CN114496715B - Deep energy level photoelectron spectroscopy research device based on electrostatic storage ring - Google Patents
Deep energy level photoelectron spectroscopy research device based on electrostatic storage ring Download PDFInfo
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Abstract
The invention belongs to the technical field of photoelectron spectroscopy, and particularly relates to a deep energy level photoelectron spectroscopy research device based on an electrostatic storage ring.
Description
Technical Field
The invention belongs to the technical field of photoelectron spectroscopy, and particularly relates to a deep-energy-level photoelectron spectroscopy research device based on an electrostatic storage ring.
Background
Clusters are relatively stable aggregates consisting of several or even thousands of atoms, molecules or ions through physical and chemical bonding, the physical and chemical properties of which vary with the number of atoms contained, the spatial dimensions of the clusters are in the range of 1nm to tens of nm, which are too large as described by inorganic molecules and too small as described by small solid blocks. Many of its properties are different from single atom molecules, and from solids and liquids, nor can they be obtained by simple linear epitaxy and interpolation of both properties. Thus, clusters are seen as a new layer of material structure between atomic molecules and macroscopic blocks, which is the transition state of various materials from atomic molecules to bulk materials.
Research developments in cluster physics over the last decade have focused mainly on determining the geometry of size dependent metal and semiconductor clusters, using the main research methods of photoelectron spectroscopy, infrared spectroscopy, electron scattering, and recently developed X-ray scattering spectroscopy, among others. In most cases, one combines these research methods with density functional method (Density Functional Theory, DFT) calculations, which not only effectively resolve the geometry of these cluster systems, but also obtain details of their corresponding electronic structures. Especially when DFT is combined with photoelectron spectroscopy, it is theoretically possible to extract both the geometry and the electronic structure of the system under investigation from the calculation of DFT. However, in practice, the above method is effective only for alkali metal and noble metal clusters due to the huge calculation amount and the difficulty of the complex electron orbit processing of DFT, and the study of heavy elements or clusters containing half-full d shell elements, especially clusters composed of f-shell elements, is still quite difficult. On the other hand, for the study of the properties of clusters (such as magnetism and reactivity), the conventional Stern-Gerlach method is generally adopted in the past, and the magnetism of free clusters is studied in a large amount by adopting X-ray spectrum (X-ray Circular Dichroism Spectroscopy) in recent years, but the reliability of the calculation result is difficult to ensure, especially for clusters with the atomic number larger than 20. Therefore, we need more support for experimental data of high-precision spectra in order to further develop and examine higher-order theoretical methods, effectively driving the development of cluster physics.
Chemical reaction studies of cluster gas phase and cluster deposition are mostly related to measurement of reaction rate, and some are related to studies of reaction intermediates using photoelectron spectroscopy and infrared spectroscopy (herein, intermediates refer to the state where clusters and products are separated). Most of these studies have been largely performed using DFT calculations, while most of the catalytically active materials are transition metal elements and their compounds (e.g., transition metal oxides), and if the micro-dynamics of the chemical reaction of clusters can be experimentally observed (measured) in real time, it will play a key role in understanding the chemical reaction properties of the clusters, and the pump-probe ultrafast dynamics measurement of the clusters using femtosecond laser is the most important means developed over the last twenty years to solve the above problems, but so far only few examples of research reports on very small-sized cluster systems have been reported, and the root cause of this situation is mainly the technical difficulties in the architecture of experimental facilities. So even though the research on ultrafast dynamics of molecules has been developed for decades, the research on ultrafast dynamics of clusters is only in the stage of just starting, and only few excited and de-excited channels are clarified in experiments at present, mainly because most clusters are different from small molecules widely researched by common pump-probe experiments, and when low-order frequency multiplication (400 nm and 266 nm) of standard Ti Sapphire femtosecond laser is used, the photoelectron emission channels of metal clusters are blocked due to the intensive de-excitation process in the photoelectron emission of the clusters when the low-photon energy excitation energy spectrum is used.
Angle-resolved photoelectron spectroscopy has been emerging in recent years, but has been widely used to measure microscopic architectural electronic structures. An angle resolved photoelectron spectrum containing information about the electronic angular momentum of the target system under investigation may give some characteristics of the electronic wave function in the cluster. If experimental measurements of pump-detection are made with a femtosecond laser, the photoelectron spectroscopy can directly reflect ultrafast processes in the clusters, such as excitation and de-excitation of electrons in the clusters, and even related chemical reaction processes. As a typical class of angle-resolved photoelectron spectroscopy, a momentum spectrometer (Velocity MAP IMAGING, VMI) photoelectron spectrometer has the characteristics of simple structure, high precision, large photoelectron generation area and the like, and compared with a traditional time-of-flight photoelectron spectrometer (such as a magnetic bottle type photoelectron spectrometer), the photoelectron spectroscopy of VMI is realized by measuring the spatial distance of the concentric centers of photoelectron signal falling points on a photoelectron detector, and can realize signal continuous measurement accumulation, so that the method is particularly suitable for the study of free clusters and molecules and is widely used. The spectrometer can not only measure the basic characteristics of the electron wave function, but also be used for researching the self-coherence in the electron emission process. However, since the energy of laser photons is limited, only a few studies of metal and semiconductor cluster systems have been carried out using this method to date.
The study of cluster micromechanics using higher photon energies would be of great advantage, but to generate such large laser photon energies, it is generally required to use either free electron lasers (fres electron lasers, FELs) or higher order frequency doubled (high harmonic generation, HHG) lasers generated by femtosecond lasers acting as pump light with nonlinear optical media as the light source. Although FELs is capable of generating high flux high energy lasers, is an ideal light source for many experiments, it is extremely expensive, and the light source for a single experiment has very limited service time, and it is difficult to meet the requirement of large period experiments of size and temperature dependence research in cluster research. On the other hand, HHG is basically a desktop instrument, which has the advantages of small space occupation and low cost compared with FELs, but its output luminous flux is extremely weak, and if it is directly used as a traditional pulse-operated photoelectron spectrometer (20-100 Hz), its signal occurrence rate is too low, and effective measurement of the photoelectron spectrum is hardly achieved.
Disclosure of Invention
The invention aims at: aiming at the defects of the prior art, the deep energy level photoelectron spectroscopy research device based on the electrostatic storage ring can finish size selection under a HHG femtosecond laser platform, and the cluster photoelectron spectroscopy full spectrum measurement of precise temperature control.
In order to achieve the above purpose, the present invention adopts the following technical scheme:
A deep energy level photoelectron spectroscopy research device based on an electrostatic storage ring comprises a magnetron sputtering source, a magnetic resonance imaging device and a magnetic resonance imaging device, wherein the magnetron sputtering source is used for providing high-current strong and temperature controllable metal/semiconductor cluster ion beam current; the quadrupole mass selector is used for carrying out mass screening on cluster ion beam streams emitted by the magnetron sputtering source; the low-temperature ion trap is used for controlling the temperature of the cluster ion beam current with the quality screened by the quadrupole mass selector; the beam optical shaping section is used for accelerating and shaping the cluster ion beam with certain mass and temperature emitted from the low-temperature ion trap and injecting the cluster ion beam into the electrostatic storage ring; the electrostatic storage ring is used for restraining the beam to do annular motion and improving the beam intensity of the beam in an order of magnitude; the electric field compensation type velocity image photoelectron spectrometer enables measurement of photoelectron spectroscopy not to influence annular movement of beam current through compensation electrodes.
