CN87104730A - Plasma accelerator ion filming device - Google Patents
Plasma accelerator ion filming device Download PDFInfo
- Publication number
- CN87104730A CN87104730A CN87104730.6A CN87104730A CN87104730A CN 87104730 A CN87104730 A CN 87104730A CN 87104730 A CN87104730 A CN 87104730A CN 87104730 A CN87104730 A CN 87104730A
- Authority
- CN
- China
- Prior art keywords
- accelerator
- permanent magnet
- acceleration
- arc
- shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011248 coating agent Substances 0.000 claims abstract description 16
- 238000000576 coating method Methods 0.000 claims abstract description 16
- 230000000694 effects Effects 0.000 claims abstract description 11
- 230000001133 acceleration Effects 0.000 claims abstract description 9
- 230000000295 complement effect Effects 0.000 claims abstract description 3
- 239000000463 material Substances 0.000 claims description 15
- 238000001704 evaporation Methods 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 5
- 238000009826 distribution Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 9
- 238000005516 engineering process Methods 0.000 abstract description 4
- 239000000693 micelle Substances 0.000 abstract description 3
- 238000005240 physical vapour deposition Methods 0.000 abstract description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010931 gold Substances 0.000 abstract description 2
- 229910052737 gold Inorganic materials 0.000 abstract description 2
- 208000034189 Sclerosis Diseases 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 230000003245 working effect Effects 0.000 description 1
Images
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- Physical Vapour Deposition (AREA)
Abstract
Title of the present invention is a plasma accelerator ion filming device, belongs to physical vapor deposition techniques.Similar technology exists that the drop micelle is many, acceleration and coating effects are lower.The present invention pays attention to the use of ear acceleration effect suddenly, has cylindric permanent magnet in the accelerator, and permanent magnet and shielding are complementary, therefore the ionization steam quality height that produces, quicken rationally, coating effects is good.Can be used for fields such as imitating gold decorating, tool and mould sclerosis.
Description
The present invention is a kind of physical vapor deposition techniques.What belong to physical vapor deposition techniques has traditional vacuum plated film, cathode sputtering and an ion film plating.At present, U.S. Pat of the prior art-3793179 has adopted evaporation of metal method ion-plating technique, owing to have only cathode substructure in this technology, anode casing does not add permanent magnet in the cathode substructure, therefore do not utilize ear acceleration effect suddenly, after treating evaporation of metal, contained droplet is many in the steam, and product glossiness is poor, quality reduces, very big to the decorative use influence, product bombardment cleaning performance is poor, and film adhesion is lower, the metal coating life-span is short, greatly reduces the quality of product.Striking silk in this technology is normally closed attitude, therefore, poor reliability, and the surperficial original shape of Coating Materials is the plane, after the striking, combustion efficacy is also very unstable, the widespread use of coating technique and quality is improved be restricted.
The present invention pays attention to the physical essence of accelerator design, adopts reasonably design, has overcome above-mentioned defective, is a kind of novel apparatus for ionically plating of the future that is widely used.
The present invention is a kind of apparatus for ionically plating, use has the type of the ear suddenly plasma accelerator 11 of cylindric permanent magnet 3 as evaporating and ionizing source, put into permanent magnet 3 in the cathode substructure 4 of accelerator 11, in the arc district, produced the externally-applied magnetic field that certain space distributes, the radial component effect of the axial component in magnetic field and discharging current, produce very strong hoop suddenly the ear electric current this suddenly the ear current values under this device condition, discharging current when not adding magnetic field is high 10～20 times, this suddenly the ear electric current again with the radial component effect of externally-applied magnetic field, just can produce very high axial plasma acceleration, make particle have corresponding kinetic energy and act on mutually with workpiece surface.It is many that thereby toroidal current also can further make evaporated material ionization overcome particulate, the phenomenon that particulate is big, with above-mentioned United States Patent (USP) mutually specific energy produce better superficial film quality.Permanent magnet 3 can be in ± 2cm scope before and after fine setting to change total field intensity and distributional pattern.Cylindric permanent magnet 3 is complementary with tube shielding 8 and plane shielding 9, produces required Distribution of Magnetic Field and desired particle acceleration of plated film and the particle distribution effect of steady running, to guarantee the normal steady running of accelerator 11.Keep 1.5～3mm distance between tube shielding 8 and Coating Materials 1 and the cathode substructure 4, select soft iron or magnetically permeable material manufacturing for use, make to be distributed with in Coating Materials 1 lip-deep axial magnetic field to be beneficial to the arc spot and to maintain on the end face and burn, the field intensity of the axial magnetic field that it is peripheral is aligned between 20～40 Gausses.
Short-circuit arc triggering device 7 in the accelerator 11 joins by resistance 15 and anode-housing 2, finishes the short-circuit arc action under the effect of the electro-magnet after the making current 6.The striking electric arc that between striking triggering device 7 and Coating Materials 1, forms, be transformed into the main arc between Coating Materials 1 and the anode casing 2 rapidly, under the effect of this arc cathode spot, Coating Materials 1 evaporation and ionization, the surface speeds away, evaporated material forms required plasma flow 10 again by further ionization of toroidal current and acceleration.For realizing even more ideal arc process, between Coating Materials 1 and short-circuit arc triggering device 7, incorporate a voltage relay 12 into, under the voltage of the normal stable burning of electric arc, voltage relay 12 discharges, make the line bag outage of electro-magnet 6, short-circuit arc triggering device 7 is in the state that breaks away from Coating Materials 1; Otherwise, occur extinguishing trend and be directed at voltage and rise to when being higher than normal voltage at arc extinction or electric arc, voltage relay 12 adhesives, the line of electro-magnet 6 is surrounded by electricity, and short-circuit arc triggering device 7 is carried out the short-circuit arcs action.Seal and electrical isolation by isolator 5 between each parts in the accelerator 11.
The original shape on Coating Materials 1 surface is a spill, and the degree of depth is about 3-5mm, and rib is wide to be about 1-2mm, and than flat-bottom structure of the prior art, what combustion efficacy will be stable is many.
This device is by 11 Coating Materials 1 evaporation, ionization, acceleration and deleterious droplet of venting and micelles of desiring evaporation of plasma accelerator, by vacuum unit 14 housing 2 is evacuated, workpiece to be plated is fixed on the work rest 13, and work rest 13 is made revolution and spinning motion and is added negative voltage.Workpiece is subjected to heating in the above conditions, bombardment is cleaned and plated film.
It is simple and reliable to adopt the present invention to reach arc process, the combustion processes steady and continuous, acceleration effect is fit to the needs of ion-plating technique, droplet micelle content is few in the plated film steam plasma body, help improving film quality, both be applicable to the tool surfaces reinforcement, improve its work-ing life more than 10 times, can make the TiN combination with decorative surfaces of imitative gold again, tone can be aligned, the luminance brightness height, applicable stainless steel, copper, aluminium, aluminium zinc, rapid steel, various workpieces such as common iron surface plating TiN film, overcome the limitation that original technology only is applicable to stainless steel and rapid steel, enlarged use range.
Accompanying drawing one is the most preferred embodiment sketch.Its structure is described as follows:
Coating Materials (1), housing (2), permanent magnet steel (3), cathode substructure (4), isolator (5), electro-magnet (6), short-circuit arc triggering device (7),
Shielding (8), plane shielding (9), plasma flow (10), accelerator (11), voltage relay (12), work rest (13), vacuum unit (14), resistance 15.
Claims (3)
1, a kind of apparatus for ionically plating is characterized in that: it uses and has the type of the ear suddenly plasma accelerator 11 of cylindric permanent magnet 3 as evaporating and ionizing source.Put into permanent magnet 3 in the cathode substructure 4 of accelerator 11, permanent magnet 3 is complementary with tube shielding 8 and plane shielding 9 produces the required Distribution of Magnetic Field of steady running and the acceleration and the particle distribution effect of the desired particle of plated film.
2, by the described apparatus for ionically plating of claim 1, it is characterized in that: accelerator 11 working voltage rly.s, 12 arc automatic starting and pilot arc.
3, by the described apparatus for ionically plating of claim 1, it is characterized in that: the Coating Materials 1 in the accelerator 11 is got certain initial spill.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 87104730 CN1013964B (en) | 1987-07-17 | 1987-07-17 | Ionic coating device of the plasma accelerator process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 87104730 CN1013964B (en) | 1987-07-17 | 1987-07-17 | Ionic coating device of the plasma accelerator process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN87104730A true CN87104730A (en) | 1988-03-30 |
| CN1013964B CN1013964B (en) | 1991-09-18 |
Family
ID=4814987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 87104730 Expired CN1013964B (en) | 1987-07-17 | 1987-07-17 | Ionic coating device of the plasma accelerator process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1013964B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6899836B2 (en) * | 2002-05-24 | 2005-05-31 | Invista North America S.A R.L. | Process of making polyamide filaments |
-
1987
- 1987-07-17 CN CN 87104730 patent/CN1013964B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CN1013964B (en) | 1991-09-18 |
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| C10 | Entry into substantive examination | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| C13 | Decision | ||
| GR02 | Examined patent application | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |