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DE3586501D1 - Herstellung und evaluation einer ausrichtung mittels ausrichtzeichen. - Google Patents

Herstellung und evaluation einer ausrichtung mittels ausrichtzeichen.

Info

Publication number
DE3586501D1
DE3586501D1 DE8686900467T DE3586501T DE3586501D1 DE 3586501 D1 DE3586501 D1 DE 3586501D1 DE 8686900467 T DE8686900467 T DE 8686900467T DE 3586501 T DE3586501 T DE 3586501T DE 3586501 D1 DE3586501 D1 DE 3586501D1
Authority
DE
Germany
Prior art keywords
alignment
evaluation
manufacturing
label
alignment label
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686900467T
Other languages
English (en)
Other versions
DE3586501T2 (de
Inventor
Douglas Feather
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
American Telephone and Telegraph Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc
Publication of DE3586501D1 publication Critical patent/DE3586501D1/de
Application granted granted Critical
Publication of DE3586501T2 publication Critical patent/DE3586501T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE8686900467T 1984-12-28 1985-12-06 Herstellung und evaluation einer ausrichtung mittels ausrichtzeichen. Expired - Fee Related DE3586501T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/687,125 US4623257A (en) 1984-12-28 1984-12-28 Alignment marks for fine-line device fabrication
PCT/US1985/002435 WO1986004158A1 (en) 1984-12-28 1985-12-06 Establishing and/or evaluating alignment by means of alignment marks

Publications (2)

Publication Number Publication Date
DE3586501D1 true DE3586501D1 (de) 1992-09-17
DE3586501T2 DE3586501T2 (de) 1993-01-14

Family

ID=24759166

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686900467T Expired - Fee Related DE3586501T2 (de) 1984-12-28 1985-12-06 Herstellung und evaluation einer ausrichtung mittels ausrichtzeichen.

Country Status (5)

Country Link
US (1) US4623257A (de)
EP (1) EP0205571B1 (de)
JP (1) JPS62501390A (de)
DE (1) DE3586501T2 (de)
WO (1) WO1986004158A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2666859B2 (ja) * 1988-11-25 1997-10-22 日本電気株式会社 目合せ用バーニヤパターンを備えた半導体装置
JPH04234930A (ja) * 1991-01-10 1992-08-24 Shimano Inc 釣り用リール
JPH05152186A (ja) * 1991-05-01 1993-06-18 Canon Inc 測定装置及び露光装置及び露光装置の位置決め方法
JPH0540013A (ja) * 1991-08-05 1993-02-19 Canon Inc ずれ測定方法及びこの方法を用いた露光装置
CA2078930C (en) * 1991-09-24 1999-08-03 Raphael L. Levien Register mark
US5764366A (en) * 1995-11-30 1998-06-09 Lucent Technologies Inc. Method and apparatus for alignment and bonding
US5757503A (en) * 1995-12-26 1998-05-26 Lucent Technologies Inc. Method and apparatus for fabricating products using alignment measuring technique
US6228743B1 (en) 1998-05-04 2001-05-08 Motorola, Inc. Alignment method for semiconductor device
US6671048B1 (en) 1999-10-21 2003-12-30 Koninklijke Philips Electronics N.V. Method for determining wafer misalignment using a pattern on a fine alignment target
US20090311615A1 (en) * 2008-06-13 2009-12-17 Deming Tang Method of photolithographic patterning
JP2015079830A (ja) * 2013-10-16 2015-04-23 三菱電機株式会社 光半導体装置、光半導体装置の製造方法、及び光モジュールの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3990798A (en) * 1975-03-07 1976-11-09 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer
US4529314A (en) * 1980-04-18 1985-07-16 Harris Corporation Method of measuring misalignment between levels on a substrate

Also Published As

Publication number Publication date
EP0205571A1 (de) 1986-12-30
WO1986004158A1 (en) 1986-07-17
US4623257A (en) 1986-11-18
EP0205571B1 (de) 1992-08-12
DE3586501T2 (de) 1993-01-14
JPS62501390A (ja) 1987-06-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee