CN117476855A - 硅碳负极片的制备方法 - Google Patents
硅碳负极片的制备方法 Download PDFInfo
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- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 238000002360 preparation method Methods 0.000 title claims abstract description 16
- 239000007789 gas Substances 0.000 claims abstract description 61
- 238000000151 deposition Methods 0.000 claims abstract description 56
- 230000008021 deposition Effects 0.000 claims abstract description 56
- 239000012159 carrier gas Substances 0.000 claims abstract description 37
- 229910052747 lanthanoid Inorganic materials 0.000 claims abstract description 37
- 150000002602 lanthanoids Chemical class 0.000 claims abstract description 37
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 28
- 238000001035 drying Methods 0.000 claims abstract description 28
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 28
- 239000010703 silicon Substances 0.000 claims abstract description 28
- 238000010438 heat treatment Methods 0.000 claims abstract description 26
- 238000005406 washing Methods 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 21
- 150000001875 compounds Chemical class 0.000 claims abstract description 20
- 238000005520 cutting process Methods 0.000 claims abstract description 12
- 238000004381 surface treatment Methods 0.000 claims abstract description 12
- 238000004140 cleaning Methods 0.000 claims abstract description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 9
- 239000003960 organic solvent Substances 0.000 claims description 9
- 238000004321 preservation Methods 0.000 claims description 9
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 239000001307 helium Substances 0.000 claims description 7
- 229910052734 helium Inorganic materials 0.000 claims description 7
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 7
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 6
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 6
- -1 carbonic acid compound Chemical class 0.000 claims description 6
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 6
- 229910000077 silane Inorganic materials 0.000 claims description 6
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 6
- 239000005052 trichlorosilane Substances 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 241000779819 Syncarpia glomulifera Species 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000011889 copper foil Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 239000001739 pinus spp. Substances 0.000 claims description 5
