CN116410089A - Photoresist film-forming monomer and preparation method and application thereof - Google Patents
Photoresist film-forming monomer and preparation method and application thereof Download PDFInfo
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- CN116410089A CN116410089A CN202310012236.6A CN202310012236A CN116410089A CN 116410089 A CN116410089 A CN 116410089A CN 202310012236 A CN202310012236 A CN 202310012236A CN 116410089 A CN116410089 A CN 116410089A
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 35
- 239000000178 monomer Substances 0.000 title claims abstract description 33
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical group ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 57
- 239000012074 organic phase Substances 0.000 claims description 40
- 238000006243 chemical reaction Methods 0.000 claims description 38
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 33
- 239000008346 aqueous phase Substances 0.000 claims description 33
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 30
- 239000000243 solution Substances 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N 1,4-Benzenediol Natural products OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 18
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical class [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 16
- 238000004440 column chromatography Methods 0.000 claims description 11
- 238000002390 rotary evaporation Methods 0.000 claims description 11
- 238000005406 washing Methods 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 9
- 239000011230 binding agent Substances 0.000 claims description 8
- 239000003112 inhibitor Substances 0.000 claims description 7
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 6
- 238000006116 polymerization reaction Methods 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 claims description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 4
- 239000012043 crude product Substances 0.000 claims description 4
- 238000005886 esterification reaction Methods 0.000 claims description 4
- 239000003999 initiator Substances 0.000 claims description 4
- 239000011259 mixed solution Substances 0.000 claims description 4
- 238000000746 purification Methods 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 claims description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 3
- SDGKUVSVPIIUCF-UHFFFAOYSA-N 2,6-dimethylpiperidine Chemical compound CC1CCCC(C)N1 SDGKUVSVPIIUCF-UHFFFAOYSA-N 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000000687 hydroquinonyl group Chemical group C1(O)=C(C=C(O)C=C1)* 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 claims description 2
- 238000010791 quenching Methods 0.000 claims description 2
- 230000000171 quenching effect Effects 0.000 claims description 2
- 238000010025 steaming Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- ORILYTVJVMAKLC-UHFFFAOYSA-N Adamantane Natural products C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 abstract description 9
- -1 adamantane acrylic ester Chemical class 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052710 silicon Inorganic materials 0.000 abstract description 4
- 239000010703 silicon Substances 0.000 abstract description 4
- ASHSBZCETQXFPA-UHFFFAOYSA-N adamantane;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.C1C(C2)CC3CC1CC2C3 ASHSBZCETQXFPA-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000003786 synthesis reaction Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 18
- 238000003756 stirring Methods 0.000 description 13
- 239000012263 liquid product Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- LJFGNNHKXSJWFF-UHFFFAOYSA-N 3-ethyladamantan-1-ol Chemical compound C1C(C2)CC3CC2(O)CC1(CC)C3 LJFGNNHKXSJWFF-UHFFFAOYSA-N 0.000 description 9
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 9
- 238000001514 detection method Methods 0.000 description 9
- 238000010907 mechanical stirring Methods 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 239000003208 petroleum Substances 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 230000032798 delamination Effects 0.000 description 7
- 229920006395 saturated elastomer Polymers 0.000 description 7
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 7
- 235000017557 sodium bicarbonate Nutrition 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 7
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 5
- PNLDIIOKBFKXKW-UHFFFAOYSA-N (3-ethyl-1-adamantyl) 2-methylprop-2-enoate Chemical group CCC12CC3CC(C1)CC(C3)(C2)OC(=O)C(C)=C PNLDIIOKBFKXKW-UHFFFAOYSA-N 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000002952 polymeric resin Substances 0.000 description 4
- 229920003002 synthetic resin Polymers 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- LXTHCCWEYOKFSR-UHFFFAOYSA-N 1-ethyladamantane Chemical compound C1C(C2)CC3CC2CC1(CC)C3 LXTHCCWEYOKFSR-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 108010025899 gelatin film Proteins 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
- C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/14—Preparation of carboxylic acid esters from carboxylic acid halides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/48—Separation; Purification; Stabilisation; Use of additives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/48—Separation; Purification; Stabilisation; Use of additives
- C07C67/52—Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/48—Separation; Purification; Stabilisation; Use of additives
- C07C67/56—Separation; Purification; Stabilisation; Use of additives by solid-liquid treatment; by chemisorption
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/48—Separation; Purification; Stabilisation; Use of additives
- C07C67/58—Separation; Purification; Stabilisation; Use of additives by liquid-liquid treatment
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
- C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
- C07C69/54—Acrylic acid esters; Methacrylic acid esters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/56—Ring systems containing bridged rings
- C07C2603/58—Ring systems containing bridged rings containing three rings
- C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
- C07C2603/74—Adamantanes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
The invention discloses a photoresist film-forming monomer, a preparation method and application thereof, wherein the photoresist film-forming monomer is a compound with the following general formulaAnd (3) the following substances:wherein R is C 1 ~C 6 Or a hydrogen atom. The 3-ethyl substituted adamantane acrylic ester photoresist film forming monomer synthesized by the method has the advantages of simple synthesis line and easy operation, and the monomer is more excellent in adhesion to a silicon substrate than the traditional adamantane methacrylate photoresist.
Description
Technical Field
The invention relates to the technical field of photoresist, in particular to a photoresist resin monomer structure, a preparation method and application thereof.
Background
193nm photoresist is basically a chemical amplification photoresist, which is a photoresist based on the chemical amplification principle, and its main components are polymer resin, photoacid generator, and corresponding additives (alkaline additive, dissolution inhibitor, etc.) and solvents. Wherein the polymer resin is formed by copolymerization between resin monomers of different side chain structures, the side chain structures are key components for endowing the polymer resin with required functions, and polar groups and acid-sensitive groups are generally provided for the polymer resin. Wherein the polar groups balance the hydrophilicity and hydrophobicity of the resin, improve adhesion between the resin and the substrate, and provide developability to the host resin.
Adamantane is selected as a typical alicyclic skeleton, and since this structure is considered as the most compact and effective dry-etching-resistant alicyclic structure, the structure of adamantane is introduced into a methacrylic resin monomer so that it has the advantages of both polymethacrylate and adamantane, shows good controllability, excellent resolution, excellent corrosion resistance, and the like, and is a photoresist resin monomer widely used for 193 nm.
The adhesion of the photoresist represents the strength of the photoresist to adhere to the substrate and the photoresist must adhere to many different types of surfaces including silicon, polysilicon, silicon dioxide and different metals. The photoresist, if not adhesive enough, can cause deformation of the pattern on the wafer surface. The adhesion of the photoresist must ensure that the photoresist withstands exposure, development and subsequent processing. However, the existing adamantane methacrylate resin compositions have low adhesion to a substrate. Resins produced by reacting ethyladamantane with maleic anhydride as in CN105295802a can be used in sealant compositions for bonding narrow-frame display devices, but require compounding with other curing agents to provide the required higher viscosity so that it can bond narrow-frame and even borderless devices such as cell phones, displays, televisions.
Disclosure of Invention
The invention aims to overcome the defects of the prior art, provides a 3-ethyl substituted adamantane acrylic ester type photoresist resin monomer with better adhesiveness with a silicon substrate, and also provides a preparation method thereof.
In order to achieve the purpose of the invention, the application provides the following technical scheme:
a photoresist film forming monomer, characterized in that: the monomer is a compound of the following general formula:
wherein R is C 1 ~C 6 Or a hydrogen atom.
Further, the monomer is selected from the following compounds:
the second object of the present invention is to provide a method for preparing the photoresist film-forming monomer, which comprises the following steps:
dissolving a compound of a formula III and an acid binding agent in an organic solvent, dropwise adding a compound of a formula II, and carrying out esterification reaction and purification to obtain a monomer of the formula I;
wherein X is a halogen atom, R is C 1 ~C 6 Or a hydrogen atom.
Further, the molar ratio of the compound of formula III, the compound of formula II and the acid binding agent is 1: (1.2-2): (1.2-2); the acid binding agent is selected from one of triethylamine, 2, 6-dimethylpiperidine and pyridine.
Further, the solvent is selected from dichloromethane, chloroform, ethyl acetate or dichloroethane.
Further, the temperature of the compound of the formula II is 0-35 ℃; the temperature of the esterification reaction is 5-35 ℃ and the time is 12-24 h.
Further, the purification comprises the steps of:
1) Quenching the reacted reaction solution by adding water, and layering the mixed solution into a first aqueous phase and a first organic phase;
2) Washing the first organic phase with saturated sodium bicarbonate aqueous solution, and layering the mixed solution into a second aqueous phase and a second organic phase;
3) Washing, drying and rotary steaming the second organic phase to obtain a crude product;
4) The crude product is subjected to column chromatography, added with polymerization inhibitor and concentrated by rotary evaporation to obtain the monomer of the formula I.
The polymerization inhibitor is selected from hydroquinone, p-hydroxyanisole and 2-tertiary butyl hydroquinone; the mol ratio of the compound of the formula III to the compound of the formula II to the acid binding agent to the polymerization inhibitor is 1: (1.2-2): (1.2-2): (0.01-2).
A third object of the present invention is to provide the use of the above-described photoresist film forming monomer as a photoresist comprising the above-described photoresist film forming monomer and at least one initiator.
The 3-ethyl substituted adamantane acrylic ester photoresist film forming monomer is synthesized, the synthetic line is simple, the operation is easy, and the adhesion of the monomer to a silicon substrate is more excellent than that of the traditional adamantane methacrylate photoresist.
Drawings
FIG. 1 is a nuclear magnetic resonance hydrogen spectrum of a photoresist film-forming monomer prepared in example 1,
FIG. 2 is a nuclear magnetic resonance spectrum of the photoresist film forming monomer prepared in example 1,
FIG. 3 is a comparative test of adhesion of the photoresist film forming monomer prepared in example 1 and 1-adamantane methacrylate.
Detailed Description
Numerical ranges in this application are approximations, so that it may include the numerical values outside of the range unless otherwise indicated. The numerical range includes all values from the lower value to the upper value that increase by 1 unit, provided that there is a spacing of at least 2 units between any lower value and any higher value. For example, if a component, physical or other property (e.g., molecular weight, etc.) is recited as 100 to 1000, it is intended that all individual values, e.g., 100, 101, 102, etc., as well as all subranges, e.g., 100 to 166,155 to 170,198 to 200, etc., are explicitly recited. For ranges containing values less than 1 or containing fractions greater than 1 (e.g., 1.1,1.5, etc.), then 1 unit is suitably considered to be 0.0001,0.001,0.01, or 0.1. For a range containing units of less than 10 (e.g., 1 to 5), 1 unit is generally considered to be 0.1. These are merely specific examples of what is intended to be provided, and all possible combinations of numerical values between the lowest value and the highest value enumerated are to be considered to be expressly stated in this application. It should also be noted that the terms "first," "second," and the like herein do not limit the order of precedence, but are used merely to distinguish materials of different structures.
As used with respect to chemical compounds, the singular includes all isomeric forms and vice versa unless explicitly stated otherwise (e.g., "hexane" includes all isomers of hexane, either individually or collectively). In addition, unless explicitly stated otherwise, the use of the terms "a," "an," or "the" include plural referents.
The terms "comprises," "comprising," "including," and their derivatives do not exclude the presence of any other component, step or procedure, and are not related to whether or not such other component, step or procedure is disclosed in the present application. For the avoidance of any doubt, all use of the terms "comprising," "including," or "having" herein, unless expressly stated otherwise, may include any additional additive, adjuvant, or compound. Rather, the term "consisting essentially of … …" excludes any other component, step or process from the scope of any of the terms recited below, except as necessary for operability. The term "consisting of … …" does not include any components, steps or processes not specifically described or listed. The term "or" refers to the listed individual members or any combination thereof unless explicitly stated otherwise.
Example 1:
1. 3-ethyl-1-adamantanol (30 g,0.165 mol), methylene chloride (400 ml), triethylamine (28 g,0.277 mol) were successively added to a 1L three-port reaction flask equipped with a thermometer and mechanical stirring, and after stirring at 15℃for 1 hour, a mixture of methacryloyl chloride (26 ml,0.25 mol) and methylene chloride (50 ml) was slowly added dropwise under the protection of nitrogen, and the reaction was completed at 15℃for 20 hours, followed by detection of the completion of the reaction by TCL.
2. 100ml of water was added to the reaction solution, stirred sufficiently for 1 hour, left to stand for delamination, the aqueous phase was removed, the organic phase was washed with 100ml of saturated aqueous sodium hydrogencarbonate solution, the aqueous phase was removed, the organic phase was washed with 100ml of water, the aqueous phase was removed, the organic phase was dried over anhydrous sodium sulfate, filtered, the organic phase was added to 0.03g of hydroquinone, and concentrated by rotary evaporation at 35℃to give 44g of brown liquid.
3. The brown liquid was subjected to column chromatography using petroleum ether: washing with ethyl acetate (50:1) gave 33.8g of a colorless transparent liquid product, 82.6% molar yield and 98.7% purity.
Proved by nuclear magnetic resonance hydrogen spectrum and carbon spectrum (shown in figures 1 and 2), the colorless transparent liquid product is 3-ethyl-1-adamantyl methacrylate.
Example 2:
1. 3-ethyl-1-adamantanol (30 g,0.165 mol), methylene chloride (400 ml), triethylamine (26 g,0.257 mol) were successively added to a 1L three-port reaction flask equipped with a thermometer and mechanical stirring, and after stirring at 15℃for 1 hour, a mixture of methacryloyl chloride (22 g,0.211 mol) and methylene chloride (50 ml) was slowly added dropwise under the protection of nitrogen, and the reaction was completed at 15℃for 20 hours, followed by detection of the completion of the reaction by TCL.
2. 100ml of water was added to the reaction solution, stirred sufficiently for 1 hour, left to stand for delamination, the aqueous phase was removed, the organic phase was washed with 100ml of saturated aqueous sodium hydrogencarbonate solution, the aqueous phase was removed, the organic phase was washed with 100ml of water, the aqueous phase was removed, the organic phase was dried over anhydrous sodium sulfate, filtered, the organic phase was added to 0.03g of hydroquinone, and concentrated by rotary evaporation at 35℃to give 42.7g of brown liquid.
3. The brown liquid was subjected to column chromatography using petroleum ether: washing with ethyl acetate (50:1) gave 31.4g of a colorless transparent liquid product in a molar yield of 76.7% and a purity of 98.1%.
The colorless transparent liquid product is the methacrylic acid-3-ethyl adamantan-1-yl ester through nuclear magnetic resonance hydrogen spectrum and carbon spectrum verification.
Example 3
1. 3-ethyl-1-adamantanol (30 g,0.165 mol), methylene chloride (400 ml), triethylamine (26 g,0.257 mol) were successively added to a 1L three-port reaction flask equipped with a thermometer and mechanical stirring, and after stirring at 15℃for 1 hour, a mixture of acryloyl chloride (25 g,0.27 mol) and methylene chloride (50 ml) was slowly added dropwise under nitrogen protection, and the reaction was completed at 15℃for 20 hours, followed by detection of the completion of the reaction by TCL.
2. 100ml of water was added to the reaction solution, stirred sufficiently for 1 hour, left to stand for delamination, the aqueous phase was removed, the organic phase was washed with 100ml of saturated aqueous sodium hydrogencarbonate solution, the aqueous phase was removed, the organic phase was washed with 100ml of water, the aqueous phase was removed, the organic phase was dried over anhydrous sodium sulfate, filtered, the organic phase was added to 0.03g of hydroquinone, and concentrated by rotary evaporation at 35℃to give 42.7g of brown liquid.
3. The brown liquid was subjected to column chromatography using petroleum ether: washing with ethyl acetate (50:1) gave 31.4g of a colorless transparent liquid product in a molar yield of 81.3% and a purity of 98.1%.
Example 4:
1. 3-ethyl-1-adamantanol (30 g,0.165 mol), methylene chloride (400 ml), triethylamine (26 g,0.255 mol) were successively added to a 1L three-port reaction flask equipped with a thermometer and mechanical stirring, and after stirring at 15℃for 1 hour, a mixture of acryloyl chloride (20 g,0.222 mol) and methylene chloride (50 ml) was slowly added dropwise under nitrogen protection, and the reaction was completed at 15℃for 20 hours, followed by detection of the completion of the reaction by TCL.
2. 100ml of water was added to the reaction solution, stirred sufficiently for 1 hour, left to stand for delamination, the aqueous phase was removed, the organic phase was washed with 100ml of saturated aqueous sodium hydrogencarbonate solution, the aqueous phase was removed, the organic phase was washed with 100ml of water, the aqueous phase was removed, the organic phase was dried over anhydrous sodium sulfate, filtered, the organic phase was added to 0.03g of hydroquinone, and concentrated by rotary evaporation at 35℃to give 40.1g of brown liquid.
3. The brown liquid was subjected to column chromatography using petroleum ether: washing with ethyl acetate (50:1) gave 29.3g of a colorless transparent liquid product in a molar yield of 75.5% and a purity of 98.1%.
Example 5:
1. 3-ethyl-1-adamantanol (30 g,0.165 mol), dichloroethane (400 ml), triethylamine (28 g,0.277 mol) were successively added to a 1L three-port reaction flask equipped with a thermometer and mechanical stirring, and after stirring at 15℃for 1 hour, a mixture of methacryloyl chloride (26 ml,0.25 mol) and dichloroethane (50 ml) was slowly added dropwise under the protection of nitrogen, and the reaction was completed at 15℃for 20 hours, followed by detection of the completion of the reaction by TCL.
2. 100ml of water was added to the reaction solution, stirred sufficiently for 1 hour, left to stand for delamination, the aqueous phase was removed, the organic phase was washed with 100ml of saturated aqueous sodium hydrogencarbonate solution, the aqueous phase was removed, the organic phase was washed with 100ml of water, the aqueous phase was removed, the organic phase was dried over anhydrous sodium sulfate, filtered, the organic phase was added to 0.03g of hydroquinone, and concentrated by rotary evaporation at 60℃to give 41.2g of brown liquid.
3. The brown liquid was subjected to column chromatography using petroleum ether: washing with ethyl acetate (50:1) gave 25.7g of a colorless transparent liquid product, 62.8% molar yield and 98.1% purity.
Example 6:
1. 3-ethyl-1-adamantanol (30 g,0.165 mol), methylene chloride (400 ml), pyridine (20.1 g,0.255 mol) were sequentially added to a 1L three-port reaction flask equipped with a thermometer and mechanical stirring, and after stirring at 15℃for 1 hour, a mixture of methacryloyl chloride (26 ml,0.25 mol) and methylene chloride (50 ml) was slowly added dropwise under the protection of nitrogen, and the reaction was completed at 15℃for 20 hours, followed by detection of the completion of the reaction by TCL.
2. 100ml of water was added to the reaction solution, stirred sufficiently for 1 hour, left to stand for delamination, the aqueous phase was removed, the organic phase was washed with 100ml of saturated aqueous sodium hydrogencarbonate solution, the aqueous phase was removed, the organic phase was washed with 100ml of water, the aqueous phase was removed, the organic phase was dried over anhydrous sodium sulfate, filtered, the organic phase was added with 0.03g of hydroquinone, concentrated by rotary evaporation at 35 ℃, and then concentrated at 60℃to give a light brown liquid of 44.7g.
3. The brown liquid was subjected to column chromatography using petroleum ether: washing with ethyl acetate (50:1) gave 31.9g of a colorless transparent liquid product, 77.9% molar yield and 98.4% purity.
Example 7:
1. 3-ethyl-1-adamantanol (30 g,0.165 mol), methylene chloride (400 ml), triethylamine (28 g,0.277 mol) were successively added to a 1L three-port reaction flask equipped with a thermometer and mechanical stirring, and after stirring at 15℃for 1 hour, a mixture of methacryloyl chloride (26 ml,0.25 mol) and methylene chloride (50 ml) was slowly added dropwise under the protection of nitrogen, and the reaction was completed at 15℃for 20 hours, followed by detection of the completion of the reaction by TCL.
2. 100ml of water was added to the reaction solution, stirred sufficiently for 1 hour, left to stand for delamination, the aqueous phase was removed, the organic phase was washed with 100ml of saturated aqueous sodium hydrogencarbonate solution, the aqueous phase was removed, the organic phase was washed with 100ml of water, the aqueous phase was removed, the organic phase was dried over anhydrous sodium sulfate, filtered, 0.03g of 2-t-butylhydroquinone was added to the organic phase, and concentrated by rotary evaporation at 35℃to give 44.7g of brown liquid.
3. The brown liquid was subjected to column chromatography using petroleum ether: washing with ethyl acetate (50:1) gave 34.9g of a colorless transparent liquid product in a molar yield of 85.2% and a purity of 99.2%.
Proved by nuclear magnetic resonance hydrogen spectrum and carbon spectrum (shown in figures 1 and 2), the colorless transparent liquid product is 3-ethyl-1-adamantyl methacrylate.
Comparative example 1:
1. 3-ethyl-1-adamantanol (30 g,0.165 mol), tetrahydrofuran (400 ml), triethylamine (26 g,0.255 mol) were sequentially added to a 1L three-port reaction flask equipped with a thermometer and mechanical stirring, and after stirring at 15℃for 1 hour, a mixture of methacryloyl chloride (22 g,0.211 mol) and tetrahydrofuran (50 ml) was slowly dropped under nitrogen protection, and the reaction was completed at 15℃for 20 hours, followed by detection of the completion of the TCL reaction.
2. 100ml of water and 150ml of dichloromethane were added to the reaction solution, stirring thoroughly for 1 hour, the aqueous phase was removed, 100ml of dichloromethane was added to the aqueous phase, stirring thoroughly, the aqueous phase was removed, the organic phases were combined and washed with water (100 ml x 2) to neutrality, the aqueous phase was removed, the organic phases were dried over anhydrous sodium sulfate, 0.03g of hydroquinone was added, and concentrated by rotary evaporation at 35 ℃ to give a brown liquid of 30.2g.
3. The brown liquid was subjected to column chromatography using petroleum ether: ethyl acetate (50:1) to give 16.5g of 3-ethyl adamantan-1-yl methacrylate as a colorless transparent liquid, 40.3% molar yield and 98.1% purity.
Comparative example 2
1. 3-ethyl-1-adamantanol (30 g,0.165 mol), tetrahydrofuran (400 ml), triethylamine (26 g,0.255 mol) were sequentially added to a 1L three-port reaction flask equipped with a thermometer and mechanical stirring, and after stirring at 15℃for 1 hour, a mixture of acryloyl chloride (20 g,0.222 mol) and methylene chloride (50 ml) was slowly added dropwise under nitrogen protection, and the reaction was completed at 15℃for 20 hours, followed by detection of the completion of the TCL reaction.
2. 100ml of water and 150ml of dichloromethane were added to the reaction solution, stirring thoroughly for 1 hour, the aqueous phase was removed, 100ml of dichloromethane was added to the aqueous phase, stirring thoroughly, the aqueous phase was removed, the organic phases were combined and washed with water (100 ml x 2) to neutrality, the aqueous phase was removed, the organic phases were dried over anhydrous sodium sulfate, 0.03g of hydroquinone was added, and concentrated by rotary evaporation at 35 ℃ to give a brown liquid of 30.2g.
3. The brown liquid was subjected to column chromatography using petroleum ether: ethyl acetate (50:1) to give 15.2g of 3-ethyl adamantan-1-yl acrylate as a colorless transparent liquid, 39.2% molar yield and 98.3% purity.
Comparative examples 1 and 2 illustrate that the use of tetrahydrofuran as a solvent has a side reaction, severely reducing the yield of the product.
Adhesion test
1.1 g of 3-ethyl adamantan-1-yl methacrylate prepared in example 1 and 1g of commercially available 1-adamantan methacrylate were weighed into a 2ml centrifuge tube, respectively, and 1% of initiator was added thereto, followed by ultrasonic dissolution for 5 minutes.
2. A layer of prepared 1-adamantane methacrylate and 3-ethyladamantane-1-yl methacrylate with an initiator is smeared on a glass slide, a silica gel film with the thickness of 2cm multiplied by 2cm is completely covered on the surface of the glass slide, and the glass slide is completely solidified by using a light source, wherein the thickness of the glass slide is 70-80 mu m.
3. The cured sample was dried for 16 hours and the adhesion was determined by cross-hatch. As a result, as shown in FIG. 3, it can be seen from the figure that the adhesion of the left 1-adamantane methacrylate was 0B in GB/T9286-1998, and the adhesion of the right 3-ethyladamantan-1-yl methacrylate was 3B in GB/T9286-1998, which is significantly superior to 1-adamantane methacrylate.
The above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (10)
3. a method for preparing a photoresist film-forming monomer according to claim 1 or 2, characterized in that: the preparation method comprises the following steps:
dissolving a compound of a formula III and an acid binding agent in an organic solvent, dropwise adding a compound of a formula II, and carrying out esterification reaction and purification to obtain a monomer of the formula I;
wherein X is a halogen atom, R is C 1 ~C 6 Or a hydrogen atomAnd (5) a seed.
4. A method of preparation according to claim 3, characterized in that: : the molar ratio of the compound of the formula III to the compound of the formula II to the acid binding agent is 1: (1.2-2): (1.2-2).
5. A method of preparation according to claim 3, characterized in that: the acid binding agent is selected from one of triethylamine, 2, 6-dimethylpiperidine and pyridine.
6. A method of preparation according to claim 3, characterized in that: the solvent is selected from dichloromethane, chloroform, ethyl acetate or dichloroethane.
7. A method of preparation according to claim 3, characterized in that: the temperature of the compound of the formula II is 0-35 ℃; the temperature of the esterification reaction is 0-35 ℃ and the time is 6-24 h.
8. A method of preparation according to claim 3, characterized in that: the purification comprises the following steps:
1) Quenching the reacted reaction solution by adding water, and layering the mixed solution into a first aqueous phase and a first organic phase;
2) Washing the first organic phase with saturated sodium bicarbonate aqueous solution, and layering the mixed solution into a second aqueous phase and a second organic phase;
3) Washing, drying and rotary steaming the second organic phase to obtain a crude product;
4) The crude product is subjected to column chromatography, added with polymerization inhibitor and concentrated by rotary evaporation to obtain the monomer of the formula I.
9. The method of manufacturing according to claim 8, wherein: the polymerization inhibitor is selected from hydroquinone, p-hydroxyanisole and 2-tertiary butyl hydroquinone; the mol ratio of the compound of the formula III to the compound of the formula II to the acid binding agent to the polymerization inhibitor is 1: (1.2-2): (1.2-2): (0.01-2).
10. Use of a photoresist film forming monomer according to claim 1 or 2, characterized in that: is used as a photoresist comprising a photoresist film forming monomer and at least one initiator.
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