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WO2024225161A1 - Film adhesive agent with dicing film, electronic component using same and manufacturing method therefor - Google Patents

Film adhesive agent with dicing film, electronic component using same and manufacturing method therefor Download PDF

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Publication number
WO2024225161A1
WO2024225161A1 PCT/JP2024/015428 JP2024015428W WO2024225161A1 WO 2024225161 A1 WO2024225161 A1 WO 2024225161A1 JP 2024015428 W JP2024015428 W JP 2024015428W WO 2024225161 A1 WO2024225161 A1 WO 2024225161A1
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Prior art keywords
film
adhesive
dicing
resin
adhesive layer
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PCT/JP2024/015428
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French (fr)
Japanese (ja)
Inventor
小雪 坂井
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古河電気工業株式会社
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Publication of WO2024225161A1 publication Critical patent/WO2024225161A1/en

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  • the present invention relates to a film-like adhesive with a dicing film, electronic components using the same, and a method for manufacturing the same.
  • Photographing devices such as digital still cameras and digital video cameras incorporate image sensors (imaging elements) such as CMOS (Complementary Metal Oxide Semiconductor) image sensors and CCD (Charge Coupled Device) image sensors.
  • image sensors imaging elements
  • incident light is photoelectrically converted by a photodiode to convert it into an electrical signal, and a digital image is formed through signal processing.
  • a color filter, a microlens, etc. are arranged on the surface of the photodiode as necessary, and a transparent protective film such as a glass plate is usually arranged on the surface.
  • a transparent protective film is fixed via a film-like adhesive or the like.
  • the adhesive used for bonding and fixing the transparent protective film of the image sensor is required to have transparency that allows sufficient light to pass through at least after a curing reaction.
  • Film-like adhesives themselves are known in various compositions and are widely used not only in image sensors but also in the manufacture of electronic devices and their components, etc. For example, in the manufacturing process of semiconductor chips, film-like adhesives are used as die attach films.
  • Patent Document 1 describes a method for manufacturing electronic components, which includes a first step of obtaining a laminate in which a transparent film-like member, a film-like adhesive that exhibits sufficiently high transparency after a curing reaction, and a dicing film are laminated in this order, a second step of obtaining a transparent film-like chip with an adhesive layer on the dicing film by dicing the transparent film-like member and the film-like adhesive together, a third step of removing the dicing film from the adhesive layer, and thermocompressing the transparent film-like chip with the adhesive layer and other members constituting the electronic component via the adhesive layer, and a fourth step of thermosetting the adhesive layer.
  • the transparent film-like member examples include a glass substrate and a transparent resin, and the transparent film-like chip with an adhesive layer obtained by dicing the transparent film-like member into a desired shape as described above can be incorporated into an electronic component via the cured product of the adhesive layer, for example, as a protective film for a photodiode.
  • the above-mentioned film-like adhesive with dicing film can also be used as a dicing die attach film in the semiconductor chip manufacturing process, for dicing a semiconductor wafer and applying adhesive to the semiconductor chips separated by dicing.
  • the present invention aims to provide a film-like adhesive with a dicing film, which exhibits sufficiently high transparency at least after a curing reaction and can effectively suppress chip flying during a dicing process. Another object of the present invention is to provide a method for manufacturing electronic components using this film-like adhesive with a dicing film.
  • a dicing film having a substrate and a pressure-sensitive adhesive layer, and a film-like adhesive disposed on the pressure-sensitive adhesive layer, the storage modulus E1 (MPa) of the film-like adhesive at 60° C. and the storage modulus E2 (MPa) of the dicing film at 60° C. satisfy E1 ⁇ E2 ⁇ 7.0, A film-like adhesive with a dicing film, wherein the light transmittance of the cured product of the film-like adhesive is 60% or more.
  • a method for manufacturing an electronic component comprising: A first step of obtaining a laminate in which a transparent film-like member and a film-like adhesive with a dicing film according to any one of items [1] to [6] are laminated in this order; a second step of dicing the transparent film-like member and the film-like adhesive together to obtain a transparent film-like chip with an adhesive layer on the dicing film; a third step of removing the dicing film from the adhesive layer and thermocompression bonding the transparent film-like chip with the adhesive layer and other members constituting an electronic component via the adhesive layer; a fourth step of thermally curing the adhesive layer; A method for manufacturing an electronic component comprising the steps of: [8] The method for manufacturing an electronic component according to claim 7, wherein the electronic component is an image sensor. [9] The
  • the numerical range expressed using “to” means a range including the numerical values before and after “to” as the lower and upper limits.
  • the term “compound having a skeleton” refers to a compound having a skeleton.
  • a “dicyandiamide compound” refers to not only dicyandiamide itself, but also a form in which at least a portion of the hydrogen atoms of dicyandiamide have been substituted.
  • the film-like adhesive with dicing film of the present invention exhibits sufficiently high transparency at least after the curing reaction, and can effectively suppress chip flying when applied to the dicing process. Furthermore, according to the manufacturing method of electronic components of the present invention, chip flying of the transparent film-like chip obtained in the dicing process can be effectively suppressed, and as a result, electronic components in which a transparent film-like chip is incorporated via a transparent cured product of the film-like adhesive can be obtained with high productivity.
  • FIG. 1 is a cross-sectional view showing a schematic structure of a film-like adhesive with a release film prepared in the Examples.
  • the film-like adhesive with dicing film of the present invention comprises a dicing film having a substrate and a pressure-sensitive adhesive layer, and a film-like adhesive disposed on the pressure-sensitive adhesive layer, wherein the storage modulus E1 (MPa) of the film-like adhesive at 60° C. and the storage modulus E2 (MPa) of the dicing film at 60° C. satisfy E1 ⁇ E2 ⁇ 7.0, and the light transmittance of the film-like adhesive after curing is 60% or more.
  • the rigidity of the entire film-like adhesive with the dicing film of the present invention is guaranteed even when the film-like adhesive with the dicing film of the present invention is locally heated by the frictional heat of the blade during dicing (it can be heated to about 60 ° C.), chip flying can be effectively suppressed, and since it shows high transparency after the curing reaction, it shows excellent optical properties as an adhesive when incorporating a transparent film-like member into an electronic component, etc.
  • the storage modulus E1 (MPa) of the film-like adhesive at 60°C and the storage modulus E2 (MPa) of the dicing film at 60°C are preferably E1 x E2 ⁇ 10.0, more preferably E1 x E2 ⁇ 11.0, even more preferably E1 x E2 ⁇ 12.0, and particularly preferably E1 x E2 ⁇ 15.0, from the viewpoint of suppressing chip flying.
  • the upper limit is not particularly limited, and is usually 50.0 ⁇ E1 x E2, with 40.0 ⁇ E1 x E2 being practical.
  • 50.0 ⁇ E1 x E2 ⁇ 7.0 is preferred, 50.0 ⁇ E1 x E2 ⁇ 10.0 is more preferred, 50.0 ⁇ E1 x E2 ⁇ 11.0 is even more preferred, 50.0 ⁇ E1 x E2 ⁇ 12.0 is even more preferred, and 40.0 ⁇ E1 x E2 ⁇ 15.0 is particularly preferred.
  • the storage modulus E1 of the film-like adhesive at 60° C. is not particularly limited as long as the relationship between E1 and E2 is satisfied.
  • E1 is preferably 0.1 to 1.5 MPa, more preferably 0.1 to 1.0 MPa, even more preferably 0.2 to 1.0 MPa, even more preferably 0.3 to 0.9 MPa, and even more preferably 0.3 to 0.8 MPa.
  • the storage modulus E2 of the dicing film at 60° C. is not particularly limited as long as it satisfies the relationship between E1 and E2.
  • E2 is preferably 10 to 80 MPa, more preferably 10 to 70 MPa, even more preferably 20 to 70 MPa, even more preferably 25 to 60 MPa, and even more preferably 30 to 50 MPa.
  • the storage modulus E1 of the above-mentioned film-like adhesive at 60° C. can be controlled by the types and contents of the components (resin, curing agent, filler, etc.) that make up the film-like adhesive.
  • the storage modulus E2 of the dicing film at 60°C can be controlled by the type and content of the components (resins constituting the adhesive layer and the substrate) constituting the dicing film, the thickness of the adhesive layer and the substrate, etc. Since the substrate usually has a greater thickness than the adhesive layer, E2 tends to be greatly affected by the characteristics of the substrate.
  • the storage modulus E3 of the substrate of the dicing film at 60°C is preferably 10 to 80 MPa, more preferably 10 to 70 MPa, even more preferably 20 to 70 MPa, even more preferably 30 to 60 MPa, and even more preferably 30 to 50 MPa.
  • the storage modulus E1 of the film-like adhesive at 60° C. and the storage modulus E2 of the dicing film at 60° C. can be determined by the method described in the Examples.
  • the storage modulus E3 of the substrate at 60° C. can also be determined in accordance with the method for determining the storage modulus E2 of the dicing film at 60° C.
  • the film-like adhesive constituting the film-like adhesive with dicing film of the present invention has a light transmittance of 60% or more after curing.
  • a transmittance of 60% or more means that the light transmittance at a wavelength of 400 nm is 60% or more.
  • the light transmittance at a wavelength of 400 nm represents the light transmittance at all wavelengths in the visible light range.
  • Cured film adhesive means a cured film adhesive cured by treating the film adhesive at 150°C for 1 hour.
  • film adhesive when used to describe the properties of the film adhesive, it means the film adhesive before thermal curing. Specifically, it means a film adhesive that has not been exposed to a temperature equal to or higher than the temperature at which the epoxy resin is thermally cured after preparation of the film adhesive. Preferably, the film adhesive has not been exposed to a temperature condition of 25°C or higher after preparation of the film adhesive.
  • the film adhesive with dicing film of the present invention is not limited to a film adhesive that has not been exposed to a temperature condition of 25°C or higher.
  • the light transmittance of the cured product of the film-like adhesive is preferably 70% or more, more preferably 80% or more, and even more preferably 85% or more.
  • the light transmittance of the cured product of the film-like adhesive is preferably 70 to 95%, more preferably 80 to 92%, and even more preferably 85 to 90%.
  • the light transmittance of the cured film-like adhesive is determined by the method described in the Examples.
  • the light transmittance of the cured product of the film-like adhesive can be controlled by the type and content of the components of the film-like adhesive (resin, curing agent, filler, etc.). Not only the content but also the particle size of the filler can affect the light transmittance.
  • the transparency of the film-like adhesive before curing is not limited, and it may be transparent or opaque. Therefore, the light transmittance of the film-like adhesive before curing at a wavelength of 400 nm may be 60% or more, or may be less than 60%.
  • the dicing film constituting the film-like adhesive with dicing film of the present invention has a substrate and a pressure-sensitive adhesive layer.
  • the substrate can be made of various resin materials. Among them, those made of a resin material selected from polyolefin resin and polyvinyl chloride resin are preferable. It is also preferable that these resin materials have a crosslinked structure.
  • the bond that contributes to the formation of the crosslinked structure may be a covalent bond, a bond based on ionic interaction, or a hydrogen bond.
  • the above polyolefin resins include polyethylene, polypropylene, ethylene-propylene copolymers, polybutene-1, poly-4-methylpentene-1, ethylene-vinyl acetate copolymers, ethylene-(meth)acrylic acid alkyl ester copolymers (ethylene-ethyl acrylate copolymers, ethylene-methyl acrylate copolymers, ethylene-methyl methacrylate copolymers, etc.), ethylene-(meth)acrylic acid copolymers, ionomer resins, and other ⁇ -olefin homopolymer or copolymer resins, or mixtures of these.
  • ionomer resins which are synthetic resins that utilize the cohesive force of metal ions to form polymer aggregates
  • examples thereof include ionomer resins in which an ethylene-(meth)acrylic acid binary copolymer or an ethylene-(meth)acrylic acid-(meth)acrylic acid alkyl ester terpolymer is crosslinked with a metal ion.
  • the metal ions contained in the ionomer resins are not particularly limited, but examples include zinc ions and sodium ions. Zinc ions are preferred in terms of low elution and low contamination.
  • ionomer resins have a greater restoring force against tension than resins without metal ions, and experience a greater shrinkage stress when heat is applied to the stretched state after the expanding step. Therefore, ionomer resins are preferable in that they can be used in a heat shrink step in which the slack generated in the tape after the expanding step is removed by thermal shrinkage and the tape is tensioned to stably maintain the spacing between the individual wafer chips.
  • thermoplastic crosslinked resins obtained by crosslinking a resin selected from low-density polyethylene having a specific gravity of 0.910 or more and less than 0.930, ultra-low-density polyethylene having a specific gravity of less than 0.910, and ethylene-vinyl acetate copolymer are also suitable.
  • a method of crosslinking a method of irradiating the resin with energy rays such as electron beams can be mentioned.
  • Such a thermoplastic crosslinked resin has a certain degree of uniform extensibility because crosslinked and non-crosslinked sites coexist in the resin.
  • thermoplastic crosslinked resin contains almost no chlorine atoms in the molecular chain structure, so that even if the tape that is no longer needed after use is incinerated, it does not generate chlorinated aromatic hydrocarbons such as dioxins and their analogues, and the environmental load is small.
  • the substrate may be a single layer or a multi-layer substrate.
  • the substrate is preferably an ionomer resin of an ethylene-(meth)acrylic acid copolymer.
  • the thickness of the substrate there are no particular limitations on the thickness of the substrate, but a thickness of 50 to 200 ⁇ m is preferred, 60 to 160 ⁇ m is more preferred, and 70 to 150 ⁇ m is even more preferred.
  • the adhesive layer constituting the adhesive tape of the present invention is not particularly limited, so long as it has the retention properties to prevent peeling between the laminate of the transparent film-like member (adherend) described below and the film-like adhesive during the dicing process, and the properties that enable peeling from the adhesive-attached transparent film-like chip when picked up.
  • the adhesive constituting the adhesive layer is not particularly limited as long as it exhibits the above-mentioned characteristics, and general adhesives used in dicing film applications, such as acrylic adhesives and rubber adhesives, can be used as appropriate. Among them, energy ray curable adhesives are preferred. If the energy ray curable adhesive is cured before the pick-up step, pick-up becomes easier.
  • the energy ray refers to light rays such as ultraviolet rays, or ionizing radiation such as electron beams.
  • the adhesive constituting the adhesive layer may be any ordinary adhesive used as an adhesive for dicing adhesive tapes without any particular limitations.
  • For the components, characteristics, and manufacturing method of the adhesive reference may be made to, for example, paragraphs [0039] to [0076] of Japanese Patent No. 6928852, paragraphs [0033] to [0052] of Japanese Patent No. 6989561, and paragraphs [0031] to [0057] of Japanese Patent Laid-Open No. 2023-13022.
  • the adhesive constituting the adhesive layer is preferably an acrylic adhesive containing a (meth)acrylic resin as a base polymer, and more preferably an acrylic adhesive containing at least one of a (meth)acrylic acid alkyl ester and (meth)acrylic acid as a constituent.
  • the (meth)acrylic acid alkyl ester preferably further has a radiation-curable group introduced into the side chain, and more preferably has a (meth)acrylic acid ester having an isocyanate group added thereto.
  • the adhesive may further contain a radiation-curable oligomer, for example, a urethane (meth)acrylate oligomer.
  • the pressure-sensitive adhesive layer may contain a curing agent.
  • the curing agent include a polyisocyanate compound.
  • the pressure-sensitive adhesive layer may also contain a photopolymerization initiator.
  • the thickness of the adhesive layer there are no particular limitations on the thickness of the adhesive layer, but a thickness of 2 to 35 ⁇ m is preferred, 5 to 30 ⁇ m is more preferred, and 5 to 20 ⁇ m is even more preferred.
  • the film-like adhesive constituting the film-like adhesive with dicing film of the present invention will be described. Any conventional film-like adhesive can be used as long as it satisfies E1 and E2 above when combined with a dicing film and the cured product of the film-like adhesive has a light transmittance of 60% or more.
  • the film-like adhesive preferably contains an epoxy resin and a polymer component, more preferably contains an epoxy resin and a urethane resin or an epoxy resin and a phenoxy resin, and even more preferably contains an epoxy resin and a phenoxy resin.
  • the film-like adhesive may contain a filler.
  • the content of the filler is preferably 30 mass % or less of the total solid content of the film-like adhesive, more preferably 20 mass % or less, even more preferably 10 mass % or less, and even more preferably 5 mass % or less.
  • the film adhesive usually contains a curing agent.
  • the film adhesive preferably contains an epoxy resin, a polymer component, and a curing agent. In this case, as described above, a filler may be contained. Each component will be described below.
  • the epoxy resin is a thermosetting resin having an epoxy group, and has an epoxy equivalent of 1000 g/eq or less.
  • the epoxy resin may be liquid, solid, or semi-solid.
  • liquid refers to a resin having a softening point of less than 25°C
  • solid refers to a resin having a softening point of 60°C or more
  • si-solid refers to a resin having a softening point between the softening points of the liquid and the solid (25°C or more and less than 60°C).
  • the epoxy resin used in the present invention preferably has a softening point of 100°C or less, from the viewpoint of obtaining a film-like adhesive that can reach a low melt viscosity in a suitable temperature range (for example, 60 to 120°C).
  • the softening point is a value measured by a softening point test (ring and ball method) method (measurement conditions: in accordance with JIS-K7234 1986).
  • the epoxy equivalent is preferably 150 to 800 g/eq.
  • the epoxy equivalent refers to the number of grams (g/eq) of a resin containing 1 gram equivalent of epoxy groups.
  • the weight average molecular weight of the epoxy resin is usually preferably less than 10,000, and more preferably not more than 5,000. There is no particular restriction on the lower limit, but a value of 300 or more is practical.
  • the weight average molecular weight is a value determined by GPC (Gel Permeation Chromatography) analysis.
  • Examples of the epoxy resin skeleton include phenol novolac type, orthocresol novolac type, cresol novolac type, dicyclopentadiene type, biphenyl type, fluorene bisphenol type, triazine type, naphthol type, naphthalene diol type, triphenylmethane type, tetraphenyl type, bisphenol A type, bisphenol F type, bisphenol AD type, bisphenol S type, and trimethylolmethane type.
  • triphenylmethane type, bisphenol A type, cresol novolac type, and orthocresol novolac type are preferred from the viewpoint of obtaining a film-like adhesive with low resin crystallinity and good appearance. These may be used alone or in combination of two or more types, and a combination of triphenylmethane type and bisphenol A type is preferred.
  • the content of the epoxy resin is preferably 25 to 80 parts by mass, more preferably 30 to 80 parts by mass, even more preferably 30 to 70 parts by mass, and even more preferably 40 to 70 parts by mass, per 100 parts by mass of the total content of the components constituting the film-like adhesive (specifically, the components other than the solvent, i.e., the solid content).
  • the content of the epoxy resin is preferably 30 to 70 parts by mass, and more preferably 30 to 60 parts by mass, per 100 parts by mass of the total content of the epoxy resin and the polymer component.
  • the polymer component may be any component that, when a film-like adhesive is formed, suppresses film tackiness (the property of film state being easily changed even by a slight change in temperature) at room temperature (25°C) and imparts sufficient adhesiveness and film-forming properties (film-forming properties).
  • polymer component examples include natural rubber, butyl rubber, isoprene rubber, chloroprene rubber, ethylene-vinyl acetate copolymer, polybutadiene resin, polycarbonate resin, thermoplastic polyimide resin, polyamide resin such as 6-nylon and 6,6-nylon, phenoxy resin, polyester resin such as polyethylene terephthalate and polybutylene terephthalate, polyamideimide resin, fluororesin, polyurethane resin, etc. These polymer components may be used alone or in combination of two or more. As the polymer component, at least one of phenoxy resin and polyurethane resin is preferable.
  • the weight average molecular weight of the polymer component is at least 10,000. There is no particular upper limit, but a value of 5,000,000 or less is practical.