Preferably, the vacuum environment of the magnetron sputtering source is 10 -6 Pa, the vacuum environment of the quadrupole mass selector is 10 -6 Pa, the square cavity where the low-temperature ion trap is located is 10 -6 Pa, the vacuum environment of the beam optical shaping section is 10 -7 Pa, and the vacuum chamber of the electrostatic storage ring is 10 -9 Pa.
Preferably, the magnetron sputtering source is a source outlet diaphragm with 15-degree offset angle with the axis for separating charged ions from neutral particles.
Preferably, the quadrupole mass selector is provided with an ion guide and a mass screening, the ion guide is provided with a stainless steel electrode plate for extracting beam current, and the mass screening is provided with a front guide rod, a rear guide rod and a mass analysis rod.
Preferably, the low-temperature ion trap is provided with an injection section, a temperature control section and an extraction section, wherein the injection section comprises a group of electrostatic focusing lenses, a group of electrostatic deflection lenses, a group of electrostatic focusing lenses and a group of electrostatic four-stage deflection lenses which are sequentially arranged, and the injection section is used for accelerating and shaping cluster ion beam current emitted from the quadrupole mass selector and then injecting the cluster ion beam current into the temperature control section; the temperature control section comprises quadrupole rods and a first end cover electrode, wherein the quadrupole rods are used for limiting radial movement of the cluster ion beam, and the first end cover electrode is used for limiting axial movement of the cluster ion beam; the extraction section comprises an acceleration lens group and a second end cover electrode and is used for storing the rapid extraction of the cluster ion beam current and controlling the extraction kinetic energy distribution and the spatial distribution of the cluster ion beam current.
Preferably, the vacuum chamber of the electrostatic storage ring is a stainless steel square chamber.
Preferably, the electrostatic storage ring comprises a four-stage vacuum tandem pumping technique.
Preferably, the internal elements of the electrostatic storage ring are distributed in a square structure for restraining the cluster ion beam current from periodically moving.
Preferably, the electrostatic storage ring is provided with four micro-channel detectors for detecting the beam intensity injected in each direction.
Preferably, the vertical electric field compensation type velocity image photoelectron spectrometer is used for measuring the angle-resolved laser photoelectron spectroscopy. The photoelectrons generated by the action of the ionized laser and the cluster ions are guided to a photoelectron energy spectrum region through repulsive force applied by the compensation electrode, and the compensation electrode arranged in the vertical direction also ensures that the measurement of the photoelectron energy spectrum does not influence the annular movement of the beam current. The invention has the beneficial effects that the invention improves the intensity of the target group by orders of magnitude through the use of the electrostatic ion storage ring, and simultaneously realizes the decoupling of the running frequency of the ionization laser system of the low-temperature ion trap and the VMI, thereby realizing the full play of the high-repetition frequency and even continuous running of the laser on the premise of ensuring the effective temperature control of the researched ions, and further enabling the device to use a relatively weak VUV light source such as the HHG of the femtosecond laser pump to replace the FFLs light source so as to realize the measurement of the cluster deep energy level full spectrum. The method realizes the research on the full-electronic configuration structure of the transition metal cluster, and the angle-resolved photoelectron spectroscopy is taken as a powerful tool for researching the cluster structure to finish measurement in a VUV region, so that the complete valence band structure of the metal-like cluster and the evolution along with the size can be revealed for the first time. The time-resolved measurement of the transition metal chemical reaction process is realized, and the high-energy photons are utilized to simultaneously detect the cluster cations and anions, so that the influence of the charge state of the cluster on the chemical reaction can be directly studied. By using the femtosecond-pumped detection spectrum, the dynamic process of the valence electron and the real electron excitation state of the shallow atom can be detected simultaneously through the use of high-energy photons, so that the contribution of the shallow atom entity to the chemical reaction can be studied. The invention combines the static storage ring with VMI, and utilizes femtosecond laser, HHG technology and desktop type equipment in laboratory to realize systematic measurement of deep energy level electronic structure in clusters and molecules.
Drawings
Features, advantages, and technical effects of exemplary embodiments of the present invention will be described below with reference to the accompanying drawings.
FIG. 1 is a diagram of an overall design layout of the present invention.
FIG. 2 is a schematic diagram of a vacuum system design layout according to the present invention.
Fig. 3 is a parallel injection mode in the electron optical system of the present invention.
Fig. 4 is a vertical injection mode in the electron optical system of the present invention.
Fig. 5 is a schematic diagram of an electron optical element layout of a beam transport and quality screening unit according to an embodiment of the present invention.
FIG. 6 is a schematic diagram of an electron optical device layout of a beam temperature control unit in parallel mode according to an embodiment of the present invention.
FIG. 7 is a schematic diagram of an electron optical device layout of a beam temperature control unit in a vertical mode according to an embodiment of the present invention.
FIG. 8 is a schematic diagram of an electron-optical device layout of a linear beam transport and guide unit in parallel mode according to an embodiment of the present invention.
Fig. 9 is a schematic diagram of an electron optical device layout of a linear beam transport and guide unit in a vertical mode according to an embodiment of the present invention.
FIG. 10 is a schematic diagram of an electron optical device layout of a vertical beam storage and photoelectron spectroscopy cell according to an embodiment of the present invention.
Wherein reference numerals are as follows:
1-a magnetron sputtering source;
2-quadrupole mass selector;
3-low temperature ion trap;
4.1-beam shaping; 4.2-beam shaping;
5-differential pumping chambers;
6.1-90 degree deflector; 6.2-90 degree deflector; 6.3-90 degree deflector; a 6.4-90 degree deflector;
7.1-microchannel plate detector; 7.2-microchannel plate detector; 7.3-microchannel plate detector; 7.4-microchannel plate detector;
8-VMI；
a 9.1-femtosecond laser system; 9.2-HHG units.
A-pre-pumping a foreline vacuum unit; b-an ultra-high vacuum unit; c-a molecular pump string pumping unit; d-an extremely high vacuum unit; p1-600m3/s large pumping speed Roots pump; P2-2200L/s semi-magnetic spin molecular pump;
P3-1200L/s magnetic spin molecular pump; P4-1200L/s magnetic spin molecular pump;
P5-1200L/s semi-magnetic spin molecular pump; P6-700L/s semi-magnetic spin molecular pump;
P7-300L/s magnetic spin molecular pump; P8-300L/s magnetic spin molecular pump; P9-300L/s magnetic spin molecular pump; P10-300L/s magnetic spin molecular pump; P11-2200L/s semi-magnetic spin molecular pump; P12-2200L/s semi-magnetic spin molecular pump; P13-2000L/s compound adsorption ion pump; V1-CF100 gate valve; V2-CF63 gate valve.
E-beam transmission and quality screening units; f-beam temperature control unit; g-direct current shaping and guiding units;
An H-beam storage and photoelectron spectroscopy unit; f1-a support flange of the low-temperature ion trap;
F2-flange at the joint of the square cavity where the low-temperature ion trap is positioned and the rear cavity.
Detailed Description
Certain terms are used throughout the description and claims to refer to particular components. Those of skill in the art will appreciate that a hardware manufacturer may refer to the same component by different names. The description and claims do not take the form of an element differentiated by name, but rather by functionality. As used throughout the specification and claims, the word "comprise" is an open-ended term, and thus should be interpreted to mean "include, but not limited to. By "substantially" is meant that within an acceptable error range, a person skilled in the art can solve the technical problem within a certain error range, substantially achieving the technical effect.
Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the present invention, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
The present invention will be described in further detail with reference to fig. 1 to 10, but the present invention is not limited thereto.
The deep energy level photoelectron spectroscopy research device based on the electrostatic storage ring comprises a magnetron sputtering source 1 for providing high-current-intensity and temperature-controllable metal/semiconductor cluster ion beam current; the quadrupole mass selector 2 is used for screening the mass of the cluster ion beam emitted by the magnetron sputtering source 1; a low-temperature ion trap 3 for temperature controlling the cluster ion beam current of the screening mass through the quadrupole mass selector 2; the beam optical shaping section 4 is used for accelerating and shaping the cluster ion beam with certain mass and temperature emitted from the low-temperature ion trap 3 and injecting the cluster ion beam into the electrostatic storage ring; the electrostatic storage ring 6 is used for restraining the beam to do annular motion and improving the beam intensity of the beam by orders of magnitude; the vertical distribution electric field compensation type velocity image photoelectron spectrometer 8 performs measurement of angle-resolved laser photoelectron spectroscopy and enables the measurement of the photoelectron spectroscopy not to influence annular movement of beam current through a compensation electrode arranged in the vertical direction. Specifically, the invention comprises a magnetron sputtering source 1, a quadrupole mass selector 2, a low-temperature ion trap 3, beam optical shaping 4, an electrostatic ion storage ring 6 and a vertical distribution electric field compensation type speed image photoelectron spectrometer 8, wherein the magnetron sputtering source 1 is used as a main cluster source, and has the advantages of large flow intensity, controllable temperature ranges 77K to 198K and various cluster generation types. The clusters have quite large size distribution after being generated from the source, and enter a low-temperature radio-frequency ion trap after being subjected to mass selection through a quadrupole mass selector 2 with high transmittance and large mass range, and the clusters are cooled to about 5K in the trap, so that the temperature requirement of the measurement of a rear-end high-precision spectrum is ensured. Meanwhile, the temperature of the clusters can be effectively controlled to be changed at random from 5K to 300K, and further the purposes of temperature-changing spectrum measurement and phase-changing research are achieved. Clusters are injected and stored in a small desktop electrostatic ion storage ring after being led out of the ion trap, clusters with single quality and controllable temperature after quality selection can be accumulated to high beam intensity in the ring through repeated injection, and extreme ultraviolet ionization laser is operated at extremely high frequency, so that the photoelectron energy spectrum intensity is improved.
In some embodiments, the apparatus is classified into a vacuum system and an electron optical system according to system functions. The vacuum system consists of vacuum acquisition and vacuum difference, wherein the vacuum acquisition is divided into four parts of a pre-pumping forevacuum unit A, an ultrahigh vacuum unit B, a molecular pump serial pumping unit C and an ultrahigh vacuum unit D according to the vacuum degree, the pre-pumping forevacuum unit A is the rough vacuum degree of 10 -1 Pa, and the ultrahigh vacuum unit B provides an ultrahigh vacuum use environment for the magnetron sputtering source 1, the quadrupole mass selector 2, the low-temperature ion trap 3 and the linear beam transmission and guide beam optical unit. The vacuum degree was 10 -6Pa,10-6Pa,10-7Pa,10- 7 Pa, respectively. The molecular pump string pumping unit C is an extremely high vacuum unit D for improving the high vacuum pre-pumping environment by 10 -5 Pa, the extremely high vacuum unit D provides an extremely high vacuum use environment for the electrostatic storage ring, and the extremely high vacuum degree of 2 multiplied by 10 -9 Pa is realized in the cavity of the storage ring through a differential vacuum acquisition system and a molecular pump string pumping technology. The electron optical system is divided into a beam transmission and quality screening unit E, a beam temperature control unit F, a direct beam shaping and guiding unit G and a beam storage and photoelectron spectroscopy unit H.
The beam transmission and mass screening unit E guides the cluster beam generated in the magnetron sputtering source 1 to the quadrupole mass selector 2 and performs mass screening. The outlet diaphragm is used as a first-stage extraction lens, the ion guide rod and the end lens are used as a second-stage extraction lens, the front lens and the rear lens of the quadrupole mass selector 2 are used as third-stage extraction lenses, and the mass separation and intensity of generated cluster particles and precise mass screening can be adjusted by adjusting the sputtering power P and He/Ar flow of the magnetron sputtering source 1 and the target outlet distance L, the diaphragm opening D, the RF frequency and amplitude of the ion guide rod, the extraction field gradient, the beam current adjusting parameters such as the quadrupole mass selector 2RF and DC amplitude and the like.
In the deep-level photoelectron spectroscopy research device based on the electrostatic storage ring, the vacuum environment of the magnetron sputtering source 1 is 10 -6 Pa, the vacuum environment of the quadrupole mass selector 2 is 10 -6 Pa, the square cavity where the low-temperature ion trap 3 is positioned is 10 -6 Pa, the vacuum environment of the Shu Liuguang chemical shaping section is 10 -7 Pa, and the vacuum cavity of the electrostatic storage ring is 10 -9 Pa.
In the deep-level photoelectron spectroscopy device based on the electrostatic storage ring according to the present invention, the magnetron sputtering source 1 has a 15 ° offset angle from the axis for separating charged ions from neutral particles for the source exit aperture.
In the deep level photoelectron spectroscopy apparatus based on the electrostatic storage ring according to the present invention, the quadrupole mass selector 2 is provided with quadrupole ion guide and quadrupole mass screening. Specifically, the quadrupole mass selector is a quadrupole ion guide rail combined with a quadrupole mass selector, wherein the quadrupole ion guide rail is a self-made ion guide rail formed by a stainless steel rod with the diameter of r 0 =10 mm and the length of L=132 mm according to the ratio of r 0/r= 1.1487, and the ion guide rail further comprises a stainless steel electrode plate with the outer diameter of 35mm, the inner diameter of 5mm and the thickness of 1.5mm for extracting cluster ion beam current emitted from a magnetron sputtering source. The quadrupole mass screening is provided with front and rear ion guide rods and a mass analysis rod, the upper limit of resolvable mass is 4000amu, and the upper limit of mass resolution is 1500.
In the deep energy level photoelectron spectroscopy research device based on the electrostatic storage ring, the low-temperature ion trap 3 is provided with an injection section, a temperature control section and a lead-out section, wherein the injection section comprises a group of electrostatic focusing lenses, a group of electrostatic deflection lenses, a group of electrostatic focusing lenses and a group of electrostatic four-level deflection lenses which are sequentially arranged, and the injection section is used for accelerating and shaping cluster ion beam current emitted from the quadrupole mass selector 2 and then injecting the cluster ion beam current into the temperature control section; the temperature control section comprises four-pole rods and a first end cover electrode, wherein the four-pole rods are used for limiting radial movement of the cluster ion beam, and the first end cover electrode is used for limiting axial movement of the cluster ion beam; the extraction section comprises an acceleration lens group and a second end cover electrode and is used for rapidly extracting the stored cluster ion beam current and controlling the extraction kinetic energy distribution and the spatial distribution of the cluster ion beam current. The accelerating lens group consists of two groups of 19 stainless steel lenses with the outer diameter of 36mm and the inner diameter of 3-12mm and the thickness of 2mm with non-uniform gradient increase, each group has the same indirect potential, and the two groups of opposite potentials realize a uniform gradient electric field with controllable 0- +/-200V distribution.
In this embodiment, the injection section of the beam temperature control unit F is configured to spatially reshape the cluster beam after the accurate quality screening by using an electrostatic focusing lens and an electrostatic deflection lens, and deflect the cluster beam by 90 ° to a quadrupole beam detector by using an electrostatic quadrupole deflection lens to perform signal measurement or guide the cluster beam to a low-temperature ion trap 3 to perform the beam temperature control in the next step, where a faraday cage is used to detect the beam intensity extracted from the source line to optimize the beam adjustment parameter. The temperature control section of the beam current temperature control unit F is a radio-frequency quadrupole ion trap and consists of quadrupole rods and a first end cover electrode, the quadrupole rods limit radial movement of cluster ion beams, the first end cover electrode limits axial movement of the cluster ion beams, and stored cluster ions collide with helium atoms cooled by a cold head to realize temperature control of 4 to 300+/-1K. The leading-out section of the beam current temperature control unit F consists of an accelerating lens group and a second end cover electrode in the low-temperature ion trap 3, and the leading-out kinetic energy distribution and the spatial distribution of the cluster ion beam groups are controlled by controlling the rapid change of the potential between the electrodes through time sequence and the rapid leading-out of the cluster ion beam current with the switching time of less than 100 ns.
The linear beam transmission and guide unit G is divided into control of cluster ion beam length and control of cluster ion beam flow energy, which is completed by pulse acceleration and deceleration field and direct current acceleration field, because the kinetic energy of the particles with the front position of the beam extracted from the low-temperature ion trap 3 is smaller, the particles with the rear position can surpass the particles with the front position after a long-distance transmission, and the beam elongation is caused, so that the beam length needs to be controlled by controlling the acceleration and deceleration of the beam. The accelerating electric field in the low-temperature ion trap 3 is used as a first-stage pulse accelerating field, the Wiley-Mclaren lens is used as a second-stage pulse accelerating and decelerating field, the reference flight tube is used as a third-stage pulse accelerating field, after the beam is completely fed into the reference flight tube without gradient after being subjected to direct current acceleration, the beam is quickly (about 100 ns) converted into another electric potential, and the beam is accelerated at the outlet of the reference flight tube due to the fact that the outlet is referenced to the ground, and the direct current accelerating lens group 1 and the direct current accelerating lens group 2 improve the beam flow energy based on the voltage stabilizing field. The electrostatic focusing lens and the deflection lens are used for controlling the space shape of the beam, so that the beam is convenient to transmit. The beam flow energy injected into the storage ring is ensured to be more than 5KeV, the length is less than 450mm, and the beam spot diameter is less than 8mm.
The beam storage and photoelectron spectroscopy unit H consists of an electrostatic storage ring 6 and a vertical electric field compensation type velocity image photoelectron spectrometer 8, one notable feature of which is that in principle there is no limit to the mass of ions that can be stored in such a ring, compared to a magnetic storage ring, which also benefits from the lack of hysteresis effects and remanence. The Velocity image (Velocity MAP IMAGING, VMI) photoelectron spectrometer has the characteristics of simple structure, high precision, large photoelectron generation area and the like, compared with the traditional time-of-flight photoelectron spectrometer (such as a magnetic bottle type photoelectron spectrometer), the photoelectron spectrum of the VMI is realized by measuring the space distance of the concentric centers of the photoelectron signal falling points on the photoelectron detector, the continuous measurement accumulation of signals can be realized, and the purpose of measuring the cluster deep energy level high precision photoelectron spectrum by using the low-flux HHG laser through the organic combination of an electrostatic storage ring and the VMI is realized. The internal elements of the electrostatic storage ring are distributed into a square structure, and the electrostatic storage ring comprises four groups of 90-degree deflectors used for beam storage and four groups of micro-channel detectors used for beam intensity detection, each group of deflectors consists of 90-degree electrostatic quadrupole deflection lenses and electrostatic focusing lenses, and the potential relationship between the 90-degree electrostatic quadrupole deflection lenses and the electrostatic focusing lenses is adjusted, so that stable storage (in the order of seconds) of the beam in the storage ring can be realized. The four groups of detectors are respectively used for detecting the beam intensity injected into the storage ring and the beam intensity in the moving direction in the circulating movement process, when the circulating beam intensity is measured to be more than 8nA, the ionization laser of the VMI starts to work at extremely high frequency, and then the signals are accumulated based on time through the MCP above the VMI, so that the high-intensity deep-energy-level photoelectron energy spectrum is finally obtained.
In the deep-level photoelectron spectroscopy device based on the electrostatic storage ring according to the invention, the vacuum chamber of the electrostatic storage ring is a stainless steel square chamber. The vacuum chamber is a 316LN stainless steel square chamber with the length of 1 meter, the width of 1 meter and the height of 0.35 meter, and comprises a four-stage vacuum serial pumping technology for realizing the extremely high vacuum degree of 2X 10 -9 Pa, wherein the first stage is a front-stage vacuum pipeline for realizing the vacuum degree of 2X 10 -1 Pa; the second stage is a pre-stage molecular pump, and the vacuum degree is 2 multiplied by 10 -5 Pa; the third stage is a main molecular pump group, and the vacuum degree is 2 multiplied by 10 -8 Pa; the fourth stage is a compound adsorption ion pump, and the vacuum degree is 2×10 -9 Pa.
Based on the quadrupole mass selector 2, the low-temperature ion trap 3 and the single mass formed after beam optical shaping, the temperature is accurate, the beam length is less than 450mm, the beam spot is less than 8mm, the cluster beam with the beam flow energy of about 5KeV is injected into the storage ring, the potential of the 4X 90-degree deflector in the storage ring is regulated to ensure that the beam is stably stored, the cluster ion beam stored in the storage ring is repeatedly injected to achieve a quasi-continuous motion state, so that the photoelectron spectrum ionization laser can operate at a very high frequency, the measurement efficiency of the photoelectron spectrum is greatly improved, and the frequency dependence relationship between the ionization laser operation frequency and cluster generation, temperature control and transmission in the traditional free ion low-temperature photoelectron spectrum is decoupled.
The vertical distribution electric field compensation type velocity image photoelectron spectrometer (VMI) reduces the influence of the existence of the VMI on the movement of the stored beam by setting a compensation electric field, and the photoelectron spectrum of the VMI is realized by measuring the space distance of the concentric point of the photoelectron signal drop point on the photoelectron detector, so that the continuous measurement accumulation of the signal can be realized, and the vertical type velocity image photoelectron spectrometer is designed to organically combine the beam storage with the measurement of the photoelectron spectrum.
Referring to fig. 1, cluster ions generated in a magnetron sputtering source 1 are guided to a quadrupole mass selector 2 through an ion guide rail for mass screening, then are injected into a low-temperature ion trap 3 through a beam shaping and deflecting lens for beam temperature control, and the cluster beams subjected to precise mass screening and temperature control are injected into an electrostatic storage ring 6 after flowing through a series of acceleration and shaping 4, wherein the kinetic energy of the injected beam is 5KeV, the beam stiffness is improved, the influence of space charge effect in the beam surrounding environment on the beam storage time is reduced, the length of the injected beam is smaller than 720mm (the single-arm length of a 90-degree electrostatic deflector), the beam spot size is compressed to be below 8mm, and the influence of an edge electric field is prevented. The electrostatic storage ring 6 comprises a 90-degree electrostatic deflector and a micro-channel detector 7 for measuring the beam shape/intensity of clustered ions, which are respectively used for beam deflection storage and beam detection, and because the VMI 8 measures the spatial distance of the concentric photoelectric signal falling points on the photoelectric detector, the continuous signal measurement accumulation can be realized, when the surrounding beam is accumulated to a certain intensity and approaches to a quasi-continuous beam, the ionizing laser 9 is operated at an extremely high frequency, so that the measurement which can only be finished on high-flux light pulses at present is met through the accumulation of weak light single pulses in time.
Referring to fig. 2, the vacuum system is divided into four parts according to use, namely a pre-pumping forevacuum unit a, an ultra-high vacuum unit B, a molecular pump string pumping unit C and an ultra-high vacuum unit D: as shown in fig. 2, the pre-pumping forevacuum unit a provides a primary (rough) vacuum environment for the post-stage ultra-high vacuum and ultra-high vacuum system, so as to reduce the use pressure of the post-stage molecular pump and improve the service life of the molecular pump, the mechanical structure comprises a pre-pumping pipeline (three sections are 16m in total, the diameter is 150 mm) and a 1.2m 3 mechanically reinforced high-vacuum buffer tank, The rough vacuum of 10 -1 Pa is achieved by a large pumping speed Roots pump P1 of 600m 3/s. the ultra-high vacuum unit B provides an ultra-high vacuum use environment for the magnetron sputtering source 1, the quadrupole mass selector 2, the low-temperature ion trap 3 and the beam optical shaping 4. All materials with good processing performance and suitable for an ultrahigh vacuum environment are selected, wherein the manufacturing materials of the cavity are mainly 316LN stainless steel with the surface subjected to the solution treatment by breaking, the flanges and the internal support materials are mainly 304L stainless steel with the surface subjected to the solution treatment by breaking, and the cavity is subjected to dehydrogenation, electrolytic polishing and high-temperature baking and degassing treatment after being processed. After 72h of vacuum baking and leak detection, the cavity of the magnetron sputtering source 1 carrying the pumping speed 2200L/s semi-magnetic spin molecular pump P2 reaches the ultra-high vacuum degree of 10 -6 Pa, the cavity of the quadrupole mass selector 2 carrying the pumping speed 1200L/s magnetic spin molecular pump P3 reaches the ultra-high vacuum degree of 10 -6 Pa, the cavity of the low-temperature ion trap 3 carrying the pumping speed 1200L/s magnetic spin molecular pump P4 reaches the ultra-high vacuum degree of 10 -7 Pa, The linear beam transmission and guide beam optical section cavity of the half-magnetic spin molecular pump P5 with the pumping speed of 1200L/s and the half-magnetic spin molecular pump P6 with the pumping speed of 700L/s achieves the ultra-high vacuum degree of 10 -7 Pa. the molecular pump serial pumping unit C is carried with a pumping speed of 300L/s and a semi-magnetic rotation floating molecular pump P7 provides a high vacuum forestage of 10 -5 Pa for the extremely high vacuum unit D, and according to the differential pumping and molecular pump serial pumping technology, the extremely high vacuum degree of 2X 10 -9 Pa is finally realized in the storage ring cavity after a plurality of weeks of continuous baking so as to increase the free range of gas molecules, further reduce the collision frequency among molecules, so that the beam is more stably stored in the ring. The vacuum cavity is a large square cavity with the thickness of 1 multiplied by 0.55m 3, the processing of the cavity needs to pay special attention to the number of welding seams and the processing and vacuum sealing mode besides the technical requirement of the ultra-high vacuum processing due to the extremely high vacuum use requirement, besides, a differential pumping cavity 5 and two small detector cavities are also provided, two half-magnetic rotary molecular pumps P11 and P12 with pumping speed of 2200L/s are carried as main molecular pumps, three 300L/s half-magnetic rotary molecular pumps P8, P9 and P10 are carried as auxiliary molecular pumps to realize ultra-high vacuum of 2 multiplied by 10 -8 Pa, A2X 10 -9 Pa extremely high vacuum is realized by mounting a composite ion pump P13 with a pumping speed of 2000L/s.
In addition to the above vacuum acquisition units, the vacuum system is also composed of a differential system in which a differential hole of 5mm in diameter and 3mm in length is provided between 1 and 2, a differential hole of 10mm in diameter and 5mm in length is provided between 2 and 3, a CF100 gate valve V1 and a differential hole of 10mm in diameter and 5mm in length is provided between 3 and 4, a CF63 gate valve V2 and a differential hole of 10mm in diameter and 5mm in length is provided between 4 and 5, and a differential hole of 10mm in diameter and 5mm in length is provided between 5 and 6.
Referring to fig. 3 and 4, two working modes are designed based on beam injection of a Wiley-Mclaren lens, fig. 3 is a parallel mode, a mass-selected cluster beam is deflected to a low-temperature ion trap 3 by an electrostatic quadrupole deflection lens, and an emergent beam in the trap is injected to a double-stage pulse field in the axial direction; fig. 4 shows a vertical mode, in which mass-selected cluster beam is directly injected into the low-temperature ion trap 3, and the outgoing beam in the trap is then injected into the center of the pulse field along the vertical axis direction. Two modes were compared: the parallel mode is convenient for beam detection after quality selection, and the flow is strong because the axial receiving degree of the Wiley-Mclaren lens is large; the vertical mode is applied to the high resolution mode, and because the emergent beam current in the trap has small energy dispersion in the axial direction and small spatial distribution, the current intensity is lower.
The manner of switching the two modes without changing the cavity is as follows:
with reference to fig. 3 and 4, the two modes are switched by adjusting the orientations of two eccentric flanges, namely, the support flange F1 of the low-temperature ion trap 3 and the flange F2 at the joint of the square cavity and the rear cavity where the low-temperature ion trap 3 is located, as follows: f1 the outer flange has a diameter of 16 inches, the inner flange has a diameter of 10 inches, the upper and lower eccentric is 59mm, and the left and right eccentric is 33.75mm; f2 outer flange size is 16 inches in diameter, and inner flange size is 10 inches in diameter, and concentric upper and lower, left and right eccentric 30mm. When the parallel mode is adopted, the eccentricity of F1 is adjusted to be 33.75mm higher than 59mm, the eccentricity of F2 is adjusted to be 30mm higher than the right, and when the vertical mode is switched, F1 and F2 are only required to be rotated 180 degrees clockwise.
Referring to fig. 3 and 4, the electron optical system according to the present invention is divided into a beam transmission and quality screening unit E, a beam temperature control unit F, a direct beam shaping and guiding unit G, and a beam storage and photoelectron spectroscopy unit H.
Referring to fig. 5, a beam transmission and mass screening unit E directs a beam of clusters generated in the magnetron sputtering source 1 into the quadrupole mass selector 2 and performs mass screening. The outlet diaphragm of the magnetron sputtering source 1 is a first-stage extraction electrode and is matched with an end mirror of a quadrupole ion guide rail to guide the cluster beam to the ion guide rail. Wherein the diameter of the diaphragm can be adjusted within the range of 1.5-23mm and is inclined by 15 degrees, so as to filter neutral particles generated in the magnetron sputtering source 1 and prevent the neutral particles from affecting the ion transmission of charged clusters; the ion guide rail is a self-made ion guide rail formed by the steps of diameter r 0 =10 mm and length L=132 mm of stainless steel rod, according to the r 0/r= 1.1487, the end mirror is an electrode plate with the outer diameter of 35mm, the inner diameter of 5mm and the thickness of 1.5mm is positioned at the front end of the rod by 85 mm.
Referring to fig. 6 and 7, fig. 6 and 7 are beam temperature controlling units F in parallel mode and vertical mode, respectively, which are divided into an injection section, a temperature controlling section and an extraction section.
In fig. 6, the injection section is sequentially composed of an electrostatic focusing lens 1, a differential electrode, an electrostatic deflection lens 1, an electrostatic focusing lens 2 and an electrostatic quadrupole deflection lens, and is used for accelerating and shaping the cluster ion beam current emitted from the quadrupole mass selector 2 and then injecting the cluster ion beam current into the temperature control section. The electrostatic focusing lens 1 consists of three electrodes, wherein the shape of the electrodes at two ends is the same, the outer diameter of the outer eave is 58mm, the thickness is 3mm, the outer diameter of the inner tube is 44mm in the middle, and the length of the whole inner diameter is 40mm and 26mm; the shape of the middle lens is that the two sides are provided with outer eaves with the outer diameter of 58mm and the thickness of 3mm, the middle is provided with an inner pipe with the outer diameter of 44mm, the whole inner diameter of 40mm and the length of 45mm, the outer eaves are designed for shielding fringe electric fields, and the distance between each two electrodes is 3mm. The differential electrode has an outer diameter of 58mm, a thickness of 3mm and a middle aperture of 10mm, and is used for vacuum differential pumping and beam guiding between a quadrupole rod cavity and a square cavity of the low-temperature ion trap 3. The electrostatic deflection lens 1 is composed of four half-moon electrodes, each two electrodes form a pair of deflection electrodes in one direction (X or Y), the gap is 20mm, and the gap between each pair of electrodes is 2mm. The electrostatic focusing lens 2 is of a shielding type flight tube structure, the overall outer diameter is 58mm, the thickness of a middle focusing electrode is 26mm, the lengths of two ends are 90mm, the electrode shielding adopts an L-shaped buckle eave, and the effect of focusing of the electrostatic focusing lens 1 is compensated, so that the condition that beam flows enter a Bender is met. The electrostatic quadrupole deflection lens consists of a group of 90-degree deflection electrodes and four groups of focusing electrode plates, the deflection electrodes are square structures with the side length of 38mm, the round bars with the outer diameter of 28mm and the length of 40mm are spliced after four petals are cut by two mutually perpendicular central lines, the focusing electrode plates consist of three electrode plates with the length of 38mm, the width of 50mm, the thickness of 1.5mm and the central aperture of 6mm, and the spacing of the electrode plates is 1mm. The Faraday cylinder is used for detecting the beam current guided to the electrostatic quadrupole deflection lens on the source line, the quadrupole beam current detector is used for detecting the cluster ion intensity after the mass selection, the potential of the 90-degree deflection electrode is reversed, and the beam current can be guided to the temperature control section.
The temperature control section consists of four-pole rods and a first end cover electrode, wherein the diameter of each rod is 8mm, the length of each rod is 154mm, the four-pole rods limit radial movement of cluster ion beam current, the first end cover electrode is 36mm in outer diameter, 6mm in inner hole and 1.5mm in thickness, axial movement of the cluster ion beam current is limited, and stored cluster ions collide with helium atoms cooled by a cold head to realize temperature control of 4-300+/-1K.
The extraction section consists of an acceleration lens group and a second end cover electrode, and is used for storing the rapid extraction of the cluster ion beam current to control the extraction kinetic energy distribution and the spatial distribution of the cluster ion beam current, wherein the acceleration lens group consists of two groups of 2mm thick electrode plates with the outer diameter of 36mm and the inner diameter of 6-24mm and the non-uniform gradient increase, each group has the same indirect potential, and the two groups have opposite potentials, so that a uniform gradient electric field with controllable 0- +/-200V distribution is realized.
In fig. 7, the injection section is sequentially composed of an electrostatic focusing lens 1, a differential electrode and an electrostatic deflection lens 1, and the temperature control section and the extraction section are the same as the parallel mode.
Referring to fig. 8 and 9, fig. 8 and 9 are respectively a linear beam transport and guide unit G in parallel mode and in vertical mode, which is divided into a cluster ion beam cluster length control section and a cluster ion beam flow energy control section.
The cluster ion beam length and kinetic energy control of fig. 8 is composed of a Wiley-Mclaren lens WM, a direct current accelerating lens group 1, an electrostatic focusing lens 3, an electrostatic deflecting lens 2, a long focusing lens and an electrostatic focusing lens 5, a direct current accelerating lens group 2, a reference flight tube, an electrostatic focusing lens 6, an electrostatic deflecting lens 3, an electrostatic focusing lens 7 and an electrostatic deflecting lens 4, wherein the kinetic energy of particles with the front end of the beam current led out from the low-temperature ion trap 3 is smaller, and after a long distance transmission, the particles with the rear end are overtaken with the front end of the beam current, so that the beam current is prolonged. Three-stage pulse acceleration and deceleration fields and two groups of direct current acceleration lens groups are designed, the length of the beam is controlled while the beam is accelerated, wherein an acceleration electric field in a low-temperature ion trap 3 is used as a first-stage pulse acceleration field, WM is used as a second-stage pulse acceleration and deceleration field, a reference flight tube is used as a third-stage pulse acceleration field, the third-stage pulse acceleration field is a flight tube with the outer diameter of 38mm, the inner diameter of 35mm and the length of 450mm, after the beam flows through the reference flight tube without gradient after being completely accelerated by direct current, the beam is rapidly (100 ns) converted into another potential, because an outlet is referenced to the ground, the beam is accelerated at the outlet of the reference flight tube, the direct current acceleration lens group 1 is formed by 4 flight tubes with the outer diameters of 60mm and the inner diameter of 20mm, The direct current accelerators composed of electrode plates with the thickness of 3.5mm and the distance of 5mm and through 1MΩ resistor voltage division are arranged, the kinetic energy of the beam flowing through the direct current accelerating lens group 1 is improved to about 200eV, the direct current accelerating lens group 2 is composed of 10 direct current accelerators composed of electrode plates with the outer diameter of 60mm and the inner diameter of 20mm and the thickness of 3.5mm and the distance of 5mm and through 1MΩ resistor voltage division, and the kinetic energy of the beam flowing through the direct current accelerating lens group 1 is improved to about 2 KeV. The electrostatic focusing lenses 3,5,6 and 7 and the electrostatic deflection lenses 2,3 and 4 are used for controlling the space shape of the beam and are convenient for beam transmission, wherein the electrostatic focusing lens 3 consists of three electrodes, the shape of the first two electrodes is the same, the outer diameter of the outer eave is 58mm, the thickness is 3mm, the outer diameter of the inner pipe is 44mm, and the whole inner diameter is 40mm and the length is 16mm; the third electrode is in the shape of an outer eave with the outer diameter of 58mm and the thickness of 3mm, an inner pipe with the outer diameter of 44mm and the whole inner diameter of 40mm and the length of 200mm, and the distance between each two electrodes is 5mm. The electrostatic focusing lens 5 has the same electrode shape as the electrostatic focusing lens 2. The electrostatic focusing lens 6 consists of three electrodes, wherein each electrode has the same shape, the outer diameter of the outer eave is 58mm, the thickness of the outer eave is 3mm, the outer diameter of the inner pipe is 44mm, the whole inner diameter is 40mm, the length of the inner pipe is 36mm, and the distance between each electrode is 5mm. The overall outer diameter of the electrostatic focusing lens 7 is 38mm, the thickness of the middle focusing electrode is 26mm, and the lengths of the two ends are 90mm. The electrostatic deflection lenses 2,3 and 4 are in the same shape as the electrostatic deflection lens 1, the long focusing lens is five electrodes with the outer diameter of 60mm, the inner diameter of 40mm and the length of 16mm, the electrodes are separated by 5mm from each other to form a direct current acceleration and deceleration field, and the direct current acceleration and deceleration field is focused by referring to the design of an optical anti-remote objective lens, so that the focal length of the lens is increased by focusing an acceleration field and defocusing a deceleration field. And shielding external eaves with the outer diameter of 80mm, the inner diameter of 40mm, the gap of 40mm and the gap of 50mm, the inner diameter of 30mm and the gap of 40mm are respectively added at the positions about 2mm away from the two sides of the sealing baffles V1 and V2, and are used for shielding the influence of the ground on the beam current electric field. finally, after the beam flow passes through the unit, the kinetic energy is improved to 5KeV, the length of the beam cluster is controlled below 200mm, and the size of the beam spot is controlled below 8 mm.
The cluster ion beam cluster length control section of fig. 9 is composed of a Wiley-Mclaren lens WM, a dc acceleration lens group 1, an electrostatic focusing lens 3, an electrostatic focusing lens 4, an electrostatic deflection lens 2, a long focusing lens, and an electrostatic focusing lens 5 in this order. The electrostatic focusing lens 4 is used for compensating the focusing effect of the electrostatic focusing lens 3, the overall outer diameter is 58mm, the thickness of the middle focusing electrode is 26mm, and the lengths of the two ends are 160mm. Cluster beam flow enables control of segment in parallel mode.
Referring to fig. 10, the storage ring unit is composed of four groups of 90 ° deflectors 1,2,3,4 and four groups of microchannel plate multipliers 1,2,3,4, each group of deflectors is composed of a 90 ° electrostatic quadrupole deflector and an electrostatic focusing lens, wherein a cylinder with an outer diameter of 90mm and a length of 150mm cuts four lobes with mutually perpendicular central lines to form a square center with a side length of 120mm, each lobe is surrounded by an outer circumference with a side length of 51mm, a thickness of 6mm, a height of 160mm, an L-shaped shielding electrode with a distance of 7mm, a side length of 65mm, a thickness of 8mm and a height of 190mm are arranged at a position 6mm from the shielding electrode, and the upper plate and the lower plate are matched with each other with a side length of 180mm and a thickness of 18mm to form a group of electrostatic quadrupole deflector. The electrostatic focusing lens consists of two side electrodes with the outer diameter of 74mm, the inner diameter of 72mm and the length of 20mm and a central electrode with the outer diameter of 74mm, the inner diameter of 72mm and the length of 120mm, and is integrally positioned in a shielding screen with the inner diameter of 100mm and the mesh of 100, and a 90-degree deflector is used for restricting the periodic movement track of the cluster ion beam current so as to ensure that the cluster ion beam current can be stored for a long time (in the second order). The four groups of detectors are respectively composed of a front/rear polar plate (MCP fixed) with the outer diameter of 60mm, the inner diameter of 27mm and the thickness of 2mm, and a conical anode with the outer diameter of 60mm, the thickness of 10mm and the distance of 45 DEG from the rear polar plate by 1mm, and are respectively used for detecting the beam intensity injected into the storage ring and the beam intensity in the moving direction in the circulating movement process.
Variations and modifications of the above embodiments will occur to those skilled in the art to which the invention pertains from the foregoing disclosure and teachings. Therefore, the present invention is not limited to the above-described embodiments, but is intended to be capable of modification, substitution or variation in light thereof, which will be apparent to those skilled in the art in light of the present teachings. In addition, although specific terms are used in the present specification, these terms are for convenience of description only and do not limit the present invention in any way.
Claims (8)
1. A deep level photoelectron spectroscopy device based on an electrostatic storage ring, comprising:
The magnetron sputtering source is used for providing high-current strong metal or semiconductor cluster ion beam current with controllable temperature;
the quadrupole mass selector is used for carrying out mass screening on cluster ion beam streams emitted by the magnetron sputtering source;
The low-temperature ion trap is used for controlling the temperature of the cluster ion beam current with the quality screened by the quadrupole mass selector;
the beam optical shaping section is used for accelerating and shaping the cluster ion beam with certain mass and temperature emitted from the low-temperature ion trap and injecting the cluster ion beam into the electrostatic storage ring;
The electrostatic storage ring is used for restraining the beam to do annular motion and improving the beam intensity of the beam in an order of magnitude;
The vertical distribution electric field compensation type speed image photoelectron spectrometer is used for measuring the angle-resolved laser photoelectron spectrum and the compensation electrode arranged in the vertical direction is used for measuring the photoelectron spectrum without influencing the annular movement of the beam current.
2. A deep level photoelectron spectroscopy device based on an electrostatic storage ring as claimed in claim 1, wherein: the vacuum environment of the magnetron sputtering source is 10 -6 Pa, the vacuum environment of the quadrupole mass selector is 10 -6 Pa, the square cavity where the low-temperature ion trap is located is 10 -6 Pa, the vacuum environment of the beam optical shaping section is 10 -7 Pa, and the vacuum cavity of the electrostatic storage ring is 10 -9 Pa.
3. A deep level photoelectron spectroscopy device based on an electrostatic storage ring as claimed in claim 1, wherein: the magnetron sputtering source is a source outlet diaphragm, and has a 15-degree deflection angle with the axis, and is used for separating charged ions and neutral particles.
4. A deep level photoelectron spectroscopy device based on an electrostatic storage ring as claimed in claim 1, wherein: the quadrupole mass selector is provided with ion guide and mass screening, the ion guide is provided with a stainless steel electrode plate for extracting beam current, and the mass screening is provided with a front guide rod, a rear guide rod and a mass analysis rod.
5. A deep level photoelectron spectroscopy device based on an electrostatic storage ring as claimed in claim 1, wherein: the low-temperature ion trap is provided with an injection section, a temperature control section and an extraction section, wherein the injection section comprises a group of electrostatic focusing lenses, a group of electrostatic deflection lenses, a group of electrostatic focusing lenses and a group of electrostatic four-stage deflection lenses which are sequentially arranged, and the injection section is used for accelerating and shaping cluster ion beam current emitted from the quadrupole mass selector and then injecting the cluster ion beam current into the temperature control section; the temperature control section comprises quadrupole rods and a first end cover electrode, wherein the quadrupole rods are used for limiting radial movement of the cluster ion beam, and the first end cover electrode is used for limiting axial movement of the cluster ion beam; the extraction section comprises an acceleration lens group and a second end cover electrode and is used for storing the rapid extraction of the cluster ion beam current and controlling the extraction kinetic energy distribution and the spatial distribution of the cluster ion beam current.
6. A deep level photoelectron spectroscopy device based on an electrostatic storage ring as claimed in claim 1, wherein: the vacuum chamber of the electrostatic storage ring is a stainless steel square chamber.
7. A deep level photoelectron spectroscopy device based on an electrostatic storage ring as claimed in claim 1, wherein: the electrostatic storage ring comprises a four-stage vacuum serial pumping module for realizing extremely high vacuum degree.
8. A deep level photoelectron spectroscopy device based on an electrostatic storage ring as claimed in claim 1, wherein: the electrostatic storage ring is internally provided with four micro-channel detectors which are respectively used for detecting the beam intensity injected in each direction.
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| CN102169791A (en) * | 2010-02-05 | 2011-08-31 | 岛津分析技术研发（上海）有限公司 | Tandem mass spectrometry apparatus and mass spectrometry method |
| CN107507754A (en) * | 2017-08-02 | 2017-12-22 | 金华职业技术学院 | It is a kind of to be used to study the method that ionic light excites rear product |
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| DE2340372A1 (en) * | 1973-08-09 | 1975-02-20 | Max Planck Gesellschaft | DOUBLE FOCUSING MASS SPECTROMETER HIGH ENTRANCE APERTURE |
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| JP3663716B2 (en) * | 1996-02-05 | 2005-06-22 | 株式会社日立製作所 | Quadrupole ion storage ring |
| US6420699B1 (en) * | 1998-09-30 | 2002-07-16 | President And Fellows Of Harvard College | Method and apparatus for altering the velocity of molecules |
| JP3859437B2 (en) * | 2000-08-04 | 2006-12-20 | 株式会社東芝 | Charged beam exposure system |
| GB2404784B (en) * | 2001-03-23 | 2005-06-22 | Thermo Finnigan Llc | Mass spectrometry method and apparatus |
| JP2007322411A (en) * | 2006-05-02 | 2007-12-13 | Univ Of Tokyo | Measuring method and analytical method of energy level |
| US8680479B2 (en) * | 2007-05-09 | 2014-03-25 | Shimadzu Corporation | Charged particle analyzer |
| CN102442630B (en) * | 2010-09-30 | 2015-09-09 | 贺思源 | Translation rotary mechanism based on bidirectional or multidirectional electrostatic driver |
| US9867272B2 (en) * | 2012-10-17 | 2018-01-09 | Cornell University | Generation and acceleration of charged particles using compact devices and systems |
| CN105632873B (en) * | 2014-10-28 | 2018-03-27 | 中国科学院大连化学物理研究所 | One kind is used for mass spectrographic ion optical path electrostatic convergence deviation device |
| DE102016125585B4 (en) * | 2016-12-23 | 2019-01-17 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | Optics for electrons from an object, use thereof in a spectrometer for X-ray photoelectron spectroscopy for electrons from an object and spectrometer |
| CN107768230B (en) * | 2017-10-31 | 2023-12-19 | 天津智谱仪器有限公司 | Second-order proton transfer reaction ion source device and application method thereof |
| JP2020060739A (en) * | 2018-10-12 | 2020-04-16 | 富士ゼロックス株式会社 | Image forming apparatus and process cartridge |
| CN109887817A (en) * | 2019-04-03 | 2019-06-14 | 郭盘林 | A kind of beam bending device of electrostatic multi-path |
| CN110534385A (en) * | 2019-09-09 | 2019-12-03 | 中国科学院合肥物质科学研究院 | A kind of electric quadrupole lens group with integrated membrane-electrode stick |
| CN112951702B (en) * | 2019-12-10 | 2023-01-03 | 中国科学院大连化学物理研究所 | Ion control and transmission device for mass spectrometer |
| CN111105984A (en) * | 2019-12-25 | 2020-05-05 | 清华大学 | Nested Faraday cylinder-based high-field asymmetric waveform ion mobility spectrometer |
| JP2022002436A (en) * | 2020-06-19 | 2022-01-06 | 捷夫 酒井 | Image force driven electrostatic generator using rechargeable charge injection method |
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| CN107507754A (en) * | 2017-08-02 | 2017-12-22 | 金华职业技术学院 | It is a kind of to be used to study the method that ionic light excites rear product |
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