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CN104480440A - 小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备 - Google Patents

小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备 Download PDF

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CN104480440A
CN104480440A CN201410612086.3A CN201410612086A CN104480440A CN 104480440 A CN104480440 A CN 104480440A CN 201410612086 A CN201410612086 A CN 201410612086A CN 104480440 A CN104480440 A CN 104480440A
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small size
film plating
magnetic body
iron boron
neodymium iron
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彭众杰
杨昆昆
贾道宁
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Yantai Shougang Magnetic Materials Inc
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Priority to CN201410612086.3A priority Critical patent/CN104480440A/zh
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Priority to JP2015209944A priority patent/JP2016089271A/ja
Priority to EP15192897.5A priority patent/EP3020848B1/en
Priority to US14/933,516 priority patent/US10208376B2/en
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Abstract

本发明公开了一种小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备，将小尺寸钕铁硼磁体试样与钢珠一起放入专用真空镀膜设备的滚筒中，抽真空至6-9×10-3pa，开启滚筒转动并继续抽真空至3-6×10-3pa后，通入氩气至真空度为3-6×10-1pa后，开启靶源，开始真空镀膜；专用镀膜设备炉体结构为卧式，真空炉体内装有网状滚筒，滚筒的一端固定在后炉壁上并由转轴带动，靶源分别设定在炉体两侧，靶面对准滚筒；此种镀膜方法的特点是无污染，对磁体无损伤，专用镀膜设备结构简单，对试样形状限定小，镀膜效率高；主要用于小尺寸钕铁硼磁体表面金属防腐膜层的制备。

Description

小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备
技术领域：
本发明主要涉及钕铁硼磁体表面防腐技术领域，具体地讲是小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备。
背景技术：
钕铁硼磁体由于富钕相和Nd2Fe14B相之间电位差的存在，以及钕铁硼磁体的吸氢作用使得其极易发生腐蚀，一般采用在钕铁硼磁体表面制备防腐膜层的方式对其进行防腐，常见的钕铁硼磁体表面防腐膜层的制备方式有电泳、喷涂、真空镀膜和电镀。
目前对于小尺寸钕铁硼磁体，由于难以采用普通夹具快速固定磁体试样的原因，一般均采用滚动电镀或滚动喷涂的方式在其表面生成一层防腐膜层，但电镀中酸、碱的存在会对磁体产生损伤，喷涂过程会对人体和环境造成一定的损害。
目前，在一些颗粒状的金属和非金属零件上，有利用斜卧式磁控多弧离子镀膜机内安装滚筒的方式进行的镀膜的实例，但炉体结构复杂，对试样形状要求较严且在钕铁硼真空镀膜领域并未应用。
发明内容：
本发明的目的是克服上述已有技术的不足，而提供一种小尺寸钕铁硼磁体表面真空镀膜方法。
本发明的另一目的提供一种小尺寸钕铁硼磁体表面真空镀膜的专用镀膜设备。
本发明主要解决现有的小尺寸钕铁硼磁体表面难以进行真空镀膜的问题。
本发明的技术方案是：小尺寸钕铁硼磁体表面真空镀膜方法，其特殊之处在于，包括如下工艺步骤：将脱脂酸洗后的小尺寸钕铁硼磁体试样与钢珠一起放入专用镀膜设备的滚筒中，关闭炉门抽真空至6-9×10-3pa后，开启滚筒转动使钢珠与磁体混合均匀，滚筒转速为5-20r/min，继续抽真空至3-6×10-3pa后，打开氩气至真空度为3-6×10-1pa后，打开靶源，开始镀膜。
进一步的，所述的小尺寸钕铁硼磁体试样的尺寸范围为厚度、长度和宽度方向均小于15mm，且三个方向的尺寸差异小于10mm。
进一步的，所述的钢珠大小为Φ2mm-Φ6mm，钢珠的重量为小尺寸钕铁硼磁体试样重量的0.25-1.5倍。
进一步的，所述的镀膜方式为多弧离子镀或磁控溅射。
本发明的专用镀膜设备，主体结构为卧式，它包括圆筒形炉壁，圆筒形炉壁一端设后炉壁，形成炉体，炉体下设底架，其特殊之处在于，在圆筒形炉壁上设氩气进气口和真空系统抽气口，圆筒形炉壁的另一端设炉门，炉门上设观察窗；在后炉壁上的转轴上固定滚筒，滚筒为网状，一端密闭，滚筒由后炉壁上的转轴带动旋转，滚筒内壁上设搅拌片，在圆筒形炉壁上设左靶源和右靶源，二者相对应，靶面正对滚筒。
进一步的，所述的搅拌片为等腰三角形或梯形。
本发明所述的小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备与现有技术对比具有突出的实质性特点和显著进步，1、本发明采用将钕铁硼磁体与钢珠混合的方式表面真空镀膜与现有的钕铁硼磁体的电镀和喷涂镀膜相比，对钕铁硼基体损伤小，对人体和环境危害小；2、专用镀膜装置与其它真空滚镀设备相比，结构简单，对样件的形状要求低，镀膜效率高。
附图说明：
图1是本发明的专用镀膜设备的正视结构示意图；
图2是图1的侧视图；
图3是本发明的实施例1中所镀试样外观图；
图4是本发明的实施例1中所镀试样膜层厚度图。
图面说明：
1真空系统抽气口、2转轴、3滚筒、4搅拌片、5左靶源、6右靶源、7观察窗、8氩气进气口、9圆筒形炉壁、10后炉壁、11炉门、12底架。
具体实施方式：
为了更好的理解此发明，下面结合实施案例来解释说明此发明，所举实施例仅用于解释本发明，并非用于限制本发明的范围。
实施例1，参见图1、2，根据设计需要，加工制成圆筒形炉壁9和后炉壁10，圆筒形炉壁9上有氩气进气口８和真空系统抽气口1，在圆筒形炉壁9一端固定后炉壁10，形成炉体，在圆筒形炉壁9的另一端安装炉门11，炉门11上安装观察窗7；在后炉壁10上的转轴2上固定滚筒3，滚筒3为网状不锈钢滚筒，一端密闭，滚筒3由后炉壁10上的转轴2带动旋转，在滚筒3内壁上安装搅拌片4，搅拌片4为等腰三角形或梯形，滚筒3靠近炉门11一端有可开关的圆形开口，钕铁硼磁体样件和钢珠可由此圆形开口处倒入或取出；在圆筒形炉壁9的左侧和右侧各安装两个左靶源5和两个右靶源6，左靶源5与右靶源6相对应，靶面正对滚筒3；在炉体下安装底架12，炉体结构为卧式；形成本发明的专用镀膜设备。
将2kg尺寸为（7mm×1.46mm×0.85mm）的小片钕铁硼磁体和3kg直径为2mm的钢珠一起放入滚筒中，抽真空至8.5-9×10-3pa后，开启滚筒转动，使滚筒处于滚动状态且转速维持在20r/min，滚筒中的搅拌片会使试样一直处于均匀的翻动状态；继续抽真空至3-3.5×10-3pa后，开启氩气进气阀至真空度为5.5-6×10-1pa后，开启安装有铝靶材的多弧离子靶源，设定电压大小为20V，电流大小为60A，开始镀铝膜，镀膜30min后关闭靶源开始冷却。
对上述实施例1制备的钕铁硼磁体铝膜进行表面观察，所得结果如图3所示，图片上可以看出试样表面铝膜层光亮，洁净；对实例1所得试样，利用光学显微镜观察截面，测量铝膜层厚度，结果如图4所示，图中所示铝膜层厚度均匀。
实施例2，采用同实施例1的专用镀膜设备，将2kg尺寸为（8mm×6mm×8mm）的小片钕铁硼磁体和0.5kg直径为6mm的钢珠一起放入滚筒中，抽真空至6 -6.5×10-3pa后，开启滚筒转动，使滚筒处于滚动状态且转速维持在5r/min，滚筒中的搅拌片会使试样一直处于均匀的翻动状态；继续抽真空至5.5-6×10-3pa后，开启氩气进气阀至真空度为3-3.5×10-1pa后，开启安装有铝靶材的多弧离子靶源，设定电压大小为20V，电流大小为60A，开始镀铝膜，镀膜60min后关闭靶源开始冷却。
本发明的钕铁硼磁体表面的真空镀膜方法和专用镀膜设备，可用于制备的金属膜层包括铝膜层、铜膜层、钛膜层、镝膜层、铽膜层、钕膜层或其合金膜层。

Claims (6)

1.小尺寸钕铁硼磁体表面真空镀膜方法，其特征在于，包括如下工艺步骤：将脱脂酸洗后的小尺寸钕铁硼磁体试样与钢珠一起放入专用镀膜设备的滚筒中，关闭炉门抽真空至6-9×10-3pa后，开启滚筒转动使钢珠与磁体混合均匀，滚筒转速为5-20r/min，继续抽真空至3-6×10-3pa后，打开氩气至真空度为3-6×10-1pa后，打开靶源，开始镀膜。
2.根据权利要求1所述的小尺寸钕铁硼磁体表面真空镀膜方法，其特征在于，所述的小尺寸钕铁硼磁体试样的尺寸范围为厚度、长度和宽度方向均小于15mm，且三个方向的尺寸差异小于10mm。
3.根据权利要求1所述的小尺寸钕铁硼磁体表面真空镀膜方法，其特征在于，所述的钢珠大小为Φ2mm-Φ6mm，钢珠的重量为小尺寸钕铁硼磁体试样重量的0.25-1.5倍。
4.根据权利要求1所述的小尺寸钕铁硼磁体表面真空镀膜方法，其特征在于，所述的镀膜方式为多弧离子镀或磁控溅射。
5.实现权利要求1－4的任一小尺寸钕铁硼磁体表面真空镀膜方法的专用镀膜设备，主体结构为卧式，它包括圆筒形炉壁（9），圆筒形炉壁（9）一端设后炉壁（10），形成炉体，炉体下设底架（12），其特征在于，在圆筒形炉壁（9）上设氩气进气口（８）和真空系统抽气口（1），圆筒形炉壁（9）的另一端设炉门（11），炉门（11）上设观察窗（7）；在后炉壁（10）上的转轴（2）上固定滚筒（3），滚筒（3）为网状，一端密闭，滚筒（3）由后炉壁（10）上的转轴（2）带动旋转，滚筒（3）内壁上设搅拌片（4），在圆筒形炉壁（9）上设左靶源（5）和右靶源（6），二者相对应，靶面正对滚筒（3）。
6.根据权利要求5所述的小尺寸钕铁硼磁体表面真空镀膜方法的专用镀膜设备，其特征在于，所述的搅拌片（4）为等腰三角形或梯形。
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