NO762217L - - Google Patents
Info
- Publication number
- NO762217L NO762217L NO762217A NO762217A NO762217L NO 762217 L NO762217 L NO 762217L NO 762217 A NO762217 A NO 762217A NO 762217 A NO762217 A NO 762217A NO 762217 L NO762217 L NO 762217L
- Authority
- NO
- Norway
- Prior art keywords
- acid
- plate according
- radiation
- salt
- plate
- Prior art date
Links
- 230000005855 radiation Effects 0.000 claims description 30
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 150000003839 salts Chemical class 0.000 claims description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 13
- 238000007639 printing Methods 0.000 claims description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- 239000011230 binding agent Substances 0.000 claims description 11
- 238000007772 electroless plating Methods 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 9
- -1 disodium salt Chemical class 0.000 claims description 9
- 239000003638 chemical reducing agent Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 5
- IWYDHOAUDWTVEP-UHFFFAOYSA-N R-2-phenyl-2-hydroxyacetic acid Natural products OC(=O)C(O)C1=CC=CC=C1 IWYDHOAUDWTVEP-UHFFFAOYSA-N 0.000 claims description 5
- AUNGANRZJHBGPY-SCRDCRAPSA-N Riboflavin Chemical compound OC[C@@H](O)[C@@H](O)[C@@H](O)CN1C=2C=C(C)C(C)=CC=2N=C2C1=NC(=O)NC2=O AUNGANRZJHBGPY-SCRDCRAPSA-N 0.000 claims description 5
- 239000004411 aluminium Substances 0.000 claims description 5
- 150000001450 anions Chemical class 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000001465 metallisation Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- QBYIENPQHBMVBV-HFEGYEGKSA-N (2R)-2-hydroxy-2-phenylacetic acid Chemical compound O[C@@H](C(O)=O)c1ccccc1.O[C@@H](C(O)=O)c1ccccc1 QBYIENPQHBMVBV-HFEGYEGKSA-N 0.000 claims description 3
- BWSFWXSSALIZAU-UHFFFAOYSA-N 2-(4-chlorophenyl)-2-hydroxyacetic acid Chemical compound OC(=O)C(O)C1=CC=C(Cl)C=C1 BWSFWXSSALIZAU-UHFFFAOYSA-N 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 3
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- 150000004676 glycans Chemical class 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 229960002510 mandelic acid Drugs 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 229920001282 polysaccharide Polymers 0.000 claims description 3
- 239000005017 polysaccharide Substances 0.000 claims description 3
- 230000003595 spectral effect Effects 0.000 claims description 3
- BHZBRPQOYFDTAB-UHFFFAOYSA-N 2-(4-bromophenyl)-2-hydroxyacetic acid Chemical compound OC(=O)C(O)C1=CC=C(Br)C=C1 BHZBRPQOYFDTAB-UHFFFAOYSA-N 0.000 claims description 2
- KKAJSJJFBSOMGS-UHFFFAOYSA-N 3,6-diamino-10-methylacridinium chloride Chemical compound [Cl-].C1=C(N)C=C2[N+](C)=C(C=C(N)C=C3)C3=CC2=C1 KKAJSJJFBSOMGS-UHFFFAOYSA-N 0.000 claims description 2
- RXGJTUSBYWCRBK-UHFFFAOYSA-M 5-methylphenazinium methyl sulfate Chemical compound COS([O-])(=O)=O.C1=CC=C2[N+](C)=C(C=CC=C3)C3=NC2=C1 RXGJTUSBYWCRBK-UHFFFAOYSA-M 0.000 claims description 2
- AUNGANRZJHBGPY-UHFFFAOYSA-N D-Lyxoflavin Natural products OCC(O)C(O)C(O)CN1C=2C=C(C)C(C)=CC=2N=C2C1=NC(=O)NC2=O AUNGANRZJHBGPY-UHFFFAOYSA-N 0.000 claims description 2
- 206010073306 Exposure to radiation Diseases 0.000 claims description 2
- 108010010803 Gelatin Proteins 0.000 claims description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Natural products OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 2
- WDVSHHCDHLJJJR-UHFFFAOYSA-N Proflavine Chemical compound C1=CC(N)=CC2=NC3=CC(N)=CC=C3C=C21 WDVSHHCDHLJJJR-UHFFFAOYSA-N 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- DPKHZNPWBDQZCN-UHFFFAOYSA-N acridine orange free base Chemical compound C1=CC(N(C)C)=CC2=NC3=CC(N(C)C)=CC=C3C=C21 DPKHZNPWBDQZCN-UHFFFAOYSA-N 0.000 claims description 2
- 229940023020 acriflavine Drugs 0.000 claims description 2
- 229920000615 alginic acid Polymers 0.000 claims description 2
- 235000010443 alginic acid Nutrition 0.000 claims description 2
- 235000019270 ammonium chloride Nutrition 0.000 claims description 2
- UKXSKSHDVLQNKG-UHFFFAOYSA-N benzilic acid Chemical compound C=1C=CC=CC=1C(O)(C(=O)O)C1=CC=CC=C1 UKXSKSHDVLQNKG-UHFFFAOYSA-N 0.000 claims description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N benzoquinolinylidene Natural products C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 claims description 2
- KLOIYEQEVSIOOO-UHFFFAOYSA-N carbocromen Chemical compound CC1=C(CCN(CC)CC)C(=O)OC2=CC(OCC(=O)OCC)=CC=C21 KLOIYEQEVSIOOO-UHFFFAOYSA-N 0.000 claims description 2
- 229920000159 gelatin Polymers 0.000 claims description 2
- 239000008273 gelatin Substances 0.000 claims description 2
- 235000019322 gelatine Nutrition 0.000 claims description 2
- 235000011852 gelatine desserts Nutrition 0.000 claims description 2
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 claims description 2
- 229960000286 proflavine Drugs 0.000 claims description 2
- 239000002151 riboflavin Substances 0.000 claims description 2
- 229960002477 riboflavin Drugs 0.000 claims description 2
- 235000019192 riboflavin Nutrition 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 239000004094 surface-active agent Substances 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- FHVDTGUDJYJELY-UHFFFAOYSA-N 6-{[2-carboxy-4,5-dihydroxy-6-(phosphanyloxy)oxan-3-yl]oxy}-4,5-dihydroxy-3-phosphanyloxane-2-carboxylic acid Chemical compound O1C(C(O)=O)C(P)C(O)C(O)C1OC1C(C(O)=O)OC(OP)C(O)C1O FHVDTGUDJYJELY-UHFFFAOYSA-N 0.000 claims 1
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 claims 1
- 229940072056 alginate Drugs 0.000 claims 1
- 229960001484 edetic acid Drugs 0.000 claims 1
- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 claims 1
- 239000004174 erythrosine Substances 0.000 claims 1
- 229940011411 erythrosine Drugs 0.000 claims 1
- 235000012732 erythrosine Nutrition 0.000 claims 1
- 239000000243 solution Substances 0.000 description 43
- 238000000576 coating method Methods 0.000 description 22
- 239000011248 coating agent Substances 0.000 description 21
- 150000001875 compounds Chemical class 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000005630 Diquat Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- SYJFEGQWDCRVNX-UHFFFAOYSA-N diquat Chemical compound C1=CC=[N+]2CC[N+]3=CC=CC=C3C2=C1 SYJFEGQWDCRVNX-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- ITATYELQCJRCCK-UHFFFAOYSA-N Mandelic Acid, Methyl Ester Chemical compound COC(=O)C(O)C1=CC=CC=C1 ITATYELQCJRCCK-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- FIKAKWIAUPDISJ-UHFFFAOYSA-L paraquat dichloride Chemical compound [Cl-].[Cl-].C1=C[N+](C)=CC=C1C1=CC=[N+](C)C=C1 FIKAKWIAUPDISJ-UHFFFAOYSA-L 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000000080 wetting agent Substances 0.000 description 3
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- YDSWCNNOKPMOTP-UHFFFAOYSA-N mellitic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1C(O)=O YDSWCNNOKPMOTP-UHFFFAOYSA-N 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 238000007540 photo-reduction reaction Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 150000005839 radical cations Chemical class 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- HFKPAXQHQKDLSU-MCDZGGTQSA-N (2r,3r,4s,5r)-2-(6-aminopurin-9-yl)-5-(hydroxymethyl)oxolane-3,4-diol;pyridine-3-carboxamide Chemical compound NC(=O)C1=CC=CN=C1.C1=NC=2C(N)=NC=NC=2N1[C@@H]1O[C@H](CO)[C@@H](O)[C@H]1O HFKPAXQHQKDLSU-MCDZGGTQSA-N 0.000 description 1
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- AXSZGQWPAAHKDH-UHFFFAOYSA-N 2-hydroxy-2-naphthalen-1-ylacetic acid Chemical compound C1=CC=C2C(C(C(O)=O)O)=CC=CC2=C1 AXSZGQWPAAHKDH-UHFFFAOYSA-N 0.000 description 1
- XRHGYUZYPHTUJZ-UHFFFAOYSA-N 4-chlorobenzoic acid Chemical class OC(=O)C1=CC=C(Cl)C=C1 XRHGYUZYPHTUJZ-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- RNIHAPSVIGPAFF-UHFFFAOYSA-N Acrylamide-acrylic acid resin Chemical compound NC(=O)C=C.OC(=O)C=C RNIHAPSVIGPAFF-UHFFFAOYSA-N 0.000 description 1
- LUAZZOXZPVVGSO-UHFFFAOYSA-N Benzyl viologen Chemical compound C=1C=C(C=2C=C[N+](CC=3C=CC=CC=3)=CC=2)C=C[N+]=1CC1=CC=CC=C1 LUAZZOXZPVVGSO-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
- DIWVBIXQCNRCFE-UHFFFAOYSA-N DL-alpha-Methoxyphenylacetic acid Chemical compound COC(C(O)=O)C1=CC=CC=C1 DIWVBIXQCNRCFE-UHFFFAOYSA-N 0.000 description 1
- 235000009161 Espostoa lanata Nutrition 0.000 description 1
- 240000001624 Espostoa lanata Species 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical group 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-M bisulphate group Chemical group S([O-])(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-M 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 150000001767 cationic compounds Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012259 ether extract Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000012458 free base Substances 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- JZMJDSHXVKJFKW-UHFFFAOYSA-N methyl sulfate Chemical class COS(O)(=O)=O JZMJDSHXVKJFKW-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- INFDPOAKFNIJBF-UHFFFAOYSA-N paraquat Chemical compound C1=C[N+](C)=CC=C1C1=CC=[N+](C)C=C1 INFDPOAKFNIJBF-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- JBSAUEMFOKUWTP-UHFFFAOYSA-N quinoline-4-carbonitrile Chemical compound C1=CC=C2C(C#N)=CC=NC2=C1 JBSAUEMFOKUWTP-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical class F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 229940047670 sodium acrylate Drugs 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- JADVWWSKYZXRGX-UHFFFAOYSA-M thioflavine T Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C1=[N+](C)C2=CC=C(C)C=C2S1 JADVWWSKYZXRGX-UHFFFAOYSA-M 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/58—Processes for obtaining metallic images by vapour deposition or physical development
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
Description
Bestrålingsfolsomme plater.Irradiation-sensitive plates.
Foreliggende oppfinnelse vedrorer bestrålingsfolsomme plater.The present invention relates to radiation-sensitive plates.
I henhold til ett trekk ved oppfinnelsen er det tilveiebragt en bestrålingsfolsom plate omfattende et metallisk substrat med en overflate belagt med et bestrålingsfolsomt lag omfattende et kvaternært ammoniumsalt av den type som vil akseptere minst ett elektron ved bestrålingseksponsering til å gi en bestanddel som er i stand til å forårsake metallavsetninger på substratet fra en elektrofri pletteringsopplosning i kontakt med denne bestanddelen og omfattende et salt av metallet og et reduseringsmiddel. According to one feature of the invention, there is provided a radiation-sensitive plate comprising a metallic substrate having a surface coated with a radiation-sensitive layer comprising a quaternary ammonium salt of the type which will accept at least one electron upon exposure to radiation to provide a constituent capable of causing metal deposits on the substrate from an electroless plating solution in contact with this component and comprising a salt of the metal and a reducing agent.
I henhold til et annet trekk ved oppfinnelsen er det tilveiebragt en fremgangsmåte for fremstilling av en litografisk trykkplate, omfattende (i) eksponere en bestrålingsfolsom plate omfattende et metallsubstrat med et overflatebelegg av et bestrålingsfolsomt lag omfattende et kvaternært ammoniumsalt av den type som vil motta minst ett elektron ved bestrålingseksponering til å gi en-bestanddel som er i stand til å forårsake metallavsetning på bestanddelen fra en elektrofri pletteringsopplosning i kontakt med bestanddelen, og som omfatter et salt av metallet og et reduseringsmiddel, og (ii) bringe den billedeksponerte plate i kontakt med den elektrofrie pletteringsopplosning omfattende et metallsalt og et reduseringsmiddel for derved å forårsake metallavsetning på de bestrålte områder av laget for å gi den onskede litografiske plate. According to another feature of the invention, there is provided a method for producing a lithographic printing plate, comprising (i) exposing a radiation-sensitive plate comprising a metal substrate with a surface coating of a radiation-sensitive layer comprising a quaternary ammonium salt of the type which will receive at least one electron by irradiation exposure to provide a component capable of causing metal deposition on the component from an electroless plating solution in contact with the component, and comprising a salt of the metal and a reducing agent, and (ii) contacting the imaged plate with the electroless plating solution comprising a metal salt and a reducing agent to thereby cause metal deposition on the irradiated areas of the layer to provide the desired lithographic plate.
Det kvaternære ammoniumsalt kan være av den type som er beskre-vet i britisk patent nr. 1.310.812 og med den generelle formel The quaternary ammonium salt can be of the type described in British patent no. 1,310,812 and with the general formula
hvori R til R"*"0 er hydrogen, halogen eller;11 12 ;organiske substituenter, R og R er, hvis stede, halogen eller organiske substituenter, ;Z er 0 eller et heltall, X~ er et anion, m =;1 eller 2, og minst ett av nitrogenatomene er kvaternært. ;Det kvaternære ammoniumsalt er fortrinnsvis et dikvaternært cy-klisk ammoniumsalt, som ved addisjon av ett elektron danner Weitz-radikaler. Slike salter er dikationiske og inneholder niTtrogenatomer i molekylet og minst to av nitrogenatomene er kva-ternæriserte og utgjor en del av de sammenknyttede ringstruktu-rer som i det minste delvis er aromatiske,og hvor bindingen mellom ringstrukturene tilveiebringes av en kjede med konjugert umetning mellom nitrogenatomene. Spesielt egnete dikvaternære ammoniumsalter for platene ifolge nærværende oppfinnelse er bi-pyridyliumsaltene eksemplifisert ved: ; Forbindelsene (1) og .(2) er kommersielt tilgjengelige forbindelser som markedsfores henholdsvis under navnene "PARAQUAT" og "DIQUAT". Forbindelse (3) er N,N'-di(paracyanofenyl)-4,4'-bi-pyridylklorid og vil i det etterfølgende bli betegnet med CPP ;Fortrinnsvis er kvaternært ammoniumsalt fargelost eller bare svakt farget for eksponering,og forbindelsen dannet derav ved eksponering er farget, slik at et lett synbart bilde dannes etter eksponering. F.eks. er radikalkationet dannet ved addering av ett elektron til dikationet CPP<++>gront, og det tilsvarende noytrale molekyl dannet ved addisjon av to elektroner til dikationet CPP er rodt. ;Det kvartære ammoniumsalt kan innbefatte et enkelt kation eller det kan utgjore en del av et mere komplekst molekyl, såsom en dimer-kationisk forbindelse. Det kan være et polymert materiale, hvor en eller flere av ringstrukturene inneholdende kvaternære nitrogenatomer er i polymergrunnstrukturen, i endegrupper, i sidekjeder eller i kombinasjoner av slike posisjoner. ;Anionene i de kvaternære ammoniumsalter kan eksempelvis være ha-logenider, perklorater, tetrafluorborater, siliciumfluorider, metylsulfater, bisulfater eller polymere anioner såsom f.eks. ! polyakrylat. Nærværet av brom- og jodatomer er mindre onskelig enn tilstedeværelsen av klor- eller fluoratomer, fordi brom og jod virker som inhibitorer for den eksiterte tilstand av katio-net. Anionene bor ikke være oksydasjons- eller reduksjonsmidler eller på annen måte kjemisk reaktive med hensyn til oppiosnings-midler eller andre bestanddeler som anvendes til å danne laget på substratet. ;Det kvartære ammoniumsalt kan være tilstede i det bestrålingsfolsomme lag i blanding med et filmdannende polymert bindemiddel. Bindemidlet kan være slik at det er inert med hensyn til bestanddelen som dannes ved eksponering av det kvartære ammoniumsalt eller det kan være slik at det har en stabiliserende innvirkning på bestanddelen. På denne måte kan noen av de bestanddeler som normalt er meget aktive bli stabilisert i en tilstrekkelig tidsperiode til å tillate behandling med en elektrofri pletteringsopplosning, selv om det er en tidsforsinkelse mellom deres dannelse og en slik behandling. Egnete yannopploselige eller svellbare filmdannende polymerer som kan anvendes som bindemiddel innbefatter polyvinylalkohol, poly a mmoniummetakry-lat , gelatin, alginater og maleinsyreanhydrid-kopolymerer, eksempelvis en kppolymer av maleinsyreanhydrid med styrenvinyl-eter eller etylen. Opploselige polysakkarider så som polysukro-se kan også anvendes som bindemiddel såvel som polyvinyl-pyrro-lidon enten alene eller i blanding med polyvinyl-alkohol. Polyvinyl-alkoholér med varierende viskositeter og hydrolyserings-grader kan anvendes, men en maksimal hydrolyseringsgrad er foretrukket, da deres opploselighet i metallsaltopplosninger er lav ved romtemperatur. De relative vektmengder av det kvartære ammoniumsalt til bindemidlet i laget kan eksempelvis være fra 1:200 til 10:1. ;Den iboende spektralfolsomhet for de kvartære ammoniumsaltene;kan forlenges vel inn i det synlige område av spektret ved inn-foring av spesielle sensitiviseringsmidler i det bestrålingsfolsomme lag. Egnete spektralsensitiviseringsmidler er Riboflavin i form av fri base, 7-klor-9-(N-metyl-dietyl-amino-etyl)-isoalloksazinklorid, ( i det etterfolgende betegnet som forbindelse RD) og andre meget lignende forbindelser, samt "Arconol ., Yellow", (et fargestoff omfattende 3,6-dimetyl-2-(4-dimetyl-aminofenyl)benztiazoliumklorid). Andre sensitiviseringsmidler som kan anvendes innbefatter 3,3'-dietyltiacynidjodid, proflavin, akridin-oransj, akriflavin, N-metylfenaziniummetylsulfat, 4-cyanokinoliniummetjodid og arythrosin. ;Kjemiske sensibilisatorer som forbedrer det bestrålingsfolsomme lags strålingsfolsomhet kan også være tilstede. Disffe sensibilisatorer er forbindelser som inneholder aktivt hydrogen og innbefatter alkoholer, aminer, fenoler, karboksylsyrer og sukre. Eksempler på slike forbindelser er glukose, oksalsyre, p-klor-benzosyrer, glycerol, benzenheksakarboksylsyre, trietanolamin, tiazinfenol, etylendiamintetraeddiksyre (dinatriumsalt), pikrin-syre, glycin, (Etelanin og nikotinamidadenosin-dinukleotidfosfat. Foretrukne kjemiske sensibilisatorer er substituerte eller usub-stituerte mono- eller di-aryl eller 1-aryl-l-alkyl-glykolsyrer eller etere, salter eller andre derivater derav. Spesielt foretrukne sensibilsatorer er mandelsyre , benzilsyre, p-brom-mandelsyre, a-metoksyfenyleddiksyre, p-klor-mandelsyre, a-naftyl-glykolsyre og ammoniummandelat. ;Andre materialer kan også være tilstede i laget om nodvendig. F.eks. kan overflateaktive midler bli tilsatt belegget for å lette dannelse av glatte, jevne lag på substratet. Andre forbindelser, eksempelvis forbindelser som kompieks-binder-jern (III) ioner,som lokalt påvirker egenskapene for den elektrofri pletteringsopplosning,kan også være tilstede i laget. Eksempler på slike forbindelser som kan betegnes som fremkallingsaksele-ratorer er etylendiamin-tetraeddiksyre (diantriumsalt)}ammo niumklorid, diammoniumhydrogenci.trat og siliciumoksyd som sel-ges under handelsnavnet "Cab-o-Sil", og de to sistnevnte er spesielt foretrukne. ;Det anvendte substrat bor i seg selv være inert med hensyn til det bestrålingsfolsomme lag eller må kunne passiveres slik at det er inert med hensyn til laget. Substratet kan være av aluminium. Det foretrukne substrat i tilfellet hvor platen skal anvendes til fremstilling av litografiske trykkplater utgjores av meget rent aluminium inneholdende ikke mindre enn 99,0 % aluminium og fordelaktig inneholder det fra 99,3 til 99,7 % aluminium. ;Fortrinnsvis bor substratoverflaten som belegges med de bestrålingsfolsomme belegg rugjores for å fremme adhesjon av laget og trykkbildet etter fremkalling. Rugjoringen av overflaten Jetter i betydelig gtad trykkerens arbeide med hensyn til å bibeholde den riktige trykkfarge-yannbalanse under trykking. ;En rugjort eller kornet overflate kan erholdes på mange måter som vil være kjent for fagmannen. Behandlingen kan være meka-nisk ved hjelp av roterende borster eller sandblåsning eller ved kulekorning. Den ru overflate kan også erholdes enkelt ved etsing med forskjellige kjemikalier som vil angripe metallet. Imidlertid er den foretrukne korningsmåte av overflaten elek-trokjemisk, hvilket oppnåes ved å neddykke metallet i arkform (satsprosess) eller i form av rull (kontinuerlig prosess) i et bad av en egnet syre eller blandinger av syrer og fore en vekselstrom mellom metallet og eksempelvis en grafittelektrode. I det tilfelle metallet er aluminium kan det anvendes saltsyre alene eller i blanding med andre kjemikalier, såsom eddiksyre, eller salpetersyre, enten alene eller i blanding med andre kjemikalier såsom eddiksyre. Fortrinnsvis gis substratet en finkornet overflate. ;Etter korning bor substratet rengjores for å fjerne biprodukter fra korningsprosessen fra overfladen, som ellers ville reagere med det bestrålingsfolsomme lag. Rensetrinnet kan utfores på kjent måte ved å fore det kornede metall gjennom ett eller flere bad inneholdende forskjellige anvendelige syrer og/eller alka-lier. ;Det er også fordelaktig for substratoverflaten at denne anodise-res. Det anodiske lag vil, når det har tilstrekkelig tykkelse, forhindre at det bestrålingsfolsomme lag reagerer kjemisk med metallet og vil også i betydelig grad oke antall kopier som kan erholdes fra den ferdige trykkplate for gitte betingelser i en trykkpresse.Anodisering kan utfores under anvendelse av et an-r tall elektrolytter som vil være kjent for en fagmann innen feltet vedrorende fremstilling av litografiske trykkplater fra aluminium. En svoveisyreelektrolytt er foretrukket. ;Den bestrålingsfolsomme plate i henhold til foreliggende oppfinnelse fremstilles ved å påfore substratet, fortrinnsvis av kornet og anodisert aluminium, en belegningsopplosning omfattende det kvaternære ammoniumsalt og eventuelt bindemidlet og andre onskede tilsetningsstoffer. Mengden av det kvaternære ammoniumsalt og bindemiddel (hvis dette er tilstede) i belegningsopplosningen er ikke kritisk, og dikteres utelukkende av den onskede folsomhet og ut fra praktiske hensyn. Tilfredsstillende resul-tater kan erholdes ved å anvende en belegningsopplosning inneholdende 0 - 20 vektsdeler av et i vann opploselig polymert bindemiddel, 0,1 - 10 vektsdeler av det kvaternære ammoniumsalt og 70 - 99,9 vektsdeler vann. Belegningsopplosningen kan påfores substratet på mange måter, men dyppe- eller valsebelegning er de foretrukne fremgangsmåter. ;Ved anvendelse av den bestrålingsfolsomme plate ifolge foreliggende oppfinnelse ved fremstilling av en litografisk trykkplate blir det bestrålingsfolsomme lag billedeksponert med aktinisk bestråling, f.eks. UV-bestråling. Det kvaternære ammoniumsalt aksepterer minst ett elektron i de områder hvorpå strå-lingen faller til å gi et bilde som er et negativ av en master. F.eks. i det tilfelle hvor det kvaternære ammoniumsalt er dikat-ionisk (den normalt stabile tilstand i vandige media) repre-sentert med Q<++>vil den fSigende reaksjon finne sted under på- virkning av bestrålingen: ; Bildetbestår av radikalkationet Q<+*>eller det noytrale molekyl wherein R to R"*"0 are hydrogen, halogen or;11 12 ;organic substituents, R and R are, if present, halogen or organic substituents, ;Z is 0 or an integer, X~ is an anion, m =; 1 or 2, and at least one of the nitrogen atoms is quaternary. The quaternary ammonium salt is preferably a diquaternary cyclic ammonium salt, which upon addition of one electron forms Weitz radicals. Such salts are dicationic and contain nitrogen atoms in the molecule and at least two of the nitrogen atoms are quaternized and form part of the linked ring structures which are at least partially aromatic, and where the bond between the ring structures is provided by a chain with conjugated unring between the nitrogen atoms . Particularly suitable diquaternary ammonium salts for the plates according to the present invention are the bi-pyridylium salts exemplified by: ; Compounds (1) and (2) are commercially available compounds marketed under the names "PARAQUAT" and "DIQUAT" respectively. Compound (3) is N,N'-di(paracyanophenyl)-4,4'-bi-pyridyl chloride and will hereafter be denoted by CPP; Preferably, the quaternary ammonium salt is colorless or only slightly colored on exposure, and the compound formed therefrom by exposure is coloured, so that an easily visible image is formed after exposure. E.g. is the radical cation formed by the addition of one electron to the dication CPP<++>green, and the corresponding neutral molecule formed by the addition of two electrons to the dication CPP is red. The quaternary ammonium salt may comprise a single cation or it may form part of a more complex molecule, such as a dimeric cationic compound. It can be a polymeric material, where one or more of the ring structures containing quaternary nitrogen atoms are in the polymer basic structure, in end groups, in side chains or in combinations of such positions. The anions in the quaternary ammonium salts can for example be halides, perchlorates, tetrafluoroborates, silicon fluorides, methyl sulphates, bisulphates or polymeric anions such as e.g. ! polyacrylate. The presence of bromine and iodine atoms is less desirable than the presence of chlorine or fluorine atoms, because bromine and iodine act as inhibitors of the excited state of the cation. The anions must not be oxidizing or reducing agents or in any other way chemically reactive with regard to anti-ionization agents or other components used to form the layer on the substrate. The quaternary ammonium salt may be present in the radiation-sensitive layer in admixture with a film-forming polymeric binder. The binder may be such that it is inert with respect to the component formed upon exposure to the quaternary ammonium salt or it may be such that it has a stabilizing effect on the component. In this way, some of the components which are normally very active can be stabilized for a sufficient period of time to allow treatment with an electroless plating solution, although there is a time delay between their formation and such treatment. Suitable water-soluble or swellable film-forming polymers which can be used as a binder include polyvinyl alcohol, polyammonium methacrylate, gelatin, alginates and maleic anhydride copolymers, for example a kppolymer of maleic anhydride with styrene vinyl ether or ethylene. Soluble polysaccharides such as polysaccharides can also be used as a binder as well as polyvinyl pyrrolidone either alone or in a mixture with polyvinyl alcohol. Polyvinyl alcohols with varying viscosities and degrees of hydrolysis can be used, but a maximum degree of hydrolysis is preferred, as their solubility in metal salt solutions is low at room temperature. The relative weight amounts of the quaternary ammonium salt to the binder in the layer can for example be from 1:200 to 10:1. The inherent spectral sensitivity of the quaternary ammonium salts can be extended well into the visible region of the spectrum by introducing special sensitizers into the radiation-sensitive layer. Suitable spectral sensitizers are Riboflavin in the form of free base, 7-chloro-9-(N-methyl-diethyl-amino-ethyl)-isoalloxazine chloride, (hereinafter referred to as compound RD) and other very similar compounds, as well as "Arconol ., Yellow", (a dye comprising 3,6-dimethyl-2-(4-dimethylaminophenyl)benzthiazolium chloride). Other sensitizers that may be used include 3,3'-diethylthiacynide iodide, proflavine, acridine orange, acriflavine, N-methylphenazinium methylsulfate, 4-cyanoquinolinium methiodide, and arythrosine. ;Chemical sensitizers that enhance the radiation sensitivity of the radiation-sensitive layer may also be present. Different sensitizers are compounds that contain active hydrogen and include alcohols, amines, phenols, carboxylic acids and sugars. Examples of such compounds are glucose, oxalic acid, p-chloro-benzoic acids, glycerol, benzenehexacarboxylic acid, triethanolamine, thiazinephenol, ethylenediaminetetraacetic acid (disodium salt), picric acid, glycine, (Ethelanin and nicotinamide adenosine dinucleotide phosphate. Preferred chemical sensitizers are substituted or unsubstituted mono- or di-aryl or 1-aryl-1-alkyl-glycolic acids or ethers, salts or other derivatives thereof. Particularly preferred sensitizers are mandelic acid, benzylic acid, p-bromo-mandelic acid, a-methoxyphenylacetic acid, p-chloro-mandelic acid, a -naphthyl glycolic acid and ammonium mandelate. ;Other materials may also be present in the layer if necessary. For example, surfactants may be added to the coating to facilitate the formation of smooth, even layers on the substrate. Other compounds, for example compounds that bind -iron (III) ions, which locally affect the properties of the electroless plating solution, can also be present in the layer. Examples of such compounds that can designated as development accelerators are ethylenediaminetetraacetic acid (diantrium salt) ammonium chloride, diammonium hydrogen citrate and silicon oxide which are sold under the trade name "Cab-o-Sil", and the latter two are particularly preferred. ;The substrate used must itself be inert with respect to the radiation-sensitive layer or must be able to be passivated so that it is inert with respect to the layer. The substrate can be made of aluminium. The preferred substrate in the case where the plate is to be used for the production of lithographic printing plates is made of very pure aluminum containing not less than 99.0% aluminum and advantageously contains from 99.3 to 99.7% aluminum. Preferably, the substrate surface which is coated with the radiation-sensitive coatings should be roughened to promote adhesion of the layer and the printed image after development. The roughening of the surface significantly affects the printer's work in maintaining the correct ink balance during printing. A roughened or grained surface can be obtained in many ways which will be known to the person skilled in the art. The treatment can be mechanical using rotating brushes or sandblasting or by ball granulation. The rough surface can also be easily obtained by etching with various chemicals that will attack the metal. However, the preferred method of graining the surface is electrochemical, which is achieved by immersing the metal in sheet form (batch process) or in roll form (continuous process) in a bath of a suitable acid or mixtures of acids and passing an alternating current between the metal and, for example a graphite electrode. If the metal is aluminium, hydrochloric acid can be used alone or in a mixture with other chemicals, such as acetic acid, or nitric acid, either alone or in a mixture with other chemicals such as acetic acid. Preferably, the substrate is given a fine-grained surface. After graining, the substrate should be cleaned to remove by-products from the graining process from the surface, which would otherwise react with the radiation-sensitive layer. The cleaning step can be carried out in a known manner by passing the granular metal through one or more baths containing various usable acids and/or alkalis. It is also advantageous for the substrate surface that this is anodized. The anodic layer, when of sufficient thickness, will prevent the radiation-sensitive layer from reacting chemically with the metal and will also significantly increase the number of copies that can be obtained from the finished printing plate for given conditions in a printing press. Anodizing can be carried out using a an-r number of electrolytes that will be known to a person skilled in the art of making lithographic printing plates from aluminum. A sulfuric acid electrolyte is preferred. ;The radiation-sensitive plate according to the present invention is produced by applying to the substrate, preferably of grained and anodised aluminium, a coating solution comprising the quaternary ammonium salt and possibly the binder and other desired additives. The amount of the quaternary ammonium salt and binder (if present) in the coating solution is not critical, and is dictated solely by the desired sensitivity and practical considerations. Satisfactory results can be obtained by using a coating solution containing 0-20 parts by weight of a water-soluble polymeric binder, 0.1-10 parts by weight of the quaternary ammonium salt and 70-99.9 parts by weight of water. The coating solution can be applied to the substrate in many ways, but dip or roller coating are the preferred methods. When using the radiation-sensitive plate according to the present invention in the production of a lithographic printing plate, the radiation-sensitive layer is image-exposed with actinic radiation, e.g. UV irradiation. The quaternary ammonium salt accepts at least one electron in the areas on which the radiation falls to produce an image which is a negative of a master. For example in the case where the quaternary ammonium salt is dicationic (the normally stable state in aqueous media) represented by Q<++>, the following reaction will take place under the influence of the irradiation: ; The image consists of the radical cation Q<+*>or the neutral molecule
Q, som begge er i stand til å forårsake metallavsetning fraQ, both of which are capable of causing metal deposition from
en elektrofri pletteringsopplosning.an electroless plating solution.
Den billed-eksponerte plate behover ikke å fremkalles umiddel-bart. Selv om bildet nedbrytes i nærvær av fuktighet og oksygen, så er den eksponerte plate tilstrekkelig stabil for håndtering under normale betingelser, for eksempelvis "step and repeat work". Hvis imidlertid det er onsket å lagre en billedeksponert plate The image-exposed plate does not need to be developed immediately. Although the image degrades in the presence of moisture and oxygen, the exposed plate is sufficiently stable for handling under normal conditions, for example "step and repeat work". If, however, it is desired to save an image-exposed plate
i et lengere tidsrom bor denne lagres under torre og/eller oksy-genfrie betingelser. for a longer period of time this should be stored under dry and/or oxygen-free conditions.
Den billedeksponerte plate fremkalles ved å bringe den i kontakt med en elektrofri pletteringsopplosning, eksempelvis en opplosning inneholdende et solvsalt og et reduseringsmiddel. Slike opplosninger er tidligere kjent og er i stand til å avsette metall uten en ytre påforing av et elektrisk felt. The image-exposed plate is developed by bringing it into contact with an electroless plating solution, for example a solution containing a sol salt and a reducing agent. Such solutions are previously known and are capable of depositing metal without an external application of an electric field.
Et vedheftende metallisk bilde avsettes så på de arealer somAn adherent metallic image is then deposited on the areas which
er bestrålt. Straks et spor av metall er avsatt er dette i stand til å katalysere ytterligere avsetning av det samme eller et annet metall fra en passende opplosning. på denne måte kan et metallisk lag bygges opp i billedområdene. Mengden av avsatt metall er avhengig av mange variabler såsom sammensetningen av det bestrålingsfolsomme lag, eksponeringstid, kontakttiden med den elektrofrie pletteringsopplosning og sammensetningen av denne. For solvbilder kan b.illedvekter på opp til 25 g/m eller hoyere oppnåes. Ytterligere behandling kan utfores om nodvendig for å gjore det metallisk bilde mere oleofilt og ikke-billed-arealene mere hydrofile. Platen kan innsvertes og deretter behandles på vanlig måte med en gummiopplosning for montering i trykkpressen. Den erholdte plate kan anvendes i en arktilfor-selspresse til å trykke lange serier av beste kvalitet, og den kan også anvendes for å trykke lange serier på bane-offset-trykkpresse. Trykkplaten er også egnet for direkte lito-anven-delser. is irradiated. As soon as a trace of metal is deposited, this is able to catalyze further deposition of the same or another metal from a suitable solution. in this way, a metallic layer can be built up in the image areas. The amount of deposited metal depends on many variables such as the composition of the radiation-sensitive layer, exposure time, contact time with the electroless plating solution and its composition. For solar images, image weights of up to 25 g/m or higher can be achieved. Further treatment can be carried out if necessary to make the metallic image more oleophilic and the non-image areas more hydrophilic. The plate can be blackened and then treated in the usual way with a rubber solution for assembly in the printing press. The plate obtained can be used in a sheet feeding press to print long series of the best quality, and it can also be used to print long series on a web offset printing press. The pressure plate is also suitable for direct litho applications.
Det er mulig å fremstille bestrålingsfolsomme plater i henhold til foreliggende oppfinnelse som har egenskaper som hdy opplosning og skarphet, og som er egnet for anvendelse ved fremstilling av litografiske trykkplater med evne til å motstå de mest krevende trykkbetingelser på samme måte som bimetall-litografiske trykkplater. It is possible to produce radiation-sensitive plates according to the present invention which have properties such as high resolution and sharpness, and which are suitable for use in the production of lithographic printing plates with the ability to withstand the most demanding printing conditions in the same way as bimetallic lithographic printing plates.
De etterfølgende eksempler illustrerer oppfinnelsen. I alle tilfeller er mengde angivelsen angitt i vektdeler, hvis intet annet er angitt. Mengden av bestrålingsfolsomt belegningsmate-. riale påfort.i henhold til eksemplene var i storrelsesordenen 0,2 g/m . Den solvinneholdende elektrofri pletteringsopplosning anvendt i eksemplene ble fremstilt ved å blande 100 ml av opplosning I, 25 ml av opplosning II og 25 ml av opplosning III, hvor de nevnte opplosninger hadde folgende sammensetning: The following examples illustrate the invention. In all cases, the quantity indicated is in parts by weight, if nothing else is stated. The amount of radiation sensitive coating mat-. according to the examples was in the order of magnitude 0.2 g/m . The solar-containing electroless plating solution used in the examples was prepared by mixing 100 ml of solution I, 25 ml of solution II and 25 ml of solution III, where the said solutions had the following composition:
Opplosning ISolution I
Opplosning II Opplosning III Solution II Solution III
"Synthrapol N" er et ikke-ionisk fuktemiddel, og er et etylen-oksydkondensat med en alifatisk alkohol. "Synthrapol N" is a non-ionic wetting agent, and is an ethylene oxide condensate with an aliphatic alcohol.
EKSEMPEL 1EXAMPLE 1
Den folgende belegningsopplosning ble fremstilt og valsebelagt på et aluminiumsark som var kornet i salpetersyre, renset i fosforsyre og til slutt anodisert i svovelsyre. The following coating solution was prepared and roll coated on an aluminum sheet which was grained in nitric acid, cleaned in phosphoric acid and finally anodized in sulfuric acid.
Den erholdte bestrålingsfolsomme plate ble eksponert gjennom en negativ transparent i en kopieringsforeramme i 1,5 min. under anvendelse av fire "Philips 300w MLU" lamper oppbåret 600 mm over rammen. Et gront kopibilde ble erholdt. Den eksponerte plate ble deretter neddykket i solvpletteringsopplosningen i 3 min. ved romtemperatur. Det gronne bilde ble erstattet av et blakt bilde av metallisk solv, som kunne poleres til glansfullt solv som var i ledende kontakt med aluminiumsubstra-tet. The resulting radiation-sensitive plate was exposed through a negative transparency in a copying pre-frame for 1.5 min. using four "Philips 300w MLU" lamps carried 600 mm above the frame. A large copy image was obtained. The exposed plate was then immersed in the sol plating solution for 3 min. at room temperature. The green image was replaced by a pale image of metallic solv, which could be polished to a glossy solv which was in conductive contact with the aluminum substrate.
EKSEMPEL 2EXAMPLE 2
Den folgende belegningsopplosning ble fremstilt og anvendt til å fremstille en bestrålingsfolsom plate på samme måte som i eksempel 1, bortsett fra at eksponeringstiden var 4 min. The following coating solution was prepared and used to prepare an irradiation-sensitive plate in the same manner as in Example 1, except that the exposure time was 4 min.
Platen ble eksponert og fremkalt som angitt i eksempel 1 bortsett fra at eksponeringstiden var 4 min., og kopibildet var grbnt på The plate was exposed and developed as indicated in Example 1 except that the exposure time was 4 min., and the copy image was gray on
sammertåte som angitt i eksempel 1.together as indicated in example 1.
EKSEMPEL 3EXAMPLE 3
Den folgende belegningsopplosning ble fremstilt og anvendt tilThe following coating solution was prepared and used for
å gi en bestrålingsfolsom plate på samme måte som i eksempel 1: to provide a radiation-sensitive plate in the same manner as in Example 1:
Platen ble eksponert som angitt i eksempel 1 bortsett fra at eksponeringstiden var ett minutt. The plate was exposed as indicated in Example 1 except that the exposure time was one minute.
Det gronne kopibilde på den eksponerte plate ble erstattet . med et sort bilde av metallisk solv etter at platen var neddykket i solvpletteringsopplosningen i 3 min. ved romtemperatur. Platens overflate ble deretter bestroket med en bomullsdott dyppet i en dispersjon av en organisk merkapto-forbindelse og et fuktemiddel i vann for å foroke bildets initiale trykksverte-mottagelighet. Etter sverting og gummiering på normal måte ble platen montert i en ark-matet, offset, trykkpresse og flere hundrede gode, rene kopier ble trykket. The green copy image on the exposed plate was replaced. with a black image of metallic sol after the plate was immersed in the sol plating solution for 3 min. at room temperature. The surface of the plate was then coated with a cotton ball dipped in a dispersion of an organic mercapto compound and a wetting agent in water to increase the initial ink receptivity of the image. After blackening and gumming in the normal way, the plate was mounted in a sheet-fed, offset, printing press and several hundred good, clean copies were printed.
EKSEMPEL 4EXAMPLE 4
Eksempel 1 ble gjentatt under anvendelse av den folgende belegningsopplosning og med en eksponeringstid på 4 min.: Example 1 was repeated using the following coating solution and with an exposure time of 4 min.:
EKSEMPEL 5 EXAMPLE 5
Eksempel 1 ble gjentatt under anvendelse av den folgende belegningsopplosning og med en eksponeringstid på 10 min.: Example 1 was repeated using the following coating solution and with an exposure time of 10 min.:
/ /
"Cyanamer P26" er en kopolymer av akrylamid, akrylsyre og na-triumakrylat erholdt fra Cyanamid of Great Britain Limited. "Cyanamer P26" is a copolymer of acrylamide, acrylic acid and sodium acrylate obtained from Cyanamid of Great Britain Limited.
EKSEMPEL 6EXAMPLE 6
Den folgende belegningsopplosning ble fremstilt og valsebelagt på et finkornet og anodisert aluminiumsark: The following coating solution was prepared and roll-coated onto a fine-grained and anodized aluminum sheet:
"Benzyl Viologen" ligner "Raraquat", men hvor metylgruppene er erstattet med benzylgrupper. "Benzyl Viologen" is similar to "Raraquat", but where the methyl groups are replaced by benzyl groups.
Den erholdte plate ble billedeksponert som angitt i eksempel 1The plate obtained was exposed as indicated in Example 1
i 2 min.. Et blekt purpur kopibilde ble erholdt. Ved behandling med solvpletteringsopplasningen kunne ikke tilstrekkelig solv avsettes til å gi et polerbart solvbilde. for 2 min. A pale purple copy image was obtained. During treatment with the sol plating placement, sufficient sol could not be deposited to give a polishable sol image.
EKSEMPEL 7EXAMPLE 7
Den folgende belegningsopplosning ble fremstilt og belagt påThe following coating solution was prepared and coated
et finkornet anodisert aluminiumsubstrat:a fine-grained anodized aluminum substrate:
"BRU 35" er et ikke-ionisk fuktemiddel og er et etylenoksyd-kondensat av en alifatisk alkohol. "BRU 35" is a non-ionic wetting agent and is an ethylene oxide condensate of an aliphatic alcohol.
Den erholdte bestrålingsfolsomme plate ble billedeksponert som angitt i eksempel 1 i 3 min.. Et purpur kopibilde ble erholdt. The resulting radiation-sensitive plate was image-exposed as indicated in Example 1 for 3 min. A purple copy image was obtained.
EKSEMPEL 8EXAMPLE 8
Eksempel 7 ble gjentatt under anvendelse av "Diquat" i stedet for "Paraquat". Et lyseblått avtrykk ble erholdt. Example 7 was repeated using "Diquat" instead of "Paraquat". A light blue impression was obtained.
EKSEMPEL 9EXAMPLE 9
Eksempel 1 ble gjentatt under anvendelse av den folgende belegningsopplosning og med en eksponeringstid på 2 min.: Example 1 was repeated using the following coating solution and with an exposure time of 2 min.:
Et gront avtrykk ble erholdt. A shallow impression was obtained.
EKSEMPEL 10.EXAMPLE 10.
Eksempel 3 ble gjentatt under anvendelse av folgende belegningsopplosning og med en eksponeringstid på 2 min.: Example 3 was repeated using the following coating solution and with an exposure time of 2 min.:
Gode, rene avtrykk av hoy kvalitet ble erholdt. Good, clean prints of high quality were obtained.
EKSEMPEL 11EXAMPLE 11
Eksempel 3 ble gjentatt under anvendelse av den folgende belegningsopplosning og med en eksponeringstid på 30 sek.: Example 3 was repeated using the following coating solution and with an exposure time of 30 sec.:
Gode, rene avtrykk av hoy kvalitet ble erholdt. Good, clean prints of high quality were obtained.
EKSEMPEL 12EXAMPLE 12
Eksempel 3 ble gjentatt under anvendelse av den folgende belegningsopplosning og med en eksponeringstid på 15 sek.: Example 3 was repeated using the following coating solution and with an exposure time of 15 sec.:
EKSEMPEL 13 EXAMPLE 13
Til 152 g (1,0 mol) mandelsyre og 200 ml metanol i rundbunnet flaske forsynt med tilbakelopskjoler ble tilsatt .100 ml metanol inneholdende ca.lOg vanhfritthydrogenklorid. Oppløsningen ble oppvarmet under tilbakelopskjbling på et dampbad i 5 timer og deretter helt i isvann i et beger. En mettet vandig opplosning av natriumbikarbonat ble tilsatt inntil oppløsningen var svakt alkalisk. Den ble deretter ekstrahert med 300 ml porsjo- To 152 g (1.0 mol) of mandelic acid and 200 ml of methanol in a round-bottomed bottle fitted with reflux valves was added 100 ml of methanol containing approx. 10 g of anhydrous hydrogen chloride. The solution was heated under reflux on a steam bath for 5 hours and then poured into ice water in a beaker. A saturated aqueous solution of sodium bicarbonate was added until the solution was slightly alkaline. It was then extracted with 300 ml portions of
ner eter i en skylletrakt. Eterekstraktene ble vasket med 200 ml's ner ether in a rinsing funnel. The ether extracts were washed with 200 ml
porsjon vann og torket over 50 g vannfri natriumsulfat. Den torkede eteropplosning ble konsentrert ved destillasjon fra en Claisen-flaske, og resten ble destillert under redusert trykk. portion of water and dried over 50 g of anhydrous sodium sulfate. The dried ether solution was concentrated by distillation from a Claisen flask, and the residue was distilled under reduced pressure.
Det ble fremstilt blandinger inneholdende således erholdt . me-tylmandelat og fotoreduserbare kvaternære ammoniumsalter såsom "Paraquat", "Diquat" og CPP<++>. Metylmandelatet ble funnet å være en sensibilisator for fotoreduksjon av saltene. Mixtures containing thus obtained were prepared. methylmandelate and photoreducible quaternary ammonium salts such as "Paraquat", "Diquat" and CPP<++>. The methyl mandelate was found to be a sensitizer for photoreduction of the salts.
EKSEMPEL 14EXAMPLE 14
Blandinger ble fremstilt inneholdende en kommersiell tilgjenge-lig mandelsyremetyleter og fotoreduserbare salter såsom ."Paraquat", "Diquat" og CPP+,+ . Eteren ble funnet å være en ef-fektiv sensibilisator for fotoreduksjon av saltene. Mixtures were prepared containing a commercially available mandelic acid methyl ether and photoreducible salts such as "Paraquat", "Diquat" and CPP+,+. The ether was found to be an effective sensitizer for photoreduction of the salts.
EKSEMPEL 15EXAMPLE 15
Eksempel 1 ble gjentatt under anvendelse av den folgende belegningsopplosning og med en eksponeringstid på 2 min.: Example 1 was repeated using the following coating solution and with an exposure time of 2 min.:
Gode, rene avtrykk av hoy kvalitet ble erholdt. Good, clean prints of high quality were obtained.
EKSEMPEL 16EXAMPLE 16
Eksempel 1 ble gjentatt under anvendelse av den folgende belegningsopplosning og med en eksponeringstid på 2 min.: Example 1 was repeated using the following coating solution and with an exposure time of 2 min.:
Gode, rene avtrykk av hoy kvalitet ble erholdt. Good, clean prints of high quality were obtained.
EKSEMPEL 17EXAMPLE 17
Eksempel 7 ble gjentatt under anvendelse av den folgende belegningsopplosning og med en eksponeringstid på 2 min.: Example 7 was repeated using the following coating solution and with an exposure time of 2 min.:
EKSEMPEL 18 EXAMPLE 18
Eksempel 17 ble gjentatt under anvendelse av 2,0 a-naftyl-glykolsyre i stedet for p-klormandelsyre. Et purpur avtrykk ble erholdt. Example 17 was repeated using 2.0 α-naphthyl glycolic acid instead of p-chloromandelic acid. A purple imprint was obtained.
Claims (14)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB27435/75A GB1556362A (en) | 1975-06-28 | 1975-06-28 | Radiation sensitive materials |
Publications (1)
Publication Number | Publication Date |
---|---|
NO762217L true NO762217L (en) | 1976-12-29 |
Family
ID=10259565
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO762217A NO762217L (en) | 1975-06-28 | 1976-06-25 |
Country Status (24)
Country | Link |
---|---|
JP (1) | JPS5210724A (en) |
AT (1) | AT351050B (en) |
BE (1) | BE843497A (en) |
CA (1) | CA1087434A (en) |
CH (1) | CH607101A5 (en) |
CS (1) | CS216159B2 (en) |
DD (1) | DD126347A5 (en) |
DE (1) | DE2628996A1 (en) |
DK (1) | DK289376A (en) |
ES (1) | ES449318A1 (en) |
FI (1) | FI761870A (en) |
FR (1) | FR2317685A1 (en) |
GB (1) | GB1556362A (en) |
HU (1) | HU175854B (en) |
IE (1) | IE43481B1 (en) |
IT (1) | IT1061441B (en) |
LU (1) | LU75251A1 (en) |
NL (1) | NL7607065A (en) |
NO (1) | NO762217L (en) |
NZ (1) | NZ181263A (en) |
PL (1) | PL110012B1 (en) |
SE (1) | SE7607190L (en) |
YU (1) | YU157976A (en) |
ZA (1) | ZA763731B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5851999A (en) * | 1981-09-21 | 1983-03-26 | Ebara Infilco Co Ltd | Method of dehydrating sludge |
GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1281698A (en) * | 1968-07-15 | 1972-07-12 | Itek Corp | Metallic photographic products |
GB1354322A (en) * | 1971-05-20 | 1974-05-30 | Ici Ltd | Magnetic information carriers |
US3853589A (en) * | 1970-11-09 | 1974-12-10 | Ici Ltd | Metal deposition process |
-
1975
- 1975-06-28 GB GB27435/75A patent/GB1556362A/en not_active Expired
-
1976
- 1976-06-23 ZA ZA763731A patent/ZA763731B/en unknown
- 1976-06-23 SE SE7607190A patent/SE7607190L/en not_active Application Discontinuation
- 1976-06-23 NZ NZ181263A patent/NZ181263A/en unknown
- 1976-06-25 HU HU76VI1086A patent/HU175854B/en unknown
- 1976-06-25 NO NO762217A patent/NO762217L/no unknown
- 1976-06-25 IE IE1387/76A patent/IE43481B1/en unknown
- 1976-06-25 DK DK289376A patent/DK289376A/en not_active Application Discontinuation
- 1976-06-25 LU LU75251A patent/LU75251A1/xx unknown
- 1976-06-25 CA CA255,739A patent/CA1087434A/en not_active Expired
- 1976-06-28 DE DE19762628996 patent/DE2628996A1/en not_active Withdrawn
- 1976-06-28 CH CH826176A patent/CH607101A5/xx not_active IP Right Cessation
- 1976-06-28 FR FR7619600A patent/FR2317685A1/en active Granted
- 1976-06-28 NL NL7607065A patent/NL7607065A/en not_active Application Discontinuation
- 1976-06-28 YU YU01579/76A patent/YU157976A/en unknown
- 1976-06-28 AT AT470976A patent/AT351050B/en not_active IP Right Cessation
- 1976-06-28 CS CS764250A patent/CS216159B2/en unknown
- 1976-06-28 JP JP51075639A patent/JPS5210724A/en active Pending
- 1976-06-28 IT IT24815/76A patent/IT1061441B/en active
- 1976-06-28 DD DD193603A patent/DD126347A5/xx unknown
- 1976-06-28 PL PL1976190788A patent/PL110012B1/en unknown
- 1976-06-28 FI FI761870A patent/FI761870A/fi not_active Application Discontinuation
- 1976-06-28 BE BE168382A patent/BE843497A/en not_active IP Right Cessation
- 1976-06-28 ES ES449318A patent/ES449318A1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5210724A (en) | 1977-01-27 |
CS216159B2 (en) | 1982-10-29 |
FR2317685B1 (en) | 1982-05-07 |
ES449318A1 (en) | 1977-08-16 |
IE43481B1 (en) | 1981-03-11 |
CA1087434A (en) | 1980-10-14 |
NL7607065A (en) | 1976-12-30 |
IT1061441B (en) | 1983-02-28 |
ATA470976A (en) | 1978-12-15 |
BE843497A (en) | 1976-12-28 |
DK289376A (en) | 1976-12-29 |
IE43481L (en) | 1976-12-28 |
YU157976A (en) | 1983-02-28 |
ZA763731B (en) | 1977-05-25 |
FI761870A (en) | 1976-12-29 |
CH607101A5 (en) | 1978-11-30 |
SE7607190L (en) | 1976-12-29 |
LU75251A1 (en) | 1977-02-18 |
NZ181263A (en) | 1978-06-02 |
GB1556362A (en) | 1979-11-21 |
DD126347A5 (en) | 1977-07-13 |
AT351050B (en) | 1979-07-10 |
HU175854B (en) | 1980-10-28 |
PL110012B1 (en) | 1980-06-30 |
FR2317685A1 (en) | 1977-02-04 |
AU1526176A (en) | 1978-01-05 |
DE2628996A1 (en) | 1977-02-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4153461A (en) | Layer support for light-sensitive material adapted to be converted into a planographic printing plate | |
US2687958A (en) | Light-sensitive layers for the printing industry | |
NO132719B (en) | ||
CA1232489A (en) | Planographic printing plate | |
JPS58171574A (en) | Sheet, foil and band-form material made from chemically, mechanically and/or electrochemically roughed aluminum or aluminum alloy, manufacture offset printing plate having same as supporter | |
US4865951A (en) | Bilayered anodized aluminum support, method for the preparation thereof and lithographic printing plate containing same | |
US3836437A (en) | Surface treatment for aluminum plates | |
US3493371A (en) | Radiation-sensitive recording material | |
US3615442A (en) | Metal printing plate and method for preparation of same | |
US3715210A (en) | Lithographic printing plates | |
US4126468A (en) | Radiation sensitive compositions of quaternary ammonium salt and carboxylic acid sensitizer | |
US4022670A (en) | Process for preparation of lithographic printing plates | |
CA1189378A (en) | Electrochemical developing process for reproduction layers | |
US4414311A (en) | Cathodic deposition of light sensitive components | |
US3265504A (en) | Surface treated lithographic plates and their production | |
NO762217L (en) | ||
JPH0428292B2 (en) | ||
US4552827A (en) | Planographic printing plate having cationic compound in interlayer | |
JPS59214651A (en) | Plate making process using photo-sensitive lithographic printing plate | |
US4202699A (en) | Lithoplates of quaternary ammonium salt compositions | |
DE3717757C2 (en) | ||
JPS6142251B2 (en) | ||
US3350206A (en) | Lithographic plates, gluconate solutions therefor and process for producing the same | |
US3682636A (en) | Presensitized photolithographic plate having diazo stabilized aluminum base | |
US3562119A (en) | Presensitized aluminum photolithographic etched plate and elements and method used in the preparation of same |