ZA746683B - Photoresist film - Google Patents

Photoresist film

Info

Publication number: ZA746683B
Authority: ZA; South Africa
Prior art keywords: photoresist film; photoresist; film
Prior art date: 1973-10-25

Application number

ZA00746683A

Inventor

M Gulla

C Christensen

M Oddi

Original Assignee

Shipley Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1973-10-25

Filing date

1974-10-22

Publication date

1975-11-26

1974-10-22 Application filed by Shipley Co filed Critical Shipley Co

1975-11-26 Publication of ZA746683B publication Critical patent/ZA746683B/en

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0577—Double layer of resist having the same pattern
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0585—Second resist used as mask for selective stripping of first resist

Landscapes

Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Microelectronics & Electronic Packaging (AREA)
Structural Engineering (AREA)
Manufacturing & Machinery (AREA)
Architecture (AREA)
Manufacturing Of Printed Circuit Boards (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
ing And Chemical Polishing (AREA)
Application Of Or Painting With Fluid Materials (AREA)
Materials For Photolithography (AREA)
Non-Metallic Protective Coatings For Printed Circuits (AREA)

ZA00746683A 1973-10-25 1974-10-22 Photoresist film ZA746683B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US40964673A	1973-10-25	1973-10-25

Publications (1)

Publication Number	Publication Date
ZA746683B true ZA746683B (en)	1975-11-26

Family

ID=23621393

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ZA00746683A ZA746683B (en)	1973-10-25	1974-10-22	Photoresist film

Country Status (13)

Country	Link
JP (1)	JPS5529426B2 (en)
AU (1)	AU466665B2 (en)
BE (1)	BE821421A (en)
BR (1)	BR7408768D0 (en)
CA (1)	CA1051707A (en)
DE (1)	DE2450380C2 (en)
ES (2)	ES431310A1 (en)
FR (1)	FR2249364B1 (en)
GB (2)	GB1493834A (en)
IT (1)	IT1025144B (en)
NL (1)	NL7413916A (en)
SE (1)	SE422631B (en)
ZA (1)	ZA746683B (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4191572A (en)	1975-06-03	1980-03-04	E. I. Du Pont De Nemours And Company	Process for image reproduction using multilayer photosensitive element with solvent-soluble layer
US4316951A (en)	1975-06-03	1982-02-23	E. I. Du Pont De Nemours And Company	Multilayer photosensitive element with solvent-soluble layer
DE2660951C2 (en) *	1975-06-03	1986-08-07	E.I. Du Pont De Nemours And Co., Wilmington, Del.	Multi-layer photosensitive material
US4311784A (en)	1978-05-09	1982-01-19	E. I. Du Pont De Nemours And Company	Multilayer photosensitive solvent-processable litho element
WO1980001321A1 (en) *	1978-12-25	1980-06-26	N Smirnova	Dry film photoresist
US4357416A (en)	1980-04-21	1982-11-02	E. I. Du Pont De Nemours And Company	Process for preparation of multilayer photosensitive solvent-processable litho element
DE3036710A1 (en) *	1980-09-29	1982-05-13	Siemens AG, 1000 Berlin und 8000 München	Photolacquer structure with photoresist layer - is on deep UV or electron positive resist
DE3377597D1 (en) *	1982-04-12	1988-09-08	Nippon Telegraph & Telephone	Method for forming micropattern
US4756988A (en) *	1982-09-29	1988-07-12	Minnesota Mining And Manufacturing Company	Multilayer dry-film negative-acting photoresist
US4672020A (en) *	1982-09-29	1987-06-09	Minnesota Mining And Manufacturing Company	Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
JPH0612452B2 (en) *	1982-09-30	1994-02-16	ブリュ−ワ−・サイエンス・インコ−ポレイテッド	Method of manufacturing integrated circuit device
JPS5997137A (en) *	1982-11-01	1984-06-04	イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ−	Multilayer light-soluble lithographic element
US4504566A (en) *	1982-11-01	1985-03-12	E. I. Du Pont De Nemours And Company	Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
GB8418938D0 (en) *	1984-07-25	1984-08-30	Davies Bros Ltd	Image on substrate
US4815800A (en) *	1984-12-21	1989-03-28	Hughes Aircraft Company	Flare reduction in holograms
US4687720A (en) *	1984-12-21	1987-08-18	Hughes Aircraft Company	Side lobe suppression in holograms using pre-exposure
US4571374A (en) *	1984-12-27	1986-02-18	Minnesota Mining And Manufacturing Company	Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4854674A (en) *	1985-02-27	1989-08-08	Hughes Aircraft Company	Process for improving holographic efficiency
US4799746A (en) *	1985-02-27	1989-01-24	Hughes Aircraft Company	Efficient holograms and method for making same
JPH07113773B2 (en) *	1986-07-04	1995-12-06	株式会社日立製作所	Pattern formation method
JP2602511B2 (en) *	1987-10-30	1997-04-23	株式会社日立製作所	Pattern formation method
KR940008381B1 (en) *	1988-03-28	1994-09-12	간사이뻬인또 가부시끼가이샤	Electrodeposition coating process of photoresist for printed circuit board
EP0433720A3 (en) *	1989-12-22	1992-08-26	Siemens Aktiengesellschaft	Method of applying a solder stop coating on printed circuit boards
JP2004140313A (en) *	2002-08-22	2004-05-13	Jsr Corp	Method for forming bump on electrode pad using bilayer multilayer film
CN112980410B (en) *	2021-02-25	2022-09-13	山东滨州昱诚化工科技有限公司	Temporary plugging agent for oil field and preparation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE711043C (en) *	1935-08-09	1941-09-25	Bekk & Kaulen Chem Fab G M B H	Process for producing planographic printing forms by projecting screened images
GB907718A (en) *	1957-11-01	1962-10-10	Lithoplate Inc	Hydrophilic base plates for diazo presensitized lithographic printing plates
US3549373A (en) *	1966-03-19	1970-12-22	Ricoh Kk	Negative-to-positive reversible copy sheet
US3474719A (en) *	1966-04-15	1969-10-28	Gaf Corp	Offset printing plates
US3469982A (en) *	1968-09-11	1969-09-30	Jack Richard Celeste	Process for making photoresists

1974
- 1974-10-10 CA CA211,185A patent/CA1051707A/en not_active Expired
- 1974-10-11 SE SE7412818A patent/SE422631B/en unknown
- 1974-10-17 AU AU74460/74A patent/AU466665B2/en not_active Expired
- 1974-10-22 BR BR8768/74A patent/BR7408768D0/en unknown
- 1974-10-22 ZA ZA00746683A patent/ZA746683B/en unknown
- 1974-10-23 GB GB30114/77A patent/GB1493834A/en not_active Expired
- 1974-10-23 GB GB45826/74A patent/GB1493833A/en not_active Expired
- 1974-10-23 DE DE2450380A patent/DE2450380C2/en not_active Expired
- 1974-10-23 IT IT28721/74A patent/IT1025144B/en active
- 1974-10-24 FR FR7435708A patent/FR2249364B1/fr not_active Expired
- 1974-10-24 BE BE149831A patent/BE821421A/en unknown
- 1974-10-24 NL NL7413916A patent/NL7413916A/en not_active Application Discontinuation
- 1974-10-24 ES ES431310A patent/ES431310A1/en not_active Expired
- 1974-10-25 JP JP12328674A patent/JPS5529426B2/ja not_active Expired
1976
- 1976-05-25 ES ES448212A patent/ES448212A1/en not_active Expired

Also Published As

Publication number	Publication date
FR2249364B1 (en)	1982-04-23
NL7413916A (en)	1975-04-29
GB1493833A (en)	1977-11-30
SE422631B (en)	1982-03-15
BE821421A (en)	1975-04-24
ES448212A1 (en)	1977-12-01
DE2450380A1 (en)	1975-05-07
IT1025144B (en)	1978-08-10
AU466665B2 (en)	1975-11-06
GB1493834A (en)	1977-11-30
FR2249364A1 (en)	1975-05-23
CA1051707A (en)	1979-04-03
AU7446074A (en)	1975-11-06
JPS5072704A (en)	1975-06-16
DE2450380C2 (en)	1984-10-11
ES431310A1 (en)	1977-04-16
SE7412818L (en)	1975-04-28
BR7408768D0 (en)	1975-08-05
JPS5529426B2 (en)	1980-08-04

Publication	Publication Date	Title
ZA746683B (en)	1975-11-26	Photoresist film
AU7065274A (en)	1976-01-08	Photographic materials
CA1024802A (en)	1978-01-24	Direct-positive photographic material
ZA739180B (en)	1974-10-30	Film circuit assemblies
HK59577A (en)	1977-12-09	Photographic camera
CA1033257A (en)	1978-06-20	Detergent film
HK6678A (en)	1978-02-10	Photographic camera
AU7156374A (en)	1976-01-29	Films
CA1027795A (en)	1978-03-14	Light-sensitive photographic material
MY7800101A (en)	1978-12-31	Photographic camera
AU7233374A (en)	1976-02-19	Film assembly
AU6976674A (en)	1975-12-04	Film unit
ZA743924B (en)	1975-06-25	Developing device
CA1033228A (en)	1978-06-20	Developing device
AU7247174A (en)	1976-02-19	Photographic film unit
HK4580A (en)	1980-02-15	Photographic camera
HK59377A (en)	1977-12-09	Photographic camera
AU6737674A (en)	1975-10-02	Projectors
AU7548574A (en)	1976-05-20	Photocopying
ZA74117B (en)	1974-11-27	Coated film
MY7800170A (en)	1978-12-31	Photographic camera
HK44876A (en)	1976-07-23	Film projection cassette
GB1489079A (en)	1977-10-19	Photographic light-sensitive materials
CS189892B1 (en)	1979-05-31	Photographic apparatus
AU484899B2 (en)	1975-12-11	Developing device