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CN109671647A - Droplet discharge apparatus, drop discharge method, program and computer storage medium - Google Patents

Droplet discharge apparatus, drop discharge method, program and computer storage medium Download PDF

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Publication number
CN109671647A
CN109671647A CN201811202183.XA CN201811202183A CN109671647A CN 109671647 A CN109671647 A CN 109671647A CN 201811202183 A CN201811202183 A CN 201811202183A CN 109671647 A CN109671647 A CN 109671647A
Authority
CN
China
Prior art keywords
drop
inspection
lid
discharge
discharged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811202183.XA
Other languages
Chinese (zh)
Inventor
大岛澄美
林辉幸
中込裕
松本诚
户原淳志
今田雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN109671647A publication Critical patent/CN109671647A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/06Silver salts
    • G03F7/063Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H01L21/02288Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The present invention provides droplet discharge apparatus, drop discharge method, program and computer storage medium.To workpiece discharge function liquid drop (D) with the droplet discharge apparatus described include: to workpiece discharge drop (D) drop discharge head;It loads medium (51), as the inspection mounting medium for accepting the inspection effluent from drop discharge head;Cover (34) is equipped with the inspection lid namely lid (32) for being covered as checking and be discharged to the drop (D) of mounting medium (51);With video camera (31), the shoot part for loading the drop (D) of medium (51) is discharged to be shot for checking through lid (32).The present invention is able to suppress as inspection and is discharged to the droplet drying checked with mounting medium, properly carries out drop inspection.

Description

Droplet discharge apparatus, drop discharge method, program and computer storage medium
Technical field
The present invention relates to the drop to workpiece discharge function liquid come described droplet discharge apparatus, arranged using the drop Drop discharge method, program and the computer storage medium of device out.
Background technique
All the time, as the device for using functional liquid to describe workpiece, it is known that make the functional liquid become drop and The droplet discharge apparatus of the ink-jet mode of discharge.Droplet discharge apparatus is widely used in for example in manufacture organic el device, colour transition The electric light such as filter, liquid crystal display device, plasma scope (PDP device), electron emitting device (FED device, SED device) When device (Flat Panel Display (flat-panel monitor), FPD) etc..
In droplet discharge apparatus, from drop discharge head to the drop of workpiece discharge function liquid, still, in order to properly right Workpiece describe, it is desirable that the correctness of drop is discharged.Therefore, before being described, each discharge of drop discharge head is checked Whether the discharge state of mouth is excellent.Specifically, being to check and discharge liquor on the mounting medium of inspection from drop discharge head Drop, shooting this by filming apparatus (video camera) is the drop for checking and being discharged.By carrying out image procossing to the shooting image, survey Determine area or the drop of drop liquid level set, whether the discharge state for detecting ejection nozzle excellent.
In addition, in droplet discharge apparatus, usually from the discharge rate of each ejection nozzle of drop discharge head, there are deviations.Cause This, is uniformly coated functional liquid for zero deflection, the discharge rate deviation of each ejection nozzle of measured in advance drop discharge head, according to The inspection data control discharge rate.Discharge rate measurement also uses the inspection whether excellent with above-mentioned discharge state in checking Identical drop check device and inspection method.
In the inspection of such drop, such as a kind of inspection desk is proposed in patent document 1, checking with mounting medium In the case where coupon for strip, the coupon is loaded (noly to rise and fall) for flat.That is, inspection desk includes: absorption Mode loads the porous plate of coupon;In the frame of the holding porous plate of upper level;Shape opposite with the lower surface of porous plate At in the inside of frame, and the gas chamber being connected to vacuum attracting mechanism.
Existing technical literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2007-237123 bulletin
Summary of the invention
Technical problems to be solved by the inivention
However, there is limitation in the quantity of video camera, therefore in the load from drop discharge head to inspection in drop inspection It sets after drop is discharged to check on medium, it is difficult to which the region that disposably should shoot video camera shoots complete.Therefore, it should shoot Region segmentation be it is multiple, 1 video camera is mobile, in each above-mentioned divided region shooting drop (hereinafter, the shooting is claimed For segmentation shooting).In the case where being split shooting in the manner described above, during shooting a region, in other regions In the case where there are droplet dryings.In this case, it is changed according to the area of the drop of shooting determining image, therefore, nothing Method correctly measures drop amount.
But include above-mentioned patent document 1 existing inspection method in, do not examine drop as above at any time and Dry situation can not correctly measure drop amount.Especially the easy stemness of drop is different and different according to the type of functional liquid, Therefore, using certain functional liquids, drop is able to carry out inspection not dry, but is using other function liquid In the case of, droplet drying and can not properly be checked, generate such deviation.Therefore, exist in existing drop inspection Room for improvement.
The present invention has been made in view of the above-described circumstances, is discharged to inspection with mounting matchmaker its object is to be suppressed to inspection The droplet drying of Jie properly carries out drop inspection.
For solving the technological means of technical problem
The present invention for solving the above subject is a kind of drop to the drop of workpiece discharge function liquid to be described Discharger characterized by comprising the drop discharge head of Xiang Shangshu workpiece discharge drop;It checks with mounting medium, undertaking Inspection effluent from above-mentioned drop discharge head;It checks with covering, is covered as checking and being discharged to above-mentioned inspection mounting matchmaker The drop of Jie;And shoot part, it is covered through above-mentioned inspection, is discharged to above-mentioned inspection and loads medium being shot for checking Drop.
According to the present invention, be with mounting medium from drop discharge head to inspection check and after drop is discharged, with covering The mode configuration inspection lid checked with the drop of mounting medium is discharged to for inspection.So, it is covered by the inspection It is able to suppress drop evaporation, is able to suppress droplet drying.Later, through check with lid, be shot for using shoot part check and It is discharged to the drop checked with mounting medium.It is such as pre- due to carrying out the shooting in the state of checking with lid covering drop Think to be able to suppress droplet drying like that, is able to suppress the variation of the area of the drop in shooting image.It therefore, can be according to shooting Image correctly measures the area of drop, and then the drop amount that can correctly be converted according to the area of the drop, as a result, energy It is enough properly to carry out drop inspection.
Or in above-mentioned droplet discharge apparatus, it is that can reduce or prevent that above-mentioned inspection lid, which is transparent material, The only lid of the reflection of light.
It further include the lid supporting part for supporting above-mentioned inspection lid, above-mentioned inspection or in above-mentioned droplet discharge apparatus Looking into and being used for storage with lid, above-mentioned lid supporting part and above-mentioned inspection mounting medium formation is to check and be discharged to above-mentioned inspection and carry Set the confined space of the drop of medium.
Or in above-mentioned droplet discharge apparatus, above-mentioned confined space is divided into multiple.
It is that the drop for checking and being discharged penetrates into from above-mentioned drop discharge head or in above-mentioned droplet discharge apparatus Above-mentioned inspection is in mounting medium, and above-mentioned inspection lid configuration is on the above-mentioned inspection mounting medium for having permeated drop.
It further include the shooting supporting part for supporting above-mentioned shoot part or in above-mentioned droplet discharge apparatus, from upper It states drop discharge head and check that above-mentioned inspection lid is kept by above-mentioned shooting supporting part when being discharged.
It further include moving in the horizontal direction above-mentioned inspection with mounting medium or in above-mentioned droplet discharge apparatus Mounting medium mobile mechanism, when carrying out checking discharge from above-mentioned drop discharge head, above-mentioned inspection is covered by above-mentioned mounting matchmaker Jie mobile mechanism keeps.
According to another aspect of the present invention, provide it is a kind of from drop discharge head to the drop of workpiece discharge function liquid to carry out The drop discharge method of description characterized by comprising check discharge step, use and carry from above-mentioned drop discharge head to inspection It sets medium and drop is discharged to check;Lid configuration step is discharged to above-mentioned inspection mounting medium to be covered as checking The mode configuration inspection of drop covers;Step is shot, is covered through above-mentioned inspection, is shot for checking and arranging using shoot part The drop of above-mentioned inspection mounting medium is arrived out;And checking step, it is above-mentioned to check according to the image that above-mentioned shoot part is shot Drop.
Or in above-mentioned drop discharge method, it is that can reduce or prevent that above-mentioned inspection lid, which is transparent material, The only lid of the reflection of light.
Or in above-mentioned drop discharge method, in above-mentioned lid configuration step, by above-mentioned inspection lid, bearing It states and checks the lid supporting part for using lid and above-mentioned inspection mounting medium, formed and be discharged to above-mentioned inspection to check for storage and use Load the confined space of the drop of medium.
Or in above-mentioned drop discharge method, above-mentioned confined space is divided into multiple.
Or in above-mentioned drop discharge method, in above-mentioned inspection discharge step, it is from above-mentioned drop discharge head The drop for checking and being discharged penetrates into above-mentioned inspection mounting medium, and in above-mentioned lid configuration step, above-mentioned inspection is matched with lid It sets on the above-mentioned inspection mounting medium for having permeated drop.
Or in above-mentioned drop discharge method, in above-mentioned inspection discharge step, above-mentioned inspection lid is by supporting The shooting supporting part of above-mentioned shoot part is kept.
Or in above-mentioned drop discharge method, in above-mentioned inspection discharge step, above-mentioned inspection is covered on by making Inspection is stated to be kept with the mounting medium mobile mechanism that mounting medium moves in the horizontal direction.
It further include discharge rate set-up procedure, according to above-mentioned checking step or in above-mentioned drop discharge method In inspection result, adjust the drop from above-mentioned drop discharge head discharge rate.
According to another aspect of the present invention, a kind of program is provided, runs, makes on the computer of the droplet discharge apparatus It obtains and above-mentioned drop discharge method is executed by droplet discharge apparatus.
In addition, according to another aspect of the present invention, providing a kind of computer-readable storage medium, being stored with above-mentioned Program.
Invention effect
In accordance with the invention it is possible to inhibit to check the drying for being discharged to and checking the drop with mounting medium, liquid is properly carried out Drop checks.
Detailed description of the invention
Fig. 1 is the side view for schematically showing the outline structure of droplet discharge apparatus of first embodiment.
Fig. 2 is the plan view for schematically showing the outline structure of droplet discharge apparatus of first embodiment.
Fig. 3 is the side view for schematically showing the outline structure of shooting unit of first embodiment.
Fig. 4 (a)~Fig. 4 (c) is the explanation for indicating to shoot the state of drop using the shooting unit of first embodiment Figure.
Fig. 5 is the flow chart for indicating the main step of workpiece processing of first embodiment.
Fig. 6 is the explanatory diagram of the processing movement of the droplet discharge apparatus of first embodiment.
Fig. 7 is the explanatory diagram that processing of the droplet discharge apparatus of first embodiment in processing position acts.
Fig. 8 is the explanatory diagram of the processing movement of the droplet discharge apparatus of first embodiment.
Fig. 9 is the explanatory diagram that processing of the droplet discharge apparatus of first embodiment in processing position acts.
Figure 10 is the explanatory diagram for the state configured with cover on mounting medium in the first embodiment that indicates.
Figure 11 is the explanatory diagram of the processing movement of the droplet discharge apparatus of first embodiment.
Figure 12 is the explanatory diagram of the processing movement of the droplet discharge apparatus of first embodiment.
Figure 13 is the chart for indicating the experimental result of the effect for actual verification first embodiment.
Figure 14 (a) and Figure 14 (b) is the outline structure for schematically showing the cover of variation 1 of first embodiment Side view.
Figure 15 is the side view for schematically showing the outline structure of the shooting unit of variation 2 of first embodiment.
Figure 16 is the side view for schematically showing the outline structure of shooting unit of second embodiment.
Description of symbols
1 droplet discharge apparatus
20 carrier units
23 carriers
24 drop discharge heads
30 shooting units
31 video cameras
32,200 lid
33 lid supporting parts
33a bracket
34 covers
35 video camera supporting parts
36 mobile mechanisms
40 work stages
50 discharge inspection units
51 mounting media
52 mounting medium maintaining parts
60 second X-axis sliding parts
70 maintenance units
80 wiper units
90 attract unit
100 control units
A carrying region
D drop
S confined space
W workpiece.
Specific embodiment
Hereinafter, being described with reference to embodiments of the present invention.In addition, in the present description and drawings, to substantial tool There is the element of identical functional structure, marks identical appended drawing reference, and the repetitive description thereof will be omitted.
<1. first embodiment>
Firstly, referring to Figures 1 and 2, illustrating the structure of the droplet discharge apparatus of first embodiment of the invention.Fig. 1 is Schematically show the side view of the outline structure of the droplet discharge apparatus 1 of present embodiment.Fig. 2 is to schematically show this reality Apply the plan view of the outline structure of the droplet discharge apparatus 1 of mode.In addition, in following state, by the main scanning direction of workpiece W It is set as X-direction, the sub-scanning direction orthogonal with main scanning direction is set as Y direction, it will be with X-direction and Y direction just The vertical direction of friendship is set as Z-direction, and the rotation direction that direction about the z axis rotates is set as the direction θ.
Droplet discharge apparatus 1 is included to be extended in main scanning direction (X-direction), makes workpiece W in main scanning direction movement X-axis platform 10;It is set up with across X-axis 10 ground of platform, in a pair of of Y-axis platform 11,11 that sub-scanning direction (Y direction) extends.In X-axis platform 10 Upper surface, a pair of of X-axis guide rail 12,12 X-direction extend be arranged, each X-axis guide rail 12 is provided with X-axis linear electric machine (not shown).The upper surface of each Y-axis platform 11, Y-axis guide rail 13 are arranged with extending in Y direction, and the Y-axis guide rail 13 is provided with Y Axis linear motor (not shown).
A pair of of Y-axis platform 11,11 is provided with carrier units 20 and shooting unit 30.Work stage is provided on X-axis platform 10 40 and discharge inspection unit 50.In the outside (Y-axis negative sense side) of X-axis platform 10, maintenance is provided between a pair of of Y-axis platform 11,11 Unit 70.
(carrier units)
Multiple (such as 10) carrier units 20 are provided in Y-axis platform 11.Each carrier units 20 include carrier plate 21, carry Transport rotating mechanism 22, carriers 23, drop discharge head 24.
Carrier plate 21 is mounted in Y-axis guide rail 13, by being set to the Y-axis linear electric machine of the Y-axis guide rail 13, and can be Y direction is mobile.Furthermore it is possible to keep multiple carrier plates 21 integrally mobile in Y direction.
In the center of the lower surface of carrier plate 21, it is provided with carrying rotating mechanism 22, under the carrying rotating mechanism 22 End has been removably installed carriers 23.Carriers 23 can be rotated by carrying rotating mechanism 22 in the direction θ.In addition, Work stage 40 is provided with carrying contraposition video camera (not shown) of shooting carriers 23.Moreover, aligning video camera according to by carrying The image of shooting corrects the position in the direction θ of carriers 23 by carrying rotating mechanism 22.
In the lower surface of carriers 23, it is provided with multiple drop discharge heads 24.In the present embodiment, such as in X-axis side To 3 drop discharge heads 24 are provided with, Y direction is provided with 2 drop discharge heads 24, that is, amounts to 6 drop discharge heads 24. In the lower surface of drop discharge head 24, i.e. nozzle face forms multiple ejection nozzles (not shown), from the ejection nozzle discharge function liquid Drop.
(shooting unit)
Shooting unit 30 is shot for checking and being discharged to the drop of the aftermentioned mounting medium 51 of discharge inspection unit 50.Figure 3 be the side view for schematically showing the outline structure of shooting unit 30.Fig. 4 (a)~Fig. 4 (c) is indicated using shooting unit The explanatory diagram of the state of 30 shooting drops.
Shooting unit 30 includes: the video camera 31 as shoot part;As the lid 32 checked with lid;With the lid of support cap 32 Supporting part 33.Lid 32 is formed as one with lid supporting part 33, in the following description, sometimes by above-mentioned lid 32 and lid supporting part 33 Referred to as cover 34.
As shown in Figure 1, video camera 31 and cover 34 are supported by the video camera supporting part 35 as shooting supporting part, it is above-mentioned to take the photograph Camera supporting part 35 is set to the side of the Y-axis platform 11 of X-axis forward direction side in a pair of of Y-axis platform 11,11.It is set in video camera supporting part 35 It is equipped with the mobile mechanism (not shown) for keeping video camera 31 mobile, video camera 31 can be mobile in Y direction.In addition, such as Fig. 3 institute Show, the mobile mechanism 36 for keeping cover 34 mobile is provided in video camera supporting part 35.Mobile mechanism 36, which is equipped with, to load and keeps covering The maintaining part 36a of the peripheral part of supporting part 33, is moved in the X-axis direction by mobile mechanism 36, can carry out the holding of cover 34 And release.In addition, cover 34 can be mobile in vertical direction by mobile mechanism 36.
Video camera 31 is for example correspondingly arranged with carrier units 20 (carriers 23), such as setting 10.In addition, cover 34 It is such as also correspondingly arranged with carrier units 20 and video camera 31, such as setting 10.
