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NL2003256A1 - Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element. - Google Patents

Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element. Download PDF

Info

Publication number
NL2003256A1
NL2003256A1 NL2003256A NL2003256A NL2003256A1 NL 2003256 A1 NL2003256 A1 NL 2003256A1 NL 2003256 A NL2003256 A NL 2003256A NL 2003256 A NL2003256 A NL 2003256A NL 2003256 A1 NL2003256 A1 NL 2003256A1
Authority
NL
Netherlands
Prior art keywords
optical element
lithographic apparatus
making
apparatus including
lithographic
Prior art date
Application number
NL2003256A
Other languages
English (en)
Inventor
Leonid Sjmaenok
Vadim Banine
Roel Moors
Denis Glushkov
Andrey Yakunin
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2003256A1 publication Critical patent/NL2003256A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • X-Ray Techniques (AREA)
  • Carbon And Carbon Compounds (AREA)
NL2003256A 2008-08-06 2009-07-22 Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element. NL2003256A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13601008P 2008-08-06 2008-08-06

Publications (1)

Publication Number Publication Date
NL2003256A1 true NL2003256A1 (nl) 2010-02-09

Family

ID=41417456

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2003256A NL2003256A1 (nl) 2008-08-06 2009-07-22 Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element.

Country Status (8)

Country Link
US (1) US9897930B2 (nl)
EP (1) EP2321703B1 (nl)
JP (1) JP5511818B2 (nl)
KR (2) KR101753212B1 (nl)
CN (1) CN102089713B (nl)
NL (1) NL2003256A1 (nl)
TW (1) TWI400580B (nl)
WO (1) WO2010015508A2 (nl)

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* Cited by examiner, † Cited by third party
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EP2478417B1 (en) 2009-09-18 2013-07-03 Koninklijke Philips Electronics N.V. Foil trap device with improved heat resistance
CN102859444B (zh) 2010-04-27 2015-04-08 Asml荷兰有限公司 光谱纯度滤光片
CN107402417B (zh) * 2010-06-25 2020-08-04 Asml荷兰有限公司 多层反射镜
US9322964B2 (en) * 2012-01-19 2016-04-26 Supriya Jaiswal Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications
US9606445B2 (en) * 2012-08-03 2017-03-28 Asml Netherlands B.V. Lithographic apparatus and method of manufacturing a device
DE102013201857A1 (de) * 2013-02-05 2014-01-23 Carl Zeiss Smt Gmbh Optisches System
NL2013700A (en) * 2013-11-25 2015-05-27 Asml Netherlands Bv An apparatus, a device and a device manufacturing method.
JP6492511B2 (ja) * 2014-10-08 2019-04-03 ウシオ電機株式会社 パターン形成体の製造方法及び光照射装置
JP6520041B2 (ja) * 2014-10-21 2019-05-29 凸版印刷株式会社 ペリクル
GB2534404A (en) 2015-01-23 2016-07-27 Cnm Tech Gmbh Pellicle
KR102345543B1 (ko) 2015-08-03 2021-12-30 삼성전자주식회사 펠리클 및 이를 포함하는 포토마스크 조립체
DE102015225509A1 (de) * 2015-12-16 2017-06-22 Carl Zeiss Smt Gmbh Reflektives optisches Element
CN109416503B (zh) 2016-07-05 2023-06-09 三井化学株式会社 防护膜、防护膜组件框体、防护膜组件、其制造方法、曝光原版、曝光装置、半导体装置的制造方法
CN108731823B (zh) * 2017-04-20 2020-02-07 清华大学 一种太赫兹波通讯方法
EP3404487B1 (en) * 2017-05-15 2021-12-01 IMEC vzw Method for forming a carbon nanotube pellicle membrane
NL2021939B1 (en) * 2017-11-10 2019-09-16 Asml Netherlands Bv EUV Pellicles
US10887973B2 (en) 2018-08-14 2021-01-05 Isteq B.V. High brightness laser-produced plasma light source
RU2709183C1 (ru) * 2019-04-26 2019-12-17 Общество С Ограниченной Ответственностью "Эуф Лабс" Источник рентгеновского излучения с жидкометаллической мишенью и способ генерации излучения
RU2706713C1 (ru) * 2019-04-26 2019-11-20 Общество С Ограниченной Ответственностью "Эуф Лабс" Источник коротковолнового излучения высокой яркости
WO2019228784A1 (en) * 2018-05-31 2019-12-05 Asml Netherlands B.V. Lithographic apparatus
EP3674797B1 (en) * 2018-12-28 2021-05-05 IMEC vzw An euvl scanner
EP3764163B1 (en) * 2019-07-11 2023-04-12 IMEC vzw An extreme ultraviolet lithography device
US20220276553A1 (en) 2019-08-26 2022-09-01 Asml Netherlands B.V. Pellicle membrane for a lithographic apparatus
NL2027098B1 (en) * 2020-01-16 2021-10-14 Asml Netherlands Bv Pellicle membrane for a lithographic apparatus
EP4208755A1 (en) * 2020-09-03 2023-07-12 ASML Netherlands B.V. Pellicle membrane for a lithographic apparatus

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JP3127037B2 (ja) 1991-03-18 2001-01-22 キヤノン株式会社 Ｘ線マスク支持体、ｘ線マスク構造体及びｘ線露光方法
JPH06184738A (ja) * 1992-08-26 1994-07-05 Mitsubishi Electric Corp 炭素薄膜の形成方法とその改質方法およびその改質方法を用いた電子デバイスおよびｘ線多層膜ミラーとその製造方法
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EP1416329A1 (en) 2002-10-31 2004-05-06 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US20040130693A1 (en) 2002-10-31 2004-07-08 Asml Netherlands B.V. Lithographic apparatus, optical element and device manufacturing method
US7217940B2 (en) 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
JP2005156201A (ja) 2003-11-21 2005-06-16 Canon Inc Ｘ線全反射ミラーおよびｘ線露光装置
JP2006049761A (ja) 2004-08-09 2006-02-16 Nikon Corp 光学素子、光学素子の製造方法及び投影露光装置
JP2006069165A (ja) * 2004-09-06 2006-03-16 Japan Science & Technology Agency カーボンナノチューブ複合シート、およびその製造方法
JP2006171577A (ja) 2004-12-17 2006-06-29 Nikon Corp 光学素子及びこれを用いた投影露光装置
US7250620B2 (en) * 2005-01-20 2007-07-31 Infineon Technologies Ag EUV lithography filter
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Also Published As

Publication number Publication date
US20110249243A1 (en) 2011-10-13
WO2010015508A3 (en) 2010-04-01
US9897930B2 (en) 2018-02-20
EP2321703B1 (en) 2013-01-16
JP5511818B2 (ja) 2014-06-04
EP2321703A2 (en) 2011-05-18
WO2010015508A2 (en) 2010-02-11
CN102089713B (zh) 2013-06-12
KR20160093111A (ko) 2016-08-05
KR20110055601A (ko) 2011-05-25
CN102089713A (zh) 2011-06-08
TW201007385A (en) 2010-02-16
JP2011530184A (ja) 2011-12-15
TWI400580B (zh) 2013-07-01
KR101753212B1 (ko) 2017-07-04

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Effective date: 20100708