- 239000001294 propane Substances 0.000 claims description 5
- 229940036248 turpentine Drugs 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims description 4
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 4
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 3
- 230000000630 rising effect Effects 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 12
- 239000011888 foil Substances 0.000 abstract description 10
- 239000007773 negative electrode material Substances 0.000 abstract description 7
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000853 adhesive Substances 0.000 abstract description 5
- 230000001070 adhesive effect Effects 0.000 abstract description 5
- 229910001416 lithium ion Inorganic materials 0.000 abstract description 5
- 239000006258 conductive agent Substances 0.000 abstract description 4
- 238000006555 catalytic reaction Methods 0.000 abstract description 3
- 239000002086 nanomaterial Substances 0.000 abstract description 3
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 230000008569 process Effects 0.000 abstract description 2
- 239000002562 thickening agent Substances 0.000 abstract description 2
- 238000005234 chemical deposition Methods 0.000 abstract 1
- 239000003599 detergent Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 238000009830 intercalation Methods 0.000 description 3
- 230000002687 intercalation Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 206010017472 Fumbling Diseases 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009831 deintercalation Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
- H01M4/0402—Methods of deposition of the material
- H01M4/0421—Methods of deposition of the material involving vapour deposition
- H01M4/0428—Chemical vapour deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- H01M10/052—Li-accumulators
- H01M10/0525—Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
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Abstract
本发明公开一种硅碳负极片的制备方法,其采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中通入载气、硅源气体和碳源气体后进行化学沉积,而制得沉积产物,后经洗涤、烘干、裁片得到硅碳负极片。本发明选用对合成纳米结构有催化作用的箔材作为载体,通过化学气相沉积的方法把硅碳负极活性物质一步沉积在箔材集流体上,且对箔材进行表面处理,可增加硅碳在箔材上的附着力,沉积后,经洗涤、烘干、裁片可得硅碳负极片,省去了传统锂离子电池用负极极片制备的配料、匀浆、涂布等流程,且不需要添加导电剂、粘合剂及增稠剂,简化了制备流程和节约了物料成本,降低硅碳负极片的制备成本。
Description
技术领域
本发明涉及负极材料领域技术,尤其是指一种硅碳负极片的制备方法。
