Saito et al., 2011 - Google Patents
Electrical creation of spin accumulation in p-type germaniumSaito et al., 2011
- Document ID
- 298282981398801580
- Author
- Saito H
- Watanabe S
- Mineno Y
- Sharma S
- Jansen R
- Yuasa S
- Ando K
- Publication year
- Publication venue
- Solid State Communications
External Links
Snippet
We report the electrical creation of a spin accumulation in p-type Ge using an epitaxial Fe/MgO contact. The induced spin polarization was successfully detected by the Hanle effect up to 100 K, and the absence of a Schottky barrier was confirmed by measuring current …
- 238000009825 accumulation 0 title abstract description 33
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices, e.g. Hall effect devices; using magneto-resistive devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices, e.g. Hall effect devices; using magneto-resistive devices
- G01R33/09—Magnetoresistive devices
- G01R33/095—Magnetoresistive devices extraordinary magnetoresistance sensors
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies; Multistep manufacturing processes therefor characterised by the materials of which they are formed
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L43/00—Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
- H01L43/02—Details
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L43/00—Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
- H01L43/06—Hall-effect devices
- H01L43/065—Semiconductor Hall-effect devices
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L43/00—Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
- H01L43/08—Magnetic-field-controlled resistors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/12—Measuring magnetic properties of articles or specimens of solids or fluids
- G01R33/1284—Spin resolved measurements; Influencing spins during measurements, e.g. in spintronics devices
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Saito et al. | Electrical creation of spin accumulation in p-type germanium | |
Dash et al. | Spin precession and inverted Hanle effect in a semiconductor near a finite-roughness ferromagnetic interface | |
Chiba et al. | Tunneling magnetoresistance in (Ga, Mn) As-based heterostructures with a GaAs barrier | |
Uemura et al. | Non-local detection of spin-polarized electrons at room temperature in Co50Fe50/GaAs Schottky tunnel junctions | |
Saito et al. | Spin injection, transport, and detection at room temperature in a lateral spin transport device with Co2FeAl0. 5Si0. 5/n-GaAs schottky tunnel junctions | |
Han et al. | Spin transport and relaxation in graphene | |
Fujita et al. | Spin transport and relaxation up to 250 k in heavily doped n-type Ge detected using Co 2 FeAl 0.5 Si 0.5 electrodes | |
Park et al. | Tunneling anisotropic magnetoresistance in multilayer-(Co/Pt)/AlO x/Pt structures | |
Txoperena et al. | How reliable are Hanle measurements in metals in a three-terminal geometry? | |
Hanbicki et al. | Electrical injection and detection of spin accumulation in Ge at room temperature | |
CN101026188B (en) | Single-charge tunnelling device | |
Monzon et al. | Spin injection and the local Hall effect in InAs quantum wells | |
US20130200446A1 (en) | Spin-based device | |
Sato et al. | Origin of the broad three-terminal Hanle signals in Fe/SiO2/Si tunnel junctions | |
Jeon et al. | Effect of spin relaxation rate on the interfacial spin depolarization in ferromagnet/oxide/semiconductor contacts | |
Nakane et al. | Magnetoresistance of a Spin Metal–Oxide–Semiconductor Field-Effect Transistor with Ferromagnetic MnAs Source and Drain Contacts | |
Sato et al. | Study for realization of spin-polarized field effect transistor in In0. 75Ga0. 25As/In0. 75Al0. 25As heterostructure | |
Maji et al. | Demonstration of efficient spin injection and detection into p-Si using NiFe2O4 based spin injector in NiFe2O4/MgO/p-Si device | |
Panda et al. | Temperature dependent spin injection properties of the Ni nanodots embedded metallic TiN matrix and p-Si heterojunction | |
Mosca et al. | Magnetoresistance in Fe/ZnSe/Fe planar junctions | |
Johnson | Spin injection and detection in a ferromagnetic metal/2DEG structure | |
Shim et al. | Electrical spin injection in modulation-doped GaAs from an in situ grown Fe/MgO layer | |
Wang et al. | Room-temperature spin transport in InAs nanowire lateral spin valve | |
AlQahtani et al. | Planar organic spin valves using nanostructured Ni80Fe20 magnetic contacts | |
Hwang et al. | Spin transport in a lateral spin-injection device with an FM/Si/FM junction |