CN1751096A - 半透明热塑性组合物、其制备方法及其模塑制品 - Google Patents
半透明热塑性组合物、其制备方法及其模塑制品 Download PDFInfo
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- CN1751096A CN1751096A CNA2004800047638A CN200480004763A CN1751096A CN 1751096 A CN1751096 A CN 1751096A CN A2004800047638 A CNA2004800047638 A CN A2004800047638A CN 200480004763 A CN200480004763 A CN 200480004763A CN 1751096 A CN1751096 A CN 1751096A
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- 150000005846 sugar alcohols Polymers 0.000 description 1
- CADICXFYUNYKGD-UHFFFAOYSA-N sulfanylidenemanganese Chemical compound [Mn]=S CADICXFYUNYKGD-UHFFFAOYSA-N 0.000 description 1
- WWNBZGLDODTKEM-UHFFFAOYSA-N sulfanylidenenickel Chemical compound [Ni]=S WWNBZGLDODTKEM-UHFFFAOYSA-N 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000375 suspending agent Substances 0.000 description 1
- 230000009182 swimming Effects 0.000 description 1
- 239000010435 syenite Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003504 terephthalic acids Chemical class 0.000 description 1
- 239000012970 tertiary amine catalyst Substances 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000003856 thermoforming Methods 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000017105 transposition Effects 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- 238000005199 ultracentrifugation Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/18—Block or graft polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/445—Block-or graft-polymers containing polysiloxane sequences containing polyester sequences
- C08G77/448—Block-or graft-polymers containing polysiloxane sequences containing polyester sequences containing polycarbonate sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L69/00—Compositions of polycarbonates; Compositions of derivatives of polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/08—Copolymers of styrene
- C08L25/12—Copolymers of styrene with unsaturated nitriles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L55/00—Compositions of homopolymers or copolymers, obtained by polymerisation reactions only involving carbon-to-carbon unsaturated bonds, not provided for in groups C08L23/00 - C08L53/00
- C08L55/02—ABS [Acrylonitrile-Butadiene-Styrene] polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
- C08L67/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyesters Or Polycarbonates (AREA)
- Silicon Polymers (AREA)
Abstract
Description
组分 | 描述 |
PC/PDMS-1 | 第一聚碳酸酯/聚二甲基硅氧烷共聚物,以共聚物总重计,其具有约20wt%的硅氧烷,绝对重均分子量约为30,000g/mol,透光率小于约30%,浊度约为104。 |
PC/PDMS-2 | 第二聚碳酸酯/聚二甲基硅氧烷共聚物,以共聚物总重计,其具有约6wt%的硅氧烷,绝对重均分子量约为23,500g/mol,透光率大于约80%,浊度约为2。 |
PC-1 | 通过界面法制得的双酚A聚碳酸酯,具有约21,800g/mol的绝对重均分子量,透光率约为90%,浊度约为1,从GE Plastics获得。 |
SAN | 苯乙烯丙烯腈共聚物,其苯乙烯和丙烯腈的重量比为约75∶25,该共聚物的重均分子量约为90,000g/mol(相对于聚苯乙烯标准物)。 |
组分 | 描述 |
BPADP | 双酚A二(二苯基磷酸酯)(Bisphenol A bis(diphenylphosphate)或BPADP,可在商业上以商品名NcendXTM P-30从Albemarle获得。 |
T-SAN | T-SAN,防滴落剂,被包衣的聚(四氟乙烯),从General ElectricPlastics Europe获得,含有50wt%的聚苯乙烯丙烯腈和50wt%的聚(四氟乙烯)。 |
金属片MB | 在双酚A聚碳酸酯中30wt%的铝片母料。铝片由Silberline以商品名Silvex 793-20-C供应。 |
金属片SAN珠 | 在SAN珠中5wt%的铝片(Silvex 793-20-C)复合物,由悬浮法生产,苯乙烯与丙烯腈的重量比为92∶8,用与约0.2wt%的二乙烯基苯交联。 |
Luminova MB | 在双酚A聚碳酸酯中30wt%的余辉磷光颜料母料。颜料LumiNovaR GLL-300FFS由United Mineral & ChemicalCorporation供应。 |
红色着色剂(Red Colorant) | 溶剂红135,Perinone染料,由Bayer AG以商品名MacrolexRRed EG供应。 |
组合物# | 1* | 2* | 3* | 4* | 5* | 6* | 7* |
PC/PDMS-1[wt%]PC-1[wt%]添加剂 | 30700.2 | 24760.2 | 18820.2 | 12880.2 | 6940.2 | 3970.2 | 01000.2 |
硅氧烷[wt%]透光率[%]浊度PDMS结构域平均尺寸[nm]Izod缺口冲击强度@-30℃[kJ/m2]MVR 300℃@2.16kg[cm3/10min] | 628103484723.9 | 4.832102454721.1 | 3.63599474231.8 | 2.44090542037.4 | 1.24671501442.3 | 0.66032961145.4 | 0911-1048.0 |
组合物# | 8 | 9 | 10 | 11 | 12 | 13 | 14* |
PC/PDMS-1[wt%]PC-1[wt%]PC/PDMS-2[wt%] | 3070 | 2476 | 1882 | 1288 | 694 | 397 | 0100 |
添加剂 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 |
硅氧烷[wt%]透光率[%] | 10.235 | 9.440 | 8.545 | 7.756 | 6.874 | 6.481 | 6.085 |
浊度PDMS结构域平均尺寸[nm]Izod缺口冲击强度@-30℃[kJ/m2]MVR 300℃@2.16kg[cm3/10min] | 99394511.6 | 91404512.7 | 76384714.3 | 42254515.9 | 10254217.6 | 5223818.3 | 3183027.6 |
组合物# | 1* | 15 | 16 | 17 | 18 | 14* |
PC/PDMS-1[wt%]PC-1[wt%]PC/PDMS-2[wt%] | 3070 | 245620 | 184240 | 122860 | 61480 | 100 |
添加剂 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 |
硅氧烷[wt%]透光率[%]浊度PDMS结构域平均尺寸[nm]Izod缺口冲击强度@-30℃[kJ/m2]MVR 300℃@2.16kg[cm3/10min] | 6.028103484723.9 | 6.033101424723.8 | 6.04090374823.9 | 6.05156284721.5 | 6.07311244420.4 | 6.0853183027.6 |
组合物# | 19* | 20 | 21 | 22 | 23 | 14* |
PC/PDMS-1[wt%]PC-1[wt%]PC/PDMS-2[wt%]添加剂 | 30700.2 | 2456200.2 | 1842400.2 | 1228600.2 | 614800.2 | 1000.2 |
金属片MB[wt%] | 2 | 2 | 2 | 2 | 2 | 2 |
Izod缺口冲击强度@23℃[kJ/m2]Izod缺口冲击强度@-30℃[kJ/m2]MVR 300℃/2.16kg金属外观程度[ΔL*] | 331824.526.4 | 331823.931.3 | 331723.037.0 | 291522.948.2 | 271321.860.8 | 221220.967.1 |
组合物# | 25* | 26 | 27 | 28 | 29 | 30* |
PC/PDMS-1[wt%]PC-1[wt%]PC/PDMS-2[wt%]添加剂 | 30700.2 | 2456200.2 | 1842400.2 | 1228600.2 | 614800.2 | 1000.2 |
Luminova MB[wt%] | 3 | 3 | 3 | 3 | 3 | 3 |
Izod缺口冲击强度@23℃[kJ/m2]Izod缺口冲击强度@-30℃[kJ/m2]MVR 300℃/2.16kg | 502631.9 | 522530.8 | 492330.6 | 492328.2 | 482127.9 | 411826.0 |
发光强度[mCd/m2]5分钟之后10分钟之后 | 2713 | 3516 | 3316 | 3216 | 3114 | 2613 |
组合物# | 31* | 32 | 33 | 34 | 35 | 36* |
PC/PDMS-1[wt%]PC-1[wt%]PC/PDMS-2[wt%]添加剂 | 30700.2 | 2456200.2 | 1842400.2 | 1228600.2 | 614800.2 | 1000.2 |
红色着色剂[wt%] | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 |
Izod缺口冲击强度@23℃[kJ/m2]Izod缺口冲击强度@-30℃[kJ/m2]MVR 300℃/2.16kg色度[C*] | 574623.246.6 | 564623.446.0 | 594622.344.6 | 584621.844.8 | 564220.752.3 | 512120.157.1 |
组合物# | 37 | 38 | 39 | 40 | 41 | 42* |
PC/PDMS-1[wt%]PC/PDMS-2[wt%]PC-1[wt%]BPADP[wt%] | 27.300.0063.709.00 | 21.8418.2050.969.00 | 16.3836.4038.229.00 | 10.9254.6025.489.00 | 5.4672.8012.749.00 | 0.0091.000.009.00 |
添加剂 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 |
硅氧烷[wt%]透光率[%]浊度PDMS结构域平均尺寸[nm]Izod缺口冲击强度@23℃[kJ/m2]MVR 300℃/2.16kg | 5.4630104415253.8 | 5.463994314651.3 | 5.464674303451.1 | 5.465838251047.6 | 5.4674921849.4 | 5.4685219745.7 |
组合物# | 43* | 44 | 45 | 46 | 47 | 48* |
PC/PDMS-1[wt%]PC/PDMS-2[wt%] | 27.300.00 | 21.8418.20 | 16.3836.40 | 10.9254.60 | 5.4672.80 | 0.0091.00 |
PC-1[wt%]BPADP[wt%]添加剂 | 63.709.000.2 | 50.969.000.2 | 38.229.000.2 | 25.489.000.2 | 12.749.000.2 | 0.009.000.2 |
金属片母料[wt%] | 2 | 2 | 2 | 2 | 2 | 2 |
Izod缺口冲击强度@23℃[kJ/m2]MVR 300℃/2.16kg金属外观程度[ΔL*] | 2149.829.9 | 1949.237.7 | 1650.643.5 | 1147.052.1 | 748.361.5 | 750.265.7 |
组合物# | 49* | 50 | 51 | 52 | 53 | 54* |
PC/PDMS-1[wt%]PC/PDMS-2[wt%]PC-1[wt%]BPADP[wt%]添加剂 | 27.300.0063.709.000.2 | 21.8418.2050.969.000.2 | 16.3836.4038.229.000.2 | 10.9254.6025.489.000.2 | 5.4672.8012.749.000.2 | 0.0091.000.009.000.2 |
金属片SAN珠粒 | 9 | 9 | 9 | 9 | 9 | 9 |
Izod缺口冲击强度@23℃[kJ/m2]刺穿能[J]MVR 300℃/2.16kg金属外观程度[ΔL*] | 7.626.250.411.4 | 7.623.944.914.1 | 6.821.046.021.5 | 6.319.342.727.2 | 6.018.439.532.2 | 5.511.939.038.6 |
组合物# | 55 | 56 | 57 | 58 |
PC/PDMS-1[wt%] | 20.0 | 20.0 | 20.0 | 20.0 |
PC/PDMS-2[wt%]PC-1[wt%]SAN[wt%]T-SAN[wt%]BPADP[wt%]添加剂金属片SAN珠粒[wt%] | 36.525.39.00.29.0 | 36.524.80.59.00.29.0 | 36.525.34.09.00.25.0 | 36.524.84.00.59.00.25.0 |
硅氧烷[wt%]Izod缺口冲击强度@23℃[kJ/m2]刺穿能@23℃[J]MVR 300℃/2.16kg金属外观程度[ΔL*] | 6.197.11837.523.0 | 6.197.52229.721.4 | 6.197.33144.616.9 | 6.198.53934.112.7 |
组分 | 描述 |
PC/PDMS-1 | 与实施例I中使用的聚碳酸酯/聚二甲基硅氧烷共聚物相同。 |
PC/PDMS-3 | 第三聚碳酸酯/聚二甲基硅氧烷共聚物,以共聚物总重计,具有约5wt%的硅氧烷,绝对重均分子量约为23,500g/mol,透光率大于约80%,浊度约为2。 |
PC-2 | 通过界面法制得的双酚A聚碳酸酯,具有约30,500g/mol的绝对重均分子量,透光率约为90%,浊度约为1,从GEPlastics获得。 |
BPADP | 双酚A二(二苯基磷酸酯)或BPADP,可在商业上以商品名NcendXTM P-30从Albemarle获得 |
T-SAN | T-SAN,防滴落剂,被包衣的聚(四氟乙烯),从GeneralElectric Plastics Europe获得,含有50wt%的聚苯乙烯丙烯腈 |
和50wt%的聚(四氟乙烯)。 |
组合物# | 59* | 60* | 61* | 62* | 63* |
PC/PDMS-1[wt%]PC-2[wt%]添加剂[wt%] | 24.9174.740.35 | 18.6880.970.35 | 12.4687.190.35 | 6.2393.420.35 | 99.650.35 |
硅氧烷[wt%] | 4.98 | 3.74 | 2.49 | 1.25 | 0.00 |
透光率[%]浊度Izod缺口冲击强度@-30℃[kJ/m2]MVR 300℃@1.2kg[cm3/10min] | 23104608.0 | 25104628.3 | 32104608.8 | 4098199.3 | 911119.8 |
组合物# | 59* | 64 | 65 | 66 | 67* | 68 |
PC/PDMS-1[wt%]PC-2[wt%]PC/PDMS-3[wt%]添加剂 | 24.9174.740.35 | 18.6856.0524.920.35 | 12.4637.3749.830.35 | 6.2318.6874.740.35 | 99.650.35 | 24.9174.740.35 |
硅氧烷[wt%]透光率[%]浊度Izod缺口冲击强度@-30℃[kJ/m2]MVR 300℃@1.2kg[cm3/10min] | 4.9823104608.0 | 4.9829103609.3 | 4.9836945711.4 | 4.9860285113.6 | 4.988422016.7 | 8.7232975111.4 |
组合物# | 69* | 70 | 71 | 72 | 73* | 74* | 75 | 76* | 77* | 78 |
