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Baldauf et al., 2011 - Google Patents

Simulation and optimization of tri-gates in a 22 nm hybrid tri-gate/planar process

Baldauf et al., 2011

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Document ID
12670790964926572777
Author
Baldauf T
Wei A
Illgen R
Flachowsky S
Herrmann T
Feudel T
Höntschel J
Horstmann M
Klix W
Stenzel R
Publication year
Publication venue
Ulis 2011 Ultimate Integration on Silicon

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Snippet

A Tri-Gate structure built into a planar 22 nm bulk process was investigated by 3-D device simulations (Sentaurus D-2010). The planar process flow sequence was extended with extra Tri-Gate patterning, but otherwise all implants were shared, as could be done in …
Continue reading at www.htw-dresden.de (PDF) (other versions)

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