CN115047725A - Wafer vertical projection type double-sided exposure system - Google Patents
Wafer vertical projection type double-sided exposure system Download PDFInfo
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- CN115047725A CN115047725A CN202210701475.8A CN202210701475A CN115047725A CN 115047725 A CN115047725 A CN 115047725A CN 202210701475 A CN202210701475 A CN 202210701475A CN 115047725 A CN115047725 A CN 115047725A
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- 230000007306 turnover Effects 0.000 claims description 9
- 230000000712 assembly Effects 0.000 claims description 8
- 238000000429 assembly Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 38
- 238000003384 imaging method Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2032—Simultaneous exposure of the front side and the backside
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
The invention discloses a wafer vertical projection type double-sided exposure system which comprises a Y-direction platform and a control panel, wherein a Y-direction stepping motor is arranged at the left end of the Y-direction platform, an output shaft of the Y-direction stepping motor is fixedly connected with a Y-direction lead screw, an X-direction platform is connected to the right side of the top end of the Y-direction platform in a sliding manner, an X-direction stepping motor is arranged at the rear end of the X-direction platform, and the mechanical arm up-and-down motor indirectly drives a first arc-shaped clamping plate and a second arc-shaped clamping plate to clamp a wafer by starting a mechanical arm up-and-down motor through arranging an adjusting and taking assembly and a mechanical arm assembly so as to conveniently adjust the height of the mechanical arm assembly and fix the wafer; through having set up focusing subassembly, start the accommodate motor, make the accommodate motor indirectly drive the speculum and slide along the third threaded rod, the automatic focusing of being convenient for realizes two-sided simultaneous projection exposure formation of image.
Description
Technical Field
The invention relates to the technical field of photoetching machines, in particular to an optical imaging exposure system of a photoetching machine.
Background
A lithography machine, also called a mask alignment exposure machine, an exposure system, a lithography system, etc., is a core equipment for manufacturing chips. The method adopts a technology similar to photo development to print fine patterns on a mask plate on a wafer through exposure of light, the existing photoetching machine is usually horizontally placed and is transmitted to an exposure working platform through a mechanical arm to be exposed, and in the exposure process, the key size of the exposed wafer imaging is ensured through two important systems of automatic focusing and automatic leveling.
The traditional projection exposure system is used for horizontally placing wafers, comprises the steps of horizontally conveying and horizontally placing the wafers on an exposure workpiece table, is limited by the placing mode, can only carry out horizontal single-sided traditional projection exposure, and cannot realize double-sided simultaneous projection exposure imaging.
Disclosure of Invention
Therefore, in order to solve the above-mentioned disadvantages, the present invention provides a wafer vertical projection type double-sided exposure system.
The invention is realized in such a way that a wafer vertical projection type double-sided exposure system is constructed, the device comprises a Y-direction platform and a control panel, a Y-direction stepping motor is arranged at the left end of the Y-direction platform, an output shaft of the Y-direction stepping motor is fixedly connected with a Y-direction lead screw, an X-direction platform is connected to the right side of the top end of the Y-direction platform in a sliding manner, an X-direction stepping motor is arranged at the rear end of the X-direction platform, an output shaft of the X-direction stepping motor is fixedly connected with the X-direction lead screw, the X-direction lead screw is in threaded connection with the inner side of a limiting plate, the limiting plate is fixed to the right side of the top end of the Y-direction platform, a Z-direction stepping motor is fixedly connected to the top end of the Z-direction stepping motor, an L-shaped limiting plate is fixedly connected to the top end of the Z-direction stepping motor, and the output shaft of the Z-direction stepping motor penetrates through the L-shaped limiting plate and is in threaded connection with a sliding plate, the utility model discloses a solar cell focusing mechanism, including slide plate, piece box, focusing subassembly, focusing motor, regulation motor output shaft, the slide plate left end rear top is equipped with the upset motor, be equipped with the wafer in the piece box, the spectroscope top is equipped with the main lens, Y direction platform right-hand member is equipped with control panel, upset motor output shaft run through the slide plate left end and get piece subassembly fixed connection with the regulation, the focusing subassembly is established in the wafer both sides, the focusing subassembly is including adjusting motor, second fixed plate, third threaded rod, speculum and condensing lens, the regulation motor is fixed at second fixed plate rear end middle part, the regulation motor output shaft run through second fixed plate rear end and with third threaded rod rear end fixed connection, third threaded rod front end threaded connection has the speculum, the speculum front end is equipped with the condensing lens.
