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CN104193995A - Organic silicon packaging material for 3D printing devices and preparation method thereof - Google Patents

Organic silicon packaging material for 3D printing devices and preparation method thereof Download PDF

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Publication number
CN104193995A
CN104193995A CN201410410962.4A CN201410410962A CN104193995A CN 104193995 A CN104193995 A CN 104193995A CN 201410410962 A CN201410410962 A CN 201410410962A CN 104193995 A CN104193995 A CN 104193995A
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silane
type printer
phenyl
acryloxy
encapsulating material
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CN201410410962.4A
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CN104193995B (en
Inventor
游胜勇
陈衍华
董晓娜
谌开红
戴润英
曾国屏
韩晓丹
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Institute of Applied Chemistry Jiangxi Academy of Sciences
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Institute of Applied Chemistry Jiangxi Academy of Sciences
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Abstract

The invention relates to an organic silicon packaging material for 3D printing devices and a preparation method thereof. The method comprises the following steps: uniformly mixing vinyl silane, phenyl silane and acryloyloxy silane, dropwisely adding water and a catalyst, and heating for condensation to obtain an organic silicon low polymer containing vinyl and acryloyloxy groups; adding the catalyst into an organic solvent, slowly and dropwisely adding sulfhydryl silane, and carrying out hydrolytic rearrangement to obtain sulfhydryl silsesquioxane; and mixing the organic silicon low polymer containing vinyl and acryloyloxy groups with the sulfhydryl silsesquioxane and an initiator, and carrying out ultraviolet irradiation and thermosetting to obtain the organic silicon packaging material which is used for liquid bath packaging in 3D printing devices. The acryloyloxy, vinyl and sulfhydryl groups are simultaneously introduced into the organic silicon polymer; the ultraviolet setting and thermosetting are used for crosslinking to enhance the light transmittance and mechanical properties of the material; and thus, the material has the advantages of no yellowing, high solvent resistance, high hydrolytic stability and the like, and satisfies the ever-developing 3D printing industry.

