CN109638052B - 柔性基板、柔性显示面板及其制造方法 - Google Patents
柔性基板、柔性显示面板及其制造方法 Download PDFInfo
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Abstract
一种柔性基板、柔性显示面板及其制造方法。柔性显示面板的制造方法包括:于一基板上形成第一有机层;于第一有机层上决定弯折区域,且于第一有机层位于弯折区域的部分上形成黏合层;于黏合层及第一有机层上形成无机层;于无机层上形成第二有机层;于第二有机层上依序形成薄膜晶体管层、有机发光二极体层及封装层;去除基板;以及去除第一有机层位于弯折区域的部分及黏合层,以形成柔性显示面板。
Description
技术领域
本发明涉及显示技术领域,尤其涉及一种柔性基板、柔性显示面板及其制造方法。
背景技术
近年来,大众对全面屏(full screen display)显示装置有相当高的兴趣。对于有机发光二极体(Organic Light-Emitting Diode,OLED)显示面板而言,端子弯曲技术(PADbending)通过将柔性基板上绑定控制芯片的绑定区域弯折到显示面板的背后,得以实现全面屏的效果。
当将绑定区域向显示面板的背后进行弯折时,绑定区域与显示区域之间会出现弯折区域。由于绑定区域与显示区域之间设置有多条用于传输信号的金属信号线,因此当显示面板弯折时,在弯折区域内的金属信号线容易受到应力作用而导致断裂,从而引发信号传输不良,使显示面板无法正常显示。
因此,有必要提供一种柔性基板、柔性显示面板及其制造方法,以解决上述问题。
发明内容
本发明的目的在于提供一种柔性基板、柔性显示面板及其制造方法,可以避免金属信号线受到应力作用而导致断裂,确保显示面板正常显示。
为实现上述目的,本发明提供一种柔性基板,设有弯折区域,其特征在于,所述柔性基板包括:第一有机层,设有位于所述弯折区域的镂空部;无机层,形成于所述第一有机层的上方,设有位于所述弯折区域的凹陷部和凸起部,其中所述凹陷部设于所述无机层接近所述第一有机层的表面,所述凸起部设于所述无机层远离所述第一有机层的表面;以及第二有机层,形成于所述无机层的上方,设有位于所述弯折区域的嵌合部,其中所述嵌合部与所述无机层的凸起部相嵌合。
在一些实施方式中,所述第一有机层的材料包括聚酰亚胺(Polyimide)。
在一些实施方式中,所述无机层的材料包括氮化硅(SiNx)。
在一些实施方式中,所述第二有机层的材料包括聚酰亚胺(Polyimide)。
为实现上述目的,本发明提供一种柔性显示面板,其特征在于,包括柔性基板和重叠于所述柔性基板上方的薄膜晶体管层、有机发光二极体层及封装层;其中,所述柔性基板包括:第一有机层,设有位于所述弯折区域的镂空部;无机层,形成于所述第一有机层的上方,设有位于所述弯折区域的凹陷部和凸起部,其中所述凹陷部设于所述无机层接近所述第一有机层的表面,所述凸起部设于所述无机层远离所述第一有机层的表面;以及第二有机层,形成于所述无机层的上方,设有位于所述弯折区域的嵌合部,其中所述嵌合部与所述无机层的凸起部相嵌合。
为实现上述目的,本发明提供一种柔性显示面板的制造方法,其特征在于,包括:于一基板上形成第一有机层;于所述第一有机层上决定弯折区域,且于所述第一有机层位于所述弯折区域的部分上形成黏合层;于所述黏合层及所述第一有机层上形成无机层;于所述无机层上形成第二有机层;于所述第二有机层上依序形成薄膜晶体管层、有机发光二极体层及封装层;去除所述基板;以及去除所述第一有机层位于所述弯折区域的部分及所述黏合层,以形成所述柔性显示面板。
在一些实施方式中,所述形成第一有机层和第二有机层之步骤采用涂布且固化方法以形成所述第一有机层和所述第二有机层。
在一些实施方式中,所述于第一有机层位于所述弯折区域的部分上形成黏合层之步骤采用涂布方法以形成所述黏合层。
在一些实施方式中,所述于黏合层及第一有机层上形成无机层之步骤采用化学气相沉积法以形成所述无机层。
在一些实施方式中,所述去除第一有机层位于所述弯折区域的部分之步骤采用激光镭射对所述第一有机层进行切割。
在一些实施方式中,所述黏合层的材料包括六甲基二硅胺、山梨醇、二甲亚砜之至少其中一者。
为让本发明的特征以及技术内容能更明显易懂,请参阅以下有关本发明的详细说明与附图,然而附图仅提供参考用,并非用来对本发明加以限制。
附图说明
图1为根据本发明实施例的柔性显示面板的制造方法的流程图;
图2A-2G为实施图1的步骤S01-S07的剖面示意图。
具体实施方式
为了使本发明的目的、技术手段及其效果更加清楚明确,以下将结合附图对本发明作进一步地阐述。应当理解,此处所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例,并不用于限定本发明。
