WO2023088544A1 - Back reflection protection by means of a method and a device for interference of a laser pulse - Google Patents
Back reflection protection by means of a method and a device for interference of a laser pulse Download PDFInfo
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- WO2023088544A1 WO2023088544A1 PCT/EP2021/081909 EP2021081909W WO2023088544A1 WO 2023088544 A1 WO2023088544 A1 WO 2023088544A1 EP 2021081909 W EP2021081909 W EP 2021081909W WO 2023088544 A1 WO2023088544 A1 WO 2023088544A1
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- WIPO (PCT)
- Prior art keywords
- laser pulse
- returning
- leading
- beam splitter
- laser
- Prior art date
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- 238000000034 method Methods 0.000 title claims description 33
- 230000010363 phase shift Effects 0.000 claims description 14
- 230000005855 radiation Effects 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 5
- 230000002452 interceptive effect Effects 0.000 claims description 4
- 230000001066 destructive effect Effects 0.000 abstract description 10
- 230000003287 optical effect Effects 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0064—Anti-reflection devices, e.g. optical isolaters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour by interference
- G02F1/212—Mach-Zehnder type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0085—Modulating the output, i.e. the laser beam is modulated outside the laser cavity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
Definitions
- the invention relates to a method and a device for irradiating an object with a laser beam.
- the object of the invention is to provide a method and a device that enable back reflection protection for laser pulses of particularly high intensity and/or to protect against non-polarized back reflections.
- the object according to the invention is thus achieved by a method for irradiating an object with a laser beam, the method having the following method steps:
- the first returning laser pulse part traversing the first beam path with the first returning laser pulse part experiencing a different phase shift than the first advancing laser pulse part when traversing the first beam path, in that the advancing laser pulse and the returning laser pulse are at least partially i) passing through an actuating element which is traversal by the returning laser pulse is offset from traversal by the leading laser pulse; and or ii) passing through a frequency shifter (23, 25);
- the leading laser pulse is divided into a first and a second leading laser pulse part.
- the first leading laser pulse part is guided along a first beam path, the second leading laser pulse along a second beam path to a second beam splitter.
- the first leading part of the laser pulse is deflected along the first beam path by preferably two reflecting optical elements and thus covers a longer distance than the second leading part of the laser pulse.
- the first and second leading laser pulse parts are superimposed again at the second beam splitter.
- the distance covered by the first leading laser pulse part along the first beam path differs from the distance covered by the second leading laser pulse along the second beam path, preferably by approximately one or a multiple of approximately one wavelength. The consequence of this is that the first and second leading laser pulse parts interfere constructively at the second beam splitter in the direction of the object and destructively in a second direction, for example in the direction of a beam trap.
- the returning laser pulse first passes through the second beam splitter.
- the returning laser pulse is divided into a first and a second returning laser pulse part.
- the first and second returning laser pulse parts are now superimposed again at the first beam splitter, specifically—without considering the invention—constructively in the direction of the laser beam source and destructively in another direction.
- the first and second returning laser pulse parts must be superimposed destructively on the first beam splitter in the direction of the laser beam source and constructively in another direction, e.g. in the direction of another beam trap.
- the first returning laser pulse part experiences a different phase shift when traversing the first beam path than the first leading laser pulse part when traversing the first beam path. If the phase of the first returning laser pulse part is shifted by 180° along the first beam path compared to the phase of the first leading laser pulse part, destructive interference occurs at the first beam splitter in the direction of the laser beam source and constructive interference in the other direction, e.g. in the direction of the other Beam source instead.
- the advancing and/or returning laser pulse or the first advancing and/or returning laser pulse part can pass through an actuating element.
- the adjusting element can be provided along the first beam pad, through which the first advancing or returning laser pulse part passes between the two beam splitters.
- the control element can preferably be designed as an active control element.
- the actuating element has in particular a first and a second position.
- the adjusting element can be designed to change the path length covered by the first forward and/or backward running laser pulse part when passing through the first beam path.
- the leading first laser pulse can travel a shorter or longer path in the first position of the actuating element than the returning laser pulse in the second position of the actuating element.
- the returning first laser pulse portion is phase-shifted in the second position of the actuator compared to the leading first laser pulse portion in the first position of the actuator preferably by 180 ° + n * 360 °, where n is an integer (including zero).
- the path length that the preliminary extending first laser pulse part along the first beam path between the two beam splitters, from the path length that the returning first laser pulse part traverses along the first beam path between the two beam splitters by an odd multiple of half a wavelength of the returning or leading laser pulse part is typically a few microns.
- the actuating element preferably has a piezoelectric element for the path length variation.
- the actuating element can have an optical element whose refractive index can be varied in an actively controllable manner.
- the actuating element can have an electro-optical crystal for phase shifting.
- the leading first laser pulse part then experiences a different phase shift than the returning first laser pulse part in the second position of the actuating element.
- the phase shift in the first position or second position can also be zero (no phase shift).
- the returning first laser pulse portion in the second position of the actuator is phase-shifted (or vice versa) by 180°+n*360° relative to the leading first laser pulse portion in the first position of the actuator, where n is an integer (including zero).
- a frequency shifting device can shift the frequency of the returning laser pulse and/or the frequency of the leading laser pulse.
- the first or second beam path is traversed by the first or second leading laser pulse part with a different frequency than that of the first th or second returning laser pulse part.
- the first and second leading laser pulse parts traverse the first and second beam paths at a first frequency
- the first and second returning laser pulse parts traverse the first and second beam paths at a second frequency.
- the path lengths along the first and second beam path must be chosen such that the following two conditions are met: the difference between the path length that the first returning laser pulse travels along the first beam path, and the path length that the second returning laser pulse travels along the second beam path must be an integer multiple plus or minus half a wavelength of the laser pulses returning at the second frequency.
- the difference between the path length that the first laser pulse travels along the first beam path and the path length that the second laser pulse travels along the second beam path must be an integer multiple of the wavelength of the laser pulses that travel at the first frequency.
- the frequency shifting device can in particular be an accumulator-optical modulator (AOM) or a Stimulated Brillouin Scattering (SBS) mirror.
- the frequency can also be shifted on a moving element, such as an expanding plasma.
- the object itself can be designed as a moving, expanding plasma, on which the laser pulse is reflected, so that the frequency of the laser pulse is shifted when it is reflected on the object itself.
- one or more frequency shifting devices can be arranged in the beam path of the forward and/or backward running laser pulse.
- the frequency shifting device can in particular be designed to be switchable. If a switchable frequency shifting device, for example an AOM, is used, the leading laser pulse can pass through it in a first, for example switched off position, in which the frequency of the laser pulse is not influenced. The returning laser pulse passes through the frequency shift device then in a second position in which the frequency of the laser pulse is shifted.
- the disadvantage of this is that the frequency-shifted returning laser pulse no longer runs on the same optical axis as the leading laser pulse.
- the frequency-shifted returning laser pulse can be deflected back to the first and/or second beam splitter, in particular by beam-deflecting optical elements.
- the frequency shifting device is preferably designed to shift the frequency of the forward and/or backward running laser pulse by at most 1000 MHz and at least 20 MHz, preferably between 600 MHz and 30 MHz, in particular 40 MHz.
- the leading laser pulse can pass through a first frequency shifting device before passing through the first beam splitter and a second frequency shifting device after passing through the second beam splitter.
- the returning laser pulse then passes through the second frequency shifter before passing through the second beam splitter and through the first frequency shifter after passing through the first beam splitter.
- the first frequency shifting device shifts the frequency of the preceding laser pulse by the same or approximately the same amount as the second frequency shifting device, only with an opposite sign. This is particularly advantageous when the leading laser pulse is amplified in one or more amplifiers after passing through the second beam splitter. These have an optimal gain range at one or more frequencies.
