CN109324484A - Developing cell cleaning device and the clean method for using the device - Google Patents
Developing cell cleaning device and the clean method for using the device Download PDFInfo
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- CN109324484A CN109324484A CN201811128282.8A CN201811128282A CN109324484A CN 109324484 A CN109324484 A CN 109324484A CN 201811128282 A CN201811128282 A CN 201811128282A CN 109324484 A CN109324484 A CN 109324484A
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- developing cell
- photoresist
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- substrate
- base plate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
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- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Nonlinear Science (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Plasma & Fusion (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention discloses a kind of developing cell cleaning devices, are applied to an exposure system.The developing cell cleaning device efficiently solves developing cell internal curing photoresist residue and cleans not clean problem, improve the cleanliness of the developing trough of the developing cell, to avoid the bad problem of product caused by the cleanliness because of the developing trough of the developing cell, the device can improve the utilization rate of chemical depletion product with secondary use photoresist solvent simultaneously.
Description
Technical field
The present invention relates to liquid crystal display panel technical field more particularly to a kind of developing cell cleaning device and use the dress
The clean method set.
Background technique
In the exposure technology of tft array substrate, a series of operation is generally completed by exposure system, such as cleaning,
Coating, exposure and imaging.The exposure system of the prior art includes: a board cleaning unit 110, a base plate coating unit 120, one
Base plate exposure unit 130 and a substrate developing cell 140.Specifically, firstly, in board cleaning unit 110, to glass substrate
It is cleaned, including processes such as progress ultraviolet light irradiation, steam cleaning and air knife dryings；Secondly, by the base after cleaning
Plate carries out hot plate baking and buffering cooling；Then, in base plate coating unit 120, pass through light blockage coating mechanism (linear
Coater photoresist) is coated on substrate；And pass through the desiccation of vacuum drier (Vacuum Chamber Dry), so that
The drying of photoresist solution is cooled into solid-state, then hot plate baking is being carried out, to be further dried；Then, by the substrate after drying
It is turned to and is sent at exposure machine, in base plate exposure unit 130, on the glass substrate using mask, photoresist is defined
Figure exposes edge to execute exposing operation again later, to remove substrate edges photoresist；This substrate substrate is sent to again to show
Shadow unit 140.In substrate developing cell 140, figure is shown by developing manufacture process.
In substrate developing cell 140, it is respectively arranged with development subelement, displacement washing subelement, directly washes subelement
With the dry subelement of air knife.Wherein, development subelement is mainly used for developing to the photoresist for defining figure, to form figure
The photoresist of change.Displacement washing subelement and straight washing subelement are mainly used for the photoresist developer solution that cleaning remains on substrate.So
And since developing cell is chronically at development operation, photoresist developer solution, mixed liquor can be splashed/be evaporated at developing trough (Chamber)
It is interior, and form cured photoresist residue.When substrate passes through substrate developing cell 140, these photoresist residues be may drop out
On the surface of the substrate, it be easy to cause the figure of substrate abnormal.Therefore, relevant staff develops to substrate with the fixed cycle single
Member 140 carries out cleaning maintenance, to mitigate the influence of photoresist residue.
It for cured photoresist residue, uses water or developer solution can not be clean by developing trough using simple, and needs to make
It is cleaned with light resistance solvent (such as rinse liquid).However, fail to provide photoresist solvent in the position of developing cell, it is then right
Developing cell cleaning and maintenance will cause certain difficulty, clean not clean photoresist residue for a long time and are easy to cause substrate to be processed
Even entire product has exception.
In view of this, it is urgent to provide a kind of developing cell cleaning device or clean methods.
Summary of the invention
The object of the present invention is to provide a kind of developing cell cleaning devices, efficiently solve developing cell solidification light
Resistance residue cleans not clean problem, improves the cleanliness in the developing trough of developing cell, to avoid showing because of developing cell
The bad problem of product caused by the cleanliness of shadow slot, while the device can be mentioned with secondary use photoresist solvent (such as rinse liquid)
The utilization rate of chemical depletion product is risen.
The present invention provides a kind of developing cell cleaning devices, are applied to an exposure system, and the exposure system includes one
Board cleaning unit, a base plate coating unit, a base plate exposure unit and a substrate developing cell；The board cleaning unit is used
It is cleaned in a substrate, and the substrate after cleaning is sent to the base plate coating unit；The base plate coating unit
The light blockage coating mechanism being arranged in the base plate coating unit by one is coated photoresist to substrate, and by coated light
The substrate of resistance is sent to the base plate exposure unit；The base plate exposure unit is used to define photoresist by mask exposure processing procedure
Substrate is sent to the substrate developing cell to execute exposing operation, and after executing exposing operation by figure；It is described
Substrate developing cell is used to develop to the photoresist for defining figure by developing manufacture process, to form patterned photoresist；Institute
It states developing cell cleaning device to be mounted in the exposure system, the developing cell cleaning device is respectively connected to the substrate
Coater unit and the substrate developing cell；The developing cell cleaning device is used for will be caused by the base plate coating unit
Photoresist solvent waste liquid is sent to the substrate developing cell, and carries out to the developing trough being arranged in the substrate developing cell
Cleaning.
In one embodiment of this invention, the photoresist solvent waste liquid is resin solution.
In one embodiment of this invention, the developing cell cleaning device includes an interim storage groove body and pipeline, institute
Stating pipeline includes the first pipeline and the second pipeline, and first piping connection is respectively connected to the output of the base plate coating unit
The input terminal at end and the interim storage groove body, second piping connection are respectively connected to the output of the interim storage groove body
The input terminal at end and the developing trough；The interim storage groove body is molten for storing photoresist caused by the base plate coating unit
Agent waste liquid, and it is provided to the developing trough.
In one embodiment of this invention, a first switch valve, the first switch are provided on first pipeline
Valve is used to control the flow from the base plate coating unit to the photoresist solvent waste liquid of the interim storage groove body.
In one embodiment of this invention, it is provided with a second switch valve on the interim storage groove body, described second
Switch valve will be for that will be stored in the intracorporal photoresist solvent discharging of waste liquid of the interim reserve tank to the factory service equipment outside one.
In one embodiment of this invention, a third switch valve, the third switch are provided on second pipeline
Valve is used to control the flow of the photoresist solvent waste liquid from the interim storage groove body to the developing trough.
In one embodiment of this invention, second pipeline be dismountable pipeline, second pipeline be also used to by
The interim storage groove body is detachably connected to other units of the exposure system.
In addition, the present invention also provides a kind of developing cell clean method, it is described aobvious using above-mentioned developing cell cleaning device
Shadow unit cleaning device includes an interim storage groove body and pipeline, and the pipeline includes the first pipeline and the second pipeline, the side
Method includes: that (a) base plate coating unit generates photoresist solvent waste liquid after being coated photoresist to substrate；(b) photoresist solvent is given up
Liquid is sent to interim storage groove body by the first pipeline and is stored；(c) the intracorporal light of interim reserve tank will be stored in
Resistance solvent waste liquid is provided to developing trough by the second pipeline, to clean the developing trough.
In one embodiment of this invention, a first switch valve is provided on first pipeline；The method is in step
Suddenly (b) further comprises: being controlled by first switch valve from the base plate coating unit to the light of the interim storage groove body
The flow of resistance solvent waste liquid.
In one embodiment of this invention, a third switch valve is provided on second pipeline；The method is in step
Suddenly (c) further comprises: controlling the photoresist solvent from the interim storage groove body to the developing trough by third switch valve
The flow of waste liquid.
It is shown it is an advantage of the current invention that developing cell cleaning device of the present invention passes through in base plate coating unit and substrate
Increase an interim storage groove body for accommodating photoresist solvent between shadow unit newly, and by the light blockage coating mechanism in base plate coating unit
The used photoresist solvent waste liquid of precleaning idler wheel institute carry out secondary use, in the developing trough for peace and quiet substrate developing cell
Remaining solidification photoresist residue.Therefore, the developing cell cleaning device can be improved the cleannes of substrate developing cell, solve
Because of the bad problem of product caused by photoresist residue, and secondary use photoresist solvent, to promote the utilization rate of chemical depletion product.
In addition, secondary use photoresist solvent also saves the time that relevant staff cleans substrate developing cell originally, to improve body
Mobility.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for
For those skilled in the art, without creative efforts, it can also be obtained according to these attached drawings other attached
Figure.
Fig. 1 is the configuration diagram of the exposure system of the prior art.
