CN205485053U

CN205485053U - Optical system

Info

Publication number: CN205485053U
Application number: CN201520777304.9U
Authority: CN
Inventors: A·J·奥德基尔克; 允智省; T·L·王; E·A·麦克道威尔; G·A·安布尔
Original assignee: 3M Innovative Properties Co
Current assignee: 3M Innovative Properties Co
Priority date: 2015-09-03
Filing date: 2015-10-08
Publication date: 2016-08-17
Anticipated expiration: 2025-10-08
Also published as: TW201722698A; CN106501930B; CN106501955A; CN106501934B; KR20170063805A; US11787137B2; CN205485050U; US20200241305A1; US20170146714A1; KR20170066460A; WO2017039715A1; CN107949804A; JP2018501501A; KR20170066461A; US20170068104A1; KR102014003B1; US20170097508A1; TW201723593A; KR102069023B1; US11325330B2

Abstract

The utility model describes an optical system, optical system includes image surface, diaphragm surface, arranges image surface with partial reflection ware between the diaphragm surface, arrange diaphragm surface with reflection type polarizer between the partial reflection ware and arranging reflection type polarizer with fourth ripples delayer between the partial reflection ware. Reflection type polarizer is salient along two orthogonal axess. Reflection type polarizer can be the multilayer reflection type polarizer of hot formed.

Description

Optical system

Background technology

Display system can include beam splitter, quarter-wave delayer and reflection type polarizer.

United States Patent (USP) No.7,242,525 (Dike) describes in real projection to space and include The feature of visuality (viewability) along one or more enhancing real images of optical path location Optical system.This optical system includes for assembling a part of light source light to form the convergence of real image Element.

United States Patent (USP) No.6,271,969 (Mertz) describes for making the photoimaging from display Optical alignment assembly.This optical module includes first and with orthogonal polarization direction Two linear polarization filter.Including being folded into of the first beam splitter, the first quarter wave plate and the second beam splitter As assembly is between Polarization filter.

United States Patent (USP) No.8,780,039 (Gay etc.) describes and is wherein shown by display device for change The optical system of the shape on the surface that the image that shows is perceived.This optical system includes spaced apart One and Part II reflector, at least one of which can be at the first molded non-planar and second not similar shape Switch between shape (it can be plane or nonplanar).Reflector and polarization optics one Rise and provide optical path so that from the light of display at least partially through the first reflector portion Point ground transmission, by the second reflector sections reflect, by the first reflector sections reflect and By the second reflector sections ground transmission.

Reflection type polarizer can be multi-layer optical film.United States Patent (USP) No.6,916,440 (Jackson Deng) describe for the method by uniaxial manner stretched multi-layer blooming.United States Patent (USP) No. 6,788,463 (Merrill etc.) describe postforming multi-layer optical film.

Summary of the invention

In some embodiments of this specification, it is provided that include imaging surface, diaphragm surface (stop surface), the first Optical stack being arranged between imaging surface and diaphragm surface (optical stack) and the second Optical stack being arranged between the first Optical stack and diaphragm surface Optical system.First Optical stack is convex towards imaging surface along the first orthogonal axle and the second axle Go out, and include the first optical lens and have in desired multiple wavelength at least 30% average The part reflector of luminous reflectance.Second Optical stack is along the first axle and the second axle towards image table Face is protruded and includes that the second optical lens, substantially transmission have light and the base of the first polarization state In basis, reflection has the multilayer reflective polariser of the light of the second orthogonal polarization state and is arranged in The first quarter-wave delayer between reflection type polarizer and the first Optical stack.

In some embodiments of this specification, it is provided that include imaging surface, diaphragm surface, The first Optical stack of being arranged between imaging surface and diaphragm surface and be arranged in the first optical stack Folded with diaphragm surface between the optical system of the second Optical stack.First Optical stack includes first Optical lens and have in desired multiple wavelength at least 30% the part of average light reflectance Reflector.Second Optical stack includes the second optical lens, multilayer reflective polariser and layout The first quarter-wave delayer between reflection type polarizer and the first Optical stack is described many Layer reflection type polarizer includes at least one of which, and described at least one of which least one layer of leaves the described At least one first position of two Optical stack optical axises is the most optically biaxial, and from At least one second position opening described optical axis is the most optically uniaxial.Substantially any logical Cross the chief ray on imaging surface and diaphragm surface with the incident angles of less than about 30 degree to described One Optical stack and described second Optical stack each on.

In some embodiments of this specification, it is provided that include the image launching undistorted image The optical system of source, emergent pupil, part reflector and reflection type polarizer.Partially reflective utensil There is the first shape protruded along the first and second orthogonal axles towards image source and predetermined multiple Wavelength has the average light reflectance of at least 30%.Reflection type polarizer has along first and second The second different shape that axle protrudes towards image source, so that being sent out by emergent pupil transmission The distortion penetrating undistorted image is below about 10%.

In some embodiments of this specification, it is provided that include image source, emergent pupil, cloth Put the first Optical stack between image source and emergent pupil and be arranged in the first Optical stack And the optical system of the second Optical stack between emergent pupil.First Optical stack includes the first light The part learning lens and the average light reflectance in desired multiple wavelength with at least 30% is anti- Emitter.Second Optical stack includes the second optical lens, multilayer reflective polariser and is arranged in The first quarter-wave delayer between reflection type polarizer and the first Optical stack.Substantially take up an official post What have in desired multiple wavelength at a distance of at least 150nm at least the first and second wavelength and Launched by image source and had in emergent pupil by the chief ray of emergent pupil transmission and be less than out Penetrate the color separation distance of at pupil the 1.5% of visual field.

In some embodiments of this specification, it is provided that include image source, emergent pupil, cloth Put the first Optical stack between image source and emergent pupil and be arranged in the first Optical stack And the optical system of the second Optical stack between emergent pupil.First Optical stack includes the first light The part learning lens and the average light reflectance in desired multiple wavelength with at least 30% is anti- Emitter.Second Optical stack includes the second optical lens, multilayer reflective polariser and is arranged in The first quarter-wave delayer between reflection type polarizer and the first Optical stack.At least have Desired multiple wavelength at a distance of first and second wavelength of at least 150nm and are sent out by image source Penetrate and had at emergent pupil less than 20 by the substantially any chief ray of emergent pupil transmission The color separation distance that arc divides.

In some embodiments of this specification, it is provided that include that there is maximum transverse size A Imaging surface, there is the diaphragm surface of maximum transverse size B and be arranged in imaging surface and light The optical system of the integral optical stacking between door screen surface.A/B is at least 3.Integral optical stacks Including the first optical lens, have in predetermined multiple wavelength at least 30% average light reflectance Part reflector, substantially transmission have the first polarization state light and substantially reflection just have The multilayer reflective polariser of the light of the second polarization state handed over, and in predetermined multiple wavelength The first quarter-wave delayer at least one wavelength.Saturating by diaphragm surface and imaging surface At least one chief ray penetrated passes through diaphragm surface with the angle of incidence of at least 40 degree.Integral optical heap Fold and can be described as that such as there are in Optical stack the various portions shaping together or adhering to each other Part and the Optical stack of layer.

In some embodiments of this specification, it is provided that include imaging surface, substantially planar Diaphragm surface and first, second, and third light that is arranged between imaging surface and diaphragm surface Learn lens, have in predetermined multiple wavelength at least 30% average light reflectance partially reflective Device, substantially transmission have the first polarization state light and substantially reflection to have orthogonal second inclined The multilayer reflective polariser of the light of polarization state and at least one ripple in predetermined multiple wavelength The optical system of the first quarter-wave delayer of strong point.Optical system includes being arranged in image table Multiple first type surfaces between face and diaphragm surface, each first type surface along the first and second orthogonal axles towards Imaging surface protrudes, and the different first type surface of at least six has six kinds of different convexitys (convexity)。

In some embodiments of this specification, it is provided that about through hot formed reflection multilayer The optical axis on the summit of formula polariser is the most rotationally symmetrical and along being orthogonal to orthogonal the of this optical axis One and the second hot formed multilayer reflective polariser that go out of crown of roll.Hot formed multilayer reflective is inclined The utensil that shakes has in the most optically uniaxial at least one at least one position leaving summit Layer, and at least one primary importance on reflection type polarizer has radial distance r1 also away from this optical axis And away from the plane being perpendicular to optical axis at apex, there is displacement s1, wherein s1/r1 is at least 0.2.

In some embodiments of this specification, it is provided that about through hot formed reflection multilayer The optical axis on the summit of formula polariser is the most rotationally symmetrical and along being orthogonal to orthogonal the of this optical axis One and the second hot formed multilayer reflective polariser that go out of crown of roll.Hot formed multilayer reflective is inclined The utensil that shakes has at least one primary importance on reflection type polarizer, its away from this optical axis have radially away from Having displacement s1 from r1 and away from the plane being perpendicular to optical axis at apex, wherein s1/r1 is at least 0.2.The region of the reflection type polarizer for being limited by s1 and r1, the transmission of reflection type polarizer The maximum change of axle less than about 2 degree.

In some embodiments of this specification, it is provided that the method making Optical stack.The party Method comprises the following steps: provide centered by tool shaft and have about described tool shaft non-rotating right The hot forming instrument of the outer surface claimed；Blooming is heated, produces the blooming softened；Make The blooming of described softening adapts to described outer surface, simultaneously at least along just leaving described tool shaft The first direction handed over and second direction stretch the film of described softening, produce the blooming adapted to, described The blooming adapted to is about the optical axis rotation asymmetry of the film of described adaptation, described optical axis and described work Tool axle is consistent；Cool down the blooming of described adaptation and produce about the rotational symmetric symmetrical optical of optical axis Film；Optical stack is produced with moulding optical lens on symmetrical optical film.

In some embodiments of this specification, it is provided that make the expectation with desired shape The method of blooming.The method comprises the following steps: provides and has and be different from desired shape The hot forming instrument of the outer surface of the first shape；Heat blooming and produce the blooming of softening；Will Outer surface that the blooming softened adapts to have the first shape and simultaneously at least along the first orthogonal He The film of second direction tensile softening, thus produce the adaptive optics film with the first shape；And cooling The blooming that adapts to and produce the desired blooming with desired shape.

In some embodiments of this specification, it is provided that include imaging surface, diaphragm surface, The first Optical stack of being arranged between imaging surface and diaphragm surface and be arranged in the first optics The optical system of the second Optical stack between stacking and emergent pupil.First Optical stack includes One optical lens and have in desired multiple wavelength at least 30% the portion of average light reflectance Divide reflector.Second Optical stack includes the second optical lens, optical axis about the second Optical stack Rotationally symmetrical and protrude along the first and second orthogonal axles being orthogonal to optical axis towards image source Multilayer reflective polariser and be arranged between reflection type polarizer and the first Optical stack One quarter-wave delayer.Hot formed multilayer reflective polariser has at least one first Putting, its optical axis away from the summit through hot forming multilayer reflective polariser has radial distance r1 also And away from the plane being perpendicular to optical axis at apex, there is displacement s1, wherein s1/r1 is at least 0.1.

In some embodiments of this specification, it is provided that Optical stack.Optical stack includes One lens, the second lens of neighbouring first lens, be arranged between the first and second lens four points One of ripple delayer, be arranged on the second lens relative with the first lens (opposite) reflective Polariser and be arranged in part reflector relative with the second lens on the first lens.Reflective partially The device that shakes is about two orthogonal bending shafts, and Optical stack is integral optical stacking.

In some embodiments of this specification, it is provided that include part reflector, multilayer reflective Polariser and be arranged in the one or four between part reflector and multilayer reflective polariser/ The optical system of one ripple delayer.Part reflector has at least 30% in desired multiple wavelength Average light reflectance.The substantially transmission of multilayer reflective polariser has the light of the first polarization state also And substantially reflection has the light of the second orthogonal polarization state.Multilayer reflective polariser is along orthogonal At least one primary importance that first and second crown of rolls go out and have on multilayer reflective polariser, should The primary importance optical axis away from multilayer reflective polariser has radial distance r1 and away from reflection multilayer The apex of formula polariser is perpendicular to the plane of optical axis and has displacement s1, and wherein s1/r1 is at least 0.1. Multilayer reflective polariser comprises at least one of which, and described at least one of which leaves light in this at least one of which At least one first position of axle is the most optically biaxial and is leaving at least the one of optical axis Individual second position is the most optically uniaxial.

In some embodiments of this specification, the first Optical stack, neighbouring first optical stack laying up The second Optical stack of putting and go out along the first and second orthogonal crown of rolls and be arranged in the second optics The optical system of the first quarter-wave delayer between stacking and the first Optical stack.First light Learn stacking include the first optical lens and have in desired multiple wavelength at least 30% average The part reflector of luminous reflectance.Second Optical stack includes the second optical lens and the most saturating Penetrate and there is the light of the first polarization state and substantially reflection has the light of orthogonal the second polarization state Multilayer reflective polariser.Reflection type polarizer includes at least one multilayer reflective polariser At least one primary importance, this primary importance optical axis away from the second Optical stack has radial distance r1 And the apex away from multilayer reflective polariser is perpendicular to the plane of optical axis and has displacement s1, wherein S1/r1 is at least 0.1.Multilayer reflective polariser comprises at least one of which, and described at least one of which is at this Leave at least one of which at least one first position of optical axis be the most optically biaxial and At least one second position leaving optical axis is the most optically uniaxial.

In some embodiments of this specification, it is provided that include the first Optical stack, neighbouring the One Optical stack is arranged and the second Optical stack of going out along the first and second orthogonal crown of rolls and cloth Put the light of the first quarter-wave delayer between the second Optical stack and the first Optical stack System.First Optical stack includes the first optical lens and has in desired multiple wavelength The part reflector of the average light reflectance of at least 30%.Second Optical stack includes the second optical lens Mirror and substantially transmission have the light of the first polarization state and substantially reflection has orthogonal the The multilayer reflective polariser of the light of two polarization states.Reflection type polarizer has multilayer reflective polarization At least one primary importance of device, this primary importance optical axis away from the second Optical stack have radially away from The plane being perpendicular to optical axis from r1 and the apex away from reflection type polarizer has displacement s1, wherein S1/r1 is at least 0.1.Optical system has the contrast of at least 50 on the visual field of optical system.

In some embodiments of this specification, it is provided that include the first Optical stack, neighbouring the One Optical stack is arranged and the second Optical stack of going out along the first and second orthogonal crown of rolls and cloth Put the light of the first quarter-wave delayer between the second Optical stack and the first Optical stack System.First Optical stack includes the first optical lens and has in desired multiple wavelength The part reflector of the average light reflectance of at least 30%.Second Optical stack includes the second optical lens Mirror and substantially transmission have the light of the first polarization state and substantially reflection has orthogonal the The reflection type polarizer of the light of two polarization states.At least one primary importance on reflection type polarizer away from The optical axis of the second Optical stack has radial distance r1 and the apex away from reflection type polarizer hangs down Directly the plane in optical axis has displacement s1, and wherein s1/r1 is at least 0.1.Optical system is adapted to provide for Adjustable refractive correction.

In some embodiments of this specification, it is provided that include the first and second optical systems Head mounted display.First optical system includes the first imaging surface, the first emergent pupil, layout Reflection type polarizer between the first emergent pupil and the first imaging surface and be arranged in first The first quarter-wave delayer between reflection type polarizer and Part I reflector.First is anti- Penetrate formula polariser to go out about two orthogonal crown of rolls.Part I reflector arrangements is reflective first Between polariser and the first imaging surface, and Part I reflector is in predetermined multiple wavelength There is the average light reflectance of at least 30%.Second optical system include the second imaging surface, second Emergent pupil, the second reflection type polarization being arranged between the second emergent pupil and the second imaging surface Device, the Part II reflector being arranged between the second reflection type polarizer and the second imaging surface with And the second quarter-wave delayer that second between reflection type polarizer and Part II reflector. Second reflection type polarizer goes out about two orthogonal crown of rolls.Part II reflector is predetermined many Individual wavelength has the average light reflectance of at least 30%.

In some embodiments of this specification, it is provided that include aperture (aperture) and figure Camera as recording equipment.This camera includes the reflection being arranged between aperture and image recording structure Formula polariser.Reflection type polarizer is about two orthogonal bending shafts.In predetermined multiple wavelength The part reflector of the average light reflectance with at least 30% is arranged in reflection type polarizer and image Between recording equipment.Quarter-wave delayer be arranged in reflection type polarizer and part reflector it Between.

In some embodiments of this specification, it is provided that beam expander.Beam expander is included in predetermined Multiple wavelength have the part reflector of average light reflectance, the neighbouring part reflection of at least 30% Device is arranged and the reflection type polarizer spaced apart with part reflector and be arranged in reflection type polarization Quarter-wave delayer between device and part reflector.Reflection type polarizer is orthogonal about two Bending shaft.

In some embodiments of this specification, it is provided that include light source, be arranged as receive from The image processing system of the light of the patterning that the light of light source and transmitting are assembled and the projection of beam expander System.Beam expander is included in predetermined multiple wavelength the average light reflectance with at least 30% Part reflector, neighbouring part reflector arrangements the reflection type polarization spaced apart with part reflector Device and the quarter-wave delayer being arranged between reflection type polarizer and part reflector.Instead Penetrate formula polariser about two orthogonal bending shafts.Beam expander is arranged to form dress from image The pattern that the light of the patterning of the convergence put incides on part reflector and beam expander transmission dissipates The light changed.

In some embodiments of this specification, it is provided that include beam expander, polarization beam apparatus, light Source and the illumination apparatus of reflective parts.Beam expander includes the reflection about two orthogonal direction bendings Formula polariser.Polarization beam apparatus includes first prism with input face, output face and the first hypotenuse； Having the second prism of first and the second hypotenuse, the second hypotenuse is arranged adjacent to the first hypotenuse；And cloth Put the second reflection type polarizer between the first hypotenuse and the second hypotenuse.Light source is adjacent to input face cloth Put and limit the input effective coverage on input face.Reflective parts are used for connecing adjacent to first layout Receive the light launched from light source and launch the light assembled.Reflective parts have limit in output face defeated Go out the maximum effective coverage of effective coverage.Beam expander is arranged as receiving converging light and transmission diverging light. One or both of input effective coverage and output effective coverage are effective less than the maximum of reflective parts About half of region.

In some embodiments of this specification, it is provided that include the amplifying device of optical system. Optical system includes emergent pupil, close to emergent pupil and about the reflection of two orthogonal bending shafts Formula polariser and the relatively close reflection type polarizer of emergent pupil are arranged also and between reflection type polarizer The part reflector separated.Part reflector have in predetermined multiple wavelength at least 30% flat All luminous reflectancies.Quarter-wave delayer be arranged in reflection type polarizer and part reflector it Between.

Accompanying drawing explanation

Fig. 1-Fig. 2 is the schematic section of optical system；

Fig. 3 A-Fig. 4 C is the schematic section of the part of Optical stack；

Fig. 5-Fig. 9 is the schematic section of optical system；

Figure 10 is the sectional view of reflection type polarizer；

Figure 11 is the front view of reflection type polarizer；

Figure 12 is the sectional view of reflection type polarizer；

Figure 13 A is the front view of reflection type polarizer；

Figure 13 B is the sectional view of the reflection type polarizer of Figure 13 A；

Figure 14 is the curve chart of the polarization precision of the contrast opposing optical system of optical system；

Figure 15 is the signal stream that diagram makes the method for the desired blooming with desired shape Cheng Tu；

Figure 16 is the schematic section of hot forming instrument；

Figure 17 is the top schematic view of head mounted display；

Figure 18-Figure 23 is the sectional view of optical system；

Figure 24 A-Figure 24 C is the top schematic view of the device including one or more optical system；

Figure 25 is the diagrammatic side view of the device including illumination apparatus and beam expander；

Figure 26 is the schematic section of Optical stack；

Figure 27 A is the side view of the optical system of head mounted display；

Figure 27 B-Figure 27 C is the top view of the optical system of Figure 27 A；With

Figure 28 A-Figure 28 B is the sectional view of the toric lens in Different Plane.

Detailed description of the invention

A part of and wherein each by diagram display with reference to forming description in the following description Plant the accompanying drawing of embodiment.Figure is not necessarily to scale.Should be understood that and contemplate other in fact Execute scheme, and can carry out in the case of without departing from the scope of the present disclosure or spirit.Therefore, Described further below is not to understand in limiting sense.

According to this specification, it has been found that include going out about two orthogonal crown of rolls and being arranged in diaphragm Surface (such as, emergent pupil or entrance pupil) and imaging surface (such as, display pannel Surface or the surface of scanner-recorder) between the optical system of reflection type polarizer can be with example As (included the head mounted display of such as virtual reality display etc can be used for various device And the camera of the camera being such as included in mobile phone etc) compact arrangement in provide there is height Visual field, high-contrast, low aberration, low distortion and/or high efficiency system.

Optical system can include the part being arranged between reflection type polarizer and imaging surface Reflector, and at least one quarter-wave delayer can be included.Such as, the one or four/ One ripple delayer can be arranged between reflection type polarizer and part reflector, and certain situation In, the second quarter-wave delayer can be arranged between part reflector and imaging surface. Optical system may be adapted to utilize the wavelength in desired or predetermined multiple wavelength, and part The average light that reflector can have at least 30% in desired or predetermined multiple wavelength is anti- The average light penetrating rate and can have at least 30% in desired or predetermined multiple wavelength is saturating Penetrate rate.Quarter-wave delayer can be in desired or predetermined multiple wavelength at least The quarter-wave delayer of one wavelength.In some embodiments, it is desirable that or predetermined Multiple wavelength can be that (such as, 400nm-700nm's is visible for single continuous wavelength scope Optical range) or it can be multiple continuous wavelength scopes.Part reflector can be trap (notch) reflector and desired or predetermined multiple wavelength can include one or more wavelength Scope, at least some of which has anti-less than 100nm or the full width at half maximum less than 50nm Penetrate band.Reflection type polarizer can be trap reflection type polarizer, and can have coupling or base The zone of reflections of the zone of reflections of compatible portion reflector in basis.In some cases, optical system can To adapt to can include for one or more laser instrument and multiple desired or predetermined wavelength Arrowband (such as, width 10nm) around laser wavelength.

Reflection type polarizer, part reflector and/or quarter-wave delayer can also be about two Individual orthogonal bending shaft.In some embodiments, reflection type polarizer, the 1st/1st Ripple delayer and part reflector are each about two orthogonal bending shafts, and some embodiment party In case, these layers or parts each protrude towards imaging surface.In some embodiments, many Individual surface provides between diaphragm surface and imaging surface, and reflection type polarizer, the one or four point One of ripple delayer and part reflector be each arranged on one of surface.These layers or parts can To be each arranged in different surfaces, or two or more layers or parts can be arranged in list On one surface.In some embodiments, one, two, three or more lens are arranged Between diaphragm surface and imaging surface, and multiple surface can include one or more lens First type surface.One or more lens may be located between reflection type polarizer and part reflector, One or more lens may be located between diaphragm surface and reflection type polarizer, and one or many Individual lens may be located between part reflector and imaging surface.

Such as, reflection type polarizer can be hot formed reflection type polarizer and can be that heat becomes The polymeric multilayer optical film reflection type polarizer of shape can be maybe hot formed wire-grid polarizer. Hot forming refers to the forming technology completed more than ambient temperature.Integrate the normal of reflection type polarizer Rule display design uses flat reflective polariser or uses with cylindrical bent shape layout Reflection type polarizer (it is about single bending shaft).Reflection type polarizer is bent to cylinder Shape not stretch reflex formula polariser and therefore not substantially change it as reflection type polarizer Performance.The reflection type polarizer of this specification can be about two orthogonal bending shafts and permissible Therefore reflection type polarizer is configured to the shape of bending and stretches.According to this specification, send out The reflection type polarizer of existing this kind of complex bend can such as be used for display or camera applications In optical system, also result in optical property (such as, relatively low color separation, the fall of various improvement Low distortion, the visual field of improvement, the contrast etc. of improvement), even if reflection type polarizer stretching Become complex bend shape.As the most discussed further, it has been found that become by heat What shape polymeric multilayer optical film made protrudes reflection type polarizer when the light being used for this specification Being particularly advantageous during system, this thermoformed polymeric multi-layer optical film was before hot forming Uniaxial orientation.In some embodiments, the multilayer reflective polariser of uniaxial orientation is APF (Advanced Polarizing Film, from 3M Company, St.Paul, MN obtain). In some embodiments, optical system includes hot formed APF and is incident on hot formed Any or substantially any chief ray in optical system on APF has low angle of incidence (example As, below about 30 degree, below about 25 degree or below about 20 degree).Fig. 1 is optical system The schematic section of 100, it includes imaging surface 130, diaphragm surface 135, is arranged in image The first Optical stack 110 between surface 130 and diaphragm surface 135, it is arranged in the first optics The second Optical stack 120 between stacking 110 and diaphragm surface 135.First and second optics Stacking 110 and 120 is each protruded along the first and second orthogonal axles towards imaging surface 130. Fig. 1 provides x-y-z coordinate system.The first and second orthogonal axles can be x-and y-respectively Axle.Imaging surface 130 has maximum transverse size A, and diaphragm surface 135 has maximum Transverse dimension B.Maximum transverse size can be circular image or the diameter on diaphragm surface or permissible It is rectangular image or the diagonal distance on diaphragm surface.In some embodiments, A/B is permissible It is at least 2, at least 3, at least 4 or at least 5.Imaging surface 130 and/or diaphragm surface 135 Can be substantially planar can be maybe bending.

First Optical stack 110 includes being respectively provided with the first and second relative first type surface 114 Hes First optical lens 112 of 116.First and/or second first type surface 114 and 116 can have The one or more layers being disposed thereon or coating.First Optical stack 110 also includes being arranged in Part reflector on one of first or second first type surface 114 and 116, as herein other (see, e.g., Fig. 2 and Fig. 3 A-Fig. 3 C) that side further describes.It is included in this explanation Any part reflector in the optical system of book can have desired or predetermined multiple The average light reflectance of at least 30% in wavelength.Desired or predetermined multiple wavelength can be Visible wavelength range (such as, 400nm-700nm), infrared wavelength range, ultraviolet waves Long scope or visible ray, infrared and some combinations of ultraviolet wavelength.In some embodiments, Desired or predetermined multiple wavelength can be narrow wave-length coverage or multiple narrow wave-length coverage, and portion Dividing reflector can be to have at least one less than 100nm or high less than the half of 50nm The trap reflector of the zone of reflections of overall with.Average light reflectance can be by average expectation or pre- The fixed reflectance on multiple wavelength determines.Similarly, average light transmission rate can be by average Desired or the predetermined absorbance on multiple wavelength determines.In some embodiments, part Reflector have in the scope of each comfortable 30%-70% or each comfortable 40%-60% scope In desired or predetermined multiple wavelength in average light reflectance and average light transmission.Portion Dividing reflector can be such as half-reflecting mirror.Any suitable part reflector can be used.Example As, part reflector can be by coating thin metal layer (such as, silver or aluminum) on a transparent substrate Build.Such as, part reflector can also be by deposition thin-film dielectric coating to lens surface Or formed by depositing the combination of metal and dielectric coat on the surface of the lens.Implement at some In scheme, part reflector can be the second reflection type polarizer, and it can be multiple layer polymer Reflection type polarizer (such as, APF or DBEF) can be maybe wire-grid polarizer.

Second Optical stack includes second optics with the first and second first type surfaces 124 and 126 Lens 122.First and/or second first type surface 124 and 126 can have be disposed thereon Individual or multiple layer or coating.As further describe elsewhere herein (see, e.g., Fig. 2 and Fig. 4 A-Fig. 4 C), the second Optical stack 120 can include reflection type polarizer and One quarter-wave delayer, reflection type polarizer and the first quarter-wave delayer are first Be arranged on one of second first type surface 124 and 126 over each other (such as, be laminated to reflection The quarter-wave delayer film of formula polarizer film or quarter-wave delayer coating is (such as, Stereospecfic polymerization thing film) (such as, the liquid crystal polymer coating on reflection type polarizer film)), Or reflection type polarizer is arranged on the first first type surface 124 and the first quarter-wave delayer It is arranged in the second first type surface 126.First quarter-wave delayer can be and the second optical lens The film of mirror 122 molding can be maybe such as to be coated on after the second optical lens 122 is the most shaped The coating of the second first type surface 126.For forming the suitable coating bag of quarter-wave delayer Vinculum optical polymerism polymer (LPP) material and be described in U.S. Patent Application Publication No. US 2002/0180916 (Schadt etc.), US 2003/028048 (Cherkaoui etc.) and Liquid crystal polymer (LCP) material in US 2005/0072959 (Moia etc.).Suitably LPP material includes ROP-131 EXP 306 LPP, and suitably LCP material includes ROF-5185 EXP 410 LCP, both of which from Rolic Technologies, Allschwil, Switzerland obtains.Quarter-wave delayer can be desired or predetermined multiple wavelength In the quarter-wave of at least one wavelength.

In some embodiments, the second Optical stack 120 is included in the first and second first type surfaces Reflection type polarizer on one of 124 and 126.Optical system 100 includes being arranged in the first He The first quarter-wave delayer between second lens 112 and 122.First quarter-wave (in this case, delayer can be arranged on the second surface 126 of the second Optical stack 122 It may be considered as the part of the second Optical stack 120 or it may be considered as being arranged in the first He Between second Optical stack 110 and 120), or can be included as that there are the first and second optics The single parts at the interval between stacking 110 and 120, maybe can be arranged in the first Optical stack On the first surface 114 of 110, (in this case, it may be considered as the first Optical stack 110 Part or it may be considered as being arranged between the first and second Optical stack 110 and 120).

The substantially transmission substantially transmission of multilayer reflective polariser has the light of the first polarization state Substantially reflection has the light of the second orthogonal polarization state.First and second polarization states are that line is inclined Polarization state.First quarter-wave delayer is arranged in reflection type polarizer and the first Optical stack Between 110.

The Optical stack of this specification can be such as any by make to be included in Optical stack Film hot forming and then use are inserted molding process injection moulding lens and are made on film.As herein Other place further describes, and reflection type polarizer film can have anisotropy mechanicalness Matter, film rotation asymmetry after the cooling period when this makes hot forming on rotational symmetric mould.Can Can be it is difficult to be molded non-rotationally-symmetric film and be not resulted in film to rotational symmetric lens Wrinkle or other defect.Have been found that the non-rotationally-symmetric hot-forming die of use may be at film Rotational symmetric film is caused after the cooling period when there is anisotropy engineering properties.Rotational symmetric Mirror may be inserted into be molded into not to be had wrinkle or otherwise damages on the rotationally symmetrical film of gained Hinder hot formed film.

Imaging surface 130 can be any surface wherein forming image.In some embodiments In, image source comprises imaging surface 130 and diaphragm surface 135 is emergent pupil.Such as, figure Image surface 130 can be the output surface of the image processing system of such as display pannel etc. Diaphragm surface 135 can be the emergent pupil of optical system 100 and may be adapted to and the second optics The entrance pupil of system is overlapping, and it can be eyes or the camera of such as observer.Second optics The entrance pupil of system can be the entrance pupil of such as observer's eyes.Image source can be launched Polarization or unpolarized light.In some embodiments, imaging surface 130 is adapted for receiving From the hole (aperture) of the light that the object outside optical system 100 reflects.

Optical system 100 can include one or more other delayer.Such as, the 2nd 4 / mono-ripple delayer can be included in the first Optical stack 110 and can be arranged in the first He Maybe can be arranged on part reflector on one of second first type surface 114 and 116.It may be desirable to Be to include such as the when imaging surface 130 is the surface of display pannel producing polarized light Two quarter-wave delayers.Display pannel can launch linear polarization, circular polarization or oval inclined The light shaken.Such as, display pannel can be liquid crystal display (LCD) panel or liquid crystal covers Silicon (LCoS) display pannel and line polarized light can be launched.In some embodiments, Second quarter-wave delayer is arranged between part reflector and imaging surface, and at some In embodiment, linear polarizer (such as, line absorption polariser or the second reflection type polarizer) It is arranged between the second quarter-wave delayer and imaging surface 130.In some embodiments In, display pannel is substantially flat.In other embodiments, the display of bending is used Device panel.It is, for example possible to use OLED (Organic Light Emitting Diode) display of bending. In some embodiments, it is possible to use transparent or translucent display is (such as, transparent OLED, LCD or electrophoretic display).In some embodiments, image source comprises figure Image surface, wherein image source can include display pannel and can optionally include shutter.? In some embodiments, shutter (such as, liquid crystal shutter or PDLC (polymer dispersion liquid Brilliant) shutter or photochromic shutter, or can the baffle plate that fast gate action be played of physical removal) May be used for transparent or semitransparent display pannel to selectively allow for or not allow ambient light By transparent or semitransparent display pannel.Semi-transparent display panel is at display pannel extremely A few state can have at least 25% or at least at least one visible wavelength The absorbance of 50%.In some embodiments, image source can comprise and can use non-visible light The fluorescent material irradiated is to produce visual picture.

In some embodiments, scanner-recorder comprises imaging surface 130 and diaphragm surface 135 It it is entrance pupil.Such as, in camera applications, the aperture diaphragm (aperture stop) of camera Can be the entrance pupil of optical system 100 and imaging surface 130 can be that the image of camera passes The surface of sensor, its can e.g. charge coupled device (CCD) sensor or complementary type gold Belong to oxide semiconductor (CMOS) sensor.

Optical system 100 can be centered by folding optical axis 140, and described folding optical axis 140 can To be limited by the central ray optical path being transmitted through imaging surface 130.Optical axis 140 folds, Because the optical path of central ray between the first and second Optical stack 110 and 120 one Section optical path is propagated along negative z-direction and the first and second Optical stack 110 and 120 it Between another section of optical path in positive z-direction propagate.

First and second Optical stack 110 and 120 can have substantially the same shape or can To have different shapes.Similarly, the first and second optical lenses 112 and 122 can have There is substantially the same shape maybe can have different shapes.Reflection type polarizer, the one or four / mono-ripple delayer, part reflector, the first and second master meters of the first optical lens 112 In first and second first type surfaces 124 and 126 of face 114 and 116 and the second optical lens 120 Any one or more can have by the description of aspheric surface multinomial rise (sag) equation Shape.Various surfaces or layer can have identical or different shape and can be by identical or not Same aspheric surface multinomial rise equation describes.Aspheric surface multinomial rise equation can take with Lower form:

z = \frac{{cr}^{2}}{1 + {[1 - (1 + k) c^{2} r^{2}]}^{1 / 2}} + {Dr}^{4} + {Er}^{6} + {Fr}^{8} + {Gr}^{10} + {Hr}^{12} + {Ir}^{14}

... (equation 1)

Wherein c, k, D, E, F, G, H and I are constants, and z is the distance (example away from summit Such as, distance s1 in Figure 10) and r be radial distance (such as, distance r1 in Figure 10). Parameter k can refer to the constant of the cone.Any optical system of this specification can include reflective partially Shake device, one or more quarter-wave delayer, part reflector and be arranged in imaging surface And the multiple first type surfaces between diaphragm surface.Reflection type polarizer, one or more 1/4th Any one or more in ripple delayer, part reflector and first type surface can have by non- The shape that polynomial asphere rise equation describes.

First Optical stack 110 is arranged with distance d1 away from imaging surface 130, the second optics Stacking 120 with distance d2 away from the first Optical stack 110 and with away from diaphragm surface 135 away from Arrange from d3.In some embodiments, distance d1, d2 and/or d3 adjustable.One In a little embodiments, the distance (d1+d2+d3) between imaging surface 130 and diaphragm surface 135 It is fixing and d1 and/or d3 is adjustable.Such as, distance d1, d2 and/or d3 can With by installing one or both of first and second Optical stack 110 and 120 to providing position User's adjustment is carried out on the track that machinery adjusts.

First and the is adjusted relative to self or relative to image and/or diaphragm surface 130 and 135 The ability of the position of two Optical stack 110 and/or 120 allows by bending that optical system 100 provides Light correction is adjustable.Such as, mobile second optics while maintaining remaining part fixing Stacking 120 permission launched by imaging surface 130 and pass through diaphragm surface transmission light can from At diaphragm surface 135, parallel being adjusted at diaphragm surface 135 is assembled or is dissipated.Real at some Executing in scheme, dioptric optical value can be indicated on mechanical speed-control device, can by use baffle plate, Ratchet or similar device physics select or electronic selection such as utilize motor or with electronics mark Chi is used in combination motor or linear actuators.In some embodiments, imaging surface is comprised Picture size on the display pannel of 130 can adjust based on diopter and change.This can be by User is manually carried out or is automatically carried out by guiding mechanism.In other embodiments, may be used To provide one, two, three or more optical lens.Part reflector arrangements wherein The surface of the first lens is arranged in the surface of the second different lens with reflection type polarizer On any embodiment in, can be at least partially through providing first and/or second saturating Between adjustable position and/or offer first and second lens of mirror, adjustable distance provides Changeable diopter.

In some embodiments, one or both of first and second optical lenses 112 and 122 Can be shaped as providing dioptric optical value and/or cylinder (cylinder power) (such as, logical Over-molded have toric lens, and it can be described as having in the two orthogonal directions not Surface with radius of curvature) make optical system 100 can be user provide desired prescription Correction.In there is the steradian of reflection and cylinder and may be used for the optical system of this specification The example of toric lens show at Figure 28 A and 28B, it is y-z plane and x-z respectively Plane passes the sectional view of the lens 2812 in the cross section of lens apex.Radius of curvature is at y-z In plane (Figure 28 A), ratio is less in x-z-plane (Figure 28 B).In some embodiments In, cylinder can produce by using the thin plastic lenses that can bend.Similarly, prescription Correction can be by providing suitable focal power (optical power) to wrap on one or more lens Include any the one of one, two, three or more the lens optical system being described herein as In individual.In some embodiments, optical system can be arranged in integration and comprise imaging surface Display pannel and other lens of optical system between prescription lens, it can not provide Refractive correction, or system may be adapted to integrate other that be arranged in diaphragm surface and optical system Prescription lens between lens, it can not provide refractive correction.

Another purposes of removable optical lens is to minimize turning to-regulating in stereoscope (vergence-accommodation) mismatch.In many wear-type three-dimensional displays, layer Secondary sense by the left eye of mobile certain objects make with eye image its more closely together with produce Raw.Left eye and right eye draw close to be more clearly visible that the virtual image of object, and this is to produce deeply The prompting of degree sense.But, when the real-world object that eye observation is close, they are not only drawn close, And the lens focus of each eye (also referred to as regulation) is so that close object enters on retina Focus in.Because the difference present in stereoscope between reminding turning and shortage are observed and are seen and lean on The regulation of the virtual image of nearly object, the user of many wear-type three-dimensional displays there may be vision Problem uncomfortable, that eye is nervous and/or nauseating.By adjusting the position of the first and second lens, empty Image distance is from may be adjusted to close point so that eye focus is to watch the virtual image of object.Pass through Combination reminding turning and regulation prompting, the position of the one or more lens in optical system is permissible It is adjusted so that and turns to-adjust mismatch can to reduce or substantially remove.

In some embodiments, head mounted display includes the optics of any this specification System and eye tracking system can also be included.Eye tracking system is configurable to detection and uses Position and optical system in the virtual image that person is watching may be adapted to by adjusting optical system In the position of one or more lens adjust object that virtual image distance presents with coupling solid The degree of depth.

In some embodiments, the first and/or second optical lens 112 and 122 can shape To have reflection or refraction or both steradian and/or cylinder.This can be such as by using Hot-forming die and the film with desired shape insert mould and carry out.Cylinder can be the most logical Cross and produce on rotation-symmetric lenses along with its cooling applies stress after injection molding is processed. Or, lens can by post-treatment, diamond turning, grind or polish and bend (sphere Or cylinder or combination).

In some embodiments, one or both of first and second optical lenses 112 and 122 Dynamically or statically can bend in optical system.The example of static buckling is one or more Fixed screw or apply similar on one or more lens of compression or tensile force statically Mechanism.In some embodiments, fixed screw can provide in an annular manner, to provide edge The astigmatism correction of multiple axles, it considers the astigmatism of all three type: follow rule property, inverse rule property and Tiltedly astigmatism.This will provide accurately correction, be normally manufactured as used with 30 degree or 15 degree or 10 The increment of the gradient of degree solves the eyeglass lens of astigmatism.The pitch of fixed screw can be with cylinder Degree is relevant to provide rotation based on screw or the correction means of partial turn.Some embodiment party In case, piezoelectricity, voice coil loudspeaker voice coil or the actuator of motor or other type of actuator are permissible For bending one or more lens (such as, based on the user input to device, such as input Prescription).

In prescription lens term, planar lens is the lens not having refractive optical power.At some In embodiment, the first optical lens 112 and/or the second optical lens 122 can be to have very Little or there is no a planar lens of transmission focal power, but can have reflection focal power (such as, by General curvature in lens).First and second first type surface 114 Hes of the first optical lens 112 The curvature of 116 can be identical or substantially the same, and the of the second optical lens 122 One and second the curvature of first type surface 124 and 126 can be identical or substantially the same.The One and second optical lens 112 and 122 can have substantially the same shape.Real at some Executing in scheme, the first optical lens 112 and/or the second optical lens 122 can have transmission light Focal power and can also have reflection focal power.

Optical system 100 include the reflection type polarizer in the second Optical stack 120 and four/ One ripple delayer and the part reflector included in the first Optical stack 110.Have reflective partially Shake what how device, quarter-wave delayer and part reflector can arrange in Optical stack Various probabilities.Fig. 2 shows a kind of possible arrangement；Other arrangement is described in Fig. 3 A-Fig. 4 C In.

Fig. 2 is the schematic section of optical system 200, including imaging surface 230, apertured sheet Face 235, the first Optical stack 210 being arranged between imaging surface 230 and diaphragm surface 235, The second Optical stack 220 being arranged between the first Optical stack 210 and diaphragm surface 235. First and second Optical stack 210 and 220 are each along the first and second orthogonal axles towards image Surface 230 is protruded.Fig. 2 provides x-y-z coordinate system system.The first and second vertical axles Can be x-and y-axle respectively.

First Optical stack 210 includes being respectively provided with the first and second relative first type surface 214 Hes First optical lens 212 of 216.First Optical stack 210 includes being arranged in the first first type surface Part reflector 217 on 214.Part reflector 217 has desired or predetermined many The average light reflectance of at least 30% in individual wavelength and can having desired or predetermined The average light transmission rate of at least 30% in multiple wavelength, it can be to retouch elsewhere herein Any wave-length coverage stated.

Second Optical stack includes second optics with the first and second first type surfaces 224 and 226 Lens 222.It is reflective that second Optical stack 220 includes being arranged on the second first type surface 226 Polariser 227 also includes the quarter-wave delayer being arranged on reflection type polarizer 227 225.Quarter-wave delayer 225 can be the film being laminated on reflection type polarizer 227 It can be maybe the coating being coated on reflection type polarizer 227.Optical system 200 can include One or more other delayers.Such as, the second quarter-wave delayer can be included in In first Optical stack 210 and can be arranged on the second first type surface 216.1st/1st Ripple delayer 225 and any other quarter-wave being included in optical system 200 postpone Device can be the quarter-wave of at least one wavelength in predetermined or desired multiple wavelength Delayer.Or, the second Optical stack 220 can be described as including the second lens 222 and cloth Put the reflection type polarizer 227 on the second lens 222 and the first quarter-wave delayer 225 can be considered as being arranged in the second Optical stack 220 rather than being included in the second Optical stack Individual course in 220 or coating.In this case, the first quarter-wave delayer 225 Can be described as being arranged between the first Optical stack 210 and the second Optical stack 220.One In a little embodiments, the first quarter-wave delayer 225 can be not attached to the second optical stack Folded 220, and in some embodiments, the first quarter-wave delayer 225 is arranged in the One and second between Optical stack 210 and 220 and spaced away.Embodiment at other In, the first quarter-wave delayer 225 can be arranged on part reflector 217 and permissible It is described as being included in the first Optical stack 210 and maybe can be described as being arranged in the first and second light Learn between stacking 210 and 220.

Light 237 and 238 is various by imaging surface 230 with diaphragm surface 235 transmission.Light (such as, line 237 and 238 respectively can be transmitted to diaphragm surface 235 since imaging surface 230 In head mounted display is applied), or light 237 and 238 can be saturating from diaphragm surface 235 It is mapped to imaging surface 230 (such as, in camera applications).Light 238 can be its optics Path limits the central ray folding optical axis 240 of optical system 200, and it is centrally located at folding On optical axis 240.Fold optical axis 240 to can correspond to fold optical axis 140.

Light 237 is transmitted to the embodiment on diaphragm surface 235 from imaging surface 230 wherein In, it is saturating that light 237 (and similarly to light 238) passes sequentially through imaging surface 230 Penetrate, by the second first type surface 216 (and any coating thereon or layer) transmission, by first Optical lens 212 transmission, pass through partially reflective device 217 transmission, by be arranged in reflective partially Shake quarter-wave delayer 225 transmission on device 227, reflect from reflection type polarizer 227, By quarter-wave delayer 225 to returning transmission, reflecting from part reflector 217, pass through Quarter-wave delayer 225 transmission, by reflection type polarizer 227 transmission, by second Lens 222 transmission and by diaphragm surface 235 transmission.Light 237 can be from imaging surface 230 Launch, there is the polarization rotating to the first polarization state when by quarter-wave delayer 225 State.This first polarization state can be the block state of reflection type polarizer 227.Lead at light 237 Cross the first quarter-wave delayer 225, reflect from part reflector 217 and pass through four/ One ripple delayer 225 passback after, its polarization state be with the first polarization state substantially orthogonal to second Polarization state.Light 237 therefore can be when it be incident on reflection type polarizer 227 for the first time Reflect from reflection type polarizer 227 and reflection type polarizer 227 can be incident in its second time By reflection type polarizer 227 transmission time upper.

Other light (not shown) when inciding on part reflector 217 with negative z-direction from Part reflector 217 reflects or during to incide on part reflector 217 with positive z-direction by portion Divide reflector 217 transmission.These light can exit optical system 200.

In some embodiments, basically by imaging surface 230 and diaphragm surface 235 Any chief ray incident in each first Optical stack 210 and the second Optical stack 220, first When secondary or each chief ray incident is in the first or second Optical stack 210 or 220, angle of incidence is little In about 30 degree, less than about 25 degree or less than about 20 degree.Any optical system in this specification In system, basically by any chief ray incident on image and diaphragm surface at each reflection type polarization On device and part reflector, first time or each chief ray incident are in reflection type polarizer or part Time on reflector, angle of incidence is less than about 30 degree, less than about 25 degree or less than about 20 degree.If By the major part of diaphragm and all chief rays of imaging surface (such as, about 90% or more, Or about 95% or more, or about 98 or more) certain condition is met, then it may be said that substantially Any chief ray meets this condition.

Various factors can be incident on reflection type polarization for the first time at the light that imaging surface 230 is launched Cause light fractional transmission by reflection type polarizer 227 time on device 227.This may be at apertured sheet Less desirable ghost image or image blurring is caused at face 235.These factors can include various polarization Parts hydraulic performance decline in forming process and the less desirable birefringence of optical system 200.This The effect of a little factors can combine so that the contrast of optical system 200 and efficiency degradation.These The effect of contrast can be seen in such as Figure 14 by factor, and optical modeling is passed through in its display The contrast at diaphragm surface 235 determined, it has with when being launched by imaging surface 230 Being changed by the percentage ratio of the light of the polarization of state, this light is by the first quarter-wave delayer 225 and by being arranged in the 1st/2nd on the second first type surface 216 of the first lens 212 It is incident on first on reflection type polarizer 227 after ripple delayer (not shown).This kind of factor can So that by using the optical lens of relative thin, (this can such as reduce less desirable pair in lens Refraction) and (this can such as reduce the light produced by thermo formed optical film to use thin blooming Learn pseudomorphism) minimize.In some embodiments, the first and second optical lens 212 and 222 Each there is the thickness less than 7mm, less than 5mm or being less than 3mm and can have such as Thickness in the range of 1mm-5mm or 1mm-7mm.In some embodiments, instead Penetrate formula polariser 227 can have less than 75 microns, less than 50 microns or less than 30 microns Thickness.In some embodiments, the contrast at diaphragm surface 235 is in optical system On the visual field of 200 at least 40, or at least 50, or at least 60, or at least 80, or at least 100. Have been found that if reflection type polarizer 227 is hot formed (to make it about two orthogonal axles Bending) multi-layer optical film (it is uniaxial orientation (such as, APF) before hot forming), Contrast with use about permissible compared with other reflection type polarizer of two orthogonal bending shafts Significantly higher.Other reflection type polarizer can also be used, such as the multilayer polymeric of non-uniaxial orientation Thing film reflection type polarizer or wire-grid polarizer.

It has been found that properly select each first type surface (such as, the second first type surface 226 and first First type surface 214) shape, optical system substantially low distortion can be provided so that image not Need precorrection.In some embodiments, the image source being suitable to launch undistorted image comprises Imaging surface 230.Part reflector 217 and reflection type polarizer 227 can have selectively Difformity is so that the distortion of launched undistorted image of diaphragm surface 235 transmission is less than light At door screen surface 235 about the 10%, or below about 5% of visual field, or below about 3%.Diaphragm surface The visual field at place can be greater than 80 degree, more than 90 degree or more than 100 degree.

Fig. 3 A-Fig. 3 C is the sectional view of the part of Optical stack 310a-310c, and it is any one years old Individual can correspond to the second Optical stack 110.Although not showing in Fig. 3 A-Fig. 3 C, optics Stacking 310a-310c can be each about two orthogonal bending shafts.Optical stack 310a-310c Each including the lens 312 with the first and second first type surfaces 314 and 316, it can be corresponding In optical lens 112.Optical stack 310a includes be arranged on the first first type surface 314 four points One of ripple delayer 315 (it can optionally be omitted) and be arranged in the second first type surface 316 On part reflector 317.Optical stack 310b includes being arranged on the first first type surface 314 Part reflector 317 be arranged on part reflector 317 relative with optical lens 312 four / mono-ripple delayer 315 (it can optionally be omitted).Optical stack 310c includes cloth Put quarter-wave delayer on the second first type surface 316 315 and including be arranged in four/ Part reflector 317 relative with lens 312 on one ripple delayer 315.

Fig. 4 A-Fig. 4 C is the sectional view of the part of Optical stack 420a-420c, and it is any one years old Individual can correspond to the second Optical stack 120.Optical stack 420a-420c can each about Two orthogonal bending shafts.It is main that Optical stack 420a-420c each includes having first and second The lens 422 on surface 424 and 426, it can correspond to optical lens 422.Optical stack 420a includes the quarter-wave delayer 425 being arranged on the first first type surface 424 and is arranged in Reflection type polarizer 427 on second first type surface 426.Optical stack 420b includes being arranged in Reflection type polarizer on one first type surface 424 427 and be arranged on reflection type polarizer 427 with The quarter-wave delayer 425 (in Fig. 2) that lens 422 are relative.Optical stack 420c Including the quarter-wave delayer 425 being arranged on the second first type surface 426 with include being arranged in Reflection type polarizer 427 relative with lens 422 on quarter-wave delayer 425.

Showing alternate embodiment in Fig. 5, it is the schematic section of optical system 500, (include having the including imaging surface 530, diaphragm surface 535 and integral optical stacking 510 One and second optical lens 512 of first type surface 514 and 516).First and/or second first type surface 514 and 516 can have the one or more layers or coating being disposed thereon.Integral optical heap Folded 510 also include that part reflector, multilayer reflective polariser and the first quarter-wave postpone Device.These each layers or parts can be arranged in the first and second first type surfaces 514 and 516 On one or more.Such as, in some embodiments, part reflector can be arranged in On one first type surface 514, the first quarter-wave delayer can be arranged on part reflector and Reflection type polarizer can be arranged on the first quarter-wave delayer.In some embodiments In, the second quarter-wave delayer can be arranged on the second first type surface 516.Real at some Executing in scheme, reflection type polarizer is arranged on the second first type surface 516, and quarter-wave postpones Device is arranged on reflection type polarizer and part reflector is arranged on quarter-wave delayer. In some embodiments, the second quarter-wave delayer is arranged on part reflector.? In some embodiments, reflection type polarizer is arranged on the first first type surface 514 and the one or four point One of ripple delayer be arranged on the second first type surface 516, and part reflector and optional second Quarter-wave delayer is arranged on the first quarter-wave delayer.In some embodiments In, the first quarter-wave delayer is arranged on the first first type surface 514, and reflection type polarization Device is arranged on the first quarter-wave delayer, and part reflector is arranged in the second first type surface On 516, and the second optional quarter-wave delayer is arranged on part reflector.

Imaging surface 530 has the first maximum transverse size and diaphragm surface 535 has second Big lateral dimension.In some embodiments, the first maximum transverse size is maximum horizontal divided by second Can be at least 2, at least 3, at least 4 or at least 5 to size.Imaging surface 530 and/or Diaphragm surface 635 can be substantially plane or can be about one or more bending shafts.

Part reflector have in desired or predetermined multiple wavelength at least 30% average Luminous reflectance and have in desired or predetermined multiple wavelength at least 30% average light saturating Penetrating rate, it can be any wave-length coverage described elsewhere herein.It is included in optical system System 500 in quarter-wave delayer can be in predetermined or desired multiple wavelength extremely Quarter-wave delayer at a few wavelength.The substantially transmission of multilayer reflective polariser has The light (such as, in the first direction linear polarization) and the substantially reflection that have the first polarization state have The light of the second orthogonal polarization state is (such as, along the second direction linear polarization orthogonal with first direction ).As further described elsewhere herein, multilayer reflective polariser is the most permissible Be polymeric multilayer reflective formula polariser (such as, APF) can be maybe wire-grid polarizer.

Optical system 500 can be centered by folding optical axis 540, and described folding optical axis 540 can Limited by the optical path of the central ray being transmitted through imaging surface 530.

It has been found that use single integrated optics stacking (as integrated optics stacks 510) permissible High visual field in compact systems is provided.Light by the outward flange transmission of imaging surface 530 537 is that with the visual angle of θ, (it can be for example, at least 40 degree, at least folding at optical axis 540 45 degree or at least 50 degree) chief ray that intersects with diaphragm surface 535.At diaphragm surface 535 Visual field be 2 θ, its can e.g. at least 80 degree, at least 90 or at least 100 degree.

Fig. 6 is the schematic section of optical system 600, and it can correspond to optical system 500, (include tool including imaging surface 630, diaphragm surface 635, integral optical stacking 610 There is the optical lens 612 of the first and second first type surfaces 614 and 616).First quarter-wave Delayer 625 is arranged on the first first type surface 614 of optical lens 612 and reflection type polarizer 627 are oppositely arranged on the first quarter-wave delayer 625 with optical lens 612.Portion Point reflector 617 is arranged on the second first type surface 616 of optical lens 612 and the two or four/ One ripple delayer 615 is oppositely arranged on part reflector 617 with optical lens 612.Light System 600 can be centered by folding optical axis 640, and described folding optical axis 640 can be by transmission Limited by the optical path of the central ray of imaging surface 630.

Integral optical stacking 610 can make by the following method: first by the one or four/ One ripple delayer 625 coats or is laminated to reflection type polarizer 627 and forms reflection type polarizer 627 and then make the film of gained be thermoformed into desired shape.As entered one elsewhere herein Step describes, and hot forming instrument can have with desired variform shape so that film exists Desired shape is obtained after cooling.Part reflector 617 and the second quarter-wave delayer 615 can be by, on coating quarter-wave delayer to part reflector film, passing through painting part Point reflector coat is on quarter-wave delayer film, by laminated portion reflector film and four / mono-ripple delayer film together or passes through first to be formed thoroughly in film inserts molding process (it can be formed at and include that reflection type polarizer 627 and the first quarter-wave postpone mirror 612 On the film of device 625) and be then coated with part reflector 617 on the second first type surface 616 and be coated with Cover quarter-wave delayer 615 to make on part reflector 617.Some embodiment party In case, it is provided that include the of reflection type polarizer 627 and the first quarter-wave delayer 625 One film, it is provided that include part reflector 617 and the second of the second quarter-wave delayer 615 Film, and then pass through to be molded between the first and second hot forming films in film inserts molding process Lens 612 form integral optical stacking 610.First and second films can be before injection step Hot forming.Other Optical stack of this specification can be similarly by thermo formed optical film (its Can be coat film or laminate) and use film to insert molding process making Optical stack system Become.Second film can be included in film and insert in molding process, so that being formed in a molding process Lens be arranged between film.

Image source 631 includes that imaging surface 630 and diaphragm surface 635 are optical systems 600 Emergent pupil.Image source 631 can be such as display pannel.In other embodiments, Display pannel does not exists, and alternatively, imaging surface 630 is adapted for receiving from optical system The hole of the light of the object reflection outside 600.There is the second optical system of entrance pupil 634 633 arrange close to optical system 600 so that diaphragm surface 635 is overlapping with entrance pupil 634. Second optical system 633 can be camera, such as, is suitable to record saturating by imaging surface 637 The image penetrated.In some embodiments, the second optical system is the eyes of observer, and Entrance pupil 634 is the pupil of observer's eyes.In such embodiments, optical system 600 go in head mounted display.

Part reflector 617 have in desired or predetermined multiple wavelength at least 30% flat All luminous reflectance and have in desired or predetermined multiple wavelength at least 30% average light Absorbance, it can be any wave-length coverage described elsewhere herein.One or four/ One ripple delayer 625 and any other quarter-wave being included in optical system 600 prolong Device can be four points at least one wavelength in predetermined or desired multiple wavelength late One of ripple delayer.Multilayer reflective polariser 627 substantially transmission has the first polarization state Light (such as, in the first direction linear polarization) and substantially reflection have the second orthogonal polarization The light (such as, along the second direction linear polarization orthogonal with first direction) of state.As herein Other place further describes, and multilayer reflective polariser 627 can be such as that polymer is many Layer reflection type polarizer (such as, APF) can be maybe wire-grid polarizer.

Light 637 is launched from image source 631 and by imaging surface 630 and diaphragm surface 635 Transmission.Light 637 is saturating by the second quarter-wave delayer 615 and part reflector 617 It is mapped in lens 612 and through lens 612.Other light (not shown) is by the two or four Reflect from part reflector 617 after/mono-ripple delayer 615 and lose from optical system 600. Its first through lens 612 time, light through the first quarter-wave delayer 625 and from Reflection type polarizer 627 reflects.Image source 631 may be adapted to transmitting to be had along reflection type polarization The light of the polarization by axle of device 627 is so that by the second quarter-wave delayer 615 After the first quarter-wave delayer 625, it is inclined along the block axis of reflection type polarizer 627 Shake and therefore reflect from it when being incident on first on reflection type polarizer 627.Implement at some In scheme, linear polarizer is included in display pannel 631 and the second quarter-wave delayer Between 617, so that the light being incident on the second quarter-wave delayer 615 has expectation Polarization.At light 637 after reflection type polarizer 627 reflects, it by the one or four/ One ripple delayer 625 and lens 612 return and then reflect (not from part reflector 617 Other light of diagram passes through partially reflective device 617 transmission), by lens 612 passback with right After be again incident on reflection type polarizer 627.Through the first quarter-wave delayer 625, reflect from part reflector 617 and pass through the first quarter-wave delayer 625 and return After, light 637 has the polarization by axle along reflection type polarizer 627.Light 637 because of Then this by reflection type polarizer 627 transmission and be transmitted to the second light by diaphragm surface 635 In system 633.

In an alternative embodiment, integrated optics stacking 610 is with such as first in Fig. 1-Fig. 2 Replace with the second Optical stack and replace by such as first, second, and third Optical stack in Fig. 8.

Fig. 7 is the schematic section of optical system 700, and it can correspond to optical system 500, (include having the including imaging surface 730, diaphragm surface 735 and integral optical stacking 710 One and second optical lens 712 of first type surface 714 and 716).First quarter-wave postpones Device 725 is arranged on optical lens 712, and reflection type polarizer 727 is arranged in the one or four On/mono-ripple delayer 725.Part reflector 717 is arranged on the second first type surface 716. Optical system 700 can be centered by folding optical axis 740, and described folding optical axis 740 can be by thoroughly The optical path penetrating the central ray by imaging surface 730 limits.

Scanner-recorder 732 includes imaging surface 730, and diaphragm surface 735 is optical system The entrance pupil of 700.Diaphragm surface can be such as the aperture of camera.Scanner-recorder 732 Can be such as CCD or CMOS device.Optical system 700 can be such as camera or phase The parts of machine and can being arranged in mobile phone.

Part reflector 717 have in desired or predetermined multiple wavelength at least 30% flat All luminous reflectance and have in desired or predetermined multiple wavelength at least 30% average light Absorbance, it can be any wave-length coverage described elsewhere herein.One or four/ One ripple delayer 725 and any other quarter-wave being included in optical system 700 prolong Device can be four points at least one wavelength in predetermined or desired multiple wavelength late One of ripple delayer.Multilayer reflective polariser 727 substantially transmission has the first polarization state Light (such as, in the first direction linear polarization) and substantially reflection have the second orthogonal polarization The light (such as, along the second direction linear polarization orthogonal with first direction) of state.As herein Other place further describes, and multilayer reflective polariser 727 can be such as that polymer is many Layer reflection type polarizer (such as, APF) can be maybe wire-grid polarizer.

Light 737 is transmitted to image by diaphragm surface 735 transmission with by imaging surface 730 In recorder 732.It is (not shown that light 737 passes sequentially through reflection type polarizer 727 transmission Other light may be reflected by reflection type polarizer 727), postponed by quarter-wave Device 725 and optical lens 712 transmission, reflect from part reflector 717 and pass through lens 712 Return with quarter-wave delayer, reflect from reflection type polarizer 727 and by 1/4th Ripple delayer 725, lens 712 and part reflector 717 transmission.Then light 737 pass through Imaging surface 730 is transmitted in scanner-recorder 732.

Any integral optical stacking 510,610 and 710 can optionally include and the first lens The second neighbouring lens, wherein reflection type polarizer, quarter-wave delayer and partially reflective One or more in device are arranged between two lens.Two lens can use optical clear Adhesive phase force together.Figure 26 is the schematic section of integral optical stacking 2610, its Can replace respectively in optical system 500,600 and 700 any integral optical stacking 510, 610 and 710 use.Integral optical stacking 2610 includes first lens the 2612, second lens 2622 and the quarter-wave delayer that is arranged between the first and second lens 2612 and 2622 2625.Quarter-wave delayer 2625 can such as be coated to the master meter of the second lens 2622 On face, and optically transparent binding agent may be used for being attached quarter-wave delayer 2625 and arrives First lens 2612.Or quarter-wave delayer 2625 can be coated to the first lens On the first type surface of 2612, and optically transparent binding agent may be used for being attached quarter-wave and postpones Device the 2625 to the second optical lens 2622.In other embodiments, quarter-wave postpones Device 2625 can be the independent film being laminated to the first and second lens 2612 and 2622.Optics Stacking includes being arranged on the first type surface of the second lens 2622 relative with the first lens 2612 anti- Penetrate formula polariser 2627 and include being arranged on the first type surface of the first lens 2612 with the second lens 2622 relative part reflector 2617.Part reflector 2617, quarter-wave delayer 2625 and reflection type polarizer 2627 can correspond to part reflector, quarter-wave postpone In device and reflection type polarizer any one, respectively other local describes the most in this article for it.

First and second lens 2612 and 2622 can be respectively by identical or different first and Two materials are formed.Such as, the material of lens 2612,2622 can be identical glass, can To be different glass, can be identical polymer, can be different polymer or Individual can be glass and another can be polymer.The material for lens is selected generally to show Go out a certain degree of dispersion (refractive index and the dependency of wavelength).In some cases, dispersion Effect can by selecting different materials to reduce for different lens so that one thoroughly The dispersion compensation of mirror or part compensate the dispersion of another lens.Abbe (Abbe) number of material can Dispersion for quantitative material.Abbe number is with (n_D-1)/(n_F-n_C) be given, wherein n_DIt is 589.3 Refractive index at nm, n_FIt is the refractive index at 486.1nm and n_CIt it is the folding at 656.3nm Penetrate rate.In some embodiments, the first and second lens 2612 and 2622 have different Abbe number.In some embodiments, the Abbe number of the first and second lens 2612 and 2622 Difference is in the range of 5-50.In some embodiments, the first and second lens 2612 He One of 2622 have the Abbe number more than 45 or more than 50, and the first and second lens 2612 With 2622 in another have less than 45 or Abbe number less than 40.This can be the most logical Cross and glass is used for lens and uses polymer to realize for another lens.

The optical system of this specification can include that one, two, three or more is arranged in Lens between imaging surface and diaphragm surface.In some embodiments, multiple first type surface cloth Put between imaging surface and diaphragm surface so that each first type surface is along the first and second axles towards figure Image surface protrudes.In some embodiments, including the such first type surface of at least six.One In a little embodiments, the first type surface that at least six is different has at least six kinds of different convexitys.Example As, include that three or more lens have high-resolution little in employing in optical system It is useful during plate, because there are three or more lens provide six or more master meter Face, its shape can be chosen as providing desired optical property in the diaphragm surface of optical system (such as, big visual field).

Fig. 8 is the schematic section of optical system 800, including having the first and second first type surfaces First optical lens 812 of 814 and 816, there are the first and second first type surfaces 824 and 826 The second optical lens 822 and there is the 3rd optics of the first and second first type surfaces 864 and 866 Lens 862, are each arranged between imaging surface 830 and diaphragm surface 835.Imaging surface 830 and/or diaphragm surface 835 can be substantially plane can be maybe bending.First He Any one in second optical surface can include one or more layer thereon or coating, such as this In literary composition, other place further describes.Optical system 800 includes being arranged in imaging surface 830 And part reflector between diaphragm surface 835, multilayer reflective polariser and the one or four/ One ripple delayer.These parts each can be arranged in first type surface 864,866,824,826, On one of 814 and 816.In some embodiments, part reflector is arranged in the second optics On first first type surface 824 of lens 822.In some embodiments, multilayer reflective polarization Device is arranged on the first first type surface 864 or second first type surface 866 of the 3rd optical lens 862. In some embodiments, the first quarter-wave delayer is arranged in multilayer reflective polariser On.In some embodiments, the first quarter-wave delayer is arranged in the 3rd optical lens On first first type surface 864 of 862, and multilayer reflective polariser is arranged in multilayer reflective On polariser.In some embodiments, the second quarter-wave delayer is included in optical system In system 800.Second quarter-wave delayer can be arranged in the of the second optical lens 822 The first and second first type surfaces of the first optical lens 812 maybe can be arranged on two first type surfaces 826 On one of 814 and 816.

Imaging surface 830 has the first maximum transverse size, and diaphragm surface 835 has Two maximum transverse size.In some embodiments, the first maximum transverse size is divided by second Big lateral dimension can be at least 2, at least 3, at least 4 or at least 5.

Optical system 800 can be centered by folding optical axis 840, and described folding optical axis 840 can Limited by the optical path of the central ray being transmitted through imaging surface 830.

Part reflector have in predetermined or desired multiple wavelength at least 30% average Luminous reflectance and have in predetermined or desired multiple wavelength at least 30% average light saturating Penetrating rate, it can be any wave-length coverage described elsewhere herein.1st/1st Ripple delayer and any other quarter-wave delayer being included in optical system 800 can To be the quarter-wave at least one wavelength in predetermined or desired multiple wavelength Delayer.Multilayer reflective polariser substantially transmission can have the first polarization state (it is permissible Linear polarization) light and substantially reflection there is the second orthogonal polarization state (it just can be Hand over linear polarization) light.As further described elsewhere herein, multilayer reflective Polariser can be such as that polymeric multilayer reflective formula polariser (such as, APF) can be maybe Wire-grid polarizer.

In some embodiments, each first type surface 864,866,824,826,814 and 816 Convexity be different from the convexity of remaining first type surface each.In other words, first type surface 864,866,824, 826,814 can have six kinds of different convexitys with 816.

Image source can comprise imaging surface 830 and diaphragm surface 835 can be emergent pupil, It may be adapted to overlapping with the entrance pupil of the second optical system.The entrance pupil of the second optical system It can be the entrance pupil of such as observer's eyes.Or, scanner-recorder can comprise image Surface 830 and diaphragm surface 835 can be entrance pupils.

Fig. 9 is the schematic section of optical system 900, including being arranged in imaging surface 930 He The first and second optical lenses 912 and 922 between diaphragm surface 935.Optical system 900 Can correspond to optical system 100 or 200.As further described elsewhere herein, Imaging surface 930 can be surface and the diaphragm surface of the image source of such as display pannel etc 935 can be emergent pupil.First lens 912 include the first and second first type surfaces 914 and 916. First first type surface 914 includes the one or more layers 914 being disposed thereon.Second first type surface 916 The one or more layers being disposed thereon can also be included.Second lens 922 include first and Two first type surfaces 924 and 926.It is one or more that second first type surface 926 includes being disposed thereon Layer 945.In some embodiments, the first first type surface 924 can also include being disposed thereon One or more layers.In the embodiment shown in the drawing, one or more layers 945 include arranging Reflection type polarizer on the second first type surface 926 and include being arranged on reflection type polarizer First quarter-wave delayer.In the embodiment shown in the drawing, one or more layers 943 wrap Include part reflector.In other embodiments, as further described elsewhere herein, Reflection type polarizer, the first quarter-wave delayer and part reflector are arranged in first and On the different surfaces of two lens 912 and 922.

Chief ray 937 and envelope light 939a and 939b by imaging surface 930 and pass through light Door screen surface 935 transmission.Chief ray 937 and envelope light 939a and 939b are from imaging surface 930 With by diaphragm surface 935 transmission.In other embodiments, the direction of optical path is phase Anti-and imaging surface 930 can be the surface of scanner-recorder.Envelope light 939a and 939b Boundary on diaphragm surface 935 and diaphragm surface 935 intersect and chief ray 937 is at optical axis Intersecting with diaphragm surface 935 at 940, optical axis 940 can be by being transmitted through imaging surface 930 Central ray optical path limit.

Chief ray 937 is incident on diaphragm surface 935 at optical axis 940 with incidence angle θ.Edge The chief ray that optical axis 940 is incident on diaphragm surface 935 maximum on diaphragm surface 935 enters The twice of firing angle is the visual field of optical system 900.In some embodiments, optical system 900 There is low aberration.Such as, in some embodiments, substantially there is visible wavelength range First and second wavelength (such as, difference 486nm and 656nm of middle difference at least 150nm The first and second wavelength) and any by imaging surface 930 and diaphragm surface 935 transmission Chief ray has less than at diaphragm surface 935 the 1.5% or little of visual field at diaphragm surface 935 In the color separation distance of 1.2%.In some embodiments, substantially there is visible wavelength model Enclose first and second wavelength of middle difference at least 150nm and by imaging surface 930 and diaphragm Any chief ray of surface 935 transmission has at diaphragm surface 935 and divides or little less than 20 arcs In the color separation distance that 10 arcs divide.

The other optical system of this specification shows in Figure 18-Figure 23.Figure 18 is optics The sectional view of system 1800, including Optical stack 1810, imaging surface 1830 and diaphragm surface 1835.Imaging surface 1830 is the surface of panel 1889.Optical stack 1810 includes lens 1812, be arranged in lens 1812 in the face of diaphragm surface 1835 first type surface on reflective partially The portion on the first type surface of imaging surface 1830 that shaking device 1827 and is arranged in lens 1812 Divide reflector 1817.Quarter-wave delayer is included in reflection type polarizer and lens 1812 Between or part reflector and lens 1812 between Optical stack 1810.Lens 1812 about Orthogonal axle (such as, x-and y-axle) protrudes towards imaging surface 1830.Show at figure The three beams light of three positions on image surface 1830.Light in each bundle is on diaphragm surface At 1835 substantially parallel.Light mainly can advance to imaging surface from diaphragm surface 1835 1830 (such as, in camera applications), or can mainly advance to from imaging surface 1830 Diaphragm surface 1835 (such as, in a display application).Panel 1889 can be display Panel can be maybe image record panel.The reflection hole of reflection type polarizer can be substantially The whole region of reflection type polarizer maybe can include except the border near reflection type polarizer The whole region of the reflection type polarizer outside part.In the embodiment shown in the drawing, reflective partially The device 1827 that shakes has reflection hole 1814, its substantially with lens 1812 in the face of diaphragm surface The whole region of the first type surface of 1835 is consistent.

Figure 19 is the sectional view of optical system 1900, including the first Optical stack 1910, second Optical stack 1920, imaging surface 1930 and diaphragm surface 1935.Imaging surface 1930 is The surface of panel 1989.First Optical stack 1910 includes lens 1912 and is arranged in lens The part reflector on the first type surface on diaphragm surface 1935 of 1912.Second Optical stack 1920 include lens 1922 and including be arranged in lens 1922 in the face of imaging surface 1930 Reflection type polarizer on first type surface.Including being arranged in the reflection type polarization in the face of part reflector Quarter-wave that is on device or that be arranged on the part reflector of reflection type polarizer prolongs Device late.Lens 1912 and lens 1922 about orthogonal axle (such as, x-and y-axle) towards Imaging surface 1930 protrudes.Show the three-beam of three positions on imaging surface 1930 Line.Light in each bundle is substantially parallel at diaphragm surface 1935.Light can mainly from Diaphragm surface 1935 advances to imaging surface 1930 (such as, in camera applications), or can Mainly to advance to diaphragm surface 1935 (such as, in display application from imaging surface 1930 In).Panel 1989 can be display pannel can be maybe image record panel.

Figure 20 is the sectional view of optical system 2000, including having the first lens 2012, second The Optical stack 2010 on lens 2022, imaging surface 2030 and diaphragm surface 2035.Image Surface 2030 is the surface of panel 2089.Optical stack 2010 includes being arranged in the first lens 2012 in the face of diaphragm surface 2035 first type surface on reflection type polarizer and include that first is saturating The part reflector on the first type surface of imaging surface 2030 of mirror 2012.Quarter-wave Delayer is between reflection type polarizer and the first lens 2012 or part reflector and first saturating It is included between mirror 2012 in Optical stack 2010.Reflection type polarizer and part reflector close Protrude towards imaging surface 2030 in orthogonal axle (such as, x-and y-axle).Show The three beams light of three positions on imaging surface 2030.Light in each bundle is on diaphragm surface At 2035 substantially parallel.Light mainly can advance to imaging surface from diaphragm surface 2035 2030 (such as, in camera applications), or can mainly advance to from imaging surface 2030 Diaphragm surface 2035 (such as, in a display application).Panel 2089 can be display Panel can be maybe image record panel.

Figure 21 is the sectional view of optical system 2100, including the first Optical stack 2110, second Optical stack 2120, imaging surface 2130 and diaphragm surface 2135.Imaging surface 2130 is The surface of panel 2189.First Optical stack 2110 includes lens 2122 and is arranged in lens The part reflector on the first type surface of imaging surface 2130 of 2112.Second Optical stack 2120 include lens 2122 and including be arranged in lens 2122 in the face of imaging surface 2130 Reflection type polarizer on first type surface.Optical system 2100 includes being arranged in the face of part is anti- On the reflection type polarizer of emitter or be arranged in the part reflector in the face of reflection type polarizer On or be arranged in lens 2112 in the face of diaphragm surface 2135 first type surface on 1/4th Ripple delayer.Reflection type polarizer about orthogonal axle (such as, x-and y-axle) towards image Surface 2130 is protruded.Show the three beams light of three positions on imaging surface 2130. Light in each bundle is substantially parallel at diaphragm surface 2135.Light can be mainly from diaphragm Surface 2135 advances to imaging surface 2130 (such as, in camera applications), maybe can lead Diaphragm surface 2135 (such as, in a display application) is advanced to from imaging surface 2130. Panel 2189 can be display pannel can be maybe image record panel.

Figure 22 is the sectional view of optical system 2200, including the first lens 2212, has second The Optical stack 2220 of lens 2222, imaging surface 2230 and diaphragm surface 2235.Optics Stacking 2220 include being arranged in lens 2222 on the first type surface of imaging surface 2230 Part reflector and including be arranged in lens 2222 on the first type surface on diaphragm surface 2235 Reflection type polarizer.It is anti-that optical system 2200 includes being arranged in the face of part reflector Penetrate on formula polariser or be arranged in four points on the part reflector of reflection type polarizer One of ripple delayer.Reflection type polarizer about orthogonal axle (such as, x-and y-axle) towards Diaphragm surface 2235 is protruded.Part reflector can be substantially flat maybe can protruding or recessed Enter.Show the three beams light of three positions on imaging surface 2230.Light in each bundle Line is substantially parallel at diaphragm surface 2235.Light can be mainly from diaphragm surface 2235 row Enter imaging surface 2230 (such as, in camera applications), or can be mainly from imaging surface 2230 advance to diaphragm surface 2235 (such as, in a display application).

Figure 23 is the sectional view of optical system 2300, including the first lens 2312, Optical stack 2320 (including the second lens 2322), Optical stack 2360 (including the 3rd lens 2362), Imaging surface 2330 and diaphragm surface 2335.Optical stack 2320 includes being arranged in the second lens The part reflector and including on the first type surface on diaphragm surface 2335 of 2322 is arranged in the The reflection type polarizer on the first type surface of imaging surface 2330 of three lens 2362.Optics System 2300 includes being arranged on the reflection type polarizer of part reflector or arranging At the quarter-wave delayer on the part reflector of reflection type polarizer.Reflective partially Shake device and part reflector each about orthogonal axle (such as, x-and y-axle) towards image table Face 2330 is protruded.Show the three beams light of three positions on imaging surface 2330. Light in each bundle is substantially parallel at diaphragm surface 2335.Light can be mainly from diaphragm Surface 2335 advances to imaging surface 2330 (such as, in camera applications), maybe can lead Diaphragm surface 2335 (such as, in a display application) is advanced to from imaging surface 2330.

Figure 10 is the sectional view of reflection type polarizer 1027, and reflection type polarizer 1027 has Summit 1057 and about two orthogonal axles (such as, x-axle and y-axle) bend.Reflective Polariser 1027 has at least one primary importance 1052, and it is away from the optical axis through summit 1057 1040 have radial distance r1 and away from the plane being perpendicular to optical axis 1040 at summit 1057 1057 (being parallel to x-y plane) had displacement s1.Ratio s1/r1 is at least 0.1 or at least 0.2, and can be less than 0.8 or less than 0.6.Such as, in some embodiments, s1/r1 exists In the range of 0.2-0.8 or in the range of 0.3-0.6.Reflection type polarizer 1027 has at least One second position 1054, it has radial distance r2 and anomaly face 1057 away from optical axis 1040 There is displacement s2.In some embodiments, s2/r2 is at least 0.3, and can be less than 0.8. Reflection type polarizer 1027 has diameter D and maximum rise Sm.

In some embodiments, reflection type polarizer about optical axis 1040 rotationally symmetrical or base In basis rotationally symmetrical.If the azimuthal variation of the shape of film or parts is no more than about 10%, then Film or parts can be described as the most rotational symmetric.In the embodiment of Figure 10 and Figure 11, Azimuthal variation refers to the side about the optical axis 1040 or 1140 through summit 1057 or 1157 The change of parallactic angle coordinate.In some embodiments, the azimuthal variation in s1/r1 is less than 10%, Or less than 8%, or less than 6%, or less than 46%, or less than 2%, or less than 1%, or It is even less than 0.5%.One or more positions 1052 can be to have being total to away from optical axis 1040 With the position ring of radial distance r1, and the most one or more position 1054 can be to have The position ring of the common radial distance r2 away from optical axis 1040.If the azimuthal variation of film shape The least to such an extent as to film can be molded as rotational symmetric lens and not make film wrinkling, then film is permissible Say it is rotational symmetric.If the azimuthal variation of the shape of film or parts be no more than about 1% or No more than about 0.5%, then film or parts can be described as the most rotational symmetric.Coordinate s1 and R1 limits the region A1 of reflection type polarizer 1027, and it has less than r1 away from optical axis 1040 Radial distance, or along light wheelbase summit 1057, there is the distance less than s1.

Figure 11 is the front view of reflection type polarizer 1127, and it can correspond to reflection type polarization Device 1027.Reflection type polarizer 1127 is about two orthogonal axles (such as, x-axle and y-axle) Bend and have summit 1157 and the optical axis 1140 (being parallel to z-axis) through summit 1157. Reflection type polarizer 1127 can be polymeric multilayer reflective formula polariser and have on summit At least one of which of substantially uniaxial orientation at 1157.Such as, least one layer of orientation can be Such as the y-direction indicated by arrow at summit 1157.This direction can also be reflective partially Shake the stop direction of device 1127 and orthogonal direction (x-direction) can be reflection type polarizer The axis of homology.Reflection type polarizer 1127 is also included within and least one layer of leaves optical axis 1140 extremely At a few primary importance 1153 the most optically biaxial and leaving at least one of optical axis At least one of which the most optically uniaxial at the second position 1152.

Polymeric multilayer optical film can be with hot forming to provide reflection type polarizer 1127.Blooming Initially can have at least one of which of the uniaxial orientation of block axis along y-direction.In hot forming Cheng Zhong, blooming stretches with the shape adapting to hot forming instrument.Blooming is stretched, because scheduling to last The shape hoped is about two orthogonal bending shafts.In contrast, blooming need not stretch with suitable Should be only about the shape of a bending shaft.Hot formed process can stay in the second position 1152 Locate substantially uniaxial orientation blooming (because film in heat forming processes on this edge, position Orientation direction stretches), but cause due to blooming during in hot forming in primary importance 1153 It is biaxially oriented that stretching produces.Block axis at first and second positions 1153 and 1152 is passed through The arrow instruction of those positions.Block axis moves α degree at primary importance 1153.The axis of homology Can be orthogonal with block axis and α degree can be moved at primary importance 1153.Some embodiment party In case, the maximum change of the axis of homology (or block axis) of reflection type polarizer 1127 is in reflection In the whole region of formula polariser or on the reflection type polarizer region limited by s1 and r1 or The reflection hole of reflection type polarizer is less than about 5 degree, or less than about 3 degree, or less than about 2 degree, or less than about 1.5 degree, or less than about 1 degree, wherein s1 and s2 as reflective partially Shake described in device 1027.Reflection hole refers to the reflection of the reflection type polarizer that optical system uses Part.Reflection hole can be that the most whole region of reflection type polarizer maybe can be got rid of The part on the border of the close reflection type polarizer of reflection type polarizer.The maximum change of the axis of homology May determine that as between the axis of homology and fixing direction (such as, the x-direction in Figure 11) Maximum angle difference deducts the minimum angles difference between the axis of homology and fixing direction.

Any reflection type polarizer in any optical system described herein can be Linear reflective formula polariser, it may be adapted to reflect light and the transmission tool with First Line polarization state There is the light of second linear polarization orthogonal with First Line polarization state.

Any reflection type polarizer in any optical system of this specification can be heat The reflection type polarizer shaped, it can be hot formed polymeric multilayer optical film.Polymer Multi-layer optical film can include multiple the first and second polymeric layers alternately.This display is at Figure 12 In, it is to include the first polymeric layer 1272 alternately and the reflection of the second polymer layer 1274 The side view of formula polariser 1227.X-in outer (thickness) the z-direction of plane and orthogonal plane With y-hand designations in the drawings.Suitably polymeric multilayer reflective formula polariser is described in such as beautiful State's patent No.5,882,774 (Jonza etc.) and United States Patent (USP) No.6,609,795 (Weber etc.) In.

In some embodiments, in the first and second polymeric layers 1272 and 1274 at least One layer can some positions in layer be substantially uniaxial orientation.In some embodiments In, multi-layer optical film has at length direction (such as, x-direction) and thickness before hot forming The refractive index in direction (such as, z-direction) is substantially the same, but with width (such as, Y-direction) the substantially different at least one of which of refractive index.In some embodiments, multilamellar Blooming be film that substantially single shaft draws before hot forming and have at least 0.7 or at least 0.8, Or the horizontal U of uniaxial character of at least 0.85, wherein U=(1/MDDR 1)/(TDDR^1/2– 1), MDDR is defined as machine direction draw ratio and TDDR is defined as cross directional stretch ratio.This The multi-layer optical film of uniaxial orientation is described in United States Patent (USP) No.2010/0254002 (Merrill etc.) In, it is from there through being incorporated herein by reference reaching the degree that it does not conflicts with this specification.At it In its embodiment, multi-layer optical film is the most not single shaft drawing before hot forming.

The multilayer reflective polariser of uniaxial orientation includes APF (Advanced Polarizing Film, obtains from 3M Company).APF includes multiple the first and second polymerizations alternately Nitride layer, the length direction (such as, x-direction) of the first polymeric layer and thickness direction is (such as, Z-direction) refractive index substantially the same, but with the folding in width (such as, y-direction) Penetrate rate substantially different.Such as, the absolute value of the refractive index difference in x-and z-direction can be less than 0.02 or less than 0.01, and the absolute value of the refractive index difference in x-and z-direction can be more than 0.05 Or more than 0.10.APF be have block axis in the width direction and along its length pass through axle Linear reflective formula polariser.Any reflective in any optical system of this specification Polariser can be hot formed APF.Unless differently illustrating, refractive index refers to wavelength 550 Refractive index at nm.

Non-uniaxial orientation reflection type polarizer be DBEF (Dual Brightness Enhancement Film, from 3M Company, St.Paul, MN obtain).DBEF is permissible There is the refractive index of width, length and thickness direction and be about the of 1.80,1.62 and 1.50 respectively One layer, and APF can have the refractive index of width, length and thickness direction be about 1.80 respectively, The ground floor of 1.56 and 1.56.APF and DBEF can have substantially isotropism The second layer.In some embodiments, optical system can use DBEF as reflective Polariser, and in some embodiments, optical system can use APF as reflective Polariser.In other embodiments, it is possible to use the multilamellar beyond DBEF or APF Polymeric reflective formula polarizer film.APF have been surprisingly found that and about two is just being thermoformed into The improvement being better than DBEF is provided during the shape that the crown of roll handed over goes out.Such improvement shows being used for The off-axis color of higher contrast and reduction is included time in device system.Other improvement includes transmission Axle and the change of the axial reduction of stop.

DBEF and APF is the multilayer reflective polariser including layer alternately.Other is anti- The formula polariser of penetrating may be used in the optical system of this specification.In some embodiments, instead The formula polariser of penetrating is wire-grid polarizer.This display is in Figure 13 A-13B, and it is to include cloth respectively The diagrammatic top of the wire-grid polarizer 1327 putting the wire-grid layer 1375 in transparent substrates 1370 regards Figure and side view.About two orthogonal axles (such as, this wire-grid polarizer can be thermoformed into X-and y-axle) shape that bends.Wire-grid layer 1375 includes multiple along reflection type polarizer Stop the metal wire arranging (before hot forming) in the parallel columns that direction (y-direction) extends Or metal trace.

In some embodiments, instead of using the wire grid polarization of the wire-grid layer included on basal layer Device, wire-grid polarizer is formed on the surface of the lens by deposited metal traces on the surface of the lens.

In some embodiments, optical system include part reflector, reflection type polarizer and The the first quarter-wave delayer being arranged between reflection type polarizer and part reflector.Portion Point reflector and reflection type polarizer can be located adjacent one another and be spaced apart from each other.Optical system is permissible Including imaging surface and diaphragm surface, wherein part reflector is arranged in imaging surface and apertured sheet It is arranged between diaphragm surface and part reflector with reflection type polarizer between face.Image source can Can be emergent pupil to comprise imaging surface and diaphragm surface, or scanner-recorder can wrap Can be entrance pupil containing imaging surface and diaphragm surface.Image source can include can transparent or Translucent display pannel and image source may further include shutter.In some embodiments In, imaging surface may be adapted to receive the light reflected from the object outside optical system.Part is anti- Emitter have in desired or predetermined multiple wavelength at least 30% average light reflectance and The average light transmission rate of at least 30% can also be had in desired or predetermined multiple wavelength. Desired or predetermined multiple wavelength can include one or more continuous wavelength scope.At some In situation, it is desirable to or predetermined multiple wavelength can be visible wavelength range (such as, 400 nm-700nm).Average light reflectance in desired or predetermined multiple wavelength is with average Light transmission can be such as between 30%-70% or between 40%-60%.1st/1st Ripple delayer and any optional other quarter-wave delayer can be desired or The predetermined quarter-wave delayer at least one wavelength in multiple wavelength.1/4th Ripple delayer can be oriented so that the fast axle transmission relative to reflection type polarizer of delayer Or block axis is with 45 degree of orientations.Reflection type polarizer is about the first and second orthogonal bending shafts. Optical system can include the multiple surfaces (example being arranged between imaging surface and diaphragm surface As, the first type surface of one, two, three or more optical lens see, e.g., Fig. 1,2,5-9) and reflection type polarizer, the first quarter-wave delayer and partially reflective Device can be arranged on the one or more surfaces in multiple surface.Any in multiple surfaces or All surface can have the shape described by aspheric surface multinomial rise equation.Optical system Can meet following condition condition any, following any 2,3,4,5,6 or 7 The combination planted or all following conditions:

I () reflection type polarizer and part reflector are each along the first and second orthogonal axle courts Protrude to imaging surface；

(ii) reflection type polarizer is multiple layer polymer reflection type polarizer, and it is included in and leaves light At least one first position least one layer of of axle is the most optically biaxial and is leaving optical axis The most optically uniaxial at least one of which of at least one second position, and pass through imaging surface With any of diaphragm surface or substantially any chief ray with less than about 30 degree or less than about 25 degree Or the incident angles of less than about 20 degree is in each first Optical stack and the second Optical stack；

(iii) image source comprises imaging surface, and image source launches undistorted image, part reflector There is the first shape and reflection type polarizer has the second different shapes so that diaphragm surface The distortion of launched undistorted image of transmission is less than about the 10% of visual field, diaphragm surface；

(iv) at least there are first and second at a distance of at least 150nm in visible wavelength range Wavelength and being existed by any of imaging surface and diaphragm surface transmission or substantially any chief ray Diaphragm surface have less than visual field, diaphragm surface 1.5% or less than 1.2% or less than 20 The color separation distance that arc divides or divides less than 10 arcs；

V () reflection type polarizer is about the rotational symmetric hot formed multilayer reflective of optical axis Polariser.Reflection type polarizer can be such as APF or DBEF, or can be that wiregrating is inclined Shake device；

(vi) optical system provides adjustable prescription (dioptric) correction.Prescription correction can With by distance adjustable between reflection type polarizer and part reflector and/or be arranged in figure The shape of the lens between picture and diaphragm surface provides；

(vii) reflection type polarizer has the optical axis tool away from the summit through reflection type polarizer There is radial distance r1 and there is displacement s1 at least away from the plane being perpendicular to optical axis at apex One primary importance.Ratio s1/r1 is at least 0.1 or at least 0.2, and can less than 0.8 or Less than 0.6；With

(viii) image source comprises imaging surface, and the contrast of diaphragm surface is in optical system Visual field at least 40 or at least 50 or at least 60 or at least 80 or at least 100.

In any optical system of this specification, any part reflector of effect can be in the phase That hope or predetermined multiple wavelength have the average light reflectance of at least 30%, and/or permissible There is in desired or predetermined multiple wavelength the average light transmission rate of at least 30%.Desired Or predetermined multiple wavelength can be desired or predetermined wavelength range can be maybe multiple phase Hope or predetermined wavelength range.Any optical system of this specification can include one or many Individual delayer, it is four at least one wavelength in desired or predetermined multiple wavelength / mono-ripple delayer.Desired or predetermined multiple wavelength can e.g. design of Optical System For any wave-length coverage run wherein.Predetermined or desired multiple wavelength can be visible Optical range, and can the wave-length coverage of e.g. 400nm-700nm.In some embodiments In, it is desirable to or predetermined multiple wavelength can be that infra-red range maybe can include one or more Infrared, visible ray and ultraviolet wavelength.In some embodiments, it is desirable that or predetermined multiple Wavelength can be arrowband or multiple arrowband, and part reflector can be trap reflector.One In a little embodiments, it is desirable to or predetermined multiple wavelength include that full width at half maximum is less than 100nm Or at least one the continuous wavelength scope less than 50nm.

In any optical system described herein, unless context clearly has different instructions, Image source can comprise imaging surface and diaphragm surface can be emergent pupil, its may be adapted to The entrance pupil of the second optical system is overlapping.The entrance pupil of the second optical system can be e.g. The entrance pupil of observer.In any optical system described herein, unless context is clear and definite Having different instructions, scanner-recorder can comprise imaging surface and diaphragm surface can be incident Pupil.

Any optical system of this specification can have substantially planar imaging surface and/or Substantially planar diaphragm surface, or one or both of these surfaces can bend.Image table Face can have maximum transverse size A, and diaphragm surface can have maximum transverse size B, Wherein A/B is at least 2 or at least 3 or at least 4 or at least 5.In some embodiments In, A/B can be such as in the range of 2-20 or 3-10.

Any optical system of this specification can have at least 80 degree, at least 90 degree or at least The visual field of 100 degree.Any optical system of this specification is adapted to so that passing through apertured sheet At least one chief ray of face and imaging surface transmission can with at least 40 degree or at least 45 degree, Or at least 50 the angle of incidence of degree by diaphragm surface.

In some aspects of this specification, it is provided that include any one of this specification or many The device of individual optical system.This device can include or not include such as display equipment or wear Formula display or optical projection system, illumination apparatus, its can also be projector, beam expander, camera or Amplifying device.Amplifying device can be such as telescope, binocular or microscope.

In some embodiments, reflection type polarizer is hot formed.Blooming is the most reflective Polariser can have anisotropic mechanical properties, this heat one-tenth making it possible to obtain intended shape The blooming of shape, it is due in blooming anisotropy of blooming after hot-forming die removes Shrink and be difficult to obtain.Anisotropic mechanical properties can be due at reflection type polarizer at least In some layers polymer molecule anisotropy orientation and at multiple layer polymer reflection type polarizer Middle generation.The surface of polymeric film comprises the anisotropy machine of the wire-grid polarizer of metal wire Tool performance can produce due to the anisotropy of metal wire that may extend in one direction.Press According to this specification, it has been found that provide when blooming has anisotropic mechanical properties and there is expectation The method of blooming of shape.

Figure 15 is the method 1580 that diagram makes the desired blooming with desired shape Schematic flow diagram, comprises the following steps: (i) (step 1582) provides outer surface to have difference Hot forming instrument in the first shape of desired shape；(ii) (step 1584) heating optics Film and produce the blooming of softening；(iii) (step 1586) makes the blooming of softening adapt to tool There is the outer surface of the first shape (such as, to scheme along the first and second the most orthogonal directions simultaneously X-and the y-direction of 16) blooming of tensile softening and produce the adaptation light with the first shape Learn film；(iv) (step 1588) cools down adaptive optics film and produces and have desired shape Desired blooming.Cooling step can include discharging blooming from instrument.Such as, at some In embodiment, blooming removes from instrument and is allowed to cool.In some embodiments, should Method further includes at and moulds (such as, film inserts molding) optical lens on blooming and produce The step of raw Optical stack.

In some embodiments, it is desirable that blooming be have anisotropic mechanical properties appoint What blooming and can be any reflection type polarizer described herein.In some embodiments In, it is desirable to blooming be the anti-of the reflection type polarizer with quarter-wave coating or lamination Penetrate formula polarizer film and quarter-wave delayer film.Desired shape can be about blooming Optical axis (such as, being parallel to the z-direction of Figure 16) rotational symmetric shape.Blooming Optical axis can be consistent with the optical axis of the Optical stack including blooming.

Figure 16 is the schematic cross-section of the hot forming instrument 1681 being suitable for thermo formed optical film Figure.Hot forming instrument 1681 includes having outer surface 1685 and be arranged on base portion 1687 Dome part 1683.Outer surface 1685 can such as have a part of ellipsoidal shape.Ellipse Circle can have the ratio of major diameter and minor axis and major diameter and minor axis can be such as 1.01-1.1's In the scope of scope or 1.01-1.05.It has been found that such as according to method 1580 at this ellipse On body instrument, hot forming reflection type polarizer film can be when removing film from instrument and make film cool down Rotational symmetric reflection type polarizer is provided.

(it can be included in any light of this specification to any reflection type polarizer of this specification In system) can be according to method 1580 and/or use hot forming instrument 1681 hot forming.Instead Penetrate formula polariser and other blooming can such as be closed by injection in inserting molding process at film Suitable lens material (such as, Merlon) is to being integrated into the light including optical lens on film Learn in stacking.

Any optical system of this specification may be used for as head mounted display is (such as, virtual Reality displays) or the device of camera (camera such as, being placed in mobile phone) in.Figure 17 It is to include framework the 1792, first and second display part 1794a and 1794b, camera 1796 Top schematic view with the head mounted display 1790 of ocular pursuit unit 1798.First and second Display part 1794a and 1794b include outer surface 1782a and 1782b respectively and wrap respectively Include inner surface 1784a and 1784b.Camera 1796 includes outer surface 1786 and inner surface 1788. First and second display parts 1794a and 1794b each can include that comprising this specification appoints The display pannel of the imaging surface of what optical system, the diaphragm surface of optical system be adapted for The emergent pupil that the entrance pupil of user is overlapping.Such as, the first display part 1794a (and For second display part 1794b similarly) imaging surface 130 and optical system can be included First and second Optical stack 110 and 120 of system 100.Imaging surface 130 can be adjacent to outward Surface 1782a arranges and diaphragm surface 135 can be positioned at the first display part towards observer 1794a outer (from inner surface 1784a along negative z-direction).In some embodiments, permissible The single display device panel crossing over part 1794a and 1794b is used to replace the display face separated Plate.

The camera 1796 that can be optionally omitted can include any optical system of this specification System, wherein diaphragm surface is the entrance pupil of optical system and scanner-recorder includes image table Face.Such as, camera 1796 can include the first and second Optical stack of optical system 100 110 and 120.Imaging surface 130 can be the scanner-recorder that adjacent inner surface 1788 is arranged Surface, and diaphragm surface 135 can arrange with adjacent outer surface 1786 or may exit off observation It is outer (from outer surface 1786 along positive z-direction) that person is positioned at camera.

Head mounted display 1790 can include three optical systems of this specification.At other In embodiment, the only one of this specification or two optical systems are included in head mounted display In.Such as, in some embodiments, head mounted display can include the list of this specification Individual optical system provides image to eyes of user, and another eyes have user The unobstructed view of environment.In other embodiments, can include this specification more than three Individual optical system.For example, it is possible to include two lists each including the optical system of this specification Unit is to provide three-dimensional view to user or to provide multiple view (such as, picture-in-picture) and two Display unit such as Figure 17 uses.

Head mounted display 1790 can include the eyeball tracking comprising eyeball tracking unit 1798 System, it can optionally omit.This system can utilize sensor and processor monitoring to use The diameter of person's pupil and position.From the display pannel being included in Part I 1798 Light can be from the pupillary reflex of user with from the optical system being arranged in Part I 1798 Reflection type polarizer reflex in eyeball tracking unit 1798.Or eyeball tracking unit 1798 can include the light source (example launching light towards the reflective parts in Part I 1794a As, infrared light supply), it is towards the eye reflections of observer.This light is then from eye reflections It is reflected back eyeball tracking unit 1798 with the reflective parts from Part I 1794a.

The attribute of the eyes that eye monitoring system can detect can include one or more of: eye The view direction of eyeball, the diameter of pupil and the change of diameter, the blinking of eyelid, ocular pursuit target And saccade.Ocular pursuit parameter can include speed that eye rotates and object of which movement eye movement it Between delay or phase place.Saccade can include persistent period, speed and the pattern of motion.System System can consider environment light condition fatigue based on pupillary reaction quantization system user and cognition Machining load and can be personalized for user based on historical data.

In some embodiments, eyeball tracking unit includes camera (such as, R-G-B (RGB) camera or infrared (IR) camera), it can include or not include this specification Optical system and the image of eyes can be captured.IR camera may be used for measuring environment light condition, Because the average IR brightness of eye image is the instruction of ambient light level.

In some embodiments, head mounted display 1790 includes being adapted to detect for pupil size Change and use fatigue and the eyeball tracking of Cognitive Processing load of this information quantization user System.In some embodiments, head mounted display 1790 is suitable to (such as, use Embed the algorithm on processor) perform one or more or all following steps:

Step 1: the gray level image of capture eyes.

Step 2: filter noise (such as, using Gaussian filter).

Step 3: calculate gradient amplitude and the direction of each pixel in eye pattern picture.

Step 4: (they are likely to the limit of object to differentiate have the pixel of high gradient magnitude Edge).

Step 5: by such as by the pixel that differentiates in a previous step according to people's visually-perceptible The connection of Helmholtz principle differentiates edge.

Step 6: compare edge line fragment and the ellipse limited by polynomial equation or other The equation of shape.Minimum ellipse sample shape can be pupil.The region of iris can also determine And may be used for improving precision.Can eliminate and may such as dodge by other elliptical shape in the picture Light.

Step 7: calculate pupil based on the distance between line matching and eyes and the camera carried out before Hole size (such as, diameter or area).

Step 8: the pupil size calculated is determined and applies Dynamic gene to consider environment Rhizoma Dioscoreae (peeled) Part.Environment light condition can use the other sensor being included in head-mounted system or pass through The Luminance Analysis of capture image measures.

Step 9: optionally store the pupil size of adjustment in data base.Pupil size is permissible Record in time and can store as time series (sequence of data points carried out in time).

Head mounted display 1790 may be adapted to based on using eyeball tracking unit 1798 to measure Pupil size and/or pupil directional information change by the first and second parts 1794a and 1794b In display pannel produce light intensity.Eyeball tracking system is configurable to detect virtual graph In Xiang, position and the optical system of user viewing may be adapted to adjust virtual image distance with logical The part coupling crossing one or more lens in the optical system described elsewhere herein is vertical The degree of depth of the object that somascope presents.

In some embodiments, head mounted display 1790 is configured so that prescription lens can It is attached with adjacent inner surface 1784a and/or 1784b.

In some embodiments of this specification, it is provided that include the optical system of this specification Device.The example of this device is that head mounted display such as includes of this specification or many The head mounted display 1790 of individual optical system.Figure 24 A is the dress including optical system 2400 Put the top schematic view of 2490.Optical system 2400 includes reflection type polarizer 2427, part Reflector 2417 and be arranged in reflection type polarizer 2427 and the first quarter-wave delayer The first quarter-wave delayer 2425 between 2425.Reflection type polarizer 2427, part Reflector 2417 and the first quarter-wave delayer 2425 can correspond to other ground herein Side describe reflection type polarizer, part reflector or quarter-wave delayer in any one. Such as, in some embodiments, reflection type polarizer 2427 is polymeric multilayer reflective formula Polariser (such as, APF) and in some embodiments, reflection type polarizer 2427 is Wire-grid polarizer.Reflection type polarizer 2427 can be about the first and second orthogonal bending shafts And desired shape can be thermoformed into.Part reflector 2417 can be about orthogonal first With the second bending shaft and can be flat alternatively or about only one bending shaft.Similarly, One quarter-wave delayer 2425 can be about orthogonal the first and second bending shafts or permissible It is flat alternatively or about only one bending shaft.Reflection type polarizer 2427, part reflector 2417 and first quarter-wave delayer 2425 can be arranged in and describe elsewhere herein One or more lens surface on.

Device 2490 can be such as display equipment, beam expander, camera or amplifying device such as Telescope, microscope, binocular etc..In the case of binocular or head mounted display, can To include more than an optical system 2400.For example, it is possible to include two optical systems 2400 (each one of each eyes), the example including the device of two optical systems shows at Figure 24 C In.In a display application, optical system 2400 can be orientated with part reflector 2417 Image processing system (such as, display pannel) in the face of display.In camera applications, Optical system 2400 can be orientated with reflection type polarizer 2427 in the face of the entrance pupil of camera And with part reflector 2417 in the face of object to be seen or environment.The light of optical system 2400 Door screen surface may be adapted to receive the hole of the light of the object reflection from optical system 2400, and The imaging surface of optical system 2400 can be the surface of scanner-recorder.At telescope, show In micro mirror and binocular application, optical system 2400 may be used for object lens (objective) part In device or may be used for having the reflection type polarizer in the face of observer in either case In the eyepiece (eyepiece) of device.The imaging surface of optical system 2400 may be adapted to receive The light of the object reflection from optical system 2400, and the diaphragm surface of optical system 2400 can To be adapted for the emergent pupil overlapping with the pupil of observer.

Figure 24 B is showing of the display equipment 2490b of the optical system 2400 including Figure 24 A Meaning top view.Display equipment 2490 includes that transparent or semitransparent display pannel 2431 is with fast Door 2493.As described in other is local in this article, transparent or semitransparent display pannel 2431 Can e.g. OLED or LCD, and shutter 2493 can e.g. PDLC shutter. Display pannel 2431 is shown as orienting reflex formula polariser 2417 and protrudes.Other embodiment party In case, display pannel 2431 can protrude with orienting reflex formula polariser 2417.Other In embodiment, display pannel 2431 can be flat or the most flat (and can to have There is substantially planar imaging surface).Display pannel 2431 (and imaging surface) can close In two orthogonal bending shafts or can be about only one bending shaft.Shutter 2493 can have The shape identical from display pannel 2431 or different shapes.Shutter 2493 can be about two Individual orthogonal bending shaft or about only one bending shaft can be substantially maybe flat (or substantially Plane).Shutter 2493 may be used for allowing ambient light enter optical system 2400 or stop Ambient light enters optical system 2400.Display equipment 2490b can include being arranged in optical system Optional other polariser 2468 between system 2400 and display pannel 2431.Optional Other polariser 2468 can be linear polarizer and can be reflection type polarizer or absorb partially Shake device.In some embodiments, optional other polariser 2468 and permissible is not included Including the parts for such as display pannel 2431.The polariser 2468 of optionally other is permissible As directed the most flat or can be about an axle or about two orthogonal bending shafts.

Figure 24 C is to include the first optical system 2400-1 in eyepiece part 2497-1 and include The diagrammatic top of the device 2490c of the second optical system 2400-2 in eyepiece part 2497-2 regards Figure.Device 2490c can be such as binocular or microscope.First optical system 2400-1 Including reflection type polarizer 2427-1, part reflector 2417-1 be arranged in reflection type polarization Quarter-wave delayer between device 2427-1 and quarter-wave delayer 2425-1 2425-1.Second optical system 2400-2 includes reflection type polarizer 2427-2, part reflector 2417-2 and be arranged in reflection type polarizer 2427-2 and quarter-wave delayer 2425-2 it Between quarter-wave delayer 2425-2.Reflection type polarizer 2427-1 and 2427-2, portion Point reflector 2417-1 and 2417-2 and quarter-wave delayer 2425-1 and 2425-1 can With corresponding to any reflection type polarizer as described in other is local in this article, part reflector Or quarter-wave delayer.Reflection type polarizer 2427-1 and 2427-2 can be about orthogonal The first and second bending shafts and desired shape can be thermoformed into.Part reflector 2417-1 Can also be optionally about the first and second orthogonal bending shafts or can be such as institute with 2417-2 Show is flat or about only one bending shaft.Similarly, quarter-wave delayer 2425-1 Can be about the first and second orthogonal bending shafts or can as directed be flat with 2425-2 Or about only one bending shaft.Reflection type polarizer 2427-1 and 2427-2, partially reflective Device 2417-1 and 2417-2 and quarter-wave delayer 2425-1 and 2425-2 can arrange On the surface of the one or more lens as described in other is local in this article.

Device 2490c includes object lens part 2499-1 and object lens part 2499-2.Object lens part 2499-1 and 2499-2 is suitable to the object in the face of observing and eyepiece part is suitable in the face of observer's Eyes.The image table of optical system 2400-1 (and for optical system 2400-2 similarly) Face can be between part reflector 2417-1 and object lens part 2499-1, can be at objection lens portion In point 2499-1 or can be between eyepiece part 2497-1 and object lens part 2499-1.Optics The diaphragm surface of system 2400-1 (and for optical system 2400-2 similarly) can be suitable In the emergent pupil overlapping with the pupil of user.

Object lens part 2499-1 can comprise one or more optical lens 2491-1 and objection lens portion Divide 2499-2 can comprise one or more optical lens 2491-2.In the embodiment substituted In, it is provided that eyepiece part 2497-1 and object lens part 2499-1 and be not used as telescope or aobvious Eyepiece part 2497-2 of micro mirror and object lens part 2499-2.

Figure 25 is device 2590a and the schematic side of illumination apparatus 2502a including device 2590 Figure, device 2590a can include any optical system described herein, and illumination apparatus 2502a Including polarization beam splitting system 2504a.Device 2590a can such as be described as illumination apparatus and permissible It it is such as compact projection systems.Polarization beam splitting system 2504a include polarization beam apparatus 2500a and First and second reflective parts 2532a and 2534a.Illumination apparatus 2502a farther includes light Source 2550a.The polarization beam apparatus 2500a that can correspond to polarization beam apparatus 100 includes first With the second prism 2510a and 2520a and reflection type polarizer 2530a.First prism 2510a Including input face 2512a, output face 2514a and the first hypotenuse 2516a.Input face 2512a There is input effective coverage 2513a and output face 2514a there is output effective coverage 2515a. Device 2590 has maximum acceptance region 2543a.Second prism 2520a has imager face 2524a and the second hypotenuse 2526a.It is oblique that reflection type polarizer 2530a is arranged in first and second Between 2516a and 2526a of limit.Light source 2550a produces has envelope light 2552a and center The light beam of light 2556a, its restriction has first, second, third and fourth sections 2557a-1 Folding optical axis 2557a to 2557a-4.First reflective parts 2532a is adjacent to polarization beam splitting Device 2500a is positioned opposite with light source 2550a, and the second reflective parts 2534a is neighbouring partially The beam splitter 2500a that shakes is positioned opposite with device 2590.

In some embodiments, the first prism 2510a has the first volume, the second prism 2520a has the second volume, and the first volume be not more than the second volume only about half of (or not Greater than about 60% or no more than about 40%).

Device 2590 can be beam expander and can correspond to device 2490.Device 2590 is permissible Including reflection type polarizer, part reflector be arranged in reflection type polarizer and part reflector Between the first quarter-wave delayer.When as beam expander, device 2590 can be fitted In receiving the input light being incident on part reflector and the output beam of transmission extension.Such as, Input beam can be assembled or collimate, and output beam can dissipate, or input beam is permissible There is first angle of divergence and output beam can have the second bigger angle of divergence.Device 2590 May be oriented such that part reflector is in the face of illumination apparatus 2502a.Other polariser is (such as, Other reflection type polarizer or absorptive polarizers) device 2590 and output face can be arranged in Between 2514a, or part reflector can be relatively close to reflection type polarizer and be included in dress Put in 2590.Illumination apparatus 2502a can provide compact illumination system and device 2590 to use Make beam expander to provide broader visual field.Other illumination apparatus that may be used for device 2590 describes U.S. Provisional Application No. in entitled " illumination apparatus " that on June 30th, 2015 submits to In 62/186944, it is incorporated herein by reference and does not conflicts with this specification reaching it herein Degree.Device 2590 can be to include that located adjacent one another and spaced apart part reflector is with anti- Penetrate the beam expander of formula polariser, and beam expander may be adapted to receive and is incident on part reflector Converging light and by reflection type polarizer transmission diverging light.

Second reflective parts 2534a has maximum effective coverage 2536a.Second reflective portion Part 2534a can be image processing system and maximum effective coverage 2536a can be that image is formed The maximum image region of device.The light the second reflective parts 2534a from envelope 2554a sends out Penetrate (such as by being reflected).One of first and second reflective parts 2532a and 2534a Or both can have the specular reflectivity more than 70% or more than 80% or more than 90%.First And/or second reflective parts 2532a and 2534a can be flat or can be one or more Bending shaft.

In some embodiments, the second reflective parts 2534a is suitable to modulate incidence thereon Light.Such as, the second reflective parts 2534a can be the polarization that reflection has spatial modulation The image processing system of the light of state.Second reflective parts 2534a can be with pixelation and can produce The light of raw patterning.The light of the second reflective parts 2534a reflection from envelope 2554a can To be the light of the patterning assembled.Can serve as the suitable figure of the second reflective parts 2534a Include that liquid crystal covers silicon (LCoS) device as forming device.LCoS device can be flat or can With at one or more bending shafts.

In Figure 25, all parts is shown as spaced apart to reach to understand the purpose of diagram.But, It should be understood that all parts can the most directly be contacted or be attached by optically transparent binding agent.? In some embodiments, reflection type polarizer 2530a uses the attachment of optically transparent adhesive phase In one or both of first and second prism 2510a and 2520a.In some embodiments, Device 2590 uses optically transparent binding agent to attach to output face 2514a.Some embodiment party In case, light source 2550a can abut directly against with input face 2512a maybe can pass through optical clear Adhesive phase attach to input face 2512a.In some embodiments, first and/or second Reflective parts 2532a and 2534a can use optically transparent binding agent to attach to the second rib Mirror 2520a.Reflection type polarizer 2530a can be describe elsewhere herein any instead Penetrate formula polariser.In some embodiments, reflection type polarizer 2530a is polymer multi-layer Reflection type polarizer, wire-grid polarizer, MacNeille reflection type polarizer or cholesteric phase reflection Formula polariser.

Fold optical axis 2557a to include extending from light source 2550a (positive x-direction) in the first direction To first segment 2557a-1 of the first reflective parts 2532a, along contrary with first direction The second sections 2557a-2 that second direction (negative x-direction) extends, along third direction (negative y- Direction) the 3rd sections 2557a-3 that extends and along the fourth direction contrary with third direction (just Y-direction) fourth segment 2557a-4 that extends.First and second sections 2557a-1 and 2557a-2 Overlap, although they are shown as having closely-spaced the most for convenience of description.Similarly, Third and fourth sections 2557a-3 and 2557a-4 is overlapping, although they are the most for convenience Illustrate and be shown as having closely-spaced.First and second directions are with the third and fourth direction substantially Orthogonal.First reflective parts 2532a and first segment 2557a-1 perpendicular and second Reflective parts 2534a and the 3rd sections 2557a-3 perpendicular.

Light source 2550a produces the light beam with envelope, and this will input effective coverage 2513a limit It is set to the input face irradiated with the light of the light source 2550a used from illumination apparatus 2502a The region of 2512a.Light source 2550a can not produce the light outside envelope 2552a or The angle of any light produced outside this envelope makes it not enter dress from illumination apparatus effusion Put 2590.

It is saturating that at least some of light from light source 2550a passes sequentially through the first prism 2510a Penetrate, by reflection type polarizer 2530a transmission, by the second prism 2520a transmission, from One reflective parts 2532a is reflected, is returned by the second prism 2520a transmission, from reflective Polariser 2530a reflection, by the second prism 2520a transmission be incident on the second reflective portion In part 2534a, from the second reflective parts 2534a reflection, by the second prism 2520a and Reflection type polarizer 2530a and the first prism 2510a transmission and eventually through device 2590 from Open illumination apparatus.This shows in fig. 25 for central ray 2556a.In some embodiments In, the first reflective parts 2532a includes polarization rotator, and it can be that quarter-wave prolongs Device late.From light source 2550a, there is the polarization by axle along reflection type polarizer 2530a Light by reflection type polarizer 2530a transmission and then anti-from the first reflective parts 2532a It is emitted back towards reflection type polarizer 2530a.Wherein the first reflective parts 2532a include four/ In the embodiment of one ripple delayer, this light is when being reflected back reflection type polarizer 2530a two Secondary by quarter-wave delayer.The most this light has with reflection type polarizer 2530a's By axle substantially orthogonal to polarization and therefore to reflex to second from reflection type polarizer 2530a anti- Penetrating formula parts 2534a, its light that can launch (such as, reflection) spatial modulation returns to reflection Formula polariser 2530a.The light of spatial modulation can have the polarization of spatial modulation.Spatial modulation Light there is the part of the polarization by axle along reflection type polarizer 2530a lead to as image light Cross reflection type polarizer 2530a, leave the first prism 2510a by output effective coverage 2515a Illumination apparatus is left with by device 2590.

Illumination apparatus 2502a allows image by guiding light beam (in envelope 2552a) by folding Optical path illumination apparatus 2502a is on image processing system (the second reflective parts 2534a) Project with reflecting the light of the patterning assembled from image processing system.Guide light beam by folding The step of optical path illumination apparatus 2502a includes that direct light passes through polarization beam apparatus 2500a to One reflective parts 2532a, reflection at least some light returns to polarization beam apparatus 2500a and from partially The beam splitter 2500a that shakes reflection at least some light is to image processing system.At least some of convergence The light of patterning is by polarization beam apparatus 2500a with by device 2590 transmission.

From the light of light source 2550a from the first reflective parts 2532a and reflection type polarizer After 2530a reflection, light irradiates the maximum region of the second reflective parts 2534a.Or, Territory, high coverage 2536a can be the maximum district of reflexive second reflective parts 2534a Territory.Such as, the second reflective parts 2534a can be the image shape with maximum imaging region Become device.Any light being incident on the image processing system outside maximum image region can not Reflect to device 2590.In this case, maximum effective coverage 2536a is that image is formed The maximum imaging region of device.It is defeated that maximum effective coverage 2536a limits on output face 2514a Go out the maximum acceptance region 2543a of effective coverage 2515a and device 2590, because light is from maximum Effective coverage 2536a reflexes to the device 2590 in envelope 2554a, and it is substantially only in output Effective coverage 2515a irradiates output face 2514a and substantially only in maximum acceptance region 2543a Middle irradiation unit 2590.Illumination apparatus 2502a is configured so that from the second reflective parts 2534a Reflect and pass through the light in the envelope 2554a of device 2590 at the second reflective parts 2534a And assemble between device 2590.This causes less than output effective coverage 2515a, and (it is less than maximum Effective coverage 2536a) maximum effective coverage 2536a.

In some embodiments, input effective coverage 2513a and/or output effective coverage 2515a less than maximum effective coverage 2536a (it can be maximum image region) about 60%, Or less than about 50% (i.e., less than about half) or less than about 40% or less than about 35%. In some embodiments, the maximized surface region of input face 2512a (input face 2512a's The gross area) less than about half of maximum image region.In some embodiments, output face The maximized surface region (gross area of output face 2514a) of 2514a is less than maximum image region About half.

Any light source of light source 2550a or this specification can include one or more the most single The photocell of color.Such as, light source 2550a can include red, green and blue color light-emitting diodes Pipe (LED).Other color can also be included, such as cyan and yellow.Or or additionally, Wide spectrum (such as, white or substantially white) light source can be used.In some embodiments In, light source 2550a includes BLUE EMITTER and phosphor.In some embodiments, light source 2550a includes integrator (such as, the integrator that may be used for combining the light from discrete light source The light from red, green and blue color LED can be combined).Light source 2550a can include polarization Element so that the light with substantially unitary polarization state be directed in the first prism 2510a towards Reflection type polarizer 2530a.In some embodiments, light source 2550a can be or permissible Including one or more LED, Organic Light Emitting Diode (OLED), laser instrument, laser two Pole pipe, incandescence light-emitting component and arc light.Light source 2550a is except such as the light-emitting component of LED Lens can also be included outward, such as collecting lens.In some embodiments, the first or second rib Mirror can have the face of one or more bending to provide desired focal power.

The optical system of this specification can include or many with non-homogeneous edge contour Individual lens, this profile can be designed as fitting with face when as the parts of head mounted display Should.Lens can have the edge contour or permissible of the classification adapting to average face, face shape It is designed for individual face.

Figure 27 A is located at the saturating of the optical system 2700 of the head mounted display on head 10 View, the vertically profiling of head 10 is centered by right eye 12.The lens of optical system 2700 Space away from eyebrow or gap 18 and the space away from buccal or gap 16 are provided.Optical system 2700 include display pannel 2731 and can correspond to any optical system of this specification, Wherein display pannel can comprise the imaging surface of optical system.Figure 27 B is optical system The top view of 2700, the lens of optical system 2700 provide away from temporal gap 26 with away from nose The gap 28 of beam.

Figure 27 C is another top view of optical system 2700.Display pannel 2731 has to be sent out Pixel 34a of light, 34b and 34c, this light is by the eye of the lens focus of optical system to head In eyeball.Chief ray 38 from the light of pixel 34a is delivered to eyes with the angle of incidence of 46 degree. Lens subassembly 36 allows from the chief ray 40 of pixel 34c away from temporal larger gap with 60 The bigger angle of incidence of degree is delivered to eyes.

The gap of lens subassembly can produce in constituting the molding process of lens of lens subassembly. Or lens can use the suitable measurement of face to grind for individuality customization.For between lens Gap can limit the region of the visible display of user.In some embodiments, to control The computer of display pannel 2731 provides gap data and computer can limit display area Territory consumes and/or the visual artifacts of minimizing ghost image to the visible region of user such as to reduce.

The advantage providing the lens consistent amount of gap away from face is that ambient light can be effectively Block with image and remain adjacent to eyes and the circulation of sufficient air is provided.Use the saturating of optical system The extended surface of mirror can improve the comfortableness of visual field and user.

Embodiment

Embodiment 1

The optical system being similar to optical system 200 is modeled.Second quarter-wave delayer It is arranged on the second first type surface 216.Each table corresponding to surface 224,226,214 and 216 Face is taken as the aspheric surface described by equation 1, each multinomial coefficient D, E, F, G, H, I ... equal to zero.Constant of the cone k be 0.042435 and surface radius r=1/c be-36.82391 mm.The parameter describing Zhong Ge surface, these surfaces listed by table 1.

Table 1

Surface counting number in this table starts from diaphragm surface 235 (Surf.1) and terminates at figure The light of image surface 230 (Surf.8 or IMA) number of times from the teeth outwards.Surf.2 Corresponding to first surface 224, Surf.3 and Surf.5 corresponds to second surface 226, Surf.4 With Surf.6 corresponding to first surface 214, and Surf.7 is corresponding to surface 216.Diameter is Referring to the clear aperature on surface, EVANASPH refers to the (expansion of equation 1 of even aspheric surface In the even power of r only occurs), radius is the inverse of parameter c in equation 1, the circular cone side of being Parameter k and IMA in formula 1 refer to imaging surface 230.

First optical lens 212 is modeled as the Zenon E48R of refractive index 1.53, and the second light Learn lens 222 and be modeled as the Merlon of refractive index 1.585.Focal length is 32.26271mm, Visual field is 90 degree, and picture altitude is that (diameter of imaging surface 230 is 54.28 to 27.14mm Mm), F# is 2.13, and eye gap (from diaphragm surface to the distance of the first lens surface) is 23.8mm and eye box (diameter on diaphragm surface 235) are 15mm.

That launched by imaging surface and by each chief ray of diaphragm surface transmission at each key light With the incident angles of less than about 20 degree respectively when line is incident in the first or second Optical stack In first Optical stack and the second Optical stack.

Optical system has the visual field of 90 degree in diaphragm surface.By imaging surface and diaphragm The chief ray with wavelength 486nm and 656nm of surface transmission has in diaphragm surface The maximum color separation distance that 3.4 arcs divide, it is about the 0.12% of visual field, diaphragm surface.

Embodiment 2

The optical system being similar to optical system 200 is modeled.Second quarter-wave delayer It is arranged on the second first type surface 216.Each table corresponding to surface 224,226,214 and 216 Face is taken as the aspheric surface described by equation 1.Table 2 and 3 is listed in these surfaces of description each The parameter on surface.Term in table is similar to those in embodiment 1.In table 3, aspheric surface is many The unit of binomial coefficient is that mm to 1 subtracts polynomial power.

Table 2

Table 3

The degree of polynomial	Figure parameters	Surf.3,5	Surf.4,6,7
				r^2	D	0.000000E+00	0.000000E+00
r^4	E	1.245489E-05	-1.462422E-04
				r^6	F	1.393604E-07	9.569876E-07
r^8	G	-1.860081E-09	-6.019644E-09
				r^10	H	2.407929E-11	2.373262E-11
r^12	I	-1.266371E-13	-5.331213E-14
				r^14	J	2.853295E-16	4.901801E-17

Surface counting number in these tables starts from diaphragm surface 235 (Surf.1) and terminates Light number of times from the teeth outwards in imaging surface 230 (Surf.12 or IMA).Surf. 2 correspond to first surface 224, Surf.3 and Surf.5 corresponds to second surface 226, Surf.4 With Surf.6 corresponding to first surface 214 and Surf.7 corresponding to surface 216.Surfs.8-11 Refer to the surface layer being arranged on imaging surface 230.

First optical lens 212 is modeled as the Zenon E48R of refractive index 1.53, and the second light Learn lens 222 and be modeled as the Merlon of refractive index 1.585.Focal length is 17.560mm, depending on Field is 90 degree, and picture altitude is 14.36mm (diameter of imaging surface 230 is 28.72mm), F# is 2.55, and eye gap is 15mm and eye box (diameter on diaphragm surface 235) is 10.0mm.

Optical system has the visual field of 90 degree in diaphragm surface.By imaging surface and diaphragm The chief ray with wavelength 486nm and 656nm of surface transmission has in diaphragm surface The maximum color separation distance that 10.8 arcs divide, it is about the 0.38% of visual field, diaphragm surface.

Embodiment 3

The optical system being similar to optical system 600 is modeled.Corresponding to surface 614 and 616 Each surface be taken as the aspheric surface that described by equation 1.These tables of description listed by table 4 and 5 The parameter on each surface in face.Term in table is similar to those in embodiment 1 and 2.

Table 4

Surf.	Type	Radius (mm)	Thickness (mm)	Material	Diameter	Circular cone
							OBJ	STANDARD	Infinitely	Infinitely		0	0
STO	STANDARD	Infinitely	19.43519		15	0
							2	EVENASPH	-32.97361	6.734839	POLYCARB	42.67275	-0.6680006
3	EVENASPH	-32.97361	-6.734839	MIRROR	49.63501	-0.6680006
							4	EVENASPH	-32.97361	6.734839	MIRROR	42.06153	-0.6680006
5	EVENASPH	-32.97361	21.79455		46.89222	-0.6680006
							IMA	STANDARD	Infinitely			66.72897	0

Table 5

The degree of polynomial	Figure parameters	Surf.2,3,4,5
			r^2	D	0
r^4	E	-2.231952E-06
			r^6	F	-1.907497E-09
r^8	G	1.062720E-12
			r^10	H	-5.475949E-15
r^12	I	6.686581E-18
			r^14	J	-4.780909E-21

Surface counting number in these tables starts from diaphragm surface 635 (Surf.1) and terminates at The light of imaging surface 630 (Surf.6 or IMA) number of times from the teeth outwards.Surf.2 With Surf.4 corresponding to first surface 614, and Surf.3 and Surf.5 is corresponding to second surface 616。

Focal length is 35.0mm, and visual field is 90 degree, and picture altitude is 33.3mm (image table The diameter in face 630 is 66.6mm), F# is 2.3, and eye gap is 19.4mm and eye box (light The diameter on door screen surface 635) it is 15mm.

Optical system has the visual field of 90 degree in diaphragm surface.By imaging surface and diaphragm The chief ray with wavelength 486nm and 656nm of surface transmission has in diaphragm surface The maximum color separation distance that 29.5 arcs divide, it is about the 0.9% of visual field, diaphragm surface.

Embodiment 4

The optical system being similar to optical system 800 is modeled.Reflection type polarizer is arranged in On second first type surface 866 of three optical lenses 862 and the first quarter-wave delayer is arranged in On reflection type polarizer.Part reflector is arranged in the first first type surface of the second optical lens 822 On 824 and the second quarter-wave delayer is arranged in the second master meter of the second optical lens 822 On face 826.Each surface corresponding to surface 864,866,824,826,814 and 816 takes For the aspheric surface described by equation 1.Description Zhong Ge surface, these surfaces listed by table 6 and 7 Parameter.Term in table be similar to before those in embodiment.

Table 6

Table 7

The degree of polynomial	Figure parameters	Surf.3,5	Surf.9
				r^2	D	0.000000E+00	0.000000E+00
r^4	E	3.286842E-05	1.398664E-04
				r^6	F	1.861485E-07	-5.794668E-07
r^8	G	-1.944055E-09	1.220044E-09
				r^10	H	1.540250E-11	-9.383593E-13
r^12	I	0.000000E+00	0.000000E+00
				r^14	J	0.000000E+00	0.000000E+00

Surface counting number in these tables starts from diaphragm surface 835 (Surf.1) and terminates at The light of imaging surface 830 (Surf.10 or IMA) number of times from the teeth outwards.Surf. 2 correspond to first surface 864, Surf.3 and Surf.5 corresponds to second surface 866, Surf.4 Corresponding to surface 266 with Surf.6 corresponding to first surface 824, Surf.7, Surf.8 is corresponding In surface 814, and Surf.9 is corresponding to surface 816.

Focal length is 19.180mm, and visual field is 82 degree, and picture altitude is 15.89mm (image The diameter on surface 830 is 31.87mm), F# is 2.12, and eye gap is 11mm and eye box (diameter on diaphragm surface 835) is 9mm.

Optical system has the visual field of 80 degree in diaphragm surface.By imaging surface and diaphragm The chief ray with wavelength 486nm and 656nm of surface transmission has in diaphragm surface The maximum color separation distance that 14.9 arcs divide, it is about the 0.52% of visual field, diaphragm surface.

Embodiment 5

The optical system being similar to optical system 200 is modeled.Second quarter-wave delayer It is arranged on the second first type surface 216.Each table corresponding to surface 224,226,214 and 216 Face is taken as the aspheric surface described by equation 1, each multinomial coefficient D, E, F, G, H, I ... equal to zero.The parameter describing Zhong Ge surface, these surfaces listed by table 8, and its term is similar to Those in embodiment before.

Table 8

Surface counting number in this table starts from diaphragm surface 235 (Surf.1) and terminates at The light of imaging surface 230 (Surf.8 or IMA) number of times from the teeth outwards.Surf.2 Corresponding to first surface 224, Surf.3 and Surf.5 corresponds to second surface 226, Surf.4 With Surf.6 corresponding to first surface 214, and Surf.7 is corresponding to surface 216.Diameter refers to The clear aperature on surface, EVANASPH refers to that even aspheric surface is (in the expansion of equation 1 The even power of r only occurs), radius is the inverse of parameter c in equation 1, and circular cone is equation Parameter k and IMA in formula 1 refer to imaging surface 230.

First optical lens 212 is modeled as Zenon E48R and second optics of refractive index 1.53 Lens 222 are modeled as the Merlon of refractive index 1.585.Focal length is 42.7mm, and visual field is 100 degree, picture altitude is 50.94mm (diameter of imaging surface 230 is 101.88mm), F# is 3.25, and eye gap is 25mm, and eye box (diameter on diaphragm surface 235) is 15mm.

Optical system has the visual field of 100 degree in diaphragm surface.By imaging surface and diaphragm The chief ray with wavelength 486nm and 656nm of surface transmission has in diaphragm surface The maximum color separation distance that 11.9 arcs divide, it is about the 0.29% of visual field, diaphragm surface.

The undistorted image that analog image surface 230 produces, and image at diaphragm surface 235 Distortion be defined as less than 1%.

Embodiment 6-8

DBEF (embodiment 6), APF (embodiment 7) and there is quarter-wave delayer APF (embodiment 8) hot forming of coating is to obtain the several of geometric match lens outer surface The film of what shape.It is empty that film carries out pruning to be coupled in injection moulding tool lens cavity be placed in lens On the surface in chamber.The film pruned has the diameter of 63mm and the radius of curvature of 87mm.Note Mould polycarbonate resin for forming lens on film.Film is formed at the optics for this specification Time in system on the lens side on diaphragm surface.In embodiment 7, film is formed on lens So that in the optical system of this specification time, APF in the face of diaphragm surface and four/ One ripple delayer diaphragm surface dorsad.

The hot forming of film uses the heating of vacuum tractive in MAAC plate charging thermoforming system Film is carried out on the outer surface of the hot forming instrument being similar to hot forming instrument 1681.Outer surface Being configured to generally elliptical shape, major axis is about 1.02 times of short axle, so that the hot forming of gained Film is in cooling and relaxes rear rotationally symmetrical.Heat forming technology parameter is: slab furnace temperature=320 °F -380°F(160℃–193℃)；Curring time=18 second；With plate forming temperature=330 °F–365°F(156℃–185℃)。

Hot forming DBEF (embodiment 6) and APF (embodiment 7) reflection type polarizer sample Image use unpolarized nearly lambert's body source emissioning light to be arrived by sample to include with different angles The camera analyzing polariser that degree aligns with the block axis of reflection type polarizer obtains.At zero degree Under, two kinds of films are all the most transparent, and under high angle, DBEF shows at APF Non-existent optical artefacts in sample.Such as, under the angle of 70 degree, APF sample is basic On be equably black and DBEF sample display colored rings.Film inserts Shooting Technique and exists The reciprocating screw horizontal clamp adapted to injection system that Krauss-Maffei (Germany) manufactures is carried out. The injection-moulding device used is for 6 base lens parts and Bayer MAKROLON 3107-550115 polycarbonate resin (from Bayer MaterialScience LLC, Pittsburgh, PA obtains) it is used for forming lens.Molding proces s parameters is: mold temperature=180 °F (82 ℃)；Melting temperature=560 °F (293 DEG C)；Filling time=1.56 second；Keep Time=5.5 second；Keep pressure=11,000psi (75.8MPa)；Cool time=15 Second.

Embodiment 9-11

Reflection type polarizer be typically thermoformed into as described in embodiment 6-8 diameter 50.8mm with The rotational symmetric convex form of radius of curvature 38.6mm.Reflection type polarizer is that DBEF is (real Execute example 9), APF (embodiment 10) and wire-grid polarizer (embodiment 11).Use Axometrics AXOSCAN polarimeter (from Axometrics, Inc., Huntsville, AL obtain) is for respectively Polarization direction measured by sample.For each sample, determine and be centrally located in film summit and have 20 The sample area of mm diameter circular hole, and measure the maximum change of sample transmission axle in hole (the maximum angular deviation of the axis of homology of fixed-direction deducts the minimum angle of the axis of homology of fixed-direction Deviation).For DBEF, maximum change is 1.707 degree, and for APF, maximum change is 0.751 degree, and for wire-grid polarizer, maximum change is 0.931 degree.The border in region away from Rotary sample axis of symmetry 10mm radial distance has the rise of 1.32mm.

The list of exemplary is presented herein below.

Embodiment 1 is a kind of optical system, including:

Imaging surface；

Diaphragm surface；

First Optical stack, is arranged between described imaging surface and described diaphragm surface, and Protrude along the first orthogonal axle and the second axle towards described imaging surface, described first optical stack Fold and include:

First optical lens；And

Part reflector, have in desired multiple wavelength at least 30% average light anti- Penetrate rate；And

Second Optical stack, is arranged between described first Optical stack and described diaphragm surface, And protrude along described first axle and described second axle towards described imaging surface, described second Optical stack includes:

Second optical lens；

Multilayer reflective polariser, substantially transmission have light and the base of the first polarization state In basis, reflection has the light of the second orthogonal polarization state；And

First quarter-wave delayer, is arranged in described reflection type polarizer and described Between one Optical stack.

Embodiment 2 is the optical system of embodiment 1, and wherein image source includes described image Surface, and described diaphragm surface is emergent pupil.

Embodiment 3 is the optical system of embodiment 2, and wherein said image source includes display Device panel.

Embodiment 4 is the optical system of embodiment 3, and wherein said display pannel is Bright or translucent.

Embodiment 5 is the optical system of any one in embodiment 2 to 4, wherein said Image source includes shutter.

Embodiment 6 is the optical system of embodiment 1, and wherein said image source includes being suitable to Receive the hole of the light reflected from the object outside described optical system.

Embodiment 7 is the optical system of embodiment 1, and wherein scanner-recorder includes described Imaging surface, and described diaphragm surface is entrance pupil.

Embodiment 8 is the optical system of any one in embodiment 1 to 7, wherein said Optical system is centered by folding optical axis, and described folding optical axis is by being transmitted through described imaging surface Central ray optical path limit.

Embodiment 9 is the optical system of any one in embodiment 1 to 8, wherein said Diaphragm surface is suitable to overlapping with the entrance pupil of the second optical system.

Embodiment 10 is the optical system of embodiment 9, wherein said second optical system Be suitable to the image that record receives at described entrance pupil.

Embodiment 11 is the optical system of embodiment 1, and wherein said diaphragm surface is suitable to Overlapping with the entrance pupil of the eyes of observer.

Embodiment 12 is the optical system of embodiment 1, and wherein image source includes described figure Image surface, described image source launches non-polarized light.

Embodiment 13 is the optical system of any one in embodiment 1 to 12, Qi Zhongsuo State the first Optical stack to farther include to be arranged in described part reflector and described imaging surface Between the second quarter-wave delayer.

Embodiment 14 is the optical system of embodiment 1, and wherein image source includes described figure Image surface, described image source polarized light-emitting.

Embodiment 15 is the optical system of embodiment 14, and wherein said polarized light is that line is inclined Shake.

Embodiment 16 is the optical system of embodiment 14, and wherein said polarized light is that circle is inclined Shake.

Embodiment 17 is the optical system of embodiment 14, and wherein said polarized light is oval Polarization.

Embodiment 18 is the optical system of any one in embodiment 1 to 17, Qi Zhongsuo Stating part reflector is the second reflection type polarizer.

Embodiment 19 is the optical system of any one in embodiment 1 to 18, Qi Zhongsuo State part reflector have in described desired multiple wavelength at least 30% average optical saturating Penetrate rate.

Embodiment 20 is the optical system of any one in embodiment 1 to 19, Qi Zhongsuo State desired multiple wavelength and include at least one continuous print wave-length coverage.

Embodiment 21 is the optical system of any one in embodiment 1 to 20, Qi Zhongsuo State desired multiple wavelength and include the wavelength of visible-range.

Embodiment 22 is the optical system of embodiment 21, wherein said visible-range from 400nm to 700nm.

Embodiment 23 is the optical system of any one in embodiment 1 to 20, Qi Zhongsuo State desired multiple wavelength and include the wavelength of infra-red range.

Embodiment 24 is the optical system of any one in embodiment 1 to 20, Qi Zhongsuo That states that desired multiple wavelength includes in infrared, visible ray and ultraviolet wavelength is one or more.

Embodiment 25 is the optical system of any one in embodiment 1 to 21, Qi Zhongsuo Stating part reflector is trap reflector.

Embodiment 26 is the optical system of embodiment 25, wherein said desired multiple ripples Length includes in one or more continuous wavelength scope, and wherein said continuous wavelength scope At least one has the full width at half maximum less than 100nm.

Embodiment 27 is the optical system of embodiment 26, and wherein said full width at half maximum does not surpasses Cross 50nm.

Embodiment 28 is the optical system of any one in embodiment 1 to 27, Qi Zhongsuo Stating multilayer reflective polariser and have at least one primary importance, described primary importance is away from through institute The optical axis on the summit stating multilayer reflective polariser has radial distance r1, and away from described top The plane being perpendicular to described optical axis at Dian has displacement s1, and s1/r1 is at least 0.1.

Embodiment 29 is the optical system of embodiment 28, and wherein s1/r1 is at least 0.2.

Embodiment 30 is the optical system of embodiment 28, and wherein s1/r1 is 0.2 to 0.8 In the range of.

Embodiment 31 is the optical system of embodiment 28, and wherein s1/r1 is 0.3 to 0.6 In the range of.

Embodiment 32 is the optical system of any one in embodiment 28 to 31, wherein Described multilayer reflective polariser has the second position, and the described second position has away from described optical axis Radial distance r2 and displacement s2, s2/r2 away from described plane be at least 0.3.

Embodiment 33 is the optical system of any one in embodiment 1 to 27, Qi Zhongsuo Stating multilayer reflective polariser and have at least one primary importance, described primary importance is away from through institute The optical axis on the summit stating multilayer reflective polariser has radial distance r1, and away from described top The plane being perpendicular to described optical axis at Dian has displacement s1, and s1/r1 is at least 0.2, and wherein The region of the described reflection type polarizer for being limited by s1 and r1, described reflection type polarizer The maximum change less than about 2 degree of the axis of homology.

Embodiment 34 is the optical system of embodiment 33, wherein said reflection type polarizer The maximum change less than about 1.5 degree of the axis of homology.

Embodiment 35 is the optical system of any one in embodiment 1 to 34, Qi Zhong The maximum of the axis of homology of reflection type polarizer described in the reflection hole of described reflection type polarizer Change less than about 1.5 degree.

Embodiment 36 is the optical system of any one in embodiment 1 to 34, Qi Zhong The maximum of the axis of homology of reflection type polarizer described in the reflection hole of described reflection type polarizer Change less than about 1 degree.

Embodiment 37 is the optical system of any one in embodiment 1 to 36, Qi Zhongsuo Stating imaging surface and have maximum transverse size A, described apertured sheet mask has maximum transverse size B, And A/B is at least 3.

Embodiment 38 is the optical system of any one in embodiment 1 to 37, Qi Zhongsuo State the first optical lens have in the face of described second optical lens the first first type surface and faced by The second relative first type surface of described imaging surface, and faced by described second optical lens has First first type surface on described diaphragm surface and in the face of relative the of described first optical lens Two first type surfaces.

Embodiment 39 is the optical system of embodiment 38, wherein said part reflector quilt It is arranged on described first first type surface or described second first type surface of described first lens.

Embodiment 40 is the optical system of embodiment 38, wherein said part reflector quilt It is arranged on described first first type surface of described first lens, and the second quarter-wave postpones Device is disposed on described second first type surface of described first lens.

Embodiment 41 is the optical system of embodiment 38, wherein said part reflector quilt It is arranged on described second first type surface of described first lens, and the second quarter-wave postpones Device is disposed on described part reflector the described second first type surface phase with described first lens Right.

Embodiment 42 is the optical system of embodiment 38, and wherein the second quarter-wave prolongs Device is disposed on described first first type surface of described first optical lens late, and described part Reflector is disposed on described second quarter-wave delayer and described first optical lens Described first first type surface relative.

Embodiment 43 is the optical system of embodiment 38, the wherein said 1st/1st Ripple delayer is disposed on described second first type surface of described second optical lens, and described Multilayer reflective polariser is disposed on described first first type surface of described second optical lens.

Embodiment 44 is the optical system of embodiment 38, and wherein said multilayer reflective is inclined The device that shakes is disposed on described second first type surface of described second optical lens, and described first Quarter-wave delayer is disposed on described multilayer reflective polariser and described second light Described second first type surface learning lens is relative.

Embodiment 45 is the optical system of any one in embodiment 1 to 44, Qi Zhongsuo Stating multilayer reflective polariser and include at least one of which, described at least one of which is in described at least one of which At least one first position of the optical axis leaving described second Optical stack be basic glazing Learn twin shaft, and be substantially optics at least one second position of leaving described optical axis Single shaft.

Embodiment 46 is the optical system of any one in embodiment 1 to 45, Qi Zhongsuo Stating multilayer reflective polariser, to be that the optical axis about described second Optical stack substantially rotates right The hot forming multilayer reflective polariser claimed.

Embodiment 47 is the optical system of any one in embodiment 1 to 46, Qi Zhongsuo Stating multilayer reflective polariser is the rotational symmetric heat of optical axis about described second Optical stack Shape multilayer reflective polariser.

Embodiment 48 is the optical system of any one in embodiment 1 to 47, wherein wears Cross the substantially any chief ray on described imaging surface and described diaphragm surface with less than about 25 degree Each in described first Optical stack and described second Optical stack of incident angles on.

Embodiment 49 is the optical system of any one in embodiment 1 to 48, Qi Zhongsuo State the first Optical stack and described second Optical stack has substantially the same shape.

Embodiment 50 is the optical system of any one in embodiment 1 to 48, Qi Zhongsuo State the first Optical stack and described second Optical stack has different shapes.

Embodiment 51 is the optical system of any one in embodiment 1 to 50, Qi Zhongsuo The each lens stated in the first lens and described second lens are planar lens.

Embodiment 52 is the optical system of any one in embodiment 1 to 48, Qi Zhongsuo State the first optical lens and described second optical lens has substantially the same shape.

Embodiment 53 is the optical system of any one in embodiment 1 to 48, Qi Zhongsuo State the first optical lens and described second optical lens has different shapes.

Embodiment 54 is the optical system of any one in embodiment 1 to 53, Qi Zhongsuo It is substantially planar for stating imaging surface.

Embodiment 55 is the optical system of any one in embodiment 1 to 53, Qi Zhongsuo Stating imaging surface is bending.

Embodiment 56 is the optical system of embodiment 1, and wherein image source includes described figure Image surface, described image source transmitting undistorted image, described part reflector has the first shape, And described reflection type polarizer has the second different shapes so that saturating by described diaphragm surface The distortion of the launched undistorted image penetrated is less than about the 10% of visual field, described diaphragm surface.

Embodiment 57 is the optical system of embodiment 56, wherein saturating by described diaphragm surface The distortion of the launched undistorted image penetrated is less than the 5% of visual field, described diaphragm surface.

Embodiment 58 is the optical system of embodiment 56, wherein saturating by described diaphragm surface The distortion of the launched undistorted image penetrated is less than the 3% of visual field, described diaphragm surface.

Embodiment 59 is the optical system of any one in embodiment 1 to 58, Qi Zhongzhi There is first wave length in visible wavelength range, at least 150nm apart and the second ripple less Grow and be transmitted through described imaging surface and the substantially any chief ray on described diaphragm surface Have in described diaphragm surface less than visual field, described diaphragm surface percent 1.5 color separation Distance.

Embodiment 60 is the optical system of embodiment 59, wherein in described diaphragm surface Described color separation distance less than percent the 1.2 of visual field, described diaphragm surface.

Embodiment 61 is the optical system of any one in embodiment 1 to 60, Qi Zhongzhi There is first wave length in visible wavelength range, at least 150nm apart and the second ripple less Grow and be transmitted through described imaging surface and the substantially any chief ray on described diaphragm surface There is the color separation distance divided less than 20 arcs in described diaphragm surface.

Embodiment 62 is the optical system of embodiment 61, wherein in described diaphragm surface Described color separation distance divide less than 10 arcs.

Embodiment 63 is the optical system of any one in embodiment 1 to 62, Qi Zhongsuo Stating part reflector and have the first shape, described multilayer reflective polariser has the second shape, And one or two in described first shape and described second shape are multinomial by aspheric surface Described by formula rise equation.

Embodiment 64 is the optical system of any one in embodiment 1 to 63, Qi Zhongsuo State multilayer reflective polariser and include polymeric layer alternately.

Embodiment 65 is the optical system of any one in embodiment 1 to 64, Qi Zhongsuo Stating multilayer reflective polariser is APF.

Embodiment 66 is the optical system of any one in embodiment 1 to 64, Qi Zhongsuo Stating multilayer reflective polariser is hot formed APF.

Embodiment 67 is the optical system of any one in embodiment 1 to 64, Qi Zhongsuo State multilayer reflective polariser and include wire-grid polarizer.

Embodiment 68 is the optical system of any one in embodiment 1 to 67, Qi Zhongsuo It is rotational symmetric for stating multilayer reflective polariser.

Embodiment 69 is the optical system of any one in embodiment 1 to 68, Qi Zhongsuo At least one Optical stack stated in the first Optical stack and described second Optical stack has phase For described diaphragm surface and the adjustable position of described imaging surface.

Embodiment 70 is the optical system of any one in embodiment 1 to 69, Qi Zhongsuo Stating that at least one Optical stack in the first Optical stack and described second Optical stack has can The shape adjusted.

Embodiment 71 is a kind of optical system, including:

Imaging surface；

Diaphragm surface；

First Optical stack, is arranged between described imaging surface and described diaphragm surface and wraps Include:

First optical lens；

Second Optical stack, is arranged between described first Optical stack and described diaphragm surface also And include:

Second optical lens；

Multilayer reflective polariser, including at least one of which, described at least one of which described extremely At least one first position of the optical axis leaving described second Optical stack on few one layer It is the most optically biaxial, and is leaving at least one second position of described optical axis Place is the most optically uniaxial；And

First quarter-wave delayer, is arranged in described reflection type polarizer and described Between one Optical stack,

Wherein through described imaging surface and described diaphragm surface substantially any chief ray with The incident angles of less than about 30 degree is in described first Optical stack and described second Optical stack In each on.

Embodiment 72 is the optical system of embodiment 71, and wherein image source includes described figure Image surface, and described diaphragm surface is emergent pupil.

Embodiment 73 is the optical system of embodiment 72, and wherein said image source includes showing Show device panel.

Embodiment 74 is the optical system of embodiment 73, and wherein said display pannel is Transparent or translucent.

Embodiment 75 is the optical system of any one in embodiment 72 to 74, wherein Described image source includes shutter.

Embodiment 76 is the optical system of embodiment 71, and wherein said image source includes fitting In the hole receiving the light reflected from the object outside described optical system.

Embodiment 77 is the optical system of embodiment 71, and wherein scanner-recorder includes institute State imaging surface, and described diaphragm surface is entrance pupil.

Embodiment 78 is the optical system of any one in embodiment 71 to 77, wherein Described optical system is centered by folding optical axis, and described folding optical axis is by being transmitted through described image The optical path of the central ray on surface limits.

Embodiment 79 is the optical system of any one in embodiment 71 to 78, wherein Described diaphragm surface is suitable to overlapping with the entrance pupil of the second optical system.

Embodiment 80 is the optical system of embodiment 79, wherein said second optical system Be suitable to the image that record receives at described entrance pupil.

Embodiment 81 is the optical system of embodiment 71, and wherein said diaphragm surface is suitable to Overlapping with the entrance pupil of the eyes of observer.

Embodiment 82 is the optical system of embodiment 71, and wherein image source includes described figure Image surface, described image source launches non-polarized light.

Embodiment 83 is the optical system of any one in embodiment 71 to 82, wherein Described first Optical stack farther includes to be arranged in described part reflector and described image table The second quarter-wave delayer between face.

Embodiment 84 is the optical system of embodiment 71, and wherein image source includes described figure Image surface, described image source polarized light-emitting.

Embodiment 85 is the optical system of embodiment 84, and wherein said polarized light is that line is inclined Shake.

Embodiment 86 is the optical system of embodiment 84, and wherein said polarized light is that circle is inclined Shake.

Embodiment 87 is the optical system of embodiment 84, and wherein said polarized light is oval Polarization.

Embodiment 88 is the optical system of any one in embodiment 71 to 87, wherein Described part reflector is the second reflection type polarizer.

Embodiment 89 is the optical system of any one in embodiment 71 to 88, wherein Described part reflector has the average optical of at least 30% in described desired multiple wavelength Absorbance.

Embodiment 90 is the optical system of any one in embodiment 71 to 89, wherein Described desired multiple wavelength include at least one continuous print wave-length coverage.

Embodiment 91 is the optical system of any one in embodiment 71 to 90, wherein Described desired multiple wavelength include the wavelength of visible-range.

Embodiment 92 is the optical system of embodiment 91, wherein said visible-range from 400nm to 700nm.

Embodiment 93 is the optical system of any one in embodiment 71 to 92, wherein Described desired multiple wavelength include the wavelength of infra-red range.

Embodiment 94 is the optical system of any one in embodiment 71 to 93, wherein It is one or more that described desired multiple wavelength include in infrared, visible ray and ultraviolet wavelength.

Embodiment 95 is the optical system of any one in embodiment 71 to 91, wherein Described part reflector is trap reflector.

Embodiment 96 is the optical system of embodiment 95, wherein said desired multiple ripples Length includes in one or more continuous wavelength scope, and wherein said continuous wavelength scope At least one has the full width at half maximum less than 100nm.

Embodiment 97 is the optical system of embodiment 96, and wherein said full width at half maximum does not surpasses Cross 50nm.

Embodiment 98 is the optical system of any one in embodiment 71 to 97, wherein Described multilayer reflective polariser has at least one primary importance, and described primary importance is away from passing The optical axis on the summit of described multilayer reflective polariser has radial distance r1, and away from described Apex is perpendicular to the plane of described optical axis and has displacement s1, and s1/r1 is at least 0.1.

Embodiment 99 is the optical system of embodiment 98, and wherein s1/r1 is at least 0.2.

Embodiment 100 is the optical system of embodiment 98, and wherein s1/r1 is 0.2 to 0.8 In the range of.

Embodiment 101 is the optical system of embodiment 98, and wherein s1/r1 is 0.3 to 0.6 In the range of.

Embodiment 102 is the optical system of any one in embodiment 98 to 101, its Described in multilayer reflective polariser there is the second position, the described second position has away from described light The radial distance r2 of axle and the displacement s2, s2/r2 away from described plane is at least 0.3.

Embodiment 103 is the optical system of any one in embodiment 71 to 97, wherein Described multilayer reflective polariser has at least one primary importance on film, described first Put the optical axis away from the summit through described multilayer reflective polariser and there is radial distance r1, and Having displacement s1 away from the plane being perpendicular to described optical axis at described apex, s1/r1 is at least 0.2, And the wherein region of the described reflection type polarizer for being limited by s1 and r1, described reflection The maximum change of the axis of homology of formula polariser less than about 2 degree.

Embodiment 104 is the optical system of embodiment 103, wherein said reflection type polarization The maximum change of the axis of homology of device less than about 1.5 degree.

Embodiment 105 is the optical system of any one in embodiment 71 to 104, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1.5 degree.

Embodiment 106 is the optical system of any one in embodiment 71 to 104, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1 degree.

Embodiment 107 is the optical system of any one in embodiment 71 to 106, its Described in the first optical lens have in the face of described second optical lens the first first type surface and In the face of the second relative first type surface of described imaging surface, and described second optical lens has In the face of first first type surface on described diaphragm surface and relative in the face of described first optical lens The second first type surface.

Embodiment 108 is the optical system of embodiment 107, wherein said part reflector It is disposed on described first first type surface or described second first type surface of described first lens.

Embodiment 109 is the optical system of embodiment 108, wherein said part reflector It is disposed on described first first type surface of described first lens, and the second quarter-wave prolongs Device is disposed on described second first type surface of described first lens late.

Embodiment 110 is the optical system of embodiment 108, wherein said part reflector It is disposed on described second first type surface of described first lens, and the second quarter-wave prolongs Device is disposed on described part reflector described second first type surface with described first lens late Relatively.

Embodiment 111 is the optical system of embodiment 107, wherein the second quarter-wave Delayer is disposed on described first first type surface of described first optical lens, and described portion Reflector is divided to be disposed on described second quarter-wave delayer and described first optical lens Described first first type surface of mirror is relative.

Embodiment 112 is the optical system of embodiment 107, wherein said one or four/ One ripple delayer is disposed on described second first type surface of described second optical lens, and institute State multilayer reflective polariser and be disposed in described first first type surface of described second optical lens On.

Embodiment 113 is the optical system of embodiment 107, wherein said multilayer reflective Polariser is disposed on described second first type surface of described second optical lens, and described One quarter-wave delayer is disposed on described multilayer reflective polariser with described second Described second first type surface of optical lens is relative.

Embodiment 114 is the optical system of any one in embodiment 71 to 113, its Described in imaging surface there is maximum transverse size A, described apertured sheet mask has maximum transversal chi Very little B, and A/B is at least 3.

Embodiment 115 is the optical system of any one in embodiment 71 to 114, its Described in multilayer reflective polariser be that the optical axis about described second Optical stack substantially revolves Turn symmetrical hot forming multilayer reflective polariser.

Embodiment 116 is the optical system of any one in embodiment 71 to 115, its Described in multilayer reflective polariser be that the optical axis about described second Optical stack is rotationally symmetrical Hot forming multilayer reflective polariser.

Embodiment 117 is the optical system of any one in embodiment 71 to 116, its Described in one or two in the first Optical stack and described second Optical stack along just The first axle and the second axle handed over protrude towards described imaging surface.

Embodiment 118 is the optical system of embodiment 117, wherein said first optical stack Folded and described second Optical stack is along described first axle and described second axle towards described Imaging surface protrudes.

Embodiment 119 is the optical system of any one in embodiment 71 to 118, its Described in multilayer reflective polariser along the first orthogonal axle and the second axle towards described image Surface is protruded.

Embodiment 120 is the optical system of any one in embodiment 71 to 119, its Described in the first Optical stack and described second Optical stack there is substantially the same shape.

Embodiment 121 is the optical system of any one in embodiment 71 to 119, its Described in the first Optical stack and described second Optical stack there is different shapes.

Embodiment 122 is the optical system of any one in embodiment 71 to 121, its Described in each lens in the first lens and described second lens be planar lens.

Embodiment 123 is the optical system of any one in embodiment 71 to 119, its Described in the first optical lens and described second optical lens there is substantially the same shape.

Embodiment 124 is the optical system of any one in embodiment 71 to 119, its Described in the first optical lens and described second optical lens there is different shapes.

Embodiment 125 is the optical system of any one in embodiment 71 to 124, its Described in imaging surface be substantially planar.

Embodiment 126 is the optical system of any one in embodiment 71 to 124, its Described in imaging surface be bending.

Embodiment 127 is the optical system of any one in embodiment 71 to 126, its In through the substantially any chief ray on described imaging surface and described diaphragm surface with less than about Every in described first Optical stack and described second Optical stack of the incident angles of 25 degree On individual.

Embodiment 128 is the optical system of embodiment 71, and wherein image source includes described Imaging surface, described image source transmitting undistorted image, described part reflector has the first shape Shape, and described reflection type polarizer has the second different shapes so that by described apertured sheet The distortion of launched undistorted image of face transmission is less than the pact of visual field, described diaphragm surface 10%.

Embodiment 129 is the optical system of embodiment 128, wherein by described diaphragm surface The distortion of launched undistorted image of transmission is less than the 5% of visual field, described diaphragm surface.

Embodiment 130 is the optical system of embodiment 128, wherein by described diaphragm surface The distortion of launched undistorted image of transmission is less than the 3% of visual field, described diaphragm surface.

Embodiment 131 is the optical system of any one in embodiment 71 to 130, its In at least there is first wave length and the in visible wavelength range, at a distance of at least 150nm Two wavelength and be transmitted through described imaging surface and the substantially any master on described diaphragm surface Light has percent 1.5 less than visual field, described diaphragm surface in described diaphragm surface Color separation distance.

Embodiment 132 is the optical system of embodiment 131, wherein on described diaphragm surface The described color separation distance at place is less than percent the 1.2 of visual field, described diaphragm surface.

Embodiment 133 is the optical system of any one in embodiment 71 to 132, its In at least there is first wave length and the in visible wavelength range, at a distance of at least 150nm Two wavelength and be transmitted through described imaging surface and the substantially any master on described diaphragm surface Light has the color separation distance divided less than 20 arcs in described diaphragm surface.

Embodiment 134 is the optical system of embodiment 133, wherein on described diaphragm surface The described color separation distance at place is divided less than 10 arcs.

Embodiment 135 is the optical system of any one in embodiment 71 to 134, its Described in part reflector there is the first shape, described multilayer reflective polariser has the second shape One or two in shape, and described first shape and described second shape are many by aspheric surface Described by item formula rise equation.

Embodiment 136 is the optical system of any one in embodiment 71 to 135, its Described in multilayer reflective polariser include polymeric layer alternately.

Embodiment 137 is the optical system of any one in embodiment 71 to 136, its Described in multilayer reflective polariser be hot formed APF.

Embodiment 138 is the optical system of any one in embodiment 71 to 136, its Described in multilayer reflective polariser include wire-grid polarizer.

Embodiment 139 is the optical system of any one in embodiment 71 to 138, its Described in multilayer reflective polariser be rotational symmetric.

Embodiment 140 is the optical system of any one in embodiment 71 to 139, its Described at least one Optical stack tool in the first Optical stack and described second Optical stack Have relative to described diaphragm surface and the described adjustable position of imaging surface user.

Embodiment 141 is the optical system of any one in embodiment 71 to 140, its Described at least one Optical stack tool in the first Optical stack and described second Optical stack There is the adjustable shape of user.

Embodiment 142 is a kind of optical system, including:

Image source, launches undistorted image；

Emergent pupil；

Part reflector, has and protrudes towards image source along the first orthogonal axle and the second axle First shape and have in predetermined multiple wavelength at least 30% average light reflectance；With And

Reflection type polarizer, has along described first axle and described second axle towards described image The second different shape that source is protruded so that undistorted by being launched of described emergent pupil transmission The distortion of image is less than about 10%.

