WO2023079584A1

WO2023079584A1 - Vapor deposition mask and method for producing display panel

Info

Publication number: WO2023079584A1
Application number: PCT/JP2021/040328
Authority: WO
Inventors: 信作中島; 毅井上
Original assignee: シャープディスプレイテクノロジー株式会社
Priority date: 2021-11-02
Filing date: 2021-11-02
Publication date: 2023-05-11

Abstract

A vapor deposition mask according to the present invention is provided with: a housing sheet (13); and a mask sheet (15) that is superposed on the housing sheet (13), while being provided with a plurality of opening parts (151, 152). The housing sheet (13) is provided with a half etching part (131) along the opening of a dummy opening part (152), which does not contribute to display among the opening parts (151, 152) of the mask sheet (15). Consequently, the present invention is capable of reducing residue of a cleaning liquid or foreign substances.

Description

Evaporation mask, manufacturing method of display panel

The present invention relates to a vapor deposition mask and a method for manufacturing a display panel.

Conventionally, the vacuum deposition method using a deposition mask has been widely used for the production of organic light-emitting devices using low-molecular-weight materials.

For example, the vapor deposition mask described in Patent Document 1 includes a frame having an opening and a mask main body that is fixed and stretched with respect to the frame. The frame body has a stepped portion formed along the opening on a surface facing the mask body, and a gap formed between the frame body and the mask body by the stepped portion. and a gap retaining portion having the same height as the stepped portion. The frame body has a through hole that allows communication between the gap and a surface other than the surface facing the mask main body. Then, during cleaning by a wet process, the cleaning liquid flows from the gap and the through hole.

Japanese Patent Application Laid-Open No. 2010-135269

However, in the deposition mask described in Patent Document 1, during cleaning by a wet process, gas is generated due to residual cleaning liquid or foreign matter in the surface contact portions of the frame and the mask body, and the life of the organic light emitting element is shortened. There was a problem that affected

In addition, there has been a problem that the precision of the vapor deposition mask deteriorates due to the close contact between the frame and the mask main body due to the surface tension caused by the residual cleaning liquid at the surface contact portion.

The present invention has been made in view of the conventional problems described above, and an object of the present invention is to provide a vapor deposition mask capable of reducing residual cleaning liquid or foreign matter.

A vapor deposition mask according to an aspect of the present invention is a vapor deposition mask for patterning a vapor deposition layer in an active region in which pixels contributing to display are arranged in a matrix in a display region of a substrate to be vapor-deposited. a first sheet-like mask having an outer shape opening having a shape corresponding to at least a part of an outer shape of the display area formed corresponding to an arrangement pattern of the display area; a second sheet-shaped mask laminated on a mask and having a plurality of openings formed therein, wherein the first sheet-shaped mask has a surface facing the second sheet-shaped mask having the second sheet-shaped mask It is characterized in that a step is formed along the opening of the opening that does not contribute to the deposition of the vapor deposition film on the substrate to be vapor-deposited.

According to the present invention, it is possible to reduce the amount of residual cleaning liquid or foreign matter.

It is a schematic diagram which shows the mode of the vapor deposition process using the vapor deposition mask which concerns on Embodiment 1 of this invention. FIG. 2 is a cross-sectional view of a main part of the vapor deposition mask shown in FIG. 1; It is a figure showing the vapor deposition process of the light emitting layer in an organic EL display panel. It is a figure showing a mode that the vapor deposition mask is produced. 5 is an enlarged view of a main portion X of the vapor deposition mask shown in FIG. 4; FIG. FIG. 6 is a cross-sectional view taken along line AA of FIG. 5; 6 is a cross-sectional view taken along line BB of FIG. 5; FIG. It is a figure explaining other examples of a vapor deposition mask.

[Embodiment 1]
An embodiment of the present invention will be described in detail below with reference to FIGS. 1 to 7. FIG.

<Overview of vapor deposition process>
FIG. 1 is a schematic diagram showing a vapor deposition process using a vapor deposition mask 10 according to Embodiment 1 of the present invention. Here, an example of the vapor deposition process when forming a light-emitting layer (a vapor-deposited layer such as a light-emitting layer and a hole transport layer for each pixel) of an organic EL display device (display panel) (manufacturing method of a display panel) is described. to explain.

