CN206209289U - A kind of nonopiate means for correcting of work stage - Google Patents
A kind of nonopiate means for correcting of work stage Download PDFInfo
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- CN206209289U CN206209289U CN201621151082.0U CN201621151082U CN206209289U CN 206209289 U CN206209289 U CN 206209289U CN 201621151082 U CN201621151082 U CN 201621151082U CN 206209289 U CN206209289 U CN 206209289U
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Abstract
The utility model discloses a kind of nonopiate means for correcting of work stage, including nonopiate measurement markers, being arranged in work stage is used for the coarse motion turntable of bearing substrate, the nonopiate measurement markers at least provided with three, and not point-blank；Visual unit, the position for obtaining the nonopiate measurement markers；Interferometer measurement unit, the position for measuring the work stage；Also include correction unit, the position of the described nonopiate measurement markers that nominal position, the visual unit according to the nonopiate measurement markers under coarse motion turntable coordinate system are obtained and the position of the work stage calculate the nonopiate amount of the work stage, and transmission to the interferometer measurement unit compensates correction.The utility model efficiently solves workpiece mesa and influence to TP control accuracies is thermally deformed in exposure process, so as to reduce the use cost of material.
Description
Technical field
The utility model is related to technical field of lithography, and in particular to a kind of nonopiate means for correcting of work stage.
Background technology
Projection scanning formula TFT (Thin Film Transistor, thin film transistor (TFT)) litho machine is for by the upper figure of mask
Shape clearly, is correctly imaged on the substrate for scribbling photoresist, as the increase of substrate size is, it is necessary to using bigger level crossing
Restriction TP (Total Pitch) precision has been become as the face type change of work stage interferometer measurement speculum, therefore Fang Jing
Principal element.
It is generally offline periodically to demarcate when type change in mirror face is little, but when type is thermally deformed larger face to face,
The off-line calibration cycle cannot meet needs.Additionally, the rotation attitude change of mirror can also influence on nonorthogonality, make
There is non-orthogonal situation in the mark of base plate exposure.
It is as shown in Figure 1 level crossing schematic diagram in work stage, including：Work stage X is to speculum 10, workpiece platform micro-motion
Module 20 and interferometer support 30.Measure and control the X of work stage to amount of movement by monitoring the change of interferometer light path.Reason
In the case of thinking, when work stage is moved along Y-direction, to X to no crosstalk, however, to ensure that when being moved along Y-direction, X is to measurement
Value it is constant, i.e., light path is constant, when there is face type to speculum 10 in work stage X, in order to ensure that light path is constant, work stage need into
Row X-direction is moved to compensate influence, now the nonideal coordinate system of work stage measurement coordinate system, but the coordinate system of bending, no
Whole machine demand can be met.In order that worktable coordinate system is preferable coordinate system, it would be desirable to periodically carry out demarcating mirror face
Type, but if the rapidoprint of mirror is influenced by heat, change is serious, and when volume production, off-line calibration frequency is far away from mirror
Change frequency, it is therefore desirable to on-line measurement its influence.Existing mirror terrace type scaling method high generally uses step motion work
Part platform realizes that is, work stage needs to stop in test, and disadvantage of this is that the nominal time is more long, efficiency is low.
Utility model content
The utility model provides a kind of nonopiate means for correcting of work stage, to solve problems of the prior art.
In order to solve the above-mentioned technical problem, the technical solution of the utility model is：A kind of work stage non-orthogonal device, bag
Include：
Nonopiate measurement markers, being arranged in work stage is used for the coarse motion turntable of bearing substrate, the nonopiate survey
Amount is marked at least provided with three, and not point-blank；
Visual unit, the position for obtaining the nonopiate measurement markers；
Interferometer measurement unit, the position for measuring the work stage；
Also include correction unit, nominal position according to the nonopiate measurement markers under coarse motion turntable coordinate system,
The position of the described nonopiate measurement markers that the visual unit is obtained and the position of the work stage calculate the work stage
Nonopiate amount, and send to the interferometer measurement unit and compensate correction.
Further, the coarse motion turntable is provided with three speculums, and each speculum is provided with described at least one
Nonopiate measurement markers.
The utility model also provides a kind of work stage nonopiate bearing calibration, comprises the following steps：
S1：Nonopiate measurement markers are set on coarse motion turntable in work stage for bearing substrate, it is described nonopiate
Measurement markers at least provided with three, and not point-blank；
S2：Choose three nonopiate measurement markers, travelling workpiece platform, make visual unit be respectively aligned to three it is described nonopiate
Measurement markers, obtain three positions of the nonopiate measurement markers, while measuring alignment when institute by interferometer measurement unit
State position x_s_i, y_s_i of work stage, wherein i=1,2,3；
S3：The position of the three nonopiate measurement markers measured according to the visual unit and the visual unit exist
Position under whole machine zero-bit coordinate system, calculates position x_ of three nonopiate measurement markers under whole machine zero-bit coordinate system
PZCS_i, y_PZCS_i, and combine position x_s_i, y_s_i of the work stage and calculate three nonopiate measurement markers and exist
Measurement position x_PSCS_i, y_PSCS_i under worktable coordinate system：
S4：According to measurement position x_PSCS_i, y_ of three nonopiate measurement markers under worktable coordinate system
PSCS_i and nominal position x_PTCS_i, y_PTCS_i under the coarse motion turntable coordinate system calculate the non-of the work stage
Amount of quadrature Non_ortho：
Non_ortho=rpux-rpuy；
Cpux, cpuy represent translational movement of three nonopiate measurement markers relative to work stage；
Rpux, rpuy represent three nonopiate measurement markers relative to work stage in X, the rotation amount of Y-direction；
Mpux represents three nonopiate measurement markers relative to work stage in X, the swell increment of Y-direction；
S5：The changing value that the nonopiate amount of the standard substrate of the nonopiate amount absolute presupposition of the work stage for obtaining will be measured is made
It is compensation rate, and compensates in the interferometer measurement unit.
Further, three speculums are set on the coarse motion turntable, at least provided with an institute on each speculum
State nonopiate measurement markers.
Further, the edge of the substrate is measured while the visual unit measures the nonopiate measurement markers
Line, for substrate prealignment.
Further, using two in two visual units simultaneously three nonopiate measurement markers of measurement in step S2
The position of individual nonopiate measurement markers, moves the work stage afterwards, makes remaining one nonopiate measurement markers alignment described
One in two visual units.
The nonopiate means for correcting of work stage that the utility model is provided, the device includes：Nonopiate measurement markers, are arranged on
Be used for the coarse motion turntable of bearing substrate in work stage, the nonopiate measurement markers at least provided with three, and not at one
On straight line；Visual unit, the position for obtaining the nonopiate measurement markers；Interferometer measurement unit, it is described for measuring
The position of work stage；Also include correction unit, according to name of the nonopiate measurement markers under coarse motion turntable coordinate system
The position of the described nonopiate measurement markers that position, the visual unit are obtained and the position of the work stage calculate the work
The nonopiate amount of part platform, and transmission to the interferometer measurement unit compensates correction.By visual unit to nonopiate survey
The position for measuring mark is measured, and the nonopiate amount of work stage is calculated according to the position of at least three nonopiate measurement markers,
The measurement to the nonopiate amount of work stage is realized, the standard substrate of the nonopiate amount absolute presupposition of the work stage for obtaining will be measured
Nonopiate amount changing value as compensation rate, and compensate in interferometer model, efficiently solve workpiece mesa in exposure
During be thermally deformed influence to TP control accuracies, so as to reduce the use cost of material.And, the utility model work stage
The edge line that nonopiate means for correcting can measure the substrate in the visual unit measures three while carrying out substrate prealignment
The individual nonopiate measurement markers so that the utility model bearing calibration can be carried out when work stage works online, and can not only be solved
Off-line calibration frequency influences the technical problem of correction accuracy far away from mirror change frequency in certainly existing off-line correction method, also
Work stage on-line correction can be realized, it is to avoid off-line correction influences the defect of yield.
Brief description of the drawings
Fig. 1 is level crossing schematic diagram in work stage in the prior art；
Fig. 2 is the structural representation of the utility model means for correcting；
Fig. 3 is the schematic layout pattern of the utility model speculum；
Fig. 4 is the utility model speculum and nonopiate measurement markers position view.
Shown in Fig. 1：10th, work stage X is to speculum；20th, workpiece platform micro-motion module；30th, interferometer support；
Shown in Fig. 2-4：1st, projection objective；2nd, work stage；3rd, substrate；4th, speculum；5th, visual unit；6th, nonopiate survey
Amount mark；7th, coarse motion turntable；8th, visual unit.
Specific embodiment
The utility model is described in detail below in conjunction with the accompanying drawings：
As in Figure 2-4, the utility model provides a kind of nonopiate bearing calibration of work stage, comprises the following steps：
S1：Nonopiate measurement markers 6 are set on coarse motion turntable 7 in work stage 2 for bearing substrate 3, it is described non-
Orthogonal measuring mark 6 at least provided with three, and not point-blank, so that the face type to work stage 2 carries out on-line measurement, this
In embodiment, three speculums 4 are set on the coarse motion turntable 7, three nonopiate measurement markers 6 are corresponded
Be arranged on three speculums 4, visual unit 5 is also correspondingly provided with 3.
S2：Choose three nonopiate measurement markers 6, travelling workpiece platform 2, make visual unit 5 be respectively aligned to three it is described non-
Orthogonal measuring mark 6, obtains three positions of the nonopiate measurement markers 6, while measuring right by interferometer measurement unit
Position x_s_i, y_s_i of the punctual work stage 2, wherein i=1,2,3；Specifically, the visual unit 5 measures three institutes
The edge line of the substrate 3 is measured while stating nonopiate measurement markers 6, for the prealignment of substrate 3.Additionally, also including using
Two visual units 5 measure two positions of nonopiate measurement markers 6 in three nonopiate measurement markers 6 simultaneously, it
After move the work stage 2, a remaining nonopiate measurement markers 6 is directed at one in described two visual units 5.
S3：The position of the three nonopiate measurement markers 6 measured according to the visual unit 5 and the visual unit
5 position under whole machine zero-bit coordinate system, calculates position of three nonopiate measurement markers 6 under whole machine zero-bit coordinate system
X_PZCS_i, y_PZCS_i, and combine position x_s_i, y_s_i three nonopiate measurement marks of calculating of the work stage 2
6 measurement position x_PSCS_i, y_PSCS_i under the coordinate system of work stage 2 of note：
S4：According to measurement position x_PSCS_i, y_ of three nonopiate measurement markers 6 under worktable coordinate system
PSCS_i and nominal position x_PTCS_i, y_PTCS_i under the coordinate system of coarse motion turntable 7 calculate the work stage 2
Nonopiate amount Non_ortho：
Non_ortho=rpux-rpuy；
Cpux, cpuy represent translational movement of three nonopiate measurement markers relative to work stage；
Rpux, rpuy represent three nonopiate measurement markers relative to work stage in X, the rotation amount of Y-direction；
Mpux represents three nonopiate measurement markers relative to work stage in X, the swell increment of Y-direction；
S5：The changing value of the nonopiate amount of the standard substrate of the nonopiate amount absolute presupposition of the work stage 2 for obtaining will be measured
As compensation rate, and compensate in the interferometer measurement unit.Although three nonopiate measurement markers 6 can rotate with coarse motion
Platform 7 rotates, but nonopiate amount can't change, online measured three if the nonopiate amount of work stage 2 is not drifted about
The difference of the nonopiate amount of nonopiate measurement markers 6 and default (i.e. off-line test) standard substrate nonopiate amount is to fix
Value, therefore by monitoring the change of the value come the change of the nonopiate amount of monitoring workpiece platform 2, and compensation can be realized.
The utility model also provides a kind of means for correcting for realizing the nonopiate bearing calibration of work stage as described above, including throws
Shadow object lens 1, also include：
Nonopiate measurement markers 6, being arranged in work stage 2 is used for the coarse motion turntable 7 of bearing substrate 3, the anon-normal
Measurement markers 6 are handed at least provided with three, and not point-blank, so that the face type to work stage 2 carries out on-line measurement, this reality
Apply in example, the coarse motion turntable 7 is provided with three speculums 4, each speculum 4 is provided with nonopiate survey described at least one
Amount mark 6.
Visual unit 5, the position for obtaining the nonopiate measurement markers 6, specifically, the visual unit 5 is measured
The edge line of the substrate 3 is measured while three nonopiate measurement markers 6, for the prealignment of substrate 3.Additionally, also wrapping
Include two positions of nonopiate measurement markers 6 measured simultaneously using two visual units 5 in three nonopiate measurement markers 6
Put, the work stage 2 is moved afterwards, a remaining nonopiate measurement markers 6 is directed in described two visual units 5 one
It is individual.
Interferometer measurement unit, position x_s_i, y_s_i for measuring the work stage 2, wherein i=1,2,3.
The means for correcting also includes correction unit, according to the nonopiate measurement markers 6 under the coordinate system of coarse motion turntable 7
Nominal position, the visual unit 5 obtain described nonopiate measurement markers 6 position and the position of the work stage 2
The nonopiate amount of the work stage 2 is calculated, and transmission to the interferometer measurement unit compensates correction.
In sum, the nonopiate means for correcting of work stage 2 that the utility model is provided, the device includes：Nonopiate measurement
Mark 6, be arranged in work stage 2 be used for bearing substrate 3 coarse motion turntable 7, the nonopiate measurement markers 6 at least provided with
Three, and not point-blank；Visual unit 5, the position for obtaining the nonopiate measurement markers 6；Interferometer measurement
Unit, the position for measuring the work stage 2；Also include correction unit, revolved in coarse motion according to the nonopiate measurement markers 6
The position of the described nonopiate measurement markers 6 that nominal position under the coordinate system of turntable 7, the visual unit 5 are obtained and described
The position of work stage 2 calculates the nonopiate amount of the work stage 2, and transmission to the interferometer measurement unit compensates school
Just.The position of nonopiate measurement markers 6 is measured by visual unit 5, and according at least three nonopiate measurement markers 6
Position calculate the nonopiate amount of work stage 2, realize the measurement to the nonopiate amount of work stage 2, the workpiece that obtains will be measured
The changing value of the nonopiate amount of the standard substrate of the nonopiate amount absolute presupposition of platform 2 is compensated to interferometer mould as compensation rate
In type, efficiently solve the face type of work stage 2 and influence to TP control accuracies is thermally deformed in exposure process, so as to reduce material
Use cost.
Although being illustrated to implementation method of the present utility model in specification, these implementation methods are intended only as carrying
Show, should not limit protection domain of the present utility model.Carried out in the range of the utility model objective various omissions, put not departing from
Change and change should be included in protection domain of the present utility model.
Claims (2)
1. the nonopiate means for correcting of a kind of work stage, it is characterised in that including：
Nonopiate measurement markers, being arranged in work stage is used for the coarse motion turntable of bearing substrate, the nonopiate measurement mark
Remember at least provided with three, and not point-blank；
Visual unit, the position for obtaining the nonopiate measurement markers；
Interferometer measurement unit, the position for measuring the work stage；
Also include correction unit, it is nominal position according to the nonopiate measurement markers under coarse motion turntable coordinate system, described
The position of the described nonopiate measurement markers that visual unit is obtained and the position of the work stage calculate the non-of the work stage
Amount of quadrature, and transmission to the interferometer measurement unit compensates correction.
2. means for correcting according to claim 1, it is characterised in that the coarse motion turntable is provided with three speculums,
Each speculum is provided with nonopiate measurement markers described at least one.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621151082.0U CN206209289U (en) | 2016-10-24 | 2016-10-24 | A kind of nonopiate means for correcting of work stage |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621151082.0U CN206209289U (en) | 2016-10-24 | 2016-10-24 | A kind of nonopiate means for correcting of work stage |
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| Publication Number | Publication Date |
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| CN206209289U true CN206209289U (en) | 2017-05-31 |
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| CN201621151082.0U Active CN206209289U (en) | 2016-10-24 | 2016-10-24 | A kind of nonopiate means for correcting of work stage |
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2016
- 2016-10-24 CN CN201621151082.0U patent/CN206209289U/en active Active
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| GR01 | Patent grant | ||
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Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
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| CP01 | Change in the name or title of a patent holder |