背景技术
锂离子电池是一种二次电池(充电电池),它主要依靠锂离子在正极和负极之间移动来工作。在充放电过程中,Li+在两个电极之间往返嵌入和脱嵌:充电时,Li+从正极脱嵌,经过电解质嵌入负极,负极处于富锂状态;放电时则相反。
但是,传统锂离子电池用硅碳负极极片制备流程复杂,成本和不良率较高,且为适配不同的硅碳负极材料,其选用的导电剂和粘合剂都需要重新摸索,开发周期长、成本高。因此,有必要提出一种新的方案对上述问题进行改进。
发明内容
有鉴于此,本发明针对现有技术存在之缺失,其主要目的是提供一种硅碳负极片的制备方法,其能有效解决现有硅碳负极材料需要重新摸索与其相适配的导电剂和粘合剂,开发周期长、开发成本高的问题。
为实现上述目的,本发明采用如下之技术方案:
一种硅碳负极片的制备方法,包括有以下步骤:
(1)采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中;
(2)往管式炉内通入载气,排尽管式炉内的空气,后保持载气的持续通入,匀速升温至沉积温度,沉积温度为500-1000℃;
(3)通过载气将硅源气体和碳源气体带入管式炉内,硅源气体和碳源气体的流量比为(1-10):(1-5),保温沉积,沉积时间为2-10h,得到沉积产物;
(4)待沉积结束后,冷却至室温,取出沉积产物,经洗涤、烘干、裁片得到硅碳负极片。
作为一种优选方案,所述载体为铜箔、镍箔、银箔、金箔、铂箔中的一种。
作为一种优选方案,所述载气为氦气、氩气、氮气中的一种或两种的混合气体。
作为一种优选方案,所述匀速升温速率为3-20℃/min。
作为一种优选方案,所述硅源气体为硅烷、乙硅烷、二氯甲硅烷、三氯甲硅烷中的一种或两种的混合气体。
作为一种优选方案,所述碳源气体为乙炔、甲烷、丙烯、丙烷的任一种或两种的混合气体。
作为一种优选方案,所述步骤(4)中的洗涤所使用的洗涤剂为有机溶剂,其为乙醇、甲苯、己烷、松节油中的一种或两种的混合物
作为一种优选方案,所述步骤(4)中烘干所用的烘干温度为60-120℃。
作为一种优选方案,所述含镧系元素的化合物为含镧系元素的氧化物、含镧系元素的氯化物、含镧系元素的碳酸化合物中的一种或两种的混合物。
本发明与现有技术相比具有明显的优点和有益效果,具体而言,由上述技术方案可知:
本发明选用对合成纳米结构有催化作用的箔材作为载体,通过化学气相沉积的方法把硅碳负极活性物质一步沉积在箔材集流体上,并且,采用含镧系元素的化合物对箔材进行表面处理,增加硅碳在箔材上的附着力,沉积后箔材经洗涤、烘干、裁片可得硅碳负极片,省去了传统锂离子电池用负极极片制备的配料、匀浆、涂布等流程,且不需要添加导电剂、粘合剂及增稠剂,简化了制备流程和节约了物料成本,从而大大降低硅碳负极片的制备成本。
为更清楚地阐述本发明的结构特征和功效,下面结合具体实施例来对本发明进行详细说明:
具体实施方式
本发明揭示一种硅碳负极片的制备方法,包括有以下步骤:
(1)采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中;该含镧系元素的化合物为含镧系元素的氧化物、含镧系元素的氯化物、含镧系元素的碳酸化合物中的一种或两种的混合物;该载体为对合成纳米结构有催化作用的箔材,具体而言,该载体为铜箔、镍箔、银箔、金箔、铂箔中的一种。
(2)往管式炉内通入载气,排尽管式炉内的空气,后保持载气的持续通入,匀速升温至沉积温度,沉积温度为500-1000℃,该载气为氦气、氩气、氮气中的一种或两种的混合气体,该匀速升温速率为3-20℃/min。
(3)通过载气将硅源气体和碳源气体带入管式炉内,硅源气体和碳源气体的流量比为(1-10):(1-5),保温沉积,沉积时间为2-10h,得到沉积产物;该硅源气体为硅烷、乙硅烷、二氯甲硅烷、三氯甲硅烷中的一种或两种的混合气体;该碳源气体为乙炔、甲烷、丙烯、丙烷的任一种或两种的混合气体。
(4)待沉积结束后,冷却至室温,取出沉积产物,经洗涤、烘干、裁片得到硅碳负极片;其中,洗涤所使用的洗涤剂为有机溶剂,其为乙醇、甲苯、己烷、松节油中的一种或两种的混合物;烘干所用的烘干温度为60-120℃。
下面结合具体实施例进行进一步详细说明。
实施例1
(1)采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中;该含镧系元素的化合物为含镧系元素的氧化物;该载体为铜箔。
(2)往管式炉内通入载气,排尽管式炉内的空气,后保持载气的持续通入,匀速升温至沉积温度,沉积温度为500℃,该载气为氮气,该匀速升温速率为10℃/min。
(3)通过载气将硅源气体和碳源气体带入管式炉内,硅源气体和碳源气体的流量比为1:5,保温沉积,沉积时间为8h,得到沉积产物;该硅源气体为三氯甲硅烷;该碳源气体为甲烷。
(4)待沉积结束后,冷却至室温,取出沉积产物,经洗涤、烘干、裁片得到硅碳负极片;其中,洗涤所使用的洗涤剂为有机溶剂,其为乙醇;烘干所用的烘干温度为100℃。
实施例2
(1)采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中;该含镧系元素的化合物为含镧系元素的氯化物;该载体为铂箔。
(2)往管式炉内通入载气,排尽管式炉内的空气,后保持载气的持续通入,匀速升温至沉积温度,沉积温度为800℃,该载气为氦气,该匀速升温速率为3℃/min。
(3)通过载气将硅源气体和碳源气体带入管式炉内,硅源气体和碳源气体的流量比为10:1,保温沉积,沉积时间为6h,得到沉积产物;该硅源气体为硅烷;该碳源气体为乙炔。
(4)待沉积结束后,冷却至室温,取出沉积产物,经洗涤、烘干、裁片得到硅碳负极片;其中,洗涤所使用的洗涤剂为有机溶剂,其为松节油;烘干所用的烘干温度为60℃。
实施例3
(1)采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中;该含镧系元素的化合物为含镧系元素的碳酸化合物;该载体为镍箔。
(2)往管式炉内通入载气,排尽管式炉内的空气,后保持载气的持续通入,匀速升温至沉积温度,沉积温度为700℃,该载气为氩气,该匀速升温速率为20℃/min。
(3)通过载气将硅源气体和碳源气体带入管式炉内,硅源气体和碳源气体的流量比为8:3,保温沉积,沉积时间为2h,得到沉积产物;该硅源气体为乙硅烷;该碳源气体为丙烯。
(4)待沉积结束后,冷却至室温,取出沉积产物,经洗涤、烘干、裁片得到硅碳负极片;其中,洗涤所使用的洗涤剂为有机溶剂,其为甲苯;烘干所用的烘干温度为120℃。
实施例4
(1)采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中;该含镧系元素的化合物为含镧系元素的氧化物和含镧系元素的碳酸化合物中的混合物;该载体为银箔。
(2)往管式炉内通入载气,排尽管式炉内的空气,后保持载气的持续通入,匀速升温至沉积温度,沉积温度为1000℃,该载气为氦气和氩气的混合气体,该匀速升温速率为14℃/min。
(3)通过载气将硅源气体和碳源气体带入管式炉内,硅源气体和碳源气体的流量比为7:2,保温沉积,沉积时间为5h,得到沉积产物;该硅源气体为三氯甲硅烷;该碳源气体为丙烷。
(4)待沉积结束后,冷却至室温,取出沉积产物,经洗涤、烘干、裁片得到硅碳负极片;其中,洗涤所使用的洗涤剂为有机溶剂,其为己烷;烘干所用的烘干温度为100℃。
实施例5
(1)采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中;该含镧系元素的化合物为含镧系元素的氯化物和含镧系元素的碳酸化合物的混合物;该载体为金箔。
(2)往管式炉内通入载气,排尽管式炉内的空气,后保持载气的持续通入,匀速升温至沉积温度,沉积温度为750℃,该载气为氦气和氮气的混合气体,该匀速升温速率为8℃/min。
(3)通过载气将硅源气体和碳源气体带入管式炉内,硅源气体和碳源气体的流量比为8:5,保温沉积,沉积时间为10h,得到沉积产物;该硅源气体为硅烷和三氯甲硅烷中的混合气体;该碳源气体为乙炔和丙烷的混合气体。
(4)待沉积结束后,冷却至室温,取出沉积产物,经洗涤、烘干、裁片得到硅碳负极片;其中,洗涤所使用的洗涤剂为有机溶剂,其为松节油;烘干所用的烘干温度为80℃。
实施例6
(1)采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中;该含镧系元素的化合物为含镧系元素的氧化物;该载体为铜箔。
(2)往管式炉内通入载气,排尽管式炉内的空气,后保持载气的持续通入,匀速升温至沉积温度,沉积温度为850℃,该载气为氦气,该匀速升温速率为18℃/min。
(3)通过载气将硅源气体和碳源气体带入管式炉内,硅源气体和碳源气体的流量比为6:1,保温沉积,沉积时间为8.5h,得到沉积产物;该硅源气体为硅烷;该碳源气体为乙炔。
(4)待沉积结束后,冷却至室温,取出沉积产物,经洗涤、烘干、裁片得到硅碳负极片;其中,洗涤所使用的洗涤剂为有机溶剂,其为乙醇;烘干所用的烘干温度为105℃。
对上述实施例所制得的硅碳负极片进行性能测试,其测试结果如表1所示。
表1
从表1可以明显得出,通过本发明的制备方法所制备的硅碳负极片具备粒度小,比表面积大的特点,且电化学性能优异。
以上所述,仅是本发明的较佳实施例而已,并非对本发明的技术范围作任何限制,故凡是依据本发明的技术实质对以上实施例所作的任何细微修改、等同变化与修饰,均仍属于本发明技术方案的范围内。
Claims (9)
1.一种硅碳负极片的制备方法,其特征在于:包括有以下步骤:
(1)采用含镧系元素的化合物对载体进行表面处理,经过清洗后,放置在管式炉内的加热区中;
(2)往管式炉内通入载气,排尽管式炉内的空气,后保持载气的持续通入,匀速升温至沉积温度,沉积温度为500-1000℃;
(3)通过载气将硅源气体和碳源气体带入管式炉内,硅源气体和碳源气体的流量比为(1-10):(1-5),保温沉积,沉积时间为2-10h,得到沉积产物;
(4)待沉积结束后,冷却至室温,取出沉积产物,经洗涤、烘干、裁片得到硅碳负极片。
2.根据权利要求1所述的硅碳负极片的制备方法,其特征在于:所述载体为铜箔、镍箔、银箔、金箔、铂箔中的一种。
3.根据权利要求1所述的硅碳负极片的制备方法,其特征在于:所述载气为氦气、氩气、氮气中的一种或两种的混合气体。
4.根据权利要求1所述的硅碳负极片的制备方法,其特征在于:所述匀速升温速率为3-20℃/min。
5.根据权利要求1所述的硅碳负极片的制备方法,其特征在于:所述硅源气体为硅烷、乙硅烷、二氯甲硅烷、三氯甲硅烷中的一种或两种的混合气体。
6.根据权利要求1所述的硅碳负极片的制备方法,其特征在于:所述碳源气体为乙炔、甲烷、丙烯、丙烷的任一种或两种的混合气体。
7.根据权利要求1所述的硅碳负极片的制备方法,其特征在于:所述步骤(4)中的洗涤所使用的洗涤剂为有机溶剂,其为乙醇、甲苯、己烷、松节油中的一种或两种的混合物。
8.根据权利要求1所述的硅碳负极片的制备方法,其特征在于:所述步骤(4)中烘干所用的烘干温度为60-120℃。
9.根据权利要求1所述的硅碳负极片的制备方法,其特征在于:所述含镧系元素的化合物为含镧系元素的氧化物、含镧系元素的氯化物、含镧系元素的碳酸化合物中的一种或两种的混合物。
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