  • the weight average molecular weight of the polymer component is a value determined by GPC (gel permeation chromatography) in terms of polystyrene.
  • GPC gel permeation chromatography
  • the weight average molecular weight of a specific polymer component has the same meaning.
  • the glass transition temperature (Tg) of the polymer component is preferably less than 100° C., and more preferably less than 90° C.
  • the lower limit is preferably 0° C. or higher, and more preferably 10° C. or higher. Therefore, the glass transition temperature (Tg) of the polymer component is preferably 0° C. or higher and less than 100° C.
  • the glass transition temperature of the polymer component is a glass transition temperature measured by a differential scanning calorimeter (DSC) at a temperature increase rate of 0.1°C/min. More specifically, the temperature was increased from -100°C to 100°C at a temperature increase rate of 0.1°C/min, and the extrapolated glass transition onset temperature according to JIS K7121:2012 "Method for measuring transition temperature of plastics" was used as the glass transition temperature.
  • the glass transition temperature value of a specific polymer component has the same meaning.
  • resins that may have an epoxy group such as phenoxy resins
  • resins having an epoxy equivalent of 1000 g/eq or less are classified as epoxy resins
  • resins having an epoxy equivalent of more than 1000 g/eq are classified as polymer components.
  • Phenoxy resin is preferred as a polymer component because it has a similar structure to epoxy resin and is therefore compatible with epoxy resin. When phenoxy resin is contained, it can also exhibit excellent adhesive properties.
  • the phenoxy resin can be obtained by a conventional method, for example, by reacting a bisphenol or biphenol compound with an epihalohydrin such as epichlorohydrin, or by reacting a liquid epoxy resin with a bisphenol or biphenol compound.
  • the weight average molecular weight of the phenoxy resin is preferably 10,000 or more, and more preferably 10,000 to 100,000.
  • the amount of epoxy groups remaining in the phenoxy resin in small amounts is preferably 5,000 g/eq or more in terms of epoxy equivalent.
  • the glass transition temperature (Tg) of the phenoxy resin is preferably less than 100°C, and more preferably less than 90°C.
  • the lower limit is preferably 0°C or higher, and more preferably 10°C or higher. Therefore, the glass transition temperature (Tg) of the phenoxy resin is preferably 0°C or higher and less than 100°C.
  • the polyurethane resin is a polymer having a urethane (carbamic acid ester) bond in the main chain.
  • the polyurethane resin has a structural unit derived from a polyol and a structural unit derived from a polyisocyanate, and may further have a structural unit derived from a polycarboxylic acid.
  • the polyurethane resin may be used alone or in combination of two or more kinds.
  • the Tg of the polyurethane resin is usually 100° C. or less, preferably 60° C. or less, more preferably 50° C. or less, and also preferably 45° C. or less.
  • weight-average molecular weight of the polyurethane resin there are no particular restrictions on the weight-average molecular weight of the polyurethane resin, but those in the range of 5,000 to 500,000 are usually used.
  • Polyurethane resins can be synthesized by standard methods and are also available on the market. Commercially available products that can be used as polyurethane resins include Dynaleo VA-9320M, Dynaleo VA-9310MF, and Dynaleo VA-9303MF (all manufactured by Toyochem Co., Ltd.).
  • the content of the polymer component relative to 100 parts by mass of the epoxy resin is preferably 1 to 250 parts by mass, more preferably 10 to 180 parts by mass, and even more preferably 40 to 150 parts by mass. By setting the content within such a range, it is possible to adjust the rigidity and flexibility of the film-like adhesive before curing. The film condition becomes good (film tackiness is reduced), and film brittleness can also be suppressed.
  • the content of the polymer component is preferably 30 to 70 parts by mass, and more preferably 40 to 70 parts by mass, per 100 parts by mass of the total content of the epoxy resin and the polymer component.
  • the curing agent is a component that affects the control of the light transmittance defined in the present invention. It is preferable to select the curing agent in consideration of the control of the light transmittance.
  • the curing agent examples include amines, acid anhydrides, and polyhydric phenols. From the viewpoint of storage stability of the film-like adhesive, it is preferable to use a latent curing agent.
  • the latent curing agent include dicyandiamide compounds, imidazole compounds, curing catalyst composite polyhydric phenol compounds, hydrazide compounds, boron trifluoride-amine complexes, amine imide compounds, polyamine salts, and modified products and microcapsule-type products thereof, which may be used alone or in combination of two or more. Among them, it is preferable to use at least one of dicyandiamide compounds, imidazole compounds, and hydrazide compounds.
  • the latent curing agent may be a thermal cationic polymerization initiator, and more preferably a thermal cationic polymerization initiator having a sulfonium cation as the cationic component and SbF 6 - or PF 6 - as the anionic component.
  • the content of the curing agent per 100 parts by mass of the epoxy resin is preferably 0.5 to 50 parts by mass, more preferably 1 to 40 parts by mass, even more preferably 1 to 30 parts by mass, even more preferably 1 to 10 parts by mass, and even more preferably 1 to 5 parts by mass, from the viewpoint of exhibiting a sufficient curing speed and ensuring transparency after curing.
  • any filler that can be normally used in a film-like adhesive can be used without any particular limitation, so long as the above-mentioned light transmittance can be achieved.
  • the filler is preferably an inorganic filler.
  • inorganic fillers examples include ceramics such as silica, clay, gypsum, calcium carbonate, barium sulfate, alumina (aluminum oxide), beryllium oxide, magnesium oxide, silicon carbide, silicon nitride, aluminum nitride, and boron nitride; metals or alloys such as aluminum, copper, silver, gold, nickel, chromium, lead, tin, zinc, palladium, and solder; and carbons such as carbon nanotubes and graphene.
  • inorganic fillers include various inorganic powders. The filler is preferably silica.
  • the particle size (d50) of the filler is not particularly limited, but from the viewpoint of increasing light transmittance, it is preferably 500 nm or less.
  • the particle size is preferably 1 to 500 nm, more preferably 10 to 500 nm, even more preferably 10 to 499 nm, even more preferably 10 to 450 nm, even more preferably 10 to 350 nm, even more preferably 10 to 200 nm, and even more preferably 10 to 100 nm.
  • the particle size (d50) is the so-called median diameter, and refers to the particle size at which the particle size distribution is measured by a laser diffraction/scattering method, and the cumulative distribution is 50% when the total volume of the particles is 100%.
  • the film-like adhesive may further contain an ion trapping agent (ion capture agent), a curing catalyst, a viscosity modifier, an antioxidant, a flame retardant, a colorant, etc., within a range that does not impair the effects of the present invention.
  • an ion trapping agent ion capture agent
  • a curing catalyst ion capture agent
  • a viscosity modifier e.g., an antioxidant
  • a flame retardant e.g., a flame retardant, a colorant, etc.
  • it may contain other additives described in WO 2017/158994.
  • the film adhesive does not contain a colorant such as a dye or pigment, and it is also preferable that the film adhesive does not contain a filler.
  • the total content of the epoxy resin and polymer component contained in the film-like adhesive is preferably 50% by mass or more, more preferably 60% by mass or more, even more preferably 70% by mass or more, and even more preferably 80% by mass or more.
  • the thickness of the film-like adhesive is not particularly limited and can be appropriately set depending on the purpose.
  • the thickness of the film-like adhesive can be, for example, 1 to 30 ⁇ m, preferably 1 to 25 ⁇ m, preferably 1 to 20 ⁇ m, preferably 2 to 20 ⁇ m, preferably 3 to 20 ⁇ m, and preferably 4 to 20 ⁇ m.
  • the thickness of the film-like adhesive can be measured by a contact linear gauge method (desktop contact thickness measuring device).
  • the method for producing the film-like adhesive with a dicing film is not particularly limited as long as it can provide a structure in which a dicing film and a film-like adhesive are laminated together.
  • a coating liquid containing an adhesive is applied onto a release-treated release liner, dried to form an adhesive layer, and then the adhesive layer and a substrate are laminated together to obtain a laminate in which the substrate, adhesive layer, and release liner are laminated in order.
  • a film-like adhesive forming composition is applied onto a release film (synonymous with release liner, but for convenience, the expression is changed here), and dried to form a film-like adhesive on the release film.
  • the release liner is peeled off to expose the adhesive layer, and the dicing film and the film-like adhesive are bonded together to obtain a film-like adhesive with a dicing film in which the substrate, adhesive layer, film-like adhesive, and release film are laminated in order.
  • the above-mentioned dicing film and die attach film are preferably bonded together under pressure.
  • the shape of the dicing film is not particularly limited as long as it can cover the opening of the ring frame, and is preferably circular.
  • the shape of the film-like adhesive is also not particularly limited as long as it can cover the back surface of the wafer, and is preferably circular.
  • the dicing film is preferably larger than the film-like adhesive, and has a shape having a portion where the pressure-sensitive adhesive layer is exposed around the adhesive layer. In this way, it is preferable to laminate the dicing film and the film-like adhesive cut into the desired shape.
  • the release film is peeled off.
  • the film-like adhesive can be obtained by forming a film using a composition (film-like adhesive-forming composition (varnish)) in which each component constituting the film-like adhesive is mixed at a temperature at which the epoxy resin does not actually cure by heat.
  • a composition film-like adhesive-forming composition (varnish)
  • the order of mixing is not particularly limited.
  • resin components such as epoxy resin and polymer component may be mixed together with a solvent as necessary, and then a curing agent may be mixed.
  • mixing in the presence of the curing agent may be performed at a temperature at which the epoxy resin does not actually cure by heat, and mixing of the resin components in the absence of the curing agent may be performed at a higher temperature.
  • a film can be formed using the above-mentioned film-like adhesive-forming composition, for example, by applying the film-like adhesive-forming composition onto a release-treated substrate (also called a release film or peeling film) and drying it as necessary.
  • the release film may be any film that functions as a cover film for the resulting film-like adhesive, and any conventional film may be appropriately used.
  • Examples of the release film include release-treated polypropylene (PP), release-treated polyethylene (PE), and release-treated polyethylene terephthalate (PET).
  • PP release-treated polypropylene
  • PE release-treated polyethylene
  • PET release-treated polyethylene terephthalate
  • As the coating method a conventional method can be appropriately adopted, and examples thereof include methods using a roll knife coater, a gravure coater, a die coater, and a reverse coater.
  • Drying may be performed by removing the organic solvent from the film-like adhesive-forming composition without substantially curing the epoxy resin to obtain a film-like adhesive, and may be performed, for example, by maintaining the composition at a temperature of 80 to 150°C for 1 to 20 minutes.
  • the film-like adhesive can be in a form in which the above-mentioned release film or the like is laminated to at least one surface.
  • the release film does not constitute the film-like adhesive, but is considered to be laminated to the film-like adhesive.
  • the thickness of a film-like adhesive in this invention is the thickness of the layer derived from the film-like adhesive-forming composition.
  • the film adhesive In order to more reliably suppress the thermal curing of the epoxy resin, it is preferable to store the film adhesive at a temperature of 10°C or less before use.
  • the film-like adhesive with a dicing film of the present invention may further be laminated with a release film or the like.
  • a transparent film-like member such as a transparent protective film is adhered to the film-like adhesive side of the laminated film, and the transparent film-like member is fixed via a dicing film, and the transparent film-like member can be cut (diced) to a desired size together with the film-like adhesive.
  • a transparent film-like chip with an adhesive layer cut to a desired size can be obtained on the dicing film.
  • the transparent film-like chip with the adhesive layer is peeled off from the dicing film, and the transparent film-like chip can be incorporated into an electronic component via the adhesive layer.
  • This incorporation into the electronic component is performed by thermocompression bonding or the like, and then the adhesive layer is thermally cured, and the transparency of the adhesive can be increased by, for example, reacting with a solid curing agent in association with the curing reaction.
  • the thermocompression bonding is carried out at a temperature at which the epoxy resin is not substantially cured, for example at about 70° C. and a pressure of about 0.3 MPa.
  • the above-mentioned heat curing reaction may be carried out at a temperature equal to or higher than the heat curing initiation temperature of the film-like adhesive.
  • the heat curing initiation temperature varies depending on the type of epoxy resin, polymer component, and epoxy curing agent used, and cannot be generally stated, but for example, 100 to 180°C is preferable, and from the viewpoint of realizing curing in a short time, 140 to 180°C is more preferable. If the temperature is lower than the heat curing initiation temperature, the heat curing reaction does not proceed sufficiently, and the strength of the adhesive layer tends to decrease. On the other hand, if the temperature of the curing reaction is too high, the curing agent and additives in the film-like adhesive tend to volatilize during the curing reaction and foam easily. In addition, the time of the curing treatment is preferably, for example, 10 to 120 minutes. In relation to the above-described embodiment, the present invention provides the following method for manufacturing an electronic component.
  • a method for manufacturing an electronic component comprising: A first step of obtaining a laminate in which a transparent film-like member and a film-like adhesive with a dicing film of the present invention are laminated in this order; a second step of dicing the transparent film-like member and the film-like adhesive together to obtain a transparent film-like chip with an adhesive layer on the dicing film; a third step of removing the dicing film from the adhesive layer and thermocompression bonding the transparent film-like chip with the adhesive layer and other members constituting an electronic component via the adhesive layer; a fourth step of thermally curing the adhesive layer;
  • a method for manufacturing an electronic component comprising the steps of:
  • the electronic component obtained by the above-mentioned manufacturing method has a structure in which a transparent film-like chip is incorporated in the electronic component via a thermoset of the film-like adhesive.
  • the term "transparent film chip” refers to a transparent film processed into a desired shape.
  • a transparent film member such as a glass substrate or transparent resin is cut into a desired shape for incorporation into an electronic component.
  • the electronic component is an image sensor (imaging element).
  • the transparent film-like chip incorporated in the electronic component is preferably a protective film for a photodiode.
  • the present invention is not limited to these embodiments except as specified in the present invention.
  • preferred examples of the electronic components include optical lenses, optical fibers, optical waveguides, optical isolators, and members used in optical devices such as semiconductor lasers.
  • room temperature means 25° C.
  • MEK is methyl ethyl ketone
  • PET is polyethylene terephthalate.
  • Substrate X A zinc ionomer resin of ethylene-methacrylic acid copolymer (product name: Himilan 1855, manufactured by DuPont-Mitsui Chemical Co., Ltd.) was melted at 200° C. and used in an extruder to prepare a substrate X having a thickness of 90 ⁇ m. One side of the substrate X was subjected to a corona treatment.
  • Substrate Y A zinc ionomer resin of ethylene-methacrylic acid copolymer (product name: Himilan AM7326, manufactured by DuPont-Mitsui Chemical Co., Ltd.) was melted at 200° C.
  • Substrate Z An ethylene-methacrylic acid copolymer (product name: Nucrel N0200H, manufactured by DuPont-Mitsui Chemical Co., Ltd.) was melted at 200° C. and used in an extruder to prepare a substrate Z having a thickness of 90 ⁇ m. One side of the substrate Z was subjected to a corona treatment.
  • the pressure-sensitive adhesive layer composition was applied to a release-treated release liner so as to give a dry film thickness of 10 ⁇ m, and dried for 3 minutes at 120° C. to obtain a pressure-sensitive adhesive layer.
  • This pressure-sensitive adhesive layer was attached to the corona-treated surface of substrate X to produce dicing film A having a substrate and a pressure-sensitive adhesive layer with a release liner.
  • Dicing film B was produced in the same manner as dicing film A, except that the substrate used was changed to substrate Y.
  • Dicing film C was produced in the same manner as dicing film A, except that the substrate Z was used instead.
  • Example 1 (Preparation of film-like adhesive) 50 parts by mass of epoxy resin (product name: 828, manufactured by Mitsubishi Chemical Corporation, bisphenol A type epoxy resin, epoxy equivalent 190 g/eq, specific gravity 1.17) and 50 parts by mass of phenoxy resin (product name: 1256, manufactured by Mitsubishi Chemical Corporation, bisphenol A type phenoxy resin, epoxy equivalent 7500 g/eq) were heated and stirred with MEK in a 1000 ml separable flask at a temperature of 110° C. for 2 hours to obtain a resin varnish.
  • epoxy resin product name: 828, manufactured by Mitsubishi Chemical Corporation, bisphenol A type epoxy resin, epoxy equivalent 190 g/eq, specific gravity 1.17
  • phenoxy resin product name: 1256, manufactured by Mitsubishi Chemical Corporation, bisphenol A type phenoxy resin, epoxy equivalent 7500 g/eq
  • this resin varnish was transferred to another flask container, and 1 part by mass of a curing agent (product name: 2PHZ-PW, imidazole type curing agent, manufactured by Shikoku Kasei Co., Ltd.) was added, and the mixture was stirred and mixed at room temperature for 1 hour, and then vacuum degassed to obtain a mixed varnish.
  • the resulting mixed varnish was then applied onto a 38 ⁇ m-thick release-treated PET film (release film) and dried by heating at 130° C. for 10 minutes to form a film-like adhesive layer with a length of 300 mm, a width of 300 mm, and a thickness of 20 ⁇ m.
  • the resulting film-like adhesive with release film was stored at 10° C. or lower.
  • the dicing film B cut as described above with the release liner was peeled off to expose the dicing film B, and the film-like adhesive with the release film cut as described above was laminated together using a roll press under conditions of a load of 0.4 MPa and a speed of 1.0 m/min to produce a film-like adhesive with a dicing film in which a substrate, a pressure-sensitive adhesive layer, a film-like adhesive, and a release film are laminated in this order.
  • the film-like adhesive is formed on the pressure-sensitive adhesive layer of the dicing film having a substrate and a pressure-sensitive adhesive layer.
  • the dicing film is larger than the film-like adhesive, and the dicing film has an exposed portion around the film-like adhesive.
  • Example 2 In preparing the film-like adhesive of Example 1, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 1, except that 1 part by mass of SI-150 was used instead of 2PHZ-PW as the curing agent, and 3 parts by mass of RY-200 was added to the mixed varnish as a filler.
  • Example 3 A film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 1, except that in preparing the film-like adhesive of Example 1, 11 parts by mass of RY-200 was added to the mixed varnish as a filler.
  • Example 4 In preparing the film-like adhesive of Example 2, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 2, except that 5 parts by mass of S0-C2 was added to the mixed varnish instead of RY-200 as a filler.
  • Example 5 In producing the film-like adhesive with a dicing film of Example 2, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 2, except that dicing film A was used as the dicing film.
  • Example 6 In producing the film-like adhesive with a dicing film of Example 3, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 3, except that dicing film A was used as the dicing film.
  • Example 7 In producing the film-like adhesive with a dicing film of Example 4, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 4, except that dicing film A was used as the dicing film.
  • Example 8 A film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 5, except that in preparing the film-like adhesive of Example 5, 150 parts by mass of a urethane resin solution (VA-9320M) (including 50 parts by mass of urethane resin) was used instead of the phenoxy resin (1256) as the polymer component, the curing agent in the mixed varnish was 1 part by mass of 2PHZ-PW, and 35 parts by mass of RY-200 was added as a filler.
  • VA-9320M urethane resin solution
  • Example 9 In preparing the film-like adhesive of Example 5, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 5, except that 50 parts by mass of ST-3000 was used instead of 828 as the epoxy resin.
  • Example 10 In preparing the film-like adhesive of Example 5, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 5, except that 20 parts by mass of RY-200 was added to the mixed varnish as a filler.
  • Example 11 In preparing the film-like adhesive of Example 5, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 5, except that the amount of 828 in the resin varnish was 30 parts by mass and the amount of 1256 was 70 parts by mass.
  • Example 12 In preparing the film-like adhesive of Example 2, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 2, except that the amount of 828 in the resin varnish was 60 parts by mass and the amount of 1256 was 40 parts by mass.
  • a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 1, except that 18 parts by mass of YDCN-703 was used instead of 828 as the epoxy resin, 100 parts by mass of acrylic resin (SG-P3) was used instead of phenoxy resin (1256) as the polymer component, and 1 part by mass of 2PHZ-PW and 15 parts by mass of Milex XLC-LL were used as the curing agent.
  • ⁇ Comparative Example 4> In preparing the film-like adhesive of Comparative Example 3, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Comparative Example 3, except that the amount of YDCN-703 blended was 50 parts by mass, the amount of SG-P3 blended was 250 parts by mass, 50 parts by mass of Milex XLC-LL was used as the curing agent without blending 2PHZ-PW, and 35 parts by mass of S0-C2 was added to the mixed varnish as a filler.
  • ⁇ Comparative Example 12> In preparing the film-like adhesive with a dicing film of Example 12, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 12, except that dicing film C was used as the dicing film.
  • the storage modulus of the film-like adhesive at 60°C and the storage modulus of the dicing film at 60°C were determined as follows.
  • the film-like adhesive with dicing film obtained in each of the above examples and comparative examples was evaluated for light transmittance and chipping after the film-like adhesive had hardened as follows.
  • the film-like adhesive with dicing film obtained in each Example and Comparative Example was first bonded to one side of a glass wafer (material D263, 10 cm square, thickness 100 ⁇ m) using a manual laminator (product name: FM-114, manufactured by Technovision) at a temperature of 70° C. and a pressure of 0.3 MPa so that the film-like adhesive layer was in contact with the surface. Then, using the same manual laminator, a dicing frame (product name: DTF2-8-1H001, manufactured by DISCO) was bonded to the area of the film-like adhesive to which the glass wafer was not bonded at room temperature and a pressure of 0.3 MPa.
  • a manual laminator product name: FM-114, manufactured by Technovision
  • dicing was performed from the glass wafer side to a size of 2 mm x 2 mm using a dicing machine (product name: DFD-6340, manufactured by DISCO) equipped with a two-axis dicing blade (Z1: NBC-ZH2050 (27HEDD), manufactured by DISCO; Z2: NBC-ZH127F-SE (BC), manufactured by DISCO).
  • Z1 NBC-ZH2050 (27HEDD), manufactured by DISCO
  • Z2 NBC-ZH127F-SE (BC), manufactured by DISCO.
  • This dicing yielded 2500 chips.
  • the number of chips that had chipped was counted, and the chipping occurrence rate relative to the total number of chips (number of chips that had chipped/total number of chips x 100) was calculated.
  • the obtained chipping occurrence rate was evaluated according to the following evaluation criteria.
  • Chip flying rate is 0%
  • the film-like adhesive with a dicing film of Comparative Example 1 does not satisfy the storage modulus relationship E1 ⁇ E2 ⁇ 7.0 In the film-like adhesive with a dicing film of Comparative Example 1, chip flying occurred during dicing.
  • the film-like adhesive with dicing film of Comparative Examples 2 to 4 had a light transmittance of 35% or less for the cured product of the film-like adhesive, and did not exhibit sufficient transparency.
  • One of the reasons for this is thought to be that the amount of filler in Comparative Example 2 was too large, and that in Comparative Examples 3 and 4, the acrylic resin was not compatible with the epoxy resin.
  • the film-like adhesives with dicing films of Comparative Examples 5 to 12 did not satisfy the storage modulus relationship E1 ⁇ E2 ⁇ 7.0
  • the film-like adhesives with dicing films of Comparative Examples 5 to 12 caused chip flying during dicing.
  • the film-like adhesives with dicing films of Examples 1 to 12 which satisfied the provisions of the present invention, satisfied E1 ⁇ E2 ⁇ 7.0 and had a light transmittance of 60% or more after the curing of the film-like adhesive. It can be seen that the use of these film-like adhesives with dicing films makes it possible to effectively prevent chip flying during the dicing process, and also shows sufficiently high transparency after the curing reaction.

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  • Adhesives Or Adhesive Processes (AREA)
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Abstract

This film adhesive agent with a dicing film has: a dicing film having a base and an adhesive layer; and a film adhesive agent disposed on the adhesive layer. A storage elastic modulus E1 (MPa) of the film adhesive agent at 60°C and a storage elastic modulus E2 (MPa) of the dicing film at 60°C satisfy E1 × E2 ≥ 7.0, and the light transmittance of the cured product of the film adhesive agent is 60% or greater.

Description

ダイシングフィルム付きフィルム状接着剤、これを用いた電子部品及びその製造方法Film-like adhesive with dicing film, electronic components using same, and manufacturing method thereof
 本発明は、ダイシングフィルム付きフィルム状接着剤、これを用いた電子部品及びその製造方法に関する。 The present invention relates to a film-like adhesive with a dicing film, electronic components using the same, and a method for manufacturing the same.
 デジタルスチルカメラやデジタルビデオカメラなどの撮影機器には、CMOS(Complementary Metal Oxide Semiconductor)イメージセンサ、CCD(Charge Coupled Device)イメージセンサなどのイメージセンサ(撮像素子)が組み込まれている。イメージセンサは、入射した光をフォトダイオードで光電変換して電気信号に変換し、信号処理を経てデジタル画像が形成される。フォトダイオードの表面には、必要によりカラーフィルタ、マイクロレンズなどが配され、さらにその表面には、通常、ガラス板などの透明保護フィルムが配される。このような透明保護フィルムは、フィルム状接着剤等を介して固定化される。イメージセンサの透明保護フィルムの接着・固定化に用いる接着剤には、少なくとも硬化反応後において、光を十分に透過する透明性が求められる。
 フィルム状接着剤それ自体は種々の組成のものが知られており、イメージセンサに限らず、電子機器やその部材の製造等において広く用いられている。例えば、半導体チップの製造工程では、フィルム状接着剤がダイアタッチフィルムとして用いられている。
Photographing devices such as digital still cameras and digital video cameras incorporate image sensors (imaging elements) such as CMOS (Complementary Metal Oxide Semiconductor) image sensors and CCD (Charge Coupled Device) image sensors. In the image sensor, incident light is photoelectrically converted by a photodiode to convert it into an electrical signal, and a digital image is formed through signal processing. A color filter, a microlens, etc. are arranged on the surface of the photodiode as necessary, and a transparent protective film such as a glass plate is usually arranged on the surface. Such a transparent protective film is fixed via a film-like adhesive or the like. The adhesive used for bonding and fixing the transparent protective film of the image sensor is required to have transparency that allows sufficient light to pass through at least after a curing reaction.
Film-like adhesives themselves are known in various compositions and are widely used not only in image sensors but also in the manufacture of electronic devices and their components, etc. For example, in the manufacturing process of semiconductor chips, film-like adhesives are used as die attach films.
 少なくとも硬化反応後に十分に高い透明性を示すフィルム状接着剤を、ダイシングフィルムとの積層構造体(ダイシングフィルム付きフィルム状接着剤)として、電子部品の製造に用いることが提案されている。例えば特許文献1には、透明フィルム状部材と、硬化反応後に十分に高い透明性を示すフィルム状接着剤と、ダイシングフィルムとがこの順に積層された積層体を得る第1の工程と、前記透明フィルム状部材と前記フィルム状接着剤とを一体にダイシングすることにより、ダイシングフィルム上に、接着剤層付き透明フィルム状チップを得る第2の工程と、前記接着剤層から前記ダイシングフィルムを取り除き、前記接着剤層付き透明フィルム状チップと電子部品を構成する他の部材とを前記接着剤層を介して熱圧着する第3の工程と、前記接着剤層を熱硬化する第4の工程と、を含む電子部品の製造方法が記載されている。上記透明フィルム状部材としてはガラス基板や透明樹脂等が挙げられ、この透明フィルム状部材を上記通り所望の形状にダイシングして得られる接着剤層付き透明フィルム状チップは、例えば、フォトダイオードの保護フィルムとして、上記接着剤層の硬化物を介して電子部品に組み込むことができる。
 また、上記のダイシングフィルム付きフィルム状接着剤は、半導体チップの製造工程において、半導体ウエハのダイシングと、ダイシングにより個片化された半導体チップに接着剤を付与するための、ダイシングダイアタッチフィルムとして用いることもできる。
It has been proposed to use a film-like adhesive that exhibits sufficiently high transparency at least after a curing reaction as a laminated structure with a dicing film (film-like adhesive with a dicing film) for the manufacture of electronic components. For example, Patent Document 1 describes a method for manufacturing electronic components, which includes a first step of obtaining a laminate in which a transparent film-like member, a film-like adhesive that exhibits sufficiently high transparency after a curing reaction, and a dicing film are laminated in this order, a second step of obtaining a transparent film-like chip with an adhesive layer on the dicing film by dicing the transparent film-like member and the film-like adhesive together, a third step of removing the dicing film from the adhesive layer, and thermocompressing the transparent film-like chip with the adhesive layer and other members constituting the electronic component via the adhesive layer, and a fourth step of thermosetting the adhesive layer. Examples of the transparent film-like member include a glass substrate and a transparent resin, and the transparent film-like chip with an adhesive layer obtained by dicing the transparent film-like member into a desired shape as described above can be incorporated into an electronic component via the cured product of the adhesive layer, for example, as a protective film for a photodiode.
In addition, the above-mentioned film-like adhesive with dicing film can also be used as a dicing die attach film in the semiconductor chip manufacturing process, for dicing a semiconductor wafer and applying adhesive to the semiconductor chips separated by dicing.
国際公開第2023/026584号International Publication No. 2023/026584
 上記のダイシング工程では、ダイシングにより個片化されたチップがダイシング中にフィルム状接着剤から剥離する現象(チップ飛び)が少なからず生じ得る。本発明者が検討を重ねたところ、フィルム状接着剤の透明性を高めるために、フィラー等の微粒子添加剤の配合量を減らした場合には、ダイシング工程におけるチップ飛びがより生じやすくなることがわかってきた。
 本発明は、フィルム状接着剤が少なくとも硬化反応後に十分に高い透明性を示し、ダイシング工程においてチップ飛びを効果的に抑えることができるダイシングフィルム付きフィルム状接着剤を提供することを課題とする。また本発明は、このダイシングフィルム付きフィルム状接着剤を用いた電子部品の製造方法を提供することを課題とする。
In the above-mentioned dicing process, a phenomenon (chip flying) in which the chips separated by dicing peel off from the film-like adhesive during dicing can occur to a considerable extent. After extensive research, the present inventors have found that when the amount of particulate additive such as a filler is reduced in order to increase the transparency of the film-like adhesive, chip flying during the dicing process becomes more likely to occur.
The present invention aims to provide a film-like adhesive with a dicing film, which exhibits sufficiently high transparency at least after a curing reaction and can effectively suppress chip flying during a dicing process. Another object of the present invention is to provide a method for manufacturing electronic components using this film-like adhesive with a dicing film.
 本発明の上記課題は下記の手段により解決される。
〔1〕
 基材と粘着剤層とを有するダイシングフィルムと、該粘着剤層上に配したフィルム状接着剤とを有し、
 前記フィルム状接着剤の60℃における貯蔵弾性率E1(MPa)と、前記ダイシングフィルムの60℃における貯蔵弾性率E2(MPa)とが、E1×E2≧7.0を満たし、
 前記フィルム状接着剤の硬化物の光透過率が60%以上である、ダイシングフィルム付きフィルム状接着剤。
〔2〕
 前記フィルム状接着剤がエポキシ樹脂及びフェノキシ樹脂を含有する、〔1〕に記載のダイシングフィルム付きフィルム状接着剤。
〔3〕
 前記フィルム状接着剤が充填材を含有し、該充填材の含有量が前記フィルム状接着剤の固形分全体の10質量%以下である、〔1〕又は〔2〕に記載のダイシングフィルム付きフィルム状接着剤。
〔4〕
 前記充填材の平均粒径(d50)が500nm以下である、〔3〕に記載のダイシングフィルム付きフィルム状接着剤。
〔5〕
 前記フィルム状接着剤が硬化剤を含有し、該硬化剤が熱カチオン重合開始剤である、〔1〕~〔4〕のいずれか1つに記載のダイシングフィルム付きフィルム状接着剤。
〔6〕
 E1が0.1~1.0MPaであり、E2が10~70MPaである、〔1〕~〔5〕のいずれか1つに記載のダイシングフィルム付きフィルム状接着剤。
〔7〕
 電子部品の製造方法であって、
 透明フィルム状部材と、〔1〕~〔6〕のいずれか1項に記載のダイシングフィルム付きフィルム状接着剤とがこの順に積層された積層体を得る第1の工程と、
 前記透明フィルム状部材と前記フィルム状接着剤とを一体にダイシングすることにより、前記ダイシングフィルム上に、接着剤層付き透明フィルム状チップを得る第2の工程と、
 前記接着剤層から前記ダイシングフィルムを取り除き、前記接着剤層付き透明フィルム状チップと電子部品を構成する他の部材とを前記接着剤層を介して熱圧着する第3の工程と、
 前記接着剤層を熱硬化する第4の工程と、
を含む電子部品の製造方法。
〔8〕
 前記電子部品がイメージセンサである、〔7〕に記載の電子部品の製造方法。
〔9〕
 前記電子部品が、前記透明フィルム状チップがフォトダイオードの保護フィルムとして組み込まれた構造を有する、〔8〕に記載の電子部品の製造方法。
The above object of the present invention is achieved by the following means.
[1]
A dicing film having a substrate and a pressure-sensitive adhesive layer, and a film-like adhesive disposed on the pressure-sensitive adhesive layer,
the storage modulus E1 (MPa) of the film-like adhesive at 60° C. and the storage modulus E2 (MPa) of the dicing film at 60° C. satisfy E1×E2≧7.0,
A film-like adhesive with a dicing film, wherein the light transmittance of the cured product of the film-like adhesive is 60% or more.
[2]
The film-like adhesive with a dicing film according to [1], wherein the film-like adhesive contains an epoxy resin and a phenoxy resin.
[3]
The film-like adhesive with a dicing film according to [1] or [2], wherein the film-like adhesive contains a filler and the content of the filler is 10 mass% or less of the total solid content of the film-like adhesive.
[4]
The film-like adhesive with a dicing film according to [3], wherein the average particle size (d50) of the filler is 500 nm or less.
[5]
The film-like adhesive with a dicing film according to any one of [1] to [4], wherein the film-like adhesive contains a curing agent, and the curing agent is a thermal cationic polymerization initiator.
[6]
The film-like adhesive with a dicing film according to any one of [1] to [5], wherein E1 is 0.1 to 1.0 MPa and E2 is 10 to 70 MPa.
[7]
A method for manufacturing an electronic component, comprising:
A first step of obtaining a laminate in which a transparent film-like member and a film-like adhesive with a dicing film according to any one of items [1] to [6] are laminated in this order;
a second step of dicing the transparent film-like member and the film-like adhesive together to obtain a transparent film-like chip with an adhesive layer on the dicing film;
a third step of removing the dicing film from the adhesive layer and thermocompression bonding the transparent film-like chip with the adhesive layer and other members constituting an electronic component via the adhesive layer;
a fourth step of thermally curing the adhesive layer;
A method for manufacturing an electronic component comprising the steps of:
[8]
The method for manufacturing an electronic component according to claim 7, wherein the electronic component is an image sensor.
[9]
The method for manufacturing an electronic component according to [8], wherein the electronic component has a structure in which the transparent film-like chip is incorporated as a protective film for a photodiode.
 本発明において「~」を用いて表される数値範囲は、「~」前後に記載される数値を下限値及び上限値として含む範囲を意味する。
 本発明において「~化合物」という場合、「~骨格を有する化合物」を意味する。例えば「ジシアンジアミド化合物」は、ジシアンジアミドそのものに加え、ジシアンジアミドが有する水素原子の少なくとも一部が置換された形態も包含する意味である。
In the present invention, the numerical range expressed using "to" means a range including the numerical values before and after "to" as the lower and upper limits.
In the present invention, the term "compound having a skeleton" refers to a compound having a skeleton. For example, a "dicyandiamide compound" refers to not only dicyandiamide itself, but also a form in which at least a portion of the hydrogen atoms of dicyandiamide have been substituted.
 本発明のダイシングフィルム付きフィルム状接着剤は、フィルム状接着剤が少なくとも硬化反応後に十分に高い透明性を示し、かつ、ダイシング工程に適用した場合にチップ飛びを効果的に抑えることができる。また、本発明の電子部品の製造方法によれば、ダイシング工程で得られる透明フィルム状チップのチップ飛びを効果的に抑えることができ、その結果、フィルム状接着剤の透明な硬化物を介して透明フィルム状チップが組み込まれた電子部品を高い生産性で得ることができる。 The film-like adhesive with dicing film of the present invention exhibits sufficiently high transparency at least after the curing reaction, and can effectively suppress chip flying when applied to the dicing process. Furthermore, according to the manufacturing method of electronic components of the present invention, chip flying of the transparent film-like chip obtained in the dicing process can be effectively suppressed, and as a result, electronic components in which a transparent film-like chip is incorporated via a transparent cured product of the film-like adhesive can be obtained with high productivity.
図1は、実施例で調製した剥離フィルム付きフィルム状接着剤の構造を模式的に示す断面図である。FIG. 1 is a cross-sectional view showing a schematic structure of a film-like adhesive with a release film prepared in the Examples.
[ダイシングフィルム付きフィルム状接着剤]
 本発明のダイシングフィルム付きフィルム状接着剤は、基材と粘着剤層とを有するダイシングフィルムと、該粘着剤層上に配したフィルム状接着剤とを有する。さらに、フィルム状接着剤の60℃における貯蔵弾性率E1(MPa)と、ダイシングフィルムの60℃における貯蔵弾性率E2(MPa)とが、E1×E2≧7.0を満たし、フィルム状接着剤の硬化後の光透過率が60%以上である。
 貯蔵弾性率E1及びE2が上記関係を満たすことにより、ダイシング時のブレードの摩擦熱によって本発明のダイシングフィルム付きフィルム状接着剤が局所的に加熱された状態(60℃程度に加熱されうる)においても本発明のダイシングフィルム付きフィルム状接着剤全体の剛性が担保され、チップ飛びを効果的に抑制することができ、かつ、硬化反応後には高い透明性を示すことから、透明フィルム状部材を電子部品等に組み込む際の接着剤として優れた光学特性を示す。ダイシングフィルムとフィルム状接着剤とを合わせた一体の貯蔵弾性率を制御するため、微粒子添加剤の配合量を低減したことによって貯蔵弾性率が比較的小さくなったフィルム状接着剤層を用いても、ダイシングフィルム全体としての貯蔵弾性率が適切に制御され、ダイシング時の振動等の抑制が可能となると考えられる。
[Film-type adhesive with dicing film]
The film-like adhesive with dicing film of the present invention comprises a dicing film having a substrate and a pressure-sensitive adhesive layer, and a film-like adhesive disposed on the pressure-sensitive adhesive layer, wherein the storage modulus E1 (MPa) of the film-like adhesive at 60° C. and the storage modulus E2 (MPa) of the dicing film at 60° C. satisfy E1×E2≧7.0, and the light transmittance of the film-like adhesive after curing is 60% or more.
By satisfying the above relationship between the storage moduli E1 and E2, the rigidity of the entire film-like adhesive with the dicing film of the present invention is guaranteed even when the film-like adhesive with the dicing film of the present invention is locally heated by the frictional heat of the blade during dicing (it can be heated to about 60 ° C.), chip flying can be effectively suppressed, and since it shows high transparency after the curing reaction, it shows excellent optical properties as an adhesive when incorporating a transparent film-like member into an electronic component, etc. In order to control the integrated storage modulus of the dicing film and the film-like adhesive, even if a film-like adhesive layer with a relatively small storage modulus is used by reducing the amount of the fine particle additive, it is considered that the storage modulus of the dicing film as a whole can be appropriately controlled, and vibration during dicing can be suppressed.
 本発明において、フィルム状接着剤の60℃における貯蔵弾性率E1(MPa)と、ダイシングフィルムの60℃における貯蔵弾性率E2(MPa)とは、チップ飛びを抑制する観点からは、E1×E2≧10.0が好ましく、E1×E2≧11.0がより好ましく、E1×E2≧12.0がさらに好ましく、E1×E2≧15.0が特に好ましい。上限は、特に限定されず、通常は50.0≧E1×E2であり、40.0≧E1×E2が実際的である。したがって、50.0≧E1×E2≧7.0が好ましく、50.0≧E1×E2≧10.0がより好ましく、50.0≧E1×E2≧11.0がさらに好ましく、50.0≧E1×E2≧12.0がさらに好ましく、40.0≧E1×E2≧15.0が特に好ましい。 In the present invention, the storage modulus E1 (MPa) of the film-like adhesive at 60°C and the storage modulus E2 (MPa) of the dicing film at 60°C are preferably E1 x E2 ≥ 10.0, more preferably E1 x E2 ≥ 11.0, even more preferably E1 x E2 ≥ 12.0, and particularly preferably E1 x E2 ≥ 15.0, from the viewpoint of suppressing chip flying. The upper limit is not particularly limited, and is usually 50.0 ≥ E1 x E2, with 40.0 ≥ E1 x E2 being practical. Therefore, 50.0 ≥ E1 x E2 ≥ 7.0 is preferred, 50.0 ≥ E1 x E2 ≥ 10.0 is more preferred, 50.0 ≥ E1 x E2 ≥ 11.0 is even more preferred, 50.0 ≥ E1 x E2 ≥ 12.0 is even more preferred, and 40.0 ≥ E1 x E2 ≥ 15.0 is particularly preferred.
 上記フィルム状接着剤の60℃における貯蔵弾性率E1は、上記E1とE2の関係を満たせば特に制限されない。E1は、0.1~1.5MPaが好ましく、0.1~1.0MPaがより好ましく、0.2~1.0MPaがさらに好ましく、0.3~0.9MPaがさらに好ましく、0.3~0.8MPaがさらに好ましい。
 上記ダイシングフィルムの60℃における貯蔵弾性率E2は、上記E1とE2の関係を満たせば特に制限されない。E2は、10~80MPaが好ましく、10~70MPaがより好ましく、20~70MPaがさらに好ましく、25~60MPaがさらに好ましく、30~50MPaがさらに好ましい。
The storage modulus E1 of the film-like adhesive at 60° C. is not particularly limited as long as the relationship between E1 and E2 is satisfied. E1 is preferably 0.1 to 1.5 MPa, more preferably 0.1 to 1.0 MPa, even more preferably 0.2 to 1.0 MPa, even more preferably 0.3 to 0.9 MPa, and even more preferably 0.3 to 0.8 MPa.
The storage modulus E2 of the dicing film at 60° C. is not particularly limited as long as it satisfies the relationship between E1 and E2. E2 is preferably 10 to 80 MPa, more preferably 10 to 70 MPa, even more preferably 20 to 70 MPa, even more preferably 25 to 60 MPa, and even more preferably 30 to 50 MPa.
 上記フィルム状接着剤の60℃における貯蔵弾性率E1は、フィルム状接着剤を構成する成分(樹脂、硬化剤、充填材等)の種類及び含有量により制御することができる。
 上記ダイシングフィルムの60℃における貯蔵弾性率E2は、ダイシングフィルムを構成する成分(粘着剤層及び基材を構成する樹脂)の種類及び含有量、粘着剤層及び基材の厚さ等により制御することができる。通常、粘着剤層よりも基材の方が大きな厚みを有するため、E2は、基材の特性に大きく影響される傾向である。この観点からは、ダイシングフィルムが有する基材の60℃における貯蔵弾性率E3は、10~80MPaが好ましく、10~70MPaがより好ましく、20~70MPaがさらに好ましく、30~60MPaがさらに好ましく、30~50MPaがさらに好ましい。
 上記フィルム状接着剤の60℃における貯蔵弾性率E1及びダイシングフィルムの60℃における貯蔵弾性率E2は、それぞれ、実施例に記載の方法で決定することができる。また、基材の60℃における貯蔵弾性率E3も、ダイシングフィルムの60℃における貯蔵弾性率E2の決定方法に準じて決定することができる。
The storage modulus E1 of the above-mentioned film-like adhesive at 60° C. can be controlled by the types and contents of the components (resin, curing agent, filler, etc.) that make up the film-like adhesive.
The storage modulus E2 of the dicing film at 60°C can be controlled by the type and content of the components (resins constituting the adhesive layer and the substrate) constituting the dicing film, the thickness of the adhesive layer and the substrate, etc. Since the substrate usually has a greater thickness than the adhesive layer, E2 tends to be greatly affected by the characteristics of the substrate. From this viewpoint, the storage modulus E3 of the substrate of the dicing film at 60°C is preferably 10 to 80 MPa, more preferably 10 to 70 MPa, even more preferably 20 to 70 MPa, even more preferably 30 to 60 MPa, and even more preferably 30 to 50 MPa.
The storage modulus E1 of the film-like adhesive at 60° C. and the storage modulus E2 of the dicing film at 60° C. can be determined by the method described in the Examples. The storage modulus E3 of the substrate at 60° C. can also be determined in accordance with the method for determining the storage modulus E2 of the dicing film at 60° C.
 本発明のダイシングフィルム付きフィルム状接着剤を構成するフィルム状接着剤は、その硬化後の光透過率が60%以上である。硬化後の透過率が60%以上であることにより、硬化後において透明性を確保でき、透明フィルム状部材などの接着に好適な光学特性を発揮することができる。ここで、本発明において、「光透過率が60%以上」とは、波長400nmにおける光透過率が60%以上であることを意味する。波長400nmでの光透過率は、全ての可視光領域の波長での光透過率を代表するものである。
 「フィルム状接着剤の硬化物」とは、フィルム状接着剤を、150℃で1時間処理して硬化させた硬化物を意味する。なお、本発明ないし明細書において、フィルム状接着剤の特性の説明で単に「フィルム状接着剤」という場合、熱硬化前のものを意味する。具体的には、フィルム状接着剤を調製後、エポキシ樹脂が熱硬化する温度以上の温度に曝されていないフィルム状接着剤を意味する。好ましくは、フィルム状接着剤を調製後、25℃以上の温度条件下に曝されていないフィルム状接着剤である。なお、上記の説明は、フィルム状接着剤の特性を明確にするためのものであり、本発明のダイシングフィルム付きフィルム状接着剤が、フィルム状接着剤が25℃以上の温度条件下に曝されていないものに限定されるものではない。
 上記フィルム状接着剤の硬化物の光透過率は70%以上がより好ましく、80%以上がさらに好ましく、85%以上であることがさらに好ましい。上記フィルム状接着剤の硬化物の光透過率は、70~95%が好ましく、80~92%がより好ましく、85~90%がさらに好ましい。
 上記フィルム状接着剤の硬化物の光透過率は、実施例に記載された方法で決定される。
 上記フィルム状接着剤の硬化物の光透過率は、フィルム状接着剤の成分(樹脂、硬化剤、充填材等)の種類及び含有量により制御することができる。充填材は、含有量のみならず、その粒径も光透過率に影響しうる。
 硬化前のフィルム状接着剤は、その透明性は限定されず、透明であってもよく、不透明であってもよい。したがって、硬化前のフィルム状接着剤は、その波長400nmにおける光透過率が60%以上であってもよく、60%未満であってもよい。
The film-like adhesive constituting the film-like adhesive with dicing film of the present invention has a light transmittance of 60% or more after curing. By having a transmittance of 60% or more after curing, transparency can be ensured after curing, and optical properties suitable for bonding transparent film-like members and the like can be exhibited. Here, in the present invention, "light transmittance of 60% or more" means that the light transmittance at a wavelength of 400 nm is 60% or more. The light transmittance at a wavelength of 400 nm represents the light transmittance at all wavelengths in the visible light range.
"Cured film adhesive" means a cured film adhesive cured by treating the film adhesive at 150°C for 1 hour. In the present invention and the specification, when the term "film adhesive" is used to describe the properties of the film adhesive, it means the film adhesive before thermal curing. Specifically, it means a film adhesive that has not been exposed to a temperature equal to or higher than the temperature at which the epoxy resin is thermally cured after preparation of the film adhesive. Preferably, the film adhesive has not been exposed to a temperature condition of 25°C or higher after preparation of the film adhesive. The above description is intended to clarify the properties of the film adhesive, and the film adhesive with dicing film of the present invention is not limited to a film adhesive that has not been exposed to a temperature condition of 25°C or higher.
The light transmittance of the cured product of the film-like adhesive is preferably 70% or more, more preferably 80% or more, and even more preferably 85% or more. The light transmittance of the cured product of the film-like adhesive is preferably 70 to 95%, more preferably 80 to 92%, and even more preferably 85 to 90%.
The light transmittance of the cured film-like adhesive is determined by the method described in the Examples.
The light transmittance of the cured product of the film-like adhesive can be controlled by the type and content of the components of the film-like adhesive (resin, curing agent, filler, etc.). Not only the content but also the particle size of the filler can affect the light transmittance.
The transparency of the film-like adhesive before curing is not limited, and it may be transparent or opaque. Therefore, the light transmittance of the film-like adhesive before curing at a wavelength of 400 nm may be 60% or more, or may be less than 60%.
 以下に、本発明のダイシングフィルム付きフィルム状接着剤について、より具体的に説明する。 The film-like adhesive with dicing film of the present invention will be described in more detail below.
<ダイシングフィルム>
 本発明のダイシングフィルム付きフィルム状接着剤を構成するダイシングフィルムは、基材と粘着剤層とを有する。
 基材及び粘着剤層は、積層してダイシングフィルムとした上で、フィルム状接着剤と組み合わせた際に、上記E1及びE2を満たせば、材料や組成は特に制限されない。
<Dicing film>
The dicing film constituting the film-like adhesive with dicing film of the present invention has a substrate and a pressure-sensitive adhesive layer.
There are no particular limitations on the materials and compositions of the substrate and pressure-sensitive adhesive layer as long as they satisfy the above E1 and E2 when laminated to form a dicing film and then combined with a film-like adhesive.
-基材-
 基材は種々の樹脂材料で構成することができる。なかでも、ポリオレフィン樹脂及びポリ塩化ビニル樹脂から選択される樹脂材料で構成されたものが好ましい。これらの樹脂材料は架橋構造を有することも好ましい。架橋構造の形成に寄与する結合は共有結合でもよく、イオン性相互作用に基づく結合でもよく、水素結合であってもよい。
- Substrate -
The substrate can be made of various resin materials. Among them, those made of a resin material selected from polyolefin resin and polyvinyl chloride resin are preferable. It is also preferable that these resin materials have a crosslinked structure. The bond that contributes to the formation of the crosslinked structure may be a covalent bond, a bond based on ionic interaction, or a hydrogen bond.
 上記ポリオレフィン樹脂としては、ポリエチレン、ポリプロピレン、エチレン-プロピレン共重合体、ポリブテン-1、ポリ-4-メチルペンテン-1、エチレン-酢酸ビニル共重合体、エチレン-(メタ)アクリル酸アルキルエステル共重合体(エチレン-アクリル酸エチル共重合体、エチレン-アクリル酸メチル共重合体、エチレン-メタクリル酸メチル共重合体など)、エチレン-(メタ)アクリル酸共重合体、アイオノマー樹脂などのα-オレフィンの単独重合体または共重合体の樹脂あるいはこれらの混合物などが挙げられる。 The above polyolefin resins include polyethylene, polypropylene, ethylene-propylene copolymers, polybutene-1, poly-4-methylpentene-1, ethylene-vinyl acetate copolymers, ethylene-(meth)acrylic acid alkyl ester copolymers (ethylene-ethyl acrylate copolymers, ethylene-methyl acrylate copolymers, ethylene-methyl methacrylate copolymers, etc.), ethylene-(meth)acrylic acid copolymers, ionomer resins, and other α-olefin homopolymer or copolymer resins, or mixtures of these.
 特に、金属イオンによる凝集力を利用し高分子を凝集体とした合成樹脂であるアイオノマー樹脂が好ましく、例えば、エチレン-(メタ)アクリル酸2元共重合体またはエチレン-(メタ)アクリル酸-(メタ)アクリル酸アルキルエステル3元共重合体を、金属イオンで架橋したアイオノマー樹脂が、例示される。これらは、均一拡張性の面でエキスパンド工程に適する。上記アイオノマー樹脂に含まれる金属イオンは特に限定されないが、亜鉛イオン、ナトリウムイオン等が挙げられる。亜鉛イオンは溶出性が低く低汚染性の面から好ましい。
 一般に、アイオノマー樹脂は、金属イオンのない樹脂と比較して引っ張りに対する復元力が大きく、エキスパンド工程後の引き伸ばされた状態に熱を加えた際の収縮応力が大きい。したがって、アイオノマー樹脂は、エキスパンド工程後にテープに生じた弛みを加熱収縮によって除去し、テープを緊張させて個々のウエハチップ間の間隔を安定に保持するヒートシュリンク工程を実施できる点で好ましい。
In particular, ionomer resins, which are synthetic resins that utilize the cohesive force of metal ions to form polymer aggregates, are preferred, and examples thereof include ionomer resins in which an ethylene-(meth)acrylic acid binary copolymer or an ethylene-(meth)acrylic acid-(meth)acrylic acid alkyl ester terpolymer is crosslinked with a metal ion. These are suitable for the expanding process in terms of uniform expandability. The metal ions contained in the ionomer resins are not particularly limited, but examples include zinc ions and sodium ions. Zinc ions are preferred in terms of low elution and low contamination.
In general, ionomer resins have a greater restoring force against tension than resins without metal ions, and experience a greater shrinkage stress when heat is applied to the stretched state after the expanding step. Therefore, ionomer resins are preferable in that they can be used in a heat shrink step in which the slack generated in the tape after the expanding step is removed by thermal shrinkage and the tape is tensioned to stably maintain the spacing between the individual wafer chips.
 また、上記アイオノマー樹脂の他に、比重0.910以上0.930未満の低密度ポリエチレン、比重0.910未満の超低密度ポリエチレン、およびエチレン-酢酸ビニル共重合体から選ばれる樹脂を架橋させた熱可塑性架橋樹脂も好適である。
 架橋の方法としては、上記樹脂に対して、電子線等のエネルギー線を照射する方法が挙げられる。このような熱可塑性架橋樹脂は、架橋部位と非架橋部位が樹脂中に共存していることから、一定の均一拡張性を有する。また、このような熱可塑性架橋樹脂は、分子鎖の構成中に塩素原子をほとんど含まないので、使用後に不要となったテープを焼却処分しても、ダイオキシンやその類縁体といった塩素化芳香族炭化水素を発生せず、環境負荷も小さい。上記ポリエチレンやエチレン-酢酸ビニル共重合体に対して照射するエネルギー線の量を適宜に調製することで、十分な均一拡張性を有する樹脂を得ることができる。
In addition to the above ionomer resins, thermoplastic crosslinked resins obtained by crosslinking a resin selected from low-density polyethylene having a specific gravity of 0.910 or more and less than 0.930, ultra-low-density polyethylene having a specific gravity of less than 0.910, and ethylene-vinyl acetate copolymer are also suitable.
As a method of crosslinking, a method of irradiating the resin with energy rays such as electron beams can be mentioned. Such a thermoplastic crosslinked resin has a certain degree of uniform extensibility because crosslinked and non-crosslinked sites coexist in the resin. In addition, such a thermoplastic crosslinked resin contains almost no chlorine atoms in the molecular chain structure, so that even if the tape that is no longer needed after use is incinerated, it does not generate chlorinated aromatic hydrocarbons such as dioxins and their analogues, and the environmental load is small. By appropriately adjusting the amount of energy rays irradiated to the polyethylene or ethylene-vinyl acetate copolymer, a resin having sufficient uniform extensibility can be obtained.
 基材は、単層でもよく、複数層であってもよい。
 基材は、エチレン-(メタ)アクリル酸共重合体のアイオノマー樹脂であることが好ましい。
The substrate may be a single layer or a multi-layer substrate.
The substrate is preferably an ionomer resin of an ethylene-(meth)acrylic acid copolymer.
 基材の厚さとしては、特に制限はないが、厚さ50~200μmが好ましく、60~160μmがより好ましく、70~150μmがさらに好ましい。 There are no particular limitations on the thickness of the substrate, but a thickness of 50 to 200 μm is preferred, 60 to 160 μm is more preferred, and 70 to 150 μm is even more preferred.
-粘着剤層-
 本発明の粘着テープを構成する粘着剤層は、ダイシング工程において、後述する透明フィルム状部材(被着体)とフィルム状接着剤との積層体との剥離を生じない程度の保持性及びピックアップ時において接着剤付き透明フィルム状チップとの剥離が可能である特性を有するものであれば、特に限定されない。
 粘着剤層を構成する粘着剤は、上記特性を示すものであれば特に限定されず、ダイシングフィルム用途に用いられる一般的な粘着剤、例えば、アクリル系粘着剤、ゴム系粘着剤等を適宜に用いることができる。なかでも、エネルギー線硬化性の粘着剤が好ましい。エネルギー線硬化性粘着剤であれば、ピックアップ工程前に硬化させることにより、ピックアップが容易になる。ここで、エネルギー線とは、紫外線のような光線、または電子線などの電離性放射線をいう。
 粘着剤層を構成する粘着剤としては、ダイシング用粘着テープの粘着剤として使用されている通常の粘着剤を特に制限なく使用することができる。粘着剤の成分、特性、製造方法としては、例えば、日本国特許第6928852号公報の段落[0039]~[0076]、日本国特許第6989561号公報の段落[0033]~[0052]の記載、特開2023-13022号公報の段落[0031]~[0057]の記載等を参照することができる。
- Adhesive layer -
The adhesive layer constituting the adhesive tape of the present invention is not particularly limited, so long as it has the retention properties to prevent peeling between the laminate of the transparent film-like member (adherend) described below and the film-like adhesive during the dicing process, and the properties that enable peeling from the adhesive-attached transparent film-like chip when picked up.
The adhesive constituting the adhesive layer is not particularly limited as long as it exhibits the above-mentioned characteristics, and general adhesives used in dicing film applications, such as acrylic adhesives and rubber adhesives, can be used as appropriate. Among them, energy ray curable adhesives are preferred. If the energy ray curable adhesive is cured before the pick-up step, pick-up becomes easier. Here, the energy ray refers to light rays such as ultraviolet rays, or ionizing radiation such as electron beams.
The adhesive constituting the adhesive layer may be any ordinary adhesive used as an adhesive for dicing adhesive tapes without any particular limitations. For the components, characteristics, and manufacturing method of the adhesive, reference may be made to, for example, paragraphs [0039] to [0076] of Japanese Patent No. 6928852, paragraphs [0033] to [0052] of Japanese Patent No. 6989561, and paragraphs [0031] to [0057] of Japanese Patent Laid-Open No. 2023-13022.
 粘着剤層を構成する粘着剤は、(メタ)アクリル樹脂をベースポリマーとして含有するアクリル系粘着剤等が好ましく、(メタ)アクリル酸アルキルエステル及び(メタ)アクリル酸の少なくともいずれかを構成成分として含むアクリル系粘着剤がより好ましい。(メタ)アクリル酸アルキルエステルは、さらに側鎖に放射線硬化性基が導入されていることが好ましく、イソシアネート基を有する(メタ)アクリル酸エステルが付加されていることがさらに好ましい。粘着剤は、さらに放射線硬化性のオリゴマーを含有していてもよく、例えば、ウレタン(メタ)アクリレートオリゴマー等を含有していてもよい。 The adhesive constituting the adhesive layer is preferably an acrylic adhesive containing a (meth)acrylic resin as a base polymer, and more preferably an acrylic adhesive containing at least one of a (meth)acrylic acid alkyl ester and (meth)acrylic acid as a constituent. The (meth)acrylic acid alkyl ester preferably further has a radiation-curable group introduced into the side chain, and more preferably has a (meth)acrylic acid ester having an isocyanate group added thereto. The adhesive may further contain a radiation-curable oligomer, for example, a urethane (meth)acrylate oligomer.
 粘着剤層は、硬化剤を含有していてもよい。硬化剤としては、ポリイソシアネート化合物等が挙げられる。
 また、粘着剤層は、光重合開始剤を含有していてもよい。
The pressure-sensitive adhesive layer may contain a curing agent. Examples of the curing agent include a polyisocyanate compound.
The pressure-sensitive adhesive layer may also contain a photopolymerization initiator.
 粘着剤層の厚さとしては、特に制限はないが、厚さ2~35μmが好ましく、5~30μmがより好ましく、5~20μmがさらに好ましい。 There are no particular limitations on the thickness of the adhesive layer, but a thickness of 2 to 35 μm is preferred, 5 to 30 μm is more preferred, and 5 to 20 μm is even more preferred.
<フィルム状接着剤>
 本発明のダイシングフィルム付きフィルム状接着剤を構成するフィルム状接着剤について説明する。
 フィルム状接着剤は、ダイシングフィルムと組み合わせた際に上記E1及びE2を満たし、かつ、このフィルム状接着剤の硬化物の光透過率が60%以上となるものであれば、通常のフィルム状接着剤を用いることができる。
 フィルム状接着剤は、エポキシ樹脂及び高分子成分を含有することが好ましく、エポキシ樹脂及びウレタン樹脂、又は、エポキシ樹脂及びフェノキシ樹脂を含有することがより好ましく、エポキシ樹脂及びフェノキシ樹脂を含有することがさらに好ましい。
 フィルム状接着剤は、充填材を含有することができる。ただし、光透過性を高める観点から、フィルム状接着剤が充填材を含む場合の、充填材の含有量は、フィルム状接着剤の固形分全体の30質量%以下とすることが好ましく、20質量%以下とすることがより好ましく、10質量%以下とすることがさらに好ましく、5質量%以下とすることがさらに好ましい。
 フィルム状接着剤は、通常は硬化剤を含有する。
 本発明の好ましい態様において、フィルム状接着剤は、エポキシ樹脂、高分子成分、硬化剤を含むことが好ましい。この場合、上記の通り、充填材を含有してもよい。各成分について説明する。
<Film-type adhesive>
The film-like adhesive constituting the film-like adhesive with dicing film of the present invention will be described.
Any conventional film-like adhesive can be used as long as it satisfies E1 and E2 above when combined with a dicing film and the cured product of the film-like adhesive has a light transmittance of 60% or more.
The film-like adhesive preferably contains an epoxy resin and a polymer component, more preferably contains an epoxy resin and a urethane resin or an epoxy resin and a phenoxy resin, and even more preferably contains an epoxy resin and a phenoxy resin.
The film-like adhesive may contain a filler. However, from the viewpoint of improving light transmittance, when the film-like adhesive contains a filler, the content of the filler is preferably 30 mass % or less of the total solid content of the film-like adhesive, more preferably 20 mass % or less, even more preferably 10 mass % or less, and even more preferably 5 mass % or less.
The film adhesive usually contains a curing agent.
In a preferred embodiment of the present invention, the film adhesive preferably contains an epoxy resin, a polymer component, and a curing agent. In this case, as described above, a filler may be contained. Each component will be described below.
-エポキシ樹脂-
 上記エポキシ樹脂は、エポキシ基を持つ熱硬化型の樹脂であり、エポキシ当量は1000g/eq以下である。エポキシ樹脂は液体、固体又は半固体のいずれであってもよい。本発明において液体とは、軟化点が25℃未満であることをいい、固体とは、軟化点が60℃以上であることをいい、半固体とは、軟化点が上記液体の軟化点と固体の軟化点との間(25℃以上60℃未満)にあることをいう。本発明で使用するエポキシ樹脂としては、好適な温度範囲(例えば60~120℃)で低溶融粘度に到達することができるフィルム状接着剤を得る観点から、軟化点が100℃以下であることが好ましい。なお、本発明において、軟化点とは、軟化点試験(環球式)法(測定条件:JIS-K7234 1986年に準拠)により測定した値である。
-Epoxy resin-
The epoxy resin is a thermosetting resin having an epoxy group, and has an epoxy equivalent of 1000 g/eq or less. The epoxy resin may be liquid, solid, or semi-solid. In the present invention, the term "liquid" refers to a resin having a softening point of less than 25°C, the term "solid" refers to a resin having a softening point of 60°C or more, and the term "semi-solid" refers to a resin having a softening point between the softening points of the liquid and the solid (25°C or more and less than 60°C). The epoxy resin used in the present invention preferably has a softening point of 100°C or less, from the viewpoint of obtaining a film-like adhesive that can reach a low melt viscosity in a suitable temperature range (for example, 60 to 120°C). In the present invention, the softening point is a value measured by a softening point test (ring and ball method) method (measurement conditions: in accordance with JIS-K7234 1986).
 本発明で使用するエポキシ樹脂において、熱硬化体の架橋密度を高める観点から、エポキシ当量は150~800g/eqであることが好ましい。なお、本発明において、エポキシ当量とは、1グラム当量のエポキシ基を含む樹脂のグラム数(g/eq)をいう。
 エポキシ樹脂の重量平均分子量は、通常、10000未満が好ましく、5000以下がより好ましい。下限値に特に制限はないが、300以上が実際的である。
 重量平均分子量は、GPC(Gel Permeation Chromatography)分析による値である。
In the epoxy resin used in the present invention, from the viewpoint of increasing the crosslink density of the thermoset, the epoxy equivalent is preferably 150 to 800 g/eq. In the present invention, the epoxy equivalent refers to the number of grams (g/eq) of a resin containing 1 gram equivalent of epoxy groups.
The weight average molecular weight of the epoxy resin is usually preferably less than 10,000, and more preferably not more than 5,000. There is no particular restriction on the lower limit, but a value of 300 or more is practical.
The weight average molecular weight is a value determined by GPC (Gel Permeation Chromatography) analysis.
 エポキシ樹脂の骨格としては、例えば、フェノールノボラック型、オルソクレゾールノボラック型、クレゾールノボラック型、ジシクロペンタジエン型、ビフェニル型、フルオレンビスフェノール型、トリアジン型、ナフトール型、ナフタレンジオール型、トリフェニルメタン型、テトラフェニル型、ビスフェノールA型、ビスフェノールF型、ビスフェノールAD型、ビスフェノールS型、及びトリメチロールメタン型等が挙げられる。このうち、樹脂の結晶性が低く、良好な外観を有するフィルム状接着剤を得る観点から、トリフェニルメタン型、ビスフェノールA型、クレゾールノボラック型、又はオルソクレゾールノボラック型が好ましい。これらは1種を単独で用いても、もしくは2種以上を組み合わせて用いてもよく、トリフェニルメタン型及びビスフェノールA型の組合せが好ましい。 Examples of the epoxy resin skeleton include phenol novolac type, orthocresol novolac type, cresol novolac type, dicyclopentadiene type, biphenyl type, fluorene bisphenol type, triazine type, naphthol type, naphthalene diol type, triphenylmethane type, tetraphenyl type, bisphenol A type, bisphenol F type, bisphenol AD type, bisphenol S type, and trimethylolmethane type. Of these, triphenylmethane type, bisphenol A type, cresol novolac type, and orthocresol novolac type are preferred from the viewpoint of obtaining a film-like adhesive with low resin crystallinity and good appearance. These may be used alone or in combination of two or more types, and a combination of triphenylmethane type and bisphenol A type is preferred.
 エポキシ樹脂の含有量は、フィルム状接着剤を構成する成分(具体的には、溶媒以外の成分、すなわち固形分)の総含有量100質量部中、25~80質量部が好ましく、30~80質量部がより好ましく、30~70質量部がさらに好ましく、40~70質量部がさらに好ましい。含有量を上記好ましい範囲内とすることにより、保存安定性及び透明性を高めることができる。また、上記好ましい上限値以下とすることにより、オリゴマー成分の生成を抑え、少しの温度変化ではフィルム状態(フィルムタック性等)の変化を生じにくくすることができる。
 エポキシ樹脂の含有量は、エポキシ樹脂と高分子成分の総含有量100質量部中、30~70質量部が好ましく、30~60質量部がより好ましい。
The content of the epoxy resin is preferably 25 to 80 parts by mass, more preferably 30 to 80 parts by mass, even more preferably 30 to 70 parts by mass, and even more preferably 40 to 70 parts by mass, per 100 parts by mass of the total content of the components constituting the film-like adhesive (specifically, the components other than the solvent, i.e., the solid content). By setting the content within the above preferred range, storage stability and transparency can be improved. Furthermore, by setting the content below the above preferred upper limit, the generation of oligomer components can be suppressed, and changes in the film state (film tackiness, etc.) due to slight temperature changes can be made less likely.
The content of the epoxy resin is preferably 30 to 70 parts by mass, and more preferably 30 to 60 parts by mass, per 100 parts by mass of the total content of the epoxy resin and the polymer component.
-高分子成分-
 上記高分子成分としては、フィルム状接着剤を形成した際に、常温(25℃)でのフィルムタック性(少しの温度変化でもフィルム状態が変化しやすい性質)を抑制し、十分な接着性及び造膜性(フィルム形成性)を付与する成分であればよい。天然ゴム、ブチルゴム、イソプレンゴム、クロロプレンゴム、エチレン-酢酸ビニル共重合体、ポリブタジエン樹脂、ポリカーボネート樹脂、熱可塑性ポリイミド樹脂、6-ナイロンや6,6-ナイロン等のポリアミド樹脂、フェノキシ樹脂、ポリエチレンテレフタレート及びポリブチレンテレフタレート等のポリエステル樹脂、ポリアミドイミド樹脂、フッ素樹脂、ポリウレタン樹脂等が挙げられる。これらの高分子成分は単独で用いてもよく、また2種以上を組み合わせて用いてもよい。高分子成分としては、フェノキシ樹脂、及びポリウレタン樹脂の少なくとも一種が好ましい。
- Polymer components -
The polymer component may be any component that, when a film-like adhesive is formed, suppresses film tackiness (the property of film state being easily changed even by a slight change in temperature) at room temperature (25°C) and imparts sufficient adhesiveness and film-forming properties (film-forming properties). Examples of the polymer component include natural rubber, butyl rubber, isoprene rubber, chloroprene rubber, ethylene-vinyl acetate copolymer, polybutadiene resin, polycarbonate resin, thermoplastic polyimide resin, polyamide resin such as 6-nylon and 6,6-nylon, phenoxy resin, polyester resin such as polyethylene terephthalate and polybutylene terephthalate, polyamideimide resin, fluororesin, polyurethane resin, etc. These polymer components may be used alone or in combination of two or more. As the polymer component, at least one of phenoxy resin and polyurethane resin is preferable.
 高分子成分の重量平均分子量は、10000以上である。上限値に特に制限はないが、5000000以下が実際的である。
 上記高分子成分の重量平均分子量は、GPC〔ゲル浸透クロマトグラフィー(Gel Permeation Chromatography)〕によるポリスチレン換算で求めた値である。以降、具体的な高分子成分の重量平均分子量の値も同義である。
 また、上記高分子成分のガラス転移温度(Tg)は、100℃未満が好ましく、90℃未満がより好ましい。下限は、0℃以上が好ましく、10℃以上がより好ましい。したがって、高分子成分のガラス転移温度(Tg)は0℃以上100℃未満が好ましい。
 上記高分子成分のガラス転移温度は、昇温速度0.1℃/分で示差走査熱量計(DSC)により測定されたガラス転移温度である。より詳細には、-100℃~100℃まで昇温速度0.1℃/分で昇温し、JIS K7121:2012「プラスチックの転移温度測定方法」の、補外ガラス転移開始温度をガラス転移温度とした。以降、具体的な高分子成分のガラス転移温度の値も同義である。
 なお、本発明においてエポキシ樹脂と高分子成分のうちフェノキシ樹脂等のエポキシ基を有し得る樹脂とは、エポキシ当量が1000g/eq以下である樹脂がエポキシ樹脂に、エポキシ当量が1000g/eqを越えるものが高分子成分に、それぞれ分類される。
The weight average molecular weight of the polymer component is at least 10,000. There is no particular upper limit, but a value of 5,000,000 or less is practical.
The weight average molecular weight of the polymer component is a value determined by GPC (gel permeation chromatography) in terms of polystyrene. Hereinafter, the weight average molecular weight of a specific polymer component has the same meaning.
The glass transition temperature (Tg) of the polymer component is preferably less than 100° C., and more preferably less than 90° C. The lower limit is preferably 0° C. or higher, and more preferably 10° C. or higher. Therefore, the glass transition temperature (Tg) of the polymer component is preferably 0° C. or higher and less than 100° C.
The glass transition temperature of the polymer component is a glass transition temperature measured by a differential scanning calorimeter (DSC) at a temperature increase rate of 0.1°C/min. More specifically, the temperature was increased from -100°C to 100°C at a temperature increase rate of 0.1°C/min, and the extrapolated glass transition onset temperature according to JIS K7121:2012 "Method for measuring transition temperature of plastics" was used as the glass transition temperature. Hereinafter, the glass transition temperature value of a specific polymer component has the same meaning.
In the present invention, among the epoxy resins and polymer components, resins that may have an epoxy group, such as phenoxy resins, are classified as follows: resins having an epoxy equivalent of 1000 g/eq or less are classified as epoxy resins, and resins having an epoxy equivalent of more than 1000 g/eq are classified as polymer components.
(フェノキシ樹脂)
 フェノキシ樹脂は、エポキシ樹脂と構造が類似していることから相溶性が良好な点で、高分子成分として好ましい。フェノキシ樹脂を含有すると、接着性にも優れた効果を発揮することができる。
 フェノキシ樹脂は常法により得ることができる。例えば、フェノキシ樹脂は、ビスフェノールもしくはビフェノール化合物とエピクロルヒドリンのようなエピハロヒドリンとの反応、液状エポキシ樹脂とビスフェノールもしくはビフェノール化合物との反応で得ることができる。
(Phenoxy resin)
Phenoxy resin is preferred as a polymer component because it has a similar structure to epoxy resin and is therefore compatible with epoxy resin. When phenoxy resin is contained, it can also exhibit excellent adhesive properties.
The phenoxy resin can be obtained by a conventional method, for example, by reacting a bisphenol or biphenol compound with an epihalohydrin such as epichlorohydrin, or by reacting a liquid epoxy resin with a bisphenol or biphenol compound.
 フェノキシ樹脂の重量平均分子量は、10000以上が好ましく、10000~100000がより好ましい。
 また、フェノキシ樹脂中に僅かに残存するエポキシ基の量は、エポキシ当量で、5000g/eq以上が好ましい。
The weight average molecular weight of the phenoxy resin is preferably 10,000 or more, and more preferably 10,000 to 100,000.
The amount of epoxy groups remaining in the phenoxy resin in small amounts is preferably 5,000 g/eq or more in terms of epoxy equivalent.
 フェノキシ樹脂のガラス転移温度(Tg)は、100℃未満が好ましく、90℃未満がより好ましい。下限は、0℃以上が好ましく、10℃以上がより好ましい。したがって、フェノキシ樹脂のガラス転移温度(Tg)は0℃以上100℃未満が好ましい。 The glass transition temperature (Tg) of the phenoxy resin is preferably less than 100°C, and more preferably less than 90°C. The lower limit is preferably 0°C or higher, and more preferably 10°C or higher. Therefore, the glass transition temperature (Tg) of the phenoxy resin is preferably 0°C or higher and less than 100°C.
(ポリウレタン樹脂)
 ポリウレタン樹脂は、主鎖中にウレタン(カルバミド酸エステル)結合を持つ重合体である。ポリウレタン樹脂は、ポリオール由来の構成単位と、ポリイソシアネート由来の構成単位とを有し、さらにポリカルボン酸由来の構成単位を有していてもよい。ポリウレタン樹脂は、1種を単独で又は2種以上を組み合わせて用いてもよい。
 ポリウレタン樹脂のTgは通常は100℃以下であり、60℃以下が好ましく、50℃以下がより好ましく、45℃以下であることも好ましい。
(Polyurethane resin)
The polyurethane resin is a polymer having a urethane (carbamic acid ester) bond in the main chain. The polyurethane resin has a structural unit derived from a polyol and a structural unit derived from a polyisocyanate, and may further have a structural unit derived from a polycarboxylic acid. The polyurethane resin may be used alone or in combination of two or more kinds.
The Tg of the polyurethane resin is usually 100° C. or less, preferably 60° C. or less, more preferably 50° C. or less, and also preferably 45° C. or less.
 ポリウレタン樹脂の重量平均分子量は特に制限されず、通常は5000~500000の範囲内にあるものが用いられる。 There are no particular restrictions on the weight-average molecular weight of the polyurethane resin, but those in the range of 5,000 to 500,000 are usually used.
 ポリウレタン樹脂は、常法により合成でき、また、市場から入手することもできる。ポリウレタン樹脂として適用できる市販品として、ダイナレオVA-9320M、ダイナレオVA-9310MF、ダイナレオVA-9303MF(いずれもトーヨーケム社製)などを挙げることができる。 Polyurethane resins can be synthesized by standard methods and are also available on the market. Commercially available products that can be used as polyurethane resins include Dynaleo VA-9320M, Dynaleo VA-9310MF, and Dynaleo VA-9303MF (all manufactured by Toyochem Co., Ltd.).
 エポキシ樹脂100質量部に対する高分子成分の含有量は、1~250質量部が好ましく、10~180質量部がより好ましく、40~150質量部がさらに好ましい。含有量をこのような範囲とすることで、硬化前のフィルム状接着剤の剛性と柔軟性を調整することができる。フィルム状態が良好(フィルムタック性が低減)となり、フィルム脆弱性も抑制することができる。
 高分子成分の含有量は、エポキシ樹脂と高分子成分の総含有量100質量部中、30~70質量部が好ましく、40~70質量部がより好ましい。
The content of the polymer component relative to 100 parts by mass of the epoxy resin is preferably 1 to 250 parts by mass, more preferably 10 to 180 parts by mass, and even more preferably 40 to 150 parts by mass. By setting the content within such a range, it is possible to adjust the rigidity and flexibility of the film-like adhesive before curing. The film condition becomes good (film tackiness is reduced), and film brittleness can also be suppressed.
The content of the polymer component is preferably 30 to 70 parts by mass, and more preferably 40 to 70 parts by mass, per 100 parts by mass of the total content of the epoxy resin and the polymer component.
-硬化剤-
 硬化剤は、本発明で規定する上記の光透過率の制御に影響する成分である。上記の光透過率の制御を考慮して、上記硬化剤を選択することが好ましい。
- Hardener -
The curing agent is a component that affects the control of the light transmittance defined in the present invention. It is preferable to select the curing agent in consideration of the control of the light transmittance.
 硬化剤として、例えば、アミン類、酸無水物類、及び多価フェノール類等が挙げられる。フィルム状接着剤の保存安定性の観点からは、潜在性硬化剤を用いることが好ましい。潜在性硬化剤としては、例えば、ジシアンジアミド化合物、イミダゾール化合物、硬化触媒複合系多価フェノール化合物、ヒドラジド化合物、三弗化ホウ素-アミン錯体、アミンイミド化合物、ポリアミン塩、及びこれらの変性物やマイクロカプセル型のものを挙げることができ、これらは1種を単独で用いても、もしくは2種以上を組み合わせて用いてもよい。なかでもジシアンジアミド化合物、イミダゾール化合物、及びヒドラジド化合物の少なくとも1種を用いることが好ましい。
 潜在性硬化剤は、熱カチオン重合開始剤であってもよく、カチオン成分としてスルホニウムカチオンを、アニオン成分としてSbF 又はPF を有する熱カチオン重合開始剤がより好ましい。
Examples of the curing agent include amines, acid anhydrides, and polyhydric phenols. From the viewpoint of storage stability of the film-like adhesive, it is preferable to use a latent curing agent. Examples of the latent curing agent include dicyandiamide compounds, imidazole compounds, curing catalyst composite polyhydric phenol compounds, hydrazide compounds, boron trifluoride-amine complexes, amine imide compounds, polyamine salts, and modified products and microcapsule-type products thereof, which may be used alone or in combination of two or more. Among them, it is preferable to use at least one of dicyandiamide compounds, imidazole compounds, and hydrazide compounds.
The latent curing agent may be a thermal cationic polymerization initiator, and more preferably a thermal cationic polymerization initiator having a sulfonium cation as the cationic component and SbF 6 - or PF 6 - as the anionic component.
 エポキシ樹脂100質量部に対する硬化剤の含有量は、十分な硬化速度を示し、かつ硬化後の透明性を確保する観点から、0.5~50質量部が好ましく、1~40質量部がより好ましく、1~30質量部がさらに好ましく、1~10質量部がさらに好ましく、1~5質量部がさらに好ましい。 The content of the curing agent per 100 parts by mass of the epoxy resin is preferably 0.5 to 50 parts by mass, more preferably 1 to 40 parts by mass, even more preferably 1 to 30 parts by mass, even more preferably 1 to 10 parts by mass, and even more preferably 1 to 5 parts by mass, from the viewpoint of exhibiting a sufficient curing speed and ensuring transparency after curing.
-充填材-
 充填材は、上記光透過率が達成できれば、フィルム状接着剤に通常使用され得る充填材を特に制限なく用いることができる。充填材は、無機充填材であることが好ましい。
 無機充填材としては、例えば、シリカ、クレー、石膏、炭酸カルシウム、硫酸バリウム、アルミナ(酸化アルミニウム)、酸化ベリリウム、酸化マグネシウム、炭化ケイ素、窒化ケイ素、窒化アルミニウム、窒化ホウ素等のセラミック類、アルミニウム、銅、銀、金、ニッケル、クロム、鉛、錫、亜鉛、パラジウム、半田等の金属、又は合金類、カーボンナノチューブ、グラフェン等のカーボン類等の種々の無機粉末が挙げられる。
 充填材としてはシリカが好ましい。
-Filling material-
As the filler, any filler that can be normally used in a film-like adhesive can be used without any particular limitation, so long as the above-mentioned light transmittance can be achieved. The filler is preferably an inorganic filler.
Examples of inorganic fillers include ceramics such as silica, clay, gypsum, calcium carbonate, barium sulfate, alumina (aluminum oxide), beryllium oxide, magnesium oxide, silicon carbide, silicon nitride, aluminum nitride, and boron nitride; metals or alloys such as aluminum, copper, silver, gold, nickel, chromium, lead, tin, zinc, palladium, and solder; and carbons such as carbon nanotubes and graphene. Examples of inorganic fillers include various inorganic powders.
The filler is preferably silica.
 充填材の粒径(d50)は特に限定されず、光透過性を高める観点から、500nm以下であることが好ましい。粒径は、1~500nmが好ましく、10~500nmがより好ましく、10~499nmがさらに好ましく、10~450nmがさらに好ましく、10~350nmがさらに好ましく、10~200nmがさらに好ましく、10~100nmがさらに好ましい。粒径(d50)とは、いわゆるメジアン径であり、レーザー回折・散乱法により粒度分布を測定し、累積分布において粒子の全体積を100%としたときに50%累積となるときの粒径を意味する。 The particle size (d50) of the filler is not particularly limited, but from the viewpoint of increasing light transmittance, it is preferably 500 nm or less. The particle size is preferably 1 to 500 nm, more preferably 10 to 500 nm, even more preferably 10 to 499 nm, even more preferably 10 to 450 nm, even more preferably 10 to 350 nm, even more preferably 10 to 200 nm, and even more preferably 10 to 100 nm. The particle size (d50) is the so-called median diameter, and refers to the particle size at which the particle size distribution is measured by a laser diffraction/scattering method, and the cumulative distribution is 50% when the total volume of the particles is 100%.
-その他の成分-
 フィルム状接着剤は、エポキシ樹脂、硬化剤、高分子成分、充填材の他に、本発明の効果を損なわない範囲で、イオントラップ剤(イオン捕捉剤)、硬化触媒、粘度調整剤、酸化防止剤、難燃剤、及び着色剤等をさらに含有していてもよい。例えば、国際公開第2017/158994号のその他の添加物を含むことができる。
 なお、接着信頼性の観点からは、フィルム状接着剤は、染料や顔料などの着色剤を含有しないことが好ましい。また、充填材を含有しない形態であることも好ましい。
 フィルム状接着剤に含まれるエポキシ樹脂及び高分子成分の合計含有量は、50質量%以上が好ましく、60質量%以上がより好ましく、70質量%以上がさらに好ましく、80質量%以上とすることも好ましい。
-Other ingredients-
In addition to the epoxy resin, the curing agent, the polymer component, and the filler, the film-like adhesive may further contain an ion trapping agent (ion capture agent), a curing catalyst, a viscosity modifier, an antioxidant, a flame retardant, a colorant, etc., within a range that does not impair the effects of the present invention. For example, it may contain other additives described in WO 2017/158994.
From the viewpoint of adhesive reliability, it is preferable that the film adhesive does not contain a colorant such as a dye or pigment, and it is also preferable that the film adhesive does not contain a filler.
The total content of the epoxy resin and polymer component contained in the film-like adhesive is preferably 50% by mass or more, more preferably 60% by mass or more, even more preferably 70% by mass or more, and even more preferably 80% by mass or more.
-フィルム状接着剤の厚み-
 フィルム状接着剤の厚さは特に制限されず、目的に応じて適宜に設定することができる。フィルム状接着剤は、厚さを例えば1~30μmとすることができ、1~25μmとすることも好ましく、1~20μmとすることも好ましく、2~20μmとすることも好ましく、3~20μmとすることも好ましく、4~20μmとすることも好ましい。フィルム状接着剤の厚みは、接触・リニアゲージ方式(卓上型接触式厚み計測装置)により測定することができる。
-Thickness of film adhesive-
The thickness of the film-like adhesive is not particularly limited and can be appropriately set depending on the purpose. The thickness of the film-like adhesive can be, for example, 1 to 30 μm, preferably 1 to 25 μm, preferably 1 to 20 μm, preferably 2 to 20 μm, preferably 3 to 20 μm, and preferably 4 to 20 μm. The thickness of the film-like adhesive can be measured by a contact linear gauge method (desktop contact thickness measuring device).
<ダイシングフィルム付きフィルム状接着剤の製造>
 ダイシングフィルム付きフィルム状接着剤の製造方法は、ダイシングフィルムとフィルム状接着剤とを積層した構造とできれば特に制限されない。
 例えば、離型処理した剥離ライナー上に粘着剤を含む塗布液を塗布し、乾燥することにより粘着剤層を形成し、粘着剤層と基材とを貼り合わせることによって、基材、粘着剤層、剥離ライナーが順に積層された積層体を得る。これとは別に、剥離フィルム(剥離ライナーと同義であるが、便宜上、ここでは表現を変えている。)上にフィルム状接着剤形成用組成物を塗布し、乾燥して剥離フィルム上にフィルム状接着剤を形成する。次いで、剥離ライナーを剥がして粘着剤層を露出させたダイシングフィルムとフィルム状接着剤とが接するようにして、ダイシングフィルムとフィルム状接着剤を貼り合わせることによって、基材、粘着剤層、フィルム状接着剤、剥離フィルムが順に積層されたダイシングフィルム付きフィルム状接着剤を得ることができる。
 上記のダイシングフィルムとダイアタッチフィルムとの貼り合わせは、加圧条件下で行うことが好ましい。
 上記のダイシングフィルムとフィルム状接着剤との貼り合わせにおいて、ダイシングフィルムの形状は、リングフレームの開口部を覆うことができる限り特に制限されず、円形状であることが好ましい。フィルム状接着剤の形状も、ウエハの裏面を覆うことができる限り特に制限されず、円形状であることが好ましい。ダイシングフィルムはフィルム状接着剤よりも大きく、接着剤層の周囲に粘着剤層が露出した部分を有する形状であることが好ましい。このように、所望の形状に裁断されたダイシングフィルム及びフィルム状接着剤を貼り合わせることが好ましい。
 上記のようにして作製したダイシングフィルム付きフィルム状接着剤は、使用時には、剥離フィルムを剥離して使用する。
<Production of film-like adhesive with dicing film>
The method for producing the film-like adhesive with a dicing film is not particularly limited as long as it can provide a structure in which a dicing film and a film-like adhesive are laminated together.
For example, a coating liquid containing an adhesive is applied onto a release-treated release liner, dried to form an adhesive layer, and then the adhesive layer and a substrate are laminated together to obtain a laminate in which the substrate, adhesive layer, and release liner are laminated in order. Separately, a film-like adhesive forming composition is applied onto a release film (synonymous with release liner, but for convenience, the expression is changed here), and dried to form a film-like adhesive on the release film. Next, the release liner is peeled off to expose the adhesive layer, and the dicing film and the film-like adhesive are bonded together to obtain a film-like adhesive with a dicing film in which the substrate, adhesive layer, film-like adhesive, and release film are laminated in order.
The above-mentioned dicing film and die attach film are preferably bonded together under pressure.
In the above-mentioned lamination of the dicing film and the film-like adhesive, the shape of the dicing film is not particularly limited as long as it can cover the opening of the ring frame, and is preferably circular. The shape of the film-like adhesive is also not particularly limited as long as it can cover the back surface of the wafer, and is preferably circular. The dicing film is preferably larger than the film-like adhesive, and has a shape having a portion where the pressure-sensitive adhesive layer is exposed around the adhesive layer. In this way, it is preferable to laminate the dicing film and the film-like adhesive cut into the desired shape.
When the film-like adhesive with a dicing film produced as described above is used, the release film is peeled off.
 フィルム状接着剤の形成についてさらに説明する。
 フィルム状接着剤は、フィルム状接着剤を構成する各成分を、エポキシ樹脂が事実上、熱硬化しない温度において混合してなる組成物(フィルム状接着剤形成用組成物(ワニス))を用いて成膜することにより得ることができる。混合の順は特に限定されない。例えば、エポキシ樹脂、高分子成分等の樹脂成分を必要に応じて溶媒と共に混合し、その後、硬化剤を混合してもよい。この場合、硬化剤の存在下における混合を、エポキシ樹脂が事実上、熱硬化しない温度で行えばよく、硬化剤の非存在下での樹脂成分の混合はより高い温度で行ってもよい。
 上記のフィルム状接着剤形成用組成物を用いた成膜は、例えば、離型処理された基材(離型フィルム又は剥離フィルムとも称す)上にフィルム状接着剤形成用組成物を塗布し、必要に応じて乾燥させて形成することができる。
 離型フィルムとしては、得られるフィルム状接着剤のカバーフィルムとして機能するものであればよく、通常のものを適宜採用することができる。例えば、離型処理されたポリプロピレン(PP)、離型処理されたポリエチレン(PE)、及び離型処理されたポリエチレンテレフタレート(PET)が挙げられる。
 塗工方法としては、通常の方法を適宜採用することができ、例えば、ロールナイフコーター、グラビアコーター、ダイコーター、及びリバースコーター等を用いた方法が挙げられる。
 乾燥は、エポキシ樹脂が実質的に硬化せずに、フィルム状接着剤形成用組成物から有機溶媒を除去してフィルム状接着剤が得られればよく、例えば、80~150℃の温度で1~20分保持することにより行うことができる。
The formation of the film-like adhesive will now be described in further detail.
The film-like adhesive can be obtained by forming a film using a composition (film-like adhesive-forming composition (varnish)) in which each component constituting the film-like adhesive is mixed at a temperature at which the epoxy resin does not actually cure by heat. The order of mixing is not particularly limited. For example, resin components such as epoxy resin and polymer component may be mixed together with a solvent as necessary, and then a curing agent may be mixed. In this case, mixing in the presence of the curing agent may be performed at a temperature at which the epoxy resin does not actually cure by heat, and mixing of the resin components in the absence of the curing agent may be performed at a higher temperature.
A film can be formed using the above-mentioned film-like adhesive-forming composition, for example, by applying the film-like adhesive-forming composition onto a release-treated substrate (also called a release film or peeling film) and drying it as necessary.
The release film may be any film that functions as a cover film for the resulting film-like adhesive, and any conventional film may be appropriately used. Examples of the release film include release-treated polypropylene (PP), release-treated polyethylene (PE), and release-treated polyethylene terephthalate (PET).
As the coating method, a conventional method can be appropriately adopted, and examples thereof include methods using a roll knife coater, a gravure coater, a die coater, and a reverse coater.
Drying may be performed by removing the organic solvent from the film-like adhesive-forming composition without substantially curing the epoxy resin to obtain a film-like adhesive, and may be performed, for example, by maintaining the composition at a temperature of 80 to 150°C for 1 to 20 minutes.
 フィルム状接着剤は、少なくとも一方の面に上述の離型フィルムなどが貼り合わされてなる形態とすることができる。この場合、離型フィルムはフィルム状接着剤を構成するものではなく、フィルム状接着剤に積層されているとしてみる。つまり、フィルム状接着剤の少なくとも一方の面に上述の離型フィルムなどが貼り合わされてなる形態において、フィルム状接着剤の厚みを説明している場合には、当該厚みには離型フィルム等の厚みは含まれない。すなわち、本発明においてフィルム状接着剤の厚みは、フィルム状接着剤形成用組成物に由来する層の厚みである。 The film-like adhesive can be in a form in which the above-mentioned release film or the like is laminated to at least one surface. In this case, the release film does not constitute the film-like adhesive, but is considered to be laminated to the film-like adhesive. In other words, when describing the thickness of a film-like adhesive in a form in which the above-mentioned release film or the like is laminated to at least one surface of the film-like adhesive, the thickness does not include the thickness of the release film or the like. In other words, the thickness of the film-like adhesive in this invention is the thickness of the layer derived from the film-like adhesive-forming composition.
 フィルム状接着剤は、エポキシ樹脂の熱硬化をより確実に抑制する観点から、使用前には10℃以下の温度条件下で保管されることが好ましい。 In order to more reliably suppress the thermal curing of the epoxy resin, it is preferable to store the film adhesive at a temperature of 10°C or less before use.
 本発明のダイシングフィルム付きフィルム状接着剤は、さらに、離型フィルムなどが積層されていてもよい。
 本発明のダイシングフィルム付きフィルム状接着剤は、このような積層フィルムとすることにより、この積層フィルムのフィルム状接着剤側に、例えば、透明保護フィルム等の透明フィルム状部材(被着体)を密着させ、これを、ダイシングフィルムを介して固定化し、前記透明フィルム状部材をフィルム状接着剤ごと所望のサイズに切断(ダイシング)することが可能となる。結果、ダイシングフィルム上に、所望のサイズに切断された接着剤層付き透明フィルム状チップを得ることができる。次いで、接着剤層付き透明フィルム状チップをダイシングフィルムから剥離し、接着剤層を介して透明フィルム状チップを電子部品に組み込むことができる。この電子部品への組み込みを熱圧着等により行い、次いで接着剤層を熱硬化することにより、硬化反応に伴い、例えば固形状の硬化剤が反応するなどして、接着剤の透明性を高めることが可能となる。
 上記熱圧着の条件は、エポキシ樹脂が事実上、熱硬化しない温度で行う。一例を挙げれば、70℃、圧力0.3MPa程度の条件が挙げられる。
 上記熱硬化反応は、フィルム状接着剤の熱硬化開始温度以上で行えばよい。熱硬化開始温度は、使用するエポキシ樹脂、高分子成分及びエポキシ硬化剤の種類により異なり、一概に言えるものではないが、例えば、100~180℃が好ましく、短時間の硬化を実現する観点から、140~180℃がより好ましい。温度が熱硬化開始温度未満であると、熱硬化反応が十分に進まず、接着剤層の強度が低下する傾向にある。他方、硬化反応の温度が高すぎると硬化反応中にフィルム状接着剤中の硬化剤、及び添加剤等が揮発して発泡しやすくなる傾向にある。また、硬化処理の時間は、例えば、10~120分間が好ましい。
 上述した実施形態に関し、本発明によれば、次に示す電子部品の製造方法が提供される。
The film-like adhesive with a dicing film of the present invention may further be laminated with a release film or the like.
By forming the film-like adhesive with dicing film of the present invention into such a laminated film, a transparent film-like member (adherend) such as a transparent protective film is adhered to the film-like adhesive side of the laminated film, and the transparent film-like member is fixed via a dicing film, and the transparent film-like member can be cut (diced) to a desired size together with the film-like adhesive. As a result, a transparent film-like chip with an adhesive layer cut to a desired size can be obtained on the dicing film. Next, the transparent film-like chip with the adhesive layer is peeled off from the dicing film, and the transparent film-like chip can be incorporated into an electronic component via the adhesive layer. This incorporation into the electronic component is performed by thermocompression bonding or the like, and then the adhesive layer is thermally cured, and the transparency of the adhesive can be increased by, for example, reacting with a solid curing agent in association with the curing reaction.
The thermocompression bonding is carried out at a temperature at which the epoxy resin is not substantially cured, for example at about 70° C. and a pressure of about 0.3 MPa.
The above-mentioned heat curing reaction may be carried out at a temperature equal to or higher than the heat curing initiation temperature of the film-like adhesive. The heat curing initiation temperature varies depending on the type of epoxy resin, polymer component, and epoxy curing agent used, and cannot be generally stated, but for example, 100 to 180°C is preferable, and from the viewpoint of realizing curing in a short time, 140 to 180°C is more preferable. If the temperature is lower than the heat curing initiation temperature, the heat curing reaction does not proceed sufficiently, and the strength of the adhesive layer tends to decrease. On the other hand, if the temperature of the curing reaction is too high, the curing agent and additives in the film-like adhesive tend to volatilize during the curing reaction and foam easily. In addition, the time of the curing treatment is preferably, for example, 10 to 120 minutes.
In relation to the above-described embodiment, the present invention provides the following method for manufacturing an electronic component.
 電子部品の製造方法であって、
 透明フィルム状部材と、本発明のダイシングフィルム付きフィルム状接着剤とがこの順に積層された積層体を得る第1の工程と、
 前記透明フィルム状部材と前記フィルム状接着剤とを一体にダイシングすることにより、前記ダイシングフィルム上に、接着剤層付き透明フィルム状チップを得る第2の工程と、
 前記接着剤層から前記ダイシングフィルムを取り除き、前記接着剤層付き透明フィルム状チップと電子部品を構成する他の部材とを前記接着剤層を介して熱圧着する第3の工程と、
 前記接着剤層を熱硬化する第4の工程と、
を含む電子部品の製造方法。
A method for manufacturing an electronic component, comprising:
A first step of obtaining a laminate in which a transparent film-like member and a film-like adhesive with a dicing film of the present invention are laminated in this order;
a second step of dicing the transparent film-like member and the film-like adhesive together to obtain a transparent film-like chip with an adhesive layer on the dicing film;
a third step of removing the dicing film from the adhesive layer and thermocompression bonding the transparent film-like chip with the adhesive layer and other members constituting an electronic component via the adhesive layer;
a fourth step of thermally curing the adhesive layer;
A method for manufacturing an electronic component comprising the steps of:
 上記製造方法により得られる電子部品は、透明フィルム状チップが、フィルム状接着剤の熱硬化体を介して電子部品中に組み込まれた構造を含む。
 本発明において「透明フィルム状チップ」とは、所望の形状に加工された透明フィルムを意味する。典型的には、ガラス基板や透明樹脂等の透明フィルム状部材を、電子部品に組み込むために所望の形状に切り出したものである。
The electronic component obtained by the above-mentioned manufacturing method has a structure in which a transparent film-like chip is incorporated in the electronic component via a thermoset of the film-like adhesive.
