CN115752265A - Calibration method of non-ideal ellipsometry system - Google Patents
Calibration method of non-ideal ellipsometry system Download PDFInfo
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Abstract
The invention provides a calibration method of a non-ideal ellipsometry system, which comprises the following steps: acquiring actual measurement light intensity information of a standard sample piece in a measurement system and normalizing the actual measurement light intensity information to obtain actual measurement normalized light intensity information of the standard sample piece; fitting and iterating to obtain system parameters of the measuring system according to the actually measured normalized light intensity information and the theoretical normalized light intensity information of the standard sample; acquiring and normalizing actual measurement light intensity information of a sample piece to be measured to obtain actual measurement normalized light intensity information of the sample piece to be measured; and fitting and iterating to obtain the parameters of the sample to be measured based on the actual measurement normalized light intensity information and the theoretical normalized light intensity information of the sample to be measured according to the system parameters of the measuring system obtained by fitting and iterating. When the system parameters are solved, the fitting parameters of the trigonometric function are newly added in the system parameters, and when the wave plate is inclined, high-precision wavelength-by-wavelength calibration can still be carried out.
Description
Technical Field
The invention relates to the field of spectral measurement, in particular to a calibration method of a non-ideal ellipsometry system.
Background
In the semiconductor industry, the measurement of Optical Critical Dimensions (OCD) and the measurement of fine structure film thickness are directly related to the precision and yield of production samples. The ellipsometer is widely applied to semiconductor process monitoring due to the advantages of non-contact, no damage, high speed, high precision and the like.
The basic configuration of the ellipsometer can be seen in fig. 1, which mainly includes a light source 1, a polarizing plate 2, a first rotating electrical machine 3, a polarizing composite wave plate 4, a sample to be measured 5, an analyzing composite wave plate 6, a second rotating electrical machine 7, an analyzing composite wave plate 8, and a spectrometer 9.
The basic principle process of system calibration and measurement of the ellipsometer is as follows:
1. the natural light passes through a polaroid and a (rotating) wave plate to obtain polarized light;
2. new polarized light is obtained by the polarized light through the reflection or transmission of the standard sample material;
3. the new polarized light passes through the (rotating) wave plate and the polarization analyzing plate of the polarization analyzing arm to obtain the changed light intensity information;
4. processing the measured light intensity change information to obtain system parameters;
5. measuring light intensity information of a sample piece to be measured;
6. fitting and iterating the system parameters and the light intensity information of the sample to be tested to obtain the Mueller matrix of the sample.
The system parameters obtained in step 4 include phase retardation of the polarization-detecting composite wave plate, an azimuth angle of the polarization-detecting composite wave plate, phase retardation of the polarization-generating composite wave plate, an azimuth angle of the polarization-detecting plate, an azimuth angle of the polarization-generating plate and the like, the whole optical system is calibrated in a wavelength-by-wavelength calibration mode, but the problem of wave plate inclination exists in the actual process installation process or the production process, so that the calibration accuracy is reduced.
Disclosure of Invention
The invention provides a calibration method of a non-ideal ellipsometry system aiming at the technical problems in the prior art, which comprises the following steps:
acquiring actual measurement light intensity information of a standard sample piece in a measurement system and normalizing the actual measurement light intensity information to obtain actual measurement normalized light intensity information of the standard sample piece;
fitting and iterating system parameters of a measuring system according to actual measurement normalized light intensity information and theoretical normalized light intensity information of a standard sample piece, wherein the system parameters comprise phase delay amount of a polarization detection composite wave plate, azimuth angle of the polarization detection composite wave plate, phase delay amount of a polarization-generating composite wave plate, azimuth angle of the polarization-generating composite wave plate, azimuth angle of an polarization detection plate and azimuth angle of the polarization-generating plate, trigonometric function phase and amplitude of phase delay amount of a newly-added polarization detection composite wave plate, trigonometric function phase and amplitude of azimuth angle of the polarization detection composite wave plate, trigonometric function phase and amplitude of phase delay amount of the polarization-generating composite wave plate, trigonometric function phase and amplitude of azimuth angle of the polarization-generating composite wave plate, and trigonometric function phase and amplitude of azimuth angle of the polarization detection plate;
acquiring and normalizing actual measurement light intensity information of a sample piece to be measured to obtain actual measurement normalized light intensity information of the sample piece to be measured;
and fitting and iterating to obtain the parameters of the sample to be measured based on the actual measurement normalized light intensity information and the theoretical normalized light intensity information of the sample to be measured according to the system parameters of the measuring system obtained by fitting and iterating.
