CN105022232B - The error calibrating method of wave aberration measurement apparatus - Google Patents
The error calibrating method of wave aberration measurement apparatus Download PDFInfo
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Abstract
The invention provides a kind of error calibrating method of wave aberration measurement apparatus, comprise the following steps：Step 1：Wave aberration measurement is carried out by the relative motion of several image planes measurement markers in the object plane measurement markers and the datum plate of work stage on the mask plate of mask platform, the inclination conditions of the datum plate are then calculated by the result of measurement；Step 2：The anglec of rotation of the datum plate is calculated by the result of measurement；Step 3：Compensation is adjusted to the datum plate according to the inclination conditions of the datum plate and the anglec of rotation.The present invention has been abandoned using mask registration, silicon chip alignment and FLS to carry out the method for object plane and the mark alignment of image planes wave aberration, but uses wave aberration measurement result to calculate the alignment precision that wave aberration marks, and is adjusted；It whether there is angle between object plane and the image planes sports platform direction of motion and label orientation by measuring, and be adjusted.
Description
Technical field
The present invention relates to semiconductor applications, more particularly to a kind of error calibrating method of wave aberration measurement apparatus.
Background technology
With extending downwardly for litho machine critical size node, the influence of object lens picture confrontation CD and alignment is more and more obvious,
So need accurately to measure objective wave aberration and distortion.Wave aberration measurement to object lens is usually using double grating Transverse Shear
Principle of interference is cut, the grating being mutually matched by object plane and image planes two forms lateral shear interferograms and object lens are detected.
The image planes marking plate mark structure that wave aberration measurement subsystem uses is as shown in figure 1, middle wave aberration measurement is marked
Note region is covered with wave aberration measurement markers；Eight WA around region be present to mark, available for being aligned, marking plate chromium plating, exist compared with
High reflectivity, is available for FLS to measure.In the measurement procedure of routine, object plane is completed by mask registration and silicon chip alignment
With the alignment procedures of image planes mark.But thus have a problem that, what this method ensured is in alignment with pair between mark
Alignment precision between quasi- precision, rather than wave aberration measurement markers.This means that the alignment between wave aberration measurement markers
Precision further comprises mark processing and manufacturing error, marking plate stress deformation and thermal deformation in addition to being influenceed by mask registration precision
Caused error.This, which results in object plane and the mark of image planes, can have inclination and rotation, directly affect the precision of wave aberration measurement.
Mask plate marks machining accuracy at present in tens nanometer scales, and marking plate is caused measurement zone by stress and influence of thermal deformation
Flatness in domain reaches hundreds of nanometers, and these are influenceed for wave aberration measurement, are had a great influence.
Alignment mark is remote apart from wave aberration test badge, and the error brought may be bigger.The mark of wave aberration test at present
Distance nearly 10mm between note and silicon chip alignment mark, as shown in figure 1, it is difficult to ensure that the alignment essence of wave aberration measurement markers
Degree.
Leveling equally is carried out there is also Similar Problems to wave aberration measurement markers plate using focusing and leveling sensor, measurement and
What is adjusted is the inclination and rotation of whole marking plate, can not measure the inclination of wave aberration measurement markers.
It is unknown to be additionally, since the rotation of single wave aberration measurement markers, causes image planes sports platform or object plane sports platform to exist
Scanning or phase shift during, may result in mark phase shift and scanning direction between it is nonopiate, this point can also influence ripple
The precision of aberration measurement.
So after by mask registration, silicon chip alignment and FLS focusing and levelings, the alignment of object plane and image planes wave aberration mark
As a result it may tilt and rotate as shown in Fig. 2 existing.In this case, if necessary to further improve wave aberration measurement essence
Degree, must just obtain object plane and the direct alignment precision of image planes wave aberration measurement markers, and be adjusted so as to ensure both it
Between be not present tilt and rotation.
The content of the invention
The technical problem to be solved in the present invention is how by the use that is marked to wave aberration to improve alignment precision, and is carried out
Adjustment.