In the present invention, the term "transparent film chip" refers to a transparent film processed into a desired shape. Typically, a transparent film member such as a glass substrate or transparent resin is cut into a desired shape for incorporation into an electronic component.
 上記の電子部品の一例として、イメージセンサ(撮像素子)が挙げられる。この場合、上記電子部品に組み込まれる透明フィルム状チップはフォトダイオードの保護フィルムであることが好ましい。 An example of the electronic component is an image sensor (imaging element). In this case, the transparent film-like chip incorporated in the electronic component is preferably a protective film for a photodiode.
 なお、上記は透明フィルム状部材の好ましい一実施形態を説明したものであり、本発明は、本発明で規定すること以外は、これらの実施形態に何ら限定されるものではない。例えば、上記電子部品として、光学レンズ、光ファイバー、光導波路、光アイソレータ、及び半導体レーザー等の光学デバイスに用いられる部材なども好ましく挙げることができる。 The above describes a preferred embodiment of the transparent film-like member, and the present invention is not limited to these embodiments except as specified in the present invention. For example, preferred examples of the electronic components include optical lenses, optical fibers, optical waveguides, optical isolators, and members used in optical devices such as semiconductor lasers.
 本発明を、実施例及び比較例に基づき、より具体的に説明するが、本発明は以下の実施形態に限定されるものではない。
 下記記載において、室温とは25℃を意味する。また、「MEK」はメチルエチルケトン、「PET」はポリエチレンテレフタレートである。
The present invention will be described more specifically based on examples and comparative examples, but the present invention is not limited to the following embodiments.
In the following description, room temperature means 25° C. Additionally, “MEK” is methyl ethyl ketone, and “PET” is polyethylene terephthalate.
 各実施例及び比較例として、図1に示す剥離フィルム付フィルム状接着剤を調製した。 For each example and comparative example, a film-like adhesive with a release film as shown in Figure 1 was prepared.
[ダイシングフィルムの作製]
<基材の準備>
(基材X)
 エチレン-メタアクリル酸共重合体の亜鉛アイオノマー樹脂(商品名:ハイミラン1855、三井・デュポンケミカル株式会社製)を200℃で溶融し、押出機を用いて厚さ90μmの基材Xを作製した。基材Xの片面にはコロナ処理を施した。
(基材Y)
 エチレン-メタアクリル酸共重合体の亜鉛アイオノマー樹脂(商品名:ハイミランAM7326、三井・デュポンケミカル株式会社製)を200℃で溶融し、押出機を用いて厚さ90μmの基材Yを作製した。基材Yの片面にはコロナ処理を施した。
(基材Z)
 エチレン-メタアクリル酸共重合体(商品名:ニュクレルN0200H、三井・デュポンケミカル株式会社製)を200℃で溶融し、押出機を用いて厚さ90μmの基材Zを作製した。基材Zの片面にはコロナ処理を施した。
[Preparation of dicing film]
<Preparation of substrate>
(Substrate X)
A zinc ionomer resin of ethylene-methacrylic acid copolymer (product name: Himilan 1855, manufactured by DuPont-Mitsui Chemical Co., Ltd.) was melted at 200° C. and used in an extruder to prepare a substrate X having a thickness of 90 μm. One side of the substrate X was subjected to a corona treatment.
(Substrate Y)
A zinc ionomer resin of ethylene-methacrylic acid copolymer (product name: Himilan AM7326, manufactured by DuPont-Mitsui Chemical Co., Ltd.) was melted at 200° C. and used in an extruder to prepare a substrate Y having a thickness of 90 μm. One side of the substrate Y was subjected to a corona treatment.
(Substrate Z)
An ethylene-methacrylic acid copolymer (product name: Nucrel N0200H, manufactured by DuPont-Mitsui Chemical Co., Ltd.) was melted at 200° C. and used in an extruder to prepare a substrate Z having a thickness of 90 μm. One side of the substrate Z was subjected to a corona treatment.
<ダイシングフィルムA>
 ブチルアクリレート65質量部、2-ヒドロキシエチルアクリレート25質量部、及びアクリル酸10質量部をラジカル重合させ、さらに、2-イソシアネートエチルメタクリレートを滴下しながら反応させて、重量平均分子量80万のアクリル共重合体を得た。このアクリル共重合体100質量部に対して、硬化剤としてポリイソシアネート3質量部、光重合開始剤として1-ヒドロキシ-シクロヘキシル-フェニル-ケトン1質量部を加えて混合し、粘着剤層組成物を得た。
 次に、粘着剤層組成物を乾燥膜厚が10μmとなるように離型処理した剥離ライナーに塗工し、120℃で3分間乾燥させて粘着剤層を得た。この粘着剤層を基材Xのコロナ処理を施した面上に貼り合わせ、剥離ライナー付きの、基材と粘着剤層を有するダイシングフィルムAを作製した。
<Dicing film A>
65 parts by mass of butyl acrylate, 25 parts by mass of 2-hydroxyethyl acrylate, and 10 parts by mass of acrylic acid were radically polymerized, and further reacted while adding 2-isocyanatoethyl methacrylate dropwise to obtain an acrylic copolymer having a weight average molecular weight of 800,000. 3 parts by mass of polyisocyanate as a curing agent and 1 part by mass of 1-hydroxy-cyclohexyl-phenyl-ketone as a photopolymerization initiator were added to 100 parts by mass of this acrylic copolymer and mixed to obtain a pressure-sensitive adhesive layer composition.
Next, the pressure-sensitive adhesive layer composition was applied to a release-treated release liner so as to give a dry film thickness of 10 μm, and dried for 3 minutes at 120° C. to obtain a pressure-sensitive adhesive layer. This pressure-sensitive adhesive layer was attached to the corona-treated surface of substrate X to produce dicing film A having a substrate and a pressure-sensitive adhesive layer with a release liner.
<ダイシングフィルムB>
 用いる基材を基材Yに変えたこと以外はダイシングフィルムAと同様にして、ダイシングフィルムBを作製した。
<Dicing film B>
Dicing film B was produced in the same manner as dicing film A, except that the substrate used was changed to substrate Y.
<ダイシングフィルムC>
 用いる基材を基材Zに変えたこと以外はダイシングフィルムAと同様にして、ダイシングフィルムCを作製した。
<Dicing film C>
Dicing film C was produced in the same manner as dicing film A, except that the substrate Z was used instead.
[ダイシングフィルム付きフィルム状接着剤の作製]
 フィルム状接着剤の調製に使用した成分を以下に示す。
<使用材料>
(エポキシ樹脂)
・828(ビスフェノールA型エポキシ樹脂、三菱ケミカル株式会社製、エポキシ当量190g/eq、比重1.17)
・ST-3000(水添ビスフェノールA型エポキシ樹脂、日鉄ケミカル&マテリアル株式会社製)
・YDCN-703(クレゾールノボラック型エポキシ樹脂、東都化成株式会社製、エポキシ当量210g/eq、分子量1200、軟化点80℃)
(フェノキシ樹脂)
・1256(フェノキシ樹脂、三菱ケミカル株式会社製、エポキシ当量7500g/eq)
(ウレタン樹脂)
・ダイナレオVA-9320M(ウレタン樹脂溶液、重量平均分子量:120000、Tg:39℃、常温弾性率:594MPa、溶媒:MEK/IPA混合溶媒、トーヨーケム(株)製)(表中では、VA-9320Mと記載)
(アクリル樹脂)
・SG-P3(アクリル樹脂、ナガセケムテックス株式会社製、重量平均分子量85万、ガラス転移温度10℃)
(硬化剤)
・2PHZ-PW(イミダゾール系硬化剤、四国化成(株)製)
・SI-150(熱カチオン重合開始剤、三新化学株式会社製)
(フェノール樹脂)
・ミレックスXLC-LL(フェノール樹脂、三井化学株式会社製、水酸基当量175g/eq)
(充填材)
・RY-200(ナノシリカフィラー、日本アエロジル株式会社製、粒径(d50):12nm、モース硬度:7Mohs、熱伝導率:1W/m・K)
・S0-C2(シリカフィラー、アドマファイン株式会社製、比重2.2g/cm、モース硬度:7Mohs、粒径(d50)500nm、比表面積6.0m/g)
[Preparation of film-like adhesive with dicing film]
The components used in preparing the film adhesive are shown below.
<Materials used>
(Epoxy resin)
828 (bisphenol A type epoxy resin, manufactured by Mitsubishi Chemical Corporation, epoxy equivalent 190 g/eq, specific gravity 1.17)
・ST-3000 (hydrogenated bisphenol A epoxy resin, manufactured by Nippon Steel Chemical & Material Co., Ltd.)
YDCN-703 (cresol novolac type epoxy resin, manufactured by Tohto Kasei Co., Ltd., epoxy equivalent 210 g/eq, molecular weight 1200, softening point 80° C.)
(Phenoxy resin)
1256 (phenoxy resin, manufactured by Mitsubishi Chemical Corporation, epoxy equivalent 7500 g/eq)
(urethane resin)
Dynaleo VA-9320M (urethane resin solution, weight average molecular weight: 120,000, Tg: 39°C, room temperature elastic modulus: 594 MPa, solvent: MEK/IPA mixed solvent, manufactured by Toyochem Co., Ltd.) (referred to as VA-9320M in the table)
(Acrylic resin)
SG-P3 (acrylic resin, Nagase ChemteX Corporation, weight average molecular weight 850,000, glass transition temperature 10°C)
(Hardening agent)
・2PHZ-PW (imidazole-based hardener, manufactured by Shikoku Kasei Co., Ltd.)
SI-150 (thermal cationic polymerization initiator, manufactured by Sanshin Chemical Industry Co., Ltd.)
(Phenol resin)
Milex XLC-LL (phenolic resin, manufactured by Mitsui Chemicals, Inc., hydroxyl equivalent: 175 g/eq)
(Filling material)
RY-200 (nanosilica filler, manufactured by Nippon Aerosil Co., Ltd., particle size (d50): 12 nm, Mohs hardness: 7 Mohs, thermal conductivity: 1 W/mK)
S0-C2 (silica filler, manufactured by ADMAFINE Co., Ltd., specific gravity 2.2 g/cm 3 , Mohs hardness: 7 Mohs, particle size (d50) 500 nm, specific surface area 6.0 m 2 /g)
<実施例1>
(フィルム状接着剤の作製)
 エポキシ樹脂(商品名:828、三菱ケミカル株式会社製、ビスフェノールA型エポキシ樹脂、エポキシ当量190g/eq、比重1.17)50質量部、及びフェノキシ樹脂(商品名:1256、三菱ケミカル株式会社製、ビスフェノールA型フェノキシ樹脂、エポキシ当量7500g/eq)50質量部を、1000mlのセパラブルフラスコ中において温度110℃で2時間、MEKとともに加熱攪拌し、樹脂ワニスを得た。次いで、この樹脂ワニスを別のフラスコ容器に移し、硬化剤(商品名:2PHZ-PW、イミダゾール系硬化剤、四国化成(株)製)1質量部を加えて、室温において1時間攪拌混合後、真空脱泡して混合ワニスを得た。さらに、得られた混合ワニスを厚み38μmの離型処理されたPETフィルム(剥離フィルム)上に塗布して、130℃で10分間加熱乾燥し、縦300mm、横300mm、厚みが20μmのフィルム状接着剤層を形成した。得られた剥離フィルム付きフィルム状接着剤は、10℃以下で保存した。上記乾燥後に、エポキシ樹脂は硬化していない(以下、特に言及のない場合、他の実施例及び比較例においても同じ)。
(ダイシングフィルム付きフィルム状接着剤の作製)
 次いで、上記剥離ライナー付きのダイシングフィルムBを、リングフレームの開口部を覆うように貼り合わせることができるような円形状に裁断した。また、上記の剥離フィルム付きフィルム状接着剤を、ウエハ裏面を覆うことができるような円形状に裁断した。
 上記のように裁断した剥離ライナー付きのダイシングフィルムBから剥離ライナーを剥離して露出させたダイシングフィルムBと、上記のように裁断した剥離フィルム付きフィルム状接着剤とを、ロールプレス機を用いて、荷重0.4MPa、速度1.0m/minの条件にて貼り合わせ、基材、粘着剤層、フィルム状接着剤及び剥離フィルムがこの順に積層されたダイシングフィルム付きフィルム状接着剤を作製した。このダイシングフィルム付きフィルム状接着剤は、基材と粘着剤層とを有するダイシングフィルムの粘着剤層上にフィルム状接着剤が形成されている。また、このダイシングフィルム付きフィルム状接着剤は、ダイシングフィルムがフィルム状接着剤よりも大きく、フィルム状接着剤の周囲にダイシングフィルムが露出した部分を有する。
Example 1
(Preparation of film-like adhesive)
50 parts by mass of epoxy resin (product name: 828, manufactured by Mitsubishi Chemical Corporation, bisphenol A type epoxy resin, epoxy equivalent 190 g/eq, specific gravity 1.17) and 50 parts by mass of phenoxy resin (product name: 1256, manufactured by Mitsubishi Chemical Corporation, bisphenol A type phenoxy resin, epoxy equivalent 7500 g/eq) were heated and stirred with MEK in a 1000 ml separable flask at a temperature of 110° C. for 2 hours to obtain a resin varnish. Next, this resin varnish was transferred to another flask container, and 1 part by mass of a curing agent (product name: 2PHZ-PW, imidazole type curing agent, manufactured by Shikoku Kasei Co., Ltd.) was added, and the mixture was stirred and mixed at room temperature for 1 hour, and then vacuum degassed to obtain a mixed varnish. The resulting mixed varnish was then applied onto a 38 μm-thick release-treated PET film (release film) and dried by heating at 130° C. for 10 minutes to form a film-like adhesive layer with a length of 300 mm, a width of 300 mm, and a thickness of 20 μm. The resulting film-like adhesive with release film was stored at 10° C. or lower. After the drying, the epoxy resin was not cured (the same applies to other examples and comparative examples unless otherwise specified below).
(Preparation of film-like adhesive with dicing film)
Next, the dicing film B with the release liner was cut into a circular shape that could be attached to cover the opening of the ring frame. Also, the film-like adhesive with the release film was cut into a circular shape that could cover the back surface of the wafer.
The dicing film B cut as described above with the release liner was peeled off to expose the dicing film B, and the film-like adhesive with the release film cut as described above was laminated together using a roll press under conditions of a load of 0.4 MPa and a speed of 1.0 m/min to produce a film-like adhesive with a dicing film in which a substrate, a pressure-sensitive adhesive layer, a film-like adhesive, and a release film are laminated in this order. In this film-like adhesive with a dicing film, the film-like adhesive is formed on the pressure-sensitive adhesive layer of the dicing film having a substrate and a pressure-sensitive adhesive layer. In addition, in this film-like adhesive with a dicing film, the dicing film is larger than the film-like adhesive, and the dicing film has an exposed portion around the film-like adhesive.
<実施例2>
 実施例1のフィルム状接着剤の作製において、硬化剤として2PHZ-PWに代えて、SI-150を1質量部用いたこと、混合ワニス中に、充填材としてRY-200を3質量部加えたこと以外は実施例1と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 2
In preparing the film-like adhesive of Example 1, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 1, except that 1 part by mass of SI-150 was used instead of 2PHZ-PW as the curing agent, and 3 parts by mass of RY-200 was added to the mixed varnish as a filler.
<実施例3>
 実施例1のフィルム状接着剤の作製において、混合ワニス中に、充填材としてRY-200を11質量部加えたこと以外は実施例1と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 3
A film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 1, except that in preparing the film-like adhesive of Example 1, 11 parts by mass of RY-200 was added to the mixed varnish as a filler.
<実施例4>
 実施例2のフィルム状接着剤の作製において、混合ワニス中に、充填材としてRY-200に代えてS0-C2を5質量部加えたこと以外は実施例2と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 4
In preparing the film-like adhesive of Example 2, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 2, except that 5 parts by mass of S0-C2 was added to the mixed varnish instead of RY-200 as a filler.
<実施例5>
 実施例2のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムAを用いたこと以外は実施例2と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 5
In producing the film-like adhesive with a dicing film of Example 2, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 2, except that dicing film A was used as the dicing film.
<実施例6>
 実施例3のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムAを用いたこと以外は実施例3と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 6
In producing the film-like adhesive with a dicing film of Example 3, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 3, except that dicing film A was used as the dicing film.
<実施例7>
 実施例4のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムAを用いたこと以外は実施例4と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 7
In producing the film-like adhesive with a dicing film of Example 4, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 4, except that dicing film A was used as the dicing film.
<実施例8>
 実施例5のフィルム状接着剤の作製において、高分子成分として、フェノキシ樹脂(1256)に代えてウレタン樹脂溶液(VA-9320M)を150質量部(うちウレタン樹脂50質量部)用いたこと、混合ワニス中の硬化剤を2PHZ-PW1質量部とし、充填材としてRY-200を35質量部加えたこと以外は実施例5と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 8
A film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 5, except that in preparing the film-like adhesive of Example 5, 150 parts by mass of a urethane resin solution (VA-9320M) (including 50 parts by mass of urethane resin) was used instead of the phenoxy resin (1256) as the polymer component, the curing agent in the mixed varnish was 1 part by mass of 2PHZ-PW, and 35 parts by mass of RY-200 was added as a filler.
<実施例9>
 実施例5のフィルム状接着剤の作製において、エポキシ樹脂として、828に代えてST-3000を50質量部用いたこと以外は実施例5と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Example 9>
In preparing the film-like adhesive of Example 5, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 5, except that 50 parts by mass of ST-3000 was used instead of 828 as the epoxy resin.
<実施例10>
 実施例5のフィルム状接着剤の作製において、混合ワニス中に、充填材としてRY-200を20質量部加えたこと以外は実施例5と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 10
In preparing the film-like adhesive of Example 5, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 5, except that 20 parts by mass of RY-200 was added to the mixed varnish as a filler.
<実施例11>
 実施例5のフィルム状接着剤の作製において、樹脂ワニス中の、828の配合量を30質量部としたこと、1256の配合量を70質量部としたこと以外は実施例5と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 11
In preparing the film-like adhesive of Example 5, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 5, except that the amount of 828 in the resin varnish was 30 parts by mass and the amount of 1256 was 70 parts by mass.
<実施例12>
 実施例2のフィルム状接着剤の作製において、樹脂ワニス中の、828の配合量を60質量部としたこと、1256の配合量を40質量部としたこと以外は実施例2と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
Example 12
In preparing the film-like adhesive of Example 2, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 2, except that the amount of 828 in the resin varnish was 60 parts by mass and the amount of 1256 was 40 parts by mass.
<比較例1>
 実施例1のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムAを用いたこと以外は実施例1と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 1>
In producing the film-like adhesive with a dicing film of Example 1, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 1, except that dicing film A was used as the dicing film.
<比較例2>
 比較例1のフィルム状接着剤の作製において、混合ワニス中に、充填材としてS0-C2を80質量部加えたこと以外は比較例1と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 2>
In preparing the film-like adhesive of Comparative Example 1, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Comparative Example 1, except that 80 parts by mass of S0-C2 was added to the mixed varnish as a filler.
<比較例3>
 実施例1のフィルム状接着剤の作製において、エポキシ樹脂として、828に代えてYDCN-703を18質量部用いたこと、高分子成分として、フェノキシ樹脂(1256)に代えてアクリル樹脂(SG-P3)を100質量部用いたこと、硬化剤として、2PHZ-PWを1質量部及びミレックスXLC-LLを15質量部用いたこと以外は実施例1と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 3>
In preparing the film-like adhesive of Example 1, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 1, except that 18 parts by mass of YDCN-703 was used instead of 828 as the epoxy resin, 100 parts by mass of acrylic resin (SG-P3) was used instead of phenoxy resin (1256) as the polymer component, and 1 part by mass of 2PHZ-PW and 15 parts by mass of Milex XLC-LL were used as the curing agent.