请参考图1,其示出根据本发明实施例的柔性显示面板的制造方法的流程图。同时参考图2A-2G,图2A-2G为实施图1的步骤S01-S07的剖面示意图。图1中,柔性显示面板的制造方法包括如下步骤:
步骤S01、于基板20上形成第一有机层21(如图2A所示)。在一些实施方式中,步骤S01采用涂布且固化方法以形成第一有机层21。具体地,基板20为玻璃基板。第一有机层21的材料包括聚酰亚胺(Polyimide)。第一有机层21的厚度为5-15微米(micrometer)。
步骤S02、于第一有机层21上决定弯折区域BA,且于第一有机层21位于弯折区域BA的部分上形成黏合层22(如图2B所示)。在一些实施方式中,步骤S02采用涂布方法以形成黏合层22。具体地,黏合层22的材料包括六甲基二硅胺、山梨醇、二甲亚砜之至少其中一者。黏合层22的厚度为0.01-1微米(micrometer)。
步骤S03、于黏合层22及第一有机层21上形成无机层23(如图2C所示)。在一些实施方式中,步骤S03采用化学气相沉积法以形成无机层23。具体地,无机层23的材料包括氮化硅(SiNx)。无机层23的厚度为0.1-1微米(micrometer)。
步骤S04、于无机层23上形成第二有机层24(如图2D所示)。在一些实施方式中,步骤S04采用涂布且固化方法以形成第二有机层24。具体地,第二有机层24的材料包括聚酰亚胺(Polyimide)。第二有机层24的厚度为5-15微米(micrometer)。
步骤S05、于第二有机层24上依序形成薄膜晶体管层25、有机发光二极体层26及封装层27(如图2E所示)。
步骤S06、去除基板20(如图2F所示)。在一些实施方式中,步骤S06采用激光镭射对基板20进行剥离。
步骤S07、去除第一有机层21位于弯折区域BA的部分及黏合层22,以形成柔性显示面板2(如图2G所示)。在一些实施方式中,步骤S07采用激光镭射对第一有机层21进行切割,以去除第一有机层21位于弯折区域BA的部分。再者,黏合层22会因高温而发生脱落(peeling)。
继续参考图2G,本发明所提供的柔性基板1设有弯折区域BA,其包括第一有机层21、无机层23和第二有机层24。第一有机层21设有位于弯折区域BA的镂空部210。无机层23形成于第一有机层21的上方,设有位于弯折区域BA的凹陷部230和凸起部231,其中凹陷部230设于无机层23接近第一有机层21的表面,凸起部231设于无机层23远离第一有机层21的表面。第二有机层24形成于无机层23的上方,设有位于弯折区域BA的嵌合部240,其中嵌合部240与无机层23的凸起部231相嵌合。再者,如图2G所示,本发明所提供的柔性显示面板2包括柔性基板1和重叠于柔性基板1上方的薄膜晶体管层25、有机发光二极体层26及封装层27。
综上所述,本发明提供的柔性基板、柔性显示面板及其制造方法,主要通过减薄具有多层结构的柔性基板的厚度,以避免弯折区域内的金属信号线受到应力作用而导致断裂,确保显示面板正常显示。
应当理解的是,本发明的应用不限于上述的举例,对本领域普通技术人员来说,可以根据上述说明加以改进或变换,所有这些改进和变换都应属于本发明所附权利要求的保护范围。
Claims (5)
1.一种柔性显示面板,其特征在于,包括柔性基板和重叠于所述柔性基板上方的薄膜晶体管层、有机发光二极体层及封装层;其中,所述柔性基板包括:
第一有机层,具有一弯折区域,所述第一有机层设有位于所述弯折区域的镂空部;
无机层,形成于所述第一有机层的上方,设有位于所述弯折区域的凹陷部和凸起部,其中所述凹陷部设于所述无机层接近所述第一有机层的表面,所述凸起部设于所述无机层远离所述第一有机层的表面;以及
第二有机层,形成于所述无机层的上方,设有位于所述弯折区域的嵌合部,其中所述嵌合部与所述无机层的凸起部相嵌合。
2.一种柔性显示面板的制造方法,其特征在于,包括:
于一基板上形成第一有机层;
于所述第一有机层上决定弯折区域,且于所述第一有机层位于所述弯折区域的部分上形成黏合层,所述黏合层的材料包括六甲基二硅胺、山梨醇、二甲亚砜之至少其中一者;
于所述黏合层及所述第一有机层上形成无机层;
于所述无机层上形成第二有机层;
于所述第二有机层上依序形成薄膜晶体管层、有机发光二极体层及封装层;
去除所述基板;以及
去除所述第一有机层位于所述弯折区域的部分及所述黏合层,以形成所述柔性显示面板。
3.如权利要求2所述的制造方法,其特征在于,所述于第一有机层位于所述弯折区域的部分上形成黏合层之步骤采用涂布方法以形成所述黏合层。
4.如权利要求2所述的制造方法,其特征在于,所述于黏合层及第一有机层上形成无机层之步骤采用化学气相沉积法以形成所述无机层。
5.如权利要求2所述的制造方法,其特征在于,所述去除第一有机层位于所述弯折区域的部分之步骤采用激光镭射对所述第一有机层进行切割。
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