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ATE196481T1 - Acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und für lithographische druckplatten - Google Patents

Acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und für lithographische druckplatten

Info

Publication number
ATE196481T1
ATE196481T1 AT96110895T AT96110895T ATE196481T1 AT E196481 T1 ATE196481 T1 AT E196481T1 AT 96110895 T AT96110895 T AT 96110895T AT 96110895 T AT96110895 T AT 96110895T AT E196481 T1 ATE196481 T1 AT E196481T1
Authority
AT
Austria
Prior art keywords
mole
chem
formula
amount
present
Prior art date
Application number
AT96110895T
Other languages
English (en)
Inventor
Harald Baumann
Udo Dwars
Celin Savariar-Hauck
Hans-Joachim Timpe
Original Assignee
Kodak Polychrome Graphics Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Llc filed Critical Kodak Polychrome Graphics Llc
Application granted granted Critical
Publication of ATE196481T1 publication Critical patent/ATE196481T1/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/12Hydrolysis
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/28Condensation with aldehydes or ketones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/30Introducing nitrogen atoms or nitrogen-containing groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
AT96110895T 1995-07-07 1996-07-05 Acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und für lithographische druckplatten ATE196481T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19524851A DE19524851C2 (de) 1995-07-07 1995-07-07 Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten

Publications (1)

Publication Number Publication Date
ATE196481T1 true ATE196481T1 (de) 2000-10-15

Family

ID=7766308

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96110895T ATE196481T1 (de) 1995-07-07 1996-07-05 Acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und für lithographische druckplatten

Country Status (7)

Country Link
US (2) US5700619A (de)
EP (1) EP0752430B1 (de)
AT (1) ATE196481T1 (de)
CA (1) CA2180581A1 (de)
DE (2) DE19524851C2 (de)
ES (1) ES2151625T3 (de)
ZA (1) ZA965647B (de)

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DE19639897A1 (de) * 1996-09-27 1998-04-02 Sun Chemical Corp Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien
DE19644515A1 (de) * 1996-10-25 1998-06-25 Sun Chemical Corp Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten
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US6458503B1 (en) * 2001-03-08 2002-10-01 Kodak Polychrome Graphics Llc Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
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Also Published As

Publication number Publication date
US5985996A (en) 1999-11-16
DE69610373D1 (de) 2000-10-26
ES2151625T3 (es) 2001-01-01
US5700619A (en) 1997-12-23
EP0752430A3 (de) 1998-04-15
DE19524851C2 (de) 1998-05-07
EP0752430A2 (de) 1997-01-08
EP0752430B1 (de) 2000-09-20
DE19524851A1 (de) 1997-01-09
DE69610373T2 (de) 2001-05-23
CA2180581A1 (en) 1997-01-08
ZA965647B (en) 1997-06-06

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