WO2021209269A1 - A process for preparation of substituted enamine compounds - Google Patents
A process for preparation of substituted enamine compounds Download PDFInfo
- Publication number
- WO2021209269A1 WO2021209269A1 PCT/EP2021/058580 EP2021058580W WO2021209269A1 WO 2021209269 A1 WO2021209269 A1 WO 2021209269A1 EP 2021058580 W EP2021058580 W EP 2021058580W WO 2021209269 A1 WO2021209269 A1 WO 2021209269A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- acid
- compound
- formula
- methyl
- ethyl
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 54
- -1 enamine compounds Chemical class 0.000 title claims abstract description 37
- 238000002360 preparation method Methods 0.000 title description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 58
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 18
- 125000001424 substituent group Chemical group 0.000 claims abstract description 16
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 25
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 22
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 19
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims description 18
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 229910052799 carbon Inorganic materials 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 11
- 239000011734 sodium Substances 0.000 claims description 11
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 9
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 8
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 8
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 7
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 7
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical group [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 claims description 7
- 229910052708 sodium Inorganic materials 0.000 claims description 7
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000011575 calcium Substances 0.000 claims description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- 239000011777 magnesium Substances 0.000 claims description 6
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- OXMIDRBAFOEOQT-UHFFFAOYSA-N 2,5-dimethyloxolane Chemical compound CC1CCC(C)O1 OXMIDRBAFOEOQT-UHFFFAOYSA-N 0.000 claims description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 claims description 4
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- 235000011054 acetic acid Nutrition 0.000 claims description 4
- 150000008043 acidic salts Chemical class 0.000 claims description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 4
- 238000005580 one pot reaction Methods 0.000 claims description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 3
- 229910052788 barium Inorganic materials 0.000 claims description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052790 beryllium Inorganic materials 0.000 claims description 3
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052792 caesium Inorganic materials 0.000 claims description 3
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims description 3
- 229910052791 calcium Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052730 francium Inorganic materials 0.000 claims description 3
- KLMCZVJOEAUDNE-UHFFFAOYSA-N francium atom Chemical compound [Fr] KLMCZVJOEAUDNE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052744 lithium Inorganic materials 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- 229910052705 radium Inorganic materials 0.000 claims description 3
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052701 rubidium Inorganic materials 0.000 claims description 3
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052712 strontium Inorganic materials 0.000 claims description 3
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 2
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 claims description 2
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 claims description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 claims description 2
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical group COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 claims description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 claims description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 2
- 230000002378 acidificating effect Effects 0.000 claims description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 2
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 claims description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 claims description 2
- 229940005991 chloric acid Drugs 0.000 claims description 2
- 235000015165 citric acid Nutrition 0.000 claims description 2
- 235000019253 formic acid Nutrition 0.000 claims description 2
- 239000001530 fumaric acid Substances 0.000 claims description 2
- 235000011087 fumaric acid Nutrition 0.000 claims description 2
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims description 2
- 238000011065 in-situ storage Methods 0.000 claims description 2
- 239000004310 lactic acid Substances 0.000 claims description 2
- 235000014655 lactic acid Nutrition 0.000 claims description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 2
- 239000011976 maleic acid Substances 0.000 claims description 2
- 239000001630 malic acid Substances 0.000 claims description 2
- 235000011090 malic acid Nutrition 0.000 claims description 2
- 150000007522 mineralic acids Chemical class 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 150000007524 organic acids Chemical class 0.000 claims description 2
- 239000003495 polar organic solvent Substances 0.000 claims description 2
- 235000019260 propionic acid Nutrition 0.000 claims description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 2
- 239000011975 tartaric acid Substances 0.000 claims description 2
- 235000002906 tartaric acid Nutrition 0.000 claims description 2
- 150000002916 oxazoles Chemical class 0.000 abstract description 10
- 231100000331 toxic Toxicity 0.000 abstract description 5
- 230000002588 toxic effect Effects 0.000 abstract description 5
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 15
- 239000011541 reaction mixture Substances 0.000 description 13
- 239000000725 suspension Substances 0.000 description 12
- 239000012065 filter cake Substances 0.000 description 9
- 229940126214 compound 3 Drugs 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 239000012230 colorless oil Substances 0.000 description 3
- 229940125782 compound 2 Drugs 0.000 description 3
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 3
- JYJVVHFRSFVEJM-UHFFFAOYSA-N iodosobenzene Chemical compound O=IC1=CC=CC=C1 JYJVVHFRSFVEJM-UHFFFAOYSA-N 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 229910000104 sodium hydride Inorganic materials 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 0 CC(N=C(*)[C@@]1C(CCOC=O)C1)=C*#N Chemical compound CC(N=C(*)[C@@]1C(CCOC=O)C1)=C*#N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 230000004071 biological effect Effects 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- FWPDSAJKWKRRJD-UHFFFAOYSA-N 5-ethoxy-4-methyl-1,3-oxazole Chemical compound CCOC=1OC=NC=1C FWPDSAJKWKRRJD-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- KRBOQICXYCGVEU-RQOWECAXSA-N C/C(/N=O)=C/C#N Chemical compound C/C(/N=O)=C/C#N KRBOQICXYCGVEU-RQOWECAXSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 230000000202 analgesic effect Effects 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 230000000843 anti-fungal effect Effects 0.000 description 1
- 230000003110 anti-inflammatory effect Effects 0.000 description 1
- 230000001028 anti-proliverative effect Effects 0.000 description 1
- 230000002365 anti-tubercular Effects 0.000 description 1
- 229940121375 antifungal agent Drugs 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000006210 cyclodehydration reaction Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000006547 cyclononyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002081 enamines Chemical class 0.000 description 1
- 238000011066 ex-situ storage Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000003818 flash chromatography Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000002218 hypoglycaemic effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- QZRHHEURPZONJU-UHFFFAOYSA-N iron(2+) dinitrate nonahydrate Chemical compound O.O.O.O.O.O.O.O.O.[Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O QZRHHEURPZONJU-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000002462 isocyano group Chemical group *[N+]#[C-] 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- 239000003158 myorelaxant agent Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 150000007978 oxazole derivatives Chemical class 0.000 description 1
- 238000005691 oxidative coupling reaction Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 1
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 1
- GNSKLFRGEWLPPA-UHFFFAOYSA-M potassium dihydrogen phosphate Chemical compound [K+].OP(O)([O-])=O GNSKLFRGEWLPPA-UHFFFAOYSA-M 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K potassium phosphate Substances [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- ZUFQODAHGAHPFQ-UHFFFAOYSA-N pyridoxine hydrochloride Chemical compound Cl.CC1=NC=C(CO)C(CO)=C1O ZUFQODAHGAHPFQ-UHFFFAOYSA-N 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 description 1
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UCPYLLCMEDAXFR-UHFFFAOYSA-N triphosgene Chemical compound ClC(Cl)(Cl)OC(=O)OC(Cl)(Cl)Cl UCPYLLCMEDAXFR-UHFFFAOYSA-N 0.000 description 1
- 239000011726 vitamin B6 Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C253/00—Preparation of carboxylic acid nitriles
- C07C253/30—Preparation of carboxylic acid nitriles by reactions not involving the formation of cyano groups
Definitions
- the present invention is related to a new process for producing substituted enamine compounds.
- Oxazole compounds represent a vast class of heterocyclic aromatic organic compounds. Oxazole compounds have become increasingly important because of biological activities and their use as intermediates for the preparation of new biological materials.
- the wide range of biological activities of oxazole compounds includes anti-inflammatory, analgesic, antibacterial, antifungal, hypoglycemic, antiproliferative, anti-tuberculosis, muscle relaxant and HIV inhibitor activity.
- oxazole derivatives are important intermediates for preparation of biological compounds such as vitamin B 6 .
- oxazole compounds Various processes for the preparation of oxazole compounds have been developed.
- One preferred process in industry is from alanine and oxalic acid in EtOH carried out by azeotropic distillation with benzene.
- the ring closure reaction to obtain 5-ethoxy-4-methyloxazole can also be carried out using phosgene or triphosgene, which is toxic and not environment friendly (see CN 104725262 B, CN 102898321 A and CN 105985297 A)
- the present invention provides a substituted enamine compound of formula (I), which can be converted to an oxazole compound, wherein R is H, lower alkyl or aryl, optionally substituted by one or more substituents.
- the present invention also provides a process for producing the compound of formula (I) and a process for producing oxazole compounds from the compound of formula (I).
- the term "lower alkyl” as used refers to Ci-Cio alkyl, i.e., branched or unbranched, cyclic or non-cyclic, saturated hydrocarbon comprising 1-10 carbon atoms.
- the "lower alkyl” is Ci-C 6 alkyl, including but not limited to methyl, ethyl, propyl, isopropyl, cyclopropyl, butyl, isobutyl, tert- butyl, cyclobutyl, pentyl, iso-pentyl, tert-pentyl, cyclopentyl, hexyl, isohexyl, tert-hexyl, cyclohexyl, octyl, isooctyl, tert-octyl, cyclooctyl, nonyl, isononyl, tert-nonyl, cyclon
- aryl refers to aromatic hydrocarbon such as phenyl, benzyl, xylyl and naphthalenyl.
- lower alkoxyl refers to the structure represented by (lower alkyl)-0-, wherein the lower alkyl is defined as above.
- halo or halogen refers to a group of elements including fluorine (F), chlorine (Cl), bromine (Br) and iodine (I), preferably refers to Cl or Br.
- substituted refers to lower alkyl, lower alkoxyl, hydroxyl, halo, -NH 2 , -N0 2 , cyano or isocyano.
- the present invention provides a process for producing a compound of formula (I), comprising: a) reacting a compound of formula (II) with a compound of formula (III) to produce a compound of formula (la); and b) converting the compound of formula (la) into the compound of formula (I),
- R is H, lower alkyl or aryl, optionally substituted by one or more substituents
- R' is H; and any two of Ri, R 2 and R 3 , together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, lower alkyl, lower alkoxyl, aryl, or NR 4 R 4 ' (wherein R 4 and R 4 ' are dependently H or lower alkyl), optionally substituted by one or more substituents; or R', Ri, R 2 and R 3 , together with the carbon they connect, form carbon monoxide (Co0).
- R is H or Ci-Ce alkyl, optionally substituted by one or more substituents. More preferably, R is H, methyl, ethyl, propyl or butyl, optionally substituted by one or more substituents. The most preferably, R is H or methyl.
- the rest one is hydroxyl, methyl, ethyl, propyl, butyl, methoxyl, ethoxyl, propoxyl, butoxyl, or NR 4 R 4 ' (wherein R and R ' are dependently H, methyl, ethyl, propyl or butyl), optionally substituted by one or more substituents.
- the rest one is hydroxyl, methoxyl, ethoxyl, or NR 4 R 4 ' (wherein R and R ' are dependently H, methyl or ethyl), optionally substituted by one or more substituents.
- R', Ri, R 2 and R 3 together with the carbon they connect, form carbon monoxide (Co0).
- R is H, methyl, ethyl or phenyl; and any two of Ri, R 2 and R 3 , together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, methoxyl, ethoxyl, or NR 4 R 4 ' (wherein R and R ' are dependently H, methyl or ethyl).
- R is H, methyl, ethyl or phenyl
- the compound of formula (III) is carbon monoxide.
- R is H or methyl; and any two of Ri, R 2 and R 3 , together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, methoxyl, ethoxyl, -NH 2 or -NHCH 3 .
- the compound of formula (la) and (II) may be in a form of any salt of formula (la') and (IG) respectively:
- X and Y are dependently a metal element such as alkali metal elements (lithium (Li), sodium (Na), postassium (K), rubidium (Rb), caesium (Cs) and francium (Fr)); or alkaline-earth metal elements (beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba) and radium (Ra)); and Iron (ll/lll), nickel and cobalt.
- X is Na or K.
- the compound of formula (III) may be added in an amount of from 0.01 moles to 20 moles, preferably from 0.05 moles to 15 moles, more preferably from 0.1 mole to 10 moles, per 1 mole of the compound of formula (II).
- the step a) of the process of the present invention may be carried out in the presence of a solvent.
- the solvent preferably is a polar organic solvent such as toluene, tetrahydrofuran (THF), methyl tert-butyl ether (TBME), alcohol (i.e., ethanol) and benzene, or mixture thereof.
- the reaction of the step a) of the present invention may be carried out at the temperature from -30°C to 110°C, preferably from -20°C to 100°C, more preferably from -10°C to 50°C such as -10, -5, 0, 10, 15, 20, 25, 30, 35, 40, 45 and 50°C.
- the obtained compound of formula (la) may be used to the next step b) directly or purified by known process such as crystallization and/or filtration.
- the compound of formula (la) may be converted into the compound of formula (I) by any suitable way, for example, by adding water, an acid, an acidic salt or an alcohol.
- the acid include but are not limited to organic acid such as formic acid, acetic acid, propionic acid, butyric acid, oxalic acid, citric acid, lactic acid, malic acid, succinic acid, tartaric acid, fumaric acid and maleic acid; inorganic acid such as hydrochloric acid, sulfonic acid, phosphoric acid, nitric acid, nitrous acid, chloric acid, hypochlorous acid, perchloric acid, sulfonic acid, hydrobromic acid and hydrofluoric acid; and acidic resin such as sulfonic acid resin.
- the examples of the acidic salt include but are not limited to ammonium chloride, monopotassium phosphate, monosodium phosphate, sodium hydrogen sulfate and potassium hydrogen sulfate.
- the examples of the alcohol include but are not limited to methanol, ethanol and phenol.
- the compound of formula (la) is converted into the desired compound of formula (I) by adding an acid as defined above.
- the acid may be added in an amount of from 0.1 mol to 10 mol, preferably from 0.5 mol to 8 mol, more preferably from 1 mol to 5 mol such as 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5 and 10 mol, per 1 mol of the compound of formula (la).
- the compound of formula (la) is converted into the desired compound of formula (I) by adding water.
- the water may be added in an amount of from 10 mL to 1000 mL, preferably from 18 mL to 500 mL, more preferably from 20 mL to 100 mL, per 1 mol of the compound of formula (la).
- a solvent may be used when necessary.
- suitable solvent include but are not limited to ethyl acetate, ethyl butyrate, butyl acetate, tetrahydrofuran, toluene, 1,4-dioxane, 2,5-dimethyltetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diethyl ether, acetonitrile, methyl tert-butyl ether, and mixture thereof.
- the step b) of the process of the present invention may be carried out at the temperature from 0°C to 50°C, preferably from 10°C to 40°C, such as 10, 15, 20, 25, 30, 35 and 40°C.
- the obtained compound of formula (I) may be directly used for industrial application, or purified by known process such as extraction, crystallization and/or filtration.
- the reaction mixture of the step a) containing the compound of formula (la) is preferably used to the step b) directly without isolation and purification.
- the process of the present application may be carried out in one pot.
- the present invention also provides a one-pot process for the preparation of the compound of formula (I), which comprises adding the compound of formula (II) as defined above, the compound of formula (III) as defined above, optionally the solvent as defined above, and water or an acid or an acidic salt or an alcohol as defined above into one pot for reaction to obtain the compound of formula (I).
- the compound of formula (II) may be prepared by any process known in the art in-situ or ex-situ, for example, by treating the compound of formula (lla) with a strong base such as sodium (Na), Sodium hydride (NaH) or sodium amide.
- a strong base such as sodium (Na), Sodium hydride (NaH) or sodium amide.
- the compounnd of formula (II) may be produced from nitriles as disclosed in US 5187297 A.
- the processes of the present invention avoid toxic and unsafe reagents while providing high yield and high selectivity.
- the obtained products of the processes of the present invention can be used for producing oxazole compounds directly without any purification.
- the present invention provides a process for producing an oxazole compound comprising the step for producing the compound of formula (la) and/or the compound of formula (I) as described above.
- the process of the present invention avoids toxic phosphate reagents and saves steps compared to the processes known in the art and thus provides a new process.
- a dried four necked round bottom flask was charged with liquid ammonia (15 mL, 0.615 mol, 11 eq). After the flask was flushed with argon, sodium (1.5 g, 65 mmol, 1.1 eq) was added and stirred for 30 mins at - 40°C to -50°C. At the same temperature compound 1 (4.85 g, 59 mmol, 1 eq) in THF (20 mL) was added dropwise in 15 mins. Then the reaction mixture was warmed to room temperature in 1 hour and stirred for additional 1 hour to obtain a white suspension of the compound 2.
- This suspension was filtrated over a paper filter (7 cm diameter) and washed with TBME (200 mL) to obtain filter cake containing the compound 2 (19.40 g, 67.1wt% purity, 97% yield).
- the filter cake obtained according to Example 3 was loaded in a four necked round bottom flask under argon atmosphere. Butyl acetate (100 mL) was added and acetic acid (7.75 g, 129 mmol, 1.0 eq) was added dropwise in 5 mins. The reaction mixture was stirred for 30 mins at room temperature and then filtered over a paper filter (7 cm diameter). The filtrate was dried at 45°C (2 mbar) to produce a colorless oil which crystallized slowly to obtain the compound 4 (13.22 g, 98.8wt% purity, 92% yield).
- the filter cake obtained according to Example 3 was loaded in a four necked round bottom flask under argon atmosphere. Butyl acetate (50 mL) was added and H 2 0 (20 mL) was added dropwise in 5 mins. The reaction mixture was stirred for 10 mins at room temperature and then extracted with butyl acetate (50 mL x 3). The organic phase was dried at 45°C (2 mbar) to produce a colorless oil which crystallized slowly to obtain the compound 4 (7.0 g, 53% yield based on acetonitrile).
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
The present invention provides a substituted enamine compound of formula (I), and a process for producing oxazole compounds from the compound of formula (I). According to the processes of the present invention, it can produce substituted enamine compounds with high yield and selectivity while avoiding toxic or unsafe reagents for producing oxazole compounds. wherein R is H, lower alkyl or aryl, optionally substituted by one or more substituents.
Description
A process for preparation of substituted enamine compounds
Technical Field
The present invention is related to a new process for producing substituted enamine compounds.
Background of the Invention
Oxazole compounds represent a vast class of heterocyclic aromatic organic compounds. Oxazole compounds have become increasingly important because of biological activities and their use as intermediates for the preparation of new biological materials. The wide range of biological activities of oxazole compounds includes anti-inflammatory, analgesic, antibacterial, antifungal, hypoglycemic, antiproliferative, anti-tuberculosis, muscle relaxant and HIV inhibitor activity. In addition, oxazole derivatives are important intermediates for preparation of biological compounds such as vitamin B6.
Various processes for the preparation of oxazole compounds have been developed. One preferred process in industry is from alanine and oxalic acid in EtOH carried out by azeotropic distillation with benzene. Following this concept, the ring closure reaction to obtain 5-ethoxy-4-methyloxazole can also be carried out using phosgene or triphosgene, which is toxic and not environment friendly (see CN 104725262 B, CN 102898321 A and CN 105985297 A)
In recent years, one attractive process is direct cyclodehydration of acyloxy enamines because acyloxy enamines have been introduced early N-atom and installed the carboxylic acids. It was reported that acyloxy enamines can be synthesized by intermolecular oxidative coupling of an enamine compound with carboxylic acid by using iodosobenzene as the oxidant. However, oxidant iodosobenzene is highly flammable and has explosion risk. In addition, oxidant iodosobenzene is not soluble in solvents and thus results in unstable yields of the process (see Xin Liu et al., Org. Lett., Vol. 14, No. 21, 2012).
Therefore, there is still demand of a new process for the preparation of substituted enamines, which can be converted to oxazole compounds, in industry.
Summary of the Invention
The present invention provides a substituted enamine compound of formula (I), which can be converted to an oxazole compound,
wherein R is H, lower alkyl or aryl, optionally substituted by one or more substituents.
The present invention also provides a process for producing the compound of formula (I) and a process for producing oxazole compounds from the compound of formula (I).
According to the processes of the present invention, it can produce substituted enamine compounds with high yield and selectivity, while avoiding toxic or unsafe reagents for producing oxazole compounds.
Detailed Description of the Invention
In the present invention, the term "lower alkyl" as used refers to Ci-Cio alkyl, i.e., branched or unbranched, cyclic or non-cyclic, saturated hydrocarbon comprising 1-10 carbon atoms. Preferably, the "lower alkyl" is Ci-C6 alkyl, including but not limited to methyl, ethyl, propyl, isopropyl, cyclopropyl, butyl, isobutyl, tert- butyl, cyclobutyl, pentyl, iso-pentyl, tert-pentyl, cyclopentyl, hexyl, isohexyl, tert-hexyl, cyclohexyl, octyl, isooctyl, tert-octyl, cyclooctyl, nonyl, isononyl, tert-nonyl, cyclononyl, decyl, isodecyl, tert-decyl, cyclodecyl. More preferably, the "lower alkyl" is methyl or ethyl.
In the present invention, the term "aryl" as used refers to aromatic hydrocarbon such as phenyl, benzyl, xylyl and naphthalenyl.
In the present invention, the term "lower alkoxyl" as used refers to the structure represented by (lower alkyl)-0-, wherein the lower alkyl is defined as above.
In the present invention, the term "carbonyl group" as used refers to the structure represented by -(C=0)-.
In the present invention, the term "halo" or "halogen" as used refers to a group of elements including fluorine (F), chlorine (Cl), bromine (Br) and iodine (I), preferably refers to Cl or Br.
In the present invention, the term "substituents" as used refers to lower alkyl, lower alkoxyl, hydroxyl, halo, -NH2, -N02, cyano or isocyano.
In the first aspect of the present invention, it provides a process for producing a compound of formula (I), comprising: a) reacting a compound of formula (II) with a compound of formula (III) to produce a compound of formula (la); and
b) converting the compound of formula (la) into the compound of formula (I),
(la) (I) wherein
R is H, lower alkyl or aryl, optionally substituted by one or more substituents; and
R' is H; and any two of Ri, R2 and R3, together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, lower alkyl, lower alkoxyl, aryl, or NR4R4' (wherein R4 and R4' are dependently H or lower alkyl), optionally substituted by one or more substituents; or R', Ri, R2 and R3, together with the carbon they connect, form carbon monoxide (Cº0).
Preferably, R is H or Ci-Ce alkyl, optionally substituted by one or more substituents. More preferably, R is H, methyl, ethyl, propyl or butyl, optionally substituted by one or more substituents. The most preferably, R is H or methyl.
Preferably, any two of Ri, R2 and R3, together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, Ci-C6 lower alkyl, Ci-C6 lower alkoxyl, aryl, or NR4R4' (wherein R and R ' are
dependently H or Ci-C6 lower alkyl), optionally substituted by one or more substituents. More preferably, the rest one is hydroxyl, methyl, ethyl, propyl, butyl, methoxyl, ethoxyl, propoxyl, butoxyl, or NR4R4' (wherein R and R ' are dependently H, methyl, ethyl, propyl or butyl), optionally substituted by one or more substituents. The most preferably, the rest one is hydroxyl, methoxyl, ethoxyl, or NR4R4' (wherein R and R ' are dependently H, methyl or ethyl), optionally substituted by one or more substituents.
More preferably, R', Ri, R2 and R3, together with the carbon they connect, form carbon monoxide (Cº0).
In one embodiment,
R is H, methyl, ethyl or phenyl; and any two of Ri, R2 and R3, together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, methoxyl, ethoxyl, or NR4R4' (wherein R and R ' are dependently H, methyl or ethyl).
In another embodiment,
R is H, methyl, ethyl or phenyl; and
The compound of formula (III) is carbon monoxide.
In one preferable embodiment,
R is H or methyl; and any two of Ri, R2 and R3, together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, methoxyl, ethoxyl, -NH2 or -NHCH3.
In the present invention, the compound of formula (la) and (II) may be in a form of any salt of formula (la') and (IG) respectively:
(la ) (II·) wherein R is defined as above, and X and Y are dependently a metal element such as alkali metal elements (lithium (Li), sodium (Na), postassium (K), rubidium (Rb), caesium (Cs) and francium (Fr)); or alkaline-earth
metal elements (beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba) and radium (Ra)); and Iron (ll/lll), nickel and cobalt. Preferably, X is Na or K.
In the step a) of the process of the present invention, the compound of formula (III) may be added in an amount of from 0.01 moles to 20 moles, preferably from 0.05 moles to 15 moles, more preferably from 0.1 mole to 10 moles, per 1 mole of the compound of formula (II).
The step a) of the process of the present invention may be carried out in the presence of a solvent. The solvent preferably is a polar organic solvent such as toluene, tetrahydrofuran (THF), methyl tert-butyl ether (TBME), alcohol (i.e., ethanol) and benzene, or mixture thereof.
The reaction of the step a) of the present invention may be carried out at the temperature from -30°C to 110°C, preferably from -20°C to 100°C, more preferably from -10°C to 50°C such as -10, -5, 0, 10, 15, 20, 25, 30, 35, 40, 45 and 50°C. After the reaction finishes, the obtained compound of formula (la) may be used to the next step b) directly or purified by known process such as crystallization and/or filtration.
In the step b) of the process of the present application, the compound of formula (la) may be converted into the compound of formula (I) by any suitable way, for example, by adding water, an acid, an acidic salt or an alcohol. The Examples of the acid include but are not limited to organic acid such as formic acid, acetic acid, propionic acid, butyric acid, oxalic acid, citric acid, lactic acid, malic acid, succinic acid, tartaric acid, fumaric acid and maleic acid; inorganic acid such as hydrochloric acid, sulfonic acid, phosphoric acid, nitric acid, nitrous acid, chloric acid, hypochlorous acid, perchloric acid, sulfonic acid, hydrobromic acid and hydrofluoric acid; and acidic resin such as sulfonic acid resin. The examples of the acidic salt include but are not limited to ammonium chloride, monopotassium phosphate, monosodium phosphate, sodium hydrogen sulfate and potassium hydrogen sulfate. The examples of the alcohol include but are not limited to methanol, ethanol and phenol.
In one embodiment, the compound of formula (la) is converted into the desired compound of formula (I) by adding an acid as defined above. The acid may be added in an amount of from 0.1 mol to 10 mol, preferably from 0.5 mol to 8 mol, more preferably from 1 mol to 5 mol such as 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5 and 10 mol, per 1 mol of the compound of formula (la).
In an alternative embodiment, the compound of formula (la) is converted into the desired compound of formula (I) by adding water. The water may be added in an amount of from 10 mL to 1000 mL, preferably from 18 mL to 500 mL, more preferably from 20 mL to 100 mL, per 1 mol of the compound of formula (la).
In the step b) of the process of the present application, a solvent may be used when necessary. Example of the suitable solvent include but are not limited to ethyl acetate, ethyl butyrate, butyl acetate, tetrahydrofuran, toluene, 1,4-dioxane, 2,5-dimethyltetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diethyl ether, acetonitrile, methyl tert-butyl ether, and mixture thereof.
The step b) of the process of the present invention may be carried out at the temperature from 0°C to 50°C, preferably from 10°C to 40°C, such as 10, 15, 20, 25, 30, 35 and 40°C. After the reaction finishes, the obtained compound of formula (I) may be directly used for industrial application, or purified by known process such as extraction, crystallization and/or filtration.
In the process of the present application, the reaction mixture of the step a) containing the compound of formula (la) is preferably used to the step b) directly without isolation and purification. In such case, the process of the present application may be carried out in one pot.
Accordingly, the present invention also provides a one-pot process for the preparation of the compound of formula (I), which comprises adding the compound of formula (II) as defined above, the compound of formula (III) as defined above, optionally the solvent as defined above, and water or an acid or an acidic salt or an alcohol as defined above into one pot for reaction to obtain the compound of formula (I).
The compound of formula (II) may be prepared by any process known in the art in-situ or ex-situ, for example, by treating the compound of formula (lla) with a strong base such as sodium (Na), Sodium hydride (NaH) or sodium amide.
Wherein Ri is as defined above.
Alternatively, the compounnd of formula (II) may be produced from nitriles as disclosed in US 5187297 A.
The processes of the present invention avoid toxic and unsafe reagents while providing high yield and high selectivity. In addition, the obtained products of the processes of the present invention can be used for producing oxazole compounds directly without any purification.
In the second aspect of the present invention, it provides a process for producing an oxazole compound comprising the step for producing the compound of formula (la) and/or the compound of formula (I) as described above. The process of the present invention avoids toxic phosphate reagents and saves steps compared to the processes known in the art and thus provides a new process.
The present invention will be further illustrated by the following examples.
Examples
1 2
A dried four necked round bottom flask was charged with liquid ammonia (15 mL, 0.615 mol, 11 eq). After the flask was flushed with argon, sodium (1.5 g, 65 mmol, 1.1 eq) was added and stirred for 30 mins at - 40°C to -50°C. At the same temperature compound 1 (4.85 g, 59 mmol, 1 eq) in THF (20 mL) was added dropwise in 15 mins. Then the reaction mixture was warmed to room temperature in 1 hour and stirred for additional 1 hour to obtain a white suspension of the compound 2.
1H NMR of f/Z-isomers of compound 2 (400 MHz, DMSO) d (ppm): 1.74 (3H) (46.7%), 1.53 (3H) (53.3%).
2
A dried four necked round bottom flask was charged with liquid ammonia (50 mL, 2.05 mol, 16 eq). After the flask was flushed with argon, iron nitrate nonahydrate (35 mg, 0.087 mmol, 0.00067 eq) was added. Then sodium (2.96 g, 129 mmol, 1.0 eq) was added and stirred for 30 mins at -40°C to -50°C. At the same temperature anhydrous acetonitrile (11.65 g, 283 mmol, 2.2 eq) was added dropwise in 15 mins and anhydrous toluene (40 mL) was added immediately. The reaction mixture was warmed to room temperature in 1 hour and stirred for additional 1 hour to obtain a grey suspension.
This suspension was filtrated over a paper filter (7 cm diameter) and washed with TBME (200 mL) to obtain filter cake containing the compound 2 (19.40 g, 67.1wt% purity, 97% yield).
Ethyl formate (10.71 g, 142 mmol, 1.1 eq) dissolved in anhydrous toluene (20 mL) was added dropwise to the grey suspension (13.43 g, 129 mmol, 1.0 eq) obtained according to the same procedures of Example 2 in 20 mins. The reaction mixture was stirred overnight to obtain a grey and thick suspension. TBME (100 mL) was added and the mixture was filtrated over a paper filter (7 cm diameter) to obtain a filter cake containing compound 3 (49.68 g, 31.6wt% purity, 92% yield).
NMR of E -isomer of compound 3 (400 MHz, DMSO) d (ppm): 8.81 (1H), 3.73 (1H), 1.82 (1H).
NMR of Z-isomer of compound 3 (400 MHz, DMSO) d (ppm): 8.58 (1H), 4.21 (1H), 1.93 (3H).
Ethyl formate (4.82 g, 65 mmol, 0.5 eq) dissolved in THF (10 mL) was added dropwise to the grey suspension (13.43 g, 129 mmol, 1.0 eq) according to the same procedures of Example 2 except that toluene was replaced with THF in 20 mins. The reaction mixture was stirred overnight to obtain a grey and
thick suspension. TBME (100 mL) was added and the mixture was filtrated over a paper filter (7 cm diameter) to obtain a filter cake containing compound 3 (7.40 g, 82% yield).
Methyl formate (9.28 g, 155 mmol, 1.2 eq) dissolved in TBME (20 mL) was added dropwise to the grey suspension (13.43 g, 129 mmol, 1.0 eq) obtained according to the same procedures of Example 2 except that toluene was replaced with TBME in 30 min. The reaction mixture was stirred over night to obtain a white and thick suspension. TBME (100 mL) was added. Then, the mixture was filtrated over a paper filter (7 cm diameter) to obtain a filter cake containing compound 3 (15.19 g, 89% yield).
2 3
Dimethyl formamide (6.95 g, 95 mmol, 3 eq) dissolved in toluene (5 mL) was added dropwise to the grey suspension (3.3 g, 31.7 mmol, 1.0 eq) obtained according to the same procedures of Example 2 in 10 min. The reaction mixture was stirred for 3 days at 40°Cto obtain a white suspension. TBME (50 mL) was added. Then, the mixture was filtrated over a paper filter (4 cm diameter) to obtain a filter cake containing compound 3 (1.98 g, 47% yield).
2 3
Carbon monoxide (50 bar overpressure) was added to ethanol (10 mL) and the filter cake (347 mg, 3.33 mmol, 1.0 eq) obtained according to the same procedures of Example 2. The reaction mixture was shaked over 19 h at 70°C to obtain a yellow suspension. TBME (20 mL) was added. Then, the mixture was filtrated over a paper filter (2 cm diameter) to obtain a filter cake containing compound 3 (248 mg, 56% yield).
3 4
The filter cake obtained according to Example 3 was loaded in a four necked round bottom flask under argon atmosphere. Butyl acetate (100 mL) was added and acetic acid (7.75 g, 129 mmol, 1.0 eq) was added dropwise in 5 mins. The reaction mixture was stirred for 30 mins at room temperature and then filtered over a paper filter (7 cm diameter). The filtrate was dried at 45°C (2 mbar) to produce a colorless oil which crystallized slowly to obtain the compound 4 (13.22 g, 98.8wt% purity, 92% yield).
NMR of Z-isomer of compound 4 (400 MHz, DMSO) d (ppm): 10.20 (1H), 8.43 (1H), 4.90 (1H), 2.15 (3H). H NMR of f-isomer of compound 4 (400 MHz, DMSO) d (ppm): 10.40 (1H), 8.81 - 8.14 (1H), 6.37 - 4.78 (1H), 2.39 -1.97 (3H).
3 4
The filter cake obtained according to Example 3 was loaded in a four necked round bottom flask under argon atmosphere. Butyl acetate (50 mL) was added and H20 (20 mL) was added dropwise in 5 mins. The reaction mixture was stirred for 10 mins at room temperature and then extracted with butyl acetate (50 mL x 3). The organic phase was dried at 45°C (2 mbar) to produce a colorless oil which crystallized slowly to obtain the compound 4 (7.0 g, 53% yield based on acetonitrile).
1 4
A dried round bottom flask was charged with THF (250 mL). After the flask was flushed with argon, NaH (40 g, 1000 mmol, 2 eq) was added. Then the mixture of compound 1 (41.1 g, 500 mmol, 1 eq) and ethyl formate (71.4 g, 1000 mmol, 2 eq) in THF (250 mL) was added dropwise in 30 min and stirred at room temperature for 5 hours. Acetic acid (60.1 g, 1000 mmol, 2 eq) was added dropwise in 5 mins. The reaction mixture was stirred for 30 mins at room temperature and then filtered over a paper filter (7 cm diameter). The filtrate was dried at 45°C (2 mbar) to produce a colorless oil which crystallized slowly to obtain the compound 4 (45.2 g, 82% yield).