Embodiment 143 is the optical system of embodiment 142, wherein by described emergent pupil The distortion of launched undistorted image of transmission is less than about 5%.

Embodiment 144 is the optical system of embodiment 142, wherein by described emergent pupil The distortion of launched undistorted image of transmission is less than about 3%.

Embodiment 145 is the optical system of any one in embodiment 142 to 144, its In be arranged between described image source and described emergent pupil integral optical stacking include first Optical lens, the first quarter-wave delayer, described part reflector and described reflective partially Shake device.

Embodiment 146 is the optical system of embodiment 145, wherein the first quarter-wave Delayer be disposed in described first optical lens in the face of the first first type surface of described image source On, and described part reflector is disposed on described quarter-wave delayer and described One optical lens is relative.

Embodiment 147 is the optical system of embodiment 145, wherein said part reflector Be disposed in described first optical lens in the face of described image source the first first type surface on.

Embodiment 148 is the optical system of embodiment 147, wherein said one or four/ One ripple delayer is disposed in the relative with described first first type surface of described first optical lens On second first type surface.

Embodiment 149 is the optical system of embodiment 147, wherein said reflection type polarization Device is disposed on described first quarter-wave delayer relative with described first optical lens.

Embodiment 150 is the optical system of any one in embodiment 145 to 149, its Described in integral optical stacking also include the second quarter-wave delayer.

Embodiment 151 is the optical system of embodiment 150, wherein said two or four/ One ripple delayer be disposed in described part reflector in the face of described image source first type surface on.

Embodiment 152 is the optical system of any one in embodiment 142 to 151, its In at least have in described predetermined multiple wavelength, at a distance of the first wave length of at least 150nm With second wave length and being launched by described image source and basic by described emergent pupil transmission Upper any chief ray has less than at described emergent pupil the hundred of visual field at described emergent pupil The color separation distance of/1.5.

Embodiment 153 is the optical system of any one in embodiment 142 to 152, its In at least have in described predetermined multiple wavelength, at a distance of the first wave length of at least 150nm With second wave length and being launched by described image source and basic by described emergent pupil transmission Upper any chief ray has the color separation distance divided less than 20 arcs at described emergent pupil.

Embodiment 154 is a kind of optical system, including:

Image source；

Emergent pupil；

First Optical stack, is arranged between described image source and described emergent pupil, and wraps Include:

First optical lens；

Part reflector, have in predetermined multiple wavelength at least 30% average light anti- Penetrate rate；And

Second Optical stack, is arranged between described first Optical stack and described emergent pupil, And including:

Second optical lens；

Multilayer reflective polariser；And

At least a part of which has in described predetermined multiple wavelength, at a distance of the of at least 150nm One wavelength and second wave length and launched by described image source and by described emergent pupil transmission Substantially any chief ray have at described emergent pupil and regard less than at described emergent pupil Percent 1.5 color separation distance, and wherein said multilayer reflective polariser is about two Individual normal axis protrudes.

Embodiment 155 is the optical system of embodiment 154, at wherein said emergent pupil Color separation distance less than at described emergent pupil percent the 1.2 of visual field.

Embodiment 156 is the optical system of embodiment 154 or 155, wherein said outgoing Color separation distance at pupil is divided less than 20 arcs.

Embodiment 157 is the optical system of any one in embodiment 154 to 155, its Described in color separation distance at emergent pupil divide less than 10 arcs.

Embodiment 158 is a kind of optical system, including:

Image source；

Emergent pupil；

First optical lens；

Second optical lens；

Multilayer reflective polariser；And

At least a part of which has in described predetermined multiple wavelength, at a distance of the of at least 150nm One wavelength and second wave length and launched by described image source and by described emergent pupil transmission Substantially any chief ray there is at described emergent pupil the color separation distance divided less than 20 arcs, And wherein said multilayer reflective polariser protrudes about two normal axis.

Embodiment 159 is the optical system of embodiment 158, at wherein said emergent pupil Color separation distance divide less than 10 arcs.

Embodiment 160 is the optical system of embodiment 158 or 159, wherein said outgoing Color separation distance at pupil is less than at described emergent pupil percent the 1.5 of visual field.

Embodiment 161 is the optical system of any one in embodiment 158 to 160, its Described in color separation distance at emergent pupil less than at described emergent pupil the percent of visual field 1.2。

Embodiment 162 is the optical system of any one in embodiment 154 to 160, its Described at least one Optical stack tool in the first Optical stack and described second Optical stack Have relative to described diaphragm surface and the adjustable position of described imaging surface.

Embodiment 163 is the optical system of any one in embodiment 154 to 162, its Described at least one Optical stack tool in the first Optical stack and described second Optical stack There is adjustable shape.

Embodiment 164 is the optical system of any one in embodiment 154 to 163, its Described in the first Optical stack convex towards described image source along the first orthogonal axle and the second axle Go out.

Embodiment 165 is the optical system of any one in embodiment 154 to 164, its Described in the second Optical stack convex towards described image source along the first orthogonal axle and the second axle Go out.

Embodiment 166 is the optical system of any one in embodiment 142 to 165, its Described in image source there is maximum transverse size A, described emergent pupil has maximum transverse size B, and A/B is at least 3.

Embodiment 167 is the optical system of any one in embodiment 142 to 166, its In from least one chief ray of described image source with the angle of incidence of at least 40 degree through described Emergent pupil.

Embodiment 168 is the optical system of any one in embodiment 142 to 167, its Described in optical system to fold centered by optical axis, described folding optical axis is launched by described image source Center light optical path limit.

Embodiment 169 is the optical system of any one in embodiment 142 to 168, its Described in emergent pupil be suitable to overlapping with the entrance pupil of the second optical system.

Embodiment 170 is the optical system of embodiment 169, wherein said second optical system System is suitable to the image that record receives at described entrance pupil.

Embodiment 171 is the optical system of any one in embodiment 142 to 169, its Described in emergent pupil to be suitable to the entrance pupil of eyes with observer overlapping.

Embodiment 172 is the optical system of any one in embodiment 142 to 171, its Described in image source launch non-polarized light.

Embodiment 173 is the optical system of any one in embodiment 142 to 171, its Described in image source polarized light-emitting.

Embodiment 174 is the optical system of embodiment 173, and wherein said polarized light is line Polarization.

Embodiment 175 is the optical system of embodiment 173, and wherein said polarized light is round Polarization.

Embodiment 176 is the optical system of embodiment 173, and wherein said polarized light is ellipse Circularly polarized.

Embodiment 177 is the optical system of any one in embodiment 142 to 176, its Described in part reflector be the second reflection type polarizer.

Embodiment 178 is the optical system of any one in embodiment 142 to 177, its Described in part reflector have in described predetermined multiple wavelength at least 30% average light Learn absorbance.

Embodiment 179 is the optical system of any one in embodiment 142 to 178, its Described in predetermined multiple wavelength include one or more predetermined wavelength range.

Embodiment 180 is the optical system of any one in embodiment 142 to 179, its Described in predetermined multiple wavelength include visible-range.

Embodiment 181 is the optical system of embodiment 180, wherein said visible-range From 400nm to 700nm.

Embodiment 182 is the optical system of any one in embodiment 142 to 179, its Described in predetermined multiple wavelength include infra-red range.

Embodiment 183 is the optical system of any one in embodiment 142 to 179, its Described in predetermined multiple wavelength include in infrared, visible ray and ultraviolet wavelength or many ?.

Embodiment 184 is the optical system of any one in embodiment 142 to 180, its Described in part reflector be trap reflector.

Embodiment 185 is the optical system of embodiment 184, wherein said predetermined multiple Wavelength includes that at least one has the wave-length coverage of the full width at half maximum less than 100nm.

Embodiment 186 is the optical system of embodiment 184, wherein said predetermined multiple Wavelength includes that at least one has the wave-length coverage of the full width at half maximum less than 50nm.

Embodiment 187 is the optical system of any one in embodiment 142 to 186, its Described in reflection type polarizer there is at least one primary importance, described primary importance is away from through institute The optical axis on the summit stating multilayer reflective polariser has radial distance r1, and away from described top The plane being perpendicular to described optical axis at Dian has displacement s1, and s1/r1 is at least 0.1.

Embodiment 188 is the optical system of embodiment 187, and wherein s1/r1 is at least 0.2.

Embodiment 189 is the optical system of embodiment 187, wherein s1/r1 0.2 to In the range of 0.8.

Embodiment 190 is the optical system of embodiment 187, wherein s1/r1 0.3 to In the range of 0.6.

Embodiment 191 is the optical system of any one in embodiment 187 to 190, its Described in multilayer reflective polariser there is the second position, the described second position has away from described light The radial distance r2 of axle and the displacement s2, s2/r2 away from described plane is at least 0.3.

Embodiment 192 is the optical system of any one in embodiment 142 to 186, its Described in multilayer reflective polariser there is at least one primary importance, described primary importance is away from wearing The optical axis on the summit crossing described reflection type polarizer has radial distance r1, and away from described top The plane being perpendicular to described optical axis at Dian has displacement s1, and s1/r1 is at least 0.2, and wherein The region of the described reflection type polarizer for being limited by s1 and r1, described reflection type polarizer The maximum change less than about 2 degree of the axis of homology.

Embodiment 193 is the optical system of embodiment 192, wherein said reflection type polarization The maximum change of the axis of homology of device less than about 1.5 degree.

Embodiment 194 is the optical system of any one in embodiment 142 to 193, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1.5 degree.

Embodiment 195 is the optical system of any one in embodiment 142 to 193, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1 degree.

Embodiment 196 is the optical system of any one in embodiment 142 to 195, its Described in reflection type polarizer include at least one of which, described at least one of which is in described at least one of which At least one first position of the optical axis leaving described second Optical stack be basic glazing Learn twin shaft, and be substantially optics at least one second position of leaving described optical axis Single shaft.

Embodiment 197 is the optical system of any one in embodiment 142 to 196, its Described in reflection type polarizer to be that the optical axis about described reflection type polarizer substantially rotates right The hot forming multilayer reflective polariser claimed.

Embodiment 198 is the optical system of any one in embodiment 142 to 197, its Described in reflection type polarizer be the rotational symmetric heat of the optical axis about described reflection type polarizer Shape multilayer reflective polariser.

Embodiment 199 is the optical system of any one in embodiment 142 to 198, its In launched by described image source and the substantially any master that is transmitted through described emergent pupil Light is anti-at described reflection type polarizer and described part with the incident angles of less than about 25 degree On each in emitter.

Embodiment 200 is the optical system of any one in embodiment 142 to 202, its Described in part reflector there is the first shape, described reflection type polarizer has the second shape, And one or two in described first shape and described second shape are multinomial by aspheric surface Described by formula rise equation.

Embodiment 201 is the optical system of any one in embodiment 142 to 200, its Described in reflection type polarizer include polymeric layer alternately.

Embodiment 202 is the optical system of any one in embodiment 142 to 201, its Described in reflection type polarizer be hot formed APF.

Embodiment 203 is the optical system of any one in embodiment 142 to 201, its Described in reflection type polarizer include wire-grid polarizer.

Embodiment 204 is the optical system of any one in embodiment 142 to 203, its Described in reflection type polarizer be rotational symmetric.

Embodiment 205 is the optical system of any one in embodiment 142 to 204, its Described in image source include display pannel.

Embodiment 206 is the optical system of embodiment 205, wherein said display pannel It is transparent or translucent.

Embodiment 207 is the optical system of embodiment 204 or 205, wherein said image Source includes shutter.

Embodiment 208 is a kind of optical system, including:

Imaging surface, has maximum transverse size A；

Diaphragm surface, has maximum transverse size B, and A/B is at least 3；

Integral optical stacks, and is arranged between described imaging surface and described diaphragm surface, and Including:

First optical lens；

Part reflector, have in predetermined multiple wavelength at least 30% average light anti- Penetrate rate；

First quarter-wave delayer, at least in described predetermined multiple wavelength At individual wavelength,

Wherein it is transmitted through at least one master of described diaphragm surface and described imaging surface Light passes described diaphragm surface with the angle of incidence of at least 40 degree.

Embodiment 209 is the optical system of embodiment 208, wherein said integral optical heap Fold and protrude towards described imaging surface along the first orthogonal axle and the second axle.

Embodiment 210 is the optical system of any one in embodiment 208 to 209, its In at least there is first wave length and the in visible wavelength range, at a distance of at least 150nm Two wavelength and be transmitted through described imaging surface and the substantially any master on described diaphragm surface Light has percent 1.5 less than visual field, described diaphragm surface in described diaphragm surface Color separation distance.

Embodiment 211 is the optical system of any one in embodiment 208 to 210, its In color separation distance in described diaphragm surface less than the percent of visual field, described diaphragm surface 1.2。

Embodiment 212 is the optical system of any one in embodiment 208 to 211, its In at least there is first wave length and the in visible wavelength range, at a distance of at least 150nm Two wavelength and be transmitted through described imaging surface and the substantially any master on described diaphragm surface Light has the color separation distance divided less than 20 arcs in described diaphragm surface.

Embodiment 213 is the optical system of any one in embodiment 208 to 212, its In described color separation distance in described diaphragm surface divide less than 10 arcs.

Embodiment 214 is the optical system of any one in embodiment 208 to 213, its Middle image source includes described imaging surface, and described diaphragm surface is emergent pupil.

Embodiment 215 is the optical system of embodiment 214, and wherein said image source includes Display pannel.

Embodiment 216 is the optical system of embodiment 215, wherein said display pannel It is transparent or translucent.

Embodiment 217 is the optical system of any one in embodiment 214 to 216, its Described in image source include shutter.

Embodiment 218 is the optical system of embodiment 208, and wherein said image source includes Be suitable to receive the hole of the light reflected from the object outside described optical system.

Embodiment 219 is the optical system of any one in embodiment 208 to 213, its Middle scanner-recorder includes described imaging surface, and described diaphragm surface is entrance pupil.

Embodiment 220 is the optical system of any one in embodiment 208 to 219, its Described in optical system to fold centered by optical axis, described folding optical axis is by being transmitted through described figure The optical path of the central ray of image surface limits.

Embodiment 221 is the optical system of embodiment 208, and wherein said diaphragm surface is fitted In overlapping with the entrance pupil of the second optical system.

Embodiment 222 is the optical system of embodiment 221, wherein said second optical system System is suitable to the image that record receives at described entrance pupil.

Embodiment 223 is the optical system of embodiment 208, and wherein said diaphragm surface is fitted Overlapping in the entrance pupil of the eyes with observer.

Embodiment 224 is the optical system of embodiment 208, and wherein image source includes described Imaging surface, described image source launches non-polarized light.

Embodiment 225 is the optical system of any one in embodiment 208 to 224, enters One step be included in the two or four at least one wavelength in described predetermined multiple wavelength/ One ripple delayer, described second quarter-wave delayer be disposed in described part reflector and Between described imaging surface, it is anti-that described first quarter-wave delayer is disposed in described multilamellar Penetrate between formula polariser and described part reflector.

Embodiment 226 is the optical system of embodiment 208, and wherein image source includes described Imaging surface, described image source polarized light-emitting.

Embodiment 227 is the optical system of embodiment 226, and wherein said polarized light is line Polarization.

Embodiment 228 is the optical system of embodiment 226, and wherein said polarized light is round Polarization.

Embodiment 229 is the optical system of embodiment 226, and wherein said polarized light is ellipse Circularly polarized.

Embodiment 230 is the optical system of any one in embodiment 208 to 229, its Described in part reflector be the second reflection type polarizer.

Embodiment 231 is the optical system of any one in embodiment 208 to 230, its Described in part reflector have in described predetermined multiple wavelength at least 30% average light Learn absorbance.

Embodiment 232 is the optical system of any one in embodiment 208 to 231, its Described in predetermined multiple wavelength include at least one continuous print wave-length coverage.

Embodiment 233 is the optical system of any one in embodiment 208 to 232, its Described in predetermined multiple wavelength include the wavelength of visible-range.

Embodiment 234 is the optical system of embodiment 233, wherein said visible-range From 400nm to 700nm.

Embodiment 235 is the optical system of any one in embodiment 208 to 234, its Described in predetermined multiple wavelength include the wavelength of infra-red range.

Embodiment 236 is the optical system of any one in embodiment 208 to 235, its Described in predetermined multiple wavelength include in infrared, visible ray and ultraviolet wavelength or many ?.

Embodiment 237 is the optical system of any one in embodiment 208 to 236, its Described in part reflector be trap reflector.

Embodiment 238 is the optical system of embodiment 237, wherein said predetermined multiple Wavelength includes in one or more continuous wavelength scope, and wherein said continuous wavelength scope At least one there is the full width at half maximum less than 100nm.

Embodiment 239 is the optical system of embodiment 238, and wherein said full width at half maximum is not More than 50nm.

Embodiment 240 is the optical system of any one in embodiment 208 to 239, its Described in multilayer reflective polariser there is at least one primary importance, described primary importance is away from wearing The optical axis on the summit crossing described multilayer reflective polariser has radial distance r1, and away from institute Stating apex to be perpendicular to the plane of described optical axis and have displacement s1, s1/r1 is at least 0.1.

Embodiment 241 is the optical system of embodiment 240, and wherein s1/r1 is at least 0.2.

Embodiment 242 is the optical system of embodiment 240, wherein s1/r1 0.2 to In the range of 0.8.

Embodiment 243 is the optical system of embodiment 240, wherein s1/r1 0.3 to In the range of 0.6.

Embodiment 244 is the optical system of embodiment 240, wherein said multilayer reflective Polariser has the second position, and the described second position has the radial distance r2 away from described optical axis And the displacement s2, s2/r2 away from described plane is at least 0.3.

Embodiment 245 is the optical system of any one in embodiment 208 to 244, its Described in multilayer reflective polariser there is at least one primary importance, described primary importance is away from wearing The optical axis on the summit crossing described multilayer reflective polariser has radial distance r1, and away from institute Stating apex to be perpendicular to the plane of described optical axis and have displacement s1, s1/r1 is at least 0.2, and The wherein region of the described reflection type polarizer for being limited by s1 and r1, described reflective partially Shake the maximum change less than about 2 degree of the axis of homology of device.

Embodiment 246 is the optical system of embodiment 245, wherein said reflection type polarization The maximum change of the axis of homology of device less than about 1.5 degree.

Embodiment 247 is the optical system of any one in embodiment 208 to 246, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1.5 degree.

Embodiment 248 is the optical system of any one in embodiment 209 to 246, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1 degree.

Embodiment 249 is the optical system of any one in embodiment 208 to 248, institute Stating multilayer reflective polariser and include at least one of which, described at least one of which is in described at least one of which At least one first position of the optical axis leaving described second Optical stack be basic glazing Learn twin shaft, and be substantially optics at least one second position of leaving described optical axis Single shaft.

Embodiment 250 is the optical system of any one in embodiment 208 to 249, its Described in multilayer reflective polariser be that the optical axis about described second Optical stack substantially revolves Turn symmetrical hot forming multilayer reflective polariser.

Embodiment 251 is the optical system of any one in embodiment 208 to 250, its Described in multilayer reflective polariser be that the optical axis about described second Optical stack is rotationally symmetrical Hot forming multilayer reflective polariser.

Embodiment 252 is the optical system of any one in embodiment 208 to 251, its In through the substantially any chief ray on described imaging surface and described diaphragm surface with less than about The incident angles of 25 degree is at described part reflector, described multilayer reflective polariser and described On each in first quarter-wave delayer.

Embodiment 253 is the optical system of embodiment 208, and wherein image source includes described Imaging surface, described image source transmitting undistorted image, described part reflector has the first shape Shape, and described reflection type polarizer has the second different shapes so that by described apertured sheet The distortion of launched undistorted image of face transmission is less than the pact of visual field, described diaphragm surface 10%.

Embodiment 254 is the optical system of embodiment 253, wherein by described diaphragm surface The distortion of launched undistorted image of transmission is less than about the 5% of visual field, described diaphragm surface.

Embodiment 255 is the optical system of embodiment 253, wherein by described diaphragm surface The distortion of launched undistorted image of transmission is less than about the 3% of visual field, described diaphragm surface.

Embodiment 256 is the optical system of any one in embodiment 208 to 255, its Described in part reflector there is the first shape, described multilayer reflective polariser has the second shape One or two in shape, and described first shape and described second shape are many by aspheric surface Described by item formula rise equation.

Embodiment 257 is the optical system of any one in embodiment 208 to 256, its Described in multilayer reflective polariser include polymeric layer alternately.

Embodiment 258 is the optical system of any one in embodiment 208 to 257, its Described in multilayer reflective polariser be hot formed APF.

Embodiment 259 is the optical system of any one in embodiment 208 to 257, its Described in multilayer reflective polariser include wire-grid polarizer.

Embodiment 260 is the optical system of any one in embodiment 208 to 259, its Described in multilayer reflective polariser be rotational symmetric.

Embodiment 261 is the optical system of any one in embodiment 208 to 260, its Described in integral optical stacking include the second optical lens.

Embodiment 262 is the optical system of embodiment 261, wherein said one or four/ One ripple delayer is disposed between described first optical lens and described second optical lens.

Embodiment 263 is the optical system of embodiment 261 or 262, wherein said multilamellar Reflection type polarizer be disposed in the second optical lens in the face of the first type surface on described diaphragm surface On, and described part reflector be disposed in described first optical lens in the face of described image On the first type surface on surface.

Embodiment 264 is a kind of optical system, including:

Imaging surface；

Substantially planar diaphragm surface；And

It is arranged between described imaging surface and described diaphragm surface:

First, second, and third optical lens；

Wherein said optical system include being arranged in described imaging surface and described diaphragm surface it Between multiple first type surfaces, each first type surface is along the first orthogonal axle and the second axle towards described figure Image surface protrudes, and six different first type surfaces of at least a part of which have six kinds of different convexitys.

Embodiment 265 is the optical system of embodiment 264, wherein said multiple first type surfaces The first and second relative first type surfaces, described second optical lens including described first optical lens The first and second relative first type surfaces of mirror and relative first of described 3rd optical lens With the second first type surface, each first first type surface is in the face of described diaphragm surface, and each second is main Surface is in the face of described imaging surface.

Embodiment 266 is the optical system of embodiment 265, wherein said second optical lens Mirror is disposed in described first and the 3rd between optical lens, and described 3rd optical lens quilt It is arranged between described diaphragm surface and described first optical lens.

Embodiment 267 is the optical system of embodiment 266, wherein said part reflector It is disposed on the first first type surface of described second optical lens.

Embodiment 268 is the optical system of embodiment 266 or 267, wherein said multilamellar Reflection type polarizer is disposed on the second first type surface of described 3rd optical lens.

Embodiment 269 is the optical system of embodiment 268, wherein said one or four/ One ripple delayer is disposed on described multilayer reflective polariser.

Embodiment 270 is the optical system of any one in embodiment 266 to 269, enters One step be included in the two or four at least one wavelength in described predetermined multiple wavelength/ One ripple delayer, described second quarter-wave delayer is disposed in described second optical lens The second first type surface on.

Embodiment 271 is the optical system of embodiment 265, wherein said reflection type polarization Device is disposed on the first first type surface of described 3rd optical lens, and described one or four/ One ripple delayer is disposed on the second first type surface of described 3rd optical lens.

Embodiment 272 is the optical system of embodiment 271, wherein said part reflector It is disposed on the first or second first type surface of described second optical lens.

Embodiment 273 is the optical system of any one in embodiment 264 to 272, its Middle image source includes described imaging surface, and described diaphragm surface is emergent pupil.

Embodiment 274 is the optical system of embodiment 273, and wherein said image source includes Display pannel.

Embodiment 275 is the optical system of embodiment 274, wherein said display pannel It it is substantial transparent.

Embodiment 276 is the optical system of any one in embodiment 273 to 275, its Described in image source include shutter.

Embodiment 277 is the optical system of any one in embodiment 264 to 272, its Middle scanner-recorder includes described imaging surface, and described diaphragm surface is entrance pupil.

Embodiment 278 is the optical system of any one in embodiment 264 to 277, its Described in optical system to fold centered by optical axis, described folding optical axis is by being transmitted through described figure The optical path of the central ray of image surface limits.

Embodiment 279 is the optical system of any one in embodiment 264 to 278, its Described in diaphragm surface be suitable to overlapping with the entrance pupil of the second optical system.

Embodiment 280 is the optical system of embodiment 279, wherein said second optical system System is suitable to the image that record receives at described entrance pupil.

Embodiment 281 is the optical system of any one in embodiment 264 to 272, its Described in be suitable to the entrance pupil of eyes with observer overlapping on diaphragm surface.

Embodiment 282 is the optical system of any one in embodiment 264 to 272, its Middle image source includes described imaging surface, and described image source launches non-polarized light.

Embodiment 283 is the optical system of any one in embodiment 264 to 269, its Described in Optical stack system further include at least in described predetermined multiple wavelength The second quarter-wave delayer at individual wavelength, described second quarter-wave delayer is by cloth Putting between described part reflector and described imaging surface, described first quarter-wave postpones Device is disposed between described multilayer reflective polariser and described part reflector.

Embodiment 284 is the optical system of any one in embodiment 264 to 272, its Middle image source includes described imaging surface, described image source polarized light-emitting.

Embodiment 285 is the optical system of embodiment 284, and wherein said polarized light is line Polarization.

Embodiment 286 is the optical system of embodiment 284, and wherein said polarized light is round Polarization.

Embodiment 287 is the optical system of embodiment 284, and wherein said polarized light is ellipse Circularly polarized.

Embodiment 288 is the optical system of any one in embodiment 264 to 287, its Described in part reflector be the second reflection type polarizer.

Embodiment 289 is the optical system of any one in embodiment 264 to 288, its Described in part reflector have in described predetermined multiple wavelength at least 30% average light Learn absorbance.

Embodiment 290 is the optical system of any one in embodiment 264 to 289, its Described in predetermined multiple wavelength include at least one continuous print wave-length coverage.

Embodiment 291 is the optical system of any one in embodiment 264 to 290, its Described in predetermined multiple wavelength include the wavelength of visible-range.

Embodiment 292 is the optical system of embodiment 291, wherein said visible-range From 400nm to 700nm.

Embodiment 293 is the optical system of any one in embodiment 264 to 292, its Described in predetermined multiple wavelength include the wavelength of infra-red range.

Embodiment 294 is the optical system of any one in embodiment 264 to 293, its Described in predetermined multiple wavelength include in infrared, visible ray and ultraviolet wavelength or many ?.

Embodiment 295 is the optical system of any one in embodiment 264 to 294, its Described in part reflector be trap reflector.

Embodiment 296 is the optical system of embodiment 295, wherein said predetermined multiple Wavelength includes in one or more continuous wavelength scope, and wherein said continuous wavelength scope At least one there is the full width at half maximum less than 100nm.

Embodiment 297 is the optical system of embodiment 296, and wherein said full width at half maximum is not More than 50nm.

Embodiment 298 is the optical system of any one in embodiment 264 to 297, its Described in multilayer reflective polariser there is at least one primary importance, described primary importance is away from wearing The optical axis on the summit crossing described multilayer reflective polariser has radial distance r1, and away from institute Stating apex to be perpendicular to the plane of described optical axis and have displacement s1, s1/r1 is at least 0.1.

Embodiment 299 is the optical system of embodiment 298, and wherein s1/r1 is at least 0.2.

Embodiment 300 is the optical system of embodiment 298, wherein s1/r1 0.2 to In the range of 0.8.

Embodiment 301 is the optical system of embodiment 298, wherein s1/r1 0.3 to In the range of 0.6.

Embodiment 302 is the optical system of any one in embodiment 298 to 301, its Described in multilayer reflective polariser there is the second position, the described second position has away from described light The radial distance r2 of axle and the displacement s2, s2/r2 away from described plane is at least 0.3.

Embodiment 303 is the optical system of any one in embodiment 264 to 297, its Described in multilayer reflective polariser there is at least one primary importance, described primary importance is away from wearing The optical axis on the summit crossing described multilayer reflective polariser has radial distance r1, and away from institute Stating apex to be perpendicular to the plane of described optical axis and have displacement s1, s1/r1 is at least 0.2, and The wherein region of the described reflection type polarizer for being limited by s1 and r1, described reflective partially Shake the maximum change less than about 2 degree of the axis of homology of device.

Embodiment 304 is the optical system of embodiment 303, wherein said reflection type polarization The maximum change of the axis of homology of device less than about 1.5 degree.

Embodiment 305 is the optical system of any one in embodiment 264 to 304, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1.5 degree.

Embodiment 306 is the optical system of any one in embodiment 264 to 304, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1 degree.

Embodiment 307 is the optical system of any one in embodiment 264 to 306, its Described in multilayer reflective polariser include at least one of which, described at least one of which is described at least one At least one first position of the optical axis leaving described second Optical stack on layer is basic Upper the most optically biaxial, and be substantially leaving at least one second position of described optical axis Optically uniaxial.

Embodiment 308 is the optical system of any one in embodiment 264 to 307, its Described in multilayer reflective polariser be that the optical axis about described second Optical stack substantially revolves Turn symmetrical hot forming multilayer reflective polariser.

Embodiment 309 is the optical system of any one in embodiment 264 to 308, its Described in multilayer reflective polariser be that the optical axis about described second Optical stack is rotationally symmetrical Hot forming multilayer reflective polariser.

Embodiment 310 is the optical system of any one in embodiment 264 to 309, its In through the substantially any chief ray on described imaging surface and described diaphragm surface with less than about The incident angles of 25 degree is at described part reflector, described multilayer reflective polariser and described On each in first quarter-wave delayer.

Embodiment 311 is the optical system of any one in embodiment 264 to 272, its Middle image source includes described imaging surface, and described image source launches undistorted image, described part Reflector has the first shape, and described reflection type polarizer has the second different shapes, The distortion making the launched undistorted image by described diaphragm surface transmission is less than described diaphragm About the 10% of visual field, surface.

Embodiment 312 is the optical system of embodiment 311, wherein by described diaphragm surface The distortion of launched undistorted image of transmission is less than about the 5% of visual field, described diaphragm surface.

Embodiment 313 is the optical system of embodiment 311, wherein by described diaphragm surface The distortion of launched undistorted image of transmission is less than about the 3% of visual field, described diaphragm surface.

Embodiment 314 is the optical system of any one in embodiment 264 to 313, its In at least there is first wave length and the in visible wavelength range, at a distance of at least 150nm Two wavelength and launched by described imaging surface and basic by described diaphragm surface transmission Upper any chief ray has hundred less than visual field, described diaphragm surface in described diaphragm surface The color separation distance of/1.5.

Embodiment 315 is the optical system of embodiment 314, wherein on described diaphragm surface The described color separation distance at place is less than percent the 1.2 of visual field, described diaphragm surface.

Embodiment 316 is the optical system of any one in embodiment 264 to 315, its In at least there is first wave length and the in visible wavelength range, at a distance of at least 150nm Two wavelength and be transmitted through described imaging surface and the substantially any master on described diaphragm surface Light has the color separation distance divided less than 20 arcs in described diaphragm surface.

Embodiment 317 is the optical system of embodiment 316, wherein on described diaphragm surface The described color separation distance at place is divided less than 10 arcs.

Embodiment 318 is the optical system of any one in embodiment 264 to 249, its Described in part reflector there is the first shape, described multilayer reflective polariser has the second shape One or two in shape, and described first shape and described second shape are many by aspheric surface Described by item formula rise equation.

Embodiment 319 is the optical system of any one in embodiment 264 to 318, its Described in multilayer reflective polariser include polymeric layer alternately.

Embodiment 320 is the optical system of any one in embodiment 264 to 319, its Described in multilayer reflective polariser be hot formed APF.

Embodiment 321 is the optical system of any one in embodiment 264 to 319, its Described in multilayer reflective polariser include wire-grid polarizer.

Embodiment 322 is the optical system of any one in embodiment 264 to 321, its Described in multilayer reflective polariser be rotational symmetric.

Embodiment 323 is the optical system of any one in embodiment 264 to 322, its Described at least one in first, second, and third optical lens have relative to described diaphragm Surface and the described adjustable position of imaging surface user.

