[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Tracy et al., 2013 - Google Patents

Electron spin lifetime of a single antimony donor in silicon

Tracy et al., 2013

Document ID
4779528769455887674
Author
Tracy L
Lu T
Bishop N
Ten Eyck G
Pluym T
Wendt J
Lilly M
Carroll M
Publication year
Publication venue
Applied Physics Letters

External Links

Snippet

We present measurements of the electron spin lifetime (T 1) of a single Sb donor in Si. For a magnetic field (B) oriented along the [100] Si crystal direction and low temperature (T) such that k T≪ g μ B⁠, we find T 1− 1= KB 5⁠, where K= 1.7× 10− 3 Hz T− 5⁠. The T 1− 1∝ B 5 …
Continue reading at pubs.aip.org (other versions)

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/778Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/122Single quantum well structures
    • H01L29/127Quantum box structures
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
    • H01L21/0405Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising semiconducting carbon, e.g. diamond, diamond-like carbon
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/40Electrodes; Multistep manufacturing processes therefor
    • H01L29/43Electrodes; Multistep manufacturing processes therefor characterised by the materials of which they are formed

Similar Documents

Publication Publication Date Title
Tracy et al. Electron spin lifetime of a single antimony donor in silicon
Borselli et al. Pauli spin blockade in undoped Si/SiGe two-electron double quantum dots
Cho et al. Evidence of double layer quantum dot formation in a silicon-on-insulator nanowire transistor
Hao et al. Electron spin resonance and spin–valley physics in a silicon double quantum dot
Jain et al. Electrical spin injection and detection at Al2O3/n-type germanium interface using three terminal geometry
Ando et al. Electric-field control of spin accumulation signals in silicon at room temperature
Gutsch et al. Electronic properties of phosphorus doped silicon nanocrystals embedded in SiO2
Sakr et al. Fabrication and characterization of electrostatic Si∕ SiGe quantum dots with an integrated read-out channel
Laroche et al. Scattering mechanisms in shallow undoped Si/SiGe quantum wells
Bhattacharya et al. Electrical spin injection and detection of spin precession in room temperature bulk GaN lateral spin valves
Łusakowski et al. Ballistic and pocket limitations of mobility in nanometer Si metal-oxide semiconductor field-effect transistors
Engström et al. Electron capture cross sections of InAs∕ GaAs quantum dots
Singh et al. Electrostatically defined silicon quantum dots with counted antimony donor implants
Anugrah et al. Determination of the Schottky barrier height of ferromagnetic contacts to few-layer phosphorene
Wu et al. Room-temperature nonsaturating magnetoresistance of intrinsic bulk silicon in high pulsed magnetic fields
Donetti et al. Hole effective mass in silicon inversion layers with different substrate orientations and channel directions
Horibe et al. Back-action-induced excitation of electrons in a silicon quantum dot with a single-electron transistor charge sensor
Bykov et al. Zener tunneling between Landau orbits in two-dimensional electron Corbino rings
Prager et al. Experimental demonstration of hybrid CMOS-single electron transistor circuits
Rortais et al. Spin-orbit coupling induced by bismuth doping in silicon thin films
Jun et al. Characterization of multiple Si∕ SiO2 interfaces in silicon-on-insulator materials via second-harmonic generation
Witt et al. Spin-relaxation mechanisms in InAs quantum well heterostructures
Lee et al. Investigation of spin scattering mechanism in silicon channels of Fe/MgO/Si lateral spin valves
Buchholz et al. Nonlocal Aharonov–Bohm conductance oscillations in an asymmetric quantum ring
Holmes et al. Spin-splitting in p-type Ge devices