MX9204410A - Mezcla sensible a la radiacion de funcionamiento negativo y un material de registro sensible a la radiacion producido con la misma. - Google Patents

Mezcla sensible a la radiacion de funcionamiento negativo y un material de registro sensible a la radiacion producido con la misma.

Info

Publication number: MX9204410A
Authority: MX; Mexico
Prior art keywords: radiation sensitive; recording material; material produced; mixture negative; sensitive recording
Prior art date: 1991-07-29

Application number

MX9204410A

Other languages

English (en)

Inventor

Georg Pawlowski

Ralph Dammel

Horst Roeschert

Winfried Meier

Walter Spiess

Klaus-Juergen Przybilla

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-07-29

Filing date

1992-07-28

Publication date

1993-05-01

1992-07-28 Application filed by Hoechst Ag filed Critical Hoechst Ag

1993-05-01 Publication of MX9204410A publication Critical patent/MX9204410A/es

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
- C04B41/5035—Silica
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing

Landscapes

Chemical & Material Sciences (AREA)
Physics & Mathematics (AREA)
Inorganic Chemistry (AREA)
Engineering & Computer Science (AREA)
Ceramic Engineering (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Materials Engineering (AREA)
Structural Engineering (AREA)
Organic Chemistry (AREA)
Materials For Photolithography (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

MX9204410A 1991-07-29 1992-07-28 Mezcla sensible a la radiacion de funcionamiento negativo y un material de registro sensible a la radiacion producido con la misma. MX9204410A (es)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE4125042A DE4125042A1 (de)	1991-07-29	1991-07-29	Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial

Publications (1)

Publication Number	Publication Date
MX9204410A true MX9204410A (es)	1993-05-01

Family

ID=6437213

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
MX9204410A MX9204410A (es)	1991-07-29	1992-07-28	Mezcla sensible a la radiacion de funcionamiento negativo y un material de registro sensible a la radiacion producido con la misma.

Country Status (7)

Country	Link
US (1)	US5401608A (es)
EP (1)	EP0525625A1 (es)
JP (1)	JPH0627669A (es)
KR (1)	KR930002881A (es)
CA (1)	CA2074791A1 (es)
DE (1)	DE4125042A1 (es)
MX (1)	MX9204410A (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH08152716A (ja) *	1994-11-28	1996-06-11	Mitsubishi Electric Corp	ネガ型レジスト及びレジストパターンの形成方法
JPH08334899A (ja) *	1995-06-06	1996-12-17	Oki Electric Ind Co Ltd	放射線感応性樹脂組成物
JP3507219B2 (ja) *	1995-09-21	2004-03-15	東洋合成工業株式会社	ネガ型レジスト組成物及びパターン形成方法
US5814431A (en) *	1996-01-10	1998-09-29	Mitsubishi Chemical Corporation	Photosensitive composition and lithographic printing plate
US6110641A (en) *	1997-12-04	2000-08-29	Shipley Company, L.L.C.	Radiation sensitive composition containing novel dye
JP2004020735A (ja) *	2002-06-13	2004-01-22	Fuji Photo Film Co Ltd	ネガ型レジスト組成物
US7144676B2 (en) *	2004-02-06	2006-12-05	Rohm And Haas Electronic Materials Llc	Imaging compositions and methods
US20050175941A1 (en) *	2004-02-06	2005-08-11	Rohm And Hass Electronic Materials, L.L.C.	Imaging composition and method
KR101125678B1 (ko) *	2004-02-06	2012-03-28	롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨.	개선된 이미지화 조성물 및 방법
US7977026B2 (en) *	2004-02-06	2011-07-12	Rohm And Haas Electronic Materials Llc	Imaging methods
US20070117042A1 (en) *	2005-11-23	2007-05-24	Rohm And Haas Electronic Materials Llc	Imaging methods
ATE555903T1 (de) *	2008-10-23	2012-05-15	Agfa Graphics Nv	Lithographiedruckplatte
US10780682B2 (en) *	2018-12-20	2020-09-22	Canon Kabushiki Kaisha	Liquid adhesion composition, multi-layer structure and method of making said structure

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3692560A (en) *	1969-09-18	1972-09-19	Bayer Ag	Acid hardening resins which can be activated by ultraviolet light
ATE68272T1 (de) *	1984-06-01	1991-10-15	Rohm & Haas	Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern.
CA1307695C (en) *	1986-01-13	1992-09-22	Wayne Edmund Feely	Photosensitive compounds and thermally stable and aqueous developablenegative images
DE3621376A1 (de) *	1986-06-26	1988-01-07	Hoechst Ag	Strahlungsempfindliches aufzeichnungsmaterial
JPH02275956A (ja) *	1988-12-23	1990-11-09	Oki Electric Ind Co Ltd	フォトレジスト組成物
DE69130003T2 (de) *	1990-05-25	1999-02-11	Mitsubishi Chemical Corp., Tokio/Tokyo	Negative lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Photolackmusters
JP3278664B2 (ja) *	1993-03-02	2002-04-30	株式会社サンツール	カーテンファイバー状スプレー塗布装置における塗布ノズル装置
JP2005193229A (ja) *	2003-12-09	2005-07-21	Konica Minolta Photo Imaging Inc	塗布装置及び塗布方法
US7798434B2 (en) *	2006-12-13	2010-09-21	Nordson Corporation	Multi-plate nozzle and method for dispensing random pattern of adhesive filaments
JP5296831B2 (ja) *	2011-05-09	2013-09-25	茂金原	接着剤塗布ヘッド

1991
- 1991-07-29 DE DE4125042A patent/DE4125042A1/de not_active Withdrawn
1992
- 1992-07-22 EP EP92112559A patent/EP0525625A1/de not_active Withdrawn
- 1992-07-23 US US07/917,364 patent/US5401608A/en not_active Expired - Fee Related
- 1992-07-28 KR KR1019920013477A patent/KR930002881A/ko not_active Application Discontinuation
- 1992-07-28 JP JP4201318A patent/JPH0627669A/ja active Pending
- 1992-07-28 MX MX9204410A patent/MX9204410A/es unknown
- 1992-07-28 CA CA002074791A patent/CA2074791A1/en not_active Abandoned

Also Published As

Publication number	Publication date
DE4125042A1 (de)	1993-02-04
US5401608A (en)	1995-03-28
JPH0627669A (ja)	1994-02-04
KR930002881A (ko)	1993-02-23
EP0525625A1 (de)	1993-02-03
CA2074791A1 (en)	1993-01-30

Publication	Publication Date	Title
DE68906923D1 (de)	1993-07-15	Amorpher oxid-film und gegenstand mit einem solchen film.
DE69215315D1 (de)	1997-01-02	Elektrophotographisches Aufzeichnungsmaterial
DE68916686D1 (de)	1994-08-18	Aufzeichnungsmaterial.
DE68925925D1 (de)	1996-04-18	Photographisches Aufzeichnungsmaterial mit verbesserten Körnigkeitseigenschaften
DE58902095D1 (de)	1992-10-01	Flaechenfoermiges lichtempfindliches aufzeichnungsmaterial.
DE69204777D1 (de)	1995-10-19	Wärmeempfindliches Aufzeichnungsmaterial.
MX9204410A (es)	1993-05-01	Mezcla sensible a la radiacion de funcionamiento negativo y un material de registro sensible a la radiacion producido con la misma.
DE68904211D1 (de)	1993-02-18	Waermeempfindliches aufzeichnungsmaterial.
DE68920205D1 (de)	1995-02-09	Wärmeempfindliches Aufzeichnungsmaterial.
DE69018020D1 (de)	1995-04-27	Mit besonderer Aussenschicht versehenes photoleitendes Aufzeichnungsmaterial.
DE3852338D1 (de)	1995-01-19	Strahlungsempfindliches Aufzeichnungsmaterial.
DE59106562D1 (de)	1995-11-02	Strahlungsempfindliches Gemisch und hieraus hergestelltes strahlungsempfindliches Aufzeichnungsmaterial.
DE58909124D1 (de)	1995-04-27	Strahlungsempfindliches Gemisch und hieraus hergestelltes strahlungsempfindliches Aufzeichnungsmaterial.
DE58907755D1 (de)	1994-07-07	Fotografisches Aufzeichnungsmaterial.
DE69215057D1 (de)	1996-12-12	Lichtempfindliches Aufzeichnungsmaterial
DE68918925D1 (de)	1994-11-24	Wärmeempfindliches Aufzeichnungsmaterial.
DE59301159D1 (de)	1996-01-25	Fotografisches Aufzeichnungsmaterial
DE58907331D1 (de)	1994-05-05	Farbfotografisches Aufzeichnungsmaterial.
DE68913623D1 (de)	1994-04-14	Wärmeempfindliches Aufzeichnungsmaterial.
DE68903842D1 (de)	1993-01-28	Waermeempfindliches aufzeichnungsmaterial.
BR9200680A (pt)	1992-11-10	Polimero sensivel a radiacao,mistura sensivel a radiacao e material de desenho sensivel a radiacao
ES2014420B3 (es)	1990-07-16	Material sensible a la radiacion.
DE58907260D1 (de)	1994-04-28	Farbfotografisches Aufzeichnungsmaterial.
DE59408567D1 (de)	1999-09-09	Fotografisches Aufzeichnungsmaterial
DE68923411D1 (de)	1995-08-17	Wärmeempfindliches Aufzeichnungsmaterial.