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ATE544174T1 - MIM CAPACITOR AND METHOD FOR PRODUCING A MIM CAPACITOR - Google Patents

MIM CAPACITOR AND METHOD FOR PRODUCING A MIM CAPACITOR

Info

Publication number
ATE544174T1
ATE544174T1 AT07820782T AT07820782T ATE544174T1 AT E544174 T1 ATE544174 T1 AT E544174T1 AT 07820782 T AT07820782 T AT 07820782T AT 07820782 T AT07820782 T AT 07820782T AT E544174 T1 ATE544174 T1 AT E544174T1
Authority
AT
Austria
Prior art keywords
mim capacitor
producing
bottom plates
metal
capacitor
Prior art date
Application number
AT07820782T
Other languages
German (de)
Inventor
Alexis Farcy
Maryline Thomas
Joaquin Torres
Sonarith Chhun
Laurent-Georges Gosset
Original Assignee
Nxp Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nxp Bv filed Critical Nxp Bv
Application granted granted Critical
Publication of ATE544174T1 publication Critical patent/ATE544174T1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/005—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/01—Manufacture or treatment
    • H10D1/041—Manufacture or treatment of capacitors having no potential barriers
    • H10D1/042—Manufacture or treatment of capacitors having no potential barriers using deposition processes to form electrode extensions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/692—Electrodes
    • H10D1/711—Electrodes having non-planar surfaces, e.g. formed by texturisation
    • H10D1/716—Electrodes having non-planar surfaces, e.g. formed by texturisation having vertical extensions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/005—Electrodes
    • H01G4/008—Selection of materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

The invention concerns a method of forming a metal- insulator-metal capacitor having top and bottom plates separated by a dielectric layer, one of the top and bottom plates having a form comprising at least one protrusion extending into a corresponding cavity in the other of the top and bottom plates, the method including the steps of growing one or more nanofibers on a base surface.
AT07820782T 2006-10-04 2007-10-01 MIM CAPACITOR AND METHOD FOR PRODUCING A MIM CAPACITOR ATE544174T1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06301014 2006-10-04
PCT/EP2007/060400 WO2008040706A1 (en) 2006-10-04 2007-10-01 Mim capacitor

Publications (1)

Publication Number Publication Date
ATE544174T1 true ATE544174T1 (en) 2012-02-15

Family

ID=38759992

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07820782T ATE544174T1 (en) 2006-10-04 2007-10-01 MIM CAPACITOR AND METHOD FOR PRODUCING A MIM CAPACITOR

Country Status (5)

Country Link
EP (1) EP2074641B1 (en)
JP (1) JP5091242B2 (en)
CN (1) CN101573772B (en)
AT (1) ATE544174T1 (en)
WO (1) WO2008040706A1 (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8274777B2 (en) 2008-04-08 2012-09-25 Micron Technology, Inc. High aspect ratio openings
EP2289106A4 (en) * 2008-06-13 2014-05-21 Qunano Ab CAPACITOR MOS NANOSTRUCTURE
US7858506B2 (en) 2008-06-18 2010-12-28 Micron Technology, Inc. Diodes, and methods of forming diodes
US8268695B2 (en) 2008-08-13 2012-09-18 Micron Technology, Inc. Methods of making capacitors
RU2444078C1 (en) * 2010-12-23 2012-02-27 Общество с ограниченной ответственностью "БАРГАН ТЕХНОЛОДЖИ" (ООО "БТЕХ") Method to manufacture laminate nanostructure for double-plate capacitors
GB201207766D0 (en) * 2012-05-03 2012-06-13 Dyson Technology Ltd Dielectric capacitor
GB2501872B8 (en) * 2012-05-03 2022-08-17 Dyson Technology Ltd Coated Structured Surfaces
RU2533010C2 (en) * 2012-06-19 2014-11-20 Общество с ограниченной ответственностью "Электронные приборы и системы ". Method of producing planar condenser of extended capacity
US9755013B2 (en) * 2015-04-22 2017-09-05 Globalfoundries Inc. High density capacitor structure and method
TWI766072B (en) * 2017-08-29 2022-06-01 瑞典商斯莫勒科技公司 Energy storing interposer device, electronic device and manufacturing method
CN112823403B (en) * 2018-10-18 2023-05-02 斯莫特克有限公司 Discrete metal-insulator-metal (MIM) energy storage component and method of manufacture
TW202038266A (en) * 2018-11-26 2020-10-16 瑞典商斯莫勒科技公司 Semiconductor assembly with discrete energy storage component
WO2021059569A1 (en) 2019-09-25 2021-04-01 株式会社村田製作所 Capacitor and method for manufacturing same
US11038011B2 (en) 2019-10-29 2021-06-15 Globalfoundries U.S. Inc. Metal-insulator-metal capacitors including nanofibers
TW202147550A (en) * 2020-02-06 2021-12-16 瑞典商斯莫勒科技公司 Electronic system with power distribution network including capacitor coupled to component pads
TW202141805A (en) * 2020-04-17 2021-11-01 瑞典商斯莫勒科技公司 Metal-insulator-metal (mim) energy storage device with layered stack and manufacturing method
WO2021229871A1 (en) * 2020-05-12 2021-11-18 株式会社村田製作所 Structure
JP7485082B2 (en) 2020-11-19 2024-05-16 株式会社村田製作所 Capacitor
WO2022113843A1 (en) 2020-11-27 2022-06-02 株式会社村田製作所 Capacitor
WO2023210134A1 (en) * 2022-04-26 2023-11-02 株式会社村田製作所 Capacitor and method for manufacturing capacitor
JPWO2024095536A1 (en) * 2022-11-01 2024-05-10

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU8664901A (en) * 2000-08-22 2002-03-04 Harvard College Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors and fabricating such devices
TW506083B (en) * 2001-11-28 2002-10-11 Ind Tech Res Inst Method of using nano-tube to increase semiconductor device capacitance
JP4695817B2 (en) * 2002-10-23 2011-06-08 富士通株式会社 Capacitor, semiconductor memory device and method
US7163659B2 (en) * 2002-12-03 2007-01-16 Hewlett-Packard Development Company, L.P. Free-standing nanowire sensor and method for detecting an analyte in a fluid
US7057881B2 (en) * 2004-03-18 2006-06-06 Nanosys, Inc Nanofiber surface based capacitors

Also Published As

Publication number Publication date
WO2008040706A1 (en) 2008-04-10
EP2074641A1 (en) 2009-07-01
CN101573772B (en) 2011-10-05
CN101573772A (en) 2009-11-04
JP5091242B2 (en) 2012-12-05
EP2074641B1 (en) 2012-02-01
JP2010506391A (en) 2010-02-25

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