- the splitting of the laser pulses at the beam splitters preferably takes place 50% in each case, i.e. into equal parts.
- the two beam splitters are preferably part of a Mach-Zehnder interferometer.
- the actively actuable control element is then arranged in a beam path of the Mach-Zehnder interferometer.
- the leading laser beam is preferably emitted from a laser beam source in the form of a seed source.
- the first beam splitter and/or the second beam splitter can each be in the form of a partially transparent mirror.
- the beam splitters can be designed in the form of glass plates that are metal-coated on one side.
- the first advancing or returning laser pulses can pass through telescopes or other beam-shaping elements between the first and second beam splitter, so that any deviations that occur in the beam size and/or divergence of the first and second advancing or returning laser pulses can be compensated for .
- a beam trap can be arranged on the first beam splitter and/or on the second beam splitter to receive constructively interfering laser pulse parts.
- the laser pulses preferably pass through an amplifier between the object and the second beam splitter.
- the amplifier can be in the form of an amplifier chain.
- a delay line can be provided between the second beam splitter and the object.
- the leading laser pulse generates EUV radiation.
- the object can be in the form of a tin droplet, in which an expanding plasma is excited by the preceding laser pulse, which leads to the emission of EUV radiation.
- the object according to the invention is also achieved by a device for irradiating an object, in particular for carrying out a method described here.
- the device has the following features: a) a laser beam source; b) a first beam splitter for dividing the leading laser pulse into a first leading laser pulse part and a second leading laser pulse part; c) a first beam path traversable by the first leading portion of the laser pulse; d) a second beam splitter for at least partially constructive interference of the first leading laser pulse part with the second leading laser pulse part on the way to the object; e) the object for reflecting the leading laser pulse and generating a returning laser pulse; wherein the second beam splitter is designed to divide the returning laser pulse into a first returning laser pulse part and a second returning laser pulse part; wherein the device has an actuating element and/or a frequency shifting device which are set up to bring about a different phase shift in the first returning laser pulse part than in the first leading laser pulse part and the returning first laser pulse part with the returning second laser pulse part at the first
- an actuating element can be arranged along the first beam path between the first and the second beam splitter.
- the actuating element can in particular be switchable between a first and a second position.
- the actuating element can be designed to change the path length that the first forward or backward running laser pulse part travels along the first beam path.
- the actuating element preferably has a piezoelectric element.
- the adjusting element can be designed to change the path length of the first beam path by half a wavelength or an odd multiple of half a wavelength of the first forward or backward running laser pulse.
- the actuating element can have an optical element whose refractive index can be changed in an actively controllable manner, for example an electro-optical phase modulator.
- This adjusting element is also preferably arranged along the first beam path. This causes the first returning laser pulse part to experience a different phase shift than the first leading laser pulse part.
- the optical element can be designed to shift the phase of the first returning laser pulse part by 180°+n*360° (or vice versa), where n is an integer (including zero).
- the frequency shifting device can be designed in the form of an accumulator-optical modulator (AOM), a Stimulated Brillouin Scattering (SBS) mirror and/or a moving, reflecting element, for example an expanding plasma.
- AOM accumulator-optical modulator
- SBS Stimulated Brillouin Scattering
- the device can also have several frequency shifters.
- a first frequency shifting device can be arranged in front of the first beam splitter and a second frequency shifting device can be arranged after the second beam splitter.
- the first and second frequency shifting device is designed in particular to increase the frequency of the preceding laser pulse by an amount before the first beam splitter and to decrease it by an amount, in particular the same or almost the same, after the second beam splitter (or vice versa).
- This has the advantage that the frequency difference between the forward and backward running laser pulse can be selected to be comparatively large without the preceding laser pulse being amplified less efficiently in a subsequent amplifier.
- the greater the frequency shift of the leading laser pulse compared to the returning laser pulse the difference in path length between the distance covered by the first leading or returning laser pulse along the first beam path compared to the second leading or returning laser pulse along the second beam path , be chosen smaller.
- one or more telescopes can be arranged in the first beam path, so that any deviations that may occur in the beam size and/or divergence of the first and second laser pulses running forwards or backwards can be compensated for. In this way, it should be ensured that the interference of the first and second advancing or returning laser pulses is not spatially influenced and the first and second advancing or returning laser pulses interfere as completely as possible in a destructive or constructive manner.
- the device can have an amplifier between the second beam splitter and the object. In particular, this can involve one or more CO2 amplifiers connected in series. In case the object itself is in the form of a plasma as a frequency shifter, the device can also be placed between the amplifier and the object.
- the device can have at least one mirror, in particular a plurality of mirrors, for deflecting the laser beam.
- the first forward or backward running laser pulse part can be guided through the first beam path via a pair of mirrors.
- the object is preferably designed to emit EUV radiation.
- the object is particularly preferably in the form of a tin droplet.
- FIG. 1a shows a schematic view of a first embodiment of a device with a path length adjusting element with a leading laser pulse.
- FIG. 1b shows the device from FIG. 1a with the laser pulse returning.
- FIG. 2a shows a schematic view of a second embodiment of a device with a refractive index setting element with a leading laser pulse.
- FIG. 2b shows the device from FIG. 2a with a returning laser pulse.
- FIG. 3 shows a schematic view of a third embodiment of a device with a frequency shifter.
- FIG. 4 shows a schematic view of a fourth embodiment of an apparatus, in which an irradiated object represents a frequency shifter.
- Fig. 5 shows a schematic view of a fifth embodiment with a frequency shifter arranged upstream of an interferometer and a frequency shifter arranged downstream of the interferometer.
- Fig. la shows a device 10 for irradiating an object 12.
- the device 10 has a laser beam source 14, a first beam splitter 16, a second beam splitter 18, a first beam path 19, an actuating element 20, a first beam trap 22, a second beam trap 24 and an amplifier 26 on.
- the beam splitters 16, 18 are preferably designed in the form of glass plates that are metal-coated on one side, so that a reflected light beam experiences a phase jump or no phase jump depending on the side on which it is incident on the beam splitter 16, 18.
- Such beam splitters are known from the design of a Mach-Zehnder interferometer.
- the laser beam source 14 emits a laser beam 28.
- the laser beam 28 has a leading laser pulse 30.
- the leading laser pulse 30 is split at the first beam splitter 16 into a first leading laser pulse part 30a and a second leading laser pulse part 30b.
- the first leading laser pulse part 30a is guided to the second beam splitter 18 via the first beam path 19 and the adjusting element 20
- the second leading laser pulse part 30b is guided to the second beam splitter 18 without passing the adjusting element 20 .
- the first leading laser pulse part 30a Due to its reflection at the first beam splitter 16, the first leading laser pulse part 30a experiences a phase shift of 180° or pi, whereas the second leading laser pulse part 30b at the first beam splitter 16 does not experience a phase shift.
- the first leading laser pulse part 30a partially passes through the second beam splitter 18 to the second beam trap 24 without a phase jump. Partly becomes the first leading laser pulse part 30a is reflected at the second beam splitter 18 to the amplifier 26 and experiences a phase jump of 180°.
- the second leading laser pulse part 30b passes through the first beam splitter 16 without a phase jump. Partly the second leading laser pulse part 30b then passes through the second beam splitter 18 to the amplifier 26 without a phase jump and partly towards the second beam trap 24 likewise without a phase jump.
- the first leading laser pulse portion 30a and the second leading laser pulse portion 30b therefore interfere constructively, and from the second beam splitter 18 to the second beam trap 24, the first leading laser pulse portion 30a and the second leading laser pulse portion 30b interfere destructively.
- the at least partially recombined leading laser pulse 30 is directed towards the amplifier 26 .
- Laser pulse 30 is amplified in amplifier 26, which is preferably in the form of an amplifier chain, and then strikes object 12.
- the object 12 is in the form of a tin droplet.