Description

A kind of organosilicon encapsulating material for 3D type printer and preparation method
?
technical field
The present invention relates to the packaged material that a kind of 3D type printer is used, particularly a kind of organosilicon encapsulating material and preparation method thereof, belongs to organosilicon applied technical field.
background technology
3D prints has become a kind of trend, 3D printer is a kind of machine of rapid shaping technique, it is that a kind of digital model file is basis, use powdery metal or the plastics etc. can jointing material, build the technology of object by the mode of successively printing, and start to be widely used in design field, especially industrial design, digital product die sinkings etc. can complete the printing of a mould within a few hours, have saved the development time of a lot of products to market.
Along with 3D prints the flourish of industry, packaged material performance requriements to liquid pool in print apparatus is also more and more higher, therefore, exploitation one has good insulation and anti-seismic performance, and good solubility-resistence is strong, not xanthochromia, has good stability to hydrolysis and the packaged material that returns reducing property, and market outlook are wide.
summary of the invention
Poor in order to overcome the good solubility-resistence that in existing 3D type printer, liquid pool packaged material exists, high temperature produces the shortcomings such as xanthochromia and poor mechanical property, the object of the present invention is to provide a kind of organosilicon encapsulating material for 3D type printer and preparation method.
Object of the present invention realizes by following proposal:
For an organosilicon encapsulating material for 3D type printer, prepared by following methods:
(1) by vinyl silanes, phenyl silane, acryloxy silane mixture in organic solvent, drip water and catalyzer, be heated to 60-120 DEG C, carry out condensation reaction 1-12h, static extraction separatory, organic layer is washed to neutrality, after being dried, carries out underpressure distillation except desolventizing, obtains the silicone oligomer containing vinyl and acryloxy;
(2) catalyzer is joined in organic solvent, then slowly drip hydrosulphonyl silane, the rearrangement reaction that is hydrolyzed at-5-30 DEG C, after reaction 24-240h, filters and obtains after drying sulfydryl silsesquioxane;
(3) the sulfydryl silsesquioxane of preparing containing vinyl and acryloxy silicone oligomer, step (2) that will be prepared by step (1) mixes with organic solvent, after stirring and dissolving is even, drip initiator, uv irradiating 10-20min, be heated to 40-100 DEG C of curing 1-3h, obtain the organosilicon encapsulating material for 3D type printer.
Vinyl silanes described in step (1), phenyl silane and its mass ratio of acryloyl-oxy base silane are 4-1.0: 3-1.0: 1; Catalyst quality is the 2-5% of silane total mass; Quality is 1-5 times of silane total mass; Organic solvent quality is 2-4 times of silane total mass;
Vinyl silanes described in step (1) is the one in vinyltrimethoxy silane, vinyltriethoxysilane, methyl ethylene diethoxy silane or methyl ethylene dimethoxy silane;
Phenyl silane described in step (1) is the one in phenylbenzene diethoxy silane, dimethoxydiphenylsilane, aminomethyl phenyl diethoxy silane or aminomethyl phenyl dimethoxy silane;
Acryloyl-oxy base silane described in step (1) is 3-(methacryloxy) propyl trimethoxy silicane, 3-(methacryloxy) propyl-triethoxysilicane, 3-(acryloxy) propyl trimethoxy silicane, 3-(acryloxy) propyl-triethoxysilicane, 3-(acryloxy) propyl group methyl dimethoxysilane, 3-(acryloxy) propyl group methyldiethoxysilane, 3-(methacryloxy) propyl group methyl dimethoxysilane, or 3-(methacryloxy) one in propyl group methyldiethoxysilane,
Catalyst quality described in step (2) is the 1-5% of hydrosulphonyl silane quality; The quality of organic solvent is 5-50 times of hydrosulphonyl silane quality;
Hydrosulphonyl silane described in step (2) is the one in 3-mercaptopropyltriethoxysilane, 3-mercaptopropyl trimethoxysilane;
Catalyzer described in step (1) and step (2) is the one in hydrochloric acid, sulfuric acid, phosphoric acid or acetic acid;
Described in step (3) to contain vinyl and acryloxy silicone oligomer and sulfydryl silsesquioxane mass ratio be 1.2-4: 1, the 3-5% that initiator quality is total mass;
Described in step (3) contain vinyl and its viscosity of acryloxy silicone oligomer is 100-10000Pa ˙s;
Initiator described in step (3) is for to be made up of light trigger and thermal initiator; Described light trigger is 1-hydroxy-cyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-acetone, 2-hydroxy-2-methyl-1-[4-(2-hydroxyl-oxethyl) phenyl]-1-acetone, 2-dimethylamino-2-benzyl-1-[4-(4-morpholinyl) phenyl]-1-butanone, 2,4,6-trimethylbenzoyl phenyl-phosphonic acid ethyl ester, 2,4,6-trimethylbenzoyl-diphenyl phosphine oxide or 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio group) phenyl] one in-1-acetone; Described thermal initiator is the one in benzoyl peroxide, isopropyl benzene hydroperoxide, Diisopropyl azodicarboxylate, 2,2'-Azobis(2,4-dimethylvaleronitrile), di-t-butyl peroxide, peroxidized t-butyl perbenzoate or di-isopropyl peroxydicarbonate;
Organic solvent described in step (1), step (2) and step (3) is the one in toluene, dimethylbenzene, benzene, ethanol, methyl alcohol, acetone, tetrahydrofuran (THF), ether or methylene dichloride.
The organosilicon material of above-mentioned preparation not only can be applied to the encapsulation of liquid pool in 3D type printer, can also continue to expand it and be applied in the field such as light and electron device package.
The present invention has following advantage and effect with respect to prior art:
The present invention has introduced the functional groups such as acryloxy, thiazolinyl, sulfydryl in organosilicon polymer, adopt thermofixation and two kinds of crosslinking technologicals of ultraviolet light polymerization, in structure, introduced the polyhedral silsesquioxane with nano-scale simultaneously and improved mechanical property, good solubility-resistence energy and the stability of material.
Embodiment
Below in conjunction with embodiment, the present invention is described in further detail, but embodiments of the present invention are not limited to this.
Embodiment 1
For a preparation method for the organosilicon encapsulating material of 3D type printer, comprise the following steps:
(1) by 30g vinyltrimethoxy silane, 20g dimethoxydiphenylsilane, 10g3-(methacryloxy) propyl trimethoxy silicane is mixed in 125g toluene solvant, drip 120g water and 3.0g hydrochloric acid, be heated to 60 DEG C, reaction 4h, static extraction separatory, organic layer is washed to neutrality, after being dried, carries out underpressure distillation except desolventizing, obtains the water white silicone oligomer A containing vinyl and acryloxy 1;
(2) 0.5g hydrochloric acid is joined in 300g methanol solvate, then slowly drip 20g 3-mercapto propyl-triethoxysilicane, the rearrangement reaction that is hydrolyzed at 10 DEG C, after reaction 120h, filters and obtains after drying sulfydryl silsesquioxane;
(3) 40g is contained to vinyl and acryloxy silicone oligomer A 1, 12g sulfydryl silsesquioxane mixes, stirring and dissolving evenly after, drip 1.3g 1-hydroxy-cyclohexyl phenyl ketone and 1.3 benzoyl peroxide initiators, uv irradiating 10min, is heated to 80 DEG C of curing 2h, obtains the organosilicon encapsulating material for 3D type printer.
Embodiment 2
For a preparation method for the organosilicon encapsulating material of 3D type printer, comprise the following steps:
(1) by 20g vinyltriethoxysilane, 15g phenylbenzene diethoxy silane, 10g3-(acryloxy) propyl trimethoxy silicane is mixed in 90g xylene solvent, drip 180g water and 2.0g sulfuric acid, be heated to 80 DEG C, carry out condensation reaction 6h, static extraction separatory, organic layer is washed to neutrality, after being dried, carries out underpressure distillation except desolventizing, obtains the silicone oligomer A2 containing vinyl and acryloxy;
(2) 1.2g sulfuric acid is joined in 300g ether solvent, then slowly drip 30g 3-mercapto propyl trimethoxy silicon, the rearrangement reaction that is hydrolyzed at 30 DEG C, after reaction 240h, filters and obtains after drying sulfydryl silsesquioxane;
