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ATE456823T1 - Verbundzusammensetzung für mikrostrukturierte schichten - Google Patents

Verbundzusammensetzung für mikrostrukturierte schichten

Info

Publication number
ATE456823T1
ATE456823T1 AT07787376T AT07787376T ATE456823T1 AT E456823 T1 ATE456823 T1 AT E456823T1 AT 07787376 T AT07787376 T AT 07787376T AT 07787376 T AT07787376 T AT 07787376T AT E456823 T1 ATE456823 T1 AT E456823T1
Authority
AT
Austria
Prior art keywords
composite composition
microstructured layers
patterned
micropatterns
hydrolysate
Prior art date
Application number
AT07787376T
Other languages
English (en)
Inventor
Pamela Kalmes
Michael Veith
Carsten Becker-Willinger
Etsuko Hino
Norio Ohkuma
Mitsutoshi Noguchi
Yoshikazu Saito
Original Assignee
Leibniz Inst Neue Materialien
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leibniz Inst Neue Materialien, Canon Kk filed Critical Leibniz Inst Neue Materialien
Application granted granted Critical
Publication of ATE456823T1 publication Critical patent/ATE456823T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Polyethers (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
AT07787376T 2006-07-18 2007-07-11 Verbundzusammensetzung für mikrostrukturierte schichten ATE456823T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200610033280 DE102006033280A1 (de) 2006-07-18 2006-07-18 Kompositzusammensetzung für mikrostrukturierte Schichten
PCT/EP2007/057103 WO2008009608A1 (en) 2006-07-18 2007-07-11 Composite composition for micropatterned layers

Publications (1)

Publication Number Publication Date
ATE456823T1 true ATE456823T1 (de) 2010-02-15

Family

ID=38738873

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07787376T ATE456823T1 (de) 2006-07-18 2007-07-11 Verbundzusammensetzung für mikrostrukturierte schichten

Country Status (8)

Country Link
US (1) US8680179B2 (de)
EP (1) EP2049949B1 (de)
JP (1) JP5089690B2 (de)
AT (1) ATE456823T1 (de)
DE (2) DE102006033280A1 (de)
ES (1) ES2339501T3 (de)
TW (1) TWI434140B (de)
WO (1) WO2008009608A1 (de)

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Also Published As

Publication number Publication date
WO2008009608A1 (en) 2008-01-24
US20100260978A9 (en) 2010-10-14
EP2049949B1 (de) 2010-01-27
JP2009543920A (ja) 2009-12-10
ES2339501T3 (es) 2010-05-20
EP2049949A1 (de) 2009-04-22
TW200811601A (en) 2008-03-01
US20090258197A1 (en) 2009-10-15
DE602007004626D1 (de) 2010-03-18
DE102006033280A1 (de) 2008-01-24
TWI434140B (zh) 2014-04-11
JP5089690B2 (ja) 2012-12-05
US8680179B2 (en) 2014-03-25

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