[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

ATE469126T1 - Fluorarylsulfonium fotosäure erzeugende verbindungen - Google Patents

Fluorarylsulfonium fotosäure erzeugende verbindungen

Info

Publication number
ATE469126T1
ATE469126T1 AT03814368T AT03814368T ATE469126T1 AT E469126 T1 ATE469126 T1 AT E469126T1 AT 03814368 T AT03814368 T AT 03814368T AT 03814368 T AT03814368 T AT 03814368T AT E469126 T1 ATE469126 T1 AT E469126T1
Authority
AT
Austria
Prior art keywords
pags
sulfonium
present
sulfonium pags
monomers
Prior art date
Application number
AT03814368T
Other languages
English (en)
Inventor
Eric Kolb
Erdem Cetin
Kirk Hutchinson
Richard Minns
Original Assignee
Stx Aprilis Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stx Aprilis Inc filed Critical Stx Aprilis Inc
Application granted granted Critical
Publication of ATE469126T1 publication Critical patent/ATE469126T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C07F5/027—Organoboranes and organoborohydrides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Holo Graphy (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT03814368T 2002-12-23 2003-12-22 Fluorarylsulfonium fotosäure erzeugende verbindungen ATE469126T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43652102P 2002-12-23 2002-12-23
PCT/US2003/041175 WO2004058699A2 (en) 2002-12-23 2003-12-22 Fluoroarylsulfonium photoacid generators

Publications (1)

Publication Number Publication Date
ATE469126T1 true ATE469126T1 (de) 2010-06-15

Family

ID=32682402

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03814368T ATE469126T1 (de) 2002-12-23 2003-12-22 Fluorarylsulfonium fotosäure erzeugende verbindungen

Country Status (6)

Country Link
US (2) US20050059543A1 (de)
EP (1) EP1583740B1 (de)
AT (1) ATE469126T1 (de)
AU (1) AU2003303482A1 (de)
DE (1) DE60332768D1 (de)
WO (1) WO2004058699A2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE469126T1 (de) * 2002-12-23 2010-06-15 Stx Aprilis Inc Fluorarylsulfonium fotosäure erzeugende verbindungen
US7192686B2 (en) * 2004-03-31 2007-03-20 Intel Corporation Photoacid generators based on novel superacids
US7498123B2 (en) * 2005-03-03 2009-03-03 Exciton, Inc. Infrared dye compositions
DE102006005103A1 (de) * 2006-02-04 2007-08-09 Merck Patent Gmbh Oxonium- und Sulfoniumsalze
WO2007120628A2 (en) * 2006-04-11 2007-10-25 Dow Corning Corporation A composition including a siloxane and a method of forming the same
US7547501B2 (en) * 2006-10-05 2009-06-16 Az Electronic Materials Usa Corp. Photoactive compounds
JP5115126B2 (ja) * 2007-10-05 2013-01-09 Ｔｄｋ株式会社 ホログラム記録媒体
WO2009054981A1 (en) * 2007-10-23 2009-04-30 Stx Aprilis, Inc. Apparatus and methods for threshold control of photopolymerization for holographic data storage using at least two wavelengths
EP2223299B1 (de) * 2007-11-27 2015-03-11 Southbourne Investments Ltd. Holografisches aufzeichnungsmedium
CN102209939A (zh) * 2008-11-08 2011-10-05 大赛璐化学工业株式会社 体全息记录用感光性组合物及其制造方法
CA2748691A1 (en) * 2008-12-12 2010-06-17 Lutz Lehmann Triaryl-sulphonium compounds, kit and methods for labeling positron emitting isotopes
JP2012220690A (ja) * 2011-04-07 2012-11-12 Tdk Corp ホログラフィック記録媒体の記録露光量決定方法及び記録方法
US9354518B2 (en) 2011-05-25 2016-05-31 Dow Corning Corporation Epoxy-functional radiation-curable composition containing an epoxy-functional siloxane oligomer for enhanced film retention and adhesion during solvent development
US8728715B2 (en) * 2012-01-13 2014-05-20 Funai Electric Co., Ltd. Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate
JP6240409B2 (ja) * 2013-05-31 2017-11-29 サンアプロ株式会社 スルホニウム塩および光酸発生剤
JP6244109B2 (ja) * 2013-05-31 2017-12-06 東京応化工業株式会社 レジスト組成物、化合物、高分子化合物及びレジストパターン形成方法
EP2842980B1 (de) 2013-08-09 2021-05-05 DSM IP Assets B.V. Niedrigviskose flüssige strahlungshärtbare harzzusammensetzungen für zahnregulierungsform zur herstellung von zusatzstoffen
EP2868692B1 (de) 2013-11-05 2017-10-25 DSM IP Assets B.V. Stabilisierte matrixgefüllte flüssige strahlungshärtbare Harzzusammensetzungen zur Additivherstellung
CN104238268B (zh) * 2014-08-15 2017-12-26 同济大学 以三苯乙烯为主体的硫鎓盐类光生酸剂、制备方法及其应用
KR102698770B1 (ko) 2015-06-08 2024-08-23 스트래터시스,인코포레이티드 부가적 제조용 액체 하이브리드 자외선/가시광선 복사선-경화성 수지 조성물
US9708442B1 (en) 2015-10-01 2017-07-18 Dsm Ip Assets, B.V. Liquid, hybrid UV/vis radiation curable resin compositions for additive fabrication
EP3377291B1 (de) 2015-11-17 2021-11-03 Covestro (Netherlands) B.V. Verbesserte antimonfreie strahlungshärtbare zusammensetzungen zur generativen fertigung und anwendungen davon in feingiessverfahren
CN108778688B (zh) 2016-03-14 2022-05-13 科思创(荷兰)有限公司 具有改善韧性耐高温性的加成法制造用可辐射固化组合物
JP7215654B2 (ja) 2017-12-15 2023-01-31 コベストロ （ネザーランズ） ビー．ブイ． 粘性熱硬化性樹脂を高温噴射して、積層造形を介して固体物品を作製するための組成物及び方法
CN111526977B (zh) 2017-12-29 2022-07-01 科思创(荷兰)有限公司 用于加成制造的组合物和制品及其使用方法
CN114341732A (zh) 2019-08-30 2022-04-12 科思创(荷兰)有限公司 用于增材制造的液体混合紫外/可见光辐射可固化树脂组合物

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4216288A (en) * 1978-09-08 1980-08-05 General Electric Company Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents
US4291114A (en) * 1978-10-18 1981-09-22 Minnesota Mining And Manufacturing Co. Imageable, composite-dry transfer sheet and process of using same
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
JPH04234422A (ja) * 1990-10-31 1992-08-24 Internatl Business Mach Corp <Ibm> 二重硬化エポキシバックシール処方物
US5500453A (en) * 1992-02-07 1996-03-19 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition
FR2688783A1 (fr) * 1992-03-23 1993-09-24 Rhone Poulenc Chimie Nouveaux borates d'onium ou de complexe organometallique amorceurs cationiques de polymerisation.
FR2688790B1 (fr) * 1992-03-23 1994-05-13 Rhone Poulenc Chimie Compositions a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adhesifs.
US5367614A (en) * 1992-04-01 1994-11-22 Grumman Aerospace Corporation Three-dimensional computer image variable perspective display system
US5380923A (en) * 1993-04-29 1995-01-10 Minnesota Mining And Manufacturing Company Polymeric sulfonium salts and method of preparation thereof
US5514728A (en) * 1993-07-23 1996-05-07 Minnesota Mining And Manufacturing Company Catalysts and initiators for polymerization
US5702846A (en) * 1994-10-03 1997-12-30 Nippon Paint Co. Ltd. Photosensitive composition for volume hologram recording
EP0853774B1 (de) * 1995-10-06 2001-11-07 Polaroid Corporation Halographisches aufzeichnungsmaterial und verfahren
JPH09278813A (ja) * 1996-04-12 1997-10-28 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JPH09278814A (ja) * 1996-04-12 1997-10-28 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JPH10152495A (ja) * 1996-11-21 1998-06-09 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
US6406770B1 (en) * 1997-12-26 2002-06-18 Dainippon Ink And Chemicals, Inc. Optical disk and method of manufacturing optical disk
KR100279497B1 (ko) * 1998-07-16 2001-02-01 박찬구 술포늄 염의 제조방법
US6512606B1 (en) * 1999-07-29 2003-01-28 Siros Technologies, Inc. Optical storage media and method for optical data storage via local changes in reflectivity of a format grating
EP1179750B1 (de) * 2000-08-08 2012-07-25 FUJIFILM Corporation Positiv arbeitende lichtempfindliche Zusammensetzung und Verfahren zur Herstellung einer integrierten Präzisions-Schaltung mit derselben
US6664022B1 (en) * 2000-08-25 2003-12-16 Shipley Company, L.L.C. Photoacid generators and photoresists comprising same
EP1578870A2 (de) * 2002-12-23 2005-09-28 Aprilis, Inc. Sensibilisator-farbstoff für fotosäureerzeugende systeme
ATE469126T1 (de) * 2002-12-23 2010-06-15 Stx Aprilis Inc Fluorarylsulfonium fotosäure erzeugende verbindungen

