[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Zhao et al., 2020 - Google Patents

High-precision compliant mechanism for lens XY micro-adjustment

Zhao et al., 2020

View PDF
Document ID
4576432294400429694
Author
Zhao L
Yu X
Li P
Qiao Y
Publication year
Publication venue
Review of Scientific Instruments

External Links

Snippet

The high resolution of lithography lenses has led to a requirement for high-precision lens- adjusting compensators. This paper presents the design, analysis, and testing of a high- precision two-degrees-of-freedom compliant mechanism to be used for lens XY micro …
Continue reading at ir.ciomp.ac.cn (PDF) (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70216—Systems for imaging mask onto workpiece
    • G03F7/70258—Projection system adjustment, alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70691—Handling of masks or wafers
    • G03F7/70716—Stages

Similar Documents

Publication Publication Date Title
Awtar et al. Design of a large range XY nanopositioning system
Zhao et al. High-precision compliant mechanism for lens XY micro-adjustment
Hao et al. A novel large-range XY compliant parallel manipulator with enhanced out-of-plane stiffness
Wang et al. A planar 3-DOF nanopositioning platform with large magnification
Kim et al. Development of a novel 3-degrees of freedom flexure based positioning system
Choi et al. Monolithic parallel linear compliant mechanism for two axes ultraprecision linear motion
Chen et al. A PZT actuated 6-DOF positioning system for space optics alignment
Tang et al. Design and nonlinear modeling of a large-displacement XYZ flexure parallel mechanism with decoupled kinematic structure
Al-Jodah et al. Design, modeling, and control of a large range 3-DOF micropositioning stage
Kang et al. Development of flexure based 6-degrees of freedom parallel nano-positioning system with large displacement
Liu et al. A 3-axis precision positioning device using PZT actuators with low interference motions
Liu et al. A large range compliant nano-manipulator supporting electron beam lithography
Zhu et al. A novel piezoelectrically actuated 2-DoF compliant micro/nano-positioning stage with multi-level amplification
Dong et al. Robust control of a parallel-kinematic nanopositioner
Guo et al. A monolithic adjusting mechanism for optical element based on modified 6-PSS parallel mechanism
Matsukuma et al. Closed-loop control of an XYZ micro-stage and designing of mechanical structure for reduction in motion errors
Zhao et al. Design and analysis of a bi-axial centralized butterfly flexure hinge for fast steering mirrors
Yagüe-Fabra et al. Scalability of precision design principles for machines and instruments
Wei et al. Development of a three-degree-of-freedom piezoelectric actuator
Villar et al. 75 mm stroke flexure stage for the LNE watt balance experiment
Wan et al. Design of a fast steering mirror driven by piezoelectric ceramics
Qi et al. A novel 2-DOF compound compliant parallel guiding mechanism
Lin et al. Decoupling and control of micromotion stage based on hysteresis of piezoelectric actuation
Sun et al. A force-decoupled compound parallel alignment stage for nanoimprint lithography
Lu et al. A novel parallel precision stage with large working range based on structural parameters of flexible hinges