Preferably, the adjusting and sheet taking assembly comprises an L-shaped connecting plate, a mechanical arm sheet taking motor, a first threaded rod, a limiting block, a sliding block, a telescopic rod, a first fixing plate, a mechanical arm upper and lower motor, a second threaded rod, a sliding plate and a mechanical arm assembly, wherein the rear side of the left end of the L-shaped connecting plate is fixedly connected with an output shaft of a turnover motor, the mechanical arm sheet taking motor is fixedly connected with the middle part of the left end of the L-shaped connecting plate, the output shaft of the mechanical arm sheet taking motor is fixedly connected with the first threaded rod, the right end of the first threaded rod is rotatably connected with the limiting block, the first threaded rod is in threaded connection with the inner side of the middle part of the sliding block, the middle part of the top end of the sliding block is provided with the telescopic rod, the top end of the telescopic rod is fixedly connected with the bottom of the left end of the mechanical arm assembly, the top end of the L-shaped connecting plate is fixedly connected with the first fixing plate, the middle part of the top end of the first fixing plate is fixedly connected with the mechanical arm upper and lower motor, the output shaft of the upper motor and the lower motor of the mechanical arm is fixedly connected with a second threaded rod, the second threaded rod is in threaded connection with the inner side of a sliding plate, and the bottom end of the sliding plate is fixedly connected with the top end of the mechanical arm component.
Preferably, the mechanical arm assembly comprises a fixed block, a limiting sliding groove, a limiting column, a Y-shaped sliding rod, a first connecting shaft, a second connecting shaft, a first mechanical arm, a first connecting groove, a first limiting groove, a first arc-shaped clamping plate, a second mechanical arm, a second connecting groove, a second limiting groove and a second arc-shaped clamping plate, wherein the left side of the top end of the fixed block is fixed with the bottom end of the sliding plate, the limiting sliding groove is arranged in the middle of the left side of the top end of the fixed block, the limiting column is fixed on the right side of the top end of the fixed block, the Y-shaped sliding rod is connected to the inner side of the limiting sliding groove in a sliding manner, the first connecting shaft and the second connecting shaft are respectively arranged on the right side of the top end of the Y-shaped sliding rod, the first connecting groove and the first limiting groove are respectively arranged on the left side of the top end of the first mechanical arm, the first arc-shaped clamping plate is connected to the rear side of the right end of the first mechanical arm in a rotating manner, the second mechanical arm is respectively provided with the second connecting groove and the second limiting groove, second robotic arm right-hand member front side rotation is connected with second arc splint, the spacing post outside rotates with first spread groove and second spread groove inboard respectively and is connected, first connecting axle and the inboard sliding connection of first spacing inslot, second connecting axle and the inboard sliding connection of second spacing inslot.
Preferably, the Y-direction stepping motor, the X-direction stepping motor, the Z-direction stepping motor, the turning motor, the adjusting motor, the robot arm film-taking motor, and the robot arm up-down motor are electrically connected to the control panel.
Preferably, focusing assemblies are symmetrically distributed at the left end and the right end of the wafer, and the focusing assemblies at the two ends can be independently adjusted.
Preferably, the middle part of the left side of the top end of the fixed block is provided with a limiting sliding groove matched with the Y-shaped sliding rod, and the thickness of the Y-shaped sliding rod is half of that of the limiting sliding groove.
Preferably, the left sides of the top ends of the first mechanical arm and the second mechanical arm are respectively provided with a first limiting groove and a second limiting groove which are matched with the first connecting shaft and the second connecting shaft.
The invention has the following advantages: the invention provides a wafer vertical projection type double-sided exposure system through improvement, compared with the same type of equipment, the improvement is as follows:
according to the wafer vertical projection type double-sided exposure system, the adjusting and wafer taking assembly and the mechanical arm assembly are arranged, the mechanical arm wafer taking motor is started to indirectly drive the first arc-shaped clamping plate and the second arc-shaped clamping plate to clamp a wafer, and the mechanical arm up-and-down motor is started to indirectly drive the mechanical arm assembly to slide up and down, so that the height of the mechanical arm assembly is conveniently adjusted and the wafer is conveniently fixed.
According to the wafer vertical projection type double-sided exposure system, the focusing assembly is arranged, the adjusting motor is started, the adjusting motor indirectly drives the reflector to slide along the third threaded rod, automatic focusing is facilitated, and double-sided simultaneous projection exposure imaging is achieved.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the construction of the Y-direction stepping motor and the Y-direction lead screw of the present invention;
FIG. 3 is a schematic view of the structure of the X-direction stepping motor and the X-direction lead screw of the present invention;
FIG. 4 is a schematic view of a wafer taking structure according to the present invention;
FIG. 5 is a schematic view of the adjustable film-taking assembly of the present invention;
FIG. 6 is a schematic view of the robot arm assembly of the present invention;
FIG. 7 is a schematic view of the focus assembly of the present invention;
FIG. 8 is a schematic diagram of the transmission refraction of a light source of the present invention.
Wherein: y-direction platform-1, Y-direction stepping motor-2, Y-direction screw rod-3, X-direction platform-4, X-direction stepping motor-5, X-direction screw rod-6, limit plate-7, Z-direction stepping motor-8, L-shaped limit plate-9, Z-direction screw rod-10, sliding plate-11, turnover motor-12, adjusting and taking-out component-13, film box-14, wafer-15, focusing component-16, spectroscope-17, main lens-18, control panel-19, L-shaped connecting plate-131, mechanical arm taking-out motor-132, first threaded rod-133, limit block-134, sliding block-135, telescopic rod-136, first fixing plate-137, mechanical arm up-down motor-138, and the like, A second threaded rod-139, a sliding plate-1310, a mechanical arm assembly-1311, a fixed block-13111, a limiting sliding groove-13112, a limiting column-13113, a Y-shaped sliding rod-13114, a first connecting shaft-13115, a second connecting shaft-13116, a first mechanical arm-13117, a first connecting groove-13118, a first limiting groove-13119, a first arc-shaped clamping plate-131110, a second mechanical arm-131111, a second connecting groove-131112, a second limiting groove-131113, a second arc-shaped clamping plate-131114, an adjusting motor-161, a second fixed plate-162, a third threaded rod-163, a reflector-164 and a condenser-165.
Detailed Description
The present invention will be described in detail below with reference to fig. 1 to 8, and the technical solutions in the embodiments of the present invention will be clearly and completely described, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, 2, 3, 4 and 5, the wafer vertical projection type double-sided exposure system of the present invention includes a Y-direction stage 1 and a control panel 19, a Y-direction stepping motor 2 is disposed at the left end of the Y-direction stage 1, an output shaft of the Y-direction stepping motor 2 is fixedly connected to a Y-direction lead screw 3, so that the Y-direction stepping motor 2 provides power for adjusting the Y-direction stage 1, an X-direction stage 4 is slidably connected to the right side of the top end of the Y-direction stage 1, an X-direction stepping motor 5 is disposed at the rear end of the X-direction stage 4, an output shaft of the X-direction stepping motor 5 is fixedly connected to an X-direction lead screw 6, the X-direction lead screw 6 is in threaded connection with an inner side of a position limiting plate 7, the position limiting plate 7 is fixed to the right side of the top end of the Y-direction stage 1, so that the X-direction stepping motor 5 provides power for adjusting the X-direction stage 4, a Z-direction stepping motor 8 is fixedly connected to the front side of the top end of the X-direction stage 4, an L-shaped limit plate 9 is fixedly connected to the top end of a Z-direction stepping motor 8, an output shaft of the Z-direction stepping motor 8 penetrates through the L-shaped limit plate 9 and is in threaded connection with a sliding plate 11, the Z-direction stepping motor 8 is used for providing power for adjusting the sliding plate 11, a turnover motor 12 is arranged above and behind the left end of the sliding plate 11, the sliding plate 11 is used for providing a fixed area for the turnover motor 12, a wafer 15 is arranged in a wafer box 14, the wafer box 14 is used for providing a placing space for the wafer 15, a main lens 18 is arranged at the top end of a spectroscope 17, a control panel 19 is arranged at the right end of a Y-direction platform 1, the Y-direction platform 1 is used for providing a fixed area for the control panel 19, an output shaft of the turnover motor 12 penetrates through the left end of the sliding plate 11 and is fixedly connected with an adjusting and taking assembly 13, the turnover motor 12 is used for conveniently overturning and adjusting the taking assembly 13, focusing assemblies 16 are arranged on two sides of the wafer 15, each focusing assembly 16 comprises an adjusting motor 161 and a second fixing plate 162, A third threaded rod 163, a reflector 164 and a condenser 165, wherein the adjusting motor 161 is fixed in the middle of the rear end of the second fixing plate 162, the output shaft of the adjusting motor 161 penetrates through the rear end of the second fixing plate 162 and is fixedly connected with the rear end of the third threaded rod 163, the front end of the third threaded rod 163 is in threaded connection with the reflector 164, so that the adjusting motor 161 can conveniently adjust the reflector 164, the condenser 165 is arranged at the front end of the reflector 164, the Y-direction stepping motor 2, the X-direction stepping motor 5, the Z-direction stepping motor 8, the flip motor 12, the adjusting motor 161, the robot arm blade-taking motor 132 and the robot arm up-down motor 138 are all electrically connected with the control panel 19, so that the control panel 19 provides power for the Y-direction stepping motor 2, the X-direction stepping motor 5, the Z-direction stepping motor 8, the flip motor 12, the adjusting motor 161, the robot blade-taking motor 132 and the robot arm up-down motor 138, and the focusing assemblies 16 are symmetrically distributed at the left and right ends of the wafer 15, and the focus assemblies 16 at both ends are individually adjustable.
Referring to fig. 6, the adjusting and film-taking assembly 13 of the wafer vertical projection type double-sided exposure system of the present invention includes an L-shaped connecting plate 131, a robot arm film-taking motor 132, a first threaded rod 133, a limiting block 134, a sliding block 135, a telescopic rod 136, a first fixing plate 137, a robot arm up-and-down motor 138, a second threaded rod 139, a sliding plate 1310 and a robot arm assembly 1311, wherein the rear side of the left end of the L-shaped connecting plate 131 is fixedly connected to an output shaft of the flipping motor 12, the middle portion of the left end of the L-shaped connecting plate 131 is fixedly connected to the robot arm film-taking motor 132, the output shaft of the robot arm film-taking motor 132 is fixedly connected to the first threaded rod 133, so that the robot arm film-taking motor 132 provides rotational power for the first threaded rod 133, the right end of the first threaded rod 133 is rotatably connected to the limiting block 134, the first threaded rod 133 is threadedly connected to the inner side of the middle portion of the sliding block 135, so that the sliding block 135 is driven by the first threaded rod 133 to slide, the middle of the top end of the sliding block 135 is provided with a telescopic rod 136, so that the sliding block 135 drives the telescopic rod 136 to slide, the top end of the telescopic rod 136 is fixedly connected with the bottom of the left end of the mechanical arm assembly 1311, the first fixing plate 137 is fixedly connected with the top end of the L-shaped connecting plate 131, the upper and lower motors 138 of the mechanical arm are fixedly connected with the middle of the top end of the first fixing plate 137, the output shaft of the upper and lower motors 138 of the mechanical arm is fixedly connected with the second threaded rod 139, the second threaded rod 139 is connected with the inner side of the sliding plate 1310 through threads, so that the upper and lower motors 138 of the mechanical arm drive the sliding plate 1310 to slide up and down, the bottom end of the sliding plate 1310 is fixedly connected with the top end of the mechanical arm assembly 1311, and the sliding plate 1310 drives the mechanical arm assembly 1311 to slide up and down.
