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WO2021171862A1 - Lithographic printing plate original plate, lithographic printing plate manufacturing method, and lithographic printing method - Google Patents

Lithographic printing plate original plate, lithographic printing plate manufacturing method, and lithographic printing method Download PDF

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Publication number
WO2021171862A1
WO2021171862A1 PCT/JP2021/002475 JP2021002475W WO2021171862A1 WO 2021171862 A1 WO2021171862 A1 WO 2021171862A1 JP 2021002475 W JP2021002475 W JP 2021002475W WO 2021171862 A1 WO2021171862 A1 WO 2021171862A1
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WO
WIPO (PCT)
Prior art keywords
group
compound
acid
printing plate
preferable
Prior art date
Application number
PCT/JP2021/002475
Other languages
French (fr)
Japanese (ja)
Inventor
加奈 栢木
侑也 宮川
駿平 渡邉
Original Assignee
富士フイルム株式会社
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Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Priority to JP2022503170A priority Critical patent/JP7464691B2/en
Publication of WO2021171862A1 publication Critical patent/WO2021171862A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/12Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by non-macromolecular organic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08Developable by water or the fountain solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers

Definitions

  • This disclosure relates to a lithographic printing plate original plate, a method for producing a lithographic printing plate, and a lithographic printing method.
  • a lithographic printing plate consists of a lipophilic image part that receives ink in the printing process and a hydrophilic non-image part that receives dampening water.
  • the oil-based image part of the flat plate printing plate is the ink receiving part
  • the hydrophilic non-image part is the dampening water receiving part (ink non-receptive part).
  • In-machine development is a method in which a lithographic printing plate original plate is exposed to an image, then attached to the printing machine as it is without performing the conventional wet development processing, and the non-image portion of the image recording layer is removed at the initial stage of the normal printing process. be.
  • Patent Document 1 describes an on-machine development type lithographic printing plate original plate having an image recording layer on an aluminum support having an anodized film, and the lithographic printing plate original plate has a sagging shape at an end, and the above image.
  • the recording layer has a layer containing a compound having a support-adsorbing property, and the content of the compound is substantially the same in the plane of the layer containing the compound having a support-adsorbing property.
  • the development type lithographic printing plate original plate is described.
  • Patent Document 2 describes a lithographic printing plate original plate having an image recording layer on a support containing a color-developing composition containing a compound represented by the following formula (1).
  • R 1 represents a group which cleaves the R 1 -O bond by heat or infrared exposure.
  • R 2 and R 3 may independently represent a hydrogen atom or an alkyl group, or R 2 and R 3 may be linked to each other to form a ring.
  • Ar 1 and Ar 2 each independently represent a group forming a benzene ring or a naphthalene ring.
  • Y 1 and Y 2 independently represent an oxygen atom, a sulfur atom, -NR 0- or a dialkylmethylene group, respectively.
  • R 4 and R 5 each independently represent an alkyl group or a group represented by the following formulas (2) to (4).
  • R 6 to R 9 independently represent a hydrogen atom or an alkyl group.
  • R 0 represents a hydrogen atom, an alkyl group or an aryl group.
  • Za represents a counterion for neutralizing the charge.
  • the compound represented by the formula (1) has at least one group represented by the formulas (2) to (4) as R 4 or R 5 or in R 1 , Ar 1 or Ar 2.
  • R 10 represents an alkylene group having 2 to 6 carbon atoms.
  • W represents a single bond or an oxygen atom.
  • n1 represents an integer from 1 to 45.
  • R 14 represents an alkyl group having 1 to 12 carbon atoms.
  • R 12 and R 13 each independently represent a single bond or an alkylene group having 1 to 12 carbon atoms.
  • M represents a hydrogen atom, a Na atom, a K atom or an onium group.
  • Patent Document 3 has an image recording layer containing a support, a polymerizable compound and a photopolymerization initiator, and a top layer on the image recording layer, and the thickness of the top layer is 0.1 g / m 2. From 1.75 g / m 2 to 1.75 g / m 2, the top layer comprises an infrared absorber having a thermodissociative group that is converted to a strong electron donating group by heat and / or infrared irradiation. , A flat plate printing plate original plate capable of forming an image by heat and / or infrared irradiation is described.
  • Patent Document 1 International Publication No. 2019/151447
  • Patent Document 2 International Publication No. 2017/141882
  • Patent Document 3 International Publication No. 2019/219560
  • An object to be solved by one embodiment of the present disclosure is to provide a lithographic printing plate original plate having excellent edge stain suppression properties.
  • An object to be solved by another embodiment of the present disclosure is to provide a method for producing a lithographic printing plate or a lithographic printing method using the lithographic printing plate original plate.
  • Means for solving the above problems include the following aspects. ⁇ 1> A layer containing a color-developing compound having a group that cleaves by heat or infrared exposure is provided on the support, and the amount of sagging X is 25 ⁇ m to 150 ⁇ m at at least two opposite ends of the support. A planographic printing plate original plate having a sagging shape with a sagging width Y of 70 ⁇ m to 300 ⁇ m. ⁇ 2> The planographic printing plate original plate according to ⁇ 1>, wherein the layer containing the color-developing compound is an image recording layer. ⁇ 3> An image recording layer is provided on the support.
  • the planographic printing plate original plate according to ⁇ 1> which has a layer containing the color-developing compound on the image recording layer.
  • ⁇ 4> The lithographic printing plate original plate according to any one of ⁇ 1> to ⁇ 3>, wherein the color-developing compound having a group that cleaves by heat or infrared exposure is a compound represented by the following formula (1). ..
  • M 1 is a group that is cleaved by thermal or infrared exposure
  • R 2 and R 3 independently represent a hydrogen atom or an alkyl group
  • R 2 and R 3 are connected to each other to form a ring. They may be formed, where Ar 1 and Ar 2 each independently represent a group forming a benzene ring or a naphthalene ring, and Y 1 and Y 2 independently represent an oxygen atom, a sulfur atom, -NR 0- or a dialkyl.
  • R 4 and R 5 each independently represent an aliphatic hydrocarbon group
  • R 6 to R 9 each independently represent a hydrogen atom or an alkyl group
  • R 0 represents a hydrogen atom, an alkyl group or an alkyl group.
  • At least one group selected from the group consisting of R 4 , R 5 , M 1 , Ar 1 and Ar 2 in the compound represented by the above formula (1) has a hydrophilic group, ⁇ 4>.
  • the original plate of the lithographic printing plate described in. ⁇ 6> The planographic printing plate original plate according to ⁇ 5>, wherein the hydrophilic group is a group represented by any of the following formulas (2) to (5).
  • R 10 represents an alkylene group having 2 to 6 carbon atoms
  • W 1 represents a single bond or an oxygen atom
  • n1 represents an integer of 1 to 45
  • R 11 represents carbon.
  • R 12 and R 13 independently represent a single bond or an alkylene group or alkylene oxy group having 1 to 12 carbon atoms, respectively.
  • X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
  • M 1 in the above formula (1) is -NR a R b , -NR c (SO 2 R d ) or -NR e (CO 2 R f).
  • R a and R b each independently represent an aryl group
  • R c , Re and R f independently represent an alkyl group or an aryl group
  • R d is an alkyl group, an aryl group, or an aryl group.
  • -NR d1 represents R d2
  • R d1 and R d2 independently represent a hydrogen atom, an alkyl group or an aryl group.
  • R 15 and R 16 independently represent a hydrogen atom, an alkyl group or an aryl group
  • E represents an onium group
  • the wavy line portion represents a bond position with an oxygen atom.
  • R 17 represents a halogen atom, an alkyl group, an aryl group, hydroxy group or alkoxy group, if R 17 there are a plurality, the plurality of R 17 may be the same or different, or a plurality of R 17 may be linked to form a ring, n2 represents an integer of 0 to 4, and R 18 represents an alkyl group, an aryl group, or a group represented by the following formulas (2) to (5). , Zb represent counterions for neutralizing the charge.
  • R 10 represents an alkylene group having 2 to 6 carbon atoms
  • W 1 represents a single bond or an oxygen atom
  • n1 represents an integer of 1 to 45
  • R 11 represents carbon.
  • R 12 and R 13 independently represent a single bond or an alkylene group or alkylene oxy group having 1 to 12 carbon atoms, respectively.
  • X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
  • ⁇ 11> The planographic printing plate original plate according to ⁇ 2> or ⁇ 3>, wherein the image recording layer has a polymerization initiator and a polymerizable compound.
  • ⁇ 12> The planographic printing plate original plate according to ⁇ 2>, ⁇ 3> or ⁇ 11>, wherein the image recording layer has polymer particles.
  • ⁇ 13> The planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 12>, wherein any layer contains a support-adsorbing compound having a molecular weight of 1,000 or less.
  • ⁇ 14> The lithographic printing plate original plate according to any one of ⁇ 1> to ⁇ 13>, which has a hydrophilic layer in a region within 1 cm from the end of the surface of the lithographic printing plate original plate on the image recording layer side.
  • a method for producing a lithographic printing plate which includes a step of removing an image recording layer in a non-image area by supplying the ink.
  • a step of exposing the planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 14> to an image, and supplying at least one selected from the group consisting of printing ink and dampening water are supplied.
  • a lithographic printing method including a step of removing an image recording layer of a non-image portion on a printing machine to produce a lithographic printing plate, and a step of printing with the obtained lithographic printing plate.
  • a lithographic printing plate original plate having excellent edge stain suppression properties. Further, according to another embodiment of the present disclosure, it is possible to provide a method for producing a lithographic printing plate or a lithographic printing method using the lithographic printing plate original plate.
  • FIG. 3 is a schematic cross-sectional view of another embodiment of an aluminum support. It is a graph which shows an example of the alternating waveform current waveform diagram used for the electrochemical roughening process in the manufacturing method of an aluminum support. It is a side view which shows an example of the radial type cell in the electrochemical roughening treatment using AC in the manufacturing method of an aluminum support.
  • the notation that does not describe substitution or non-substitution includes those having no substituent as well as those having a substituent.
  • the "alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • (meth) acrylic is a term used in a concept that includes both acrylic and methacryl
  • (meth) acryloyl” is a term that is used as a concept that includes both acryloyl and methacryloyl. Is.
  • process in the present specification is not limited to an independent process, and even if it cannot be clearly distinguished from other processes, the term “process” will be used as long as the intended purpose of the process is achieved. included.
  • % by mass and “% by weight” are synonymous, and “parts by mass” and “parts by weight” are synonymous.
  • a combination of two or more preferred embodiments is a more preferred embodiment.
  • the weight average molecular weight (Mw) and the number average molecular weight (Mn) in the present disclosure use columns of TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (all trade names manufactured by Toso Co., Ltd.). It is a molecular weight converted by detecting with a solvent THF (tetrahydrofuran) and a differential refractometer by a gel permeation chromatography (GPC) analyzer and using polystyrene as a standard substance.
  • THF tetrahydrofuran
  • GPC gel permeation chromatography
  • the term "lithographic printing plate original plate” includes not only a lithographic printing plate original plate but also a discarded plate original plate.
  • lithographic printing plate includes not only a lithographic printing plate produced by subjecting a lithographic printing plate original plate through operations such as exposure and development as necessary, but also a discarded plate. In the case of a discarded original plate, exposure and development operations are not always necessary.
  • the discard plate is a planographic printing plate original plate to be attached to an unused plate cylinder when printing a part of the paper surface in a single color or two colors in, for example, color newspaper printing.
  • the lithographic printing plate original plate according to the present disclosure has a layer containing a color-developing compound having a group that cleaves by heat or infrared exposure on the support, and sags at at least two opposite ends of the support. It has a sagging shape in which the amount X is 25 ⁇ m to 150 ⁇ m and the sagging width Y is 70 ⁇ m to 300 ⁇ m. Further, the lithographic printing plate original plate according to the present disclosure is a negative type lithographic printing plate original plate, and can be suitably used as an on-machine development type lithographic printing plate original plate.
  • the lithographic printing plate original plate according to the present disclosure is a dye produced from the above-mentioned color-developing compound by containing a color-developing compound having a group that cleaves by heat or infrared exposure in any layer. Also excellent in color development over time. Further, the excellent color development property is excellent in the plate inspection property of the exposed lithographic printing plate original plate, and the excellent color development property with time is also excellent in the plate inspection property of the exposed lithographic printing plate original plate after aging. Further, the lithographic printing plate original plate according to the present disclosure is detailed by containing a color-developing compound having a group that cleaves by heat or infrared exposure in any layer and having a specific sagging shape at the end of the support. The mechanism is unknown, but it is also excellent in on-machine developability and chemical resistance.
  • the lithographic printing plate original according to the present disclosure has a layer containing a color-developing compound having a group that is cleaved by heat or infrared exposure.
  • the layer containing the color-developing compound having a group that cleaves by heat or infrared exposure is not particularly limited as long as it is any layer on the support, but at least one selected from the group consisting of an image recording layer and a protective layer. It is preferably a layer. From the viewpoint of on-machine developability and chemical resistance, at least an image recording layer is more preferable. Further, from the viewpoint of color development over time, at least a protective layer is more preferable.
  • the lithographic printing plate original plate according to the present disclosure preferably has an image recording layer on the support and a layer containing the color-developing compound on the image recording layer from the viewpoint of color development over time. It is more preferable to have an image recording layer on the support and a layer containing the color-developing compound as a protective layer on the image recording layer.
  • the lithographic printing plate original plate according to the present disclosure preferably contains a support-adsorbing compound having a molecular weight of 1,000 or less in any layer from the viewpoint of edge stain suppression and on-machine developability, and protects the plate. It is more preferable that the protective layer contains at least a support-adsorbing compound having a layer and having a molecular weight of 1,000 or less.
  • the planographic printing plate original plate according to the present disclosure has a sagging shape in which the sagging amount X is 25 ⁇ m to 150 ⁇ m and the sagging width Y is 70 ⁇ m to 300 ⁇ m at at least two opposing side ends of the support.
  • the vertical distance X of the curved surface portion bent in the thickness direction of the support from the extension line of the surface of the support on the image recording layer side is "the amount of sagging", and the image of the support of the curved surface portion.
  • the distance Y in the direction parallel to the surface on the recording layer side is called "sag width".
  • FIG. 1 is an example of the cross-sectional shape of the end portion of the support of the lithographic printing plate original plate cut by the cutting device.
  • the vertical distance of the curved surface portion bent in the thickness direction of the support is the sagging amount X
  • the distance in the direction parallel to the surface of the support on the image recording layer side of the curved surface portion is the sagging width Y.
  • Edge stains on the lithographic printing plate original plate occur when the printing ink component driven from the non-image area to the edge is transferred to the blanket, so the amount of sagging at the edge is large to avoid contact between the edge and the blanket. There is a need to.
  • the amount of sagging X is preferably 35 ⁇ m to 150 ⁇ m, more preferably 50 ⁇ m to 150 ⁇ m, and more preferably 50 ⁇ m to 100 ⁇ m from the viewpoint of edge stain suppression, on-machine developability, and chemical resistance. More preferred.
  • the sagging width Y is preferably in the range of 90 ⁇ m to 300 ⁇ m, and more preferably 150 ⁇ m to 250 ⁇ m, from the viewpoint of edge stain suppression, on-machine developability, and chemical resistance.
  • the preferable ranges of the sagging amount X and the sagging width Y are not related to the edge shape of the back surface of the support.
  • FIG. 2 is a conceptual diagram showing a cut portion of the slitter device.
  • a pair of upper and lower cutting blades 210 and 220 are arranged on the left and right sides of the slitter device. These cutting blades 210 and 220 are made of disk-shaped round blades, and the upper cutting blades 210a and 210b are coaxially supported by the rotating shaft 211 and the lower cutting blades 220a and 220b are coaxially supported by the rotating shaft 221.
  • the upper cutting blades 210a and 210b and the lower cutting blades 220a and 220b are rotated in opposite directions.
  • the aluminum support 230 is passed between the upper cutting blades 210a and 210b and the lower cutting blades 220a and 220b and cut to a predetermined width. More specifically, by adjusting the gap between the upper cutting blade 210a and the lower cutting blade 220a of the cutting portion of the slitter device of FIG. 2 and the gap between the upper cutting blade 210b and the lower cutting blade 220b, It is possible to form a sagging-shaped end portion as shown in FIG. Further, it is preferable that the above-mentioned cutting is performed at least in the portion having the edge hydrophilic layer described later.
  • the image recording layer in the lithographic printing plate original plate according to the present disclosure preferably contains a color-developing compound having a group that is cleaved by heat or infrared exposure.
  • the image recording layer in the present disclosure is a negative type image recording layer, and is preferably a water-soluble or water-dispersible negative type image recording layer.
  • the image recording layer in the present disclosure preferably contains a polymerization initiator and a polymerizable compound, and more preferably contains an infrared absorber other than the color-developing compound, a polymerization initiator, and a polymerizable compound. ..
  • the image recording layer in the present disclosure is preferably an on-board development type image recording layer.
  • the color-developing compound having a group that cleaves by heat or infrared exposure may be a compound having a group that cleaves by directly absorbing heat or infrared rays, and for example, an infrared absorber separately contained may absorb infrared rays. It may be a compound having a group that cleaves due to heat generated by absorption.
  • the color-developing compound having a group that cleaves by heat or infrared exposure is a compound that develops color by cleaving the group.
  • color development means that coloring or absorption becomes stronger after heating or exposure than before heating or exposure, and the wavelength becomes shorter so that absorption is provided in the visible light region.
  • a color-developing compound having a group that cleaves by heat or infrared exposure a degradable infrared absorber is used from the viewpoints of edge stain suppression property, color development property, color development property over time, on-machine developability, and chemical resistance. It is preferable that the compound is represented by the following formula (A), and more preferably.
  • + YA1 has the following structure:
  • R A1 and R A2 are each independently a hydrocarbon group of carded
  • R A1, R A2 two of R Ad and R Aa will contain the necessary atoms to form a cyclic structure together
  • the other RAad and RAa independently represent a hydrogen atom, a halogen atom, -RAe , -ORAf , and -SR.
  • the conversion is a conversion that provides an increase in light absorption between frequencies of 400 nm to 700 nm.
  • the hydrocarbon group of R A1 and R A2, and, R Ae, R Af, R Ag, the aliphatic hydrocarbon group for R Au and R Av, aryl or heteroaryl group is substituted May be good.
  • the RAd converted by a chemical reaction is preferably any of the groups shown below.
  • Aa, Ab, respectively Ac and Ad are independently represents 0 or 1
  • -L A - represents a linking group
  • R A17 is a hydrogen atom, optionally optionally substituted aliphatic hydrocarbon Represents a group, optionally substituted aryl group or optionally substituted heteroaryl group, or RA17 and RA3 , RA17 and RA5 , or RA17 and RA11.
  • R A4 is -OR A10, a -NR A13 R A14, or -CF 3
  • R A10 also optionally be substituted
  • RA3 contains hydrogen atoms, optionally substituted aliphatic hydrocarbon groups, optionally substituted aryl groups or optionally substituted. a heteroaryl group, or, R A3 is comprises the atoms necessary to form at least one together cyclic structure R A10, R A13 and R A14, R A6 is optionally substituted Represents an aliphatic hydrocarbon group which may be optionally, an aryl group which may be optionally substituted, a heteroaryl group which may be optionally substituted, -OR A10 , -NR A13 RA14 or -CF 3.
  • R A5 is a hydrogen atom, optionally optionally substituted aliphatic hydrocarbon group, which may optionally be substituted aryl group or optionally represents a heteroaryl group which may be substituted, or the atoms necessary to R A5 to form at least one together cyclic structure
  • R A8' R A8 is -COO- or -COOR A8 is a hydrogen atom, an alkali metal cation, an ammonium ion or a mono-, - di -, tri - or Represents a tetraalkylammonium ion, where RA18 represents an optionally substituted aryl group, an optionally substituted heteroaryl group or an ⁇ -branched aliphatic hydrocarbon group.
  • a color-developing compound having a group that cleaves by heat or infrared exposure the following formula (1) is used from the viewpoint of edge stain suppression property, color development property, color development property over time, on-machine developability, and chemical resistance. It is particularly preferred that it is the compound represented.
  • M 1 is a group that is cleaved by thermal or infrared exposure
  • R 2 and R 3 independently represent a hydrogen atom or an alkyl group
  • R 2 and R 3 are connected to each other to form a ring. They may be formed, where Ar 1 and Ar 2 each independently represent a group forming a benzene ring or a naphthalene ring, and Y 1 and Y 2 independently represent an oxygen atom, a sulfur atom, -NR 0- or a dialkyl.
  • R 4 and R 5 each independently represent an aliphatic hydrocarbon group
  • R 6 to R 9 each independently represent a hydrogen atom or an alkyl group
  • R 0 represents a hydrogen atom, an alkyl group or an alkyl group.
  • the compound represented by the above formula (1) is preferably a compound that is decomposed by heat or infrared exposure to produce a compound having a maximum absorption wavelength in the range of 500 nm to 600 nm.
  • the color-developing mechanism of the compound represented by the formula (1) is that M 1 is cleaved by exposure to heat or infrared rays to develop color.
  • M 1 is R 1- O-, which will be described later, as shown below, the cleaved oxygen atom forms a carbonyl group, and a merocyanine dye which is a color former is generated to develop a color. Etc. are estimating.
  • R 2 to R 9 , R 0 , Ar 1 and Ar 2 may have a substituent such as a hydrophilic group described later.
  • substituents are alkoxy group, aryloxy group, amino group, alkylthio group, arylthio group, halogen atom, carboxy group, carboxylate group, sulfo group, sulfonate group, alkyloxycarbonyl group, aryloxycarbonyl group, phosphonic acid. Examples thereof include a group, a phosphonate group, and a group combining these groups.
  • the group is an anionic group, it may form a salt, and the counter cation may be a cation having a cyanine dye structure, a proton, a metal cation, onium, or the like.
  • the alkyl group in R 2 to R 9 and R 0 in the formula (1) is preferably an alkyl group having 1 to 30 carbon atoms, more preferably an alkyl group having 1 to 15 carbon atoms, and an alkyl group having 1 to 10 carbon atoms. More preferred.
  • the alkyl group may be linear, have a branch, or have a ring structure.
  • an aryl group having 6 to 30 carbon atoms is preferable, an aryl group having 6 to 20 carbon atoms is more preferable, and an aryl group having 6 to 12 carbon atoms is further preferable.
  • the above-mentioned aryl group may have a substituent. Examples of substituents are alkyl groups, alkoxy groups, allyloxy groups, amino groups, alkylthio groups, arylthio groups, halogen atoms, carboxy groups, carboxylate groups, sulfo groups, sulfonate groups, alkyloxycarbonyl groups and aryloxycarbonyl groups. , And a group combining these.
  • phenyl group, naphthyl group, p-tolyl group, p-chlorophenyl group, p-fluorophenyl group, p-methoxyphenyl group, p-dimethylaminophenyl group, p-methylthiophenyl group, p- Phenylthiophenyl group and the like can be mentioned.
  • aryl groups a phenyl group, a p-methoxyphenyl group, a p-dimethylaminophenyl group and a naphthyl group are preferable.
  • R 2 and R 3 are connected to form a ring.
  • the number of ring members is preferably 5 or 6-membered ring, and more preferably 6-membered ring.
  • Y 1 and Y 2 independently represent an oxygen atom, a sulfur atom, an ⁇ NR 0 ⁇ or a dialkyl methylene group, preferably an ⁇ NR 0 ⁇ or a dialkyl methylene group, and more preferably a dialkyl methylene group.
  • R 0 represents a hydrogen atom, an alkyl group or an aryl group, and is preferably an alkyl group.
  • R 4 and R 5 are preferably the same group.
  • R 4 and R 5 have an anionic group, it is preferable that R 4 and R 5 are the same group except that they have an anionic group and have or do not have a counter cation.
  • R 4 and R 5 are each independently preferably a linear alkyl group or an alkyl group having a sulfonate group at the terminal, and more preferably a methyl group, an ethyl group or a butyl group having a sulfonate group at the terminal.
  • the counter cation of the sulfonate group may be a quaternary ammonium group in the formula (1), an alkali metal cation or an alkaline earth metal cation.
  • R 4 and R 5 are preferably alkyl groups having an anionic structure independently, and have a carboxylate group or a sulfonate group. It is more preferably an alkyl group, and even more preferably an alkyl group in which a sulfonate group is poured at the end. Further, from the viewpoint of lengthening the maximum absorption wavelength of the compound represented by the formula (1), and from the viewpoint of color development and printing resistance in a slab printing plate, R 4 and R 5 each have an aromatic ring independently.
  • alkyl group is preferably an alkyl group, more preferably an alkyl group having an aromatic ring at the end, a 2-phenylethyl group, a 2-naphthalenylethyl group, or a 2- (9-anthrasenyl) ethyl group. Is particularly preferred.
  • R 6 to R 9 independently represent a hydrogen atom or an alkyl group, and are preferably hydrogen atoms.
  • Ar 1 and Ar 2 each independently represent a group forming a benzene ring or a naphthalene ring. Substituents may be provided on the benzene ring and the naphthalene ring.
  • Substituents include alkyl groups, alkoxy groups, allyloxy groups, amino groups, alkylthio groups, arylthio groups, halogen atoms, carboxy groups, carboxylate groups, sulfo groups, sulfonate groups, alkyloxycarbonyl groups, aryloxycarbonyl groups, and , A group combining these, and the like, but an alkyl group is preferable.
  • Ar 1 and Ar 2 are independently a naphthalene ring or a naphthalene ring or Ar 2.
  • a group forming a benzene ring having an alkyl group or an alkoxy group as a substituent is preferable, and a naphthalene ring or a group forming a benzene ring having an alkoxy group as a substituent is more preferable. It is particularly preferable that the group forms a naphthalene ring or a benzene ring having a methoxy group as a substituent.
  • Za represents a counterion that neutralizes the charge, and when indicating an anion species, sulfonate ion, carboxylate ion, tetrafluoroborate ion, hexafluorophosphate ion, p-toluenesulfonate ion, perchlorate ion and the like are used. Hexafluoroborate ions are particularly preferred.
  • alkali metal ion, alkaline earth metal ion, ammonium ion, pyridinium ion or sulfonium ion is preferable, sodium ion, potassium ion, ammonium ion, pyridinium ion or sulfonium ion is more preferable, and sodium ion, potassium. Ions or ammonium ions are more preferred.
  • R 1 to R 9 , R 0 , Ar 1 , Ar 2 , Y 1 and Y 2 may have an anionic structure or a cationic structure, and R 1 to R 9 , R 0 , Ar 1 , Ar 2 , If all of Y 1 and Y 2 are charge-neutral groups, Za is a monovalent counter anion, for example R 1 to R 9 , R 0 , Ar 1 , Ar 2 , Y 1 and If Y 2 has two or more anionic structures, Za can also be a counter cation.
  • Ar 1 or Ar 2 is preferably a group forming a group represented by the following formula (8).
  • R 19 represents an alkyl group having 1 to 12 carbon atoms or a group represented by the formulas (2) to (4) described later, n3 represents an integer of 1 to 4, and * represents a binding site. Represents.
  • At least one group preferably has a hydrophilic group, and at least one group selected from the group consisting of R 4 , R 5 and M 1 more preferably has a hydrophilic group, R 4 and at least one group selected from the group consisting of R 5 further preferably has a hydrophilic group, independently R 4 and R 5 each particularly preferably has a hydrophilic group.
  • hydrophilic group examples include a polyalkyleneoxy group, an acid group, a salt of an acid group, an alkoxy group, a hydroxy group and the like.
  • the hydrophilic group is preferably a group represented by any of the following formulas (2) to (5) from the viewpoint of edge stain suppressing property, on-machine developability, and chemical resistance.
  • the group represented by either the following formula (2) or the following formula (5) is more preferable, and the group represented by the following formula (2) is particularly preferable.
  • R 10 represents an alkylene group having 2 to 6 carbon atoms
  • W 1 represents a single bond or an oxygen atom
  • n1 represents an integer of 1 to 45
  • R 11 represents carbon.
  • R 12 and R 13 independently represent a single bond or an alkylene group or alkylene oxy group having 1 to 12 carbon atoms, respectively.
  • X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
  • alkylene group represented by R 10 examples include ethylene group, n-propylene group, isopropylene group, n-butylene group, isobutylene group, n-pentylene group, isopentylene group, n-hexyl group, isohexyl group and the like.
  • Ethylene group, n-propylene group, isopropylene group, or n-butylene group is preferable, and n-propylene group is particularly preferable.
  • n1 is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 to 3.
  • alkyl group represented by R 11 examples include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, n-pentyl group, isopentyl group and neopentyl.
  • Examples thereof include a group, an n-hexyl group, an n-octyl group, an n-dodecyl group and the like, and a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group or a tert-butyl group is preferable, and a methyl group is preferable.
  • a group or an ethyl group is more preferable, and a methyl group is particularly preferable.
  • Specific examples of the acyl group in R 11 include an acetyl group, a propionyl group, a pivaloyl group and the like. Of these, an acetyl group is preferable.
  • Me represents a methyl group
  • Et represents an ethyl group
  • * represents a binding site
  • alkylene group represented by R 12 or R 13 in the formula (3) or the formula (4) include a methylene group, an ethylene group, an n-propylene group, an isopropylene group, an n-butylene group, and an isobutylene group.
  • an ethylene group or an n-propylene group is particularly preferable.
  • R 12 or R 13 is a single bond. Is preferable.
  • R 12 or R 13 is preferably an alkylene group. In equation (4), the two existing Ms may be the same or different.
  • onium group represented by M in the formula (3) or the formula (4) include an ammonium group, an iodonium group, a phosphonium group, a sulfonium group and the like.
  • the ammonium group includes a group represented by the following formula (A1).
  • Ra to R d independently represent a hydrogen atom or an aryl group having 20 or less carbon atoms, an alkyl group, an alkenyl group or an alkynyl group.
  • the aryl group, alkyl group, alkenyl group or alkynyl group may have a substituent.
  • the substituent include an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 1 to 12 carbon atoms, an alkynyl group having 1 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an alkoxy group having 1 to 12 carbon atoms.
  • Examples thereof include a group, a cyano group, a sulfonyl group, a thioalkyl group having 1 to 12 carbon atoms, a thioaryl group having 6 to 12 carbon atoms, and a hydroxy group.
  • R a to R d a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an aryl group having 6 carbon atoms are preferable.
  • the iodonium group includes a group represented by the following formula (B1).
  • Re to R f are independently synonymous with Ra to R d in the above formula (A1).
  • Examples of preferred Re to R f include aryl groups having 6 to 20 carbon atoms.
  • the phosphonium group includes a group represented by the following formula (C1).
  • R g to R j are independently synonymous with R a to R d in the above formula (A1).
  • Examples of preferable R g to R j include aryl groups having 6 to 20 carbon atoms.
  • the sulfonium group includes a group represented by the following formula (D1).
  • R k to R m are independently synonymous with R a to R d in the above formula (A1).
  • Preferred examples include an aryl group having 6 to 20 carbon atoms. Examples of preferred R k ⁇ R m, and an aryl group having 6 to 20 carbon atoms.
  • M may be the above-mentioned onium group.
  • the onium group may exist as an intracellular onium salt.
  • Et represents an ethyl group and * represents a binding site.
  • Et represents an ethyl group and * represents a binding site.
  • One or more groups represented by any of the formulas (2) to (5) may be present in the compound represented by the formula (1).
  • the upper limit of the number of groups represented by any of the formulas (2) to (5) is preferably 5.
  • the number of groups represented by any of the formulas (2) to (5) is preferably 1 to 5, and more preferably 2 to 3.
  • the group represented by any of the formulas (2) to (5) may exist as a group represented by R 4 or R 5 in the compound represented by the formula (1), or M 1 , It may be present in the group represented by Ar 1 or Ar 2.
  • Groups represented by any of the formulas (2) to (5) is particularly preferably a R 4 and R 5. Further, the group represented by any of the formulas (2) to (5) is preferably present in the groups represented by Ar 1 and Ar 2.
  • M 1 in the above formula (1) is -NR a R b , -NR c (SO 2 R d ) or -NR e (CO 2 R) from the viewpoint of edge stain suppression property, color development property, and color development property over time.
  • f is preferable.
  • R a and R b each independently represent an aryl group
  • R c , Re and R f independently represent an alkyl group or an aryl group
  • R d is an alkyl group, an aryl group, or an aryl group.
  • -NR d1 represents R d2
  • R d1 and R d2 independently represent a hydrogen atom, an alkyl group or an aryl group.
  • the alkyl group in R c to R f , R d1 and R d2 is preferably an alkyl group having 1 to 20 carbon atoms.
  • the aryl group in R a to R f , R d1 and R d2 is preferably an aryl group having 6 to 20 carbon atoms.
  • the alkyl group and aryl group in R a to R f , R d1 and R d2 may have a substituent.
  • substituents are alkoxy group, aryloxy group, amino group, alkylthio group, arylthio group, halogen atom, carboxy group, carboxylate group, sulfo group, sulfonate group, alkyloxycarbonyl group, aryloxycarbonyl group, phosphonic acid. Examples thereof include a group, a phosphonate group, and a group combining these groups.
  • the group is an anionic group, it may form a salt, and the counter cation may be a cation having a cyanine dye structure, a proton, a metal cation, onium, or the like.
  • M 1 in the above formula (1) is preferably —OR 1 from the viewpoint of edge stain suppression property, color development property, and color development property over time.
  • R 1 is, R 1 -O bond by heat or infrared exposure represents a group which cleaves.
  • R 1 is preferably a group represented by any of the following formulas 1-1 to 1-7, and is represented by any of the following formulas 1-1 to 1-3. It is more preferable that it is a group.
  • represents a bond site with an oxygen atom
  • R 20 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, -OR 24 , and -NR 25 R.
  • R 21 independently represents a hydrogen atom, an alkyl group or an aryl group
  • R 23 represents an aryl group, an alkenyl group, an alkoxy group or an onium group
  • R 24 to R 27 independently represent a hydrogen atom and an alkyl.
  • R 28 independently represents an alkyl group, an aryl group, -OR 24 , -NR 25 R 26 or -SR 27
  • Z 1 represents a charge-neutralizing counterion.
  • R 20 , R 21 and R 24 to R 28 are alkyl groups is the same as the preferred embodiment of the alkyl group in R 2 to R 9 and R 0 .
  • the carbon number of the alkenyl group in R 20 and R 23 is preferably 1 to 30, more preferably 1 to 15, and even more preferably 1 to 10.
  • the preferred embodiment when R 20 to R 28 are an aryl group is the same as the preferred embodiment of the aryl group in R 0.
  • R 20 in the formula 1-1 is preferably an alkyl group, an alkenyl group, an aryl group, -OR 24 , -NR 25 R 26 or -SR 27 , and an alkyl group, -OR 24 , -NR 25 R 26 or -SR 27 is more preferred, an alkyl group or -OR 24 is even more preferred, and -OR 24 is particularly preferred.
  • the alkyl group is preferably an alkyl group having an arylthio group or an alkyloxycarbonyl group at the ⁇ -position.
  • R 24 is preferably an alkyl group, more preferably an alkyl group having 1 to 8 carbon atoms, and an isopropyl group or a t-butyl group. It is more preferable to have a t-butyl group, and it is particularly preferable to have a t-butyl group.
  • R 21 in the formula 1-2 is preferably a hydrogen atom.
  • R 24 is preferably an alkyl group.
  • R 21 in the formula 1-3 is independently a hydrogen atom or an alkyl group, and it is more preferable that at least one R 11 in the formula 1-3 is an alkyl group.
  • the alkyl group in R 21 is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 3 to 10 carbon atoms. Further, the alkyl group in R 21 is preferably an alkyl group having a branch including a ring structure, more preferably a secondary or tertiary alkyl group, and is an isopropyl group, a cyclopentyl group, a cyclohexyl group, or an alkyl group.
  • R 23 in the formula 1-3 is preferably an aryl group, an alkoxy group or an onium group, more preferably a p-dimethylaminophenyl group or a pyridinium group, and is a pyridinium group. It is more preferable to have.
  • the onium group in R 23 include a pyridinium group, an ammonium group, a sulfonium group and the like. The onium group may have a substituent.
  • substituents examples include an alkyl group, an alkoxy group, an aryloxy group, an amino group, an alkylthio group, an arylthio group, a halogen atom, a carboxy group, a sulfo group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and a group combining these groups.
  • it is preferably an alkyl group, an aryl group, or a group in which these are combined.
  • a pyridinium group is preferable, and an N-alkyl-3-pyridinium group, an N-benzyl-3-pyridinium group, an N- (alkoxypolyalkyleneoxyalkyl) -3-pyridinium group, and an N-alkoxycarbonylmethyl-3-pyridinium group.
  • N-alkyl-4-pyridinium group, N-benzyl-4-pyridinium group, N- (alkoxypolyalkyleneoxyalkyl) -4-pyridinium group, N-alkoxycarbonylmethyl-4-pyridinium group, or N-alkyl -3,5-dimethyl-4-pyridinium group is more preferable, N-alkyl-3-pyridinium group or N-alkyl-4-pyridinium group is more preferable, N-methyl-3-pyridinium group, N-octyl.
  • a -3-pyridinium group, an N-methyl-4-pyridinium group, or an N-octyl-4-pyridinium group is particularly preferable, and an N-octyl-3-pyridinium group or an N-octyl-4-pyridinium group is the most preferable.
  • R 23 is a pyridinium group
  • examples of the counter anion include sulfonate ion, carboxylate ion, tetrafluoroborate ion, hexafluorophosphate ion, p-toluene sulfonate ion, perchlorate ion and the like.
  • -Toluene sulfonate ion and hexafluorophosphate ion are preferable.
  • R 20 in the formula 1-4 is preferably an alkyl group or an aryl group, and more preferably one of the two R 20s is an alkyl group and the other is an aryl group.
  • R 20 in the formula 1-5 is preferably an alkyl a group or an aryl group, more preferably an aryl group, more preferably a p- methylphenyl group.
  • R 20 are each independently of formula 1-6 is preferably an alkyl group or an aryl group, and more preferably a methyl group or a phenyl group.
  • Z 1 in the formula 1-7 may be any counterion that neutralizes the charge, and the compound as a whole may be contained in the above Za.
  • Z 1 is preferably a sulfonate ion, a carboxylate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, a p-toluene sulfonate ion, or a perchlorate ion, and is preferably a p-toluene sulfonate ion or a hexafluoro. More preferably, it is a phosphate ion.
  • R 1 is more preferably a group represented by the following formula (6).
  • R 15 and R 16 independently represent a hydrogen atom, an alkyl group or an aryl group
  • E represents an onium group
  • the wavy line portion represents a bond position with an oxygen atom.
  • the alkyl group represented by R 15 or R 16 is the same as the alkyl group in R 2 to R 9 and R 0 , and the preferred embodiment is also the same as the preferred embodiment of the alkyl group in R 2 to R 9 and R 0. .
  • the aryl group represented by R 15 or R 16 is the same as the aryl group in R 0 , and the preferred embodiment is also the same as the preferred embodiment of the aryl group in R 0.
  • the onium group represented by E is the same as the onium group in R 23 , and the preferred embodiment is also the same as the preferred embodiment of the onium group in R 23.
  • E in the above formula (6) is preferably a pyridinium group represented by the following formula (7).
  • R 17 represents a halogen atom, an alkyl group, an aryl group, hydroxy group or alkoxy group, if R 17 there are a plurality, the plurality of R 17 may be the same or different, or a plurality of R 17 may be linked to form a ring, n2 represents an integer of 0 to 4, and R 18 represents an alkyl group, an aryl group, or a group represented by the following formulas (2) to (5). , Zb represent a counterion for neutralizing the charge.
  • R 10 represents an alkylene group having 2 to 6 carbon atoms
  • W 1 represents a single bond or an oxygen atom
  • n1 represents an integer of 1 to 45
  • R 11 represents carbon.
  • R 12 and R 13 independently represent a single bond or an alkylene group or an alkylene oxy group having 1 to 12 carbon atoms
  • M represents a hydrogen atom, a Na atom, or a K atom.
  • the compound represents an onium group and the charge can be neutralized by the entire compound represented by the formula (1), it does not have to have M, m1 represents 1, 2, 3 or 4, and X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
  • the alkyl group or aryl group represented by R 17 or R 18 is the same as the alkyl group in R 2 to R 9 and R 0 or the aryl group in R 0 , and the preferred embodiment is also in R 2 to R 9 and R 0 . This is similar to the preferred embodiment of the alkyl group or the aryl group at R0.
  • the alkoxy group represented by R 17 is preferably an alkoxy group having 1 to 10 carbon atoms, and a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, an isobutoxy group, a tert-butoxy group and the like. Can be mentioned.
  • n2 is preferably 0.
  • the counterion for neutralizing the charge represented by Zb is the same as that of Z 1 in the formula (1-7), and the preferred embodiment is also the same as that of Z 1 in the formula (1-7).
  • the group represented by the formula formulas (2) to the R 18 of (7) (5) has the same meaning as the group represented by the above-mentioned equations (2) to (5), preferred embodiments are also The same is true.
  • TsO ⁇ represents a tosylate anion
  • represents a binding site with an oxygen atom
  • Me represents a methyl group and TsO ⁇ represents a tosylate anion.
  • the color-developing compound may be used alone or in combination of two or more.
  • the color-developing compound can be contained in an arbitrary amount, but from the viewpoint of edge stain suppression property, color development property, color development property over time, on-machine developability, and chemical resistance, the image is imaged.
  • the content of the color-developing compound is preferably 0.1% by mass to 95% by mass, more preferably 1% by mass to 75% by mass, and 1% by mass to 50% by mass with respect to the total mass of the recording layer. It is particularly preferably mass%.
  • the content of the color-developing compound in the image recording layer is 1 mg / m 2 to 100 mg / m from the viewpoint of edge stain suppression, color development, color development over time, on-machine developability, and chemical resistance. It is preferably 2 , more preferably 10 mg / m 2 to 80 mg / m 2 , and particularly preferably 20 mg / m 2 to 60 mg / m 2.
  • the method for producing the color-developing compound is not particularly limited, and the color-developing compound can be produced by a known method.
  • the compound represented by the above formula (1) can be obtained as a synthetic scheme according to the synthetic method shown below.
  • synthetic schemes represented by the following formulas S1 to S3 are preferably mentioned.
  • a synthetic scheme represented by the following formula S4 is preferably mentioned.
  • DMAP represents N, N-dimethylamino-4-pyridine
  • AcONa represents sodium acetate
  • NEt 3 represents triethylamine
  • catecol is catechol.
  • R represents a group corresponding to each portion in the formulas 1-1 to 1-7.
  • the image recording layer has support adsorption property from the viewpoint of edge stain suppression property and on-machine developability, has a molecular weight of 1,000 or less, and does not have an ethylenically unsaturated group in the molecule. It is preferable to contain a compound (also referred to as "support-adsorbing compound having a molecular weight of 1,000 or less" or “support-adsorbing compound”).
  • the "support adsorptivity” means the adsorptivity of the support to the anodic oxide film. The presence or absence of adsorptivity to the anodic oxide film can be easily determined by the following method.
  • a solution in which the test compound is dissolved in an easily soluble solvent for example, water is prepared.
  • This solution is applied onto an aluminum support having an anodic oxide film so that the applied amount after drying is 30 mg / m 2, and dried.
  • the aluminum support coated with the test compound is washed and dried 5 times using the above-mentioned easily soluble solvent, and then the residual amount of the test compound that has not been washed and removed is measured.
  • the amount of the remaining test compound may be directly quantified, or the amount of the test compound dissolved in the washing liquid may be quantified.
  • the quantification of the test compound can be carried out by, for example, fluorescence X-ray measurement, reflection spectroscopic absorbance measurement, or the like. If the residual amount is 1 mg / m 2 or more, the test compound is determined to have support adsorptivity.
  • the support-adsorptive compound preferably has a group that exhibits adsorptivity to the anodic oxide film of the aluminum support.
  • the group exhibiting the adsorptivity to the anodic oxide film of the aluminum support is a chemical bond with a substance (for example, metal, metal oxide) or functional group (for example, hydroxy group) existing on the surface of the anodic oxide film.
  • a substance for example, metal, metal oxide
  • functional group for example, hydroxy group
  • Examples include functional groups capable of forming (eg, ionic bonds, hydrogen bonds, coordination bonds).
  • an acid group is preferable.
  • the acid group preferably has an acid dissociation constant (pKa) of 7 or less.
  • Examples of acid groups include phenolic hydroxyl groups, carboxy groups, -SO 3 H, -OSO 3 H, -PO 3 H 2 , -OPO 3 H 2 , -CONHSO 2- , -SO 2 NHSO 2- , -COCH. 2 COCH 3 and the like can be mentioned. In particular, -OPO 3 H 2 and -PO 3 H 2 are preferable.
  • the acid group may form a salt.
  • Examples of the salt formed by the acid group include an alkali metal salt, an alkaline earth metal salt, and an ammonium salt.
  • the molecular weight of the support-adsorbing compound is 1,000 or less. When the molecular weight is 1,000 or less, it easily moves to the surface of the anodic oxide film during on-machine development, and an excellent edge stain prevention effect can be obtained.
  • the molecular weight is preferably 50 to 1,000, more preferably 50 to 800, and even more preferably 50 to 600.
  • the support-adsorbing compound does not have an ethylenically unsaturated group in the molecule.
  • the ethylenically unsaturated group is a group having a polymerizable property, and includes a (meth) acrylic group, a vinyl group, an allyl group, a styryl group and the like. Since the support-adsorbing compound does not have an ethylenically unsaturated group in the molecule, it is possible to prevent the specific small molecule compound from being cured together with the image recording layer by exposure.
  • Oxyacid can be used as the support-adsorbing compound.
  • Support-adsorbing compounds include phosphoric acid, polyphosphoric acid, metaphosphoric acid, ammonium primary phosphate, ammonium secondary phosphate, sodium dihydrogen phosphate, sodium monohydrogen phosphate, potassium primary phosphate, and phosphorus secondary.
  • Potassium acid sodium tripolyphosphate, potassium pyrophosphate, sodium hexametaphosphate, phosphinic acid, ethylphosphonic acid, propylphosphonic acid, i-propylphosphonic acid, butylphosphonic acid, hexylphosphonic acid, octylphosphonic acid, dodecylphosphonic acid, octadecylphosphon Acids, 2-hydroxyethylphosphonic acid and sodium or potassium salts thereof, alkylphosphonic acid monoalkyl esters such as methyl methylphosphonate, methyl ethylphosphonate, methyl 2-hydroxyethylphosphonate and sodium or potassium salts thereof, Examples thereof include alkylene diphosphonic acids such as methylene diphosphonic acid and ethylene diphosphonic acid, sodium salts or potassium salts thereof, polyvinylphosphonic acid, p-toluenesulfonic acid, sodium p-toluenesulfonate, s
  • a compound represented by the following formula (B) is preferable.
  • nB is an integer of 2 to 10
  • R B1, R B2 and R B3 independently represent a hydrogen atom, an alkyl group or alkylene oxide group.
  • the alkyl group in the formula (B) is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 5 carbon atoms, and even more preferably an alkyl group having 1 to 3 carbon atoms.
  • the alkylene oxide group in the formula (B) is preferably an alkylene oxide group having 1 to 10 alkylene oxide units having 2 or 3 carbon atoms, and an alkylene oxide group having 1 to 5 alkylene oxide units having 2 or 3 carbon atoms. More preferably, an alkylene oxide group having 1 to 3 alkylene oxide units having 2 or 3 carbon atoms is further preferable.
  • phosphoric acid As the support-adsorbing compound, phosphoric acid, polyphosphoric acid, phosphoric acid or phosphinic acid is particularly preferable from the viewpoint of edge stain suppressing property and on-machine developability.
  • the support-adsorbing compound includes a hydroxy acid compound having two or more hydroxy groups (hereinafter, also referred to as “specific hydroxy acid compound”) from the viewpoint of edge stain suppression property and on-machine developability. Is preferable.
  • Specific hydroxy acid compounds include hydroxycarboxylic acids having two or more hydroxy groups and salts thereof.
  • the salt include sodium salt, potassium salt, lithium salt, calcium salt, magnesium salt, aluminum salt and ammonium salt.
  • the number of hydroxy groups in the hydroxycarboxylic acid having two or more hydroxy groups is preferably 2 to 15, more preferably 3 to 10, and even more preferably 4 to 7.
  • the number of carboxy groups in the hydroxycarboxylic acid having two or more hydroxy groups is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3.
  • the specific hydroxy acid compound has high hydrophilicity from the viewpoint of preventing edge stains.
  • the hydrophilicity of the specific hydroxy acid compound can be expressed by using the ClogP value, which is generally known as an index indicating the hydrophilicity of the compound.
  • the specific hydroxy acid compound preferably has a ClogP value of 0.5 or less, more preferably -1 or less, and even more preferably -3 or less. Further, the ClogP value of the specific hydroxy acid compound is preferably -10 or more, more preferably -7 or more, still more preferably -5 or more, from the viewpoint of image forming property in the end region.
  • the ClogP value of the specific hydroxy acid compound is a numerical value calculated from the molecular structure by the molecular structure editor software "ChemDraw Professional 2016".
  • the molecular weight of the specific hydroxy acid compound is preferably 1,000 or less. When the molecular weight is 1,000 or less, the specific hydroxy acid compound easily moves to the surface of the anodic oxide film during on-machine development, and can effectively contribute to the prevention of edge stains.
  • the molecular weight of the specific hydroxy acid compound is more preferably 80 to 1,000, further preferably 100 to 500, and particularly preferably 100 to 300.
  • Specific hydroxy acid compounds include glyceric acid, gluconic acid, tartrate acid, mevalonic acid, pantoic acid, quinic acid, shikimic acid, gallic acid, coffee acid, 2,3-dihydroxybenzoic acid, 2,4-dihydroxybenzoic acid, and 2 , 5-Dihydroxybenzoic acid, 2,6-dihydroxybenzoic acid, 3,4-dihydroxybenzoic acid, 3,5-dihydroxybenzoic acid, 2,3,4-trihydroxybenzoic acid, 3,4,5-trihydroxy Examples thereof include benzoic acid, sodium gluconate, potassium gluconate, sodium tartrate, and sodium gallic acid.
  • gluconic acid As the specific hydroxy acid compound, gluconic acid, tartaric acid, mevalonic acid, quinic acid, Na gluconate, K gluconate, or Na tartrate is preferable from the viewpoint of edge stain suppression and on-machine developability. , Na gluconate, or K gluconate is more preferable, and gluconic acid is particularly preferable.
  • the support-adsorbing compound may be used alone or in combination of two or more.
  • the content of the support-adsorbing compound in the image recording layer, edge soiling inhibitory, and, in view of on-press development property, 10mg / m 2 ⁇ 150mg / m 2 are preferred, 30mg / m 2 ⁇ 100mg / m 2 Is more preferable, and 50 mg / m 2 to 100 mg / m 2 is particularly preferable.
  • the content of the support-adsorbing compound is preferably 0.5% by mass to 20% by mass with respect to the total mass of the image recording layer from the viewpoint of edge stain suppression and on-machine developability. More preferably, it is from mass% to 15% by mass, and even more preferably from 2% by mass to 10% by mass.
  • the image recording layer preferably contains a polymerizable compound.
  • the polymerizable compound used in the present disclosure may be, for example, a radical-polymerizable compound or a cationically polymerizable compound, but is an addition-polymerizable compound having at least one ethylenically unsaturated bond (ethyleney). It is preferably an unsaturated compound).
  • the ethylenically unsaturated compound is preferably a compound having at least one terminal ethylenically unsaturated bond, and more preferably a compound having two or more terminal ethylenically unsaturated bonds.
  • the polymerizable compound has a chemical form such as, for example, a monomer, a prepolymer, that is, a dimer, a trimer or an oligomer, or a mixture thereof.
  • Examples of the monomer include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, amides, etc., and unsaturated carboxylic acids are preferable. Esters of acids and polyhydric alcohol compounds and amides of unsaturated carboxylic acids and polyhydric amine compounds are used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxy group, an amino group or a mercapto group with a monofunctional or polyfunctional isocyanate or an epoxy, and a monofunctional or polyfunctional group.
  • unsaturated carboxylic acids for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.
  • esters thereof for example, acrylic acid, methacrylic acid, itaconic acid, crotonic
  • a dehydration condensation reaction product with a functional carboxylic acid is also preferably used.
  • an addition reaction product of unsaturated carboxylic acid esters or amides having an electrophilic substituent such as an isocyanate group or an epoxy group with monofunctional or polyfunctional alcohols, amines and thiols, and a halogen atom is also suitable.
  • the monomer of the ester of the polyhydric alcohol compound and the unsaturated carboxylic acid include ethylene glycol diacrylate, 1,3-butanediol diacrylate, tetramethylene glycol diacrylate, and propylene glycol diacrylate as acrylic acid esters.
  • EO ethylene oxide
  • methacrylic acid ester As methacrylic acid ester, tetramethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropantrimethacrylate, ethylene glycol dimethacrylate, pentaerythritol trimethacrylate, bis [p- (3-methacryloxy-2-hydroxypropoxy) phenyl] There are dimethylmethane, bis [p- (methacrylicoxyethoxy) phenyl] dimethylmethane and the like.
  • amide monomer of the polyvalent amine compound and the unsaturated carboxylic acid examples include methylenebisacrylamide, methylenebismethacrylamide, 1,6-hexamethylenebisacrylamide, and 1,6-hexamethylenebismethacrylamide.
  • a urethane-based addition-polymerizable compound produced by using an addition reaction of isocyanate and a hydroxy group is also suitable, and specific examples thereof include, for example, 2 in 1 molecule described in Japanese Patent Publication No. 48-41708.
  • a vinyl urethane compound containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxy group represented by the following formula (M) to a polyisocyanate compound having two or more isocyanate groups. And so on.
  • CH 2 C (R M4) COOCH 2 CH (R M5) OH (M)
  • RM4 and RM5 each independently represent a hydrogen atom or a methyl group.
  • urethane acrylates described in JP-A-51-37193, JP-A-2-32293, JP-A-2-16765, JP-A-2003-344997, and JP-A-2006-65210, The ethylenes described in JP-A-58-49860, JP-A-56-17654, JP-A-62-39417, JP-A-62-39418, JP-A-2000-250211 and JP-A-2007-94138.
  • Kind is also suitable.
  • the details of the method of use such as the structure of the polymerizable compound, whether it is used alone or in combination, and the amount of addition can be arbitrarily set.
  • the content of the polymerizable compound is preferably 5% by mass to 75% by mass, more preferably 10% by mass to 70% by mass, and 15% by mass to 60% by mass with respect to the total mass of the image recording layer. It is particularly preferably mass%.
  • the image recording layer in the lithographic printing plate original plate according to the present disclosure preferably contains a polymerization initiator, and more preferably contains a polymerization initiator and a polymerizable compound. Further, the polymerization initiator preferably contains an electron-accepting type polymerization initiator, and more preferably contains an electron-accepting type polymerization initiator and an electron-donating type polymerization initiator.
  • the image recording layer preferably contains an electron-accepting polymerization initiator as the polymerization initiator.
  • the electron-accepting polymerization initiator is a compound that generates a polymerization initiator such as a radical by accepting one electron by electron transfer between molecules when the electrons of the infrared absorber are excited by infrared exposure.
  • the electron-accepting polymerization initiator used in the present disclosure is a compound that generates a polymerization initiator such as a radical or a cation by energy of light, heat, or both, and is a known thermal polymerization initiator and has a small bond dissociation energy.
  • a compound having a bond, a photopolymerization initiator and the like can be appropriately selected and used.
  • a radical polymerization initiator is preferable, and an onium salt compound is more preferable.
  • the electron-accepting polymerization initiator is preferably an infrared photosensitive polymerization initiator.
  • the electron-accepting radical polymerization initiator include (a) organic halides, (b) carbonyl compounds, (c) azo compounds, (d) organic peroxides, (e) metallocene compounds, and (f) azide compounds. , (G) hexaarylbiimidazole compounds, (i) disulfone compounds, (j) oxime ester compounds, and (k) onium salt compounds.
  • the compounds described in paragraphs 0022 to 0023 of JP-A-2008-195018 are preferable.
  • B) As the carbonyl compound for example, the compound described in paragraph 0024 of JP-A-2008-195018 is preferable.
  • C) As the azo compound for example, the azo compound described in JP-A-8-108621 can be used.
  • D) As the organic peroxide for example, the compound described in paragraph 0025 of JP-A-2008-195018 is preferable.
  • the metallocene compound for example, the compound described in paragraph 0026 of JP-A-2008-195018 is preferable.
  • Examples of the (f) azide compound include compounds such as 2,6-bis (4-azidobenzylidene) -4-methylcyclohexanone.
  • Examples of the hexaarylbiimidazole compound for example, the compound described in paragraph 0027 of JP-A-2008-195018 is preferable.
  • Examples of the disulfon compound include the compounds described in JP-A-61-166544 and JP-A-2002-328465.
  • As the (j) oxime ester compound for example, the compounds described in paragraphs 0028 to 0030 of JP-A-2008-195018 are preferable.
  • oxime ester compounds and onium salt compounds are preferable from the viewpoint of curability.
  • an iodonium salt compound, a sulfonium salt compound or an azinium salt compound is preferable, an iodonium salt compound or a sulfonium salt compound is more preferable, and an iodonium salt compound is particularly preferable. Specific examples of these compounds are shown below, but the present disclosure is not limited thereto.
  • a diaryl iodonium salt compound is preferable, a diphenyl iodonium salt compound substituted with an electron donating group such as an alkyl group or an alkoxyl group is more preferable, and an asymmetric diphenyl iodonium salt compound is preferable.
  • a triarylsulfonium salt compound is preferable, and in particular, an electron-attracting group, for example, a triarylsulfonium salt compound in which at least a part of a group on the aromatic ring is substituted with a halogen atom is preferable, and an aromatic is preferable.
  • a triarylsulfonium salt compound having a total number of halogen atoms substituted on the ring of 4 or more is more preferable.
  • triphenylsulfonium hexafluorophosphate
  • triphenylsulfonium benzoylformate
  • bis (4-chlorophenyl) phenylsulfonium benzoylformate
  • bis (4-chlorophenyl) -4-methylphenylsulfonium tetrafluoro.
  • Tris (4-chlorophenyl) Sulfonium 3,5-bis (methoxycarbonyl) Benzene Sulfonium
  • Tris (4-chlorophenyl) Sulfonium Hexafluorophosphate
  • Examples of the counter anion of the iodonium salt compound and the sulfonium salt compound include a sulfonate anion, a carboxylate anion, a tetrafluoroborate anion, a hexafluorophosphate anion, a p-toluene sulfonate anion, a tosylate anion, a sulfonamide anion or a sulfonimide.
  • Anions can be mentioned.
  • a sulfonamide anion or a sulfonimide anion is preferable, and a sulfonimide anion is more preferable.
  • sulfonamide anion an aryl sulfonamide anion is preferable. Further, as the sulfonimide anion, a bisaryl sulfonimide anion is preferable. Specific examples of the sulfonamide anion or the sulfonamide anion are shown below, but the present disclosure is not limited thereto. In the specific examples below, Ph represents a phenyl group, Me represents a methyl group, and Et represents an ethyl group.
  • the minimum unoccupied molecular orbital (LUMO) of the electron-accepting polymerization initiator is preferably ⁇ 3.00 eV or less, and more preferably ⁇ 3.02 eV or less, from the viewpoint of improving sensitivity.
  • the lower limit is preferably -3.80 eV or more, and more preferably -3.60 eV or more.
  • the electron-accepting polymerization initiator may be used alone or in combination of two or more.
  • the content of the electron-accepting polymerization initiator is preferably 0.1% by mass to 50% by mass, more preferably 0.5% by mass to 30% by mass, based on the total mass of the image recording layer. It is preferably 0.8% by mass to 20% by mass, and particularly preferably 0.8% by mass.
  • Electron-donated polymerization initiator (polymerization aid)
  • the image recording layer preferably contains an electron-donating polymerization initiator (also referred to as a "polymerization aid") as a polymerization initiator, and contains an electron-accepting polymerization initiator and an electron-donating polymerization initiator. Is more preferable.
  • the electron donating type polymerization initiator in the present disclosure donates one electron by intermolecular electron transfer to an orbit where one electron is missing from the infrared absorber when the electron of the infrared absorber is excited or moved intramolecularly by infrared exposure. This is a compound that generates a polymerization-initiated species such as a radical.
  • the electron-donating type polymerization initiator is preferably an electron-donating radical polymerization initiator.
  • the image recording layer more preferably contains the electron donating type polymerization initiator described below, and examples thereof include the following five types.
  • Alkyl or aryl ate complex It is considered that the carbon-heterobond is oxidatively cleaved to generate an active radical. Specifically, a borate compound is preferable.
  • N-arylalkylamine compound It is considered that the CX bond on the carbon adjacent to nitrogen is cleaved by oxidation to generate an active radical.
  • a hydrogen atom, a carboxyl group, a trimethylsilyl group or a benzyl group is preferable.
  • N-phenylglycins which may or may not have a substituent on the phenyl group
  • N-phenyliminodiacetic acid which may or may not have a substituent on the phenyl group.
  • Sulfur-containing compound The above-mentioned amines in which the nitrogen atom is replaced with a sulfur atom can generate an active radical by the same action.
  • phenylthioacetic acid (which may or may not have a substituent on the phenyl group) can be mentioned.
  • Tin-containing compounds The above-mentioned amines in which the nitrogen atom is replaced with a tin atom can generate active radicals by the same action.
  • Sulfinates Oxidation can generate active radicals. Specific examples thereof include arylsulfinic sodium.
  • the image recording layer preferably contains a borate compound from the viewpoint of printing resistance.
  • the borate compound is preferably a tetraaryl borate compound or a monoalkyl triaryl borate compound, and more preferably a tetraaryl borate compound from the viewpoint of print resistance and color development.
  • the counter cation contained in the borate compound is not particularly limited, but is preferably an alkali metal ion or a tetraalkylammonium ion, and more preferably a sodium ion, a potassium ion, or a tetrabutylammonium ion.
  • sodium tetraphenylborate is preferably mentioned as the borate compound.
  • B-1 to B-9 are shown below as preferable specific examples of the electron donating type polymerization initiator, but it goes without saying that the present invention is not limited to these. Further, in the following chemical formula, Ph represents a phenyl group and Bu represents an n-butyl group.
  • the maximum occupied molecular orbital (HOMO) of the electron donating polymerization initiator used in the present disclosure is preferably ⁇ 6.00 eV or higher, and preferably ⁇ 5.95 eV or higher, from the viewpoint of improving sensitivity. More preferably, it is more preferably ⁇ 5.93 eV or more.
  • the upper limit is preferably ⁇ 5.00 eV or less, and more preferably ⁇ 5.40 eV or less.
  • the electron donating type polymerization initiator may contain only one type, or two or more types may be used in combination.
  • the content of the electron donating type polymerization initiator is preferably 0.01% by mass to 30% by mass, preferably 0.05% by mass, based on the total mass of the image recording layer from the viewpoint of sensitivity and printing resistance. It is more preferably about 25% by mass, and even more preferably 0.1% by mass to 20% by mass.
  • the image recording layer contains an onium ion and an anion in the above-mentioned electron donating type polymerization initiator
  • the image recording layer is assumed to contain an electron accepting type polymerization initiator and the above-mentioned electron donating type polymerization initiator. ..
  • the image recording layer in the present disclosure contains the electron-donating polymerization initiator and the infrared absorber described later, and the value of HOMO of the infrared absorber-HOMO of the electron-donating polymerization initiator is determined. It is preferably 0.70 eV or less, and more preferably 0.70 eV to ⁇ 0.10 eV. A negative value means that the HOMO of the electron donating polymerization initiator is higher than that of the infrared absorber HOMO.
  • infrared absorbers and electron-accepting polymerization initiators Further, as an infrared absorber to be described later, from the viewpoint of improving sensitivity, an organic anion having ⁇ d of 16 or more, ⁇ p of 16 to 32, and ⁇ h of 60% or less of ⁇ p in the solubility parameter of Hansen. Is a preferred embodiment.
  • the electron-accepting polymerization initiator in the present disclosure has a Hansen solubility parameter of ⁇ d of 16 or more, ⁇ p of 16 to 32, and ⁇ h of 60% or less of ⁇ p from the viewpoint of improving sensitivity. It is a preferred embodiment to have an organic anion.
  • ⁇ d, ⁇ p and ⁇ h in the Hansen solubility parameter in the present disclosure have the dispersion term ⁇ d [unit: MPa 0.5 ] and the polar term ⁇ p [unit: MPa 0.5 ] in the Hansen solubility parameter.
  • the solubility parameter of Hansen is expressed in a three-dimensional space by dividing the solubility parameter introduced by Hildebrand into three components of a dispersion term ⁇ d, a polar term ⁇ p, and a hydrogen bond term ⁇ h. It is a thing.
  • Hansen solubility parameter see Charles M. et al. It is described in the document "Hansen Solubility Parameter; A Users Handbook (CRC Press, 2007)" by Hansen.
  • ⁇ d, ⁇ p and ⁇ h in the Hansen solubility parameter of the organic anion are estimated from the chemical structure by using the computer software “Hansen Solubility Parameters in Practice (HSPiP ver. 4.1.07)”. The value.
  • organic anions having ⁇ d of 16 or more, ⁇ p of 16 to 32, and ⁇ h of 60% or less of ⁇ p in the solubility parameter of Hansen are the above-mentioned I-1 to I-15 and I. -17 to I-21, I-23 to I-25, and the following are preferably mentioned, but it goes without saying that the present invention is not limited thereto.
  • bis (halogen-substituted benzenesulfonyl) imide anion is more preferably mentioned, and I-5 described above is particularly preferable.
  • the image recording layer preferably contains particles from the viewpoint of UV printing resistance.
  • the particles may be organic particles or inorganic particles, but from the viewpoint of UV printing resistance, they preferably contain organic particles, and more preferably polymer particles.
  • the inorganic particles known inorganic particles can be used, and metal oxide particles such as silica particles and titania particles can be preferably used.
  • the polymer particles may be selected from the group consisting of thermoplastic polymer particles, heat-reactive polymer particles, polymer particles having a polymerizable group, microcapsules containing a hydrophobic compound, and microgels (crosslinked polymer particles). preferable. Of these, polymer particles or microgels having a polymerizable group are preferable. In a particularly preferred embodiment, the polymer particles contain at least one ethylenically unsaturated polymerizable group. The presence of such polymer particles has the effect of enhancing the printing resistance of the exposed portion and the on-machine developability of the unexposed portion. Further, the polymer particles are preferably thermoplastic polymer particles.
  • thermoplastic polymer particles Research Discovery No. 1 of January 1992. 33303, JP-A-9-123387, 9-131850, 9-171249, 9-171250, European Patent No. 913647, and the like are preferred.
  • Specific examples of the polymer constituting the thermoplastic polymer particles include ethylene, styrene, vinyl chloride, methyl acrylate, ethyl acrylate, methyl methacrylate, ethyl methacrylate, vinylidene chloride, acrylonitrile, vinylcarbazole, and a polyalkylene structure. Examples include homopolymers or copolymers of monomers such as acrylates or methacrylates or mixtures thereof.
  • thermoplastic polymer particles Preferably, a copolymer containing polystyrene, styrene and acrylonitrile, or polymethyl methacrylate can be mentioned.
  • the average particle size of the thermoplastic polymer particles is preferably 0.01 ⁇ m to 3.0 ⁇ m.
  • heat-reactive polymer particles examples include polymer particles having a heat-reactive group.
  • the heat-reactive polymer particles form a hydrophobic region by cross-linking due to a heat reaction and the change of functional groups at that time.
  • the thermally reactive group in the polymer particles having a thermally reactive group may be a functional group that undergoes any reaction as long as a chemical bond is formed, but a polymerizable group is preferable, and as an example, it is preferable.
  • Eethylene unsaturated groups eg, acryloyl group, methacryloyl group, vinyl group, allyl group, etc.
  • cationically polymerizable groups eg, vinyl group, vinyloxy group, epoxy group, oxetanyl group, etc.
  • Preferred examples thereof include a hydroxy group or an amino group as a partner, an acid anhydride for carrying out a ring-opening addition
  • microcapsules examples include those in which at least a part of the constituent components of the image recording layer is encapsulated in the microcapsules, as described in JP-A-2001-277740 and JP-A-2001-277742.
  • the components of the image recording layer can also be contained outside the microcapsules.
  • the image recording layer containing the microcapsules is preferably configured such that the hydrophobic constituents are encapsulated in the microcapsules and the hydrophilic constituents are contained outside the microcapsules.
  • the microgel (crosslinked polymer particles) can contain a part of the constituent components of the image recording layer on at least one of the surface or the inside thereof.
  • a reactive microgel having a radically polymerizable group on its surface is preferable from the viewpoint of the sensitivity of the obtained lithographic printing plate original plate and the printing durability of the obtained lithographic printing plate.
  • a known method can be applied to microencapsulate or microgelify the constituents of the image recording layer.
  • polymer particles an adduct of a polyhydric phenol compound having two or more hydroxy groups in the molecule and isophorone diisocyanate from the viewpoint of printing resistance, stain resistance and storage stability of the obtained flat plate printing plate.
  • the one obtained by the reaction of the polyhydric isocyanate compound and the compound having active hydrogen is preferable.
  • polyvalent phenol compound a compound having a plurality of benzene rings having a phenolic hydroxyl group is preferable.
  • a polyol compound or a polyamine compound is preferable, a polyol compound is more preferable, and at least one compound selected from the group consisting of propylene glycol, glycerin and trimethylolpropane is further preferable.
  • the resin particles obtained by the reaction of the polyhydric phenol compound having two or more hydroxy groups in the molecule, the polyhydric isocyanate compound which is an adduct of isophorone diisocyanate, and the compound having active hydrogen are JP-A-2012.
  • the polymer particles described in paragraphs 0032 to 0905 of JP-206495 are preferably mentioned.
  • the polymer particles have a hydrophobic main chain from the viewpoint of printing resistance and solvent resistance of the obtained lithographic printing plate, and i) a pendant cyano group directly bonded to the hydrophobic main chain. It is preferable to include both a constituent unit having and ii) a constituent unit having a pendant group containing a hydrophilic polyalkylene oxide segment.
  • Acrylic resin chains are preferably mentioned as the hydrophobic main chain.
  • the pendant cyano group preferably include- [CH 2 CH (C ⁇ N)-] or-[CH 2 C (CH 3 ) (C ⁇ N)-].
  • the constituent unit having the pendant cyano group can be easily derived from an ethylene-based unsaturated monomer, for example, acrylonitrile or methacrylonitrile, or a combination thereof.
  • the alkylene oxide in the hydrophilic polyalkylene oxide segment ethylene oxide or propylene oxide is preferable, and ethylene oxide is more preferable.
  • the number of repetitions of the alkylene oxide structure in the hydrophilic polyalkylene oxide segment is preferably 10 to 100, more preferably 25 to 75, and even more preferably 40 to 50.
  • Both a constituent unit having a hydrophobic backbone and i) having a pendant cyano group directly attached to the hydrophobic backbone and ii) a constituent unit having a pendant group containing a hydrophilic polyalkylene oxide segment are preferably mentioned.
  • the polymer particles preferably have a hydrophilic group from the viewpoint of UV printing resistance and on-machine developability.
  • the hydrophilic group is not particularly limited as long as it has a hydrophilic structure, and examples thereof include an acid group such as a carboxy group, a hydroxy group, an amino group, a cyano group, and a polyalkylene oxide structure.
  • an acid group such as a carboxy group, a hydroxy group, an amino group, a cyano group, and a polyalkylene oxide structure.
  • a polyalkylene oxide structure is preferable, and a polyethylene oxide structure, a polypropylene oxide structure, or a polyethylene / propylene oxide structure is more preferable.
  • the polyalkylene oxide structure preferably has a polypropylene oxide structure, and may have a polyethylene oxide structure and a polypropylene oxide structure. More preferred.
  • the hydrophilic group preferably contains a structural unit having a cyano group or a group represented by the following formula Z from the viewpoint of printing resistance, inking property and on-machine developability. It is more preferable to include a structural unit represented by the following formula (AN) or a group represented by the following formula Z, and it is particularly preferable to include a group represented by the following formula Z.
  • Q represents a divalent linking group
  • W represents a divalent group having a hydrophilic structure or a divalent group having a hydrophobic structure
  • Y represents a monovalent group having a hydrophilic structure or It represents a monovalent group having a hydrophobic structure, either W or Y has a hydrophilic structure
  • * represents a binding site with another structure.
  • RAN represents a hydrogen atom or a methyl group.
  • the polymer contained in the polymer particles preferably contains a structural unit formed of a compound having a cyano group.
  • the cyano group is usually preferably introduced as a structural unit containing a cyano group by using a compound (monomer) having a cyano group.
  • Examples of the compound having a cyano group include acrylonitrile compounds, and (meth) acrylonitrile is preferable.
  • the structural unit having a cyano group is preferably a structural unit formed of an acrylonitrile compound, and more preferably a structural unit formed of (meth) acrylonitrile, that is, a structural unit represented by the above formula (AN). ..
  • the content of the structural unit having a cyano group, preferably the structural unit represented by the above formula (AN), in the polymer having a structural unit having a cyano group. Is preferably 5% by mass to 90% by mass, more preferably 20% by mass to 80% by mass, based on the total mass of the polymer having a structural unit having a cyano group, from the viewpoint of UV printing resistance. It is preferably 30% by mass to 60% by mass, and particularly preferably 30% by mass.
  • the polymer particles preferably contain a structural unit formed of an aromatic vinyl compound.
  • the aromatic vinyl compound may be a compound having a structure in which a vinyl group is bonded to an aromatic ring, and examples thereof include a styrene compound and a vinylnaphthalene compound, and a styrene compound is preferable, and styrene is more preferable.
  • styrene compound examples include styrene, p-methylstyrene, p-methoxystyrene, ⁇ -methylstyrene, p-methyl- ⁇ -methylstyrene, ⁇ -methylstyrene, p-methoxy- ⁇ -methylstyrene and the like. Styrene is preferred.
  • vinylnaphthalene compound examples include 1-vinylnaphthalene, methyl-1-vinylnaphthalene, ⁇ -methyl-1-vinylnaphthalene, 4-methyl-1-vinylnaphthalene, 4-methoxy-1-vinylnaphthalene and the like.
  • -Vinylnaphthalene is preferably mentioned.
  • the structural unit formed of the aromatic vinyl compound the structural unit represented by the following formula Z1 is preferably mentioned.
  • R Z1 and R Z2 independently represent a hydrogen atom or an alkyl group
  • Ar represents an aromatic ring group
  • R Z3 represents a substituent
  • nz is an integer of 0 or more and less than or equal to the maximum number of substituents of Ar.
  • R Z1 and R Z2 are each independently preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom or a methyl group, and both are hydrogen atoms. Is more preferable.
  • Ar is preferably a benzene ring or a naphthalene ring, and more preferably a benzene ring.
  • R Z3 is preferably an alkyl group or an alkoxy group, more preferably an alkyl group having 1 to 4 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and it is a methyl group or a methoxy group. Is more preferable. In the formula Z1, if the R Z3 there are a plurality, plural of R Z3 may be the same or may be different. In the formula Z1, nz is preferably an integer of 0 to 2, more preferably 0 or 1, and even more preferably 0.
  • the polymer particles may contain one type of structural unit formed of an aromatic vinyl compound alone, or may contain two or more types.
  • the content of the structural unit formed by the aromatic vinyl compound may be 0.1% by mass to 20% by mass with respect to the total mass of the polymer particles from the viewpoint of ink inking property. It is preferably 0.5% by mass to 15% by mass, and particularly preferably 1% by mass to 10% by mass.
  • the polymer particles preferably have a crosslinked structure, and more preferably contain a structural unit having a crosslinked structure, from the viewpoint of UV printing resistance. Since the polymer particles have a crosslinked structure, the hardness of the polymer particles themselves is improved, so that the image area strength is improved, and even when an ultraviolet curable ink that easily deteriorates the plate than other inks is used. It is considered that the printing resistance (UV printing resistance) is further improved.
  • the crosslinked structure is not particularly limited, but is a structural unit formed by polymerizing a polyfunctional ethylenically unsaturated compound, or a structural unit in which one or more reactive groups form a covalent bond inside the particles. Is preferable.
  • the functional number of the polyfunctional ethylenically unsaturated compound is preferably 2 to 15, more preferably 3 to 10, and 4 to 10 from the viewpoint of UV printing resistance and on-machine developability. It is more preferably present, and particularly preferably 5 to 10.
  • the structural unit having the crosslinked structure is preferably a bifunctional to 15-functional branched unit from the viewpoint of UV printing resistance and on-machine developability.
  • the n-functional bifurcation unit is a bifurcation unit having n molecular chains, in other words, a structural unit having an n-functional bifurcation point (crosslinked structure). It is also preferable to form a crosslinked structure with a polyfunctional mercapto compound.
  • the ethylenically unsaturated group in the polyfunctional ethylenically unsaturated compound is not particularly limited, and examples thereof include a (meth) acryloxy group, a (meth) acrylamide group, an aromatic vinyl group, and a maleimide group.
  • the polyfunctional ethylenically unsaturated compound is preferably a polyfunctional (meth) acrylate compound, a polyfunctional (meth) acrylamide compound, or a polyfunctional aromatic vinyl compound.
  • polyfunctional (meth) acrylate compound examples include diethylene glycol diacrylate, triethylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylol propane diacrylate, trimethylol propane triacrylate, 1,4-butanediol diacrylate, and 1,6.
  • -Hexanediol diacrylate polyethylene glycol diacrylate, polypropylene glycol diacrylate, tricyclodecanedimethylol diacrylate, ditrimethylol propanetetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol triacrylate, dipentaerythritol hexa.
  • Examples thereof include acrylate and triacrylate of tris ( ⁇ -hydroxyethyl) isocyanurate.
  • examples of the polyfunctional (meth) acrylate compound include N, N'-methylenebisacrylamide, N- [tris (3-acrylamide propoxymethyl) methyl] acrylamide and the like.
  • examples of the polyfunctional aromatic vinyl compound include divinylbenzene and the like.
  • the number of carbon atoms in the branching unit is not particularly limited, but is preferably 8 to 100, and more preferably 8 to 70.
  • the polymer particles may contain one type of structural unit having a crosslinked structure alone, or may contain two or more types.
  • the content of the structural unit having a crosslinked structure is 0.1% by mass to 20% by mass with respect to the total mass of the polymer particles from the viewpoint of UV printing resistance and on-machine developability. Is more preferable, and it is more preferably 0.5% by mass to 15% by mass, and particularly preferably 1% by mass to 10% by mass.
  • polymer particles preferably contain polymer particles having a group represented by the above formula Z from the viewpoints of printing resistance, fillability, and on-machine developability.
  • Q in the above formula Z is preferably a divalent linking group having 1 to 20 carbon atoms, and more preferably a divalent linking group having 1 to 10 carbon atoms. Further, Q in the above formula Z is preferably an alkylene group, an arylene group, an ester bond, an amide bond, or a group in which two or more of these are combined, and may be a phenylene group, an ester bond, or an amide bond. More preferred.
  • the divalent group having a hydrophilic structure in W of the above formula Z is preferably a polyalkyleneoxy group or a group in which -CH 2 CH 2 NR W- is bonded to one end of a polyalkyleneoxy group. ..
  • R W represents a hydrogen atom or an alkyl group.
  • the RWAs are independently linear, branched or cyclic alkylene groups having 6 to 120 carbon atoms, haloalkylene groups having 6 to 120 carbon atoms, arylene groups having 6 to 120 carbon atoms, and alkanelylenes having 6 to 120 carbon atoms. It represents a group (a divalent group obtained by removing one hydrogen atom from an alkylaryl group) or an aralkylene group having 6 to 120 carbon atoms.
  • the monovalent group having a hydrophobic structure in Y of the above formula Z is a linear, branched or cyclic alkyl group having 6 to 120 carbon atoms, a haloalkyl group having 6 to 120 carbon atoms, an aryl group having 6 to 120 carbon atoms, and the like.
  • RWB represents an alkyl group having 6 to 20 carbon atoms.
  • the polymer particle having a group represented by the above formula Z is more preferably a divalent group in which W has a hydrophilic structure from the viewpoints of print resistance, carving property and on-machine developability. More preferably, Q is a phenylene group, an ester bond, or an amide bond, W is a polyalkyleneoxy group, and Y is a polyalkyleneoxy group having a hydrogen atom or an alkyl group at the end.
  • the polymer particles preferably contain polymer particles having a polymerizable group from the viewpoints of print resistance, fillability and on-machine developability, and include polymer particles having a polymerizable group on the particle surface. Is more preferable. Further, the polymer particles preferably contain polymer particles having a hydrophilic group and a polymerizable group from the viewpoint of printing resistance.
  • the polymerizable group may be a cationically polymerizable group or a radically polymerizable group, but from the viewpoint of reactivity, it is preferably a radically polymerizable group.
  • the polymerizable group is not particularly limited as long as it is a polymerizable group, but from the viewpoint of reactivity, an ethylenically unsaturated group is preferable, and a vinylphenyl group (styryl group), a (meth) acryloxy group, or a (meth) acryloxy group, or A (meth) acrylamide group is more preferred, and a (meth) acryloxy group is particularly preferred.
  • the polymer in the polymer particles having a polymerizable group preferably has a structural unit having a polymerizable group.
  • a polymerizable group may be introduced on the surface of the polymer particles by a polymer reaction.
  • the polymer particles preferably contain a resin having a urea bond from the viewpoints of printing resistance, inking property, on-machine developability, and ability to suppress development residue during on-machine development, and are preferably represented by the following formula (Iso). It is more preferable to contain a resin having a structure obtained by at least reacting the isocyanate compound represented by water with water, and having a structure obtained by at least reacting the isocyanate compound represented by the following formula (Iso) with water.
  • the polyoxyalkylene structure contains a resin having a polyethylene oxide structure and a polypropylene oxide structure.
  • the particles containing the resin having the urea bond are preferably microgels.
  • n represents an integer from 0 to 10.
  • a compound having active hydrogen reactive with an isocyanate group such as an alcohol compound or an amine compound
  • an isocyanate group such as an alcohol compound or an amine compound
  • the structure of the alcohol compound, the amine compound or the like is introduced into the resin having a urea bond. You can also do it.
  • the compound having active hydrogen those described in the above-mentioned microgel are preferably mentioned.
  • the resin having a urea bond preferably has an ethylenically unsaturated group, and more preferably has a group represented by the following formula (PETA).
  • the average particle size of the particles is preferably 0.01 ⁇ m to 3.0 ⁇ m, more preferably 0.03 ⁇ m to 2.0 ⁇ m, and even more preferably 0.10 ⁇ m to 1.0 ⁇ m. Good resolution and stability over time can be obtained in this range.
  • the average primary particle size of the particles in the present disclosure is measured by a light scattering method, or an electron micrograph of the particles is taken, and a total of 5,000 particle sizes are measured on the photographs, and the average value is obtained. Shall be calculated. For non-spherical particles, the particle size value of spherical particles having the same particle area as the particle area on the photograph is used as the particle size. Further, the average particle size in the present disclosure shall be the volume average particle size unless otherwise specified.
  • the image recording layer may contain particles, particularly polymer particles, alone or in combination of two or more.
  • the content of the particles in the image recording layer, particularly the polymer particles is preferably 5% by mass to 90% by mass, preferably 10% by mass, based on the total mass of the image recording layer from the viewpoint of developability and UV printing resistance. It is more preferably% to 90% by mass, further preferably 20% by mass to 90% by mass, and particularly preferably 50% by mass to 90% by mass.
  • the content of the polymer particles in the image recording layer is 20% by mass to 100% by mass with respect to the total mass of the components having a molecular weight of 3,000 or more in the image recording layer from the viewpoint of developability and UV printing resistance. It is preferably by mass, more preferably 35% by mass to 100% by mass, further preferably 50% by mass to 100% by mass, and particularly preferably 80% by mass to 100% by mass.
  • the image recording layer may contain a binder polymer, but is preferably not contained from the viewpoint of on-machine developability and UV printing resistance.
  • the binder polymer is a polymer other than the polymer particles, that is, a binder polymer that is not in the form of particles.
  • a (meth) acrylic resin, a polyvinyl acetal resin, or a polyurethane resin is preferable.
  • a known binder polymer used for the image recording layer of the lithographic printing plate original plate can be preferably used.
  • a binder polymer (hereinafter, also referred to as a binder polymer for on-machine development) used in an on-machine development type lithographic printing plate original plate will be described in detail.
  • a binder polymer for on-machine development a binder polymer having an alkylene oxide chain is preferable.
  • the binder polymer having an alkylene oxide chain may have a poly (alkylene oxide) moiety in the main chain or the side chain.
  • graft polymer having a poly (alkylene oxide) in a side chain, or a block copolymer of a block composed of a poly (alkylene oxide) -containing repeating unit and a block composed of a (alkylene oxide) -free repeating unit.
  • a polyurethane resin is preferable.
  • the polymer of the main chain is (meth) acrylic resin, polyvinyl acetal resin, polyurethane resin, polyurea resin, polyimide resin, polyamide resin, epoxy resin, polystyrene resin, novolak type. Examples thereof include phenol resin, polyester resin, synthetic rubber and natural rubber, and (meth) acrylic resin is particularly preferable.
  • Molecular compounds hereinafter, also referred to as star-shaped polymer compounds
  • star-shaped polymer compounds for example, the compound described in JP-A-2012-148555 can be preferably used.
  • the star-shaped polymer compound contains a polymerizable group such as an ethylenically unsaturated bond for improving the film strength of the image portion as described in JP-A-2008-195018, with a main chain or a side chain, preferably a side chain. Examples include those held in the chain.
  • the polymerizable group forms crosslinks between the polymer molecules to promote curing.
  • an ethylenically unsaturated group such as a (meth) acrylic group, a vinyl group, an allyl group or a styryl group, an epoxy group or the like is preferable, and the (meth) acrylic group, the vinyl group or the styryl group is a polymerization reaction.
  • a (meth) acrylic group is particularly preferable.
  • These groups can be introduced into the polymer by polymer reaction or copolymerization. For example, a reaction between a polymer having a carboxy group in the side chain and glycidyl methacrylate, or a reaction between a polymer having an epoxy group and an ethylenically unsaturated group-containing carboxylic acid such as methacrylic acid can be used. These groups may be used together.
  • the molecular weight of the binder polymer is preferably 2,000 or more, more preferably 5,000 or more, and 10,000 to 300,000 in terms of polystyrene by the GPC method. It is more preferable to have.
  • hydrophilic polymers such as polyacrylic acid and polyvinyl alcohol described in JP-A-2008-195018 can be used in combination.
  • a lipophilic polymer and a hydrophilic polymer can be used in combination.
  • one type of binder polymer may be used alone, or two or more types may be used in combination.
  • the binder polymer can be contained in the image recording layer in an arbitrary amount, but from the viewpoint of on-machine developability and UV printing resistance, the binder polymer is not contained or the binder polymer is used.
  • the content is preferably more than 0% by mass and 20% by mass or less with respect to the total mass of the image recording layer, and either does not contain the binder polymer or the content of the binder polymer is the image recording layer.
  • the binder polymer is not contained or the content of the binder polymer is based on the total mass of the image recording layer. , 0% by mass and 5% by mass or less, and the binder polymer is not contained, or the content of the binder polymer exceeds 0% by mass with respect to the total mass of the image recording layer. It is particularly preferably 2% by mass or less, and most preferably does not contain the above binder polymer.
  • the image recording layer may contain an infrared absorber (also simply referred to as “infrared absorber”) other than the color-developing compound.
  • the infrared absorber is not particularly limited, and examples thereof include pigments and dyes.
  • the dye used as the infrared absorber a commercially available dye and, for example, a known dye described in a document such as "Dye Handbook" (edited by the Society of Synthetic Organic Chemistry, published in 1970) can be used.
  • dyes such as azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, and metal thiolate complexes.
  • azo dyes such as azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, and metal thiolate complexes.
  • dyes particularly preferable ones include cyanine pigments, squarylium pigments, pyrylium salts, nickel thiolate complexes, and indolenin cyanine pigments. Further, cyanine pigments and indorenin cyanine pigments can be mentioned. Of these, the cyanine pigment is particularly preferable.
  • the infrared absorber is preferably a cationic polymethine dye having an oxygen or nitrogen atom at the meso position.
  • Preferred examples of the cationic polymethine pigment include cyanine pigments, pyrylium pigments, thiopyrylium pigments, and azulenium pigments, and cyanine pigments are preferable from the viewpoints of availability, solvent solubility at the time of introduction reaction, and the like.
  • the cyanine dye include the compounds described in paragraphs 0017 to 0019 of JP-A-2001-133769, paragraphs 0016 to 0021 of JP-A-2002-0233360, and paragraphs 0012 to 0037 of JP-A-2002-040638.
  • the compounds described in paragraphs 0034 to 0041 of JP-A-2002-278057, paragraphs 0080-0086 of JP-A-2008-195018, and particularly preferably paragraphs 0035 of JP-A-2007-90850 examples thereof include the compounds described in Japanese Patent Application Laid-Open No. 2012-206495, and the compounds described in paragraphs 0105 to 0113 of JP2012-206495A.
  • the compounds described in paragraphs 0008 to 0009 of JP-A-5-5005 and paragraphs 0022 to 0025 of JP-A-2001-222101 can also be preferably used.
  • the compounds described in paragraphs 0072 to 0076 of JP-A-2008-195018 are preferable.
  • infrared absorber Only one type of infrared absorber may be used, or two or more types may be used in combination. Further, a pigment and a dye may be used in combination as an infrared absorber.
  • the content of the infrared absorber in the image recording layer is preferably 0.1% by mass to 10.0% by mass, more preferably 0.5% by mass to 5.0% by mass, based on the total mass of the image recording layer. preferable.
  • the image recording layer preferably contains an acid color former. Further, the acid color former preferably contains a leuco compound.
  • the "acid color former" used in the present disclosure has a property of developing or decoloring and changing the color of the image recording layer by heating in a state of receiving an electron-accepting compound (for example, a proton such as an acid). Means a compound.
  • the acid color former has a partial skeleton such as lactone, lactam, salton, spiropyrane, ester, and amide, and when it comes into contact with an electron-accepting compound, these partial skeletons are rapidly ring-opened or cleaved. Compounds are preferred.
  • Examples of such acid color formers are 3,3-bis (4-dimethylaminophenyl) -6-dimethylaminophthalide (referred to as "crystal violet lactone") and 3,3-bis (4).
  • -Dimethylaminophenyl) phthalide 3- (4-dimethylaminophenyl) -3- (4-diethylamino-2-methylphenyl) -6-dimethylaminophthalide, 3- (4-dimethylaminophenyl) -3- ( 1,2-dimethylindole-3-yl) phthalide, 3- (4-dimethylaminophenyl) -3- (2-methylindole-3-yl) phthalide, 3,3-bis (1,2-dimethylindole-) 3-yl) -5-dimethylaminophthalide, 3,3-bis (1,2-dimethylindole-3-yl) -6-dimethylaminophthalide, 3,3-bis (9-ethy
  • the acid color former used in the present disclosure is at least one compound selected from the group consisting of a spiropyran compound, a spirooxazine compound, a spirolactone compound, and a spirolactam compound from the viewpoint of color development.
  • a spiropyran compound a spirooxazine compound, a spirolactone compound, and a spirolactam compound from the viewpoint of color development.
  • the hue of the dye after color development is preferably green, blue or black from the viewpoint of visibility.
  • the acid color former is preferably a leuco dye from the viewpoint of color development and visibility of the exposed portion.
  • the leuco dye is not particularly limited as long as it has a leuco structure, but preferably has a spiro structure, and more preferably has a spirolactone ring structure.
  • the leuco dye is preferably a leuco dye having a phthalide structure or a fluorane structure from the viewpoint of color development and visibility of the exposed portion.
  • the leuco dye having a phthalide structure or a fluorine structure is a compound represented by any of the following formulas (Le-1) to (Le-3) from the viewpoint of color development and visibility of the exposed portion. It is more preferable that the compound is represented by the following formula (Le-2).
  • each ERG independently represents an electron donating group
  • each X 1 ⁇ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group
  • X 5 to X 10 independently represent a hydrogen atom, a halogen atom or a monovalent organic group
  • Y 1 and Y 2 independently represent C or N, and when Y 1 is N, If X 1 does not exist and Y 2 is N, then X 4 does not exist
  • Ra 1 represents a hydrogen atom, an alkyl group or an alkoxy group
  • Rb 1 to Rb 4 are independent hydrogen atoms.
  • the electron donating groups in the ERGs of the formulas (Le-1) to (Le-3) include amino groups, alkylamino groups, arylamino groups, and dialkylaminos from the viewpoint of color development and visibility of the exposed area.
  • a group, a monoalkyl monoarylamino group, a diarylamino group, an alkoxy group, an aryloxy group, or an alkyl group is preferable, and an amino group, an alkylamino group, an arylamino group, a dialkylamino group, or a monoalkyl monoarylamino group.
  • Formula (Le-1) ⁇ formula each X 1 ⁇ X 4 is in (Le-3) independently chromogenic, and, from the viewpoint of visibility of the exposure unit, a hydrogen atom, or, be a chlorine atom preferably , A hydrogen atom is more preferable.
  • X 5 to X 10 in the formula (Le-2) or the formula (Le-3) are independently, from the viewpoint of color development and visibility of the exposed part, hydrogen atom, halogen atom, alkyl group, aryl group, respectively.
  • a hydrogen atom is particularly preferable. It is preferable that at least one of Y 1 and Y 2 in the formulas (Le-1) to (Le-3) is C from the viewpoint of color development and visibility of the exposed portion, and Y 1 and Y are Y. It is more preferable that both of 2 are C.
  • Ra 1 in the formulas (Le-1) to (Le-3) is preferably an alkyl group or an alkoxy group, and more preferably an alkoxy group, from the viewpoint of color development and visibility of the exposed portion. It is preferably a methoxy group, and particularly preferably a methoxy group.
  • Rb 1 to Rb 4 in the formulas (Le-1) to (Le-3) are each independently preferably a hydrogen atom or an alkyl group from the viewpoint of color development and visibility of the exposed part, and are alkyl. It is more preferably a group, and particularly preferably a methyl group.
  • the leuco dye having the phthalide structure or the fluorane structure has the following formulas (Le-4) to the following formulas (Le-4) from the viewpoint of color development and visibility of the exposed portion. It is more preferably a compound represented by any of Le-6), and further preferably a compound represented by the following formula (Le-5).
  • each ERG independently represents an electron donating group
  • each X 1 ⁇ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group
  • Y 1 and Y 2 independently represent C or N, and if Y 1 is N, then X 1 does not exist, and if Y 2 is N, then X 4 does not exist and Ra.
  • 1 represents a hydrogen atom, an alkyl group or an alkoxy group
  • Rb 1 to Rb 4 independently represent a hydrogen atom, an alkyl group or an aryl group.
  • the leuco dye having the phthalide structure or the fluorane structure has the following formulas (Le-7) to the following formulas (Le-7) to the leuco dye having the phthalide structure or the fluorane structure from the viewpoint of color development and visibility of the exposed portion. It is more preferably a compound represented by any of Le-9), and particularly preferably a compound represented by the following formula (Le-8).
  • each X 1 ⁇ X 4 is independently a hydrogen atom, a halogen atom or a dialkyl anilino group
  • Y 1 and Y 2 are each independently, C or Representing N, when Y 1 is N, X 1 does not exist, when Y 2 is N, X 4 does not exist
  • Ra 1 to Ra 4 independently represent a hydrogen atom and an alkyl.
  • Rb 1 to Rb 4 independently represent a hydrogen atom, an alkyl group or an aryl group
  • Rc 1 and Rc 2 each independently represent an aryl group.
  • Ra 1 to Ra 4 in the formulas (Le-7) to (Le-9) are each independently preferably an alkyl group or an alkoxy group from the viewpoint of color development and visibility of the exposed portion, and are alkoxy groups. It is more preferably a group, and particularly preferably a methoxy group.
  • Rb 1 to Rb 4 in the formulas (Le-7) to (Le-9) are independently each of a hydrogen atom, an alkyl group, an alkyl group or an alkoxy from the viewpoint of color development and visibility of the exposed part.
  • the group is preferably an aryl group substituted, more preferably a hydrogen atom or an alkyl group, and particularly preferably a hydrogen atom or a methyl group.
  • Each of Rc 1 and Rc 2 in the formula (Le-8) is preferably a phenyl group or an alkylphenyl group, and is preferably a phenyl group, independently from the viewpoint of color development and visibility of the exposed portion. Is more preferable.
  • X 1 to X 4 are hydrogen atoms and Y 1 and Y 2 are C.
  • Rb 1 and Rb 2 are independently substituted with hydrogen atoms, alkyl groups, alkyl groups or alkoxy groups, respectively. It is preferably an aryl group, more preferably a hydrogen atom or an alkyl group.
  • the alkyl group in the formulas (Le-1) to (Le-9) may be linear, have a branch, or have a ring structure. Further, the number of carbon atoms of the alkyl group in the formulas (Le-1) to (Le-9) is preferably 1 to 20, more preferably 1 to 8, and further preferably 1 to 4. It is preferably 1 or 2, and particularly preferably 1. The number of carbon atoms of the aryl group in the formulas (Le-1) to (Le-9) is preferably 6 to 20, more preferably 6 to 10, and particularly preferably 6 to 8.
  • each group such as a monovalent organic group, an alkyl group, an aryl group, a dialkylanilino group, an alkylamino group and an alkoxy group in the formulas (Le-1) to (Le-9) has a substituent.
  • substituents include alkyl groups, aryl groups, halogen atoms, amino groups, alkylamino groups, arylamino groups, dialkylamino groups, monoalkyl monoarylamino groups, diallylamino groups, hydroxy groups, alkoxy groups, aryloxy groups and acyls. Examples thereof include a group, an alkoxycarbonyl group, an aryloxycarbonyl group, and a cyano group. Further, these substituents may be further substituted with these substituents.
  • Examples of the leuco dye having a phthalide structure or a fluorine structure that are preferably used include the following compounds.
  • examples of the leuco dye preferably used include the following compounds.
  • ETAC, S-205, BLACK305, BLACK400, BLACK100, BLACK500, H-7001, GREEN300, NIRBLACK78, H-3035, ATP, H-1046, H-2114, GREEN-DCF, Blue-63. , GN-169, and crystal violet lactone are preferable because the film to be formed has a good visible light absorption rate.
  • the acid color formers may be used alone or in combination of two or more.
  • the content of the acid color former is preferably 0.5% by mass to 10% by mass, and more preferably 1% by mass to 5% by mass, based on the total mass of the image recording layer.
  • the image recording layer used in the present disclosure may contain a chain transfer agent.
  • the chain transfer agent contributes to the improvement of printing durability in the lithographic printing plate.
  • a thiol compound is preferable, a thiol having 7 or more carbon atoms is more preferable from the viewpoint of boiling point (difficulty in volatilization), and a compound having a mercapto group on the aromatic ring (aromatic thiol compound) is further preferable.
  • the thiol compound is preferably a monofunctional thiol compound.
  • chain transfer agent examples include the following compounds.
  • the chain transfer agent may contain only one type or a combination of two or more types.
  • the content of the chain transfer agent is preferably 0.01% by mass to 50% by mass, more preferably 0.05% by mass to 40% by mass, and 0.1% by mass to 30% by mass with respect to the total mass of the image recording layer. % Is more preferable.
  • the image recording layer may contain a fat-sensing agent such as a phosphonium compound, a nitrogen-containing small molecule compound, and an ammonium group-containing polymer in order to improve the meat-forming property.
  • a fat-sensing agent such as a phosphonium compound, a nitrogen-containing small molecule compound, and an ammonium group-containing polymer in order to improve the meat-forming property.
  • these compounds function as a surface coating agent for the inorganic layered compound, and it is possible to suppress a decrease in inking property during printing due to the inorganic layered compound.
  • the fat sensitive agent it is preferable to use a phosphonium compound, a nitrogen-containing low molecular weight compound, and an ammonium group-containing polymer in combination, and the phosphonium compound, a quaternary ammonium salt, and an ammonium group-containing polymer are used in combination. Is more preferable.
  • nitrogen-containing small molecule compounds examples include amine salts and quaternary ammonium salts. Further, imidazolinium salts, benzoimidazolinium salts, pyridinium salts, quinolinium salts and the like can also be mentioned. Of these, quaternary ammonium salts and pyridinium salts are preferable.
  • tetramethylammonium hexafluorophosphate
  • tetrabutylammonium hexafluorophosphate
  • dodecyltrimethylammonium p-toluenesulfonate
  • benzyltriethylammonium hexafluorophosphate
  • benzyldimethyloctylammonium hexafluorophosphate.
  • Examples thereof include fert, benzyldimethyldodecylammonium-hexafluorophosphate, compounds described in paragraphs 0021 to 0037 of JP-A-2008-284858 and paragraphs 0030 to 0057 of JP-A-2009-90645.
  • the ammonium group-containing polymer may have an ammonium group in its structure, and a polymer containing 5 mol% to 80 mol% of a (meth) acrylate having an ammonium group in the side chain as a copolymerization component is preferable.
  • Specific examples include the polymers described in paragraphs 0008-0105 of JP2009-208458A.
  • the ammonium salt-containing polymer preferably has a reduction specific viscosity (unit: ml / g) value in the range of 5 to 120, which is obtained according to the measurement method described in JP-A-2009-208458, and is in the range of 10 to 110. Is more preferable, and those in the range of 15 to 100 are particularly preferable.
  • Mw weight average molecular weight
  • the content of the oil-sensitive agent is preferably 0.01% by mass to 30.0% by mass, more preferably 0.1% by mass to 15.0% by mass, and 1% by mass with respect to the total mass of the image recording layer. % To 10% by mass is more preferable.
  • the image recording layer may contain a surfactant, a polymerization inhibitor, a higher fatty acid derivative, a plasticizer, an inorganic layered compound and the like as other components.
  • a surfactant e.g., a surfactant, a polymerization inhibitor, a higher fatty acid derivative, a plasticizer, an inorganic layered compound and the like.
  • the image recording layer in the lithographic printing plate original plate according to the present disclosure is coated by dispersing or dissolving each of the above-mentioned necessary components in a known solvent. It can be formed by preparing a liquid, applying the coating liquid on the support by a known method such as coating with a bar coater, and drying. As the solvent, a known solvent can be used.
  • the solvent may be used alone or in combination of two or more.
  • the solid content concentration in the coating liquid is preferably about 1 to 50% by mass.
  • the coating amount (solid content) of the image recording layer after coating and drying varies depending on the application, but from the viewpoint of obtaining good sensitivity and good film characteristics of the image recording layer, 0.3 g / m 2 to 3.0 g / m 2 is preferred.
  • the support in the lithographic printing plate original plate according to the present disclosure can be appropriately selected from known hydrophilic supports for lithographic printing plate original plates and used.
  • an aluminum support is preferable.
  • an aluminum support having a hydrophilic surface (hereinafter, also referred to as “hydrophilic aluminum support”) is preferable.
  • a hydrophilic support is preferably mentioned.
  • the aluminum support in the lithographic printing plate original according to the present disclosure has a contact angle with water on the surface of the aluminum support on the image recording layer side by the aerial water droplet method of 110 ° or less from the viewpoint of suppressing scratches and stains.
  • the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side shall be measured by the following method.
  • the plate printing plate original plate is immersed in a solvent capable of removing the image recording layer (for example, the solvent used in the coating liquid for the image recording layer), the image recording layer is scraped off at least one of the sponge and cotton, and the image recording layer is used as a solvent.
  • the surface of the aluminum support is exposed by dissolving in it.
  • the contact angle with water on the surface of the exposed aluminum support on the image recording layer side is measured on the surface at 25 ° C. by a fully automatic contact angle meter (for example, DM-501 manufactured by Kyowa Surface Chemical Co., Ltd.) as a measuring device. It is measured as the contact angle of water droplets (after 0.2 seconds).
  • the aluminum support in the present disclosure an aluminum plate that has been roughened and anodized by a known method is preferable. That is, the aluminum support in the present disclosure preferably has an aluminum plate and an aluminum anodic oxide film arranged on the aluminum plate.
  • the support (1) has an aluminum plate and an anodic oxide film of aluminum arranged on the aluminum plate, and the anodic oxide film is located closer to the image recording layer than the aluminum plate.
  • the anodic oxide film has micropores extending in the depth direction from the surface on the image recording layer side, and the average diameter of the micropores on the surface of the anodic oxide film is more than 10 nm and 100 nm or less, and the anodic oxidation.
  • the value of the brightness L * in the L * a * b * color system of the surface of the film on the image recording layer side is 70 to 100.
  • FIG. 3 is a schematic cross-sectional view of an embodiment of the aluminum support 12a.
  • the aluminum support 12a has a laminated structure in which an aluminum plate 18 and an aluminum anodic oxide film 20a (hereinafter, also simply referred to as “anodized film 20a”) are laminated in this order.
  • the anodic oxide film 20a in the aluminum support 12a is located closer to the image recording layer than the aluminum plate 18. That is, it is preferable that the planographic printing plate original plate according to the present disclosure has at least an anodic oxide film, an image recording layer, and a water-soluble resin layer on an aluminum plate in this order.
  • the anodic oxide film 20a is a film formed on the surface of the aluminum plate 18 by anodization treatment, and this film is extremely fine micropores 22a which are substantially perpendicular to the surface of the film and are uniformly distributed to each individual.
  • the micropore 22a extends from the surface of the anodic oxide film 20a on the image recording layer side (the surface of the anodic oxide film 20a on the side opposite to the aluminum plate 18 side) along the thickness direction (aluminum plate 18 side).
  • the average diameter (average opening diameter) of the micropores 22a in the anodic oxide film 20a on the surface of the anodic oxide film is preferably more than 10 nm and 100 nm or less. Among them, from the viewpoint of the balance between printing resistance, stain resistance, and image visibility, 15 nm to 60 nm is more preferable, 20 nm to 50 nm is further preferable, and 25 nm to 40 nm is particularly preferable.
  • the diameter inside the pores may be wider or narrower than the surface layer. If the average diameter exceeds 10 nm, the printing resistance and image visibility are further excellent. Further, when the average diameter is 100 nm or less, the printing durability is further excellent.
  • the average diameter of the micropores 22a is 400 nm ⁇ 600 nm in the four images obtained by observing the surface of the anodized film 20a with a field emission scanning electron microscope (FE-SEM) at a magnification of 150,000.
  • the diameter (diameter) of the microscopes existing in the range of is measured at 50 points and calculated as an arithmetic mean value. If the shape of the micropore 22a is not circular, the diameter equivalent to the circle is used.
  • the "circle equivalent diameter” is the diameter of a circle when the shape of the opening is assumed to be a circle having the same projected area as the projected area of the opening.
  • the depth of the micropore 22a is not particularly limited, but is preferably 10 nm to 3,000 nm, more preferably 50 nm to 2,000 nm, and even more preferably 300 nm to 1,600 nm.
  • the depth is an average value obtained by taking a photograph (150,000 times) of the cross section of the anodic oxide film 20a and measuring the depths of 25 or more micropores 22a.
  • the shape of the micropore 22a is not particularly limited, and in FIG. 1, it is a substantially straight tubular (substantially cylindrical) shape, but it may be a conical shape whose diameter decreases in the depth direction (thickness direction).
  • the shape of the bottom of the micropore 22a is not particularly limited, and may be curved (convex) or flat.
  • the value of L * a * b * lightness L * in the color system of the surface of the aluminum support 12a on the image recording layer side (the surface of the anodic oxide film 20a on the image recording layer side) is preferably 70 to 100. .. Among them, 75 to 100 is preferable, and 75 to 90 is more preferable, in that the balance between printing resistance and image visibility is more excellent.
  • the brightness L * is measured using a color difference meter Specro Eye manufactured by X-Rite Co., Ltd.
  • the micropore communicates with the large-diameter hole extending from the surface of the anodic oxide film to a depth of 10 nm to 1,000 nm and the bottom of the large-diameter hole, and is deep from the communication position. It is composed of a small-diameter hole extending from 20 nm to 2,000 nm, and the average diameter of the large-diameter hole on the surface of the anodic oxide film is 15 nm to 150 nm, and the average diameter of the small-diameter hole at the communication position.
  • a mode in which the diameter is 13 nm or less (hereinafter, the support according to the above mode is also referred to as “support (2)”) is also preferably mentioned.
  • support (2) is also preferably mentioned.
  • the aluminum support 12b includes an aluminum plate 18 and an anodic oxide film 20b having a micropore 22b composed of a large-diameter hole portion 24 and a small-diameter hole portion 26.
  • the micropores 22b in the anodic oxide film 20b communicate with the large-diameter hole portion 24 extending from the surface of the anodic oxide film to a position at a depth of 10 nm to 1000 nm (depth D: see FIG. 4) and the bottom of the large-diameter hole portion 24.
  • the large-diameter hole portion 24 and the small-diameter hole portion 26 will be described in detail below.
  • the average diameter of the large-diameter pore portion 24 on the surface of the anodic oxide film 20b is the same as the average diameter of the micropores 22a in the above-mentioned anodic oxide film 20a on the surface of the anodic oxide film, which is more than 10 nm and 100 nm or less, and the preferable range is also the same. Is.
  • the method for measuring the average diameter on the surface of the anodic oxide film 20b of the large-diameter hole portion 24 is the same as the method for measuring the average diameter on the surface of the anodic oxide film of the micropores 22a in the anodic oxide film 20a.
  • the bottom of the large-diameter hole portion 24 is located at a depth of 10 nm to 1,000 nm (hereinafter, also referred to as a depth D) from the surface of the anodic oxide film. That is, the large-diameter hole portion 24 is a hole portion extending from the surface of the anodic oxide film to a position of 10 nm to 1,000 nm in the depth direction (thickness direction).
  • the depth is preferably 10 nm to 200 nm.
  • the depth is an average value obtained by taking a photograph (150,000 times) of the cross section of the anodic oxide film 20b, measuring the depths of 25 or more large-diameter hole portions 24, and averaging them.
  • the shape of the large-diameter hole portion 24 is not particularly limited, and examples thereof include a substantially straight tubular shape (substantially cylindrical) and a conical shape whose diameter decreases in the depth direction (thickness direction). preferable.
  • the small-diameter hole portion 26 is a hole portion that communicates with the bottom portion of the large-diameter hole portion 24 and extends further in the depth direction (thickness direction) from the communication position.
  • the average diameter of the small-diameter hole portion 26 at the communication position is preferably 13 nm or less. Above all, 11 nm or less is preferable, and 10 nm or less is more preferable.
  • the lower limit is not particularly limited, but it is often 5 nm or more.
  • the surface may be observed with the above-mentioned FE-SEM to obtain the average diameter of the small-diameter holes. If the shape of the small-diameter hole portion 26 is not circular, the diameter equivalent to a circle is used.
  • the "circle equivalent diameter” is the diameter of a circle when the shape of the opening is assumed to be a circle having the same projected area as the projected area of the opening.
  • the bottom portion of the small-diameter hole portion 26 is located at a position extending 20 nm to 2,000 nm in the depth direction from the communication position with the large-diameter hole portion 24.
  • the small-diameter hole portion 26 is a hole portion that extends further in the depth direction (thickness direction) from the communication position with the large-diameter hole portion 24, and the depth of the small-diameter hole portion 26 is 20 nm to 2,000 nm. ..
  • the depth is preferably 500 nm to 2,000 nm.
  • the depth is an average value obtained by taking a photograph (50,000 times) of the cross section of the anodic oxide film 20b and measuring the depths of 25 or more small-diameter holes.
  • the shape of the small-diameter hole portion 26 is not particularly limited, and examples thereof include a substantially straight tubular shape (substantially cylindrical) and a conical shape whose diameter decreases in the depth direction, and a substantially straight tubular shape is preferable.
  • -Manufacturing method of aluminum support As a method for manufacturing the aluminum support used in the present disclosure, for example, a manufacturing method in which the following steps are sequentially performed is preferable.
  • -Roughening treatment step Roughening treatment of aluminum plate-Anodizing treatment step: Anodizing the roughened aluminum plate-Pore wide treatment step: Anodizing obtained in the anodizing treatment step Step of bringing an aluminum plate having an oxide film into contact with an acid aqueous solution or an alkaline aqueous solution to increase the diameter of micropores in the anodized film
  • -Roughening treatment step Roughening treatment of aluminum plate-Anodizing treatment step: Anodizing the roughened aluminum plate-Pore wide treatment step: Anodizing obtained in the anodizing treatment step Step of bringing an aluminum plate having an oxide film into contact with an acid aqueous solution or an alkaline aqueous solution to increase the diameter of micropores in the anodized film.
  • the roughening treatment step is a step of applying a roughening treatment including an electrochemical roughening treatment to the surface of the aluminum plate. This step is preferably carried out before the anodizing treatment step described later, but it may not be carried out in particular as long as the surface of the aluminum plate already has a preferable surface shape.
  • the roughening treatment may be carried out only by the electrochemical roughening treatment, but is carried out by combining the electrochemical roughening treatment with the mechanical roughening treatment and / or the chemical roughening treatment. You may.
  • the electrochemical roughening treatment is preferably carried out using direct current or alternating current in an aqueous solution mainly containing nitric acid or hydrochloric acid.
  • the method of mechanical roughening treatment is not particularly limited, and examples thereof include the methods described in Japanese Patent Publication No. 50-40047.
  • the chemical roughening treatment is also not particularly limited, and known methods can be mentioned.
  • the chemical etching treatment applied after the mechanical roughening treatment smoothes the uneven edges on the surface of the aluminum plate, prevents ink from getting caught during printing, and improves the stain resistance of the printing plate. , It is performed to remove unnecessary substances such as abrasive particles remaining on the surface.
  • Examples of the chemical etching treatment include etching with an acid and etching with an alkali, and as a method particularly excellent in terms of etching efficiency, a chemical etching treatment using an alkaline aqueous solution (hereinafter, also referred to as “alkali etching treatment”) can be mentioned. Be done.
  • the alkaline agent used in the alkaline aqueous solution is not particularly limited, and examples thereof include caustic soda, caustic potash, sodium metasilicate, sodium carbonate, sodium aluminate, and sodium gluconate.
  • the alkaline aqueous solution may contain aluminum ions.
  • the concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.01% by mass or more, more preferably 3% by mass or more, and preferably 30% by mass or less.
  • the alkaline etching treatment When the alkaline etching treatment is performed, it is preferable to perform a chemical etching treatment (hereinafter, also referred to as "desmat treatment") using a low-temperature acidic aqueous solution in order to remove the product generated by the alkaline etching treatment.
  • the acid used in the acidic aqueous solution is not particularly limited, and examples thereof include sulfuric acid, nitric acid, and hydrochloric acid.
  • the temperature of the acidic aqueous solution is preferably 20 ° C to 80 ° C.
  • the roughening treatment step a method in which the treatments shown in the A mode or the B mode are carried out in the order shown below is preferable.
  • (1) mechanical roughening treatment may be carried out before the treatment of (2) of the above A aspect or before the treatment of (10) of the B aspect.
  • the amount of the aluminum plate dissolved in the first alkali etching treatment and the fourth alkali etching treatment is preferably 0.5 g / m 2 to 30 g / m 2, and more preferably 1.0 g / m 2 to 20 g / m 2 .
  • Examples of the nitric acid-based aqueous solution used in the first electrochemical roughening treatment in the A aspect include an aqueous solution used in the electrochemical roughening treatment using direct current or alternating current.
  • an aqueous solution obtained by adding aluminum nitrate, sodium nitrate, ammonium nitrate or the like to an aqueous nitric acid solution of 1 to 100 g / L can be mentioned.
  • the aqueous solution mainly containing hydrochloric acid used in the second electrochemical roughening treatment in the A aspect and the third electrochemical roughening treatment in the B aspect the electrochemical rough surface using ordinary direct current or alternating current is used. Examples thereof include an aqueous solution used for the chemical treatment.
  • an aqueous solution obtained by adding 0 g / L to 30 g / L of sulfuric acid to a 1 g / L to 100 g / L hydrochloric acid aqueous solution can be mentioned.
  • Nitrate ions such as aluminum nitrate, sodium nitrate, and ammonium nitrate;
  • hydrochloric acid ions such as aluminum chloride, sodium chloride, and ammonium chloride may be further added to this solution.
  • FIG. 5 is a graph showing an example of an alternating waveform current waveform diagram used in the electrochemical roughening process.
  • ta is the anode reaction time
  • ct is the cathode reaction time
  • tp is the time from 0 to the peak of the current
  • Ia is the peak current on the anode cycle side
  • Ic is the peak current on the cathode cycle side.
  • AA is the current of the anode reaction of the aluminum plate
  • CA is the current of the cathode reaction of the aluminum plate.
  • the time tp from 0 to the peak of the current is preferably 1 ms to 10 ms.
  • the conditions for one cycle of AC used for electrochemical roughening are that the ratio ct / ta of the anode reaction time ta and the cathode reaction time ct of the aluminum plate is 1 to 20, and the amount of electricity Qc and the anode when the aluminum plate is the anode.
  • the ratio Qc / Qa of the amount of electricity Qa at the time is in the range of 0.3 to 20 and the anode reaction time ta is in the range of 5 ms to 1,000 ms.
  • the current density is the peak value of the trapezoidal wave, and is preferably 10 A / dm 2 to 200 A / dm 2 for both the anode cycle side Ia and the cathode cycle side Ic of the current.
  • Ic / Ia is preferably 0.3 to 20.
  • the total amount of electricity furnished to anode reaction of the aluminum plate at the time the electrochemical graining is completed, 25C / dm 2 ⁇ 1,000C / dm 2 is preferred.
  • FIG. 6 is a side view showing an example of a radial cell in an electrochemical roughening treatment using alternating current.
  • 50 is a main electrolytic cell
  • 51 is an AC power supply
  • 52 is a radial drum roller
  • 53a and 53b are main poles
  • 54 is an electrolyte supply port
  • 55 is an electrolyte
  • 56 is a slit
  • 57 is an electrolyte passage
  • 58 is an auxiliary anode
  • 60 is an auxiliary anode tank
  • W is an aluminum plate.
  • the arrow A1 indicates the supply direction of the electrolytic solution
  • the arrow A2 indicates the discharge direction of the electrolytic solution.
  • the electrolysis conditions may be the same or different.
  • the aluminum plate W is wound around a radial drum roller 52 immersed in the main electrolytic cell 50 and is electrolyzed by the main poles 53a and 53b connected to the AC power supply 51 during the transfer process.
  • the electrolytic solution 55 is supplied from the electrolytic solution supply port 54 to the electrolytic solution passage 57 between the radial drum roller 52 and the main poles 53a and 53b through the slit 56.
  • the aluminum plate W treated in the main electrolytic cell 50 is then electrolyzed in the auxiliary anode tank 60.
  • An auxiliary anode 58 is arranged to face the aluminum plate W in the auxiliary anode tank 60, and the electrolytic solution 55 is supplied so as to flow in the space between the auxiliary anode 58 and the aluminum plate W.
  • the amount of the aluminum plate dissolved in the second alkaline etching treatment is preferably 1.0 g / m 2 or more, and more preferably 2.0 g / m 2 to 10 g / m 2 in that a predetermined printing plate original plate can be easily produced.
  • the amount of the aluminum plate dissolved in the third alkali etching treatment and the fourth alkali etching treatment is preferably 0.01 g / m 2 to 0.8 g / m 2 and 0.05 g in that a predetermined printing plate original plate can be easily produced.
  • / M 2 to 0.3 g / m 2 is more preferable.
  • an acidic aqueous solution containing phosphoric acid, nitric acid, sulfuric acid, chromium acid, hydrochloric acid, or a mixed acid containing two or more of these acids is preferably used.
  • the acid concentration of the acidic aqueous solution is preferably 0.5% by mass to 60% by mass.
  • the procedure of the anodizing treatment step is not particularly limited as long as the above-mentioned micropores can be obtained, and known methods can be mentioned.
  • aqueous solutions of sulfuric acid, phosphoric acid, oxalic acid and the like can be used as the electrolytic bath.
  • the concentration of sulfuric acid is 100 g / L to 300 g / L.
  • the conditions for the anodic oxidation treatment are appropriately set depending on the electrolytic solution used.
  • the liquid temperature is 5 ° C. to 70 ° C. (preferably 10 ° C. to 60 ° C.), and the current density is 0.5 A / dm 2 to 60 A / dm 2.
  • the pore-wide treatment is a treatment (pore diameter enlargement treatment) for enlarging the diameter (pore diameter) of the micropores existing in the anodizing film formed by the above-mentioned anodizing treatment step.
  • the pore-wide treatment can be performed by bringing the aluminum plate obtained by the above-mentioned anodizing treatment step into contact with an acid aqueous solution or an alkaline aqueous solution.
  • the contact method is not particularly limited, and examples thereof include a dipping method and a spraying method.
  • the planographic printing plate original plate according to the present disclosure preferably has a protective layer (sometimes referred to as an overcoat layer) on the image recording layer.
  • the protective layer preferably contains a color-developing compound having a group that cleaves by heat or infrared exposure.
  • a preferred embodiment of the color-developing compound having a group that cleaves by heat or infrared exposure in the protective layer is a preferred embodiment of the color-developing compound having a group that cleaves by heat or infrared exposure in the image recording layer, except for the following aspects. Is similar to.
  • the protective layer preferably contains a support-adsorbing compound having a molecular weight of 1,000 or less from the viewpoint of edge stain suppression and on-machine developability.
  • the preferred embodiment of the support-adsorbing compound having a molecular weight of 1,000 or less in the protective layer is the same as the preferred embodiment of the support-adsorbing compound having a molecular weight of 1,000 or less in the image recording layer, except for the following aspects. ..
  • the protective layer is not particularly limited, but a protective layer having a function of suppressing an image formation inhibitory reaction by blocking oxygen, a function of preventing scratches on the image recording layer, and a function of preventing ablation during high-illuminance laser exposure. Can be mentioned.
  • Protective layers with such properties are described, for example, in US Pat. Nos. 3,458,311 and JP-A-55-49729.
  • the oxygen low-permeability polymer used for the protective layer either a water-soluble polymer or a water-insoluble polymer can be appropriately selected and used, and if necessary, two or more kinds may be mixed and used. can.
  • Specific examples thereof include polyvinyl alcohol, modified polyvinyl alcohol, polyvinylpyrrolidone, water-soluble cellulose derivatives, poly (meth) acrylonitrile, and the like.
  • the modified polyvinyl alcohol an acid-modified polyvinyl alcohol having a carboxy group or a sulfo group is preferably used.
  • Specific examples thereof include the modified polyvinyl alcohols described in JP-A-2005-250216 and JP-A-2006-259137.
  • the protective layer preferably contains an inorganic layered compound in order to enhance oxygen blocking property.
  • Inorganic laminar compound is a particle having a thin tabular shape, for example, natural mica, micas such as synthetic mica, wherein: talc represented by 3MgO ⁇ 4SiO ⁇ H 2 O, teniolite, montmorillonite, saponite, hectorite Examples include light, zirconium phosphate and the like.
  • the inorganic layered compound preferably used is a mica compound.
  • Examples of the mica compound include formula: A (B, C) 2-5 D 4 O 10 (OH, F, O) 2 [However, A is any of K, Na, Ca, and B and C are It is any of Fe (II), Fe (III), Mn, Al, Mg, and V, and D is Si or Al. ] Can be mentioned as a group of mica such as natural mica and synthetic mica.
  • natural mica includes muscovite, paragonite, phlogopite, biotite and lepidolite.
  • synthetic mica non-swelling mica such as fluorine gold mica KMg 3 (AlSi 3 O 10 ) F 2 , potash tetrasilicon mica KMg 2.5 Si 4 O 10 ) F 2 , and Na tetrasilic mica Namg 2.
  • the lattice layer causes a positive charge shortage, and in order to compensate for this, cations such as Li + , Na + , Ca 2+ , and Mg 2+ are adsorbed between the layers.
  • the cations intervening between these layers are called exchangeable cations and can be exchanged with various cations.
  • the bond between the layered crystal lattices is weak because the ionic radius is small, and the cations swell greatly with water.
  • Swellable synthetic mica has a strong tendency to do so and is particularly preferably used.
  • the aspect ratio is preferably 20 or more, more preferably 100 or more, and particularly preferably 200 or more.
  • the aspect ratio is the ratio of the major axis to the thickness of the particles, which can be measured, for example, from a micrograph projection of the particles. The larger the aspect ratio, the greater the effect obtained.
  • the average major axis of the mica compound is preferably 0.3 ⁇ m to 20 ⁇ m, more preferably 0.5 ⁇ m to 10 ⁇ m, and particularly preferably 1 ⁇ m to 5 ⁇ m.
  • the average thickness of the particles is preferably 0.1 ⁇ m or less, more preferably 0.05 ⁇ m or less, and particularly preferably 0.01 ⁇ m or less.
  • the preferred embodiment is such that the thickness is about 1 nm to 50 nm and the surface size (major axis) is about 1 ⁇ m to 20 ⁇ m.
  • the content of the inorganic layered compound is preferably 1% by mass to 60% by mass, more preferably 3% by mass to 50% by mass, based on the total solid content of the protective layer. Even when a plurality of types of inorganic layered compounds are used in combination, it is preferable that the total amount of the inorganic layered compounds is the above-mentioned content. Oxygen blocking property is improved in the above range, and good sensitivity can be obtained. In addition, it is possible to prevent a decrease in meat-forming property.
  • the protective layer may contain known additives such as a plasticizer for imparting flexibility, a surfactant for improving coatability, and inorganic particles for controlling the slipperiness of the surface.
  • a plasticizer for imparting flexibility such as acrylic acid, acrylic acid, and styrene foam, and the like.
  • the protective layer is applied by a known method.
  • the coating amount of the protective layer (solid content) is preferably from 0.01g / m 2 ⁇ 10g / m 2, more preferably 0.02g / m 2 ⁇ 3g / m 2, 0.02g / m 2 ⁇ 1g / m 2 is particularly preferable.
  • the planographic printing plate original plate according to the present disclosure preferably has an undercoat layer (sometimes referred to as an intermediate layer) between the image recording layer and the support.
  • the undercoat layer strengthens the adhesion between the support and the image recording layer in the exposed portion, and makes it easy for the image recording layer to peel off from the support in the unexposed portion, so that the developability is not impaired without impairing the printing resistance. Contributes to improving.
  • the undercoat layer functions as a heat insulating layer, so that the heat generated by the exposure is diffused to the support to prevent the sensitivity from being lowered.
  • Examples of the compound used for the undercoat layer include polymers having an adsorptive group and a hydrophilic group that can be adsorbed on the surface of the support.
  • a polymer having an adsorptive group and a hydrophilic group and further having a crosslinkable group is preferable in order to improve the adhesion to the image recording layer.
  • the compound used for the undercoat layer may be a small molecule compound or a polymer.
  • As the compound used for the undercoat layer two or more kinds may be mixed and used as needed.
  • the compound used for the undercoat layer is a polymer
  • a copolymer of a monomer having an adsorptive group, a monomer having a hydrophilic group, and a monomer having a crosslinkable group is preferable.