(3) 30g is contained to vinyl and acryloxy silicone oligomer A 2, 7.5g sulfydryl silsesquioxane mix, after stirring and dissolving is even, drip 0.75g 2-hydroxy-2-methyl-1-[4-(2-hydroxyl-oxethyl) phenyl]-1-acetone and 0.75 Diisopropyl azodicarboxylate initiator, uv irradiating 20min, be heated to 100 DEG C of curing 1h, obtain the organosilicon encapsulating material for 3D type printer.
Embodiment 3
For a preparation method for the organosilicon encapsulating material of 3D type printer, comprise the following steps:
(1) by 30g methyl ethylene diethoxy silane, 18g aminomethyl phenyl diethoxy silane, 10g3-(methacryloxy) propyl-triethoxysilicane is mixed in 240g acetone solvent, drip 300g water and 1.2g hydrochloric acid, be heated to 120 DEG C, carry out condensation reaction 2h, static extraction separatory, organic layer is washed to neutrality, after being dried, carries out underpressure distillation except desolventizing, obtains the silicone oligomer A containing vinyl and acryloxy 3;
(2) 0.3g phosphoric acid is joined in 250g tetrahydrofuran solvent, then slowly drip 30g 3-mercapto propyl-triethoxysilicane, the rearrangement reaction that is hydrolyzed at 5 DEG C, after reaction 48h, filters and obtains after drying sulfydryl silsesquioxane;
(3) 12g is contained to vinyl and acryloxy silicone oligomer A 3, 10g sulfydryl silsesquioxane mix, after stirring and dissolving is even, drip 0.825g2-hydroxy-2-methyl-1-phenyl-acetone and 0.275 di-t-butyl peroxide initiator, uv irradiating 15min, be heated to 80 DEG C of curing 1h, obtain the organosilicon encapsulating material for 3D type printer.
Embodiment 4
For a preparation method for the organosilicon encapsulating material of 3D type printer, comprise the following steps:
(1) by 15g methyl ethylene dimethoxy silane, 20g aminomethyl phenyl dimethoxy silane, 10g3-(acryloxy) propyl-triethoxysilicane is mixed in 90g alcohol solvent, drip 90g water and 3.0g hydrochloric acid, be heated to 100 DEG C, carry out condensation reaction 8h, static extraction separatory, organic layer is washed to neutrality, after being dried, carries out underpressure distillation except desolventizing, obtains the silicone oligomer A containing vinyl and acryloxy 4;
(2) 0.3g acetic acid is joined in 250g tetrahydrofuran solvent, then slowly drip 30g 3-mercapto propyl trimethoxy silicon, the rearrangement reaction that is hydrolyzed at 5 DEG C, after reaction 48h, filters and obtains after drying sulfydryl silsesquioxane;
(3) 30g is contained to vinyl and acryloxy silicone oligomer A 4, 10g sulfydryl silsesquioxane mixes, stirring and dissolving evenly after, drip 0.8g 2; 4,6-trimethylbenzoyl phenyl-phosphonic acid ethyl ester and 0.8 peroxidized t-butyl perbenzoate initiator, uv irradiating 10min; be heated to 60 DEG C of curing 1h, obtain the organosilicon encapsulating material for 3D type printer.
Embodiment 5
For a preparation method for the organosilicon encapsulating material of 3D type printer, comprise the following steps:
(1) by 30g vinyltrimethoxy silane, 15g aminomethyl phenyl diethoxy silane, 10g 3-(acryloxy) propyl group methyl dimethoxysilane is mixed in 165g toluene solvant, drip 110g water and 2.2g hydrochloric acid, be heated to 120 DEG C, carry out condensation reaction 10h, static extraction separatory, organic layer is washed to neutrality, after being dried, carries out underpressure distillation except desolventizing, obtains the silicone oligomer A containing vinyl and acryloxy 5;
(2) 0.3g hydrochloric acid is joined in 250g dichloromethane solvent, then slowly drip 30g 3-mercapto propyl-triethoxysilicane, the rearrangement reaction that is hydrolyzed at-5 DEG C, after reaction 240h, filters and obtains after drying sulfydryl silsesquioxane;
(3) 40g is contained to vinyl and acryloxy silicone oligomer A 5, 10g sulfydryl silsesquioxane mix, after stirring and dissolving is even, drip 0.75g2-methyl-2-(4-morpholinyl)-1-[4-(methylthio group) phenyl]-1-acetone and 0.75 di-isopropyl peroxydicarbonate initiator, uv irradiating 20min, be heated to 100 DEG C of curing 2h, obtain the organosilicon encapsulating material for 3D type printer.