Referring to fig. 7, a wafer vertical projection type double-sided exposure system according to the present invention includes a mechanical arm assembly 1311, which includes a fixed block 13111, a position-limiting sliding slot 13112, a position-limiting post 13113, a Y-shaped sliding bar 13114, a first connecting shaft 13115, a second connecting shaft 13116, a first mechanical arm 13117, a first connecting slot 13118, a first position-limiting slot 13119, a first arc-shaped clamp 131110, a second mechanical arm 131111, a second connecting slot 131112, a second position-limiting slot 131113, and a second arc-shaped clamp 131114, wherein the left side of the top end of the fixed block 13111 is fixed to the bottom end of the sliding plate 1310, so that the sliding plate 1310 drives the fixed block 13111 to slide up and down, the position-limiting sliding slot 13112 is disposed in the middle of the left side of the top end of the fixed block 13111, the position-limiting post 13113 is fixed to the right side of the top end of the fixed block 13111, the Y-shaped sliding bar 13114 is slidably connected to the Y-shaped sliding bar 13112, the position-limiting sliding slot 13112 provides a position-limiting sliding movement for the Y-shaped sliding bar 13114, the first connecting shaft 13115 and the second connecting shaft 13116 are disposed on the right side of the top end of the Y-shaped sliding bar 13114, the Y-shaped sliding bar 13114 drives the first connecting shaft 13115 and the second connecting shaft 13116 to slide, the left side of the top end of the first mechanical arm 13117 is respectively provided with a first connecting groove 13118 and a first limiting groove 13119, the first mechanical arm 13117 provides a fixed area for the first connecting groove 13118 and the first limiting groove 13119, the rear side of the right end of the first mechanical arm 13117 is rotatably connected with a first arc-shaped clamp plate 131110, the first mechanical arm 13117 provides a rotating area for the first arc-shaped clamp plate 131110, the right side of the top end of the second mechanical arm 131111 is respectively provided with a second connecting groove 131112 and a second limiting groove 131113, the second mechanical arm 131111 provides a fixed area for the second connecting groove 131112 and the second limiting groove 131113, the front side of the right end of the second mechanical arm 131111 is rotatably connected with a second arc-shaped clamp plate 131114, the second mechanical arm 131111 provides a rotating area for the second arc-shaped clamp plate 131114, the outer side of the limiting column 13113 is rotatably connected with the inner sides of the first connecting groove 13118 and the second connecting groove 131112, the limiting column 13113 provides a limiting rotation area for the first connecting groove 13118 and the second connecting groove 131112, the first connecting shaft 13115 is connected with the inner side of the first limiting groove 13119 in a sliding manner, the first limiting groove 13119 provides a sliding area for the first connecting shaft 13115, the second connecting shaft 13116 is connected with the inner side of the second limiting groove 131113 in a sliding manner, the second limiting groove 131113 provides a limiting sliding area for the second connecting shaft 13116, the middle part of the left side of the top end of the fixing block 13111 is provided with a limiting sliding groove 13112 matched with the Y-shaped sliding rod 13114, so that the Y-shaped sliding rod 13114 can slide in the limiting sliding groove 13112, and the thickness of the Y-shaped sliding bar 13114 is half of the thickness of the limiting sliding groove 13112, and the left sides of the top ends of the first mechanical arm 13117 and the second mechanical arm 131111 are respectively provided with a first limiting groove 13119 and a second limiting groove 131113 which are matched with the first connecting shaft 13115 and the second connecting shaft 13116, so that the first connecting shaft 13115 and the second connecting shaft 13116 can respectively slide in the first limiting groove 13119 and the second limiting groove 131113.
The invention provides a wafer vertical projection type double-sided exposure system through improvement, and the working principle is as follows;
firstly, when the equipment is used, the device is firstly placed in a working area, and then the equipment is connected with an external power supply, so that the required electric energy can be provided for the work of the equipment;
secondly, by starting the robotic arm film-taking motor 132, the robotic arm film-taking motor 132 drives the second threaded rod 139 to rotate clockwise, the second threaded rod 139 drives the slider 135 to slide leftward, the slider 135 drives the telescopic rod 136 to slide leftward, the telescopic rod 136 drives the Y-shaped sliding rod 13114 to slide leftward, the Y-shaped sliding rod 13114 simultaneously drives the first connecting shaft 13115 and the second connecting shaft 13116 to slide leftward, the first connecting shaft 13115 and the second connecting shaft 13116 respectively slide in the first limiting groove 13119 and the second limiting groove 131113, the first connecting shaft 13115 and the second connecting shaft 13116 respectively drive the first robotic arm 13117 and the second robotic arm 131111 to rotate outward, the first robotic arm 13117 and the second robotic arm 131111 drive the first arc-shaped clamp plate 131110 and the second arc-shaped clamp plate 131114 to move outward, the robotic arm-taking motor 132 is turned off, and the cassette 14 is moved closer to the robotic arm 1311, then, the robot blade picking motor 132 is started, so that the robot blade picking motor 132 drives the second threaded rod 139 to rotate counterclockwise, the second threaded rod 139 drives the slider 135 to slide rightward, the slider 135 drives the telescopic rod 136 to slide rightward, the telescopic rod 136 drives the Y-shaped sliding rod 13114 to slide rightward, the Y-shaped sliding rod 13114 simultaneously drives the first connecting shaft 13115 and the second connecting shaft 13116 to slide rightward, the first connecting shaft 13115 and the second connecting shaft 13116 respectively slide inside the first limiting groove 13119 and the second limiting groove 131113, the first connecting shaft 13115 and the second connecting shaft 13116 respectively drive the first robot arm 13117 and the second robot arm 131111 to rotate inward, the first robot arm 13117 and the second robot arm 131111 drive the first arc-shaped clamping plate 131110 and the second arc-shaped clamping plate 131114 to move inward, and the first arc-shaped clamping plate 131110 and the second arc-shaped clamping plate 131114 clamp the wafer 15 tightly and fixedly;
thirdly, the turning motor 12 is started, the turning motor 12 drives the adjusting and sheet-taking assembly 13 to rotate, the adjusting and sheet-taking assembly 13 is in a vertical state, the manipulator arm assembly 1311 drives the wafer 15 to be fixed in the middle of the two groups of focusing assemblies 16, then the adjusting motor 161 is started, the adjusting motor 161 drives the third threaded rod 163 to rotate, the third threaded rod 163 drives the reflector 164 to slide along the third threaded rod 163, and the reflector 164 is adjusted to a proper position to close the adjusting motor 161;
fourthly, the light source is irradiated to the spectroscope 17 through the main lens 18, the spectroscope 17 refracts the light source to the reflectors 164 on the two sides of the wafer 15 respectively, the reflectors 164 refract the light source to the condenser 165, the condenser 165 refracts the light source to the two sides of the wafer 15, and the two sides of the wafer 15 are projected, exposed and imaged simultaneously;
fifthly, the robot blade picking motor 132 is then started, so that the robot blade picking motor 132 drives the second threaded rod 139 to rotate clockwise, the second threaded rod 139 drives the slider 135 to slide leftward, the slider 135 drives the telescopic rod 136 to slide leftward, the telescopic rod 136 drives the Y-shaped sliding rod 13114 to slide leftward, the Y-shaped sliding rod 13114 simultaneously drives the first connecting shaft 13115 and the second connecting shaft 13116 to slide leftward, the first connecting shaft 13115 and the second connecting shaft 13116 respectively slide in the first limiting groove 13119 and the second limiting groove 131113, the first connecting shaft 13115 and the second connecting shaft 13116 respectively drive the first robot arm 13117 and the second robot arm 131111 to rotate outward, the first robot arm 13117 and the second robot arm 131111 drive the first arc-shaped clamp plate 131110 and the second arc-shaped clamp plate 131114 to move outward, and the first arc-shaped clamp plate 131110 and the second arc-shaped clamp plate 131114 respectively loosen the wafer 15, and thus the exposed wafer 15 is picked down.
The invention provides a wafer vertical projection type double-sided exposure system through improvement, an adjusting and sheet taking assembly 13 and a mechanical arm assembly 1311 are optimally arranged, the mechanical arm sheet taking motor 132 is started to indirectly drive a first arc-shaped clamping plate 131110 and a second arc-shaped clamping plate 131114 to clamp a wafer 15, and the mechanical arm up-down motor 138 is started to indirectly drive the mechanical arm assembly 1311 to slide up and down, so that the height of the mechanical arm assembly 1311 is conveniently adjusted and the wafer 15 is conveniently fixed; by optimally setting the focusing assembly 16, the adjusting motor 161 is started, so that the adjusting motor 161 indirectly drives the reflector 164 to slide along the third threaded rod 163, automatic focusing is facilitated, and double-sided simultaneous projection exposure imaging is realized.