According to the calibration method of the non-ideal ellipsometric system, when the system parameters are solved, the fitting parameters of the trigonometric function are added in the system parameters, and when the wave plate is inclined, high-precision wavelength-by-wavelength calibration can still be performed.
Drawings
FIG. 1 is a schematic diagram of an optical measurement system;
FIG. 2 is a schematic view showing the fluctuation tendency of the equivalent optical rotation angle;
FIG. 3 is a diagram illustrating the fluctuation trend of the equivalent phase retardation;
FIG. 4 is a schematic diagram showing the fluctuation trend of the equivalent fast axis azimuth angle;
FIG. 5 is a flowchart of a calibration method for a non-ideal ellipsometry system according to the present invention.
In the drawings, the names of the components represented by the respective reference numerals are as follows:
1. the device comprises a light source, 2, a polarizing plate, 3, a first rotating motor, 4, a polarizing composite wave plate, 5, a sample to be detected, 6, an analyzing composite wave plate, 7, a second rotating motor, 8, an analyzing plate, 9 and a spectrometer.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention. In addition, technical features of various embodiments or individual embodiments provided by the present invention may be arbitrarily combined with each other to form a feasible technical solution, and such combination is not limited by the sequence of steps and/or the structural composition mode, but must be realized by a person skilled in the art, and when the technical solution combination is contradictory or cannot be realized, such a technical solution combination should not be considered to exist and is not within the protection scope of the present invention.
Based on the optical measurement system in fig. 1, the specific principle is as follows:
the phase retardation of the single wave plate at any incidence angle and azimuth angle can be calculated by the following equation:
wherein, theta tile Is the angle of incidence, β is the fast axis azimuth, d is the thickness of the monopole plate, n e And n o Is the e-light refractive index and o-light refractive index of the materialRefractive index, λ is the wavelength.
The composite wave plate model has the following equation:
wherein λ is i The center wavelength of the i-th wave plate of the composite wave plate model,
is the optical axis included angle between the (i + 1) th wave plate and the first wave plate in the composite wave plate model, M wp Equivalent Mueller matrix, delta, of composite waveplates 1 Is an equivalent phase retardation, ρ 1 Is an equivalent angle of rotation, theta 1 Is the equivalent fast axis azimuth.
The central wavelength, the optical axis included angle, the incident angle and the wavelength are selected through the formula (2), the fast axis azimuth angle is changed, the fluctuation trend of the equivalent phase delay amount, the equivalent optical rotation angle and the equivalent fast axis azimuth angle is obtained, and the fluctuation trend is approximate to a trigonometric function respectively as shown in fig. 2, fig. 3 and fig. 4, so that the calibration of the inclination measurement system can be carried out in a mode of adding the trigonometric function.
Fig. 5 is a flowchart of a calibration method of a non-ideal ellipsometry system according to the present invention, as shown in fig. 5, the method includes:
s1, actual measurement light intensity information of a standard sample piece in a measurement system is obtained and normalized, and actual measurement normalized light intensity information of the standard sample piece is obtained.
As an embodiment, the obtaining and normalizing actual measurement light intensity information of the standard sample in the measurement system to obtain actual measurement normalized light intensity information of the standard sample includes: obtaining a plurality of different moments t1, t2, t3, t n Actually measured light intensity information in the measuring system is obtained to obtain an actually measured light intensity information sequence of the standard sample piece in a set time period; and normalizing the actually measured light intensity information sequence of the standard sample piece in a set time period to obtain the actually measured normalized light intensity information of the standard sample piece.
It can be understood that the light intensity change information of the standard sample is obtained by using a measuring system such as a spectrometer. Specifically, based on a measurement system such as a spectrometer, the measured light intensity information of a plurality of standard samples at different moments within a period of time is measured to form a measured light intensity information sequence of the standard samples, and then the measured light intensity information sequence of the standard samples is normalized to obtain measured normalized light intensity information of the standard samples.
And S2, fitting and iterating to obtain system parameters of the measuring system according to the actually-measured normalized light intensity information and the theoretical normalized light intensity information of the standard sample.
It can be understood that, in this step, the actual measured normalized light intensity information and the theoretical normalized light intensity information of the standard sample piece obtained in S1 are utilized to fit and iterate the system parameters of the measurement system, where the system parameters include not only the phase retardation of the polarization-detecting composite wave plate, the azimuth angle of the polarization-detecting composite wave plate, the phase retardation of the polarization-generating composite wave plate, the azimuth angle of the polarization-detecting composite wave plate, and the azimuth angle of the polarization-generating plate, but also the trigonometric function phase and amplitude of the phase retardation of the polarization-detecting composite wave plate in the form of trigonometric function, the trigonometric function phase and amplitude of the azimuth angle of the polarization-detecting composite wave plate, the trigonometric function phase and amplitude of the azimuth angle of the polarization-generating composite wave plate, and the trigonometric function phase and amplitude of the azimuth angle of the polarization-detecting plate, and the trigonometric function phase and amplitude of the azimuth angle of the polarization-generating plate. The fitting iteration method includes, but is not limited to, a Levenberg-Marquardt method, a Newton method, a gradient descent method, a conjugate gradient method, and the like.
Constructing a system model of the measuring system based on the system parameter factors, wherein when the system parameters in the form of trigonometric functions are not added, the system model is as follows:
S out ＝[M A R(A+ρ 2 )]×[R(-ω 2 t-C2-θ 2 )M(δ 2 )R(ω 2 t+C 2 +θ 2 )]×Ms×[R(-ω 1 t-C 1 -θ 1 +ρ 1 )M(δ 1 )R(ω 1 t+C 1 +θ 1 -ρ 1 )]×[R(-P+ρ 1 )M p ]×S in (3)。
after the system parameters in the form of trigonometric functions are added, the system model is as follows:
S out ＝[M A R(A+ρ 2 +A A0 sin(2ω 2 +φ A0 ))]×[R(-ω 2 t-C 2 -θ 2 -A C20 sin(2ω 2 +φ C20 ))M(δ 2 +A δ20 sin(2ω 2 +φ δ20 ))R(ω 2 t+C 2 +θ 2 +A C20 sin(2ω 2 +φ C20 )]×Ms×[R(-ω 1 t-C 1 -θ 1 +ρ 1 -A C10 sin(2ω 1 +φ C10 ))M(δ 1 +A δ10 sin(2ω 1 +φ δ10 ))R(ω 1 t+C 1 +θ 1 -ρ 1 +A C10 sin(2ω 1 +φ C10 ))]×[R(-P+ρ 1 -A P0 sin(2ω 1 +φ P0 ))M P ]×S in (4)；
wherein M is s For a sample Mueller matrix, M P 、M A Mueller matrix of polaroid sheet for polarizing arm and analyzing arm, rho 1 、ρ 2 Is the angle of rotation theta of the polarizing composite wave plate 1 and the analyzing composite wave plate 2 1 、θ 2 Is the optical axis azimuth angle, omega, of the polarization composite wave plate 1 and the polarization detection composite wave plate 2 1 、ω 2 The rotational speeds of motor 1 and motor 2, M (delta) 1 ) And M (delta) 2 ) The phase retardation Mueller matrix of the polarization composite wave plate and the polarization analysis composite wave plate, R is a rotation matrix, t is a measurement time, ms is a measurement sample parameter, P, A, C 1 、C 2 Is the initial azimuth angle of the polarizing plate, the analyzer plate, the polarizing composite wave plate and the analyzing composite wave plate S in To normalize the Stokes vector of natural light, A A0 Phi and phi A0 Amplitude and phase of trigonometric functions of azimuth angle of analyzer plate, A C20 Phi and phi C20 Amplitude and phase of trigonometric functions of azimuth for analyzing the composite wave plate, A δ20 Phi (phi) and phi (phi) δ20 For calibrating offsetAmplitude and phase of trigonometric function of phase retardation of wave-combining plate, A C10 Phi and phi C10 Amplitude and phase being trigonometric functions of the azimuth of the polarizing composite wave plate, A δ10 Phi and phi δ10 Amplitude and phase of trigonometric function of retardation of polarization composite wave plate, A P0 Phi (phi) and phi (phi) P0 The amplitude and phase of the trigonometric function of the azimuth of the polarizer.
Understandably, the actually measured normalized light intensity information of the standard sample in the S1 is subjected to fitting iteration by using a formula (4), so that the theoretically normalized light intensity information after fitting iteration is as close as possible to the actually measured normalized light intensity information of the standard sample, and the system parameters of the measuring system are obtained.
In the fitting iteration process, other parameters are known, system parameters are unknown, the system parameters are adjusted, theoretical normalized light intensity information is solved based on the formula (4), and the solved theoretical normalized light intensity information and the actually measured normalized light intensity information of the standard sample piece are evaluated by utilizing an evaluation function. And solving corresponding theoretical normalized light intensity information by continuously adjusting system parameters until the solved theoretical normalized light intensity information and the evaluation function value of the actual measurement normalized light intensity information of the standard sample satisfy the condition, and acquiring the system parameters at the moment.
Wherein, confirm initial system parameter, according to formula (4), solve corresponding theoretical normalized light intensity information, include: for each time t1, t2, t3 n According to a formula (4), based on the determined initial system parameters, solving theoretical light intensity information at each moment; and normalizing the theoretical light intensity information at each moment to obtain the theoretical normalized light intensity information.
It can be understood that when the theoretical normalized light intensity information is solved by using the formula (4), under the adjusted set of system parameters, the theoretical light intensity information at each moment is solved by using the formula (4), and then the theoretical light intensity information at all the moments is normalized to obtain the theoretical normalized light intensity information.
And S3, acquiring and normalizing the actual measurement light intensity information of the sample piece to be measured to obtain the actual measurement normalized light intensity information of the sample piece to be measured.
It can be understood that the actually measured light intensity information of the sample piece to be measured is measured by using a measuring system such as a spectrometer and normalized to obtain the actually measured normalized light intensity information of the sample piece to be measured. The measurement process is the same as the actually measured normalized light intensity information of the measurement standard sample in S1, and the description is not repeated here.
And S4, fitting and iterating the parameters of the sample to be measured based on the actually-measured normalized light intensity information and the theoretical normalized light intensity information of the sample to be measured according to the system parameters of the measuring system iterated by fitting.
As an embodiment, the iterating the system parameters of the measurement system according to the fitting based on the actual measurement normalized light intensity information and the theoretical normalized light intensity information of the sample to be measured to obtain the parameters of the sample to be measured by fitting iteration includes: determining initial sample piece parameters to be measured according to the system parameters of the known measurement system obtained by fitting iteration, solving corresponding theoretical normalized light intensity information through a formula (4), and calculating an evaluation value between the theoretical normalized light intensity information and actual measured normalized light intensity information of the sample piece to be measured; and continuously adjusting the parameters of the sample to be measured, solving corresponding theoretical normalized light intensity information through a formula (4) until an evaluation value between the theoretical normalized light intensity information and the actually measured normalized light intensity information of the sample to be measured meets the condition, and acquiring the parameters of the sample to be measured.
It can be understood that after the actual measurement normalized light intensity information of the sample to be measured is obtained, the theoretical normalized light intensity information is solved based on the formula (4) by continuously adjusting the parameters of the sample to be measured based on the system parameters of the measurement system obtained by the fitting iteration of the S2 until the evaluation values of the theoretical normalized light intensity information and the actual measurement normalized light intensity information of the sample to be measured satisfy the conditions, and the parameters of the sample to be measured are obtained. And the parameters of the sample to be tested are Mueller matrix parameters.
The calibration method of the non-ideal ellipsometry system provided by the embodiment of the invention relates to the problem of inclination of two wave plates, so that the calibration method of the trigonometric function phase and amplitude of the phase delay of the fitting parameter polarization-detecting composite wave plate, the trigonometric function phase and amplitude of the azimuth angle of the polarization-detecting composite wave plate, the trigonometric function phase and amplitude of the phase delay of the polarization-generating composite wave plate, the trigonometric function phase and amplitude of the azimuth angle of the polarization-detecting plate and the trigonometric function phase and amplitude of the azimuth angle of the polarization-generating plate is added for wavelength-by-wavelength calibration, and the calibration precision is improved.
It should be noted that, in the foregoing embodiments, the description of each embodiment has an emphasis, and reference may be made to the related description of other embodiments for a part that is not described in detail in a certain embodiment.
As will be appreciated by one skilled in the art, embodiments of the present invention may be provided as a method, system, or computer program product. Accordingly, the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment or an embodiment combining software and hardware aspects. Furthermore, the present invention may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, and the like) having computer-usable program code embodied therein.
The present invention is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of the invention. It will be understood that each flow and/or block of the flow diagrams and/or block diagrams, and combinations of flows and/or blocks in the flow diagrams and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded computer, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
While preferred embodiments of the present invention have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. Therefore, it is intended that the appended claims be interpreted as including preferred embodiments and all such alterations and modifications as fall within the scope of the invention.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (6)
1. A method of calibrating a non-ideal ellipsometric system, comprising:
acquiring actual measurement light intensity information of a standard sample piece in a measurement system and normalizing the actual measurement light intensity information to obtain actual measurement normalized light intensity information of the standard sample piece;
fitting and iterating system parameters of a measuring system according to actual measurement normalized light intensity information and theoretical normalized light intensity information of a standard sample piece, wherein the system parameters comprise phase delay amount of a polarization detection composite wave plate, azimuth angle of the polarization detection composite wave plate, phase delay amount of a polarization generation composite wave plate, azimuth angle of the polarization generation composite wave plate, azimuth angle of an polarization detection plate and azimuth angle of the polarization generation plate, trigonometric function phase and amplitude of the phase delay amount of the newly added polarization detection composite wave plate, trigonometric function phase and amplitude of the azimuth angle of the polarization detection composite wave plate, trigonometric function phase and amplitude of the phase delay amount of the polarization generation composite wave plate, trigonometric function phase and amplitude of the azimuth angle of the polarization generation composite wave plate, and trigonometric function phase and amplitude of the azimuth angle of the polarization generation plate;
acquiring and normalizing actual measurement light intensity information of a sample piece to be measured to obtain actual measurement normalized light intensity information of the sample piece to be measured;
and fitting and iterating to obtain the parameters of the sample to be measured based on the actual measurement normalized light intensity information and the theoretical normalized light intensity information of the sample to be measured according to the system parameters of the measuring system obtained by fitting and iterating.
2. The method for calibrating a non-ideal ellipsometry system according to claim 1, wherein the obtaining and normalizing the measured light intensity information of the standard sample in the measurement system to obtain the measured normalized light intensity information of the standard sample comprises:
obtaining a plurality of different moments t1, t2, t3, t n Actually measured light intensity information in the measuring system is obtained to obtain an actually measured light intensity information sequence of the standard sample piece in a set time period;
and normalizing the actually measured light intensity information sequence of the standard sample piece in a set time period to obtain the actually measured normalized light intensity information of the standard sample piece.
