Chang et al., 2007 - Google Patents
Strong luminescence from strain relaxed InGaN/GaN nanotips for highly efficient light emittersChang et al., 2007
View HTML- Document ID
- 8114595540764508158
- Author
- Chang H
- Hsieh Y
- Chen T
- Chen Y
- Liang C
- Lin T
- Tseng S
- Chen L
- Publication year
- Publication venue
- Optics Express
External Links
Snippet
Semiconductor heterostructures represent the most important building block for current optoelectronic devices. One of the common features of semiconductor heterostructures is the existence of internal strain due to lattice mismatch. The internal strain can tilt the band …
- 229910002601 GaN 0 title abstract description 78
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of group III and group V of the periodic system
- H01L33/32—Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well, or supperlattice structures, e.g. single quantum well lasers (SQW lasers), multiple quantum well lasers (MQW lasers), graded index separate confinement hetrostructure lasers (GRINSCH lasers)
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L51/00—Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
- H01L51/50—Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes [OLED] or polymer light emitting devices [PLED];
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Susilo et al. | Improved performance of UVC-LEDs by combination of high-temperature annealing and epitaxially laterally overgrown AlN/sapphire | |
Zhong et al. | Integrated ZnO nanotips on GaN light emitting diodes for enhanced emission efficiency | |
Wang et al. | GaN nanorod light emitting diode arrays with a nearly constant electroluminescent peak wavelength | |
Chang et al. | Strong luminescence from strain relaxed InGaN/GaN nanotips for highly efficient light emitters | |
Su et al. | Suppressed quantum-confined Stark effect in InGaN-based LEDs with nano-sized patterned sapphire substrates | |
Zhang et al. | Deep ultraviolet light-emitting diodes based on a well-ordered AlGaN nanorod array | |
Wei et al. | Improving light extraction of InGaN-based light emitting diodes with a roughened p-GaN surface using CsCl nano-islands | |
Dong et al. | Optical properties of nanopillar AlGaN/GaN MQWs for ultraviolet light-emitting diodes | |
Lee et al. | Increase in the efficiency of III-nitride micro LEDs by atomic layer deposition | |
Lin et al. | Efficiency improvement of a vertical light-emitting diode through surface plasmon coupling and grating scattering | |
Cho et al. | Enhanced optical output and reduction of the quantum-confined Stark effect in surface plasmon-enhanced green light-emitting diodes with gold nanoparticles | |
Tu et al. | Regularly patterned non-polar InGaN/GaN quantum-well nanorod light-emitting diode array | |
Oh et al. | High efficiency ultraviolet GaN-based vertical light emitting diodes on 6-inch sapphire substrate using ex-situ sputtered AlN nucleation layer | |
Ley et al. | Strain relaxation of InGaN/GaN multi-quantum well light emitters via nanopatterning | |
Horng et al. | Performance of GaN-based light-emitting diodes fabricated using GaN epilayers grown on silicon substrates | |
Khoury et al. | 560 nm InGaN micro-LEDs on low-defect-density and scalable (20-21) semipolar GaN on patterned sapphire substrates | |
Seo et al. | Orange a-plane InGaN/GaN light-emitting diodes grown on r-plane sapphire substrates | |
Shen et al. | Enabling area-selective potential-energy engineering in InGaN/GaN quantum wells by post-growth intermixing | |
Zhang et al. | Deep ultraviolet light-emitting diodes with improved performance via nanoporous AlGaN template | |
Yu et al. | Surface plasmon-enhanced nanoporous GaN-based green light-emitting diodes with Al 2 O 3 passivation layer | |
Xing et al. | Demonstration of 651 nm InGaN-based red light-emitting diode with an external quantum efficiency over 6% by InGaN/AlN strain release interlayer | |
Ogawa et al. | Fabrication of InGaN/GaN MQW nano‐LEDs by hydrogen‐environment anisotropic thermal etching | |
Dai et al. | Effects of indium surfactant on growth and characteristics of (11 2¯ 2) plane AlGaN-based multiple quantum wells | |
Peng et al. | Anomalous electroluminescent blue-shift behavior induced by well widths variance and localization effect in InGaN/GaN multi-quantum wells | |
Wang et al. | Enhanced coupling efficiency and electrical property in surface plasmon-enhanced light-emitting diodes with the tapered Ag structure |