CN219555221U - Plasma waterfall flow generating device - Google Patents
Plasma waterfall flow generating device Download PDFInfo
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- CN219555221U CN219555221U CN202223358241.2U CN202223358241U CN219555221U CN 219555221 U CN219555221 U CN 219555221U CN 202223358241 U CN202223358241 U CN 202223358241U CN 219555221 U CN219555221 U CN 219555221U
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Abstract
The utility model relates to the technical field of electrician and electrics, and provides a plasma waterfall flow generating device which comprises a first electrode group, a second electrode group and a grounding metal sheet; the first electrode group and the second electrode group are distributed in a mirror image mode relative to the grounding metal sheet; the first electrode group is provided with a first wiring end and a first discharging end, the first wiring end is used for being electrically connected with a power supply, and the first discharging end is arranged towards the grounding metal sheet; the second electrode group is provided with a second wiring end and a second discharging end, the second wiring end is used for being electrically connected with a power supply, and the second discharging end is arranged towards the grounding metal sheet. The plasma waterfall flow generating device provided by the utility model applies voltage between the first electrode group and the grounding metal sheet and between the second electrode group and the grounding metal sheet by using a power supply, and generates low-temperature plasmas between the first electrode group and the grounding metal sheet, wherein the plasmas are mutually overlapped and fused to generate large-area, large-volume, uniformly dispersed and stable air low-temperature plasma waterfall flow.
Description
Technical Field
The utility model relates to the technical field of electrician and electrics, in particular to a plasma waterfall flow generating device.
Background
The low-temperature plasma generation technology has an increasingly important function in modern industry, has a very wide application prospect, and can generate stable dispersion air low-temperature plasma with large area or volume in many applications such as sterilization, disinfection, air purification, surface treatment and the like. However, the discharge in the atmospheric air is easily converted from a thomson discharge to a streamer discharge, forming a spark breakdown path.
Thus, there are several difficulties in generating a stable dispersed air cryogenic plasma of large area or volume: (1) The larger the area or volume, the worse the stability and dispersion of the plasma; (2) When the electrode array is adopted for parallel connection to realize space increase, too large electrode parallel connection interval can influence the dispersion uniformity of the whole plasma; the electrode parallel connection interval is too small, and the electric fields among the electrodes are mutually influenced, so that the overall electric field of the whole electrode array is more uniform, and the generation of plasma is weakened.
How to generate stable dispersed air low-temperature plasma with large area or large volume by optimizing the parallel structure of the plasma generation circuit and the electrode is one of the important problems in the field needing to be studied urgently.
Disclosure of Invention
Based on the above expression, the utility model provides a plasma waterfall flow generating device to solve the technical problems of poor stability and dispersion uniformity of plasma generated by the plasma generating device in the prior art.
The technical scheme for solving the technical problems is as follows:
the utility model provides a plasma waterfall flow generating device, comprising: the first electrode group, the second electrode group and the grounding metal sheet;
the first electrode group and the second electrode group are arranged in a mirror image mode relative to the grounding metal sheet;
the first electrode group is provided with a first wiring end and a first discharging end, the first wiring end is used for being electrically connected with a power supply, and the first discharging end is arranged towards the grounding metal sheet;
the second electrode group is provided with a second wiring end and a second discharging end, the second wiring end is used for being electrically connected with the power supply, and the second discharging end is arranged towards the grounding metal sheet.
On the basis of the technical scheme, the utility model can be improved as follows.
Furthermore, the first discharge end and the second discharge end are formed by uniformly arranging a plurality of metal needle points and are in a needle cluster shape.
Further, the first discharge end and the second discharge end are both made of ablation resistant conductive material.
Further, the first electrode group includes a plurality of first electrodes;
a plurality of the first electrode arrays are arranged.
Further, any adjacent three first electrodes are arranged in a 'delta' shape.
Further, the second electrode group includes a plurality of second electrodes;
the second electrode arrays are distributed and are arranged in a mirror image mode with the first electrodes relative to the grounding metal sheet.
Further, the plasma waterfall flow generating device further comprises a first current limiting resistor row and a second current limiting resistor row;
the first current limiting resistor bank is connected between the first electrode group and the power supply;
the second current limiting resistor bank is connected between the second electrode group and the power supply.
Further, the first current limiting resistor row comprises a plurality of first current limiting resistors, and the first current limiting resistors are connected with the first electrodes in a one-to-one correspondence manner;
the second current limiting resistor row comprises a plurality of second current limiting resistors, and the second current limiting resistors are connected with the second electrodes in a one-to-one correspondence mode.
Further, the first current limiting resistor and the second current limiting resistor are both high-resistance resistors.
Further, the plasma waterfall flow generating device further comprises a first bracket and a second bracket;
the first bracket is provided with a first through hole for the first electrode group to pass through, and the first bracket is used for supporting the first electrode group;
the second support is provided with a second through hole for the second electrode group to penetrate through, and the second support is used for supporting the second electrode group.
Compared with the prior art, the technical scheme of the utility model has the following beneficial technical effects:
according to the plasma waterfall flow generating device, the first electrode group, the second electrode group and the grounding metal sheet are arranged, the power supply applies voltage between the first electrode group and the grounding metal sheet, and between the second electrode group and the grounding metal sheet, and low-temperature plasma is generated between the first electrode group and the grounding metal sheet, and discharge between the electrode in any electrode group and the grounding metal sheet is independent, so that the plasmas can be mutually overlapped and fused to generate air low-temperature plasma waterfall flows which are large in area, large in volume, uniform in dispersion and stable, and the generated low-temperature plasma waterfall flows can be well used for air purification, sterilization, disinfection and other open spaces.
Drawings
Fig. 1 is a schematic structural diagram of a plasma waterfall generating device according to an embodiment of the present utility model;
fig. 2 is a schematic structural diagram of a first electrode according to an embodiment of the present utility model;
fig. 3 is a schematic layout diagram of a first electrode set according to an embodiment of the present utility model;
in the drawings, the list of components represented by the various numbers is as follows:
1. a first electrode group; 11. a first electrode; 12. a first discharge end; 13. a first terminal; 2. a second electrode group; 21. a second electrode; 3. a grounding metal sheet; 4. a first current limiting resistor bank; 41. a first current limiting resistor; 5. a second current limiting resistor bank; 51. a second current limiting resistor; 6. a first bracket; 7. a second bracket; 8. and a power supply.
Detailed Description
In order that the utility model may be readily understood, a more complete description of the utility model will be rendered by reference to the appended drawings. Embodiments of the utility model are illustrated in the accompanying drawings. This utility model may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
In describing embodiments of the present utility model, it should be noted that, unless explicitly stated and limited otherwise, the terms "coupled," "coupled," and "connected" should be construed broadly, and may be either a fixed connection, a removable connection, or an integral connection, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium. The specific meaning of the above terms in embodiments of the present utility model will be understood in detail by those of ordinary skill in the art.
It should be noted that the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present specification, the description with reference to the term "particular example" or "some examples" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the embodiments of the utility model. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
Embodiments of the present utility model will be described in further detail with reference to the accompanying drawings and examples, which are provided to illustrate the present utility model, but are not intended to limit the scope of the present utility model.
As shown in fig. 1, an embodiment of the present utility model provides a plasma waterfall flow generating apparatus, including: a first electrode group 1, a second electrode group 2 and a grounding metal sheet 3.
The first electrode set 1 and the second electrode set 2 are arranged mirror-image with respect to the grounding metal sheet 3.
The first electrode group 1 has a first terminal 13 and a first discharge end 12, the first terminal 13 is used for electrically connecting with the power source 8, and the first discharge end 12 is arranged towards the grounding metal sheet 3.
The second electrode group 2 has a second terminal for electrical connection with the power source 8 and a second discharge terminal provided toward the ground sheet metal 3.
Specifically, as shown in fig. 1, the first electrode group 1 is disposed above the grounding metal sheet 3, and a certain distance exists between the discharge end and the grounding metal sheet 3, and the distance can be adaptively adjusted according to the voltage applied by the power source 8, and the higher the voltage of the power source 8, the larger the allowable outer diameter of the first electrode group 1, and the larger the distance between the first discharge end 12 and the grounding metal sheet 3.
Correspondingly, the second electrode set 2 and the first electrode set 1 are arranged in a mirror image manner with respect to the grounding metal sheet 3, and the composition electrode and the arrangement fixing mode are identical to those of the first electrode set 1. The second electrode group 2 is arranged below the grounding metal sheet 3 and also has a certain distance from the grounding metal sheet 3.
The grounding metal sheet 3 is a grounding metal conductor, has a smooth surface, is preferably a thin copper sheet, and can be fixed between the first electrode group 1 and the second electrode group 2 in parallel and in the middle by an insulating electrode support.
According to the plasma waterfall flow generating device provided by the embodiment of the utility model, the first electrode group 1, the second electrode group 2 and the grounding metal sheet 3 are arranged, the power supply 8 applies voltages between the first electrode group 1 and the grounding metal sheet and between the second electrode group 2 and the grounding metal sheet, and low-temperature plasma is generated between the first electrode group 1 and the grounding metal sheet, and discharge between the electrodes in any electrode group and the grounding metal sheet is independent, so that the plasmas are mutually overlapped and fused to generate large-area, large-volume, uniformly dispersed and stable air low-temperature plasma waterfall flows, and the generated low-temperature plasma waterfall flows can be well used for air purification, sterilization, disinfection and other open spaces.
Further, as shown in fig. 2, the first discharge end 12 and the second discharge end are each formed by uniformly arranging a plurality of metal needle points, and are in a needle cluster shape.
Wherein the first discharge end 12 and the second discharge end are each made of an ablation resistant conductive material.
In practical operation, it is required that the ends of the plurality of metal tips of the discharge end are flush, uniformly distributed around the circumference, and densely distributed, and the radius of curvature of the individual metal tips is as small as possible to promote the generation of plasma.
In addition, the thickness and size of the needle cluster are determined by the discharge voltage of the power supply, and the needle cluster is set according to actual needs and is not particularly limited herein.
Further, as shown in fig. 3, the first electrode group 1 includes a plurality of first electrodes 11, and the plurality of first electrodes 11 are arranged in an array.
Wherein, any adjacent three first electrodes 11 are arranged in a delta shape.
Since the second electrode set 2 is arranged in mirror image with the first electrode set 1, the second electrode set 2 includes a plurality of second electrodes 21; the plurality of second electrodes 21 are arranged in an array and are arranged in mirror image with respect to the plurality of first electrodes 11 with respect to the ground metal sheet 3. I.e. the number and arrangement of the second electrodes 21 are the same as those of the first electrodes 11.
In a specific example, as shown in fig. 3, the number of the first electrodes 11 and the second electrodes 21 is 9, and the arrangement of the first electrodes 11 is illustrated as an example, the 9 first electrodes 11 are distributed in two rows, the first row is 4, the second row is 5, the first row and the second row are arranged in a staggered manner, any three adjacent electrodes in the two rows are arranged in a delta shape, and it can be understood that any three adjacent electrodes are arranged in an equilateral triangle manner, so that the distances between the first electrodes 11 are equal, wherein the side length of the equilateral triangle only needs to meet the insulation requirement between the first electrodes 11, and the smaller the side length is, the more beneficial to the discharge and the plasma fusion of each first electrode 11. In actual operation, other numbers of the first electrodes 11 and the second electrodes 21 may be provided in the above arrangement, which is merely an example, and the present utility model is not limited thereto.
The first electrode group 1 and the second electrode group 2 are arranged and combined according to the arrangement mode, so that the whole plasma generation area and the whole plasma generation volume can be optimally adjusted, and the plasma waterfall flow generating device has flexible adjustability.
Further, as shown in fig. 1, the plasma waterfall generating device further includes a first current limiting resistor bank 4 and a second current limiting resistor bank 5.
The first current limiting resistor bank 4 is connected between the first electrode group 1 and the power supply 8; the second current limiting resistor bank 5 is connected between the second electrode set 2 and the power supply 8.
The first current limiting resistor bank 4 includes a plurality of first current limiting resistors 41, and the plurality of first current limiting resistors 41 are connected to the plurality of first electrodes 11 in a one-to-one correspondence.
The second current limiting resistor bank 5 includes a plurality of second current limiting resistors 51, and the plurality of second current limiting resistors 51 are connected to the plurality of second electrodes 21 in one-to-one correspondence.
The first current limiting resistor 41 and the second current limiting resistor 51 are both high-resistance resistors, and the specific withstand voltage depends on the power supply voltage, and in the embodiment of the utility model, 50MΩ/5W resistor is preferable.
Specifically, the number of current limiting resistors is equal to the sum of the number of first electrodes 11 and second electrodes 21, and one current limiting resistor is connected to each electrode. That is, a first current limiting resistor 41 is connected between the first connection terminal of the first electrode 11 and the power supply 8, and a second current limiting resistor 51 is connected between the second connection terminal of the second electrode 21 and the power supply 8. That is, one end of the current limiting resistor is equipotential and connected to the high voltage electrode of the power supply 8, and the other end is insulated from each other and electrically connected to each electrode, so that each electrode is electrically connected to the power supply 8 through the current limiting resistor and electrically isolated between each of the needle cluster electrodes.
The first current limiting resistor 41 and the second current limiting resistor 51 are the same, and the first and second are not actually meant here.
In operation, the high-voltage power supply 8 applies a voltage between each electrode and the grounded metal sheet 3 through each current limiting resistor in the current limiting resistor row, and generates low-temperature plasma. Because the current limiting resistor has the current limiting isolation function, the discharge between each electrode and the grounding metal sheet 3 is independent, and therefore plasmas can be mutually overlapped and fused according to the size of the space dimension, and air low-temperature plasmas with large area and large volume, uniform dispersion and stability are generated.
Further, as shown in fig. 1, the plasma waterfall flow generating device further includes a first bracket 6 and a second bracket 7.
The first support 6 is provided with a first through hole for the first electrode group 1 to pass through, and the first support 6 is used for supporting the first electrode group 1.
The second support 7 is provided with a second through hole for the second electrode group 2 to penetrate, and the second support 7 is used for supporting the second electrode group 2.
Specifically, the connection ends of the first electrode 11 and the second electrode 21 are metal screws with certain lengths, and the metal screws can be arranged and fixed on the first bracket 6 and the second bracket 7 in a penetrating way so as to enhance the stability of the electrodes in the use process.
The first support 6 and the second support 7 are both made of insulating materials, are integrally in a 'mouth' -shaped structure, and are respectively an upper support and a lower support, and are used for fixing the first electrode 11 and the second electrode 21, and the grounding metal sheet 3 is horizontally arranged between the first support 6 and the second support 7 in a centered mode.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present utility model, and are not limiting; although the utility model has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present utility model.
Claims (10)
1. A plasma waterfall flow generating apparatus, comprising: the first electrode group, the second electrode group and the grounding metal sheet;
the first electrode group and the second electrode group are arranged in a mirror image mode relative to the grounding metal sheet;
the first electrode group is provided with a first wiring end and a first discharging end, the first wiring end is used for being electrically connected with a power supply, and the first discharging end is arranged towards the grounding metal sheet;
the second electrode group is provided with a second wiring end and a second discharging end, the second wiring end is used for being electrically connected with the power supply, and the second discharging end is arranged towards the grounding metal sheet.
2. The plasma waterfall flow generating device according to claim 1, wherein the first discharge end and the second discharge end are formed by uniformly arranging a plurality of metal needle points and are in a needle cluster shape.
3. The plasma waterfall flow generating device of claim 2, wherein the first discharge end and the second discharge end are each made of an ablation resistant conductive material.
4. The plasma waterfall generating device according to claim 1, wherein the first electrode group includes a plurality of first electrodes;
a plurality of the first electrode arrays are arranged.
5. The plasma waterfall flow generating apparatus of claim 4, wherein any adjacent three of the first electrodes are arranged in a "delta" shape.
6. The plasma waterfall generating apparatus of claim 5, wherein the second electrode set comprises a plurality of second electrodes;
the second electrode arrays are distributed and are arranged in a mirror image mode with the first electrodes relative to the grounding metal sheet.
7. The plasma waterfall generating device of claim 6, further comprising a first current limiting resistor bank and a second current limiting resistor bank;
the first current limiting resistor bank is connected between the first electrode group and the power supply;
the second current limiting resistor bank is connected between the second electrode group and the power supply.
8. The plasma waterfall flow generating device according to claim 7, wherein the first current limiting resistor bank comprises a plurality of the first current limiting resistors, and the plurality of the first current limiting resistors and the plurality of the first electrodes are connected in one-to-one correspondence;
the second current limiting resistor row comprises a plurality of second current limiting resistors, and the second current limiting resistors are connected with the second electrodes in a one-to-one correspondence mode.
9. The plasma waterfall flow generating device of claim 8, wherein the first current limiting resistor and the second current limiting resistor are both high resistance resistors.
10. The plasma waterfall generating device of claim 1, wherein the plasma waterfall generating device further comprises a first bracket and a second bracket;
the first bracket is provided with a first through hole for the first electrode group to pass through, and the first bracket is used for supporting the first electrode group;
the second support is provided with a second through hole for the second electrode group to penetrate through, and the second support is used for supporting the second electrode group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223358241.2U CN219555221U (en) | 2022-12-13 | 2022-12-13 | Plasma waterfall flow generating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223358241.2U CN219555221U (en) | 2022-12-13 | 2022-12-13 | Plasma waterfall flow generating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219555221U true CN219555221U (en) | 2023-08-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202223358241.2U Active CN219555221U (en) | 2022-12-13 | 2022-12-13 | Plasma waterfall flow generating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219555221U (en) |
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2022
- 2022-12-13 CN CN202223358241.2U patent/CN219555221U/en active Active
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