In order to solve this technical problem, the invention provides a kind of error calibrating method of wave aberration measurement apparatus, bag
Include following steps：
Step 1：Pass through several pictures in the object plane measurement markers and the datum plate of work stage on the mask plate of mask platform
The relative motion of planar survey mark carries out wave aberration measurement, then calculates the inclination feelings of the datum plate by the result of measurement
Condition.
Step 2：The anglec of rotation of the datum plate is calculated by the result of measurement；
Step 3：Compensation is adjusted to the datum plate according to the inclination conditions of the datum plate and the anglec of rotation.
It is further comprising the steps of：
Step 4：Position phasor is obtained by the relative motion of an object plane measurement markers and an image planes measurement markers, so
Pass through the direction of motion of position PHASE DIAGRAM CALCULATION mask platform and the angle of image planes measurement markers or the direction of motion and thing of work stage afterwards
The angle of planar survey mark；
Step 5：Compensation is adjusted to mask platform position or work stage position according to the angle.
Comprise the following steps in the step 1：
S101：Object plane measurement markers on mask plate are moved to the field of view center point of object lens, by the image planes on datum plate
The regional center of measurement markers is moved to nominal position corresponding with object plane measurement markers.
S102：Select datum plate on some image planes measurement markers, by the object plane measurement markers respectively with it is each
Relative motion occurs for image planes measurement markers, and sensor carries out IMAQ and wave aberration measurement, obtains the measurement of this several image planes
Zelnick aberration coefficients corresponding to mark；
S103：The defocus position according to corresponding to the Zelnick aberration coefficients calculate some image planes measurement markers,
Inclination conditions Tx, Ty of the datum plate are calculated by the defocus position again.
The quantity of the image planes measurement markers is at least four.
Defocus position dF corresponding to the image planes measurement markers is obtained according to Zelnick aberration coefficients Z4 by below equation
：
Wherein, n is median, and dF is defocusing amount, and NA is the numerical aperture of object lens, and λ is wavelength.
Relation between inclination conditions Tx, Ty and defocusing amount dF of the datum plate meets following formula：
DF=Txx+Tyy+c
Wherein, x, y are the nominal positions of the image planes measurement markers, and dF is defocusing amount, and c is constant, and then according to the public affairs
Inclination conditions Tx, Ty of the datum plate is calculated in formula and measurement result.
When calculating inclination conditions Tx, Ty of the datum plate, select at least three in some image planes measurement markers
Measurement result, be applied in following formula：
Wherein, (x1, y1)、(x2, y2) and (x3, y3) be the image planes measurement markers nominal position, inv is to seek matrix
It is inverse, so as to which inclination conditions Tx, Ty of the datum plate be calculated.
The step 2 comprises the following steps：
S201：Measured according to the wave aberration, obtain Zelnick aberration coefficients corresponding to image planes measurement markers, Ke Yiji
Calculate physical location X, Y of several image planes measurement markers；
S202：According to the anglec of rotation Rz of datum plate described in above-mentioned actual calculation of location.
In the step S201, the quantity of the wave aberration measurement markers is at least four, selects the image planes measurement mark
Two measurement results in note, using Z2, Z3 in the two measurement results, are applied in below equation, obtain the image planes and survey
Physical location corresponding to amount mark（X1, Y1）、（X2, Y2）：
Wherein, NA is the numerical aperture of object lens.
Physical location corresponding to the image planes measurement markers is applied in below equation, calculates the rotation of the datum plate
Angle Rz：
The step 4 comprises the following steps：
S401：Make relative motion occurs between the object plane measurement markers and the image planes measurement markers, pass
Sensor gathers position phasor, the curve map that the move distance of mark changes and changed that accompanies of ascending the throne；
S402：Differed according to this PHASE DIAGRAM CALCULATION position, then by institute's rheme phasemeter calculate the direction of motion of mask platform with
The angle in image planes measurement markers direction, or the direction of motion of work stage and the angle in object plane measurement markers direction.
In the step S401, the image planes measurement markers position is constant, and the object plane measurement markers are in the first direction
Move linearly to scan the image planes mark, select two regions in the image planes mark second direction, the first party
To perpendicular to second direction, while the mobile object plane measurement markers, first to first region of image planes mark along the
In several cycles of one scanning direction, then the object plane, which marks, is switched to the Two Areas that the image planes mark, in mobile institute
Several cycles are scanned while stating object plane measurement markers in the first direction, so as to collect the position phasor in two regions.