<比較例4>
 比較例3のフィルム状接着剤の作製において、YDCN-703の配合量を50質量部としたこと、SG-P3の配合量を250質量部としたこと、硬化剤として、2PHZ-PWを配合せずミレックスXLC-LLを50質量部用いたこと、混合ワニス中に、充填材としてS0-C2を35質量部加えたこと以外は比較例3と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 4>
In preparing the film-like adhesive of Comparative Example 3, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Comparative Example 3, except that the amount of YDCN-703 blended was 50 parts by mass, the amount of SG-P3 blended was 250 parts by mass, 50 parts by mass of Milex XLC-LL was used as the curing agent without blending 2PHZ-PW, and 35 parts by mass of S0-C2 was added to the mixed varnish as a filler.
<比較例5>
 実施例2のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムCを用いたこと以外は実施例2と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 5>
In producing the film-like adhesive with a dicing film of Example 2, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 2, except that dicing film C was used as the dicing film.
<比較例6>
 実施例3のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムCを用いたこと以外は実施例3と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 6>
In producing the film-like adhesive with a dicing film of Example 3, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 3, except that dicing film C was used as the dicing film.
<比較例7>
 実施例4のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムCを用いたこと以外は実施例4と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 7>
In producing the film-like adhesive with a dicing film of Example 4, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 4, except that dicing film C was used as the dicing film.
<比較例8>
 実施例8のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムCを用いたこと以外は実施例8と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 8>
In preparing the film-like adhesive with a dicing film of Example 8, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 8, except that dicing film C was used as the dicing film.
<比較例9>
 実施例9のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムCを用いたこと以外は実施例9と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 9>
In preparing the film-like adhesive with a dicing film of Example 9, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 9, except that dicing film C was used as the dicing film.
<比較例10>
 実施例10のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムCを用いたこと以外は実施例10と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 10>
In preparing the film-like adhesive with a dicing film of Example 10, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 10, except that dicing film C was used as the dicing film.
<比較例11>
 実施例11のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムCを用いたこと以外は実施例11と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 11>
In preparing the film-like adhesive with a dicing film of Example 11, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 11, except that dicing film C was used as the dicing film.
<比較例12>
 実施例12のダイシングフィルム付きフィルム状接着剤の作製において、ダイシングフィルムとしてダイシングフィルムCを用いたこと以外は実施例12と同様にして、剥離フィルム付きフィルム状接着剤及びダイシングフィルム付きフィルム状接着剤を得た。
<Comparative Example 12>
In preparing the film-like adhesive with a dicing film of Example 12, a film-like adhesive with a release film and a film-like adhesive with a dicing film were obtained in the same manner as in Example 12, except that dicing film C was used as the dicing film.
 上記の各実施例及び比較例で得られた剥離フィルム付きフィルム状接着剤及びダイシングフィルムA~Cについて、フィルム状接着剤の60℃における貯蔵弾性率及びダイシングフィルムの60℃における貯蔵弾性率を次の通り決定した。 For the film-like adhesive with release film and dicing films A to C obtained in each of the above examples and comparative examples, the storage modulus of the film-like adhesive at 60°C and the storage modulus of the dicing film at 60°C were determined as follows.
[フィルム状接着剤の貯蔵弾性率の測定]
 各実施例及び比較例において得られた剥離フィルム付きフィルム状接着剤から剥離フィルムを剥がし、フィルム状接着剤を、ラミネーターを用いて70℃で、厚さ0.5mmとなるまで積層した。この積層体を5mm幅に切り出し、測定サンプルとした。動的粘弾性測定装置RSAIII(TAインスツルメント製)を用いて、チャック間距離20mm、周波数10Hzの引張条件で、25℃より80℃まで昇温速度5℃/minの条件で昇温した際のフィルム状接着剤の粘弾性挙動を測定し、60℃における貯蔵弾性率E1を求めた。
[Measurement of storage modulus of film-like adhesive]
The release film was peeled off from the film-like adhesive with release film obtained in each Example and Comparative Example, and the film-like adhesive was laminated to a thickness of 0.5 mm at 70 ° C. using a laminator. This laminate was cut into a width of 5 mm to be used as a measurement sample. Using a dynamic viscoelasticity measuring device RSAIII (manufactured by TA Instruments), the viscoelastic behavior of the film-like adhesive was measured when it was heated from 25 ° C. to 80 ° C. at a heating rate of 5 ° C. / min under tensile conditions of a chuck distance of 20 mm and a frequency of 10 Hz, and the storage modulus E1 at 60 ° C. was calculated.
[ダイシングフィルムの貯蔵弾性率の測定]
 ダイシングフィルムA~Cを、それぞれ5mm幅に切り出し、測定サンプルとした。動的粘弾性測定装置RSAIII(TAインスツルメント製)を用いて、チャック間距離20mm、周波数10Hzの引張条件で、25℃より80℃まで昇温速度5℃/minの条件で昇温した際のダイシングフィルムの粘弾性挙動を測定し、60℃における貯蔵弾性率E2を求めた。
 なお、基材単体で60℃における貯蔵弾性率を測定したところ、ダイシングフィルムの貯蔵弾性率とほぼ同じであった。
[Measurement of storage modulus of dicing film]
Each of the dicing films A to C was cut into a width of 5 mm to prepare a measurement sample. Using a dynamic viscoelasticity measuring device RSAIII (manufactured by TA Instruments), the viscoelastic behavior of the dicing film was measured when the temperature was increased from 25° C. to 80° C. at a heating rate of 5° C./min under tension conditions of a chuck distance of 20 mm and a frequency of 10 Hz, and the storage modulus E2 at 60° C. was calculated.
When the storage modulus of the substrate alone was measured at 60° C., it was found to be approximately the same as that of the dicing film.
 上記の各実施例及び比較例で得られたダイシングフィルム付きフィルム状接着剤について、フィルム状接着剤の硬化後の光透過率及びチップ飛びを次の通り評価した。 The film-like adhesive with dicing film obtained in each of the above examples and comparative examples was evaluated for light transmittance and chipping after the film-like adhesive had hardened as follows.
[フィルム状接着剤の硬化物の光透過率測定]
 ダイシングフィルム付きフィルム状接着剤を150℃1時間加熱硬化した後、ダイシングフィルムを剥離し、フィルム状接着剤単体の平行線透過率を分光光度計(日立ハイテクノロジーズ社製、分光光度計U-4100型固体資料測定システム)を用いて、波長範囲200~1100nmの範囲を測定し、波長400nmの平行線透過率を用いて評価した。
[Measurement of light transmittance of cured film adhesive]
The film-like adhesive with the dicing film was heated and cured at 150°C for 1 hour, and then the dicing film was peeled off. The parallel ray transmittance of the film-like adhesive alone was measured using a spectrophotometer (Hitachi High-Technologies Corporation, Spectrophotometer U-4100 Solid Sample Measurement System) in the wavelength range of 200 to 1100 nm, and evaluated using the parallel ray transmittance at a wavelength of 400 nm.
[チップ飛び評価]
 各実施例及び比較例において得られたダイシングフィルム付きフィルム状接着剤を、先ず、マニュアルラミネーター(商品名:FM-114、テクノビジョン社製)を用いて温度70℃、圧力0.3MPaにおいてガラスウエハ(材質D263、10cm角、厚さ100μm)の一方の面に、フィルム状接着剤層が接するように、接着させた。その後、同マニュアルラミネーターを用いて室温、圧力0.3MPaにおいてフィルム状接着剤の前記ガラスウエハが接着されていない領域にダイシングフレーム(商品名:DTF2-8-1H001、DISCO社製)を接着させた。次いで、2軸のダイシングブレード(Z1:NBC-ZH2050(27HEDD)、DISCO社製、Z2:NBC-ZH127F-SE(BC)、DISCO社製)が設置されたダイシング装置(商品名:DFD-6340、DISCO社製)を用いて2mm×2mmのサイズになるようにガラスウエハ側からダイシングを実施した。このダイシングにより、2500個のチップを得た。ダイシング後のサンプルにおいて、チップ飛び(剥離)したチップの個数を数え、全体のチップ数に対するチップ飛び発生率(チップ飛びしたチップの個数/全体のチップ数×100)を算出した。得られたチップ飛び発生率を下記評価基準に当てはめ評価した。
 
-評価基準-
AA:チップ飛び発生率が0%
A:チップ飛び発生率が、全チップの1%未満
B:チップ飛び発生率が、全チップの1%以上、3%未満
C:チップ飛び発生率が、全チップの3%以上
[Chip flying evaluation]
The film-like adhesive with dicing film obtained in each Example and Comparative Example was first bonded to one side of a glass wafer (material D263, 10 cm square, thickness 100 μm) using a manual laminator (product name: FM-114, manufactured by Technovision) at a temperature of 70° C. and a pressure of 0.3 MPa so that the film-like adhesive layer was in contact with the surface. Then, using the same manual laminator, a dicing frame (product name: DTF2-8-1H001, manufactured by DISCO) was bonded to the area of the film-like adhesive to which the glass wafer was not bonded at room temperature and a pressure of 0.3 MPa. Next, dicing was performed from the glass wafer side to a size of 2 mm x 2 mm using a dicing machine (product name: DFD-6340, manufactured by DISCO) equipped with a two-axis dicing blade (Z1: NBC-ZH2050 (27HEDD), manufactured by DISCO; Z2: NBC-ZH127F-SE (BC), manufactured by DISCO). This dicing yielded 2500 chips. In the samples after dicing, the number of chips that had chipped (peeled off) was counted, and the chipping occurrence rate relative to the total number of chips (number of chips that had chipped/total number of chips x 100) was calculated. The obtained chipping occurrence rate was evaluated according to the following evaluation criteria.

-Evaluation criteria-
AA: Chip flying rate is 0%
A: The chip skipping rate is less than 1% of all chips. B: The chip skipping rate is 1% or more and less than 3% of all chips. C: The chip skipping rate is 3% or more of all chips.
 上記の結果を下表にまとめて示す。下表中、エポキシ樹脂、高分子成分、硬化剤、充填材の各配合量を示す数値は質量部である。空欄はその成分を含有してないことを示す。「充填材含有量」欄には、フィルム状接着剤の固形分全体中の充填材の含有量を記載している。 The above results are summarized in the table below. In the table below, the values indicating the amounts of epoxy resin, polymer component, hardener, and filler are in parts by mass. A blank space indicates that the component is not contained. The "Filler content" column indicates the amount of filler contained in the total solid content of the film adhesive.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
 比較例1のダイシングフィルム付きフィルム状接着剤は、貯蔵弾性率の関係E1×E2≧7.0を満たさない。この比較例1のダイシングフィルム付きフィルム状接着剤では、ダイシング時にチップ飛びが生じた。
 比較例2~4のダイシングフィルム付きフィルム状接着剤は、フィルム状接着剤の硬化物の光透過率が35%以下であり、十分な透明性を示さなかった。比較例2は充填材の量が多すぎることにより、比較例3及び4はアクリル樹脂がエポキシ樹脂と相溶しなかったことが一因と考えられる。
 比較例5~12のダイシングフィルム付きフィルム状接着剤は、貯蔵弾性率の関係E1×E2≧7.0を満たさない。これら比較例5~12のダイシングフィルム付きフィルム状接着剤は、ダイシング時にチップ飛びが生じた。
 これに対し本発明の規定を満たす実施例1~12のダイシングフィルム付きフィルム状接着剤は、E1×E2≧7.0を満たし、フィルム状接着剤の硬化物の光透過率が60%以上であった。これらのダイシングフィルム付きフィルム状接着剤を用いれば、ダイシング工程においてチップ飛びを効果的に抑えることができること、また、硬化反応後に十分に高い透明性を示すことがわかる。
The film-like adhesive with a dicing film of Comparative Example 1 does not satisfy the storage modulus relationship E1×E2≧7.0 In the film-like adhesive with a dicing film of Comparative Example 1, chip flying occurred during dicing.
The film-like adhesive with dicing film of Comparative Examples 2 to 4 had a light transmittance of 35% or less for the cured product of the film-like adhesive, and did not exhibit sufficient transparency. One of the reasons for this is thought to be that the amount of filler in Comparative Example 2 was too large, and that in Comparative Examples 3 and 4, the acrylic resin was not compatible with the epoxy resin.
The film-like adhesives with dicing films of Comparative Examples 5 to 12 did not satisfy the storage modulus relationship E1×E2≧7.0 The film-like adhesives with dicing films of Comparative Examples 5 to 12 caused chip flying during dicing.
In contrast, the film-like adhesives with dicing films of Examples 1 to 12, which satisfied the provisions of the present invention, satisfied E1×E2≧7.0 and had a light transmittance of 60% or more after the curing of the film-like adhesive. It can be seen that the use of these film-like adhesives with dicing films makes it possible to effectively prevent chip flying during the dicing process, and also shows sufficiently high transparency after the curing reaction.
 本発明をその実施態様とともに説明したが、我々は特に指定しない限り我々の発明を説明のどの細部においても限定しようとするものではなく、添付の請求の範囲に示した発明の精神と範囲に反することなく幅広く解釈されるべきであると考える。 Although the present invention has been described in conjunction with its embodiments, we do not intend to limit our invention to any of the details of the description unless otherwise specified, and believe that the appended claims should be interpreted broadly without departing from the spirit and scope of the invention as set forth in the appended claims.
 本願は、2023年4月28日に日本国で特許出願された特願2023-074875に基づく優先権を主張するものであり、これはここに参照してその内容を本明細書の記載の一部として取り込む。 This application claims priority to Japanese Patent Application No. 2023-074875, filed on April 28, 2023, the contents of which are incorporated herein by reference as part of the present specification.
10 ダイシングフィルム
11 基材
12 粘着剤層
20 フィルム状接着剤
10 Dicing film 11 Substrate 12 Adhesive layer 20 Film-like adhesive

Claims (9)

  1.  基材と粘着剤層とを有するダイシングフィルムと、該粘着剤層上に配したフィルム状接着剤とを有し、
     前記フィルム状接着剤の60℃における貯蔵弾性率E1(MPa)と、前記ダイシングフィルムの60℃における貯蔵弾性率E2(MPa)とが、E1×E2≧7.0を満たし、
     前記フィルム状接着剤の硬化物の光透過率が60%以上である、ダイシングフィルム付きフィルム状接着剤。
    A dicing film having a substrate and a pressure-sensitive adhesive layer, and a film-like adhesive disposed on the pressure-sensitive adhesive layer,
    the storage modulus E1 (MPa) of the film-like adhesive at 60° C. and the storage modulus E2 (MPa) of the dicing film at 60° C. satisfy E1×E2≧7.0,
    A film-like adhesive with a dicing film, wherein the light transmittance of the cured product of the film-like adhesive is 60% or more.
  2.  前記フィルム状接着剤がエポキシ樹脂及びフェノキシ樹脂を含有する、請求項1に記載のダイシングフィルム付きフィルム状接着剤。 The film-like adhesive with dicing film according to claim 1, wherein the film-like adhesive contains an epoxy resin and a phenoxy resin.
  3.  前記フィルム状接着剤が充填材を含有し、該充填材の含有量が前記フィルム状接着剤の固形分全体の10質量%以下である、請求項1又は2に記載のダイシングフィルム付きフィルム状接着剤。 The film-like adhesive with dicing film according to claim 1 or 2, wherein the film-like adhesive contains a filler, and the content of the filler is 10 mass % or less of the total solid content of the film-like adhesive.
  4.  前記充填材の粒径(d50)が500nm以下である、請求項3に記載のダイシングフィルム付きフィルム状接着剤。 The film-like adhesive with dicing film according to claim 3, wherein the particle size (d50) of the filler is 500 nm or less.
  5.  前記フィルム状接着剤が硬化剤を含有し、該硬化剤が熱カチオン重合開始剤である、請求項1~4のいずれか1項に記載のダイシングフィルム付きフィルム状接着剤。 The film-like adhesive with dicing film according to any one of claims 1 to 4, wherein the film-like adhesive contains a curing agent, and the curing agent is a thermal cationic polymerization initiator.
  6.  E1が0.1~1.0MPaであり、E2が10~70MPaである、請求項1~5のいずれか1項に記載のダイシングフィルム付きフィルム状接着剤。 The film-like adhesive with dicing film according to any one of claims 1 to 5, wherein E1 is 0.1 to 1.0 MPa and E2 is 10 to 70 MPa.
  7.  電子部品の製造方法であって、
     透明フィルム状部材と、請求項1~6のいずれか1項に記載のダイシングフィルム付きフィルム状接着剤とがこの順に積層された積層体を得る第1の工程と、
     前記透明フィルム状部材と前記フィルム状接着剤とを一体にダイシングすることにより、前記ダイシングフィルム上に、接着剤層付き透明フィルム状チップを得る第2の工程と、
     前記接着剤層から前記ダイシングフィルムを取り除き、前記接着剤層付き透明フィルム状チップと電子部品を構成する他の部材とを前記接着剤層を介して熱圧着する第3の工程と、
     前記接着剤層を熱硬化する第4の工程と、
    を含む電子部品の製造方法。
    A method for manufacturing an electronic component, comprising:
    A first step of obtaining a laminate in which a transparent film-like member and the film-like adhesive with a dicing film according to any one of claims 1 to 6 are laminated in this order;
    a second step of dicing the transparent film-like member and the film-like adhesive together to obtain a transparent film-like chip with an adhesive layer on the dicing film;
    a third step of removing the dicing film from the adhesive layer and thermocompression bonding the transparent film-like chip with the adhesive layer and other members constituting an electronic component via the adhesive layer;
    a fourth step of thermally curing the adhesive layer;
    A method for manufacturing an electronic component comprising the steps of:
  8.  前記電子部品がイメージセンサである、請求項7に記載の電子部品の製造方法。 The method for manufacturing an electronic component according to claim 7, wherein the electronic component is an image sensor.
  9.  前記電子部品が、前記透明フィルム状チップがフォトダイオードの保護フィルムとして組み込まれた構造を有する、請求項8に記載の電子部品の製造方法。 The method for manufacturing an electronic component according to claim 8, wherein the electronic component has a structure in which the transparent film-like chip is incorporated as a protective film for a photodiode.
PCT/JP2024/015428 2023-04-28 2024-04-18 Film adhesive agent with dicing film, electronic component using same and manufacturing method therefor WO2024225161A1 (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010074135A (en) * 2008-08-20 2010-04-02 Hitachi Chem Co Ltd Method of manufacturing semiconductor device and dicing-tape integral type adhesive sheet
JP2011187571A (en) * 2010-03-05 2011-09-22 Nitto Denko Corp Dicing die-bonding film
JP2011249739A (en) * 2009-06-15 2011-12-08 Nitto Denko Corp Dicing tape-integrated film for semiconductor back surface
JP2012059768A (en) * 2010-09-06 2012-03-22 Nitto Denko Corp Film for semiconductor device and semiconductor device
JP2013153071A (en) * 2012-01-25 2013-08-08 Nitto Denko Corp Method for manufacturing semiconductor device and adhesive film used in the method
WO2020240964A1 (en) * 2019-05-29 2020-12-03 古河電気工業株式会社 Tape for glass processing

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010074135A (en) * 2008-08-20 2010-04-02 Hitachi Chem Co Ltd Method of manufacturing semiconductor device and dicing-tape integral type adhesive sheet
JP2011249739A (en) * 2009-06-15 2011-12-08 Nitto Denko Corp Dicing tape-integrated film for semiconductor back surface
JP2011187571A (en) * 2010-03-05 2011-09-22 Nitto Denko Corp Dicing die-bonding film
JP2012059768A (en) * 2010-09-06 2012-03-22 Nitto Denko Corp Film for semiconductor device and semiconductor device
JP2013153071A (en) * 2012-01-25 2013-08-08 Nitto Denko Corp Method for manufacturing semiconductor device and adhesive film used in the method
WO2020240964A1 (en) * 2019-05-29 2020-12-03 古河電気工業株式会社 Tape for glass processing

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