  • the adsorbable adsorptive group to the support surface a phenolic hydroxyl group, a carboxyl group, -PO 3 H 2, -OPO 3 H 2, -CONHSO 2 -, - SO 2 NHSO 2 -, - is COCH 2 COCH 3 preferable.
  • the hydrophilic group a sulfo group or a salt thereof, or a salt of a carboxy group is preferable.
  • the polymer may have a polar substituent of the polymer and a crosslinkable group introduced by salt formation with a substituent having a pair charge with the polar substituent and a compound having an ethylenically unsaturated bond.
  • a monomer other than the above, preferably a hydrophilic monomer, may be further copolymerized.
  • a phosphorus compound having a double bond reactive group is preferably used.
  • Crosslinkable groups preferably ethylenically unsaturated bonding groups
  • Low molecular weight or high molecular weight compounds having functional and hydrophilic groups that interact with the surface are also preferably used. More preferable are polymer polymers having an adsorptive group, a hydrophilic group and a crosslinkable group that can be adsorbed on the surface of the support described in JP-A-2005-125479 and JP-A-2006-188038.
  • the content of the ethylenically unsaturated bond group in the polymer used for the undercoat layer is preferably 0.1 mmol to 10.0 mmol, more preferably 0.2 mmol to 5.5 mmol per 1 g of the polymer.
  • the weight average molecular weight (Mw) of the polymer used for the undercoat layer is preferably 5,000 or more, and more preferably 10,000 to 300,000.
  • the undercoat layer preferably contains a hydrophilic compound from the viewpoint of developability.
  • the hydrophilic compound is not particularly limited, and a known hydrophilic compound used for the undercoat layer can be used. Further, the hydrophilic compound in the undercoat layer is preferably the support-adsorbing compound.
  • Preferred examples of the hydrophilic compound include phosphonic acids having an amino group such as carboxymethyl cellulose and dextrin, organic phosphonic acids, organic phosphoric acids, organic phosphinic acids, amino acids, and hydrochlorides of amines having a hydroxy group.
  • hydrophilic compound a compound having an amino group or a functional group having a polymerization prohibitive ability and a group interacting with the surface of the support (for example, 1,4-diazabicyclo [2.2.2] octane (DABCO)).
  • DABCO 1,4-diazabicyclo [2.2.2] octane
  • 2,3,5,6-tetrahydroxy-p-quinone, chloranyl, sulfophthalic acid, ethylenediaminetetraacetic acid (EDTA) or its salt, hydroxyethylethylenediaminetriacetic acid or its salt, dihydroxyethylethylenediaminediacetic acid or its salt, hydroxy Ethylenediaminediacetic acid or a salt thereof, etc. are preferably mentioned.
  • the hydrophilic compound preferably contains a hydroxycarboxylic acid or a salt thereof from the viewpoint of suppressing scratches and stains. Further, the hydrophilic compound, preferably a hydroxycarboxylic acid or a salt thereof, is preferably contained in the layer on the aluminum support from the viewpoint of suppressing scratches and stains. Further, the layer on the aluminum support is preferably a layer on the side where the image recording layer is formed, and is preferably a layer in contact with the aluminum support. As the layer on the aluminum support, an undercoat layer or an image recording layer is preferably mentioned as a layer in contact with the aluminum support.
  • a layer other than the layer in contact with the aluminum support for example, a protective layer or an image recording layer may contain a hydrophilic compound, preferably a hydroxycarboxylic acid or a salt thereof.
  • the image recording layer contains a hydroxycarboxylic acid or a salt thereof from the viewpoint of suppressing scratches and stains.
  • an embodiment in which the surface of the aluminum support on the image recording layer side is surface-treated with a composition containing at least hydroxycarboxylic acid or a salt thereof is also preferably mentioned. Be done.
  • At least a part of the treated hydroxycarboxylic acid or a salt thereof is detected in a state of being contained in a layer on the image recording layer side (for example, an image recording layer or an undercoat layer) in contact with an aluminum support.
  • a layer on the image recording layer side for example, an image recording layer or an undercoat layer
  • the surface of the aluminum support on the image recording layer side can be made hydrophilic, and the aluminum support can also be made hydrophilic.
  • the contact angle with water on the surface of the image recording layer side by the aerial water droplet method can be easily set to 110 ° or less, and the scratch and stain suppression property is excellent.
  • Hydroxycarboxylic acid is a general term for organic compounds having one or more carboxy groups and one or more hydroxy groups in one molecule, and is also called hydroxy acid, oxyic acid, oxycarboxylic acid, or alcoholic acid (). Iwanami Physics and Chemistry Dictionary 5th Edition, published by Iwanami Shoten Co., Ltd. (1998)).
  • the hydroxycarboxylic acid or a salt thereof is preferably represented by the following formula (HC).
  • R HC (OH) mhc ( COMM HC ) nhc type (HC)
  • R HC represents an organic group having a mhc + nhc valence
  • M HC each independently represents a hydrogen atom, an alkali metal or onium
  • mhc and nhc each independently represent an integer of 1 or more. When is 2 or more, M may be the same or different.
  • examples of the mhc + nhc valent organic group represented by R include a mhc + nhc valent hydrocarbon group.
  • the hydrocarbon group may have a substituent and / or a linking group.
  • a group having a mhc + nhc valence derived from an aliphatic hydrocarbon for example, an alkylene group, an alcantryyl group, an alkanetetrayl group, an alcantyl group, an alkenylene group, an arcentryyl group, an alkentetrayl group.
  • Mhc + nhc valent groups derived from aromatic hydrocarbons such as groups, alkenylpentyl groups, alkynylene groups, alkyntriyl groups, alkynetetrayl groups, alkynpentyl groups, etc., such as allylene groups, allenetriyl groups, allenes. Examples thereof include a tetrayl group and an arenepentile group. Examples of the substituent other than the hydroxyl group and the carboxyl group include an alkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group and the like.
  • substituents include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group and a hexadecyl group.
  • the linking group is composed of at least one atom selected from the group consisting of hydrogen atom, carbon atom, oxygen atom, nitrogen atom, sulfur atom and halogen atom, and the number of atoms is preferably 1 to 50. Is. Specific examples thereof include an alkylene group, a substituted alkylene group, an arylene group and a substituted arylene group, and a plurality of these divalent groups are linked by any of an amide bond, an ether bond, a urethane bond, a urea bond and an ester bond. It may have an esterified structure.
  • Examples of the alkali metal represented by MHC include lithium, sodium, potassium and the like, and sodium is particularly preferable.
  • Examples of onium include ammonium, phosphonium, sulfonium and the like, and ammonium is particularly preferable.
  • M HC from the viewpoint of scratch stain inhibitory, preferably an alkali metal or an onium, and more preferably an alkali metal.
  • the total number of mhc and nhc is preferably 3 or more, more preferably 3 to 8, and even more preferably 4 to 6.
  • the hydroxycarboxylic acid or a salt thereof preferably has a molecular weight of 600 or less, more preferably 500 or less, and particularly preferably 300 or less.
  • the molecular weight is preferably 76 or more.
  • the hydroxycarboxylic acid constituting the hydroxycarboxylic acid or the salt of the hydroxycarboxylic acid is gluconic acid, glycolic acid, lactic acid, tartron acid, hydroxybutyric acid (2-hydroxybutyric acid, 3-hydroxybutyric acid, ⁇ -Hydroxybutyric acid, etc.), malic acid, tartaric acid, citramal acid, citric acid, isocitrate, leucic acid, mevalonic acid, pantoic acid, ricinolic acid, ricineraidic acid, cerebronic acid, quinic acid, shikimic acid, monohydroxybenzoic acid derivative (Salicylic acid, cleosortic acid (homosalicylic acid, hydroxy (methyl) benzoic acid), vanil
  • hydroxycarboxylic acid or the hydroxycarboxylic acid constituting the salt of the hydroxycarboxylic acid a compound having two or more hydroxy groups is preferable from the viewpoint of suppressing scratches and stains, and a hydroxy group is preferable.
  • a compound having 3 or more hydroxy groups is more preferable, a compound having 5 or more hydroxy groups is further preferable, and a compound having 5 to 8 hydroxy groups is particularly preferable.
  • gluconic acid or shikimic acid is preferable as a substance having one carboxy group and two or more hydroxy groups.
  • Citric acid or malic acid is preferable as having two or more carboxy groups and one hydroxy group.
  • Tartaric acid is preferable as having two or more carboxy groups and two or more hydroxy groups.
  • gluconic acid is particularly preferable as the hydroxycarboxylic acid.
  • the hydrophilic compound may be used alone or in combination of two or more.
  • the undercoat layer contains a hydrophilic compound, preferably hydroxycarboxylic acid or a salt thereof
  • the content of the hydrophilic compound, preferably hydroxycarboxylic acid and its salt is 0.01% by mass or more based on the total mass of the undercoat layer. It is preferably 50% by mass, more preferably 0.1% by mass to 40% by mass, and particularly preferably 1.0% by mass to 30% by mass.
  • the undercoat layer may contain a chelating agent, a secondary or tertiary amine, a polymerization inhibitor, or the like in order to prevent stains over time.
  • the undercoat layer is applied by a known method.
  • the coating amount (solid content) of the undercoat layer is preferably 0.1 mg / m 2 to 100 mg / m 2, and more preferably 1 mg / m 2 to 30 mg / m 2 .
  • the lithographic printing plate original plate according to the present disclosure has a hydrophilic layer (also referred to as "edge hydrophilic layer”) in a region within 1 cm from the edge of the surface of the lithographic printing plate original plate on the image recording layer side. It is preferable to have. Even if the edge hydrophilic layer is provided at the end of at least one side of the surface of the lithographic printing plate original plate on the image recording layer side, the surface of the lithographic printing plate original plate on the image recording layer side has a quadrilateral shape.
  • the width of the edge hydrophilic layer is not particularly limited, but is preferably 1 mm to 50 mm.
  • the lithographic printing plate original plate according to the present disclosure is preferably a lithographic printing plate original plate formed by cutting in the region where the edge hydrophilic layer is formed.
  • the edge hydrophilic layer may be provided as the outermost layer on the image recording layer side or between the layers, but is provided as the outermost layer on the image recording layer side from the viewpoint of suppressing edge stains. It is preferable to do so.
  • the edge hydrophilization layer preferably contains a hydrophilizing agent.
  • the hydrophilizing agent preferably contains a phosphoric acid compound and / or a phosphonic acid compound, and more preferably contains a phosphoric acid compound and / or a phosphonic acid compound and a surfactant as a hydrophilizing agent. Further, in the above two embodiments, it is preferable to contain at least a phosphoric acid compound.
  • a surfactant As the hydrophilic agent, it is preferable to use a surfactant.
  • the surfactant include anionic surfactants, nonionic surfactants, cationic surfactants, and amphoteric surfactants, but anionic surfactants, nonionic surfactants, and , At least one surfactant selected from the group consisting of amphoteric surfactants is preferred, anionic surfactants and / or nonionic surfactants are more preferred. According to the above aspect, a hydrophilic coating liquid having excellent coatability can be obtained.
  • Anionic and nonionic surfactants such as fluorine-based and silicone-based surfactants (typically, fluorine-based or silicone-based anionic or nonionic surfactants) are anionic or nonionic surfactants. Not preferable as an agent. When these surfactants are used, the coatability of the hydrophilic coating liquid is poor, which is not preferable.
  • Anionic surfactants include fatty acid salts, avietates, hydroxyalcan sulfonates, alkane sulfonates, dialkyl sulfosuccinates, linear alkylbenzene sulfonates, branched alkylbenzene sulfonates, alkylnaphthalene sulfonates.
  • dialkyl sulfosuccinates, alkyl sulfate esters, polyoxyethylene aryl ether sulfate esters, and alkylnaphthalene sulfonates are particularly preferably used.
  • at least one anionic surfactant selected from the group consisting of anionic surfactants represented by the formula (IA) or the formula (IB) can be mentioned.
  • R 1 represents an alkyl group having 1 to 20 carbon atoms in a linear or branched chain; p represents 0, 1 or 2; Ar 1 represents 6 to 10 carbon atoms. It represents an aryl group; q represents 1, 2 or 3; M 1 + is, Na +, K +, representative of the Li + or NH 4 +. When p is 2, a plurality of R 1s may be the same or different from each other.
  • R 2 represents an alkyl group having 1 to 20 carbon atoms in a linear or branched chain; m represents 0, 1 or 2; Ar 2 represents 6 to 10 carbon atoms.
  • R 1 and R 2 include CH 3 , C 2 H 5 , C 3 H 7 , or C 4 H 9 .
  • Preferred examples of R 3 are each -CH 2 -, - CH 2 CH 2 -, or -CH 2 CH 2 CH 2 -, - CH 2 CH (CH 3) - and the like, more preferable examples Is -CH 2 CH 2- .
  • p and m are preferably 0 or 1, and p is particularly preferably 0.
  • Y is preferably a single bond.
  • n is preferably an integer of 1 to 20.
  • the anionic surfactant is preferably a polymer compound (anionic polymer surfactant).
  • the surface shape is excellent.
  • the polymer compound is not particularly limited as long as it contains at least one anionic group as a hydrophilic group.
  • the anionic group include a sulfonic acid group, a sulfuric acid group and a carboxy group. Of these, a sulfonic acid group is preferable.
  • These anionic groups may constitute salts.
  • the salt may be a salt with an inorganic cation or a salt with an organic cation. Examples of the inorganic cation include lithium cation, sodium cation, potassium cation, calcium cation, magnesium cation and the like.
  • Lithium cations, sodium cations and potassium cations are preferable, and sodium cations and potassium cations are more preferable.
  • the polymer compound includes a polymer of a monomer having an anionic group in the molecule, a polymer of a monomer having an anionic group in the molecule, and a common weight of one or more other monomers.
  • Examples thereof include a polymer obtained by introducing a hydrophilic group into a polymer having no anionic group or a coalescence.
  • Examples of the monomer having an anionic group in the molecule include sulfonic acid groups such as acrylic acid, methacrylic acid, maleic acid, itaconic acid, styrene sulfonic acid, sodium styrene sulfonate, and ⁇ -methyl styrene sulfonic acid.
  • Olefin sulfonic acid such as styrene derivative, maleic anhydride, vinyl sulfonic acid, sodium allyl sulfonic acid, sodium metalyl sulfonic acid, sodium isoprene sulfonic acid, 3-vinyloxypropane sulfonic acid, 2-acrylamide-2-methyl propane sulfonic acid , A acrylamide derivatives having a sulfonic acid group such as 2-acrylamide-2-methylpropanesulfonic acid, (meth) acrylate derivatives such as 2-sulfoethylmethacrylate, dienesulfonic acid such as butadienesulfonic acid, naphthalenesulfonic acid and the like. Can be mentioned.
  • a styrene derivative having a sulfonic acid group or an acrylamide derivative having a sulfonic acid group is preferable from the viewpoint of edge stain prevention performance, and sodium 4-styrene sulfonate or 2-acrylamide-2-methylpropane. Sodium sulfonate is more preferred.
  • the copolymer of the above-mentioned monomer having an anionic group and the monomer having a phosphoric acid ester group in the molecule described later is not an anionic surfactant but a phosphoric acid compound, and the copolymer described later is contained in the molecule described later.
  • the copolymer with the monomer having a phosphonate ester group corresponds to a phosphonic acid compound instead of an anionic surfactant.
  • the polymer compound include partially saponified products of a styrene-maleic anhydride copolymer, formalin condensates of sulfonated aromatic compounds containing polynuclear aromatic compounds (particularly, sodium sodium phthalene sulfonic acid salt formalin condensates), and the like.
  • Examples thereof include partially saponified products of ethylene-maleic anhydride copolymer, sodium salt of polyacrylic acid, sodium salt of polystyrene sulfonic acid, sodium salt of poly2-acrylamide-2-methylpropanesulfonic acid, and the like.
  • the weight average molecular weight of the polymer compound is preferably 2,000 to 1,000,000, more preferably 3,000 to 700,000, and particularly preferably 5,000 to 500,000.
  • nonionic surfactants include polyoxyethylene alkyl ethers, polyoxyethylene aryl ethers, glycerin fatty acid partial esters, sorbitan fatty acid partial esters, pentaerythritol fatty acid partial esters, and propylene glycol monofatty acid esters.
  • Sucrose fatty acid partial esters polyoxyethylene sorbitan fatty acid partial esters, polyoxyethylene sorbitol fatty acid partial esters, polyethylene glycol fatty acid esters, polyglycerin fatty acid partial esters, polyoxyethylene glycerin fatty acid partial esters, fatty acid diethanolamides , N, N-bis-2-hydroxyalkylamines, polyoxyethylene alkylamines, triethanolamine fatty acid esters, trialkylamine oxides and the like.
  • polyoxyethylene aryl ethers, polyoxyethylene-polyoxypropylene block copolymers and the like are preferably used.
  • surfactants examples include polyoxyethylene alkyl ethers such as polyoxyethylene naphthyl ether, polyoxyethylene alkylphenyl ether, polyoxyethylene lauryl ether, polyoxyethylene cetyl ether, and polyoxyethylene stearyl ether, and poly.
  • Polyoxyethylene alkyl esters such as oxyethylene stearate, sorbitan alkyl esters such as sorbitan monolaurate, sorbitan monostearate, sorbitan distearate, sorbitan monooleate, sorbitan sesquioleate, sorbitan trioleate, glycerol mono
  • Nonionic surfactants such as monoglyceride alkyl esters such as stearate and glycerol monoolate are preferred.
  • the nonionic surfactant is preferably a polymer compound.
  • the weight average molecular weight of the polymer compound is preferably 2,000 to 1,000,000, more preferably 3,000 to 700,000, and particularly preferably 5,000 to 500,000.
  • nonionic surfactant examples include a surfactant represented by the following formula (II-A) and a surfactant represented by the formula (II-B).
  • R 1 represents a hydrogen atom or an alkyl group having 1 to 100 carbon atoms
  • n and m represent integers of 0 to 100, respectively, and both n and m are 0.
  • R 2 represents a hydrogen atom or an alkyl group having 1 to 100 carbon atoms
  • n and m represent integers of 0 to 100, respectively, and both n and m are 0.
  • n and m represent integers of 0 to 100, respectively, and both n and m are 0.
  • Examples of the compound represented by the formula (II-A) include polyoxyethylene phenyl ether, polyoxyethylene methyl phenyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether and the like.
  • Examples of the compound represented by the formula (II-B) include polyoxyethylene naphthyl ether, polyoxyethylene methyl naphthyl ether, polyoxyethylene octyl naphthyl ether, holioxyethylene nonyl naphthyl ether and the like.
  • the number of repeating units (n) of the polyoxyethylene chain is preferably 3 to 50, more preferably 5 to 30.
  • the number of repeating units (m) of the polyoxypropylene chain is preferably 0 to 10, more preferably 0 to 5.
  • the polyoxyethylene moiety and the polyoxypropylene moiety may be a random or block copolymer.
  • the nonionic aromatic ether-based surfactants represented by the above formulas (II-A) and (II-B) are used alone or in combination of two or more. Specific examples of the compounds represented by the formulas (II-A) and (II-B) are shown below.
  • the oxyethylene repeating unit and the oxypropylene repeating unit in the following exemplified compound "Y-5" may take any of a random bond and a block connection.
  • the edge hydrophilized layer preferably contains an amphoteric surfactant.
  • amphoteric surfactants include carboxybetaines, aminocarboxylic acids, sulfobetaines, aminosulfates, imidazolines and the like.
  • the amphoteric surfactant is preferably a polymer compound (amphoteric surfactant polymer).
  • amphoteric surfactant polymer a sulfobetaine polymer, a carboxybetaine polymer, and a phosphobetaine polymer compound are preferable, and for example, the compounds described in JP2013-57747A and JP2012-194535A. Can be mentioned.
  • anionic surfactants having a high effect of promoting on-machine development are particularly preferably used, but two or more of these surfactants can be used in combination.
  • the combined use of two or more kinds of anionic surfactants different from each other or the combined use of an anionic surfactant and a nonionic surfactant is preferable.
  • sodium naphthalene sulfonate sodium alkylnaphthalene sulfonate, or polyoxyethylene aryl ether
  • sodium naphthalene sulfonate or sodium t-butyl naphthalene sulfonate it is more preferable to use sodium naphthalene sulfonate or sodium t-butyl naphthalene sulfonate.
  • the content of the above-mentioned surfactant is not particularly limited, but is preferably 1% by mass to 95% by mass and 10% by mass to 90% by mass with respect to the total mass of the edge hydrophilized layer. Is more preferable, and 50% by mass to 90% by mass is further preferable. When the content of the surfactant is within the above range, the on-machine developability is promoted.
  • cationic surfactants can be used in combination.
  • the cationic surfactant include alkylamine salts, quaternary ammonium salts, polyoxyalkylamine salts, polyethylene polyamine derivatives and the like.
  • phosphoric acid compound- As the hydrophilic agent, it is preferable to use a phosphoric acid compound.
  • phosphoric acid compounds include phosphoric acid, metaphosphoric acid, ammonium monophosphate, ammonium dibasic phosphate, sodium dihydrogen phosphate, sodium monohydrogen phosphate, potassium monophosphate, potassium dibasic phosphate, and tripolyphosphoric acid. Examples thereof include sodium, potassium pyrophosphate, and sodium hexametaphosphate. Of these, sodium dihydrogen phosphate, sodium monohydrogen phosphate, and sodium hexametaphosphate can be preferably used.
  • the content of the phosphoric acid compound is preferably 1% by mass to 80% by mass, more preferably 10% by mass to 50% by mass, based on the total mass of the edge hydrophilic layer.
  • a phosphoric acid monoester compound and a phosphoric acid diester compound can be used.
  • the phosphoric acid compound it is preferable to use a polymer compound, and a polymer compound having a phosphoric acid monoester group is more preferable.
  • a hydrophilic coating liquid having excellent coatability on a support can be obtained.
  • the polymer compound does not include a polymer composed of one or more of the monomers having a phosphate ester group in the molecule, or one or more monomers containing a phosphate ester group and a phosphate ester group.
  • Examples thereof include a copolymer with one or more kinds of monomers, a polymer in which a phosphoric acid ester group is later introduced into a polymer having no phosphoric acid ester group, and the like.
  • Examples of the monomer having a phosphate ester group include mono (2-methacryloyloxyethyl) acid phosphate, mono (2-methacryloyloxypolyoxyethylene glycol) acid phosphate, mono (2-acryloyloxyethyl) acid phosphate, and 3-.
  • mono (2-acryloyloxyethyl) acid phosphate is preferably used from the viewpoint of edge stain prevention performance.
  • Typical products include Light Ester P-1M (manufactured by Kyoei Chemical Co., Ltd.) and Hosmer PE (manufactured by Unichemical Co., Ltd.).
  • both a homopolymer and a copolymer of a monomer having a phosphoric acid ester group are used.
  • the copolymer include a copolymer of a monomer having a phosphoric acid ester group and the above-mentioned monomer having an anionic group, a monomer having a phosphoric acid ester group, a phosphoric acid ester group and an anion.
  • a copolymer with a monomer containing neither of the sex groups can be used.
  • the proportion of the monomer unit having a phosphate ester group in the molecule is 1 mol% to 100 mol%, more preferably 5 mol% to 100 mol%, still more preferably 10 mol% to. It is a 100 mol% copolymer or homopolymer.
  • a monomer having a hydrophilic group is preferable. Examples of the hydrophilic group include a hydroxy group, an alkylene oxide structure, an amino group, an ammonium group and an amide group.
  • a hydroxy group, an alkylene oxide structure and an amide group are preferable, and an alkylene oxide having 2 or 3 carbon atoms is preferable.
  • An alkylene oxide structure having 1 to 20 units is more preferable, and a polyethylene oxide structure having 2 to 10 ethylene oxide units is further preferable.
  • 2-hydroxyethyl acrylate, ethoxydiethylene glycol acrylate, methoxytriethylene glycol acrylate, poly (oxyethylene) methacrylate, N-isopropylacrylamide, acrylamide, and the like can be mentioned.
  • the phosphoric acid compound it is preferable to use a copolymer of the monomer having a phosphoric acid ester group in the molecule and the monomer having the anionic group.
  • a hydrophilic coating liquid having high coatability and high edge stain prevention performance can be obtained.
  • the ratio of the monomer unit having a phosphoric acid ester group in the molecule to the total monomer unit in the copolymer of the monomer having a phosphoric acid ester group in the molecule and the monomer having an anionic group is , 2 mol% to 99 mol%, more preferably 2 mol% to 80 mol%, further preferably 5 mol% to 70 mol%, and 5 mol% to 50 mol%. It is particularly preferable to have.
  • the weight average molecular weight of the polymer compound is preferably 5,000 to 1,000,000, more preferably 7,000 to 700,000, and particularly preferably 10,000 to 500,000.
  • Phosphonate compound- As the hydrophilic agent, it is preferable to use a phosphonic acid compound.
  • Phosphonate compounds include ethylphosphonic acid, propylphosphonic acid, i-propylphosphonic acid, butylphosphonic acid, hexylphosphonic acid, octylphosphonic acid, dodecylphosphonic acid, octadecylphosphonic acid, 2-hydroxyethylphosphonic acid and sodiums thereof.
  • Alkylphosphonic acid monoalkyl esters such as salts or potassium salts, methyl methylphosphonates, methyl ethylphosphonates, and methyl 2-hydroxyethylphosphonates and arches such as sodium salts or potassium salts thereof, methylene diphosphonic acid, ethylene diphosphonic acid, etc.
  • Examples thereof include range phosphonic acid and sodium or potassium salts thereof, polyvinyl phosphonic acid. Above all, it is preferable to use polyvinylphosphonic acid.
  • the content of the phosphonic acid compound is preferably 1% by mass to 80% by mass, more preferably 10% by mass to 50% by mass, based on the total mass of the edge hydrophilized layer.
  • a preferable polymer compound as a phosphonic acid compound is a polymer composed of one or more monomers having a phosphonic acid group or a phosphonic acid monoester group in the molecule, or a phosphonic acid group or a phosphonic acid monoester, in addition to polyvinylphosphonic acid. Examples thereof include a copolymer with one or more monomers having an ester group and one or more monomers not containing a phosphonic acid group or a phosphonic acid monoester group.
  • Examples of the monomer having a phosphonic acid group include vinylphosphonic acid, ethylphosphonic acid monovinyl ester, acryloylaminomethylphosphonic acid, and 3-methacryloyloxypropylphosphonic acid.
  • As the polymer compound both a homopolymer and a copolymer of a monomer having a phosphonic acid ester group are used.
  • Examples of the copolymer include a copolymer of a monomer having a phosphonic acid ester group and the above-mentioned monomer having an anionic group, a monomer having a phosphoric acid ester group, a phosphoric acid ester group, and an anion.
  • a copolymer with a monomer containing neither of the sex groups can be used.
  • a monomer having a hydrophilic group is preferable.
  • the hydrophilic group include a hydroxy group, an alkylene oxide structure, an amino group, an ammonium group and an amide group. Among them, a hydroxy group, an alkylene oxide structure and an amide group are preferable, and an alkylene oxide having 2 or 3 carbon atoms is preferable.
  • An alkylene oxide structure having 1 to 20 units is more preferable, and a polyethylene oxide structure having 2 to 10 ethylene oxide units is further preferable.
  • the proportion of the monomer unit having a phosphate ester group in the molecule is 1 mol% to 100 mol%, more preferably 3 mol% to 100 mol%, still more preferably 5 mol% to. It is a 100 mol% copolymer or homopolymer.
  • a copolymer of the monomer having a phosphonic acid ester group in the molecule and the monomer having the anionic group can also be used.
  • a hydrophilic coating liquid having high coatability and high edge stain prevention performance can be obtained, which is preferable.
  • the ratio of the monomer unit having a phosphonic acid ester group in the molecule to the total monomer unit in the copolymer of the monomer having a phosphonic acid ester group in the molecule and the monomer having an anionic group is , 2 mol% to 99 mol%, more preferably 2 mol% to 80 mol%, further preferably 5 mol% to 70 mol%, and 10 mol% to 50 mol%. It is particularly preferable to have.
  • the weight average molecular weight of the polymer compound is preferably 5,000 to 1,000,000, more preferably 7,000 to 700,000, and particularly preferably 10,000 to 500,000.
  • Water-soluble resin- The hydrophilic agent preferably contains a water-soluble resin.
  • Water-soluble resins include water-soluble resins classified as polysaccharides, polyvinyl alcohol, polyvinylpyrrolidone, polyacrylamide and copolymers thereof, vinyl methyl ether / maleic anhydride copolymer, vinyl acetate / maleic anhydride copolymer. , Styrene / maleic anhydride copolymer and the like.
  • polysaccharides examples include starch derivatives (eg, dextrin, enzymatically decomposed dextrin, hydroxypropylated starch, carboxymethylated starch, phosphate esterified starch, polyoxyalkylene grafted starch, cyclodextrin), celluloses (eg, carboxymethyl cellulose, carboxy). Ethyl cellulose, methyl cellulose, hydroxypropyl cellulose, methyl propyl cellulose, etc.), carrageenan, alginic acid, guar gum, locust bean gum, xanthan gum, arabic gum, soybean polysaccharide and the like can be mentioned. Among them, starch derivatives such as dextrin and polyoxyalkylene grafted starch, gum arabic, carboxymethyl cellulose, soybean polysaccharide and the like are preferably used.
  • starch derivatives such as dextrin and polyoxyalkylene grafted starch, gum arabic, carboxymethyl cellulose, soybean
  • water-soluble resins can be used in combination of two or more.
  • the content of the water-soluble resin can be preferably in the range of 5% by mass to 40% by mass, more preferably 10% by mass to 30% by mass, based on the total mass of the edge hydrophilized layer. Within this range, a hydrophilic protective film having excellent coatability can be obtained.
  • hydrophilizing agent may be used alone, but it is preferable to use two or more kinds of hydrophilizing agents in combination, and it is more preferable to use one to four kinds of hydrophilizing agents in combination. Preferably, it is more preferable to use one to three kinds of hydrophilic agents in combination, and it is particularly preferable to use two kinds of hydrophilic agents in combination.
  • surfactant is used. It is preferable to use the agent in combination with a phosphoric acid compound or a phosphonic acid compound, and more preferably to use an anionic surfactant in combination with a phosphoric acid compound or a phosphonic acid compound.
  • a copolymer of a monomer having a phosphoric acid ester group or a phosphonic acid ester group in the molecule and a monomer having an anionic group in the molecule is used. It is preferable to use a copolymer of a monomer having a phosphate ester group in the molecule and a monomer having an anionic group in the molecule, and it is more preferable to use a phosphoric acid ester group in the molecule. It is more preferable to use a copolymer of a monomer having a sulfonic acid group and a monomer having a sulfonic acid group in the molecule.
  • the edge hydrophilic layer can contain a plasticizer.
  • the plasticizer include phthalates such as dibutylphthalate, diheptylphthalate, di-n-octylphthalate, di (2-ethylhexyl) phthalate, dinonylphthalate, didecylphthalate, dilaurylphthalate, and butylbenzylphthalate.
  • Aliphatic dibasic acid esters such as dioctyl adipate, butyl glycol adipate, dioctyl azelate, dibutyl sebacate, di (2-ethylhexyl) sebacate, dioctyl sebacate, eg epoxidized triglycerides such as epoxidized soybean oil, eg Includes plasticizers having a freezing point of 15 ° C. or lower, such as phosphoric acid esters such as tricresyl phosphate, trioctyl phosphate, trischloroethyl phthalate, and benzoic acid esters such as benzyl benzoate.
  • plasticizers having a freezing point of 15 ° C. or lower, such as phosphoric acid esters such as tricresyl phosphate, trioctyl phosphate, trischloroethyl phthalate, and benzoic acid esters such as benzyl be
  • the content of the plasticizer is preferably more than 0% by mass and 10% by mass or less, and more preferably more than 0% by mass and 5% by mass or less with respect to the total mass of the edge hydrophilized layer.
  • the edge hydrophilic layer can contain inorganic salts such as nitrates and sulfates, preservatives, antifoaming agents and the like. Further, it is also preferable that the edge hydrophilic layer contains particles such as the above-mentioned microgel.
  • the inorganic salt include magnesium nitrate, sodium nitrate, potassium nitrate, ammonium nitrate, sodium sulfate, potassium sulfate, ammonium sulfate, sodium hydrogen sulfate, nickel sulfate and the like.
  • Preservatives include phenol or derivatives thereof, formalin, imidazole derivatives, sodium dehydroacetate, 4-isothiazolin-3-one derivatives, benzoisothiazolin-3-one, benztriazole derivatives, amizing anidine derivatives, quaternary ammonium salts, pyridine, etc.
  • Derivatives such as quinoline and guanidine, diazine, triazole derivative, oxazole, oxazine derivative, nitrobromo alcohol-based 2-bromo-2-nitropropane-1,3-diol, 1,1-dibromo-1-nitro-2-ethanol , 1,1-Dibromo-1-nitro-2-propanol and the like.
  • the defoaming agent a general silicone-based self-emulsifying type, emulsifying type, or surfactant nonionic compound having an HLB value of 5 or less can be used.
  • a lithographic printing plate can be produced by image-exposing the lithographic printing plate original plate according to the present disclosure and performing development processing.
  • the method for producing a lithographic printing plate according to the present disclosure comprises a step of exposing the lithographic printing plate original plate according to the present disclosure to an image (hereinafter, also referred to as an “exposure step”), and a group consisting of printing ink and dampening water. It is preferable to include a step of supplying at least one of the selected ones and removing the image recording layer of the non-image portion on the printing machine (hereinafter, also referred to as “on-machine development step”).
  • the lithographic printing method according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image (exposure step) and printing by supplying at least one selected from the group consisting of printing ink and dampening water. It is preferable to include a step of removing the image recording layer of the non-image portion on the machine to prepare a lithographic printing plate (on-machine development step) and a step of printing with the obtained lithographic printing plate (printing step).
  • exposure step a step of removing the image recording layer of the non-image portion on the machine to prepare a lithographic printing plate (on-machine development step) and a step of printing with the obtained lithographic printing plate (printing step).
  • the lithographic printing plate original plate according to the present disclosure can also be developed with a developing solution.
  • the exposure step and the on-machine development step in the lithographic printing plate manufacturing method will be described, but the exposure step in the lithographic printing plate manufacturing method according to the present disclosure and the exposure step in the lithographic printing method according to the present disclosure are the same. It is a step, and the on-machine development step in the method for producing a lithographic printing plate according to the present disclosure and the on-machine development step in the lithographic printing method according to the present disclosure are the same steps. Further, it is estimated that a part of the outermost layer is removed during on-machine development, and a part of the outermost layer remains on the surface of the image portion or permeates into the inside of the image portion by printing ink.
  • the method for producing a lithographic printing plate according to the present disclosure preferably includes an exposure step of exposing the lithographic printing plate original plate according to the present disclosure to an image to form an exposed portion and an unexposed portion.
  • the planographic printing plate original plate according to the present disclosure is preferably exposed by laser exposure through a transparent original image having a line image, halftone dot image, or the like, or by laser light scanning with digital data or the like.
  • the wavelength of the light source is preferably 750 nm to 1,400 nm.
  • a solid-state laser and a semiconductor laser that emit infrared rays are suitable.
  • the output is preferably 100 mW or more, the exposure time per pixel is preferably 20 microseconds or less, and the irradiation energy amount is 10 mJ / cm 2 to 300 mJ / cm 2. preferable. Further, it is preferable to use a multi-beam laser device in order to shorten the exposure time.
  • the exposure mechanism may be any of an inner drum method, an outer drum method, a flatbed method and the like. Image exposure can be performed by a conventional method using a platesetter or the like. In the case of on-machine development, the lithographic printing plate original plate may be mounted on the printing machine and then the image may be exposed on the printing machine.
  • the method for producing a lithographic printing plate according to the present disclosure involves an on-machine development step of supplying at least one selected from the group consisting of printing ink and dampening water to remove an image recording layer in a non-image area on a printing machine. It is preferable to include it.
  • the on-machine development method will be described below.
  • the image-exposed lithographic printing plate original plate supplies oil-based ink and water-based components on the printing machine, and the image recording layer in the non-image area is removed to produce a lithographic printing plate.
  • the flat plate printing plate original plate is mounted on the printing machine as it is without any development processing after the image exposure, or the flat plate printing plate original plate is mounted on the printing machine and then the image is exposed on the printing machine, and then When printing is performed by supplying an oil-based ink and a water-based component, in the non-image area, an uncured image recording layer is formed by either or both of the supplied oil-based ink and the water-based component in the initial stage of printing.
  • the image recording layer cured by exposure forms an oil-based ink receiving portion having a lipophilic surface.
  • the first supply to the printing plate may be an oil-based ink or a water-based component, but the oil-based ink is first supplied in terms of preventing contamination by the components of the image recording layer from which the water-based components have been removed. Is preferable.
  • the lithographic printing plate original plate is developed on the printing machine and used as it is for printing a large number of sheets.
  • the oil-based ink and the water-based component ordinary printing ink for lithographic printing and dampening water are preferably used.
  • the wavelength of the light source is preferably 300 nm to 450 nm or 750 nm to 1,400 nm as the laser for image-exposing the lithographic printing plate original plate according to the present disclosure.
  • a light source having a wavelength of 300 nm to 450 nm a lithographic printing plate original plate containing a sensitizing dye having an absorption maximum in this wavelength region in the image recording layer is preferably used, and the light source having a wavelength of 750 nm to 1,400 nm is the above-mentioned one. It is preferably used.
  • a semiconductor laser is suitable as a light source having a wavelength of 300 nm to 450 nm.
  • the method for producing a lithographic printing plate according to the present disclosure is a step of exposing the lithographic printing plate original plate according to the present disclosure to an image, and a step of removing the image recording layer of the non-image portion with a developing solution to prepare a lithographic printing plate ( It may also be a method including "developer development step").
  • the lithographic printing method according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image, and a step of removing the image recording layer of the non-image portion with a developing solution to prepare a lithographic printing plate.
  • the method may include a step of printing with the obtained lithographic printing plate.
  • the developing solution a known developing solution can be used.
  • the pH of the developing solution is not particularly limited and may be a strong alkaline developing solution, but a developing solution having a pH of 2 to 11 is preferable.
  • a developing solution having a pH of 2 to 11 for example, a developing solution containing at least one of a surfactant and a water-soluble polymer compound is preferable.
  • a method of removing the protective layer by a pre-washing step, then performing alkaline development, removing the alkali by washing with water in a post-washing step, performing a gum solution treatment, and drying in a drying step. can be mentioned.
  • the developer-gum solution treatment can be performed at the same time. Therefore, the post-washing step is not particularly required, and the drying step can be performed after the development and the gum liquid treatment are performed with one liquid. Further, since the protective layer can be removed at the same time as the development and the gum liquid treatment, the pre-washing step is not particularly required. After the development treatment, it is preferable to remove excess developer using a squeeze roller or the like and then dry.
  • the lithographic printing method includes a printing step of supplying printing ink to a lithographic printing plate to print a recording medium.
  • the printing ink is not particularly limited, and various known inks can be used as desired. Further, as the printing ink, oil-based ink or ultraviolet curable ink (UV ink) is preferably mentioned. Further, in the printing process, dampening water may be supplied as needed. Further, the printing step may be continuously performed in the on-machine development step or the developer development step without stopping the printing machine.
  • the recording medium is not particularly limited, and a known recording medium can be used as desired.
  • lithographic printing is performed before, during, and between exposure and development as necessary.
  • the entire surface of the plate original may be heated.
  • Heating before development is preferably performed under mild conditions of 150 ° C. or lower.
  • For heating after development it is preferable to use conditions stronger than the above, and it is preferably in the range of 100 ° C. to 500 ° C. Within the above range, a sufficient image enhancement effect can be obtained, and problems such as deterioration of the support and thermal decomposition of the image portion can be suppressed.
  • % and “parts” mean “mass%” and “parts by mass”, respectively, unless otherwise specified.
  • the material of the bundled brush was 6.10 nylon, and the diameter of the brush bristles was 0.3 mm and the bristles length was 50 mm.
  • the brush was made by making a hole in a stainless steel cylinder having a diameter of 300 mm and flocking the brush so as to be dense.
  • the distance between the two support rollers ( ⁇ 200 mm) at the bottom of the bundled brush was 300 mm.
  • the bundled brush was pressed until the load of the drive motor for rotating the brush became 10 kW plus the load before pressing the bundled brush against the aluminum plate.
  • the direction of rotation of the brush was the same as the direction of movement of the aluminum plate.
  • Electrochemical roughening treatment using an aqueous nitric acid solution An electrochemical roughening treatment was continuously performed using an AC voltage of 60 Hz.
  • As the electrolytic solution an electrolytic solution having a liquid temperature of 35 ° C. was used, in which aluminum nitrate was added to an aqueous solution of 10.4 g / L of nitric acid to adjust the aluminum ion concentration to 4.5 g / L.
  • the AC power supply waveform is the waveform shown in FIG. 5, in which the time tp from zero to the peak of the current value is 0.8 msec, the duty ratio is 1: 1, and the trapezoidal square wave AC is used, with the carbon electrode as the counter electrode.
  • An electrochemical roughening treatment was performed.
  • Ferrite was used as the auxiliary anode.
  • the electrolytic cell shown in FIG. 6 was used.
  • the current density was 30 A / dm 2 at the peak value of the current, and 5% of the current flowing from the power supply was diverted to the auxiliary anode.
  • Amount of electricity (C / dm 2) the aluminum plate was 185C / dm 2 as the total quantity of electricity when the anode.
  • Electrochemical roughening treatment using an aqueous hydrochloric acid solution An electrochemical roughening treatment was continuously performed using an AC voltage of 60 Hz.
  • As the electrolytic solution an electrolytic solution having a liquid temperature of 35 ° C. was used, in which aluminum chloride was added to an aqueous solution of 6.2 g / L of hydrochloric acid to adjust the aluminum ion concentration to 4.5 g / L.
  • the AC power supply waveform is the waveform shown in FIG. 5, in which the time tp from zero to the peak of the current value is 0.8 msec, the duty ratio is 1: 1, and the trapezoidal square wave AC is used, with the carbon electrode as the counter electrode.
  • An electrochemical roughening treatment was performed.
  • Ferrite was used as the auxiliary anode.
  • the electrolytic cell shown in FIG. 6 was used.
  • the current density was 25A / dm 2 at the peak of electric current amount of hydrochloric acid electrolysis (C / dm 2) the aluminum plate was 63C / dm 2 as the total quantity of electricity when the anode.
  • Desmat treatment using an acidic aqueous solution As an acidic aqueous solution, an aqueous solution of waste liquid (sulfuric acid concentration 170 g / L and aluminum ion concentration 5 g / L) generated in the anodic oxidation treatment step at a liquid temperature of 35 ° C. is sprayed on an aluminum plate. Was sprayed for 4 seconds to perform desmat treatment.
  • waste liquid sulfuric acid concentration 170 g / L and aluminum ion concentration 5 g / L
  • the first-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG.
  • Anodizing treatment was carried out using a 170 g / L sulfuric acid aqueous solution as an electrolytic solution under the conditions of a liquid temperature of 50 ° C. and a current density of 30 A / dm 2 to form an anodized film having a film amount of 0.3 g / m 2.
  • the aluminum plate 616 is conveyed as shown by an arrow in FIG.
  • the aluminum plate 616 is charged to (+) by the feeding electrode 620 in the feeding tank 612 in which the electrolytic solution 618 is stored.
  • the aluminum plate 616 is conveyed upward by the roller 622 in the power supply tank 612, turned downward by the nip roller 624, and then conveyed toward the electrolytic treatment tank 614 in which the electrolytic solution 626 is stored, and is conveyed by the roller 628. Turns horizontally. Then, the aluminum plate 616 is charged to (-) by the electrolytic electrode 630 to form an anodic oxide film on the surface thereof, and the aluminum plate 616 leaving the electrolytic treatment tank 614 is conveyed to a subsequent process.
  • the direction changing means is composed of the roller 622, the nip roller 624 and the roller 628, and the aluminum plate 616 is formed in the inter-tank portion between the power supply tank 612 and the electrolytic treatment tank 614, and the roller 622, the nip roller 624 and the roller By 628, it is conveyed in a chevron shape and an inverted U shape.
  • the feeding electrode 620 and the electrolytic electrode 630 are connected to the DC power supply 634.
  • (Jl) Second-stage anodizing treatment The second-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. Anodizing treatment was carried out using a 170 g / L sulfuric acid aqueous solution as an electrolytic solution under the conditions of a liquid temperature of 50 ° C. and a current density of 13 A / dm 2 to form an anodized film having a film amount of 2.1 g / m 2.
  • the undercoat layer coating liquid (1) having the following composition was applied onto the support 1 so that the dry coating amount was 20 mg / m 2 to form an undercoat layer.
  • the dry coating amount was the amount shown in Table 1, and the dry coating amount was 70 mg / m 2 . It was applied so as to form an undercoat layer.
  • the undercoat layer was not formed.
  • the image recording layer was formed by any of the following image recording layers (1) to (4) shown in Table 1.
  • An image recording layer coating liquid (1) having the following composition is bar-coated on the undercoat layer or the support 1, and dried in an oven at 100 ° C. for 60 seconds to obtain an image recording layer having a dry coating amount of 1.0 g / m 2. 1) was formed.
  • the image recording layer coating liquid (1) was prepared by mixing and stirring the following photosensitive liquid (1) and microgel liquid immediately before coating.
  • the preparation method of the microgel (1) used in the above microgel solution is shown below.
  • -Preparation of multivalent isocyanate compound (1) Bismuth tris (2-ethylhexanoate) (neostan U) in a suspension solution of ethyl acetate (25.31 g) containing 17.78 g (80 mmol) of isophorone diisocyanate and 7.35 g (20 mmol) of the following polyhydric phenol compound (1).
  • -600, 43 mg manufactured by Nitto Kasei Co., Ltd.
  • the reaction temperature was set to 50 ° C., and the mixture was stirred for 3 hours to obtain an ethyl acetate solution (50% by mass) of the polyvalent isocyanate compound (1).
  • microgel (1) The following oil phase components and aqueous phase components were mixed and emulsified at 12000 rpm for 10 minutes using a homogenizer. After stirring the obtained emulsion at 45 ° C. for 4 hours, 10 mass of 1,8-diazabicyclo [5.4.0] undec-7-ene-octylate (U-CAT SA102, manufactured by San-Apro Co., Ltd.) 5.20 g of% aqueous solution was added, the mixture was stirred at room temperature for 30 minutes, and allowed to stand at 45 ° C. for 24 hours. The solid content concentration was adjusted to 20% by mass with distilled water to obtain an aqueous dispersion of microgel (1). When the number average particle size was measured by the light scattering method using a laser diffraction / scattering type particle size distribution measuring device (LA-920, manufactured by HORIBA, Ltd.), it was 0.28 ⁇ m.
  • LA-920 laser diffraction / scattering type particle size distribution measuring device
  • Multivalent isocyanate compound (1) (as a 50% by mass ethyl acetate solution): 15.0 g (Component 4) 65% by mass ethyl acetate solution of dipentaerythritol pentaacrylate (SR-399, manufactured by Sartmer): 11.54 g (Component 5) 10% ethyl acetate solution of sulfonate type surfactant (Pionin A-41-C, manufactured by Takemoto Oil & Fat Co., Ltd .): 4.42 g
  • An image recording layer coating liquid (2) having the following composition is bar-coated on the undercoat layer formed as described above, dried in an oven at 100 ° C. for 60 seconds, and an image having a dry coating amount of 1.0 g / m 2.
  • the recording layer (2) was formed.
  • the image recording layer coating liquid (2) was obtained by mixing and stirring the following photosensitive liquid (2) and microgel liquid (2) immediately before coating.
  • Microgel liquid (2) ⁇ Microgel (2): 2.640 parts ⁇ Distilled water: 2.425 parts
  • microgel (2) As oil phase components, trimethylolpropane and xylene diisocyanate adduct (manufactured by Mitsui Chemicals Polyurethane Co., Ltd., Takenate D-110N) 10 g, pentaerythritol triacrylate (manufactured by Nippon Kayaku Co., Ltd., SR444) 3.15 g, And 0.1 g of alkylbenzene sulfonate (manufactured by Takemoto Oil & Fat Co., Ltd., Pionin A-41C) was dissolved in 17 g of ethyl acetate.
  • aqueous phase component 40 g of a 4% by mass aqueous solution of polyvinyl alcohol (PVA-205, manufactured by Kuraray Co., Ltd.) was prepared.
  • the oil phase component and the aqueous phase component were mixed and emulsified at 12,000 rpm for 10 minutes using a homogenizer.
  • the obtained emulsion was added to 25 g of distilled water, stirred at room temperature for 30 minutes, and then stirred at 50 ° C. for 3 hours.
  • the solid content concentration of the microgel solution thus obtained was diluted with distilled water so as to be 15% by mass, and this was used as the above-mentioned microgel (2).
  • the volume average particle size of the microgel was measured by the light scattering method and found to be 0.2 ⁇ m.
  • An image recording layer coating liquid (3) having the following composition is bar-coated on the undercoat layer or support 1 formed as described above to a thickness of 30 ⁇ m, dried in an oven at 120 ° C. for 1 minute, and image-recorded. The layer (3) was formed.
  • Formation of image recording layer (4) An image recording layer water-based coating liquid containing thermoplastic polymer particles, an infrared absorber and polyacrylic acid was prepared, the pH was adjusted to 3.6, and then the coating was applied on the undercoat layer or the support 1 and 1 at 50 ° C. It was dried for a minute to form an image recording layer (4). The amount of each component applied after drying is shown below.
  • thermoplastic polymer particles, infrared absorber IR-01, and polyacrylic acid used in the image recording layer coating liquid are as shown below.
  • Thermoplastic polymer particles styrene / acrylonitrile copolymer (molar ratio 50/50), Tg: 99 ° C., volume average particle size: 60 nm
  • a protective layer was formed by forming the following protective layer (1) or (2) shown in Table 1.
  • a protective layer coating liquid (1) having the following composition was bar-coated on the image recording layer and dried in an oven at 120 ° C. for 60 seconds to form a protective layer (1) having a dry coating amount of 0.15 g / m 2. ..
  • the preparation method of the inorganic layered compound dispersion liquid (1) used for the protective layer coating liquid (1) is shown below.
  • inorganic layered compound dispersion (1) 6.4 g of synthetic mica (Somasif ME-100, manufactured by Corp Chemical Co., Ltd.) was added to 193.6 g of ion-exchanged water, and the mixture was dispersed using a homogenizer until the average particle size (laser scattering method) became 3 ⁇ m.
  • the aspect ratio of the obtained dispersed particles was 100 or more.
  • a protective layer coating liquid (2) having the following composition is further bar-coated on the image recording layer, then dried in an oven at 120 ° C. for 60 seconds, and the protective layer (2) having a dry coating amount of 0.15 g / m 2 is dried. Was formed.
  • edge hydrophilized layer was further formed.
  • a coating device 2NL04 manufactured by Hyojin Equipment Co., Ltd. was used.
  • As the coating liquid for forming the edge hydrophilic layer components other than the pure water described below were added to pure water and stirred to prepare a coating liquid containing a hydrophilic component.
  • -Compound represented by the following formula P-2 (Mw: 100,000): 5.0 parts by mass-Microgel (2): 1.0 part by mass-Pure water: 194 parts by mass
  • the transport speed was adjusted with a clearance of 0.3 mm and a liquid feed rate of 5 cc / min, and the coating liquid was applied so that the solid content coating amount was 1.7 g / m 2 .
  • the coating was applied to a region (two places) having a width of 5 mm centered at a position of 3 cm from each of the two opposite end portions of the support. After coating, it was dried at 120 ° C. for 1 minute to form an edge hydrophilized layer as the outermost layer on the image recording layer side.
  • ⁇ Cutting of lithographic printing plate original plate> The planographic printing plate original plate obtained as described above is cut by adjusting the gap between the upper cutting blade and the lower cutting blade, the biting amount, and the cutting edge angle using a slitter device as shown in FIG. 2, and the results are shown in Table 1.
  • a sagging shape was formed at the described end.
  • the cutting position was set at the center of the formation region of the edge hydrophilic layer (position 3 cm from each of the two opposite sides of the support), and two points of the support were cut.
  • Table 1 shows the sagging amount X and the sagging width Y in the sagging shape.
  • the exposure was performed in an environment of 25 ° C. and 50% RH.
  • color development Immediately after exposure (color development) and after storage in a dark place (25 ° C.) for 2 hours after exposure (color development over time), the color development of the lithographic printing plate original plate was measured.
  • the measurement was performed by the SCE (specular reflection light removal) method using a spectrocolorimeter CM2600d manufactured by Konica Minolta Co., Ltd. and an operation software CM-S100W. Chromogenic uses the L * a * b * color system of L * value (lightness) was evaluated by the difference ⁇ L between the L * values of the L * value and the unexposed portions of the exposed portion. The larger the value of ⁇ L, the better the color development.
  • the lithographic printing plate original plate was exposed on a Luxcel PLATESETTER T-6000III manufactured by FUJIFILM Corporation equipped with an infrared semiconductor laser under the conditions of an outer drum rotation speed of 1,000 rpm, a laser output of 70%, and a resolution of 2,400 dpi.
  • As the exposed image a chart including a solid image, 50% halftone dots, and a non-image portion was used.
  • the image-exposed flat plate printing plate original plate is attached to an offset rotary printing machine manufactured by Tokyo Kikai Seisakusho Co., Ltd., and used as printing ink for newspapers, Soybee KKST-S (red) manufactured by Inktech Co., Ltd.
  • the lithographic printing plate original plate was exposed by a Luxel PLATESETTER T-6000III manufactured by FUJIFILM Corporation equipped with an infrared semiconductor laser under the conditions of an outer drum rotation speed of 1,000 rpm, a laser output of 70%, and a resolution of 2,400 dpi.
  • the exposed image included a solid image and a 50% halftone dot chart of a 20 ⁇ m dot FM screen.
  • the exposed planographic printing plate original plate was attached to the plate cylinder of the printing machine LITHRONE26 manufactured by Komori Corporation without developing.
  • B-1 and B-2 shown in Table 1 are the following compounds.
  • the lithographic printing plate original plates of Examples 1 to 34 which are the lithographic printing plate original plates according to the present disclosure, are superior in edge stain suppression property as compared with the lithographic printing plate original plates of the comparative examples. Further, from the results shown in Table 1, the lithographic printing plate original plates of Examples 1 to 34, which are the lithographic printing plate original plates according to the present disclosure, have improved color development property, color development property over time, on-machine developability, and chemical resistance. Is also excellent.
  • X Amount of sagging
  • Y Sagging width
  • 1 Aluminum plate
  • 2, 4 Roller brush
  • 3 Polishing slurry liquid
  • 5, 6, 7, 8 Support roller
  • 18 Aluminum plate
  • ta Anode reaction time
  • Tc Cathode reaction time
  • tp Time from 0 to peak of current
  • Ia Peak current on the anode cycle side
  • Ic Peak current on the cathode cycle side
  • AA Anode reaction of aluminum plate Current
  • CA Current of cathode reaction of aluminum plate
  • 10 Plate printing plate original plate
  • 12a, 12b Aluminum support
  • 14 Undercoat layer
  • 16 Image recording layer
  • 20a, 20b Anode oxide film
  • 22a, 22b Micropore
  • 24 Large-diameter hole
  • 26 Small-diameter hole
  • D Depth of large-diameter hole
  • 50 Main anode
  • 51 AC power supply
  • 52 Radial drum roller
  • 53a, 53b Main pole
  • 54 Electrolyte supply

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Abstract

This lithographic printing plate original plate has, on a support body, a layer that contains a color developing compound having a group cleaved by heat or infrared exposure, the lithographic printing plate original plate having, at end portions of at least two opposing sides in the support body, a sagging shape exhibiting a sagging amount X of 25-150 μm and a sagging width Y of 70-300 μm. This lithographic printing plate manufacturing method and this lithographic printing method use said lithographic printing plate original plate.

Description

平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法Planographic printing plate Original plate, lithographic printing plate manufacturing method, and lithographic printing method
 本開示は、平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法に関する。 This disclosure relates to a lithographic printing plate original plate, a method for producing a lithographic printing plate, and a lithographic printing method.
 一般に、平版印刷版は、印刷過程でインキを受容する親油性の画像部と湿し水を受容する親水性の非画像部とからなる。平版印刷は、水と油性インキとが互いに反発する性質を利用して、平版印刷版の親油性の画像部をインキ受容部、親水性の非画像部を湿し水受容部(インキ非受容部)として、平版印刷版の表面にインキの付着性の差異を生じさせ、画像部のみにインキを着肉させた後、紙などの被印刷体にインキを転写して印刷する方法である。 Generally, a lithographic printing plate consists of a lipophilic image part that receives ink in the printing process and a hydrophilic non-image part that receives dampening water. In flat plate printing, utilizing the property that water and oil-based ink repel each other, the oil-based image part of the flat plate printing plate is the ink receiving part, and the hydrophilic non-image part is the dampening water receiving part (ink non-receptive part). ), This is a method in which a difference in the adhesiveness of ink is generated on the surface of a flat plate printing plate, the ink is inlaid only on the image portion, and then the ink is transferred to an object to be printed such as paper for printing.
 現在、平版印刷版原版から平版印刷版を作製する製版工程においては、CTP(コンピュータ・トゥ・プレート)技術による画像露光が行われている。即ち、画像露光は、リスフィルムを介することなく、レーザーやレーザーダイオードを用いて直接平版印刷版原版に走査露光などにより行われる。 Currently, in the plate making process of producing a lithographic printing plate from a lithographic printing plate original plate, image exposure by CTP (computer to plate) technology is performed. That is, the image exposure is performed by scanning exposure directly to the lithographic printing plate original plate using a laser or a laser diode without using a lith film.
 一方、地球環境への関心の高まりから、平版印刷版原版の製版に関して、現像処理などの湿式処理に伴う廃液に関する環境問題がクローズアップされ、これに伴い、現像処理の簡易化又は無処理化が指向されている。簡易な現像処理の一つとして、「機上現像」と呼ばれる方法が提案されている。機上現像は、平版印刷版原版を画像露光後、従来の湿式現像処理を行わず、そのまま印刷機に取り付け、画像記録層の非画像部の除去を通常の印刷工程の初期段階で行う方法である。 On the other hand, due to growing interest in the global environment, environmental problems related to waste liquids associated with wet processing such as development processing have been highlighted in the plate making of lithographic printing plate original plates. It is oriented. As one of the simple development processes, a method called "on-machine development" has been proposed. In-machine development is a method in which a lithographic printing plate original plate is exposed to an image, then attached to the printing machine as it is without performing the conventional wet development processing, and the non-image portion of the image recording layer is removed at the initial stage of the normal printing process. be.
 平版印刷版を用いて印刷する場合、通常の枚葉印刷機のように印刷版のサイズよりも小さい紙への印刷においては、印刷版の端部は紙面外の位置にあるので端部が印刷品質に影響することはない。しかし、新聞印刷のような輪転機を用いてロール状の紙に連続して印刷する場合には、印刷版の端部はロール紙面内にあるため、端部に付着したインキが紙に転写して線状の汚れ(エッジ汚れ)が発生し、印刷物の商品価値を著しく損ねることになる。 When printing using a lithographic printing plate, when printing on paper smaller than the size of the printing plate like a normal sheet-fed printing press, the edge of the printing plate is located outside the paper surface, so the edge is printed. It does not affect the quality. However, when printing continuously on roll-shaped paper using a rotary press such as newspaper printing, the edge of the printing plate is inside the roll paper surface, so the ink adhering to the edge is transferred to the paper. As a result, linear stains (edge stains) occur, which significantly impairs the commercial value of printed matter.
 従来の平版印刷版原版としては、例えば、特許文献1~3に記載されたものが挙げられる。
 特許文献1には、陽極酸化皮膜を有するアルミニウム支持体上に画像記録層を有する機上現像型平版印刷版原版であって、上記平版印刷版原版は端部にダレ形状を有し、上記画像記録層の上に支持体吸着性を有する化合物を含有する層を有し、上記化合物の含有量が上記支持体吸着性を有する化合物を含有する層の面内において実質的に同じである機上現像型平版印刷版原版が記載されている。
Examples of the conventional planographic printing plate original plate include those described in Patent Documents 1 to 3.
Patent Document 1 describes an on-machine development type lithographic printing plate original plate having an image recording layer on an aluminum support having an anodized film, and the lithographic printing plate original plate has a sagging shape at an end, and the above image. On the machine, the recording layer has a layer containing a compound having a support-adsorbing property, and the content of the compound is substantially the same in the plane of the layer containing the compound having a support-adsorbing property. The development type lithographic printing plate original plate is described.
 特許文献2には、下記式(1)で表される化合物を含有する発色組成物を含む画像記録層を支持体上に有する平版印刷版原版が記載されている。 Patent Document 2 describes a lithographic printing plate original plate having an image recording layer on a support containing a color-developing composition containing a compound represented by the following formula (1).
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 式(1)中、Rは熱又は赤外線露光によりR-O結合が開裂する基を表す。R及びRはそれぞれ独立に、水素原子又はアルキル基を表し、あるいはR及びRは互いに連結して環を形成してもよい。Ar及びArはそれぞれ独立に、ベンゼン環又はナフタレン環を形成する基を表す。Y及びYはそれぞれ独立に、酸素原子、硫黄原子、-NR-又はジアルキルメチレン基を表す。R及びRはそれぞれ独立に、アルキル基又は下記式(2)~(4)で表される基を表す。R~Rはそれぞれ独立に、水素原子又はアルキル基を表す。Rは水素原子、アルキル基又はアリール基を表す。Zaは電荷を中和するための対イオンを表す。但し、式(1)で表される化合物は、R若しくはRとして又はR、Ar若しくはAr中に式(2)~(4)で表される基を少なくとも1つ有する。 In Formula (1), R 1 represents a group which cleaves the R 1 -O bond by heat or infrared exposure. R 2 and R 3 may independently represent a hydrogen atom or an alkyl group, or R 2 and R 3 may be linked to each other to form a ring. Ar 1 and Ar 2 each independently represent a group forming a benzene ring or a naphthalene ring. Y 1 and Y 2 independently represent an oxygen atom, a sulfur atom, -NR 0- or a dialkylmethylene group, respectively. R 4 and R 5 each independently represent an alkyl group or a group represented by the following formulas (2) to (4). R 6 to R 9 independently represent a hydrogen atom or an alkyl group. R 0 represents a hydrogen atom, an alkyl group or an aryl group. Za represents a counterion for neutralizing the charge. However, the compound represented by the formula (1) has at least one group represented by the formulas (2) to (4) as R 4 or R 5 or in R 1 , Ar 1 or Ar 2.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 式(2)~(4)中、R10は炭素数2~6のアルキレン基を表す。Wは単結合又は酸素原子を表す。n1は1~45の整数を表す。R11は炭素数1~12のアルキル基又は-C(=O)-R14を表す。R14は炭素数1~12のアルキル基を表す。R12及びR13はそれぞれ独立に、単結合又は炭素数1~12のアルキレン基を表す。Mは水素原子、Na原子、K原子又はオニウム基を表す。 In formulas (2) to (4), R 10 represents an alkylene group having 2 to 6 carbon atoms. W represents a single bond or an oxygen atom. n1 represents an integer from 1 to 45. R 11 represents an alkyl group having 1 to 12 carbon atoms or -C (= O) -R 14 . R 14 represents an alkyl group having 1 to 12 carbon atoms. R 12 and R 13 each independently represent a single bond or an alkylene group having 1 to 12 carbon atoms. M represents a hydrogen atom, a Na atom, a K atom or an onium group.