Moreover, as shown in Fig. 4 (a)~Fig. 4 (c), aftermentioned load is discharged to when being shot for checking using shooting unit 30 When setting the drop D of medium 51, cover 34 is configured on mounting medium 51 in a manner of covering drop D.Specifically, cover The region A (hereinafter referred to as carrying region A) of drop D is discharged in 34 one carriers 23 of covering.Moreover, using video camera 31 from lid 32 Top the drop D of carrying region A is shot through the lid 32.In addition, when being shot using video camera 31, from illumination The illumination of utensil (not shown) is to drop D.In the present embodiment, such as the light source as luminaire is able to use Such as the LED of coaxial-type.
In this case, for lid 32, it is desirable that can be shot using video camera 31, transparent material can be used. In addition, lid 32, which also can be used, is able to reduce or prevent illumination light in order to inhibit the Newton's ring as caused by the interference of reflected light Reflection lid.In present embodiment, as lid 32, such as it is able to use low-reflection glass.In low-reflection glass, in glass table Laminated coating has been applied in face, can reduce the reflection of illumination light.But it as long as lid 32 has the function of above-mentioned, can be used Arbitrary lid, such as anti-reflection glass (non-reflecting glass) also can be used.Anti-reflection glass is formed with minimum in glass surface Bumps, reflected light can be made to spread, prevent the reflection of illumination light.In addition, as lid 32, such as can also be in transparent glass Or antireflection film is pasted on the substrates such as quartz.
Lid supporting part 33 has the rectangular shape for the drop D that carrying region A is surrounded when overlooking.Moreover, by cover 34 configurations form confined space E when loading above medium 51, by lid 32, lid supporting part 33 and mounting medium 51.In addition, in order to The air-tightness for improving confined space E preferably touches lid supporting part 33 and mounting medium 51, and it is preferable to use for example for lid supporting part 33 Flexible material.
In addition, confined space E is preferably as small as possible from the viewpoint of inhibiting drop D dry as described later.Therefore, The limitation of various devices such as in the operating distance that consideration drop D is not accommodated in video camera 31 with the interference of lid 32 or drop D On the basis of, the height of lid supporting part 33 (lid 32) is set as small as possible.
(work stage)
As depicted in figs. 1 and 2, work stage 40 is, for example, vacuum adsorption table, for adsorbing and loading workpiece W.Work stage 40 By the way that the platform rotating mechanism 41 of the lower face side of the work stage 40 is arranged in, supported in a manner of rotatable in the direction θ.This Outside, in the X-axis negative sense side of Y-axis platform 11, i.e. the top of work stage 40 is provided with workpiece contraposition video camera (not shown), is used to clap Take the photograph the alignment mark of the workpiece W in work stage 40.Also, it according to the image by workpiece contraposition video camera shooting, is rotated by platform Mechanism 41 corrects the position in the direction θ for the workpiece W for being positioned in work stage 40.
Work stage 40 and platform rotating mechanism 41 are by being arranged in the first X-axis sliding part 42 of the lower face side of platform rotating mechanism 41 Bearing.First X-axis sliding part 42 is mounted in X-axis guide rail 12, by being arranged in the X-axis linear electric machine of the X-axis guide rail 12, and energy It is enough mobile in X-direction.It, also can be along X-axis guide rail 12 moreover, work stage 40 (workpiece W) is by the first X-axis sliding part 42 X-direction is mobile.
(discharge inspection unit)
Discharge inspection unit 50 is the unit for accepting the inspection effluent from drop discharge head 24.Inspection unit 50 is discharged It include: the mounting medium 51 as inspection mounting medium extended in Y direction;Equally extend in Y direction, absorption is simultaneously Keep the mounting medium maintaining part 52 of mounting medium 51.In present embodiment, mounting medium 51 is able to use in surface (upper table Face) apply the liquid-repelling film of the film (film coating) with liquid repellency.Medium 51 is loaded to be used in mounting medium maintaining part 52 when being directed into the underface of drop discharge head 24 so that the drop D being discharged from drop discharge head 24 liquid thereon.In addition, Mounting medium maintaining part 52 is flatly adsorbed and keeps membranaceous mounting medium 51.
Discharge inspection unit 50 is equipped on the second X-axis sliding part 60 as mounting medium mobile mechanism.The sliding of second X-axis Part 60 is mounted in X-axis guide rail 12, by the way that the X-axis linear electric machine of the X-axis guide rail 12 is arranged in, and can be mobile in X-direction. Moreover, discharge inspection unit 50 can also be moved along X-axis guide rail 12 in X-direction by the second X-axis sliding part 60.
(maintenance unit)
Maintenance unit 70 carries out the maintenance of drop discharge head 24, eliminates the bad discharge state of the drop discharge head 24.Dimension Protecting unit 70 includes wiper unit 80 and attraction unit 90.Wiper unit 80 is with attraction unit 90 from 10 side of X-axis platform successively in Y-axis Direction is arranged.In addition, wiper unit 80 and attraction unit 90 are configured in a manner of being located at the lower section of carriers 23.
(wiper unit)
Wiper unit 80 is the unit whisked off the nozzle face for being formed with multiple ejection nozzles in drop discharge head 24. Wiper unit 80, which has, whisks off roller 81.Moreover, whisking off roller 81 when carriers 23 are directed into the top of wiper unit 80 and carrying The nozzle face contact of the drop discharge head 24 of part 23 is transported, to whisk off the nozzle face.
(attracting unit)
Attracting unit 90 is the unit from 24 suction function liquid of drop discharge head.Attracting unit 90, is being arranged in Y direction Multiple (such as 10) are set and divide attraction component 91.The segmentation attracts the quantity of component 91 identical as the quantity of carriers 23. Each segmentation attracts component 91 to attract the drop discharge head 24 of corresponding carriers 23, and functional liquid is forcibly arranged from the drop Lift one's head 24 ejection nozzle discharge.In addition, each segmentation attracts component 91 when droplet discharge apparatus 1 is dormant state, arranged with drop The 24 nozzle face contiguity of lifting one's head inhibits functional liquid dry.