Embodiment 324 is the optical system of any one in embodiment 264 to 323, its Described at least one in first, second, and third optical lens there is the adjustable shape of user Shape.

Embodiment 325 is the optical system of any one in embodiment 264 to 324, its Described in imaging surface be substantially planar.

Embodiment 326 is the optical system of any one in embodiment 264 to 324, its Described in imaging surface be bending.

Embodiment 327 is the optical system of any one in embodiment 1 to 326, has The contrast in described diaphragm surface of at least 40 on the visual field of described optical system.

Embodiment 328 is the optical system of any one in embodiment 1 to 327, has The contrast in described diaphragm surface of at least 50 on the visual field of described optical system.

Embodiment 329 is the optical system of any one in embodiment 1 to 328, has The contrast in described diaphragm surface of at least 60 on the visual field of described optical system.

Embodiment 330 is the optical system of any one in embodiment 1 to 329, has The contrast in described diaphragm surface of at least 80 on the visual field of described optical system.

Embodiment 331 is the optical system of any one in embodiment 1 to 330, has The contrast in described diaphragm surface of at least 100 on the visual field of described optical system.

Embodiment 332 is the optical system of any one in embodiment 1 to 333, wherein At least one lens has non-homogeneous edge contour.

Embodiment 333 is the optical system of embodiment 332, wherein said edge contour bag Include when described optical system uses in head mounted display, be suitable to adapt to the shape of face.

Embodiment 334 is a kind of hot forming multilayer reflective polariser, described hot forming multilamellar Reflection type polarizer is about the optical axis on the summit through described hot forming multilayer reflective polariser The most rotationally symmetrical and along the first orthogonal axle and the second axle being orthogonal to described optical axis Protruding, described hot forming multilayer reflective polariser has:

At least one internal layer, is substantially leaving at least one first position on described summit Optically uniaxial；And

At least one primary importance on described reflection type polarizer, has footpath away from described optical axis To distance r1 and away from the plane being perpendicular to described optical axis at described apex, there is displacement s1, S1/r1 is at least 0.2.

Embodiment 335 is the hot forming multilayer reflective polariser of embodiment 334, wherein The region of the described reflection type polarizer for being limited by s1 and r1, described reflection type polarizer The maximum change less than about 2 degree of the axis of homology.

Embodiment 336 is the optical system of embodiment 335, wherein said reflection type polarization The maximum change of the axis of homology of device less than about 1.5 degree.

Embodiment 337 is the optical system of any one in embodiment 334 to 336, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1.5 degree.

Embodiment 338 is the optical system of any one in embodiment 334 to 336, its In described in the reflection hole of described reflection type polarizer the axis of homology of reflection type polarizer Maximum change less than about 1 degree.

Embodiment 339 is that the hot forming multilamellar of any one in embodiment 334 to 338 is anti- Penetrating formula polariser, at least one internal layer wherein said is at least one of which leaving described summit At least one second position is the most optically biaxial.

Embodiment 340 is a kind of hot forming multilayer reflective polariser, described hot forming multilamellar Reflection type polarizer is about the optical axis on the summit through described hot forming multilayer reflective polariser The most rotationally symmetrical and along the first orthogonal axle and the second axle being orthogonal to described optical axis Protruding, described hot forming multilayer reflective polariser has:

At least one primary importance on described reflection type polarizer, has footpath away from described optical axis To distance r1 and away from the plane being perpendicular to described optical axis at described apex, there is displacement s1, S1/r1 is at least 0.2,

The wherein region of the described reflection type polarizer for being limited by s1 and r1, described reflection The maximum change of the axis of homology of formula polariser less than about 2 degree.

Embodiment 341 is the hot forming multilayer reflective polariser of embodiment 340, wherein The maximum change of the axis of homology of described reflection type polarizer less than about 1.5 degree.

Embodiment 342 is the hot forming multilayer reflective polariser of embodiment 340 or 341, Including at least one of which, described at least one of which leaving in described at least one of which described reflective partially At least one first position of optical axis of device of shaking is the most optically biaxial, and is leaving At least one second position of described optical axis is the most optically uniaxial.

Embodiment 343 is that the hot forming multilamellar of any one in embodiment 334 to 342 is anti- Penetrating formula polariser, wherein s1/r1 is less than about 0.8.

Embodiment 344 is that the hot forming multilamellar of any one in embodiment 334 to 343 is anti- Penetrating formula polariser, wherein said reflection type polarizer has the second position, the described second position away from Described optical axis has radial distance r2, and has displacement s2 away from described plane, and s2/r2 is less than 0.3。

Embodiment 345 is that the hot forming multilamellar of any one in embodiment 334 to 344 is anti- Penetrating formula polariser, wherein the azimuthal variation in s1/r1 is less than 10%.

Embodiment 346 is that the hot forming multilamellar of any one in embodiment 334 to 344 is anti- Penetrating formula polariser, wherein the azimuthal variation in s1/r1 is less than 8%.

Embodiment 347 is that the hot forming multilamellar of any one in embodiment 334 to 344 is anti- Penetrating formula polariser, wherein the azimuthal variation in s1/r1 is less than 6%.

Embodiment 348 is that the hot forming multilamellar of any one in embodiment 334 to 344 is anti- Penetrating formula polariser, wherein the azimuthal variation in s1/r1 is less than 4%.

Embodiment 349 is that the hot forming multilamellar of any one in embodiment 334 to 344 is anti- Penetrating formula polariser, wherein the azimuthal variation in s1/r1 is less than 2%.

Embodiment 350 is that the hot forming multilamellar of any one in embodiment 334 to 344 is anti- Penetrating formula polariser, wherein the azimuthal variation in s1/r1 is less than 1%.

Embodiment 351 is that the hot forming multilamellar of any one in embodiment 334 to 350 is anti- Penetrate formula polariser, including polymeric layer alternately.

Embodiment 352 is that the hot forming multilamellar of any one in embodiment 334 to 351 is anti- Penetrating formula polariser, described hot forming multilayer reflective polariser is hot forming APF.

Embodiment 353 is that the hot forming multilamellar of any one in embodiment 334 to 351 is anti- Penetrate formula polariser, including wire-grid polarizer.

Embodiment 354 is a kind of lens, and described lens have about two orthogonal direction bendings Surface, and include arranging on said surface according in embodiment 334 to 353 The hot forming multilayer reflective polariser of any one.

Embodiment 355 is a kind of Optical stack, including:

First lens；

Second lens, neighbouring described first lens；

Quarter-wave delayer, is arranged between described first lens and described second lens；

Reflection type polarizer, is arranged on the second lens relative with described first lens；And

Part reflector, is arranged on described first lens relative with described second lens,

Wherein said reflection type polarizer bends about two normal axis, and wherein said optics Stacking is integral optical stacking.

Embodiment 356 is the Optical stack of embodiment 355, wherein said first lens bag Include the first material, and described second lens include the second material.

Embodiment 357 is the Optical stack of embodiment 356, wherein said first material and Described second material is identical.

Embodiment 358 is the Optical stack of embodiment 356, wherein said first material and Described second material is different.

Embodiment 359 is the Optical stack of embodiment 355, wherein said first material and At least one in described second material is polymer.

Embodiment 360 is the Optical stack of embodiment 359, and wherein said first material is First polymer and described second material are the second polymer.

Embodiment 361 is the Optical stack of embodiment 360, wherein said first polymer Different with described second polymer.

Embodiment 362 is any one in embodiment 355 or 356 or 358 to 361 Optical stack, wherein said first lens and described second lens have different Abbe numbers.

Embodiment 363 is the Optical stack of embodiment 362, wherein said first lens and The difference of the Abbe number of described second lens is in the range of 5 to 50.

Embodiment 364 is the Optical stack of any one in embodiment 355 to 363, its Described in the first lens and described second lens one there is the Abbe number more than 45, and And another in described first lens and described second lens has the Abbe number less than 45.

Embodiment 365 is the Optical stack of any one in embodiment 355 to 364, its Described in the first lens and described second lens one there is the Abbe number more than 50, and And another in described first lens and described second lens has the Abbe number less than 40.

Embodiment 366 is the Optical stack of any one in embodiment 355 to 365, its Described in reflection type polarizer be the hot forming multilamellar of any one in embodiment 334 to 353 Reflection type polarizer.

Embodiment 367 is the Optical stack of any one in embodiment 355 to 366, its Described in part reflector have in desired multiple wavelength at least 30% average light reflection Rate.

Embodiment 368 is the Optical stack of any one in embodiment 355 to 367, its Described in part reflector have in desired multiple wavelength at least 30% average light transmission Rate.

Embodiment 369 is the Optical stack of any one in embodiment 355 to 368, its Described in part reflector be reflection type polarizer.

Embodiment 370 is the Optical stack of any one in embodiment 355 to 369, its Described in desired multiple wavelength include at least one continuous wavelength scope.

Embodiment 371 is the Optical stack of any one in embodiment 355 to 370, its Described in desired multiple wavelength include the wavelength of visible-range.

Embodiment 372 is the Optical stack of embodiment 371, wherein said visible-range From 400nm to 700nm.

Embodiment 373 is the Optical stack of any one in embodiment 355 to 372, its Described in desired multiple wavelength include the wavelength of infra-red range.

Embodiment 374 is the Optical stack of any one in embodiment 355 to 373, its Described in desired multiple wavelength include in infrared, visible ray and ultraviolet wavelength or many ?.

Embodiment 375 is the Optical stack of any one in embodiment 355 to 374, its Described in part reflector be trap reflector.

Embodiment 376 is the Optical stack of any one in embodiment 355 to 375, its Described in desired multiple wavelength include one or more continuous print wave-length coverage, and wherein At least one in described continuous wavelength scope has the full width at half maximum less than 100nm.

Embodiment 377 is the Optical stack of any one in embodiment 355 to 376, its Described in full width at half maximum less than 50nm.

Embodiment 378 is a kind of optical system, including imaging surface, diaphragm surface and layout Arbitrary in embodiment 355 to 376 between described imaging surface and described diaphragm surface The Optical stack of item.

Embodiment 379 is a kind of optical system, including imaging surface, diaphragm surface and layout Arbitrary in embodiment 334 to 353 between described imaging surface and described diaphragm surface The hot forming multilayer reflective polariser of item.

Embodiment 380 is the optical system of embodiment 379, farther includes:

The quarter-wave being arranged between described imaging surface and described reflection type polarizer prolongs Device late；And it is arranged in the part between described imaging surface and described quarter-wave delayer Reflector.

Embodiment 381 is the optical system of any one in embodiment 1 to 333, wherein Described reflection type polarizer is that the hot forming according to any one in embodiment 334 to 353 is many Layer reflection type polarizer.

Embodiment 382 is a kind of method making Optical stack, including:

There is provided centered by tool shaft and have about described tool shaft non-rotationally-symmetric outside The hot forming instrument on surface；

Blooming is heated, produces the blooming softened；

The blooming making described softening adapts to described outer surface, simultaneously at least along leaving described work The orthogonal first direction of tool axle and second direction stretch the film of described softening, produce the light adapted to Learning film, the blooming of described adaptation is about the optical axis rotation asymmetry of the film of described adaptation, described Optical axis is consistent with described tool shaft；

Cool down the blooming of described adaptation, produce about the rotational symmetric symmetrical optical of described optical axis Film；And

Described symmetrical optical film moulds optical lens, produces described Optical stack.

Embodiment 383 is the method for embodiment 382, and wherein said cooling step is further Discharge from described instrument including by described blooming.

Embodiment 384 is the method for embodiment 382 or 383, wherein said molding optics Lens step is included on optical lens that to mould the second film relative with described blooming.

Embodiment 385 is the method for embodiment 384, and wherein said second film includes part Reflector.

Embodiment 386 is the method for any one in embodiment 382 to 385, Qi Zhongsuo State blooming and include reflection type polarizer.

Embodiment 387 is the method for embodiment 386, and wherein said blooming wraps further Include quarter-wave delayer.

Embodiment 388 is the method for embodiment 386 or 387, wherein said reflective partially The device that shakes is multiple layer polymer reflection type polarizer.

Embodiment 389 is the method for embodiment 388, and wherein said reflection type polarizer is APF。

Embodiment 390 is the method for embodiment 386 or 387, wherein said reflective partially The device that shakes is wire-grid polarizer.

Embodiment 391 is a kind of method that making has the expectation blooming of intended shape, bag Include:

The hot forming instrument of the outer surface with the first shape being different from intended shape is provided；

Blooming is heated, produces the blooming softened；

When described softening film is stretched along the most orthogonal first direction and second direction, make The blooming of described softening adapts to the outer surface with described first shape, produces and has the first shape The blooming of the adaptation of shape；

Cool down the blooming of described adaptation, produce the expectation blooming with described intended shape.

Embodiment 392 is the method for embodiment 391, and wherein said cooling step is further Discharge from described instrument including by the blooming of described adaptation.

Embodiment 393 is the method for embodiment 391 or 392, wherein said intended shape It is that the optical axis about described expectation blooming is rotational symmetric.

Embodiment 394 is the method for any one in embodiment 391 to 393, Qi Zhongsuo State hot forming instrument centered by tool shaft, and described outer surface is about the non-rotation of described tool shaft Turn symmetry.

Embodiment 395 is the method for any one in embodiment 391 to 393, further It is included on described expectation blooming molding optical lens, produces Optical stack.

Embodiment 396 is the method for embodiment 395, and wherein said molding optical lens walks Suddenly it is included on optical lens that to mould the second film relative with described expectation blooming.

Embodiment 397 is the method for embodiment 396, and wherein said second film includes part Reflector.

Embodiment 398 is the method for any one in embodiment 391 to 397, Qi Zhongsuo State expectation blooming and include reflection type polarizer.

Embodiment 399 is the method for embodiment 398, and wherein said expectation blooming enters one Step includes quarter-wave delayer.

Embodiment 400 is the method for embodiment 398 or 399, wherein said reflective partially The device that shakes is multiple layer polymer reflection type polarizer.

Embodiment 401 is the method for embodiment 400, and wherein said reflection type polarizer is APF。

Embodiment 402 is the method for embodiment 398 or 399, wherein said reflective partially The device that shakes is wire-grid polarizer.

Embodiment 403 is a kind of optical system, including:

Imaging surface；

Diaphragm surface；

First Optical stack, is arranged between described imaging surface and described diaphragm surface, and Including:

First optical lens；

Second Optical stack, is arranged between described first Optical stack and described diaphragm surface, And including:

Second optical lens；

Hot forming multilayer reflective polariser, the optical axis about described second Optical stack revolves Turn symmetrical and along being orthogonal to the first orthogonal axle of described optical axis and the second axle towards institute State imaging surface to protrude, described hot forming multilayer reflective polariser have at least one the One position, described primary importance is away from the top through described hot forming multilayer reflective polariser The optical axis of point has radial distance r1, and is perpendicular to described optical axis away from described apex Plane there is displacement s1, s1/r1 is at least 0.1；And

Embodiment 404 is the optical system of embodiment 403, and wherein image source includes described Imaging surface, and described diaphragm surface is emergent pupil.

Embodiment 405 is the optical system of embodiment 404, and wherein said image source includes Display pannel.

Embodiment 406 is the optical system of embodiment 405, wherein said display pannel It is transparent or translucent.

Embodiment 407 is the optical system of any one in embodiment 404 to 406, its Described in image source include shutter.

Embodiment 408 is the optical system of embodiment 403, and wherein said image source includes Be suitable to receive the hole of the light reflected from the object outside described optical system.

Embodiment 409 is the optical system of embodiment 403, and wherein scanner-recorder includes Described imaging surface, and described diaphragm surface is entrance pupil.

Embodiment 410 is the optical system of any one in embodiment 403 to 409, its Described in optical system to fold centered by optical axis, described folding optical axis is by being transmitted through described figure The optical path of the central ray of image surface limits.

Embodiment 411 is the optical system of any one in embodiment 403 to 410, its Described in diaphragm surface be suitable to overlapping with the entrance pupil of the second optical system.

Embodiment 412 is the optical system of embodiment 411, wherein said second optical system System is suitable to the image that record receives at described entrance pupil.

Embodiment 413 is the optical system of embodiment 403, and wherein said diaphragm surface is fitted Overlapping in the entrance pupil of the eyes with observer.

Embodiment 414 is the optical system of embodiment 403, and wherein image source includes described Imaging surface, described image source launches non-polarized light.

Embodiment 415 is the optical system of any one in embodiment 403 to 414, its Described in the first Optical stack farther include to be arranged in described part reflector and described image The second quarter-wave delayer between surface.

Embodiment 416 is the optical system of embodiment 403, and wherein image source includes described Imaging surface, described image source polarized light-emitting.

Embodiment 417 is the optical system of embodiment 416, and wherein said polarized light is line Polarization.

Embodiment 418 is the optical system of embodiment 416, and wherein said polarized light is round Polarization.

Embodiment 419 is the optical system of embodiment 416, and wherein said polarized light is ellipse Circularly polarized.

Embodiment 420 is the optical system of any one in embodiment 403 to 419, its Described in part reflector be the second reflection type polarizer.

Embodiment 421 is the optical system of any one in embodiment 403 to 420, its Described in part reflector have in described desired multiple wavelength at least 30% average light Learn absorbance.

Embodiment 422 is the optical system of any one in embodiment 403 to 421, its Described in desired multiple wavelength include at least one continuous print wave-length coverage.

Embodiment 423 is the optical system of any one in embodiment 403 to 422, its Described in desired multiple wavelength include the wavelength of visible-range.

Embodiment 424 is the optical system of embodiment 423, wherein said visible-range From 400nm to 700nm.

Embodiment 425 is the optical system of any one in embodiment 403 to 424, its Described in desired multiple wavelength include the wavelength of infra-red range.

Embodiment 426 is the optical system of any one in embodiment 403 to 425, its Described in desired multiple wavelength include in infrared, visible ray and ultraviolet wavelength or many ?.

Embodiment 427 is the optical system of any one in embodiment 403 to 426, its Described in part reflector be trap reflector.

Embodiment 428 is the optical system of embodiment 427, wherein said desired multiple Wavelength includes in one or more continuous wavelength scope, and wherein said continuous wavelength scope At least one there is the full width at half maximum less than 100nm.

Embodiment 429 is the optical system of embodiment 428, and wherein said full width at half maximum is not More than 50nm.

Embodiment 430 is the optical system of any one in embodiment 403 to 429, its Middle s1/r1 is at least 0.2.

Embodiment 431 is the optical system of any one in embodiment 403 to 430, its Middle s1/r1 is in the range of 0.2 to 0.8.

Embodiment 432 is the optical system of any one in embodiment 403 to 431, its Middle s1/r1 is in the range of 0.3 to 0.6.

Embodiment 433 is the optical system of any one in embodiment 424 to 432, its Described in multilayer reflective polariser there is the second position, the described second position has away from described light The radial distance r2 of axle and the displacement s2, s2/r2 away from described plane is at least 0.3.

Embodiment 434 is the optical system of any one in embodiment 403 to 433, its In the region of described reflection type polarizer for being limited by s1 and r1, described reflection type polarization The maximum change of the axis of homology of device less than about 2 degree.

Embodiment 435 is the optical system of any one in embodiment 403 to 433, its In the region of described reflection type polarizer for being limited by s1 and r1, described reflection type polarization The maximum change of the axis of homology of device less than about 1.5 degree.

Embodiment 436 is the optical system of any one in embodiment 403 to 433, its In the region of described reflection type polarizer for being limited by s1 and r1, described reflection type polarization The maximum change of the axis of homology of device less than about 1 degree.

Embodiment 437 is the optical system of any one in embodiment 403 to 436, its Described in the first optical lens have in the face of described second optical lens the first first type surface and In the face of the second relative first type surface of described imaging surface, and described second optical lens has In the face of first first type surface on described diaphragm surface and relative in the face of described first optical lens The second first type surface.

Embodiment 438 is the optical system of embodiment 437, wherein said part reflector It is disposed on described first first type surface or described second first type surface of described first lens.

Embodiment 439 is the optical system of embodiment 437, wherein said part reflector It is disposed on described first first type surface of described first lens, and the second quarter-wave prolongs Device is disposed on described second first type surface of described first lens late.

Embodiment 440 is the optical system of embodiment 437, wherein said part reflector It is disposed on described second first type surface of described first lens, and the second quarter-wave prolongs Device is disposed on described part reflector described second first type surface with described first lens late Relatively.

Embodiment 441 is the optical system of embodiment 437, wherein the second quarter-wave Delayer is disposed on described first first type surface of described first optical lens, and described portion Reflector is divided to be disposed on described second quarter-wave delayer and described first optical lens Described first first type surface of mirror is relative.

Embodiment 442 is the optical system of embodiment 437, wherein said one or four/ One ripple delayer is disposed on described second first type surface of described second optical lens, and institute State multilayer reflective polariser and be disposed in described first first type surface of described second optical lens On.

Embodiment 443 is the optical system of embodiment 437, wherein said multilayer reflective Polariser is disposed on described second first type surface of described second optical lens, and described One quarter-wave delayer is disposed on described multilayer reflective polariser with described second Described second first type surface of optical lens is relative.

Embodiment 444 is the optical system of any one in embodiment 403 to 443, its Described in multilayer reflective polariser include at least one of which, described at least one of which is described at least one At least one first position of the optical axis leaving described second Optical stack on layer is basic Upper the most optically biaxial, and be substantially leaving at least one second position of described optical axis Optically uniaxial.

Embodiment 445 is the optical system of any one in embodiment 403 to 444, its In through the substantially any chief ray on described imaging surface and described diaphragm surface with less than about Every in described first Optical stack and described second Optical stack of the incident angles of 25 degree On individual.

Embodiment 446 is the optical system of any one in embodiment 403 to 445, its Described in the first Optical stack and described second Optical stack there is substantially the same shape.

Embodiment 447 is the optical system of any one in embodiment 403 to 445, its Described in the first Optical stack and described second Optical stack there is different shapes.

Embodiment 448 is the optical system of any one in embodiment 403 to 447, its Described in each lens in the first lens and described second lens be planar lens.

Embodiment 449 is the optical system of any one in embodiment 403 to 448, its Described in the first optical lens and described second optical lens there is substantially the same shape.

Embodiment 450 is the optical system of any one in embodiment 403 to 448, its Described in the first optical lens and described second optical lens there is different shapes.

Embodiment 451 is the optical system of any one in embodiment 403 to 450, its Described in imaging surface be substantially planar.

Embodiment 452 is the optical system of any one in embodiment 403 to 450, its Described in imaging surface be substantially curved.

Embodiment 453 is the optical system of embodiment 403, and wherein image source includes described Imaging surface, described image source transmitting undistorted image, described part reflector has the first shape Shape, and described reflection type polarizer has the second different shapes so that by described apertured sheet The distortion of launched undistorted image of face transmission is less than the pact of visual field, described diaphragm surface 10%.

Embodiment 454 is the optical system of embodiment 453, wherein by described diaphragm surface The distortion of launched undistorted image of transmission is less than about the 5% of visual field, described diaphragm surface.

Embodiment 455 is the optical system of embodiment 453, wherein by described diaphragm surface The distortion of launched undistorted image of transmission is less than about the 3% of visual field, described diaphragm surface.

Embodiment 456 is the optical system of any one in embodiment 403 to 455, its In at least there is first wave length and the in visible wavelength range, at a distance of at least 150nm Two wavelength and be transmitted through described imaging surface and the substantially any master on described diaphragm surface Light has percent 1.5 less than visual field, described diaphragm surface in described diaphragm surface Color separation distance.

Embodiment 457 is the optical system of embodiment 456, wherein on described diaphragm surface The described color separation distance at place is less than percent the 1.2 of visual field, described diaphragm surface.

Embodiment 458 is the optical system of any one in embodiment 403 to 457, its In at least there is first wave length and the in visible wavelength range, at a distance of at least 150nm Two wavelength and be transmitted through described imaging surface and the substantially any master on described diaphragm surface Light has the color separation distance divided less than 20 arcs in described diaphragm surface.

Embodiment 459 is the optical system of embodiment 458, wherein on described diaphragm surface The described color separation distance at place is divided less than 10 arcs.

Embodiment 460 is the optical system of any one in embodiment 403 to 459, its Described in part reflector there is the first shape, described multilayer reflective polariser has the second shape One or two in shape, and described first shape and described second shape are many by aspheric surface Described by item formula rise equation.

Embodiment 461 is the optical system of any one in embodiment 403 to 460, its Described in multilayer reflective polariser include polymeric layer alternately.

Embodiment 462 is the optical system of any one in embodiment 403 to 461, its Described in multilayer reflective polariser be hot formed APF.

Embodiment 463 is the optical system of any one in embodiment 403 to 461, its Described in multilayer reflective polariser include wire-grid polarizer.

Embodiment 464 is the optical system of any one in embodiment 403 to 463, its Described at least one Optical stack tool in the first Optical stack and described second Optical stack Have relative to described diaphragm surface and the adjustable position of described imaging surface.

Embodiment 465 is the optical system of any one in embodiment 403 to 464, its Described in the first Optical stack there is adjustable shape.

Embodiment 466 is a kind of optical system, including:

Part reflector, has the average light reflection of at least 30% in desired multiple wavelength Rate；And

Multilayer reflective polariser, substantially transmission have the light and substantially of the first polarization state Reflection has the light of the second orthogonal polarization state, and described multilayer reflective polariser is along orthogonal First axle and the second crown of roll go out, at least one primary importance on described multilayer reflective polariser Optical axis away from described multilayer reflective polariser has radial distance r1 and away from described multilamellar The apex of reflection type polarizer is perpendicular to the plane of described optical axis and has displacement s1, and s1/r1 is At least 0.1；And

First quarter-wave delayer, is arranged in described part reflector and described reflection multilayer Between formula polariser, wherein said multilayer reflective polariser includes at least one of which, described at least One layer of at least one first position leaving described optical axis in described at least one of which is base In basis optically biaxial, and be basic leaving at least one second position of described optical axis Upper optically uniaxial.

Embodiment 467 is the optical system of embodiment 466, wherein said multilayer reflective Polariser is arranged to neighbouring described part reflector and spaced apart with described part reflector.

Embodiment 468 is embodiment 466 or the optical system of embodiment 467, its In the first Optical stack include the first optical lens and described part reflector.

Embodiment 469 is the optical system of any one in embodiment 466 to 468, its In the second Optical stack include the second optical lens and described multilayer reflective polariser.

Embodiment 470 is a kind of optical system, including:

First Optical stack, described first Optical stack includes:

First optical lens；And

Second Optical stack, is arranged proximate to described first Optical stack and along orthogonal One axle and the second crown of roll go out, and described second Optical stack includes:

Second optical lens；

Multilayer reflective polariser, substantially transmission have light and the base of the first polarization state In basis, reflection has the light of the second orthogonal polarization state, on described multilayer reflective polariser At least one primary importance optical axis away from described second Optical stack there is radial distance r1 And the plane of described optical axis it is perpendicular to away from the apex at described multilayer reflective polariser Having displacement s1, s1/r1 is at least 0.1；And

First quarter-wave delayer, is arranged in described second Optical stack and described first light Learn between stacking,

Wherein said multilayer reflective polariser includes at least one of which, and described at least one of which is described At least one first position leaving described optical axis at least one of which is that substantially optics is double Axle, and be the most optically uniaxial leaving at least one second position of described optical axis 's.

Embodiment 471 is a kind of optical system, including:

First Optical stack, described first Optical stack includes:

First optical lens；And

Second optical lens；

Reflection type polarizer, substantially transmission have the light and substantially of the first polarization state Reflection has the light of the second orthogonal polarization state, at least on described reflection type polarizer The individual primary importance optical axis away from described second Optical stack have radial distance r1 and away from The apex of described reflection type polarizer is perpendicular to the plane of described optical axis and has displacement s1, S1/r1 is at least 0.1；And

Wherein said optical system has the contrast of at least 50 on the visual field of described optical system Degree.

Embodiment 472 is the optical system of embodiment 471, wherein said contrast be to Few 60.

Embodiment 473 is the optical system of embodiment 471, wherein said contrast be to Few 80.

Embodiment 474 is the optical system of embodiment 471, wherein said contrast be to Few 100.

Embodiment 475 is the optical system of any one in embodiment 469 to 474, its Described in the second Optical stack spaced apart with described first Optical stack.

Embodiment 476 is a kind of optical system, including:

First Optical stack, described first Optical stack includes:

First optical lens；And

Second optical lens；

Wherein said optical system is adapted to provide for adjustable refractive correction.

Embodiment 477 is the optical system of any one in embodiment 466 to 476, its Described in reflection type polarizer include at least one of which, described at least one of which is in described at least one of which At least one first position leaving described optical axis be the most optically biaxial, and At least one second position leaving described optical axis is the most optically uniaxial.

Embodiment 478 is the optical system of any one in embodiment 466 to 476, its Described in reflection type polarizer be wire-grid polarizer.

Embodiment 479 is the optical system of embodiment 476, wherein said adjustable in the wrong Light correction by the Adjustable Range between described first Optical stack and described second Optical stack, The shape-adjustable of described first Optical stack and the shape-adjustable of described second Optical stack In one or more provide.

Embodiment 480 is the optical system of any one in embodiment 466 to 479, enters One step includes imaging surface and diaphragm surface, is arranged in described imaging surface and described diaphragm surface Between described part reflector, be arranged between described part reflector and described diaphragm surface Described reflection type polarizer.

Embodiment 481 is the optical system of embodiment 480, wherein said reflection type polarization Device protrudes towards described imaging surface about the first orthogonal axle and the second axle.

Embodiment 482 is the optical system of embodiment 480 or 481, wherein said part Reflector protrudes towards described imaging surface about the first orthogonal axle and the second axle.

Embodiment 483 is the optical system of any one in embodiment 480 to 482, its In through the substantially any chief ray on described imaging surface and described diaphragm surface with less than about Each in described part reflector and described reflection type polarizer of the incident angles of 30 degree On.

Embodiment 484 is the optical system of any one in embodiment 480 to 482, its In through the substantially any chief ray on described imaging surface and described diaphragm surface with less than about Each in described part reflector and described reflection type polarizer of the incident angles of 25 degree On.

Embodiment 485 is in embodiment 466 to 477 or embodiment 479 to 482 The optical system of any one, wherein said reflection type polarizer is APF.

Embodiment 486 is in embodiment 466 to 477 or embodiment 479 to 485 The optical system of any one, wherein said reflection type polarizer is hot formed APF.

Embodiment 487 is the optical system of any one in embodiment 466 to 486, its Described in part reflector be the second reflection type polarizer.

Embodiment 488 is the optical system of any one in embodiment 466 to 487, its Described in part reflector have in described desired multiple wavelength at least 30% average light Absorbance.

Embodiment 489 is the optical system of any one in embodiment 466 to 488, its Described in desired multiple wavelength include at least one continuous print wave-length coverage.

Embodiment 490 is the optical system of any one in embodiment 466 to 489, its Described in desired multiple wavelength include the wavelength of visible-range.

Embodiment 491 is the optical system of embodiment 490, wherein said visible-range From 400nm to 700nm.

Embodiment 492 is the optical system of any one in embodiment 466 to 491, its Described in desired multiple wavelength include the wavelength of infra-red range.

Embodiment 493 is the optical system of any one in embodiment 466 to 492, its Described in desired multiple wavelength include in infrared, visible ray and ultraviolet wavelength or many ?.

Embodiment 494 is the optical system of any one in embodiment 466 to 493, its Described in part reflector be trap reflector.

Embodiment 495 is the optical system of embodiment 494, wherein said desired multiple Wavelength includes one or more continuous print wave-length coverage, and wherein said continuous wavelength scope In at least one there is the full width at half maximum less than 100nm.

Embodiment 496 is the optical system of embodiment 495, and wherein said full width at half maximum is not More than 50nm.

Embodiment 497 is the optical system of any one in embodiment 466 to 496, its Middle s1/r1 is at least 0.2.

Embodiment 498 is the optical system of any one in embodiment 466 to 497, its Middle s1/r1 is in the range of 0.2 to 0.8.

Embodiment 499 is the optical system of any one in embodiment 466 to 498, its Middle s1/r1 is in the range of 0.3 to 0.6.

Embodiment 500 is the optical system of any one in embodiment 466 to 499, its Described in reflection type polarizer there is the second position, the described second position has footpath away from described optical axis To distance r2, and having displacement s2 away from described plane, s2/r2 is at least 0.3.

