Fu et al., 2007 - Google Patents
Study on the microstructure of polycrystalline silicon films treated with line shaped electron beamFu et al., 2007
- Document ID
- 14304089242467644265
- Author
- Fu L
- Gromball F
- Müller J
- Publication year
- Publication venue
- Materials science forum
External Links
Snippet
Line shaped electron beam was used for the recrystallization of nanocrystalline silicon layer that had been deposited on the low cost borosilicate glass-substrate in this paper. Polycrystalline silicon films of a 20μm thickness, which are the base for a solar cell absorber …
- 238000010894 electron beam technology 0 title abstract description 25
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GASES [GHG] EMISSION, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/54—Material technologies
- Y02E10/547—Monocrystalline silicon PV cells
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GASES [GHG] EMISSION, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies or technologies with a potential or indirect contribution to GHG emissions mitigation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/002—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising material or reactants forming it in situ to the melt
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU739048B2 (en) | Columnar-grained polycrystalline solar cell substrate and improved method of manufacture | |
AU667130B2 (en) | Improved columnar-grained polycrystalline solar cell and process of manufacture | |
KR20090024802A (en) | Device and method for production of semiconductor grade silicon | |
Gao et al. | Thickness tunable SnS nanosheets for photoelectrochemical water splitting | |
Nakajima et al. | Crystal growth of Si for solar cells | |
Pihan et al. | Polycrystalline silicon films by aluminium-induced crystallisation: growth process vs. silicon deposition method | |
Hässler et al. | Formation and annihilation of oxygen donors in multicrystalline silicon for solar cells | |
Itoh et al. | Growth of spherical Si crystals on porous Si3N4 substrate that repels Si melt | |
Albin et al. | Colossal grain growth in Cd (Se, Te) thin films and their subsequent use in CdTe epitaxy by close-spaced sublimation | |
Hainey et al. | Aluminum-catalyzed silicon nanowires: Growth methods, properties, and applications | |
Fang et al. | Polycrystalline silicon films on aluminum sheets for solar cell application | |
Grynko et al. | Growth of CdS nanowire crystals: Vapor–liquid–solid versus vapor–solid mechanisms | |
Nose et al. | Floating cast method to realize high-quality Si bulk multicrystals for solar cells | |
Nakatsuka et al. | Fabrication of ZnSnP2 thin films by phosphidation | |
Fu et al. | Study on the microstructure of polycrystalline silicon films treated with line shaped electron beam | |
Miyamura et al. | Advantage in solar cell efficiency of high-quality seed cast mono Si ingot | |
Joonwichien et al. | Towards implementation of floating cast method for growing large‐scale high‐quality multicrystalline silicon ingot using designed double crucibles | |
Fu et al. | Influence of the energy density on the structure and morphology of polycrystalline silicon films treated with electron beam | |
Fu | Application of Electron Beam Treatment in Polycrystalline Silicon Films Manufacture for Solar Cell | |
Li et al. | Surface morphology and impurity distribution of electron beam recrystallized silicon films on low cost substrates for solar cell absorber | |
CN104412361B (en) | Method for producing semiconductor thin films on foreign substrates | |
Panknin et al. | The beneficial role of flash lamp annealing on the epitaxial growth of the 3C–SiC on Si | |
Fave | Liquid phase epitaxy | |
Kadirov et al. | Technology of Secondary Cast Polycrystalline Silicon and Its Application in the Production of Solar Cells | |
Ayachi et al. | The effect of sintering temperature of Si 3 N 4 photovoltaic solar crucible coating on the adhesion strength |