AU4876801A - Composition for use in polishing magnetic disk substrate and method for preparing the same - Google Patents
Composition for use in polishing magnetic disk substrate and method for preparing the sameInfo
- Publication number
- AU4876801A AU4876801A AU48768/01A AU4876801A AU4876801A AU 4876801 A AU4876801 A AU 4876801A AU 48768/01 A AU48768/01 A AU 48768/01A AU 4876801 A AU4876801 A AU 4876801A AU 4876801 A AU4876801 A AU 4876801A
- Authority
- AU
- Australia
- Prior art keywords
- preparing
- composition
- same
- magnetic disk
- disk substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-115592 | 2000-04-17 | ||
JP2000115592 | 2000-04-17 | ||
PCT/JP2001/003221 WO2001079377A1 (en) | 2000-04-17 | 2001-04-16 | Composition for use in polishing magnetic disk substrate and method for preparing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
AU4876801A true AU4876801A (en) | 2001-10-30 |
Family
ID=18627202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU48768/01A Abandoned AU4876801A (en) | 2000-04-17 | 2001-04-16 | Composition for use in polishing magnetic disk substrate and method for preparing the same |
Country Status (5)
Country | Link |
---|---|
CN (1) | CN1249193C (en) |
AU (1) | AU4876801A (en) |
MY (1) | MY119774A (en) |
TW (1) | TW528645B (en) |
WO (1) | WO2001079377A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4231632B2 (en) * | 2001-04-27 | 2009-03-04 | 花王株式会社 | Polishing liquid composition |
JP4095798B2 (en) * | 2001-12-20 | 2008-06-04 | 株式会社フジミインコーポレーテッド | Polishing composition |
JP3875156B2 (en) * | 2002-08-07 | 2007-01-31 | 花王株式会社 | Roll-off reducing agent |
JP4202201B2 (en) * | 2003-07-03 | 2008-12-24 | 株式会社フジミインコーポレーテッド | Polishing composition |
KR101189899B1 (en) * | 2005-11-22 | 2012-10-10 | 히다치 가세고교 가부시끼가이샤 | Polishing fluid for polishing aluminum films and method for polishing aluminum films with the same |
JP5049249B2 (en) * | 2008-10-31 | 2012-10-17 | 花王株式会社 | Polishing liquid composition |
SG188775A1 (en) * | 2011-09-30 | 2013-04-30 | Hoya Corp | Manufacturing method of glass substrate for magnetic disk, magnetic disk, and magnetic data recording/reproducing device |
US9202483B1 (en) * | 2015-01-02 | 2015-12-01 | HGST Netherlands B.V. | Iron-oxidized hard disk drive enclosure cover |
KR101943704B1 (en) * | 2016-06-27 | 2019-01-29 | 삼성에스디아이 주식회사 | Cmp slurry composition for metal film and polishing method |
US9982351B1 (en) * | 2017-01-31 | 2018-05-29 | GM Global Technology Operations LLC | Chemical mechanical polishing for improved contrast resolution |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4002327A1 (en) * | 1990-01-26 | 1991-08-01 | Wacker Chemitronic | METHOD FOR THE WET-CHEMICAL TREATMENT OF SEMICONDUCTOR SURFACES AND SOLUTION FOR ITS IMPLEMENTATION |
JP3458023B2 (en) * | 1995-08-01 | 2003-10-20 | メック株式会社 | Copper and copper alloy microetchants |
JP3825827B2 (en) * | 1996-01-30 | 2006-09-27 | 昭和電工株式会社 | Polishing composition, magnetic disk substrate polishing method, and manufacturing method |
JP3507628B2 (en) * | 1996-08-06 | 2004-03-15 | 昭和電工株式会社 | Polishing composition for chemical mechanical polishing |
JPH10121035A (en) * | 1996-08-30 | 1998-05-12 | Showa Denko Kk | Composition for polishing magnetic disk substrate |
US5958288A (en) * | 1996-11-26 | 1999-09-28 | Cabot Corporation | Composition and slurry useful for metal CMP |
JPH10204416A (en) * | 1997-01-21 | 1998-08-04 | Fujimi Inkooporeetetsudo:Kk | Polishing composition |
JPH11167711A (en) * | 1997-12-03 | 1999-06-22 | Showa Alum Corp | Production of magnetic disk substrate |
JPH1180708A (en) * | 1997-09-09 | 1999-03-26 | Fujimi Inkooporeetetsudo:Kk | Composition for polishing |
JP4076630B2 (en) * | 1998-08-07 | 2008-04-16 | 花王株式会社 | Polishing liquid composition |
-
2001
- 2001-03-16 TW TW90106240A patent/TW528645B/en not_active IP Right Cessation
- 2001-04-16 CN CN 01800964 patent/CN1249193C/en not_active Expired - Fee Related
- 2001-04-16 WO PCT/JP2001/003221 patent/WO2001079377A1/en active Application Filing
- 2001-04-16 AU AU48768/01A patent/AU4876801A/en not_active Abandoned
- 2001-04-17 MY MYPI20011813 patent/MY119774A/en unknown
Also Published As
Publication number | Publication date |
---|---|
TW528645B (en) | 2003-04-21 |
CN1249193C (en) | 2006-04-05 |
CN1366548A (en) | 2002-08-28 |
MY119774A (en) | 2005-07-29 |
WO2001079377A1 (en) | 2001-10-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |