[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

KR101963931B1 - Black photosensitive resin composition, black matrix and image display device comprising thereof - Google Patents

Black photosensitive resin composition, black matrix and image display device comprising thereof Download PDF

Info

Publication number
KR101963931B1
KR101963931B1 KR1020150025552A KR20150025552A KR101963931B1 KR 101963931 B1 KR101963931 B1 KR 101963931B1 KR 1020150025552 A KR1020150025552 A KR 1020150025552A KR 20150025552 A KR20150025552 A KR 20150025552A KR 101963931 B1 KR101963931 B1 KR 101963931B1
Authority
KR
South Korea
Prior art keywords
group
carbon atoms
black
photosensitive resin
resin composition
Prior art date
Application number
KR1020150025552A
Other languages
Korean (ko)
Other versions
KR20160066482A (en
Inventor
유정호
육성훈
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to TW104139414A priority Critical patent/TWI654487B/en
Priority to CN201510863908.XA priority patent/CN105652595A/en
Publication of KR20160066482A publication Critical patent/KR20160066482A/en
Application granted granted Critical
Publication of KR101963931B1 publication Critical patent/KR101963931B1/en

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

The present invention relates to a black photosensitive resin composition, a black matrix using the black photosensitive resin composition, and an image display device having the black matrix. The black photosensitive resin composition according to the present invention has excellent adhesion to a substrate and can form a fine pattern for realizing a high resolution.

Description

TECHNICAL FIELD [0001] The present invention relates to a black photosensitive resin composition, a black matrix using the black photosensitive resin composition, and an image display device having the black matrix.

The present invention relates to a black photosensitive resin composition capable of realizing high resolution by securing an excellent substrate adhesion and an improved developing adhesion, a black matrix using the composition, and an image display device having the same.

The quality of the display depends on the color filter. A black pattern on the lattice called a black matrix is disposed between the color pixels of the color filter. In order to realize a large screen area and high contrast, the black matrix of the color filter is required to be patterned with high light resolution and high resolution.

In the conventional black matrix, chromium has been used. This process deposits chromium on the entire glass substrate and forms a pattern by etching treatment. Therefore, high cost is required in the process, and high reflection of chrome, environmental pollution . For this reason, studies of a resin black matrix by a pigment dispersion method capable of micromachining are actively conducted.

In addition, studies have been made to prepare black compositions using color pigments other than carbon black. However, color pigments other than carbon black are required to have a very large blending amount because of low light shielding property. As a result, viscosity of the composition increases, There is a problem that the strength of the formed film or the adhesion to the substrate is considerably lowered. Currently, various studies are under way in response to the demand for continuous improvement of the industry.

In addition, according to the slimness of the display and the requirement for a wider screen, a technique for increasing the screen size even by one inch is applied by using a minimum area even in the upper and lower plate joint portions of the module. Particularly, in order to maximize the characteristics of the mobile as the mobile market gradually grows, besides the slimming of the module itself, there are also plans to reduce the number of devices and maximize the display.

As one of the methods, a new type of cementation method is used instead of the existing cementation method. In the conventional bonding method, the method of attaching the glass and the black matrices at the same time has been performed, but the display efficiency on the panel is lowered by using a larger glass than the actual visible region. On the other hand, in the new joining method, in order to increase the display efficiency, the joining is performed only in the black matrix portion without using the glass during joining, thereby maximizing the display efficiency in the panel. In this method, Characteristics can be secured.

However, in the conventional method, since adhesion was carried out using glass and black matrix at the same time, there was no big problem in adhesion of sealant in reliability and pressure applied at the time of adhesion, but adhesion with only black matrix portion was carried out using cadmium binder In one case, the pressure applied during bonding and the adhesion of the black matrix to the substrate in the reliability process became a problem, causing a breakdown and a film breakage. Both the optical density (OD) characteristics and the substrate adhesion were satisfied There was a problem.

Korean Patent No. 10-1068622 discloses a high-order black matrix composition with improved substrate adhesion, which solves the problem of high optical density and substrate adhesion, but it can not provide high resolution with the composition.

Korean Patent No. 10-0671106 discloses a black matrix composition having improved durability and photosensitivity using a cadmium binder and a specific initiator. The specific initiator used herein is not sufficient in improving sensitivity with acetophenone and benzophenone photoinitiators.

Korean Patent No. 10-1068622 Korean Patent No. 10-0671106

The inventors of the present invention have completed the present invention by confirming that the above problems can be solved when a cadmium binder resin and an oxime ester fluorene initiator are used together.

Accordingly, it is an object of the present invention to provide a black photosensitive resin composition capable of securing excellent adhesion properties and high resolution.

It is another object of the present invention to provide a black matrix formed using the black photosensitive resin composition.

It is another object of the present invention to provide a liquid crystal display device having the black matrix.

In order to achieve the above object, the present invention provides an ink composition comprising an alkali soluble binder resin, a photopolymerizable compound, a photopolymerization initiator, a black pigment and a solvent,

The alkali-soluble binder resin includes a cadmium-based binder resin,

The photopolymerization initiator provides a black photosensitive resin composition comprising at least one compound represented by the following general formula (1).

[Chemical Formula 1]

Figure 112015017994965-pat00001

(Wherein R 1 to R 10 and p are as described in the specification)

Wherein the cation binder resin has at least one repeating unit represented by the following general formulas (2) and (3).

(2)

Figure 112015017994965-pat00002

(3)

Figure 112015017994965-pat00003

(In the above formulas 2 and 3, R 24 to R 26 are as described in the specification)

The present invention also provides a black matrix made of the black photosensitive resin composition and an image display device including the same.

The black photosensitive resin composition according to the present invention can solve the problems of adhesion and resolution degradation.

The black matrix using the black photosensitive resin composition is excellent in adhesion to a substrate and can form a fine pattern, so that an image display device incorporating the black matrix can secure a high resolution and realize a vivid image quality.

Fig. 1 shows the results of the evaluation of adhesion in the experimental example.
Fig. 2 shows a minimum pattern according to the evaluation of developing adhesion in the experimental example.

The present invention provides a black photosensitive resin composition usable in a black matrix of an image display apparatus.

Particularly, in the present invention, a black photosensitive resin composition comprising a cadmium-based binder resin as an alkali-soluble resin and an oxime ester fluorene-based compound as a photopolymerization initiator is proposed. The cadmium-based binder resin is excellent in adhesion to a substrate, The oxime ester fluorene-based initiator has excellent photosensitivity and can improve the development adhesion of the black matrix. In addition, the black matrix is produced with the black photosensitive resin composition, thereby assuring an advantage that a fine pattern can be easily formed.

The black photosensitive resin composition according to the present invention, together with the cationic binder and oxime ester fluorene initiator, includes a photopolymerizable compound, a black pigment and a solvent.

Each composition will be described below.

The alkali-soluble binder resin has reactivity and alkali solubility due to the action of light or heat and acts as a dispersant of the black pigment. It should also have properties that are soluble in the alkaline developer used in the development step for the production of the black matrix.

In the present invention, the alkali-soluble binder resin is a cadmium-based binder and contains at least one repeating unit represented by the following general formulas (2) and (3) to improve the adhesion to the substrate and realize a fine pattern for high resolution I will.

Figure 112015017994965-pat00004

Figure 112015017994965-pat00005

(In the above formulas 2 and 3,

R 24 and R 25 represent hydrogen, halogen or an alkyl group having 1 to 5 carbon atoms;

R 26 represents a hydrogen atom or a methyl group;

X is -CO-, -SO 2 -, -C (CF 3 ) 2 -, -Si (CH 3 ) 2 -, -CH 2 -, -C (CH 3 ) 2 -, -O-, - a fluorenyl group or a direct bond;

Y represents the residue of an acid anhydride;

Z represents a residue of an acid dianhydride;

The molar ratio (m / n) of the structural units is a ratio of 0/100 to 100/0)

R 24 and R 25 are hydrogen, halogen or an alkyl group having 1 to 5 carbon atoms, and R 26 is a hydrogen atom or a methyl group. Preferably, R 24 to R 26 are hydrogen.

In the repeating units represented by the general formulas (2) and (3) constituting the cationic binder of the present invention, examples of the repeating unit represented by X as -CO- include bis (4-hydroxyphenyl) ketone, bis Dimedylphenyl) ketone and bis (4-hydroxy-3,5-dichlorophenyl) ketone; X is -SO 2 - in that the bis (4-hydroxyphenyl) sulfone, bis (4-hydroxy-3,5-dimethylphenyl) sulfone and bis (4-hydroxy-3,5-dichlorophenyl) sulfone ; X is - C (CF 3) 2 - that is the bis (4-hydroxyphenyl) hexafluoro-propane, bis (4-hydroxy-3,5-dimethyl-phenyl) hexafluoro-propane and bis (4- Hydroxy-3,5-dichlorophenyl) hexafluoropropane; X is -Si (CH 3) 2 - that is the bis (4-hydroxyphenyl) dimethylsilane, bis (4-hydroxy-3,5-dimethylphenyl) dimethylsilane, and bis (4-hydroxy-3, 5-dichlorophenyl) dimethylsilane; X is -CH 2 - that is the bis (4-hydroxyphenyl) methane, bis (4-hydroxy-3,5-dichloro petil) methane and bis (4-hydroxy-3,5-dibromo-phenyl ) Methane; X is - C (CH 3) 2 - that is the 2,2-bis (4-hydroxyphenyl) propane, 2,2-bis (4-hydroxy-3,5-dimethylphenyl) propane, 2,2 Bis (4-hydroxy-3-methylphenyl) propane, 2,2-bis (4-hydroxy- There is propane; Examples of X-O- include bis (4-hydroxyphenyl) ether, bis (4-hydroxy-3,5-dimethylphenyl) ether and bis ; Examples of X 9,9-fluorenyl group include 9,9-bis (4-hydroxyphenyl) fluorene, 9,9-bis (4-hydroxy- (4-hydroxy-3-bromophenyl) fluorene, 9,9-bis (4-hydroxy-3-fluorophenyl) fluorene, Fluorene, 9,9-bis (4-hydroxy-3-methoxyphenyl) fluorene, 9,9- (4-hydroxy-3,5-dichlorophenyl) fluorene and 9,9-bis (4-hydroxy-3,5-dibromophenyl) fluorene; Examples of the direct bond include 4,4'-biphenol and 3,3'-biphenol.

Y and Z in the above formula (2) are respectively residues of an acid anhydride and an acid anhydride, and can be introduced by reacting with a synthetic intermediate of a cationic binder resin of the present invention, an acid anhydride and an acid anhydride. Examples of the acid anhydride compound capable of introducing the residue Y include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, anhydrous tetrahydrophthalic anhydride, Examples of the solvent include tetrahydropthalic anhydride, hexahydrophthalic anhydride, methylendomethylenetetrahydrophthalic anhydride, chlorendic anhydride and methyltetrahydrophthalic anhydride. Examples of the acid dianhydride compound capable of introducing the residue Z include pyromellitic dianhydride, benzophenonetetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, biphenyltetetracarboxylic acid dianhydride, and other aromatic polycarboxylic acid anhydrides.

The cationic binder resin of the present invention can be prepared by the following method. First, bisphenol fluorene-type epoxy compounds synthesized by bisphenol fluorene are reacted with (meth) acrylate to synthesize a bisphenol fluorene-type epoxy acrylate compound, and then a cell such as ethyl cellosolve acetate or butyl cellosolve acetate With an acid anhydride, an acid anhydride or a mixture thereof in a solvent system under heating. In this reaction, the acid anhydride, the acid dianhydride, or the mixture thereof is for introduction of Y and Z, and in actual synthesis it is preferable to react the mixture of the acid anhydride and the acid dianhydride with bisphenol fluorene type epoxy acrylate Do. The type of the (meth) acrylate is not particularly limited, and any of the known (meth) acrylates can be used. At this time, it is preferable to set such that 0.5 mole of the acid anhydride per 1 mole of the OH group of the epoxy acrylate resin reacts quantitatively. The reaction temperature is in the range of 100 to 130 캜, preferably in the range of 115 to 125 캜.

The molar ratio (m / n) of the structural units in the case where the cationic binder resin of the present invention contains all the repeating units of the above formulas (2) and (3) is not particularly limited, but is preferably 1/99 to 90/10, Is from 5/95 to 80/20. When the ratio m / n satisfies the above range, the content of the carboxyl group of the binder resin is appropriately maintained to maintain the excellent alkali resistance, the developing solution does not dissolve in the exposed portion, . In addition, the cation binder resin having the above-mentioned molar ratio can solve the viscous problem after the initial curing and can apply close contact exposure. Also, the cured film after the post-curing is excellent in heat resistance and ITO sputtering is possible even at a high temperature of about 250 ° C.

The molecular weight of the cationic binder resin in the present invention is represented by an intrinsic viscosity (? Nh ), which is measured at 30 占 폚 in a solution of 0.5 g of the cationic binder in 100 ml of N-methylpyrrolidone 0.1 dl / g or more, and preferably 0.15 dl / g or more. If it is less than 0.1 dl / g, the molecular weight is too small to cause a problem of viscosity after the initial curing, so that it is impossible to apply close contact exposure, which causes the mask to be stained.

The cationic binder resin may be contained in an amount of 1 to 40% by weight, preferably 5 to 20% by weight, based on 100% by weight of the total composition. When used within the above range, solubility in a developing solution is sufficient, pattern formation is easy, and reduction of the film thickness of the pixel portion of the exposed portion is prevented during development, so that the missing property of the non-pixel portion is improved.

The oxime ester fluorene initiator which is a feature of the present invention together with the cadmium binder resin is used for improving the sensitivity of the black photosensitive resin composition. The photopolymerization initiator is a compound for initiating a photopolymerizable compound. In the present invention, by using the oxime ester fluorene initiator represented by the following formula (1), the sensitivity of the black photosensitive resin composition is enhanced, and the exposure time is shortened, And can have high resolution at the same time.

Figure 112015017994965-pat00006

(In the formula 1,

R 1 to R 3 are each independently selected from the group consisting of hydrogen, halogen, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an arylalkyl group having 7 to 40 carbon atoms , A hydroxyalkyl group having 1 to 20 carbon atoms, a hydroxyalkoxyalkyl group having 2 to 40 carbon atoms, or a cycloalkyl group having 3 to 20 carbon atoms;

R 4 to R 10 each represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an arylalkyl group having 7 to 40 carbon atoms, a hydroxyalkyl group having 1 to 20 carbon atoms, A hydroxyalkoxyalkyl group having 2 to 40 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms, an amino group, a nitro group, a cyano group or a hydroxy group;

p is 0 or 1)

Halogen mentioned in the present invention is fluorine (F), chlorine (Cl), bromine (Br) or iodine (I).

The alkyl group referred to in the present invention refers to a straight or branched chain hydrocarbon radical consisting solely of carbon and hydrogen atoms and having no unsaturation and bonded to the remainder of the molecule by a single bond. The alkyl group is preferably a linear or branched alkyl group having 1 to 20 carbon atoms, more preferably a linear or branched alkyl group having 1 to 10 carbon atoms, and most preferably a linear or branched alkyl group having 1 to 6 carbon atoms. Examples of such unsubstituted alkyl groups include methyl, ethyl, n - propyl, isopropyl, n - butyl, isobutyl, sec - butyl, t - butyl, pentyl, isoamyl, And the like. The at least one hydrogen atom contained in the alkyl group may be substituted with at least one substituent selected from the group consisting of a halogen atom, a hydroxyl group, a thiol group (-SH), a nitro group, a cyano group, a substituted or unsubstituted amino group, an amidino group, a hydrazine group, An alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 20 carbon atoms, an alkynyl group having 1 to 20 carbon atoms, a heteroalkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, An arylalkyl group having 6 to 20 carbon atoms, a heteroaryl group having 6 to 20 carbon atoms, or a heteroarylalkyl group having 6 to 20 carbon atoms.

The alkoxy group mentioned in the present invention is preferably an oxygen-containing straight-chain or branched alkoxy group each having an alkyl moiety having 1 to 20 carbon atoms. More preferably an alkoxy group having 1 to 10 carbon atoms, and most preferably an alkoxy group having 1 to 4 carbon atoms. Examples of such an alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, and a t -butoxy group. The alkoxy group may be further substituted with one or more halo atoms such as fluoro, chloro or bromo to provide a haloalkoxy group. Examples thereof include a fluoromethoxy group, a chloromethoxy group, a trifluoromethoxy group, a trifluoroethoxy group, a fluoroethoxy group, and a fluoropropoxy group. At least one hydrogen atom in the alkoxy group may be substituted with the same substituent as in the case of the alkyl group.

The cycloalkyl group referred to in the present invention includes not only a single ring system but also a plurality of cyclic hydrocarbons, and at least one hydrogen atom in the cycloalkyl group can be substituted with the same substituent as the alkyl group. The cycloalkyl group preferably has 3 to 20 carbon atoms, more preferably a cycloalkyl group having 3 to 10 carbon atoms, and most preferably a cycloalkyl group having 3 to 8 carbon atoms.

The aryl group referred to in the present invention means an aromatic monocyclic or multicyclic hydrocarbon ring system consisting solely of hydrogen and carbon, wherein the ring system may be partially or fully saturated. At least one hydrogen atom in the aryl group may be substituted with the same substituent as in the case of the alkyl group. The aryl group is an organic radical derived from an aromatic hydrocarbon by one hydrogen elimination and includes a single or fused ring system, suitably containing from 4 to 7, preferably 5 or 6, ring atoms in each ring, And a form in which a plurality of aryls are connected by a single bond. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 18 carbon atoms.

The hydroxyalkyl group referred to in the present invention means an OH-alkyl group in which a hydroxy group is bonded to the alkyl group defined above, and the hydroxyalkoxyalkyl group means hydroxyalkyl-O-alkyl in which the hydroxyalkyl group and the alkyl group are connected by oxygen do. The hydroxyalkyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and most preferably 1 to 6 carbon atoms. The hydroxyalkoxyalkyl group preferably has 2 to 40 carbon atoms, more preferably 2 to 20 carbon atoms, and most preferably 2 to 9 carbon atoms.

The arylalkyl group referred to in the present invention means that at least one hydrogen atom of the alkyl group is substituted with the aryl group. The arylalkyl group preferably has 7 to 40 carbon atoms, more preferably 7 to 28 carbon atoms, and most preferably 7 to 24 carbon atoms.

The oxime ester fluorene initiator represented by Formula 1 may be represented by the following Formula 4 when p is 0 and may be represented by Formula 5 when p is 1, We will explain in detail below.

Figure 112015017994965-pat00007

(In the formula 4,

R 11 to R 13 are each independently selected from the group consisting of hydrogen, halogen, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an arylalkyl group having 7 to 40 carbon atoms , A hydroxyalkyl group having 1 to 20 carbon atoms, a hydroxyalkoxyalkyl group having 2 to 40 carbon atoms, or a cycloalkyl group having 3 to 20 carbon atoms;

A represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an arylalkyl group having 7 to 40 carbon atoms, a hydroxyalkyl group having 1 to 20 carbon atoms, A hydroxyalkyl group, a hydroxyalkoxyalkyl group, a cycloalkyl group having 3 to 20 carbon atoms, an amino group, a nitro group, a cyano group or a hydroxy group)

Wherein R 11 to R 13 are particularly hydrogen, bromine, chlorine, iodine, methyl, ethyl, n - propyl group, i - propyl, n - butyl, i - butyl, t - butyl, n - pentyl , i - pentyl group, n - hexyl group, i - hexyl group, a phenyl group, a naphthyl group, a biphenyl group, a terphenyl group, an anthryl group, indenyl group, phenanthryl group, a methoxy group, an ethoxy group, n - propyl oxy group, i - propyl oxy group, n - butoxy group, i - butoxy, t - butoxy group, hydroxymethyl group, hydroxyethyl group, hydroxy-n - propyl group, hydroxy-n - butyl group, hydroxy-i - butyl, hydroxy-n - pentyl group, hydroxy-i - pentyl group, hydroxy-n - hexyl group, a hydroxy-i - hexyl group, a hydroxy-methoxy-methyl, hydroxy-methoxy-ethyl, hydroxy-methoxy-propyl group, hydroxy-methoxy A hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, A dodecoxyethoxyhexyl group;

A represents a hydrogen atom, a methyl group, an ethyl group, an n - propyl group, an i - propyl group, an n - butyl group, an i - butyl group, a t - butyl group, a phenyl group, a naphthyl group, a biphenyl group, A methoxy group, an ethoxy group, a propoxy group, a butoxy group, a hydroxymethyl group, a hydroxyethyl group, a hydroxypropyl group, a hydroxybutyl group, a hydroxymethoxymethyl group, a hydroxymethoxyethyl group, A nitro group, a cyano group, or a hydroxy group, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a propyl group, But is not limited thereto.

Preferably, R < 11 > is hydrogen or an n -butyl group; R 12 is a methyl group; R 13 is a methyl group, an n -butyl group or a phenyl group; A may be hydrogen or a nitro group.

Examples of the oxime ester fluorene-based initiator used in the present invention include, but are not limited to, the following compounds, and any of those known in the art may be used.

Figure 112015017994965-pat00008

Figure 112015017994965-pat00009

(In the above formula (5)

R 14 to R 23 are each independently selected from the group consisting of hydrogen, halogen, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an arylalkyl group having 7 to 40 carbon atoms , A hydroxyalkyl group having 1 to 20 carbon atoms, a hydroxyalkoxyalkyl group having 2 to 40 carbon atoms, or a cycloalkyl group having 3 to 20 carbon atoms)

Wherein R 14 to R 23 are particularly hydrogen, bromine, chlorine, iodine, methyl group, ethyl group, n- propyl group, i - propyl, n - butyl, i - butyl, t - butyl, n - pentyl , i - pentyl group, n - hexyl group, i - hexyl group, a phenyl group, a naphthyl group, a biphenyl group, a terphenyl group, an anthryl group, indenyl group, phenanthryl group, a methoxy group, an ethoxy group, n - propyl oxy group, i - propyl oxy group, n - butoxy group, i - butoxy, t - butoxy group, hydroxymethyl group, hydroxyethyl group, hydroxy-n - propyl group, hydroxy-n - butyl group, hydroxy-i - butyl, hydroxy-n - pentyl group, hydroxy-i - pentyl group, hydroxy-n - hexyl group, a hydroxy-i - hexyl group, a hydroxy-methoxy-methyl, hydroxy-methoxy-ethyl, hydroxy-methoxy-propyl group, hydroxy-methoxy A hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, a hydroxypropyl group, The hydroxy may be a methoxy hexyl group.

Preferably, R 14 is hydrogen, a methyl group, an ethyl group, a propyl group, or a butyl group; R 15 is a methyl group, an ethyl group, or a propyl group; R 16 is a methyl group, an ethyl group, a propyl group, or a butyl group; R 17 to R 23 may be hydrogen.

Examples of the oxime ester fluorene-based initiator used in the present invention include, but are not limited to, the following compounds, and any of those known in the art may be used.

Figure 112015017994965-pat00010

The content of the photopolymerization initiator is not particularly limited, but may be in the range of 0.1 to 10% by weight, preferably 0.5 to 5% by weight, based on 100% by weight of the black photosensitive resin composition. If the content is less than the above range, the sensitivity may be lowered and the pattern may fall off during the developing process. On the contrary, if the content exceeds the above range, the physical properties of the coating film Can be lowered.

Further, other photopolymerization initiators than those described above may be further used within the scope of not impairing the effects of the present invention. The photopolymerization initiator that can be further used includes, for example, at least one compound selected from the group consisting of an acetophenone compound, a benzophenone compound, a triazine compound, a nonimidazole compound, and a thioxanone compound .

The acetophenone-based compounds include, for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethylketal, 2- (4-methylthioxy) phenyl] -2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2- 2-methyl-1- [4- (1-methylvinyl) phenyl] propane-1-one, 1-one and 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butan-1-one.

The benzophenone compound may be, for example, benzophenone, methyl 0-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'- methyldiphenylsulfide, 3,3 ', 4,4'-tetra tert-butylperoxycarbonyl) benzophenone and 2,4,6-trimethylbenzophenone.

Examples of the triazine-based compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4- (Trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (trichloromethyl) Bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) -Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan- Azine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine and 2,4- Methyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine.

Examples of the non-imidazole compound include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'- Dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) Bis (2,6-dichlorophenyl) -4, 5,5'-tetra (trialkoxyphenyl) bimidazole, 2,2- , 4 ', 5,5'-tetraphenyl-1,2'-biimidazole and imidazole compounds wherein the phenyl group at the 4,4', 5,5 'position is substituted by a carboalkoxy group . Among the imidazole compounds, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3- 4,4 ', 5,5'-tetraphenylbiimidazole and 2,2-bis (2,6-dichlorophenyl) -4,4', 5,5'-tetraphenyl- Dissol is preferably used.

The thioxanthone compound may be, for example, 2-isopropylthioxanecone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone and 1-chloro-4- .

The photopolymerization initiator may further include a photopolymerization initiator to improve the sensitivity of the black photosensitive resin composition of the present invention. Since the black photosensitive resin composition according to the present invention contains a photopolymerization initiation auxiliary agent, the sensitivity can be further improved and the productivity can be increased.

As the photopolymerization initiation auxiliary, for example, at least one compound selected from the group consisting of an amine compound, a carboxylic acid compound and an organic sulfur compound having a thiol group can be preferably used.

The amine compounds include, for example, aliphatic amine compounds such as triethanolamine, methyldiethanolamine and triisopropanolamine; 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N, N-dimethylparatoluidine, 4,4- Aromatic amine compounds such as bis (dimethylamino) benzophenone (commonly known as Michler's ketone) and 4,4'-bis (diethylamino) benzophenone, and aromatic amine compounds are used as the amine compounds .

The carboxylic acid compound is, for example, selected from the group consisting of phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, , And aromatic heteroacetic acids such as dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine and naphthoxyacetic acid.

The organic sulfur compounds having thiol groups include, for example, 2-mercaptobenzothiazole, 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyloxyethyl ) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -thione, trimethylolpropane tris (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate), and the like can be used. .

Such a photopolymerization initiator is preferably used in an amount of usually not more than 10 mol, preferably 0.01 to 5 mol, per 1 mol of the photopolymerization initiator. When the photopolymerization initiator is used within the above range, the polymerization efficiency can be increased and the productivity improvement effect can be expected.

The black photosensitive resin composition according to the present invention together with the above-mentioned cationic binder resin and oxime ester fluorene-based initiator includes a photopolymerizable compound.

The photopolymerizable compound according to the present invention may be a monofunctional monomer, a bifunctional monomer or a polyfunctional monomer as a component for enhancing the strength of a pattern, and preferably a monomer having two or more functions is preferably used.

The type of the monofunctional monomer is not particularly limited, and examples thereof include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate N-vinylpyrrolidone, and the like.

The type of the bifunctional monomer is not particularly limited and examples thereof include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) Glycol di (meth) acrylate, bis (acryloyloxyethyl) ether of bisphenol A, and 3-methylpentanediol di (meth) acrylate.

The type of the polyfunctional monomer is not particularly limited and includes, for example, trimethylolpropane tri (meth) acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, propoxylated trimethylolpropane tri Acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, ethoxylated dipentaerythritol hexa (Meth) acrylate, propoxylated dipentaerythritol hexa (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and the like.

The content of the photopolymerizable compound is not particularly limited, but may be 1 to 20% by weight, preferably 1 to 10% by weight, based on 100% by weight of the black photosensitive resin composition. If the content is less than the above range, the photosensitivity may be lowered. On the other hand, if the content exceeds the above range, the adhesive property of the photosensitive resin layer is excessively excessive, and the strength of the film is insufficient.

Examples of the black pigment include carbon black, organic black pigment, titanium black, and a pigment mixed with red, blue, and green.

More specifically, the black pigment may be prepared by mixing a carbon black and two or more colored pigments to prepare a milled colored dispersion. Examples of usable carbon black include CHBK-17 from Mikuni Color; HS, SISO 3HHAF-HS, Sisato NH, Sisato 3M, Sisso 300HAF-LS, Sisso 116HMMAF-HS, Sisato 116MAF, Sisito FMFEF- HS, Cysto SOFEF, Cysto VGPF, Cysto SVHSRF-HS, and Cysto SSRF; Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, OIL7B, OIL9B, OIL11B, OIL30B, and OIL31B; PRINTEX-55, PRINTEX-55, PRINTEX-45, PRINTEX-35, PRINTEX-55, PRINTEX-85, PRINTEX-75, PRINTEX- SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101; PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A; SPECIAL BLACK-550; RAVEN-1080 ULTRA, RAVEN-1060ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, 420, RAVEN-410, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN- RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, and RAVEN-1170.

Examples of color pigments usable in combination with the carbon black include carmine 6B (CI12490), phthalocyanine green (CI 74260), phthalocyanine blue (CI 74160), Mitsubishi carbon black MA100, perylene black (BASF K0084. K0086) , Linol Yellow (CI 21090), Linol Yellow GRO (CI 21090), Benzidine Yellow 4T-564D, Mitsubishi Carbon Black MA-40, Victoria Pure Blue (CI42595) PIGMENT RED97, 122, 149, 168, 177, 180, 192, 215, C.I. PIGMENT GREEN 7, 36, C.I. PIGMENT 15: 1, 15: 4, 15: 6, 22, 60, 64, C.I. PIGMENT 83, 139 C.I. PIGMENT VIOLET 23, etc. In addition, white pigments, fluorescent pigments, etc. may be used.

The carbon black is not particularly limited as long as it is a light-shielding pigment, and known carbon black can be used. Specific examples of the carbon black that is the black pigment include channel black, furnace black, thermal black, lamp black, and the like.

The carbon black, which is the black pigment, may be a resin-coated carbon black. Since the carbon black coated with the resin has a lower conductivity than that of the carbon black not coated with the resin, excellent electrical insulation can be imparted to the black matrix or black column spacer when the spacer is formed.

The black pigment may be used as a pigment dispersion in which the particle size of the black pigment is uniformly dispersed. Examples of a method for uniformly dispersing the particle diameter of the pigment include a method of dispersing the pigment by adding the pigment dispersant and the like, and a pigment dispersion in which the pigment is uniformly dispersed in the solution can be obtained by the above method.

Specific examples of the pigment dispersant include a cationic surfactant, an anionic surfactant, a nonionic surfactant, a positive surfactant, a polyester surfactant, and a polyamine surfactant. These surfactants may be used singly or in combination of two or more.

It is also preferable to include an acrylate-based dispersant (hereinafter referred to as an acrylate-based dispersant) containing butyl methacrylate (BMA) or N, N-dimethylaminoethyl methacrylate (DMAEMA). Examples of commercially available acrylate dispersants include DISPER BYK-2000, DISPER BYK-2001, DISPER BYK-2070 and DISPER BYK-2150. The acrylate dispersants may be used alone or in combination of two or more. .

As the pigment dispersant, other resin type pigment dispersants other than the acrylic dispersant may be used. The other resin type pigment dispersing agent may be a known resin type pigment dispersing agent, especially a polycarboxylic acid ester such as polyurethane, polyacrylate, unsaturated polyamide, polycarboxylic acid, polycarboxylic acid (partial) Amine salts of polycarboxylic acids, alkylamine salts of polycarboxylic acids, polysiloxanes, long chain polyaminoamide phosphate salts, esters of hydroxyl group-containing polycarboxylic acids and their modified products, or free ) Oil-based dispersants such as amides formed by reaction of a polyester having a carboxyl group with poly (lower alkyleneimine) or salts thereof; Soluble resin or water-soluble polymer compound such as (meth) acrylic acid-styrene copolymer, (meth) acrylic acid- (meth) acrylate ester copolymer, styrene-maleic acid copolymer, polyvinyl alcohol or polyvinylpyrrolidone; Polyester; Modified polyacrylates; Adducts of ethylene oxide / propylene oxide, and phosphate esters. DISPER BYK-161, DISPER BYK-162, DISPER BYK-163, DISPER BYK-160, BYK (trade name) 164, DISPER BYK-166, DISPER BYK-171, DISPER BYK-182, DISPER BYK-184; EFKA-4060, EFKA-4060, EFKA-4055, EFKA-4055, EFKA-4055, EFKA-4020, EFKA-4015, EFKA-4060, EFKA- 4330, EFKA-4400, EFKA-4406, EFKA-4510, EFKA-4800; SOLSPERS-24000, SOLSPERS-32550, NBZ-4204/10 from Lubirzol; Hinoact T-6000, Hinoact T-7000, Hinoact T-8000; available from Kawaken Fine Chemicals; AJISPUR PB-821, Ajisper PB-822, Ajisper PB-823 manufactured by Ajinomoto; FLORENE DOPA-17HF, fluorene DOPA-15BHF, fluorene DOPA-33, and fluorene DOPA-44 are trade names of Kyoeisha Chemical Co., In addition to the acrylic dispersant, other resin type pigment dispersants may be used alone or in combination of two or more, and may be used in combination with an acrylic dispersant.

The black pigment of the present invention may be contained in an amount of 5 to 20% by weight, preferably 5 to 10% by weight, based on 100% by weight of the black photosensitive resin composition. If the content is less than the above range, it is difficult to use it as a black matrix. On the other hand, if the content is in excess of the above range, the dispersion stability of the composition may be lowered or the use of relatively different composition may be decreased to lower the physical properties of the finally obtained black matrix .

The solvent used for dissolving other components of the black photosensitive resin composition of the present invention is not particularly limited as long as it is a solvent used in a commonly used black photosensitive resin composition and may be selected from ethers, Alcohols, esters, amides and the like are preferable.

Specific examples of the solvent include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; Propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether and propylene glycol monobutyl ether; Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxypentyl acetate; Aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene; Ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone; Alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol and glycerin; Esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate, and cyclic esters such as ? -Butyrolactone.

The solvent is preferably an organic solvent having a boiling point of 100 to 200 DEG C in terms of coating property and dryness, and examples thereof include propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl lactate, Ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, and the like. The solvents exemplified above may be used alone or in admixture of two or more.

The content of the solvent is not particularly limited, but may be a remainder that satisfies 100% by weight of the black photosensitive resin composition. For example, the content may be 20 to 85% by weight. When the content is within the above range, .

In addition, the black photosensitive resin composition of the present invention may further comprise at least one additive selected from an adhesion promoter, a surfactant, a dispersant, an antioxidant, an ultraviolet absorber, a thermal polymerization inhibitor, and a leveling agent.

Examples of the adhesion promoter include methacrylate such as methacryloyloxypropyltrimethoxysilane, methacryloyloxypropyldimethoxysilane, methacryloyloxypropyltriethoxysilane, and methacryloyloxypropyldimethoxysilane. At least one member selected from the group consisting of octyltrimethoxysilane, dodecyltrimethoxysilane, and octadecyltrimethoxysilane may be used as the alkyltrimethoxysilane. Species can be used.

Examples of the surfactant include MCF 350SF, F-475, F-488 and F-552 (hereinafter referred to as DIC), but the present invention is not limited thereto.

As the dispersant and leveling agent, any of those commonly used in the art can be used.

As the antioxidant, 2,2-thiobis (4-methyl-6- t -butylphenol), 2,6 g, t -butylphenol and the like can be used. t -butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole, alkoxybenzophenone and the like. Examples of the thermal polymerization inhibitor include hydroquinone, p -methoxyphenol, di- t -butyl- p -cresol, pyrogallol, t- butyl catechol, benzoquinone, 4,4- t-butylphenol), 2,2-methylenebis (4-methyl-6- t -butylphenol), 2-mercaptoimidazole and the like.

The photosensitive resin composition of the present invention may further comprise at least one secondary additive selected from a carbon black dispersion, a functional resin binder, a monomer, a radiation-sensitive compound, and other additives.

The present invention also provides a black mattress made of the black photosensitive resin composition and an image display device having the black mattress.

The production of the black photosensitive composition is not particularly limited in the present invention, and follows the known production method of the photosensitive composition.

The introduction of the black matrix can be patterned by a photolithography method after coating to form a pattern. The photolithography method is not particularly limited in the present invention, and any known method using a photosensitive resin composition can be applied.

For example, a patterned black matrix

a) applying a black photosensitive composition to a substrate surface;

b) drying the solvent by pre-cure (prebaking);

c) applying a photomask onto the obtained film to irradiate an actinic ray to cure the exposed portion;

d) performing a developing step of dissolving the unexposed portion using an aqueous alkali solution; And

e) drying and post-baking.

A glass substrate or a polymer plate is used as the substrate. As the glass substrate, in particular, soda lime glass, barium-strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass or quartz can be preferably used. Examples of the polymer plate include polycarbonate, acrylic, polyethylene terephthalate, polyether sulfide, and polysulfone.

At this time, a wet coating method using a coating apparatus such as a roll coater, a spin coater, a slit and spin coater, a slit coater (which may be referred to as a die coater), an ink jet or the like is possible so as to obtain a desired thickness.

Prebaking is performed by heating with an oven, a hot plate or the like. The heating temperature and the heating time in the prebaking are appropriately selected depending on the solvent to be used and are, for example, from 80 to 150 DEG C for 1 to 30 minutes.

The exposure performed after the pre-baking is performed by an exposure machine, and exposed through a photomask to expose only the portion corresponding to the pattern. The light to be irradiated may be, for example, visible light, ultraviolet light, X-ray, electron beam, or the like.

The alkali development after the exposure is performed for the purpose of removing the resist of the unexposed portion of the unexposed portion, and a desired pattern is formed by this development. As a developer suitable for the alkali development, for example, a carbonate of an alkali metal or an alkaline earth metal Aqueous solution or the like can be used. Particularly, a weakly alkaline aqueous solution containing 1 to 3% by weight of a carbonate such as sodium carbonate, potassium carbonate or lithium carbonate is used at a temperature of 10 to 50 캜, preferably 20 to 40 캜, using a developing machine or an ultrasonic cleaner .

The post-baking is performed in order to improve the adhesion between the patterned color conversion layer and the substrate, and is performed by heat treatment at 80 to 220 ° C for 10 to 120 minutes. Post-baking Pre-baking is carried out using an oven, hot plate or the like.

The black matrix obtained by this method is formed to a thickness of sufficient size, from several to several thousand micrometers, preferably from 0.1 to 100 μm, more preferably from 1 to 50 μm, so as to maintain a high photosensitivity and enable formation of fine patterns. do.

Further, the image display apparatus of the present invention is provided with the above-described black matrix, and specific examples thereof include a liquid crystal display, an OLED, and a flexible display, but are not limited thereto.

Hereinafter, the present invention will be described in more detail with reference to Examples, Comparative Examples and Experimental Examples. However, the following examples, comparative examples and experimental examples are for illustrating the present invention, and the present invention is not limited by the following examples, comparative examples and experimental examples, and can be variously modified and changed.

SYNTHESIS EXAMPLE 1 Synthesis of Cathode Binder Resin (A-1)

231 g of bisphenol fluorene type epoxy resin (epoxy equivalent 231), 450 mg of triethylbenzylammonium chloride, 100 mg of 2,6-diisobutylphenol and 72.0 g of acrylic acid were added to a 500-mL four-necked flask and mixed , And the mixture was dissolved by heating at 90 to 100 ° C while blowing air at a rate of 25 ml per minute. The solution gradually became cloudy white as it was heated, but it was slowly heated up to 120 ° C to completely dissolve it. At this time, the solution gradually became clear and sticky, and was stirred continuously. The acid value was measured at intervals and stirring was continued until the acid value became less than 2.0 mg KOH / g. It took 8 hours for the acid price to reach the target (acid value 0.8). Thereafter, the mixture was cooled to room temperature to obtain a colorless transparent solid bisphenol fluorene epoxyacrylate. 303 g of bisphenol fluorene type epoxy acrylate thus obtained was dissolved in 2 kg of cellosolve acetate to prepare a solution. To this solution, 38 g of 1,2,3,6-tetrahydrophthalic anhydride and 15 g of biphenyl tetracarboxylic acid 73.5 g of acid dianhydride 1 g of tetraethylammonium bromide was added and the mixture was gradually heated and reacted at 110 to 115 캜 for 2 hours to obtain Resin A-1 (m / n = 5/5). The reaction of the acid anhydride was confirmed by IR spectrum. The intrinsic viscosity of the obtained compound resin A-1 was 0.2 dl / g (? Nh = 0.2).

Synthesis Example 2: Synthesis of carcass binder resin (A-2)

2 kg of cellosolve acetate was added to 303 g of the bisphenol fluorene epoxy acrylate obtained in Synthesis Example 1 and dissolved, and then 38 g of 1,2,3,6-tetrahydrophthalic anhydride, 80.5 g of a carboxylic acid dianhydride and 1 g of tetraethylammonium bromide were mixed and reacted slowly at 110 to 115 ° C for 2 hours to obtain Resin A-2 (m / n = 5/5). The reaction of the acid anhydride was confirmed by IR spectrum. The intrinsic viscosity of the obtained compound resin A-2 was 0.3 dl / g (? Nh = 0.3).

Synthesis Example 3: Synthesis of acrylic binder resin (A-3)

After adding 200 ml of propylene glycol monomethyl ether acetate and 1.5 g of azobisisobutyronitrile to a 500 ml polymerization vessel, 20 g of methacrylic acid, glycidyl methacrylate, methyl methacrylate, and dicyclopentanyl acrylate were added to 20 : 20: 40: 20, and then the mixture was stirred at 70 DEG C for 5 hours under nitrogen atmosphere to prepare Resin A-3 as an acrylic polymer. The copolymer thus prepared had a weight average molecular weight of 25,000 and a dispersion degree of 2.0.

Synthesis Example 4: Synthesis of photopolymerization initiator (C-1)

Reaction 1.

After dissolving 5.0 g of 2-nitroprorene in 100 ml of anhydrous nitrobenzene, 6.31 g of anhydrous aluminum chloride was added, and the reaction was warmed to 45 ° C. A solution of 2.79 g of acetyl chloride in 30 ml of anhydrous nitrobenzene was added for 30 minutes , And the reaction was heated to 65 DEG C and stirred for 1 hour. Then, the reaction mixture was cooled to room temperature, and 70 ml of distilled water was added thereto. The mixture was stirred for about 30 minutes, and the product was filtered. The obtained solid product was dispersed in 50 ml of ether and stirred at room temperature for 30 minutes, followed by filtration and drying to obtain pale yellow reactant 1 (1- (9,9-H-7-nitroprrolen- 5.08 g was obtained.

Reaction 2.

1.5 g of the reaction product 1 was dispersed in 30 ml of ethanol, 0.49 g of hydroxylamine hydrochloride and 0.58 g of sodium acetate were added, and then the reaction solution was gradually heated and refluxed for 2 hours. The reaction product was cooled to room temperature and 20 ml of distilled water was added thereto. The mixture was stirred for about 30 minutes, and the resulting solid product was filtered, washed several times with distilled water and then dried to obtain reaction product 2 (1- (9,9- -Nitroprrolen-2-yl) -ethanone oxime) was obtained.

Reaction 3.

1.20 g of Reaction Product 2 was dispersed in 50 ml of ethyl acetate, and 0.69 g of acetic anhydride was added. Then, the reaction solution was gradually heated and refluxed for 3 hours. The reaction mixture was cooled to room temperature, washed with 20 ml of a saturated aqueous solution of sodium hydrogencarbonate and 20 ml of distilled water. The recovered organic layer was dried over anhydrous magnesium sulfate, and the solvent was distilled off under reduced pressure. The product was recrystallized from methanol Of 1.22 g of initiator C-1 (1- (9, 9-H-7-nitrofluoren-2-yl) -ethanone oxime-O-acetate).

Synthesis Example 5: Synthesis of photopolymerization initiator (C-2)

Reaction 1.

200.0 g of fluorene, 268.8 g of potassium hydroxide and 19.9 g of potassium iodide were dissolved in 1 L of anhydrous dimethyl sulfoxide and the reaction was maintained at 15 DEG C. Then, 283.3 g of bromoethane was slowly added over 2 hours, Was stirred at 15 < 0 > C for 1 hour. Then, 2 L of distilled water was added to the reaction mixture, stirred for 30 minutes, and the product was extracted with 2 L of dichloromethane. The extracted organic layer was washed twice with 2 L of distilled water, and the recovered organic layer was dried over anhydrous magnesium sulfate, Was subjected to fractional distillation under reduced pressure to obtain 248.6 g of reaction product 1 (9,9-diethyl-9H-fluorene) as a pale yellow liquid having a high viscosity.

Reaction 2.

100.5 g of the reactant 1 was dissolved in 1 L of dichloromethane and the reaction was cooled to -5 ° C. Then, 72.3 g of aluminum chloride was slowly added thereto. While taking care not to raise the temperature of the reaction product, the reaction mixture was diluted with 50 ml of dichloromethane 50.1 g was slowly added over 2 hours and the reaction was stirred at -5 [deg.] C for 1 hour. Then, the reaction mixture was slowly poured into 1 L of ice water and stirred for 30 minutes. The organic layer was separated, washed with 500 ml of distilled water, and the recovered organic layer was distilled under reduced pressure. The resulting product was purified by silica gel column chromatography (eluent: ethyl acetate: n- Hexane = 1: 4) to obtain 75.8 g of reactant 2 (1- (9,9-diethyl-9H-fluoren-2-yl) -1-propanone) as a pale yellow solid.

Reaction 3.

44.5 g of Reaction Product 2 was dissolved in 900 ml of tetrahydrofuran (THF), 150 ml of 4N HCl dissolved in 1,4-dioxane and 24.7 g of isobutyl nitrite were added in this order, and the reaction was stirred at 25 ° C for 6 hours. Then, 500 ml of ethyl acetate was added to the reaction solution, and the mixture was stirred for 30 minutes. The organic layer was separated and washed with 600 ml of distilled water. The recovered organic layer was dried over anhydrous magnesium sulfate and the solvent was distilled off under reduced pressure. Recrystallization was performed using 300 ml of a mixed solvent of acetate and hexane (1: 6), followed by drying to obtain a reaction product 3 (1- (9,9-diethyl-9H- fluoren- 2-propanedione-2-oxime).

Reaction 4.

Reaction product 3 was dissolved in 1 L of N-methyl-2-pyrrolidinone (NMP) under a nitrogen atmosphere, and the reaction was maintained at -5 ° C. Then, 35.4 g of triethylamine was added and the reaction solution was stirred for 30 minutes A solution prepared by dissolving 27.5 g of acetyl chloride in 75 ml of N-methyl-2-pyrrolidinone was slowly added over 30 minutes and stirred for 30 minutes while careful not to raise the temperature of the reaction product. Then, 1 L of distilled water was slowly added to the reaction mixture and stirred for 30 minutes to separate the organic layer. The recovered organic layer was dried over anhydrous magnesium sulfate, and the solvent was distilled off under reduced pressure. The resulting solid product was recrystallized using 1 L of ethanol and then dried to give an initiator C-2 (1- (9,9-diethyl-9H-fluoren-2-yl) Dione-2-oxime-O-acetate).

Examples 1 to 12 and Comparative Examples 1 to 5: Preparation of black photosensitive resin composition

A black photosensitive resin composition was prepared using the components and the content (unit: wt%) of Table 1 below.

Furtherance
(weight%)
Alkali soluble binder resin Photopolymerizable compound 4) Photopolymerization initiator Black pigment 9) Solvent 10) stick
Promoter 11)
A-1 1) A-2 2) A-3 3) C-1 5) C-2 6) C-3 7) C-4 8) Example 1 15 - - 10 - 0.3 0.3 - 8 Remainder 0.1 Example 2 15 - - 10 - 0.5 - - 8 Remainder 0.1 Example 3 7 - - 5 - 0.3 0.3 - 8 Remainder 0.1 Example 4 25 - - 10 - 0.3 0.3 - 8 Remainder 0.1 Example 5 7 - - 5 - 6.0 6.0 - 8 Remainder 0.1 Example 6 - 15 - 10 - 0.3 0.3 - 8 Remainder 0.1 Example 7 - 15 - 10 - 0.5 - - 8 Remainder 0.1 Example 8 - 7 - 5 - 0.3 0.3 - 8 Remainder 0.1 Example 9 - 25 - 10 - 0.3 0.3 - 8 Remainder 0.1 Example 10 - 7 - 5 - 6.0 6.0 - 8 Remainder 0.1 Example 11 15 - - 10 0.5 - - - 8 Remainder 0.1 Example 12 15 - - 10 0.3 - 0.3 - 8 Remainder 0.1 Comparative Example 1 - - 15 10 - 0.3 0.3 - 8 Remainder 0.1 Comparative Example 2 15 - - 10 - - - 0.5 8 Remainder 0.1 Comparative Example 3 - 15 - 10 - - - 0.5 8 Remainder 0.1 Comparative Example 4 - 15 - 10 - - 0.5 - 8 Remainder 0.1 Comparative Example 5 - 15 - 10 - - 0.3 0.3 8 Remainder 0.1 1) Cathode binder resin of Synthesis Example 1
2) Cathode binder resin of Synthesis Example 2
3) The acrylic binder resin of Synthesis Example 3
4) Dipentaerythritol triacrylate (manufactured by Nippon Kayaku Co., Ltd.)
5) The photopolymerization initiator of Synthesis Example 4
6) The photopolymerization initiator of Synthesis Example 5
7) N-1919 (Adeka)
8) Triazine-EB (Tronly)
9) CHBK-17 (Mikuni Color Company)
10) Propylene glycol monomethyl ether acetate
11) 3-methacryloyloxypropyltrimethoxysilane (Shin-Etsu)

Experimental Example 1: Evaluation

(1) adhesion of substrate

The photosensitive resin compositions of Examples and Comparative Examples were applied and dried on a hot plate at 100 占 폚 for 1 minute to obtain a coated film. Thereafter, the exposure process was carried out using a high-pressure mercury lamp having a wavelength of 365 nm using a mask having a pattern thickness of 1 to 20 mu m and engraved on a 1 mu m unit. After performing the post-bake for 100 minutes in a convection oven at 230 ° C without performing development for the exposure process, PCT (Pressure-cookertest) was performed, and then the glass and coating pieces were peeled off by a cross- (PCT process condition: 2 atm, humidity 120% 4hr / 1 cycle).

(2) Developing adhesion

The photosensitive resin compositions of Examples and Comparative Examples were applied to a glass substrate having a thickness of 1 mm at a thickness of 1 占 퐉 and dried on a hot plate at 100 占 폚 for 1 minute to obtain a coated film. Thereafter, the resist film was exposed to light using a high-pressure mercury lamp having a wavelength of 365 nm using a mask having a pattern width of 1 to 20 mu m on a coating film in a unit of 1 mu m, The development was carried out for a certain period of time. The minimum pattern was measured based on the mask size where the pattern remained.

Substrate adhesion Minimal pattern
(탆)
1 cycle 2cycle 3cycle Example 1 Peeling off Peeling off Peeling off 4 Example 2 Peeling off Peeling off Peeling off 4 Example 3 Peeling off Peeling off Peeling off 3 Example 4 Peeling off Peeling off Peeling off 5 Example 5 Peeling off Peeling off Peeling off 6 Example 6 Peeling off Peeling off Peeling off 4 Example 7 Peeling off Peeling off Peeling off 4 Example 8 Peeling off Peeling off Peeling off 3 Example 9 Peeling off Peeling off Peeling off 5 Example 10 Peeling off Peeling off Peeling off 6 Example 11 Peeling off Peeling off Peeling off 4 Example 12 Peeling off Peeling off Peeling off 4 Comparative Example 1 Peeling off Exfoliation Exfoliation 6 Comparative Example 2 Peeling off Exfoliation Exfoliation 8 Comparative Example 3 Peeling off Exfoliation Exfoliation 8 Comparative Example 4 Peeling off Exfoliation Exfoliation 8 Comparative Example 5 Peeling off Peeling off Exfoliation 8

As shown in Table 2, in the case of Examples 1 to 12 using the black photosensitive resin composition according to the present invention, a color filter having a high resolution was realized because the developing adhesion was excellent and the minimum pattern size that can be formed without pattern loss was remarkably small. And it was also confirmed that the durability was also excellent because the adhesive strength to the substrate was excellent.

On the other hand, in Examples 4 and 5 and Examples 9 and 10 in which the alkali-soluble binder resin and the photopolymerization initiator were contained in a slight excess, the minimum pattern size was small and the substrate adhesion was superior to the comparative example, It can be confirmed that the minimum pattern size is large.

In the case of Comparative Example 1 using the acrylic binder resin, it was confirmed that the adhesion to the substrate was excellent, but the developing adhesion was decreased.

In addition, in the case of Comparative Examples 2 and 3 using the existing triazine initiator instead of the oxime ester fluorene initiator of the present invention, it was confirmed that both the developing adhesion and the adhesion to the substrate were reduced.

The black photosensitive resin composition according to the present invention is introduced into a black matrix of an image display device, and maintains excellent adhesion properties and high resolution, thereby realizing high-quality and vivid image quality.

Claims (5)

An alkali-soluble binder resin, a photopolymerizable compound, a photopolymerization initiator, a black pigment and a solvent,
The alkali-soluble binder resin includes a cationic binder resin having repeating units represented by the following general formulas (2) and (3)
Wherein the photopolymerization initiator comprises at least one compound represented by the following general formula (1): < EMI ID =
[Chemical Formula 1]
Figure 112018109006010-pat00011

(In the formula 1,
R 1 to R 3 are each independently selected from the group consisting of hydrogen, halogen, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an arylalkyl group having 7 to 40 carbon atoms , A hydroxyalkyl group having 1 to 20 carbon atoms, a hydroxyalkoxyalkyl group having 2 to 40 carbon atoms, or a cycloalkyl group having 3 to 20 carbon atoms;
R 4 to R 10 each represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an arylalkyl group having 7 to 40 carbon atoms, a hydroxyalkyl group having 1 to 20 carbon atoms, A hydroxyalkoxyalkyl group having 2 to 40 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms, an amino group, a nitro group, a cyano group or a hydroxy group;
p is 0 or 1)
(2)
Figure 112018109006010-pat00016

(3)
Figure 112018109006010-pat00017

(In the above formulas 2 and 3,
R 24 and R 25 represent hydrogen, halogen or an alkyl group having 1 to 5 carbon atoms;
R 26 represents a hydrogen atom or a methyl group;
X is -CO-, -SO 2 -, -C (CF 3 ) 2 -, -Si (CH 3 ) 2 -, -CH 2 -, -C (CH 3 ) 2 -, -O-, - a fluorenyl group or a direct bond;
Y represents the residue of an acid anhydride;
Z represents a residue of an acid dianhydride;
The molar ratio (m / n) of the structural units is a ratio of 1/99 to 90/10)
delete The black photosensitive resin composition according to claim 1, wherein the black photosensitive resin composition contains, within 100% by weight of the total composition,
1 to 40% by weight of an alkali soluble binder resin,
1 to 20% by weight of photopolymerizable compound,
0.1 to 10% by weight of a photopolymerization initiator,
5 to 20% by weight of a black pigment, and
And the remaining part contains a solvent.
A black matrix produced by the black photosensitive resin composition according to any one of claims 1 and 3. The image display apparatus according to claim 4, comprising a black matrix.
KR1020150025552A 2014-12-02 2015-02-24 Black photosensitive resin composition, black matrix and image display device comprising thereof KR101963931B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW104139414A TWI654487B (en) 2014-12-02 2015-11-26 Black photosensitive resin composition, black matrix using same, and image display device comprising the black matrix
CN201510863908.XA CN105652595A (en) 2014-12-02 2015-12-01 Black photosensitive resin composition, black matrix and image display device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140170283 2014-12-02
KR20140170283 2014-12-02

Publications (2)

Publication Number Publication Date
KR20160066482A KR20160066482A (en) 2016-06-10
KR101963931B1 true KR101963931B1 (en) 2019-04-01

Family

ID=56190786

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150025552A KR101963931B1 (en) 2014-12-02 2015-02-24 Black photosensitive resin composition, black matrix and image display device comprising thereof

Country Status (3)

Country Link
KR (1) KR101963931B1 (en)
CN (1) CN105652595A (en)
TW (1) TWI654487B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101788399B1 (en) * 2015-09-23 2017-10-19 (주)경인양행 Oxime ester compound having improved heat stability, photopolymerization initiator and photoresist composition comprising the same
JP6533556B2 (en) * 2016-05-24 2019-06-19 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. Photosensitive resin composition and photocurable pattern produced therefrom
KR102493611B1 (en) * 2016-06-14 2023-01-31 동우 화인켐 주식회사 Red colored photosensitive resin composition, color filter and display device having the same
KR102011090B1 (en) * 2016-09-19 2019-08-14 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and image display device produced using the same
US11820932B2 (en) 2016-09-28 2023-11-21 Merck Patent Gmbh Polymerisable liquid crystal material and polymerised liquid crystal film
KR101840347B1 (en) * 2016-10-26 2018-03-20 동우 화인켐 주식회사 Self emission type photosensitive resin composition, color filter and image display device produced using the same
KR101986408B1 (en) * 2016-11-08 2019-06-05 동우 화인켐 주식회사 Colored Photosensitive Resin Composition, Color Filter and Display Device
KR102510668B1 (en) * 2017-02-01 2023-03-16 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and image display device produced using the same
KR102033415B1 (en) * 2017-03-17 2019-10-17 동우 화인켐 주식회사 Colored Photosensitive Resin Composition for Red Pixel, Color Filter and Display Device
KR102335614B1 (en) * 2018-03-21 2021-12-03 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and image display device using the same
CN112341359B (en) * 2019-08-07 2022-05-06 常州强力电子新材料股份有限公司 Fluorenoxime ester compound, preparation method and application thereof
CN115611782A (en) * 2022-10-15 2023-01-17 瑞红(苏州)电子化学品股份有限公司 High-acid-production oxime sulfonate photoacid generator and application of resist composition thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014137466A (en) * 2013-01-16 2014-07-28 Jsr Corp Radiation-sensitive coloring composition, colored cured film and display element
KR101435652B1 (en) 2014-01-17 2014-08-28 주식회사 삼양사 NOVEL FLUORENYL β-OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100671106B1 (en) 2004-12-29 2007-01-17 제일모직주식회사 High photosensitive resin composition and black matrix thereof
JP2010015025A (en) * 2008-07-04 2010-01-21 Adeka Corp Photosensitive composition containing specific photopolymerization initiator
KR101338676B1 (en) * 2008-11-05 2013-12-06 도오꾜오까고오교 가부시끼가이샤 Photosensitive resin composition and base
KR101068622B1 (en) 2009-12-22 2011-09-28 주식회사 엘지화학 The high lightshielding blackmatrix composition having improved adhesion properties
KR101453769B1 (en) * 2010-12-24 2014-10-22 제일모직 주식회사 Photosensitive resin composition and color filter using the same
KR101469519B1 (en) * 2011-10-07 2014-12-08 (주)경인양행 Oxim ester Compound, and Photopolymerization initiator Comprising the Same
JP5682094B2 (en) 2012-09-28 2015-03-11 ダイトーケミックス株式会社 Fluorene compound, photopolymerization initiator containing the fluorene compound, and photosensitive composition containing the photopolymerization initiator
KR20140076320A (en) 2012-12-12 2014-06-20 제일모직주식회사 Photosensitive resin composition and black spacer using the same
KR20140100261A (en) * 2013-02-06 2014-08-14 동우 화인켐 주식회사 Colored photosensitive resin composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014137466A (en) * 2013-01-16 2014-07-28 Jsr Corp Radiation-sensitive coloring composition, colored cured film and display element
KR101435652B1 (en) 2014-01-17 2014-08-28 주식회사 삼양사 NOVEL FLUORENYL β-OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME

Also Published As

Publication number Publication date
CN105652595A (en) 2016-06-08
TW201627762A (en) 2016-08-01
KR20160066482A (en) 2016-06-10
TWI654487B (en) 2019-03-21

Similar Documents

Publication Publication Date Title
KR101963931B1 (en) Black photosensitive resin composition, black matrix and image display device comprising thereof
TWI521306B (en) Photosensitive resin composition and light blocking layer using the same
CN104820342B (en) Photosensitive resin composition for light-shielding film and cured product thereof
KR102047079B1 (en) A colored photo sensitive resin composition, color filter and liquid crystal display device having the same
JP4489564B2 (en) Photosensitive resin composition and color filter using the same
JP2017207778A (en) Photosensitive composition
JP2010262028A (en) Photosensitive resin composition for black matrix
KR101886902B1 (en) Black photosensitive resin composition, black matrix and image display device having the same
KR20170065111A (en) Colored photosensitive resin composition, color filter and image display device produced using the same
JP6031807B2 (en) Coloring composition, color filter and display element
KR102002134B1 (en) Black photosensitive resin composition, Black matrix and Image display device having the same
KR102131169B1 (en) Black photosensitive resin composition, Black matrix and Image display device having the same
KR20170111342A (en) Colored photosensitive resin composition, color filter and image display device produced using the same
JP6183044B2 (en) Curable composition, cured film and display element
CN105700293A (en) Black photosensitive resin composition, black array and image display device comprising the same
KR101953936B1 (en) Black photosensitive resin composition, black matrix and image display device having the same
TW201712430A (en) Photosensitive resin composition for black matrix and uses thereof
KR101970325B1 (en) Black photosensitive resin composition, black matrix, column sapcer and column spacer combined with black matrix for image display device produced using the same
CN111032720A (en) Resin, photosensitive resin composition, resin cured film, and image display device
JP2008233605A (en) Photosensitive resist composition for color filter and color filter
KR20170111133A (en) Colored photosensitive resin composition, color filter and image display device produced using the same
KR20160071994A (en) Black photosensitive resin composition, black matrix and image display device comprising thereof
KR20140014622A (en) A colored photosensitive resin composition
CN115052861A (en) Compound, composition, cured product, and method for producing cured product
KR20160025736A (en) Black photosensitive resin composition, black matrix and image display device having the same

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant