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Park et al., 2012 - Google Patents

Front-side metal electrode optimization using fine line double screen printing and nickel plating for large area crystalline silicon solar cells

Park et al., 2012

Document ID
2359944006099895968
Author
Park C
Kwon T
Kim B
Lee J
Ahn S
Ju M
Balaji N
Lee H
Yi J
Publication year
Publication venue
Materials Research Bulletin

External Links

Snippet

Industrial applicable fine-line double printing and nickel plating method was applied to single crystalline silicon (c-Si) solar cells. As the finger widths decreased, the efficiency and short circuit current density (JSC) linearly increased. Although the increase of the JSC was …
Continue reading at www.sciencedirect.com (other versions)

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    • H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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