- a plasma is generated in the tin droplet by the preceding laser pulse 30, which leads to the emission of extreme ultraviolet light (EUV) radiation 32.
- EUV extreme ultraviolet light
- FIG. 1b shows the device 10 with a returning laser pulse 34 reflected by the object 12.
- the returning laser pulse 34 is split at the second beam splitter 18 into a first returning laser pulse part 34a and a second returning laser pulse part 34b.
- the first returning laser pulse part 34a experiences a phase jump of 180° at the second beam splitter 18, whereas the second returning laser pulse part 34b at the second beam splitter 18 experiences no phase jump.
- the first returning laser pulse part 34a passes through the actuating element 20 on its way to the first beam splitter 16 along the first beam path 19, whereas Gen the second returning laser pulse part 34b does not pass through the actuating element 20 on its way to the first beam splitter 16.
- the first returning laser pulse part 34a partially passes through the first beam splitter 16 to the first beam trap 22 without a phase jump.
- the first returning laser pulse part 34a is partly reflected at the first beam splitter 16 towards the laser beam source 14 and experiences a phase jump of 180° in the process.
- Partly the second returning laser pulse part 34b passes through the first beam splitter 16 towards the laser beam source 14 without a phase jump and partly towards the first beam trap 22 likewise without a phase jump.
- the first returning laser pulse part 34a and the second returning laser pulse part 34b interfere constructively from the first beam splitter 16 towards the laser beam source 14 and interfere destructively towards the first beam trap 22 .
- the laser beam source 14 would be damaged as a result.
- the actuating element 20 is therefore switched from its first position, shown in FIG. 1a, for the leading laser pulse 30 to its second position, shown in FIG.
- the actuating element 20 consequently changes the path length for the returning laser pulse 34 compared to the preceding laser pulse 30 .
- the actuating element 20 can have a piezoelectric element.
- the first returning laser pulse part 34a and the second returning laser pulse part 34b interfere destructively from the first beam splitter 16 to the laser beam source 14 and constructively to the first beam trap 22 .
- the laser beam source 14 is protected from the returning laser pulse 34 .
- FIG. 2a and FIG. 2b correspond to those shown in FIGS. la, b shown devices 10. However, in Figs. 2a, b shown actuating element 20 an electric tro-optical crystal 36 for changing the phase of the first returning laser pulse 34 in relation to the first leading laser pulse 30 .
- the distances for the first laser pulse parts 30a, 34a and the second laser pulse parts 30b, 34b are the same—apart from any phase shifts.
- the distances are drawn with different lengths in the figures only for reasons of representability. The distances can be executed as desired, so that they are the same length in the end.
- Devices 10 in Figs. 3, 4 and 5 correspond to the devices 10 shown in FIGS. 1a and b or 2a and b. However, the devices 10 in FIGS. 3, 4 and 5 no actuating element 20 along the first beam path 19.
- a frequency shifting device 23 is provided between the second beam splitter 18 and the object 12 in FIG. 3 .
- the frequency of the preceding laser pulse is shifted by the frequency shifting device 23 after it has passed through the second beam splitter 18 .
- a path length along the first beam path 19 and along a second beam path 21, which is traversed by second forward and backward running laser pulse parts 30b, 34b between the two beam splitters 16, 18, is chosen so that the frequency-shifted first and second returning laser pulse parts 30a, 30b experience destructive interference towards the laser beam source 14 at the first beam splitter 16, while the non-frequency-shifted first and second leading laser pulse parts 34a, 34b experience constructive interference towards the object 12.
- the object 12 is designed as a frequency shifting device 23, for example as an expanding plasma.
- the frequency of the leading laser pulse 30 is shifted on the object 12 .
- the returning laser pulse 34 is already destructively interfered in the direction of the laser beam source 14 before passing through the amplifier 26 .
- 5 shows a device 10 with two frequency shifting devices 23, 25 which are arranged on the one hand between the laser beam source 14 and the first beam splitter 16 and on the other hand between the second beam splitter 18 and the object 12.
- the frequency of the leading laser pulse 30 is shifted by a certain amount before passing through the first beam splitter 16 and shifted back again by the same amount after passing through the second beam splitter 18 .
- the frequency of the returning laser pulse 34 is also shifted by a specific amount before passing through the second beam splitter 18 and is also shifted back again by the same amount after passing through the first beam splitter 16.
- the amplifier 26 can thus be operated at the frequency of the laser pulse generated in the laser beam source 14 .
- the distances covered by the first and second laser pulse parts (30a, b, 34a, b) along the first and second beam paths 19, 21 are of different lengths.
- the two beam paths 19, 21 are designed such that a time difference between the time that the first laser pulse part (30a, 34a) needs to run through the first beam path 19 and a time that the second laser pulse part (30b, 34b) needs to run through the second Beam path 21 required is short compared to the pulse duration. This ensures that only a small part of the two laser pulse parts (30a, b, 34a, b) does not interfere.
- the invention relates in summary to back reflection protection by destructive interference of a returning laser pulse 34.
- a leading laser pulse 30 is divided, a first leading laser pulse part 30a, in contrast to a second leading laser pulse part 30b, runs through a first beam path 19.
- the two Laser pulse parts 30a, b are at least partially constructively superimposed.
- the leading laser pulse 30 is reflected and the reflected, returning laser pulse 34 basically traverses the same path as the leading laser pulse 30, but a returning first laser pulse part 34a is phase-shifted when passing through the first beam path 19 so that it coincides with a returning second laser pulse part 34b is at least partially, in particular completely, destructively superimposed on its way to the laser beam source 14, so that the laser beam source 14 is protected from the returning laser pulse 34.
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Abstract
Description
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Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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CN202180105055.7A CN118435471A (en) | 2021-11-17 | 2021-11-17 | Method and apparatus for back reflection protection by laser pulse interference |
KR1020247019565A KR20240101950A (en) | 2021-11-17 | 2021-11-17 | Retro-reflection protection by method and device for interference of laser pulses |
PCT/EP2021/081909 WO2023088544A1 (en) | 2021-11-17 | 2021-11-17 | Back reflection protection by means of a method and a device for interference of a laser pulse |
EP21815431.8A EP4434125A1 (en) | 2021-11-17 | 2021-11-17 | Back reflection protection by means of a method and a device for interference of a laser pulse |
TW111142232A TWI842178B (en) | 2021-11-17 | 2022-11-04 | Method and device for irradiating an object with a laser beam |
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PCT/EP2021/081909 WO2023088544A1 (en) | 2021-11-17 | 2021-11-17 | Back reflection protection by means of a method and a device for interference of a laser pulse |
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WO2023088544A1 true WO2023088544A1 (en) | 2023-05-25 |
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PCT/EP2021/081909 WO2023088544A1 (en) | 2021-11-17 | 2021-11-17 | Back reflection protection by means of a method and a device for interference of a laser pulse |
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EP (1) | EP4434125A1 (en) |
KR (1) | KR20240101950A (en) |
CN (1) | CN118435471A (en) |
TW (1) | TWI842178B (en) |
WO (1) | WO2023088544A1 (en) |
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WO2008048314A2 (en) * | 2005-12-30 | 2008-04-24 | Intel Corporation | Planar non-magnetic optical isolator |
WO2015082004A1 (en) * | 2013-12-05 | 2015-06-11 | Trumpf Lasersystems For Semiconductor Manufacturing Gmbh | Amplifier arrangement and driver laser arrangement for an euv light source comprising same |
US20180375278A1 (en) * | 2016-02-10 | 2018-12-27 | Trumpf Lasersystems For Semiconductor Manufacturing Gmbh | Extreme ultraviolet radiation producing systems with driver laser systems having optical isolators |
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TW202325452A (en) | 2023-07-01 |
TWI842178B (en) | 2024-05-11 |
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