4 5
To a solution of the compound 4 (220 mg, 2.0 mmol) in dried 1,2-dichloroethane (20 mL) was added BF3-Et20 (4.0 mmol, 2.0 eq). The reaction mixture was heated to reflux, and then phenyliodine(lll) diacetate (838 mg, 2.6 mmol, 1.3 eq) was added in one portion rapidly. After stirring under refluxing condition for 0.5-3 hours, the reaction mixture was cooled down to room temperature, quenched with saturated aqueous NaHC03, and then extracted with dichloromethane. The combined organic layer was washed with brine, dried over anhydrous l\la2SC>4 and concentrated by the rotary evaporator. The crude product was purified by flash column chromatography to give the compound 5 (140 mg, 65% yield).
Claims
1. A process for producing a compound of formula (I), comprising: a) reacting a compound of formula (II) with a compound of formula (III) to produce a compound of formula (la); and
b) converting the compound of formula (la) into the compound of formula (I),
wherein
R is H, lower alkyl or aryl, optionally substituted by one or more substituents; and
R' is H; and any two of Ri, R2 and R3, together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, lower alkyl, lower alkoxyl, aryl, or NR R ' (wherein R and R ' are dependently H or lower alkyl), optionally substituted by one or more substituents; or R', Ri, R2 and R3, together with the carbon they connect, form carbon monoxide (Cº0).
2. The process of claim 1, wherein R is H, methyl, ethyl, propyl or butyl, optionally substituted by one or more substituents.
3. The process of claim 1, wherein any two of Ri, R2 and R3, together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, methyl, ethyl, propyl, butyl, methoxyl, ethoxyl, propoxyl, butoxyl, or NR R ' (wherein R and R ' are dependently H, methyl, ethyl, propyl or butyl), optionally substituted by one or more substituents.
4. The process of claim 1, wherein R', Ri, R2 and R3, together with the carbon they connect, form carbon monoxide (Cº0).
5. The process of claim 1, wherein R is H, methyl, ethyl or phenyl; and any two of Ri, R2 and R3, together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, methoxyl, ethoxyl, or NR4R4' (wherein R and R ' are dependently H, methyl or ethyl).
6. The process of claim 1, wherein R is H, methyl, ethyl or phenyl; and the compound of formula (III) is carbon monoxide.
7. The process of claim 1, wherein R is H or methyl; and any two of Ri, R2 and R3, together with the carbon they connect, form a carbonyl group, and the rest one is hydroxyl, methoxyl, ethoxyl, -NH2 or -NHCH3.
8. The process of claim 1, wherein the compound of formula (la) and (II) are in a form of any salt of formula (la') and (IG) respectively:
(la ) (II·) wherein R is defined as any one of claims 1-7, and X and Y are dependently a metal element such as alkali metal elements (lithium (Li), sodium (Na), postassium (K), rubidium (Rb), caesium (Cs) and francium (Fr)); or alkaline-earth metal elements (beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba) and radium (Ra)); and Iron (ll/lll), nickel and cobalt.
9. The process of any one of claims 1-8, wherein the step a) of the process is carried out in the presence of a solvent.
10. The process of claim 9, wherein the solvent is a polar organic solvent such as toluene, tetrahydrofuran (THF), methyl tert-butyl ether (TBME), alcohol (i.e., ethanol) and benzene, or mixture thereof.
11. The process of any one of claims 1-8, wherein in the step b) the compound of formula (la) is converted into the compound of formula (I) by adding water, an acid, an acidic salt or an alcohol.
12. The process of any one of claims 1-8, wherein in the step b) the compound of formula (la) is converted into the compound of formula (I) by adding an acid selected from the group consisting of organic acid such as formic acid, acetic acid, propionic acid, butyric acid, oxalic acid, citric acid, lactic acid, malic acid, succinic acid, tartaric acid, fumaric acid and maleic acid; inorganic acid such as hydrochloric acid, sulfonic acid, phosphoric acid, nitric acid, nitrous acid, chloric acid, hypochlorous acid, perchloric acid, sulfonic acid, hydrobromic acid and hydrofluoric acid; and acidic resin such as sulfonic acid resin.
13. The process of any one of claims 1-8, wherein in the step b) a solvent is used.
14. The process of claim 13, wherein the solvent is selected from the group consisting of ethyl acetate, ethyl butyrate, butyl acetate, tetrahydrofuran, toluene, 1,4-dioxane, 2,5-dimethyltetrahydrofuran, methyl tetrahydrofuran, dimethyl ether, diethyl ether, acetonitrile, methyl tert-butyl ether, and mixture thereof.
15. The process of any one of claims 1-8, wherein the process is carried out in one pot.
16. The process of any one of claims 1-8, wherein the compound of formula (II) is prepared in-situ.
17. A process for producing an oxazole compound comprising the step for producing the compound of formula (la) and/or the compound of formula (I) according to any one of claims 1-16.
19. The compound of claim 18, wherein R is H, methyl, ethyl, propyl or butyl, optionally substituted by one or more substituents.
20. The compound of claim 18 or 19, wherein the salt is a compound of formula (la')
wherein R is defined as claims 18 or 19, and X is a metal element such as alkali metal elements (lithium (Li), sodium (Na), postassium (K), rubidium (Rb), caesium (Cs) and francium (Fr)); or alkaline-earth metal elements (beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba) and radium (Ra)); and Iron (ll/lll), nickel and cobalt.
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