Fig. 2 is the schematic diagram of the developing cell cleaning device in one embodiment of the invention.
Fig. 3 is the configuration diagram of the exposure system in embodiment of the present invention, the developing cell cleaning device peace
In the exposure system.
Fig. 4 is the step flow chart of developing cell clean method in one embodiment of the invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description.Obviously, described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those skilled in the art's every other implementation obtained without creative efforts
Example, shall fall within the protection scope of the present invention.
Description and claims of this specification and term " first " in above-mentioned attached drawing, " second ", " third " etc.
(if present) is to be used to distinguish similar objects, without being used to describe a particular order or precedence order.It should be appreciated that this
The object of sample description is interchangeable under appropriate circumstances.In addition, term " includes " and " having " and their any deformation, meaning
Figure, which is to cover, non-exclusive includes.
In patent document, the attached drawing that is discussed herein below and for describing each embodiment of principle disclosed by the invention only
For illustrating, and should not be construed as limiting the scope of the present disclosure.Those skilled in the art will appreciate that original of the invention
Reason can be implemented in any system suitably arranged.It will be explained in illustrative embodiments, these realities be shown in the attached drawings
The example for applying mode.In addition, terminal accoding to exemplary embodiment will be described in detail with reference to the attached drawings.Identical attached drawing mark in attached drawing
Number refer to identical element.
Term used in description of the invention is only used to describe particular implementation, and is not intended to show of the invention
Concept.Unless have clearly different meanings in context, it is otherwise, used in the singular to express the table for covering plural form
It reaches.In the description of the present invention, it should be appreciated that there are this hairs for the terms meant for illustration such as " comprising ", " having " and " containing "
A possibility that feature for being disclosed in bright specification, number, step, movement or combinations thereof, and be not intended to exclude may be present or can
A possibility that adding other one or more features, number, step, movement or combinations thereof.Same reference numerals in attached drawing refer to
For same section.
The embodiment of the present invention provides a kind of developing cell cleaning device.It will be described in detail respectively below.
Referring to figs. 2 and 3.Fig. 2 is the schematic diagram of the developing cell cleaning device in one embodiment of the invention.Fig. 3 is this
The configuration diagram of the exposure system in the embodiment is invented, the developing cell cleaning device is mounted on the exposure system
In.
The present invention provides a kind of developing cell cleaning devices, are applied to an exposure system.The exposure system includes one
Board cleaning unit 110, a base plate coating unit 120, a base plate exposure unit 130 and a substrate developing cell 140.
Specifically, the board cleaning unit 110 is transmitted for cleaning to a substrate, and by the substrate after cleaning
To the base plate coating unit 120.The board cleaning unit 110 may include the first cleaning subelement, the second cleaning son list
Member and third clean subelement (not shown).Wherein, the first cleaning subelement is used to carry out ultraviolet light irradiation to substrate, with clear
Clean substrate.Second cleaning subelement carries out secondary cleaning to substrate by steam mode.It is dry using air knife that third cleans subelement
Drying process cleans substrate.After cleaning substrate, hot plate baking can be carried out to substrate and buffering cools down.
The light blockage coating mechanism in the base plate coating unit 120 is arranged in by one for the base plate coating unit 120
(linear coater) is coated photoresist to substrate, and the substrate of coated photoresist is sent to the base plate exposure list
Member 130.In the base plate coating unit 120, it can further pass through vacuum drier (Vacuum Chamber Dry)
Desiccation is then carrying out hot plate baking, to be further dried so that the drying of photoresist solution is cooled into solid-state.Then, will
Substrate after drying is turned to and is sent to the base plate exposure unit 130.
The base plate exposure unit 130 is used to define figure to photoresist by mask exposure processing procedure, to execute exposing operation,
And after executing exposing operation, substrate is sent to the substrate developing cell 140.130 benefit of base plate exposure unit
With mask on substrate, figure is defined to photoresist, to execute exposing operation.And then exposure edge, to remove substrate edges light
Resistance.
The substrate developing cell 140 is used to develop to the photoresist for defining figure by developing manufacture process, to be formed
Patterned photoresist.There are three developing troughs 141 for setting in the substrate developing cell 140, by the base plate exposure unit 130
Incoming substrate successively passes through three developing troughs 141, and is set multiple developing nozzle institutes above three developing troughs 141
After the photoresist developer solution of injection, the photoresist on substrate reacts with photoresist developer solution, can then form patterned photoresist.
In the present embodiment, the developing cell cleaning device is mounted in the exposure system, and the developing cell is clear
Clean device is respectively connected to the base plate coating unit 120 and the substrate developing cell 140.The developing cell cleaning device
For photoresist solvent waste liquid caused by the base plate coating unit 120 to be sent to the substrate developing cell 140, and it is right
The developing trough 141 being arranged in the substrate developing cell 140 is cleaned.
Specifically, the developing cell cleaning device includes an interim storage groove body 210 and pipeline, and the pipeline includes the
One pipeline 220 and the second pipeline 230, first pipeline 220 connect the output for being respectively connected to the base plate coating unit 120
The input terminal at end and the interim storage groove body 210, the connection of the second pipeline 230 are respectively connected to the interim storage groove body
The input terminal of 210 output end and the developing trough 141；The interim storage groove body 210 is for storing the base plate coating list
Photoresist solvent waste liquid caused by member 120, and it is provided to the developing trough 141.In the present embodiment, the base plate coating list
The precleaning idler wheel 122 of the light blockage coating mechanism of member 120 generates photoresist solvent waste liquid.The photoresist solvent waste liquid is resin solution.
Certainly, in other embodiments, the photoresist solvent waste liquid may be the solvent of other and resin solution phase same-action.
Since the substrate developing cell 140 in the prior art has not been able to provide photoresist solvent, simply by displacement water
The mode washed and directly washed cleans substrate, therefore can not effectively dispose to remain in and form solidification in developing trough 141
Photoresist residue.The developing cell cleaning device transmits photoresist solvent waste liquid caused by the base plate coating unit 120
To the substrate developing cell 140,122 used photoresist solvents of precleaning idler wheel of light blockage coating mechanism are taken full advantage of
Waste liquid, which has stronger cleaning effect to solidification photoresist residue in developing trough 141, to realize to developing trough
141 cleaning treatment.In this way, not only increasing the cleannes of developing cell, further avoid being drawn because of 141 cleanliness of developing trough
The bad problem of product risen, and secondary use photoresist solvent, to promote the utilization rate of chemical depletion product.In addition, secondary use
Photoresist solvent also saves the time that relevant staff cleans substrate developing cell 140 originally, to improve body mobility.
In addition, in the present embodiment, a first switch valve 221 is provided on first pipeline 220, described first is opened
Valve 221 is closed to be used to control the stream from the base plate coating unit 120 to the photoresist solvent waste liquid of the interim storage groove body 210
Amount.
A second switch valve 211 is provided on the interim storage groove body 210, the second switch valve 211 is used for will
It is stored in the factory service equipment of the photoresist solvent discharging of waste liquid in the interim storage groove body 210 to outside.That is, if working as
It, can first will be in the interim storage groove body 210 when photoresist solvent waste liquid caused by the base plate coating unit 120 is more
Photoresist solvent discharging of waste liquid a part is to external factory service equipment, so that temporarily storage groove body 210 has enough space to
Accommodate photoresist solvent waste liquid.
In addition, in the present embodiment, a third switch valve 231 is provided on second pipeline 230, the third is opened
Close the flow that valve 231 is used to control the photoresist solvent waste liquid from the interim storage groove body 210 to the developing trough 141.In this way,
Also the utilization rate of chemical depletion product can be effectively improved.
In the present embodiment, second pipeline 230 is dismountable pipeline.Under normal conditions, second pipeline 230
It is connected to the developing trough 141.It is of course also possible to according to the demand of live practice, such as other units of the exposure system
It needs using photoresist solvent, then can disassemble second pipeline 230, and can by the interim storage groove body 210
Dismantling connection to the exposure system other units, with provide needed for photoresist solvent.
With reference to Fig. 4.The step flow chart of developing cell clean method in one embodiment of the invention.The present invention also provides one kind
Developing cell clean method, using above-mentioned developing cell cleaning device, the developing cell cleaning device includes an interim storage
Groove body 210 and pipeline, the pipeline include the first pipeline 220 and the second pipeline 230.The described method includes:
Step S410: base plate coating unit generates photoresist solvent waste liquid after being coated photoresist to substrate.
The light blockage coating mechanism in the base plate coating unit 120 is arranged in by one for the base plate coating unit 120
(linear coater) is coated photoresist to substrate, and the substrate of coated photoresist is sent to the base plate exposure list
Member 130.In the base plate coating unit 120, it can further pass through vacuum drier (Vacuum Chamber Dry)
Desiccation is then carrying out hot plate baking, to be further dried so that the drying of photoresist solution is cooled into solid-state；Then, will
Substrate after drying is turned to and is sent to the base plate exposure unit 130.The base plate coating unit 120 to substrate into
After row coating photoresist, a large amount of photoresist solvent waste liquid can be generated.
Step S420: photoresist solvent waste liquid is sent to interim storage groove body by the first pipeline and is stored.
In the present embodiment, a first switch valve 221 is provided on first pipeline 220.The method is in step
S420 further comprises: being controlled by first switch valve 221 from the base plate coating unit 120 to the interim storage groove body
The flow of 210 photoresist solvent waste liquid.
The interim storage groove body 210 is first by a large amount of photoresist solvent waste liquid caused by the base plate coating unit 120
Temporarily stored.When needing the developing trough 141 to the substrate developing cell 140 to clean, the interim storage groove body 210
The photoresist solvent waste liquid temporarily stored is provided to the developing trough 141, so that cleaning is used.
Step S430: will be stored in the intracorporal photoresist solvent waste liquid of the interim reserve tank be provided to by the second pipeline it is aobvious
Shadow slot, to clean the developing trough.
In this example, a third switch valve 231 is provided on second pipeline 230.The method is in step
S430 further comprises: being controlled by third switch valve 231 from the interim storage groove body 210 to the developing trough 141
The flow of photoresist solvent waste liquid.In this way, can also effectively improve the utilization rate of chemical depletion product.
Developing cell cleaning device of the present invention and the method for using the device pass through in base plate coating unit 120 and base
Increase an interim storage groove body 210 for accommodating photoresist solvent between plate developing cell 140 newly, and will be in base plate coating unit 120
The used photoresist solvent waste liquids of the institute of precleaning idler wheel 122 of light blockage coating mechanism carry out secondary uses, be used for peace and quiet substrate
Remaining solidification photoresist residue in the developing trough 141 of developing cell 140.Therefore, the developing cell cleaning device can be improved
The cleannes of substrate developing cell 140, the product caused by solving the problems, such as because of photoresist residue is bad, and secondary use photoresist is molten
Agent, to promote the utilization rate of chemical depletion product.In addition, secondary use photoresist solvent also saves relevant staff's cleaning base originally
The time of plate developing cell 140, to improve body mobility.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
Member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications also should be regarded as
Protection scope of the present invention.
Claims (10)
1. a kind of developing cell cleaning device, is applied to an exposure system, the exposure system includes a board cleaning unit, one
Base plate coating unit, a base plate exposure unit and a substrate developing cell；The board cleaning unit is used to carry out a substrate
Cleaning, and the substrate after cleaning is sent to the base plate coating unit；The base plate coating unit is arranged by one in institute
It states the light blockage coating mechanism in base plate coating unit and photoresist is coated to substrate, and the substrate of coated photoresist is sent to
The base plate exposure unit；The base plate exposure unit is used to define figure to photoresist by mask exposure processing procedure, to execute exposure
Light operation, and after executing exposing operation, substrate is sent to the substrate developing cell；The substrate developing cell is used
Develop in by developing manufacture process to the photoresist for defining figure, to form patterned photoresist；It is characterized in that, described aobvious
Shadow unit cleaning device is mounted in the exposure system, and the developing cell cleaning device is respectively connected to the base plate coating
Unit and the substrate developing cell；The developing cell cleaning device is used for photoresist caused by the base plate coating unit
Solvent waste liquid is sent to the substrate developing cell, and carries out to the developing trough being arranged in the substrate developing cell clear
It is clean.
2. developing cell cleaning device according to claim 1, which is characterized in that the photoresist solvent waste liquid is that resin is molten
Liquid.
3. developing cell cleaning device according to claim 1, which is characterized in that the developing cell cleaning device includes
One interim storage groove body and pipeline, the pipeline include the first pipeline and the second pipeline, and first piping connection is separately connected
To the output end of the base plate coating unit and the input terminal of the interim storage groove body, second piping connection is separately connected
To the output end of the interim storage groove body and the input terminal of the developing trough；The interim storage groove body is for storing the base
Photoresist solvent waste liquid caused by plate coater unit, and it is provided to the developing trough.
4. developing cell cleaning device according to claim 3, which is characterized in that be provided with one on first pipeline
First switch valve, the first switch valve are molten to the photoresist of the interim storage groove body from the base plate coating unit for controlling
The flow of agent waste liquid.
5. developing cell cleaning device according to claim 3, which is characterized in that be arranged on the interim storage groove body
There is a second switch valve, the second switch valve will be for that will be stored in the intracorporal photoresist solvent discharging of waste liquid of the interim reserve tank
To external factory service equipment.
6. developing cell cleaning device according to claim 3, which is characterized in that be provided with one on second pipeline
Third switch valve, the third switch valve are used to control the photoresist solvent waste liquid from the interim storage groove body to the developing trough
Flow.
7. developing cell cleaning device according to claim 3, which is characterized in that second pipeline is dismountable pipe
Road, second pipeline are also used to for the interim storage groove body being detachably connected to other units of the exposure system.
8. a kind of developing cell clean method, using developing cell cleaning device described in claim 1, the developing cell is clear
Clean device includes an interim storage groove body and pipeline, and the pipeline includes the first pipeline and the second pipeline, which is characterized in that described
Method includes:
(a) base plate coating unit generates photoresist solvent waste liquid after being coated photoresist to substrate；
(b) photoresist solvent waste liquid is sent to interim storage groove body by the first pipeline and stored；
(c) the interim reserve tank intracorporal photoresist solvent waste liquid will be stored in, developing trough is provided to by the second pipeline, with clear
The clean developing trough.
9. developing cell clean method according to claim 8, which is characterized in that be provided with one on first pipeline
First switch valve；The method further comprises in step (b):
It is controlled by first switch valve from the base plate coating unit to the stream of the photoresist solvent waste liquid of the interim storage groove body
Amount.
10. developing cell clean method according to claim 8, which is characterized in that be provided on second pipeline
One third switch valve；The method further comprises in step (c):
The flow of the photoresist solvent waste liquid from the interim storage groove body to the developing trough is controlled by third switch valve.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811128282.8A CN109324484B (en) | 2018-09-27 | 2018-09-27 | Developing unit cleaning device and cleaning method using the same |
| PCT/CN2019/086740 WO2020062886A1 (en) | 2018-09-27 | 2019-05-14 | Developing unit cleaning device and cleaning method using same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811128282.8A CN109324484B (en) | 2018-09-27 | 2018-09-27 | Developing unit cleaning device and cleaning method using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109324484A true CN109324484A (en) | 2019-02-12 |
| CN109324484B CN109324484B (en) | 2020-03-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811128282.8A Active CN109324484B (en) | 2018-09-27 | 2018-09-27 | Developing unit cleaning device and cleaning method using the same |
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| CN (1) | CN109324484B (en) |
| WO (1) | WO2020062886A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020062886A1 (en) * | 2018-09-27 | 2020-04-02 | 武汉华星光电技术有限公司 | Developing unit cleaning device and cleaning method using same |
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| JP2000195833A (en) * | 1998-12-28 | 2000-07-14 | Nomura Micro Sci Co Ltd | Method and device for cleaning |
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| CN108117197A (en) * | 2018-02-06 | 2018-06-05 | 武汉华星光电技术有限公司 | Filter device |
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| CN104297828A (en) * | 2014-09-30 | 2015-01-21 | 中国科学院长春光学精密机械与物理研究所 | Method for manufacturing variable-pitch optical grating |
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| CN205721074U (en) * | 2016-05-30 | 2016-11-23 | 昆山沪利微电有限公司 | A kind of developing trough of automated cleaning |
| US10866516B2 (en) * | 2016-08-05 | 2020-12-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Metal-compound-removing solvent and method in lithography |
| CN109324484B (en) * | 2018-09-27 | 2020-03-27 | 武汉华星光电技术有限公司 | Developing unit cleaning device and cleaning method using the same |
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| CN204406032U (en) * | 2014-12-19 | 2015-06-17 | 卢兆晓 | A kind of cleaning fluid recycling device for developing machine |
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| CN109324484B (en) | 2020-03-27 |
| WO2020062886A1 (en) | 2020-04-02 |
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