CN110923634A - Monitoring device, evaporator and monitoring method in evaporation chamber - Google Patents
Monitoring device, evaporator and monitoring method in evaporation chamber Download PDFInfo
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- CN110923634A CN110923634A CN201911338368.8A CN201911338368A CN110923634A CN 110923634 A CN110923634 A CN 110923634A CN 201911338368 A CN201911338368 A CN 201911338368A CN 110923634 A CN110923634 A CN 110923634A
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- evaporation
- camera
- evaporation chamber
- monitoring device
- driving structure
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a monitoring device, an evaporator and a monitoring method in an evaporation chamber, and belongs to the technical field of metal evaporation. The invention provides a monitoring device in an evaporation chamber, which comprises a reflecting part, a connecting piece and a camera mechanism, wherein the connecting piece is configured to connect the reflecting part with the evaporation chamber, the camera mechanism comprises a camera, and the camera can be matched with the reflecting part to shoot all parts of the evaporation device. The invention realizes that the camera shoots the evaporation device in the evaporation chamber in all directions.
Description
Technical Field
The invention relates to the technical field of metal evaporation, in particular to a monitoring device in an evaporation chamber, an evaporation machine using the monitoring device and a monitoring method using the monitoring device.
Background
In order to monitor the internal condition of the cavity of the experimental evaporator, except for arranging an observation window, the camera can better observe various conditions in the evaporation process, but organic materials and metal in the experimental evaporator are evaporated in the same cavity, the metal evaporation can pollute the lens on the lens, and meanwhile, the high-temperature evaporation also has influence on the camera sensor.
Therefore, it is desirable to provide a monitoring device and an evaporation machine in an evaporation chamber to solve the technical problem that the lens is contaminated by the evaporated metal in the evaporation process of the camera.
Disclosure of Invention
The invention aims to provide a monitoring device, an evaporator and a monitoring method in a vapor deposition chamber, so that a camera can shoot the vapor deposition device in the vapor deposition chamber in an all-around mode, and a lens is prevented from being polluted by vapor deposited metal.
In order to realize the purpose, the following technical scheme is provided:
the invention provides a monitoring device in an evaporation chamber, which comprises:
a reflection section;
a connecting member configured to connect the reflection section with an evaporation chamber;
the camera shooting mechanism comprises a camera, and the camera can be matched with the reflection part to shoot all parts of the evaporation device.
Further, the connecting piece is a first regulating mechanism with at least one degree of freedom.
Furthermore, the first adjusting mechanism is an adjusting mechanism with two degrees of freedom and comprises a first driving structure and a second driving structure fixed at the driving end of the first driving structure, the first driving structure can rotate around a first direction, the second driving structure can rotate around a second direction, the first direction is perpendicular to the second direction, and the reflecting part is fixed at the driving end of the second driving structure.
Further, first regulation and control mechanism still includes transfer platform and mounting panel, the transfer platform is fixed the drive end of first drive structure, second drive structure sets up on the transfer platform, the mounting panel is fixed the drive end of second drive structure, the reflection part is fixed on the mounting panel.
Furthermore, the first regulating and controlling mechanism is a universal rotating mechanism, the universal rotating mechanism comprises a third driving structure and a universal joint, the universal joint is rotatably connected to the driving end of the third driving structure, and the reflecting part is fixed to the universal joint.
Furthermore, the camera shooting mechanism further comprises a second regulating mechanism, and the camera is fixed at a regulating end of the second regulating mechanism.
Further, the camera shooting mechanism further comprises a spacer, and the spacer is configured to separate a camera of the camera shooting mechanism from metal vapor evaporated by an evaporation device.
Further, the monitoring device within the evaporation chamber further comprises a light source assembly configured to illuminate the evaporation chamber.
Furthermore, the monitoring device in the evaporation chamber also comprises a control system, wherein the control system comprises a monitoring module, a data processing module and an execution module; the monitoring module acquires the position of a sample to be detected and transmits the acquired position information to the data processing module, the data processing module calls corresponding adjusting parameters according to the acquired position information, and the execution module adjusts the reflecting part and the camera shooting mechanism according to the adjusting parameters.
The invention also provides an evaporation machine which comprises an evaporation chamber, an evaporation device and the monitoring device in the evaporation chamber, wherein the evaporation device and the monitoring device are arranged in the evaporation chamber.
Further, the evaporation device comprises a plurality of heating mechanisms, a material placing plate and a sample platform, wherein each heating mechanism comprises a power supply, a positive pole and a negative pole, two ends of the material placing plate are respectively fixed on the positive pole and the negative pole, the material placing plate is made of conductive materials and is configured to place metal to be evaporated, the sample platform is arranged above the heating mechanisms, and a sample to be evaporated is placed on the sample platform.
The invention also provides a method for monitoring the evaporation chamber of the evaporation machine by using the monitoring device in the evaporation chamber, which comprises the following steps:
s100: the control system obtains instruction information of a position to be observed;
s200: the control system calls a state parameter combination which needs to be adjusted by the reflection part and the camera shooting mechanism corresponding to the instruction information;
s300: and the control system controls the first regulating mechanism connecting piece and/or the second regulating camera shooting mechanism to respectively regulate the reflecting part and/or the camera shooting mechanism to a specified state.
Compared with the prior art, the monitoring device in the evaporation chamber is provided with the camera and the connecting piece, wherein the camera is arranged in the evaporation chamber in a rotatable or fixed mode, the reflecting part is further arranged, and the camera is matched with the reflecting part to shoot the panorama of the evaporation device. The monitoring device provided by the invention can realize that the camera can shoot the evaporation device in an all-round way in the evaporation chamber.
The invention also provides an evaporation machine applying the monitoring device, and the evaporation machine can realize that the camera shoots the evaporation device in the evaporation chamber in all directions.
The invention also provides a method for monitoring the evaporation chamber by using the monitoring device, which can automatically realize the matching adjustment of the reflecting part and the camera mechanism, so that the camera can shoot the panorama of the evaporation device.
Drawings
FIG. 1 is a schematic view of an internal structure of a monitoring device in an evaporation chamber according to an embodiment of the present invention;
fig. 2 is a top view of the internal structure of a monitoring device in an evaporation chamber according to an embodiment of the present invention.
Reference numerals: 1-a housing; 2-a first drive configuration; 3-a transfer platform; 4-a second drive configuration; 5, mounting a plate; 6-a reflection part; 7-a protective sleeve; 8-a camera; 9-a sample stage; 901-sample cell; 10-a scaffold; 11-upright post; 12-a discharge plate; 1201-a discharge chute; 13-positive electrode; 14-a negative electrode; 15-fourth drive configuration.
Detailed Description
In order to make the technical problems solved, technical solutions adopted and technical effects achieved by the present invention clearer, the technical solutions of the embodiments of the present invention will be described in further detail below with reference to the accompanying drawings, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1 and 2, the present embodiment provides a monitoring device in an evaporation chamber, including a reflection portion 6, a connector and a camera mechanism, wherein the connector is configured to connect the reflection portion with the evaporation chamber, the camera mechanism includes a camera 8, and the camera 8 can be matched with the reflection portion 6 to shoot all parts of the evaporation device.
Specifically, the connecting member is a first adjusting mechanism with at least one degree of freedom, and the connecting member in this embodiment is preferably a two-axis rotating mechanism. More specifically, the two-axis rotating mechanism of the present embodiment includes a first driving structure 2 and a second driving structure 4 fixed at a driving end of the first driving structure 2, the first driving structure 2 can rotate around a first direction, the second driving structure 4 can rotate around a second direction, the first direction is perpendicular to the second direction, and the reflection portion 6 is fixed at the driving end of the second driving structure 4. Specifically, slewing mechanism still includes transfer table 3 and mounting panel 5, and transfer table 3 fixes the drive end at first drive structure 2, and second drive structure 4 sets up on transfer table 3, and mounting panel 5 fixes the drive end at second drive structure 4, and reflection part 6 fixes on mounting panel 5. Wherein the first drive structure 2 and the second drive structure 4 are preferably both motors.
In another embodiment, the first adjustment mechanism may also be designed as a shaft rotation mechanism, and specifically, the shaft rotation mechanism includes a driver, preferably a driving motor, a mounting plate 5 is fixed to the end of the driving shaft of the driving motor, and the reflecting portion 6 is fixed to the mounting plate 5, so that the driving motor drives the reflecting portion 6 to rotate.
In another embodiment, the first adjustment mechanism may also be designed as a universal rotation mechanism, and specifically, the universal rotation mechanism includes a third driving structure and a universal joint, the universal joint is rotatably connected to the driving end of the third driving structure, and the reflection portion 6 is fixed on the universal joint. In particular, the third drive structure is preferably a motor.
Optionally, in order to protect the camera 8 from being contaminated by the evaporated metal, the camera mechanism is disposed below the first adjusting and controlling mechanism in a manner of avoiding the evaporation direction. In this embodiment, camera 8 is rotatable or fixed, and reflection part 6 rotates in order to shoot the panorama of coating by vaporization device with the cooperation of camera 8 under the drive of first regulation and control mechanism.
Further, for satisfying the comprehensive shooting demand to the coating by vaporization device better, the mechanism of making a video recording of this embodiment still includes second adjustment and control mechanism, and camera 8 is fixed at second adjustment and control mechanism's regulation and control end to can rotate under second adjustment and control mechanism's the drive and shoot all positions of coating by vaporization device with cooperation reflecting part 6. In particular, the second regulating mechanism is preferably a motor, and the camera 8 and the reflecting part 6 are matched to rotate, so that a wider shooting angle can be obtained.
Optionally, to avoid the lens of the camera 8 from being contaminated by the evaporated metal, the camera mechanism further includes a spacer 7, and the spacer 7 is configured to isolate the camera 8 of the camera mechanism from the metal vapor evaporated by the evaporation device. Specifically, the spacer 7 of this embodiment is preferably a protective sleeve sleeved on the periphery of the camera mechanism, but in other embodiments, a partition plate may be disposed on a side of the camera mechanism close to the evaporation device, as long as the partition plate can block the evaporated metal without contaminating the lens of the camera 8.
Further, monitoring devices in the coating by vaporization chamber still includes the light source subassembly, and the light source subassembly is configured to throw light on to the coating by vaporization chamber, and specifically, the light source subassembly sets up to luminance and angularly adjustable structure to satisfy the user demand of coating by vaporization machine illumination better.
Specifically, the reflecting portion 6 in this embodiment is preferably a reflector, but in other embodiments, a flat glass may be used, because a layer of metal is attached to the flat glass during the metal evaporation process, so that the flat glass has a light reflecting function. The camera 8 may be a CCD image sensor or a CMOS image sensor. Among them, the CCD is a charge coupled device (charge coupled device) for short, which can convert light into electric charges and store and transfer the electric charges, and can also take out the stored electric charges to change the voltage, so it is an ideal CCD camera element, and the CCD camera formed by the CCD camera element has the characteristics of small volume, light weight, no influence of magnetic field, and vibration and impact resistance, and is widely used. CMOS is a short for Complementary Metal Oxide Semiconductor (Complementary Metal Oxide Semiconductor), which is a voltage-controlled amplifier device and is a basic unit constituting a CMOS digital integrated circuit.
In order to realize automatic regulation and shooting, the monitoring device in the evaporation chamber of the embodiment further comprises a control system, wherein the control system comprises a monitoring module, a data processing module and an execution module; the monitoring module acquires the position of a sample to be detected and transmits the acquired position information to the data processing module, the data processing module calls corresponding adjusting parameters according to the acquired position information, and the execution module adjusts the reflecting part and the camera shooting mechanism according to the adjusting parameters.
The monitoring device provided by the embodiment can realize that the camera 8 shoots the evaporation device in the evaporation chamber in all directions, and avoids being polluted by the evaporated metal.
This embodiment still provides an evaporation plating machine, including evaporation plating cavity, evaporation plating device and the foretell monitoring device in the evaporation plating cavity, evaporation plating device and monitoring device all set up in the evaporation plating cavity. This coating by vaporization machine can realize that camera 8 carries out all-round shooting to the coating by vaporization device in the coating by vaporization cavity.
Further, the evaporation device comprises a plurality of heating mechanisms, a discharging plate 12 and a sample platform 9, each heating mechanism comprises a power supply, a positive electrode 13 and a negative electrode 14, two ends of the discharging plate 12 are respectively fixed on the positive electrode 13 and the negative electrode 14, the discharging plate 12 is made of conductive materials, the discharging plate 12 is configured to place metal to be evaporated, the sample platform 9 is arranged above the heating mechanisms, and a sample to be evaporated is placed in the sample platform 9. Optionally, the heating mechanism further includes a support 10 and a plurality of columns 11 disposed circumferentially around the support 10, the positive electrodes 13 are disposed in one-to-one correspondence with the columns 11, the positive electrodes 13 are disposed at the top ends of the columns 11, the negative electrodes 14 are disposed in one-to-one correspondence with the positive electrodes 13, and the negative electrodes 14 are disposed on the support 10.
Specifically, the support 10 is a cylindrical table, the positive electrode 13 is a positive electrode block, the negative electrode 14 is a negative electrode block, the positive electrode block is arranged at the top end of the column 11, and the negative electrode block is arranged on the cylindrical table along the circumferential direction of the table surface of the cylindrical table. The discharging plate 12 is a strip plate, two ends of the discharging plate 12 are fixed on the positive pole block and the negative pole block through screws and nuts, a discharging groove 1201 is arranged on the discharging plate 12 in a downward concave mode, and metal to be evaporated is placed in the discharging groove 1201. The sample stage 9 is a circular plate, a plurality of sample grooves 901 are formed in the sample stage along the circumferential direction, a sample to be evaporated is placed in the sample grooves 901, and an evaporation metal below the sample stage can be evaporated on a metal surface in the sample grooves 901 from the lower direction.
In order to ensure the uniformity of sample evaporation, the evaporation device of the embodiment further includes a fourth driving structure 15, the sample stage 9 is fixed at the driving end of the fourth driving structure 15, and the fourth driving structure 15 is configured to drive the sample stage 9 to rotate along the horizontal direction. Specifically, the evaporator further comprises a closed housing 1, a support column (not shown in the figure) is arranged at the top end of the housing 1, a fourth driving structure 15 is arranged on the support column, and the fourth driving structure 15 is preferably a motor.
The embodiment also provides a method for monitoring the evaporation chamber of the evaporation machine by using the monitoring device in the evaporation chamber, which specifically comprises the following steps:
s100: the control system obtains instruction information of a position to be observed;
s200: the control system calls (parameter database) the state parameter combination which is needed to be adjusted by the reflection part 6 and the camera shooting mechanism corresponding to the instruction information;
s300: the control system controls the connecting piece and/or the camera shooting mechanism to respectively adjust the reflecting part 6 and/or the camera shooting mechanism to a specified state.
The monitoring method provided by the embodiment can automatically realize the matching adjustment of the reflecting part and the camera mechanism, so that the camera can shoot the panorama of the evaporation device.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (12)
1. A monitoring device in an evaporation chamber, comprising:
a reflection unit (6);
a connecting member configured to connect the reflection section (6) with an evaporation chamber;
the camera shooting mechanism comprises a camera (8), and the camera (8) can be matched with the reflection part (6) to shoot all parts of the evaporation device.
2. The apparatus of claim 1, wherein the coupling is a first adjustment mechanism having at least one degree of freedom.
3. A monitoring device in an evaporation chamber according to claim 2, wherein the first adjustment mechanism is an adjustment mechanism with two degrees of freedom, and comprises a first driving structure (2) and a second driving structure (4) fixed at a driving end of the first driving structure (2), the first driving structure (2) can rotate around a first direction, the second driving structure (4) can rotate around a second direction, the first direction is perpendicular to the second direction, and the reflecting part (6) is fixed at a driving end of the second driving structure (4).
4. The monitoring device in a vapor deposition chamber according to claim 3, wherein the first regulating mechanism further comprises a relay table (3) and a mounting plate (5), the relay table (3) is fixed at a driving end of the first driving structure (2), the second driving structure (4) is provided on the relay table (3), the mounting plate (5) is fixed at a driving end of the second driving structure (4), and the reflecting portion (6) is fixed on the mounting plate (5).
5. A monitoring device in an evaporation chamber according to claim 2, wherein the first regulating mechanism is a universal rotation mechanism, the universal rotation mechanism comprises a third driving structure and a universal joint, the universal joint is rotatably connected to a driving end of the third driving structure, and the reflecting part (6) is fixed on the universal joint.
6. A monitoring device in an evaporation chamber according to claim 1, wherein the camera mechanism further comprises a second regulating mechanism, and the camera (8) is fixed at a regulating end of the second regulating mechanism.
7. A monitoring device in an evaporation chamber according to claim 1, wherein the camera mechanism further comprises a spacer (7), the spacer (7) being configured to isolate the camera (8) from metal vapor evaporated by an evaporation device.
8. The monitoring device within an evaporation chamber of claim 1, further comprising a light source assembly configured to illuminate the evaporation chamber.
9. The monitoring device in a vapor deposition chamber of claim 1, further comprising a control system comprising a monitoring module, a data processing module, and an execution module; the monitoring module acquires the position of a sample to be detected and transmits the acquired position information to the data processing module, the data processing module calls corresponding adjusting parameters according to the acquired position information, and the execution module adjusts the reflecting part (6) and the camera shooting mechanism according to the adjusting parameters.
10. An evaporation machine comprising an evaporation chamber, an evaporation device, and the monitoring device in the evaporation chamber according to any one of claims 1 to 9, wherein the evaporation device and the monitoring device are provided in the evaporation chamber.
11. The evaporation machine according to claim 10, wherein the evaporation apparatus comprises a plurality of heating mechanisms, an emptying plate (12) and a sample stage (9), the heating mechanisms comprise a power supply, a positive electrode (13) and a negative electrode (14), two ends of the emptying plate (12) are respectively fixed on the positive electrode (13) and the negative electrode (14), the emptying plate (12) is made of conductive materials, the emptying plate (12) is configured to place metal to be evaporated, the sample stage (9) is arranged above the heating mechanisms, and a sample to be evaporated is placed on the sample stage (9).
12. A method of monitoring an evaporation chamber of an evaporation machine by using the monitoring device in the evaporation chamber according to any one of claims 1 to 9, characterized by comprising the following steps:
s100: the control system obtains instruction information of a position to be observed;
s200: the control system calls a state parameter combination which is needed to be adjusted by the reflection part (6) and the camera mechanism corresponding to the instruction information;
s300: the control system controls the connecting piece and/or the camera shooting mechanism to respectively adjust the reflecting part (6) and/or the camera shooting mechanism to a specified state.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911338368.8A CN110923634A (en) | 2019-12-23 | 2019-12-23 | Monitoring device, evaporator and monitoring method in evaporation chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911338368.8A CN110923634A (en) | 2019-12-23 | 2019-12-23 | Monitoring device, evaporator and monitoring method in evaporation chamber |
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| CN110923634A true CN110923634A (en) | 2020-03-27 |
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| CN201911338368.8A Pending CN110923634A (en) | 2019-12-23 | 2019-12-23 | Monitoring device, evaporator and monitoring method in evaporation chamber |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114577506A (en) * | 2020-11-30 | 2022-06-03 | 核工业理化工程研究院 | Sampling device and sampling method for vacuum coating sample |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1143764A (en) * | 1997-07-24 | 1999-02-16 | Sumitomo Heavy Ind Ltd | Evaporating state detector for evaporating material and vacuum coating forming device using it |
| JP2005126759A (en) * | 2003-10-23 | 2005-05-19 | Nec Kansai Ltd | Vacuum deposition apparatus |
| JP2010255019A (en) * | 2009-04-21 | 2010-11-11 | Sumitomo Electric Ind Ltd | Film deposition apparatus |
| US20120012056A1 (en) * | 2010-07-16 | 2012-01-19 | Hon Hai Precision Industry Co., Ltd. | Apparatus for processing coating material and evaporation deposition device having same |
| CN108431294A (en) * | 2016-12-12 | 2018-08-21 | 应用材料公司 | For the equipment, the system for depositing one or more layers on substrate and the method for monitoring vacuum deposition system in depositing materials on substrates |
-
2019
- 2019-12-23 CN CN201911338368.8A patent/CN110923634A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1143764A (en) * | 1997-07-24 | 1999-02-16 | Sumitomo Heavy Ind Ltd | Evaporating state detector for evaporating material and vacuum coating forming device using it |
| JP2005126759A (en) * | 2003-10-23 | 2005-05-19 | Nec Kansai Ltd | Vacuum deposition apparatus |
| JP2010255019A (en) * | 2009-04-21 | 2010-11-11 | Sumitomo Electric Ind Ltd | Film deposition apparatus |
| US20120012056A1 (en) * | 2010-07-16 | 2012-01-19 | Hon Hai Precision Industry Co., Ltd. | Apparatus for processing coating material and evaporation deposition device having same |
| CN108431294A (en) * | 2016-12-12 | 2018-08-21 | 应用材料公司 | For the equipment, the system for depositing one or more layers on substrate and the method for monitoring vacuum deposition system in depositing materials on substrates |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114577506A (en) * | 2020-11-30 | 2022-06-03 | 核工业理化工程研究院 | Sampling device and sampling method for vacuum coating sample |
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Application publication date: 20200327 |