WO2022162447A1 - Processes for preparation of chlorantraniliprole or a salt or its intermediates thereof - Google Patents
Processes for preparation of chlorantraniliprole or a salt or its intermediates thereof Download PDFInfo
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- WO2022162447A1 WO2022162447A1 PCT/IB2021/057708 IB2021057708W WO2022162447A1 WO 2022162447 A1 WO2022162447 A1 WO 2022162447A1 IB 2021057708 W IB2021057708 W IB 2021057708W WO 2022162447 A1 WO2022162447 A1 WO 2022162447A1
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- WO
- WIPO (PCT)
- Prior art keywords
- formula
- compound
- rrt
- methyl
- chloride
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 121
- 230000008569 process Effects 0.000 title claims abstract description 110
- 239000005886 Chlorantraniliprole Substances 0.000 title claims abstract description 86
- PSOVNZZNOMJUBI-UHFFFAOYSA-N chlorantraniliprole Chemical compound CNC(=O)C1=CC(Cl)=CC(C)=C1NC(=O)C1=CC(Br)=NN1C1=NC=CC=C1Cl PSOVNZZNOMJUBI-UHFFFAOYSA-N 0.000 title claims abstract description 86
- 238000002360 preparation method Methods 0.000 title claims abstract description 75
- 150000003839 salts Chemical class 0.000 title abstract description 18
- 239000000543 intermediate Substances 0.000 title description 14
- 150000001875 compounds Chemical class 0.000 claims description 199
- 238000006243 chemical reaction Methods 0.000 claims description 146
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 claims description 114
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 102
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 93
- 239000002904 solvent Substances 0.000 claims description 59
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 54
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 49
- 239000000203 mixture Substances 0.000 claims description 49
- 239000000243 solution Substances 0.000 claims description 49
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 49
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 48
- 239000007787 solid Substances 0.000 claims description 48
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 42
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 36
- 125000000217 alkyl group Chemical group 0.000 claims description 35
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 33
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 30
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 30
- 238000010992 reflux Methods 0.000 claims description 29
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 claims description 27
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 claims description 26
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 24
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 claims description 24
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 24
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 claims description 22
- -1 benzotriazol- 1-yl-oxytripyrrolidino phosphonium hexafluorophosphate Chemical compound 0.000 claims description 22
- 238000004128 high performance liquid chromatography Methods 0.000 claims description 22
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 21
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 21
- 239000002253 acid Substances 0.000 claims description 21
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 21
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 claims description 20
- 239000003960 organic solvent Substances 0.000 claims description 19
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 18
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 claims description 18
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 18
- 239000012535 impurity Substances 0.000 claims description 17
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 16
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 claims description 16
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 15
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims description 15
- 238000001914 filtration Methods 0.000 claims description 15
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 claims description 14
- 238000001816 cooling Methods 0.000 claims description 13
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims description 12
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 claims description 12
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 claims description 12
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 12
- 230000003213 activating effect Effects 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 12
- 239000007789 gas Substances 0.000 claims description 12
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 12
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 11
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 claims description 11
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims description 11
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims description 11
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 11
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 claims description 10
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 10
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- PAQZWJGSJMLPMG-UHFFFAOYSA-N 2,4,6-tripropyl-1,3,5,2$l^{5},4$l^{5},6$l^{5}-trioxatriphosphinane 2,4,6-trioxide Chemical compound CCCP1(=O)OP(=O)(CCC)OP(=O)(CCC)O1 PAQZWJGSJMLPMG-UHFFFAOYSA-N 0.000 claims description 9
- 239000012359 Methanesulfonyl chloride Substances 0.000 claims description 9
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 9
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 9
- 238000005580 one pot reaction Methods 0.000 claims description 9
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 claims description 9
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 claims description 9
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 claims description 9
- 239000008096 xylene Substances 0.000 claims description 9
- 235000011054 acetic acid Nutrition 0.000 claims description 8
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 claims description 8
- 239000007800 oxidant agent Substances 0.000 claims description 8
- 239000011736 potassium bicarbonate Substances 0.000 claims description 8
- 229910000028 potassium bicarbonate Inorganic materials 0.000 claims description 8
- 235000015497 potassium bicarbonate Nutrition 0.000 claims description 8
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 claims description 8
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 claims description 8
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 8
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 7
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 7
- YNESATAKKCNGOF-UHFFFAOYSA-N lithium bis(trimethylsilyl)amide Chemical compound [Li+].C[Si](C)(C)[N-][Si](C)(C)C YNESATAKKCNGOF-UHFFFAOYSA-N 0.000 claims description 7
- 239000001117 sulphuric acid Substances 0.000 claims description 7
- 235000011149 sulphuric acid Nutrition 0.000 claims description 7
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 6
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 claims description 6
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 claims description 6
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 claims description 6
- 238000002441 X-ray diffraction Methods 0.000 claims description 6
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 claims description 6
- 229910000024 caesium carbonate Inorganic materials 0.000 claims description 6
- 229940043279 diisopropylamine Drugs 0.000 claims description 6
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 claims description 6
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 claims description 6
- RIVIDPPYRINTTH-UHFFFAOYSA-N n-ethylpropan-2-amine Chemical compound CCNC(C)C RIVIDPPYRINTTH-UHFFFAOYSA-N 0.000 claims description 6
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 6
- 235000011181 potassium carbonates Nutrition 0.000 claims description 6
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims description 6
- 235000017557 sodium bicarbonate Nutrition 0.000 claims description 6
- 235000017550 sodium carbonate Nutrition 0.000 claims description 6
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims description 6
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 6
- UCPYLLCMEDAXFR-UHFFFAOYSA-N triphosgene Chemical compound ClC(Cl)(Cl)OC(=O)OC(Cl)(Cl)Cl UCPYLLCMEDAXFR-UHFFFAOYSA-N 0.000 claims description 6
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 claims description 5
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 claims description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 5
- QGHDLJAZIIFENW-UHFFFAOYSA-N 4-[1,1,1,3,3,3-hexafluoro-2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical group C1=C(CC=C)C(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C(CC=C)=C1 QGHDLJAZIIFENW-UHFFFAOYSA-N 0.000 claims description 4
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 claims description 4
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 claims description 4
- 229910019142 PO4 Inorganic materials 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 claims description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 4
- PFKFTWBEEFSNDU-UHFFFAOYSA-N carbonyldiimidazole Chemical compound C1=CN=CN1C(=O)N1C=CN=C1 PFKFTWBEEFSNDU-UHFFFAOYSA-N 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 claims description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 4
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 4
- 239000010452 phosphate Substances 0.000 claims description 4
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 claims description 4
- BDNKZNFMNDZQMI-UHFFFAOYSA-N 1,3-diisopropylcarbodiimide Chemical compound CC(C)N=C=NC(C)C BDNKZNFMNDZQMI-UHFFFAOYSA-N 0.000 claims description 3
- JVSFQJZRHXAUGT-UHFFFAOYSA-N 2,2-dimethylpropanoyl chloride Chemical compound CC(C)(C)C(Cl)=O JVSFQJZRHXAUGT-UHFFFAOYSA-N 0.000 claims description 3
- MFGOFGRYDNHJTA-UHFFFAOYSA-N 2-amino-1-(2-fluorophenyl)ethanol Chemical compound NCC(O)C1=CC=CC=C1F MFGOFGRYDNHJTA-UHFFFAOYSA-N 0.000 claims description 3
- NHQDETIJWKXCTC-UHFFFAOYSA-N 3-chloroperbenzoic acid Chemical compound OOC(=O)C1=CC=CC(Cl)=C1 NHQDETIJWKXCTC-UHFFFAOYSA-N 0.000 claims description 3
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 3
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 claims description 3
- CLZISMQKJZCZDN-UHFFFAOYSA-N [benzotriazol-1-yloxy(dimethylamino)methylidene]-dimethylazanium Chemical compound C1=CC=C2N(OC(N(C)C)=[N+](C)C)N=NC2=C1 CLZISMQKJZCZDN-UHFFFAOYSA-N 0.000 claims description 3
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 claims description 3
- 239000012346 acetyl chloride Substances 0.000 claims description 3
- 239000012736 aqueous medium Substances 0.000 claims description 3
- RROBIDXNTUAHFW-UHFFFAOYSA-N benzotriazol-1-yloxy-tris(dimethylamino)phosphanium Chemical compound C1=CC=C2N(O[P+](N(C)C)(N(C)C)N(C)C)N=NC2=C1 RROBIDXNTUAHFW-UHFFFAOYSA-N 0.000 claims description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- BGRWYRAHAFMIBJ-UHFFFAOYSA-N diisopropylcarbodiimide Natural products CC(C)NC(=O)NC(C)C BGRWYRAHAFMIBJ-UHFFFAOYSA-N 0.000 claims description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 claims description 3
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 claims description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 claims description 3
- 239000000546 pharmaceutical excipient Substances 0.000 claims description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- WRIKHQLVHPKCJU-UHFFFAOYSA-N sodium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([Na])[Si](C)(C)C WRIKHQLVHPKCJU-UHFFFAOYSA-N 0.000 claims description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 3
- LMDZBCPBFSXMTL-UHFFFAOYSA-N 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide Chemical compound CCN=C=NCCCN(C)C LMDZBCPBFSXMTL-UHFFFAOYSA-N 0.000 claims description 2
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 claims description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 claims description 2
- 239000005711 Benzoic acid Substances 0.000 claims description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 2
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 claims description 2
- LVZWSLJZHVFIQJ-UHFFFAOYSA-N Cyclopropane Chemical compound C1CC1 LVZWSLJZHVFIQJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000012425 OXONE® Substances 0.000 claims description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 2
- GPDHNZNLPKYHCN-DZOOLQPHSA-N [[(z)-(1-cyano-2-ethoxy-2-oxoethylidene)amino]oxy-morpholin-4-ylmethylidene]-dimethylazanium;hexafluorophosphate Chemical compound F[P-](F)(F)(F)(F)F.CCOC(=O)C(\C#N)=N/OC(=[N+](C)C)N1CCOCC1 GPDHNZNLPKYHCN-DZOOLQPHSA-N 0.000 claims description 2
- TVNASBPRZBQSLH-UHFFFAOYSA-N [benzotriazol-1-yloxy-(dimethoxyamino)methylidene]-dimethoxyazanium Chemical compound CO[N+](=C(ON1N=NC2=C1C=CC=C2)N(OC)OC)OC TVNASBPRZBQSLH-UHFFFAOYSA-N 0.000 claims description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 claims description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 claims description 2
- CSKNSYBAZOQPLR-UHFFFAOYSA-N benzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=CC=C1 CSKNSYBAZOQPLR-UHFFFAOYSA-N 0.000 claims description 2
- 235000010233 benzoic acid Nutrition 0.000 claims description 2
- MOIPGXQKZSZOQX-UHFFFAOYSA-N carbonyl bromide Chemical compound BrC(Br)=O MOIPGXQKZSZOQX-UHFFFAOYSA-N 0.000 claims description 2
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 claims description 2
- 239000004914 cyclooctane Substances 0.000 claims description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 2
- HCUYBXPSSCRKRF-UHFFFAOYSA-N diphosgene Chemical compound ClC(=O)OC(Cl)(Cl)Cl HCUYBXPSSCRKRF-UHFFFAOYSA-N 0.000 claims description 2
- FRYHCSODNHYDPU-UHFFFAOYSA-N ethanesulfonyl chloride Chemical compound CCS(Cl)(=O)=O FRYHCSODNHYDPU-UHFFFAOYSA-N 0.000 claims description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 2
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 claims description 2
- 229940011051 isopropyl acetate Drugs 0.000 claims description 2
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 claims description 2
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 claims description 2
- DUWWHGPELOTTOE-UHFFFAOYSA-N n-(5-chloro-2,4-dimethoxyphenyl)-3-oxobutanamide Chemical compound COC1=CC(OC)=C(NC(=O)CC(C)=O)C=C1Cl DUWWHGPELOTTOE-UHFFFAOYSA-N 0.000 claims description 2
- HJKYXKSLRZKNSI-UHFFFAOYSA-I pentapotassium;hydrogen sulfate;oxido sulfate;sulfuric acid Chemical compound [K+].[K+].[K+].[K+].[K+].OS([O-])(=O)=O.[O-]S([O-])(=O)=O.OS(=O)(=O)O[O-].OS(=O)(=O)O[O-] HJKYXKSLRZKNSI-UHFFFAOYSA-I 0.000 claims description 2
- 235000011007 phosphoric acid Nutrition 0.000 claims description 2
- IUBQJLUDMLPAGT-UHFFFAOYSA-N potassium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([K])[Si](C)(C)C IUBQJLUDMLPAGT-UHFFFAOYSA-N 0.000 claims description 2
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 claims description 2
- 239000012286 potassium permanganate Substances 0.000 claims description 2
- 235000019260 propionic acid Nutrition 0.000 claims description 2
- 229910001510 metal chloride Inorganic materials 0.000 claims 2
- QARBMVPHQWIHKH-KHWXYDKHSA-N methanesulfonyl chloride Chemical group C[35S](Cl)(=O)=O QARBMVPHQWIHKH-KHWXYDKHSA-N 0.000 claims 1
- 238000003756 stirring Methods 0.000 description 50
- 239000002585 base Substances 0.000 description 29
- 239000012044 organic layer Substances 0.000 description 23
- 239000000047 product Substances 0.000 description 23
- 239000000463 material Substances 0.000 description 18
- 238000001556 precipitation Methods 0.000 description 14
- 150000002170 ethers Chemical class 0.000 description 13
- 239000010410 layer Substances 0.000 description 13
- 150000002576 ketones Chemical class 0.000 description 12
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 10
- 238000001035 drying Methods 0.000 description 10
- 150000008282 halocarbons Chemical class 0.000 description 10
- 150000002825 nitriles Chemical class 0.000 description 10
- 229910052783 alkali metal Inorganic materials 0.000 description 8
- 150000001408 amides Chemical class 0.000 description 8
- 238000002955 isolation Methods 0.000 description 8
- 238000002425 crystallisation Methods 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 6
- 150000007529 inorganic bases Chemical class 0.000 description 6
- 238000001144 powder X-ray diffraction data Methods 0.000 description 6
- 150000003462 sulfoxides Chemical class 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 5
- 238000010908 decantation Methods 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 4
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 4
- 150000008041 alkali metal carbonates Chemical class 0.000 description 4
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 4
- 238000005660 chlorination reaction Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 150000007530 organic bases Chemical class 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- FQMUOIZSRNYHTL-UHFFFAOYSA-N ethyl 5-bromo-2-(3-chloropyridin-2-yl)pyrazole-3-carboxylate Chemical compound CCOC(=O)C1=CC(Br)=NN1C1=NC=CC=C1Cl FQMUOIZSRNYHTL-UHFFFAOYSA-N 0.000 description 3
- 239000002917 insecticide Substances 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- XAYCTBDPZIKHCW-UHFFFAOYSA-N (3-chloropyridin-2-yl)hydrazine Chemical compound NNC1=NC=CC=C1Cl XAYCTBDPZIKHCW-UHFFFAOYSA-N 0.000 description 2
- QIVUCLWGARAQIO-OLIXTKCUSA-N (3s)-n-[(3s,5s,6r)-6-methyl-2-oxo-1-(2,2,2-trifluoroethyl)-5-(2,3,6-trifluorophenyl)piperidin-3-yl]-2-oxospiro[1h-pyrrolo[2,3-b]pyridine-3,6'-5,7-dihydrocyclopenta[b]pyridine]-3'-carboxamide Chemical compound C1([C@H]2[C@H](N(C(=O)[C@@H](NC(=O)C=3C=C4C[C@]5(CC4=NC=3)C3=CC=CN=C3NC5=O)C2)CC(F)(F)F)C)=C(F)C=CC(F)=C1F QIVUCLWGARAQIO-OLIXTKCUSA-N 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- GWGIBEMOOVJUPI-UHFFFAOYSA-N ethyl 2-(3-chloropyridin-2-yl)-5-oxopyrazolidine-3-carboxylate Chemical compound CCOC(=O)C1CC(=O)NN1C1=NC=CC=C1Cl GWGIBEMOOVJUPI-UHFFFAOYSA-N 0.000 description 2
- GUAZTUMVVYURLC-UHFFFAOYSA-N ethyl 5-bromo-2-(3-chloropyridin-2-yl)-3,4-dihydropyrazole-3-carboxylate Chemical compound CCOC(=O)C1CC(Br)=NN1C1=NC=CC=C1Cl GUAZTUMVVYURLC-UHFFFAOYSA-N 0.000 description 2
- 239000002360 explosive Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 239000013067 intermediate product Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000634 powder X-ray diffraction Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000000638 solvent extraction Methods 0.000 description 2
- BIIBYWQGRFWQKM-JVVROLKMSA-N (2S)-N-[4-(cyclopropylamino)-3,4-dioxo-1-[(3S)-2-oxopyrrolidin-3-yl]butan-2-yl]-2-[[(E)-3-(2,4-dichlorophenyl)prop-2-enoyl]amino]-4,4-dimethylpentanamide Chemical compound CC(C)(C)C[C@@H](C(NC(C[C@H](CCN1)C1=O)C(C(NC1CC1)=O)=O)=O)NC(/C=C/C(C=CC(Cl)=C1)=C1Cl)=O BIIBYWQGRFWQKM-JVVROLKMSA-N 0.000 description 1
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 description 1
- MAKFMOSBBNKPMS-UHFFFAOYSA-N 2,3-dichloropyridine Chemical compound ClC1=CC=CN=C1Cl MAKFMOSBBNKPMS-UHFFFAOYSA-N 0.000 description 1
- WNAJXPYVTFYEST-UHFFFAOYSA-N 2-Amino-3-methylbenzoate Chemical compound CC1=CC=CC(C(O)=O)=C1N WNAJXPYVTFYEST-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- DWKNOLCXIFYNFV-HSZRJFAPSA-N 2-[[(2r)-1-[1-[(4-chloro-3-methylphenyl)methyl]piperidin-4-yl]-5-oxopyrrolidine-2-carbonyl]amino]-n,n,6-trimethylpyridine-4-carboxamide Chemical compound CN(C)C(=O)C1=CC(C)=NC(NC(=O)[C@@H]2N(C(=O)CC2)C2CCN(CC=3C=C(C)C(Cl)=CC=3)CC2)=C1 DWKNOLCXIFYNFV-HSZRJFAPSA-N 0.000 description 1
- GNFTZDOKVXKIBK-UHFFFAOYSA-N 3-(2-methoxyethoxy)benzohydrazide Chemical compound COCCOC1=CC=CC(C(=O)NN)=C1 GNFTZDOKVXKIBK-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- HFGHRUCCKVYFKL-UHFFFAOYSA-N 4-ethoxy-2-piperazin-1-yl-7-pyridin-4-yl-5h-pyrimido[5,4-b]indole Chemical compound C1=C2NC=3C(OCC)=NC(N4CCNCC4)=NC=3C2=CC=C1C1=CC=NC=C1 HFGHRUCCKVYFKL-UHFFFAOYSA-N 0.000 description 1
- FORBXGROTPOMEH-UHFFFAOYSA-N 5-bromo-2-(3-chloropyridin-2-yl)pyrazole-3-carboxylic acid Chemical compound OC(=O)C1=CC(Br)=NN1C1=NC=CC=C1Cl FORBXGROTPOMEH-UHFFFAOYSA-N 0.000 description 1
- SJVGFKBLUYAEOK-SFHVURJKSA-N 6-[4-[(3S)-3-(3,5-difluorophenyl)-3,4-dihydropyrazole-2-carbonyl]piperidin-1-yl]pyrimidine-4-carbonitrile Chemical compound FC=1C=C(C=C(C=1)F)[C@@H]1CC=NN1C(=O)C1CCN(CC1)C1=CC(=NC=N1)C#N SJVGFKBLUYAEOK-SFHVURJKSA-N 0.000 description 1
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 description 1
- 241000254173 Coleoptera Species 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- 241000255925 Diptera Species 0.000 description 1
- 239000007821 HATU Substances 0.000 description 1
- 241000256602 Isoptera Species 0.000 description 1
- 241000255777 Lepidoptera Species 0.000 description 1
- 239000012317 TBTU Substances 0.000 description 1
- 241000607479 Yersinia pestis Species 0.000 description 1
- YTAHJIFKAKIKAV-XNMGPUDCSA-N [(1R)-3-morpholin-4-yl-1-phenylpropyl] N-[(3S)-2-oxo-5-phenyl-1,3-dihydro-1,4-benzodiazepin-3-yl]carbamate Chemical compound O=C1[C@H](N=C(C2=C(N1)C=CC=C2)C1=CC=CC=C1)NC(O[C@H](CCN1CCOCC1)C1=CC=CC=C1)=O YTAHJIFKAKIKAV-XNMGPUDCSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 150000001412 amines Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000013461 intermediate chemical Substances 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- VOVZXURTCKPRDQ-CQSZACIVSA-N n-[4-[chloro(difluoro)methoxy]phenyl]-6-[(3r)-3-hydroxypyrrolidin-1-yl]-5-(1h-pyrazol-5-yl)pyridine-3-carboxamide Chemical compound C1[C@H](O)CCN1C1=NC=C(C(=O)NC=2C=CC(OC(F)(F)Cl)=CC=2)C=C1C1=CC=NN1 VOVZXURTCKPRDQ-CQSZACIVSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- UXCDUFKZSUBXGM-UHFFFAOYSA-N phosphoric tribromide Chemical compound BrP(Br)(Br)=O UXCDUFKZSUBXGM-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- HRZFUMHJMZEROT-UHFFFAOYSA-L sodium disulfite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])(=O)=O HRZFUMHJMZEROT-UHFFFAOYSA-L 0.000 description 1
- 235000010262 sodium metabisulphite Nutrition 0.000 description 1
- 239000004296 sodium metabisulphite Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- ZWZVWGITAAIFPS-UHFFFAOYSA-N thiophosgene Chemical compound ClC(Cl)=S ZWZVWGITAAIFPS-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C231/00—Preparation of carboxylic acid amides
- C07C231/02—Preparation of carboxylic acid amides from carboxylic acids or from esters, anhydrides, or halides thereof by reaction with ammonia or amines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C231/00—Preparation of carboxylic acid amides
- C07C231/12—Preparation of carboxylic acid amides by reactions not involving the formation of carboxamide groups
Definitions
- the present invention relates to processes for preparation of chlorantraniliprole or a salt thereof. Further, the present invention relates to an improved process for preparation of intermediate of chlorantraniliprole.
- Chlorantraniliprole is a class of anthranilic-diamide insecticide derivative compounds and is chemically known as 3-Bromo-N-[4-chloro-2-methyl-6-(methyl carbamoyl) phenyl]-l-(3-chloro-2-pyridine-2-yl)-lH-pyrazole-5-carboxamide, it has the following structure:
- Chlorantraniliprole is being developed world-wide by DuPont belonging to a new class of selective insecticides featuring a novel mode of action to control a range of pests belonging to the order Lepidoptera and some other Coleoptera, Diptera and Isoptera species.
- Preparation of chlorantraniliprole was disclosed in different patent publications; for example, PCT application Number: 2003/015519 (“the ‘519 publication”) disclosed process to prepare chlorantraniliprole by the following scheme:
- Chlorantraniliprole All the above reported process of chlorantraniliprole involves expensive raw materials and involves formation of impurities with low yields and purity.
- Compound of Formula V is the key intermediate and main cost contributor in the preparation of chlorantraniliprole.
- the ‘978 process also involves use of hydrogen peroxide in oxy-chlorination, which is not viable on large scale manufacturing as it extremely shock-sensitive explosives and require special care while handling.
- Chlorantraniliprole is one of the important insecticide available in the market. As all the reported processes involves isolation of each intermediate products of Formula All and Formula AIII as solid in the preparation of Formula V, which involves increasing the reactor occupancy and additional process steps such as use of multiple solvent systems for each stage, isolation of each stage by filtration, drying and testing of each intermediate; hence, the reported processes requires excess reactor occupancy and excess manufacturing time and this creates extra burden to the final cost of the material. As disclosed above, compound of Formula V is the key cost contributor in the preparation of chlorantraniliprole and to reduce the manufacturing cost of the chlorantraniliprole it is desirable to reduce the manufacturing cost of the intermediates involved in the process.
- the present invention provides processes for preparation of chlorantraniliprole or a salt thereof of Formula I.
- the present invention also relates to an improved process for preparation of chlorantraniliprole or a salt thereof without isolating the intermediates.
- the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II, wherein “R” is selected from straight or branched chain Ci-6 alkyl group; and b) reacting the compound of Formula II with a source of monomethylamine to obtain chlorantraniliprole.
- the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II, wherein “R” is selected from straight or branched chain Ci-6 alkyl group; and b) reacting the compound of Formula II with a source of monomethylamine to obtain chlorantraniliprole; wherein the compound of Formula II is not isolated as a solid.
- the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a solution containing compound of Formula II, wherein “R” is selected from straight or branched chain Ci-6 alkyl group; and b) adding a source of monomethylamine to the step a) to obtain chlorantraniliprole.
- the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent at a temperature of about 25°C to reflux temperature, b) cooling the step a) solution to below 25°C, c) adding a source of monomethylamine to the step b) solution, d) heating the step c) to about 25°C to reflux temperature, e) concentrating the step d) reaction mass to obtain a solid compound, f) adding a suitable organic solvent to the step e) and heating to reflux temperature, g) cooling the solution to below 35°C, and h) filtering the chlorantraniliprole.
- the present invention provides an improved process for preparation of a compound of Formula IV, comprising: a) mixing a suitable oxidizing agent, a suitable acid and a suitable organic solvent, b) heating the reaction mass to about 40°C to reflux temperature, c) adding a compound of Formula VII to the above step b) reaction mass,
- Formula VII d) isolating the compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, and e) hydrolyzing the compound of formula VI, wherein “R” is selected from straight or branched chain Ci-6 alkyl group to obtain a compound of Formula IV.
- the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) mixing a suitable oxidizing agent, a suitable acid and a suitable organic solvent b) heating the reaction mass to about 40°C to reflux temperature, c) adding a compound of Formula VII, wherein “R” is selected from straight or branched chain Ci-6 alkyl group, to the above step b) reaction mass
- Formula VII d) isolating the compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group
- the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: reacting a compound of Formula II; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a source of monomethylamine in a suitable solvent to obtain chlorantraniliprole.
- the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is methyl, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II, wherein “R” is methyl; and b) reacting the compound of Formula II, wherein “R” is methyl with a source of monomethylamine to obtain chlorantraniliprole; wherein the compound of Formula II is not isolated as a solid.
- the present invention provides an improved process for preparation of chlorantraniliprole of Formula I, comprising: reacting a compound of Formula V with a compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, in presence of a suitable base and a suitable solvent to obtain chlorantraniliprole.
- the present invention provides an improved process for preparation of chlorantraniliprole of Formula I, comprising: reacting a compound of Formula V with a compound of Formula VI; wherein “R” is ethyl, in presence of a suitable base and a suitable solvent to obtain chlorantraniliprole.
- the present invention provides an improved process for preparation of chlorantraniliprole of Formula I, a) mixing a suitable oxidizing agent, a suitable acid and a suitable organic solvent b) heating the reaction mass to about 40°C to reflux temperature, c) adding a compound of Formula VII, wherein “R” is selected from straight or branched chain Ci-6 alkyl group, to the above step b) reaction mass,
- Formula VII d) isolating the compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, and
- the present invention provides an improved process for preparation of compound of Formula V, comprising:
- the present invention provides an improved process for preparation of compound of Formula V, comprising: a) reacting a compound of Formula Al with a phosgene or its derivative and a suitable inorganic base in a suitable solvent to obtain a compound of Formula All, b) reacting the compound of Formula All with a source of monomethyl amine to obtain a compound of Formula AIII, and c) reacting the compound of Formula AIII with a source of chloride to obtain a compound of Formula V; wherein the step a) to c) are carried out in one -pot reaction without isolating the intermediate compound of Formula All and Formula AIII as solid.
- the present invention provides an improved process for preparation of compound of Formula V, comprising: a) reacting a compound of Formula Al with a phosgene or its derivative and a suitable base in a suitable solvent to obtain a solution of compound of Formula All, b) adding a source of monomethyl amine to the solution of compound of Formula All to obtain a solution of compound of Formula AIII, c) adding a source of chloride to the solution of compound of Formula AIII to obtain a compound of Formula V ; and d) isolating the compound of Formula V.
- the present invention provides an improved process for preparation of compound of Formula V, comprising: a) reacting a compound of Formula Al with a phosgene or its derivative and a suitable base in a suitable solvent to obtain a solution containing compound of Formula All, b) adding a source of monomethyl amine to the solution of step a) to obtain a containing compound of Formula AIII, c) adding a source of chloride to the solution of step b) to obtain a solution of containing compound of Formula V, d) adding water and a suitable acid to the step c) solution, e) separating the organic and aqueous layers, f) adding a suitable base to the aqueous layer, and g) filtering the compound of Formula V.
- the present invention provides an improved process for preparation of compound of Formula V having less than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11, comprising: a) reacting a compound of Formula AIII with a source of chloride to obtain a solution containing compound of Formula V having more than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11, b) adding water and a suitable acid to the step a) solution, c) separating the organic and aqueous layers
- the present invention provides an improved process for preparation of chlorantraniliprole , comprising: a) preparing a compound of Formula V according processes described as above embodiments, and b) converting the compound of Formula V in to chlorantraniliprole.
- the present invention provides a compound of Formula V having less than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT- 2.62, RRT-2.96, RRT-3.08 and RRT-3.11.
- the present invention provides crystalline chlorantraniliprole characterized by a powder X-ray diffraction (PXRD) pattern substantially in accordance with Figure 1.
- PXRD powder X-ray diffraction
- the present invention provides crystalline chlorantraniliprole characterized by X-Ray diffraction (XRD) pattern having at least one peak selected from at about 8.6, 10.0, 10.5, 10.6, 11.4, 11.7, 12.2, 14.0, 14.2, 14.4, 14.6, 14.9, 15.6, 16.1, 16.6, 17.3, 17.5, 17.8, 18.3, 18.5, 20.0, 20.3, 20.5, 20.7, 21.1, 21.2, 21.4, 21.5, 21.7, 22.7, 22.9, 23.4, 24.3, 24.7, 24.9, 25.3, 25.6, 26.1, 27.2, 27.5, 28.4, 29.0, 29.2, 29.4, 29.8, 30.0 and 30.3 ⁇ 0.2° 20.
- the present invention provides a crystalline compound of Formula Ila characterized by a powder X-ray diffraction (PXRD) pattern substantially in accordance with Figure 2.
- PXRD powder X-ray diffraction
- the present invention provides a crystalline compound of Formula Ila characterized by X-Ray diffraction (XRD) pattern having at least one peak selected from at about 6.8, 8.2, 9.3, 10.1, 11.1, 12.4, 12.8, 13.5, 14.3, 14.8, 15.6, 15.7, 15.9, 16.5, 18.1, 18.7, 19.0, 19.5, 19.9, 20.4, 20.9, 21.7, 22.0, 22.5, 22.7, 23.2, 23.5, 24.0, 24.3, 24.8, 25.3, 25.9, 26.4, 27.2, 27.7, 27.9, 28.3, 28.9, 29.1, 29.2, 29.8 and 30.5 ⁇ 0.2° 20.
- XRD X-Ray diffraction
- the present invention provides a composition comprising chlorantraniliprole, prepared by the process of the present invention and/or at least one excipient.
- Figure 1 is the characteristic powder X-ray diffraction (PXRD) pattern of chlorantraniliprole prepared according to Example- 1.
- Figure 2 is the characteristic powder X-ray diffraction (PXRD) pattern of Formula Ila prepared according to Example -4.
- PXRD powder X-ray diffraction
- the present invention encompasses processes for preparation of chlorantraniliprole of Formula I.
- the present invention also relates to an improved process for preparation of chlorantraniliprole or a salt thereof without isolating compound of Formula II.
- the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II, wherein “R” is selected from straight or branched chain Ci-6 alkyl group; and b) reacting the compound of Formula II with a source of monomethylamine to obtain chlorantraniliprole.
- the term “straight or branched chain Ci-6 alkyl” used herein is selected from but not limited to methyl, ethyl, propyl, isopropyl, butyl, iso-butyl, tertbutyl, pentyl, iso-pentyl, hexyl, iso-hexyl, iso-amyl and the like.
- the straight or branched chain Ci-6 alkyl may be further substituted with a suitable substituent, which may be selected from the group comprising halogen, aryl and the like; preferably methyl, ethyl or iso-butyl; more preferably methyl or ethyl.
- one -pot reaction means a process uses a strategy to improve the efficiency of a chemical reaction whereby a reactant is subjected to successive chemical reactions in just one solvent/reactor. This is much desired by chemists because avoiding a lengthy separation process and purification of the intermediate chemical compounds can save time and resources, improves the efficiency of a chemical reaction, and offers better chemical yield.
- the step a) of forgoing process involves reaction of a compound of Formula III with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II in a solution.
- the suitable activating agent used in aforementioned step a) is selected from the group consisting of but not limited to acid-chloride reagents such as thionyl chloride, pivaloyl chloride and the like, sulfonyl-chloride reagents such as methane sulfonyl chloride, ethane sulfonyl chloride, benzene sulfonyl chloride, p-toluene sulfonyl chloride, p-nitro sulfonyl chloride and the like, coupling agents such as carbonyldiimidazole (CDI), diisopropylcarbodiimide (DCI), N-(3-dimethylaminopropyl)-N’ -ethyl carbodiimide (EDC), dicyclohexyl carbodiimide (DCC), propanephosphonic acid cyclic anhydride (PPA), benzotriazol- 1-yl
- the suitable base used in aforementioned step a) is selected from the group consisting of but not limited to inorganic bases selected from alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide and the like; alkali metal alkoxides such as sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert-butoxide and the like; alkali metal carbonates such as sodium carbonate, potassium carbonate, cesium carbonate and the like; alkali metal bicarbonates such as sodium bicarbonate, potassium bicarbonate and the like; organic bases selected from the group comprising of triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, pyridine, 2-picoline, 3-picoline and the like and mixtures thereof; preferably sodium hydroxide, sodium methoxide, triethylamine, diiso
- the suitable solvent used in aforementioned step a) is selected from the group consisting of but not limited to amides, sulfoxides, ketones, nitriles, ethers, halogenated hydrocarbons, aromatic hydrocarbons and the like and mixtures thereof.
- the amides include, but are not limited to dimethylacetamide, dimethylformamide, N- methylpyrrolidone and the like and mixtures thereof;
- sulfoxides include, but are not limited to dimethyl sulfoxide, diethyl sulfoxide and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like;
- nitriles include, but are not limited to acetonitrile, propionitrile and the like;
- ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like;
- halogenated hydrocarbons include, but are not limited to methylene chloride, ethylene chloride, chloroform and the like; aromatic hydrocarbon
- reaction of a Formula III with a compound of Formula IV is carried out at a temperature of about 25°C to reflux temperature; preferably at about 25°C to about 35°C.
- the resultant compound of Formula II may be isolated as a solid or may be insitu converted to chlorantraniliprole without isolating the compound of Formula II as a solid by directly adding a source of monomethylamine to the step a) solution.
- the obtained compound of Formula II can be isolated from step a) reaction mass by conventional techniques such as precipitation by cooling the reaction mass, isolated by solvent precipitation, crystallization, concentrated by subjecting the solution to heating, decantation or filtration; preferably if isolation involves compound of Formula II can be isolated by precipitation by adding a suitable solvent such as water, and proceed for step b) reaction.
- the step b) reaction is carried out in a one pot reaction without isolating the compound of formula II as solid.
- the reaction includes an optional step of washing the organic layer obtained from the step a) with water and separating the product containing organic layer and to this source of monomethylamine may be added.
- the source of monomethylamine used in aforementioned step b) is selected from the group consisting aqueous methyl amine, methyl amine in a solvent, methyl amine gas and the like; preferably aqueous methyl amine or methyl amine gas.
- source of monomethylamine may be added to the reaction mass by cooling the reaction mass temperature to below 25°C; preferably at 0-5°C and then the reaction of a Formula II with a source of monomethylamine is carried out at a temperature of about 25°C to reflux temperature; preferably at about 30°C to about 40°C.
- step b) is carried out in presence of a suitable base.
- the suitable base optionally used in aforementioned step b) is selected from the group consisting of but not limited to inorganic bases selected from alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide and the like; alkali metal alkoxides such as sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert- butoxide and the like; alkali metal carbonates such as sodium carbonate, potassium carbonate, cesium carbonate and the like; alkali metal bicarbonates such as sodium bicarbonate, potassium bicarbonate and the like; organic bases selected from the group comprising of triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, pyridine, 2-picoline, 3-picoline and the like and mixtures thereof.
- inorganic bases selected from alkali metal hydroxides such as lithium hydroxide
- step b) reaction may be optionally carried out in presence of a suitable solvent, wherein the solvent is selected from the group consisting of but not limited to alcohols, amides, sulfoxides, ketones, nitriles, ethers, halogenated hydrocarbons, aromatic hydrocarbons, water and mixtures thereof.
- a suitable solvent selected from the group consisting of but not limited to alcohols, amides, sulfoxides, ketones, nitriles, ethers, halogenated hydrocarbons, aromatic hydrocarbons, water and mixtures thereof.
- the alcohols include, but are not limited to methanol, ethanol, butanol, pentanol, isopropanol, isopentanol and the like and mixtures thereof;
- amides include, but are not limited to dimethylacetamide, dimethylformamide, N-methylpyrrolidone and the like and mixtures thereof;
- sulfoxides include, but are not limited to dimethyl sulfoxide, diethyl sulfoxide and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like;
- nitriles include, but are not limited to acetonitrile, propionitrile and the like;
- ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,
- the resultant chlorantraniliprole can be isolated by conventional techniques such as precipitation by cooling the reaction mass, isolated by solvent precipitation, crystallization, concentrated by subjecting the solution to heating, decantation or filtration; preferably isolated by precipitation by adding a suitable solvent such as water and then filtering the product or complete concentrating of the solvent by subjecting the solution to heating followed by isolating the product from another solvent such as methanol or acetone.
- the chlorantraniliprole obtained by the process described as above may optionally be stirred with a suitable organic solvent at a temperature of about 25°C to about reflux temperature.
- a suitable organic solvent is selected from the group consisting of but not limited to alcohols, ketones, ethers, alicyclic hydrocarbons, water and mixtures thereof.
- the alcohols include, but are not limited to methanol, ethanol, butanol, pentanol, isopropanol, isopentanol and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like; ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like; alicyclic hydrocarbons include, but are not limited to cyclopropane, cyclobutane, cyclopentane, cyclohexane, methyl cyclohexane, cycloheptane, cyclooctane and the like and mixture thereof; preferably methanol, acetone, methyl tetrahydrofuran or
- the resultant chlorantraniliprole can be isolated by conventional techniques such as precipitation by cooling the reaction mass, isolated by solvent precipitation, crystallization, concentrated by subjecting the solution to heating, decantation or filtration; preferably precipitation by cooling the reaction mass to below 30°C.
- the resultant product may optionally be further dried at a temperature of about 35°C to about 85°C for sufficient period of time. Drying can be suitably carried out in a tray dryer, vacuum oven, air oven and the like; preferably drying is carried out under vacuum at a temperature of about 45°C to about 75°C for sufficient period of time.
- the present invention provides an improved process for preparation of chlorantraniliprole of Formula I, comprising: reacting a compound of Formula V with a compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, in presence of a suitable base and a suitable solvent to obtain chlorantraniliprole.
- the base used for reaction of compound of Formula V with a compound of Formula VI is selected from silyl bases such as Lithium bis(trimethylsilyl)amide, Sodium bis(trimethylsilyl)amide, Potassium bis(trimethylsilyl)amide and the like; hydroxides such as Potassium hydroxide, Sodium hydroxide, Cesium hydroxide and the like; alkyl hydroxides such as sodium methoxide, sodium ethoxide, potassium methoxide, sodium tert-butoxide, potassium tert-butoxide and the like and mixture thereof; preferably Lithium bis(trimethylsilyl)amide, Sodium bis(trimethylsilyl)amide or sodium methoxide; more preferably Lithium bis(trimethylsilyl)amide.
- silyl bases such as Lithium bis(trimethylsilyl)amide, Sodium bis(trimethylsilyl)amide, Potassium bis(trimethylsilyl)amide and the like
- hydroxides such as Potassium hydrox
- the suitable solvent used herein for reaction of compound of Formula V with a compound of Formula VI is selected from the group consisting of but not limited to amides, sulfoxides, ketones, nitriles, ethers, halogenated hydrocarbons, aromatic hydrocarbons and mixtures thereof.
- the amides include, but are not limited to dimethylacetamide, dimethylformamide, N-methylpyrrolidone and the like and mixtures thereof;
- sulfoxides include, but are not limited to dimethyl sulfoxide, diethyl sulfoxide and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like;
- nitriles include, but are not limited to acetonitrile, propionitrile and the like;
- ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like;
- halogenated hydrocarbons include, but are not limited to methylene chloride, ethylene chloride, chloroform and the like; aromatic hydrocarbons
- the reaction of a Formula V with a compound of Formula VI is carried out at a temperature of about -60°C to 25°C; preferably at about -40°C to about -50°C.
- the resultant product is isolated by known methods such as extraction of the product from the solution, cooling the solution to precipitation, concentration of the reaction solution, solvent crystallization and the like.
- the product can be isolated by extraction of the product from the solution by first adding water and water immiscible organic solvent to the reaction solution so that aqueous and organic layers are formed and the product containing organic layer can be separated easily and then concentrated by known procedures.
- the suitable water immiscible organic solvent includes but is not limited to toluene, ethyl acetate, methylene chloride and the like; preferably with ethyl acetate.
- the resultant product may optionally be further dried at a temperature of about 35°C to about 85°C for sufficient period of time. Drying can be suitably carried out in a tray dryer, vacuum oven, air oven and the like; preferably drying is carried out under vacuum at a temperature of about 45°C to about 85°C for sufficient period of time.
- the present invention provides an improved process for preparation of a compound of Formula IV, comprising: a) mixing a suitable oxidizing agent, a suitable acid and a suitable organic solvent, b) heating the reaction mass to about 40°C to reflux temperature, c) adding a compound of Formula VII to the above step b) reaction mass, d) isolating the compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, and e) hydrolyzing the compound of formula VI, wherein “R” is selected from straight or branched chain Ci-6 alkyl group to obtain a compound of Formula IV.
- the starting materials, a compound of Formula a VII was known in the art and can be produced by methods known and recognized by the organic chemist of ordinary skill in the art, for example US7232836.
- the suitable oxidizing agent in aforementioned step a) is selected from the group consisting of but not limited to hydrogen peroxide, potassium persulfate, sodium persulfate, ammonium persulfate, potassium monopersulfate, sodium monopersulfate, potassium permanganate and the like and mixture thereof; preferably potassium persulfate.
- the suitable acid used in aforementioned step a) is selected from the group consisting of but not limited to acetic acid, propanoic acid, p-toluenesulphonic acid, benzoic acid, sulphuric acid, phosphoric acid, oleum, hydrobromic acid, hydrochloric acid and the like and mixture thereof; preferably sulphuric acid.
- the suitable organic solvent used in aforementioned step a) is selected from the group consisting of but not limited to ketones, nitriles, ethers, esters, halogenated hydrocarbons, aromatic hydrocarbons and the like and mixtures thereof.
- the ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like; nitriles include, but are not limited to acetonitrile, propionitrile and the like; ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like; ethers include, but are not limited to ethyl acetate, isopropyl acetate, butyl acetate and the like; halogenated hydrocarbons include, but are not limited to methylene
- the step b) of forgoing process involves heating the step a) reaction mass to about 40°C to reflux temperature; preferably at about 75°C to about 85°C.
- the step c) of forgoing process involves addition of a compound of Formula VII to the step b) reaction mass at about 75°C to about 85°C.
- compound of Formula VII is dissolved in a suitable organic solvent and added drop wise in to the step b) reaction mass for a period of about 30 min to 5 hrs at about 75°C to about 85°C.
- the suitable organic solvent is same as used in the step a).
- undissolved salts may be separated by filtration and the compound was Formula VI can be isolated by conventional techniques such as precipitation by cooling the reaction mass, isolated by solvent precipitation, crystallization, concentrated by subjecting the solution to heating, decantation or filtration; preferably isolated by precipitation by adding a suitable solvent such as water.
- the resultant product may optionally be further dried at a temperature of about 35°C to about 65°C. Drying can be suitably carried out in a tray dryer, vacuum oven, air oven and the like; preferably drying is carried out under vacuum at a temperature of about 45°C for sufficient period of time.
- the present invention provides chlorantraniliprole of Formula I prepared by the processes described as above having a purity of at least about 98%, as measured by HPLC, preferably at least about 99% as measured by HPLC.
- the present invention also encompasses an improved process for the preparation of compound of Formula V with high product yield and quality, wherein the improvements involve use of one -pot process without isolating intermediate compounds of Formula All and Formula AIII in a single solvent system and avoids explosives reagents, multiple solvent systems and cumbersome isolations such as time consuming solvent workups, drying and necessity of analyzing the compounds at each stage.
- the present invention provides an improved process for preparation of compound of Formula V, comprising:
- RRT relative retention time
- HPLC high pressure liquid chromatography
- the phosgene or its derivative as used in the aforementioned step a) is selected from phosgene as in gaseous form or as in liquid form consisting of but not limited to phosgene, diphosgene, triphosgene, bromophosgene and the like; preferably triphosgene.
- the suitable base used for reacting a compound of Formula Al with a phosgene or its derivative in aforementioned step a) is selected from the group consisting of but not limited to inorganic bases selected from alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide and the like; alkali metal alkoxides such as sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert- butoxide and the like; alkali metal carbonates such as sodium carbonate, potassium carbonate, cesium carbonate and the like; alkali metal bicarbonates such as sodium bicarbonate, potassium bicarbonate and the like; organic bases selected from the group comprising of triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, 2-picoline, 3-picoline and the like and mixtures thereof; preferably an inorganic base
- the suitable solvent used for reacting a compound of Formula Al with a phosgene or its derivative in aforementioned step a) is selected from the group consisting of but not limited to amides, esters, ketones, nitriles, ethers, halogenated hydrocarbons, aromatic hydrocarbons and the like and mixtures thereof.
- the amides include, but are not limited to dimethylacetamide, dimethylformamide, N-methylpyrrolidone and the like and mixtures thereof; esters include, but are not limited to ethyl acetate, methyl acetate and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like; nitriles include, but are not limited to acetonitrile, propionitrile and the like; ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like; halogenated hydrocarbons include, but are not limited to methylene chloride, ethylene chloride, chloroform and the like; aromatic hydrocarbons include, but are not limited to toluene,
- reaction of Formula Al with a phosgene or its derivative is carried out at a temperature of about 0°C to reflux temperature; preferably at about 20°C to about 40°C.
- step a) solution advantageously processed to next step by adding a source of monomethylamine to the step a) solution without isolating the compound of Formula All as a solid.
- the source of monomethylamine used in aforementioned step b) is selected from the group consisting of aqueous methyl amine, methyl amine in solvent, methyl amine gas and the like; preferably aqueous methyl amine or methyl amine gas.
- reaction of compound of Formula All with a source of monomethyl amine is carried out in presence of a suitable acid, a suitable base or, a suitable second solvent.
- the suitable acid optionally used in aforementioned step b) is selected from the group consisting of acetic acid, formic acid, methanoic acid and the like.
- the suitable base optionally used in aforementioned step b) is selected from the group consisting of but not limited to inorganic bases selected from alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide and the like; alkali metal alkoxides such as sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert- butoxide and the like; alkali metal carbonates such as sodium carbonate, potassium carbonate, cesium carbonate and the like; alkali metal bicarbonates such as sodium bicarbonate, potassium bicarbonate and the like; organic bases selected from the group comprising of triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, pyridine, 2-picoline, 3-picoline and the like and mixtures thereof.
- the suitable second solvent optionally used in aforementioned step b) is same as the
- reaction of a Formula All with a source of monomethylamine is carried out at a temperature of about 25 °C to reflux temperature; preferably at about 30°C to about 45°C.
- step b) solution advantageously processed to next step by adding a source of chloride to the compound of Formula AIII without isolating the compound of Formula AIII as a solid.
- the step b) solution may be washed with water to remove inorganic salts if any and then the resultant organic layer may be processed to next step by adding a source of chloride without isolating the compound of Formula AIII as a solid.
- the source of chloride used in aforementioned step c) is selected from the group consisting of but not limited to sulfuryl chloride, N-chlorosuccinimide, chlorine gas, metal chloride-H 2 O2 in acid aqueous medium, HCI-H2O2, m-chloroperbenzoic acid/HCl, acetyl chloride and the like; preferably sulfuryl chloride.
- step c) is carried out in presence of a suitable solvent.
- the suitable solvent optionally used in aforementioned step c) is same as the solvent used in step a) of the aforesaid process.
- the reaction of a Formula AIII with a source of chloride is carried out at a temperature of about 25°C to reflux temperature; preferably at about 30°C to about 45°C.
- the present invention advantageously separated these impurities by simply formation of salt of the resultant compound of Formula V after chlorination reaction and separates the salt of compound of Formula V as an aqueous layer and unwanted impurities by an organic layer.
- the chlorination reaction water may be added to the reaction mass and followed by adding a suitable acid to form a salt of compound of formula V in heterogeneous solvent mixture and both organic and aqueous layers may be separated. Then after separating the impurities containing organic layer the resultant compound of Formula V can be isolated from the aqueous layer by known methods, for example, adjusting pH of the aqueous layers to above 7 with a suitable base. Then the compound of Formula V can be isolated from reaction mass by conventional techniques such as solvent extraction, solvent precipitation, crystallization, concentrated by subjecting the solution to heating, decantation or filtration; preferably by filtering the solids.
- the suitable acid used herein for making salt formation is selected from hydrochloric acid, sulfuric acid, acetic acid, p-toluene sulfonic acid and the like and mixture thereof; preferably hydrochloric acid and suitable base used herein for neutralization is selected from sodium hydroxide, potassium hydroxide, cesium hydroxide, lithium hydroxide and the like and mixture thereof.
- the resultant product may optionally be further dried at a temperature of about 30°C to about 80°C. Drying can be suitably carried out in a tray dryer, vacuum oven, air oven and the like.
- the present invention provides compound of Formula V prepared by the processes described as above having a purity of at least about 98% by HPLC, preferably at about 99.5% and having less than 0.5% by HPLC, preferably less than 0.2% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT- 1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11.
- the present invention provides a compound of Formula V having less than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT- 2.96, RRT-3.08 and RRT-3.11.
- the present invention provides an improved process for the preparation of chlorantraniliprole or a salt thereof, comprising preparing the compound of Formula V as process described above, and converting the compound of Formula V in to chlorantraniliprole or a salt thereof by any process known in the art for example W02006/062978 or by the process described in the present specification.
- the present invention provides crystalline chlorantraniliprole characterized by a powder X-ray diffraction (PXRD) pattern substantially in accordance with Figure 1.
- PXRD powder X-ray diffraction
- the present invention provides crystalline chlorantraniliprole characterized by X-Ray diffraction (XRD) pattern having at least one peak selected from at about 8.6, 10.0, 10.5, 10.6, 11.4, 11.7, 12.2, 14.0, 14.2, 14.4, 14.6, 14.9, 15.6, 16.1, 16.6, 17.3, 17.5, 17.8, 18.3, 18.5, 20.0, 20.3, 20.5, 20.7, 21.1, 21.2, 21.4, 21.5, 21.7, 22.7, 22.9, 23.4, 24.3, 24.7, 24.9, 25.3, 25.6, 26.1, 27.2, 27.5, 28.4, 29.0, 29.2, 29.4, 29.8, 30.0 and 30.3 ⁇ 0.2° 20.
- the present invention provides a crystalline compound of Formula Ila characterized by a powder X-ray diffraction (PXRD) pattern substantially in accordance with Figure 2.
- PXRD powder X-ray diffraction
- the present invention provides a crystalline compound of Formula Ila characterized by X-Ray diffraction (XRD) pattern having at least one peak selected from at about 6.8, 8.2, 9.3, 10.1, 11.1, 12.4, 12.8, 13.5, 14.3, 14.8, 15.6, 15.7, 15.9, 16.5, 18.1, 18.7, 19.0, 19.5, 19.9, 20.4, 20.9, 21.7, 22.0, 22.5, 22.7, 23.2, 23.5, 24.0, 24.3, 24.8, 25.3, 25.9, 26.4, 27.2, 27.7, 27.9, 28.3, 28.9, 29.1, 29.2, 29.8 and 30.5 ⁇ 0.2° 20.
- XRD X-Ray diffraction
- the present invention provides a composition comprising chlorantraniliprole, prepared by the processes of the present invention and/or at least one excipient.
- the present invention relates to a one -pot process for preparation of chlorantraniliprole of Formula I, which is depicted in below scheme:
- the present invention relates to a process for preparation of chlorantraniliprole of Formula I, which is depicted in below scheme: In another embodiment, the present invention relates to a process for preparation of chlorantraniliprole of Formula I, which is depicted as follows: wherein "R" is selected from straight orbranched chain Cj- 6 alkyl group
- the present invention provides chlorantraniliprole and its intermediates, obtained by the above process, as analyzed using high performance liquid chromatography (“HPLC”) with the conditions are tabulated below:
- reaction mass was allowed to 25- 30°C and stir for 4 hrs at same temperature.
- reaction mass was concentrated under vacuum at below 50°C and co-distilled with methanol (50 mL) to obtain a solid.
- methanol 50 mL
- Reaction mass was cool to 25-30°C and stir for 4 hr at same temperature.
- reaction mass was allowed to 25-30°C and stir for 4 hrs at same temperature. After completion of the reaction, reaction mass was concentrated under vacuum at below 50°C and co-distilled with acetone (50 mL) to obtain a solid. To the solid was added acetone (300 mL) and heated to reflux for 1 hr. Reaction mass was cool to 25-30°C and stir for 4 hr at same temperature. Then the solid was filtered and washed with acetone (50 mL) and dry the wet material initially at 25-30°C for 30-60 min, then dry at 60- 65°C for 6 hr to obtain title compound. Wt: 159 gm.
- reaction mass was allowed to 25-30°C and stir for 4 hrs at same temperature. After completion of the reaction, reaction mass was concentrated under vacuum at below 50°C and co-distilled with methanol (50 mL) to obtain a solid. To the solid was added methanol (50 mL) and heated to reflux for 1 hr. Reaction mass was cool to 25-30°C and stir for 4 hr at same temperature. Then the solid was filtered and washed with methanol (50 mL) and dry the wet material initially at 25-30°C for 30-60 min, then dry at 60- 65°C for 6 hr to obtain title compound. Wt: 163 gm. Purity by HPLC: 99.6%
- Precipitated solid was filtered and washed with water (100 mL) and dried the wet material under vacuum at 50-60°C to obtain title compound.
- Wt 160 gm
- PXRD Fig 3
- TGA 0.08%
- DSC Endothermic peaks at 155.5°C and 176°C.
- Reaction mass temperature was heated to 25-30°C and separated the organic and aqueous layers. Organic layer was concentrated under vacuum at 40-45°C to obtain a solid. Then the obtained solid was mixed with acetonitrile (500 mL) at 25-30°C. To the reaction mass was added water (250 mL) at 25-30°C and stir for 1 hr at same temperature. Precipitated solid was filtered and washed with water (100 mL), acetonitrile (50 mL) and dried the wet material under vacuum at 50-60°C to obtain title compound. Wt: 75 gm.
- reaction mass was heated to about 55-60°C for 5-10 min.
- reaction mass was added of (3-chloropyridin-2-yl) hydrazine (100 gm) and diethyl maleate (132.6 gm) at 55-60°C.
- reaction mass was cool to 25-30°C and was added acetic acid (90 mL) at same temperature. Then the reaction mass was completely concentrated under vacuum at below 50°C to obtain a residue.
- reaction mass After completion of the reaction, to the reaction mass was charged water (1 lit) and ethyl acetate (1 lit) at about -40°C to about -50°C. Reaction mass temperature was heated to 25-30°C and separated the organic and aqueous layers. Organic layer was concentrated under vacuum at 40-45°C to obtain a solid. Then the obtained solid was mixed with acetonitrile (500 mL) at 25-30°C. To the reaction mass was added water (250 mL) at 25-30°C and stir for 1 hr at same temperature. Precipitated solid was filtered and washed with water (100 mL), acetonitrile (50 mL) and dried the wet material under vacuum at 50-60°C to obtain title compound. Wt: 100 gm.
- Precipitated solids were filtered and washed with water (100 mL) and dry the wet material initially at 30-35°C for 60 min, then dry at 60-75°C for 6 hr to obtain title compound. Wt: 105 gm.
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Abstract
The present invention generally relates to a process for preparation of chlorantraniliprole or a salt thereof. Further, the present invention relates to an improved process for preparation of intermediate of chlorantraniliprole.
Description
“PROCESSES FOR PREPARATION OF CHLORANTRANILIPROLE OR A SALT OR ITS INTERMEDIATES THEREOF”
PRIORITY:
This application claims the benefit under Indian Provisional Application No.(S) 202141003552 filed on 27 Jan, 2021 entitled “Process for preparation of chlorantraniliprole or a salt thereof’; 202141003553 filed on 27 Jan, 2021 entitled “An improved process for preparation of chlorantraniliprole or a salt thereof’ and 202141035921 filed on 09 Aug, 2021 entitled “An improved process for preparation of 2-amino-5-chloro-N-3-dimethyl benzamide” the contents of each of which are incorporated by reference herein.
FIELD OF THE INVENTION
The present invention relates to processes for preparation of chlorantraniliprole or a salt thereof. Further, the present invention relates to an improved process for preparation of intermediate of chlorantraniliprole.
BACKGROUND OF THE INVENTION
Chlorantraniliprole is a class of anthranilic-diamide insecticide derivative compounds and is chemically known as 3-Bromo-N-[4-chloro-2-methyl-6-(methyl carbamoyl) phenyl]-l-(3-chloro-2-pyridine-2-yl)-lH-pyrazole-5-carboxamide, it has the following structure:
Chlorantraniliprole (Formula I)
Chlorantraniliprole is being developed world-wide by DuPont belonging to a new class of selective insecticides featuring a novel mode of action to control a range of pests belonging to the order Lepidoptera and some other Coleoptera, Diptera and Isoptera species.
Preparation of chlorantraniliprole was disclosed in different patent publications; for example, PCT application Number: 2003/015519 (“the ‘519 publication”) disclosed process to prepare chlorantraniliprole by the following scheme:
PCT application Number: 2004/111030 (“the ‘030 publication”) discloses an alternative process for preparation of chlorantraniliprole. The ‘030 publication disclosed process is as follows:
PCT application Number: 2006/062978 (“the ‘978 publication”) discloses an alternative process for preparation of chlorantraniliprole, as follows:
PCT application Number: 2019/207595 (“the ‘595 publication”) discloses an alternative process for preparation of chlorantraniliprole, as follows:
Chlorantraniliprole
All the above reported process of chlorantraniliprole involves expensive raw materials and involves formation of impurities with low yields and purity.
Further, the ‘978 publication discloses a process for preparation of compound of Formula V, as follows:
Compound of Formula V is the key intermediate and main cost contributor in the preparation of chlorantraniliprole. The ‘978 application disclosed preparation of compound of Formula V in three stage process from 2-amino-3-methyl benzoic acid of Formula Al and the process involves isolation of intermediate products of Formula All and Formula AIII as solid, which makes the process lengthy as it involves multiple steps of solvent extractions, isolation and drying steps and this leads to low yield of the Formula V from the starting compound of Formula Al. The ‘978 process also involves use of hydrogen peroxide in oxy-chlorination, which is not viable on large scale manufacturing as it extremely shock-sensitive explosives and require special care while handling.
Further other known literatures for ex: CN103539694B, CN111134128A, CN103109816B and Nongyao (2013), 52(11), 793-795, 811 discloses preparation of this compound of Formula V but all the literatures involves the same processing strategies, isolation of intermediates as mentioned under the ‘978 publication.
Chlorantraniliprole is one of the important insecticide available in the market. As all the reported processes involves isolation of each intermediate products of Formula All and Formula AIII as solid in the preparation of Formula V, which involves increasing the reactor occupancy and additional process steps such as use of multiple solvent systems for each stage, isolation of each stage by filtration, drying and testing of each intermediate; hence, the reported processes requires excess reactor occupancy and excess manufacturing time and this creates extra burden to the final cost of the material. As disclosed above, compound of Formula V is the key cost contributor in the
preparation of chlorantraniliprole and to reduce the manufacturing cost of the chlorantraniliprole it is desirable to reduce the manufacturing cost of the intermediates involved in the process.
Hence, it’s important to develop a simple and cost effective improved process for preparation of pure chlorantraniliprole or its intermediates with avoiding the aforementioned problems and with high yield, which is readily amenable to large scale production and free from its impurities.
SUMMARY OF THE INVENTION
Accordingly, the present invention provides processes for preparation of chlorantraniliprole or a salt thereof of Formula I. The present invention also relates to an improved process for preparation of chlorantraniliprole or a salt thereof without isolating the intermediates.
In accordance with one embodiment, the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising:
a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II, wherein “R” is selected from straight or branched chain Ci-6 alkyl group; and
b) reacting the compound of Formula II with a source of monomethylamine to obtain chlorantraniliprole.
In accordance with another embodiment, the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II, wherein “R” is selected from straight or branched chain Ci-6 alkyl group; and b) reacting the compound of Formula II with a source of monomethylamine to obtain chlorantraniliprole; wherein the compound of Formula II is not isolated as a solid.
In accordance with another embodiment, the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a solution containing compound of Formula II, wherein “R” is selected from straight or branched chain Ci-6 alkyl group; and b) adding a source of monomethylamine to the step a) to obtain chlorantraniliprole.
In accordance with another embodiment, the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent at a temperature of about 25°C to reflux temperature, b) cooling the step a) solution to below 25°C, c) adding a source of monomethylamine to the step b) solution, d) heating the step c) to about 25°C to reflux temperature, e) concentrating the step d) reaction mass to obtain a solid compound, f) adding a suitable organic solvent to the step e) and heating to reflux temperature, g) cooling the solution to below 35°C, and
h) filtering the chlorantraniliprole.
In accordance with another embodiment, the present invention provides an improved process for preparation of a compound of Formula IV, comprising:
a) mixing a suitable oxidizing agent, a suitable acid and a suitable organic solvent, b) heating the reaction mass to about 40°C to reflux temperature, c) adding a compound of Formula VII to the above step b) reaction mass,
Formula VII d) isolating the compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, and
e) hydrolyzing the compound of formula VI, wherein “R” is selected from straight or branched chain Ci-6 alkyl group to obtain a compound of Formula IV.
In accordance with another embodiment, the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) mixing a suitable oxidizing agent, a suitable acid and a suitable organic solvent b) heating the reaction mass to about 40°C to reflux temperature,
c) adding a compound of Formula VII, wherein “R” is selected from straight or branched chain Ci-6 alkyl group, to the above step b) reaction mass
Formula VII d) isolating the compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group
Formula VI e) hydrolyzing the compound of formula VI, wherein “R” is selected from straight or branched chain Ci-6 alkyl group to obtain a compound of Formula IV; f) reacting the compound of Formula IV with a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, in presence of a suitable activating agent, a suitable base and a suitable solvent at a temperature of about 25°C to reflux temperature, g) cooling the step f) solution to below 25°C, h) adding a source of monomethylamine to the step g) solution, i) heating the step h) to about 25°C to reflux temperature, j) concentrating the step i) reaction mass to obtain a solid compound, k) adding a suitable organic solvent to the step j) and heating to reflux temperature, l) cooling the solution to below 35°C, and m) filtering the chlorantraniliprole.
In accordance with another embodiment, the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: reacting a compound of Formula II; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a source of monomethylamine in a suitable solvent to obtain chlorantraniliprole.
In accordance with another embodiment, the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising: a) reacting a compound of Formula III; wherein “R” is methyl, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II, wherein “R” is methyl; and b) reacting the compound of Formula II, wherein “R” is methyl with a source of monomethylamine to obtain chlorantraniliprole; wherein the compound of Formula II is not isolated as a solid.
In accordance with another embodiment, the present invention provides an improved process for preparation of chlorantraniliprole of Formula I,
comprising: reacting a compound of Formula V with a compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, in presence of a suitable base and a suitable solvent to obtain chlorantraniliprole.
In accordance with another embodiment, the present invention provides an improved process for preparation of chlorantraniliprole of Formula I, comprising: reacting a compound of Formula V with a compound of Formula VI; wherein “R” is ethyl, in presence of a suitable base and a suitable solvent to obtain chlorantraniliprole.
In accordance with another embodiment, the present invention provides an improved process for preparation of chlorantraniliprole of Formula I,
a) mixing a suitable oxidizing agent, a suitable acid and a suitable organic solvent b) heating the reaction mass to about 40°C to reflux temperature, c) adding a compound of Formula VII, wherein “R” is selected from straight or branched chain Ci-6 alkyl group, to the above step b) reaction mass,
Formula VII d) isolating the compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, and
Formula VI e) reacting a compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula V in presence of a suitable base and a suitable solvent to obtain chlorantraniliprole.
In accordance another embodiment, the present invention provides an improved process for preparation of compound of Formula V, comprising:
Formula V a) reacting a compound of Formula Al with a phosgene or its derivative and a suitable base in a suitable solvent to obtain a compound of Formula All,
Formula Al Formula All b) reacting the compound of Formula All with a source of monomethyl amine to obtain a compound of Formula AIII, and
Formula AIII c) reacting the compound of Formula AIII with a source of chloride to obtain a compound of Formula V; wherein the step a) to c) are carried out in one-pot reaction without isolating the intermediate compound of Formula All and Formula AIII as solid.
In accordance another embodiment, the present invention provides an improved process for preparation of compound of Formula V, comprising: a) reacting a compound of Formula Al with a phosgene or its derivative and a suitable inorganic base in a suitable solvent to obtain a compound of Formula All,
b) reacting the compound of Formula All with a source of monomethyl amine to obtain a compound of Formula AIII, and c) reacting the compound of Formula AIII with a source of chloride to obtain a compound of Formula V; wherein the step a) to c) are carried out in one -pot reaction without isolating the intermediate compound of Formula All and Formula AIII as solid.
In accordance with another embodiment, the present invention provides an improved process for preparation of compound of Formula V, comprising: a) reacting a compound of Formula Al with a phosgene or its derivative and a suitable base in a suitable solvent to obtain a solution of compound of Formula All, b) adding a source of monomethyl amine to the solution of compound of Formula All to obtain a solution of compound of Formula AIII, c) adding a source of chloride to the solution of compound of Formula AIII to obtain a compound of Formula V ; and d) isolating the compound of Formula V.
In accordance with another embodiment, the present invention provides an improved process for preparation of compound of Formula V, comprising: a) reacting a compound of Formula Al with a phosgene or its derivative and a suitable base in a suitable solvent to obtain a solution containing compound of Formula All, b) adding a source of monomethyl amine to the solution of step a) to obtain a containing compound of Formula AIII, c) adding a source of chloride to the solution of step b) to obtain a solution of containing compound of Formula V, d) adding water and a suitable acid to the step c) solution, e) separating the organic and aqueous layers, f) adding a suitable base to the aqueous layer, and g) filtering the compound of Formula V.
In accordance with another embodiment, the present invention provides an improved process for preparation of compound of Formula V having less than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06,
RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11, comprising: a) reacting a compound of Formula AIII with a source of chloride to obtain a solution containing compound of Formula V having more than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11, b) adding water and a suitable acid to the step a) solution, c) separating the organic and aqueous layers, d) adding a suitable base to the aqueous layer, and e) filtering the compound of Formula V.
In accordance with another embodiment, the present invention provides an improved process for preparation of chlorantraniliprole , comprising:
a) preparing a compound of Formula V according processes described as above embodiments, and b) converting the compound of Formula V in to chlorantraniliprole.
In accordance with another embodiment, the present invention provides a compound of Formula V having less than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT- 2.62, RRT-2.96, RRT-3.08 and RRT-3.11.
In accordance with another embodiment, the present invention provides crystalline chlorantraniliprole characterized by a powder X-ray diffraction (PXRD) pattern substantially in accordance with Figure 1.
In accordance with another embodiment, the present invention provides crystalline chlorantraniliprole characterized by X-Ray diffraction (XRD) pattern having at least one peak selected from at about 8.6, 10.0, 10.5, 10.6, 11.4, 11.7, 12.2, 14.0, 14.2, 14.4, 14.6, 14.9, 15.6, 16.1, 16.6, 17.3, 17.5, 17.8, 18.3, 18.5, 20.0, 20.3, 20.5, 20.7, 21.1, 21.2, 21.4, 21.5, 21.7, 22.7, 22.9, 23.4, 24.3, 24.7, 24.9, 25.3, 25.6, 26.1, 27.2, 27.5, 28.4, 29.0, 29.2, 29.4, 29.8, 30.0 and 30.3 ±0.2° 20.
In accordance with another embodiment, the present invention provides a crystalline compound of Formula Ila characterized by a powder X-ray diffraction (PXRD) pattern substantially in accordance with Figure 2.
In accordance with another embodiment, the present invention provides a crystalline compound of Formula Ila characterized by X-Ray diffraction (XRD) pattern having at least one peak selected from at about 6.8, 8.2, 9.3, 10.1, 11.1, 12.4, 12.8, 13.5, 14.3, 14.8, 15.6, 15.7, 15.9, 16.5, 18.1, 18.7, 19.0, 19.5, 19.9, 20.4, 20.9, 21.7, 22.0, 22.5, 22.7, 23.2, 23.5, 24.0, 24.3, 24.8, 25.3, 25.9, 26.4, 27.2, 27.7, 27.9, 28.3, 28.9, 29.1, 29.2, 29.8 and 30.5 ±0.2° 20.
In accordance with another embodiment, the present invention provides a composition comprising chlorantraniliprole, prepared by the process of the present invention and/or at least one excipient.
BRIEF DESCRIPTION OF THE DRAWINGS
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate several embodiments of the invention and together with the description, serve to explain the principles of the invention.
Figure 1 is the characteristic powder X-ray diffraction (PXRD) pattern of chlorantraniliprole prepared according to Example- 1.
Figure 2 is the characteristic powder X-ray diffraction (PXRD) pattern of Formula Ila prepared according to Example -4.
DETAILED DESCRIPTION OF THE INVENTION
The present invention encompasses processes for preparation of chlorantraniliprole of Formula I. The present invention also relates to an improved process for preparation of chlorantraniliprole or a salt thereof without isolating compound of Formula II.
In accordance with one embodiment, the present invention provides a process for preparation of chlorantraniliprole of Formula I, comprising:
a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II, wherein “R” is selected from straight or branched chain Ci-6 alkyl group; and
b) reacting the compound of Formula II with a source of monomethylamine to obtain chlorantraniliprole.
Unless otherwise specified the term “straight or branched chain Ci-6 alkyl” used herein is selected from but not limited to methyl, ethyl, propyl, isopropyl, butyl, iso-butyl, tertbutyl, pentyl, iso-pentyl, hexyl, iso-hexyl, iso-amyl and the like. Optionally the straight or branched chain Ci-6 alkyl may be further substituted with a suitable substituent, which may be selected from the group comprising halogen, aryl and the like; preferably methyl, ethyl or iso-butyl; more preferably methyl or ethyl.
The term "one -pot reaction" as used in this application means a process uses a strategy to improve the efficiency of a chemical reaction whereby a reactant is subjected to successive chemical reactions in just one solvent/reactor. This is much desired by chemists because avoiding a lengthy separation process and purification of the intermediate chemical compounds can save time and resources, improves the efficiency of a chemical reaction, and offers better chemical yield.
The starting materials, a compound of Formula III and Formula IV are known in the art and can be produced by methods known and recognized by the organic chemist of ordinary skill in the art, for example US9301529 and US7232836. Alternatively Formula IV can also be prepared by the procedure as described by the following embodiments of the invention.
The step a) of forgoing process involves reaction of a compound of Formula III with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II in a solution.
In a preferred embodiment the exemplary compound of Formula III and Formula II can be represented as follows:
The suitable activating agent used in aforementioned step a) is selected from the group consisting of but not limited to acid-chloride reagents such as thionyl chloride, pivaloyl chloride and the like, sulfonyl-chloride reagents such as methane sulfonyl chloride, ethane sulfonyl chloride, benzene sulfonyl chloride, p-toluene sulfonyl chloride, p-nitro sulfonyl chloride and the like, coupling agents such as carbonyldiimidazole (CDI), diisopropylcarbodiimide (DCI), N-(3-dimethylaminopropyl)-N’ -ethyl carbodiimide (EDC), dicyclohexyl carbodiimide (DCC), propanephosphonic acid cyclic anhydride (PPA), benzotriazol- 1-yl-oxytripyrrolidino phosphonium hexafluorophosphate
(PyBOP), bromo- tripyrrolidino- phosphonium hexafluorophosphate (PyBrOP),
benzotriazol- 1-yloxy-tris (dimethylamino)-phosphonium hexafluorophosphate (BOP), Propylphosphonic anhydride (T3P), 2-(7-aza-lH-benzotriazol-l-yl)- N,N,N’,N’ -tetra methylaminium hexafluorophosphate) (HATU), (l-cyano-2-ethoxy-2-oxoethyl idenarninooxy)dirnethylamino-morpholino-carberiiurn hexa fluorophosphate (COMU), N,N,N',N'-Tetramethyl-O-(lH-benzotriazol-l-yl)uronium hexafluoro phosphate, O- (benzotriazol-l-yl)-N,N,N',N'-tetramethyluronium hexafluoro phosphate (HBTU), 2- (lH-Benzotriazol-l-yl)-N,N,N’,N’-tetramethylaminium tetrafluoroborate (TBTU) and the like and mixture thereof; preferably pivaloyl chloride, methane sulfonyl chloride or carbonyldiimidazole; more preferably methane sulfonyl chloride.
The suitable base used in aforementioned step a) is selected from the group consisting of but not limited to inorganic bases selected from alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide and the like; alkali metal alkoxides such as sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert-butoxide and the like; alkali metal carbonates such as sodium carbonate, potassium carbonate, cesium carbonate and the like; alkali metal bicarbonates such as sodium bicarbonate, potassium bicarbonate and the like; organic bases selected from the group comprising of triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, pyridine, 2-picoline, 3-picoline and the like and mixtures thereof; preferably sodium hydroxide, sodium methoxide, triethylamine, diisopropyl ethylamine or 3-picoline; more preferably 3-picoline.
The suitable solvent used in aforementioned step a) is selected from the group consisting of but not limited to amides, sulfoxides, ketones, nitriles, ethers, halogenated hydrocarbons, aromatic hydrocarbons and the like and mixtures thereof. The amides include, but are not limited to dimethylacetamide, dimethylformamide, N- methylpyrrolidone and the like and mixtures thereof; sulfoxides include, but are not limited to dimethyl sulfoxide, diethyl sulfoxide and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like; nitriles include, but are not limited to acetonitrile, propionitrile and the like; ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like; halogenated hydrocarbons include, but are not limited to methylene chloride, ethylene chloride, chloroform and the like; aromatic hydrocarbons include, but are not limited to
toluene, xylene and the like and mixture thereof; preferably acetonitrile, tetrahydrofuran or methylene chloride; more preferably acetonitrile or methylene chloride.
The reaction of a Formula III with a compound of Formula IV is carried out at a temperature of about 25°C to reflux temperature; preferably at about 25°C to about 35°C.
After completion of the step a) reaction, the resultant compound of Formula II may be isolated as a solid or may be insitu converted to chlorantraniliprole without isolating the compound of Formula II as a solid by directly adding a source of monomethylamine to the step a) solution.
In a preferred embodiment, after completion of the step a) reaction, optionally the obtained compound of Formula II can be isolated from step a) reaction mass by conventional techniques such as precipitation by cooling the reaction mass, isolated by solvent precipitation, crystallization, concentrated by subjecting the solution to heating, decantation or filtration; preferably if isolation involves compound of Formula II can be isolated by precipitation by adding a suitable solvent such as water, and proceed for step b) reaction.
In another preferred embodiment, after completion of the step a) reaction the step b) reaction is carried out in a one pot reaction without isolating the compound of formula II as solid. The reaction includes an optional step of washing the organic layer obtained from the step a) with water and separating the product containing organic layer and to this source of monomethylamine may be added.
The source of monomethylamine used in aforementioned step b) is selected from the group consisting aqueous methyl amine, methyl amine in a solvent, methyl amine gas and the like; preferably aqueous methyl amine or methyl amine gas.
Advantageously, source of monomethylamine may be added to the reaction mass by cooling the reaction mass temperature to below 25°C; preferably at 0-5°C and then the reaction of a Formula II with a source of monomethylamine is carried out at a temperature of about 25°C to reflux temperature; preferably at about 30°C to about 40°C.
Optionally the step b) is carried out in presence of a suitable base. The suitable base optionally used in aforementioned step b) is selected from the group consisting of but not limited to inorganic bases selected from alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide and the like; alkali metal alkoxides such as sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert- butoxide and the like; alkali metal carbonates such as sodium carbonate, potassium carbonate, cesium carbonate and the like; alkali metal bicarbonates such as sodium bicarbonate, potassium bicarbonate and the like; organic bases selected from the group comprising of triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, pyridine, 2-picoline, 3-picoline and the like and mixtures thereof.
In another embodiment, if the forgoing process involves isolation of compound of Formula II after step a), then the step b) reaction may be optionally carried out in presence of a suitable solvent, wherein the solvent is selected from the group consisting of but not limited to alcohols, amides, sulfoxides, ketones, nitriles, ethers, halogenated hydrocarbons, aromatic hydrocarbons, water and mixtures thereof. The alcohols include, but are not limited to methanol, ethanol, butanol, pentanol, isopropanol, isopentanol and the like and mixtures thereof; amides include, but are not limited to dimethylacetamide, dimethylformamide, N-methylpyrrolidone and the like and mixtures thereof; sulfoxides include, but are not limited to dimethyl sulfoxide, diethyl sulfoxide and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like; nitriles include, but are not limited to acetonitrile, propionitrile and the like; ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like; halogenated hydrocarbons include, but are not limited to methylene chloride, ethylene chloride, chloroform and the like; aromatic hydrocarbons include, but are not limited to toluene, xylene and the like; preferably acetonitrile, tetrahydrofuran or methylene chloride; more preferably acetonitrile or methylene chloride.
After completion of the step b) reaction, the resultant chlorantraniliprole can be isolated by conventional techniques such as precipitation by cooling the reaction mass, isolated by solvent precipitation, crystallization, concentrated by subjecting the solution to
heating, decantation or filtration; preferably isolated by precipitation by adding a suitable solvent such as water and then filtering the product or complete concentrating of the solvent by subjecting the solution to heating followed by isolating the product from another solvent such as methanol or acetone.
Then the chlorantraniliprole obtained by the process described as above may optionally be stirred with a suitable organic solvent at a temperature of about 25°C to about reflux temperature. The organic solvent used herein is selected from the group consisting of but not limited to alcohols, ketones, ethers, alicyclic hydrocarbons, water and mixtures thereof. The alcohols include, but are not limited to methanol, ethanol, butanol, pentanol, isopropanol, isopentanol and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like; ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like; alicyclic hydrocarbons include, but are not limited to cyclopropane, cyclobutane, cyclopentane, cyclohexane, methyl cyclohexane, cycloheptane, cyclooctane and the like and mixture thereof; preferably methanol, acetone, methyl tetrahydrofuran or cyclohexane; more preferably methanol or acetone.
Then the resultant chlorantraniliprole can be isolated by conventional techniques such as precipitation by cooling the reaction mass, isolated by solvent precipitation, crystallization, concentrated by subjecting the solution to heating, decantation or filtration; preferably precipitation by cooling the reaction mass to below 30°C. The resultant product may optionally be further dried at a temperature of about 35°C to about 85°C for sufficient period of time. Drying can be suitably carried out in a tray dryer, vacuum oven, air oven and the like; preferably drying is carried out under vacuum at a temperature of about 45°C to about 75°C for sufficient period of time.
In another embodiment, the present invention provides an improved process for preparation of chlorantraniliprole of Formula I,
comprising: reacting a compound of Formula V with a compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, in presence of a suitable base and a suitable solvent to obtain chlorantraniliprole.
The starting materials, a compound of Formula V and Formula VI are known in the art and can be produced by methods known and recognized by the organic chemist of ordinary skill in the art, for example US7232836. Alternatively Formula VI can also be prepared by the procedure as described by the following embodiments of the invention.
The base used for reaction of compound of Formula V with a compound of Formula VI is selected from silyl bases such as Lithium bis(trimethylsilyl)amide, Sodium bis(trimethylsilyl)amide, Potassium bis(trimethylsilyl)amide and the like; hydroxides such as Potassium hydroxide, Sodium hydroxide, Cesium hydroxide and the like; alkyl hydroxides such as sodium methoxide, sodium ethoxide, potassium methoxide, sodium
tert-butoxide, potassium tert-butoxide and the like and mixture thereof; preferably Lithium bis(trimethylsilyl)amide, Sodium bis(trimethylsilyl)amide or sodium methoxide; more preferably Lithium bis(trimethylsilyl)amide.
The suitable solvent used herein for reaction of compound of Formula V with a compound of Formula VI is selected from the group consisting of but not limited to amides, sulfoxides, ketones, nitriles, ethers, halogenated hydrocarbons, aromatic hydrocarbons and mixtures thereof. The amides include, but are not limited to dimethylacetamide, dimethylformamide, N-methylpyrrolidone and the like and mixtures thereof; sulfoxides include, but are not limited to dimethyl sulfoxide, diethyl sulfoxide and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like; nitriles include, but are not limited to acetonitrile, propionitrile and the like; ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like; halogenated hydrocarbons include, but are not limited to methylene chloride, ethylene chloride, chloroform and the like; aromatic hydrocarbons include, but are not limited to toluene, xylene and the like and mixture thereof; preferably dimethylformamide, acetonitrile or tetrahydrofuran; more preferably tetrahydrofuran.
The reaction of a Formula V with a compound of Formula VI is carried out at a temperature of about -60°C to 25°C; preferably at about -40°C to about -50°C.
After completion of the reaction, the resultant product is isolated by known methods such as extraction of the product from the solution, cooling the solution to precipitation, concentration of the reaction solution, solvent crystallization and the like. Preferably the product can be isolated by extraction of the product from the solution by first adding water and water immiscible organic solvent to the reaction solution so that aqueous and organic layers are formed and the product containing organic layer can be separated easily and then concentrated by known procedures. The suitable water immiscible organic solvent includes but is not limited to toluene, ethyl acetate, methylene chloride and the like; preferably with ethyl acetate.
The resultant product may optionally be further dried at a temperature of about 35°C to about 85°C for sufficient period of time. Drying can be suitably carried out in a tray
dryer, vacuum oven, air oven and the like; preferably drying is carried out under vacuum at a temperature of about 45°C to about 85°C for sufficient period of time.
In accordance with another embodiment, the present invention provides an improved process for preparation of a compound of Formula IV, comprising:
a) mixing a suitable oxidizing agent, a suitable acid and a suitable organic solvent, b) heating the reaction mass to about 40°C to reflux temperature, c) adding a compound of Formula VII to the above step b) reaction mass,
d) isolating the compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, and
e) hydrolyzing the compound of formula VI, wherein “R” is selected from straight or branched chain Ci-6 alkyl group to obtain a compound of Formula IV.
The starting materials, a compound of Formula a VII was known in the art and can be produced by methods known and recognized by the organic chemist of ordinary skill in the art, for example US7232836.
The suitable oxidizing agent in aforementioned step a) is selected from the group consisting of but not limited to hydrogen peroxide, potassium persulfate, sodium persulfate, ammonium persulfate, potassium monopersulfate, sodium monopersulfate, potassium permanganate and the like and mixture thereof; preferably potassium persulfate.
The suitable acid used in aforementioned step a) is selected from the group consisting of but not limited to acetic acid, propanoic acid, p-toluenesulphonic acid, benzoic acid, sulphuric acid, phosphoric acid, oleum, hydrobromic acid, hydrochloric acid and the like and mixture thereof; preferably sulphuric acid.
The suitable organic solvent used in aforementioned step a) is selected from the group consisting of but not limited to ketones, nitriles, ethers, esters, halogenated hydrocarbons, aromatic hydrocarbons and the like and mixtures thereof. The ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like; nitriles include, but are not limited to acetonitrile, propionitrile and the like; ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like; ethers include, but are not limited to ethyl acetate, isopropyl acetate, butyl acetate and the like; halogenated hydrocarbons include, but are not limited to methylene chloride, ethylene chloride, chloroform and the like; aromatic hydrocarbons include, but are not limited to toluene, xylene and the like and mixture thereof; preferably acetonitrile, tetrahydrofuran or methylene chloride; more preferably acetonitrile.
The step b) of forgoing process involves heating the step a) reaction mass to about 40°C to reflux temperature; preferably at about 75°C to about 85°C.
The step c) of forgoing process involves addition of a compound of Formula VII to the step b) reaction mass at about 75°C to about 85°C. Advantageously, compound of Formula VII is dissolved in a suitable organic solvent and added drop wise in to the step b) reaction mass for a period of about 30 min to 5 hrs at about 75°C to about 85°C. The suitable organic solvent is same as used in the step a).
After completion of the step c) reaction, undissolved salts may be separated by filtration and the compound was Formula VI can be isolated by conventional techniques such as
precipitation by cooling the reaction mass, isolated by solvent precipitation, crystallization, concentrated by subjecting the solution to heating, decantation or filtration; preferably isolated by precipitation by adding a suitable solvent such as water. The resultant product may optionally be further dried at a temperature of about 35°C to about 65°C. Drying can be suitably carried out in a tray dryer, vacuum oven, air oven and the like; preferably drying is carried out under vacuum at a temperature of about 45°C for sufficient period of time.
Then the above obtained compound was Formula VI is hydrolyzed in presence of a suitable acid or base selected from hydrochloric acid, sulphuric acid, sodium hydroxide, potassium hydroxide and the like, by methods known and recognized by the organic chemist of ordinary skill in the art, for example US7232836.
The present invention provides chlorantraniliprole of Formula I prepared by the processes described as above having a purity of at least about 98%, as measured by HPLC, preferably at least about 99% as measured by HPLC.
Further, the present invention also encompasses an improved process for the preparation of compound of Formula V with high product yield and quality, wherein the improvements involve use of one -pot process without isolating intermediate compounds of Formula All and Formula AIII in a single solvent system and avoids explosives reagents, multiple solvent systems and cumbersome isolations such as time consuming solvent workups, drying and necessity of analyzing the compounds at each stage.
In accordance another embodiment, the present invention provides an improved process for preparation of compound of Formula V, comprising:
Formula V a) reacting a compound of Formula Al with a phosgene or its derivative and a suitable base in a suitable solvent to obtain a compound of Formula All,
Formula Al Formula All b) reacting the compound of Formula All with a source of monomethyl amine to obtain a compound of Formula AIII, and
Formula AIII c) reacting the compound of Formula AIII with a source of chloride to obtain a compound of Formula V; wherein the step a) to c) are carried out in one -pot reaction without isolating the intermediate compound of Formula All and Formula AIII as solid.
The term RRT (relative retention time) as used in this application means in high pressure liquid chromatography (HPLC) the amount of time it takes for the compound to pass through the column is the retention time (RT) and comparison of the RT of one compound to another is called relative retention time (RRT).
The phosgene or its derivative as used in the aforementioned step a) is selected from phosgene as in gaseous form or as in liquid form consisting of but not limited to phosgene, diphosgene, triphosgene, bromophosgene and the like; preferably triphosgene.
The suitable base used for reacting a compound of Formula Al with a phosgene or its derivative in aforementioned step a) is selected from the group consisting of but not limited to inorganic bases selected from alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide and the like; alkali metal alkoxides such as sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert- butoxide and the like; alkali metal carbonates such as sodium carbonate, potassium carbonate, cesium carbonate and the like; alkali metal bicarbonates such as sodium
bicarbonate, potassium bicarbonate and the like; organic bases selected from the group comprising of triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, 2-picoline, 3-picoline and the like and mixtures thereof; preferably an inorganic base such as sodium carbonate, sodium bicarbonate or potassium bicarbonate; more preferably sodium bicarbonate.
The suitable solvent used for reacting a compound of Formula Al with a phosgene or its derivative in aforementioned step a) is selected from the group consisting of but not limited to amides, esters, ketones, nitriles, ethers, halogenated hydrocarbons, aromatic hydrocarbons and the like and mixtures thereof. The amides include, but are not limited to dimethylacetamide, dimethylformamide, N-methylpyrrolidone and the like and mixtures thereof; esters include, but are not limited to ethyl acetate, methyl acetate and the like and mixtures thereof; ketones include, but are not limited to acetone, methyl isobutyl ketone, methyl ethyl ketone and the like; nitriles include, but are not limited to acetonitrile, propionitrile and the like; ethers include, but are not limited to tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane and the like; halogenated hydrocarbons include, but are not limited to methylene chloride, ethylene chloride, chloroform and the like; aromatic hydrocarbons include, but are not limited to toluene, xylene and the like and mixture thereof; preferably ethyl acetate, acetonitrile or methylene chloride; more preferably methylene chloride.
The reaction of Formula Al with a phosgene or its derivative is carried out at a temperature of about 0°C to reflux temperature; preferably at about 20°C to about 40°C.
After completion of the step a) reaction, the step a) solution advantageously processed to next step by adding a source of monomethylamine to the step a) solution without isolating the compound of Formula All as a solid.
The source of monomethylamine used in aforementioned step b) is selected from the group consisting of aqueous methyl amine, methyl amine in solvent, methyl amine gas and the like; preferably aqueous methyl amine or methyl amine gas.
Optionally the reaction of compound of Formula All with a source of monomethyl amine is carried out in presence of a suitable acid, a suitable base or, a suitable second
solvent. The suitable acid optionally used in aforementioned step b) is selected from the group consisting of acetic acid, formic acid, methanoic acid and the like. The suitable base optionally used in aforementioned step b) is selected from the group consisting of but not limited to inorganic bases selected from alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide and the like; alkali metal alkoxides such as sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert- butoxide and the like; alkali metal carbonates such as sodium carbonate, potassium carbonate, cesium carbonate and the like; alkali metal bicarbonates such as sodium bicarbonate, potassium bicarbonate and the like; organic bases selected from the group comprising of triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, pyridine, 2-picoline, 3-picoline and the like and mixtures thereof. The suitable second solvent optionally used in aforementioned step b) is same as the solvent used in step a) of the aforesaid process.
The reaction of a Formula All with a source of monomethylamine is carried out at a temperature of about 25 °C to reflux temperature; preferably at about 30°C to about 45°C.
After completion of the step b) reaction, the step b) solution advantageously processed to next step by adding a source of chloride to the compound of Formula AIII without isolating the compound of Formula AIII as a solid.
Optionally, after completion of the step b) reaction, the step b) solution may be washed with water to remove inorganic salts if any and then the resultant organic layer may be processed to next step by adding a source of chloride without isolating the compound of Formula AIII as a solid.
The source of chloride used in aforementioned step c) is selected from the group consisting of but not limited to sulfuryl chloride, N-chlorosuccinimide, chlorine gas, metal chloride-H2O2 in acid aqueous medium, HCI-H2O2, m-chloroperbenzoic acid/HCl, acetyl chloride and the like; preferably sulfuryl chloride.
Optionally the step c) is carried out in presence of a suitable solvent. The suitable solvent optionally used in aforementioned step c) is same as the solvent used in step a) of the aforesaid process.
The reaction of a Formula AIII with a source of chloride is carried out at a temperature of about 25°C to reflux temperature; preferably at about 30°C to about 45°C.
Generally chlorination reactions are prone to form impurities which are may be due to the reactions at other positional or side reactions with the amine moiety present in the substrate. These impurities may be identified by HPLC at RRT-0.31, RRT-0.53, RRT- 0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11 in the range of about 2 % to about 5 % respectively along with the required compound of Formula V. Without control of these impurities at this stage the same may be carrying forwarded to subsequent stages and to final stage and at final stage one or more additional purification steps required to remove these impurities. Hence, the compound of Formula V purity is important for preparation of pure chlorantranilipr ole .
In contrast, the present invention advantageously separated these impurities by simply formation of salt of the resultant compound of Formula V after chlorination reaction and separates the salt of compound of Formula V as an aqueous layer and unwanted impurities by an organic layer.
In another embodiment, after completion of the chlorination reaction water may be added to the reaction mass and followed by adding a suitable acid to form a salt of compound of formula V in heterogeneous solvent mixture and both organic and aqueous layers may be separated. Then after separating the impurities containing organic layer the resultant compound of Formula V can be isolated from the aqueous layer by known methods, for example, adjusting pH of the aqueous layers to above 7 with a suitable base. Then the compound of Formula V can be isolated from reaction mass by conventional techniques such as solvent extraction, solvent precipitation, crystallization, concentrated by subjecting the solution to heating, decantation or filtration; preferably by filtering the solids.
The suitable acid used herein for making salt formation is selected from hydrochloric acid, sulfuric acid, acetic acid, p-toluene sulfonic acid and the like and mixture thereof; preferably hydrochloric acid and suitable base used herein for neutralization is selected
from sodium hydroxide, potassium hydroxide, cesium hydroxide, lithium hydroxide and the like and mixture thereof.
The resultant product may optionally be further dried at a temperature of about 30°C to about 80°C. Drying can be suitably carried out in a tray dryer, vacuum oven, air oven and the like.
The present invention provides compound of Formula V prepared by the processes described as above having a purity of at least about 98% by HPLC, preferably at about 99.5% and having less than 0.5% by HPLC, preferably less than 0.2% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT- 1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11.
In another embodiment, the present invention provides a compound of Formula V having less than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT- 2.96, RRT-3.08 and RRT-3.11.
In another embodiment, the present invention provides an improved process for the preparation of chlorantraniliprole or a salt thereof, comprising preparing the compound of Formula V as process described above, and converting the compound of Formula V in to chlorantraniliprole or a salt thereof by any process known in the art for example W02006/062978 or by the process described in the present specification.
In another embodiment, the present invention provides crystalline chlorantraniliprole characterized by a powder X-ray diffraction (PXRD) pattern substantially in accordance with Figure 1.
In another embodiment, the present invention provides crystalline chlorantraniliprole characterized by X-Ray diffraction (XRD) pattern having at least one peak selected from at about 8.6, 10.0, 10.5, 10.6, 11.4, 11.7, 12.2, 14.0, 14.2, 14.4, 14.6, 14.9, 15.6, 16.1, 16.6, 17.3, 17.5, 17.8, 18.3, 18.5, 20.0, 20.3, 20.5, 20.7, 21.1, 21.2, 21.4, 21.5, 21.7, 22.7, 22.9, 23.4, 24.3, 24.7, 24.9, 25.3, 25.6, 26.1, 27.2, 27.5, 28.4, 29.0, 29.2, 29.4, 29.8, 30.0 and 30.3 ±0.2° 20.
In another embodiment, the present invention provides a crystalline compound of Formula Ila characterized by a powder X-ray diffraction (PXRD) pattern substantially in accordance with Figure 2.
In another embodiment, the present invention provides a crystalline compound of Formula Ila characterized by X-Ray diffraction (XRD) pattern having at least one peak selected from at about 6.8, 8.2, 9.3, 10.1, 11.1, 12.4, 12.8, 13.5, 14.3, 14.8, 15.6, 15.7, 15.9, 16.5, 18.1, 18.7, 19.0, 19.5, 19.9, 20.4, 20.9, 21.7, 22.0, 22.5, 22.7, 23.2, 23.5, 24.0, 24.3, 24.8, 25.3, 25.9, 26.4, 27.2, 27.7, 27.9, 28.3, 28.9, 29.1, 29.2, 29.8 and 30.5 ±0.2° 20.
In another embodiment, the present invention provides a composition comprising chlorantraniliprole, prepared by the processes of the present invention and/or at least one excipient.
In another embodiment, the present invention relates to a one -pot process for preparation of chlorantraniliprole of Formula I, which is depicted in below scheme:
In another embodiment, the present invention relates to a process for preparation of chlorantraniliprole of Formula I, which is depicted in below scheme:
In another embodiment, the present invention relates to a process for preparation of chlorantraniliprole of Formula I, which is depicted as follows:
wherein "R" is selected from straight orbranched chain Cj-6 alkyl group
The present invention provides chlorantraniliprole and its intermediates, obtained by the above process, as analyzed using high performance liquid chromatography (“HPLC”) with the conditions are tabulated below:
EXAMPLES
The following non-limiting examples illustrate specific embodiments of the present invention. They are not intended to be limiting the scope of the present invention in any way.
EXAMPLE-1:
Preparation of chlorantraniliprole
Compound of Formula III (R=Me; 66 gm) and Formula IV (100 gm), 3-picoline (77 gm) and acetonitrile (500 mL) were added in to a round bottom flask at about 25°C to about 30°C and stir for 10 min at same temperature. Reaction mass was cool to 0-5°C and was added methanesulfonyl chloride (45.5 gm) and stir for 1 hr at same temperature. Then the reaction mass was allowed to 25-30°C and stir for 2 hrs at same temperature. After completion of the reaction, reaction mixture was washed with water (600 mL). Then the organic layer was cool to 0-5°C and was passed methyl amine gas (86 gm) and stir fir 1 hr at same temperature. Then the reaction mass was allowed to 25- 30°C and stir for 4 hrs at same temperature. After completion of the reaction, reaction mass was concentrated under vacuum at below 50°C and co-distilled with methanol (50 mL) to obtain a solid. To the solid was added methanol (50 mL) and heated to reflux for 1 hr. Reaction mass was cool to 25-30°C and stir for 4 hr at same temperature. Then the solid was filtered and washed with methanol (50 mL) and dry the wet material initially at 25-30°C for 30-60 min, then dry at 60-65°C for 6 hr to obtain title compound. Wt: 160 gm. Purity by HPLC: 99.5%; PXRD: Fig 1; TGA: No weight loss; DSC: Endothermic peaks at 204°C and 237.2°C.
EXAMPLE-2:
Preparation of chlorantraniliprole
Compound of Formula III (R=Me; 66 gm) and Formula IV (100 gm), 3-picoline (77 gm) and methylene chloride (500 mL) were added in to a round bottom flask at about 25°C to about 30°C and stir for 10 min at same temperature. Reaction mass was cool to 0-5°C and was added methanesulfonyl chloride (45.5 gm) and stir for 1 hr at same temperature. Then the reaction mass was allowed to 25-30°C and stir for 2 hrs at same temperature. After completion of the reaction, reaction mixture was cool to 0-5°C and
was passed methyl amine gas (82 gm) and stir fir 1 hr at same temperature. Then the reaction mass was allowed to 25-30°C and stir for 4 hrs at same temperature. After completion of the reaction, reaction mass was concentrated under vacuum at below 50°C and co-distilled with acetone (50 mL) to obtain a solid. To the solid was added acetone (300 mL) and heated to reflux for 1 hr. Reaction mass was cool to 25-30°C and stir for 4 hr at same temperature. Then the solid was filtered and washed with acetone (50 mL) and dry the wet material initially at 25-30°C for 30-60 min, then dry at 60- 65°C for 6 hr to obtain title compound. Wt: 159 gm.
EXAMPLE-3:
Preparation of chlorantraniliprole
Compound of Formula III (R=Me; 66 gm) and Formula IV (100 gm), 3-picoline (77 gm) and acetonitrile (500 mL) were added in to a round bottom flask at about 25°C to about 30°C and stir for 10 min at same temperature. Reaction mass was cool to 0-5°C and was added methanesulfonyl chloride (45.5 gm) and stir for 1 hr at same temperature. Then the reaction mass was allowed to 25-30°C and stir for 2 hrs at same temperature. After completion of the reaction, reaction mass was cool to 0-5°C and was passed methyl amine gas (86 gm) and stir fir 1 hr at same temperature. Then the reaction mass was allowed to 25-30°C and stir for 4 hrs at same temperature. After completion of the reaction, reaction mass was concentrated under vacuum at below 50°C and co-distilled with methanol (50 mL) to obtain a solid. To the solid was added methanol (50 mL) and heated to reflux for 1 hr. Reaction mass was cool to 25-30°C and stir for 4 hr at same temperature. Then the solid was filtered and washed with methanol (50 mL) and dry the wet material initially at 25-30°C for 30-60 min, then dry at 60- 65°C for 6 hr to obtain title compound. Wt: 163 gm. Purity by HPLC: 99.6%
EXAMPLE-4:
Preparation of compound of Formula II (R= methyl)
Compound of Formula III (R=Me; 66 gm) and Formula IV (100 gm), 3-picoline (92.3 gm) and acetonitrile (500 mL) were added in to a round bottom flask at about 25°C to about 30°C and stir for 10 min at same temperature. Reaction mass was cool to 0-5°C and was added methanesulfonyl chloride (53.1 gm) at same temperature. Then the reaction mass was allowed to 25-30°C and stir for 1 hrs at same temperature. After
completion of the reaction, to the reaction mass was charged water (250 mL) at 25-30°C and stir for 1 hrs at same temperature. Precipitated solid was filtered and washed with water (100 mL) and dried the wet material under vacuum at 50-60°C to obtain title compound. Wt: 160 gm; PXRD: Fig 3; TGA: 0.08%; DSC: Endothermic peaks at 155.5°C and 176°C.
EXAMPLE S;
Preparation of chlorantraniliprole
Compound of Formula II (R=Me; 100 gm) and acetonitrile (300 mL) were added in to a round bottom flask at about 25°C to about 30°C. Reaction mass was cool to 0-5°C and was passed methyl amine gas at same temperature for 1 to 1.5 hrs. Then the reaction mass was allowed to 25-30°C and stir for 12 hrs at same temperature. After completion of the reaction, to the reaction mass was charged water (150 mL) at 25-30°C. Precipitated solid was filtered and washed with water (50 mL), acetonitrile (50 mL) and dried the wet material under vacuum at 50-60°C to obtain title compound. Wt: 90 gm. Purity by HPLC: 99.4%.
EXAMPLE-6:
Preparation of chlorantraniliprole
Compound of Formula II (R=Me; 100 gm) and acetonitrile (300 mL) were added in to a round bottom flask at about 25°C to about 30°C. To the reaction mass was added aqueous methylamine (10 gm) at about 25°C to about 30°C and stir for 24 hrs at same temperature. After completion of the reaction, to the reaction mass was charged water (150 mL) at 25-30°C. Precipitated solid was filtered and washed with water (50 mL), acetonitrile (50 mL) and dried the wet material under vacuum at 50-60°C to obtain title compound. Wt: 93 gm.
EXAMPLE-7:
Preparation of chlorantraniliprole
Compound of Formula VI (R’=Ethyl; 100 gm) and tetrahydrofuran (500 mL) were added in to a round bottom flask at about 25°C to about 30°C. To the reaction mass was added compound of Formula V (60.1 gm) at about 25°C to about 30°C. Then reaction mass was cool to about -40°C to about -50°C and was added IM LiHMDS in
tetrahydrofuran (906 mL) at same temperature and stir for 1 hr at same temperature. After completion of the reaction, to the reaction mass was charged water (1 lit) and ethyl acetate (1 lit) at about -40°C to about -50°C. Reaction mass temperature was heated to 25-30°C and separated the organic and aqueous layers. Organic layer was concentrated under vacuum at 40-45°C to obtain a solid. Then the obtained solid was mixed with acetonitrile (500 mL) at 25-30°C. To the reaction mass was added water (250 mL) at 25-30°C and stir for 1 hr at same temperature. Precipitated solid was filtered and washed with water (100 mL), acetonitrile (50 mL) and dried the wet material under vacuum at 50-60°C to obtain title compound. Wt: 75 gm.
EXAMPLE S:
Preparation of compound of Formula IV i) Preparation of (3-chloropyridin-2-yl) hydrazine
2,3-Dichloropyridine (100 gm), ethanol (150 mL) and hydrazine hydrate (162 mL) were added in to a round bottom flask at about 25°C to about 30°C. Reaction mass was heated to reflux for 15 hrs. After completion of the reaction, reaction mass was cool to 25-30°C and was added water (100 mL). The precipitated solid compound was filtered and washed with water (300 mL) and dried the wet material under vacuum at 65-75°C to obtain title compound. Wt: 101 gm. ii) Preparation of 2-(3-Chloro pyridin-2-yl)-5-oxo-pyrazolidine-3-carboxylic acid ethyl ester
Sodium ethoxide (21% w/w) in ethanol (300 mL) and ethanol (250 mL) were added in to a round bottom flask at about 25°C to about 30°C. Reaction mass was heated to about 55-60°C for 5-10 min. To the reaction mass was added of (3-chloropyridin-2-yl) hydrazine (100 gm) and diethyl maleate (132.6 gm) at 55-60°C. After completion of the reaction, reaction mass was cool to 25-30°C and was added acetic acid (90 mL) at same temperature. Then the reaction mass was completely concentrated under vacuum at below 50°C to obtain a residue. To the residue was added water (500 mL) and the product was extracted with methylene chloride (500 mL). Organic layer was concentrate completely under vacuum at below 40°C. Then the obtained product was crystallized from ethanol and dried the wet material under vacuum at 50-55°C to obtain title compound. Wt: 120 gm.
iii) Preparation of Ethyl 3-bromo-l-(3-chloro-2-pyridinyl)-4,5-dihydro-lH-pyrazole-5- carboxylate (Formula VII)
2-(3-Chloro pyridin-2-yl)-5-oxo-pyrazolidine-3-carboxylic acid ethyl ester (100 gm), acetonitrile (200 mL) and Phosphoryl bromide (84.9 gm) were added in to a round bottom flask at about 25°C to about 30°C. Reaction mass was heated to reflux for 4 hrs. After completion of the reaction, reaction mass was cool to 25-30°C and was added water (500 mL) and extracted with methylene chloride (500 mL). Then the organic layer was washed with 5% Sodium metabisulphite solution (500 mL) and followed by 5% sodium bicarbonate solution (500 mL). Organic layer was concentrate completely under vacuum below 40°C to obtain title compound. Wt: 120 gm. iv) Preparation of Ethyl 3-bromo-l-(3-chloro-2-pyridinyl)-lH-pyrazole-5-carboxylate (Formula VI; ethyl)
Sulphuric acid (58.98 gm), potassium persulfate (119.5 gm) and acetonitrile (200 mL) were added in to a round bottom flask at about 25°C to about 30°C. Reaction mass was heated to reflux and was added solution of ethyl 3-bromo-l-(3-chloro-2-pyridinyl)-4,5- dihydro-lH-pyrazole-5-carboxylate (100 gm dissolved in 100 mL acetonitrile) and stir for 3 hrs at same temperature. After completion of the reaction, reaction mass was cool to 60-65°C and undissolved salts were filtered. Ten the filterate was added in to water (500 mL) at 25-30°C and stir for 2 hrs at same temperature. The precipitated solid compound was filtered and washed with water (100 mL) and dried the wet material under vacuum at 50-55°C to obtain title compound. Wt: 94.6 gm. v) Preparation of 3-Bromo-l-(3-chloro-2-pyridinyl)-lH-pyrazole-5-carboxylic acid (Formula IV)
Ethyl 3-bromo-l-(3-Chloro-2-pyridinyl)-lH-pyrazole-5-carboxylate (100 gm), methanol (300 mL), water (200 mL) and sodium hydroxide (13.31 gm) were added in to a round bottom flask at about 25°C to about 30°C and stir for 2 hrs at same temperature. After completion of the reaction, concentrated the solvent under vacuum at below 50°C and was added water (500 mL). Aqueous layer was cool to 5°C and pH was adjusted to 1.5 ±0.5 with hydrochloric acid at 5°C. The precipitated solid compound was filtered
and washed with water (100 mL) and dried the wet material under vacuum at 50-55°C to obtain title compound. Wt: 80 gm.
EXAMPLE-9:
Preparation of compound of Formula V
Thiophosgene solution (78.5 gm) and 700 mL methylene chloride was were added in to a round bottom flask at room temperature and stir for 10 min at 10°C to 20°C. To the solution was added compound of Formula Al (100 gm), sodium bicarbonate (138.9 gm) and stir for 10-20 min at same temperature. Reaction mass was heated 25-35°C and stir for 6 hrs at same temperature. After completion of the reaction, to the reaction mass was added 40% aqueous monomethylamine (154 gm) at 10-20°C and stir for 3 hrs at 25- 35°C. After completion of the reaction, to the reaction mass was added water (700 mL) and product containing organic layer was separated. To the product containing organic layer sulfuryl chloride (133.6 gm) was added slowly at 10-20°C and stir for 6 hrs at 25- 35°C. After completion of the reaction, to the reaction mass was added water (500 mL) and hydrochloric acid (150 mL) at 10-20°C and stir for 20 min at 25-35°C. Aqueous and organic layers were separated and product containing aqueous layer pH was adjusted to 8.0-9.0 with aq sodium hydroxide solution at 25°C to 35°C and stir for 30 min at same temperature. Filtered the solids and washed the wet cake with water (100 mL) and dry the wet material initially at 25-35°C for 60 min, then dry at 60-75°C for 6 hr to obtain title compound. Wt: 106 gm; Yield: 79%; HPLC Purity: 99.5%;
The organic layer was taken and concentrated completely under vacuum to obtain a residue and analyzed the residue by HPLC and the results are as follows:
EXAMPLE-10:
Preparation of compound of Formula V
Compound of Formula Al (100 gm), methylene chloride (500 mL), sodium bicarbonate (138.9 gm) were added in to a round bottom flask and allowed to cool to 0-10°C and stir for 10-20 min at same temperature. To the reaction mass was added triphosgene solution (78.5 gm dissolved in 200 mL methylene chloride) at 0-10°C. Reaction mass was heated 25-35°C and stir for 6 hrs at same temperature. After completion of the reaction, to the reaction mass was added acetic acid (7.9 gm) and 40% aqueous monomethylamine (102.7 gm) at 25-35°C and stir for 3 hrs at same temperature. After completion of the reaction, to the reaction mass water (100 mL) was added and product containing organic layer was separated. To the product containing organic layer Sulfuryl chloride (134.1 gm) was added slowly at 25-35°C and stir for 3 hrs at same temperature. After completion of the reaction, reaction mass was cool to 0-5°C and was added water (500 mL) at same temperature. pH of the reaction mass was adjusted to 9.5 with aq sodium hydroxide solution at -5°C to 5°C and stir for 30 min at same temperature. Then the product containing organic layer was separated and aqueous layer was extracted with methylene chloride (200 mL). The combined organic layer was concentrated under vacuum at below 40°C to get semi solid. To the solids was added a mixture of methanol (50 mL) and water (450 mL) at 25-35°C and stir for 3 hrs at same temperature. Filtered the solids and washed the wet cake with water (100 mL) and dry the wet material initially at 25-35°C for 60 min, then dry at 60-75°C for 6 hr to obtain title compound. Wt: 105gm; Yield: 78.3%.
EXAMPLE-11:
Preparation of Chlorantraniliprole
3-Bromo-l-(3-chloro-2-pyridinyl)-lH-pyrazole-5-carboxylic acid ethyl ester (100 gm) and tetrahydrofuran (500 mL) were added in to a round bottom flask at about 25°C to about 30°C. To the reaction mass was added compound of Formula V (60.1 gm) at about 25°C to about 30°C. Then reaction mass was cool to about -40°C to about -50°C and was added IM LiHMDS in tetrahydrofuran (906 mL) at same temperature and stir
for 1 hr at same temperature. After completion of the reaction, to the reaction mass was charged water (1 lit) and ethyl acetate (1 lit) at about -40°C to about -50°C. Reaction mass temperature was heated to 25-30°C and separated the organic and aqueous layers. Organic layer was concentrated under vacuum at 40-45°C to obtain a solid. Then the obtained solid was mixed with acetonitrile (500 mL) at 25-30°C. To the reaction mass was added water (250 mL) at 25-30°C and stir for 1 hr at same temperature. Precipitated solid was filtered and washed with water (100 mL), acetonitrile (50 mL) and dried the wet material under vacuum at 50-60°C to obtain title compound. Wt: 100 gm.
REFERENCE EXAMPLE-1:
Preparation of compound of Formula All
Compound of Formula Al (100 gm) and methylene chloride (500 mL) were added in to a round bottom flask and allowed to cool to 0-10°C. To the reaction mass was slowly added pyridine (104.4 gm) and triphosgene (68.7 gm dissolved in 100 mL methylene chloride) at 0-10°C and stir for 2 hrs at same temperature. Reaction mass was heated 25-35°C and stir for 6 hrs at same temperature. After completion of the reaction, to the reaction mass was added water (100 mL), cool to 10°C and stir for 3 hrs at same temperature. Precipitated solids were filtered and washed with water (100 mL) and dry the wet material initially at 30-35°C for 60 min, then dry at 60-75°C for 6 hr to obtain title compound. Wt: 105 gm.
REFERENCE EXAMPLE-2:
Preparation of compound of Formula AIII
Compound of Formula All (100 gm), acetic acid (5.8 mL) and methylene chloride (425 mL) were added in to a round bottom flask and heated to 30-35°C. To the reaction mass was added 40% aq methylamine solution (58 gm) and stir for 3 hrs at 30-35°C. After completion of the reaction, to the reaction mass was added water (85 mL) and extracted product in to methylene chloride (85 mL). Combined organic layer was concentrated under vacuum at below 55°C and dry the wet material initially at 45-50°C to obtain title compound. Wt: 83 gm.
REFERENCE EXAMPLE-3:
Preparation of compound of Formula V
Compound of Formula AIII (80 gm), methylene chloride (340 mL) and Sulfuryl chloride (61.5 gm) were added in to a round bottom flask at 30-35°C and stir for 3 hrs at same temperature. After completion of the reaction, to the reaction mass was added water (70 mL) and pH adjusted to 8.5 to 9.5 with lye solution at -5°C to 5°C and stir for 30 min at same temperature. Then the product containing organic layer was separated and was concentrated under vacuum at below 40°C to get semi solid. To the solids was added a mixture of methanol (35 mL) and water (300 mL) at 25-35°C and stir for 3 hrs at same temperature. Filtered the solids and washed the wet cake with water (70 mL) and dry the wet material initially at 25-35°C for 60 min, then dry at 60-75°C for 6 hr to obtain title compound. Wt: 78 gm.
It will be understood that various modifications may be made to the embodiments disclosed herein. Therefore the above description should not be constructed as limiting, but merely as exemplifications of preferred embodiments. For example, the functions described above and implemented as the best mode for operating the present invention are for illustration purposes only. Other arrangements and methods may be implemented by those skilled in the art without departing from the scope and spirit of this invention. Moreover, those skilled in the art will envision other modifications within the scope and spirit of the specification appended hereto.
Claims
We Claim:
1. A process for preparation of chlorantraniliprole of Formula I, comprising:
a) reacting a compound of Formula III; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, with a compound of Formula IV in presence of a suitable activating agent, a suitable base and a suitable solvent to obtain a compound of Formula II, wherein “R” is selected from straight or branched chain Ci-6 alkyl group; and
b) reacting the compound of Formula II with a source of monomethylamine to obtain chlorantraniliprole.
2. The process as claimed in claim 1, wherein in the Ci-6 alkyl group is selected from the group consisting of methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert butyl, pentyl, isopentyl, hexyl, isohexyl and isoamyl.
3. The process as claimed in claim 1, wherein in the suitable activating agent is selected from the group consisting thionyl chloride, pivaloyl chloride, methane sulfonyl chloride, ethane sulfonyl chloride, benzene sulfonyl chloride, p- toluenesulfonyl chloride, p- nitro sulfonyl chloride, carbonyldiimidazole, diisopropylcarbodiimide, N-(3-dimethylaminopropyl)-N’ -ethyl carbodiimide, dicyclohexyl carbodiimide, propanephosphonic acid cyclic anhydride, benzotriazol- 1-yl-oxytripyrrolidino phosphonium hexafluorophosphate, bromo- tripyrrolidino- phosphonium hexafluorophosphate, benzotriazol- 1-yloxy-tris (dimethylamino)-
phosphonium hexafluorophosphate, Propylphosphonic anhydride, 2-(7-Aza-lH- benzotriazol-l-yl)- N,N,N’,N’ -tetra methylaminium hexafluorophosphate), (1- cyano-2-ethoxy-2-oxoethyl idenaminooxy)dimethylamino-morpholino-carbenium hexa fluorophosphate, N,N,N',N'-Tetramethyl-O-(lH-benzotriazol- l-yl)uronium hexafluoro phosphate, O -(benzotriazol- l-yl)-N,N,N',N'-tetramethyluronium hexafluoro phosphate, 2-( IH-Benzotriazol- l-yl)-N,N,N’ ,N’ -tetramethylaminium tetrafluoroborate and mixture thereof. The process as claimed in claim 1, wherein in the suitable base is selected from the group consisting of lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert-butoxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium bicarbonate, potassium bicarbonate, triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, pyridine, 2-picoline, 3- picoline and mixtures thereof. The process as claimed in claim 1, wherein in the suitable solvent is selected from the group consisting of dimethylacetamide, dimethylformamide, N- methylpyrrolidone, dimethyl sulfoxide, diethyl sulfoxide, acetone, methyl isobutyl ketone, methyl ethyl ketone, acetonitrile, propionitrile, tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4- dioxane, methylene chloride, ethylene chloride, chloroform, toluene, xylene and mixtures thereof. The process as claimed in claim 1, wherein the step a) reaction is carried out at a temperature of about 20°C to about 35°C. The process as claimed in claim 1, wherein in the step b) is carried out by one-pot reaction without isolating the compound of Formula II as a solid. The process as claimed in claim 1, wherein in source of monomethylamine is selected from the group consisting of aqueous methyl amine, methyl amine in solvent and methyl amine gas. The process as claimed in claim 1, wherein in the alkyl group is methyl; wherein in the activating agent is methane sulfonyl chloride or thionyl chloride; wherein in the
base is 3-picoline; wherein in the solvent is acetonitrile or methylene chloride; and wherein in the source of monomethylamine is aqueous methyl amine or methyl amine gas. The process as claimed in claim 1, wherein the step b) reaction is carried out at a temperature of about 30°C to about 40°C. The process as claimed in claim 1, wherein the process further comprises: a) cooling the step a) solution containing compound of Formula II to below 25°C, b) adding a source of monomethylamine to the step a) solution, c) heating the step b) to about 25°C to reflux temperature, d) concentrating the step c) reaction mass to obtain a solid compound, e) adding a suitable organic solvent to the step d) and heating to reflux temperature, f) cooling the solution to below 35°C, and g) filtering the chlorantraniliprole. The process as claimed in claim 11, wherein in the suitable organic solvent in step e) is selected from the group consisting of methanol, ethanol, butanol, pentanol, isopropanol, isopentanol, acetone, methyl isobutyl ketone, methyl ethyl ketone, tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane, cyclopropane, cyclobutane, cyclopentane, cyclohexane, methyl cyclohexane, cycloheptane, cyclooctane and mixture thereof. The process as claimed in claim 12, wherein in the organic solvent is methanol or acetone. An improved process for preparation of chlorantraniliprole of Formula I,
comprising: reacting a compound of Formula V
with a compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group,
Formula VI in presence of a suitable base and a suitable solvent to obtain chlorantraniliprole. The process as claimed in claim 14, wherein the Ci-6 alkyl group is selected from the group consisting of methyl, ethyl, propyl, iso-propyl, butyl, iso-butyl, tert-butyl, pentyl, iso-pentyl, hexyl, iso-hexyl and iso-amyl. The process as claimed in claim 14, wherein the suitable base is selected from the group consisting of Lithium bis(trimethylsilyl)amide, Sodium bis(trimethylsilyl)amide, Potassium bis(trimethylsilyl)amide, Potassium hydroxide, Sodium hydroxide, Cesium hydroxide, sodium methoxide, sodium ethoxide, potassium methoxide, sodium tert-butoxide, potassium tert-butoxide and mixture thereof. The process as claimed in claim 14, wherein the suitable solvent is selected from the group consisting of dimethylacetamide, dimethylformamide, N- methylpyrrolidone, dimethyl sulfoxide, diethyl sulfoxide, acetone, methyl isobutyl ketone, methyl ethyl ketone, acetonitrile, propionitrile, tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4- dioxane, methylene chloride, ethylene chloride, chloroform, toluene, xylene and mixture thereof.
18. The process as claimed in claim 14, wherein the alkyl group is ethyl; wherein the base is Lithium bis (trimethylsilyl) amide; and wherein the solvent is tetrahydrofuran.
19. The process as claimed in claim 14, wherein the reaction is carried out at a temperature of about -40°C to about -50°C. 0. An improved process for preparation of a compound of Formula IV, comprising:
Formula IV a) mixing a suitable oxidizing agent, a suitable acid and a suitable organic solvent, b) heating the reaction mass to about 40°C to reflux temperature, c) adding a compound of Formula VII to the above step b) reaction mass,
Formula VII d) isolating the compound of Formula VI; wherein “R” is selected from straight or branched chain Ci-6 alkyl group, and
Formula VI e) hydrolyzing the compound of formula VI, wherein “R” is selected from straight or branched chain Ci-6 alkyl group to obtain a compound of Formula IV.
21. The process as claimed in claim 20, wherein the suitable oxidizing agent is selected from the group consisting of hydrogen peroxide, potassium persulfate, sodium persulfate, ammonium persulfate, potassium monopersulfate, sodium monopersulfate, potassium permanganate and mixture thereof.
22. The process as claimed in claim 20, wherein the suitable acid is selected from the group consisting of acetic acid, propanoic acid, p-toluenesulphonic acid, benzoic acid, sulphuric acid, phosphoric acid, oleum, hydrobromic acid, hydrochloric acid and mixture thereof.
23. The process as claimed in claim 20, wherein the suitable organic solvent is selected from the group consisting of acetone, methyl isobutyl ketone, methyl ethyl ketone, acetonitrile, propionitrile, tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-dioxane, ethyl acetate, isopropyl acetate, butyl acetate, methylene chloride, ethylene chloride, chloroform, toluene, xylene and mixture thereof.
24. The process as claimed in claim 20, wherein the acid is sulphuric acid; wherein the oxidizing agent is potassium persulfate; and wherein the organic solvent is acetonitrile.
25. The process as claimed in claim 20, wherein the step e) is carried out in presence of a suitable acid or a base.
26. The process as claimed in claim 25, wherein the step e) is carried out using hydrochloric acid, sulphuric acid, sodium hydroxide or potassium hydroxide.
Formula V a) reacting a compound of Formula Al with a phosgene or its derivative and a suitable base in a suitable solvent to obtain a compound of Formula All,
Formula Al Formula All b) reacting the compound of Formula All with a source of monomethyl amine to obtain a compound of Formula AIII, and
Formula AIII c) reacting the compound of Formula AIII with a source of chloride to obtain a compound of Formula V; wherein the step a) to c) are carried out in one -pot reaction without isolating the intermediate compound of Formula All and Formula AIII as solid.
28. The process as claimed in claim 27, wherein in the phosgene or its derivative is selected from the group consisting of phosgene, diphosgene, triphosgene and bromophosgene.
29. The process as claimed in claim 27, wherein in the suitable base is selected from the group consisting of lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium methoxide, sodium ethoxide, sodium tert-butoxide, potassium tert-butoxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium bicarbonate, potassium bicarbonate, triethylamine, isopropyl ethylamine, diisopropyl amine, diisopropyl ethylamine, N-methyl morpholine, piperidine, 2-picoline, 3-picoline and mixtures thereof.
30. The process as claimed in claim 27, wherein in the suitable solvent is selected from the group consisting of dimethylacetamide, dimethylformamide, N- methylpyrrolidone, ethyl acetate, methyl acetate, acetone, methyl isobutyl ketone, methyl ethyl ketone, acetonitrile, propionitrile, tetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diisopropyl ether, methyl tertiary butyl ether, 1,4-
dioxane, methylene chloride, ethylene chloride, chloroform, toluene, xylene and mixture thereof.
31. The process as claimed in claim 27, wherein the step a) reaction is carried out at a temperature of about 0°C to reflux.
32. The process as claimed in claim 27, wherein in the source of monomethyl amine is selected from the group consisting of aqueous methyl amine, methyl amine in solvent and methyl amine gas.
33. The process as claimed in claim 27, wherein the step b) reaction is carried out at a temperature of about 25°C to reflux.
34. The process as claimed in claim 27, wherein in the source of chloride is selected from the group consisting of sulfuryl chloride, N-chlorosuccinimide, chlorine gas, metal chloride -H2O2 in acid aqueous medium, HCI-H2O2, m-chloroperbenzoic acid/HCl and acetyl chloride.
35. The process as claimed in claim 27, wherein the step c) reaction is carried out at a temperature of about 25°C to reflux.
36. The process as claimed in claim 27, wherein in the phosgene or its derivative is triphosgene, wherein in the base is sodium carbonate, sodium bicarbonate or potassium bicarbonate; wherein in the solvent is ethyl acetate, acetonitrile or methylene chloride; wherein in the source of monomethyl amine is aqueous methyl amine or methyl amine gas; and wherein in the source of chloride is sulfuryl chloride.
37. An improved process for preparation of compound of Formula V having less than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11, comprising: a) reacting a compound of Formula AIII with a source of chloride to obtain a solution containing compound of Formula V having more than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89,
RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11, b) adding water and a suitable acid to the step a) solution, c) separating the organic and aqueous layers, d) adding a suitable base to the aqueous layer, and e) filtering the compound of Formula V.
38. The process as claimed in claim 37, wherein in the source of chloride is selected from the group consisting of sulfuryl chloride, N-chlorosuccinimide, chlorine gas, metal chloride -H2O2 in acid aqueous medium, HCI-H2O2, m-chloroperbenzoic acid/HCl and acetyl chloride; wherein the suitable acid is selected from the group consisting of hydrochloric acid, sulfuric acid, acetic acid, p-toluene sulfonic acid and mixture thereof; and wherein the base is selected from the group consisting of sodium hydroxide, potassium hydroxide, caesium hydroxide, lithium hydroxide and mixture thereof.
39. A compound of Formula V having less than 0.5% by HPLC of at least one of impurities at RRT-0.31, RRT-0.53, RRT-0.79, RRT-0.89, RRT-1.06, RRT-1.84, RRT-2.01, RRT-2.03, RRT-2.62, RRT-2.96, RRT-3.08 and RRT-3.11.
40. Crystalline chlorantraniliprole having an X-Ray diffraction (XRD) at least one peak selected from at about 8.6, 10.0, 10.5, 10.6, 11.4, 11.7, 12.2, 14.0, 14.2, 14.4, 14.6,
14.9, 15.6, 16.1, 16.6, 17.3, 17.5, 17.8, 18.3, 18.5, 20.0, 20.3, 20.5, 20.7, 21.1, 21.2,
21.4, 21.5, 21.7, 22.7, 22.9, 23.4, 24.3, 24.7, 24.9, 25.3, 25.6, 26.1, 27.2, 27.5, 28.4,
29.0, 29.2, 29.4, 29.8, 30.0 and 30.3 ±0.2° 20.
Formula Ila having an X-Ray diffraction (XRD) at least one peak selected from at about 6.8,
8.2, 9.3, 10.1, 11.1, 12.4, 12.8, 13.5, 14.3, 14.8, 15.6, 15.7, 15.9, 16.5, 18.1, 18.7,
19.0, 19.5, 19.9, 20.4, 20.9, 21.7, 22.0, 22.5, 22.7, 23.2, 23.5, 24.0, 24.3, 24.8, 25.3,5.9, 26.4, 27.2, 27.7, 27.9, 28.3, 28.9, 29.1, 29.2, 29.8 and 30.5 ±0.2° 20. composition comprising chlorantraniliprole prepared by the processes accordingo claims 1-41 and/or at least one excipient.
50
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WO2003015519A1 (en) * | 2001-08-13 | 2003-02-27 | E.I. Du Pont De Nemours And Company | Arthropodicidal anthranilamides |
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CN103058993A (en) * | 2013-01-08 | 2013-04-24 | 河南师范大学 | Chlorantraniliprole preparation method |
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WO2003015519A1 (en) * | 2001-08-13 | 2003-02-27 | E.I. Du Pont De Nemours And Company | Arthropodicidal anthranilamides |
WO2006062978A1 (en) * | 2004-12-07 | 2006-06-15 | E.I. Dupont De Nemours And Company | Method for preparing n-phenylpyrazole-1-carboxamides |
US8153844B2 (en) * | 2006-07-19 | 2012-04-10 | E. I. Du Pont De Nemours And Company | Process for making 3-substituted 2-amino-5-halobenzamides |
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