The basic principles and main features of the present invention and the advantages of the present invention have been shown and described, and the standard parts used in the present invention are all available on the market, the special-shaped parts can be customized according to the description and the accompanying drawings, the specific connection mode of each part adopts the conventional means of bolt and rivet, welding and the like mature in the prior art, the machinery, parts and equipment adopt the conventional type in the prior art, and the circuit connection adopts the conventional connection mode in the prior art, and the details are not described herein.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. The utility model provides a two-sided exposure system of wafer vertical projection formula, includes Y direction platform (1), spectroscope (17) and control panel (19), Y direction platform (1) left end is equipped with Y direction step motor (2), Y direction step motor (2) output shaft and Y direction lead screw (3) fixed connection, Y direction platform (1) top right side sliding connection has X direction platform (4), X direction platform (4) rear end is equipped with X direction step motor (5), X direction step motor (5) output shaft and X direction lead screw (6) fixed connection, X direction lead screw (6) and limiting plate (7) inboard threaded connection, limiting plate (7) are fixed on Y direction platform (1) top right side, X direction platform (4) top front side fixed connection has Z direction step motor (8), the top end of the Z-direction stepping motor (8) is fixedly connected with an L-shaped limiting plate (9), an output shaft of the Z-direction stepping motor (8) penetrates through the L-shaped limiting plate (9) and is in threaded connection with a sliding plate (11), a turnover motor (12) is arranged above the rear end of the left end of the sliding plate (11), a wafer (15) is arranged in a wafer box (14), a main lens (18) is arranged at the top end of a spectroscope (17), and a control panel (19) is arranged at the right end of the Y-direction platform (1); the method is characterized in that: still get piece subassembly (13) and focusing subassembly (16) including adjusting, the upset motor (12) output shaft runs through sliding plate (11) left end and gets piece subassembly (13) fixed connection with the regulation, establish in wafer (15) both sides focusing subassembly (16), focusing subassembly (16) are including adjusting motor (161), second fixed plate (162), third threaded rod (163), speculum (164) and condenser (165), it fixes at second fixed plate (162) rear end middle part to adjust motor (161), adjust motor (161) output shaft run through second fixed plate (162) rear end and with third threaded rod (163) rear end fixed connection, third threaded rod (163) front end threaded connection has speculum (164), speculum (164) front end is equipped with condenser (165).
2. The wafer vertical projection type double-sided exposure system according to claim 1, wherein: the adjusting and sheet taking assembly (13) comprises an L-shaped connecting plate (131), a mechanical arm sheet taking motor (132), a first threaded rod (133), a limiting block (134), a sliding block (135), a telescopic rod (136), a first fixing plate (137), a mechanical arm up-down motor (138), a second threaded rod (139), a sliding plate (1310) and a mechanical arm assembly (1311), wherein the rear side of the left end of the L-shaped connecting plate (131) is fixedly connected with an output shaft of a turnover motor (12), the middle part of the left end of the L-shaped connecting plate (131) is fixedly connected with the mechanical arm sheet taking motor (132), the output shaft of the mechanical arm sheet taking motor (132) is fixedly connected with the first threaded rod (133), the right end of the first threaded rod (133) is rotatably connected with the limiting block (134), the first threaded rod (133) is in threaded connection with the inner side of the middle part of the sliding block (135), the middle part of the top end of the sliding block (135) is provided with the telescopic rod (136), the top end of the telescopic rod (136) is fixedly connected with the bottom of the left end of the mechanical arm assembly (1311), the top end of the L-shaped connecting plate (131) is fixedly connected with a first fixing plate (137), the middle of the top end of the first fixing plate (137) is fixedly connected with a mechanical arm up-down motor (138), an output shaft of the mechanical arm up-down motor (138) is fixedly connected with a second threaded rod (139), the second threaded rod (139) is in threaded connection with the inner side of a sliding plate (1310), and the bottom end of the sliding plate (1310) is fixedly connected with the top end of the mechanical arm assembly (1311).
3. The wafer vertical projection type double-sided exposure system according to claim 2, wherein: the mechanical arm assembly (1311) comprises a fixing block (13111), a limiting sliding groove (13112), a limiting column (13113), a Y-shaped sliding rod (13114), a first connecting shaft (13115), a second connecting shaft (13116), a first mechanical arm (13117), a first connecting groove (13118), a first limiting groove (13119), a first arc-shaped clamping plate (131110), a second mechanical arm (131111), a second connecting groove (131112), a second limiting groove (131113) and a second arc-shaped clamping plate (131114), wherein the left side of the top end of the fixing block (13111) is fixed to the bottom end of the sliding plate (1310), the limiting sliding groove (13112) is arranged in the middle of the left side of the top end of the fixing block (13111), and the limiting column (13113) is fixed to the right side of the top end of the fixing block (13111).
4. The wafer vertical projection type double-sided exposure system according to claim 3, wherein: the inner side of the limiting sliding groove (13112) is connected with a Y-shaped sliding rod (13114) in a sliding mode, the right side of the top end of the Y-shaped sliding rod (13114) is provided with a first connecting shaft (13115) and a second connecting shaft (13116) respectively, the left side of the top end of a first mechanical arm (13117) is provided with a first connecting groove (13118) and a first limiting groove (13119) respectively, the rear side of the right end of the first mechanical arm (13117) is connected with a first arc-shaped clamping plate (131110) in a rotating mode, and the right side of the top end of a second mechanical arm (131111) is provided with a second connecting groove (131112) and a second limiting groove (131113) respectively.
5. The wafer vertical projection type double-sided exposure system according to claim 4, wherein: second robotic arm (131111) right-hand member front side rotation is connected with second arc splint (131114), spacing post (13113) outside respectively with first connecting groove (13118) and second connecting groove (131112) inboard rotation be connected, first connecting axle (13115) and first spacing groove (13119) inboard sliding connection, second connecting axle (13116) and second spacing groove (131113) inboard sliding connection.
6. The wafer vertical projection type double-sided exposure system according to claim 1, wherein: the Y-direction stepping motor (2), the X-direction stepping motor (5), the Z-direction stepping motor (8), the turnover motor (12), the adjusting motor (161), the mechanical arm sheet taking motor (132) and the mechanical arm up-down motor (138) are all electrically connected with the control panel (19).
7. The wafer vertical projection type double-sided exposure system according to claim 1, wherein: focusing assemblies (16) are symmetrically distributed at the left end and the right end of the wafer (15), and the focusing assemblies (16) at the two ends can be independently adjusted.
8. The wafer vertical projection type double-sided exposure system according to claim 3, wherein: and a limiting sliding groove (13112) matched with the Y-shaped sliding rod (13114) is formed in the middle of the left side of the top end of the fixing block (13111).
9. The wafer vertical projection type double-sided exposure system according to claim 3, wherein: the thickness of the Y-shaped sliding rod (13114) is half of that of the limiting sliding groove (13112).
10. The wafer vertical projection type double-sided exposure system according to claim 3, wherein: the left sides of the top ends of the first mechanical arm (13117) and the second mechanical arm (131111) are respectively provided with a first limiting groove (13119) and a second limiting groove (131113) which are matched with the first connecting shaft (13115) and the second connecting shaft (13116).
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| CN202210701475.8A CN115047725A (en) | 2022-06-21 | 2022-06-21 | Wafer vertical projection type double-sided exposure system |
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| CN202210701475.8A CN115047725A (en) | 2022-06-21 | 2022-06-21 | Wafer vertical projection type double-sided exposure system |
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| CN113241321A (en) * | 2021-06-07 | 2021-08-10 | 扬州市职业大学(扬州市广播电视大学) | Mechanical arm |
| CN214812207U (en) * | 2021-02-16 | 2021-11-23 | 江西索瑞达智能装备科技有限公司 | Automatic glue dispenser for full-automatic reflector light coupling system |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20010017690A1 (en) * | 1998-11-10 | 2001-08-30 | Marc Vernackt | Method and device for exposing both sides of a sheet |
| CN105487349A (en) * | 2016-01-22 | 2016-04-13 | 江苏影速光电技术有限公司 | Laser direct writing system realizing vertical double-side exposure and based on DMD (digital micromirror device) projection light paths |
| CN210129097U (en) * | 2019-04-16 | 2020-03-06 | 翌颖科技(上海)有限公司 | High-precision automatic exposure machine |
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