Claims (12)

1. for an organosilicon encapsulating material for 3D type printer, it is characterized in that, described material is prepared by following methods:
(1) by vinyl silanes, phenyl silane, acryloxy silane mixture in organic solvent, drip water and catalyzer, be heated to 60-120 DEG C, carry out condensation reaction 1-12h, static extraction separatory, organic layer is washed to neutrality, after being dried, carries out underpressure distillation except desolventizing, obtains the silicone oligomer containing vinyl and acryloxy;
(2) catalyzer is joined in organic solvent, then slowly drip hydrosulphonyl silane, the rearrangement reaction that is hydrolyzed at-5-30 DEG C, after reaction 24-240h, filters and obtains after drying sulfydryl silsesquioxane;
(3) the sulfydryl silsesquioxane of preparing containing vinyl and acryloxy silicone oligomer and step (2) that will be prepared by step (1) mixes, after stirring and dissolving is even, drip initiator, uv irradiating 10-20min, be heated to 40-100 DEG C of curing 1-3h, obtain the organosilicon encapsulating material for 3D type printer.
2. a kind of organosilicon encapsulating material for 3D type printer according to claim 1, is characterized in that: the vinyl silanes described in step (1), phenyl silane and its mass ratio of acryloyl-oxy base silane are 4-1.0: 3-1.0: 1; Catalyst quality is the 2-5% of silane total mass; Quality is 1-5 times of silane total mass; Organic solvent quality is 2-4 times of silane total mass.
3. a kind of organosilicon encapsulating material for 3D type printer according to claim 1, is characterized in that: the vinyl silanes described in step (1) is the one in vinyltrimethoxy silane, vinyltriethoxysilane, methyl ethylene diethoxy silane or methyl ethylene dimethoxy silane.
4. a kind of organosilicon encapsulating material for 3D type printer according to claim 1, is characterized in that: the phenyl silane described in step (1) is the one in phenylbenzene diethoxy silane, dimethoxydiphenylsilane, aminomethyl phenyl diethoxy silane or aminomethyl phenyl dimethoxy silane.
5. a kind of organosilicon encapsulating material for 3D type printer according to claim 1, it is characterized in that: the acryloyl-oxy base silane described in step (1) is 3-(methacryloxy) propyl trimethoxy silicane, 3-(methacryloxy) propyl-triethoxysilicane, 3-(acryloxy) propyl trimethoxy silicane, 3-(acryloxy) propyl-triethoxysilicane, 3-(acryloxy) propyl group methyl dimethoxysilane, 3-(acryloxy) propyl group methyldiethoxysilane, 3-(methacryloxy) propyl group methyl dimethoxysilane, or 3-(methacryloxy) one in propyl group methyldiethoxysilane.
6. a kind of organosilicon encapsulating material for 3D type printer according to claim 1, is characterized in that: described in step (2), catalyst quality is the 1-5% of hydrosulphonyl silane quality; Organic solvent quality is 5-50 times of hydrosulphonyl silane quality.
7. a kind of organosilicon encapsulating material for 3D type printer according to claim 1, is characterized in that: the hydrosulphonyl silane described in step (2) is the one in 3-mercaptopropyltriethoxysilane, 3-mercaptopropyl trimethoxysilane.
8. a kind of organosilicon encapsulating material for 3D type printer according to claim 1, is characterized in that: the catalyzer described in step (1) and step (2) is the one in hydrochloric acid, sulfuric acid, phosphoric acid or acetic acid.
9. a kind of organosilicon encapsulating material for 3D type printer according to claim 1, it is characterized in that: described in step (3) to contain vinyl and acryloxy silicone oligomer and sulfydryl silsesquioxane mass ratio be 1.2-4: 1, the 3-5% that initiator quality is total mass.
10. a kind of organosilicon encapsulating material for 3D type printer according to claim 1, is characterized in that: described in step (3) contain vinyl and its viscosity of acryloxy silicone oligomer is 100-10000Pa ˙ S.
11. a kind of organosilicon encapsulating materials for 3D type printer according to claim 1, is characterized in that: the initiator described in step (3) is for to be made up of light trigger and thermal initiator; The mass ratio of light trigger and thermal initiator is 1:1; Described light trigger is 1-hydroxy-cyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-acetone, methyl benzoylformate, 2-hydroxy-2-methyl-1-[4-(2-hydroxyl-oxethyl) phenyl]-1-acetone, 2-dimethylamino-2-benzyl-1-[4-(4-morpholinyl) phenyl]-1-butanone, 2,4,6-trimethylbenzoyl phenyl-phosphonic acid ethyl ester, 2,4,6-trimethylbenzoyl-diphenyl phosphine oxide or 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio group) phenyl] one in-1-acetone; Described thermal initiator is the one in benzoyl peroxide, isopropyl benzene hydroperoxide, Diisopropyl azodicarboxylate, 2,2'-Azobis(2,4-dimethylvaleronitrile), di-t-butyl peroxide, peroxidized t-butyl perbenzoate or di-isopropyl peroxydicarbonate.
12. a kind of organosilicon encapsulating materials for 3D type printer according to claim 1, is characterized in that: in step (1), step (2), the organic solvent described in step (3) is the one in toluene, dimethylbenzene, benzene, ethanol, methyl alcohol, acetone, tetrahydrofuran (THF), ether or methylene dichloride.
CN201410410962.4A 2014-08-20 2014-08-20 A kind of organosilicon encapsulating material for 3D printing equipment and preparation method Active CN104193995B (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105511006A (en) * 2016-02-03 2016-04-20 京东方科技集团股份有限公司 Polaroid, display substrate, liquid crystal display panel and making method thereof
CN106317412A (en) * 2016-08-17 2017-01-11 广东工业大学 Mercaptopropyl polysiloxane with photoreaction activity and preparation method thereof
CN106317898A (en) * 2016-08-17 2017-01-11 广东工业大学 Photocured organosilicone elastomer and preparation method and application thereof
WO2017124065A1 (en) 2016-01-15 2017-07-20 Hrl Laboratories, Llc Resin formulations for polymer-derived ceramic materials
CN107814934A (en) * 2017-11-29 2018-03-20 四会市兴源再生资源有限公司 A kind of silsesquioxane and preparation method thereof
CN110343251A (en) * 2019-07-12 2019-10-18 深圳职业技术学院 A kind of silicone photonic resin
CN112909292A (en) * 2021-01-15 2021-06-04 苏州泰仑电子材料有限公司 Sealing film for fuel cell membrane electrode and preparation method thereof
CN117080320A (en) * 2023-08-21 2023-11-17 广州满坤电子有限公司 LED lamp panel and production process thereof

