DE102014106377A1 - Magnetron arrangement - Google Patents

Abstract

A magnetron assembly (200) may include, according to various embodiments: an elongate cathode (102); a plurality of anode structures (204a, 206a; 204b, 206b; 204c, 206c; 204d, 206d; 204c, 206c; 204d, 206d) associated with the cathode (102), each of the plurality of anode structures (204a, 206a; 204b, 206b; 204c, 206c; 204d, 206d) being arranged such may be to provide each an anode potential for influencing the cathode (102); wherein at least one anode structure of the plurality of anode structures (204a, 206a; 204b, 206b; 204c, 206c; 204d, 206d) has two anode structure sections (204a, 206a) opposite and opposite each other with respect to the longitudinal extent (101) of the cathode (102). can have; wherein the opposing anode structure sections (204a, 206a) may be offset from each other and / or may have different spatial dimensions along the longitudinal extent (101) of the cathode (102).

Description

The invention relates to a magnetron arrangement. In general, different methods can be used to machine, coat, heat, etch and / or structurally modify a workpiece or substrate. One method of coating a workpiece or coating a substrate is, for example, sputtering (so-called sputtering or sputter deposition). By sputtering, for example, one or more layers, each with a layer thickness in the micrometer range, can be deposited on a substrate. During sputtering, a plasma-forming gas can be ionized by means of a cathode and the cathode material can be atomized by means of a plasma provided close to the cathode. Further, at least one anode may be provided to the cathode such that an electrical current flow may form between the anode and the cathode (the sputtering cathode) so that the plasma can be generated and / or maintained stable.

Modifications of the cathode sputtering are, for example, the so-called magnetron sputtering or the reactive magnetron sputtering. In this case, the formation of the plasma can be assisted by means of a magnetic field, wherein by means of the magnetic field, for example, the ionization rate of the plasma-forming gas can be increased. To generate the magnetic field, a magnetic system can be or be arranged relative to the cathode, wherein the magnetic system and the magnetic field generated therewith can define a plasma channel, a so-called race track, at the cathode, in which the plasma can form.

The plasma formation in the plasma channel can be influenced, for example, by means of adapting (regulating or controlling) the electric field between the anode and the cathode. The plasma formation in the plasma channel can be influenced, for example, by adjusting the anode potential (the anode voltage).

According to various embodiments, the anode may be divided into a plurality of anode structures having a plurality of anode structure sections such that an associated region of the plasma channel or a region of the cathode can be influenced in each case by means of the anode structure sections of an anode structure. Clearly, different regions of the plasma channel can be supplied with anode potential, wherein in each case an anode structure or the anode structure sections of an anode structure can clearly influence an assigned region of the plasma channel (a supply region) as effective region of the anode.

Illustratively, it has been recognized that when the anode and the cathode are juxtaposed, a portion of the plasma channel that may be affected by an anode structure portion of the anode may be offset from the anode structure portion, e.g. due to the deflection of electrons in the magnetic field between the anode structure portion and the affected region of the plasma channel.

Another aspect of various embodiments can be seen illustratively in reducing the number of parameters necessary to control plasma formation through the anode (e.g., current / voltage controls).

According to various embodiments, an anode (or an anode structure) may be associated with a cathode such that current flow between the anode and the cathode may or may be provided. Furthermore, an anode can for example be associated with a cathode such that the plasma formation near the cathode can be influenced and / or maintained. According to various embodiments, a magnetron may include a cathode and at least one anode associated with that cathode. Further, a magnetron (e.g., a double-tube magnetron) may include a plurality of cathodes and a plurality of anodes, wherein at least one anode may be associated with each of the cathodes for influencing the plasma formation proximate to the respective cathode.

Further, a current / voltage supply may be coupled to an anode structure of an anode and the cathode, respectively, wherein an electric voltage (a potential difference between anode potential and cathode potential) may be provided between the anode structure of the anode and the cathode by means of the current / voltage supply the anode potential may affect the electric field around the cathode or a current flow between the anode structure of the anode and the cathode.

According to various embodiments, an anode may be segmented. In this case, an anode segment can form an anode structure. Illustratively, an anode segment may be an integral segment of the anode, such as an electrically conductive tube, an electrically conductive sheet, an electrically conductive wire, or the like. Alternatively, a plurality of anode segments connected together may form a common anode structure. Illustratively, an anode structure may be or may be divided into any number of anode segments which may functionally function as a unit, e.g. have a common potential.

For example, an anode structure may partially surround an associated cathode and designate a single anode segment. Alternatively, an anode structure may comprise two anode segments each disposed on opposite sides of the cathode or more than two anode segments disposed on opposite sides of the cathode. Clearly, several anode segments can be brought into a functional relationship by means of an anode structure. For example, an anode structure may combine anode segments that may affect a common region of the plasma channel. Further, a plurality of the anode structures may form an anode.

Furthermore, a plurality of anode structures, for example, each spatially and / or electrically insulating can be set apart separately. For example, in each case two adjacent anode structures can be separated from one another by means of a gap. Furthermore, an insulating material can be arranged in the gap.

For example, an anode structure may include two anode structure sections, wherein the two anode structure sections may provide a (e.g., common) anode potential for the cathode. Illustratively, the anode structure portions may each denote functional (e.g., closest to the plasma channel) portions of an anode structure and may be defined by current flow between the anode portions of the anode structure and a cathode. Illustratively, the anode structure sections may each designate functional geometric sections of an anode structure and may be defined by a flow of current between the anode sections of the anode structure and a cathode. For example, an anode section may be defined in each case from the entry region of the electrons leaving the plasma channel into the anode structure.

An electric field provided by means of the anode structure (or anode structure sections of an anode structure) may be defined by the shape, geometry and arrangement of the anode structure. For example, the electric field may be defined by the shape, geometry and arrangement of an anode segment of the anode structure. If the anode structure has a plurality of anode segments, the electric field can also be defined by the relative position of the anode segments relative to one another and / or by the relative position of the anode segments relative to the cathode.

A magnetron assembly according to various embodiments may include: an elongate cathode; at least one anode structure associated with the cathode, wherein the at least one anode structure may be configured to provide an anode potential; wherein the at least one anode structure can have two anode structure sections which are opposite one another with respect to the longitudinal extension of the cathode and are connected to one another in an electrically conductive manner; wherein the opposing anode structure sections may be offset from each other and / or may have different spatial dimensions along the length of the cathode.

A magnetron assembly according to various embodiments may include: an elongate cathode; a plurality of anode structures associated with the elongate cathode, wherein each anode structure of the plurality of anode structures may be configured to respectively provide an anode potential for biasing the cathode (each anode structure may be associated with an anode potential and the anode structures may have different anode potentials from each other); wherein at least one anode structure of the plurality of anode structures may have two anode structure sections opposite each other with respect to the longitudinal extension of the cathode and connected to one another in an electrically conductive manner; wherein the opposing anode structure sections may be offset from each other and / or may have different spatial dimensions along the length of the cathode.

According to various embodiments, an anode segment or a plurality of juxtaposed anode segments may define an anode structure section.

For example, an anode structure portion or an anode segment may have a longitudinal extent in a range of about 0.1 m to about 2.5 m, e.g. in a range of about 0.5 m to about 1.5 m, or in a range of about 0.5 m to about 1 m. Alternatively, an anode structure portion or an anode segment may have a longitudinal extent in a range of about 0.1 m to about 1 m, or in a range of about 0.1 m to about 0.5 m.

Two anode structure sections of an anode structure may be disposed relative to the cathode (with respect to the longitudinal extent of the cathode) such that the cathode is disposed between the two anode structure sections, in which case the two anode structure sections are opposite to the cathode , or on both sides of the cathode or on opposite sides of the cathode are arranged. For example, a tubular Anode structure, which can partially surround the cathode, have two opposite anode structure sections.

Two anode structure sections of an anode structure may be arranged relative to a plasma channel (with respect to the longitudinal extension of the plasma channel) of a magnetron such that the plasma channel is disposed between the two anode structure sections, in which case the two anode structure sections are opposite each other Plasma channels are opposite, or on both sides of the plasma channel or on opposite sides of the plasma channel are arranged.

Further, opposing anode structure sections may be functionally related or functionally linked together. For example, opposing anode structure sections may affect a common longitudinal region of the cathode.

Two staggered anode structure sections may be arranged opposite one another and be displaced relative to one another with respect to the longitudinal extent of the cathode and / or overlap incompletely transversely to the longitudinal extent of the cathode.

According to various embodiments, all the anode structure sections may each have a longitudinal extent parallel to the longitudinal extent of the cathode. In this case, in each case opposite anode structure sections relative to each other by an offset along the longitudinal extension of the cathode can be arranged displaced (offset). For example, two staggered anode elements may be staggered by less than half of their longitudinal extent (eg, less than 50% offset, eg, less than 30% offset, eg, less than 20% offset, eg an offset of less than 10%).

According to various embodiments, the respective longitudinal extent of opposing anode structure sections may be different from each other.

Two oppositely disposed anode structure sections or oppositely disposed (with respect to their longitudinal extent) different length anode structure sections may have a distance in the range of about 0.1 m to about 1 m, transverse to the longitudinal extent of the cathode. in a range of about 0.2 m to about 0.5 m.

According to various embodiments, a cathode may be a planar elongate cathode or a tubular elongate cathode. Further, an elongate cathode may have a longitudinal extent in a range of about 1 m to about 5 m, e.g. in a range of about 2 m to about 5 m, e.g. in a range of about 2 m to about 4.5 m. Further, an elongated cathode may have a width (transverse to the longitudinal extent) in a range of about 0.1 m to about 1 m, e.g. in a range of about 0.1 m to about 0.5 m.

Furthermore, according to various embodiments, a magnetron arrangement may comprise: a regulator coupled to the at least one anode structure for influencing the anode potential of the opposing and electrically conductively connected anode structure sections of the at least one anode structure.

Further, according to various embodiments, the controller may be configured such that an electric current strength of a current flow between the cathode and the at least one anode structure as a controlled variable and the anode potential of the opposing and electrically conductively connected anode structure sections of the at least one anode structure can be used as a manipulated variable.

The controller may be, for example, a PID controller (a proportional-integral-derivative controller). For example, the controller can use a voltage, an anode potential, a current intensity and / or a power as a controlled variable or manipulated variable. Clearly, the controller can be configured as a power controller.

For example, a voltage may be provided as a continuous voltage or as a pulsed voltage (e.g., a square wave). For example, the pulsed voltage provided can be controlled by pulse width modulation such that a difference between an average electric current and a desired current can be reduced.

In accordance with various embodiments, each of the plurality of anode structures may each comprise two anode structure sections opposite each other with respect to the longitudinal extent of the cathode, and the anode structure sections of the plurality of anode structures may each extend on both sides along the longitudinal extent of the cathode. Furthermore, the plurality of anode structures may be spatially separated from each other and disposed along the length of the cathode.

According to various embodiments, the at least one anode structure may be formed as a half pipe (as a cylindrical anode structure with a circular ring segment as base area). Furthermore, the anode structure can have a curved or angled shape (for example, in cross-section) or can be U-shaped, C-shaped or V-shaped. Furthermore, the anode structure may be a segment of a hollow cylinder or the anode structure may be tubular at least in sections. For example, a half tube may include a curved plate or a curved plate, where the curvature may define a longitudinal direction.

According to various embodiments, a magnetron assembly may include: an elongate cathode; an anode structure associated with the elongate cathode, wherein the anode structure may extend along a longitudinal extent of the cathode; wherein the anode structure may comprise a plurality of spatially separated anode segments, wherein the anode segments may be disposed relative to the cathode such that a first anode segment and a second anode segment opposite thereto with respect to the longitudinal extent of the cathode comprise an anode segments Pair can form; wherein the anode segments of at least one anode-segment pair can be electrically conductively connected to each other and arranged offset from one another.

Furthermore, the anode segments may have a substantially equal spatial extent along the length of the cathode. For example, the anode segments of at least one anode-segment pair along the longitudinal extent of the cathode may have a same spatial extent.

A magnetron assembly according to various embodiments may include: a cathode having a magnet system, wherein the magnet system may be arranged and disposed relative to a surface of the cathode such that a plasma may be generated in a longitudinal plasma region over the surface of the cathode; a plurality of anode structures arranged along the longitudinal extent of the plasma region, which may be configured such that the plasma can be influenced in the longitudinally extended plasma region, wherein each of the anode structures may have a first effective region, a second effective region and a connecting structure; wherein the connection structure can predetermine a common anode potential for the two effective regions, wherein the two effective regions with respect to the longitudinal extent of the longitudinally extended plasma region are opposite one another and can be set up such that a first extension of the first effective region along the longitudinal extension is different from a second extension of the second effective region, and / or the effective ranges are arranged offset from one another.

An effective region of an anode structure may be a region of the anode structure that may affect a predefined plasma channel region or plasma region and may be associated with the plasma channel region or plasma region. For example, an anode structure partially surrounding the cathode may have two opposing effective regions, wherein each of the two opposing effective regions may be associated with the predefined plasma channel region or plasma region. Clearly, an effective range can be defined in the anode structure from the entry region of the electrons leaving the plasma channel region or plasma region.

A magnetron assembly according to various embodiments may include: an elongate cathode; a first anode and a second anode, wherein the first anode and the second anode are disposed on opposite sides of the elongated cathode and extend along the longitudinal extent of the cathode; wherein the first anode may comprise a plurality of spatially separated first anode segments, and wherein the second anode may comprise a plurality of spatially separated second anode segments, wherein one anode segment of the first anode segments and one directly opposite anode segment of the second Anode segments can form an anode-segment pair; wherein the anode segments of at least one anode-segment pair can be arranged offset to one another.

A magnetron assembly according to various embodiments may further include a power supply coupled to the first anode and the second anode for electrically supplying the first anode and the second anode.

According to various embodiments, the anode segments of at least one anode-segment pair may be of different lengths (in the direction of the longitudinal extension of the cathode).

Furthermore, the anode segments of an anode-segment pair can be arranged offset from one another in such a way that the anode Segments of the anode-segment pair may affect a common cathode region (eg affect plasma formation over a common region of the cathode). Further, the anode segments of an anode-segment pair may be staggered such that the anode segments of the anode-segment pair may affect a common longitudinal region of the cathode (eg, affect plasma formation over a common longitudinal region of the cathode).

According to various embodiments, a cathode may have different cathode areas (e.g., surface areas), e.g. several longitudinal areas along the longitudinal extent of the cathode.

According to various embodiments, the magnetron assembly may include: an elongate cathode; at least one anode structure associated with the cathode; wherein the at least one anode structure may have two anode structure sections opposite to each other with respect to the longitudinal extension of the cathode and electrically conductively connected to one another to provide a (common) anode potential; wherein the two opposing anode structure sections may be offset from each other and / or may have different spatial dimensions along the length of the cathode.

Embodiments of the invention are illustrated in the figures and are explained in more detail below.

Show it

1A to 1C each a schematic cross-section or a schematic plan view of a magnetron arrangement according to various embodiments;

2A and 2 B each a schematic cross-section or a schematic plan view of a magnetron arrangement according to various embodiments;

3A and 3B each a schematic cross-section or a schematic plan view of a magnetron arrangement according to various embodiments;

4A to 4C in each case a schematic cross section or a schematic view of a magnetron arrangement according to various embodiments;

4D a schematic plan view of a magnetron arrangement according to various embodiments;

5 a schematic cross-sectional view or a schematic view of a processing arrangement with a magnetron arrangement according to various embodiments;

6A to 6C in each case a schematic cross section or a schematic view of a magnetron arrangement according to various embodiments;

In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "rear", etc. is used with reference to the orientation of the figure (s) described. Because components of embodiments can be positioned in a number of different orientations, the directional terminology is illustrative and is in no way limiting. It should be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. It should be understood that the features of the various exemplary embodiments described herein may be combined with each other unless specifically stated otherwise. The following detailed description is therefore not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

As used herein, the terms "connected," "connected," and "coupled" are used to describe both direct and indirect connection, direct or indirect connection, and direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference numerals, as appropriate.

The phrase "substantially," as it relates to a physical quantity or a relationship between multiple physical quantities, may describe a deviation (tolerance) of less than 10%.

For sputtering by means of a magnetron arrangement according to various embodiments, an electric field can be provided between a cathode and an anode of the magnetron arrangement, wherein an electric current flow (with a total current intensity or a total power) between the anode and the cathode (sputtering cathode) is formed can. The electric field may, according to various embodiments, be a temporally constant electric field (DC sputtering) or a time or space variable according to a specification, for example periodically variable electric field (AC sputtering) can be provided.

Furthermore, during sputtering, electrons can interact with a plasma-forming gas and thereby generate a plasma, which can be used to atomize a target. The target may, for example, have a sputtering cathode (cathode) or a material applied to the sputtering cathode and to be sputtered. The target material may be the sputtering cathode material to be sputtered, e.g. denote the cathode material or the material to be sputtered applied to the sputtering cathode.

The sputtered sputtered target material may propagate into a processing area such that a substrate is processed in the processing area, e.g. can be coated. The processing area may be or may be provided in a processing chamber, for example, wherein the processing chamber may be or may be configured to process or process the substrate. For example, the plasma-forming gas may be or may be provided in the processing chamber.

For DC sputtering with anodes, a metallic rod, sheet or the like may be used as the anode, and the anode may be mounted along the sputter cathode (cathode) on one or two sides (e.g., opposite or both sides). In contrast to the two-sided embodiment, an anode arranged on one side of the cathode can lead to an asymmetrical plasma characteristic and reduce a target utilization.

The target utilization may illustratively indicate a useful life of a target in sputtering the target material before the target needs to be changed. Alternatively, the target utilization may refer to material utilization and describe how much material can be sputtered from a target before the target needs to be changed.

According to various embodiments, segmentation of the anode may occur in a plurality of longitudinally juxtaposed segments (e.g., anode segments). Illustratively, a segmented anode can provide multiple anode segments, e.g. an electrical voltage may be provided separately between each of the plurality of anode segments and the cathode, respectively.

An anode of a long (e.g., elongated) DC sputtering source (magnetron array) may be segmented such that the sputtering rate of individual longitudinal regions (longitudinal sections) of the magnetron may be affected. The sputtering rate can illustratively refer to a quantity of material that is sputtered per unit of time. The interference can be done by controlling the electrical current through the anode segments. The control can be done, for example, by connecting and disconnecting segments, e.g. either permanent ("on-off" control) or e.g. periodically, by means of a square wave signal. By means of pulse width modulation of the square wave signal, stepless control of the time-averaged current can take place.

The connection and disconnection of anode segments can for example be done with electronic switches (IGBTs). A technical requirement can be seen in providing as many anode segments as necessary, if possible, in order to keep the number of parameters to be set and thus the operating complexity low.

A segmentation of an (eg two-sided) anode can take place by dividing both sides (in anode segments) with the same segment lengths (eg extension of the anode segments along the length of the anode), the wiring (or the regulation) of both sides ( the anode) can be done separately. In this case, twice as many (to be controlled) segments (anode segments) arise, as would be necessary because two segments can always act on the same longitudinal section (longitudinal region of the cathode). According to various embodiments, opposing anode segments may or may not be electrically (conductively) connected. For example, due to the electrically conductive connection of opposing anode segments, a number of the parameters to be controlled (e.g., supply quantities or manipulated variables) may be reduced.

Clearly, due to the electrically conductive connection of opposing anode segments, the number of (individually) controllable anode segments can be halved. Furthermore, due to the electrically conductive connection of opposing anode segments, the number of parameters to be controlled can be halved.

When controlling the anode segments, for example, the plasma formation or the plasma can be influenced in cathode regions, for example in longitudinal regions of the cathode or in regions of the race track (eg supply regions). In this case, one of the (controlled) anode segments can not affect the area of the race track, which may be geometrically closest to it. Clearly, the supply area and the supply area regulating anode segment can be arranged offset from each other. Analog can the Plasma region and the plasma region regulating anode segment offset from each other.

The race track can designate an annular plasma region in which the plasma can be formed during sputtering. The shape, the position and / or the geometry of the race track with respect to a cathode of the magnetron arrangement may be defined by means of a magnet system of the magnetron arrangement. For example, the race track may be in the form of an annular channel (plasma channel) that may extend along a surface of the cathode. The surface of the cathode may, for example, face the processing area of the processing chamber.

The trajectory of the accelerated electrons in the magnetic field, which may be defined by a magnet system of the magnetron arrangement, may follow the course of the race track. Clearly, for example, the electrons can move along the annular plasma channel of the race track on closed tracks, whereby an approximately ring current flow can result, which can define a "circulation direction". Upon ionization of the plasma-forming gas (e.g., by impact ionization), the electrons may be directed out of their (e.g., closed) pathway due to the interaction of the electrons with the plasma-forming gas atoms thereby leaving the race track and / or the loop current flow.

The electrons leaving the race track can continue to follow the "direction of rotation" of the magnetron on the way through the free space to the anode. One reason for this can be seen in the far-reaching stray magnetic field of the magnet system. Therefore, the stream leaving the race track at one point may enter the anode a little further "downstream" (along the direction of rotation) (drift effect). The offset between the exit point of the electrons from the race track and the point of entry of the electrons into the anode can be called a drift offset.

According to various embodiments, the drift effect may be taken into account in the segmentation of the anode. For example, the segments may be arranged such that the division points (gaps between the segments) are displaced a bit in accordance with the drift direction of the electrons and thus opposite division points of the segmented anode can be arranged offset from one another.

According to various embodiments, directly opposed segments may be electrically connected and form obliquely offset segments of an anode structure. The offset (of the segments or anode structure portions of the anode structure) may be arranged so that the respective segments (electrically conductive to each other) affect the same (e.g., common) longitudinal region of the cathode and / or the same longitudinal region of the race track. For example, an offset of opposite segments can be or be set up such that the supply region of the respective electrically conductively connected and opposite anode segments can lie completely in a common longitudinal region of the cathode.

According to various embodiments, the opposite segments of the anode at the magnetron end (at the end portions of the cathode) may be chosen to be unequal in length. In the case of an encompassing anode (e.g., angled and / or bent sheet), such as a tubular magnetron, the offset (e.g., drift offset) may be accounted for, for example, by an oblique cut of the sheet.

1A illustrates a schematic cross section or a schematic plan view of a magnetron arrangement 100 according to various embodiments. The magnetron arrangement 100 can be an elongated cathode 102 (a sputtering cathode) and one of the cathodes 102 assigned anode 104 . 106 with a first anode structure 104a . 106a and a second anode structure 104b . 106b exhibit. For example, the cathode 102 along one direction 101 be elongated or a longitudinal extent along the direction 101 exhibit.

The anode 104 . 106 may comprise an electrically conductive material, eg a metallic material. For example, the anode 104 . 106 a metal or a carrier having a metal layer. Furthermore, the electric field between the anode 104 . 106 and the cathode 102 from the shape of the anode 104 . 106 be defined or influenced. For example, the anode 104 . 106 a sheet, rod or tube and each be planar, curved or angled. Furthermore, the anode can 104 . 106 with an anode supply structure (not shown) for supplying the anode 104 . 106 be coupled with electrical energy and / or with a coolant. For example, the anode can be provided as a tube through which a coolant flows, wherein the tube can be connected in an electrically conductive manner to a current / voltage source by means of the anode supply structure.

According to various embodiments, between the first anode structure 104a . 106a and the cathode 102 a first voltage and between the second anode structure 104b . 106b and the cathode 102 a second voltage can be provided. In this case, a regulation or control can be carried out such that the first voltage is different from the second voltage.

Furthermore, the first anode structure 104a . 106a a first anode structure section 104a and a second anode structure section 106a , wherein the first anode structure section 104a and the second anode structure section 106a with respect to the longitudinal extent of the cathode can be arranged opposite one another. Furthermore, the first anode structure section 104a and the second anode structure section 106a be electrically connected to each other.

The two anode structure sections 104a . 106a the first anode structure 104a . 106a For example, they may be spatially separated or part of a common, physically connected (eg, one-piece) first anode structure 104a . 106a be at least a portion of the cathode (or a portion of the plasma channel) between the anode structure sections 104a . 106a the first anode structure may be arranged. Furthermore, the anode structure sections 104a . 106a each of the first anode structure of an anode segment (eg 104a respectively. 106a ) or a plurality of anode segments connected to one another in an electrically conductive manner.

Similarly, the second anode structure may have a third anode structure section 104b and a fourth anode structure section 106b having the anode structure sections 104b . 106b the second anode structure similar or equal to the anode structure sections 104a . 106a the first anode structure can be set up or be.

Furthermore, the first anode structure 104a . 106a and the second anode structure 104b . 106b be arranged along the longitudinal extent of the cathode, for example in a row along the longitudinal extent of the cathode, and / or along the longitudinal extent of the cathode, for example along the direction 101 , extend.

According to various embodiments, the first anode structure section 104a and the second anode structure section 106a with respect to the cathode, and different spatial dimensions along the length of the cathode, eg along the direction 101 , exhibit. Furthermore, the third anode structure section 104b and the fourth anode structure section 106b a substantially equal spatial dimensions along the longitudinal extent of the cathode, eg along the direction 101 , and opposite to each other offset (eg in the direction 101 offset) may be arranged.

Furthermore, the anode structure sections of the anode structures may be spatially separated from one another, for example by means of a gap 114a . 116a between each two adjacent one-side anode structure portions of the anode structures. The gap 114a . 116a For example, between the first anode structure 104a . 106a and the second anode structure 104b . 106b offset (eg in the direction 101 offset) to each other. The gap 114a . 116a can be the first anode structure 104a . 106a and the second anode structure 104b . 106b electrically isolate from each other. Furthermore, at least in one of the gaps 114a . 116a an electrically insulating material may be arranged or a gap may be formed by means of an electrically insulating material.

The electrically insulating material may comprise a vacuum compatible material, a high temperature resistant material and / or a chemically stable material. For example, the electrically insulating material may be a ceramic or one at the gaps 114a . 116a arranged coating on the columns 114a . 116a have adjacent anode segments.

A gap may further define a distance between the two adjacent anode segments, wherein by means of the gap, for example, a distance between the two adjacent anode segments in a range of about 5 mm to about 50 mm may be provided.

According to various embodiments, the offset of the column 114a . 116a be defined by the drift offset to each other. For example, the offset of the column 114a . 116a to each other approximately equal to twice the drift offset.

Furthermore, the cathode 102 two adjoining longitudinal areas 111 . 111b have, for example, halves, which may be arranged side by side. The border 111g the adjoining longitudinal areas 111 . 111b may for example extend transversely to the longitudinal extent of the cathode, wherein the adjacent longitudinal regions 111 . 111b may be defined so that they each about about half of the cathode 102 are extended.

Furthermore, the longitudinal area 111 . 111b two anode structure sections arranged in each case on both sides of the longitudinal region are or can be assigned, wherein the respective longitudinal region can be influenced by means of the anode structure sections assigned to the longitudinal region (for example the plasma formation in the longitudinal region). For example can be the first longitudinal area 111 the anode structure sections 104a . 106a the first anode structure and the second longitudinal region 111b the anode structure sections 104b . 106b be associated with the second anode structure or be.

The anode structure sections of the anode 104 . 106 may further be arranged such that the limit 111g the adjoining longitudinal areas 111 . 111b with respect to the longitudinal extent of the cathode 102 between the columns 114a . 116a can be arranged. For example, a first gap 114a at a first distance 124a along the direction 101 from the border of adjoining longitudinal areas 111 . 111b be arranged, and a second gap 116a at a second distance 124b from the direction 101 from the border of adjoining longitudinal areas 111 . 111b be arranged.

According to various embodiments, the first distance 124a and the second distance 124b be essentially the same size. Furthermore, the first distance 124a and the second distance 124b essentially correspond to the drift offset.

1B illustrates a schematic cross section or a schematic plan view of a magnetron arrangement 100 According to various embodiments, each two anode structure sections of the plurality of anode structures may have an equal extension along the length of the cathode.

From a symmetry of service areas 111 . 111b may be a symmetry of the anode sections relative to the cathode 102 result, wherein the symmetry of the anode sections by means of the two sides with respect to the cathode 102 can be defined in a row arranged anode sections. In this case, the opposite anode sections 104a . 106a and 104b . 106b be different lengths, each with the anode sections 104a . 106b and 106a . 104b can be the same length. Furthermore, the anode sections 106a . 106b which are on one side of the cathode 102 are arranged to be different in length. Similarly, those on one side of the cathode 102 arranged anode sections 104a . 104b be different in length.

As described above, the anode structure sections may each be defined by an anode segment. By way of example, the first anode structure may have two anode segments which are spatially separated from one another 104a . 106a wherein the anode segments are so relative to the cathode 102 can be arranged that a first anode segment 104a and a second anode segment opposite to the longitudinal extent of the cathode 106a a first anode segment pair 104a . 106a can form. Similarly, the second anode structure may be a second anode-segment pair 104b . 106b with a third anode segment 104b and a fourth anode segment 106b exhibit.

The anode segments of the first anode-segment pair 104a . 106a can vary in length along the length of the cathode 102 , eg along one direction 101 , extends its. Similarly, the anode segments of the second anode-segment pair 104b . 106b different lengths along the length of the cathode 102 , eg along one direction 101 , extends its.

Furthermore, in each case two anode segments of the anode 104a . 104b . 106a . 106b a substantially equal spatial extent along the direction 101 exhibit. As in 1B The first anode segment can be illustrated in each case 104a and the fourth anode segment 106b , and in each case the second anode segment 104b and the third anode segment 106a a substantially equal spatial extent along the direction 101 exhibit.

Instead of an anode segment, a plurality of adjacently arranged and electrically conductively connected anode segments may functionally define an anode structure section.

1C illustrates a schematic cross section or a schematic plan view of a magnetron arrangement 100 according to various embodiments, wherein the magnetron arrangement 100 can be configured analogously to the preceding description and also a third anode structure 104c . 106c may have, wherein the third anode structure 104c . 106c may be configured such that between the anode sections 104c . 106c the third anode structure and the cathode 102 a third voltage can be provided. Furthermore, the anode structure sections 104c . 106c the third anode structure a third longitudinal region 111c associated with the cathode, wherein by means of the anode structure sections 104c . 106c the third anode structure, the plasma formation in the third longitudinal region 111c can be influenced.

The third anode structure 104c . 106c can between the first anode structure 104a . 106a and the second anode structure 104b . 106b be arranged. Furthermore, the first anode structure 104a . 106a and the second anode structure 104b . 106b may be arranged in each case on opposite end portions of the cathode.

The third anode structure 104c . 106c may be a fifth anode structure section 104c and a sixth anode structure section 106c have, with respect to the longitudinal extent of the cathode 102 arranged opposite each other and for example can be the same length (along the direction 101 ).

As in 1C can be arranged between each two adjacent anode structure sections, a gap. For three anode segments per side of the cathode 102 For example, two columns each can separate the anode segments from each other. Furthermore, column 114a . 114b the anode structure sections 104a . 104b . 104c separate from each other and column 116a . 116b the anode structure sections 106a . 106b . 106c separate each other. Two arranged on one side of the cathode column 114a . 114b can each have a distance to each other, wherein the distance of the column 114a . 114b and the distance of the column 116a . 116b can be essentially the same. Furthermore, the column 114a . 114b and the column 116a . 116b be arranged offset from each other.

2A illustrates a schematic cross section or a schematic plan view of a magnetron arrangement 200 according to various embodiments, wherein a magnet system (not shown) of the magnetron arrangement 200 set up and relative to the surface of the cathode 102 can be arranged that a plasma in an annular plasma channel 112 or race track 112 over the surface of the cathode 102 can be generated.

Further, an anode structure may include a first anode portion 204a and a second anode section 206a , wherein the anode structure may be configured such that the plasma by means of the first anode section 204a and the second anode section 206a can be influenced. The anode sections may illustratively each denote functional regions of the anode structure, for example, one may be attached to the anode sections 204a . 206a applied anode potential, the plasma formation in the longitudinal region 111 the cathode 102 influence.

The sputtering accelerated electrons can the race track 112 for example, along a direction of rotation 109U revolve, with the trajectories 109a . 109b the first longitudinal area 111 leaving electrons from the direction of rotation 109U can be defined (drift effect). In this case, the electrons can form an electrical current flow, that of a first plasma region 211 of the race track (first supply area 211 ) to the first anode section 204a can flow. Analogously, the electrons can form an electrical current flow, that of a second plasma region 213a of the race track (second supply area 213a ) to the second anode section 206a can flow.

Illustratively, the plasma formation in the first plasma region 211 by means of a between the cathode 102 and the first anode section 204a provided first voltage (anode voltage) are influenced, and analogous to the plasma formation in the second plasma region 213a by means of a between the cathode 102 and the second anode section 206a provided second voltage (anode voltage).

In this case, due to the drift effect of the electrons, the first anode section 204a relative to the first plasma region 211 , as well as the second anode section 206a relative to the second plasma region 213a be arranged offset. The offset of an anode portion to the respective (assigned) plasma region may depend on the shape and strength of the magnetic field, the anode potential, the shape of race tracks 112 and other geometric factors of the magnetron arrangement 200 be defined or become. For example, the offset of an anode portion to the respective (associated) plasma region may or may not be defined by the drift offset.

To account for the drift effect of the electrons, for example, to compensate, the anode sections 204a . 206a be offset from one another such that the respective plasma regions 213a . 211 completely in the longitudinal area 111 the cathode 102 can lie. Illustratively, the anode sections 204a . 206a be offset from one another or be such that an offset of the plasma regions 213a . 211 can be reduced to each other or that the plasma areas 213a . 211 no offset towards each other 101 exhibit.

The first anode section 204a and the second anode section 206a can be electrically conductively coupled to each other, for example by means of an electrically conductive cable or an electrically conductive substrate (eg a metallic substrate) or a substrate with an electrically conductive (eg metallic) coating.

For example, if the first anode structure comprises an anode-segment pair, as described above, the anode segments may 204a . 206a of the anode-segment pair each define an anode portion and each a plasma region 211 . 213a be assigned. According to various embodiments, the anode segments 204a . 206a an anode Segment pairs may be arranged offset so that they have a common longitudinal area 111 the cathode 102 (eg the plasma properties or the plasma formation in a common longitudinal area 111 the cathode 102 ).

2 B illustrates a schematic cross section or a schematic plan view of a magnetron arrangement 200 according to various embodiments, wherein several along the longitudinal extent of the race tracks 112 arranged anode structures can each be set up such that the plasma at several longitudinal areas 111 . 111b . 111c . 111d the cathode can be influenced, with the several longitudinal areas 111 . 111b . 111c . 111d from the symmetry of the cathode 102 or the symmetry of the race track 112 can be defined.

Clearly, the geometry of the race track 112 define two halves, eg two symmetrical halves, which are each to be influenced individually. Furthermore, each of the straight course and the curved course of the race track in both halves may have different plasma properties. This may, for example, four along the longitudinal extent of the cathode 102 arranged longitudinal areas 111 . 111b . 111c . 111d result, each of which should be influenced individually.

According to various embodiments, the first longitudinal region 111 and the second longitudinal area 111b in each case at opposite end portions of the elongate cathode or at opposite end portions race tracks be arranged. Furthermore, the third longitudinal area 111c and the fourth longitudinal area 111d between the first longitudinal area 111 and the second longitudinal area 111b be arranged and adjoin one another.

According to various embodiments, an anode structure as described above may include a first anode portion 204a and an anode section opposite thereto 206a have, wherein the first anode section 204a and the second anode section 206a a first anode section pair 204a . 206a can form. Similarly, a second anode structure may include a second anode-portion pair 204b . 206b , a third anode structure, a third anode section pair 204c . 206c and a fourth anode structure a fourth anode-section pair 204d . 206d exhibit. Each of the anode-section pairs may be defined by an anode-segment pair, as described above.

Furthermore, each of the anode-section pairs may be configured such that the plasma formation in each case in a longitudinal region of the cathode 102 can be influenced. For example, by means of the first anode section pair 204a . 206a the first longitudinal area 111 , by means of the second anode section pair 204b . 206b the second longitudinal area 111b , by means of the third anode section pair 204c . 206c the third longitudinal area 111c and by means of the fourth anode section pair 204d . 206d the fourth longitudinal area 111d to be influenced.

The anode section of the third anode section pair 204c . 206c and the fourth anode section pair 204d . 206d can each have an equal extent along the direction 101 have and arranged offset from one another.

3A illustrates a schematic cross section or a schematic plan view of a magnetron arrangement 300 According to various embodiments, wherein the plurality of anode structures may be connected to a power supply P (eg, a power source P or power source P) for electrically powering the plurality of anode structures.

By means of the power supply P can be connected to the anode structure sections 304a . 306a the first anode structure has a first anode potential and at the anode structure sections 304b . 306b the second anode structure a second (different from the first anode potential or independent) anode potential can be provided.

Furthermore, the plurality of anode structures can be configured such that the plasma formation in a first longitudinal area can be determined by means of the first anode potential 111 the cathode 102 and by means of the second anode potential, the plasma formation in a second longitudinal region 111b the cathode 102 can be influenced.

Further, the anode structure portions of the plurality of anode structures may be defined by respective anode segments as described above. For example, a first anode segment pair 304a . 306a and a second anode segment pair 304b . 306b be coupled by means of the power / power supply P.

3B illustrates a schematic cross section or a schematic plan view of a magnetron arrangement 300 according to various embodiments, wherein the magnetron arrangement 300 can be coupled to a plurality of regulators R1, R2, R3, R4 for influencing the anode potential of the plurality of anode structures. In this case, in each case one controller can be coupled to exactly one anode structure. Furthermore, the multiple regulators R1, R2, R3, R4 can influence of the anode potential of the opposing and electrically conductively connected anode structure sections of the plurality of anode structures.

A first regulator R1 may be connected to a first anode section pair 304a . 306a , a second regulator R2 having a second anode section pair 304b . 306b , a third controller R3 with a third anode section pair 304c . 306c and a fourth regulator R4 having a fourth anode portion pair 304d . 306d be coupled.

Furthermore, each regulator of the plurality of regulators R1, R2, R3, R4 may be coupled to the power supply P, respectively. Furthermore, each controller of the plurality of regulators R1, R2, R3, R4 can be set up in such a way that an electrical current intensity can be used as a controlled variable and an anode potential as a manipulated variable.

For example, the first regulator R1 may have a first current between the cathode 102 and the anode structure sections of the first anode structure coupled to the regulator R1 304a . 306a compare with a first target current. Furthermore, the first regulator R1 can regulate the first anode potential in such a way that a difference between the first current intensity and the first desired current intensity can be reduced. Alternatively, the first regulator R1 may regulate or adjust a first power, wherein the first power may be defined by the first anode potential and the first current strength.

The first desired current intensity may be, for example, a predetermined power or a predetermined power range during operation of the magnetron arrangement 300 consider. Analogously, a second current intensity can be set or regulated by means of the second regulator R2, the third current intensity by means of a third regulator R3 and the fourth current strength by means of a fourth regulator R4.

Furthermore, by means of the power / voltage supply P, a total current intensity or a total power, that of the magnetron arrangement 300 can be implemented, discontinued or regulated. For example, the total current strength may or may not be defined by the sum of the first, second, third, and fourth current levels. Analogously, the overall performance can be defined.

4A illustrates a schematic cross section or a schematic view of a magnetron arrangement 400 according to various embodiments along a direction 101 and eg transverse to one direction 103 , wherein the magnetron arrangement 400 a planar cathode 102 with bilaterally arranged anode segments 404a . 406a can have.

The anode segments 404a . 406a may be part of a common anode structure as described above. The anode segments 404a . 406a can also, as in 4A is illustrated to be angled, or alternatively curved, corrugated or flat. Furthermore, the anode segments 404a . 406a have an angled cross-section or alternatively have a round, square or oval cross-section. Furthermore, the shape of the anode segments 404a . 406a to the cathode 102 be adapted to the cathode 102 For example, at least partially surround.

Further, each of the anode segments 404a . 406a be formed by a hollow body, for example by means of a tube, wherein a cooling liquid can be passed through the hollow body for dissipating heat energy from the anode segments 404a . 406a , These can be the anode segments 404a . 406a For example, be connected to a cooling device.

According to various embodiments, by means of the magnetron arrangement 400 over a surface 102 o the cathode to be provided with a plasma. In this case, the anode sections 414a . 414b the common anode structure 404a . 406a the surface 102 o be facing the cathode or at least geometrically closest to the formed plasma channel 412 lie.

4B illustrates a schematic cross section or a schematic view of a magnetron arrangement 400 according to various embodiments along a direction 101 and across a direction 103 wherein the magnetron assembly is a tubular cathode 102 with bilaterally arranged anode segments 404a . 406a can have.

The tubular cathode 102 For example, it may comprise a carrier tube and a target material applied to the carrier tube. Furthermore, the shape, eg a cross-section, of the anode segments 404a . 406a As described above, be adapted to the tubular cathode, and / or be curved, for example.

Furthermore, the tubular cathode 102 be rotatably supported, for example by means of an end block. For example, the tubular cathode 102 one way across 103 be extending axis of rotation rotatably. Furthermore, the tubular cathode 102 extending along the axis of rotation and be connected to a cathode supply structure (not shown). The cathode supply structure can be used, for example, to supply the cathode 102 be set up with electrical energy and / or with cooling liquid.

4C illustrates a schematic cross section or a schematic view of a magnetron arrangement 440 according to various embodiments along a direction 101 and across a direction 103 wherein the anode structure may be integral and by means of a single anode segment 442a can be formed. Furthermore, the anode sections 414a . 416a the anode structure by means of the anode segment 442a be connected. The anode structure or the anode segment 442a For example, it may or may not be formed as a half pipe and the cathode is partially surrounded.

For example, the anode segment 442a have an electrically conductive material, or be coated with an electrically conductive material. Furthermore, the anode segment 442a Part of the connection structure, which is the anode sections 414a . 416a a common potential can pretend.

Illustratively, the anode sections 414a . 416a each part of a one-piece anode structure.

4D illustrates a schematic cross section or a schematic plan view of a magnetron arrangement 440 according to various embodiments, transverse to one direction 103 and across a direction 101 , wherein the anode 440 several anode segments 442a . 442b . 442c . 442d can have. The anode 440 For example, it may be configured such that the plurality of anode segments 442a . 442b . 442c . 442d the anode 440 at least partially surrounding the cathode.

As described above, in each case two opposite anode sections 414a . 416a the first anode structure part of a common first anode segment 442a or by means of a first anode segment 442a be connected (eg electrically conductive). Similarly, the anode sections 414b . 416b the second anode structure part of a second anode segment 442b , the anode sections 414c . 416c the third anode structure part of a third anode segment 442c and the anode sections 414d . 416d the fourth anode structure part of a fourth anode segment 442d be.

Furthermore, in each case two adjacently arranged anode structures (or anode segments) can each be formed by means of a gap 444 be separated from each other. The column can 444 be arranged such that the anode sections are each arranged offset from each other, or different dimensions along the direction 101 as described above.

Illustratively, the column 444 each at an angle to the longitudinal extent of the cathode, for example at an angle to the direction 101 , run.

In the 4D illustrated anode segments 442a . 442b . 442c . 442d the anode 440 can be analogous to the one in 4C illustrated anode structure to be curved. Alternatively, the in 4D illustrated anode segments 442a . 442b . 442c . 442d the anode 440 be angled.

5 illustrates a schematic cross section or a schematic view of a processing arrangement 500 with a magnetron arrangement 100 . 200 . 300 . 400 according to various embodiments. The processing arrangement 500 For example, a processing chamber 502 for processing a substrate 506 exhibit. The magnetron arrangement 100 . 200 . 300 . 400 can be a cathode 102 and at least one anode-segment pair 504a . 506a as described above. Furthermore, the magnetron arrangement can be so relative to a processing area 521 be arranged that sputtered material spun from the cathode 102 away and towards the processing area 521 spread out.

The processing chamber 502 For example, it may be a vacuum chamber or vacuum chamber. For example, the processing chamber 502 be coupled to a vacuum pump system for providing a vacuum or at least a negative pressure within the processing chamber.

Furthermore, in the processing area 521 the substrate 506 Processed, eg processed, eg coated. Furthermore, the processing arrangement 500 a transport system 504 have for transporting the substrate 506 in the processing area 521 into, or to transport the substrate 506 from the processing area 521 out, or to transport the substrate 506 in the processing area 521 , The transport system may, for example, have multiple transport rollers.

6A illustrates a schematic cross section or a schematic view of a magnetron arrangement 600 according to various embodiments with an anode to be segmented 604 . 606 that of an elongate cathode 102 can be assigned. In this case, a cathode region 611 as a cathode region to be influenced 611 be predefined. Illustratively, the cathode region to be influenced 611 be defined by a plasma region in which the plasma formation is to be influenced.

Furthermore, the cathode region to be influenced 611 due to the geometry of the magnetron arrangement 600 be defined, or the cathode area to be influenced 611 may be defined due to a process step in sputtering or processing a substrate. For example, the cathode region to be influenced 611 by the shape, location or geometry of the race track 112 be defined.