Embodiment 501 is the optical system of any one in embodiment 466 to 500, its In the region of described reflection type polarizer for being limited by s1 and r1, described reflection type polarization The maximum change of the axis of homology of device less than about 2 degree.

Embodiment 502 is the optical system of any one in embodiment 466 to 501, institute Stating optical system is beam expander.

Embodiment 503 is a kind of beam expander, arbitrary including in embodiment 466 to 501 The optical system of item.

Embodiment 504 is a kind of optical projection system, including the beam expander of embodiment 503 and suitable In the image processing system of the light launching patterning, described optical projection system is configured to described figure Beam expander described in the light directing of case.

Embodiment 505 is the optical projection system of embodiment 504, the light of wherein said beam expander System is oriented with described part reflector in the face of described image processing system.

Embodiment 506 is the optical projection system of embodiment 504 or 505, farther includes cloth Put the polarization beam apparatus between described image processing system and described beam expander.

Embodiment 507 is the optical projection system of embodiment 506, farther includes to be arranged in institute State the second reflection type polarizer between beam expander and described polarization beam apparatus.

Embodiment 508 is the optical projection system of embodiment 506 or 507, wherein said polarization Beam splitter includes the first prism and the second prism and along described first prism and described second The diagonal plane of prism is arranged in the plane reflection between described first prism and described second prism Formula polariser.

Embodiment 509 is the optical projection system of embodiment 508, wherein said first prism quilt It is arranged between described second prism and described image processing system.

Embodiment 510 is the optical projection system of embodiment 508 or 509, wherein said first Prism has the first volume, and described second prism has the second volume, and described first volume Less than about half of described second volume.

Embodiment 511 is a kind of optical projection system, including beam expander and the photograph of embodiment 503 Funerary objects, described optical projection system is configured to described in the light directing that will export from described illumination apparatus expand Device.

Embodiment 512 is the optical projection system of embodiment 511, and wherein said illumination apparatus includes:

Polarization beam apparatus, including:

First prism, has input face, output face and the first hypotenuse；

Second prism, has imager face and the second hypotenuse, and described second hypotenuse is arranged Become neighbouring described first hypotenuse；And

Second reflection type polarizer, be arranged in described first hypotenuse and described second hypotenuse it Between；

Light source, is arranged to neighbouring described input face and the input that limits on described input face has Effect region；And

Image processing system, is arranged proximate to described imager face, for receiving from described light source The light launched and the light launching patterning, described image processing system has maximum image district Territory, described maximum image region limits the output effective coverage in described output face；

One or two in wherein said input effective coverage and described output effective coverage Less than about half of described maximum image region.

Embodiment 513 is the optical projection system of embodiment 512, the effective district of wherein said input Territory is less than about half of described maximum image region.

Embodiment 514 is the optical projection system of embodiment 512, the effective district of wherein said output Territory is less than about half of described maximum image region.

Embodiment 515 is the optical projection system of embodiment 512, the effective district of wherein said input About half less than described maximum image region each in territory and described output effective coverage.

Embodiment 516 is the optical projection system of embodiment 512, wherein the maximum table of input face Region, face is less than about half of described maximum image region.

Embodiment 517 is the optical projection system of embodiment 512, and wherein said output face is Big region, surface is less than about half of described maximum image region.

Embodiment 518 is the optical projection system of embodiment 512, the maximized surface district of input face Territory is less than about half of described maximum image region, and the maximized surface of wherein said output face Region is less than about half of described maximum image region.

Embodiment 519 is the optical projection system of embodiment 512, farther includes neighbouring described The reflective parts that polarization beam apparatus is positioned opposite with described light source.

Embodiment 520 is the optical projection system of embodiment 512, wherein said second reflective Polariser is that polymeric multilayer reflective formula polariser, wire-grid polarizer, MacNeille are reflective Polariser or cholesteric phase reflection type polarizer.

Embodiment 521 is the optical projection system of embodiment 512, wherein said second reflective Polariser is polymeric multilayer reflective formula polariser.

Embodiment 522 is any one in embodiment 1 to 333, or embodiment 378 Any one in 381, or the optical system of any one in embodiment 403 to 475, Wherein said optical system is adapted to provide for refractive correction.

Embodiment 523 is the optical system of embodiment 522, and wherein said refractive correction is Adjustable.

Embodiment 524 is a kind of device, including any one in embodiment 1 to 333, Or any one in embodiment 378 to 381, or in embodiment 403 to 523 The optical system of any one.

Embodiment 525 is the device of embodiment 524, and described device is head mounted display.

Embodiment 526 is the device of embodiment 524, and described device is beam expander, illumination Device or projector.

Embodiment 527 is the device of embodiment 524, and described device is camera.

Embodiment 528 is the device of embodiment 524, and described device is telescope, micro- Mirror or binocular.

Embodiment 529 is a kind of head mounted display, including the first optical system, and described the One optical system is any one in embodiment 1 to 333, or embodiment 378 to 381 In any one, or the optical system of any one in embodiment 403 to 523.

Embodiment 530 is the head mounted display of embodiment 529, farther includes eyes Tracking system.

Embodiment 531 is the head mounted display of embodiment 530, wherein said optical system System is suitable to: in response to the signal received from described eye tracking system, adjust described reflective partially Shake the position of device or the position of described part reflector.

Embodiment 532 is the head mounted display of embodiment 529, farther includes second Optical system, described second optical system is any one in embodiment 1 to 333, or Any one in embodiment 378 to 381, or arbitrary in embodiment 403 to 523 The optical system of item.

Embodiment 533 is the head mounted display of embodiment 532, farther includes eyes Tracking system.

Embodiment 534 is the head mounted display of embodiment 533, wherein said optical system System is suitable to: in response to the signal received from described eye tracking system, adjust described first optics The position of the reflection type polarizer of system or the part reflector of described first optical system Position.

Embodiment 535 is the head mounted display of embodiment 533 or 534, wherein said Optical system is suitable to: in response to the signal received from described eye tracking system, adjusts described The position of the reflection type polarizer of two optical systems or the part of described second optical system are anti- The position of emitter.

Embodiment 536 is a kind of head mounted display, including:

First optical system, including:

First imaging surface；

First emergent pupil；

First reflection type polarizer, is arranged in described first emergent pupil and described first figure Between image surface, described first reflection type polarizer protrudes about two normal axis；

Part I reflector, is arranged in described first reflection type polarizer and described first Between imaging surface, described Part I reflector have in predetermined multiple wavelength to The average light reflectance of few 30%；And

First quarter-wave delayer, is arranged in described first reflection type polarizer and institute State between Part I reflector；And

Second optical system, is arranged close to described first optical system, described second optical system System includes:

Second imaging surface；

Second emergent pupil；

Second reflection type polarizer, is arranged in described second emergent pupil and described second figure Between image surface, described second reflection type polarizer protrudes about two normal axis；

Part II reflector, is arranged in described second reflection type polarizer and described second Between imaging surface, described Part II reflector have in predetermined multiple wavelength to The average light reflectance of few 30%；And

Second quarter-wave delayer, is arranged in described second reflection type polarizer and institute State between Part II reflector.

Embodiment 537 is the head mounted display of embodiment 536, and wherein image source includes Described first imaging surface and described second imaging surface.

Embodiment 538 is the head mounted display of embodiment 537, wherein said image source Including display pannel.

Embodiment 539 is the head mounted display of embodiment 538, wherein said display Panel is transparent or translucent.

Embodiment 540 is the head mounted display of any one in embodiment 537 to 539, Wherein said image source includes shutter.

Embodiment 541 is the head mounted display of embodiment 536, wherein the first image source Including described first imaging surface, and the second image source includes described second imaging surface.

Embodiment 542 is the head mounted display of embodiment 536, wherein said first figure Image source includes the first display pannel.

Embodiment 543 is the head mounted display of embodiment 542, and wherein said first shows Show that device panel is transparent or translucent.

Embodiment 544 is the head mounted display of any one in embodiment 541 to 543, Wherein said first image source includes the first shutter.

Embodiment 545 is the head mounted display of any one in embodiment 541 to 544, Wherein said second image source includes second display panel.

Embodiment 546 is the head mounted display of embodiment 545, and wherein said second shows Show that device panel is transparent or translucent.

Embodiment 547 is the head mounted display of any one in embodiment 541 to 546, Wherein said second image source includes the second shutter.

Embodiment 548 is the head mounted display of any one in embodiment 536 to 547, Wherein said first imaging surface and described second imaging surface are substantially planar.

Embodiment 549 is the head mounted display of any one in embodiment 536 to 547, One or two in wherein said first imaging surface and described second imaging surface are curved Bent.

Embodiment 550 is the head mounted display of any one in embodiment 536 to 549, Wherein said first optical system includes the first optical lens.

Embodiment 551 is the head mounted display of embodiment 550, wherein said first anti- The formula polariser of penetrating is disposed on the first type surface of described first optical lens.

Embodiment 552 is the head mounted display of embodiment 550 or 551, wherein said First optical lens has edge contour heterogeneous.

Embodiment 553 is the head mounted display of any one in embodiment 536 to 552, Wherein said second optical system includes the second optical lens.

Embodiment 554 is the head mounted display of embodiment 553, wherein said second anti- The formula polariser of penetrating is disposed on the first type surface of described second optical lens.

Embodiment 555 is the head mounted display of embodiment 553 or 554, wherein said Second optical lens has edge contour heterogeneous.

Embodiment 556 is the head mounted display of any one in embodiment 536 to 555, Wherein said first reflection type polarizer is the heat one-tenth of any one in embodiment 334 to 353 Shape multilayer reflective polariser.

Embodiment 557 is the head mounted display of any one in embodiment 536 to 556, Wherein said second reflection type polarizer is the heat one-tenth of any one in embodiment 334 to 353 Shape multilayer reflective polariser.

Embodiment 558 is the head mounted display of any one in embodiment 536 to 557, Farther include eye tracking system.

Embodiment 559 is the head mounted display of embodiment 558, wherein said first light System is suitable to: in response to the signal received from described eye tracking system, adjust described first Distance between reflection type polarizer and described Part I reflector.

Embodiment 560 is embodiment 558 or the head mounted display of embodiment 559, Wherein said second optical system is suitable to: in response to the letter received from described eye tracking system Number, adjust the distance between described second reflection type polarizer and described Part II reflector.

Embodiment 561 is the head mounted display of any one in embodiment 536 to 560, Wherein said predetermined multiple wavelength include at least one continuous print wave-length coverage.

Embodiment 562 is the head mounted display of any one in embodiment 536 to 561, Wherein said predetermined multiple wavelength include the wavelength of visible-range.

Embodiment 563 is the head mounted display of embodiment 562, wherein said visible ray Scope is from 400nm to 700nm.

Embodiment 564 is the head mounted display of any one in embodiment 536 to 563, Wherein said predetermined multiple wavelength include the wavelength of infra-red range.

Embodiment 565 is the head mounted display of any one in embodiment 536 to 564, Wherein said predetermined multiple wavelength include in infrared, visible ray and ultraviolet wavelength or Multinomial.

Embodiment 566 is the head mounted display of any one in embodiment 536 to 565, Wherein said part reflector is trap reflector.

Embodiment 567 is the head mounted display of embodiment 566, wherein said predetermined Multiple wavelength include one or more continuous wavelength scope, and wherein said continuous wavelength model At least one in enclosing has the full width at half maximum less than 100nm.

Embodiment 568 is the head mounted display of embodiment 566, wherein said predetermined Multiple wavelength include one or more continuous wavelength scope, and wherein said continuous wavelength model At least one in enclosing has the full width at half maximum less than 50nm.

Embodiment 569 is the head mounted display of any one in embodiment 536 to 568, Wherein said first optical system is any one in embodiment 1 to 333, or embodiment party Any one in case 378 to 381, or the light of any one in embodiment 403 to 523 System.

Embodiment 570 is the head mounted display of any one in embodiment 536 to 569, Wherein said second optical system is any one in embodiment 1 to 333, or embodiment party Any one in case 378 to 381, or the light of any one in embodiment 403 to 523 System.

Embodiment 571 is the head mounted display of any one in embodiment 529 to 570, Described head mounted display is virtual reality display.

Embodiment 572 is a kind of camera, including:

Aperture；

Image recording structure；

Reflection type polarizer, is arranged between described aperture and described image recording structure, described Reflection type polarizer is bending about two normal axis；

Part reflector, be arranged in described reflection type polarizer and described image recording structure it Between, described part reflector has the average light reflection of at least 30% in predetermined multiple wavelength Rate；And

Quarter-wave delayer, is arranged in described reflection type polarizer and described part reflector Between.

Embodiment 573 is the camera of embodiment 572, farther includes the first Optical stack, Described first Optical stack includes the first lens and described part reflector.

Embodiment 574 is the camera of embodiment 572 or 573, farther includes the second light Learning stacking, described second Optical stack includes the second lens and described reflection type polarizer.

Embodiment 575 is the camera of embodiment 572, farther includes integral optical stacking, Described integral optical stacking includes the first optical lens, described reflection type polarizer, described part Reflector and described quarter-wave delayer.

Embodiment 576 is the camera of embodiment 575, wherein said integral optical stack into One step includes the second optical lens of neighbouring described first optical lens, is arranged in described first light Learn the described quarter-wave delayer between lens and described second optical lens, be arranged in institute State the described part on the first type surface relative with described second optical lens of the first optical lens Reflector and be arranged in the relative with described first optical lens of described second optical lens Described reflection type polarizer on first type surface.

Embodiment 577 is the camera of any one in embodiment 572 to 576, Qi Zhongsuo State the optical axis away from described reflection type polarizer of at least one primary importance on reflection type polarizer There is radial distance r1, and the apex away from described reflection type polarizer is perpendicular to described optical axis Plane there is displacement s1, s1/r1 is at least 0.1.

Embodiment 578 is the camera of embodiment 577, and wherein s1/r1 is at least 0.2.

Embodiment 579 is the camera of any one in embodiment 577 to 578, Qi Zhongsuo State reflection type polarizer and include at least one of which, described at least one of which in described at least one of which from At least one first position opening described optical axis is the most optically biaxial, and is leaving At least one second position of described optical axis is the most optically uniaxial.

Embodiment 580 is the camera of any one in embodiment 572 to 579, Qi Zhongsuo Stating reflection type polarizer is hot formed APF.

Embodiment 581 is the camera of any one in embodiment 572 to 578, Qi Zhongsuo Stating reflection type polarizer is wire-grid polarizer.

Embodiment 582 is the camera of any one in embodiment 572 to 581, Qi Zhongsuo State reflection type polarizer to protrude towards described image recording structure.

Embodiment 583 is the camera of embodiment 572, and wherein said camera includes optical system System, described optical system include described reflection type polarizer, described quarter-wave delayer and Described part reflector, imaging surface, diaphragm surface, described imaging surface is described image note Surface and the described diaphragm surface of recording device are the surfaces limited by described aperture.

Embodiment 584 is the camera of embodiment 583, and wherein said optical system is further By any one in embodiment 1 to 333, or arbitrary in embodiment 378 to 381 , or any one sign in embodiment 403 to 523.

Embodiment 585 is a kind of beam expander, including:

Part reflector, has the average light reflection of at least 30% in predetermined multiple wavelength Rate；

Reflection type polarizer, is arranged proximate to described part reflector and partially reflective with described Device is spaced apart, and described reflection type polarizer is bending about two normal axis；And

Embodiment 586 is the beam expander of embodiment 585, and wherein said beam expander is suitable to connect Receive and be incident on the converging light on described part reflector and be transmitted through described reflection type polarization The diverging light of device.

Embodiment 587 is the beam expander of embodiment 585 or 586, farther includes first Optical stack, described first Optical stack includes the first lens and described part reflector.

Embodiment 588 is the beam expander of any one in embodiment 585 to 587, enters one Step includes that the second Optical stack, described second Optical stack include the second lens and described reflective Polariser.

Embodiment 589 is the beam expander of embodiment 585 or 586, farther includes one Optical stack, described integral optical stacking include the first optical lens, described reflection type polarizer, Described part reflector and described quarter-wave delayer.

Embodiment 590 is the beam expander of embodiment 589, and wherein said integral optical stacks Farther include the second optical lens of neighbouring described first optical lens, be arranged in described first Described quarter-wave delayer between optical lens and described second optical lens, it is arranged in Described portion on the first type surface relative with described second optical lens of described first optical lens Divide reflector and be arranged in the relative with described first optical lens of described second optical lens First type surface on described reflection type polarizer.

Embodiment 591 is the beam expander of any one in embodiment 585 to 590, wherein At least one primary importance on the described reflection type polarizer light away from described reflection type polarizer Axle has radial distance r1, and is perpendicular to described away from the apex at described reflection type polarizer The plane of optical axis has displacement s1, and s1/r1 is at least 0.1.

Embodiment 592 is the beam expander of embodiment 591, and wherein s1/r1 is at least 0.2.

Embodiment 593 is the beam expander of any one in embodiment 585 to 592, wherein Described reflection type polarizer includes at least one of which, and described at least one of which is in described at least one of which At least one first position leaving described optical axis is the most optically biaxial, and from At least one second position opening described optical axis is the most optically uniaxial.

Embodiment 594 is the beam expander of any one in embodiment 585 to 593, wherein Described reflection type polarizer is hot formed APF.

Embodiment 595 is the beam expander of any one in embodiment 585 to 592, wherein Described reflection type polarizer is wire-grid polarizer.

Embodiment 596 is a kind of optical projection system, including light source, is arranged to connect from described light source In receiving light and launching the image processing system of light and the embodiment 585 to 595 of patterning The beam expander of any one, described beam expander is arranged such that from described image processing system The light of patterning be incident on described part reflector.

Embodiment 597 is the optical projection system of embodiment 596, farther includes to be arranged in institute State the polarization beam apparatus between image processing system and described beam expander.

Embodiment 598 is a kind of optical projection system, including light source, is arranged to connect from described light source Receive light and launch the image processing system of light of patterning and beam expander, the described expansion of convergence Bundle device includes:

Quarter-wave delayer, is arranged in described reflection type polarizer and described part reflector Between,

Wherein said beam expander is arranged such that the convergence from described image processing system The light of patterning is incident on described part reflector, the patterning that described beam expander transmission dissipates Light.

Embodiment 599 is the optical projection system of embodiment 598, and wherein said beam expander enters one Step is characterized by any one in embodiment 586 to 595.

Embodiment 600 is the optical projection system of embodiment 598 or 599, farther includes cloth Put the polarization beam apparatus between described image processing system and described beam expander.

Embodiment 601 is a kind of illumination apparatus, including:

Beam expander, including the reflection type polarizer about two orthogonal direction bendings；

Polarization beam apparatus, including:

First prism, has input face, output face and the first inclined-plane；

Second prism, has first and the second inclined-plane, and described second inclined-plane is arranged to neighbouring Described first inclined-plane；And

Second reflection type polarizer, is arranged between described first inclined-plane and described second inclined-plane；

Light source, is arranged proximate to described input face and to limit the input on described input face effective Region；And

Reflective parts, are arranged proximate to described first, launch from described light source for receiving Light and launch converging light, described reflective parts have maximum effective coverage, described maximum Effective coverage limits the output effective coverage in described output face；

Wherein said beam expander is arranged to receive described converging light and transmission diverging light, and One or two in described input effective coverage and described output effective coverage are less than described About half of the maximum effective coverage of reflective parts.

Embodiment 602 is the illumination apparatus of embodiment 601, and wherein said beam expander is further Including neighbouring described reflection type polarizer and the part spaced apart with described reflection type polarizer Reflector, described part reflector has the average light of at least 30% in predetermined multiple wavelength Reflectance, described part reflector is disposed in described polarization beam apparatus and described reflection type polarization Between device.

Embodiment 603 is the illumination apparatus of embodiment 602, farther includes to be arranged in described Quarter-wave delayer between reflection type polarizer and described part reflector.

Embodiment 604 is the illumination apparatus of any one in embodiment 601 to 603, wherein Described beam expander is further characterized by any one in embodiment 585 to 595.

Embodiment 605 is the illumination apparatus of any one in embodiment 601 to 604, wherein Described reflective parts are image processing systems.

Embodiment 606 is the illumination apparatus of any one in embodiment 601 to 605, described Illumination apparatus is image projector.

Embodiment 607 is a kind of amplifying device including optical system, described optical system bag Include:

Close to the reflection type polarizer of described emergent pupil, described reflection type polarizer is about two Normal axis bends；

Part reflector, is arranged proximate to described reflection type polarizer and described emergent pupil phase Right, described part reflector is spaced apart with described reflection type polarizer；Described part reflector exists Predetermined multiple wavelength have the average light reflectance of at least 30%；And

Embodiment 608 is the amplifying device of embodiment 607, and wherein said optical system is entered One step is by any one in embodiment 1 to 333, or in embodiment 378 to 381 Any one in any one, or embodiment 403 to 523 is characterized.

Embodiment 609 is the amplifying device of embodiment 607 or 608, farther includes thing Mirror part and eyepiece part.

Embodiment 610 is the amplifying device of embodiment 609, wherein said objection lens portion subpackage Include described reflection type polarizer, described part reflector and described quarter-wave delayer.

Embodiment 611 is the amplifying device of embodiment 609, wherein said eyepiece part bag Include described optical system.

Embodiment 612 is the amplifying device of any one in embodiment 607 to 611, its Described in optical system farther include the first Optical stack, described first Optical stack includes One lens and described part reflector.

Embodiment 613 is the amplifying device of any one in embodiment 607 to 612, its Described in optical system farther include the second Optical stack, described second Optical stack includes Two lens and described reflection type polarizer.

Embodiment 614 is the amplifying device of any one in embodiment 607 to 611, its Described in optical system farther include integral optical stacking, described integral optical stacking includes the One optical lens, described reflection type polarizer, described part reflector and described quarter-wave Delayer.

Embodiment 615 is the amplifying device of embodiment 614, wherein said integral optical heap Folded farther include neighbouring described first optical lens the second optical lens, be arranged in described the Described quarter-wave delayer between one optical lens and described second optical lens, layout Described on the first type surface relative with described second optical lens of described first optical lens Part reflector and that be arranged in described second optical lens with described first optical lens phase To first type surface on described reflection type polarizer.

Embodiment 616 is the amplifying device of any one in embodiment 607 to 615, institute Stating amplifying device is binocular, telescope or microscope.

Embodiment 617 is the amplifying device of any one in embodiment 607 to 616, its Described at least one primary importance on reflection type polarizer away from described reflection type polarizer Optical axis has a radial distance r1, and the apex away from described reflection type polarizer be perpendicular to institute The plane stating optical axis has displacement s1, and s1/r1 is at least 0.1.

Embodiment 618 is the amplifying device of embodiment 617, and wherein s1/r1 is at least 0.2.

Embodiment 619 is the amplifying device of any one in embodiment 607 to 618, its Described in reflection type polarizer include at least one of which, described at least one of which is in described at least one of which At least one first position leaving described optical axis be the most optically biaxial, and At least one second position leaving described optical axis is the most optically uniaxial.

Embodiment 620 is the amplifying device of any one in embodiment 607 to 619, its Described in reflection type polarizer be hot formed APF.

Embodiment 621 is the amplifying device of any one in embodiment 607 to 618, its Described in reflection type polarizer be wire-grid polarizer.

Except as otherwise noted, the most all expression quantity in description and claims, The number of characteristics metrics etc. should be understood to be modified by term " about ".Therefore, unless there are contrary Instruction, otherwise the numerical parameter described in description and claims is approximation, and it can basis The those skilled in the art using the application teachings are intended to the desired characteristic that reaches and change. Show no sign of being limited to the application of doctrine of equivalents the meaning of claims protection domain, each Individual numerical parameter at least should be according to the number of significant figures recorded and use four ordinary houses Five enter method explains.Although the digital scope shown in the broad range of the present invention and parameter For approximation, but for the numerical value shown in concrete example described herein, they meetings Report as precisely as possible.But, any numerical value will likely include ones which and test or measure restriction phase The error of association.

It is corresponding that the description of the element in figure should be understood to be equally applicable in other figures Element, except as otherwise noted or unless context indicates the most on the contrary.Although having schemed Show and describe particular, but skilled artisan would appreciate that various replacement and / or equivalent embodiments can substitute in the case of without departing substantially from the scope of the present disclosure and illustrate and retouch The particular stated.The application is intended to particular discussed in this article Any it is altered or varied.Therefore, the disclosure is intended to only be limited by claim and equivalence thereof System.

Claims

1. an optical system, including:

Imaging surface；

Diaphragm surface；

First Optical stack, is arranged between described imaging surface and described diaphragm surface, and protrudes along the first orthogonal axle and the second axle towards described imaging surface, and described first Optical stack includes:

First optical lens；And

Part reflector, has the average light reflectance of at least 30% in desired multiple wavelength；And

Second Optical stack, is arranged between described first Optical stack and described diaphragm surface, and protrudes along described first axle and described second axle towards described imaging surface, and described second Optical stack includes:

Second optical lens；

Multilayer reflective polariser, substantially transmission have the light of the first polarization state and substantially reflection has the light of the second orthogonal polarization state；And

First quarter-wave delayer, is arranged between described reflection type polarizer and described first Optical stack.

Optical system the most according to claim 1, wherein image source includes described imaging surface, and described diaphragm surface is emergent pupil.

Optical system the most according to claim 1, wherein scanner-recorder includes described imaging surface, and described diaphragm surface is entrance pupil.

Optical system the most according to claim 1, wherein said optical system is centered by folding optical axis, and described folding optical axis is limited by the optical path of the central ray being transmitted through described imaging surface.

Optical system the most according to claim 1, wherein said first Optical stack farther includes the second quarter-wave delayer being arranged between described part reflector and described imaging surface.

Optical system the most according to claim 1, wherein said desired multiple wavelength are the wave-length coverages from 400nm to 700nm.

Optical system the most according to claim 1, wherein said desired multiple wavelength include that at least one in one or more continuous wavelength scope, and wherein said continuous wavelength scope has the full width at half maximum less than 100nm.

Optical system the most according to claim 1, wherein said multilayer reflective polariser has at least one primary importance, the described primary importance optical axis away from the summit through described multilayer reflective polariser has radial distance r1, and away from the plane being perpendicular to described optical axis at described apex, there is displacement s1, s1/r1 is at least 0.2, and the wherein region of the described reflection type polarizer for being limited by s1 and r1, the maximum change of the axis of homology of described reflection type polarizer less than about 2 degree.

Optical system the most according to claim 1, wherein said multilayer reflective polariser includes at least one of which, at least one first position of the described at least one of which optical axis leaving described second Optical stack in described at least one of which is the most optically biaxial, and is the most optically uniaxial leaving at least one second position of described optical axis.

Optical system the most according to claim 9, that wherein launched by described image source and be transmitted through the substantially any chief ray on described diaphragm surface with on each in described reflection type polarizer and described part reflector of the incident angles of less than about 25 degree.

11. optical systems according to claim 1, wherein said multilayer reflective polariser includes wire-grid polarizer.

12. 1 kinds of optical systems, including:

Image source；

Emergent pupil；

First Optical stack, is arranged between described image source and described emergent pupil, and includes:

First optical lens；

Part reflector, has the average light reflectance of at least 30% in predetermined multiple wavelength；And

Second Optical stack, is arranged between described first Optical stack and described emergent pupil, and includes:

Second optical lens；

Reflection type polarizer, goes out about the first orthogonal axle and the second crown of roll；And

First quarter-wave delayer, is arranged between described reflection type polarizer and described first Optical stack,

At least a part of which have in described predetermined multiple wavelength, at a distance of the first wave length of at least 150nm and second wave length and launched by described image source and by the substantially any chief ray of described emergent pupil transmission described emergent pupil have less than described emergent pupil visual field percent 1.5 color separation distance.

13. optical systems according to claim 12, wherein the described color separation distance at described emergent pupil is divided less than 20 arcs.

14. optical systems according to claim 12, wherein said reflection type polarizer has at least one primary importance, the described primary importance optical axis away from the summit through described reflection type polarizer has radial distance r1, and away from the plane being perpendicular to described optical axis at described apex, there is displacement s1, s1/r1 is at least 0.2, and the wherein region of the described reflection type polarizer for being limited by s1 and r1, the maximum change of the axis of homology of described reflection type polarizer less than about 2 degree.

15. optical systems according to claim 12, wherein said reflection type polarizer includes at least one of which, at least one first position of the described at least one of which optical axis leaving described second Optical stack in described at least one of which is the most optically biaxial, and is the most optically uniaxial leaving at least one second position of described optical axis.

16. optical systems according to claim 15, that wherein launched by described image source and be transmitted through the substantially any chief ray of described emergent pupil with on each in described reflection type polarizer and described part reflector of the incident angles of less than about 25 degree.

17. 1 kinds of optical systems, including:

Image source；

Diaphragm surface；

First Optical stack, is arranged between described imaging surface and described diaphragm surface, and includes:

First optical lens；

Second Optical stack, is arranged between described first Optical stack and described diaphragm surface and includes:

Second optical lens；

Hot forming multilayer reflective polariser, optical axis about described second Optical stack is rotationally symmetrical and protrudes along the first orthogonal axle and the second axle being orthogonal to described optical axis towards described imaging surface, described hot forming multilayer reflective polariser has at least one primary importance, the described primary importance optical axis away from the summit through described hot forming multilayer reflective polariser has radial distance r1, and having displacement s1 away from the plane being perpendicular to described optical axis at described apex, s1/r1 is at least 0.1；And

18. optical systems according to claim 17, wherein image source includes described imaging surface, and described diaphragm surface is emergent pupil.

19. optical systems according to claim 17, wherein s1/r1 is in the range of 0.2 to 0.8.

20. optical systems according to claim 17, the wherein region of the described reflection type polarizer for being limited by s1 and r1, the maximum change of the axis of homology of described reflection type polarizer less than about 2 degree.

21. optical systems according to claim 17, wherein said reflection type polarizer includes at least one of which, at least one first position of the described at least one of which optical axis leaving described second Optical stack in described at least one of which is the most optically biaxial, and is the most optically uniaxial leaving at least one second position of described optical axis.

22. optical systems according to claim 21, wherein through the substantially any chief ray on described imaging surface and described diaphragm surface with on each in described first Optical stack and described second Optical stack of the incident angles of less than about 25 degree.

23. optical systems according to claim 17, wherein said hot forming multilayer reflective polariser is hot forming APF.

24. 1 kinds of optical systems, including:

Image source, launches undistorted image；

Emergent pupil；

Part reflector, has the first shape protruded towards described image source along the first orthogonal axle and the second axle, and has the average light reflectance of at least 30% in predetermined multiple wavelength；And

Reflection type polarizer, has the second different shape protruded along described first axle and described second axle towards described image source so that be less than about 10% by the distortion of launched undistorted image of described emergent pupil transmission.

25. optical systems according to claim 24, farther include the first optical lens of being arranged between described image source and described emergent pupil and be arranged in the second optical lens between described first optical lens and described emergent pupil, described part reflector is arranged on the surface of described first optical lens, and described reflection type polarizer is arranged on the surface of described second optical lens.

26. optical systems according to claim 24, farther include the quarter-wave delayer being arranged between described part reflector and described reflection type polarizer.

27. optical systems according to claim 24, are wherein less than about 5% by the distortion of launched undistorted image of described emergent pupil transmission.

28. optical systems according to claim 24, wherein said reflection type polarizer has at least one primary importance, the described primary importance optical axis away from the summit through described reflection type polarizer has radial distance r1, and away from the plane being perpendicular to described optical axis at described apex, there is displacement s1, s1/r1 is at least 0.2, and the wherein region of the described reflection type polarizer for being limited by s1 and r1, the maximum change of the axis of homology of described reflection type polarizer less than about 2 degree.

29. optical systems according to claim 24, wherein said reflection type polarizer includes at least one of which, at least one first position of the described at least one of which optical axis leaving described reflection type polarizer in described at least one of which is the most optically biaxial, and is the most optically uniaxial leaving at least one second position of described optical axis.

30. optical systems according to claim 29, that wherein launched by described image source and be transmitted through the substantially any chief ray of described emergent pupil with on each in described reflection type polarizer and described part reflector of the incident angles of less than about 25 degree.