PC/PDMS-1[wt%]PC-2[wt%]PC/PDMS-3[wt%]BPADP[wt%]T-SAN[wt%]添加剂 | 22.4167.24100.35 | 16.8150.4322.41100.35 | 11.2133.6244.83100.35 | 5.6016.8167.24100.35 | 89.65100.35 | 22.3667.09100.200.35 | 11.1833.5444.73100.200.35 | 89.45100.200.35 | 22.3667.09100.200.35 | 22.3667.09100.200.35 |
硅氧烷[wt%]透光率[%]浊度Izod缺口冲击强度@23℃[kJ/m2]MVR 300℃@1.2kg[cm3/10min] | 4.48241047219.2 | 4.48311026222.6 | 4.4842771027.3 | 4.486619934.3 | 4.48851742.5 | 4.47241046419.5 | 4.4739891626.3 | 4.477139641.0 | 4.47241046319.1 | 7.8336922727.7 |
Claims (12)
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CNA2007101383684A Pending CN101121789A (zh) | 2003-02-21 | 2004-02-23 | 透明和高热聚碳酸酯-聚硅氧烷共聚物和含有聚碳酸酯的透明共混物及其制造过程 |
CNB2004800105845A Expired - Lifetime CN100551948C (zh) | 2003-02-21 | 2004-02-23 | 透明和高热聚碳酸酯-聚硅氧烷共聚物和含有聚碳酸酯的透明共混物及其制造过程 |
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CNB2004800105845A Expired - Lifetime CN100551948C (zh) | 2003-02-21 | 2004-02-23 | 透明和高热聚碳酸酯-聚硅氧烷共聚物和含有聚碳酸酯的透明共混物及其制造过程 |
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Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101553525B (zh) * | 2006-10-31 | 2012-05-23 | 沙伯基础创新塑料知识产权有限公司 | 红外透射热塑性组合物 |
CN102471474A (zh) * | 2009-07-29 | 2012-05-23 | 帝人化成株式会社 | 聚碳酸酯-聚二有机硅氧烷共聚物 |
CN102482496A (zh) * | 2009-09-10 | 2012-05-30 | 沙伯基础创新塑料知识产权有限公司 | 硅氧烷嵌段共聚物纳米孔泡沫体、其制备方法以及包含该泡沫体的制品 |
US8207288B2 (en) | 2007-05-08 | 2012-06-26 | Idemitsu Kosan Co., Ltd. | Polycarbonate polymer, coating liquid, and electrophotographic photosensitive body |
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WO2003040225A1 (de) | 2001-11-08 | 2003-05-15 | Albis Plastic Gmbh | Metallic-farbene thermoplastische formmasse |
US6676852B2 (en) * | 2002-05-31 | 2004-01-13 | General Electric Company | Phosphorescent thermoplastic composition |
-
2004
- 2004-02-20 US US10/783,140 patent/US7166687B2/en not_active Expired - Lifetime
- 2004-02-20 EP EP04713352.5A patent/EP1597317B1/en not_active Expired - Lifetime
- 2004-02-20 JP JP2006503935A patent/JP2006523243A/ja active Pending
- 2004-02-20 WO PCT/US2004/005001 patent/WO2004076541A2/en active Application Filing
- 2004-02-20 KR KR1020057015352A patent/KR20050107583A/ko active IP Right Grant
- 2004-02-20 CN CNB2004800047638A patent/CN100469838C/zh not_active Expired - Lifetime
- 2004-02-23 CN CNA2007101383684A patent/CN101121789A/zh active Pending
- 2004-02-23 CN CNB2004800105845A patent/CN100551948C/zh not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
---|---|
US7166687B2 (en) | 2007-01-23 |
CN101121789A (zh) | 2008-02-13 |
CN100469838C (zh) | 2009-03-18 |
US20050187372A1 (en) | 2005-08-25 |
JP2006523243A (ja) | 2006-10-12 |
EP1597317A2 (en) | 2005-11-23 |
WO2004076541A2 (en) | 2004-09-10 |
WO2004076541A3 (en) | 2004-11-25 |
US20060014919A9 (en) | 2006-01-19 |
KR20050107583A (ko) | 2005-11-14 |
EP1597317B1 (en) | 2015-09-09 |
CN1798791A (zh) | 2006-07-05 |
CN100551948C (zh) | 2009-10-21 |
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