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CN1696179A (en) * 2005-06-03 2005-11-16 哈尔滨工业大学 Method for grafting modifying silicone resin

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1696179A (en) * 2005-06-03 2005-11-16 哈尔滨工业大学 Method for grafting modifying silicone resin

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017124065A1 (en) 2016-01-15 2017-07-20 Hrl Laboratories, Llc Resin formulations for polymer-derived ceramic materials
EP3402767A4 (en) * 2016-01-15 2019-07-17 HRL Laboratories, LLC Resin formulations for polymer-derived ceramic materials
EP4026817A1 (en) * 2016-01-15 2022-07-13 HRL Laboratories, LLC Resin formulations for polymer-derived ceramic materials
CN105511006A (en) * 2016-02-03 2016-04-20 京东方科技集团股份有限公司 Polaroid, display substrate, liquid crystal display panel and making method thereof
CN105511006B (en) * 2016-02-03 2018-09-07 京东方科技集团股份有限公司 Polaroid, display base plate, liquid crystal display panel and preparation method thereof
CN106317412A (en) * 2016-08-17 2017-01-11 广东工业大学 Mercaptopropyl polysiloxane with photoreaction activity and preparation method thereof
CN106317898A (en) * 2016-08-17 2017-01-11 广东工业大学 Photocured organosilicone elastomer and preparation method and application thereof
CN107814934A (en) * 2017-11-29 2018-03-20 四会市兴源再生资源有限公司 A kind of silsesquioxane and preparation method thereof
CN110343251A (en) * 2019-07-12 2019-10-18 深圳职业技术学院 A kind of silicone photonic resin
CN112909292A (en) * 2021-01-15 2021-06-04 苏州泰仑电子材料有限公司 Sealing film for fuel cell membrane electrode and preparation method thereof
CN117080320A (en) * 2023-08-21 2023-11-17 广州满坤电子有限公司 LED lamp panel and production process thereof
CN117080320B (en) * 2023-08-21 2024-01-12 广州满坤电子有限公司 LED lamp panel and production process thereof

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