CN101407466A - 乙二胺的纯化方法 - Google Patents
乙二胺的纯化方法 Download PDFInfo
- Publication number
- CN101407466A CN101407466A CNA2008101824499A CN200810182449A CN101407466A CN 101407466 A CN101407466 A CN 101407466A CN A2008101824499 A CNA2008101824499 A CN A2008101824499A CN 200810182449 A CN200810182449 A CN 200810182449A CN 101407466 A CN101407466 A CN 101407466A
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- CN
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- Prior art keywords
- quadrol
- impurity
- dimine
- ammonia
- ethylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000000034 method Methods 0.000 title abstract description 28
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 title 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 19
- -1 carbon dienes Chemical class 0.000 claims abstract description 17
- 239000012535 impurity Substances 0.000 claims abstract description 14
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 13
- 238000000746 purification Methods 0.000 claims abstract description 11
- 238000004821 distillation Methods 0.000 claims abstract description 9
- 229910052680 mordenite Inorganic materials 0.000 claims abstract description 9
- 238000009833 condensation Methods 0.000 claims abstract description 7
- 230000005494 condensation Effects 0.000 claims abstract description 7
- NSOXQYCFHDMMGV-UHFFFAOYSA-N Tetrakis(2-hydroxypropyl)ethylenediamine Chemical compound CC(O)CN(CC(C)O)CCN(CC(C)O)CC(C)O NSOXQYCFHDMMGV-UHFFFAOYSA-N 0.000 claims description 61
- 239000007788 liquid Substances 0.000 claims description 9
- 238000010521 absorption reaction Methods 0.000 claims description 8
- 238000006481 deamination reaction Methods 0.000 claims description 8
- 239000003463 adsorbent Substances 0.000 claims description 7
- 230000009615 deamination Effects 0.000 claims description 7
- 239000002594 sorbent Substances 0.000 claims description 4
- 239000002250 absorbent Substances 0.000 abstract description 3
- 230000002745 absorbent Effects 0.000 abstract description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract 7
- 239000005977 Ethylene Substances 0.000 abstract 7
- 239000000047 product Substances 0.000 description 21
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 16
- UYMKPFRHYYNDTL-UHFFFAOYSA-N ethenamine Chemical compound NC=C UYMKPFRHYYNDTL-UHFFFAOYSA-N 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 238000006386 neutralization reaction Methods 0.000 description 9
- BDAGIHXWWSANSR-UHFFFAOYSA-N Formic acid Chemical compound OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 8
- 238000010998 test method Methods 0.000 description 8
- 239000012043 crude product Substances 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 238000006356 dehydrogenation reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- KGWDUNBJIMUFAP-KVVVOXFISA-N Ethanolamine Oleate Chemical compound NCCO.CCCCCCCC\C=C/CCCCCCCC(O)=O KGWDUNBJIMUFAP-KVVVOXFISA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000005576 amination reaction Methods 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005906 dihydroxylation reaction Methods 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN2008101824499A CN101407466B (zh) | 2008-12-08 | 2008-12-08 | 乙二胺的纯化方法 |
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CN2008101824499A CN101407466B (zh) | 2008-12-08 | 2008-12-08 | 乙二胺的纯化方法 |
Publications (2)
Publication Number | Publication Date |
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CN101407466A true CN101407466A (zh) | 2009-04-15 |
CN101407466B CN101407466B (zh) | 2013-11-27 |
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CN2008101824499A Active CN101407466B (zh) | 2008-12-08 | 2008-12-08 | 乙二胺的纯化方法 |
Country Status (1)
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CN (1) | CN101407466B (zh) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101723837A (zh) * | 2009-12-10 | 2010-06-09 | 西安近代化学研究所 | 乙二胺的提纯方法 |
WO2018017830A1 (en) * | 2016-07-21 | 2018-01-25 | Versum Materials Us, Llc | High purity ethylenediamine for semiconductor applications |
CN109761818A (zh) * | 2019-03-13 | 2019-05-17 | 东莞市乔科化学有限公司 | 一种电子级多乙烯多胺精品、其制备方法及应用 |
CN110078630A (zh) * | 2019-05-27 | 2019-08-02 | 安徽工大化工科技有限公司 | 一种乙二胺的制备方法及其产品 |
CN111100017A (zh) * | 2019-12-31 | 2020-05-05 | 南京化学试剂股份有限公司 | 一种药用级乙二胺的精制方法 |
CN113461539A (zh) * | 2021-08-02 | 2021-10-01 | 江苏扬农化工集团有限公司 | 一种从氨基腈类有机物制备有机二胺的方法 |
US11152206B2 (en) | 2016-07-27 | 2021-10-19 | Versum Materials Us, Llc | Compositions and methods using same for carbon doped silicon containing films |
CN114263039A (zh) * | 2022-02-17 | 2022-04-01 | 王进 | 一种载药缓释性能涂料修复剂及其制备方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100546717C (zh) * | 2006-12-19 | 2009-10-07 | 西安近代化学研究所 | 气相合成乙二胺用的催化剂及其制备方法 |
-
2008
- 2008-12-08 CN CN2008101824499A patent/CN101407466B/zh active Active
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101723837B (zh) * | 2009-12-10 | 2012-12-26 | 山西玉龙化工有限公司 | 乙二胺的提纯方法 |
CN101723837A (zh) * | 2009-12-10 | 2010-06-09 | 西安近代化学研究所 | 乙二胺的提纯方法 |
KR102226784B1 (ko) * | 2016-07-21 | 2021-03-10 | 버슘머트리얼즈 유에스, 엘엘씨 | 반도체 응용을 위한 고순도 에틸렌디아민 |
WO2018017830A1 (en) * | 2016-07-21 | 2018-01-25 | Versum Materials Us, Llc | High purity ethylenediamine for semiconductor applications |
TWI647210B (zh) * | 2016-07-21 | 2019-01-11 | 慧盛材料美國責任有限公司 | 用於半導體應用的高純度伸乙基二胺 |
KR20190018764A (ko) * | 2016-07-21 | 2019-02-25 | 버슘머트리얼즈 유에스, 엘엘씨 | 반도체 응용을 위한 고순도 에틸렌디아민 |
IL264219A (en) * | 2016-07-21 | 2019-02-28 | Versum Mat Us Llc | High purity ethylenediamine for semiconductor applications |
CN109476582A (zh) * | 2016-07-21 | 2019-03-15 | 弗萨姆材料美国有限责任公司 | 用于半导体应用的高纯度乙二胺 |
US11742200B2 (en) | 2016-07-27 | 2023-08-29 | Versum Materials Us, Llc | Composition and methods using same for carbon doped silicon containing films |
US11152206B2 (en) | 2016-07-27 | 2021-10-19 | Versum Materials Us, Llc | Compositions and methods using same for carbon doped silicon containing films |
CN109761818A (zh) * | 2019-03-13 | 2019-05-17 | 东莞市乔科化学有限公司 | 一种电子级多乙烯多胺精品、其制备方法及应用 |
CN110078630A (zh) * | 2019-05-27 | 2019-08-02 | 安徽工大化工科技有限公司 | 一种乙二胺的制备方法及其产品 |
CN110078630B (zh) * | 2019-05-27 | 2022-04-26 | 安徽工业大学科技园有限公司 | 一种乙二胺的制备方法及其产品 |
CN111100017B (zh) * | 2019-12-31 | 2020-09-01 | 南京化学试剂股份有限公司 | 一种药用级乙二胺的精制方法 |
CN111100017A (zh) * | 2019-12-31 | 2020-05-05 | 南京化学试剂股份有限公司 | 一种药用级乙二胺的精制方法 |
CN113461539A (zh) * | 2021-08-02 | 2021-10-01 | 江苏扬农化工集团有限公司 | 一种从氨基腈类有机物制备有机二胺的方法 |
CN113461539B (zh) * | 2021-08-02 | 2023-11-21 | 江苏扬农化工集团有限公司 | 一种从氨基腈类有机物制备有机二胺的方法 |
CN114263039A (zh) * | 2022-02-17 | 2022-04-01 | 王进 | 一种载药缓释性能涂料修复剂及其制备方法 |
Also Published As
Publication number | Publication date |
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CN101407466B (zh) | 2013-11-27 |
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Owner name: SHANXI YULONG CHEMICAL CO., LTD. Free format text: FORMER OWNER: XI'AN INST. OF MODERN CHEMISTRY Effective date: 20121115 |
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Free format text: CORRECT: ADDRESS; FROM: 710065 XI'AN, SHAANXI PROVINCE TO: 038300 SHUOZHOU, SHAANXI PROVINCE |
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Effective date of registration: 20121115 Address after: 038300 East Economic Development Zone, Huairen, Shanxi, Shuozhou Applicant after: SHANXI YULONG CHEMICAL CO.,LTD. Address before: 710065 Shaanxi province Xi'an Yanta District Zhang eight road No. 168 Applicant before: XI'AN MODERN CHEMISTRY Research Institute |
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Effective date of registration: 20180309 Address after: 038300 East Economic Development Zone, Huairen, Shanxi, Shuozhou Patentee after: Shanxi ERON Grant Chemical Co.,Ltd. Address before: 038300 East Economic Development Zone, Huairen, Shanxi, Shuozhou Patentee before: SHANXI YULONG CHEMICAL CO.,LTD. |
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Effective date of registration: 20240429 Address after: 038300 pharmaceutical Park, Huairen economic and Technological Development Zone, Shuozhou City, Shanxi Province Patentee after: SHANXI YULONG CHEMICAL CO.,LTD. Country or region after: China Address before: 038300 Yundong Economic Development Zone, Huairen County, Shuozhou City, Shanxi Province Patentee before: Shanxi ERON Grant Chemical Co.,Ltd. Country or region before: China |