CN103821506A - Three-dimensional array imaging measurement method for resistivity of well surrounding medium - Google Patents
Three-dimensional array imaging measurement method for resistivity of well surrounding medium Download PDFInfo
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Abstract
The invention discloses a three-dimensional array imaging measurement method for the resistivity of a well surrounding medium. The method comprises the following steps: I, placing a detector into a well, wherein the detector is provided with an array direction electrode system, the array direction electrode system comprises a plurality of electrodes and works in a plurality of different working modes, each working mode corresponds to one type of electric field distribution, and signals are transmitted at different working frequencies in each working mode; II, calculating a plurality of array lateral curves; III, calculating a plurality of direction lateral curves; IV, imaging the direction lateral curves to obtain a well surrounding 360-degree numerical simulation imaging pattern; V, analyzing the resistivity of heterogeneity stratums in different directions around a well through the array lateral curves, the direction lateral curves and the well surrounding imaging pattern, evaluating inclined wells, highly-deviated wells, horizontal wells, thin layers, heterogeneity stratums, non-induced fractures and holes, quantitatively explaining the resistivity of flushed zones, invasion zones and undisturbed formations, and judging the radiuses of the invasion zones and the flushed zones.
Description
Technical field
The present invention is about a kind of array orientation laterolog method, refers to especially a kind of well week resistivity of media cubical array imaging measurement method and for realizing the array orientation electrode system of the method.
Background technology
Along with In Oil Field Exploration And Development needs, the required precision of evaluating reservoir is more and more higher, and logger is also at development.Some traditional loggers more and more can not meet the requirement of log analysis, especially the careful description to inclined shaft, high angle hole, horizontal well, thin layer, inhomogeneous formation, non-induction crack and solution cavity and quantitatively directed flushed zone, invaded zone, the virgin zone resistivity explained, judge invaded zone radius, flushed zone radius etc.
Original array side adopts hardware to focus on to instrument, circuit is realized main monitoring control by closed loop, be subject to peripheral environment to affect large (as variations in temperature, power-supply fluctuation etc.), hardware focuses on residual voltage between monitor electrode and cannot eliminate, focusing effect is poor, and be subject to shoulder effect longitudinal frame high not enough, can not provide well all heterogeneous body information simultaneously.Microresistivity scanner and well week, scanning imagery can do orientation analysis to wellbore medium, but investigative range is very shallow, and there is no resolving ability for the primary seam hole in induction seam hole that in some drilling process, induction produces and stratum.
Summary of the invention
In view of this, main purpose of the present invention be to provide a kind of can fine evaluation stratum and the well week resistivity of media cubical array imaging measurement method of abundant information is provided.
For achieving the above object, the invention provides all resistivity of media cubical arraies of a kind of well imaging measurement method, the method comprises:
Step 1, probe is placed in well, this probe is provided with array orientation electrode system, this array orientation electrode system comprises multiple electrodes, this array orientation electrode system works in multiple different working modes, every kind of mode of operation, corresponding to a kind of Electric Field Distribution, is sent signal with a kind of different operating frequency under every kind of mode of operation;
Step 2, generate many strip arrays side direction curve according to array orientation electrode system in the parameter under different working modes;
Step 3, parameter according to array orientation electrode system under different working modes generate many orientation side direction curves;
Step 4, obtain well week 360 ° of numerical simulation images by above-mentioned many orientation side direction curves through imagings;
Step 5, by array side to curve, orientation side direction curve and well week image analyze the resistivity of well week different azimuth inhomogeneous formation, and evaluate inclined shaft, high angle hole, horizontal well, thin layer, inhomogeneous formation, non-induction crack and solution cavity and quantitative interpretation flushed zone, invaded zone, virgin zone resistivity, judge invaded zone radius, flushed zone radius.
Described array orientation electrode system comprises the lateral electrodes ring being arranged symmetrically with being embedded on insulating carrier and the azimuthal electrodes ring that is positioned at probe central authorities, this azimuthal electrodes ring comprises multiple azimuthal electrodes, this lateral electrodes ring is made up of the multipair lateral electrodes symmetrical with respect to this azimuthal electrodes ring, every pair of lateral electrodes comprises two lateral electrodes that are symmetrically distributed in these azimuthal electrodes ring both sides, these azimuthal electrodes ring both sides are respectively provided with a main electrode symmetrical with respect to azimuthal electrodes ring, this main electrode is between this azimuthal electrodes ring and lateral electrodes, these azimuthal electrodes ring both sides are respectively provided with a monitor electrode symmetrical with respect to azimuthal electrodes ring, this monitor electrode is between this main electrode and lateral electrodes, between homonymy electrode, use wire short circuit to keep equipotential.
Described main electrode transmitting principal current, described lateral electrodes under different working modes as emission electrode emission current, again focusing electrode received current simultaneously, wherein at least one pair of inboard lateral electrodes near described azimuthal electrodes ring is emission electrode, other are focusing electrode to the lateral electrodes in outside, and each emission electrode equates with each focusing electrode difference current potential.
Described azimuthal electrodes ring is made up of 12 azimuthal electrodes equal angles intervals, and single azimuthal electrodes radian is 10 °, between adjacent two azimuthal electrodes centers, is 30 °.
Described lateral electrodes ring comprises successively from inside to outside the first lateral electrodes, the second lateral electrodes, the 3rd lateral electrodes, the 4th lateral electrodes, the 5th lateral electrodes and the 6th lateral electrodes centered by this azimuthal electrodes ring.
Described mode of operation comprises: mode of operation 0, and described main electrode is sent constant current, turns back to each lateral electrodes; Mode of operation 1, the first lateral electrodes is emission electrode, and the second lateral electrodes, the 3rd lateral electrodes, the 4th lateral electrodes, the 5th lateral electrodes and the 6th lateral electrodes are focusing electrode; Mode of operation 2, the first lateral electrodes and the second lateral electrodes are emission electrode, and the 3rd lateral electrodes, the 4th lateral electrodes, the 5th lateral electrodes and the 6th lateral electrodes are focusing electrode; Mode of operation 3, the first lateral electrodes, the second lateral electrodes, the 3rd lateral electrodes are emission electrode, and the 4th lateral electrodes, the 5th lateral electrodes and the 6th lateral electrodes are focusing electrode; Mode of operation 4, the first lateral electrodes, the second lateral electrodes, the 3rd lateral electrodes, the 4th lateral electrodes are emission electrode, and the 5th lateral electrodes and the 6th lateral electrodes are focusing electrode; Mode of operation 5, the first lateral electrodes, the second lateral electrodes, the 3rd lateral electrodes, the 4th lateral electrodes, the 5th lateral electrodes are emission electrode, and the 6th lateral electrodes is focusing electrode; Under each mode of operation, each emission electrode keeps current potential to equate, each focusing electrode keeps current potential to equate.
In described step 1, for different investigation depths, measure respectively the potential difference between each azimuthal electrodes and described main electrode, measure the potential difference between each azimuthal electrodes and described monitor electrode, measure the potential difference between described main electrode and focusing electrode.
In described step 2, utilize the potential difference between potential difference and each azimuthal electrodes and the described monitor electrode between main electrode and focusing electrode to calculate multiple array side to curve, in described step 3, utilize the potential difference between potential difference and each azimuthal electrodes and the described monitor electrode between each azimuthal electrodes and main electrode to calculate multiple orientation side direction curve.
When described main electrode is emission electrode, each when lateral electrodes is focusing electrode, utilize potential difference between each azimuthal electrodes and monitor electrode and the emission current computation of mud resistivity of main electrode.
The corresponding a kind of different investigation depth of each mode of operation, calculates a corresponding strip array side direction curve in each investigation depth, calculates the corresponding orientation side direction curve identical with described azimuthal electrodes quantity in each investigation depth.
Method of the present invention can improve longitudinal frame, deepens the horizontal detection degree of depth, shortens the length of original array side to instrument, for execute-in-place brings convenience.According to many orientation side direction curves in each investigation depth well week, draw respectively the well week resistivity imaging figure of multiple investigation depths, can careful description inclined shaft, high angle hole, horizontal well, thin layer, inhomogeneous formation, non-induction crack and quantitatively directed flushed zone, invaded zone, the virgin zone resistivity explained, judge invaded zone radius, flushed zone radius, and can realize the well week imaging effect with certain resolution.
Accompanying drawing explanation
Fig. 1 is the array orientation electrode system structure chart using in all resistivity of media cubical arraies of well of the present invention imaging measurement method;
Fig. 2 is mode of operation 0 distribution map of the electric field in the present invention;
Fig. 3 is mode of operation 1 distribution map of the electric field in the present invention;
Fig. 4 is mode of operation 2 distribution map of the electric field in the present invention;
Fig. 5 is mode of operation 3 distribution map of the electric field in the present invention;
Fig. 6 is mode of operation 4 distribution map of the electric field in the present invention;
Fig. 7 is mode of operation 5 distribution map of the electric field in the present invention;
Fig. 8 is 2m decreased resistance invasion resistive formation numerical simulation five strip array side direction curve synoptic diagrams in the present invention;
Fig. 9 is investigation depth well week imaging schematic diagram in the numerical simulation of the other 0.2m radius of well hole in the present invention;
Figure 10 be in the present invention 60 ° of inclination angles of 1m low-resistance without investigation depth well week imaging schematic diagram in invaded formation numerical simulation;
Figure 11 is investigation depth well week imaging schematic diagram in 50 μ m crack 75° inclination angle stratum numerical simulations in the present invention;
Figure 12 is the flow chart of steps of all resistivity of media cubical arraies of well of the present invention imaging measurement method.
The specific embodiment
For ease of method of the present invention and the effect that reaches are had to further understanding, the existing preferred embodiment that develops simultaneously is by reference to the accompanying drawings described in detail as follows.
In conjunction with Figure 12 and Fig. 1 to Fig. 7, all resistivity of media cubical arraies of well of the present invention imaging measurement method is described.In the present invention, be first in well by an elongated cylinder probe, this probe is provided with array orientation electrode system, as shown in Figure 1, this array orientation electrode system is made up of the azimuthal electrodes ring that is embedded in the symmetrical lateral electrodes ring on insulating carrier and is positioned at probe central authorities.Array orientation electrode system is made up of mandrel, metal electrode and glass fibre reinforced plastic insulating body or rubber bar isolator.Be positioned at the azimuthal electrodes ring M0 of instrument central authorities by i.e. 12 azimuthal electrodes of 12 coil M01 ~ M012() equal angles interval formation, single azimuthal electrodes radian is 10 °, between adjacent two azimuthal electrodes centers, is 30 °, but is not limited to 12 azimuthal electrodes.Azimuthal electrodes ring M0 both sides are transmitting main electrode A0 principal current and that be arranged symmetrically with (A0 '), main electrode A0(A0 ') arrange respectively successively outward again the lateral electrodes ring being formed to electrode by limit for length's shielded side by 6 pairs of symmetrical short-circuits, be respectively the first lateral electrodes A1 (A1 '), the second lateral electrodes A2 (A2 '), the 3rd lateral electrodes A3 (A3 '), the 4th lateral electrodes A4 (A4 '), the 5th lateral electrodes A5 (A5 ') and the 6th lateral electrodes A6 (A6 '), each lateral electrodes comprises that two are arranged in azimuthal electrodes ring M0 both sides and symmetrical electrode, the each of lateral electrodes ring is emission electrode to lateral electrodes under different mode, again focusing electrode simultaneously.Between main electrode A0 (A0 ') and the first lateral electrodes A1 (A1 '), be provided with a pair of monitor electrode M1 (M1 '), electrode arrangement is about azimuthal electrodes ring M0 symmetry, between homonymy electrode, use wire short circuit to keep equipotential, two monitor electrode current potentials equate, two main electrode current potentials are equal, and two electrode potentials of every pair of lateral electrodes equate.Lateral electrodes ring in the present invention is not limited to 6 pairs of lateral electrodes.
The multiple different operating frequency of well week resistivity of media cubical array imaging measurement system employing of the present invention is sent signal, the corresponding a kind of mode of operation of signal of every kind of operating frequency, every kind of corresponding a kind of Electric Field Distribution of mode of operation, in the present invention take the signal of 35HZ, 70HZ, 105HZ, 140HZ, 210HZ, six kinds of operating frequencies of 280HZ as example, but not as limit, can also be other multiple better operating frequencies, six kinds of six kinds of different Electric Field Distribution corresponding to mode of operation are called AL0 ~ AL5, as shown in Figures 2 to 7.
As shown in Figure 2, mode of operation AL0 of the present invention, signal frequency adopts 35HZ, main electrode A0(A0 ') send principal current, electric current flows out from A0 (A0 '), turns back to electrode A 1-A6 (A1 '-A6 '), keeps A1-A6 (A1 '-A6 ') current potential to equate.Measure the potential difference between each azimuthal electrodes (M01-M012) and main electrode A0, obtain
; Measure the potential difference between each azimuthal electrodes (M01-M012) and monitor electrode M1, obtain
; Measure the potential difference between main electrode A0 and the 6th lateral electrodes A6, obtain
.
As shown in Figure 3, mode of operation AL1 of the present invention, signal frequency adopts 70HZ, the first lateral electrodes A1 (A1 ') emission current, the second lateral electrodes A2 (A2 '), the 3rd lateral electrodes A3 (A3 '), the 4th lateral electrodes A4 (A4 '), the 5th lateral electrodes A5 (A5 ') and the 6th lateral electrodes A6 (A6 ') be as focusing electrode received current, keeps A2 (A2 '), A3 (A3 '), A4 (A4 '), A5 (A5 '), A6 (A6 ') current potential to equate when measurement.Measure the potential difference between each azimuthal electrodes and main electrode A0, obtain
; Measure the potential difference between each azimuthal electrodes and monitor electrode M1, obtain
; Measure the potential difference between main electrode A0 and the 6th lateral electrodes A6, obtain
.
As shown in Figure 4, mode of operation AL2 of the present invention, signal frequency adopts 105HZ, the first lateral electrodes A1 (A1 '), the second lateral electrodes A2 (A2 ') emission current, the 3rd lateral electrodes A3 (A3 '), the 4th lateral electrodes A4 (A4 '), the 5th lateral electrodes A5 (A5 '), the 6th lateral electrodes A6 (A6 ') receive, when measurement, keep A1 (A1 '), A2 (A2 ') current potential to equate, keep A3 (A3 '), A4 (A4 '), A5 (A5 '), A6 (A6 ') current potential to equate simultaneously.Measure the potential difference between each azimuthal electrodes and main electrode A0, obtain
; Measure the potential difference between each azimuthal electrodes and monitor electrode M1, obtain
; Measure the potential difference between main electrode A0 and the 6th lateral electrodes A6, obtain
.
As shown in Figure 5, mode of operation AL3 of the present invention, signal frequency adopts 140HZ, the first lateral electrodes A1 (A1 '), the second lateral electrodes A2 (A2 '), the 3rd lateral electrodes A3 (A3 ') emission current, the 4th lateral electrodes A4 (A4 '), the 5th lateral electrodes A5 (A5 '), the 6th lateral electrodes A6 (A6 ') receive, when measurement, keep A1 (A1 '), A2 (A2 '), A3 (A3 ') current potential to equate, keep A4 (A4 '), A5 (A5 '), A6 (A6 ') current potential to equate simultaneously.Measure the potential difference between each azimuthal electrodes and main electrode A0, obtain
; Measure the potential difference between each azimuthal electrodes and monitor electrode M1, obtain
; Measure the potential difference between main electrode A0 and the 6th lateral electrodes A6, obtain
.
As shown in Figure 6, mode of operation AL4 of the present invention, signal frequency adopts 210HZ, the first lateral electrodes A1 (A1 '), the second lateral electrodes A2 (A2 '), the 3rd lateral electrodes A3 (A3 '), the 4th lateral electrodes A4 (A4 ') emission current, the 5th lateral electrodes A5 (A5 '), the 6th lateral electrodes A6 (A6 ') receive, when measurement, keep A1 (A1 '), A2 (A2 '), A3 (A3 '), A4 (A4 ') current potential to equate, keep A5 (A5 '), A6 (A6 ') current potential to equate simultaneously.Measure the potential difference between each azimuthal electrodes and main electrode A0, obtain
; Measure the potential difference between each azimuthal electrodes and monitor electrode M1, obtain
; Measure the potential difference between main electrode A0 and the 6th lateral electrodes A6, obtain
.
As shown in Figure 7, mode of operation AL5 of the present invention, signal frequency adopts 280HZ, the first lateral electrodes A1 (A1 '), the second lateral electrodes A2 (A2 '), the 3rd lateral electrodes A3 (A3 '), the 4th lateral electrodes A4 (A4 '), the 5th lateral electrodes A5 (A5 ') emission current, the 6th lateral electrodes A6 (A6 ') receives, and keeps A1 (A1 '), A2 (A2 '), A3 (A3 '), A4 (A4 '), A5 (A5 ') current potential to equate when measurement.Measure the potential difference between each azimuthal electrodes and main electrode A0, obtain
, measure the potential difference between each azimuthal electrodes and monitor electrode M1, obtain
, measure the potential difference between main electrode A0 and the 6th lateral electrodes A6, obtain
.
Under mode of operation AL0, because principal current does not focus on, refurn electrode is very near again, main mud and the wellbore effect surveyed under this mode of operation.The mud resistivity design formulas obtaining is:
Wherein
for mud resistivity under Mode A L0,
for mud resistivity calibration factor under Mode A L0,
for the electric current of main electrode A0 under Mode A L0.
AL0 pattern and AL1 ~ AL5 pattern are combined respectively to the array side that obtains five kinds of different investigation depths to curve and orientation side direction curve.
Order
, wherein
Five strip array side direction curve calculation formula are:
Orientation side direction curve calculation formula in five investigation depths is:
Wherein
,
be respectively
the array side of individual investigation depth is to curve and resistivity calibration factor,
,
be respectively
individual investigation depth
individual orientation side direction curve and resistivity calibration factor, therefore, can obtain 5 strip array side direction curves and 60 orientation side direction curves of five different investigation depths in the present invention.
The five strip array side direction curves that obtain and 60 orientation side direction curve investigation depths are progressively deepened, and the permeable formation on stratum, impervious bed obtain becoming more meticulous point, can obtain the azimuth information in different investigation depths simultaneously.
Specific embodiment is below all the geologic parameter by specific geological model is set respectively, the signal numerical value response of using the apparatus structure parameter after aforementioned calculation method and optimization to obtain, can obtain numerical curve and imaging figure accurately and effectively by these signal numerical value of Treatment Analysis, accuracy and the validity of the inventive method has well been described.
The example that Fig. 8 provides is that reservoir thickness is 2m, and the invaded zone degree of depth is 0.5m, mud resistivity R
mfbe 0.1 Ω m, shoulder-bed resistivity (SBR) R
sbe 1 Ω m, invaded zone resistivity R
xobe 10 Ω m, virgin zone resistivity R
tbe 30 Ω m, five high-resolution array side direction curve synoptic diagrams that obtain in this case, in practical application, can calculate quantitative interpretation flushed zone, invaded zone, virgin zone resistivity according to these different inversions of curves, judge invaded zone radius, flushed zone radius.
The example that Fig. 9 provides is that other certain the 0.05m place, hole frontier distance well border, orientation of well has the hole that a radius is 0.2m, hole inner stuffing resistivity is 1 Ω m, shoulder-bed resistivity (SBR) is 3000 Ω m, the well week 360 ° of numerical simulation images that obtain through imaging according to 12 of middle investigation depth orientation side direction curves.The image that can obtain five different investigation depths in the present invention, the image of only getting middle investigation depth herein explains.The numerical value of the image-forming information obtaining by observation instrument and form, contribute to judge the hole degree of depth, orientation, size and hole resistivity.First can on image, find out intuitively it is that a hole exists, the degree of depth that wherein numerical value obviously diminishes is between 99.8m ~ 100.2m, orientation is between 330 ° ~ 30 °, the minimum 1500 Ω m that drop to of azimuthal resistivity, these are all consistent with the hole information arranging, and these data that obtain when actual use are all the useful information that judges the hole degree of depth, orientation, size and hole resistivity.
The example that Figure 10 provides be bed thickness be 1m without invading low-resistance reservoir, reservoir resistivity 2 Ω m, shoulder-bed resistivity (SBR) is 20 Ω m, the well week 360 ° of numerical simulation images that obtain in the lower investigation depth of situation of 60 ° of reservoir inclinations, the numerical values recited of the image-forming information obtaining by instrument and imaging form, contribute to depth of stratum, azimuth tendency and the inclination size of describing reservoir, the orientation discrepancy information of careful description high angle hole and horizontal well.First can on image, find out intuitively it is the existence on a large gradient stratum, the degree of depth that wherein numerical value obviously diminishes is between 99.5m ~ 100.5m, bed boundary form between 0 ° ~ 360 °, orientation is recessed, the minimum 2 Ω m left and right of being down to of azimuthal resistivity, these are all consistent with the oblique formation information arranging, and these data that obtain when actual use are all to judge the tiltedly useful information of layer depth, azimuth tendency and inclination size.
The example that Figure 11 provides is that the open width of microcrack is 50 μ m, reservoir resistivity is 3000 Ω m, the resistivity of microcrack is 1 Ω m, the well week 360 ° of numerical simulation images that obtain in the lower investigation depth of situation of 75 ° of microcrack inclinations, the numerical values recited of the image-forming information obtaining by instrument and imaging form, contribute to describe depth of stratum, azimuth tendency and the inclination size of formation fracture, the azimuth information in non-induction crack, careful description stratum.First can on image, find out intuitively it is the existence of a high angle fracture, the degree of depth that wherein numerical value obviously diminishes is between 99.6m ~ 100.6m, bed boundary form between 0 ° ~ 360 °, orientation is for obviously recessed, the minimum 100 Ω m left and right of being down to of azimuthal resistivity, these are all consistent with the high angle micro fracture information arranging, and these data that obtain when actual use are all the useful information that judges the fracture formation degree of depth, azimuth tendency and inclination size.
The present invention is by changing electrode system structure, shorten array side to tool length, improve longitudinal frame, strengthen the horizontal detection degree of depth, adopt soft or hard to focus on combination, utilize electric field superposition principle focus current, focused condition is unconditionally met, and has improved certainty of measurement, has also made up the deficiency of hard focusing, thereby reduced by shoulder effect, become the effective implementation method that improves longitudinal frame.In obtaining high resolution ratio array side direction curve, can obtain five different investigation depth array side to all images of curve, orientation side direction curve and well by array orientation electrode system, for providing, logging evaluation more enriches effective well logging information, can obtain the resistivity of well week different azimuth inhomogeneous formation, thereby can fine evaluation inclined shaft, high angle hole, horizontal well, thin layer, inhomogeneous formation, non-induction crack and solution cavity and quantitative interpretation flushed zone, invaded zone, virgin zone resistivity, judge invaded zone radius, flushed zone radius.
The above, be only preferred embodiment of the present invention, is not intended to limit protection scope of the present invention.
Claims (10)
1. all resistivity of media cubical arraies of a well imaging measurement method, is characterized in that, the method comprises:
Step 1, probe is placed in well, this probe is provided with array orientation electrode system, this array orientation electrode system comprises multiple electrodes, this array orientation electrode system works in multiple different working modes, every kind of mode of operation, corresponding to a kind of Electric Field Distribution, is sent signal with a kind of different operating frequency under every kind of mode of operation;
Step 2, generate many strip arrays side direction curve according to array orientation electrode system in the parameter under different working modes;
Step 3, parameter according to array orientation electrode system under different working modes generate many orientation side direction curves;
Step 4, obtain well week 360 ° of numerical simulation images by above-mentioned many orientation side direction curves through imagings;
Step 5, by array side to curve, orientation side direction curve and well week image analyze the resistivity of well week different azimuth inhomogeneous formation, and evaluate inclined shaft, high angle hole, horizontal well, thin layer, inhomogeneous formation, non-induction crack and hole and quantitative interpretation flushed zone, invaded zone, virgin zone resistivity, judge invaded zone radius, flushed zone radius.
2. all resistivity of media cubical arraies of well as claimed in claim 1 imaging measurement method, it is characterized in that, described array orientation electrode system comprises the lateral electrodes ring being arranged symmetrically with being embedded on insulating carrier and the azimuthal electrodes ring that is positioned at probe central authorities, this azimuthal electrodes ring comprises multiple azimuthal electrodes, this lateral electrodes ring is made up of the multipair lateral electrodes symmetrical with respect to this azimuthal electrodes ring, every pair of lateral electrodes comprises two lateral electrodes that are symmetrically distributed in these azimuthal electrodes ring both sides, these azimuthal electrodes ring both sides are respectively provided with a main electrode symmetrical with respect to azimuthal electrodes ring, this main electrode is between this azimuthal electrodes ring and lateral electrodes, these azimuthal electrodes ring both sides are respectively provided with a monitor electrode symmetrical with respect to azimuthal electrodes ring, this monitor electrode is between this main electrode and lateral electrodes, between homonymy electrode, use wire short circuit to keep equipotential.
3. all resistivity of media cubical arraies of well as claimed in claim 2 imaging measurement method, it is characterized in that, described main electrode transmitting principal current, described lateral electrodes under different working modes as emission electrode emission current, simultaneously again as focusing electrode received current, wherein at least one pair of inboard lateral electrodes near described azimuthal electrodes ring is emission electrode, and other are focusing electrode to the lateral electrodes in outside, and each emission electrode equates with each focusing electrode difference current potential.
4. all resistivity of media cubical arraies of well as claimed in claim 2 imaging measurement method, it is characterized in that, described azimuthal electrodes ring is made up of 12 azimuthal electrodes equal angles intervals, and single azimuthal electrodes radian is 10 °, between adjacent two azimuthal electrodes centers, is 30 °.
5. all resistivity of media cubical arraies of well as claimed in claim 2 imaging measurement method, it is characterized in that, described lateral electrodes ring comprises successively from inside to outside the first lateral electrodes, the second lateral electrodes, the 3rd lateral electrodes, the 4th lateral electrodes, the 5th lateral electrodes and the 6th lateral electrodes centered by this azimuthal electrodes ring.
6. all resistivity of media cubical arraies of well as claimed in claim 5 imaging measurement method, is characterized in that, described mode of operation comprises: mode of operation 0, and described main electrode is sent constant current, turns back to each lateral electrodes; Mode of operation 1, the first lateral electrodes is emission electrode, and the second lateral electrodes, the 3rd lateral electrodes, the 4th lateral electrodes, the 5th lateral electrodes and the 6th lateral electrodes are focusing electrode; Mode of operation 2, the first lateral electrodes and the second lateral electrodes are emission electrode, and the 3rd lateral electrodes, the 4th lateral electrodes, the 5th lateral electrodes and the 6th lateral electrodes are focusing electrode; Mode of operation 3, the first lateral electrodes, the second lateral electrodes, the 3rd lateral electrodes are emission electrode, and the 4th lateral electrodes, the 5th lateral electrodes and the 6th lateral electrodes are focusing electrode; Mode of operation 4, the first lateral electrodes, the second lateral electrodes, the 3rd lateral electrodes, the 4th lateral electrodes are emission electrode, and the 5th lateral electrodes and the 6th lateral electrodes are focusing electrode; Mode of operation 5, the first lateral electrodes, the second lateral electrodes, the 3rd lateral electrodes, the 4th lateral electrodes, the 5th lateral electrodes are emission electrode, and the 6th lateral electrodes is focusing electrode; Under each mode of operation, each emission electrode keeps current potential to equate, each focusing electrode keeps current potential to equate.
7. all resistivity of media cubical arraies of well as claimed in claim 3 imaging measurement method, it is characterized in that, in described step 1, for different investigation depths, measure respectively the potential difference between each azimuthal electrodes and described main electrode, measure the potential difference between each azimuthal electrodes and described monitor electrode, measure the potential difference between described main electrode and focusing electrode.
8. all resistivity of media cubical arraies of well as claimed in claim 7 imaging measurement method, it is characterized in that, in described step 2, utilize the potential difference between potential difference and each azimuthal electrodes and the described monitor electrode between main electrode and focusing electrode to calculate multiple array side to curve, in described step 3, utilize the potential difference between potential difference and each azimuthal electrodes and the described monitor electrode between each azimuthal electrodes and main electrode to calculate multiple orientation side direction curve.
9. all resistivity of media cubical arraies of well as claimed in claim 7 imaging measurement method, it is characterized in that, when described main electrode is emission electrode, each when lateral electrodes is focusing electrode, utilize potential difference between each azimuthal electrodes and monitor electrode and the emission current computation of mud resistivity of main electrode.
10. all resistivity of media cubical arraies of well as claimed in claim 2 imaging measurement method, it is characterized in that, the corresponding a kind of different investigation depth of each mode of operation, calculate a corresponding strip array side direction curve in each investigation depth, calculate the corresponding orientation side direction curve identical with described azimuthal electrodes quantity in each investigation depth.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104047599A (en) * | 2014-07-09 | 2014-09-17 | 中国石油集团长城钻探工程有限公司 | Specific resistance imaging measurement method for logger |
| CN104074513A (en) * | 2014-07-09 | 2014-10-01 | 中国石油集团长城钻探工程有限公司 | Resistivity imaging measuring device for logging instrument |
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| CN111810116A (en) * | 2020-06-29 | 2020-10-23 | 中国石油天然气集团有限公司 | Method and device for measuring apparent resistivity of logging while drilling resistivity and readable storage medium |
| CN112696195A (en) * | 2019-10-23 | 2021-04-23 | 中国石油天然气股份有限公司 | Method and device for determining azimuthal anisotropy of formation resistivity |
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| CN104047599A (en) * | 2014-07-09 | 2014-09-17 | 中国石油集团长城钻探工程有限公司 | Specific resistance imaging measurement method for logger |
| CN104074513A (en) * | 2014-07-09 | 2014-10-01 | 中国石油集团长城钻探工程有限公司 | Resistivity imaging measuring device for logging instrument |
| CN104047599B (en) * | 2014-07-09 | 2016-08-24 | 中国石油集团长城钻探工程有限公司 | Logging instrument resistivity imaging measurement method |
| CN104074513B (en) * | 2014-07-09 | 2017-01-04 | 中国石油集团长城钻探工程有限公司 | Logging instrument resistivity image measuring device |
| CN107524438A (en) * | 2017-07-26 | 2017-12-29 | 杭州迅美科技有限公司 | Possess delineation ability crosses drill collar azimuthal array lateralog and its measuring method |
| CN110488367A (en) * | 2019-08-23 | 2019-11-22 | 中海石油(中国)有限公司深圳分公司 | A kind of resistivity inversion Initialization Algorithms based on array lateral logging data |
| CN112696195A (en) * | 2019-10-23 | 2021-04-23 | 中国石油天然气股份有限公司 | Method and device for determining azimuthal anisotropy of formation resistivity |
| CN112696195B (en) * | 2019-10-23 | 2023-11-28 | 中国石油天然气股份有限公司 | Stratum resistivity azimuth anisotropy determining method and device |
| CN111305836A (en) * | 2020-04-01 | 2020-06-19 | 中国石油天然气集团有限公司 | Well-wall-pasting type hard focusing azimuth array lateral instrument and method |
| CN111810116A (en) * | 2020-06-29 | 2020-10-23 | 中国石油天然气集团有限公司 | Method and device for measuring apparent resistivity of logging while drilling resistivity and readable storage medium |
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