As shown in FIG. 1, in a vapor deposition process for vapor-depositing a light-emitting layer and the like, a vapor deposition mask 10 provided with a mask sheet 15 (see FIG. 2) having a plurality of through holes is brought into close contact with a TFT substrate (substrate to be vapor-deposited) 1. Vapor-deposited particles Z (for example, an organic light-emitting material) evaporated by the vapor deposition source 20 are vapor-deposited on the pixels of the TFT substrate 1 through the mask sheet 15 under vacuum. As a result, a vapor deposition pattern corresponding to the through-holes of the mask sheet 15 is formed on the TFT substrate 1 .

In the TFT substrate 1, TFTs (transistors, driving elements) included in a pixel circuit arranged in each pixel, gate wirings, source wirings, and various other wirings are formed on a mother glass by a known method. A passivation film (protective film), an interlayer insulating film (planarizing film), etc. are formed, and a reflective electrode layer in contact with the anode, an ITO layer, and pixels for defining a light emitting region are formed on the inorganic insulating film. It is manufactured by forming a bank layer.

The passivation film prevents peeling of the metal film in the TFT and protects the TFT. A passivation film is formed on the mother glass or via another layer to cover the TFT. A passivation film is an inorganic insulating film made of silicon nitride, silicon oxide, or the like.

The interlayer insulating film flattens unevenness on the passivation film. An interlayer insulating film is formed on the passivation film. The interlayer insulating film is an organic insulating film made of photosensitive resin such as acrylic or polyimide.

<Vapor deposition mask>
FIG. 2 is a fragmentary cross-sectional view of the vapor deposition mask 10 shown in FIG. The vapor deposition mask 10 described here forms a pattern of a vapor deposition layer in an active region in which pixels contributing to display are arranged in a matrix on the cover region of the TET substrate 1, which is a substrate to be vapor-deposited. It is a vapor deposition mask for As shown in FIG. 2, the vapor deposition mask 10 includes a cover sheet 12 (first sheet mask: also referred to as a first support sheet), a howling sheet 13 (first sheet mask: also referred to as a second support sheet), and a mask sheet 15 (second sheet mask). The vapor deposition mask 10 has, for example, a three-layer structure in which a cover sheet 12, a howling sheet 13, and a mask sheet 15 are laminated in this order.

The cover sheet 12 plays a role of filling the gaps between the mask sheets 15 that will be attached to the mask frame 11 (see FIG. 4) later.

For the cover sheet 12, for example, an invar material having a thickness of 30 μm to 50 μm is used as a base material. The cover sheet 12 has an elongated shape and extends linearly from one end to the other end.

The howling sheet 13 usually plays a role of supporting the mask sheet 15 to be attached to the mask frame 11 (see FIG. 4) later so that it does not loosen and closing the dummy opening 152 formed in the mask sheet 15 . However, since the howling sheet 13 in the present embodiment has a half-etched portion 131 to be described later, the dummy openings 152 of the mask sheet 15 do not completely block the howling sheet 13 side.

For the howling sheet 13, for example, stainless steel (SUS304) having a thickness of 50 μm to 100 μm or an invar material is used as a base material. The width of the howling sheet 13 is, for example, about 8 mm to 10 mm, and is determined by the layout on the substrate on which the organic EL display panel is arranged.

Howling sheet 13 is perpendicular to the direction in which cover sheet 12 extends (first direction) so that cover sheet 12 and howling sheet 13 form a cross when vapor deposition mask 10 is viewed from the mask sheet 15 side. direction (perpendicular direction) (horizontal direction of the paper surface: second direction).

The howling sheet 13 has a half-etched portion (step) 131 formed by half-etching on the surface facing the mask sheet 15 . More specifically, the howling sheet 13 has the half-etched portions 131 formed at least at positions corresponding to the dummy openings 152 of the mask sheet 15 . Thereby, surface contact between the howling sheet 13 and the mask sheet 15 can be reduced. The half-etched portion 131 is formed approximately half of the howling sheet 13 in the thickness direction of the howling sheet 13 . However, the half-etching portion 131 is not limited to this as long as it has a configuration that reduces surface contact between the half-etching portion 131 and the mask sheet 15 .

The mask sheet 15 is strip-shaped, and as a base material, for example, an invar material having a thickness of 20 μm to 40 μm, preferably about 25 μm is used. The mask sheet 15 is, for example, a fine metal mask sheet. The mask sheet 15 is made of a thin sheet in order to prevent the vapor-deposited luminescent layer from becoming uneven in thickness. The mask sheet 15 is a sheet for forming a pattern of a light-emitting layer and the like in pixels in the display area of the organic EL display panel, for example, for separately coloring each of RGB.

The mask sheet 15 is laminated on the howling sheet 13 along the same direction as the direction in which the cover sheet 12 extends. The mask sheet 15 has a plurality of openings (a plurality of through-holes 151 and dummy openings 152 that do not contribute to deposition of the vapor deposition film on the vapor deposition target substrate).

<Preparation of vapor deposition mask>
FIG. 3 is a diagram showing the vapor deposition process of the light-emitting layer in the organic EL display panel. FIG. 4 is a diagram showing how the vapor deposition mask 10 is produced. The light-emitting layer emits light of a different color, for example red, green or blue, for each pixel.

First, as indicated by step S1 in FIG. 3 and

reference numerals

1041 and 1042 in FIG. mask) 12 is attached (cover sheet attaching step).

The mask frame 11 is a component of the vapor deposition mask 10. For the mask frame 11, for example, an Invar material having a thickness of 20 mm to 30 mm and having extremely low thermal expansion is used as a base material. The mask frame 11 is sufficiently thicker than the mask sheet 15 and has high rigidity so that sufficient accuracy can be ensured even when the mask sheet 15 is stretched and welded. The mask frame 11 has a mass of approximately 80 kg.

As indicated by reference numeral 1042 in FIG. 4, when attaching the cover sheet 12 to the mask frame 11, a force is applied to both ends of the cover sheet 12 in an outward direction (directions away from each other) to stretch (pull) them. , the both ends of the cover sheet 12 are welded to predetermined positions of the mask frame 11 . Then, unnecessary portions outside the welded portion of the cover sheet 12 are cut. Thereby, each cover sheet 12 is attached to a predetermined position of the mask frame 11 . In this embodiment, each cover sheet 12 is attached to the mask frame 11 so as to be parallel to the short side direction of the mask frame 11 . Each cover sheet 12 is attached to the mask frame 11 so as to be aligned with the long sides of the mask frame 11 and parallel to each other.

Next, as shown in step S2 in FIG. 3 and reference numeral 1043 in FIG. 4, a howling sheet (first sheet-like mask) 13 (also called a support sheet) is attached to the mask frame 11 to which the cover sheet 12 is attached ( Howling sheet installation process).

The width of the howling sheet 13 is substantially the same as that of the cover sheet 12 . However, in a portrait-shaped display panel, the terminals are usually masked by the howling sheet 13 , so the howling sheet may be wider than the cover sheet 12 . The howling sheet 13 is arranged at a position not overlapping the display area of the display panel (that is, the effective portion of the mask sheet 15).

As indicated by reference numeral 1043 in FIG. 4 , when the howling sheet 13 is attached to the mask frame 11 , the howling sheet 13 is stretched (pulled) by applying a force in an outward direction (a direction away from each other) to each of both ends of the howling sheet 13 . , both ends of the howling sheet 13 are welded to predetermined positions of the mask frame 11 . Then, an unnecessary portion outside the welded portion of the howling sheet 13 is cut. As a result, the mounting regions, which are regions in the vicinity of both ends of each howling sheet 13 , are mounted at predetermined positions on the mask frame 11 . That is, each howling sheet 13 is attached to a predetermined position of the mask frame 11 .

In this embodiment, each howling sheet 13 is attached to the mask frame 11 so as to be parallel to the long sides of the mask frame 11 . Each howling sheet 13 is attached to the mask frame 11 so as to be aligned in the short side direction of the mask frame 11 and parallel to each other.

As indicated by reference numeral 1043 in FIG. 4, a plurality of cover sheets 12 and a plurality of howling sheets 13 are attached to the mask frame 11 in a grid pattern, so that the cover sheets 12 facing each other and the howling sheets 13 facing each other are mounted. and are formed side by side. The contour opening has a shape corresponding to the contour of the display region, which is the formation region of the light emitting layer.

Next, as indicated by step S3 in FIG. 3 and reference numeral 1044 in FIG. 4, the alignment sheet 14 on which the alignment marks are formed is attached to the mask frame 11 so that the alignment marks are at predetermined positions (alignment sheet attaching step). .

When attaching the alignment sheet 14 to the mask frame 11, as indicated by reference numeral 1044 in FIG. It is welded to a predetermined position of the mask frame 11 while stretching (pulling) it by applying a force in a direction. Then, an unnecessary portion outside the welded portion of the alignment sheet 14 is cut. Thereby, each alignment sheet 14 is attached to a predetermined position of the mask frame 11 . In this embodiment, two alignment sheets 14 are attached to the mask frame 11 so as to be parallel to each other along the short sides of the frame opening 11a of the mask frame 11 .

Next, as indicated by step S4 in FIG. 3 and reference numeral 1045 in FIG. 4, a plurality of mask sheets (second sheet-like masks) 15 are attached to the mask frame 11 (mask sheet attaching step).

When the light-emitting layer is deposited on the TFT substrate through the mask sheet 15, the through-holes 151 are formed corresponding to the formation regions of the light-emitting layer that emits light of one of the colors emitted by the light-emitting layer. For example, when a light-emitting layer that emits red light, a light-emitting layer that emits green light, and a light-emitting layer that emits blue light are formed in the display area, the through hole 151 is formed in the light-emitting layer that emits red light. and the pattern of the light emitting layer that emits green light or the light emitting layer that emits blue light.

The through holes 151 are formed in an arrangement corresponding to pixels. Each through hole 151 has the same pitch and shape as each other through hole 151 .

It can also be said that the through holes 151 are openings that contribute to image display in the display area, and the dummy openings 152 are openings that do not contribute to image display in the display area.

As indicated by reference numeral 1045 in FIG. 4, when the mask sheet 15 is attached to the mask frame 11, the mask sheet 15 is stretched (pulled) by applying a force in an outward direction (a direction away from each other) to each of both ends of the mask sheet 15. Then, both ends of the mask sheet 15 are precisely welded to predetermined positions of the mask frame 11 so that the through holes 151 are positioned at predetermined positions based on the alignment marks formed on the alignment sheet 14 .

Also, when stretching and welding the mask frame 11, it is stretched and welded while applying a counterforce according to the amount of deformation of the mask frame 11 after stretching and welding.

Then, after attaching the required number of mask sheets 15 to the mask frame 11 so that the outer openings defined by the cover sheet 12 and the howling sheet 13 are all covered with the through holes 151 . Then, as shown in step S5 of FIG. 3, unnecessary portions outside the welded portion are cut out of each mask sheet 15. Then, as shown in FIG. Thereby, the vapor deposition mask 10 is completed.

Next, as shown in step S6 of FIG. 3, the completed vapor deposition mask 10 is washed, and various mask inspections such as foreign matter inspection and accuracy inspection are performed. Thereafter, the vapor deposition masks 10 that have passed the mask inspection without any problem are stored in a stocker and, if necessary, supplied to a vapor deposition apparatus used in the vapor deposition process.

<Detailed structure of vapor deposition mask>
FIG. 5 is an enlarged view of the essential part X of the vapor deposition mask 10 shown in FIG. 6 is a cross-sectional view taken along line AA of FIG. 5. FIG. A view denoted by reference numeral 1061 in FIG. 6 is a cross-sectional view of the conventional method when the half-etched portion 131 is not formed in the howling sheet 13 in the cross-sectional view taken along line AA of FIG. A view denoted by reference numeral 1062 in FIG. 6 is a cross-sectional view taken along line AA in FIG.

FIG. 7 is a cross-sectional view taken along line BB in FIG. 7 is a cross-sectional view of the conventional method when the half-etched portion 131 is not formed in the howling sheet 13 in the cross-sectional view taken along line BB of FIG. A view denoted by reference numeral 1072 in FIG. 7 is a cross-sectional view taken along line BB in FIG.

As shown in FIG. 5, the mask sheet 15 has dummy openings 152 as dummy pattern openings formed between adjacent through holes 151 as pixel pattern openings. The dummy opening 152 is formed facing the howling sheet 13 .

Normally, the mask sheet 15 is laminated on the howling sheet 13 as indicated by reference numeral 1061 in FIG. More specifically, of the dummy openings 152 of the mask sheet 15 , the side facing the howling sheet 13 is laminated so as to be covered with the howling sheet 13 .

On the other hand, in this embodiment, as indicated by reference numeral 1062 in FIG. A half-etched portion (step) 131 is formed along the opening of the dummy opening 152, which is an opening that does not contribute to the deposition of the vapor deposition film on the 1. As shown in FIG. The half-etched portion 131 is formed at a position facing the periphery of the dummy opening 152 and forms a gap between the howling sheet 13 and the dummy opening 152 . In other words, the side of dummy opening 152 facing howling sheet 13 is not completely covered with howling sheet 13 .

In the portion where the dummy opening 152 is not formed, the howling sheet 13 is normally laminated so as to be in surface contact with the cover sheet 12, as indicated by reference numeral 1071 in FIG. The mask sheet 15 is in surface contact with the howling sheet 13 on the surface of the howling sheet 13 opposite to the surface in surface contact with the cover sheet 12 .

On the other hand, in this embodiment, as indicated by reference numeral 1072 in FIG. are scattered. That is, the howling sheet 13 is laminated on the cover sheet 12 and the mask sheet 15 via the half-etched portion (supporting portion) 131 . In other words, the howling sheet 13 is laminated so as to be in surface contact with part of the cover sheet 12 and in surface contact with part of the mask sheet 15 . As a result, the howling sheet 13 has a half-etched portion, so surface contact with the cover sheet 12 and the mask sheet 15 is reduced.

Thus, as indicated by reference numeral 1061 in FIG. 6 and reference numeral 1071 in FIG. 7, in both conventional methods, the howling sheet 13 is in surface contact with the mask sheet 15 over its entire surface. Therefore, during cleaning by a wet process, the cleaning liquid remains in the dummy openings 152, generating gas, which affects the life of the organic light-emitting element.

On the other hand, in the deposition mask 10 according to the embodiment of the present invention, as indicated by reference numeral 1062 in FIG. It is Therefore, in a structure in which a plurality of mask sheets 15 are stacked on a plurality of howling sheets 13, gaps are formed between the dummy openings 152 of the plurality of mask sheets 15 and the plurality of howling sheets 13. . Therefore, during cleaning by a wet process, the cleaning liquid or foreign matter that has flowed into the dummy openings 152 flows through the gaps between the dummy openings 152 and the plurality of howling sheets 13, thereby reducing the amount of residual cleaning liquid or foreign matter. play.

Further, as indicated by reference numeral 1072 in FIG. 7, gaps are formed by the half-etched portion 131 between the cover sheet 12 and the howling sheet 13 and between the howling sheet 13 and the mask sheet 15 . Therefore, during cleaning by a wet process, the cleaning liquid or foreign matter flows through the gaps between the plurality of cover sheets 12 and mask sheets 15 and the plurality of howling sheets 13, thereby reducing the residual cleaning liquid or foreign matter.

[Embodiment 2]
Other embodiments of the invention are described below. For convenience of description, members having the same functions as those of the members described in the above embodiments are denoted by the same reference numerals, and description thereof will not be repeated. The howling sheet 13A included in the vapor deposition mask 10A of the present embodiment differs in the shape of the half-etched portion 131A from the half-etched portion 131 included in the howling sheet 13 of the first embodiment. The mask sheet 15A of the present embodiment differs from the mask sheet 15 of the first embodiment in the shape and number of dummy openings 152A.

FIG. 8 is a diagram explaining another example of the vapor deposition mask 10. FIG. A diagram denoted by reference numeral 1081 in FIG. 8 is a diagram showing the configuration of the howling seat 13A. A view denoted by reference numeral 1082 in FIG. 8 is a cross-sectional view showing a surface contact state between the howling sheet 13A and the mask sheet 15A.

As indicated by reference numeral 1081 in FIG. 8, a half-etched portion 131A is formed so as to surround a rectangular howling sheet portion 132A when the howling sheet 13A is viewed from the front side of the paper.

As indicated by reference numeral 1082 in FIG. 8, the half-etched portions 131A are formed by etching approximately half the plate thickness of the howling sheet 13A at both ends extending in the extending direction of the howling sheet 13A. The half-etched portion 131A is formed around the dummy opening 152A of the mask sheet 15A when the mask sheet 15A is laminated on the howling sheet 13A. 152 A of dummy opening parts are formed so that 153 A of several opening parts may be scattered. The number of openings 153A is not limited to this as long as the number of openings is plural and a part of them is covered with howling seat portion 132A of howling seat 13A.

As indicated by reference numeral 1082 in FIG. 8, the opening 153A that constitutes the dummy opening 152A has a shape that expands from one end of the semicircular shape toward one surface of the mask sheet 15A. For this reason, for example, the contact angle is smaller than that of an opening corresponding to a shape that expands from one end of an elliptical shape toward one surface of the mask sheet 15A, making it difficult to get wet from the viewpoint of surface tension. . However, the shape of the opening 153A is not limited to this.

As indicated by reference numeral 1082 in FIG. 8, in a state in which the mask sheet 15A is laminated on the howling sheet 13A, the opening 153A corresponding to the boundary between the howling sheet portion 132A and the half-etched portion 131A is the howling sheet of the howling sheet 13A. It is not in surface contact with the portion 132A. In other words, part of the opening 153A is not completely covered with the howling sheet 13A. For this reason, there is a risk that the rigidity of the dummy opening 152A will be compromised. Therefore, it is preferable that the opening 153 corresponding to the boundary between the howling sheet 132A and the half-etched portion 131A is in surface contact with the howling sheet 13A. Note that the above rigidity problem can be avoided by setting the gap between the dummy opening 152A and the half-etched portion 131A in the state indicated by reference numeral 1082 in FIG. 8 in consideration of the incident angle of vapor deposition. can be done.

As described above, in the vapor deposition mask 10A according to the second embodiment, the dummy opening 152A has a plurality of openings 153A, and the amount of surface contact between the openings 153A of the howling sheet 13A is small. Therefore, the vapor deposition mask 10A can reduce the adhesion of the howling sheet 13A and the mask sheet 15A due to surface tension due to residual cleaning liquid.

〔summary〕
A vapor deposition mask according to aspect 1 of the present invention is a vapor deposition mask for patterning a vapor deposition layer in an active region of a vapor deposition substrate in which pixels contributing to display arranged in a matrix in a display region are arranged in a matrix. a first sheet-like mask in which an outer shape opening having a shape corresponding to at least part of an outer shape of the display area is formed corresponding to an arrangement pattern of the display area; and the first sheet-like mask. and a second sheet-shaped mask having a plurality of openings formed therein, wherein the first sheet-shaped mask has the openings of the second sheet-shaped mask on the surface facing the second sheet-shaped mask A step is formed along the opening of the opening that does not contribute to the formation of the vapor deposition film on the vapor deposition target substrate.

According to the above configuration, in the first sheet-like mask laminated on the second sheet-like mask, a step is formed along the opening of the opening (dummy opening) formed in the second sheet-like mask that does not contribute to display. A gap is formed between the opening and the second sheet-like mask. As a result, when the vapor deposition mask is cleaned by the wet process, the cleaning liquid or foreign matter flows through the gap, thereby reducing the residual cleaning liquid or foreign matter.

In the vapor deposition mask according to aspect 2 of the present invention, in aspect 1, the step of the second sheet-like mask is formed by half-etching the surface of the second sheet-like mask facing the first sheet-like mask. It is preferable that

According to the above configuration, in the manufacturing process of the vapor deposition mask, it is possible to easily form a step by half-etching a desired position on the first sheet mask.

In the vapor deposition mask according to aspect 3 of the present invention, in aspect 1 or 2, the first sheet-like mask is supported in a gap formed between the first sheet-like mask and the second sheet-like mask at the same height as the step. It is preferable that the parts are interspersed.

According to the above configuration, it is possible to further reduce the area of surface contact between the second sheet-shaped mask and the first sheet-shaped mask.

A vapor deposition mask according to aspect 4 of the present invention is the vapor deposition mask according to aspect 3, wherein the supporting portion is formed by half-etching a surface of the second sheet-like mask facing the first sheet-like mask. preferable.

According to the above configuration, in the manufacturing process of the vapor deposition mask, the supporting portion can be easily formed only by half-etching the desired position on the first sheet-shaped mask.

The vapor deposition mask according to aspect 5 of the present invention, in any one aspect of aspects 1 to 4, preferably includes a frame-shaped mask frame to which the first sheet-like mask and the second sheet-like mask are attached.

According to the above configuration, since both the first sheet-like mask and the second sheet-like mask are attached to a highly rigid mask frame, the positions of the external opening and the effective portion in the vapor deposition mask can be precisely positioned. can be matched.

A vapor deposition mask according to aspect 6 of the present invention is a vapor deposition mask according to aspect 5, wherein the first sheet-like mask comprises a plurality of cover sheets extending in a first direction and attached to the mask frame in parallel with each other; and a plurality of howling sheets extending in a second direction orthogonal to and attached to the mask frame parallel to each other, wherein the outer shape opening is defined by the cover sheet adjacent to each other and the howling sheet adjacent to each other It is preferable that the area is With the above configuration, the outer shape opening can be configured.

A display panel manufacturing method according to aspect 7 of the present invention may include a vapor deposition step using the vapor deposition mask according to any one of aspects 1 to 6 above.

The present invention is not limited to the above-described embodiments, but can be modified in various ways within the scope of the claims, and can be obtained by appropriately combining technical means disclosed in different embodiments. is also included in the technical scope of the present invention. Furthermore, new technical features can be formed by combining the technical means disclosed in each embodiment.

1 TFT substrate (substrate to be deposited)

Reference Signs List

10, 10A deposition mask 11 mask frame 11a frame opening 12 cover sheet (first sheet mask)
13, 13A Howling sheet (first sheet mask)
15, 15A Mask sheet (second sheet mask)
131, 131A half etching part (step, support part)
151 through

hole

152, 152A dummy opening

Claims

A vapor deposition mask for patterning a vapor deposition layer in an active region in which pixels contributing to display are arranged in a matrix and arranged in a matrix in a display region of a substrate to be vapor-deposited,
a first sheet-shaped mask in which an outline opening having a shape corresponding to at least part of the outline of the display area is formed corresponding to the arrangement pattern of the display area;
A second sheet-shaped mask laminated on the first sheet-shaped mask and having a plurality of openings formed therein,
The first sheet mask is
A step is formed on the surface facing the second sheet-shaped mask along the openings of the openings of the second sheet-shaped mask that do not contribute to the formation of the vapor deposition film on the substrate to be vapor-deposited. A vapor deposition mask characterized by being
2. The deposition mask according to claim 1, wherein the steps of the second sheet-like mask are formed by half-etching a surface of the second sheet-like mask facing the first sheet-like mask. .
The first sheet mask is
3. The vapor deposition mask according to claim 1, wherein support portions having the same height as said step are interspersed in the gap formed between said second sheet-like mask.
4. The vapor deposition mask according to claim 3, wherein the supporting portion is formed by half-etching a surface of the second sheet-like mask facing the first sheet-like mask.
The vapor deposition mask according to any one of claims 1 to 4, further comprising a frame-shaped mask frame to which the first sheet-like mask and the second sheet-like mask are attached.
The first sheet-like mask includes a plurality of cover sheets attached to the mask frame parallel to each other and extending in a first direction, and a plurality of cover sheets extending in a second direction orthogonal to the first direction and parallel to each other on the mask frame. with multiple howling sheets attached,
6. The vapor deposition mask according to claim 5, wherein the outer shape opening is a region defined by the cover sheets adjacent to each other and the howling sheets adjacent to each other.
A method of manufacturing a display panel, comprising a vapor deposition step using the vapor deposition mask according to any one of claims 1 to 6.