Also Published As

Publication number Publication date
US20090182172A1 (en) 2009-07-16
DE60332768D1 (de) 2010-07-08
US20050059543A1 (en) 2005-03-17
WO2004058699A2 (en) 2004-07-15
AU2003303482A1 (en) 2004-07-22
WO2004058699A3 (en) 2004-09-10
EP1583740A2 (de) 2005-10-12
AU2003303482A8 (en) 2004-07-22
EP1583740B1 (de) 2010-05-26

Similar Documents

Publication Publication Date Title
ATE469126T1 (de) Fluorarylsulfonium fotosäure erzeugende verbindungen
Bruder et al. The chemistry and physics of Bayfol® HX film holographic photopolymer
Xiao et al. Cationic and thiol–ene photopolymerization upon red lights using anthraquinone derivatives as photoinitiators
Ji et al. Encoding, reading, and transforming information using multifluorescent supramolecular polymeric hydrogels
KR100296083B1 (ko) 감광성기록재료,감광성기록매체및이감광성기록매체를사용하는홀로그램의제조방법
Ortica et al. Laser flash photolysis study of two aromatic N-oxyimidosulfonate photoacid generators
CN102005213A (zh) 光学数据存储介质及其使用方法
EP2277027A1 (de) Photopolymerisierbare zusammensetzungen
US20050233246A1 (en) Novel optical storage materials, methods of making the storage materials, and methods for storing and reading data
TWI304514B (en) Photopolymerizing composition and photopolymerizing recording medium manufactured using the same and used to manufacture 3d optical memory having ultra-high information storage capacity
CN102592613B (zh) 光学数据存储介质及其使用方法
ATE464537T1 (de) Optischer neigungsmesser
Fouassier et al. Radical polymerization activity and mechanistic approach in a new three‐component photoinitiating system
KR20070014870A (ko) 높은 회절 효율 및 낮은 부피 수축율을 갖는 유-무기하이브리드형 광고분자 조성물
RU2004128410A (ru) Фотохромные полимеры для трехмерной оперативной оптической памяти
Ley et al. Application of high performance photoinitiating systems for holographic grating recording
JP2013524398A (ja) 情報の光学的記録による可逆的記録媒体と、そのような媒体への可逆的記録方法
Zammit et al. Visible light pulsed-laser polymerization at 532 nm employing a julolidine dye photosensitizer initiation system
DE602007007411D1 (de) Bildaufzeichnungsmaterial
Jager et al. Reactive and nonreactive fluorescent probes for monitoring the photoinitiated polymerization of dimethacrylates: The role of luminophore distribution in heterogeneous environments
CN113407930A (zh) 一种基于腔体式光折变晶体puf的身份验证系统
Hisada et al. Triplet energy migration among energetically disordered chromophores in polymer matrixes. 1. monte carlo simulation for the hopping of triplet excitons
WO2008096673A1 (ja) 感光性平版印刷版材料
Liang et al. Photochromic cross-linked copolymer containing thermally stable fluorescing 2-indolylfulgimide
Cullum et al. Three-dimensional optical random access memory materials for use as radiation dosimeters

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties