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NL9000599A - Werkwijze en inrichting voor optische beeldvorming. - Google Patents

Werkwijze en inrichting voor optische beeldvorming. Download PDF

Info

Publication number
NL9000599A
NL9000599A NL9000599A NL9000599A NL9000599A NL 9000599 A NL9000599 A NL 9000599A NL 9000599 A NL9000599 A NL 9000599A NL 9000599 A NL9000599 A NL 9000599A NL 9000599 A NL9000599 A NL 9000599A
Authority
NL
Netherlands
Prior art keywords
lens
image
exposure
pattern
imaging lens
Prior art date
Application number
NL9000599A
Other languages
English (en)
Dutch (nl)
Original Assignee
Nippon Seiko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Seiko Kk filed Critical Nippon Seiko Kk
Publication of NL9000599A publication Critical patent/NL9000599A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL9000599A 1989-03-15 1990-03-15 Werkwijze en inrichting voor optische beeldvorming. NL9000599A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP6327589 1989-03-15
JP6327589A JPH0812843B2 (ja) 1989-03-15 1989-03-15 光学結像装置及び方法

Publications (1)

Publication Number Publication Date
NL9000599A true NL9000599A (nl) 1990-10-01

Family

ID=13224596

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9000599A NL9000599A (nl) 1989-03-15 1990-03-15 Werkwijze en inrichting voor optische beeldvorming.

Country Status (4)

Country Link
US (1) US5061956A (ja)
JP (1) JPH0812843B2 (ja)
DE (1) DE4007069C2 (ja)
NL (1) NL9000599A (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5229811A (en) * 1990-06-15 1993-07-20 Nikon Corporation Apparatus for exposing peripheral portion of substrate
NL9100202A (nl) * 1991-02-05 1992-09-01 Asm Lithography Bv Lithografische inrichting met een hangende objecttafel.
US5305054A (en) 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
US5673102A (en) * 1991-02-22 1997-09-30 Canon Kabushiki Kaisha Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity
NL9100421A (nl) * 1991-03-08 1992-10-01 Asm Lithography Bv Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting.
JPH0536586A (ja) * 1991-08-02 1993-02-12 Canon Inc 像投影方法及び該方法を用いた半導体デバイスの製造方法
US5424803A (en) * 1991-08-09 1995-06-13 Canon Kabushiki Kaisha Projection exposure apparatus and semiconductor device manufacturing method
JP3210123B2 (ja) * 1992-03-27 2001-09-17 キヤノン株式会社 結像方法及び該方法を用いたデバイス製造方法
JP3278896B2 (ja) * 1992-03-31 2002-04-30 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
DE102006038455A1 (de) 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
KR20090116333A (ko) * 2008-05-07 2009-11-11 주식회사 프로텍 상하 독립구동 방식의 양면 동시 노광시스템

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU406392B2 (en) * 1966-12-05 1970-10-07 Method and apparatus forthe production of masks for use inthe manufacture of planar transistors and integrated circuits
US4811055A (en) * 1984-02-27 1989-03-07 Canon Kabushiki Kaisha Projection exposure apparatus
JPS6119129A (ja) * 1984-07-05 1986-01-28 Nippon Kogaku Kk <Nikon> 投影光学装置
JPH0720755B2 (ja) * 1985-03-28 1995-03-08 大日本印刷株式会社 疑似円形描画用光学作図装置
NL8601547A (nl) * 1986-06-16 1988-01-18 Philips Nv Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting.
JPS63246296A (ja) * 1987-03-31 1988-10-13 三菱電機株式会社 Ｉｃカ−ド装置
JP2690960B2 (ja) * 1988-09-07 1997-12-17 株式会社日立製作所 拡大投影露光方法及びその装置

Also Published As

Publication number Publication date
DE4007069A1 (de) 1990-09-20
DE4007069C2 (de) 1995-06-29
JPH02241018A (ja) 1990-09-25
JPH0812843B2 (ja) 1996-02-07
US5061956A (en) 1991-10-29

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BB A search report has been drawn up
BC A request for examination has been filed
BV The patent application has lapsed