The wave aberration measurement markers are grating.
Obtained using the position PHASE DIAGRAM CALCULATION collected and differed in place, the direction of motion and image planes that the mask platform is calculated are surveyed
Measure the angle of label orientation, or the direction of motion of work stage and the angle in object plane measurement markers direction.
The direction of motion of the mask platform and the angle in image planes measurement markers direction, or the direction of motion and object plane of work stage
The angle in measurement markers direction is obtained by below equation：
Wherein, p is the moving grating cycle, and d is the switching distance of moving grating, and Δ θ differs for position.
When measuring the rotation of Y-direction, the lines of the grating are set along Y-direction, and X-direction and the first direction are same
To.
When measuring the rotation of X-direction, the lines of the grating are set in X direction, and Y-direction and the first direction are same
To.
The error calibrating method of described wave aberration measurement apparatus also includes step 6：According to the knot of the adjustment compensation
Fruit, carry out wave aberration measurement.
The present invention has been abandoned using mask registration, silicon chip alignment and FLS to carry out object plane and the mark alignment of image planes wave aberration
Method, but used wave aberration measurement markers to realize the inclination conditions of the datum plate and the anglec of rotation and mask plate
Or the direction of motion of datum plate and the rotation angle in wave aberration measurement markers direction are adjusted compensation.Specifically, using ripple
Aberration measurement result calculates the alignment precision of wave aberration mark, and is adjusted；Moved by measuring object plane and image planes sports platform
It whether there is angle between direction and label orientation, and be adjusted.
Brief description of the drawings
Fig. 1 is alignment mark of the prior art and the distribution schematic diagram of wave aberration measurement markers；
Fig. 2 is wave aberration measurement markers alignment result schematic diagram in the prior art；
Fig. 3 is the structural representation of one embodiment of the invention medium wave aberration measurement device；
Fig. 4 is the schematic flow sheet in one embodiment of the invention；
Fig. 5 is the schematic diagram of test badge 1,2,3,4 in one embodiment of the invention；
Fig. 6 and Fig. 7 is the direction of motion of mask plate or datum plate and wave aberration measurement markers side in one embodiment of the invention
To the position phase schematic diagram that rotation be present；
Fig. 8 and Fig. 9 is the direction of motion of mask plate or datum plate and wave aberration measurement markers side in one embodiment of the invention
To the position phase schematic diagram in the absence of rotation.
Embodiment
Error school below with reference to Fig. 3 to Fig. 9 by one embodiment to wave aberration measurement apparatus provided by the invention
Quasi- method is described in detail, and it is an optional embodiment of the invention, it is believed that those skilled in the art is not changing
Become in the range of present invention spirit and content, it can be modified and polished.
The present invention is used for solving object plane and the alignment error of image planes measurement markers in wave aberration measurement process.It is of the invention and existing
There is technology to compare, reduce the dependence that wave aberration measurement is aligned to FLS, mask registration, silicon chip；Improve wave aberration measurement mark
The alignment precision of note；Improve the precision of wave aberration measurement.
Because wave aberration measurement result possesses very high precision in itself, so Adjustment precision is very high.The precision of wave aberration can
To reach several nanometers, because the marked region size that is measured available for wave aberration is in centimetre scale, so object plane and image planes
Measurement markers alignment tilts and the measurement accuracy of rotation can reach the microradian order of magnitude.
Same wave aberration measurement accuracy reaches nanometer scale, and this means that phase measurement precision can reach pi/
100, equally, for the angle between the direction of motion and measurement markers direction of object plane or image planes sports platform, measurement accuracy also may be used
To reach the microradian order of magnitude.
To sum up, the present invention can reach very high measurement accuracy.
Fig. 3 and Fig. 4 are refer to, present embodiments provides a kind of error calibrating method of wave aberration measurement apparatus, including with
Lower step：
Step 1：By some in the object plane measurement markers and the datum plate of work stage on the mask plate of mask platform
The relative motion of individual image planes measurement markers carries out wave aberration measurement, then calculates the inclination of the datum plate by the result of measurement
Situation.
Step 2：The anglec of rotation of the datum plate is calculated by the result of measurement.
Step 3：Compensation is adjusted to the datum plate according to the inclination conditions of the datum plate and the anglec of rotation.
Further, step 4：Obtained by the relative motion of an object plane measurement markers and an image planes measurement markers
Position phasor, the then direction of motion by position PHASE DIAGRAM CALCULATION mask platform and the angle of image planes measurement markers or the motion of work stage
Direction and the angle of object plane measurement markers.
Step 5：Compensation is adjusted to mask platform position or work stage position according to the angle.
Further, step 6：According to the result of the adjustment compensation, wave aberration measurement is carried out.
Object plane measurement markers on the mask plate that the step 1 passes through mask platform and on the datum plate of work stage
The relative motion of several image planes measurement markers carries out wave aberration measurement, then calculates the datum plate by the result of measurement
Inclination conditions, further comprise：
S101：Object plane measurement markers on mask plate are moved to the field of view center point of object lens, by the image planes on datum plate
The regional center of measurement markers is moved to nominal position corresponding with object plane measurement markers.
Wherein, Fig. 3 is refer to, wave aberration measurement markers include image planes measurement markers and the mask on the datum plate
Object plane measurement markers on plate, also separately there is alignment mark on datum plate and mask plate, just do not described in figure.
S102：Select datum plate on some image planes measurement markers, by the object plane measurement markers respectively with it is each
Relative motion occurs for image planes measurement markers, and sensor carries out IMAQ and wave aberration measurement, obtains the measurement of this several image planes
Zelnick aberration coefficients corresponding to mark.
In the present embodiment, the quantity of the image planes measurement markers is at least 4, and the present embodiment lists 4, i.e., such as Fig. 5
Shown measurement markers 1,2,3,4.
S103：The defocus position according to corresponding to the Zelnick aberration coefficients calculate some image planes measurement markers.
Specifically, in the present embodiment, defocus position dF is according to Zelnick corresponding to four image planes measurement markers
Aberration coefficients Z4Obtained by below equation：
Wherein, n is median, and dF is defocusing amount, and NA is the numerical aperture of object lens, and λ is wavelength.
S104：The inclination conditions T of the datum plate is calculated by the defocus positionx、Ty。
It should be noted that the inclination conditions T of the datum platex、TyAnd the relation between defocusing amount dF meet it is following
Formula：
DF=Txx+Tyy+c
Wherein, x, y are the nominal positions of the image planes measurement markers, and dF is defocusing amount, and c is constant.
Measured due to have selected several image planes measurement markers, therefore in the inclination conditions for calculating the datum plate
Tx、TyWhen, at least three measurement results in some image planes measurement markers are selected, in the present embodiment, in four measurement results
Middle selection three, is applied in following formula：
Wherein, (x1, y1)、(x2, y2) and (x3, y3) be the image planes measurement markers nominal position, inv is to seek matrix
It is inverse, so as to which the inclination conditions T of the datum plate be calculatedx、Ty。
The step 2 calculates the anglec of rotation of the datum plate by the result of measurement, further comprises：
S201：Measured according to the wave aberration, obtain Zelnick aberration coefficients corresponding to image planes measurement markers, Ke Yiji
Calculate physical location x, y of several image planes measurement markers.
Specifically, Zelnick aberration coefficients include Z2, Z3, in the present embodiment, the wave aberration measurement markers
Quantity is at least four, selects two measurement results in the image planes measurement markers, using Z2, Z3 in the two measurement results,
It is applied in below equation, obtains physical location (X corresponding to the image planes measurement markers1, Y1)、(X2, Y2)：
Wherein, NA is the numerical aperture of object lens.
S202：Physical location corresponding to the image planes measurement markers is applied in below equation, calculates the datum plate
Anglec of rotation Rz：
The step 4 obtains position phasor by the relative motion of an object plane measurement markers and an image planes measurement markers,
Then by the direction of motion of the direction of motion of position PHASE DIAGRAM CALCULATION mask platform and the angle of image planes measurement markers or work stage with
The angle of object plane measurement markers, further comprises：
S401：Make relative motion occurs between the object plane measurement markers and the image planes measurement markers, pass
Sensor gathers position phasor, the curve map that the move distance of mark changes and changed that accompanies of ascending the throne；
In the present embodiment, because wave aberration measurement markers image planes measurement markers are more than object plane measurement markers, so this reality
It is constant to apply the preferred image planes measurement markers position of example, scheme that the object plane measurement markers move, specifically,
During measurement, the image planes measurement markers position is constant, and the object plane measurement markers move linearly to scan in the first direction
Image planes mark is stated, selectes two regions in the image planes mark second direction, the first direction moves perpendicular to second direction
While the dynamic object plane mark, is first scanned in the first direction to first region of image planes mark several cycles, so
The object plane mark is switched to the Two Areas of the image planes mark afterwards, along first party while the movement object plane mark
To several cycles are scanned, so as to collect the position phasor in two regions.The wave aberration measurement markers are grating.Certainly, exist
, can also be constant using object plane measurement markers position in other optional embodiments of the invention, image planes measurement markers move
Scheme, its principle is similar with the present embodiment with implementation.
Furthermore, it is understood that in the present embodiment, Fig. 6 to Fig. 9 is refer to, image planes measurement markers position is kept in measurement process
It is constant, it can be marked along X-direction motive objects planar survey as depicted, when measuring the rotation of Y-direction, the lines of the grating
Set along Y-direction, X-direction and the first direction are in the same direction.In the present embodiment, in image planes measurement markers the top region along X side
To several mark cycles are scanned, the region of image planes measurement markers bottom is then switched to, scans several weeks in X direction
Phase, sensor carry out IMAQ, scope of certain object plane measurement markers no more than image planes measurement markers in lower section.Position phasor
The wavefront calculations that can be obtained by sensor measurement, which go out, to be directly converted to according to the light intensity that sensor measures,
Wherein, the longitudinal axis represents position phase, and transverse axis represents the distance of measurement markers movement.
In another optional embodiment of the present invention, when measuring the rotation of X-direction, the lines of the grating are in X direction
Set, Y-direction and the first direction are in the same direction, i.e., are marked along Y-direction motive objects planar survey.
S402：Differed according to this PHASE DIAGRAM CALCULATION position, then by institute's rheme phasemeter calculate the direction of motion of mask platform with
The angle in image planes measurement markers direction, or the direction of motion of work stage and the angle in object plane measurement markers direction.
Particularly, after the step of above, the position PHASE DIAGRAM CALCULATION collected can be utilized to obtain and differed in place, it is described to cover
The direction of motion of die station and the angle in image planes measurement markers direction, or the direction of motion of work stage and object plane measurement markers direction
Angle is obtained by below equation：
Wherein, p is the cycle of moving grating, and d is the switching distance of moving grating, and Δ θ differs for position.
In summary, the present invention has been abandoned using mask registration, silicon chip alignment and FLS to carry out object plane and image planes wave aberration
Mark alignment method, but used wave aberration measurement markers realize the inclination conditions of the datum plate and the anglec of rotation with
And the direction of motion of mask platform or work stage and the rotation angle in wave aberration measurement markers direction are adjusted compensation.It is specific next
Say, the alignment precision of wave aberration mark is calculated using wave aberration measurement result, and be adjusted；Transported by measuring object plane and image planes
It is dynamic to whether there is angle between the platform direction of motion and label orientation, and be adjusted.
Claims (13)
1. a kind of error calibrating method of wave aberration measurement apparatus, comprises the following steps：
Step 1：Surveyed by several image planes in the object plane measurement markers and the datum plate of work stage on the mask plate of mask platform
The relative motion of amount mark carries out wave aberration measurement, then calculates the inclination conditions of the datum plate, ripple by the result of measurement
Aberration measurement mark includes the image planes measurement markers and the object plane measurement markers；
Step 2：The anglec of rotation of the datum plate is calculated by the result of measurement；
Step 3：Compensation is adjusted to the datum plate according to the inclination conditions of the datum plate and the anglec of rotation；
Step 4：Position phasor, Ran Houtong are obtained by the relative motion of an object plane measurement markers and an image planes measurement markers
The direction of motion of position PHASE DIAGRAM CALCULATION mask platform is crossed to survey with the direction of motion of the angle of image planes measurement markers or work stage and object plane
Measure the angle of mark；
Step 5：Compensation is adjusted to mask platform position or work stage position according to the angle；
Comprise the following steps in the step 1：
S101：Object plane measurement markers on mask plate are moved to the field of view center point of object lens, the image planes on datum plate are measured
The regional center of mark is moved to nominal position corresponding with object plane measurement markers；
S102：Select datum plate on some image planes measurement markers, by the object plane measurement markers respectively with each image planes
Relative motion occurs for measurement markers, and sensor carries out IMAQ and wave aberration measurement, obtains this several image planes measurement markers
Corresponding Zelnick aberration coefficients；
S103：The defocus position according to corresponding to the Zelnick aberration coefficients calculate some image planes measurement markers, then lead to
Cross the inclination conditions T that the defocus position calculates the datum platex、Ty；
The step 2 comprises the following steps：
S201：Measured, Zelnick aberration coefficients corresponding to acquisition image planes measurement markers, can calculated according to the wave aberration
Physical location X, Y of several image planes measurement markers；
S202：According to the anglec of rotation Rz of datum plate described in above-mentioned actual calculation of location；
The step 4 comprises the following steps：
S401：Make relative motion, sensor occurs between the object plane measurement markers and the image planes measurement markers
Position phasor is gathered, the curve map that the move distance of mark changes and changed that accompanies of ascending the throne；
S402：Differed according to this PHASE DIAGRAM CALCULATION position, then the direction of motion and image planes of mask platform are calculated by institute's rheme phasemeter
The angle in measurement markers direction, or the direction of motion of work stage and the angle in object plane measurement markers direction.
2. the error calibrating method of wave aberration measurement apparatus as claimed in claim 1, it is characterised in that：The image planes measurement mark
The quantity of note is at least four.
3. the error calibrating method of wave aberration measurement apparatus as claimed in claim 2, it is characterised in that：The image planes measurement mark
Defocus position dF corresponding to note is according to Zelnick aberration coefficients Z4Obtained by below equation：
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Wherein, n is median, and dF is defocusing amount, and NA is the numerical aperture of object lens, and λ is wavelength.
4. the error calibrating method of wave aberration measurement apparatus as claimed in claim 1, it is characterised in that：The datum plate inclines
Oblique situation Tx、TyAnd the relation between defocusing amount dF meets following formula：
DF=Txx+Tyy+c
Wherein, x, y are the nominal positions of the image planes measurement markers, and dF is defocusing amount, and c is constant, so according to the formula and
The inclination conditions T of the datum plate is calculated in measurement resultx、Ty。
5. the error calibrating method of wave aberration measurement apparatus as claimed in claim 4, it is characterised in that：Calculating the benchmark
The inclination conditions T of platex、TyWhen, select in some image planes measurement markers at least three measurement result, be applied to following
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</mrow>
Wherein, (x1, y1)、(x2, y2) and (x3, y3) be the image planes measurement markers nominal position, inv to seek inverse of a matrix,
So as to which the inclination conditions T of the datum plate be calculatedx、Ty。
6. the error calibrating method of wave aberration measurement apparatus as claimed in claim 1, it is characterised in that：In the step S201
In, the quantity of the wave aberration measurement markers is at least four, selects two measurement results in the image planes measurement markers, is utilized
Z2, Z3 in the two measurement results, are applied in below equation, obtain physical location corresponding to the image planes measurement markers
(X1, Y1)、(X2, Y2)：
<mrow>
<mi>X</mi>
<mo>=</mo>
<mo>-</mo>
<mfrac>
<msub>
<mi>Z</mi>
<mn>2</mn>
</msub>
<mrow>
<mi>N</mi>
<mi>A</mi>
</mrow>
</mfrac>
<mo>;</mo>
</mrow>
<mrow>
<mi>Y</mi>
<mo>=</mo>
<mo>-</mo>
<mfrac>
<msub>
<mi>Z</mi>
<mn>3</mn>
</msub>
<mrow>
<mi>N</mi>
<mi>A</mi>
</mrow>
</mfrac>
<mo>;</mo>
</mrow>
Wherein, NA is the numerical aperture of object lens.
7. the error calibrating method of wave aberration measurement apparatus as claimed in claim 6, it is characterised in that：The image planes are measured
Physical location is applied in below equation corresponding to mark, calculates the anglec of rotation Rz of the datum plate：
<mrow>
<mi>t</mi>
<mi>a</mi>
<mi>n</mi>
<mrow>
<mo>(</mo>
<mi>R</mi>
<mi>z</mi>
<mo>)</mo>
</mrow>
<mo>=</mo>
<mfrac>
<mrow>
<msub>
<mi>X</mi>
<mn>1</mn>
</msub>
<mo>-</mo>
<msub>
<mi>X</mi>
<mn>2</mn>
</msub>
</mrow>
<mrow>
<msub>
<mi>Y</mi>
<mn>1</mn>
</msub>
<mo>-</mo>
<msub>
<mi>Y</mi>
<mn>2</mn>
</msub>
</mrow>
</mfrac>
<mo>.</mo>
</mrow>
8. the error calibrating method of wave aberration measurement apparatus as claimed in claim 1, it is characterised in that：In the step S401
In, the image planes measurement markers position is constant, and the object plane measurement markers move linearly to scan the picture in the first direction
Face marks, and selectes two regions in the image planes mark second direction, the first direction is perpendicular to second direction, mobile institute
While stating object plane measurement markers, is first scanned in the first direction to first region of image planes mark several cycles, so
Object plane mark is switched to the Two Areas of the image planes mark afterwards, along the while the movement object plane measurement markers
In several cycles of one scanning direction, so as to collect the position phasor in two regions, the wave aberration measurement markers are grating.
9. the error calibrating method of wave aberration measurement apparatus as claimed in claim 8, it is characterised in that：Utilize the position collected
PHASE DIAGRAM CALCULATION obtains to differ in place, and the direction of motion of the mask platform and the angle in image planes measurement markers direction, or work is calculated
The direction of motion of part platform and the angle in object plane measurement markers direction.
10. the error calibrating method of wave aberration measurement apparatus as claimed in claim 9, it is characterised in that：The mask platform
The direction of motion and the angle in image planes measurement markers direction, or the direction of motion of work stage and the angle in object plane measurement markers direction lead to
Below equation is crossed to obtain：
<mrow>
<mi>t</mi>
<mi>a</mi>
<mi>n</mi>
<mrow>
<mo>(</mo>
<mi>R</mi>
<mo>)</mo>
</mrow>
<mo>=</mo>
<mfrac>
<mrow>
<mi>p</mi>
<mo>&times;</mo>
<mi>&Delta;</mi>
<mi>&theta;</mi>
</mrow>
<mrow>
<mn>2</mn>
<mo>&times;</mo>
<mi>&pi;</mi>
<mo>&times;</mo>
<mi>d</mi>
</mrow>
</mfrac>
</mrow>
Wherein, p is the moving grating cycle, and d is the switching distance of moving grating, and Δ θ differs for position.
11. the error calibrating method of wave aberration measurement apparatus as claimed in claim 8, it is characterised in that：When measurement Y-direction
During rotation, the lines of the object plane measurement markers are set along Y-direction, and X-direction and the first direction are in the same direction.
12. the error calibrating method of wave aberration measurement apparatus as claimed in claim 8, it is characterised in that：When measurement X-direction
During rotation, the lines of the object plane measurement markers are set in X direction, and Y-direction and the first direction are in the same direction.
13. the error calibrating method of wave aberration measurement apparatus as claimed in claim 1, it is characterised in that：Also include step 6：
According to the result of the adjustment compensation, wave aberration measurement is carried out.
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| JP5095539B2 (en) * | 2008-07-17 | 2012-12-12 | 富士フイルム株式会社 | Aberration measurement error correction method |
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