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Ling et al., 2010 - Google Patents

Crystal quality improvement of a-plane GaN using epitaxial lateral overgrowth on nanorods

Ling et al., 2010

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Document ID
12112087978122101021
Author
Ling S
Chao C
Chen J
Liu P
Ko T
Lu T
Kuo H
Wang S
Cheng S
Tsay J
Publication year
Publication venue
Journal of crystal growth

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Snippet

The crystal quality of a-plane GaN films was improved by using epitaxial lateral overgrowth on nano-rod GaN template. The scanning electron microscope images showed the fully coalesced regrowth process completed within only 2μm thickness. The a-plane GaN films …
Continue reading at ir.lib.nycu.edu.tw (PDF) (other versions)

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    • HELECTRICITY
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    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
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    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
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    • H01L21/02367Substrates
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    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
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    • H01L21/02365Forming inorganic semiconducting materials on a substrate
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
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