3. The method of calibrating a non-ideal ellipsometric system according to claim 2, wherein fitting and iterating system parameters of the measurement system according to the measured normalized light intensity information and the theoretical normalized light intensity information of the standard sample comprises:
constructing a system model of the measuring system:
S out ＝[M A R(A+ρ 2 +A A0 sin(2ω 2 +φ A0 ))]×[R(-ω 2 t-C 2 -θ 2 -A C20 sin(2ω+φ C20 ))M(δ 2 +A δ 20 sin(2ω 2 +φ δ20 ))R(ω 2 t+C 2 +θ 2 +A C20 sin(2ω 2 +φ C20 )]×Ms×[R(-ω 1 t-C 1 -θ 1 +ρ 1 -A C10 sin(2ω 1 +φ C10 ))M(δ 1 +A δ10 sin(2ω 1 +φ δ10 ))R(ω 1 t+C 1 +θ 1 -ρ 1 +A C10 sin(2ω 1 +φ C10 ))]×[R(-P+ρ 1 -A P0 sin(2ω 1 +φ P0 ))M P ]×S in (4)；
wherein M is s For the sample Mueller matrix, M P 、M A Mueller matrix of polaroid sheet for polarizing arm and analyzing arm, rho 1 、ρ 2 Is the angle of rotation theta of the polarizing composite wave plate 1 and the analyzing composite wave plate 2 1 、θ 2 Is the optical axis azimuth angle, omega, of the polarization composite wave plate 1 and the polarization composite wave plate 2 1 、ω 2 The rotational speeds of motor 1 and motor 2, M (delta) 1 ) And M (delta) 2 ) The phase retardation Mueller matrix of the polarization composite wave plate and the polarization analysis composite wave plate, R is a rotation matrix, P, A, C 1 、C 2 Initial azimuth angles of the polarization plate, the polarization analyzing plate, the polarization composite wave plate and the polarization analyzing composite wave plate, t is time, S in To normalize the Stokes vector of natural light, A A0 、φ A0 、A C20 、φ C20 、A δ20 、φ δ20 、A C10 、φ C10 、A δ10 、φ δ10 And A P0 、φ P0 For measuring system parameters of the system, wherein A A0 Phi and phi A0 Amplitude and phase of trigonometric functions of azimuth angle of analyzer plate, A C20 Phi and phi C20 Amplitude and phase of trigonometric functions of azimuth for analyzing the composite wave plate, A δ20 Phi and phi δ20 Amplitude and phase of trigonometric function of retardation of phase of polarization-analyzing composite wave plate, A C10 Phi and phi C10 Amplitude and phase being trigonometric functions of the azimuth of the polarizing composite wave plate, A δ10 Phi (phi) and phi (phi) δ10 Amplitude and phase of trigonometric function of retardation of polarization composite wave plate, A P0 Phi (phi) and phi (phi) P0 To get upThe amplitude and phase of the trigonometric function of the azimuth of the partial plate;
determining initial system parameters, solving corresponding theoretical normalized light intensity information according to a formula (4), and calculating an evaluation value between the solved theoretical normalized light intensity information and the actually measured normalized light intensity information of the standard sample;
and solving corresponding theoretical normalized light intensity information based on a formula (4) by continuously adjusting system parameters until an evaluation value between the solved theoretical normalized light intensity information and the actually-measured normalized light intensity information of the standard sample piece meets a condition, and acquiring the system parameters of the measuring system.
4. The method of claim 3, wherein said determining initial system parameters and solving for corresponding theoretical normalized light intensity information according to equation (4) comprises:
for each time t1, t2, t3 n According to a formula (4), based on the determined initial system parameters, solving theoretical light intensity information at each moment;
and normalizing the theoretical light intensity information at each moment to obtain the theoretical normalized light intensity information.
5. The method for calibrating a non-ideal ellipsometry system according to claim 1 or 3, wherein the fitting iteration of the parameters of the measurement system based on the measured normalized light intensity information and the theoretical normalized light intensity information of the sample to be measured according to the system parameters of the measurement system iterated through the fitting iteration comprises:
determining initial sample piece parameters to be measured according to the system parameters of the known measurement system obtained by fitting iteration, solving corresponding theoretical normalized light intensity information through a formula (4), and calculating an evaluation value between the theoretical normalized light intensity information and actual measured normalized light intensity information of the sample piece to be measured;
and continuously adjusting the parameters of the sample to be detected, solving the corresponding theoretical normalized light intensity information through a formula (4) until the evaluation value between the theoretical normalized light intensity information and the actual measurement normalized light intensity information of the sample to be detected meets the condition, and acquiring the parameters of the sample to be detected.
6. The method of claim 1 or 5, wherein the sample parameters are Mueller matrix parameters.
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| CN116930093B (en) * | 2023-04-01 | 2024-01-26 | 中国人民解放军国防科技大学 | Error calibration method of double-vortex wave plate Mueller matrix ellipsometer |
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