Control unit 100 is provided in above droplet discharge apparatus 1.Control unit 100 is, for example, computer, and is equipped with data Storage unit (not shown).It is stored in data store such as describing the data (bitmap data), it is above-mentioned to describe the data for controlling System is discharged to the drop D of workpiece W, describes defined pattern on workpiece W.In addition, control unit 100 is equipped with program storage part (not shown).Program and control for controlling the various processing in droplet discharge apparatus 1 is stored in program storage part to drive The program etc. of the movement of dynamic system.
In addition, above-mentioned data and above procedure are stored in for example computer-readable hard disk (HD), floppy disk (FD), CD (CD), in the computer-readable storage medium of disk (MO), storage card etc., control can also be installed to from the storage medium Portion 100.
Then, illustrate using the workpiece processing such as carried out with the droplet discharge apparatus 1 that upper type is constituted.Fig. 5 is to indicate this The flow chart of the example of the main step of workpiece processing.In the following description, it on X-axis platform 10, will more be leaned on than Y-axis platform 11 The position of X-axis negative sense side, which is known as being transported into, transports position P1, and the position between a pair of of Y-axis platform 11,11 is known as to handle position P2, will be compared Y-axis platform 11 is more known as position of readiness P3 by the position of X-axis forward direction side.In addition, by the Y-axis negative sense side of X-axis platform 10, i.e., a pair of of Y-axis Position between platform 11,11 is known as maintenance position P4.
Firstly, as shown in fig. 6, making to be discharged inspection unit 50 from position of readiness P3 to processing by the second X-axis sliding part 60 Position P2 is mobile.As shown in fig. 7, the configuration of mounting medium 51 that inspection unit 50 is discharged is discharged in drop in processing position P2 First 24 lower section is to check and drop D (the step S1 of Fig. 5) is discharged from drop discharge head 24 to the mounting medium 51.At this point, carrying Setting medium 51 can be used liquid-repelling film, and therefore, drop D is to maintain the state of its shape to exist.In addition, in step sl, cover 34 are kept by mobile mechanism 36 (video camera supporting part 35).
Later, as shown in figure 8, making to be discharged inspection unit 50 to the movement of X-axis forward direction side, the mounting of inspection unit 50 will be discharged Medium 51 is configured in the lower section of video camera 31.Then, as shown in figure 9, declining cover 34 by mobile mechanism 36, configuration is being carried (the step S2 of Fig. 5) is set on medium 51.In step S2, cover 34 is configured in a manner of covering the drop D of carrying region A. Moreover, cover 34 and mounting medium 51 form the confined space E of the drop D of storage carrying region A.In confined space E, Drop D can be made to become saturation state, drop D can be made not evaporate and inhibit drying.
Moreover, moving video camera 31 suitably in Y direction relative to confined space E, as shown in figure 9, passing through camera shooting Machine 31 is shot for checking and being discharged to the drop D (the step S3 of Fig. 5) of mounting medium 51.In step S3, video camera 31 is saturating Lid 32 is crossed to shoot the drop D of carrying region A.When the shooting, lid 32 is transparent, therefore video camera 31 can properly be shot Drop D.In addition, when video camera 31 shoots drop D, the illumination from luminaire to drop D.Herein, lid 32 can To use low-reflection glass, therefore it is able to suppress Newton's ring caused by the interference by illumination light and reflected light.
Here, as shown in Figure 10, in step sl, drop is discharged from a carriers 23 to carrying region A to check D.As described above, in the present embodiment, carriers 23, video camera 31, cover 34 quantity respectively correspond to, be identical number Amount, therefore in step s 2, a cover 34 is configured in a manner of covering a carrying region A.In addition, in step s3, leading to Crossing keeps video camera 31 mobile, in each for the multiple cut zone being split to form by carrying region A, shooting (segmentation shooting) Drop D.
In addition, in the mobile segmentation shooting to shoot drop D of video camera 31, all the time, as described above, in shooting one During a cut zone, the droplet drying in other cut zone.At this point, in the present embodiment, by 34 He of cover It loads medium 51 and forms confined space E.So, as described above, can be saturated to become drop D in confined space E State, drop D do not evaporate.Therefore, it is dry to be able to suppress drop D, can appropriately shoot multiple cut zone in carrying region A Drop D.
In addition, in cut zone, the peripheral part discharge substitution drop for the drop D that can be used to actual paint.At this In the case of, the substitution drop for being discharged to peripheral part is easy drying compared with the drop D being discharged on the inside of it, therefore can be further Inhibit the drop D on the inside of this dry.
In step s3, the image of shooting is output to control unit 100.In control unit 100, according to the image of shooting, Check the discharge rate (the step S4 of Fig. 5) of the ejection nozzle in drop discharge head 24.Specifically, in control unit 100, by right It shoots image and carries out image procossing, grasp the profile of drop D to measure the area of drop D, then according to the drop D's of measurement Area finds out comparing for the discharge rate of ejection nozzle come the drop amount that converts.
Later, according to the inspection result of step S4, the discharge rate (step of Fig. 5 of the ejection nozzle in drop discharge head 24 is adjusted Rapid S5).Here, workpiece W is, for example, organic el device, chromatic filter, liquid crystal display device, plasma scope, plate Display etc. is formed with the pixel as light-emitting component in workpiece W.Moreover, in step s 5, such as according in step S4 In the opposite discharge rate from each ejection nozzle that finds out, the nozzle number described with each pixel to workpiece W and describe liquid Quantity is dripped, to calculate the discharge rate described to each pixel, according to the result to the ejection nozzle from drop discharge head 24 Discharge rate carry out feedback control.
In addition, in step s 5, making to be discharged inspection unit 50 from position P2 is handled to position of readiness P3 movement.
As described above, transporting position being transported into during the discharge inspection and discharge rate for carrying out step S1~S5 adjust P1 configures work stage 40, and the workpiece W for being transported into droplet discharge apparatus 1 is placed on the work stage by conveyer (not shown) 40.Then, the alignment mark for the workpiece W that video camera is shot in work stage 40 is aligned by workpiece.Then, according to the figure of the shooting Picture corrects the position for being positioned in the direction θ of workpiece W of work stage 40 by platform rotating mechanism 41, carries out the contraposition of workpiece W (the step S6 of Fig. 5).
Later, as shown in figure 11, by the first X-axis sliding part 42 make work stage 40 from be transported into transport position P1 to processing position It is mobile to set P2.Workpiece W discharge liquor in processing position P2, from from the drop discharge head 24 to the lower section for being moved to drop discharge head 24 Drop.Then, make work stage 40 further mobile to the side position of readiness P3, so that the entire surface of workpiece W passes through drop discharge head 24 Lower section.Then, it moves back and forth workpiece W in X-direction, and keeps carrier units 20 suitably mobile in Y direction, in work Part W describes defined pattern (the step S7 of Fig. 5).
Later, as shown in figure 12, making work stage 40 from position of readiness P3 to being transported into, to transport position P1 mobile.When work stage 40 To be transported into transport position P1 it is mobile when, the workpiece W for finishing drawing processing is transported from droplet discharge apparatus 1.Then, by next work Part W is transported into droplet discharge apparatus 1, carries out the contraposition (the step S8 of Fig. 5) of the workpiece W of above-mentioned step S5.
As described above, step S1~S8 is executed to each workpiece W, processing terminate for a series of workpiece.In addition, carrying out It is arbitrary at the time of the discharge inspection and discharge state adjustment of step S1~S5.For example, can be to batch of first work Part W carries out step S1~S5, or can also carry out step S1~S5 to each workpiece W.
It is in step sl to check and arrange from drop discharge head 24 to mounting medium 51 according to above first embodiment Out after drop D, in step s 2 in a manner of being covered as inspection and be discharged to the drop D of the carrying region A of mounting medium 51 Configure cover 34.So, drop D can be inhibited by the confined space E formed by the cover 34 and mounting medium 51 Drying.Later, it is shot for checking and being discharged to the liquid of mounting medium 51 through lid 32 using video camera 31 in step s3 Drip D.Since the shooting carries out in the state that cover 34 covers drop D, the dry of drop D is able to suppress as anticipation It is dry, it is able to suppress the variation of the area of the drop D in shooting image.It therefore, in step s 4, can be correct according to shooting image Ground measures the area of drop D, and the drop amount that can correctly convert according to the area of drop D, and as a result, it is possible to properly survey The opposite discharge rate of fixed each ejection nozzle.Moreover, in step s 5, the ejection nozzle in drop discharge head 24 can be suitably adjusted Discharge rate, therefore being capable of the unbiased drawing processing poorly carried out to workpiece W.
In addition, the present inventor is able to suppress the dry effect of drop D using cover 34 through experimental confirmation.It is being configured with It cover 34 and is tested in the case where cover 34 is not configured, the area for determining drop D in every case changes with time. Figure 13 indicates the experimental result.The horizontal axis of Figure 13 indicates to pass through the time, and the longitudinal axis indicates area change rate.When referring to Fig.1 3 when, In the case where cover 34 is not configured, the area of drop D becomes smaller at any time.On the other hand, in the case where being configured with cover 34, i.e., Pass through the time, the area of drop D hardly happens variation.
In addition, as noted previously, as being able to suppress drop D drying, therefore the range of choice change of functional liquid using cover 34 Extensively.As shown in the embodiment, by forming confined space E, shape can be saturated to become drop D in confined space E State, no matter therefore with the type of functional liquid why, drop D can be inhibited dry.Thus, it is also possible to select the function for being easy drying It can liquid.
Moreover, because being able to suppress the drying of drop D using cover 34, therefore when shooting drop D using video camera 31 The range of choice of the luminaire used becomes wide.In the present embodiment, use LED as the light source of luminaire, still, example Such as using halogen lamp or mercury vapor lamp, due to fever, drop D becomes easy drying.At this point, , can be to make drop D become saturation state in confined space E in present embodiment, therefore it is able to suppress drop D drying, The light source of fever is able to use as luminaire.
(variation 1 of first embodiment)
In above first embodiment, a cover 34 is arranged in correspondence with a carrying region A, but cover 34 Shapes or configure it is without being limited thereto.
Such as cover 34 can be arranged throughout multiple carrying region A.Figure 14 (a) and Figure 14 (b) indicates that cover 34 spreads 2 A carrying region A1, A2 and the example being arranged.In this case, lid supporting part 33 is in a manner of surrounding 2 carrying regions A1, A2 Setting.In addition, being provided with the bracket 33a extended in X-direction in the center of the Y direction of lid supporting part 33.Pass through the bracket 33a is divided into confined space E1, E2 to divide carrying region A1, A2.In addition, cover 34 can also be throughout 3 or more Carrying region A and be arranged.
In addition, for example bracket 33a can be arranged in the cover 34 being arranged in correspondence with a carrying region A.In the situation Under, a carrying region A is divided into multiple.Such as the curved feelings of lid 32 of a carrying region A wider and a cover 34 Under condition, in order to inhibit the bending, cover 34 is provided with bracket 33a.
Due to being capable of forming the confined space of covering drop D in the case where the shapes or configure of cover 34 are any E, therefore it is able to suppress drop D drying, the above-mentioned effect of first embodiment can be obtained.
(variation 2 of first embodiment)
In addition, being in step sl inspection from drop discharge head 24 to mounting medium 51 in above first embodiment When looking into and drop D is discharged, cover 34 is kept by mobile mechanism 36, but keeps the method for cover 34 without being limited thereto.
Figure 15 is to indicate cover 34 is kept by the second X-axis sliding part 60 in step sl example.In this case, in step In rapid S2, cover is configured to by way of mounting 51 movement of medium from the second X-axis sliding part 60 to be allowed to mobile mechanism 36 34.As described above, the whether keeping method of which kind of cover 34, can form confined space E, therefore be able to suppress drop D It is dry, the above-mentioned effect of first embodiment can be obtained.
(variation 3 of first embodiment)
In addition, mounting medium 51 uses liquid-repelling film in above first embodiment, still, the kind of medium 51 is loaded Class is without being limited thereto.Such as permeable membrane also can be used in mounting medium 51.In this case, mounting medium 51 is discharged to for inspection Drop D penetrate into the mounting medium 51.Determined mounting medium 51 using liquid-repelling film also according to the type of such as functional liquid It is using permeable membrane.In addition, the mounting film without being limited thereto of medium 51, also can be used the dike plate of for example, glass substrate.
No matter loading medium 51 is which kind of, by forming confined space E between cover 34 and mounting medium 51, it will be able to Inhibit drop D dry, the above-mentioned effect of first embodiment can be obtained.
But in the case where using permeable membrane as mounting medium 51, the light source as luminaire is for example using ring The LED of type.In this case, when drop D is penetrated into mounting medium 51, using ring-like LED from oblique irradiation LED light. So, it in the image shot by video camera 31, has permeated the part of drop D and has not permeated the comparison of the part of drop D Difference become obviously, thus, it is possible to measure the area of drop D.
<2. second embodiment>
Then, referring to Fig.1 6 illustrate second embodiment of the present invention droplet discharge apparatus structure.Figure 16 is signal Property indicate shooting unit 30 in the droplet discharge apparatus 1 of present embodiment and discharge inspection unit 50 outline structure side Face figure.
The droplet discharge apparatus 1 of second embodiment be suitable for use permeable membrane as load medium 51 the case where, i.e., from Drop discharge head 24 is that the drop D for checking and being discharged penetrates into situation about loading in medium 51.
As shown in figure 16, in this second embodiment, substitute first embodiment in cover 34 and used as inspection With the lid 200 of lid.Lid 200 uses material identical with the lid 32 of cover 34.Specifically, lid 200 be able to use it is for example low anti- Penetrate glass, anti-reflection glass or the glass or the quartz that are pasted with antireflection film etc..
In addition, lid 200 can be set to each carrying region A as shown in the first embodiment.Alternatively, lid 200 can be as The variation 1 of first embodiment is arranged throughout multiple carrying region A like that.
In addition, the drop in the other structures and first embodiment of the droplet discharge apparatus 1 in second embodiment is arranged The structure of device 1 is identical out.
Then, illustrate that the workpiece carried out using the droplet discharge apparatus 1 constituted as described above is handled.The following description In step S1~S8 it is corresponding with step S1~S8 in first embodiment.
Firstly, being to check and drop D is discharged from drop discharge head 24 to mounting medium 51, drop D seeps in step sl Thoroughly into mounting medium 51.At this point, lid 200 can be kept by mobile mechanism 36 as in the first embodiment, or can also be with It is kept as the variation 2 of first embodiment by the second X-axis sliding part 60.
Later, in step s 2, as shown in figure 16, lid 200 is positioned in mounting Jie for having permeated drop D by mobile mechanism 36 In matter 51.Later, in step s3, it is shot for checking the drop D for being discharged to mounting medium 51 by video camera 31.
In above-mentioned steps S2, S3, since drop D is covered by lid 200, drop D does not evaporate and is able to suppress drying. In the first embodiment, from the viewpoint of inhibiting drop D dry, confined space E is reduced as far as possible, and it is real originally second It applies in mode, there is no space between lid 200 and mounting medium 51.Therefore, it is dry that drop D can be further suppressed.
In addition, lid 200 is contacted with mounting medium 51 when shooting drop D in step s3, so the interference because of reflected light is led The influence of the Newton's ring of cause becomes larger.Therefore, lid 200 it is preferable to use low-reflection glass, anti-reflection glass or is pasted with antireflection Glass or quartz of film etc..
In addition, step S4~S8 later is identical as step S4~S8 of first embodiment.
As described above, in this second embodiment, the effect being the same as the above first embodiment can be obtained.
<3. other embodiments>
In the droplet discharge apparatus 1 of above first embodiment and second embodiment, shooting unit 30 can have Have and is discharged to the drop D of workpiece W using shooting come description inspection video camera (not shown) for the state described.Image taking camera shooting Machine is oppositely arranged with video camera 31 in X-direction across carriers 23 (drop discharge head 24).
In this case, after pattern as defined in describing in the step s 7 in workpiece W, description inspection is directed into work stage 40 When looking into the lower section of video camera, describe the pattern for checking that video camera shooting is carried out by the drop for the workpiece W being discharged in work stage 40 Deng description state.The image of shooting is output to control unit 100, and in control unit 100, the image based on shooting is checked The bad state of description state, such as film are uneven etc..In the inspection result, determining that description state is the feelings of bad state Under condition, such as feedback control is carried out to discharging operation of the drop from drop discharge head 24 etc..
In addition, the droplet discharge apparatus 1 of embodiment of above can be widely applied for for example manufacturing organic el device, colour The electricity such as filter, liquid crystal display device, plasma scope (PDP device), electron emitting device (FED device, SED device) When Optical devices (flat-panel monitor: FPD) etc..In addition, carrying out metal line molding, lens molding, resist molding and light Also droplet discharge apparatus 1 can be used when spreading body formed etc. manufacture.
More than, embodiment of the present invention is illustrated, but the present invention is not limited to above-mentioned examples.For this field skill For art personnel, in the scope for the technical idea recorded in the range of patent application, it is clear that it is conceivable that various modifications Or fixed case, these also belong to the range of technology of the invention certainly.
Industrial utilizability
The present invention is useful when the drop to workpiece discharge function liquid is to describe.

Claims (17)

1. a kind of droplet discharge apparatus to the drop of workpiece discharge function liquid to be described characterized by comprising
To the drop discharge head of workpiece discharge drop;
It checks with mounting medium, inspection effluent of the undertaking from the drop discharge head;
It checks with covering, is covered as checking and being discharged to the drop checked with mounting medium;With
Shoot part, through the drop for checking with lid and being shot for inspection and being discharged to the inspection mounting medium.
2. droplet discharge apparatus as described in claim 1, it is characterised in that:
The inspection is transparent material with lid, is the lid that can reduce or prevent the reflection of light.
3. droplet discharge apparatus as claimed in claim 1 or 2, it is characterised in that:
It further include supporting the lid supporting part checked with lid,
The inspection lid, the lid supporting part and the inspection mounting medium, which form to be used to store, to be inspection and is discharged to institute State the confined space for checking the drop with mounting medium.
4. droplet discharge apparatus as claimed in claim 3, it is characterised in that:
The confined space is divided into multiple.
5. droplet discharge apparatus as claimed in claim 1 or 2, it is characterised in that:
The inspection is penetrated into from the drop that the drop discharge head is inspection and is discharged to be covered in mounting medium, the inspection is used It configures on the inspection mounting medium for having permeated drop.
6. such as described in any item droplet discharge apparatus of Claims 1 to 5, it is characterised in that:
It further include the shooting supporting part for supporting the shoot part,
When carrying out checking discharge from the drop discharge head, the inspection is kept with lid by the shooting supporting part.
7. such as described in any item droplet discharge apparatus of Claims 1 to 5, it is characterised in that:
It further include the mounting medium mobile mechanism for moving in the horizontal direction the inspection with mounting medium,
When carrying out checking discharge from the drop discharge head, the inspection is kept with lid by the mounting medium mobile mechanism.
8. a kind of drop discharge method from drop discharge head to the drop of workpiece discharge function liquid to be described, feature exist In, comprising:
It checks discharge step, is to check and drop is discharged with mounting medium from the drop discharge head to inspection;
Lid configuration step, configuration inspection is used in a manner of being covered as inspection and be discharged to described check with the drop for loading medium Lid;With
Step is shot, through inspection lid, is shot for checking and being discharged to inspection mounting using shoot part The drop of medium;With
Checking step checks the drop according to the image of shoot part shooting.
9. drop discharge method as claimed in claim 8, it is characterised in that:
The inspection is transparent material with lid, is the lid that can reduce or prevent the reflection of light.
10. drop discharge method as claimed in claim 8 or 9, it is characterised in that:
In the lid configuration step, by the inspection lid, described check with the lid supporting part of lid and inspection use is supported Medium is loaded, is formed for storing to check and is discharged to the confined space for checking the drop with mounting medium.
11. drop discharge method as claimed in claim 10, it is characterised in that:
The confined space is divided into multiple.
12. drop discharge method as claimed in claim 8 or 9, it is characterised in that:
It is that the drop for checking and being discharged penetrates into inspection load from the drop discharge head in inspection discharge step It sets in medium, in the lid configuration step, described check loads medium in the inspection for having permeated drop with lid configuration On.
13. such as described in any item drop discharge methods of claim 8~12, it is characterised in that:
In inspection discharge step, described check is kept with lid by the shooting supporting part for supporting the shoot part.
14. such as described in any item drop discharge methods of claim 8~12, it is characterised in that:
It is described to check with the load covered by moving in the horizontal direction the inspection with mounting medium in inspection discharge step Set the holding of medium mobile mechanism.
15. such as described in any item drop discharge methods of claim 8~13, it is characterised in that:
It further include discharge rate set-up procedure, according to the inspection result in the checking step, adjustment is discharged from the drop The discharge rate of the drop of head.
16. a kind of program, it is characterised in that:
It is run on the computer of the droplet discharge apparatus, so that requiring 8~15 times by droplet discharge apparatus perform claim Drop discharge method described in one.
17. a kind of computer-readable storage medium, it is characterised in that:
It is stored with program described in claim 16.
CN201811202183.XA 2017-10-16 2018-10-16 Droplet discharge apparatus, drop discharge method, program and computer storage medium Pending CN109671647A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113126447A (en) * 2019-12-30 2021-07-16 台湾积体电路制造股份有限公司 Method for generating extreme ultraviolet radiation

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7526150B2 (en) 2021-09-13 2024-07-31 芝浦メカトロニクス株式会社 Coating device and droplet discharge inspection method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000153603A (en) * 1998-11-18 2000-06-06 Canon Inc Delivery ink measuring apparatus
JP2011177679A (en) * 2010-03-03 2011-09-15 Seiko Epson Corp Droplet discharge device and method for controlling droplet discharge device
JP2012187497A (en) * 2011-03-10 2012-10-04 Seiko Epson Corp Evaluation method and evaluation apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001041799A (en) 1999-07-30 2001-02-16 Canon Inc Volume measuring method and volume measuring device of droplet, and recording medium
JP4654948B2 (en) 2006-03-10 2011-03-23 セイコーエプソン株式会社 Ejection inspection apparatus, droplet ejection apparatus, and electro-optic device manufacturing method
JP2009014429A (en) * 2007-07-03 2009-01-22 Seiko Epson Corp Weighing apparatus, droplet discharge device and weighing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000153603A (en) * 1998-11-18 2000-06-06 Canon Inc Delivery ink measuring apparatus
JP2011177679A (en) * 2010-03-03 2011-09-15 Seiko Epson Corp Droplet discharge device and method for controlling droplet discharge device
JP2012187497A (en) * 2011-03-10 2012-10-04 Seiko Epson Corp Evaluation method and evaluation apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113126447A (en) * 2019-12-30 2021-07-16 台湾积体电路制造股份有限公司 Method for generating extreme ultraviolet radiation

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