Starting from the cathode area to be influenced 611 For example, an offset can be determined which shows a relative position of an effective range 611a to the cathode region to be influenced 611 represents. The offset can be, for example, the drift effect, the drift direction 609a or the trajectory 609a the electrons between the cathode region to be influenced 611 and the anode to be segmented 604 . 606 , the anode potential or the operating state of the magnetron arrangement.

The effective range 611a can be the area of the anode 604 . 606 denote the cathode region to be influenced 611 influences, or the plasma formation in the cathode region to be influenced 611 affected. Furthermore, the effective range 611a due to the current flow of the cathode region to be influenced 611 to the anode 604 . 606 be defined.

6B illustrates a schematic cross section or a schematic view of a magnetron arrangement 600 according to various embodiments, wherein a first longitudinal region to be influenced 613 the cathode 102 for example, at an end portion of the cathode 102 can be arranged and a second longitudinal area to be influenced 615 the cathode in an opposite half of the cathode 102 can be arranged.

Starting from the curved course of the race track 112 can be the first longitudinal area to be influenced 613 the cathode 102 be associated with two effective ranges or be that a first effective range pair 613a . 613b can form. The effective ranges of the first effective range pair 613a . 613b can each be on opposite sides of the first longitudinal area to be influenced 613 the cathode 102 be arranged or become.

Furthermore, the effective ranges of the first effective range pair 613a . 613b through the trajectories 609a . 609b . 609c the electrons between the first longitudinal region to be influenced 613 the cathode 102 and the anode to be segmented 604 . 606 be defined or become. Furthermore, the effective ranges of the first effective range pair 613a . 613b a different extent along the direction 101 exhibit. For example, the first effective range 613a opposite the second effective range 613b be shortened by twice the drift offset.

Starting from the rectilinear sections of the plasma region 112 can the second longitudinal area to be influenced 615 the cathode 102 be associated with two effective ranges or be a second effective range pair 615a . 615b can form. The effective ranges of the second effective range pair 615a . 615b can be on opposite sides of the second longitudinal area to be influenced 615 the cathode 102 be arranged or become.

Furthermore, the effective ranges of the second effective range pair 615a . 615b along the longitudinal axis of the cathode, eg along the direction 101 be arranged offset from each other. For example, the effective ranges of the second effective range pair 615a . 615b offset by the double drift offset to each other.

6C illustrates a schematic cross section or a schematic view of a magnetron arrangement 600 according to various embodiments, wherein, starting from the first effective range pair 613a . 613b and the second effective range pair 615a . 615b , a plurality of spatially separated anode segments or a plurality of spatially separated anode structures may be or may be formed.

For this purpose, for example, an anode to be segmented 604 . 606 be segmented or divided by means of several columns. Further, the segmentation of the anode can be made such that from the anode to be segmented 604 several spatially separated anode segments 604a . 606a . 604b . 606b in the corresponding areas of impact 613a . 613b . 615a . 615b can be formed.

Alternatively, multiple anode segments may be relative to each other and relative to the cathode 102 be arranged and electrically conductively connected to each other such that a plurality of spatially separated anode sections 604a . 606a . 604b . 606b in the corresponding areas of impact 613a . 613b . 615a . 615b can be formed. Clearly, a plurality of electrically connected anode segments can be arranged in an area of effect.

Alternatively, instead of segmenting the anode, a plurality of spatially separated anode segments may be combined into corresponding anode structures (e.g., electrically connected). Clearly, the anode segments of an already segmented anode can be electrically conductively connected such that a plurality of anode structure sections and / or anode structures can be set up, as described above.

For example, a first anode segment pair 604a . 606a in the first effective range pair 613a . 613b may be formed or arranged and a second anode-segment pair 604b . 606b in the second effective range pair 615a . 615b be formed or arranged.

Furthermore, any number of functionally identical or functionally equivalent anode segments can be arranged (or formed) in the corresponding effective regions.

Claims (8)

Magnetron arrangement ( 200 ), an elongated cathode ( 102 ); At least one of the cathodes ( 102 ) associated anode structure ( 204a . 206a ; 204b . 206b ; 204c . 206c ; 204d . 206d ); Wherein the at least one anode structure ( 204a . 206a ; 204b . 206b ; 204c . 206c ; 204d . 206d ) two with respect to the longitudinal extent ( 101 ) of the cathode opposite and electrically conductively connected anode structure sections ( 204a . 206a ) for providing an anode potential; Wherein the two opposing anode structure sections ( 204a . 206a ) are offset from one another and / or different spatial dimensions along the longitudinal extent ( 101 ) the cathode ( 102 ) exhibit. A magnetron assembly according to claim 1, further comprising: a controller coupled to the at least one anode structure for influencing the anode potential of the opposing and electrically conductively connected anode structure sections of the at least one anode structure. A magnetron arrangement as claimed in claim 2, wherein the regulator is arranged such that an electric current flow between the cathode ( 102 ) and the at least one anode structure is used as a controlled variable and the anode potential of the opposing and electrically conductively connected anode structure sections of the at least one anode structure as a manipulated variable. A magnetron assembly according to any one of claims 1 to 3, wherein the plurality of anode structures ( 204a . 206a ; 204b . 206b ; 204c . 206c ; 204d . 206d ) are spatially separated from each other and along the longitudinal extent of the cathode ( 102 ) are arranged. A magnetron assembly according to claim 4, wherein each of said plurality of anode structures ( 204a . 206a ; 204b . 206b ; 204c . 206c ; 204d . 206d ) two each with respect to the longitudinal extent ( 101 ) the cathode ( 102 ) have opposite and electrically conductively connected anode structure sections, wherein the anode structure sections of the plurality of anode structures ( 204a . 206a ; 204b . 206b ; 204c . 206c ; 204d . 206d ) each on both sides along the longitudinal extent ( 101 ) the cathode ( 102 ). Magnetron arrangement according to one of claims 1 to 5, wherein the at least one anode structure is formed as a half pipe. Magnetron arrangement ( 200 ), an elongated cathode ( 102 ); • one of the cathodes ( 102 ) associated anode structure, wherein the anode structure along a longitudinal extent ( 101 ) the cathode ( 102 ) extends; Wherein the anode structure comprises a plurality of spatially separated anode segments, wherein the anode segments are so relative to the cathode ( 102 ) are arranged such that a first anode segment ( 204c ) and with respect to the longitudinal extent of the cathode ( 102 ) to the opposite second anode segment ( 206c ) form an anode-segment pair; Wherein the anode segments of at least one anode-segment pair ( 204c . 206c ) are electrically conductively connected to each other and arranged offset from each other. A magnetron assembly according to claim 7, wherein the anode segments have a substantially equal spatial extent along the longitudinal extent (FIG. 101 ) the cathode ( 102 ) exhibit.

Images