 特許文献3には、支持体、重合性化合物及び光重合開始剤を含む画像記録層、及び、上記画像記録層上にトップ層を有し、上記トップ層の厚さが0.1g/mから1.75g/mまでの間であり、上記トップ層が、熱及び/又は赤外線照射により強い電子供与性基に変換される熱解離性基を有する赤外線吸収剤を含み、上記トップ層が、熱及び/又は赤外線照射により画像形成可能である平版印刷版原版が記載されている。 Patent Document 3 has an image recording layer containing a support, a polymerizable compound and a photopolymerization initiator, and a top layer on the image recording layer, and the thickness of the top layer is 0.1 g / m 2. From 1.75 g / m 2 to 1.75 g / m 2, the top layer comprises an infrared absorber having a thermodissociative group that is converted to a strong electron donating group by heat and / or infrared irradiation. , A flat plate printing plate original plate capable of forming an image by heat and / or infrared irradiation is described.
  特許文献1:国際公開第2019/151447号
  特許文献2:国際公開第2017/141882号
  特許文献3:国際公開第2019/219560号
Patent Document 1: International Publication No. 2019/151447 Patent Document 2: International Publication No. 2017/141882 Patent Document 3: International Publication No. 2019/219560
 本開示の一実施形態が解決しようとする課題は、エッジ汚れ抑制性に優れる平版印刷版原版を提供することである。
 本開示の他の実施形態が解決しようとする課題は、上記平版印刷版原版を用いた平版印刷版の作製方法又は平版印刷方法を提供することである。
An object to be solved by one embodiment of the present disclosure is to provide a lithographic printing plate original plate having excellent edge stain suppression properties.
An object to be solved by another embodiment of the present disclosure is to provide a method for producing a lithographic printing plate or a lithographic printing method using the lithographic printing plate original plate.
 上記課題を解決するための手段には、以下の態様が含まれる。
<1> 支持体上に、熱又は赤外線露光により開裂する基を有する発色性化合物を含む層を有し、上記支持体の少なくとも対向する2辺の端部に、ダレ量Xが25μm~150μm、かつダレ幅Yが70μm~300μmであるダレ形状を有する平版印刷版原版。
<2> 上記発色性化合物を含む層が、画像記録層である<1>に記載の平版印刷版原版。
<3> 支持体上に、画像記録層を有し、
 上記発色性化合物を含む層を、上記画像記録層上に有する<1>に記載の平版印刷版原版。
<4> 上記熱又は赤外線露光により開裂する基を有する発色性化合物が、下記式(1)で表される化合物である<1>~<3>のいずれか1つに記載の平版印刷版原版。
Means for solving the above problems include the following aspects.
<1> A layer containing a color-developing compound having a group that cleaves by heat or infrared exposure is provided on the support, and the amount of sagging X is 25 μm to 150 μm at at least two opposite ends of the support. A planographic printing plate original plate having a sagging shape with a sagging width Y of 70 μm to 300 μm.
<2> The planographic printing plate original plate according to <1>, wherein the layer containing the color-developing compound is an image recording layer.
<3> An image recording layer is provided on the support.
The planographic printing plate original plate according to <1>, which has a layer containing the color-developing compound on the image recording layer.
<4> The lithographic printing plate original plate according to any one of <1> to <3>, wherein the color-developing compound having a group that cleaves by heat or infrared exposure is a compound represented by the following formula (1). ..
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 式(1)中、Mは熱又は赤外線露光により開裂する基であり、R及びRはそれぞれ独立に、水素原子又はアルキル基を表し、R及びRは互いに連結して環を形成してもよく、Ar及びArはそれぞれ独立に、ベンゼン環又はナフタレン環を形成する基を表し、Y及びYはそれぞれ独立に、酸素原子、硫黄原子、-NR-又はジアルキルメチレン基を表し、R及びRはそれぞれ独立に、脂肪族炭化水素基を表し、R~Rはそれぞれ独立に、水素原子又はアルキル基を表し、Rは水素原子、アルキル基又はアリール基を表し、Zaは電荷を中和する対イオンを表す。 In formula (1), M 1 is a group that is cleaved by thermal or infrared exposure, R 2 and R 3 independently represent a hydrogen atom or an alkyl group, and R 2 and R 3 are connected to each other to form a ring. They may be formed, where Ar 1 and Ar 2 each independently represent a group forming a benzene ring or a naphthalene ring, and Y 1 and Y 2 independently represent an oxygen atom, a sulfur atom, -NR 0- or a dialkyl. R 4 and R 5 each independently represent an aliphatic hydrocarbon group, R 6 to R 9 each independently represent a hydrogen atom or an alkyl group, and R 0 represents a hydrogen atom, an alkyl group or an alkyl group. Represents an aryl group and Za represents a counterion that neutralizes the charge.
<5> 上記式(1)で表される化合物におけるR、R、M、Ar及びArよりなる群から選ばれた少なくとも1つの基が、親水性基を有する、<4>に記載の平版印刷版原版。
<6> 上記親水性基が、下記式(2)~式(5)のいずれかで表される基である<5>に記載の平版印刷版原版。
<5> At least one group selected from the group consisting of R 4 , R 5 , M 1 , Ar 1 and Ar 2 in the compound represented by the above formula (1) has a hydrophilic group, <4>. The original plate of the lithographic printing plate described in.
<6> The planographic printing plate original plate according to <5>, wherein the hydrophilic group is a group represented by any of the following formulas (2) to (5).
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 式(2)~式(5)中、R10は炭素数2~6のアルキレン基を表し、Wは単結合又は酸素原子を表し、n1は1~45の整数を表し、R11は炭素数1~12のアルキル基又は炭素数2~12のアシル基を表し、R12及びR13はそれぞれ独立に、単結合、又は、炭素数1~12のアルキレン基若しくはアルキレンオキシ基を表し、Mは水素原子、Na原子、K原子又はオニウム基を表し、また、式(1)で表される化合物全体で電荷が中和可能な場合は、Mを有していなくともよく、m1は1、2、3又は4を表し、Xは-O-、-S-又は-CH-を表し、波線部分は他の構造との結合位置を表す。 In formulas (2) to (5), R 10 represents an alkylene group having 2 to 6 carbon atoms, W 1 represents a single bond or an oxygen atom, n1 represents an integer of 1 to 45, and R 11 represents carbon. Represents an alkyl group of number 1 to 12 or an acyl group of 2 to 12 carbon atoms, and R 12 and R 13 independently represent a single bond or an alkylene group or alkylene oxy group having 1 to 12 carbon atoms, respectively. Represents a hydrogen atom, a Na atom, a K atom or an onium group, and if the charge can be neutralized in the whole compound represented by the formula (1), it does not have to have M, and m1 is 1. It represents 2, 3 or 4, X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
<7> 上記式(1)におけるMが、-NR、-NR(SO)又は-NR(CO)である<4>~<6>のいずれか1つに記載の平版印刷版原版。
 ただし、R及びRはそれぞれ独立に、アリール基を表し、R、R及びRはそれぞれ独立に、アルキル基又はアリール基を表し、Rは、アルキル基、アリール基、又は、-NRd1d2を表し、Rd1及びRd2はそれぞれ独立に、水素原子、アルキル基又はアリール基を表す。
<8> 上記式(1)におけるMが、-O-Rである<4>~<6>のいずれか1つに記載の平版印刷版原版。
 ただし、Rは、熱又は赤外線露光によりR-O結合が開裂する基を表す。
<9> 上記Rが、下記式(6)で表される基である<8>に記載の平版印刷版原版。
<7> Either <4> to <6> in which M 1 in the above formula (1) is -NR a R b , -NR c (SO 2 R d ) or -NR e (CO 2 R f). The original plate of the planographic printing plate described in one.
However, R a and R b each independently represent an aryl group, R c , Re and R f independently represent an alkyl group or an aryl group, and R d is an alkyl group, an aryl group, or an aryl group. -NR d1 represents R d2 , and R d1 and R d2 independently represent a hydrogen atom, an alkyl group or an aryl group.
<8> The planographic printing plate original plate according to any one of <4> to <6>, wherein M 1 in the above formula (1) is −OR 1.
However, R 1 is, R 1 -O bond by heat or infrared exposure represents a group which cleaves.
<9> The planographic printing plate original plate according to <8>, wherein R 1 is a group represented by the following formula (6).
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 式(6)中、R15及びR16はそれぞれ独立に、水素原子、アルキル基又はアリール基を表し、Eはオニウム基を表し、波線部分は酸素原子との結合位置を表す。 In formula (6), R 15 and R 16 independently represent a hydrogen atom, an alkyl group or an aryl group, E represents an onium group, and the wavy line portion represents a bond position with an oxygen atom.
<10> 上記式(6)におけるEが、下記式(7)で表されるピリジニウム基である<9>に記載の平版印刷版原版。 <10> The planographic printing plate original plate according to <9>, wherein E in the above formula (6) is a pyridinium group represented by the following formula (7).
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 式(7)中、R17はハロゲン原子、アルキル基、アリール基、ヒドロキシ基又はアルコキシ基を表し、R17が複数存在する場合、複数のR17は同じでも異なってもよく、あるいは複数のR17が連結して環を形成してもよく、n2は0~4の整数を表すし、R18はアルキル基、アリール基又は下記式(2)~式(5)で表される基を表し、Zbは電荷を中和するための対イオンを表す。 Wherein (7), R 17 represents a halogen atom, an alkyl group, an aryl group, hydroxy group or alkoxy group, if R 17 there are a plurality, the plurality of R 17 may be the same or different, or a plurality of R 17 may be linked to form a ring, n2 represents an integer of 0 to 4, and R 18 represents an alkyl group, an aryl group, or a group represented by the following formulas (2) to (5). , Zb represent counterions for neutralizing the charge.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 式(2)~式(5)中、R10は炭素数2~6のアルキレン基を表し、Wは単結合又は酸素原子を表し、n1は1~45の整数を表し、R11は炭素数1~12のアルキル基又は炭素数2~12のアシル基を表し、R12及びR13はそれぞれ独立に、単結合、又は、炭素数1~12のアルキレン基若しくはアルキレンオキシ基を表し、Mは水素原子、Na原子、K原子又はオニウム基を表し、また、式(1)で表される化合物全体で電荷が中和可能な場合は、Mを有していなくともよく、m1は1、2、3又は4を表し、Xは-O-、-S-又は-CH-を表し、波線部分は他の構造との結合位置を表す。 In formulas (2) to (5), R 10 represents an alkylene group having 2 to 6 carbon atoms, W 1 represents a single bond or an oxygen atom, n1 represents an integer of 1 to 45, and R 11 represents carbon. Represents an alkyl group of number 1 to 12 or an acyl group of 2 to 12 carbon atoms, and R 12 and R 13 independently represent a single bond or an alkylene group or alkylene oxy group having 1 to 12 carbon atoms, respectively. Represents a hydrogen atom, a Na atom, a K atom or an onium group, and if the charge can be neutralized in the whole compound represented by the formula (1), it does not have to have M, and m1 is 1. It represents 2, 3 or 4, X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
<11> 上記画像記録層が、重合開始剤及び重合性化合物を有する<2>又は<3>に記載の平版印刷版原版。
<12> 上記画像記録層が、ポリマー粒子を有する<2>、<3>又は<11>に記載の平版印刷版原版。
<13> 分子量1,000以下の支持体吸着性化合物をいずれかの層に含む<1>~<12>のいずれか1つに記載の平版印刷版原版。
<14> 上記平版印刷版原版の画像記録層側の面の端部から1cm以内の領域に親水化層を有する<1>~<13>のいずれか1つに記載の平版印刷版原版。
<15> <1>~<14>のいずれか1つに記載の平版印刷版原版を画像様に露光する工程と、印刷機上で印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して非画像部の画像記録層を除去する工程と、を含む平版印刷版の作製方法。
<16> <1>~<14>のいずれか1つに記載の平版印刷版原版を画像様に露光する工程と、印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去し平版印刷版を作製する工程と、得られた平版印刷版により印刷する工程と、を含む平版印刷方法。
<11> The planographic printing plate original plate according to <2> or <3>, wherein the image recording layer has a polymerization initiator and a polymerizable compound.
<12> The planographic printing plate original plate according to <2>, <3> or <11>, wherein the image recording layer has polymer particles.
<13> The planographic printing plate original plate according to any one of <1> to <12>, wherein any layer contains a support-adsorbing compound having a molecular weight of 1,000 or less.
<14> The lithographic printing plate original plate according to any one of <1> to <13>, which has a hydrophilic layer in a region within 1 cm from the end of the surface of the lithographic printing plate original plate on the image recording layer side.
<15> The step of exposing the lithographic printing plate original plate according to any one of <1> to <14> like an image, and at least one selected from the group consisting of printing ink and dampening water on a printing machine. A method for producing a lithographic printing plate, which includes a step of removing an image recording layer in a non-image area by supplying the ink.
<16> A step of exposing the planographic printing plate original plate according to any one of <1> to <14> to an image, and supplying at least one selected from the group consisting of printing ink and dampening water are supplied. A lithographic printing method including a step of removing an image recording layer of a non-image portion on a printing machine to produce a lithographic printing plate, and a step of printing with the obtained lithographic printing plate.
 本開示の一実施形態によれば、エッジ汚れ抑制性に優れる平版印刷版原版を提供することができる。
 また、本開示の他の実施形態によれば、上記平版印刷版原版を用いた平版印刷版の作製方法又は平版印刷方法を提供することができる。
According to one embodiment of the present disclosure, it is possible to provide a lithographic printing plate original plate having excellent edge stain suppression properties.
Further, according to another embodiment of the present disclosure, it is possible to provide a method for producing a lithographic printing plate or a lithographic printing method using the lithographic printing plate original plate.
裁断装置により裁断された平版印刷版原版の支持体の端部の断面形状の一例を示す模式図である。It is a schematic diagram which shows an example of the cross-sectional shape of the end part of the support of the planographic printing plate original plate cut by the cutting apparatus. スリッター装置の裁断部の一例を示す概念図である。It is a conceptual diagram which shows an example of the cutting part of a slitter device. アルミニウム支持体の一実施形態の模式的断面図である。It is a schematic cross-sectional view of one Embodiment of an aluminum support. アルミニウム支持体の別の一実施形態の模式的断面図である。FIG. 3 is a schematic cross-sectional view of another embodiment of an aluminum support. アルミニウム支持体の製造方法における電気化学的粗面化処理に用いられる交番波形電流波形図の一例を示すグラフである。It is a graph which shows an example of the alternating waveform current waveform diagram used for the electrochemical roughening process in the manufacturing method of an aluminum support. アルミニウム支持体の製造方法における交流を用いた電気化学的粗面化処理におけるラジアル型セルの一例を示す側面図である。It is a side view which shows an example of the radial type cell in the electrochemical roughening treatment using AC in the manufacturing method of an aluminum support. 陽極酸化皮膜を有するアルミニウム支持体の製造方法における機械的粗面化処理に用いられるブラシグレイニングの工程の概念を示す側面図である。It is a side view which shows the concept of the brush graining process used for the mechanical roughening process in the manufacturing method of the aluminum support which has an anodic oxide film. 陽極酸化皮膜を有するアルミニウム支持体の製造方法における陽極酸化処理に用いられる陽極酸化処理装置の概略図である。It is the schematic of the anodizing treatment apparatus used for the anodizing treatment in the manufacturing method of the aluminum support which has an anodic oxide film.
 以下において、本開示の内容について詳細に説明する。以下に記載する構成要件の説明は、本開示の代表的な実施態様に基づいてなされることがあるが、本開示はそのような実施態様に限定されるものではない。
 なお、本明細書において、数値範囲を示す「~」とはその前後に記載される数値を下限値及び上限値として含む意味で使用される。
 本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
 また、本明細書における基(原子団)の表記において、置換及び無置換を記していない表記は、置換基を有さないものと共に置換基を有するものをも包含するものである。例えば「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
 本明細書において、「(メタ)アクリル」は、アクリル及びメタクリルの両方を包含する概念で用いられる語であり、「(メタ)アクリロイル」は、アクリロイル及びメタクリロイルの両方を包含する概念として用いられる語である。
 また、本明細書中の「工程」の用語は、独立した工程だけではなく、他の工程と明確に区別できない場合であっても、その工程の所期の目的が達成されれば本用語に含まれる。 また、本開示において、「質量%」と「重量%」とは同義であり、「質量部」と「重量部」とは同義である。
 更に、本開示において、2以上の好ましい態様の組み合わせは、より好ましい態様である。
 また、本開示における重量平均分子量(Mw)及び数平均分子量(Mn)は、特に断りのない限り、TSKgel GMHxL、TSKgel G4000HxL、TSKgel G2000HxL(いずれも東ソー(株)製の商品名)のカラムを使用したゲルパーミエーションクロマトグラフィ(GPC)分析装置により、溶剤THF(テトラヒドロフラン)、示差屈折計により検出し、標準物質としてポリスチレンを用いて換算した分子量である。
 本明細書において、「平版印刷版原版」の用語は、平版印刷版原版だけでなく、捨て版原版を包含する。また、「平版印刷版」の用語は、平版印刷版原版を、必要により、露光、現像などの操作を経て作製された平版印刷版だけでなく、捨て版を包含する。捨て版原版の場合には、必ずしも、露光、現像の操作は必要ない。なお、捨て版とは、例えばカラーの新聞印刷において一部の紙面を単色又は2色で印刷を行う場合に、使用しない版胴に取り付けるための平版印刷版原版である。
 以下、本開示を詳細に説明する。
The contents of the present disclosure will be described in detail below. The description of the constituent elements described below may be based on the representative embodiments of the present disclosure, but the present disclosure is not limited to such embodiments.
In addition, in this specification, "-" indicating a numerical range is used in the meaning that the numerical values described before and after the numerical range are included as the lower limit value and the upper limit value.
In the numerical range described stepwise in the present disclosure, the upper limit value or the lower limit value described in one numerical range may be replaced with the upper limit value or the lower limit value of another numerical range described stepwise. .. Further, in the numerical range described in the present disclosure, the upper limit value or the lower limit value of the numerical range may be replaced with the value shown in the examples.
Further, in the notation of a group (atomic group) in the present specification, the notation that does not describe substitution or non-substitution includes those having no substituent as well as those having a substituent. For example, the "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In the present specification, "(meth) acrylic" is a term used in a concept that includes both acrylic and methacryl, and "(meth) acryloyl" is a term that is used as a concept that includes both acryloyl and methacryloyl. Is.
In addition, the term "process" in the present specification is not limited to an independent process, and even if it cannot be clearly distinguished from other processes, the term "process" will be used as long as the intended purpose of the process is achieved. included. Further, in the present disclosure, "% by mass" and "% by weight" are synonymous, and "parts by mass" and "parts by weight" are synonymous.
Further, in the present disclosure, a combination of two or more preferred embodiments is a more preferred embodiment.
Unless otherwise specified, the weight average molecular weight (Mw) and the number average molecular weight (Mn) in the present disclosure use columns of TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (all trade names manufactured by Toso Co., Ltd.). It is a molecular weight converted by detecting with a solvent THF (tetrahydrofuran) and a differential refractometer by a gel permeation chromatography (GPC) analyzer and using polystyrene as a standard substance.
In the present specification, the term "lithographic printing plate original plate" includes not only a lithographic printing plate original plate but also a discarded plate original plate. Further, the term "lithographic printing plate" includes not only a lithographic printing plate produced by subjecting a lithographic printing plate original plate through operations such as exposure and development as necessary, but also a discarded plate. In the case of a discarded original plate, exposure and development operations are not always necessary. The discard plate is a planographic printing plate original plate to be attached to an unused plate cylinder when printing a part of the paper surface in a single color or two colors in, for example, color newspaper printing.
Hereinafter, the present disclosure will be described in detail.
(平版印刷版原版)
 本開示に係る平版印刷版原版は、支持体上に、熱又は赤外線露光により開裂する基を有する発色性化合物を含む層を有し、上記支持体の少なくとも対向する2辺の端部に、ダレ量Xが25μm~150μm、かつダレ幅Yが70μm~300μmであるダレ形状を有する。
 また、本開示に係る平版印刷版原版は、ネガ型平版印刷版原版であり、また、機上現像型平版印刷版原版として好適に用いることができる。
(Planographic printing plate original)
The lithographic printing plate original plate according to the present disclosure has a layer containing a color-developing compound having a group that cleaves by heat or infrared exposure on the support, and sags at at least two opposite ends of the support. It has a sagging shape in which the amount X is 25 μm to 150 μm and the sagging width Y is 70 μm to 300 μm.
Further, the lithographic printing plate original plate according to the present disclosure is a negative type lithographic printing plate original plate, and can be suitably used as an on-machine development type lithographic printing plate original plate.
 従来の平版印刷版原版である特許文献1~3に記載の平版印刷版原版では、エッジ汚れ抑制性が十分でないことを見出した。
 本発明者らが鋭意検討した結果、上記構成をとることにより、エッジ汚れ抑制性に優れる平版印刷版原版を提供できることを見出した。
 上記効果が得られる詳細なメカニズムは不明であるが、以下のように推測される。
 熱又は赤外線露光により開裂する基を有する発色性化合物をいずれかの層に含むことにより、発色に必要な色素量が減少するため、疎水性素材量が少量となり、相対的に親水性が高まり、残膜を抑制してエッジ汚れを抑制すると推定している。更に、支持体の端部に特定形状のダレ形状を有することにより、端部とブランケットとの接触によるインキ転写を抑制し、エッジ汚れ抑制性に優れると推定している。
It has been found that the lithographic printing plate originals described in Patent Documents 1 to 3, which are the conventional lithographic printing plate originals, do not have sufficient edge stain suppression property.
As a result of diligent studies by the present inventors, it has been found that a lithographic printing plate original plate having excellent edge stain suppression can be provided by adopting the above configuration.
The detailed mechanism for obtaining the above effect is unknown, but it is presumed as follows.
By including a color-developing compound having a group that cleaves by heat or infrared exposure in any layer, the amount of dye required for color development is reduced, so that the amount of hydrophobic material is small and the hydrophilicity is relatively increased. It is estimated that the residual film is suppressed and edge stains are suppressed. Further, it is presumed that by having a specific sagging shape at the end of the support, ink transfer due to contact between the end and the blanket is suppressed, and the edge stain suppressing property is excellent.
 また、本開示に係る平版印刷版原版は、熱又は赤外線露光により開裂する基を有する発色性化合物をいずれかの層に含むことにより、上記発色性化合物より生じた色素のため、発色性、及び、経時発色性にも優れる。また、発色性に優れることにより、露光した平版印刷版原版の検版性にも優れ、また、経時発色性に優れることにより、経時後の露光した平版印刷版原版の検版性にも優れる。
 また、本開示に係る平版印刷版原版は、熱又は赤外線露光により開裂する基を有する発色性化合物をいずれかの層に含み、支持体の端部に特定形状のダレ形状を有することにより、詳細なメカニズムは不明であるが、機上現像性、及び、耐薬品性にも優れる。
Further, the lithographic printing plate original plate according to the present disclosure is a dye produced from the above-mentioned color-developing compound by containing a color-developing compound having a group that cleaves by heat or infrared exposure in any layer. Also excellent in color development over time. Further, the excellent color development property is excellent in the plate inspection property of the exposed lithographic printing plate original plate, and the excellent color development property with time is also excellent in the plate inspection property of the exposed lithographic printing plate original plate after aging.
Further, the lithographic printing plate original plate according to the present disclosure is detailed by containing a color-developing compound having a group that cleaves by heat or infrared exposure in any layer and having a specific sagging shape at the end of the support. The mechanism is unknown, but it is also excellent in on-machine developability and chemical resistance.
 本開示に係る平版印刷版原版は、熱又は赤外線露光により開裂する基を有する発色性化合物を含む層を有する。
 上記熱又は赤外線露光により開裂する基を有する発色性化合物を含む層は、支持体上のいずれかの層であれば特に制限はないが、画像記録層及び保護層よりなる群から選ばれる少なくとも1層であることが好ましい。機上現像性及び耐薬品性の観点からは、少なくとも画像記録層であることがより好ましい。また、経時発色性の観点からは、少なくとも保護層であることがより好ましい。
 また、本開示に係る平版印刷版原版は、経時発色性の観点から、支持体上に、画像記録層を有し、上記発色性化合物を含む層を、上記画像記録層上に有することが好ましく、支持体上に、画像記録層を有し、保護層として、上記発色性化合物を含む層を、上記画像記録層上に有することがより好ましい。
 更に、本開示に係る平版印刷版原版は、エッジ汚れ抑制性、及び、機上現像性の観点から、分子量1,000以下の支持体吸着性化合物をいずれかの層に含むことが好ましく、保護層を有し、かつ分子量1,000以下の支持体吸着性化合物を少なくとも保護層に含むことがより好ましい。
The lithographic printing plate original according to the present disclosure has a layer containing a color-developing compound having a group that is cleaved by heat or infrared exposure.
The layer containing the color-developing compound having a group that cleaves by heat or infrared exposure is not particularly limited as long as it is any layer on the support, but at least one selected from the group consisting of an image recording layer and a protective layer. It is preferably a layer. From the viewpoint of on-machine developability and chemical resistance, at least an image recording layer is more preferable. Further, from the viewpoint of color development over time, at least a protective layer is more preferable.
Further, the lithographic printing plate original plate according to the present disclosure preferably has an image recording layer on the support and a layer containing the color-developing compound on the image recording layer from the viewpoint of color development over time. It is more preferable to have an image recording layer on the support and a layer containing the color-developing compound as a protective layer on the image recording layer.
Further, the lithographic printing plate original plate according to the present disclosure preferably contains a support-adsorbing compound having a molecular weight of 1,000 or less in any layer from the viewpoint of edge stain suppression and on-machine developability, and protects the plate. It is more preferable that the protective layer contains at least a support-adsorbing compound having a layer and having a molecular weight of 1,000 or less.
<ダレ形状>
 本開示に係る平版印刷版原版は、支持体の少なくとも対向する2辺の端部に、ダレ量Xが25μm~150μm、かつダレ幅Yが70μm~300μmであるダレ形状を有する。
 支持体の端部において、支持体の画像記録層側の面の延長線から支持体の厚み方向に曲がった曲面部分の垂直方向の距離Xを「ダレ量」、上記曲面部分の支持体の画像記録層側の面と平行な方向の距離Yを「ダレ幅」という。
 図1は、裁断装置により裁断された、平版印刷版原版の支持体の端部の断面形状の一例である。図1に示すように、支持体の厚み方向に曲がった曲面部分の垂直方向の距離がダレ量X、上記曲面部分の支持体の画像記録層側の面と平行な方向の距離がダレ幅Yである。
 平版印刷版原版におけるエッジ汚れは、非画像部から端部に追いやられた印刷インキ成分が、ブランケットに転写して起こるため、端部とブランケットとの接触を避けるため、端部のダレ量を大きくする必要がある。
 ダレ量Xは、エッジ汚れ抑制性、機上現像性、及び、耐薬品性の観点から、35μm~150μmであることが好ましく、50μm~150μmであることがより好ましく、50μm~100μmであることが更に好ましい。
 ダレ幅Yは、エッジ汚れ抑制性、機上現像性、及び、耐薬品性の観点から、90μm~300μmの範囲であることが好ましく、150μm~250μmであることがより好ましい。
 なお、上記ダレ量X及びダレ幅Yの好ましい範囲は、支持体の裏面のエッジ形状には関わらない。
<Dripping shape>
The planographic printing plate original plate according to the present disclosure has a sagging shape in which the sagging amount X is 25 μm to 150 μm and the sagging width Y is 70 μm to 300 μm at at least two opposing side ends of the support.
At the end of the support, the vertical distance X of the curved surface portion bent in the thickness direction of the support from the extension line of the surface of the support on the image recording layer side is "the amount of sagging", and the image of the support of the curved surface portion. The distance Y in the direction parallel to the surface on the recording layer side is called "sag width".
FIG. 1 is an example of the cross-sectional shape of the end portion of the support of the lithographic printing plate original plate cut by the cutting device. As shown in FIG. 1, the vertical distance of the curved surface portion bent in the thickness direction of the support is the sagging amount X, and the distance in the direction parallel to the surface of the support on the image recording layer side of the curved surface portion is the sagging width Y. Is.
Edge stains on the lithographic printing plate original plate occur when the printing ink component driven from the non-image area to the edge is transferred to the blanket, so the amount of sagging at the edge is large to avoid contact between the edge and the blanket. There is a need to.
The amount of sagging X is preferably 35 μm to 150 μm, more preferably 50 μm to 150 μm, and more preferably 50 μm to 100 μm from the viewpoint of edge stain suppression, on-machine developability, and chemical resistance. More preferred.
The sagging width Y is preferably in the range of 90 μm to 300 μm, and more preferably 150 μm to 250 μm, from the viewpoint of edge stain suppression, on-machine developability, and chemical resistance.
The preferable ranges of the sagging amount X and the sagging width Y are not related to the edge shape of the back surface of the support.
 ダレ形状の形成方法としては、特に制限はなく、公知の裁断方法を用いることができるが、スリッター装置の上側裁断刃と下側裁断刃の隙間、噛み込み量及び刃先角度の調整により作製する方法が好適に挙げられる。
 図2は、スリッター装置の裁断部を示す概念図である。スリッター装置には、上下一対の裁断刃210、220が左右に配置されている。これらの裁断刃210、220は円板状の丸刃からなり、上側裁断刃210a及び210bは回転軸211に、下側裁断刃220a及び220bは回転軸221に、それぞれ同軸上に支持されている。そして、上側裁断刃210a及び210bと下側裁断刃220a及び220bとは、相反する方向に回転される。アルミニウムの支持体230は、上側裁断刃210a、210bと下側裁断刃220a、220bとの間を通されて所定の幅に裁断される。更に具体的には、図2のスリッター装置の裁断部の上側裁断刃210aと下側裁断刃220aとの隙間、及び、上側裁断刃210bと下側裁断刃220bとの隙間を調整することにより、図1に示すようなダレ形状の端部を形成させることができる。
 また、上記裁断は、後述するエッジ親水化層を有する部分において、少なくとも裁断することが好ましい。
The method for forming the sagging shape is not particularly limited, and a known cutting method can be used, but the method of forming by adjusting the gap between the upper cutting blade and the lower cutting blade of the slitter device, the biting amount, and the cutting edge angle. Is preferably mentioned.
FIG. 2 is a conceptual diagram showing a cut portion of the slitter device. A pair of upper and lower cutting blades 210 and 220 are arranged on the left and right sides of the slitter device. These cutting blades 210 and 220 are made of disk-shaped round blades, and the upper cutting blades 210a and 210b are coaxially supported by the rotating shaft 211 and the lower cutting blades 220a and 220b are coaxially supported by the rotating shaft 221. .. Then, the upper cutting blades 210a and 210b and the lower cutting blades 220a and 220b are rotated in opposite directions. The aluminum support 230 is passed between the upper cutting blades 210a and 210b and the lower cutting blades 220a and 220b and cut to a predetermined width. More specifically, by adjusting the gap between the upper cutting blade 210a and the lower cutting blade 220a of the cutting portion of the slitter device of FIG. 2 and the gap between the upper cutting blade 210b and the lower cutting blade 220b, It is possible to form a sagging-shaped end portion as shown in FIG.
Further, it is preferable that the above-mentioned cutting is performed at least in the portion having the edge hydrophilic layer described later.
<画像記録層>
 本開示に係る平版印刷版原版における画像記録層は、機上現像性及び耐薬品性の観点から、熱又は赤外線露光により開裂する基を有する発色性化合物を含むことが好ましい。
 本開示における画像記録層は、ネガ型画像記録層であり、水溶性又は水分散性のネガ型画像記録層であることが好ましい。
 また、本開示における画像記録層は、重合開始剤、及び、重合性化合物を含むことが好ましく、上記発色性化合物以外の赤外線吸収剤、重合開始剤、及び、重合性化合物を含むことがより好ましい。
 また、本開示における画像記録層は、機上現像型画像記録層であることが好ましい。
 以下、画像記録層に含まれる各成分の詳細について説明する。
<Image recording layer>
From the viewpoint of on-machine developability and chemical resistance, the image recording layer in the lithographic printing plate original plate according to the present disclosure preferably contains a color-developing compound having a group that is cleaved by heat or infrared exposure.
The image recording layer in the present disclosure is a negative type image recording layer, and is preferably a water-soluble or water-dispersible negative type image recording layer.
Further, the image recording layer in the present disclosure preferably contains a polymerization initiator and a polymerizable compound, and more preferably contains an infrared absorber other than the color-developing compound, a polymerization initiator, and a polymerizable compound. ..
Further, the image recording layer in the present disclosure is preferably an on-board development type image recording layer.
Hereinafter, details of each component contained in the image recording layer will be described.
-熱又は赤外線露光により開裂する基を有する発色性化合物-
 熱又は赤外線露光により開裂する基を有する発色性化合物は、化合物自体が直接熱又は赤外線を吸収して開裂する基を有する化合物であってもよいし、例えば、別途含まれる赤外線吸収剤が赤外線を吸収して発生した熱等により開裂する基を有する化合物であってもよい。
 また、熱又は赤外線露光により開裂する基を有する発色性化合物は、上記基の開裂により発色する化合物である。
 本開示において、発色とは、加熱又は露光前よりも、加熱又は露光後に強く着色又は吸収が短波長化し可視光領域に吸収を有するようになることを示す。
 中でも、熱又は赤外線露光により開裂する基を有する発色性化合物としては、エッジ汚れ抑制性、発色性、経時発色性、機上現像性、及び、耐薬品性の観点から、分解性赤外線吸収剤であることが好ましく、下記式(A)で表される化合物であることがより好ましい。
-A color-developing compound having a group that cleaves when exposed to heat or infrared rays-
The color-developing compound having a group that cleaves by heat or infrared exposure may be a compound having a group that cleaves by directly absorbing heat or infrared rays, and for example, an infrared absorber separately contained may absorb infrared rays. It may be a compound having a group that cleaves due to heat generated by absorption.
The color-developing compound having a group that cleaves by heat or infrared exposure is a compound that develops color by cleaving the group.
In the present disclosure, color development means that coloring or absorption becomes stronger after heating or exposure than before heating or exposure, and the wavelength becomes shorter so that absorption is provided in the visible light region.
Among them, as a color-developing compound having a group that cleaves by heat or infrared exposure, a degradable infrared absorber is used from the viewpoints of edge stain suppression property, color development property, color development property over time, on-machine developability, and chemical resistance. It is preferable that the compound is represented by the following formula (A), and more preferably.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 式A中、A1=は以下の構造: In formula A, + YA1 = has the following structure:
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
の1つにより表示され、
A2-は以下の構造:
Displayed by one of
YA2- has the following structure:
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
の1つにより表示され、nは0、1、2又は3を表し、p及びqはそれぞれ独立に、0、1又は2を表し、RA1及びRA2はそれぞれ独立に、炭化水素基を表すか、RA1、RA2、RAd及びRAaのうちの2つは一緒になって環式構造を形成するのに必要な原子を含んでなり、RAdの少なくとも1つは赤外線照射又は熱への露出により誘発される化学反応により上記RAdより強い電子供与体である基に転換される基を表すか、又は、RAaの少なくとも1つは赤外線照射又は熱への露出により誘発される化学反応により上記RAaより強い電子供与体である基に転換される基を表し、他のRAd及びRAaはそれぞれ独立に、水素原子、ハロゲン原子、-RAe、-ORAf、-SRAg及び-NRAuAvよりなる群から選ばれる基を表し、RAe、RAf、RAg、RAu及びRAvはそれぞれ独立に、脂肪族炭化水素基、アリール基又はヘテロアリール基を表し、上記転換は、波長400nm~700nmの間の光吸収の増加を与える転換である。
 また、RA1及びRA2における炭化水素基、並びに、RAe、RAf、RAg、RAu及びRAvにおける脂肪族炭化水素基、アリール基又はヘテロアリール基は、置換基を有していてもよい。
Table displayed by one 1, n represents 0, 1, 2 or 3, p and q are each independently 0, 1 or 2, R A1 and R A2 are each independently a hydrocarbon group of carded, R A1, R A2, two of R Ad and R Aa will contain the necessary atoms to form a cyclic structure together, at least one infrared radiation or heat R Ad or a group that is converted based on a strong electron donor than the R Ad by a chemical reaction induced by exposure to, or at least one of R Aa is induced by exposure to infrared radiation or heat Represents a group that is converted to a group that is a stronger electron donor than the above RAa by a chemical reaction , and the other RAad and RAa independently represent a hydrogen atom, a halogen atom, -RAe , -ORAf , and -SR. Represents a group selected from the group consisting of Ag and -NR Au R Av, where R Ae , R Af , R Ag , R Au and R Av each independently represent an aliphatic hydrocarbon group, an aryl group or a heteroaryl group. The conversion is a conversion that provides an increase in light absorption between frequencies of 400 nm to 700 nm.
Further, the hydrocarbon group of R A1 and R A2, and, R Ae, R Af, R Ag, the aliphatic hydrocarbon group for R Au and R Av, aryl or heteroaryl group is substituted May be good.
 また、化学反応により転換される上記RAdは、以下に示すいずれかの基であることが好ましい。 Further, the RAd converted by a chemical reaction is preferably any of the groups shown below.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 上記式中、Aa、Ab、Ac及びAdはそれぞれ独立に、0又は1を表し、-L-は結合基を表し、RA17が水素原子、場合により置換されていてもよい脂肪族炭化水素基、場合により置換されていてもよいアリール基又は場合により置換されていてもよいヘテロアリール基を表すか、あるいは、RA17及びRA3、RA17及びRA5、又は、RA17及びRA11が一緒になって環構造を形成するのに必要な原子を含んでなり、RA4は、-ORA10、-NRA13A14又は-CFであり、RA10は、場合により置換されていてもよいアリール基、場合により置換されていてもよいヘテロアリール基又はα-分枝鎖状の脂肪族炭化水素基を表し、RA13及びRA14はそれぞれ独立に、水素原子、場合により置換されていてもよい脂肪族炭化水素基、場合により置換されていてもよいアリール基又は場合により置換されていてもよいヘテロアリール基を表すか、あるいは、RA13及びRA14が一緒になって環構造を形成するのに必要な原子を含んでなり、RA3は、水素原子、場合により置換されていてもよい脂肪族炭化水素基、場合により置換されていてもよいアリール基又は場合により置換されていてもよいヘテロアリール基であり、あるいは、RA3がRA10、RA13及びRA14の少なくとも1つと一緒になって環構造を形成するのに必要な原子を含んでなり、RA6は場合により置換されていてもよい脂肪族炭化水素基、場合により置換されていてもよいアリール基、場合により置換されていてもよいヘテロアリール基、-ORA10、-NRA13A14又は-CFを表し、ここでRA10、RA13及びRA14がRA4におけるものと同じ意味を有し、RA5は、水素原子、場合により置換されていてもよい脂肪族炭化水素基、場合により置換されていてもよいアリール基又は場合により置換されていてもよいヘテロアリール基を表すか、あるいは、RA5がRA10、RA13及びRA14の少なくとも1つと一緒になって環構造を形成するのに必要な原子を含んでなり、RA11、RA15及びRA16はそれぞれ独立に、水素原子、場合により置換されていてもよい脂肪族炭化水素基、場合により置換されていてもよいアリール基又は場合により置換されていてもよいヘテロアリール基を表すか、あるいは、RA15及びRA16が一緒になって環構造を形成するのに必要な原子を含んでなり、RA12が場合により置換されていてもよい脂肪族炭化水素基、場合により置換されていてもよいアリール基又は場合により置換されていてもよいヘテロアリール基を表し、RA7及びRA9はそれぞれ独立に、水素原子又は場合により置換されていてもよい脂肪族炭化水素基を表し、RA8が-COO-又は-COORA8’を表し、ここでRA8’が水素原子、アルカリ金属カチオン、アンモニウムイオン又はモノ-、ジ-、トリ-若しくはテトラアルキルアンモニウムイオンを表し、RA18が場合により置換されていてもよいアリール基、場合により置換されていてもよいヘテロアリール基又はα-分枝鎖状の脂肪族炭化水素基を表す。 In the above formula, Aa, Ab, respectively Ac and Ad are independently represents 0 or 1, -L A - represents a linking group, R A17 is a hydrogen atom, optionally optionally substituted aliphatic hydrocarbon Represents a group, optionally substituted aryl group or optionally substituted heteroaryl group, or RA17 and RA3 , RA17 and RA5 , or RA17 and RA11. together comprise the necessary atoms to form a cyclic structure, R A4 is -OR A10, a -NR A13 R A14, or -CF 3, R A10 also optionally be substituted Represents a good aryl group, an optionally substituted heteroaryl group or an α-branched aliphatic hydrocarbon group, where RA13 and RA14 are independently substituted with hydrogen atoms and optionally. May represent an aliphatic hydrocarbon group, optionally an optionally substituted aryl group or optionally optionally substituted heteroaryl group, or RA13 and RA14 together to form a ring structure. RA3 contains hydrogen atoms, optionally substituted aliphatic hydrocarbon groups, optionally substituted aryl groups or optionally substituted. a heteroaryl group, or, R A3 is comprises the atoms necessary to form at least one together cyclic structure R A10, R A13 and R A14, R A6 is optionally substituted Represents an aliphatic hydrocarbon group which may be optionally, an aryl group which may be optionally substituted, a heteroaryl group which may be optionally substituted, -OR A10 , -NR A13 RA14 or -CF 3. in R A10, R A13 and R A14 has the same meaning as in R A4, R A5 is a hydrogen atom, optionally optionally substituted aliphatic hydrocarbon group, which may optionally be substituted aryl group or optionally represents a heteroaryl group which may be substituted, or the atoms necessary to R A5 to form at least one together cyclic structure R A10, R A13 and R A14 Included , RA11, RA15 and RA16 are each independently hydrogen atom, optionally substituted aliphatic hydrocarbon group, optionally substituted aryl group or optionally located. It represents a heteroaryl group that may be substituted, or contains the atoms necessary for RA15 and RA16 to form a ring structure together, even if RA12 is optionally substituted. Represents a good aliphatic hydrocarbon group, optionally substituted aryl group or optionally substituted heteroaryl group, where RA7 and RA9 are independently substituted with hydrogen atoms or optionally. It represents an aliphatic hydrocarbon group that, 'represents, wherein R A8' R A8 is -COO- or -COOR A8 is a hydrogen atom, an alkali metal cation, an ammonium ion or a mono-, - di -, tri - or Represents a tetraalkylammonium ion, where RA18 represents an optionally substituted aryl group, an optionally substituted heteroaryl group or an α-branched aliphatic hydrocarbon group.
 また、熱又は赤外線露光により開裂する基を有する発色性化合物としては、エッジ汚れ抑制性、発色性、経時発色性、機上現像性、及び、耐薬品性の観点から、下記式(1)で表される化合物であることが特に好ましい。 Further, as a color-developing compound having a group that cleaves by heat or infrared exposure, the following formula (1) is used from the viewpoint of edge stain suppression property, color development property, color development property over time, on-machine developability, and chemical resistance. It is particularly preferred that it is the compound represented.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 式(1)中、Mは熱又は赤外線露光により開裂する基であり、R及びRはそれぞれ独立に、水素原子又はアルキル基を表し、R及びRは互いに連結して環を形成してもよく、Ar及びArはそれぞれ独立に、ベンゼン環又はナフタレン環を形成する基を表し、Y及びYはそれぞれ独立に、酸素原子、硫黄原子、-NR-又はジアルキルメチレン基を表し、R及びRはそれぞれ独立に、脂肪族炭化水素基を表し、R~Rはそれぞれ独立に、水素原子又はアルキル基を表し、Rは水素原子、アルキル基又はアリール基を表し、Zaは電荷を中和する対イオンを表す。 In formula (1), M 1 is a group that is cleaved by thermal or infrared exposure, R 2 and R 3 independently represent a hydrogen atom or an alkyl group, and R 2 and R 3 are connected to each other to form a ring. They may be formed, where Ar 1 and Ar 2 each independently represent a group forming a benzene ring or a naphthalene ring, and Y 1 and Y 2 independently represent an oxygen atom, a sulfur atom, -NR 0- or a dialkyl. R 4 and R 5 each independently represent an aliphatic hydrocarbon group, R 6 to R 9 each independently represent a hydrogen atom or an alkyl group, and R 0 represents a hydrogen atom, an alkyl group or an alkyl group. Represents an aryl group and Za represents a counterion that neutralizes the charge.
 上記式(1)で表される化合物は、熱又は赤外線の露光により分解し、500nm~600nmに極大吸収波長を有する化合物を生成する化合物であることが好ましい。
 また、式(1)で表される化合物の発色機構は、熱又は赤外線の露光により、Mが開裂することにより発色する。例えば、Mが後述するR-O-である場合、下記に示すように、開裂した上記酸素原子がカルボニル基を形成し、発色体であるメロシアニン色素が生成し発色するものと、本発明者等は推定している。
 また、メロシアニン色素が生成するには、熱又は赤外線露光により結合が開裂するRとシアニン色素構造とが酸素原子を介して結合していることが重要であると本発明者等は推定している。
The compound represented by the above formula (1) is preferably a compound that is decomposed by heat or infrared exposure to produce a compound having a maximum absorption wavelength in the range of 500 nm to 600 nm.
The color-developing mechanism of the compound represented by the formula (1) is that M 1 is cleaved by exposure to heat or infrared rays to develop color. For example, when M 1 is R 1- O-, which will be described later, as shown below, the cleaved oxygen atom forms a carbonyl group, and a merocyanine dye which is a color former is generated to develop a color. Etc. are estimating.
Further, in order to generate a merocyanine dye , the present inventors presume that it is important that R 1 whose bond is cleaved by heat or infrared exposure and the cyanine dye structure are bonded via oxygen atoms. There is.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 式(1)におけるMの好ましい態様については、後述する。
 また、R~R、R、Ar及びArは、後述する親水性基等の置換基を有していてもよい。置換基の例としては、アルコキシ基、アリーロキシ基、アミノ基、アルキルチオ基、アリールチオ基、ハロゲン原子、カルボキシ基、カルボキシレート基、スルホ基、スルホネート基、アルキルオキシカルボニル基、アリールオキシカルボニル基、ホスホン酸基、ホスホネート基、及び、これらを組み合わせた基等が挙げられる。また、上記基が、アニオン性基である場合、塩を形成していてもよく、対カチオンは、シアニン色素構造のカチオンであっても、プロトン、金属カチオン、オニウム等であってもよい。
A preferred embodiment of M 1 in the formula (1) will be described later.
Further, R 2 to R 9 , R 0 , Ar 1 and Ar 2 may have a substituent such as a hydrophilic group described later. Examples of substituents are alkoxy group, aryloxy group, amino group, alkylthio group, arylthio group, halogen atom, carboxy group, carboxylate group, sulfo group, sulfonate group, alkyloxycarbonyl group, aryloxycarbonyl group, phosphonic acid. Examples thereof include a group, a phosphonate group, and a group combining these groups. When the group is an anionic group, it may form a salt, and the counter cation may be a cation having a cyanine dye structure, a proton, a metal cation, onium, or the like.
 式(1)におけるR~R及びRにおけるアルキル基は、炭素数1~30のアルキル基が好ましく、炭素数1~15のアルキル基がより好ましく、炭素数1~10のアルキル基が更に好ましい。上記アルキル基は、直鎖状であっても、分岐を有していても、環構造を有していてもよい。
 具体的には、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、ヘキサデシル基、オクタデシル基、エイコシル基、イソプロピル基、イソブチル基、s-ブチル基、t-ブチル基、イソペンチル基、ネオペンチル基、1-メチルブチル基、イソヘキシル基、2-エチルヘキシル基、2-メチルヘキシル基、シクロヘキシル基、シクロペンチル基、及び、2-ノルボルニル基を挙げられる。
 これらアルキル基の中でも、メチル基、エチル基、プロピル基又はブチル基が特に好ましい。
The alkyl group in R 2 to R 9 and R 0 in the formula (1) is preferably an alkyl group having 1 to 30 carbon atoms, more preferably an alkyl group having 1 to 15 carbon atoms, and an alkyl group having 1 to 10 carbon atoms. More preferred. The alkyl group may be linear, have a branch, or have a ring structure.
Specifically, for example, methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group. Group, eicosyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group. Examples include a group and a 2-norbornyl group.
Among these alkyl groups, a methyl group, an ethyl group, a propyl group or a butyl group is particularly preferable.
 Rにおけるアリール基としては、炭素数6~30のアリール基が好ましく、炭素数6~20のアリール基がより好ましく、炭素数6~12のアリール基が更に好ましい。
 また、上記アリール基は、置換基を有していてもよい。置換基の例としては、アルキル基、アルコキシ基、アリーロキシ基、アミノ基、アルキルチオ基、アリールチオ基、ハロゲン原子、カルボキシ基、カルボキシレート基、スルホ基、スルホネート基、アルキルオキシカルボニル基、アリールオキシカルボニル基、及び、これらを組み合わせた基等が挙げられる。
 具体的には、例えば、フェニル基、ナフチル基、p-トリル基、p-クロロフェニル基、p-フルオロフェニル基、p-メトキシフェニル基、p-ジメチルアミノフェニル基、p-メチルチオフェニル基、p-フェニルチオフェニル基等が挙げられる。
 これらアリール基の中で、フェニル基、p-メトキシフェニル基、p-ジメチルアミノフェニル基、ナフチル基が好ましい。
As the aryl group at R 0, an aryl group having 6 to 30 carbon atoms is preferable, an aryl group having 6 to 20 carbon atoms is more preferable, and an aryl group having 6 to 12 carbon atoms is further preferable.
Moreover, the above-mentioned aryl group may have a substituent. Examples of substituents are alkyl groups, alkoxy groups, allyloxy groups, amino groups, alkylthio groups, arylthio groups, halogen atoms, carboxy groups, carboxylate groups, sulfo groups, sulfonate groups, alkyloxycarbonyl groups and aryloxycarbonyl groups. , And a group combining these.
Specifically, for example, phenyl group, naphthyl group, p-tolyl group, p-chlorophenyl group, p-fluorophenyl group, p-methoxyphenyl group, p-dimethylaminophenyl group, p-methylthiophenyl group, p- Phenylthiophenyl group and the like can be mentioned.
Among these aryl groups, a phenyl group, a p-methoxyphenyl group, a p-dimethylaminophenyl group and a naphthyl group are preferable.
 R及びRは、連結して環を形成していることが好ましい。
 R及びRが連結して環を形成する場合、環員数は5又は6員環が好ましく、6員環がより好ましい。
It is preferable that R 2 and R 3 are connected to form a ring.
When R 2 and R 3 are connected to form a ring, the number of ring members is preferably 5 or 6-membered ring, and more preferably 6-membered ring.
 Y及びYはそれぞれ独立に、酸素原子、硫黄原子、-NR-又はジアルキルメチレン基を表し、-NR-又はジアルキルメチレン基が好ましく、ジアルキルメチレン基がより好ましい。
 Rは水素原子、アルキル基又はアリール基を表し、アルキル基であることが好ましい。
Y 1 and Y 2 independently represent an oxygen atom, a sulfur atom, an −NR 0 − or a dialkyl methylene group, preferably an −NR 0 − or a dialkyl methylene group, and more preferably a dialkyl methylene group.
R 0 represents a hydrogen atom, an alkyl group or an aryl group, and is preferably an alkyl group.
 R及びRは、同じ基であることが好ましい。また、R及びRがアニオン性基を有する場合、R及びRは、アニオン性基を有し、かつ対カチオンを有するか又は有しないか以外は同じ基であることが好ましい。
 また、R及びRはそれぞれ独立に、直鎖アルキル基又は末端にスルホネート基を有するアルキル基であることが好ましく、メチル基、エチル基又は末端にスルホネート基を有するブチル基であることがより好ましい。
 また、上記スルホネート基の対カチオンは、式(1)中の第四級アンモニウム基であってもよいし、アルカリ金属カチオンやアルカリ土類金属カチオンであってもよい。
 更に、式(1)で表される化合物の水溶性を向上させる観点から、R及びRはそれぞれ独立に、アニオン構造を有するアルキル基であることが好ましく、カルボキシレート基又はスルホネート基を有するアルキル基であることがより好ましく、末端にスルホネート基を注するアルキル基であることが更に好ましい。
 また、式(1)で表される化合物の極大吸収波長を長波長化し、また、発色性及び平版印刷版における耐刷性の観点から、R及びRはそれぞれ独立に、芳香環を有するアルキル基であることが好ましく、末端に芳香環を有するアルキル基であることがより好ましく、2-フェニルエチル基、2-ナフタレニルエチル基、又は、2-(9-アントラセニル)エチル基であることが特に好ましい。
R 4 and R 5 are preferably the same group. When R 4 and R 5 have an anionic group, it is preferable that R 4 and R 5 are the same group except that they have an anionic group and have or do not have a counter cation.
Further, R 4 and R 5 are each independently preferably a linear alkyl group or an alkyl group having a sulfonate group at the terminal, and more preferably a methyl group, an ethyl group or a butyl group having a sulfonate group at the terminal. preferable.
Further, the counter cation of the sulfonate group may be a quaternary ammonium group in the formula (1), an alkali metal cation or an alkaline earth metal cation.
Further, from the viewpoint of improving the water solubility of the compound represented by the formula (1), R 4 and R 5 are preferably alkyl groups having an anionic structure independently, and have a carboxylate group or a sulfonate group. It is more preferably an alkyl group, and even more preferably an alkyl group in which a sulfonate group is poured at the end.
Further, from the viewpoint of lengthening the maximum absorption wavelength of the compound represented by the formula (1), and from the viewpoint of color development and printing resistance in a slab printing plate, R 4 and R 5 each have an aromatic ring independently. It is preferably an alkyl group, more preferably an alkyl group having an aromatic ring at the end, a 2-phenylethyl group, a 2-naphthalenylethyl group, or a 2- (9-anthrasenyl) ethyl group. Is particularly preferred.
 R~Rはそれぞれ独立に、水素原子又はアルキル基を表し、水素原子であることが好ましい。
 Ar及びArはそれぞれ独立に、ベンゼン環又はナフタレン環を形成する基を表す。上記ベンゼン環及びナフタレン環上には、置換基を有していてもよい。置換基としては、アルキル基、アルコキシ基、アリーロキシ基、アミノ基、アルキルチオ基、アリールチオ基、ハロゲン原子、カルボキシ基、カルボキシレート基、スルホ基、スルホネート基、アルキルオキシカルボニル基、アリールオキシカルボニル基、及び、これらを組み合わせた基等が挙げられるが、アルキル基であることが好ましい。
 また、式(1)で表される化合物の極大吸収波長を長波長化し、また、発色性及び平版印刷版における耐刷性の観点から、Ar及びArはそれぞれ独立に、ナフタレン環、又は、アルキル基若しくはアルコキシ基を置換基として有したベンゼン環を形成する基であることが好ましく、ナフタレン環、又は、アルコキシ基を置換基として有したベンゼン環を形成する基であることがより好ましく、ナフタレン環、又は、メトキシ基を置換基として有したベンゼン環を形成する基であることが特に好ましい。
R 6 to R 9 independently represent a hydrogen atom or an alkyl group, and are preferably hydrogen atoms.
Ar 1 and Ar 2 each independently represent a group forming a benzene ring or a naphthalene ring. Substituents may be provided on the benzene ring and the naphthalene ring. Substituents include alkyl groups, alkoxy groups, allyloxy groups, amino groups, alkylthio groups, arylthio groups, halogen atoms, carboxy groups, carboxylate groups, sulfo groups, sulfonate groups, alkyloxycarbonyl groups, aryloxycarbonyl groups, and , A group combining these, and the like, but an alkyl group is preferable.
Further, from the viewpoint of lengthening the maximum absorption wavelength of the compound represented by the formula (1), and from the viewpoint of color development and printing resistance in a slab printing plate, Ar 1 and Ar 2 are independently a naphthalene ring or a naphthalene ring or Ar 2. , A group forming a benzene ring having an alkyl group or an alkoxy group as a substituent is preferable, and a naphthalene ring or a group forming a benzene ring having an alkoxy group as a substituent is more preferable. It is particularly preferable that the group forms a naphthalene ring or a benzene ring having a methoxy group as a substituent.
 Zaは、電荷を中和する対イオンを表し、アニオン種を示す場合は、スルホネートイオン、カルボキシレートイオン、テトラフルオロボレートイオン、ヘキサフルオロホスフェートイオン、p-トルエンスルホネートイオン、過塩素酸塩イオン等が挙げられ、ヘキサフルオロホスフェートイオンが特に好ましい。カチオン種を示す場合は、アルカリ金属イオン、アルカリ土類金属イオン、アンモニウムイオン、ピリジニウムイオン又はスルホニウムイオンが好ましく、ナトリウムイオン、カリウムイオン、アンモニウムイオン、ピリジニウムイオン又はスルホニウムイオンがより好ましく、ナトリウムイオン、カリウムイオン又はアンモニウムイオンが更に好ましい。
 R~R、R、Ar、Ar、Y及びYは、アニオン構造やカチオン構造を有していてもよく、R~R、R、Ar、Ar、Y及びYの全てが電荷的に中性の基であれば、Zaは一価の対アニオンであるが、例えば、R~R、R、Ar、Ar、Y及びYに2以上のアニオン構造を有する場合、Zaは対カチオンにもなり得る。
Za represents a counterion that neutralizes the charge, and when indicating an anion species, sulfonate ion, carboxylate ion, tetrafluoroborate ion, hexafluorophosphate ion, p-toluenesulfonate ion, perchlorate ion and the like are used. Hexafluoroborate ions are particularly preferred. When indicating a cation species, alkali metal ion, alkaline earth metal ion, ammonium ion, pyridinium ion or sulfonium ion is preferable, sodium ion, potassium ion, ammonium ion, pyridinium ion or sulfonium ion is more preferable, and sodium ion, potassium. Ions or ammonium ions are more preferred.
R 1 to R 9 , R 0 , Ar 1 , Ar 2 , Y 1 and Y 2 may have an anionic structure or a cationic structure, and R 1 to R 9 , R 0 , Ar 1 , Ar 2 , If all of Y 1 and Y 2 are charge-neutral groups, Za is a monovalent counter anion, for example R 1 to R 9 , R 0 , Ar 1 , Ar 2 , Y 1 and If Y 2 has two or more anionic structures, Za can also be a counter cation.
 式(1)において、Ar又はArが、下記式(8)で表される基を形成する基であることが好ましい。 In the formula (1), Ar 1 or Ar 2 is preferably a group forming a group represented by the following formula (8).
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 式(8)中、R19は炭素数1~12のアルキル基又は後述する式(2)~(4)で表される基を表し、n3は1~4の整数を表し、*は結合部位を表す。 In the formula (8), R 19 represents an alkyl group having 1 to 12 carbon atoms or a group represented by the formulas (2) to (4) described later, n3 represents an integer of 1 to 4, and * represents a binding site. Represents.
 エッジ汚れ抑制性、機上現像性、及び、耐薬品性の観点から、上記式(1)で表される化合物におけるR、R、M、Ar及びArよりなる群から選ばれた少なくとも1つの基が、親水性基を有することが好ましく、R、R及びMよりなる群から選ばれた少なくとも1つの基が、親水性基を有することがより好ましく、R及びRよりなる群から選ばれた少なくとも1つの基が、親水性基を有することが更に好ましく、R及びRがそれぞれ独立に、親水性基を有することが特に好ましい。 From the viewpoint of edge stain suppression, on-machine developability, and chemical resistance, it is selected from the group consisting of R 4 , R 5 , M 1 , Ar 1 and Ar 2 in the compound represented by the above formula (1). At least one group preferably has a hydrophilic group, and at least one group selected from the group consisting of R 4 , R 5 and M 1 more preferably has a hydrophilic group, R 4 and at least one group selected from the group consisting of R 5 further preferably has a hydrophilic group, independently R 4 and R 5 each particularly preferably has a hydrophilic group.
 親水性基としては、ポリアルキレンオキシ基、酸基、酸基の塩、アルコキシ基、ヒドロキシ基等が挙げられる。
 中でも、上記親水性基は、エッジ汚れ抑制性、機上現像性、及び、耐薬品性の観点から、下記式(2)~式(5)のいずれかで表される基であることが好ましく、下記式(2)又は式(5)のいずれかで表される基であることがより好ましく、下記式(2)で表される基であることが特に好ましい。
Examples of the hydrophilic group include a polyalkyleneoxy group, an acid group, a salt of an acid group, an alkoxy group, a hydroxy group and the like.
Above all, the hydrophilic group is preferably a group represented by any of the following formulas (2) to (5) from the viewpoint of edge stain suppressing property, on-machine developability, and chemical resistance. , The group represented by either the following formula (2) or the following formula (5) is more preferable, and the group represented by the following formula (2) is particularly preferable.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
 式(2)~式(5)中、R10は炭素数2~6のアルキレン基を表し、Wは単結合又は酸素原子を表し、n1は1~45の整数を表し、R11は炭素数1~12のアルキル基又は炭素数2~12のアシル基を表し、R12及びR13はそれぞれ独立に、単結合、又は、炭素数1~12のアルキレン基若しくはアルキレンオキシ基を表し、Mは水素原子、Na原子、K原子又はオニウム基を表し、また、式(1)で表される化合物全体で電荷が中和可能な場合は、Mを有していなくともよく、m1は1、2、3又は4を表し、Xは-O-、-S-又は-CH-を表し、波線部分は他の構造との結合位置を表す。 In formulas (2) to (5), R 10 represents an alkylene group having 2 to 6 carbon atoms, W 1 represents a single bond or an oxygen atom, n1 represents an integer of 1 to 45, and R 11 represents carbon. Represents an alkyl group of number 1 to 12 or an acyl group of 2 to 12 carbon atoms, and R 12 and R 13 independently represent a single bond or an alkylene group or alkylene oxy group having 1 to 12 carbon atoms, respectively. Represents a hydrogen atom, a Na atom, a K atom or an onium group, and if the charge can be neutralized in the whole compound represented by the formula (1), it does not have to have M, and m1 is 1. It represents 2, 3 or 4, X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
 R10で表されるアルキレン基の具体例としては、エチレン基、n-プロピレン基、イソプロピレン基、n-ブチレン基、イソブチレン基、n-ペンチレン基、イソペンチレン基、n-ヘキシル基、イソヘキシル基等が挙げられ、エチレン基、n-プロピレン基、イソプロピレン基、又は、n-ブチレン基が好ましく、n-プロピレン基が特に好ましい。
 n1は1~10が好ましく、1~5がより好ましく、1~3が特に好ましい。
 R11で表されるアルキル基の具体例としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、tert-ブチル基、n-ペンチル基、イソペンチル基、ネオペンチル基、n-ヘキシル基、n-オクチル基、n-ドデシル基等が挙げられ、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、又は、tert-ブチル基が好ましく、メチル基、又は、エチル基が更に好ましく、メチル基が特に好ましい。
 R11におけるアシル基の具体例としては、アセチル基、プロピオニル基、ピバロイル基等が挙げられる。中でも、アセチル基が好ましい。
Specific examples of the alkylene group represented by R 10 include ethylene group, n-propylene group, isopropylene group, n-butylene group, isobutylene group, n-pentylene group, isopentylene group, n-hexyl group, isohexyl group and the like. , Ethylene group, n-propylene group, isopropylene group, or n-butylene group is preferable, and n-propylene group is particularly preferable.
n1 is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 to 3.
Specific examples of the alkyl group represented by R 11 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, n-pentyl group, isopentyl group and neopentyl. Examples thereof include a group, an n-hexyl group, an n-octyl group, an n-dodecyl group and the like, and a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group or a tert-butyl group is preferable, and a methyl group is preferable. A group or an ethyl group is more preferable, and a methyl group is particularly preferable.
Specific examples of the acyl group in R 11 include an acetyl group, a propionyl group, a pivaloyl group and the like. Of these, an acetyl group is preferable.
 式(2)で表される基の具体例を以下に示すが、本開示はこれらに限定されるものではない。下記構造式中、Meはメチル基、Etはエチル基を表し、*は結合部位を表す。 Specific examples of the group represented by the formula (2) are shown below, but the present disclosure is not limited thereto. In the following structural formula, Me represents a methyl group, Et represents an ethyl group, and * represents a binding site.
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
 式(3)又は式(4)において、R12又はR13で表されるアルキレン基の具体例としては、メチレン基、エチレン基、n-プロピレン基、イソプロピレン基、n-ブチレン基、イソブチレン基、n-ペンチレン基、イソペンチレン基、n-ヘキシル基、イソヘキシル基、n-オクチレン基、n-ドデシレン基等が挙げられ、エチレン基、n-プロピレン基、イソプロピレン基、又は、n-ブチレン基が好ましく、エチレン基、又は、n-プロピレン基が特に好ましい。
 式(3)又は式(4)で表される基が、式(1)で表される化合物のAr又はArで表される基中に存在する場合、R12又はR13は単結合が好ましい。
 式(3)又は式(4)で表される基が、式(1)で表される化合物のM中に存在する場合あるいはR又はRで表される基として存在する場合、R12又はR13はアルキレン基が好ましい。
 式(4)において、2つ存在するMは同じでも異なってもよい。
Specific examples of the alkylene group represented by R 12 or R 13 in the formula (3) or the formula (4) include a methylene group, an ethylene group, an n-propylene group, an isopropylene group, an n-butylene group, and an isobutylene group. , N-pentylene group, isopentylene group, n-hexyl group, isohexyl group, n-octylene group, n-dodecylene group and the like, and ethylene group, n-propylene group, isopropylene group or n-butylene group Preferably, an ethylene group or an n-propylene group is particularly preferable.
When the group represented by the formula (3) or the formula (4) is present in the group represented by Ar 1 or Ar 2 of the compound represented by the formula (1), R 12 or R 13 is a single bond. Is preferable.
When the group represented by the formula (3) or the formula (4) is present in M 1 of the compound represented by the formula (1), or when it is present as a group represented by R 4 or R 5, R 12 or R 13 is preferably an alkylene group.
In equation (4), the two existing Ms may be the same or different.
 式(3)又は式(4)において、Mで表されるオニウム基の具体例としては、アンモニウム基、ヨードニウム基、ホスホニウム基、スルホニウム基等が挙げられる。 Specific examples of the onium group represented by M in the formula (3) or the formula (4) include an ammonium group, an iodonium group, a phosphonium group, a sulfonium group and the like.
 アンモニウム基は、下記式(A1)で表される基を含む。 The ammonium group includes a group represented by the following formula (A1).
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
 式(A1)中、R~Rはそれぞれ独立に、水素原子又は炭素数20以下のアリール基、アルキル基、アルケニル基若しくはアルキニル基を表す。アリール基、アルキル基、アルケニル基又はアルキニル基は、置換基を有していてもよい。置換基としては、炭素数1~12のアルキル基、炭素数1~12のアルケニル基、炭素数1~12のアルキニル基、炭素数6~12のアリール基、炭素数1~12のアルコキシ基、炭素数6~12のアリーロキシ基、ハロゲン原子、炭素数1~12のアルキルアミノ基、炭素数2~12のジアルキルアミノ基、炭素数2~12のアルキルアミド基又はアリールアミド基、カルボニル基、カルボキシ基、シアノ基、スルホニル基、炭素数1~12のチオアルキル基、炭素数6~12のチオアリール基、ヒドロキシ基が挙げられる。R~Rとしては、水素原子、炭素数1~4のアルキル基又は炭素数6のアリール基が好ましい。 In the formula (A1), Ra to R d independently represent a hydrogen atom or an aryl group having 20 or less carbon atoms, an alkyl group, an alkenyl group or an alkynyl group. The aryl group, alkyl group, alkenyl group or alkynyl group may have a substituent. Examples of the substituent include an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 1 to 12 carbon atoms, an alkynyl group having 1 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an alkoxy group having 1 to 12 carbon atoms. Alyloxy group with 6 to 12 carbon atoms, halogen atom, alkylamino group with 1 to 12 carbon atoms, dialkylamino group with 2 to 12 carbon atoms, alkylamide group or arylamide group with 2 to 12 carbon atoms, carbonyl group, carboxy Examples thereof include a group, a cyano group, a sulfonyl group, a thioalkyl group having 1 to 12 carbon atoms, a thioaryl group having 6 to 12 carbon atoms, and a hydroxy group. As R a to R d , a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an aryl group having 6 carbon atoms are preferable.
 アンモニウム基の具体例を以下に示すが、本開示はこれらに限定されるものではない。下記構造式中、Meはメチル基を表し、Etはエチル基を表す。 Specific examples of ammonium groups are shown below, but the present disclosure is not limited thereto. In the following structural formula, Me represents a methyl group and Et represents an ethyl group.
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 ヨードニウム基は、下記式(B1)で表される基を含む。 The iodonium group includes a group represented by the following formula (B1).
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
 式(B1)中、R~Rはそれぞれ独立に、上記式(A1)におけるR~Rと同義である。好ましいR~Rの例としては、炭素数6~20のアリール基が挙げられる。 In the formula (B1), Re to R f are independently synonymous with Ra to R d in the above formula (A1). Examples of preferred Re to R f include aryl groups having 6 to 20 carbon atoms.
 ヨードニウム基の具体例を以下に示すが、本開示はこれらに限定されるものではない。 Specific examples of the iodonium group are shown below, but the present disclosure is not limited thereto.
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 ホスホニウム基は、下記式(C1)で表される基を含む。 The phosphonium group includes a group represented by the following formula (C1).
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 式(C1)中、R~Rはそれぞれ独立に、上記式(A1)におけるR~Rと同義である。好ましいR~Rの例としては、炭素数6~20のアリール基が挙げられる。 In the formula (C1), R g to R j are independently synonymous with R a to R d in the above formula (A1). Examples of preferable R g to R j include aryl groups having 6 to 20 carbon atoms.
 ホスホニウム基の具体例を以下に示すが、本開示はこれらに限定されるものではない。 Specific examples of the phosphonium group are shown below, but the present disclosure is not limited thereto.
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
 スルホニウム基は、下記式(D1)で表される基を含む。 The sulfonium group includes a group represented by the following formula (D1).
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
 式(D1)中、R~Rはそれぞれ独立に、上記式(A1)におけるR~Rと同義である。好ましい例としては、炭素数6~20のアリール基が挙げられる。好ましいR~Rの例としては、炭素数6~20のアリール基が挙げられる。 In the formula (D1), R k to R m are independently synonymous with R a to R d in the above formula (A1). Preferred examples include an aryl group having 6 to 20 carbon atoms. Examples of preferred R k ~ R m, and an aryl group having 6 to 20 carbon atoms.
 スルホニウム基の具体例を以下に示すが、本開示はこれらに限定されるものではない。 Specific examples of the sulfonium group are shown below, but the present disclosure is not limited thereto.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 上記オニウム基の中で、アンモニウム基が好ましい。
 式(1)で表される化合物中に、オニウム基を含む場合には、Mは上記オニウム基であってもよい。
 上記オニウム基は、分子内オニウム塩として存在してもよい。
Among the onium groups, an ammonium group is preferable.
When the compound represented by the formula (1) contains an onium group, M may be the above-mentioned onium group.
The onium group may exist as an intracellular onium salt.
 式(3)で表される基の具体例を以下に示すが、本開示はこれらに限定されるものではない。下記構造式中、Etはエチル基を表し、*は結合部位を表す。 Specific examples of the group represented by the formula (3) are shown below, but the present disclosure is not limited thereto. In the following structural formula, Et represents an ethyl group and * represents a binding site.
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
 式(4)で表される基の具体例を以下に示すが、本開示はこれらに限定されるものではない。下記構造式中、Etはエチル基を表し、*は結合部位を表す。 Specific examples of the group represented by the formula (4) are shown below, but the present disclosure is not limited thereto. In the following structural formula, Et represents an ethyl group and * represents a binding site.
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
 式(5)で表される基の具体例を以下に示すが、本開示はこれらに限定されるものではない。下記構造式中、*は結合部位を表す。 Specific examples of the group represented by the formula (5) are shown below, but the present disclosure is not limited thereto. In the following structural formula, * represents a binding site.
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
 式(2)~式(5)のいずれかで表される基は、式(1)で表される化合物中に1つ以上存在すればよい。式(2)~式(5)のいずれかで表される基の数の上限は、5が好ましい。式(2)~式(5)のいずれかで表される基の数は、好ましくは1~5、より好ましくは2~3である。
 式(2)~式(5)のいずれかで表される基は、式(1)で表される化合物中R又はRで表される基として存在してもよいし、M、Ar又はArで表される基中に存在してもよい。
 式(2)~式(5)のいずれかで表される基は、R及びRであることが特に好ましい。また、式(2)~式(5)のいずれかで表される基は、Ar及びArで表される基中に存在することが好ましい。
One or more groups represented by any of the formulas (2) to (5) may be present in the compound represented by the formula (1). The upper limit of the number of groups represented by any of the formulas (2) to (5) is preferably 5. The number of groups represented by any of the formulas (2) to (5) is preferably 1 to 5, and more preferably 2 to 3.
The group represented by any of the formulas (2) to (5) may exist as a group represented by R 4 or R 5 in the compound represented by the formula (1), or M 1 , It may be present in the group represented by Ar 1 or Ar 2.
Groups represented by any of the formulas (2) to (5) is particularly preferably a R 4 and R 5. Further, the group represented by any of the formulas (2) to (5) is preferably present in the groups represented by Ar 1 and Ar 2.
 上記式(1)におけるMは、エッジ汚れ抑制性、発色性、及び、経時発色性の観点から、-NR、-NR(SO)又は-NR(CO)であることが好ましい。
 ただし、R及びRはそれぞれ独立に、アリール基を表し、R、R及びRはそれぞれ独立に、アルキル基又はアリール基を表し、Rは、アルキル基、アリール基、又は、-NRd1d2を表し、Rd1及びRd2はそれぞれ独立に、水素原子、アルキル基又はアリール基を表す。
M 1 in the above formula (1) is -NR a R b , -NR c (SO 2 R d ) or -NR e (CO 2 R) from the viewpoint of edge stain suppression property, color development property, and color development property over time. f ) is preferable.
However, R a and R b each independently represent an aryl group, R c , Re and R f independently represent an alkyl group or an aryl group, and R d is an alkyl group, an aryl group, or an aryl group. -NR d1 represents R d2 , and R d1 and R d2 independently represent a hydrogen atom, an alkyl group or an aryl group.
 R~R、Rd1及びRd2におけるアルキル基は、炭素数1~20のアルキル基であることが好ましい。
 また、R~R、Rd1及びRd2におけるアリール基は、炭素数6~20のアリール基であることが好ましい。
 R~R、Rd1及びRd2におけるアルキル基及びアリール基は、置換基を有していてもよい。置換基の例としては、アルコキシ基、アリーロキシ基、アミノ基、アルキルチオ基、アリールチオ基、ハロゲン原子、カルボキシ基、カルボキシレート基、スルホ基、スルホネート基、アルキルオキシカルボニル基、アリールオキシカルボニル基、ホスホン酸基、ホスホネート基、及び、これらを組み合わせた基等が挙げられる。また、上記基が、アニオン性基である場合、塩を形成していてもよく、対カチオンは、シアニン色素構造のカチオンであっても、プロトン、金属カチオン、オニウム等であってもよい。
The alkyl group in R c to R f , R d1 and R d2 is preferably an alkyl group having 1 to 20 carbon atoms.
Further, the aryl group in R a to R f , R d1 and R d2 is preferably an aryl group having 6 to 20 carbon atoms.
The alkyl group and aryl group in R a to R f , R d1 and R d2 may have a substituent. Examples of substituents are alkoxy group, aryloxy group, amino group, alkylthio group, arylthio group, halogen atom, carboxy group, carboxylate group, sulfo group, sulfonate group, alkyloxycarbonyl group, aryloxycarbonyl group, phosphonic acid. Examples thereof include a group, a phosphonate group, and a group combining these groups. When the group is an anionic group, it may form a salt, and the counter cation may be a cation having a cyanine dye structure, a proton, a metal cation, onium, or the like.
 また、上記式(1)におけるMは、エッジ汚れ抑制性、発色性、及び、経時発色性の観点から、-O-Rであることが好ましい。
 ただし、Rは、熱又は赤外線露光によりR-O結合が開裂する基を表す。
Further, M 1 in the above formula (1) is preferably —OR 1 from the viewpoint of edge stain suppression property, color development property, and color development property over time.
However, R 1 is, R 1 -O bond by heat or infrared exposure represents a group which cleaves.
 発色性の観点から、Rは、下記式1-1~式1-7のいずれかで表される基であることが好ましく、下記式1-1~式1-3のいずれかで表される基であることがより好ましい。 From the viewpoint of color development, R 1 is preferably a group represented by any of the following formulas 1-1 to 1-7, and is represented by any of the following formulas 1-1 to 1-3. It is more preferable that it is a group.
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
 式1-1~式1-7中、●は、酸素原子との結合部位を表し、R20はそれぞれ独立に、水素原子、アルキル基、アルケニル基、アリール基、-OR24、-NR2526又は-SR27を表し、R21はそれぞれ独立に、水素原子、アルキル基又はアリール基を表し、R22はアリール基、-OR24、-NR2526、-SR27、-C(=O)R28、-OC(=O)R28又はハロゲン原子を表し、R23はアリール基、アルケニル基、アルコキシ基又はオニウム基を表し、R24~R27はそれぞれ独立に、水素原子、アルキル基又はアリール基を表し、R28はそれぞれ独立に、アルキル基、アリール基、-OR24、-NR2526又は-SR27を表し、Zは電荷を中和する対イオンを表す。 In formulas 1-1 to 1-7, ● represents a bond site with an oxygen atom, and R 20 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, -OR 24 , and -NR 25 R. 26 or -SR 27 , R 21 independently represents a hydrogen atom, an alkyl group or an aryl group, R 22 is an aryl group, -OR 24 , -NR 25 R 26 , -SR 27 , -C (= O) R 28 , -OC (= O) R 28 or halogen atom, R 23 represents an aryl group, an alkenyl group, an alkoxy group or an onium group, and R 24 to R 27 independently represent a hydrogen atom and an alkyl. Representing a group or aryl group, R 28 independently represents an alkyl group, an aryl group, -OR 24 , -NR 25 R 26 or -SR 27 , and Z 1 represents a charge-neutralizing counterion.
 R20、R21及びR24~R28がアルキル基である場合の好ましい態様は、R~R及びRにおけるアルキル基の好ましい態様と同様である。
 R20及びR23におけるアルケニル基の炭素数は、1~30であることが好ましく、1~15であることがより好ましく、1~10であることが更に好ましい。
 R20~R28がアリール基である場合の好ましい態様は、Rにおけるアリール基の好ましい態様と同様である。
The preferred embodiment when R 20 , R 21 and R 24 to R 28 are alkyl groups is the same as the preferred embodiment of the alkyl group in R 2 to R 9 and R 0 .
The carbon number of the alkenyl group in R 20 and R 23 is preferably 1 to 30, more preferably 1 to 15, and even more preferably 1 to 10.
The preferred embodiment when R 20 to R 28 are an aryl group is the same as the preferred embodiment of the aryl group in R 0.
 発色性の観点から、式1-1におけるR20は、アルキル基、アルケニル基、アリール基、-OR24、-NR2526又は-SR27であることが好ましく、アルキル基、-OR24、-NR2526又は-SR27であることがより好ましく、アルキル基又は-OR24であることが更に好ましく、-OR24であることが特に好ましい。
 また、式1-1におけるR20がアルキル基である場合、上記アルキル基は、α位にアリールチオ基又はアルキルオキシカルボニル基を有するアルキル基であることが好ましい。
 式1-1におけるR20が-OR24である場合、R24は、アルキル基であることが好ましく、炭素数1~8のアルキル基であることがより好ましく、イソプロピル基又はt-ブチル基であることが更に好ましく、t-ブチル基であることが特に好ましい。
From the viewpoint of color development, R 20 in the formula 1-1 is preferably an alkyl group, an alkenyl group, an aryl group, -OR 24 , -NR 25 R 26 or -SR 27 , and an alkyl group, -OR 24 , -NR 25 R 26 or -SR 27 is more preferred, an alkyl group or -OR 24 is even more preferred, and -OR 24 is particularly preferred.
When R 20 in the formula 1-1 is an alkyl group, the alkyl group is preferably an alkyl group having an arylthio group or an alkyloxycarbonyl group at the α-position.
When R 20 in the formula 1-1 is −OR 24 , R 24 is preferably an alkyl group, more preferably an alkyl group having 1 to 8 carbon atoms, and an isopropyl group or a t-butyl group. It is more preferable to have a t-butyl group, and it is particularly preferable to have a t-butyl group.
 発色性の観点から、式1-2におけるR21は、水素原子であることが好ましい。
 また、発色性の観点から、式1-2におけるR22は、-C(=O)OR24、-OC(=O)OR24又はハロゲン原子であることが好ましく、-C(=O)OR24又は-OC(=O)OR24であることがより好ましい。式1-2におけるR22が-C(=O)OR24又は-OC(=O)OR24である場合、R24は、アルキル基であることが好ましい。
From the viewpoint of color development, R 21 in the formula 1-2 is preferably a hydrogen atom.
Further, from the viewpoint of color development, R 22 in the formula 1-2 is preferably -C (= O) OR 24 , -OC (= O) OR 24 or a halogen atom, and is preferably -C (= O) OR. It is more preferably 24 or −OC (= O) OR 24. When R 22 in the formula 1-2 is -C (= O) OR 24 or -OC (= O) OR 24 , R 24 is preferably an alkyl group.
 発色性の観点から、式1-3におけるR21はそれぞれ独立に、水素原子又はアルキル基であることが好ましく、また、式1-3における少なくとも1つのR11が、アルキル基であることがより好ましい。
 また、R21におけるアルキル基は、炭素数1~10のアルキル基であることが好ましく、炭素数3~10のアルキル基であることがより好ましい。
 更に、R21におけるアルキル基は、環構造を含む分岐を有するアルキル基であることが好ましく、第二級又は第三級アルキル基であることがより好ましく、イソプロピル基、シクロペンチル基、シクロヘキシル基、又は、t-ブチル基であることが更に好ましい。
 また、発色性の観点から、式1-3におけるR23は、アリール基、アルコキシ基又はオニウム基であることが好ましく、p-ジメチルアミノフェニル基又はピリジニウム基であることがより好ましく、ピリジニウム基であることが更に好ましい。
 R23におけるオニウム基としては、ピリジニウム基、アンモニウム基、スルホニウム基等が挙げられる。オニウム基は、置換基を有していてもよい。置換基としては、アルキル基、アルコキシ基、アリーロキシ基、アミノ基、アルキルチオ基、アリールチオ基、ハロゲン原子、カルボキシ基、スルホ基、アルキルオキシカルボニル基、アリールオキシカルボニル基、これらを組み合わせた基等が挙げられるが、アルキル基、アリール基及びこれらを組み合わせた基であることが好ましい。
 中でも、ピリジニウム基が好ましく、N-アルキル-3-ピリジニウム基、N-ベンジル-3-ピリジニウム基、N-(アルコキシポリアルキレンオキシアルキル)-3-ピリジニウム基、N-アルコキシカルボニルメチル-3-ピリジニウム基、N-アルキル-4-ピリジニウム基、N-ベンジル-4-ピリジニウム基、N-(アルコキシポリアルキレンオキシアルキル)-4-ピリジニウム基、N-アルコキシカルボニルメチル-4-ピリジニウム基、又は、N-アルキル-3,5-ジメチル-4-ピリジニウム基がより好ましく、N-アルキル-3-ピリジニウム基、又は、N-アルキル-4-ピリジニウム基が更に好ましく、N-メチル-3-ピリジニウム基、N-オクチル-3-ピリジニウム基、N-メチル-4-ピリジニウム基、又は、N-オクチル-4-ピリジニウム基が特に好ましく、N-オクチル-3-ピリジニウム基、又は、N-オクチル-4-ピリジニウム基が最も好ましい。
 また、R23がピリジニウム基である場合、対アニオンとしては、スルホネートイオン、カルボキシレートイオン、テトラフルオロボレートイオン、ヘキサフルオロホスフェートイオン、p-トルエンスルホネートイオン、過塩素酸塩イオン等が挙げられ、p-トルエンスルホネートイオン、ヘキサフルオロホスフェートイオンが好ましい。
From the viewpoint of color development, it is preferable that R 21 in the formula 1-3 is independently a hydrogen atom or an alkyl group, and it is more preferable that at least one R 11 in the formula 1-3 is an alkyl group. preferable.
The alkyl group in R 21 is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 3 to 10 carbon atoms.
Further, the alkyl group in R 21 is preferably an alkyl group having a branch including a ring structure, more preferably a secondary or tertiary alkyl group, and is an isopropyl group, a cyclopentyl group, a cyclohexyl group, or an alkyl group. , T-butyl group is more preferable.
Further, from the viewpoint of color development, R 23 in the formula 1-3 is preferably an aryl group, an alkoxy group or an onium group, more preferably a p-dimethylaminophenyl group or a pyridinium group, and is a pyridinium group. It is more preferable to have.
Examples of the onium group in R 23 include a pyridinium group, an ammonium group, a sulfonium group and the like. The onium group may have a substituent. Examples of the substituent include an alkyl group, an alkoxy group, an aryloxy group, an amino group, an alkylthio group, an arylthio group, a halogen atom, a carboxy group, a sulfo group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and a group combining these groups. However, it is preferably an alkyl group, an aryl group, or a group in which these are combined.
Of these, a pyridinium group is preferable, and an N-alkyl-3-pyridinium group, an N-benzyl-3-pyridinium group, an N- (alkoxypolyalkyleneoxyalkyl) -3-pyridinium group, and an N-alkoxycarbonylmethyl-3-pyridinium group. , N-alkyl-4-pyridinium group, N-benzyl-4-pyridinium group, N- (alkoxypolyalkyleneoxyalkyl) -4-pyridinium group, N-alkoxycarbonylmethyl-4-pyridinium group, or N-alkyl -3,5-dimethyl-4-pyridinium group is more preferable, N-alkyl-3-pyridinium group or N-alkyl-4-pyridinium group is more preferable, N-methyl-3-pyridinium group, N-octyl. A -3-pyridinium group, an N-methyl-4-pyridinium group, or an N-octyl-4-pyridinium group is particularly preferable, and an N-octyl-3-pyridinium group or an N-octyl-4-pyridinium group is the most preferable. preferable.
When R 23 is a pyridinium group, examples of the counter anion include sulfonate ion, carboxylate ion, tetrafluoroborate ion, hexafluorophosphate ion, p-toluene sulfonate ion, perchlorate ion and the like. -Toluene sulfonate ion and hexafluorophosphate ion are preferable.
 発色性の観点から、式1-4におけるR20は、アルキル基又はアリール基であることが好ましく、2つのR20のうち、一方がアルキル基、他方がアリール基であることがより好ましい。
 発色性の観点から、式1-5におけるR20は、アルキル基又はアリール基であることが好ましく、アリール基であることがより好ましく、p-メチルフェニル基であることが更に好ましい。
 発色性の観点から、式1-6におけるR20はそれぞれ独立に、アルキル基又はアリール基であることが好ましく、メチル基又はフェニル基であることがより好ましい。
 発色性の観点から、式1-7におけるZは、電荷を中和する対イオンであればよく、化合物全体として、上記Zaに含まれてもよい。
 Zは、スルホネートイオン、カルボキシレートイオン、テトラフルオロボレートイオン、ヘキサフルオロホスフェートイオン、p-トルエンスルホネートイオン、又は、過塩素酸塩イオンであることが好ましく、p-トルエンスルホネートイオン、又は、ヘキサフルオロホスフェートイオンであることがより好ましい。
From the viewpoint of color development, R 20 in the formula 1-4 is preferably an alkyl group or an aryl group, and more preferably one of the two R 20s is an alkyl group and the other is an aryl group.
From the viewpoint of color development property, R 20 in the formula 1-5 is preferably an alkyl a group or an aryl group, more preferably an aryl group, more preferably a p- methylphenyl group.
From the viewpoint of color development property, R 20 are each independently of formula 1-6 is preferably an alkyl group or an aryl group, and more preferably a methyl group or a phenyl group.
From the viewpoint of color development, Z 1 in the formula 1-7 may be any counterion that neutralizes the charge, and the compound as a whole may be contained in the above Za.
Z 1 is preferably a sulfonate ion, a carboxylate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, a p-toluene sulfonate ion, or a perchlorate ion, and is preferably a p-toluene sulfonate ion or a hexafluoro. More preferably, it is a phosphate ion.
 発色性の観点から、更に好ましくは、Rは下記式(6)で表される基である。 From the viewpoint of color development, R 1 is more preferably a group represented by the following formula (6).
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
 式(6)中、R15及びR16はそれぞれ独立に、水素原子、アルキル基又はアリール基を表し、Eはオニウム基を表し、波線部分は酸素原子との結合位置を表す。 In formula (6), R 15 and R 16 independently represent a hydrogen atom, an alkyl group or an aryl group, E represents an onium group, and the wavy line portion represents a bond position with an oxygen atom.
 R15又はR16で表されるアルキル基は、R~R及びRにおけるアルキル基と同様であり、好ましい態様もR~R及びRにおけるアルキル基の好ましい態様と同様である。
 R15又はR16で表されるアリール基は、Rにおけるアリール基と同様であり、好ましい態様も、Rにおけるアリール基の好ましい態様と同様である。
 Eで表されるオニウム基は、R23におけるオニウム基と同様であり、好ましい態様もR23におけるオニウム基の好ましい態様と同様である。
The alkyl group represented by R 15 or R 16 is the same as the alkyl group in R 2 to R 9 and R 0 , and the preferred embodiment is also the same as the preferred embodiment of the alkyl group in R 2 to R 9 and R 0. ..
The aryl group represented by R 15 or R 16 is the same as the aryl group in R 0 , and the preferred embodiment is also the same as the preferred embodiment of the aryl group in R 0.
The onium group represented by E is the same as the onium group in R 23 , and the preferred embodiment is also the same as the preferred embodiment of the onium group in R 23.
 上記式(6)におけるEは、発色性の観点から、下記式(7)で表されるピリジニウム基であることが好ましい。 From the viewpoint of color development, E in the above formula (6) is preferably a pyridinium group represented by the following formula (7).
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
 式(7)中、R17はハロゲン原子、アルキル基、アリール基、ヒドロキシ基又はアルコキシ基を表し、R17が複数存在する場合、複数のR17は同じでも異なってもよく、あるいは複数のR17が連結して環を形成してもよく、n2は0~4の整数を表すし、R18はアルキル基、アリール基又は下記式(2)~式(5)で表される基を表し、Zbは電荷を中和するための対イオンを表す。 Wherein (7), R 17 represents a halogen atom, an alkyl group, an aryl group, hydroxy group or alkoxy group, if R 17 there are a plurality, the plurality of R 17 may be the same or different, or a plurality of R 17 may be linked to form a ring, n2 represents an integer of 0 to 4, and R 18 represents an alkyl group, an aryl group, or a group represented by the following formulas (2) to (5). , Zb represent a counterion for neutralizing the charge.
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036
 式(2)~式(5)中、R10は炭素数2~6のアルキレン基を表し、Wは単結合又は酸素原子を表し、n1は1~45の整数を表し、R11は炭素数1~12のアルキル基を表し、R12及びR13はそれぞれ独立に、単結合、又は、炭素数1~12のアルキレン基若しくはアルキレンオキシ基を表し、Mは水素原子、Na原子、K原子又はオニウム基を表し、また、式(1)で表される化合物全体で電荷が中和可能な場合は、Mを有していなくともよく、m1は1、2、3又は4を表し、Xは-O-、-S-又は-CH-を表し、波線部分は他の構造との結合位置を表す。 In formulas (2) to (5), R 10 represents an alkylene group having 2 to 6 carbon atoms, W 1 represents a single bond or an oxygen atom, n1 represents an integer of 1 to 45, and R 11 represents carbon. Represents an alkyl group of numbers 1 to 12, R 12 and R 13 independently represent a single bond or an alkylene group or an alkylene oxy group having 1 to 12 carbon atoms, and M represents a hydrogen atom, a Na atom, or a K atom. Alternatively, if the compound represents an onium group and the charge can be neutralized by the entire compound represented by the formula (1), it does not have to have M, m1 represents 1, 2, 3 or 4, and X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
 R17又はR18で表されるアルキル基又はアリール基は、R~R及びRにおけるアルキル基又はRにおけるアリール基と同様であり、好ましい態様もR~R及びRにおけるアルキル基又はRにおけるアリール基の好ましい態様と同様である。
 R17で表されるアルコキシ基は、炭素数1~10のアルコキシ基が好ましく、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基、n-ブトキシ基、イソブトキシ基、tert-ブトキシ基等が挙げられる。
 n2は、好ましくは、0である。
 Zbで表される電荷を中和するための対イオンは、式(1-7)におけるZと同様であり、好ましい態様も式(1-7)におけるZの好ましい態様と同様である。
 また、式(7)のR18における式(2)~式(5)で表される基は、上述した式(2)~式(5)で表される基と同義であり、好ましい態様も同様である。
The alkyl group or aryl group represented by R 17 or R 18 is the same as the alkyl group in R 2 to R 9 and R 0 or the aryl group in R 0 , and the preferred embodiment is also in R 2 to R 9 and R 0 . This is similar to the preferred embodiment of the alkyl group or the aryl group at R0.
The alkoxy group represented by R 17 is preferably an alkoxy group having 1 to 10 carbon atoms, and a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, an isobutoxy group, a tert-butoxy group and the like. Can be mentioned.
n2 is preferably 0.
The counterion for neutralizing the charge represented by Zb is the same as that of Z 1 in the formula (1-7), and the preferred embodiment is also the same as that of Z 1 in the formula (1-7).
Further, the group represented by the formula formulas (2) to the R 18 of (7) (5) has the same meaning as the group represented by the above-mentioned equations (2) to (5), preferred embodiments are also The same is true.
 以下にRの好ましい例を挙げるが、本開示はこれに限定されるものではない。なお、TsOは、トシレートアニオンを表し、●は、酸素原子との結合部位を表す。 Preferred examples of R 1 are shown below, but the present disclosure is not limited thereto. In addition, TsO represents a tosylate anion, and ● represents a binding site with an oxygen atom.
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
 上記発色性化合物の具体例を以下に示すが、本開示はこれらに限定されるものではない。下記構造式中、Meはメチル基を表し、TsOは、トシレートアニオンを表す。 Specific examples of the color-developing compound are shown below, but the present disclosure is not limited thereto. In the following structural formula, Me represents a methyl group and TsO represents a tosylate anion.
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000058
Figure JPOXMLDOC01-appb-C000058
Figure JPOXMLDOC01-appb-C000059
Figure JPOXMLDOC01-appb-C000059
Figure JPOXMLDOC01-appb-C000060
Figure JPOXMLDOC01-appb-C000060
 上記発色性化合物は、1種単独で使用しても、2種以上を併用してもよい。
 上記画像記録層において、上記発色性化合物は、任意な量で含有させることができるが、エッジ汚れ抑制性、発色性、経時発色性、機上現像性、及び、耐薬品性の観点から、画像記録層の全質量に対し上記発色性化合物の含有量が、0.1質量%~95質量%であることが好ましく、1質量%~75質量%であることがより好ましく、1質量%~50質量%であることが特に好ましい。
 また、上記画像記録層における上記発色性化合物の含有量は、エッジ汚れ抑制性、発色性、経時発色性、機上現像性、及び、耐薬品性の観点から、1mg/m~100mg/mであることが好ましく、10mg/m~80mg/mであることがより好ましく、20mg/m~60mg/mであることが特に好ましい。
The color-developing compound may be used alone or in combination of two or more.
In the image recording layer, the color-developing compound can be contained in an arbitrary amount, but from the viewpoint of edge stain suppression property, color development property, color development property over time, on-machine developability, and chemical resistance, the image is imaged. The content of the color-developing compound is preferably 0.1% by mass to 95% by mass, more preferably 1% by mass to 75% by mass, and 1% by mass to 50% by mass with respect to the total mass of the recording layer. It is particularly preferably mass%.
The content of the color-developing compound in the image recording layer is 1 mg / m 2 to 100 mg / m from the viewpoint of edge stain suppression, color development, color development over time, on-machine developability, and chemical resistance. It is preferably 2 , more preferably 10 mg / m 2 to 80 mg / m 2 , and particularly preferably 20 mg / m 2 to 60 mg / m 2.
 上記発色性化合物の作製方法としては、特に制限はなく、公知の方法により作製することができる。
 例えば、上記式(1)で表される化合物は、合成スキームとして下記に示す合成法に準じて得ることができる。
 例えば、上記式1-1、式1-5又は式1-6のいずれかで表される基を導入する方法としては、下記式S1~式S3で表される合成スキームが好適に挙げられ、上記式1-2~式1-4のいずれかで表される基を導入する方法としては、下記式S4で表される合成スキームが好適に挙げられる。
 なお、DMAPは、N,N-ジメチルアミノ-4-ピリジンを表し、AcONaは、酢酸ナトリウムを表し、NEtは、トリエチルアミンを表し、catecolは、カテコールである。また、Rは、式1-1~式1-7における各部分に対応する基を表す。
The method for producing the color-developing compound is not particularly limited, and the color-developing compound can be produced by a known method.
For example, the compound represented by the above formula (1) can be obtained as a synthetic scheme according to the synthetic method shown below.
For example, as a method for introducing a group represented by any of the above formulas 1-1, 1-5 or 1-6, synthetic schemes represented by the following formulas S1 to S3 are preferably mentioned. As a method for introducing a group represented by any of the above formulas 1-2 to 1-4, a synthetic scheme represented by the following formula S4 is preferably mentioned.
DMAP represents N, N-dimethylamino-4-pyridine, AcONa represents sodium acetate, NEt 3 represents triethylamine, and catecol is catechol. Further, R represents a group corresponding to each portion in the formulas 1-1 to 1-7.
Figure JPOXMLDOC01-appb-C000061
Figure JPOXMLDOC01-appb-C000061
Figure JPOXMLDOC01-appb-C000062
Figure JPOXMLDOC01-appb-C000062
-分子量1,000以下の支持体吸着性化合物-
 上記画像記録層は、エッジ汚れ抑制性、及び、機上現像性の観点から、支持体吸着性を有し、分子量が1,000以下であり、分子中にエチレン性不飽和基を有さない化合物(「分子量1,000以下の支持体吸着性化合物」、又は、「支持体吸着性化合物」ともいう。)を含むことが好ましい。
 ここで、「支持体吸着性」とは、支持体が有する陽極酸化皮膜に対する吸着性を意味する。陽極酸化皮膜に対する吸着性の有無は、以下の方法により、容易に判定することができる。
 即ち、試験化合物を易溶性溶媒(例えば、水)に溶解した溶液を調製する。この溶液を乾燥後の塗布量が30mg/mとなるように陽極酸化皮膜を有するアルミニウム支持体上に塗布し乾燥させる。次に試験化合物を塗布したアルミニウム支持体を、上記易溶性溶媒を用いて洗浄と乾燥を5回繰り返した後、洗浄除去されなかった試験化合物の残存量を測定する。残存量の測定は、残存する試験化合物量を直接定量してもよいし、洗浄液中に溶解した試験化合物量を定量してもよい。試験化合物の定量は、例えば蛍光X線測定、反射分光吸光度測定などで実施することができる。
 残存量が、1mg/m以上であれば、試験化合物は、支持体吸着性を有すると判定される。
-Support-adsorptive compound with a molecular weight of 1,000 or less-
The image recording layer has support adsorption property from the viewpoint of edge stain suppression property and on-machine developability, has a molecular weight of 1,000 or less, and does not have an ethylenically unsaturated group in the molecule. It is preferable to contain a compound (also referred to as "support-adsorbing compound having a molecular weight of 1,000 or less" or "support-adsorbing compound").
Here, the "support adsorptivity" means the adsorptivity of the support to the anodic oxide film. The presence or absence of adsorptivity to the anodic oxide film can be easily determined by the following method.
That is, a solution in which the test compound is dissolved in an easily soluble solvent (for example, water) is prepared. This solution is applied onto an aluminum support having an anodic oxide film so that the applied amount after drying is 30 mg / m 2, and dried. Next, the aluminum support coated with the test compound is washed and dried 5 times using the above-mentioned easily soluble solvent, and then the residual amount of the test compound that has not been washed and removed is measured. For the measurement of the residual amount, the amount of the remaining test compound may be directly quantified, or the amount of the test compound dissolved in the washing liquid may be quantified. The quantification of the test compound can be carried out by, for example, fluorescence X-ray measurement, reflection spectroscopic absorbance measurement, or the like.
If the residual amount is 1 mg / m 2 or more, the test compound is determined to have support adsorptivity.
 支持体吸着性化合物は、アルミニウム支持体が有する陽極酸化皮膜に対して吸着性を示す基を有することが好ましい。アルミニウム支持体が有する陽極酸化皮膜に対して吸着性を示す基としては、陽極酸化皮膜の表面に存在する物質(例えば、金属、金属酸化物)又は官能基(例えば、ヒドロキシ基)と、化学結合(例えば、イオン結合、水素結合、配位結合)を形成することができる官能基が挙げられる。このような官能基の中で、酸基が好ましい。酸基は、酸解離定数(pKa)が7以下であることが好ましい。酸基の例としては、フェノール性水酸基、カルボキシ基、-SOH、-OSOH、-PO、-OPO、-CONHSO-、-SONHSO-、-COCHCOCHなどが挙げられる。特に、-OPO及び-POが好ましい。酸基は、塩を形成していてもよい。酸基が形成する塩としては、アルカリ金属塩、アルカリ土類金属塩、アンモニウム塩などが挙げられる。 The support-adsorptive compound preferably has a group that exhibits adsorptivity to the anodic oxide film of the aluminum support. The group exhibiting the adsorptivity to the anodic oxide film of the aluminum support is a chemical bond with a substance (for example, metal, metal oxide) or functional group (for example, hydroxy group) existing on the surface of the anodic oxide film. Examples include functional groups capable of forming (eg, ionic bonds, hydrogen bonds, coordination bonds). Among such functional groups, an acid group is preferable. The acid group preferably has an acid dissociation constant (pKa) of 7 or less. Examples of acid groups include phenolic hydroxyl groups, carboxy groups, -SO 3 H, -OSO 3 H, -PO 3 H 2 , -OPO 3 H 2 , -CONHSO 2- , -SO 2 NHSO 2- , -COCH. 2 COCH 3 and the like can be mentioned. In particular, -OPO 3 H 2 and -PO 3 H 2 are preferable. The acid group may form a salt. Examples of the salt formed by the acid group include an alkali metal salt, an alkaline earth metal salt, and an ammonium salt.
 支持体吸着性化合物の分子量は、1,000以下である。分子量が1,000以下であることにより、機上現像時に陽極酸化皮膜の表面に移動しやすく、優れたエッジ汚れ防止効果が得られる。分子量は、好ましくは50~1,000、より好ましくは50~800、更に好ましくは50~600である。 The molecular weight of the support-adsorbing compound is 1,000 or less. When the molecular weight is 1,000 or less, it easily moves to the surface of the anodic oxide film during on-machine development, and an excellent edge stain prevention effect can be obtained. The molecular weight is preferably 50 to 1,000, more preferably 50 to 800, and even more preferably 50 to 600.
 支持体吸着性化合物は、分子中にエチレン性不飽和基を有さない。エチレン性不飽和基とは、重合性を有する基であり、(メタ)アクリル基、ビニル基、アリル基、スチリル基などの基を包含する。支持体吸着性化合物が、分子中にエチレン性不飽和基を有さないことにより、露光で特定低分子化合物が画像記録層とともに硬化することを抑制できる。 The support-adsorbing compound does not have an ethylenically unsaturated group in the molecule. The ethylenically unsaturated group is a group having a polymerizable property, and includes a (meth) acrylic group, a vinyl group, an allyl group, a styryl group and the like. Since the support-adsorbing compound does not have an ethylenically unsaturated group in the molecule, it is possible to prevent the specific small molecule compound from being cured together with the image recording layer by exposure.
 支持体吸着性化合物としては、オキソ酸を用いることができる。オキソ酸は、同じ原子にヒドロキシ基(-OH)とオキソ基(=O)が結合しており、且つそのヒドロキシ基が酸性プロトンを与える化合物を指す。 Oxyacid can be used as the support-adsorbing compound. An oxo acid refers to a compound in which a hydroxy group (-OH) and an oxo group (= O) are bonded to the same atom, and the hydroxy group gives an acidic proton.
 支持体吸着性化合物としては、リン酸、ポリリン酸、メタリン酸、第一リン酸アンモニウム、第二リン酸アンモニウム、リン酸二水素ナトリウム、リン酸一水素ナトリウム、第一リン酸カリウム、第二リン酸カリウム、トリポリリン酸ナトリウム、ピロリン酸カリウム、ヘキサメタリン酸ナトリウム、ホスフィン酸、エチルホスホン酸、プロピルホスホン酸、i-プロピルホスホン酸、ブチルホスホン酸、ヘキシルホスホン酸、オクチルホスホン酸、ドデシルホスホン酸、オクタデシルホスホン酸、2-ヒドロキシエチルホスホン酸及びこれらのナトリウム塩又はカリウム塩、メチルホスホン酸メチル、エチルホスホン酸メチル、2-ヒドロキシエチルホスホン酸メチルなどのアルキルホスホン酸モノアルキルエステル及びこれらのナトリウム塩又はカリウム塩、メチレンジホスホン酸、エチレンジホスホン酸等のアルキレンジホスホン酸及びこれらのナトリウム塩又はカリウム塩、ポリビニルホスホン酸、p-トルエンスルホン酸、p-トルエンスルホン酸ナトリウム、スルホフタル酸、クエン酸などが挙げられる。 Support-adsorbing compounds include phosphoric acid, polyphosphoric acid, metaphosphoric acid, ammonium primary phosphate, ammonium secondary phosphate, sodium dihydrogen phosphate, sodium monohydrogen phosphate, potassium primary phosphate, and phosphorus secondary. Potassium acid, sodium tripolyphosphate, potassium pyrophosphate, sodium hexametaphosphate, phosphinic acid, ethylphosphonic acid, propylphosphonic acid, i-propylphosphonic acid, butylphosphonic acid, hexylphosphonic acid, octylphosphonic acid, dodecylphosphonic acid, octadecylphosphon Acids, 2-hydroxyethylphosphonic acid and sodium or potassium salts thereof, alkylphosphonic acid monoalkyl esters such as methyl methylphosphonate, methyl ethylphosphonate, methyl 2-hydroxyethylphosphonate and sodium or potassium salts thereof, Examples thereof include alkylene diphosphonic acids such as methylene diphosphonic acid and ethylene diphosphonic acid, sodium salts or potassium salts thereof, polyvinylphosphonic acid, p-toluenesulfonic acid, sodium p-toluenesulfonate, sulfophthalic acid, citric acid and the like. ..
 支持体吸着性化合物としては、下記式(B)で表される化合物が好ましい。 As the support-adsorbing compound, a compound represented by the following formula (B) is preferable.
Figure JPOXMLDOC01-appb-C000063
Figure JPOXMLDOC01-appb-C000063
 式(B)中、nBは、2~10の整数を表し、RB1、RB2及びRB3はそれぞれ独立に、水素原子、アルキル基又はアルキレンオキシド基を表す。 Wherein (B), nB is an integer of 2 to 10, are each R B1, R B2 and R B3 independently represent a hydrogen atom, an alkyl group or alkylene oxide group.
 式(B)におけるアルキル基は、炭素数1~10のアルキル基が好ましく、炭素数1~5のアルキル基がより好ましく、炭素数1~3のアルキル基が更に好ましい。
 式(B)におけるアルキレンオキシド基は、炭素数2又は3のアルキレンオキシド単位を1~10個有するアルキレンオキシド基が好ましく、炭素数2又は3のアルキレンオキシド単位を1~5個有するアルキレンオキシド基がより好ましく、炭素数2又は3のアルキレンオキシド単位を1~3個有するアルキレンオキシド基が更に好ましい。
The alkyl group in the formula (B) is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 5 carbon atoms, and even more preferably an alkyl group having 1 to 3 carbon atoms.
The alkylene oxide group in the formula (B) is preferably an alkylene oxide group having 1 to 10 alkylene oxide units having 2 or 3 carbon atoms, and an alkylene oxide group having 1 to 5 alkylene oxide units having 2 or 3 carbon atoms. More preferably, an alkylene oxide group having 1 to 3 alkylene oxide units having 2 or 3 carbon atoms is further preferable.
 支持体吸着性化合物としては、エッジ汚れ抑制性、及び、機上現像性の観点から、リン酸、ポリリン酸、ホスホン酸又はホスフィン酸が特に好ましい。 As the support-adsorbing compound, phosphoric acid, polyphosphoric acid, phosphoric acid or phosphinic acid is particularly preferable from the viewpoint of edge stain suppressing property and on-machine developability.
 また、支持体吸着性化合物は、エッジ汚れ抑制性、及び、機上現像性の観点から、2つ以上のヒドロキシ基を有するヒドロキシ酸化合物(以下、「特定ヒドロキシ酸化合物」ともいう。)を含むことが好ましい。 Further, the support-adsorbing compound includes a hydroxy acid compound having two or more hydroxy groups (hereinafter, also referred to as “specific hydroxy acid compound”) from the viewpoint of edge stain suppression property and on-machine developability. Is preferable.
 特定ヒドロキシ酸化合物は、2つ以上のヒドロキシ基を有するヒドロキシカルボン酸及びその塩を包含する。塩としては、例えば、ナトリウム塩、カリウム塩、リチウム塩、カルシウム塩、マグネシウム塩、アルミニウム塩、アンモニウム塩が挙げられる。
 2つ以上のヒドロキシ基を有するヒドロキシカルボン酸におけるヒドロキシ基の数は、2~15が好ましく、3~10がより好ましく、4~7が更に好ましい。
 2つ以上のヒドロキシ基を有するヒドロキシカルボン酸におけるカルボキシ基の数は1~10が好ましく、1~5がより好ましく、1~3が更に好ましい。
Specific hydroxy acid compounds include hydroxycarboxylic acids having two or more hydroxy groups and salts thereof. Examples of the salt include sodium salt, potassium salt, lithium salt, calcium salt, magnesium salt, aluminum salt and ammonium salt.
The number of hydroxy groups in the hydroxycarboxylic acid having two or more hydroxy groups is preferably 2 to 15, more preferably 3 to 10, and even more preferably 4 to 7.
The number of carboxy groups in the hydroxycarboxylic acid having two or more hydroxy groups is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3.
 特定ヒドロキシ酸化合物は高い親水性を有することがエッジ汚れ防止の観点で好ましい。特定ヒドロキシ酸化合物の親水性は、一般に化合物の親水性を表す指標として知られているClogP値を用いて表すことができる。特定ヒドロキシ酸化合物はClogP値が0.5以下であることが好ましく、-1以下であることがより好ましく、-3以下であることが更に好ましい。また、特定ヒドロキシ酸化合物のClogP値は、端部領域における画像形成性の観点からは、-10以上が好ましく、-7以上がより好ましく、-5以上が更に好ましい。
 ここで、特定ヒドロキシ酸化合物のClogP値は分子構造式エディタソフト「ChemDraw Professional 2016」により分子構造から算出された数値である。
It is preferable that the specific hydroxy acid compound has high hydrophilicity from the viewpoint of preventing edge stains. The hydrophilicity of the specific hydroxy acid compound can be expressed by using the ClogP value, which is generally known as an index indicating the hydrophilicity of the compound. The specific hydroxy acid compound preferably has a ClogP value of 0.5 or less, more preferably -1 or less, and even more preferably -3 or less. Further, the ClogP value of the specific hydroxy acid compound is preferably -10 or more, more preferably -7 or more, still more preferably -5 or more, from the viewpoint of image forming property in the end region.
Here, the ClogP value of the specific hydroxy acid compound is a numerical value calculated from the molecular structure by the molecular structure editor software "ChemDraw Professional 2016".
 特定ヒドロキシ酸化合物の分子量は1,000以下が好ましい。分子量が1,000以下であることにより、特定ヒドロキシ酸化合物が機上現像時に陽極酸化皮膜の表面に容易に移動し、エッジ汚れ防止に有効に寄与することができる。特定ヒドロキシ酸化合物の分子量は80~1,000がより好ましく、100~500が更に好ましく、100~300が特に好ましい。 The molecular weight of the specific hydroxy acid compound is preferably 1,000 or less. When the molecular weight is 1,000 or less, the specific hydroxy acid compound easily moves to the surface of the anodic oxide film during on-machine development, and can effectively contribute to the prevention of edge stains. The molecular weight of the specific hydroxy acid compound is more preferably 80 to 1,000, further preferably 100 to 500, and particularly preferably 100 to 300.
 特定ヒドロキシ酸化合物としては、グリセリン酸、グルコン酸、酒石酸、メバロン酸、パントイン酸、キナ酸、シキミ酸、没食子酸、コーヒー酸、2,3-ジヒドロキシ安息香酸、2,4-ジヒドロキシ安息香酸、2,5-ジヒドロキシ安息香酸、2,6-ジヒドロキシ安息香酸、3,4-ジヒドロキシ安息香酸、3,5-ジヒドロキシ安息香酸、2,3,4-トリヒドロキシ安息香酸、3,4,5-トリヒドロキシ安息香酸、グルコン酸ナトリウム、グルコン酸カリウム、酒石酸ナトリウム、没食子酸ナトリウムなどが挙げられる。
 特定ヒドロキシ酸化合物としては、エッジ汚れ抑制性、及び、機上現像性の観点から、グルコン酸、酒石酸、メバロン酸、キナ酸、グルコン酸Na、グルコン酸K、又は、酒石酸Naが好ましく、グルコン酸、グルコン酸Na、又は、グルコン酸Kがより好ましく、グルコン酸が特に好ましい。
Specific hydroxy acid compounds include glyceric acid, gluconic acid, tartrate acid, mevalonic acid, pantoic acid, quinic acid, shikimic acid, gallic acid, coffee acid, 2,3-dihydroxybenzoic acid, 2,4-dihydroxybenzoic acid, and 2 , 5-Dihydroxybenzoic acid, 2,6-dihydroxybenzoic acid, 3,4-dihydroxybenzoic acid, 3,5-dihydroxybenzoic acid, 2,3,4-trihydroxybenzoic acid, 3,4,5-trihydroxy Examples thereof include benzoic acid, sodium gluconate, potassium gluconate, sodium tartrate, and sodium gallic acid.
As the specific hydroxy acid compound, gluconic acid, tartaric acid, mevalonic acid, quinic acid, Na gluconate, K gluconate, or Na tartrate is preferable from the viewpoint of edge stain suppression and on-machine developability. , Na gluconate, or K gluconate is more preferable, and gluconic acid is particularly preferable.
 支持体吸着性化合物は、1種単独で使用してもよいし、2種以上を併用してもよい。
 画像記録層における支持体吸着性化合物の含有量は、エッジ汚れ抑制性、及び、機上現像性の観点から、10mg/m~150mg/mが好ましく、30mg/m~100mg/mがより好ましく、50mg/m~100mg/mが特に好ましい。
 また、支持体吸着性化合物の含有量は、エッジ汚れ抑制性、及び、機上現像性の観点から、画像記録層の全質量に対して、0.5質量%~20質量%が好ましく、1質量%~15質量%がより好ましく、2質量%~10質量%が更に好ましい。
The support-adsorbing compound may be used alone or in combination of two or more.
The content of the support-adsorbing compound in the image recording layer, edge soiling inhibitory, and, in view of on-press development property, 10mg / m 2 ~ 150mg / m 2 are preferred, 30mg / m 2 ~ 100mg / m 2 Is more preferable, and 50 mg / m 2 to 100 mg / m 2 is particularly preferable.
The content of the support-adsorbing compound is preferably 0.5% by mass to 20% by mass with respect to the total mass of the image recording layer from the viewpoint of edge stain suppression and on-machine developability. More preferably, it is from mass% to 15% by mass, and even more preferably from 2% by mass to 10% by mass.
-重合性化合物-
 上記画像記録層は、重合性化合物を含むことが好ましい。
 本開示に用いられる重合性化合物は、例えば、ラジカル重合性化合物であっても、カチオン重合性化合物であってもよいが、少なくとも1個のエチレン性不飽和結合を有する付加重合性化合物(エチレン性不飽和化合物)であることが好ましい。エチレン性不飽和化合物としては、末端エチレン性不飽和結合を少なくとも1個有する化合物であることが好ましく、末端エチレン性不飽和結合を2個以上有する化合物であることがより好ましい。重合性化合物は、例えばモノマー、プレポリマー、すなわち2量体、3量体若しくはオリゴマー、又は、それらの混合物などの化学的形態をもつ。
-Polymerizable compound-
The image recording layer preferably contains a polymerizable compound.
The polymerizable compound used in the present disclosure may be, for example, a radical-polymerizable compound or a cationically polymerizable compound, but is an addition-polymerizable compound having at least one ethylenically unsaturated bond (ethyleney). It is preferably an unsaturated compound). The ethylenically unsaturated compound is preferably a compound having at least one terminal ethylenically unsaturated bond, and more preferably a compound having two or more terminal ethylenically unsaturated bonds. The polymerizable compound has a chemical form such as, for example, a monomer, a prepolymer, that is, a dimer, a trimer or an oligomer, or a mixture thereof.
 モノマーの例としては、不飽和カルボン酸(例えば、アクリル酸、メタクリル酸、イタコン酸、クロトン酸、イソクロトン酸、マレイン酸など)や、そのエステル類、アミド類が挙げられ、好ましくは、不飽和カルボン酸と多価アルコール化合物とのエステル類、不飽和カルボン酸と多価アミン化合物とのアミド類が用いられる。また、ヒドロキシ基、アミノ基、メルカプト基等の求核性置換基を有する不飽和カルボン酸エステル類あるいはアミド類と単官能もしくは多官能イソシアネート類あるいはエポキシ類との付加反応物、及び単官能もしくは多官能のカルボン酸との脱水縮合反応物等も好適に使用される。また、イソシアネート基、エポキシ基等の親電子性置換基を有する不飽和カルボン酸エステル類あるいはアミド類と単官能又は多官能のアルコール類、アミン類、チオール類との付加反応物、更にハロゲン原子、トシルオキシ基等の脱離性置換基を有する不飽和カルボン酸エステル類あるいはアミド類と単官能又は多官能のアルコール類、アミン類、チオール類との置換反応物も好適である。また、別の例として、上記の不飽和カルボン酸を、不飽和ホスホン酸、スチレン、ビニルエーテル等に置き換えた化合物群を使用することも可能である。これらは、特表2006-508380号公報、特開2002-287344号公報、特開2008-256850号公報、特開2001-342222号公報、特開平9-179296号公報、特開平9-179297号公報、特開平9-179298号公報、特開2004-294935号公報、特開2006-243493号公報、特開2002-275129号公報、特開2003-64130号公報、特開2003-280187号公報、特開平10-333321号公報等に記載されている。 Examples of the monomer include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, amides, etc., and unsaturated carboxylic acids are preferable. Esters of acids and polyhydric alcohol compounds and amides of unsaturated carboxylic acids and polyhydric amine compounds are used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxy group, an amino group or a mercapto group with a monofunctional or polyfunctional isocyanate or an epoxy, and a monofunctional or polyfunctional group. A dehydration condensation reaction product with a functional carboxylic acid is also preferably used. Further, an addition reaction product of unsaturated carboxylic acid esters or amides having an electrophilic substituent such as an isocyanate group or an epoxy group with monofunctional or polyfunctional alcohols, amines and thiols, and a halogen atom, Substituents of unsaturated carboxylic acid esters or amides having a releasable substituent such as a tosyloxy group with monofunctional or polyfunctional alcohols, amines and thiols are also suitable. Further, as another example, it is also possible to use a compound group in which the above unsaturated carboxylic acid is replaced with unsaturated phosphonic acid, styrene, vinyl ether or the like. These are JP-A-2006-508380, JP-A-2002-287344, JP-A-2008-256850, JP-A-2001-342222, JP-A-9-179296, JP-A-9-179297. , JP-A-9-179298, JP-A-2004-294935, JP-A-2006-243493, JP-A-2002-275129, JP-A-2003-64130, JP-A-2003-280187, It is described in Kaihei 10-333321.
 多価アルコール化合物と不飽和カルボン酸とのエステルのモノマーの具体例としては、アクリル酸エステルとして、エチレングリコールジアクリレート、1,3-ブタンジオールジアクリレート、テトラメチレングリコールジアクリレート、プロピレングリコールジアクリレート、トリメチロールプロパントリアクリレート、ヘキサンジオールジアクリレート、テトラエチレングリコールジアクリレート、ペンタエリスリトールテトラアクリレート、ソルビトールトリアクリレート、イソシアヌル酸エチレンオキシド(EO)変性トリアクリレート、ポリエステルアクリレートオリゴマー等がある。メタクリル酸エステルとして、テトラメチレングリコールジメタクリレート、ネオペンチルグリコールジメタクリレート、トリメチロールプロパントリメタクリレート、エチレングリコールジメタクリレート、ペンタエリスリトールトリメタクリレート、ビス〔p-(3-メタクリルオキシ-2-ヒドロキシプロポキシ)フェニル〕ジメチルメタン、ビス〔p-(メタクリルオキシエトキシ)フェニル〕ジメチルメタン等がある。また、多価アミン化合物と不飽和カルボン酸とのアミドのモノマーの具体例としては、メチレンビスアクリルアミド、メチレンビスメタクリルアミド、1,6-ヘキサメチレンビスアクリルアミド、1,6-ヘキサメチレンビスメタクリルアミド、ジエチレントリアミントリスアクリルアミド、キシリレンビスアクリルアミド、キシリレンビスメタクリルアミド等がある。 Specific examples of the monomer of the ester of the polyhydric alcohol compound and the unsaturated carboxylic acid include ethylene glycol diacrylate, 1,3-butanediol diacrylate, tetramethylene glycol diacrylate, and propylene glycol diacrylate as acrylic acid esters. Trimethylol propan triacrylate, hexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol tetraacrylate, sorbitol triacrylate, isocyanurate ethylene oxide (EO) modified triacrylate, polyester acrylate oligomer and the like. As methacrylic acid ester, tetramethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropantrimethacrylate, ethylene glycol dimethacrylate, pentaerythritol trimethacrylate, bis [p- (3-methacryloxy-2-hydroxypropoxy) phenyl] There are dimethylmethane, bis [p- (methacrylicoxyethoxy) phenyl] dimethylmethane and the like. Specific examples of the amide monomer of the polyvalent amine compound and the unsaturated carboxylic acid include methylenebisacrylamide, methylenebismethacrylamide, 1,6-hexamethylenebisacrylamide, and 1,6-hexamethylenebismethacrylamide. Diethylenetriaminetrisacrylamide, xylylenebisacrylamide, xylylenebismethacrylamide and the like.
 また、イソシアネートとヒドロキシ基の付加反応を用いて製造されるウレタン系付加重合性化合物も好適であり、その具体例としては、例えば、特公昭48-41708号公報に記載されている1分子に2個以上のイソシアネート基を有するポリイソシアネート化合物に、下記式(M)で表されるヒドロキシ基を含有するビニルモノマーを付加させた1分子中に2個以上の重合性ビニル基を含有するビニルウレタン化合物等が挙げられる。
 CH=C(RM4)COOCHCH(RM5)OH    (M)
 式(M)中、RM4及びRM5はそれぞれ独立に、水素原子又はメチル基を表す。
Further, a urethane-based addition-polymerizable compound produced by using an addition reaction of isocyanate and a hydroxy group is also suitable, and specific examples thereof include, for example, 2 in 1 molecule described in Japanese Patent Publication No. 48-41708. A vinyl urethane compound containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxy group represented by the following formula (M) to a polyisocyanate compound having two or more isocyanate groups. And so on.
CH 2 = C (R M4) COOCH 2 CH (R M5) OH (M)
In formula (M), RM4 and RM5 each independently represent a hydrogen atom or a methyl group.
 また、特開昭51-37193号公報、特公平2-32293号公報、特公平2-16765号公報、特開2003-344997号公報、特開2006-65210号公報に記載のウレタンアクリレート類、特公昭58-49860号公報、特公昭56-17654号公報、特公昭62-39417号公報、特公昭62-39418号公報、特開2000-250211号公報、特開2007-94138号公報に記載のエチレンオキサイド系骨格を有するウレタン化合物類、米国特許第7153632号明細書、特表平8-505958号公報、特開2007-293221号公報、特開2007-293223号公報に記載の親水基を有するウレタン化合物類も好適である。 Further, the urethane acrylates described in JP-A-51-37193, JP-A-2-32293, JP-A-2-16765, JP-A-2003-344997, and JP-A-2006-65210, The ethylenes described in JP-A-58-49860, JP-A-56-17654, JP-A-62-39417, JP-A-62-39418, JP-A-2000-250211 and JP-A-2007-94138. Urethane compounds having an oxide-based skeleton, urethane compounds having a hydrophilic group described in US Pat. No. 7,153,632, JP-A-8-505598, JP-A-2007-293221, JP-A-2007-293223. Kind is also suitable.
 重合性化合物の構造、単独使用か併用か、添加量等の使用方法の詳細は、任意に設定できる。
 重合性化合物の含有量は、画像記録層の全質量に対して、5質量%~75質量%であることが好ましく、10質量%~70質量%であることがより好ましく、15質量%~60質量%であることが特に好ましい。
The details of the method of use such as the structure of the polymerizable compound, whether it is used alone or in combination, and the amount of addition can be arbitrarily set.
The content of the polymerizable compound is preferably 5% by mass to 75% by mass, more preferably 10% by mass to 70% by mass, and 15% by mass to 60% by mass with respect to the total mass of the image recording layer. It is particularly preferably mass%.
-重合開始剤-
 本開示に係る平版印刷版原版における画像記録層は、重合開始剤を含むことが好ましく、重合開始剤、及び、重合性化合物を含むことがより好ましい。
 また、重合開始剤としては、電子受容型重合開始剤を含むことが好ましく、電子受容型重合開始剤、及び、電子供与型重合開始剤を含むことがより好ましい。
-Polymerization initiator-
The image recording layer in the lithographic printing plate original plate according to the present disclosure preferably contains a polymerization initiator, and more preferably contains a polymerization initiator and a polymerizable compound.
Further, the polymerization initiator preferably contains an electron-accepting type polymerization initiator, and more preferably contains an electron-accepting type polymerization initiator and an electron-donating type polymerization initiator.
<<電子受容型重合開始剤>>
 上記画像記録層は、重合開始剤として、電子受容型重合開始剤を含むことが好ましい。
 電子受容型重合開始剤は、赤外線露光により赤外線吸収剤の電子が励起した際に、分子間電子移動で一電子を受容することにより、ラジカル等の重合開始種を発生する化合物である。
 本開示に用いられる電子受容型重合開始剤は、光、熱あるいはその両方のエネルギーによりラジカルやカチオン等の重合開始種を発生する化合物であって、公知の熱重合開始剤、結合解離エネルギーの小さな結合を有する化合物、光重合開始剤などを適宜選択して用いることができる。
 電子受容型重合開始剤としては、ラジカル重合開始剤が好ましく、オニウム塩化合物がより好ましい。
 また、電子受容型重合開始剤としては、赤外線感光性重合開始剤であることが好ましい。
 電子受容型ラジカル重合開始剤としては、例えば、(a)有機ハロゲン化物、(b)カルボニル化合物、(c)アゾ化合物、(d)有機過酸化物、(e)メタロセン化合物、(f)アジド化合物、(g)ヘキサアリールビイミダゾール化合物、(i)ジスルホン化合物、(j)オキシムエステル化合物、及び、(k)オニウム塩化合物が挙げられる。
<< Electron Receptor Polymerization Initiator >>
The image recording layer preferably contains an electron-accepting polymerization initiator as the polymerization initiator.
The electron-accepting polymerization initiator is a compound that generates a polymerization initiator such as a radical by accepting one electron by electron transfer between molecules when the electrons of the infrared absorber are excited by infrared exposure.
The electron-accepting polymerization initiator used in the present disclosure is a compound that generates a polymerization initiator such as a radical or a cation by energy of light, heat, or both, and is a known thermal polymerization initiator and has a small bond dissociation energy. A compound having a bond, a photopolymerization initiator and the like can be appropriately selected and used.
As the electron-accepting polymerization initiator, a radical polymerization initiator is preferable, and an onium salt compound is more preferable.
Further, the electron-accepting polymerization initiator is preferably an infrared photosensitive polymerization initiator.
Examples of the electron-accepting radical polymerization initiator include (a) organic halides, (b) carbonyl compounds, (c) azo compounds, (d) organic peroxides, (e) metallocene compounds, and (f) azide compounds. , (G) hexaarylbiimidazole compounds, (i) disulfone compounds, (j) oxime ester compounds, and (k) onium salt compounds.
 (a)有機ハロゲン化物としては、例えば、特開2008-195018号公報の段落0022~0023に記載の化合物が好ましい。
 (b)カルボニル化合物としては、例えば、特開2008-195018号公報の段落0024に記載の化合物が好ましい。
 (c)アゾ化合物としては、例えば、特開平8-108621号公報に記載のアゾ化合物等を使用することができる。
 (d)有機過酸化物としては、例えば、特開2008-195018号公報の段落0025に記載の化合物が好ましい。
 (e)メタロセン化合物としては、例えば、特開2008-195018号公報の段落0026に記載の化合物が好ましい。
 (f)アジド化合物としては、例えば、2,6-ビス(4-アジドベンジリデン)-4-メチルシクロヘキサノン等の化合物を挙げることができる。
 (g)ヘキサアリールビイミダゾール化合物としては、例えば、特開2008-195018号公報の段落0027に記載の化合物が好ましい。
 (i)ジスルホン化合物としては、例えば、特開昭61-166544号、特開2002-328465号の各公報に記載の化合物が挙げられる。
 (j)オキシムエステル化合物としては、例えば、特開2008-195018号公報の段落0028~0030に記載の化合物が好ましい。
As the (a) organic halide, for example, the compounds described in paragraphs 0022 to 0023 of JP-A-2008-195018 are preferable.
(B) As the carbonyl compound, for example, the compound described in paragraph 0024 of JP-A-2008-195018 is preferable.
(C) As the azo compound, for example, the azo compound described in JP-A-8-108621 can be used.
(D) As the organic peroxide, for example, the compound described in paragraph 0025 of JP-A-2008-195018 is preferable.
(E) As the metallocene compound, for example, the compound described in paragraph 0026 of JP-A-2008-195018 is preferable.
Examples of the (f) azide compound include compounds such as 2,6-bis (4-azidobenzylidene) -4-methylcyclohexanone.
(G) As the hexaarylbiimidazole compound, for example, the compound described in paragraph 0027 of JP-A-2008-195018 is preferable.
(I) Examples of the disulfon compound include the compounds described in JP-A-61-166544 and JP-A-2002-328465.
As the (j) oxime ester compound, for example, the compounds described in paragraphs 0028 to 0030 of JP-A-2008-195018 are preferable.
 上記電子受容型重合開始剤の中でも好ましいものとして、硬化性の観点から、オキシムエステル化合物及びオニウム塩化合物が挙げられる。中でも、耐刷性の観点から、ヨードニウム塩化合物、スルホニウム塩化合物又はアジニウム塩化合物が好ましく、ヨードニウム塩化合物又はスルホニウム塩化合物がより好ましく、ヨードニウム塩化合物が特に好ましい。
 これら化合物の具体例を以下に示すが、本開示はこれに限定されるものではない。
Among the electron-accepting polymerization initiators, oxime ester compounds and onium salt compounds are preferable from the viewpoint of curability. Among them, from the viewpoint of printing resistance, an iodonium salt compound, a sulfonium salt compound or an azinium salt compound is preferable, an iodonium salt compound or a sulfonium salt compound is more preferable, and an iodonium salt compound is particularly preferable.
Specific examples of these compounds are shown below, but the present disclosure is not limited thereto.
 ヨードニウム塩化合物の例としては、ジアリールヨードニウム塩化合物が好ましく、特に電子供与性基、例えば、アルキル基又はアルコキシル基で置換されたジフェニルヨードニウム塩化合物がより好ましく、また、非対称のジフェニルヨードニウム塩化合物が好ましい。具体例としては、ジフェニルヨードニウム=ヘキサフルオロホスファート、4-メトキシフェニル-4-(2-メチルプロピル)フェニルヨードニウム=ヘキサフルオロホスファート、4-(2-メチルプロピル)フェニル-p-トリルヨードニウム=ヘキサフルオロホスファート、4-ヘキシルオキシフェニル-2,4,6-トリメトキシフェニルヨードニウム=ヘキサフルオロホスファート、4-ヘキシルオキシフェニル-2,4-ジエトキシフェニルヨードニウム=テトラフルオロボラート、4-オクチルオキシフェニル-2,4,6-トリメトキシフェニルヨードニウム=1-ペルフルオロブタンスルホナート、4-オクチルオキシフェニル-2,4,6-トリメトキシフェニルヨードニウム=ヘキサフルオロホスファート、ビス(4-t-ブチルフェニル)ヨードニウム=ヘキサフルオロホスファートが挙げられる。 As an example of the iodonium salt compound, a diaryl iodonium salt compound is preferable, a diphenyl iodonium salt compound substituted with an electron donating group such as an alkyl group or an alkoxyl group is more preferable, and an asymmetric diphenyl iodonium salt compound is preferable. .. Specific examples include diphenyliodonium = hexafluorophosphate, 4-methoxyphenyl-4- (2-methylpropyl) phenyliodonium = hexafluorophosphate, 4- (2-methylpropyl) phenyl-p-tolyliodonium = hexa. Fluorophosphate, 4-hexyloxyphenyl-2,4,6-trimethoxyphenyliodonium = hexafluorophosphate, 4-hexyloxyphenyl-2,4-diethoxyphenyliodonium = tetrafluoroborate, 4-octyloxy Phenyl-2,4,6-trimethoxyphenyliodonium = 1-perfluorobutane sulfonate, 4-octyloxyphenyl-2,4,6-trimethoxyphenyliodonium = hexafluorophosphate, bis (4-t-butylphenyl) ) Iodonium = hexafluorophosphate can be mentioned.
 スルホニウム塩化合物の例としては、トリアリールスルホニウム塩化合物が好ましく、特に電子求引性基、例えば、芳香環上の基の少なくとも一部がハロゲン原子で置換されたトリアリールスルホニウム塩化合物が好ましく、芳香環上のハロゲン原子の総置換数が4以上であるトリアリールスルホニウム塩化合物が更に好ましい。具体例としては、トリフェニルスルホニウム=ヘキサフルオロホスファート、トリフェニルスルホニウム=ベンゾイルホルマート、ビス(4-クロロフェニル)フェニルスルホニウム=ベンゾイルホルマート、ビス(4-クロロフェニル)-4-メチルフェニルスルホニウム=テトラフルオロボラート、トリス(4-クロロフェニル)スルホニウム=3,5-ビス(メトキシカルボニル)ベンゼンスルホナート、トリス(4-クロロフェニル)スルホニウム=ヘキサフルオロホスファート、トリス(2,4-ジクロロフェニル)スルホニウム=ヘキサフルオロホスファートが挙げられる。 As an example of the sulfonium salt compound, a triarylsulfonium salt compound is preferable, and in particular, an electron-attracting group, for example, a triarylsulfonium salt compound in which at least a part of a group on the aromatic ring is substituted with a halogen atom is preferable, and an aromatic is preferable. A triarylsulfonium salt compound having a total number of halogen atoms substituted on the ring of 4 or more is more preferable. Specific examples include triphenylsulfonium = hexafluorophosphate, triphenylsulfonium = benzoylformate, bis (4-chlorophenyl) phenylsulfonium = benzoylformate, and bis (4-chlorophenyl) -4-methylphenylsulfonium = tetrafluoro. Borate, Tris (4-chlorophenyl) Sulfonium = 3,5-bis (methoxycarbonyl) Benzene Sulfonium, Tris (4-chlorophenyl) Sulfonium = Hexafluorophosphate, Tris (2,4-dichlorophenyl) Sulfonium = Hexafluorophos Fert can be mentioned.
 また、ヨードニウム塩化合物及びスルホニウム塩化合物の対アニオンの例としては、スルホネートアニオン、カルボキシレートアニオン、テトラフルオロボレートアニオン、ヘキサフルオロホスフェートアニオン、p-トルエンスルホネートアニオン、トシレートアニオン、スルホンアミドアニオン又はスルホンイミドアニオンが挙げられる。
 上記の中でも、スルホンアミドアニオン又はスルホンイミドアニオンが好ましく、スルホンイミドアニオンがより好ましい。
 スルホンアミドアニオンとしては、アリールスルホンアミドアニオンが好ましい。
 また、スルホンイミドアニオンとしては、ビスアリールスルホンイミドアニオンが好ましい。
 スルホンアミドアニオン又はスルホンイミドアニオンの具体例を以下に示すが、本開示はこれらに限定されるものではない。下記具体例中、Phはフェニル基を、Meはメチル基を、Etはエチル基を、それぞれ表す。
Examples of the counter anion of the iodonium salt compound and the sulfonium salt compound include a sulfonate anion, a carboxylate anion, a tetrafluoroborate anion, a hexafluorophosphate anion, a p-toluene sulfonate anion, a tosylate anion, a sulfonamide anion or a sulfonimide. Anions can be mentioned.
Among the above, a sulfonamide anion or a sulfonimide anion is preferable, and a sulfonimide anion is more preferable.
As the sulfonamide anion, an aryl sulfonamide anion is preferable.
Further, as the sulfonimide anion, a bisaryl sulfonimide anion is preferable.
Specific examples of the sulfonamide anion or the sulfonamide anion are shown below, but the present disclosure is not limited thereto. In the specific examples below, Ph represents a phenyl group, Me represents a methyl group, and Et represents an ethyl group.
Figure JPOXMLDOC01-appb-C000064
Figure JPOXMLDOC01-appb-C000064
 電子受容型重合開始剤の最低空軌道(LUMO)は、感度の向上の観点から、-3.00eV以下であることが好ましく、-3.02eV以下であることがより好ましい。
 また、下限としては、-3.80eV以上であることが好ましく、-3.60eV以上であることがより好ましい。
The minimum unoccupied molecular orbital (LUMO) of the electron-accepting polymerization initiator is preferably −3.00 eV or less, and more preferably −3.02 eV or less, from the viewpoint of improving sensitivity.
The lower limit is preferably -3.80 eV or more, and more preferably -3.60 eV or more.
 電子受容型重合開始剤は、1種単独で用いてもよく、2種以上を併用してもよい。
 電子受容型重合開始剤の含有量は、画像記録層の全質量に対して、0.1質量%~50質量%であることが好ましく、0.5質量%~30質量%であることがより好ましく、0.8質量%~20質量%であることが特に好ましい。
The electron-accepting polymerization initiator may be used alone or in combination of two or more.
The content of the electron-accepting polymerization initiator is preferably 0.1% by mass to 50% by mass, more preferably 0.5% by mass to 30% by mass, based on the total mass of the image recording layer. It is preferably 0.8% by mass to 20% by mass, and particularly preferably 0.8% by mass.
<<電子供与型重合開始剤(重合助剤)>>
 上記画像記録層は、重合開始剤として、電子供与型重合開始剤(「重合助剤」ともいう。)を含むことが好ましく、電子受容型重合開始剤、及び、電子供与型重合開始剤を含むことがより好ましい。
 本開示における電子供与型重合開始剤は、赤外線露光により赤外線吸収剤の電子が励起又は分子内移動した際に、赤外線吸収剤の一電子抜けた軌道に分子間電子移動で一電子を供与することにより、ラジカル等の重合開始種を発生する化合物である。
 電子供与型重合開始剤としては、電子供与型ラジカル重合開始剤であることが好ましい。
 上記画像記録層は、平版印刷版における耐刷性向上の観点から、以下に説明する電子供与型重合開始剤を含有することがより好ましく、その例として以下の5種が挙げられる。
(i)アルキル又はアリールアート錯体:酸化的に炭素-ヘテロ結合が解裂し、活性ラジカルを生成すると考えられる。具体的には、ボレート化合物が好ましい。
(ii)N-アリールアルキルアミン化合物:酸化により窒素に隣接した炭素上のC-X結合が解裂し、活性ラジカルを生成するものと考えられる。Xとしては、水素原子、カルボキシル基、トリメチルシリル基又はベンジル基が好ましい。具体的には、例えば、N-フェニルグリシン類(フェニル基に置換基を有していてもいなくてもよい。)、N-フェニルイミノジ酢酸(フェニル基に置換基を有していてもいなくてもよい。)が挙げられる。
(iii)含硫黄化合物:上述のアミン類の窒素原子を硫黄原子に置き換えたものが、同様の作用により活性ラジカルを生成し得る。例えばフェニルチオ酢酸(フェニル基に置換基を有していてもいなくてもよい。)が挙げられる。
(iv)含錫化合物:上述のアミン類の窒素原子を錫原子に置き換えたものが、同様の作用により活性ラジカルを生成し得る。
(v)スルフィン酸塩類:酸化により活性ラジカルを生成し得る。具体的は、アリールスルフィン駿ナトリウム等を挙げることができる。
<< Electron-donated polymerization initiator (polymerization aid) >>
The image recording layer preferably contains an electron-donating polymerization initiator (also referred to as a "polymerization aid") as a polymerization initiator, and contains an electron-accepting polymerization initiator and an electron-donating polymerization initiator. Is more preferable.
The electron donating type polymerization initiator in the present disclosure donates one electron by intermolecular electron transfer to an orbit where one electron is missing from the infrared absorber when the electron of the infrared absorber is excited or moved intramolecularly by infrared exposure. This is a compound that generates a polymerization-initiated species such as a radical.
The electron-donating type polymerization initiator is preferably an electron-donating radical polymerization initiator.
From the viewpoint of improving the printing durability of the lithographic printing plate, the image recording layer more preferably contains the electron donating type polymerization initiator described below, and examples thereof include the following five types.
(I) Alkyl or aryl ate complex: It is considered that the carbon-heterobond is oxidatively cleaved to generate an active radical. Specifically, a borate compound is preferable.
(Ii) N-arylalkylamine compound: It is considered that the CX bond on the carbon adjacent to nitrogen is cleaved by oxidation to generate an active radical. As X, a hydrogen atom, a carboxyl group, a trimethylsilyl group or a benzyl group is preferable. Specifically, for example, N-phenylglycins (which may or may not have a substituent on the phenyl group) and N-phenyliminodiacetic acid (which may or may not have a substituent on the phenyl group). May be mentioned.)
(Iii) Sulfur-containing compound: The above-mentioned amines in which the nitrogen atom is replaced with a sulfur atom can generate an active radical by the same action. For example, phenylthioacetic acid (which may or may not have a substituent on the phenyl group) can be mentioned.
(Iv) Tin-containing compounds: The above-mentioned amines in which the nitrogen atom is replaced with a tin atom can generate active radicals by the same action.
(V) Sulfinates: Oxidation can generate active radicals. Specific examples thereof include arylsulfinic sodium.
 これらの中でも、上記画像記録層は、耐刷性の観点から、ボレート化合物を含有することが好ましい。
 ボレート化合物としては、耐刷性及び発色性の観点から、テトラアリールボレート化合物、又は、モノアルキルトリアリールボレート化合物であることが好ましく、テトラアリールボレート化合物であることがより好ましい。
 ボレート化合物が有する対カチオンとしては、特に制限はないが、アルカリ金属イオン、又は、テトラアルキルアンモニウムイオンであることが好ましく、ナトリウムイオン、カリウムイオン、又は、テトラブチルアンモニウムイオンであることがより好ましい。
Among these, the image recording layer preferably contains a borate compound from the viewpoint of printing resistance.
The borate compound is preferably a tetraaryl borate compound or a monoalkyl triaryl borate compound, and more preferably a tetraaryl borate compound from the viewpoint of print resistance and color development.
The counter cation contained in the borate compound is not particularly limited, but is preferably an alkali metal ion or a tetraalkylammonium ion, and more preferably a sodium ion, a potassium ion, or a tetrabutylammonium ion.
 ボレート化合物として具体的には、ナトリウムテトラフェニルボレートが好ましく挙げられる。 Specifically, sodium tetraphenylborate is preferably mentioned as the borate compound.
 以下に電子供与型重合開始剤の好ましい具体例として、B-1~B-9を示すが、これらに限定されないことは、言うまでもない。また、下記化学式において、Phはフェニル基を表し、Buはn-ブチル基を表す。 B-1 to B-9 are shown below as preferable specific examples of the electron donating type polymerization initiator, but it goes without saying that the present invention is not limited to these. Further, in the following chemical formula, Ph represents a phenyl group and Bu represents an n-butyl group.
Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000065
 また、本開示に用いられる電子供与型重合開始剤の最高被占軌道(HOMO)は、感度の向上の観点から、-6.00eV以上であることが好ましく、-5.95eV以上であることがより好ましく、-5.93eV以上であることが更に好ましい。
 また、上限としては、-5.00eV以下であることが好ましく、-5.40eV以下であることがより好ましい。
Further, the maximum occupied molecular orbital (HOMO) of the electron donating polymerization initiator used in the present disclosure is preferably −6.00 eV or higher, and preferably −5.95 eV or higher, from the viewpoint of improving sensitivity. More preferably, it is more preferably −5.93 eV or more.
The upper limit is preferably −5.00 eV or less, and more preferably −5.40 eV or less.
 電子供与型重合開始剤は、1種のみを含有しても、2種以上を併用してもよい。
 電子供与型重合開始剤の含有量としては、感度及び耐刷性の観点から、画像記録層の全質量に対し、0.01質量%~30質量%であることが好ましく、0.05質量%~25質量%であることがより好ましく、0.1質量%~20質量%であることが更に好ましい。
The electron donating type polymerization initiator may contain only one type, or two or more types may be used in combination.
The content of the electron donating type polymerization initiator is preferably 0.01% by mass to 30% by mass, preferably 0.05% by mass, based on the total mass of the image recording layer from the viewpoint of sensitivity and printing resistance. It is more preferably about 25% by mass, and even more preferably 0.1% by mass to 20% by mass.
 本開示において、画像記録層が、オニウムイオンと、上述の電子供与型重合開始剤におけるアニオンと、を含む場合、画像記録層は電子受容型重合開始剤及び上記電子供与型重合開始剤を含むものとする。 In the present disclosure, when the image recording layer contains an onium ion and an anion in the above-mentioned electron donating type polymerization initiator, the image recording layer is assumed to contain an electron accepting type polymerization initiator and the above-mentioned electron donating type polymerization initiator. ..
-電子供与型重合開始剤と赤外線吸収剤との関係-
 本開示における画像記録層は、感度の向上の観点から、上記電子供与型重合開始剤及び後述する赤外線吸収剤を含有し、赤外線吸収剤のHOMO-上記電子供与型重合開始剤のHOMOの値が0.70eV以下であることが好ましく、0.70eV~-0.10eVであることがより好ましい。
 なお、マイナスの値は、上記電子供与型重合開始剤のHOMOが、赤外線吸収剤のHOMOよりも高くなることを意味する。
-Relationship between electron donating polymerization initiator and infrared absorber-
From the viewpoint of improving sensitivity, the image recording layer in the present disclosure contains the electron-donating polymerization initiator and the infrared absorber described later, and the value of HOMO of the infrared absorber-HOMO of the electron-donating polymerization initiator is determined. It is preferably 0.70 eV or less, and more preferably 0.70 eV to −0.10 eV.
A negative value means that the HOMO of the electron donating polymerization initiator is higher than that of the infrared absorber HOMO.
-赤外線吸収剤及び電子受容型重合開始剤の好ましい態様-
 また、後述する赤外線吸収剤としては、感度の向上の観点から、ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16~32であり、且つ、δhがδpの60%以下である有機アニオンを有することが好ましい態様である。
 本開示における電子受容型重合開始剤としては、感度の向上の観点から、ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16~32であり、且つ、δhがδpの60%以下である有機アニオンを有することが好ましい態様である。
-Preferable aspects of infrared absorbers and electron-accepting polymerization initiators-
Further, as an infrared absorber to be described later, from the viewpoint of improving sensitivity, an organic anion having δd of 16 or more, δp of 16 to 32, and δh of 60% or less of δp in the solubility parameter of Hansen. Is a preferred embodiment.
The electron-accepting polymerization initiator in the present disclosure has a Hansen solubility parameter of δd of 16 or more, δp of 16 to 32, and δh of 60% or less of δp from the viewpoint of improving sensitivity. It is a preferred embodiment to have an organic anion.
 ここで、本開示におけるハンセンの溶解度パラメータにおけるδd、δp及びδhは、ハンセン(Hansen)の溶解度パラメータにおける分散項δd[単位:MPa0.5]及び極性項δp[単位:MPa0.5]を用いる。ここで、ハンセン(Hansen)の溶解度パラメータは、ヒルデブランド(Hildebrand)によって導入された溶解度パラメータを、分散項δd、極性項δp、水素結合項δhの3成分に分割し、3次元空間に表したものである。
 ハンセン(Hansen)の溶解度パラメータの詳細については、Charles M.Hansen著の文献「Hansen Solubility Parameters;A Users Handbook(CRC Press,2007)」に記載されている。
Here, δd, δp and δh in the Hansen solubility parameter in the present disclosure have the dispersion term δd [unit: MPa 0.5 ] and the polar term δp [unit: MPa 0.5 ] in the Hansen solubility parameter. Use. Here, the solubility parameter of Hansen is expressed in a three-dimensional space by dividing the solubility parameter introduced by Hildebrand into three components of a dispersion term δd, a polar term δp, and a hydrogen bond term δh. It is a thing.
For more information on the Hansen solubility parameter, see Charles M. et al. It is described in the document "Hansen Solubility Parameter; A Users Handbook (CRC Press, 2007)" by Hansen.
 本開示において、上記有機アニオンのハンセンの溶解度パラメータにおけるδd、δp及びδhは、コンピュータソフトウェア「Hansen Solubility Parameters in Practice(HSPiP ver.4.1.07)」を用いることにより、その化学構造から推算した値である。 In the present disclosure, δd, δp and δh in the Hansen solubility parameter of the organic anion are estimated from the chemical structure by using the computer software “Hansen Solubility Parameters in Practice (HSPiP ver. 4.1.07)”. The value.
 ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16~32であり、且つ、δhがδpの60%以下である有機アニオンの具体例としては、上述したI-1~I-15、I-17~I-21、及び、I-23~I-25、並びに、以下に示すものが好適に挙げられるが、これらに限定されないことは言うまでもない。中でも、ビス(ハロゲン置換ベンゼンスルホニル)イミドアニオンがより好適に挙げられ、上述したI-5が特に好適に挙げられる。 Specific examples of the organic anions having δd of 16 or more, δp of 16 to 32, and δh of 60% or less of δp in the solubility parameter of Hansen are the above-mentioned I-1 to I-15 and I. -17 to I-21, I-23 to I-25, and the following are preferably mentioned, but it goes without saying that the present invention is not limited thereto. Among them, bis (halogen-substituted benzenesulfonyl) imide anion is more preferably mentioned, and I-5 described above is particularly preferable.
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000066
-粒子-
 上記画像記録層は、UV耐刷性の観点から、粒子を含むことが好ましい。
 粒子としては、有機粒子であっても、無機粒子であってもよいが、UV耐刷性の観点から、有機粒子を含むことが好ましく、ポリマー粒子を含むことがより好ましい。
 無機粒子としては、公知の無機粒子を用いることができ、シリカ粒子、チタニア粒子等の金属酸化物粒子を好適に用いることができる。
-particle-
The image recording layer preferably contains particles from the viewpoint of UV printing resistance.
The particles may be organic particles or inorganic particles, but from the viewpoint of UV printing resistance, they preferably contain organic particles, and more preferably polymer particles.
As the inorganic particles, known inorganic particles can be used, and metal oxide particles such as silica particles and titania particles can be preferably used.
 ポリマー粒子は、熱可塑性ポリマー粒子、熱反応性ポリマー粒子、重合性基を有するポリマー粒子、疎水性化合物を内包しているマイクロカプセル、及び、ミクロゲル(架橋ポリマー粒子)よりなる群から選ばれることが好ましい。中でも、重合性基を有するポリマー粒子又はミクロゲルが好ましい。特に好ましい実施形態では、ポリマー粒子は少なくとも1つのエチレン性不飽和重合性基を含む。このようなポリマー粒子の存在により、露光部の耐刷性及び未露光部の機上現像性を高める効果が得られる。
 また、ポリマー粒子は、熱可塑性ポリマー粒子であることが好ましい。
The polymer particles may be selected from the group consisting of thermoplastic polymer particles, heat-reactive polymer particles, polymer particles having a polymerizable group, microcapsules containing a hydrophobic compound, and microgels (crosslinked polymer particles). preferable. Of these, polymer particles or microgels having a polymerizable group are preferable. In a particularly preferred embodiment, the polymer particles contain at least one ethylenically unsaturated polymerizable group. The presence of such polymer particles has the effect of enhancing the printing resistance of the exposed portion and the on-machine developability of the unexposed portion.
Further, the polymer particles are preferably thermoplastic polymer particles.
 熱可塑性ポリマー粒子としては、1992年1月のResearch Disclosure No.33303、特開平9-123387号公報、同9-131850号公報、同9-171249号公報、同9-171250号公報及び欧州特許第931647号明細書などに記載の熱可塑性ポリマー粒子が好ましい。
 熱可塑性ポリマー粒子を構成するポリマーの具体例としては、エチレン、スチレン、塩化ビニル、アクリル酸メチル、アクリル酸エチル、メタクリル酸メチル、メタクリル酸エチル、塩化ビニリデン、アクリロニトリル、ビニルカルバゾール、ポリアルキレン構造を有するアクリレート又はメタクリレートなどのモノマーのホモポリマー若しくはコポリマー又はそれらの混合物を挙げることができる。好ましくは、ポリスチレン、スチレン及びアクリロニトリルを含む共重合体、又は、ポリメタクリル酸メチルを挙げることができる。熱可塑性ポリマー粒子の平均粒径は0.01μm~3.0μmが好ましい。
As the thermoplastic polymer particles, Research Discovery No. 1 of January 1992. 33303, JP-A-9-123387, 9-131850, 9-171249, 9-171250, European Patent No. 913647, and the like are preferred.
Specific examples of the polymer constituting the thermoplastic polymer particles include ethylene, styrene, vinyl chloride, methyl acrylate, ethyl acrylate, methyl methacrylate, ethyl methacrylate, vinylidene chloride, acrylonitrile, vinylcarbazole, and a polyalkylene structure. Examples include homopolymers or copolymers of monomers such as acrylates or methacrylates or mixtures thereof. Preferably, a copolymer containing polystyrene, styrene and acrylonitrile, or polymethyl methacrylate can be mentioned. The average particle size of the thermoplastic polymer particles is preferably 0.01 μm to 3.0 μm.
 熱反応性ポリマー粒子としては、熱反応性基を有するポリマー粒子が挙げられる。熱反応性ポリマー粒子は熱反応による架橋及びその際の官能基変化により疎水化領域を形成する。 Examples of the heat-reactive polymer particles include polymer particles having a heat-reactive group. The heat-reactive polymer particles form a hydrophobic region by cross-linking due to a heat reaction and the change of functional groups at that time.
 熱反応性基を有するポリマー粒子における熱反応性基としては、化学結合が形成されるならば、どのような反応を行う官能基でもよいが、重合性基であることが好ましく、その例として、ラジカル重合反応を行うエチレン性不飽和基(例えば、アクリロイル基、メタクリロイル基、ビニル基、アリル基など)、カチオン重合性基(例えば、ビニル基、ビニルオキシ基、エポキシ基、オキセタニル基など)、付加反応を行うイソシアナト基又はそのブロック体、エポキシ基、ビニルオキシ基及びこれらの反応相手である活性水素原子を有する官能基(例えば、アミノ基、ヒドロキシ基、カルボキシ基など)、縮合反応を行うカルボキシ基及び反応相手であるヒドロキシ基又はアミノ基、開環付加反応を行う酸無水物及び反応相手であるアミノ基又はヒドロキシ基などが好ましく挙げられる。 The thermally reactive group in the polymer particles having a thermally reactive group may be a functional group that undergoes any reaction as long as a chemical bond is formed, but a polymerizable group is preferable, and as an example, it is preferable. Eethylene unsaturated groups (eg, acryloyl group, methacryloyl group, vinyl group, allyl group, etc.), cationically polymerizable groups (eg, vinyl group, vinyloxy group, epoxy group, oxetanyl group, etc.), addition reaction Isocyanato group or a block body thereof, an epoxy group, a vinyloxy group and a functional group having an active hydrogen atom which is a reaction partner thereof (for example, an amino group, a hydroxy group, a carboxy group, etc.), a carboxy group for performing a condensation reaction and a reaction. Preferred examples thereof include a hydroxy group or an amino group as a partner, an acid anhydride for carrying out a ring-opening addition reaction, and an amino group or a hydroxy group as a reaction partner.
 マイクロカプセルとしては、例えば、特開2001-277740号公報、特開2001-277742号公報に記載のごとく、画像記録層の構成成分の少なくとも一部をマイクロカプセルに内包させたものが挙げられる。画像記録層の構成成分は、マイクロカプセル外にも含有させることもできる。マイクロカプセルを含有する画像記録層は、疎水性の構成成分をマイクロカプセルに内包し、親水性の構成成分をマイクロカプセル外に含有する構成が好ましい態様である。 Examples of the microcapsules include those in which at least a part of the constituent components of the image recording layer is encapsulated in the microcapsules, as described in JP-A-2001-277740 and JP-A-2001-277742. The components of the image recording layer can also be contained outside the microcapsules. The image recording layer containing the microcapsules is preferably configured such that the hydrophobic constituents are encapsulated in the microcapsules and the hydrophilic constituents are contained outside the microcapsules.
 ミクロゲル(架橋ポリマー粒子)は、その表面又は内部の少なくとも一方に、画像記録層の構成成分の一部を含有することができる。特に、ラジカル重合性基をその表面に有する反応性ミクロゲルは、得られる平版印刷版原版の感度、及び、得られる平版印刷版の耐刷性の観点から好ましい。 The microgel (crosslinked polymer particles) can contain a part of the constituent components of the image recording layer on at least one of the surface or the inside thereof. In particular, a reactive microgel having a radically polymerizable group on its surface is preferable from the viewpoint of the sensitivity of the obtained lithographic printing plate original plate and the printing durability of the obtained lithographic printing plate.
 画像記録層の構成成分をマイクロカプセル化又はミクロゲル化するには、公知の方法が適用できる。 A known method can be applied to microencapsulate or microgelify the constituents of the image recording layer.
 また、ポリマー粒子としては、得られる平版印刷版の耐刷性、耐汚れ性及び保存安定性の観点から、分子中に2個以上のヒドロキシ基を有する多価フェノール化合物とイソホロンジイソシアネートとの付加物である多価イソシアネート化合物、及び、活性水素を有する化合物の反応により得られるものが好ましい。
 上記多価フェノール化合物としては、フェノール性水酸基を有するベンゼン環を複数有している化合物が好ましい。
 上記活性水素を有する化合物としては、ポリオール化合物、又は、ポリアミン化合物が好ましく、ポリオール化合物がより好ましく、プロピレングリコール、グリセリン及びトリメチロールプロパンよりなる群から選ばれた少なくとも1種の化合物が更に好ましい。
 分子中に2個以上のヒドロキシ基を有する多価フェノール化合物とイソホロンジイソシアネートとの付加物である多価イソシアネート化合物、及び、活性水素を有する化合物の反応により得られる樹脂の粒子としては、特開2012-206495号公報の段落0032~0095に記載のポリマー粒子が好ましく挙げられる。
Further, as the polymer particles, an adduct of a polyhydric phenol compound having two or more hydroxy groups in the molecule and isophorone diisocyanate from the viewpoint of printing resistance, stain resistance and storage stability of the obtained flat plate printing plate. The one obtained by the reaction of the polyhydric isocyanate compound and the compound having active hydrogen is preferable.
As the polyvalent phenol compound, a compound having a plurality of benzene rings having a phenolic hydroxyl group is preferable.
As the compound having active hydrogen, a polyol compound or a polyamine compound is preferable, a polyol compound is more preferable, and at least one compound selected from the group consisting of propylene glycol, glycerin and trimethylolpropane is further preferable.
Examples of the resin particles obtained by the reaction of the polyhydric phenol compound having two or more hydroxy groups in the molecule, the polyhydric isocyanate compound which is an adduct of isophorone diisocyanate, and the compound having active hydrogen are JP-A-2012. The polymer particles described in paragraphs 0032 to 0905 of JP-206495 are preferably mentioned.
 更に、ポリマー粒子としては、得られる平版印刷版の耐刷性及び耐溶剤性の観点から、疎水性主鎖を有し、i)上記疎水性主鎖に直接的に結合されたペンダントシアノ基を有する構成ユニット、及び、ii)親水性ポリアルキレンオキシドセグメントを含むペンダント基を有する構成ユニットの両方を含むことが好ましい。
 上記疎水性主鎖としては、アクリル樹脂鎖が好ましく挙げられる。
 上記ペンダントシアノ基の例としては、-[CHCH(C≡N)-]又は-[CHC(CH)(C≡N)-]が好ましく挙げられる。
 また、上記ペンダントシアノ基を有する構成ユニットは、エチレン系不飽和型モノマー、例えば、アクリロニトリル又はメタクリロニトリルから、又は、これらの組み合わせから容易に誘導することができる。
 また、上記親水性ポリアルキレンオキシドセグメントにおけるアルキレンオキシドとしては、エチレンオキシド又はプロピレンオキシドが好ましく、エチレンオキシドがより好ましい。
 上記親水性ポリアルキレンオキシドセグメントにおけるアルキレンオキシド構造の繰り返し数は、10~100であることが好ましく、25~75であることがより好ましく、40~50であることが更に好ましい。
 疎水性主鎖を有し、i)上記疎水性主鎖に直接的に結合されたペンダントシアノ基を有する構成ユニット、及び、ii)親水性ポリアルキレンオキシドセグメントを含むペンダント基を有する構成ユニットの両方を含む樹脂の粒子としては、特表2008-503365号公報の段落0039~0068に記載のものが好ましく挙げられる。
Further, the polymer particles have a hydrophobic main chain from the viewpoint of printing resistance and solvent resistance of the obtained lithographic printing plate, and i) a pendant cyano group directly bonded to the hydrophobic main chain. It is preferable to include both a constituent unit having and ii) a constituent unit having a pendant group containing a hydrophilic polyalkylene oxide segment.
Acrylic resin chains are preferably mentioned as the hydrophobic main chain.
Examples of the pendant cyano group preferably include- [CH 2 CH (C≡N)-] or-[CH 2 C (CH 3 ) (C≡N)-].
In addition, the constituent unit having the pendant cyano group can be easily derived from an ethylene-based unsaturated monomer, for example, acrylonitrile or methacrylonitrile, or a combination thereof.
Further, as the alkylene oxide in the hydrophilic polyalkylene oxide segment, ethylene oxide or propylene oxide is preferable, and ethylene oxide is more preferable.
The number of repetitions of the alkylene oxide structure in the hydrophilic polyalkylene oxide segment is preferably 10 to 100, more preferably 25 to 75, and even more preferably 40 to 50.
Both a constituent unit having a hydrophobic backbone and i) having a pendant cyano group directly attached to the hydrophobic backbone and ii) a constituent unit having a pendant group containing a hydrophilic polyalkylene oxide segment. As the resin particles containing the above, those described in paragraphs 0039 to 0068 of JP-A-2008-503365 are preferably mentioned.
 また、上記ポリマー粒子は、UV耐刷性、及び、機上現像性の観点から、親水性基を有することが好ましい。
 上記親水性基としては、親水性を有する構造であれば、特に制限はないが、カルボキシ基等の酸基、ヒドロキシ基、アミノ基、シアノ基、ポリアルキレンオキシド構造等が挙げられる。
 中でも、機上現像性、及び、UV耐刷性の観点から、ポリアルキレンオキシド構造が好ましく、ポリエチレンオキシド構造、ポリプロピレンオキシド構造、又は、ポリエチレン/プロピレンオキシド構造がより好ましい。
 また、機上現像性、及び、機上現像時の現像カス抑制性の観点からは、上記ポリアルキレンオキシド構造として、ポリプロピレンオキシド構造を有することが好ましく、ポリエチレンオキシド構造及びポリプロピレンオキシド構造を有することがより好ましい。
 また、上記親水性基としては、耐刷性、着肉性、及び、機上現像性の観点から、シアノ基を有する構成単位、又は、下記式Zで表される基を含むことが好ましく、下記式(AN)で表される構成単位、又は、下記式Zで表される基を含むことがより好ましく、下記式Zで表される基を含むことが特に好ましい。
 *-Q-W-Y 式Z
 式Z中、Qは二価の連結基を表し、Wは親水性構造を有する二価の基又は疎水性構造を有する二価の基を表し、Yは親水性構造を有する一価の基又は疎水性構造を有する一価の基を表し、W及びYのいずれかは親水性構造を有し、*は他の構造との結合部位を表す。
Further, the polymer particles preferably have a hydrophilic group from the viewpoint of UV printing resistance and on-machine developability.
The hydrophilic group is not particularly limited as long as it has a hydrophilic structure, and examples thereof include an acid group such as a carboxy group, a hydroxy group, an amino group, a cyano group, and a polyalkylene oxide structure.
Above all, from the viewpoint of on-machine developability and UV printing resistance, a polyalkylene oxide structure is preferable, and a polyethylene oxide structure, a polypropylene oxide structure, or a polyethylene / propylene oxide structure is more preferable.
Further, from the viewpoint of on-machine developability and ability to suppress development residue during on-machine development, the polyalkylene oxide structure preferably has a polypropylene oxide structure, and may have a polyethylene oxide structure and a polypropylene oxide structure. More preferred.
Further, the hydrophilic group preferably contains a structural unit having a cyano group or a group represented by the following formula Z from the viewpoint of printing resistance, inking property and on-machine developability. It is more preferable to include a structural unit represented by the following formula (AN) or a group represented by the following formula Z, and it is particularly preferable to include a group represented by the following formula Z.
* -Q-W-Y formula Z
In formula Z, Q represents a divalent linking group, W represents a divalent group having a hydrophilic structure or a divalent group having a hydrophobic structure, and Y represents a monovalent group having a hydrophilic structure or It represents a monovalent group having a hydrophobic structure, either W or Y has a hydrophilic structure, and * represents a binding site with another structure.
Figure JPOXMLDOC01-appb-C000067
Figure JPOXMLDOC01-appb-C000067
 式(AN)中、RANは、水素原子又はメチル基を表す。 In formula (AN), RAN represents a hydrogen atom or a methyl group.
 上記ポリマー粒子に含まれるポリマーは、UV耐刷性の観点から、シアノ基を有する化合物により形成される構成単位を含むことが好ましい。
 シアノ基は、通常、シアノ基を有する化合物(モノマー)を用いて、シアノ基を含む構成単位として導入されることが好ましい。シアノ基を有する化合物としては、アクリロニトリル化合物が挙げられ、(メタ)アクリロニトリルが好適に挙げられる。
 シアノ基を有する構成単位としては、アクリロニトリル化合物により形成される構成単位であることが好ましく、(メタ)アクリロニトリルにより形成される構成単位、すなわち、上記式(AN)で表される構成単位がより好ましい。
 上記ポリマーが、シアノ基を有する構成単位を有するポリマーを含む場合、シアノ基を有する構成単位を有するポリマーにおけるシアノ基を有する構成単位、好ましくは上記式(AN)で表される構成単位の含有量は、UV耐刷性の観点から、シアノ基を有する構成単位を有するポリマーの全質量に対し、5質量%~90質量%であることが好ましく、20質量%~80質量%であることがより好ましく、30質量%~60質量%であることが特に好ましい。
From the viewpoint of UV printing resistance, the polymer contained in the polymer particles preferably contains a structural unit formed of a compound having a cyano group.
The cyano group is usually preferably introduced as a structural unit containing a cyano group by using a compound (monomer) having a cyano group. Examples of the compound having a cyano group include acrylonitrile compounds, and (meth) acrylonitrile is preferable.
The structural unit having a cyano group is preferably a structural unit formed of an acrylonitrile compound, and more preferably a structural unit formed of (meth) acrylonitrile, that is, a structural unit represented by the above formula (AN). ..
When the polymer contains a polymer having a structural unit having a cyano group, the content of the structural unit having a cyano group, preferably the structural unit represented by the above formula (AN), in the polymer having a structural unit having a cyano group. Is preferably 5% by mass to 90% by mass, more preferably 20% by mass to 80% by mass, based on the total mass of the polymer having a structural unit having a cyano group, from the viewpoint of UV printing resistance. It is preferably 30% by mass to 60% by mass, and particularly preferably 30% by mass.
 上記ポリマー粒子は、UV耐刷性の観点から、芳香族ビニル化合物により形成される構成単位を含むことが好ましい。
 芳香族ビニル化合物としては、芳香環にビニル基が結合した構造を有する化合物であればよいが、スチレン化合物、ビニルナフタレン化合物等が挙げられ、スチレン化合物が好ましく、スチレンがより好ましい。
 スチレン化合物としては、スチレン、p-メチルスチレン、p-メトキシスチレン、β-メチルスチレン、p-メチル-β-メチルスチレン、α-メチルスチレン、及びp-メトキシ-β-メチルスチレン等が挙げられ、スチレンが好ましく挙げられる。
 ビニルナフタレン化合物としては、1-ビニルナフタレン、メチル-1-ビニルナフタレン、β-メチル-1-ビニルナフタレン、4-メチル-1-ビニルナフタレン、4-メトキシ-1-ビニルナフタレン等が挙げられ、1-ビニルナフタレンが好ましく挙げられる。
From the viewpoint of UV print resistance, the polymer particles preferably contain a structural unit formed of an aromatic vinyl compound.
The aromatic vinyl compound may be a compound having a structure in which a vinyl group is bonded to an aromatic ring, and examples thereof include a styrene compound and a vinylnaphthalene compound, and a styrene compound is preferable, and styrene is more preferable.
Examples of the styrene compound include styrene, p-methylstyrene, p-methoxystyrene, β-methylstyrene, p-methyl-β-methylstyrene, α-methylstyrene, p-methoxy-β-methylstyrene and the like. Styrene is preferred.
Examples of the vinylnaphthalene compound include 1-vinylnaphthalene, methyl-1-vinylnaphthalene, β-methyl-1-vinylnaphthalene, 4-methyl-1-vinylnaphthalene, 4-methoxy-1-vinylnaphthalene and the like. -Vinylnaphthalene is preferably mentioned.
 また、芳香族ビニル化合物により形成される構成単位としては、下記式Z1で表される構成単位が好ましく挙げられる。 Further, as the structural unit formed of the aromatic vinyl compound, the structural unit represented by the following formula Z1 is preferably mentioned.
Figure JPOXMLDOC01-appb-C000068
Figure JPOXMLDOC01-appb-C000068
 式Z1中、RZ1及びRZ2はそれぞれ独立に、水素原子又はアルキル基を表し、Arは芳香環基を表し、RZ3は置換基を表し、nzは0以上Arの最大置換基数以下の整数を表す。
 式Z1中、RZ1及びRZ2はそれぞれ独立に、水素原子又は炭素数1~4のアルキル基であることが好ましく、水素原子又はメチル基であることがより好ましく、いずれも水素原子であることが更に好ましい。
 式Z1中、Arはベンゼン環又はナフタレン環であることが好ましく、ベンゼン環であることがより好ましい。
 式Z1中、RZ3はアルキル基又はアルコキシ基であることが好ましく、炭素数1~4のアルキル基又は炭素数1~4のアルコキシ基であることがより好ましく、メチル基又はメトキシ基であることが更に好ましい。
 式Z1中、RZ3が複数存在する場合、複数のRZ3は同一であってもよいし、それぞれ異なっていてもよい。
 式Z1中、nzは0~2の整数であることが好ましく、0又は1であることがより好ましく、0であることが更に好ましい。
In the formula Z1, R Z1 and R Z2 independently represent a hydrogen atom or an alkyl group, Ar represents an aromatic ring group, R Z3 represents a substituent, and nz is an integer of 0 or more and less than or equal to the maximum number of substituents of Ar. Represents.
In the formula Z1, R Z1 and R Z2 are each independently preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom or a methyl group, and both are hydrogen atoms. Is more preferable.
In the formula Z1, Ar is preferably a benzene ring or a naphthalene ring, and more preferably a benzene ring.
In the formula Z1, R Z3 is preferably an alkyl group or an alkoxy group, more preferably an alkyl group having 1 to 4 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and it is a methyl group or a methoxy group. Is more preferable.
In the formula Z1, if the R Z3 there are a plurality, plural of R Z3 may be the same or may be different.
In the formula Z1, nz is preferably an integer of 0 to 2, more preferably 0 or 1, and even more preferably 0.
 上記ポリマー粒子は、芳香族ビニル化合物により形成される構成単位を1種単独で含有していても、2種以上を含有していてもよい。
 上記ポリマー粒子において、芳香族ビニル化合物により形成される構成単位の含有量は、インキ着肉性の観点から、上記ポリマー粒子の全質量に対し、0.1質量%~20質量%であることが好ましく、0.5質量%~15質量%であることがより好ましく、1質量%~10質量%であることが特に好ましい。
The polymer particles may contain one type of structural unit formed of an aromatic vinyl compound alone, or may contain two or more types.
In the polymer particles, the content of the structural unit formed by the aromatic vinyl compound may be 0.1% by mass to 20% by mass with respect to the total mass of the polymer particles from the viewpoint of ink inking property. It is preferably 0.5% by mass to 15% by mass, and particularly preferably 1% by mass to 10% by mass.
 また、ポリマー粒子は、UV耐刷性の観点から、架橋構造を有することが好ましく、架橋構造を有する構成単位を含むことがより好ましい。
 ポリマー粒子が架橋構造を有することにより、ポリマー粒子自体の硬度が向上するため、画像部強度が向上し、他のインキよりも版を劣化させやすい紫外線硬化型インキを使用した場合であっても、耐刷性(UV耐刷性)が更に向上すると考えられる。
 上記架橋構造としては、特に制限はないが、多官能エチレン性不飽和化合物を重合してなる構成単位、又は1種以上の反応性基同士が粒子内部で共有結合を形成した構成単位であることが好ましい。上記多官能エチレン性不飽和化合物の官能数としては、UV耐刷性及び機上現像性の観点から、2~15であることが好ましく、3~10であることがより好ましく、4~10であることが更に好ましく、5~10であることが特に好ましい。
 また、上記を言い換えると、上記架橋構造を有する構成単位は、UV耐刷性及び機上現像性の観点から、2官能性~15官能性分岐単位であることが好ましい。
 なお、n官能性分岐単位とは、n本の分子鎖が出ている分岐単位のことをいい、言い換えると、n官能性分岐点(架橋構造)を有する構成単位のことである。
 また、多官能メルカプト化合物により架橋構造を形成することも好ましく挙げられる。
Further, the polymer particles preferably have a crosslinked structure, and more preferably contain a structural unit having a crosslinked structure, from the viewpoint of UV printing resistance.
Since the polymer particles have a crosslinked structure, the hardness of the polymer particles themselves is improved, so that the image area strength is improved, and even when an ultraviolet curable ink that easily deteriorates the plate than other inks is used. It is considered that the printing resistance (UV printing resistance) is further improved.
The crosslinked structure is not particularly limited, but is a structural unit formed by polymerizing a polyfunctional ethylenically unsaturated compound, or a structural unit in which one or more reactive groups form a covalent bond inside the particles. Is preferable. The functional number of the polyfunctional ethylenically unsaturated compound is preferably 2 to 15, more preferably 3 to 10, and 4 to 10 from the viewpoint of UV printing resistance and on-machine developability. It is more preferably present, and particularly preferably 5 to 10.
In other words, the structural unit having the crosslinked structure is preferably a bifunctional to 15-functional branched unit from the viewpoint of UV printing resistance and on-machine developability.
The n-functional bifurcation unit is a bifurcation unit having n molecular chains, in other words, a structural unit having an n-functional bifurcation point (crosslinked structure).
It is also preferable to form a crosslinked structure with a polyfunctional mercapto compound.
 上記多官能エチレン性不飽和化合物におけるエチレン性不飽和基としては、特に限定されないが、(メタ)アクリロキシ基、(メタ)アクリルアミド基、芳香族ビニル基、マレイミド基等が挙げられる。
 また、上記多官能エチレン性不飽和化合物は、多官能(メタ)アクリレート化合物、又は多官能(メタ)アクリルアミド化合物、又は、多官能芳香族ビニル化合物であることが好ましい。
The ethylenically unsaturated group in the polyfunctional ethylenically unsaturated compound is not particularly limited, and examples thereof include a (meth) acryloxy group, a (meth) acrylamide group, an aromatic vinyl group, and a maleimide group.
The polyfunctional ethylenically unsaturated compound is preferably a polyfunctional (meth) acrylate compound, a polyfunctional (meth) acrylamide compound, or a polyfunctional aromatic vinyl compound.
 多官能(メタ)アクリレート化合物としては、ジエチレングリコールジアクリレート、トリエチレングリコールジアクリレート、テトラエチレングリコールジアクリレート、トリメチロールプロパンジアクリレート、トリメチロールプロパントリアクリレート、1,4-ブタンジオールジアクリレート、1,6-ヘキサンジオールジアクリレート、ポリエチレングリコールジアクリレート、ポリプロピレングリコールジアクリレート、トリシクロデカンジメチロールジアクリレート、ジトリメチロールプロパンテトラアクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールトリアクリレート、ジペンタエリスリトールヘキサアクリレート、トリス(β-ヒドロキシエチル)イソシアヌレートのトリアクリレート等が挙げられる。
 多官能(メタ)アクリレート化合物としては、N,N’-メチレンビスアクリルアミド、N-[トリス(3-アクリルアミドプロポキシメチル)メチル]アクリルアミド等が挙げられる。
 多官能芳香族ビニル化合物としては、ジビニルベンゼン等が挙げられる。
Examples of the polyfunctional (meth) acrylate compound include diethylene glycol diacrylate, triethylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylol propane diacrylate, trimethylol propane triacrylate, 1,4-butanediol diacrylate, and 1,6. -Hexanediol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tricyclodecanedimethylol diacrylate, ditrimethylol propanetetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol triacrylate, dipentaerythritol hexa. Examples thereof include acrylate and triacrylate of tris (β-hydroxyethyl) isocyanurate.
Examples of the polyfunctional (meth) acrylate compound include N, N'-methylenebisacrylamide, N- [tris (3-acrylamide propoxymethyl) methyl] acrylamide and the like.
Examples of the polyfunctional aromatic vinyl compound include divinylbenzene and the like.
 上記分岐単位の炭素数としては、特に制限はないが、8~100であることが好ましく、8~70であることがより好ましい。 The number of carbon atoms in the branching unit is not particularly limited, but is preferably 8 to 100, and more preferably 8 to 70.
 上記ポリマー粒子は、架橋構造を有する構成単位を1種単独で含有していても、2種以上を含有していてもよい。
 上記ポリマー粒子において、架橋構造を有する構成単位の含有量は、UV耐刷性及び機上現像性の観点から、上記ポリマー粒子の全質量に対し、0.1質量%~20質量%であることが好ましく、0.5質量%~15質量%であることがより好ましく、1質量%~10質量%であることが特に好ましい。
The polymer particles may contain one type of structural unit having a crosslinked structure alone, or may contain two or more types.
In the polymer particles, the content of the structural unit having a crosslinked structure is 0.1% by mass to 20% by mass with respect to the total mass of the polymer particles from the viewpoint of UV printing resistance and on-machine developability. Is more preferable, and it is more preferably 0.5% by mass to 15% by mass, and particularly preferably 1% by mass to 10% by mass.
 また、上記ポリマー粒子は、耐刷性、着肉性、及び、機上現像性の観点から、上記式Zで表される基を有するポリマー粒子を含むことが好ましい。 Further, the polymer particles preferably contain polymer particles having a group represented by the above formula Z from the viewpoints of printing resistance, fillability, and on-machine developability.
 上記式ZにおけるQは、炭素数1~20の二価の連結基であることが好ましく、炭素数1~10の二価の連結基であることがより好ましい。
 また、上記式ZにおけるQは、アルキレン基、アリーレン基、エステル結合、アミド結合、又は、これらを2以上組み合わせた基であることが好ましく、フェニレン基、エステル結合、又は、アミド結合であることがより好ましい。
Q in the above formula Z is preferably a divalent linking group having 1 to 20 carbon atoms, and more preferably a divalent linking group having 1 to 10 carbon atoms.
Further, Q in the above formula Z is preferably an alkylene group, an arylene group, an ester bond, an amide bond, or a group in which two or more of these are combined, and may be a phenylene group, an ester bond, or an amide bond. More preferred.
 上記式ZのWにおける親水性構造を有する二価の基は、ポリアルキレンオキシ基、又は、ポリアルキレンオキシ基の一方の末端に-CHCHNR-が結合した基であることが好ましい。なお、Rは、水素原子又はアルキル基を表す。
 上記式ZのWにおける疎水性構造を有する二価の基は、-RWA-、-O-RWA-O-、-RN-RWA-NR-、-OC(=O)-RWA-O-、又は、-OC(=O)-RWA-O-であることが好ましい。なお、RWAはそれぞれ独立に、炭素数6~120の直鎖、分岐若しくは環状アルキレン基、炭素数6~120のハロアルキレン基、炭素数6~120のアリーレン基、炭素数6~120のアルカーリレン基(アルキルアリール基から水素原子を1つ除いた二価の基)、又は、炭素数6~120のアラルキレン基を表す。
The divalent group having a hydrophilic structure in W of the above formula Z is preferably a polyalkyleneoxy group or a group in which -CH 2 CH 2 NR W- is bonded to one end of a polyalkyleneoxy group. .. Incidentally, R W represents a hydrogen atom or an alkyl group.
The divalent group having a hydrophobic structure in the W of formula Z, -R WA -, - O -R WA -O -, - R W N-R WA -NR W -, - OC (= O) - R WA -O-, or, -OC (= O) is preferably -R WA -O-. The RWAs are independently linear, branched or cyclic alkylene groups having 6 to 120 carbon atoms, haloalkylene groups having 6 to 120 carbon atoms, arylene groups having 6 to 120 carbon atoms, and alkanelylenes having 6 to 120 carbon atoms. It represents a group (a divalent group obtained by removing one hydrogen atom from an alkylaryl group) or an aralkylene group having 6 to 120 carbon atoms.
 上記式ZのYにおける親水性構造を有する一価の基は、-OH、-C(=O)OH、末端が水素原子又はアルキル基であるポリアルキレンオキシ基、又は、末端が水素原子又はアルキル基であるポリアルキレンオキシ基の他方の末端に-CHCHN(R)-が結合した基であることが好ましい。
 上記式ZのYにおける疎水性構造を有する一価の基は、炭素数6~120の直鎖、分岐若しくは環状アルキル基、炭素数6~120のハロアルキル基、炭素数6~120のアリール基、炭素数6~120のアルカーリル基(アルキルアリール基)、炭素数6~120のアラルキル基、-ORWB、-C(=O)ORWB、又は、-OC(=O)RWBであることが好ましい。RWBは、炭素数6~20を有するアルキル基を表す。
The monovalent group having a hydrophilic structure in Y of the above formula Z is -OH, -C (= O) OH, a polyalkyleneoxy group having a hydrogen atom or an alkyl group at the end, or a hydrogen atom or an alkyl at the end. it is preferably bound group - at the other end of the polyalkyleneoxy group is a group -CH 2 CH 2 N (R W ).
The monovalent group having a hydrophobic structure in Y of the above formula Z is a linear, branched or cyclic alkyl group having 6 to 120 carbon atoms, a haloalkyl group having 6 to 120 carbon atoms, an aryl group having 6 to 120 carbon atoms, and the like. It may be an alcoholyl group (alkylaryl group) having 6 to 120 carbon atoms, an aralkyl group having 6 to 120 carbon atoms, -OR WB , -C (= O) OR WB , or -OC (= O) R WB. preferable. RWB represents an alkyl group having 6 to 20 carbon atoms.
 上記式Zで表される基を有するポリマー粒子は、耐刷性、着肉性、及び、機上現像性の観点から、Wが親水性構造を有する二価の基であることがより好ましく、Qがフェニレン基、エステル結合、又は、アミド結合であり、Wは、ポリアルキレンオキシ基であり、Yが、末端が水素原子又はアルキル基であるポリアルキレンオキシ基であることがより好ましい。 The polymer particle having a group represented by the above formula Z is more preferably a divalent group in which W has a hydrophilic structure from the viewpoints of print resistance, carving property and on-machine developability. More preferably, Q is a phenylene group, an ester bond, or an amide bond, W is a polyalkyleneoxy group, and Y is a polyalkyleneoxy group having a hydrogen atom or an alkyl group at the end.
 また、上記ポリマー粒子は、耐刷性、着肉性、及び、機上現像性の観点から、重合性基を有するポリマー粒子を含むことが好ましく、粒子表面に重合性基を有するポリマー粒子を含むことがより好ましい。
 更に、上記ポリマー粒子は、耐刷性の観点から、親水性基及び重合性基を有するポリマー粒子を含むことが好ましい。
 上記重合性基は、カチオン重合性基であっても、ラジカル重合性基であってもよいが、反応性の観点からは、ラジカル重合性基であることが好ましい。
 上記重合性基としては、重合可能な基であれば特に制限はないが、反応性の観点から、エチレン性不飽和基が好ましく、ビニルフェニル基(スチリル基)、(メタ)アクリロキシ基、又は、(メタ)アクリルアミド基がより好ましく、(メタ)アクリロキシ基が特に好ましい。
 また、重合性基を有するポリマー粒子におけるポリマーは、重合性基を有する構成単位を有することが好ましい。
 更に、高分子反応によりポリマー粒子表面に重合性基を導入してもよい。
Further, the polymer particles preferably contain polymer particles having a polymerizable group from the viewpoints of print resistance, fillability and on-machine developability, and include polymer particles having a polymerizable group on the particle surface. Is more preferable.
Further, the polymer particles preferably contain polymer particles having a hydrophilic group and a polymerizable group from the viewpoint of printing resistance.
The polymerizable group may be a cationically polymerizable group or a radically polymerizable group, but from the viewpoint of reactivity, it is preferably a radically polymerizable group.
The polymerizable group is not particularly limited as long as it is a polymerizable group, but from the viewpoint of reactivity, an ethylenically unsaturated group is preferable, and a vinylphenyl group (styryl group), a (meth) acryloxy group, or a (meth) acryloxy group, or A (meth) acrylamide group is more preferred, and a (meth) acryloxy group is particularly preferred.
Further, the polymer in the polymer particles having a polymerizable group preferably has a structural unit having a polymerizable group.
Further, a polymerizable group may be introduced on the surface of the polymer particles by a polymer reaction.
 また、上記ポリマー粒子は、耐刷性、着肉性、機上現像性、機上現像時の現像カス抑制性の観点から、ウレア結合を有する樹脂を含むことが好ましく、下記式(Iso)で表されるイソシアネート化合物と水とを少なくとも反応させて得られる構造を有する樹脂を含むことがより好ましく、下記式(Iso)で表されるイソシアネート化合物と水とを少なくとも反応させて得られる構造を有し、かつポリオキシアルキレン構造として、ポリエチレンオキシド構造及びポリプロピレンオキシド構造を有する樹脂を含むことが特に好ましい。また、上記ウレア結合を有する樹脂を含む粒子は、ミクロゲルであることが好ましい。 Further, the polymer particles preferably contain a resin having a urea bond from the viewpoints of printing resistance, inking property, on-machine developability, and ability to suppress development residue during on-machine development, and are preferably represented by the following formula (Iso). It is more preferable to contain a resin having a structure obtained by at least reacting the isocyanate compound represented by water with water, and having a structure obtained by at least reacting the isocyanate compound represented by the following formula (Iso) with water. However, it is particularly preferable that the polyoxyalkylene structure contains a resin having a polyethylene oxide structure and a polypropylene oxide structure. Further, the particles containing the resin having the urea bond are preferably microgels.
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-C000069
 式(Iso)中、nは0~10の整数を表す。 In the formula (Iso), n represents an integer from 0 to 10.
 上記式(Iso)で表されるイソシアネート化合物と水との反応の一例としては、下記に示す反応が挙げられる。なお、下記の例は、n=0、4,4-異性体を使用した例である。
 下記に示すように、上記式(Iso)で表されるイソシアネート化合物と水とを反応させると、水によりイソシアネート基の一部が加水分解し、アミノ基が生じ、生じたアミノ基とイソシアネート基とが反応し、ウレア結合が生成し、二量体が形成される。また、下記反応が繰り返され、ウレア結合を有する樹脂が形成される。
 また、下記反応において、アルコール化合物、アミン化合物等のイソシアネート基と反応性を有する化合物(活性水素を有する化合物)を添加することにより、アルコール化合物、アミン化合物等の構造をウレア結合を有する樹脂に導入することもできる。
 上記活性水素を有する化合物としては、上述したミクロゲルにおいて記載したものが好ましく挙げられる。
An example of the reaction between the isocyanate compound represented by the above formula (Iso) and water is the reaction shown below. The following example is an example using n = 0, 4,4-isomer.
As shown below, when the isocyanate compound represented by the above formula (Iso) is reacted with water, a part of the isocyanate group is hydrolyzed by water to generate an amino group, and the generated amino group and isocyanate group React, forming urea bonds and forming dimers. Further, the following reaction is repeated to form a resin having a urea bond.
Further, in the following reaction, by adding a compound (compound having active hydrogen) reactive with an isocyanate group such as an alcohol compound or an amine compound, the structure of the alcohol compound, the amine compound or the like is introduced into the resin having a urea bond. You can also do it.
As the compound having active hydrogen, those described in the above-mentioned microgel are preferably mentioned.
Figure JPOXMLDOC01-appb-C000070
Figure JPOXMLDOC01-appb-C000070
 また、上記ウレア結合を有する樹脂は、エチレン性不飽和基を有することが好ましく、下記式(PETA)で表される基を有することがより好ましい。 Further, the resin having a urea bond preferably has an ethylenically unsaturated group, and more preferably has a group represented by the following formula (PETA).
Figure JPOXMLDOC01-appb-C000071
Figure JPOXMLDOC01-appb-C000071
 式(PETA)中、波線部分は、他の構造との結合位置を表す。 In the formula (PETA), the wavy line part represents the connection position with other structures.
 上記粒子の平均粒径は、0.01μm~3.0μmが好ましく、0.03μm~2.0μmがより好ましく、0.10μm~1.0μmが更に好ましい。この範囲で良好な解像度と経時安定性が得られる。
 本開示における上記粒子の平均一次粒径は、光散乱法により測定するか、又は、粒子の電子顕微鏡写真を撮影し、写真上で粒子の粒径を総計で5,000個測定し、平均値を算出するものとする。なお、非球形粒子については写真上の粒子面積と同一の粒子面積を有する球形粒子の粒径値を粒径とする。
 また、本開示における平均粒径は、特に断りのない限り、体積平均粒径であるものとする。
The average particle size of the particles is preferably 0.01 μm to 3.0 μm, more preferably 0.03 μm to 2.0 μm, and even more preferably 0.10 μm to 1.0 μm. Good resolution and stability over time can be obtained in this range.
The average primary particle size of the particles in the present disclosure is measured by a light scattering method, or an electron micrograph of the particles is taken, and a total of 5,000 particle sizes are measured on the photographs, and the average value is obtained. Shall be calculated. For non-spherical particles, the particle size value of spherical particles having the same particle area as the particle area on the photograph is used as the particle size.
Further, the average particle size in the present disclosure shall be the volume average particle size unless otherwise specified.
 上記画像記録層は、粒子、特にポリマー粒子を1種単独で含有していても、2種以上を含有していてもよい。
 また、上記画像記録層における粒子、特にポリマー粒子の含有量は、現像性、UV耐刷性の観点から、上記画像記録層の全質量に対し、5質量%~90質量%が好ましく、10質量%~90質量%であることがより好ましく、20質量%~90質量%であることが更に好ましく、50質量%~90質量%であることが特に好ましい。
 また、上記画像記録層におけるポリマー粒子の含有量は、現像性、及び、UV耐刷性の観点から、上記画像記録層の分子量3,000以上の成分の全質量に対し、20質量%~100質量%が好ましく、35質量%~100質量%であることがより好ましく、50質量%~100質量%であることが更に好ましく、80質量%~100質量%であることが特に好ましい。
The image recording layer may contain particles, particularly polymer particles, alone or in combination of two or more.
The content of the particles in the image recording layer, particularly the polymer particles, is preferably 5% by mass to 90% by mass, preferably 10% by mass, based on the total mass of the image recording layer from the viewpoint of developability and UV printing resistance. It is more preferably% to 90% by mass, further preferably 20% by mass to 90% by mass, and particularly preferably 50% by mass to 90% by mass.
The content of the polymer particles in the image recording layer is 20% by mass to 100% by mass with respect to the total mass of the components having a molecular weight of 3,000 or more in the image recording layer from the viewpoint of developability and UV printing resistance. It is preferably by mass, more preferably 35% by mass to 100% by mass, further preferably 50% by mass to 100% by mass, and particularly preferably 80% by mass to 100% by mass.
-バインダーポリマー-
 上記画像記録層は、バインダーポリマーを含んでいてもよいが、機上現像性、及び、UV耐刷性の観点から、含まないことが好ましい。
 上記バインダーポリマーは、上記ポリマー粒子以外のポリマー、すなわち、粒子形状でないバインダーポリマーである。
 上記バインダーポリマーとしては、(メタ)アクリル樹脂、ポリビニルアセタール樹脂、又は、ポリウレタン樹脂が好ましい。
-Binder polymer-
The image recording layer may contain a binder polymer, but is preferably not contained from the viewpoint of on-machine developability and UV printing resistance.
The binder polymer is a polymer other than the polymer particles, that is, a binder polymer that is not in the form of particles.
As the binder polymer, a (meth) acrylic resin, a polyvinyl acetal resin, or a polyurethane resin is preferable.
 中でも、上記バインダーポリマーは、平版印刷版原版の画像記録層に用いられる公知のバインダーポリマーを好適に使用することができる。一例として、機上現像型の平版印刷版原版に用いられるバインダーポリマー(以下、機上現像用バインダーポリマーともいう。)について、詳細に記載する。
 機上現像用バインダーポリマーとしては、アルキレンオキシド鎖を有するバインダーポリマーが好ましい。アルキレンオキシド鎖を有するバインダーポリマーは、ポリ(アルキレンオキシド)部位を主鎖に有していても側鎖に有していてもよい。また、ポリ(アルキレンオキシド)を側鎖に有するグラフトポリマーでも、ポリ(アルキレンオキシド)含有繰返し単位で構成されるブロックと(アルキレンオキシド)非含有繰返し単位で構成されるブロックとのブロックコポリマーでもよい。
 ポリ(アルキレンオキシド)部位を主鎖に有する場合は、ポリウレタン樹脂が好ましい。ポリ(アルキレンオキシド)部位を側鎖に有する場合の主鎖のポリマーとしては、(メタ)アクリル樹脂、ポリビニルアセタール樹脂、ポリウレタン樹脂、ポリウレア樹脂、ポリイミド樹脂、ポリアミド樹脂、エポキシ樹脂、ポリスチレン樹脂、ノボラック型フェノール樹脂、ポリエステル樹脂、合成ゴム、天然ゴムが挙げられ、特に(メタ)アクリル樹脂が好ましい。
Above all, as the binder polymer, a known binder polymer used for the image recording layer of the lithographic printing plate original plate can be preferably used. As an example, a binder polymer (hereinafter, also referred to as a binder polymer for on-machine development) used in an on-machine development type lithographic printing plate original plate will be described in detail.
As the binder polymer for on-machine development, a binder polymer having an alkylene oxide chain is preferable. The binder polymer having an alkylene oxide chain may have a poly (alkylene oxide) moiety in the main chain or the side chain. Further, it may be a graft polymer having a poly (alkylene oxide) in a side chain, or a block copolymer of a block composed of a poly (alkylene oxide) -containing repeating unit and a block composed of a (alkylene oxide) -free repeating unit.
When the main chain has a poly (alkylene oxide) moiety, a polyurethane resin is preferable. When the main chain polymer has a poly (alkylene oxide) moiety in the side chain, the polymer of the main chain is (meth) acrylic resin, polyvinyl acetal resin, polyurethane resin, polyurea resin, polyimide resin, polyamide resin, epoxy resin, polystyrene resin, novolak type. Examples thereof include phenol resin, polyester resin, synthetic rubber and natural rubber, and (meth) acrylic resin is particularly preferable.
 また、バインダーポリマーの他の好ましい例として、6官能以上10官能以下の多官能チオールを核として、この核に対しスルフィド結合により結合したポリマー鎖を有し、当該ポリマー鎖が重合性基を有する高分子化合物(以下、星型高分子化合物ともいう。)が挙げられる。星型高分子化合物としては、例えば、特開2012-148555号公報に記載の化合物を好ましく用いることができる。 Further, as another preferable example of the binder polymer, a high molecular weight polymer chain having a polyfunctional thiol having 6 or more functionalities or 10 functionalities as a nucleus and being bonded to the nucleus by a sulfide bond, and the polymer chain having a polymerizable group. Molecular compounds (hereinafter, also referred to as star-shaped polymer compounds) can be mentioned. As the star-shaped polymer compound, for example, the compound described in JP-A-2012-148555 can be preferably used.
 星型高分子化合物は、特開2008-195018号公報に記載のような画像部の皮膜強度を向上するためのエチレン性不飽和結合等の重合性基を、主鎖又は側鎖、好ましくは側鎖に有しているものが挙げられる。重合性基によってポリマー分子間に架橋が形成され、硬化が促進する。
 重合性基としては、(メタ)アクリル基、ビニル基、アリル基、スチリル基などのエチレン性不飽和基やエポキシ基等が好ましく、(メタ)アクリル基、ビニル基、又は、スチリル基が重合反応性の観点でより好ましく、(メタ)アクリル基が特に好ましい。これらの基は高分子反応や共重合によってポリマーに導入することができる。例えば、カルボキシ基を側鎖に有するポリマーとグリシジルメタクリレートとの反応、あるいはエポキシ基を有するポリマーとメタクリル酸などのエチレン性不飽和基含有カルボン酸との反応を利用できる。これらの基は併用してもよい。
The star-shaped polymer compound contains a polymerizable group such as an ethylenically unsaturated bond for improving the film strength of the image portion as described in JP-A-2008-195018, with a main chain or a side chain, preferably a side chain. Examples include those held in the chain. The polymerizable group forms crosslinks between the polymer molecules to promote curing.
As the polymerizable group, an ethylenically unsaturated group such as a (meth) acrylic group, a vinyl group, an allyl group or a styryl group, an epoxy group or the like is preferable, and the (meth) acrylic group, the vinyl group or the styryl group is a polymerization reaction. It is more preferable from the viewpoint of sex, and a (meth) acrylic group is particularly preferable. These groups can be introduced into the polymer by polymer reaction or copolymerization. For example, a reaction between a polymer having a carboxy group in the side chain and glycidyl methacrylate, or a reaction between a polymer having an epoxy group and an ethylenically unsaturated group-containing carboxylic acid such as methacrylic acid can be used. These groups may be used together.
 バインダーポリマーの分子量は、GPC法によるポリスチレン換算値として重量平均分子量(Mw)が、2,000以上であることが好ましく、5,000以上であることがより好ましく、10,000~300,000であることが更に好ましい。 The molecular weight of the binder polymer is preferably 2,000 or more, more preferably 5,000 or more, and 10,000 to 300,000 in terms of polystyrene by the GPC method. It is more preferable to have.
 必要に応じて、特開2008-195018号公報に記載のポリアクリル酸、ポリビニルアルコールなどの親水性ポリマーを併用することができる。また、親油的なポリマーと親水的なポリマーとを併用することもできる。 If necessary, hydrophilic polymers such as polyacrylic acid and polyvinyl alcohol described in JP-A-2008-195018 can be used in combination. In addition, a lipophilic polymer and a hydrophilic polymer can be used in combination.
 本開示において用いられる画像記録層においては、バインダーポリマーを1種単独で使用しても、2種以上を併用してもよい。
 上記バインダーポリマーは、画像記録層中に任意な量で含有させることができるが、機上現像性、及び、UV耐刷性の観点から、上記バインダーポリマーを含まないか、又は、上記バインダーポリマーの含有量は、画像記録層の全質量に対して、0質量%を超え20質量%以下であることが好ましく、上記バインダーポリマーを含まないか、又は、上記バインダーポリマーの含有量は、画像記録層の全質量に対して、0質量%を超え10質量%以下であることがより好ましく、上記バインダーポリマーを含まないか、又は、上記バインダーポリマーの含有量は、画像記録層の全質量に対して、0質量%を超え5質量%以下であることが更に好ましく、上記バインダーポリマーを含まないか、又は、上記バインダーポリマーの含有量は、画像記録層の全質量に対して、0質量%を超え2質量%以下であることが特に好ましく、上記バインダーポリマーを含まないことが最も好ましい。
In the image recording layer used in the present disclosure, one type of binder polymer may be used alone, or two or more types may be used in combination.
The binder polymer can be contained in the image recording layer in an arbitrary amount, but from the viewpoint of on-machine developability and UV printing resistance, the binder polymer is not contained or the binder polymer is used. The content is preferably more than 0% by mass and 20% by mass or less with respect to the total mass of the image recording layer, and either does not contain the binder polymer or the content of the binder polymer is the image recording layer. It is more preferable that it is more than 0% by mass and 10% by mass or less with respect to the total mass of the image recording layer, and the binder polymer is not contained or the content of the binder polymer is based on the total mass of the image recording layer. , 0% by mass and 5% by mass or less, and the binder polymer is not contained, or the content of the binder polymer exceeds 0% by mass with respect to the total mass of the image recording layer. It is particularly preferably 2% by mass or less, and most preferably does not contain the above binder polymer.
-赤外線吸収剤-
 上記画像記録層は、感度の観点から、上記発色性化合物以外の赤外線吸収剤(単に「赤外線吸収剤」ともいう。)を含んでいてもよい。
 赤外線吸収剤としては、特に制限はなく、例えば、顔料及び染料が挙げられる。
 赤外線吸収剤として用いられる染料としては、市販の染料及び例えば、「染料便覧」(有機合成化学協会編集、昭和45年刊)等の文献に記載されている公知のものが利用できる。具体的には、アゾ染料、金属錯塩アゾ染料、ピラゾロンアゾ染料、ナフトキノン染料、アントラキノン染料、フタロシアニン染料、カルボニウム染料、キノンイミン染料、メチン染料、シアニン染料、スクアリリウム色素、ピリリウム塩、金属チオレート錯体等の染料が挙げられる。
-Infrared absorber-
From the viewpoint of sensitivity, the image recording layer may contain an infrared absorber (also simply referred to as “infrared absorber”) other than the color-developing compound.
The infrared absorber is not particularly limited, and examples thereof include pigments and dyes.
As the dye used as the infrared absorber, a commercially available dye and, for example, a known dye described in a document such as "Dye Handbook" (edited by the Society of Synthetic Organic Chemistry, published in 1970) can be used. Specifically, dyes such as azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, and metal thiolate complexes. Can be mentioned.
 これらの染料のうち特に好ましいものとしては、シアニン色素、スクアリリウム色素、ピリリウム塩、ニッケルチオレート錯体、インドレニンシアニン色素が挙げられる。更に、シアニン色素やインドレニンシアニン色素が挙げられる。中でも、シアニン色素が特に好ましい。 Among these dyes, particularly preferable ones include cyanine pigments, squarylium pigments, pyrylium salts, nickel thiolate complexes, and indolenin cyanine pigments. Further, cyanine pigments and indorenin cyanine pigments can be mentioned. Of these, the cyanine pigment is particularly preferable.
 上記赤外線吸収剤としては、メソ位に酸素又は窒素原子を有するカチオン性のポリメチン色素であることが好ましい。カチオン性のポリメチン色素としては、シアニン色素、ピリリウム色素、チオピリリウム色素、アズレニウム色素等が好ましく挙げられ、入手の容易性、導入反応時の溶剤溶解性等の観点から、シアニン色素であることが好ましい。 The infrared absorber is preferably a cationic polymethine dye having an oxygen or nitrogen atom at the meso position. Preferred examples of the cationic polymethine pigment include cyanine pigments, pyrylium pigments, thiopyrylium pigments, and azulenium pigments, and cyanine pigments are preferable from the viewpoints of availability, solvent solubility at the time of introduction reaction, and the like.
 シアニン色素の具体例としては、特開2001-133969号公報の段落0017~0019に記載の化合物、特開2002-023360号公報の段落0016~0021、特開2002-040638号公報の段落0012~0037に記載の化合物、好ましくは特開2002-278057号公報の段落0034~0041、特開2008-195018号公報の段落0080~0086に記載の化合物、特に好ましくは特開2007-90850号公報の段落0035~0043に記載の化合物、特開2012-206495号公報の段落0105~0113に記載の化合物が挙げられる。
 また、特開平5-5005号公報の段落0008~0009、特開2001-222101号公報の段落0022~0025に記載の化合物も好ましく使用することができる。
 顔料としては、特開2008-195018号公報の段落0072~0076に記載の化合物が好ましい。
Specific examples of the cyanine dye include the compounds described in paragraphs 0017 to 0019 of JP-A-2001-133769, paragraphs 0016 to 0021 of JP-A-2002-0233360, and paragraphs 0012 to 0037 of JP-A-2002-040638. , Preferably the compounds described in paragraphs 0034 to 0041 of JP-A-2002-278057, paragraphs 0080-0086 of JP-A-2008-195018, and particularly preferably paragraphs 0035 of JP-A-2007-90850. Examples thereof include the compounds described in Japanese Patent Application Laid-Open No. 2012-206495, and the compounds described in paragraphs 0105 to 0113 of JP2012-206495A.
Further, the compounds described in paragraphs 0008 to 0009 of JP-A-5-5005 and paragraphs 0022 to 0025 of JP-A-2001-222101 can also be preferably used.
As the pigment, the compounds described in paragraphs 0072 to 0076 of JP-A-2008-195018 are preferable.
 赤外線吸収剤は、1種のみ用いてもよいし、2種以上を併用してもよい。また、赤外線吸収剤として顔料と染料とを併用してもよい。
 上記画像記録層中の赤外線吸収剤の含有量は、画像記録層の全質量に対し、0.1質量%~10.0質量%が好ましく、0.5質量%~5.0質量%がより好ましい。
Only one type of infrared absorber may be used, or two or more types may be used in combination. Further, a pigment and a dye may be used in combination as an infrared absorber.
The content of the infrared absorber in the image recording layer is preferably 0.1% by mass to 10.0% by mass, more preferably 0.5% by mass to 5.0% by mass, based on the total mass of the image recording layer. preferable.
-酸発色剤-
 上記画像記録層は、酸発色剤を含むことが好ましい。また、酸発色剤としては、ロイコ化合物を含むことが好ましい。
 本開示で用いられる「酸発色剤」とは、電子受容性化合物(例えば酸等のプロトン)を受容した状態で加熱することにより、発色又は消色し画像記録層の色を変化させる性質を有する化合物を意味する。酸発色剤としては、特に、ラクトン、ラクタム、サルトン、スピロピラン、エステル、アミド等の部分骨格を有し、電子受容性化合物と接触した時に、速やかにこれらの部分骨格が開環若しくは開裂する無色の化合物が好ましい。
-Acid color former-
The image recording layer preferably contains an acid color former. Further, the acid color former preferably contains a leuco compound.
The "acid color former" used in the present disclosure has a property of developing or decoloring and changing the color of the image recording layer by heating in a state of receiving an electron-accepting compound (for example, a proton such as an acid). Means a compound. The acid color former has a partial skeleton such as lactone, lactam, salton, spiropyrane, ester, and amide, and when it comes into contact with an electron-accepting compound, these partial skeletons are rapidly ring-opened or cleaved. Compounds are preferred.
 このような酸発色剤の例としては、3,3-ビス(4-ジメチルアミノフェニル)-6-ジメチルアミノフタリド(“クリスタルバイオレットラクトン”と称される。)、3,3-ビス(4-ジメチルアミノフェニル)フタリド、3-(4-ジメチルアミノフェニル)-3-(4-ジエチルアミノ-2-メチルフェニル)-6-ジメチルアミノフタリド、3-(4-ジメチルアミノフェニル)-3-(1,2-ジメチルインドール-3-イル)フタリド、3-(4-ジメチルアミノフェニル)-3-(2-メチルインドール-3-イル)フタリド、3,3-ビス(1,2-ジメチルインドール-3-イル)-5-ジメチルアミノフタリド、3,3-ビス(1,2-ジメチルインドール-3-イル)-6-ジメチルアミノフタリド、3,3-ビス(9-エチルカルバゾール-3-イル)-6-ジメチルアミノフタリド、3,3-ビス(2-フェニルインドール-3-イル)-6-ジメチルアミノフタリド、3-(4-ジメチルアミノフェニル)-3-(1-メチルピロール-3-イル)-6-ジメチルアミノフタリド、 Examples of such acid color formers are 3,3-bis (4-dimethylaminophenyl) -6-dimethylaminophthalide (referred to as "crystal violet lactone") and 3,3-bis (4). -Dimethylaminophenyl) phthalide, 3- (4-dimethylaminophenyl) -3- (4-diethylamino-2-methylphenyl) -6-dimethylaminophthalide, 3- (4-dimethylaminophenyl) -3- ( 1,2-dimethylindole-3-yl) phthalide, 3- (4-dimethylaminophenyl) -3- (2-methylindole-3-yl) phthalide, 3,3-bis (1,2-dimethylindole-) 3-yl) -5-dimethylaminophthalide, 3,3-bis (1,2-dimethylindole-3-yl) -6-dimethylaminophthalide, 3,3-bis (9-ethylcarbazole-3-3) Il) -6-dimethylaminophthalide, 3,3-bis (2-phenylindole-3-yl) -6-dimethylaminophthalide, 3- (4-dimethylaminophenyl) -3- (1-methylpyrrole) -3-yl) -6-dimethylaminophthalide,
 3,3-ビス〔1,1-ビス(4-ジメチルアミノフェニル)エチレン-2-イル〕-4,5,6,7-テトラクロロフタリド、3,3-ビス〔1,1-ビス(4-ピロリジノフェニル)エチレン-2-イル〕-4,5,6,7-テトラブロモフタリド、3,3-ビス〔1-(4-ジメチルアミノフェニル)-1-(4-メトキシフェニル)エチレン-2-イル〕-4,5,6,7-テトラクロロフタリド、3,3-ビス〔1-(4-ピロリジノフェニル)-1-(4-メトキシフェニル)エチレン-2-イル〕-4,5,6,7-テトラクロロフタリド、3-〔1,1-ジ(1-エチル-2-メチルインドール-3-イル)エチレン-2-イル〕-3-(4-ジエチルアミノフェニル)フタリド、3-〔1,1-ジ(1-エチル-2-メチルインドール-3-イル)エチレン-2-イル〕-3-(4-N-エチル-N-フェニルアミノフェニル)フタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-n-オクチル-2-メチルインドール-3-イル)-フタリド、3,3-ビス(1-n-オクチル-2-メチルインドール-3-イル)-フタリド、3-(2-メチル-4-ジエチルアミノフェニル)-3-(1-n-オクチル-2-メチルインドール-3-イル)-フタリド等のフタリド類、 3,3-bis [1,1-bis (4-dimethylaminophenyl) ethylene-2-yl] -4,5,6,7-tetrachlorophthalide, 3,3-bis [1,1-bis (1,1-bis) 4-Pyrrolidinophenyl) ethylene-2-yl] -4,5,6,7-tetrabromophthalide, 3,3-bis [1- (4-dimethylaminophenyl) -1- (4-methoxyphenyl) Ethyl-2-yl] -4,5,6,7-tetrachlorophthalide, 3,3-bis [1- (4-pyrrolidinophenyl) -1- (4-methoxyphenyl) ethylene-2-yl] -4,5,6,7-tetrachlorophthalide, 3- [1,1-di (1-ethyl-2-methylindole-3-yl) ethylene-2-yl] -3- (4-diethylaminophenyl) ) Phenylide, 3- [1,1-di (1-ethyl-2-methylindol-3-yl) ethylene-2-yl] -3- (4-N-ethyl-N-phenylaminophenyl) phthalide, 3 -(2-ethoxy-4-diethylaminophenyl) -3- (1-n-octyl-2-methylindole-3-yl) -phthalide, 3,3-bis (1-n-octyl-2-methylindole-) Phenylides such as 3-yl) -phthalide, 3- (2-methyl-4-diethylaminophenyl) -3- (1-n-octyl-2-methylindole-3-yl) -phthalide,
 4,4-ビス-ジメチルアミノベンズヒドリンベンジルエーテル、N-ハロフェニル-ロイコオーラミン、N-2,4,5-トリクロロフェニルロイコオーラミン、ローダミン-B-アニリノラクタム、ローダミン-(4-ニトロアニリノ)ラクタム、ローダミン-B-(4-クロロアニリノ)ラクタム、3,7-ビス(ジエチルアミノ)-10-ベンゾイルフェノオキサジン、ベンゾイルロイコメチレンブルー、4ーニトロベンゾイルメチレンブルー、 4,4-Bis-dimethylaminobenzhydrinbenzyl ether, N-halophenyl-leucooramine, N-2,4,5-trichlorophenylleucooramine, rhodamine-B-anilinolactam, rhodamine- (4-nitroanilino) ) Lactam, Rhodamine-B- (4-chloroanilino) lactam, 3,7-bis (diethylamino) -10-benzoylphenoxazine, benzoyl leucomethylene blue, 4-nitrobenzoyl methylene blue,
 3,6-ジメトキシフルオラン、3-ジメチルアミノ-7-メトキシフルオラン、3-ジエチルアミノ-6-メトキシフルオラン、3-ジエチルアミノ-7-メトキシフルオラン、3-ジエチルアミノ-7-クロロフルオラン、3-ジエチルアミノ-6-メチル-7-クロロフルオラン、3-ジエチルアミノ-6,7-ジメチルフルオラン、3-N-シクロヘキシル-N-n-ブチルアミノ-7-メチルフルオラン、3-ジエチルアミノ-7-ジベンジルアミノフルオラン、3-ジエチルアミノ-7-オクチルアミノフルオラン、3-ジエチルアミノ-7-ジ-n-ヘキシルアミノフルオラン、3-ジエチルアミノ-7-アニリノフルオラン、3-ジエチルアミノ-7-(2’-フルオロフェニルアミノ)フルオラン、3-ジエチルアミノ-7-(2’-クロロフェニルアミノ)フルオラン、3-ジエチルアミノ-7-(3’-クロロフェニルアミノ)フルオラン、3-ジエチルアミノ-7-(2’,3’-ジクロロフェニルアミノ)フルオラン、3-ジエチルアミノ-7-(3’-トリフルオロメチルフェニルアミノ)フルオラン、3-ジ-n-ブチルアミノ-7-(2’-フルオロフェニルアミノ)フルオラン、3-ジ-n-ブチルアミノ-7-(2’-クロロフェニルアミノ)フルオラン、3-N-イソペンチル-N-エチルアミノ-7-(2’-クロロフェニルアミノ)フルオラン、 3,6-Dimethoxyfluorane, 3-dimethylamino-7-methoxyfluorane, 3-diethylamino-6-methoxyfluorane, 3-diethylamino-7-methoxyfluorane, 3-diethylamino-7-chlorofluorine, 3 -Diethylamino-6-methyl-7-chlorofluorane, 3-diethylamino-6,7-dimethylfluorane, 3-N-cyclohexyl-Nn-butylamino-7-methylfluorane, 3-diethylamino-7- Dibenzylaminofluorane, 3-diethylamino-7-octylaminofluorane, 3-diethylamino-7-di-n-hexylaminofluorane, 3-diethylamino-7-anilinofluorane, 3-diethylamino-7- ( 2'-fluorophenylamino) fluorane, 3-diethylamino-7- (2'-chlorophenylamino) fluorane, 3-diethylamino-7- (3'-chlorophenylamino) fluorane, 3-diethylamino-7- (2', 3) '-Dichlorophenylamino) fluorane, 3-diethylamino-7- (3'-trifluoromethylphenylamino) fluorane, 3-di-n-butylamino-7- (2'-fluorophenylamino) fluorane, 3-di- n-Butylamino-7- (2'-chlorophenylamino) fluorane, 3-N-isopentyl-N-ethylamino-7- (2'-chlorophenylamino) fluorane,
 3-N-n-ヘキシル-N-エチルアミノ-7-(2’-クロロフェニルアミノ)フルオラン、3-ジエチルアミノ-6-クロロ-7-アニリノフルオラン、3-ジ-n-ブチルアミノ-6-クロロ-7-アニリノフルオラン、3-ジエチルアミノ-6-メトキシ-7-アニリノフルオラン、3-ジ-n-ブチルアミノ-6-エトキシ-7-アニリノフルオラン、3-ピロリジノ-6-メチル-7-アニリノフルオラン、3-ピペリジノ-6-メチル-7-アニリノフルオラン、3-モルホリノ-6-メチル-7-アニリノフルオラン、3-ジメチルアミノ-6-メチル-7-アニリノフルオラン、3-ジエチルアミノ-6-メチル-7-アニリノフルオラン、3-ジ-n-ブチルアミノ-6-メチル-7-アニリノフルオラン、3-ジ-n-ペンチルアミノ-6-メチル-7-アニリノフルオラン、3-N-エチル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-プロピル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-プロピル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-ブチル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-ブチル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-イソブチル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-イソブチル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-イソペンチル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-ヘキシル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-n-プロピルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-n-ブチルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-n-ヘキシルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-n-オクチルアミノ-6-メチル-7-アニリノフルオラン、 3-Nn-hexyl-N-ethylamino-7- (2'-chlorophenylamino) fluorane, 3-diethylamino-6-chloro-7-anilinofluorane, 3-di-n-butylamino-6- Chloro-7-anilinofluorane, 3-diethylamino-6-methoxy-7-anilinofluorane, 3-di-n-butylamino-6-ethoxy-7-anilinofluorane, 3-pyrrolidino-6- Methyl-7-anilinofluoran, 3-piperidino-6-methyl-7-anilinofluoran, 3-morpholino-6-methyl-7-anilinofluoran, 3-dimethylamino-6-methyl-7- Anilinofluorane, 3-diethylamino-6-methyl-7-anilinofluorane, 3-di-n-butylamino-6-methyl-7-anilinofluorane, 3-di-n-pentylamino-6 -Methyl-7-anilinofluorane, 3-N-ethyl-N-methylamino-6-methyl-7-anilinofluorane, 3-Nn-propyl-N-methylamino-6-methyl-7 -Anilinofluorane, 3-Nn-propyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-Nn-butyl-N-methylamino-6-methyl-7-ani Renofluorane, 3-Nn-butyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-N-isobutyl-N-methylamino-6-methyl-7-anilinofluorane, 3-N-isobutyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-N-isopentyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-Nn- Hexyl-N-methylamino-6-methyl-7-anilinofluorane, 3-N-cyclohexyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-N-cyclohexyl-Nn- Propylamino-6-methyl-7-anilinofluorane, 3-N-cyclohexyl-Nn-butylamino-6-methyl-7-anilinofluorane, 3-N-cyclohexyl-Nn-hexylamino -6-Methyl-7-anilinofluorane, 3-N-cyclohexyl-Nn-octylamino-6-methyl-7-anilinofluorane,
 3-N-(2’-メトキシエチル)-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-メトキシエチル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-メトキシエチル)-N-イソブチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-エトキシエチル)-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-エトキシエチル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(3’-メトキシプロピル)-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(3’-メトキシプロピル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(3’-エトキシプロピル)-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(3’-エトキシプロピル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-テトラヒドロフルフリル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(4’-メチルフェニル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-ジエチルアミノ-6-エチル-7-アニリノフルオラン、3-ジエチルアミノ-6-メチル-7-(3’-メチルフェニルアミノ)フルオラン、3-ジエチルアミノ-6-メチル-7-(2’,6’-ジメチルフェニルアミノ)フルオラン、3-ジ-n-ブチルアミノ-6-メチル-7-(2’,6’-ジメチルフェニルアミノ)フルオラン、3-ジ-n-ブチルアミノ-7-(2’,6’-ジメチルフェニルアミノ)フルオラン、2,2-ビス〔4’-(3-N-シクロヘキシル-N-メチルアミノ-6-メチルフルオラン)-7-イルアミノフェニル〕プロパン、3-〔4’-(4-フェニルアミノフェニル)アミノフェニル〕アミノ-6-メチル-7-クロロフルオラン、3-〔4’-(ジメチルアミノフェニル)〕アミノ-5,7-ジメチルフルオラン等のフルオラン類、 3-N- (2'-methoxyethyl) -N-methylamino-6-methyl-7-anilinofluorane, 3-N- (2'-methoxyethyl) -N-ethylamino-6-methyl-7 -Anilinofluorane, 3-N- (2'-methoxyethyl) -N-isobutylamino-6-methyl-7-anilinofluorane, 3-N- (2'-ethoxyethyl) -N-methylamino -6-Methyl-7-anilinofluorane, 3-N- (2'-ethoxyethyl) -N-ethylamino-6-methyl-7-anilinofluorane, 3-N- (3'-methoxypropyl) ) -N-Methylamino-6-methyl-7-anilinofluorane, 3-N- (3'-methoxypropyl) -N-ethylamino-6-methyl-7-anilinofluorane, 3-N- (3'-ethoxypropyl) -N-methylamino-6-methyl-7-anilinofluorane, 3-N- (3'-ethoxypropyl) -N-ethylamino-6-methyl-7-anilinoflu Oran, 3-N- (2'-tetrahydrofurfuryl) -N-ethylamino-6-methyl-7-anilinofluoran, 3-N- (4'-methylphenyl) -N-ethylamino-6- Methyl-7-anilinofluorane, 3-diethylamino-6-ethyl-7-anilinofluorane, 3-diethylamino-6-methyl-7- (3'-methylphenylamino) fluorane, 3-diethylamino-6- Methyl-7- (2', 6'-dimethylphenylamino) fluorane, 3-di-n-butylamino-6-methyl-7- (2', 6'-dimethylphenylamino) fluorane, 3-di-n -Butylamino-7- (2', 6'-dimethylphenylamino) fluorane, 2,2-bis [4'-(3-N-cyclohexyl-N-methylamino-6-methylfluorane) -7-yl Aminophenyl] propane, 3- [4'-(4-phenylaminophenyl) aminophenyl] amino-6-methyl-7-chlorofluorane, 3- [4'-(dimethylaminophenyl)] amino-5,7 -Fluorans such as dimethylfluorane,
 3-(2-メチル-4-ジエチルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-n-プロポキシカルボニルアミノ-4-ジ-n-プロピルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-メチルアミノ-4-ジ-n-プロピルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-メチル-4-ジn-ヘキシルアミノフェニル)-3-(1-n-オクチル-2-メチルインドール-3-イル)-4,7-ジアザフタリド、3,3-ビス(2-エトキシ-4-ジエチルアミノフェニル)-4-アザフタリド、3,3-ビス(1-n-オクチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-オクチル-2-メチルインドール-3-イル)-4又は7-アザフタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4又は7-アザフタリド、3-(2-ヘキシルオキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4又は7-アザフタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-フェニルインドール-3-イル)-4又は7-アザフタリド、3-(2-ブトキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-フェニルインドール-3-イル)-4又は7-アザフタリド、3-メチル-スピロ-ジナフトピラン、3-エチル-スピロ-ジナフトピラン、3-フェニル-スピロ-ジナフトピラン、3-ベンジル-スピロ-ジナフトピラン、3-メチル-ナフト-(3-メトキシベンゾ)スピロピラン、3-プロピル-スピロ-ジベンゾピラン-3,6-ビス(ジメチルアミノ)フルオレン-9-スピロ-3’-(6’-ジメチルアミノ)フタリド、3,6-ビス(ジエチルアミノ)フルオレン-9-スピロ-3’-(6’-ジメチルアミノ)フタリド等のフタリド類、 3- (2-Methyl-4-diethylaminophenyl) -3- (1-ethyl-2-methylindol-3-yl) -4-azaphthalide, 3- (2-n-propoxycarbonylamino-4-di-n) -Propylaminophenyl) -3- (1-ethyl-2-methylindol-3-yl) -4-azaphthalide, 3- (2-methylamino-4-di-n-propylaminophenyl) -3- (1) -Ethyl-2-methylindole-3-yl) -4-azaphthalide, 3- (2-methyl-4-din-hexylaminophenyl) -3- (1-n-octyl-2-methylindole-3-) Il) -4,7-diazaphthalide, 3,3-bis (2-ethoxy-4-diethylaminophenyl) -4-azaphthalide, 3,3-bis (1-n-octyl-2-methylindole-3-yl) -4-azaphthalide, 3- (2-ethoxy-4-diethylaminophenyl) -3- (1-ethyl-2-methylindole-3-yl) -4-azaphthalide, 3- (2-ethoxy-4-diethylaminophenyl) ) -3- (1-octyl-2-methylindole-3-yl) -4 or 7-azaphthalide, 3- (2-ethoxy-4-diethylaminophenyl) -3- (1-ethyl-2-methylindole-) 3-Il) -4 or 7-azaphthalide, 3- (2-hexyloxy-4-diethylaminophenyl) -3- (1-ethyl-2-methylindole-3-yl) -4 or 7-azaphthalide, 3- (2-Ethyl-4-diethylaminophenyl) -3- (1-ethyl-2-phenylindole-3-yl) -4 or 7-azaphthalide, 3- (2-butoxy-4-diethylaminophenyl) -3-( 1-Ethyl-2-phenylindole-3-yl) -4 or 7-azaphthalide, 3-methyl-spiro-dinaphthopylan, 3-ethyl-spiro-dinaftopylan, 3-phenyl-spiro-dinaftopyrane, 3-benzyl-spiro- Dinaftpyran, 3-methyl-naphtho- (3-methoxybenzo) spiropyrane, 3-propyl-spiro-dibenzopyran-3,6-bis (dimethylamino) fluorene-9-spiryl-3'-(6'-dimethylamino) Phtalides, phthalides such as 3,6-bis (diethylamino) fluorene-9-spiro-3'-(6'-dimethylamino) phthalide,
 その他、2’-アニリノ-6’-(N-エチル-N-イソペンチル)アミノ-3’-メチルスピロ[イソベンゾフラン-1(3H),9’-(9H)キサンテン-3-オン、2’-アニリノ-6’-(N-エチル-N-(4-メチルフェニル))アミノ-3’-メチルスピロ[イソベンゾフラン-1(3H),9’-(9H)キサンテン]-3-オン、3’-N,N-ジベンジルアミノ-6’-N,N-ジエチルアミノスピロ[イソベンゾフラン-1(3H),9’-(9H)キサンテン]-3-オン、2’-(N-メチル-N-フェニル)アミノ-6’-(N-エチル-N-(4-メチルフェニル))アミノスピロ[イソベンゾフラン-1(3H),9’-(9H)キサンテン]-3-オンなどが挙げられる。 In addition, 2'-anilino-6'-(N-ethyl-N-isopentyl) amino-3'-methylspiro [isobenzofuran-1 (3H), 9'-(9H) xanthen-3-one, 2'-anilino -6'-(N-ethyl-N- (4-methylphenyl)) amino-3'-methylspiro [isobenzofuran-1 (3H), 9'-(9H) xanthene] -3-one, 3'-N , N-Dibenzylamino-6'-N, N-diethylaminospiro [isobenzofuran-1 (3H), 9'-(9H) xanthene] -3-one, 2'-(N-methyl-N-phenyl) Amino-6'-(N-ethyl-N- (4-methylphenyl)) aminospiro [isobenzofuran-1 (3H), 9'-(9H) xanthene] -3-one and the like can be mentioned.
 中でも、本開示に用いられる酸発色剤は、発色性の観点から、スピロピラン化合物、スピロオキサジン化合物、スピロラクトン化合物、及び、スピロラクタム化合物よりなる群から選ばれた少なくとも1種の化合物であることが好ましい。
 発色後の色素の色相としては、可視性の観点から、緑、青又は黒であることが好ましい。
Among them, the acid color former used in the present disclosure is at least one compound selected from the group consisting of a spiropyran compound, a spirooxazine compound, a spirolactone compound, and a spirolactam compound from the viewpoint of color development. preferable.
The hue of the dye after color development is preferably green, blue or black from the viewpoint of visibility.
 また、上記酸発色剤は、発色性、及び、露光部の視認性の観点から、ロイコ色素であることが好ましい。
 上記ロイコ色素としては、ロイコ構造を有する色素であれば、特に制限はないが、スピロ構造を有することが好ましく、スピロラクトン環構造を有することがより好ましい。
 また、上記ロイコ色素としては、発色性、及び、露光部の視認性の観点から、フタリド構造又はフルオラン構造を有するロイコ色素であることが好ましい。
 更に、上記フタリド構造又はフルオラン構造を有するロイコ色素は、発色性、及び、露光部の視認性の観点から、下記式(Le-1)~式(Le-3)のいずれかで表される化合物であることが好ましく、下記式(Le-2)で表される化合物であることがより好ましい。
Further, the acid color former is preferably a leuco dye from the viewpoint of color development and visibility of the exposed portion.
The leuco dye is not particularly limited as long as it has a leuco structure, but preferably has a spiro structure, and more preferably has a spirolactone ring structure.
Further, the leuco dye is preferably a leuco dye having a phthalide structure or a fluorane structure from the viewpoint of color development and visibility of the exposed portion.
Further, the leuco dye having a phthalide structure or a fluorine structure is a compound represented by any of the following formulas (Le-1) to (Le-3) from the viewpoint of color development and visibility of the exposed portion. It is more preferable that the compound is represented by the following formula (Le-2).
Figure JPOXMLDOC01-appb-C000072
Figure JPOXMLDOC01-appb-C000072
 式(Le-1)~式(Le-3)中、ERGはそれぞれ独立に、電子供与性基を表し、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、X~X10はそれぞれ独立に、水素原子、ハロゲン原子又は一価の有機基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Raは、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、水素原子、アルキル基又はアリール基を表す。 Wherein (Le-1) ~ formula (Le-3), in each ERG independently represents an electron donating group, each X 1 ~ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group , X 5 to X 10 independently represent a hydrogen atom, a halogen atom or a monovalent organic group, Y 1 and Y 2 independently represent C or N, and when Y 1 is N, If X 1 does not exist and Y 2 is N, then X 4 does not exist, Ra 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 are independent hydrogen atoms. , Alkyl group or aryl group.
 式(Le-1)~式(Le-3)のERGにおける電子供与性基としては、発色性、及び、露光部の視認性の観点から、アミノ基、アルキルアミノ基、アリールアミノ基、ジアルキルアミノ基、モノアルキルモノアリールアミノ基、ジアリールアミノ基、アルコキシ基、アリーロキシ基、又は、アルキル基であることが好ましく、アミノ基、アルキルアミノ基、アリールアミノ基、ジアルキルアミノ基、モノアルキルモノアリールアミノ基、ジアリールアミノ基、アルコキシ基、又は、アリーロキシ基であることがより好ましく、アリールアミノ基、モノアルキルモノアリールアミノ基、又は、ジアリールアミノ基であることが更に好ましく、アリールアミノ基、又は、モノアルキルモノアリールアミノ基であることが特に好ましい。
 式(Le-1)~式(Le-3)におけるX~Xはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、水素原子、又は、塩素原子であることが好ましく、水素原子であることがより好ましい。
 式(Le-2)又は式(Le-3)におけるX~X10はそれぞれ独立に、発色性、及び、露光部の視認性の観点から、水素原子、ハロゲン原子、アルキル基、アリール基、アミノ基、アルキルアミノ基、アリールアミノ基、ジアルキルアミノ基、モノアルキルモノアリールアミノ基、ジアリールアミノ基、ヒドロキシ基、アルコキシ基、アリーロキシ基、アシル基、アルコキシカルボニル基、アリーロキシカルボニル基又はシアノ基であることが好ましく、水素原子、ハロゲン原子、アルキル基、アリール基、アルコキシ基、又は、アリーロキシ基であることがより好ましく、水素原子、ハロゲン原子、アルキル基、又は、アリール基であることが更に好ましく、水素原子であることが特に好ましい。
 式(Le-1)~式(Le-3)におけるY及びYは、発色性、及び、露光部の視認性の観点から、少なくとも1方がCであることが好ましく、Y及びYの両方がCであることがより好ましい。
 式(Le-1)~式(Le-3)におけるRaは、発色性、及び、露光部の視認性の観点から、アルキル基又はアルコキシ基であることが好ましく、アルコキシ基であることがより好ましく、メトキシ基であることが特に好ましい。
 式(Le-1)~式(Le-3)におけるRb~Rbはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、水素原子又はアルキル基であることが好ましく、アルキル基であることがより好ましく、メチル基であることが特に好ましい。
The electron donating groups in the ERGs of the formulas (Le-1) to (Le-3) include amino groups, alkylamino groups, arylamino groups, and dialkylaminos from the viewpoint of color development and visibility of the exposed area. A group, a monoalkyl monoarylamino group, a diarylamino group, an alkoxy group, an aryloxy group, or an alkyl group is preferable, and an amino group, an alkylamino group, an arylamino group, a dialkylamino group, or a monoalkyl monoarylamino group. , A diallylamino group, an alkoxy group, or an aryloxy group, more preferably an arylamino group, a monoalkyl monoarylamino group, or a diarylamino group, further preferably an arylamino group or a monoalkyl group. It is particularly preferably a monoarylamino group.
Formula (Le-1) ~ formula each X 1 ~ X 4 is in (Le-3) independently chromogenic, and, from the viewpoint of visibility of the exposure unit, a hydrogen atom, or, be a chlorine atom preferably , A hydrogen atom is more preferable.
X 5 to X 10 in the formula (Le-2) or the formula (Le-3) are independently, from the viewpoint of color development and visibility of the exposed part, hydrogen atom, halogen atom, alkyl group, aryl group, respectively. Amino group, alkylamino group, arylamino group, dialkylamino group, monoalkyl monoarylamino group, diarylamino group, hydroxy group, alkoxy group, aryloxy group, acyl group, alkoxycarbonyl group, aryloxycarbonyl group or cyano group. It is preferably a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, or an aryloxy group, and more preferably a hydrogen atom, a halogen atom, an alkyl group, or an aryl group. , A hydrogen atom is particularly preferable.
It is preferable that at least one of Y 1 and Y 2 in the formulas (Le-1) to (Le-3) is C from the viewpoint of color development and visibility of the exposed portion, and Y 1 and Y are Y. It is more preferable that both of 2 are C.
Ra 1 in the formulas (Le-1) to (Le-3) is preferably an alkyl group or an alkoxy group, and more preferably an alkoxy group, from the viewpoint of color development and visibility of the exposed portion. It is preferably a methoxy group, and particularly preferably a methoxy group.
Rb 1 to Rb 4 in the formulas (Le-1) to (Le-3) are each independently preferably a hydrogen atom or an alkyl group from the viewpoint of color development and visibility of the exposed part, and are alkyl. It is more preferably a group, and particularly preferably a methyl group.
 また、上記フタリド構造又はフルオラン構造を有するロイコ色素は、発色性、及び、露光部の視認性の観点から、上記フタリド構造又はフルオラン構造を有するロイコ色素は、下記式(Le-4)~式(Le-6)のいずれかで表される化合物であることがより好ましく、下記式(Le-5)で表される化合物であることが更に好ましい。 Further, the leuco dye having the phthalide structure or the fluorane structure has the following formulas (Le-4) to the following formulas (Le-4) from the viewpoint of color development and visibility of the exposed portion. It is more preferably a compound represented by any of Le-6), and further preferably a compound represented by the following formula (Le-5).
Figure JPOXMLDOC01-appb-C000073
Figure JPOXMLDOC01-appb-C000073
 式(Le-4)~式(Le-6)中、ERGはそれぞれ独立に、電子供与性基を表し、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Raは、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、水素原子、アルキル基又はアリール基を表す。 Wherein (Le-4) ~ formula (Le-6), in each ERG independently represents an electron donating group, each X 1 ~ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group , Y 1 and Y 2 independently represent C or N, and if Y 1 is N, then X 1 does not exist, and if Y 2 is N, then X 4 does not exist and Ra. 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 independently represent a hydrogen atom, an alkyl group or an aryl group.
 式(Le-4)~式(Le-6)におけるERG、X~X、Y、Y、Ra、及び、Rb~Rbはそれぞれ、式(Le-1)~式(Le-3)におけるERG、X~X、Y、Y、Ra、及び、Rb~Rbと同義であり、好ましい態様も同様である。 ERG in formula (Le-4) ~ formula (Le-6), X 1 ~ X 4, Y 1, Y 2, Ra 1 and, respectively Rb 1 ~ Rb 4 are formula (Le-1) ~ formula ( le-3) ERG in, X 1 ~ X 4, Y 1, Y 2, Ra 1 and have the same meanings as Rb 1 ~ Rb 4, preferable embodiments thereof are also the same.
 更に、上記フタリド構造又はフルオラン構造を有するロイコ色素は、発色性、及び、露光部の視認性の観点から、上記フタリド構造又はフルオラン構造を有するロイコ色素は、下記式(Le-7)~式(Le-9)のいずれかで表される化合物であることが更に好ましく、下記式(Le-8)で表される化合物であることが特に好ましい。 Further, the leuco dye having the phthalide structure or the fluorane structure has the following formulas (Le-7) to the following formulas (Le-7) to the leuco dye having the phthalide structure or the fluorane structure from the viewpoint of color development and visibility of the exposed portion. It is more preferably a compound represented by any of Le-9), and particularly preferably a compound represented by the following formula (Le-8).
Figure JPOXMLDOC01-appb-C000074
Figure JPOXMLDOC01-appb-C000074
 式(Le-7)~式(Le-9)中、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Ra~Raはそれぞれ独立に、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、水素原子、アルキル基又はアリール基を表し、Rc及びRcはそれぞれ独立に、アリール基を表す。 Wherein (Le-7) ~ formula (Le-9), each X 1 ~ X 4 is independently a hydrogen atom, a halogen atom or a dialkyl anilino group, Y 1 and Y 2 are each independently, C or Representing N, when Y 1 is N, X 1 does not exist, when Y 2 is N, X 4 does not exist, and Ra 1 to Ra 4 independently represent a hydrogen atom and an alkyl. Represents a group or an alkoxy group, Rb 1 to Rb 4 independently represent a hydrogen atom, an alkyl group or an aryl group, and Rc 1 and Rc 2 each independently represent an aryl group.
 式(Le-7)~式(Le-9)におけるX~X、Y及びYは、式(Le-1)~式(Le-3)におけるX~X、Y及びYと同義であり、好ましい態様も同様である。
 式(Le-7)~式(Le-9)におけるRa~Raはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、アルキル基又はアルコキシ基であることが好ましく、アルコキシ基であることがより好ましく、メトキシ基であることが特に好ましい。
 式(Le-7)~式(Le-9)におけるRb~Rbはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、水素原子、アルキル基、又は、アルキル基若しくはアルコキシ基が置換したアリール基であることが好ましく、水素原子、又は、アルキル基であることがより好ましく、水素原子、又は、メチル基であることが特に好ましい。
 式(Le-8)におけるRc及びRcはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、フェニル基、又は、アルキルフェニル基であることが好ましく、フェニル基であることがより好ましい。
 また、式(Le-8)において、発色性、及び、露光部の視認性の観点から、X~Xが水素原子であり、Y及びYがCであることが好ましい。
 更に、式(Le-8)において、発色性、及び、露光部の視認性の観点から、Rb及びRbがそれぞれ独立に、水素原子、アルキル基、又は、アルキル基若しくはアルコキシ基が置換したアリール基であることが好ましく、水素原子、又は、アルキル基であることがより好ましい。
X 1 - X 4 in formula (Le-7) to Formula (Le-9), Y 1 and Y 2 has the formula (Le-1) X 1 ~ X 4 in ~ formula (Le-3), Y 1 and It has the same meaning as Y 2 , and the preferred embodiment is also the same.
Ra 1 to Ra 4 in the formulas (Le-7) to (Le-9) are each independently preferably an alkyl group or an alkoxy group from the viewpoint of color development and visibility of the exposed portion, and are alkoxy groups. It is more preferably a group, and particularly preferably a methoxy group.
Rb 1 to Rb 4 in the formulas (Le-7) to (Le-9) are independently each of a hydrogen atom, an alkyl group, an alkyl group or an alkoxy from the viewpoint of color development and visibility of the exposed part. The group is preferably an aryl group substituted, more preferably a hydrogen atom or an alkyl group, and particularly preferably a hydrogen atom or a methyl group.
Each of Rc 1 and Rc 2 in the formula (Le-8) is preferably a phenyl group or an alkylphenyl group, and is preferably a phenyl group, independently from the viewpoint of color development and visibility of the exposed portion. Is more preferable.
Further, in the formula (Le-8), from the viewpoint of color development and visibility of the exposed portion, it is preferable that X 1 to X 4 are hydrogen atoms and Y 1 and Y 2 are C.
Further, in the formula (Le-8), from the viewpoint of color development and visibility of the exposed portion, Rb 1 and Rb 2 are independently substituted with hydrogen atoms, alkyl groups, alkyl groups or alkoxy groups, respectively. It is preferably an aryl group, more preferably a hydrogen atom or an alkyl group.
 式(Le-1)~式(Le-9)におけるアルキル基は、直鎖であっても、分岐を有していても、環構造を有していてもよい。
 また、式(Le-1)~式(Le-9)におけるアルキル基の炭素数は、1~20であることが好ましく、1~8であることがより好ましく、1~4であることが更に好ましく、1又は2であることが特に好ましい。
 式(Le-1)~式(Le-9)におけるアリール基の炭素数は、6~20であることが好ましく、6~10であることがより好ましく、6~8であることが特に好ましい。
The alkyl group in the formulas (Le-1) to (Le-9) may be linear, have a branch, or have a ring structure.
Further, the number of carbon atoms of the alkyl group in the formulas (Le-1) to (Le-9) is preferably 1 to 20, more preferably 1 to 8, and further preferably 1 to 4. It is preferably 1 or 2, and particularly preferably 1.
The number of carbon atoms of the aryl group in the formulas (Le-1) to (Le-9) is preferably 6 to 20, more preferably 6 to 10, and particularly preferably 6 to 8.
 また、式(Le-1)~式(Le-9)における一価の有機基、アルキル基、アリール基、ジアルキルアニリノ基、アルキルアミノ基、アルコキシ基等の各基は、置換基を有していてもよい。置換基としては、アルキル基、アリール基、ハロゲン原子、アミノ基、アルキルアミノ基、アリールアミノ基、ジアルキルアミノ基、モノアルキルモノアリールアミノ基、ジアリールアミノ基、ヒドロキシ基、アルコキシ基、アリーロキシ基、アシル基、アルコキシカルボニル基、アリーロキシカルボニル基、シアノ基等が挙げられる。また、これら置換基は、更にこれら置換基により置換されていてもよい。 Further, each group such as a monovalent organic group, an alkyl group, an aryl group, a dialkylanilino group, an alkylamino group and an alkoxy group in the formulas (Le-1) to (Le-9) has a substituent. May be. Substituents include alkyl groups, aryl groups, halogen atoms, amino groups, alkylamino groups, arylamino groups, dialkylamino groups, monoalkyl monoarylamino groups, diallylamino groups, hydroxy groups, alkoxy groups, aryloxy groups and acyls. Examples thereof include a group, an alkoxycarbonyl group, an aryloxycarbonyl group, and a cyano group. Further, these substituents may be further substituted with these substituents.
 好適に用いられる上記フタリド構造又はフルオラン構造を有するロイコ色素としては、以下の化合物が挙げられる。 Examples of the leuco dye having a phthalide structure or a fluorine structure that are preferably used include the following compounds.
Figure JPOXMLDOC01-appb-C000075
Figure JPOXMLDOC01-appb-C000075
Figure JPOXMLDOC01-appb-C000076
Figure JPOXMLDOC01-appb-C000076
Figure JPOXMLDOC01-appb-C000077
Figure JPOXMLDOC01-appb-C000077
Figure JPOXMLDOC01-appb-C000078
Figure JPOXMLDOC01-appb-C000078
Figure JPOXMLDOC01-appb-C000079
Figure JPOXMLDOC01-appb-C000079
 また、好適に用いられるロイコ色素としては、以下の化合物が挙げられる。 Further, examples of the leuco dye preferably used include the following compounds.
Figure JPOXMLDOC01-appb-C000080
Figure JPOXMLDOC01-appb-C000080
 酸発色剤としては上市されている製品を使用することも可能であり、ETAC、RED500、RED520、CVL、S-205、BLACK305、BLACK400、BLACK100、BLACK500、H-7001、GREEN300、NIRBLACK78、BLUE220、H-3035、BLUE203、ATP、H-1046、H-2114(以上、福井山田化学工業(株)製)、ORANGE-DCF、Vermilion-DCF、PINK-DCF、RED-DCF、BLMB、CVL、GREEN-DCF、TH-107(以上、保土ヶ谷化学(株)製)、ODB、ODB-2、ODB-4、ODB-250、ODB-BlackXV、Blue-63、Blue-502、GN-169、GN-2、Green-118、Red-40、Red-8(以上、山本化成(株)製)、クリスタルバイオレットラクトン(東京化成工業(株)製)等が挙げられる。これらの市販品の中でも、ETAC、S-205、BLACK305、BLACK400、BLACK100、BLACK500、H-7001、GREEN300、NIRBLACK78、H-3035、ATP、H-1046、H-2114、GREEN-DCF、Blue-63、GN-169、クリスタルバイオレットラクトンが、形成される膜の可視光吸収率が良好のため好ましい。 It is also possible to use commercially available products as the acid color former, ETAC, RED500, RED520, CVL, S-205, BLACK305, BLACK400, BLACK100, BLACK500, H-7001, GREEN300, NIRBLACK78, BLUE220, H. -3035, BLUE203, ATP, H-1046, H-2114 (all manufactured by Fukui Yamada Chemical Industry Co., Ltd.), ORANGE-DCF, Vermilion-DCF, PINK-DCF, RED-DCF, BLMB, CVL, GREEN-DCF , TH-107 (all manufactured by Hodogaya Chemical Co., Ltd.), ODB, ODB-2, ODB-4, ODB-250, ODB-BlackXV, Blue-63, Blue-502, GN-169, GN-2, Green -118, Red-40, Red-8 (all manufactured by Yamamoto Kasei Co., Ltd.), crystal violet lactone (manufactured by Tokyo Chemical Industry Co., Ltd.) and the like. Among these commercially available products, ETAC, S-205, BLACK305, BLACK400, BLACK100, BLACK500, H-7001, GREEN300, NIRBLACK78, H-3035, ATP, H-1046, H-2114, GREEN-DCF, Blue-63. , GN-169, and crystal violet lactone are preferable because the film to be formed has a good visible light absorption rate.
 これらの酸発色剤は、1種単独で用いてもよいし、2種類以上の成分を組み合わせて使用することもできる。
 酸発色剤の含有量は、画像記録層の全質量に対し、0.5質量%~10質量%であることが好ましく、1質量%~5質量%であることがより好ましい。
These acid color formers may be used alone or in combination of two or more.
The content of the acid color former is preferably 0.5% by mass to 10% by mass, and more preferably 1% by mass to 5% by mass, based on the total mass of the image recording layer.
-連鎖移動剤-
 本開示において用いられる画像記録層は、連鎖移動剤を含有してもよい。連鎖移動剤は、平版印刷版における耐刷性の向上に寄与する。
 連鎖移動剤としては、チオール化合物が好ましく、沸点(揮発し難さ)の観点で炭素数7以上のチオールがより好ましく、芳香環上にメルカプト基を有する化合物(芳香族チオール化合物)が更に好ましい。上記チオール化合物は単官能チオール化合物であることが好ましい。
-Chain transfer agent-
The image recording layer used in the present disclosure may contain a chain transfer agent. The chain transfer agent contributes to the improvement of printing durability in the lithographic printing plate.
As the chain transfer agent, a thiol compound is preferable, a thiol having 7 or more carbon atoms is more preferable from the viewpoint of boiling point (difficulty in volatilization), and a compound having a mercapto group on the aromatic ring (aromatic thiol compound) is further preferable. The thiol compound is preferably a monofunctional thiol compound.
 連鎖移動剤として具体的には、下記の化合物が挙げられる。 Specific examples of the chain transfer agent include the following compounds.
Figure JPOXMLDOC01-appb-C000081
Figure JPOXMLDOC01-appb-C000081
Figure JPOXMLDOC01-appb-C000082
Figure JPOXMLDOC01-appb-C000082
Figure JPOXMLDOC01-appb-C000083
Figure JPOXMLDOC01-appb-C000083
Figure JPOXMLDOC01-appb-C000084
Figure JPOXMLDOC01-appb-C000084
 連鎖移動剤は、1種のみを含有しても、2種以上を併用してもよい。
 連鎖移動剤の含有量は、画像記録層の全質量に対し、0.01質量%~50質量%が好ましく、0.05質量%~40質量%がより好ましく、0.1質量%~30質量%が更に好ましい。
The chain transfer agent may contain only one type or a combination of two or more types.
The content of the chain transfer agent is preferably 0.01% by mass to 50% by mass, more preferably 0.05% by mass to 40% by mass, and 0.1% by mass to 30% by mass with respect to the total mass of the image recording layer. % Is more preferable.
-感脂化剤-
 画像記録層は、着肉性を向上させるために、ホスホニウム化合物、含窒素低分子化合物、アンモニウム基含有ポリマー等の感脂化剤を含有してもよい。特に、保護層に無機層状化合物を含有させる場合、これらの化合物は、無機層状化合物の表面被覆剤として機能し、無機層状化合物による印刷途中の着肉性低下を抑制することができる。
 感脂化剤としては、ホスホニウム化合物と、含窒素低分子化合物と、アンモニウム基含有ポリマーとを併用することが好ましく、ホスホニウム化合物と、第四級アンモニウム塩類と、アンモニウム基含有ポリマーとを併用することがより好ましい。
-Fat sensitive agent-
The image recording layer may contain a fat-sensing agent such as a phosphonium compound, a nitrogen-containing small molecule compound, and an ammonium group-containing polymer in order to improve the meat-forming property. In particular, when the protective layer contains an inorganic layered compound, these compounds function as a surface coating agent for the inorganic layered compound, and it is possible to suppress a decrease in inking property during printing due to the inorganic layered compound.
As the fat sensitive agent, it is preferable to use a phosphonium compound, a nitrogen-containing low molecular weight compound, and an ammonium group-containing polymer in combination, and the phosphonium compound, a quaternary ammonium salt, and an ammonium group-containing polymer are used in combination. Is more preferable.
 ホスホニウム化合物としては、特開2006-297907号公報及び特開2007-50660号公報に記載のホスホニウム化合物が挙げられる。具体例としては、テトラブチルホスホニウムヨージド、ブチルトリフェニルホスホニウムブロミド、テトラフェニルホスホニウムブロミド、1,4-ビス(トリフェニルホスホニオ)ブタン=ジ(ヘキサフルオロホスファート)、1,7-ビス(トリフェニルホスホニオ)ヘプタン=スルファート、1,9-ビス(トリフェニルホスホニオ)ノナン=ナフタレン-2,7-ジスルホナート等が挙げられる。 Examples of the phosphonium compound include the phosphonium compounds described in JP-A-2006-297907 and JP-A-2007-50660. Specific examples include tetrabutylphosphonium iodide, butyltriphenylphosphonium bromide, tetraphenylphosphonium bromide, 1,4-bis (triphenylphosphonio) butane-di (hexafluorophosphine), and 1,7-bis (tri). Examples thereof include phenylphosphonio) heptane = sulfate, 1,9-bis (triphenylphosphonio) nonane = naphthalene-2,7-disulfonate and the like.
 含窒素低分子化合物としては、アミン塩類、第四級アンモニウム塩類が挙げられる。また、イミダゾリニウム塩類、ベンゾイミダゾリニウム塩類、ピリジニウム塩類、キノリニウム塩類も挙げられる。中でも、第四級アンモニウム塩類及びピリジニウム塩類が好ましい。具体例としては、テトラメチルアンモニウム=ヘキサフルオロホスファート、テトラブチルアンモニウム=ヘキサフルオロホスファート、ドデシルトリメチルアンモニウム=p-トルエンスルホナート、ベンジルトリエチルアンモニウム=ヘキサフルオロホスファート、ベンジルジメチルオクチルアンモニウム=ヘキサフルオロホスファート、ベンジルジメチルドデシルアンモニウム=ヘキサフルオロホスファート、特開2008-284858号公報の段落0021~0037、特開2009-90645号公報の段落0030~0057に記載の化合物等が挙げられる。 Examples of nitrogen-containing small molecule compounds include amine salts and quaternary ammonium salts. Further, imidazolinium salts, benzoimidazolinium salts, pyridinium salts, quinolinium salts and the like can also be mentioned. Of these, quaternary ammonium salts and pyridinium salts are preferable. Specific examples include tetramethylammonium = hexafluorophosphate, tetrabutylammonium = hexafluorophosphate, dodecyltrimethylammonium = p-toluenesulfonate, benzyltriethylammonium = hexafluorophosphate, and benzyldimethyloctylammonium = hexafluorophosphate. Examples thereof include fert, benzyldimethyldodecylammonium-hexafluorophosphate, compounds described in paragraphs 0021 to 0037 of JP-A-2008-284858 and paragraphs 0030 to 0057 of JP-A-2009-90645.
 アンモニウム基含有ポリマーとしては、その構造中にアンモニウム基を有すればよく、側鎖にアンモニウム基を有する(メタ)アクリレートを共重合成分として5モル%~80モル%含有するポリマーが好ましい。具体例としては、特開2009-208458号公報の段落0089~0105に記載のポリマーが挙げられる。 The ammonium group-containing polymer may have an ammonium group in its structure, and a polymer containing 5 mol% to 80 mol% of a (meth) acrylate having an ammonium group in the side chain as a copolymerization component is preferable. Specific examples include the polymers described in paragraphs 0008-0105 of JP2009-208458A.
 アンモニウム塩含有ポリマーは、特開2009-208458号公報に記載の測定方法に従って求められる還元比粘度(単位:ml/g)の値が、5~120の範囲のものが好ましく、10~110の範囲のものがより好ましく、15~100の範囲のものが特に好ましい。上記還元比粘度を重量平均分子量(Mw)に換算した場合、10,000~150,0000が好ましく、17,000~140,000がより好ましく、20,000~130,000が特に好ましい。 The ammonium salt-containing polymer preferably has a reduction specific viscosity (unit: ml / g) value in the range of 5 to 120, which is obtained according to the measurement method described in JP-A-2009-208458, and is in the range of 10 to 110. Is more preferable, and those in the range of 15 to 100 are particularly preferable. When the reduced specific viscosity is converted into a weight average molecular weight (Mw), it is preferably 10,000 to 150,000, more preferably 17,000 to 140,000, and particularly preferably 20,000 to 130,000.
 以下に、アンモニウム基含有ポリマーの具体例を示す。
(1)2-(トリメチルアンモニオ)エチルメタクリレート=p-トルエンスルホナート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比10/90、Mw4.5万)
(2)2-(トリメチルアンモニオ)エチルメタクリレート=ヘキサフルオロホスファート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比20/80、Mw6.0万)
(3)2-(エチルジメチルアンモニオ)エチルメタクリレート=p-トルエンスルホナート/ヘキシルメタクリレート共重合体(モル比30/70、Mw4.5万)
(4)2-(トリメチルアンモニオ)エチルメタクリレート=ヘキサフルオロホスファート/2-エチルヘキシルメタクリレート共重合体(モル比20/80、Mw6.0万)
(5)2-(トリメチルアンモニオ)エチルメタクリレート=メチルスルファート/ヘキシルメタクリレート共重合体(モル比40/60、Mw7.0万)
(6)2-(ブチルジメチルアンモニオ)エチルメタクリレート=ヘキサフルオロホスファート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比25/75、Mw6.5万)
(7)2-(ブチルジメチルアンモニオ)エチルアクリレート=ヘキサフルオロホスファート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比20/80、Mw6.5万)
(8)2-(ブチルジメチルアンモニオ)エチルメタクリレート=13-エチル-5,8,11-トリオキサ-1-ヘプタデカンスルホナート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比20/80、Mw7.5万)
(9)2-(ブチルジメチルアンモニオ)エチルメタクリレート=ヘキサフルオロホスファート/3,6-ジオキサヘプチルメタクリレート/2-ヒドロキシ-3-メタクリロイルオキシプロピルメタクリレート共重合体(モル比15/80/5、Mw6.5万)
Specific examples of the ammonium group-containing polymer are shown below.
(1) 2- (trimethylammonio) ethyl methacrylate = p-toluenesulfonate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 10/90, Mw 45,000)
(2) 2- (trimethylammonio) ethyl methacrylate = hexafluorophosphate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 20/80, Mw 60,000)
(3) 2- (Ethyldimethylammonio) ethyl methacrylate = p-toluenesulfonate / hexyl methacrylate copolymer (molar ratio 30/70, Mw 45,000)
(4) 2- (trimethylammonio) ethyl methacrylate = hexafluorophosphate / 2-ethylhexyl methacrylate copolymer (molar ratio 20/80, Mw 60,000)
(5) 2- (trimethylammonio) ethyl methacrylate = methyl sulfate / hexyl methacrylate copolymer (molar ratio 40/60, Mw 7,000,000)
(6) 2- (Butyldimethylammonio) ethyl methacrylate = hexafluorophosphate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 25/75, Mw 65,000)
(7) 2- (Butyldimethylammonio) ethyl acrylate = hexafluorophosphate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 20/80, Mw 65,000)
(8) 2- (Butyldimethylammonio) ethyl methacrylate = 13-ethyl-5,8,11-trioxa-1-heptadecanesulfonate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 20/80) , Mw 75,000)
(9) 2- (Butyldimethylammonio) ethyl methacrylate = hexafluorophosphate / 3,6-dioxaheptyl methacrylate / 2-hydroxy-3-methacryloyloxypropyl methacrylate copolymer (molar ratio 15/80/5, Mw 65,000)
 感脂化剤の含有量は、画像記録層の全質量に対して、0.01質量%~30.0質量%が好ましく、0.1質量%~15.0質量%がより好ましく、1質量%~10質量%が更に好ましい。 The content of the oil-sensitive agent is preferably 0.01% by mass to 30.0% by mass, more preferably 0.1% by mass to 15.0% by mass, and 1% by mass with respect to the total mass of the image recording layer. % To 10% by mass is more preferable.
-その他の成分-
 画像記録層には、その他の成分として、界面活性剤、重合禁止剤、高級脂肪酸誘導体、可塑剤、無機層状化合物等を含有することができる。具体的には、特開2008-284817号公報の段落0114~0159の記載を参照することができる。
-Other ingredients-
The image recording layer may contain a surfactant, a polymerization inhibitor, a higher fatty acid derivative, a plasticizer, an inorganic layered compound and the like as other components. Specifically, the description in paragraphs 0114 to 0159 of Japanese Patent Application Laid-Open No. 2008-284817 can be referred to.
-画像記録層の形成-
 本開示に係る平版印刷版原版における画像記録層は、例えば、特開2008-195018号公報の段落0142~0143に記載のように、必要な上記各成分を公知の溶剤に分散又は溶解して塗布液を調製し、塗布液を支持体上にバーコーター塗布など公知の方法で塗布し、乾燥することにより形成することができる。
 溶剤としては、公知の溶剤を用いることができる。具体的には、例えば、水、アセトン、メチルエチルケトン(2-ブタノン)、シクロヘキサン、酢酸エチル、エチレンジクロライド、テトラヒドロフラン、トルエン、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、アセチルアセトン、シクロヘキサノン、ジアセトンアルコール、エチレングリコールモノメーチルエーテルアセテート、エチレングリコールエチルエーテルアセテート、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテルアセテート、1-メトキシ-2-プロパノール、3-メトキシ-1-プロパノール、メトキシメトキシエタノール、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、3-メトキシプロピルアセテート、N,N-ジメチルホルムアミド、ジメチルスルホキシド、γ-ブチロラクトン、乳酸メチル、乳酸エチル等が挙げられる。溶剤は、1種単独で使用してもよいし、2種以上を併用してもよい。塗布液中の固形分濃度は1~50質量%程度であることが好ましい。
 塗布、乾燥後における画像記録層の塗布量(固形分)は、用途によって異なるが、良好な感度と画像記録層の良好な皮膜特性を得る観点から、0.3g/m~3.0g/mが好ましい。
-Formation of image recording layer-
As described in paragraphs 0142 to 0143 of Japanese Patent Application Laid-Open No. 2008-195018, for example, the image recording layer in the lithographic printing plate original plate according to the present disclosure is coated by dispersing or dissolving each of the above-mentioned necessary components in a known solvent. It can be formed by preparing a liquid, applying the coating liquid on the support by a known method such as coating with a bar coater, and drying.
As the solvent, a known solvent can be used. Specifically, for example, water, acetone, methyl ethyl ketone (2-butanone), cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, Propylene glycol monoethyl ether, acetylacetone, cyclohexanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether acetate, 1-methoxy-2-propanol, 3- Methoxy-1-propanol, methoxymethoxyethanol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-methoxypropyl acetate, N, N-dimethyl Examples thereof include formamide, dimethylsulfoxide, γ-butyrolactone, methyl lactate, ethyl lactate and the like. The solvent may be used alone or in combination of two or more. The solid content concentration in the coating liquid is preferably about 1 to 50% by mass.
The coating amount (solid content) of the image recording layer after coating and drying varies depending on the application, but from the viewpoint of obtaining good sensitivity and good film characteristics of the image recording layer, 0.3 g / m 2 to 3.0 g / m 2 is preferred.
<支持体>
 本開示に係る平版印刷版原版における支持体は、公知の平版印刷版原版用親水性支持体から適宜選択して用いることができる。
 支持体としては、アルミニウム支持体が好ましい。
 アルミニウム支持体としては、親水性表面を有するアルミニウム支持体(以下、「親水性アルミニウム支持体」ともいう。)が好ましい。
 また、支持体としては、親水性支持体が好ましく挙げられる。
 本開示に係る平版印刷版原版におけるアルミニウム支持体は、アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角が、傷汚れ抑制性の観点から、110°以下であることが好ましく、90°以下であることがより好ましく、80°以下であることが更に好ましく、50°以下であることがより更に好ましく、30°以下であることが特に好ましく、20°以下であることがより特に好ましく、10°以下であることが最も好ましい。
<Support>
The support in the lithographic printing plate original plate according to the present disclosure can be appropriately selected from known hydrophilic supports for lithographic printing plate original plates and used.
As the support, an aluminum support is preferable.
As the aluminum support, an aluminum support having a hydrophilic surface (hereinafter, also referred to as “hydrophilic aluminum support”) is preferable.
Further, as the support, a hydrophilic support is preferably mentioned.
The aluminum support in the lithographic printing plate original according to the present disclosure has a contact angle with water on the surface of the aluminum support on the image recording layer side by the aerial water droplet method of 110 ° or less from the viewpoint of suppressing scratches and stains. It is more preferably 90 ° or less, further preferably 80 ° or less, further preferably 50 ° or less, particularly preferably 30 ° or less, and particularly preferably 20 ° or less. Is more particularly preferable, and 10 ° or less is most preferable.
 本開示において、アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角は、以下の方法により測定するものとする。
 平版印刷版原版を画像記録層を除去可能な溶媒(例えば、画像記録層用塗布液で用いた溶媒)に浸漬させ、スポンジ及びコットンの少なくとも一方で画像記録層を掻き取り、画像記録層を溶媒中に溶解させることでアルミニウム支持体の表面を露出させる。
 露出させたアルミニウム支持体の画像記録層側の表面における水との接触角は、測定装置として全自動接触角計(例えば、協和界面化学(株)製DM-501)によって、25℃における表面上の水滴の接触角(0.2秒後)として測定される。
In the present disclosure, the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side shall be measured by the following method.
The plate printing plate original plate is immersed in a solvent capable of removing the image recording layer (for example, the solvent used in the coating liquid for the image recording layer), the image recording layer is scraped off at least one of the sponge and cotton, and the image recording layer is used as a solvent. The surface of the aluminum support is exposed by dissolving in it.
The contact angle with water on the surface of the exposed aluminum support on the image recording layer side is measured on the surface at 25 ° C. by a fully automatic contact angle meter (for example, DM-501 manufactured by Kyowa Surface Chemical Co., Ltd.) as a measuring device. It is measured as the contact angle of water droplets (after 0.2 seconds).
 本開示におけるアルミニウム支持体としては、公知の方法で粗面化処理され、陽極酸化処理されたアルミニウム板が好ましい。即ち、本開示におけるアルミニウム支持体は、アルミニウム板とアルミニウム板上に配置されたアルミニウムの陽極酸化被膜とを有することが好ましい。 As the aluminum support in the present disclosure, an aluminum plate that has been roughened and anodized by a known method is preferable. That is, the aluminum support in the present disclosure preferably has an aluminum plate and an aluminum anodic oxide film arranged on the aluminum plate.
 本開示において用いられるアルミニウム支持体の好ましい態様の一例(本一例に係るアルミニウム支持体を、「支持体(1)」ともいう。)を以下に示す。
 即ち、支持体(1)は、アルミニウム板と、上記アルミニウム板上に配置されたアルミニウムの陽極酸化皮膜とを有し、上記陽極酸化皮膜が、上記アルミニウム板よりも上記画像記録層側に位置し、上記陽極酸化皮膜が、上記画像記録層側の表面から深さ方向にのびるマイクロポアを有し、上記マイクロポアの上記陽極酸化皮膜表面における平均径が10nmを超え100nm以下であり、上記陽極酸化皮膜の上記画像記録層側の表面のL表色系における明度Lの値が、70~100である。
An example of a preferred embodiment of the aluminum support used in the present disclosure (the aluminum support according to this example is also referred to as “support (1)”) is shown below.
That is, the support (1) has an aluminum plate and an anodic oxide film of aluminum arranged on the aluminum plate, and the anodic oxide film is located closer to the image recording layer than the aluminum plate. The anodic oxide film has micropores extending in the depth direction from the surface on the image recording layer side, and the average diameter of the micropores on the surface of the anodic oxide film is more than 10 nm and 100 nm or less, and the anodic oxidation. The value of the brightness L * in the L * a * b * color system of the surface of the film on the image recording layer side is 70 to 100.
 図3は、アルミニウム支持体12aの一実施形態の模式的断面図である。
 アルミニウム支持体12aは、アルミニウム板18とアルミニウムの陽極酸化皮膜20a(以後、単に「陽極酸化皮膜20a」とも称する)とをこの順で積層した積層構造を有する。なお、アルミニウム支持体12a中の陽極酸化皮膜20aが、アルミニウム板18よりも画像記録層側に位置する。つまり、本開示に係る平版印刷版原版は、アルミニウム板上に、陽極酸化皮膜、画像記録層、及び水溶性樹脂層をこの順で少なくとも有することが好ましい。
FIG. 3 is a schematic cross-sectional view of an embodiment of the aluminum support 12a.
The aluminum support 12a has a laminated structure in which an aluminum plate 18 and an aluminum anodic oxide film 20a (hereinafter, also simply referred to as “anodized film 20a”) are laminated in this order. The anodic oxide film 20a in the aluminum support 12a is located closer to the image recording layer than the aluminum plate 18. That is, it is preferable that the planographic printing plate original plate according to the present disclosure has at least an anodic oxide film, an image recording layer, and a water-soluble resin layer on an aluminum plate in this order.
-陽極酸化皮膜-
 以下、陽極酸化被膜20aの好ましい態様について説明する。
 陽極酸化皮膜20aは、陽極酸化処理によってアルミニウム板18の表面に作製される皮膜であって、この皮膜は、皮膜表面に略垂直であり、かつ、個々が均一に分布した極微細なマイクロポア22aを有する。マイクロポア22aは、画像記録層側の陽極酸化皮膜20a表面(アルミニウム板18側とは反対側の陽極酸化皮膜20a表面)から厚み方向(アルミニウム板18側)に沿ってのびる。
-Anodized film-
Hereinafter, preferred embodiments of the anodic oxide coating 20a will be described.
The anodic oxide film 20a is a film formed on the surface of the aluminum plate 18 by anodization treatment, and this film is extremely fine micropores 22a which are substantially perpendicular to the surface of the film and are uniformly distributed to each individual. Has. The micropore 22a extends from the surface of the anodic oxide film 20a on the image recording layer side (the surface of the anodic oxide film 20a on the side opposite to the aluminum plate 18 side) along the thickness direction (aluminum plate 18 side).
 陽極酸化皮膜20a中のマイクロポア22aの陽極酸化皮膜表面における平均径(平均開口径)は、10nm超え100nm以下であることが好ましい。中でも、耐刷性、耐汚れ性、及び画像視認性のバランスの点から、15nm~60nmがより好ましく、20nm~50nmが更に好ましく、25nm~40nmが特に好ましい。ポア内部の径は、表層よりも広がっても狭まってもよい。
 平均径が10nmを超えれば、耐刷性及び画像視認性が更に優れる。また、平均径が100nm以下であれば場合、耐刷性が更に優れる。
 マイクロポア22aの平均径は、陽極酸化皮膜20a表面を倍率15万倍の電界放出型走査電子顕微鏡(FE-SEM)でN=4枚観察し、得られた4枚の画像において、400nm×600nmの範囲に存在するマイクロポアの径(直径)を50箇所測定し、算術平均値として算出される。
 なお、マイクロポア22aの形状が円状でない場合は、円相当径を用いる。「円相当径」とは、開口部の形状を、開口部の投影面積と同じ投影面積をもつ円と想定したときの円の直径である。
The average diameter (average opening diameter) of the micropores 22a in the anodic oxide film 20a on the surface of the anodic oxide film is preferably more than 10 nm and 100 nm or less. Among them, from the viewpoint of the balance between printing resistance, stain resistance, and image visibility, 15 nm to 60 nm is more preferable, 20 nm to 50 nm is further preferable, and 25 nm to 40 nm is particularly preferable. The diameter inside the pores may be wider or narrower than the surface layer.
If the average diameter exceeds 10 nm, the printing resistance and image visibility are further excellent. Further, when the average diameter is 100 nm or less, the printing durability is further excellent.
The average diameter of the micropores 22a is 400 nm × 600 nm in the four images obtained by observing the surface of the anodized film 20a with a field emission scanning electron microscope (FE-SEM) at a magnification of 150,000. The diameter (diameter) of the microscopes existing in the range of is measured at 50 points and calculated as an arithmetic mean value.
If the shape of the micropore 22a is not circular, the diameter equivalent to the circle is used. The "circle equivalent diameter" is the diameter of a circle when the shape of the opening is assumed to be a circle having the same projected area as the projected area of the opening.
 マイクロポア22aの深さは特に制限されないが、10nm~3,000nmが好ましく、50nm~2,000nmがより好ましく、300nm~1,600nmが更に好ましい。
 なお、上記深さは、陽極酸化皮膜20aの断面の写真(15万倍)をとり、25個以上のマイクロポア22aの深さを測定し、平均した値である。
The depth of the micropore 22a is not particularly limited, but is preferably 10 nm to 3,000 nm, more preferably 50 nm to 2,000 nm, and even more preferably 300 nm to 1,600 nm.
The depth is an average value obtained by taking a photograph (150,000 times) of the cross section of the anodic oxide film 20a and measuring the depths of 25 or more micropores 22a.
 マイクロポア22aの形状は特に制限されず、図1では、略直管状(略円柱状)であるが、深さ方向(厚み方向)に向かって径が小さくなる円錐状であってもよい。また、マイクロポア22aの底部の形状は特に制限されず、曲面状(凸状)であっても、平面状であってもよい。 The shape of the micropore 22a is not particularly limited, and in FIG. 1, it is a substantially straight tubular (substantially cylindrical) shape, but it may be a conical shape whose diameter decreases in the depth direction (thickness direction). The shape of the bottom of the micropore 22a is not particularly limited, and may be curved (convex) or flat.
 アルミニウム支持体12aの画像記録層側の表面(陽極酸化皮膜20aの画像記録層側の表面)のL表色系における明度Lの値は、70~100であることが好ましい。中でも、耐刷性及び画像視認性のバランスがより優れる点で、75~100が好ましく、75~90がより好ましい。
 上記明度Lの測定は、エックスライト(株)製、色彩色差計Spectro Eyeを用いて測定する。
The value of L * a * b * lightness L * in the color system of the surface of the aluminum support 12a on the image recording layer side (the surface of the anodic oxide film 20a on the image recording layer side) is preferably 70 to 100. .. Among them, 75 to 100 is preferable, and 75 to 90 is more preferable, in that the balance between printing resistance and image visibility is more excellent.
The brightness L * is measured using a color difference meter Specro Eye manufactured by X-Rite Co., Ltd.
 支持体(1)において、上記マイクロポアが、上記陽極酸化皮膜表面から深さ10nm~1,000nmの位置までのびる大径孔部と、上記大径孔部の底部と連通し、連通位置から深さ20nm~2,000nmの位置までのびる小径孔部とから構成され、上記大径孔部の上記陽極酸化皮膜表面における平均径が15nm~150nmであり、上記小径孔部の上記連通位置における平均径が13nm以下である態様(以下、上記態様に係る支持体を、「支持体(2)」ともいう。)も好ましく挙げられる。
 図4は、アルミニウム支持体12aの、図3に示したものとは別の一実施形態の模式的断面図である。
 図4において、アルミニウム支持体12bは、アルミニウム板18と、大径孔部24と小径孔部26とから構成されるマイクロポア22bを有する陽極酸化皮膜20bとを含む。
 陽極酸化皮膜20b中のマイクロポア22bは、陽極酸化皮膜表面から深さ10nm~1000nm(深さD:図4参照)の位置までのびる大径孔部24と、大径孔部24の底部と連通し、連通位置から更に深さ20nm~2,000nmの位置までのびる小径孔部26とから構成される。
 以下に、大径孔部24と小径孔部26について詳述する。
In the support (1), the micropore communicates with the large-diameter hole extending from the surface of the anodic oxide film to a depth of 10 nm to 1,000 nm and the bottom of the large-diameter hole, and is deep from the communication position. It is composed of a small-diameter hole extending from 20 nm to 2,000 nm, and the average diameter of the large-diameter hole on the surface of the anodic oxide film is 15 nm to 150 nm, and the average diameter of the small-diameter hole at the communication position. A mode in which the diameter is 13 nm or less (hereinafter, the support according to the above mode is also referred to as “support (2)”) is also preferably mentioned.
FIG. 4 is a schematic cross-sectional view of the aluminum support 12a according to an embodiment different from that shown in FIG.
In FIG. 4, the aluminum support 12b includes an aluminum plate 18 and an anodic oxide film 20b having a micropore 22b composed of a large-diameter hole portion 24 and a small-diameter hole portion 26.
The micropores 22b in the anodic oxide film 20b communicate with the large-diameter hole portion 24 extending from the surface of the anodic oxide film to a position at a depth of 10 nm to 1000 nm (depth D: see FIG. 4) and the bottom of the large-diameter hole portion 24. It is composed of a small-diameter hole portion 26 extending from the communication position to a depth of 20 nm to 2,000 nm.
The large-diameter hole portion 24 and the small-diameter hole portion 26 will be described in detail below.
 大径孔部24の陽極酸化皮膜20b表面における平均径は、上述した陽極酸化皮膜20a中のマイクロポア22aの陽極酸化皮膜表面における平均径と同じで、10nm超100nm以下であり、好適範囲も同じである。
 大径孔部24の陽極酸化皮膜20b表面における平均径の測定方法は、陽極酸化皮膜20a中のマイクロポア22aの陽極酸化皮膜表面における平均径の測定方法と同じである。
The average diameter of the large-diameter pore portion 24 on the surface of the anodic oxide film 20b is the same as the average diameter of the micropores 22a in the above-mentioned anodic oxide film 20a on the surface of the anodic oxide film, which is more than 10 nm and 100 nm or less, and the preferable range is also the same. Is.
The method for measuring the average diameter on the surface of the anodic oxide film 20b of the large-diameter hole portion 24 is the same as the method for measuring the average diameter on the surface of the anodic oxide film of the micropores 22a in the anodic oxide film 20a.
 大径孔部24の底部は、陽極酸化皮膜表面から深さ10nm~1,000nm(以後、深さDとも称する)に位置する。つまり、大径孔部24は、陽極酸化皮膜表面から深さ方向(厚み方向)に10nm~1,000nmの位置までのびる孔部である。上記深さは、10nm~200nmが好ましい。
 なお、上記深さは、陽極酸化皮膜20bの断面の写真(15万倍)をとり、25個以上の大径孔部24の深さを測定し、平均した値である。
The bottom of the large-diameter hole portion 24 is located at a depth of 10 nm to 1,000 nm (hereinafter, also referred to as a depth D) from the surface of the anodic oxide film. That is, the large-diameter hole portion 24 is a hole portion extending from the surface of the anodic oxide film to a position of 10 nm to 1,000 nm in the depth direction (thickness direction). The depth is preferably 10 nm to 200 nm.
The depth is an average value obtained by taking a photograph (150,000 times) of the cross section of the anodic oxide film 20b, measuring the depths of 25 or more large-diameter hole portions 24, and averaging them.
 大径孔部24の形状は特に制限されず、例えば、略直管状(略円柱状)、及び、深さ方向(厚み方向)に向かって径が小さくなる円錐状が挙げられ、略直管状が好ましい。 The shape of the large-diameter hole portion 24 is not particularly limited, and examples thereof include a substantially straight tubular shape (substantially cylindrical) and a conical shape whose diameter decreases in the depth direction (thickness direction). preferable.
 小径孔部26は、図4に示すように、大径孔部24の底部と連通して、連通位置より更に深さ方向(厚み方向)に延びる孔部である。
 小径孔部26の連通位置における平均径は、13nm以下が好ましい。中でも、11nm以下が好ましく、10nm以下がより好ましい。下限は特に制限されないが、5nm以上の場合が多い。
As shown in FIG. 4, the small-diameter hole portion 26 is a hole portion that communicates with the bottom portion of the large-diameter hole portion 24 and extends further in the depth direction (thickness direction) from the communication position.
The average diameter of the small-diameter hole portion 26 at the communication position is preferably 13 nm or less. Above all, 11 nm or less is preferable, and 10 nm or less is more preferable. The lower limit is not particularly limited, but it is often 5 nm or more.
 小径孔部26の平均径は、陽極酸化皮膜20a表面を倍率15万倍のFE-SEMでN=4枚観察し、得られた4枚の画像において、400nm×600nmの範囲に存在するマイクロポア(小径孔部)の径(直径)を測定し、算術平均値として得られる。なお、大径孔部の深さが深い場合は、必要に応じて、陽極酸化皮膜20b上部(大径孔部のある領域)を切削し(例えば、アルゴンガスによって切削)、その後陽極酸化皮膜20b表面を上記FE-SEMで観察して、小径孔部の平均径を求めてもよい。
 なお、小径孔部26の形状が円状でない場合は、円相当径を用いる。「円相当径」とは、開口部の形状を、開口部の投影面積と同じ投影面積をもつ円と想定したときの円の直径である。
The average diameter of the small-diameter pores 26 is as follows: The surface of the anodized film 20a is observed with N = 4 sheets by FE-SEM at a magnification of 150,000 times, and in the obtained 4 images, micropores existing in the range of 400 nm × 600 nm. The diameter (diameter) of the (small diameter hole) is measured and obtained as an arithmetic mean value. If the large-diameter hole is deep, the upper part of the anodic oxide film 20b (the region with the large-diameter hole) is cut (for example, cut with argon gas), and then the anodic oxide film 20b is cut. The surface may be observed with the above-mentioned FE-SEM to obtain the average diameter of the small-diameter holes.
If the shape of the small-diameter hole portion 26 is not circular, the diameter equivalent to a circle is used. The "circle equivalent diameter" is the diameter of a circle when the shape of the opening is assumed to be a circle having the same projected area as the projected area of the opening.
 小径孔部26の底部は、上記の大径孔部24との連通位置から更に深さ方向に20nm~2,000nmのびた場所に位置する。言い換えると、小径孔部26は、上記大径孔部24との連通位置から更に深さ方向(厚み方向)にのびる孔部であり、小径孔部26の深さは20nm~2,000nmである。なお、上記深さは、500nm~2,000nmが好ましい。
 なお、上記深さは、陽極酸化皮膜20bの断面の写真(5万倍)をとり、25個以上の小径孔部の深さを測定し、平均した値である。
The bottom portion of the small-diameter hole portion 26 is located at a position extending 20 nm to 2,000 nm in the depth direction from the communication position with the large-diameter hole portion 24. In other words, the small-diameter hole portion 26 is a hole portion that extends further in the depth direction (thickness direction) from the communication position with the large-diameter hole portion 24, and the depth of the small-diameter hole portion 26 is 20 nm to 2,000 nm. .. The depth is preferably 500 nm to 2,000 nm.
The depth is an average value obtained by taking a photograph (50,000 times) of the cross section of the anodic oxide film 20b and measuring the depths of 25 or more small-diameter holes.
 小径孔部26の形状は特に制限されず、例えば、略直管状(略円柱状)、及び、深さ方向に向かって径が小さくなる円錐状が挙げられ、略直管状が好ましい。 The shape of the small-diameter hole portion 26 is not particularly limited, and examples thereof include a substantially straight tubular shape (substantially cylindrical) and a conical shape whose diameter decreases in the depth direction, and a substantially straight tubular shape is preferable.
-アルミニウム支持体の製造方法-
 本開示に用いられるアルミニウム支持体の製造方法としては、例えば、以下の工程を順番に実施する製造方法が好ましい。
・粗面化処理工程:アルミニウム板に粗面化処理を施す工程
・陽極酸化処理工程:粗面化処理されたアルミニウム板を陽極酸化する工程
・ポアワイド処理工程:陽極酸化処理工程で得られた陽極酸化皮膜を有するアルミニウム板を、酸水溶液又はアルカリ水溶液に接触させ、陽極酸化皮膜中のマイクロポアの径を拡大させる工程
 以下、各工程の手順について詳述する。
-Manufacturing method of aluminum support-
As a method for manufacturing the aluminum support used in the present disclosure, for example, a manufacturing method in which the following steps are sequentially performed is preferable.
-Roughening treatment step: Roughening treatment of aluminum plate-Anodizing treatment step: Anodizing the roughened aluminum plate-Pore wide treatment step: Anodizing obtained in the anodizing treatment step Step of bringing an aluminum plate having an oxide film into contact with an acid aqueous solution or an alkaline aqueous solution to increase the diameter of micropores in the anodized film The procedure of each step will be described in detail below.
〔粗面化処理工程〕
 粗面化処理工程は、アルミニウム板の表面に、電気化学的粗面化処理を含む粗面化処理を施す工程である。本工程は、後述する陽極酸化処理工程の前に実施されることが好ましいが、アルミニウム板の表面がすでに好ましい表面形状を有していれば、特に実施しなくてもよい。
[Roughening process]
The roughening treatment step is a step of applying a roughening treatment including an electrochemical roughening treatment to the surface of the aluminum plate. This step is preferably carried out before the anodizing treatment step described later, but it may not be carried out in particular as long as the surface of the aluminum plate already has a preferable surface shape.
 粗面化処理は、電気化学的粗面化処理のみを実施してもよいが、電気化学的粗面化処理と機械的粗面化処理及び/又は化学的粗面化処理とを組み合わせて実施してもよい。
 機械的粗面化処理と電気化学的粗面化処理とを組み合わせる場合には、機械的粗面化処理の後に、電気化学的粗面化処理を実施するのが好ましい。
 電気化学的粗面化処理は、硝酸又は塩酸を主体とする水溶液中で、直流又は交流を用いて行われることが好ましい。
 機械的粗面化処理の方法は特に制限されないが、例えば、特公昭50-40047号公報に記載されている方法が挙げられる。
 化学的粗面化処理も特に制限されず、公知の方法が挙げられる。
The roughening treatment may be carried out only by the electrochemical roughening treatment, but is carried out by combining the electrochemical roughening treatment with the mechanical roughening treatment and / or the chemical roughening treatment. You may.
When the mechanical roughening treatment and the electrochemical roughening treatment are combined, it is preferable to carry out the electrochemical roughening treatment after the mechanical roughening treatment.
The electrochemical roughening treatment is preferably carried out using direct current or alternating current in an aqueous solution mainly containing nitric acid or hydrochloric acid.
The method of mechanical roughening treatment is not particularly limited, and examples thereof include the methods described in Japanese Patent Publication No. 50-40047.
The chemical roughening treatment is also not particularly limited, and known methods can be mentioned.
 機械的粗面化処理の後には、以下の化学エッチング処理を実施するのが好ましい。
 機械的粗面化処理の後に施される化学エッチング処理は、アルミニウム板の表面の凹凸形状のエッジ部分をなだらかにし、印刷時のインキの引っかかりを防止し、印刷版の耐汚れ性を向上させるとともに、表面に残った研磨材粒子等の不要物を除去するために行われる。
 化学エッチング処理としては、酸によるエッチング及びアルカリによるエッチングが挙げられ、エッチング効率の点で特に優れている方法として、アルカリ水溶液を用いる化学エッチング処理(以下、「アルカリエッチング処理」ともいう。)が挙げられる。
After the mechanical roughening treatment, it is preferable to carry out the following chemical etching treatment.
The chemical etching treatment applied after the mechanical roughening treatment smoothes the uneven edges on the surface of the aluminum plate, prevents ink from getting caught during printing, and improves the stain resistance of the printing plate. , It is performed to remove unnecessary substances such as abrasive particles remaining on the surface.
Examples of the chemical etching treatment include etching with an acid and etching with an alkali, and as a method particularly excellent in terms of etching efficiency, a chemical etching treatment using an alkaline aqueous solution (hereinafter, also referred to as “alkali etching treatment”) can be mentioned. Be done.
 アルカリ水溶液に用いられるアルカリ剤は特に制限されないが、例えば、カセイソーダ、カセイカリ、メタケイ酸ソーダ、炭酸ソーダ、アルミン酸ソーダ、及び、グルコン酸ソーダが挙げられる。
 アルカリ水溶液は、アルミニウムイオンを含んでいてもよい。
 アルカリ水溶液のアルカリ剤の濃度は、0.01質量%以上が好ましく、3質量%以上がより好ましく、また、30質量%以下が好ましい。
The alkaline agent used in the alkaline aqueous solution is not particularly limited, and examples thereof include caustic soda, caustic potash, sodium metasilicate, sodium carbonate, sodium aluminate, and sodium gluconate.
The alkaline aqueous solution may contain aluminum ions.
The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.01% by mass or more, more preferably 3% by mass or more, and preferably 30% by mass or less.
 アルカリエッチング処理を施した場合、アルカリエッチング処理により生じる生成物を除去するために、低温の酸性水溶液を用いて化学エッチング処理(以下、「デスマット処理」ともいう。)を施すのが好ましい。
 酸性水溶液に用いられる酸は特に制限されないが、例えば、硫酸、硝酸、及び、塩酸が挙げられる。また、酸性水溶液の温度は、20℃~80℃が好ましい。
When the alkaline etching treatment is performed, it is preferable to perform a chemical etching treatment (hereinafter, also referred to as "desmat treatment") using a low-temperature acidic aqueous solution in order to remove the product generated by the alkaline etching treatment.
The acid used in the acidic aqueous solution is not particularly limited, and examples thereof include sulfuric acid, nitric acid, and hydrochloric acid. The temperature of the acidic aqueous solution is preferably 20 ° C to 80 ° C.
 粗面化処理工程としては、A態様又はB態様に示す処理を以下に示す順に実施する方法が好ましい。 As the roughening treatment step, a method in which the treatments shown in the A mode or the B mode are carried out in the order shown below is preferable.
~A態様~
(2)アルカリ水溶液を用いた化学エッチング処理(第1アルカリエッチング処理)
(3)酸性水溶液を用いた化学エッチング処理(第1デスマット処理)
(4)硝酸を主体とする水溶液を用いた電気化学的粗面化処理(第1電気化学的粗面化処理)
(5)アルカリ水溶液を用いた化学エッチング処理(第2アルカリエッチング処理)
(6)酸性水溶液を用いた化学エッチング処理(第2デスマット処理)
(7)塩酸を主体とする水溶液中で電気化学的粗面化処理(第2電気化学的粗面化処理)
(8)アルカリ水溶液を用いた化学エッチング処理(第3アルカリエッチング処理)
(9)酸性水溶液を用いた化学エッチング処理(第3デスマット処理)
~ A aspect ~
(2) Chemical etching treatment using an alkaline aqueous solution (first alkaline etching treatment)
(3) Chemical etching treatment using an acidic aqueous solution (first desmat treatment)
(4) Electrochemical roughening treatment using an aqueous solution mainly composed of nitric acid (first electrochemical roughening treatment)
(5) Chemical etching treatment using an alkaline aqueous solution (second alkaline etching treatment)
(6) Chemical etching treatment using an acidic aqueous solution (second desmat treatment)
(7) Electrochemical roughening treatment in an aqueous solution mainly composed of hydrochloric acid (second electrochemical roughening treatment)
(8) Chemical etching treatment using an alkaline aqueous solution (third alkaline etching treatment)
(9) Chemical etching treatment using an acidic aqueous solution (third desmat treatment)
~B態様~
(10)アルカリ水溶液を用いた化学エッチング処理(第4アルカリエッチング処理)
(11)酸性水溶液を用いた化学エッチング処理(第4デスマット処理)
(12)塩酸を主体とする水溶液を用いた電気化学的粗面化処理(第3電気化学的粗面化処理)
(13)アルカリ水溶液を用いた化学エッチング処理(第5アルカリエッチング処理)
(14)酸性水溶液を用いた化学エッチング処理(第5デスマット処理)
~ B mode ~
(10) Chemical etching treatment using an alkaline aqueous solution (fourth alkaline etching treatment)
(11) Chemical etching treatment using an acidic aqueous solution (fourth desmat treatment)
(12) Electrochemical roughening treatment using an aqueous solution mainly composed of hydrochloric acid (third electrochemical roughening treatment)
(13) Chemical etching treatment using an alkaline aqueous solution (fifth alkaline etching treatment)
(14) Chemical etching treatment using an acidic aqueous solution (fifth desmat treatment)
 上記A態様の(2)の処理前、又は、B態様の(10)の処理前に、必要に応じて、(1)機械的粗面化処理を実施してもよい。 If necessary, (1) mechanical roughening treatment may be carried out before the treatment of (2) of the above A aspect or before the treatment of (10) of the B aspect.
 第1アルカリエッチング処理及び第4アルカリエッチング処理におけるアルミニウム板の溶解量は、0.5g/m~30g/mが好ましく、1.0g/m~20g/mがより好ましい。 The amount of the aluminum plate dissolved in the first alkali etching treatment and the fourth alkali etching treatment is preferably 0.5 g / m 2 to 30 g / m 2, and more preferably 1.0 g / m 2 to 20 g / m 2 .
 A態様における第1電気化学的粗面化処理で用いる硝酸を主体とする水溶液としては、直流又は交流を用いた電気化学的な粗面化処理に用いる水溶液が挙げられる。例えば、1~100g/Lの硝酸水溶液に、硝酸アルミニウム、硝酸ナトリウム、又は、硝酸アンモニウム等を添加して得られる水溶液が挙げられる。
 A態様における第2電気化学的粗面化処理及びB態様における第3電気化学的粗面化処理で用いる塩酸を主体とする水溶液としては、通常の直流又は交流を用いた電気化学的な粗面化処理に用いる水溶液が挙げられる。例えば、1g/L~100g/Lの塩酸水溶液に、硫酸を0g/L~30g/L添加して得られる水溶液が挙げられる。なお、この溶液に、硝酸アルミニウム、硝酸ナトリウム、及び、硝酸アンモニウム等の硝酸イオン;塩化アルミニウム、塩化ナトリウム、及び、塩化アンモニウム等の塩酸イオンを更に添加してもよい。
Examples of the nitric acid-based aqueous solution used in the first electrochemical roughening treatment in the A aspect include an aqueous solution used in the electrochemical roughening treatment using direct current or alternating current. For example, an aqueous solution obtained by adding aluminum nitrate, sodium nitrate, ammonium nitrate or the like to an aqueous nitric acid solution of 1 to 100 g / L can be mentioned.
As the aqueous solution mainly containing hydrochloric acid used in the second electrochemical roughening treatment in the A aspect and the third electrochemical roughening treatment in the B aspect, the electrochemical rough surface using ordinary direct current or alternating current is used. Examples thereof include an aqueous solution used for the chemical treatment. For example, an aqueous solution obtained by adding 0 g / L to 30 g / L of sulfuric acid to a 1 g / L to 100 g / L hydrochloric acid aqueous solution can be mentioned. Nitrate ions such as aluminum nitrate, sodium nitrate, and ammonium nitrate; hydrochloric acid ions such as aluminum chloride, sodium chloride, and ammonium chloride may be further added to this solution.
 電気化学的粗面化処理の交流電源波形は、サイン波、矩形波、台形波、及び、三角波等を用いることができる。周波数は0.1Hz~250Hzが好ましい。
 図5は、電気化学的粗面化処理に用いられる交番波形電流波形図の一例を示すグラフである。
 図5において、taはアノード反応時間、tcはカソード反応時間、tpは電流が0からピークに達するまでの時間、Iaはアノードサイクル側のピーク時の電流、Icはカソードサイクル側のピーク時の電流、AAはアルミニウム板のアノード反応の電流、CAはアルミニウム板のカソード反応の電流である。台形波において、電流が0からピークに達するまでの時間tpは1ms~10msが好ましい。電気化学的な粗面化に用いる交流の1サイクルの条件が、アルミニウム板のアノード反応時間taとカソード反応時間tcの比tc/taが1~20、アルミニウム板がアノード時の電気量Qcとアノード時の電気量Qaの比Qc/Qaが0.3~20、アノード反応時間taが5ms~1,000ms、の範囲にあるのが好ましい。電流密度は台形波のピーク値で電流のアノードサイクル側Ia、カソードサイクル側Icともに10A/dm~200A/dmが好ましい。Ic/Iaは、0.3~20が好ましい。電気化学的な粗面化が終了した時点でのアルミニウム板のアノード反応にあずかる電気量の総和は、25C/dm~1,000C/dmが好ましい。
As the AC power supply waveform of the electrochemical roughening treatment, a sine wave, a square wave, a trapezoidal wave, a triangular wave, or the like can be used. The frequency is preferably 0.1 Hz to 250 Hz.
FIG. 5 is a graph showing an example of an alternating waveform current waveform diagram used in the electrochemical roughening process.
In FIG. 5, ta is the anode reaction time, ct is the cathode reaction time, tp is the time from 0 to the peak of the current, Ia is the peak current on the anode cycle side, and Ic is the peak current on the cathode cycle side. , AA is the current of the anode reaction of the aluminum plate, and CA is the current of the cathode reaction of the aluminum plate. In a trapezoidal wave, the time tp from 0 to the peak of the current is preferably 1 ms to 10 ms. The conditions for one cycle of AC used for electrochemical roughening are that the ratio ct / ta of the anode reaction time ta and the cathode reaction time ct of the aluminum plate is 1 to 20, and the amount of electricity Qc and the anode when the aluminum plate is the anode. It is preferable that the ratio Qc / Qa of the amount of electricity Qa at the time is in the range of 0.3 to 20 and the anode reaction time ta is in the range of 5 ms to 1,000 ms. The current density is the peak value of the trapezoidal wave, and is preferably 10 A / dm 2 to 200 A / dm 2 for both the anode cycle side Ia and the cathode cycle side Ic of the current. Ic / Ia is preferably 0.3 to 20. The total amount of electricity furnished to anode reaction of the aluminum plate at the time the electrochemical graining is completed, 25C / dm 2 ~ 1,000C / dm 2 is preferred.
 交流を用いた電気化学的な粗面化には図6に示した装置を用いることができる。
 図6は、交流を用いた電気化学的粗面化処理におけるラジアル型セルの一例を示す側面図である。
 図6において、50は主電解槽、51は交流電源、52はラジアルドラムローラ、53a及び53bは主極、54は電解液供給口、55は電解液、56はスリット、57は電解液通路、58は補助陽極、60は補助陽極槽、Wはアルミニウム板である。図6中、矢印A1は電解液の給液方向を、矢印A2は電解液の排出方向をそれぞれ示している。である。電解槽を2つ以上用いるときには、電解条件は同じでもよいし、異なっていてもよい。
 アルミニウム板Wは主電解槽50中に浸漬して配置されたラジアルドラムローラ52に巻装され、搬送過程で交流電源51に接続する主極53a及び53bにより電解処理される。電解液55は、電解液供給口54からスリット56を通じてラジアルドラムローラ52と主極53a及び53bとの間の電解液通路57に供給される。主電解槽50で処理されたアルミニウム板Wは、次いで、補助陽極槽60で電解処理される。この補助陽極槽60には補助陽極58がアルミニウム板Wと対向配置されており、電解液55が補助陽極58とアルミニウム板Wとの間の空間を流れるように供給される。
The apparatus shown in FIG. 6 can be used for electrochemical roughening using alternating current.
FIG. 6 is a side view showing an example of a radial cell in an electrochemical roughening treatment using alternating current.
In FIG. 6, 50 is a main electrolytic cell, 51 is an AC power supply, 52 is a radial drum roller, 53a and 53b are main poles, 54 is an electrolyte supply port, 55 is an electrolyte, 56 is a slit, and 57 is an electrolyte passage. 58 is an auxiliary anode, 60 is an auxiliary anode tank, and W is an aluminum plate. In FIG. 6, the arrow A1 indicates the supply direction of the electrolytic solution, and the arrow A2 indicates the discharge direction of the electrolytic solution. Is. When two or more electrolytic cells are used, the electrolysis conditions may be the same or different.
The aluminum plate W is wound around a radial drum roller 52 immersed in the main electrolytic cell 50 and is electrolyzed by the main poles 53a and 53b connected to the AC power supply 51 during the transfer process. The electrolytic solution 55 is supplied from the electrolytic solution supply port 54 to the electrolytic solution passage 57 between the radial drum roller 52 and the main poles 53a and 53b through the slit 56. The aluminum plate W treated in the main electrolytic cell 50 is then electrolyzed in the auxiliary anode tank 60. An auxiliary anode 58 is arranged to face the aluminum plate W in the auxiliary anode tank 60, and the electrolytic solution 55 is supplied so as to flow in the space between the auxiliary anode 58 and the aluminum plate W.
 第2アルカリエッチング処理におけるアルミニウム板の溶解量は、所定の印刷版原版が製造しやすい点で、1.0g/m以上が好ましく、2.0g/m~10g/mがより好ましい。 The amount of the aluminum plate dissolved in the second alkaline etching treatment is preferably 1.0 g / m 2 or more, and more preferably 2.0 g / m 2 to 10 g / m 2 in that a predetermined printing plate original plate can be easily produced.
 第3アルカリエッチング処理及び第4アルカリエッチング処理におけるアルミニウム板の溶解量は、所定の印刷版原版が製造しやすい点で、0.01g/m~0.8g/mが好ましく、0.05g/m~0.3g/mがより好ましい。 The amount of the aluminum plate dissolved in the third alkali etching treatment and the fourth alkali etching treatment is preferably 0.01 g / m 2 to 0.8 g / m 2 and 0.05 g in that a predetermined printing plate original plate can be easily produced. / M 2 to 0.3 g / m 2 is more preferable.
 酸性水溶液を用いた化学エッチング処理(第1~第5デスマット処理)では、燐酸、硝酸、硫酸、クロム酸、塩酸、又はこれらの2以上の酸を含む混酸を含む酸性水溶液が好適に用いられる。
 酸性水溶液の酸の濃度は、0.5質量%~60質量%が好ましい。
In the chemical etching treatment (first to fifth desmat treatments) using an acidic aqueous solution, an acidic aqueous solution containing phosphoric acid, nitric acid, sulfuric acid, chromium acid, hydrochloric acid, or a mixed acid containing two or more of these acids is preferably used.
The acid concentration of the acidic aqueous solution is preferably 0.5% by mass to 60% by mass.
〔陽極酸化処理工程〕
 陽極酸化処理工程の手順は、上述したマイクロポアが得られれば特に制限されず、公知の方法が挙げられる。
 陽極酸化処理工程においては、硫酸、リン酸、及び、シュウ酸等の水溶液を電解浴として用いることができる。例えば、硫酸の濃度は、100g/L~300g/Lが挙げられる。
 陽極酸化処理の条件は使用される電解液によって適宜設定されるが、例えば、液温5℃~70℃(好ましくは10℃~60℃)、電流密度0.5A/dm~60A/dm(好ましくは1A/dm~60A/dm)、電圧1V~100V(好ましくは5V~50V)、電解時間1秒~100秒(好ましくは5秒~60秒)、及び、皮膜量0.1g/m~5g/m(好ましくは0.2g/m~3g/m)が挙げられる。
[Anodizing process]
The procedure of the anodizing treatment step is not particularly limited as long as the above-mentioned micropores can be obtained, and known methods can be mentioned.
In the anodizing treatment step, aqueous solutions of sulfuric acid, phosphoric acid, oxalic acid and the like can be used as the electrolytic bath. For example, the concentration of sulfuric acid is 100 g / L to 300 g / L.
The conditions for the anodic oxidation treatment are appropriately set depending on the electrolytic solution used. For example, the liquid temperature is 5 ° C. to 70 ° C. (preferably 10 ° C. to 60 ° C.), and the current density is 0.5 A / dm 2 to 60 A / dm 2. (Preferably 1 A / dm 2 to 60 A / dm 2 ), voltage 1 V to 100 V (preferably 5 V to 50 V), electrolysis time 1 second to 100 seconds (preferably 5 seconds to 60 seconds), and film amount 0.1 g. / M 2 to 5 g / m 2 (preferably 0.2 g / m 2 to 3 g / m 2 ).
〔ポアワイド処理〕
 ポアワイド処理は、上述した陽極酸化処理工程により形成された陽極酸化皮膜に存在するマイクロポアの径(ポア径)を拡大させる処理(孔径拡大処理)である。
 ポアワイド処理は、上述した陽極酸化処理工程により得られたアルミニウム板を、酸水溶液又はアルカリ水溶液に接触させることにより行うことができる。接触させる方法は特に制限されず、例えば、浸せき法及びスプレー法が挙げられる。
[Pore wide processing]
The pore-wide treatment is a treatment (pore diameter enlargement treatment) for enlarging the diameter (pore diameter) of the micropores existing in the anodizing film formed by the above-mentioned anodizing treatment step.
The pore-wide treatment can be performed by bringing the aluminum plate obtained by the above-mentioned anodizing treatment step into contact with an acid aqueous solution or an alkaline aqueous solution. The contact method is not particularly limited, and examples thereof include a dipping method and a spraying method.
<保護層>
 本開示に係る平版印刷版原版は、画像記録層上に、保護層(オーバーコート層と呼ばれることもある。)を有していることが好ましい。
<Protective layer>
The planographic printing plate original plate according to the present disclosure preferably has a protective layer (sometimes referred to as an overcoat layer) on the image recording layer.
 上記保護層は、発色性、及び、経時発色性の観点から、熱又は赤外線露光により開裂する基を有する発色性化合物を含むことが好ましい。
 上記保護層における熱又は赤外線露光により開裂する基を有する発色性化合物の好ましい態様は、下記に示す態様以外は、上記画像記録層における熱又は赤外線露光により開裂する基を有する発色性化合物の好ましい態様と同様である。
 上記保護層における上記発色性化合物の含有量は、エッジ汚れ抑制性、発色性、経時発色性、機上現像性、及び、耐薬品性の観点から、0.1mg/m~100mg/mであることが好ましく、1mg/m~50mg/mであることがより好ましく、5mg/m~40mg/mであることが特に好ましい。
From the viewpoint of color development and color development over time, the protective layer preferably contains a color-developing compound having a group that cleaves by heat or infrared exposure.
A preferred embodiment of the color-developing compound having a group that cleaves by heat or infrared exposure in the protective layer is a preferred embodiment of the color-developing compound having a group that cleaves by heat or infrared exposure in the image recording layer, except for the following aspects. Is similar to.
The content of the color forming compound in the protective layer, edge soiling inhibitory chromogenic over time chromogenic, on-press development property, and, in view of chemical resistance, 0.1mg / m 2 ~ 100mg / m 2 It is preferably 1 mg / m 2 to 50 mg / m 2 , more preferably 5 mg / m 2 to 40 mg / m 2 .
 また、上記保護層は、エッジ汚れ抑制性、及び、機上現像性の観点から、分子量1,000以下の支持体吸着性化合物を含むことが好ましい。
 上記保護層における分子量1,000以下の支持体吸着性化合物の好ましい態様は、下記に示す態様以外は、上記画像記録層における分子量1,000以下の支持体吸着性化合物の好ましい態様と同様である。
 上記保護層における上記支持体吸着性化合物の含有量は、エッジ汚れ抑制性、及び、機上現像性の観点から、0.1mg/m~100mg/mであることが好ましく、1mg/m~50mg/mであることがより好ましく、5mg/m~40mg/mであることが特に好ましい。
Further, the protective layer preferably contains a support-adsorbing compound having a molecular weight of 1,000 or less from the viewpoint of edge stain suppression and on-machine developability.
The preferred embodiment of the support-adsorbing compound having a molecular weight of 1,000 or less in the protective layer is the same as the preferred embodiment of the support-adsorbing compound having a molecular weight of 1,000 or less in the image recording layer, except for the following aspects. ..
The content of the support-adsorbing compound in the protective layer, edge soiling inhibitory, and is preferably from the viewpoint of on-press developability, it is 0.1mg / m 2 ~ 100mg / m 2, 1mg / m It is more preferably 2 to 50 mg / m 2 , and particularly preferably 5 mg / m 2 to 40 mg / m 2.
 また、保護層は、特に制限はないが、酸素遮断により画像形成阻害反応を抑制する機能の他、画像記録層における傷の発生防止及び高照度レーザー露光時のアブレーション防止の機能を有する保護層が挙げられる。 The protective layer is not particularly limited, but a protective layer having a function of suppressing an image formation inhibitory reaction by blocking oxygen, a function of preventing scratches on the image recording layer, and a function of preventing ablation during high-illuminance laser exposure. Can be mentioned.
 このような特性の保護層については、例えば、米国特許第3,458,311号明細書及び特公昭55-49729号公報に記載されている。保護層に用いられる酸素低透過性のポリマーとしては、水溶性ポリマー、水不溶性ポリマーのいずれをも適宜選択して使用することができ、必要に応じて2種類以上を混合して使用することもできる。具体的には、例えば、ポリビニルアルコール、変性ポリビニルアルコール、ポリビニルピロリドン、水溶性セルロース誘導体、ポリ(メタ)アクリロニトリル等が挙げられる。
 変性ポリビニルアルコールとしてはカルボキシ基又はスルホ基を有する酸変性ポリビニルアルコールが好ましく用いられる。具体的には、特開2005-250216号公報及び特開2006-259137号公報に記載の変性ポリビニルアルコールが挙げられる。
Protective layers with such properties are described, for example, in US Pat. Nos. 3,458,311 and JP-A-55-49729. As the oxygen low-permeability polymer used for the protective layer, either a water-soluble polymer or a water-insoluble polymer can be appropriately selected and used, and if necessary, two or more kinds may be mixed and used. can. Specific examples thereof include polyvinyl alcohol, modified polyvinyl alcohol, polyvinylpyrrolidone, water-soluble cellulose derivatives, poly (meth) acrylonitrile, and the like.
As the modified polyvinyl alcohol, an acid-modified polyvinyl alcohol having a carboxy group or a sulfo group is preferably used. Specific examples thereof include the modified polyvinyl alcohols described in JP-A-2005-250216 and JP-A-2006-259137.
 保護層は、酸素遮断性を高めるために無機層状化合物を含有することが好ましい。無機層状化合物は、薄い平板状の形状を有する粒子であり、例えば、天然雲母、合成雲母等の雲母群、式:3MgO・4SiO・HOで表されるタルク、テニオライト、モンモリロナイト、サポナイト、ヘクトライト、リン酸ジルコニウム等が挙げられる。
 好ましく用いられる無機層状化合物は雲母化合物である。雲母化合物としては、例えば、式:A(B,C)2-510(OH,F,O)〔ただし、Aは、K、Na、Caのいずれか、B及びCは、Fe(II)、Fe(III)、Mn、Al、Mg、Vのいずれかであり、Dは、Si又はAlである。〕で表される天然雲母、合成雲母等の雲母群が挙げられる。
The protective layer preferably contains an inorganic layered compound in order to enhance oxygen blocking property. Inorganic laminar compound is a particle having a thin tabular shape, for example, natural mica, micas such as synthetic mica, wherein: talc represented by 3MgO · 4SiO · H 2 O, teniolite, montmorillonite, saponite, hectorite Examples include light, zirconium phosphate and the like.
The inorganic layered compound preferably used is a mica compound. Examples of the mica compound include formula: A (B, C) 2-5 D 4 O 10 (OH, F, O) 2 [However, A is any of K, Na, Ca, and B and C are It is any of Fe (II), Fe (III), Mn, Al, Mg, and V, and D is Si or Al. ] Can be mentioned as a group of mica such as natural mica and synthetic mica.
 雲母群においては、天然雲母としては白雲母、ソーダ雲母、金雲母、黒雲母及び鱗雲母が挙げられる。合成雲母としてはフッ素金雲母KMg(AlSi10)F、カリ四ケイ素雲母KMg2.5Si10)F等の非膨潤性雲母、及び、NaテトラシリリックマイカNaMg2.5(Si10)F、Na又はLiテニオライト(Na,Li)MgLi(Si10)F、モンモリロナイト系のNa又はLiヘクトライト(Na,Li)1/8Mg2/5Li1/8(Si10)F等の膨潤性雲母等が挙げられる。更に合成スメクタイトも有用である。 In the mica group, natural mica includes muscovite, paragonite, phlogopite, biotite and lepidolite. As synthetic mica, non-swelling mica such as fluorine gold mica KMg 3 (AlSi 3 O 10 ) F 2 , potash tetrasilicon mica KMg 2.5 Si 4 O 10 ) F 2 , and Na tetrasilic mica Namg 2. 5 (Si 4 O 10 ) F 2 , Na or Li teniolite (Na, Li) Mg 2 Li (Si 4 O 10 ) F 2 , montmorillonite-based Na or Li hectrite (Na, Li) 1/8 Mg 2 / Examples thereof include swelling mica such as 5 Li 1/8 (Si 4 O 10 ) F 2. In addition, synthetic smectites are also useful.
 上記の雲母化合物の中でも、フッ素系の膨潤性雲母が特に有用である。すなわち、膨潤性合成雲母は、10Å~15Å(1Å=0.1nm)程度の厚さの単位結晶格子層からなる積層構造を有し、格子内金属原子置換が他の粘土鉱物より著しく大きい。その結果、格子層は正電荷不足を生じ、それを補償するために層間にLi、Na、Ca2+、Mg2+等の陽イオンを吸着している。これらの層間に介在している陽イオンは交換性陽イオンと呼ばれ、いろいろな陽イオンと交換し得る。特に、層間の陽イオンがLi、Naの場合、イオン半径が小さいため層状結晶格子間の結合が弱く、水により大きく膨潤する。その状態でシェアーをかけると容易に劈開し、水中で安定したゾルを形成する。膨潤性合成雲母はこの傾向が強く、特に好ましく用いられる。 Among the above mica compounds, fluorine-based swelling mica is particularly useful. That is, the swellable synthetic mica has a laminated structure composed of a unit crystal lattice layer having a thickness of about 10 Å to 15 Å (1 Å = 0.1 nm), and the metal atom substitution in the lattice is significantly larger than that of other clay minerals. As a result, the lattice layer causes a positive charge shortage, and in order to compensate for this, cations such as Li + , Na + , Ca 2+ , and Mg 2+ are adsorbed between the layers. The cations intervening between these layers are called exchangeable cations and can be exchanged with various cations. In particular, when the cations between layers are Li + and Na + , the bond between the layered crystal lattices is weak because the ionic radius is small, and the cations swell greatly with water. When a share is applied in that state, it easily cleaves and forms a stable sol in water. Swellable synthetic mica has a strong tendency to do so and is particularly preferably used.
 雲母化合物の形状としては、拡散制御の観点からは、厚さは薄ければ薄いほどよく、平面サイズは塗布面の平滑性や活性光線の透過性を阻害しない限りにおいて大きい程よい。従って、アスペクト比は、好ましくは20以上であり、より好ましくは100以上、特に好ましくは200以上である。アスペクト比は粒子の厚さに対する長径の比であり、例えば、粒子の顕微鏡写真による投影図から測定することができる。アスペクト比が大きい程、得られる効果が大きい。 As for the shape of the mica compound, from the viewpoint of diffusion control, the thinner the thickness, the better, and the plane size is better as long as it does not hinder the smoothness of the coated surface and the transmission of active rays. Therefore, the aspect ratio is preferably 20 or more, more preferably 100 or more, and particularly preferably 200 or more. The aspect ratio is the ratio of the major axis to the thickness of the particles, which can be measured, for example, from a micrograph projection of the particles. The larger the aspect ratio, the greater the effect obtained.
 雲母化合物の粒子径は、その平均長径が、好ましくは0.3μm~20μm、より好ましくは0.5μm~10μm、特に好ましくは1μm~5μmである。粒子の平均の厚さは、好ましくは0.1μm以下、より好ましくは0.05μm以下、特に好ましくは0.01μm以下である。具体的には、例えば、代表的化合物である膨潤性合成雲母の場合、好ましい態様としては、厚さが1nm~50nm程度、面サイズ(長径)が1μm~20μm程度である。 The average major axis of the mica compound is preferably 0.3 μm to 20 μm, more preferably 0.5 μm to 10 μm, and particularly preferably 1 μm to 5 μm. The average thickness of the particles is preferably 0.1 μm or less, more preferably 0.05 μm or less, and particularly preferably 0.01 μm or less. Specifically, for example, in the case of a swellable synthetic mica which is a typical compound, the preferred embodiment is such that the thickness is about 1 nm to 50 nm and the surface size (major axis) is about 1 μm to 20 μm.
 無機層状化合物の含有量は、保護層の全固形分に対して、1質量%~60質量%が好ましく、3質量%~50質量%がより好ましい。複数種の無機層状化合物を併用する場合でも、無機層状化合物の合計量が上記の含有量であることが好ましい。上記範囲で酸素遮断性が向上し、良好な感度が得られる。また、着肉性の低下を防止できる。 The content of the inorganic layered compound is preferably 1% by mass to 60% by mass, more preferably 3% by mass to 50% by mass, based on the total solid content of the protective layer. Even when a plurality of types of inorganic layered compounds are used in combination, it is preferable that the total amount of the inorganic layered compounds is the above-mentioned content. Oxygen blocking property is improved in the above range, and good sensitivity can be obtained. In addition, it is possible to prevent a decrease in meat-forming property.
 保護層は可撓性付与のための可塑剤、塗布性を向上させための界面活性剤、表面の滑り性を制御するための無機粒子など公知の添加物を含有してもよい。また、画像記録層において記載した感脂化剤を保護層に含有させてもよい。 The protective layer may contain known additives such as a plasticizer for imparting flexibility, a surfactant for improving coatability, and inorganic particles for controlling the slipperiness of the surface. In addition, the oil-sensitive agent described in the image recording layer may be contained in the protective layer.
 保護層は公知の方法で塗布される。保護層の塗布量(固形分)は、0.01g/m~10g/mが好ましく、0.02g/m~3g/mがより好ましく、0.02g/m~1g/mが特に好ましい。 The protective layer is applied by a known method. The coating amount of the protective layer (solid content) is preferably from 0.01g / m 2 ~ 10g / m 2, more preferably 0.02g / m 2 ~ 3g / m 2, 0.02g / m 2 ~ 1g / m 2 is particularly preferable.
<下塗り層>
 本開示に係る平版印刷版原版は、画像記録層と支持体との間に下塗り層(中間層と呼ばれることもある。)を有することが好ましい。下塗り層は、露光部においては支持体と画像記録層との密着を強化し、未露光部においては画像記録層の支持体からのはく離を生じやすくさせるため、耐刷性を損なわずに現像性を向上させることに寄与する。また、赤外線レーザー露光の場合に、下塗り層が断熱層として機能することにより、露光により発生した熱が支持体に拡散して感度が低下するのを防ぐ効果も有する。
<Undercoat layer>
The planographic printing plate original plate according to the present disclosure preferably has an undercoat layer (sometimes referred to as an intermediate layer) between the image recording layer and the support. The undercoat layer strengthens the adhesion between the support and the image recording layer in the exposed portion, and makes it easy for the image recording layer to peel off from the support in the unexposed portion, so that the developability is not impaired without impairing the printing resistance. Contributes to improving. Further, in the case of infrared laser exposure, the undercoat layer functions as a heat insulating layer, so that the heat generated by the exposure is diffused to the support to prevent the sensitivity from being lowered.
 下塗り層に用いられる化合物としては、支持体表面に吸着可能な吸着性基及び親水性基を有するポリマーが挙げられる。画像記録層との密着性を向上させるために吸着性基及び親水性基を有し、更に架橋性基を有するポリマーが好ましい。下塗り層に用いられる化合物は、低分子化合物でもポリマーであってもよい。下塗り層に用いられる化合物は、必要に応じて、2種以上を混合して使用してもよい。 Examples of the compound used for the undercoat layer include polymers having an adsorptive group and a hydrophilic group that can be adsorbed on the surface of the support. A polymer having an adsorptive group and a hydrophilic group and further having a crosslinkable group is preferable in order to improve the adhesion to the image recording layer. The compound used for the undercoat layer may be a small molecule compound or a polymer. As the compound used for the undercoat layer, two or more kinds may be mixed and used as needed.
 下塗り層に用いられる化合物がポリマーである場合、吸着性基を有するモノマー、親水性基を有するモノマー及び架橋性基を有するモノマーの共重合体が好ましい。
 支持体表面に吸着可能な吸着性基としては、フェノール性水酸基、カルボキシ基、-PO、-OPO、-CONHSO-、-SONHSO-、-COCHCOCHが好ましい。親水性基としては、スルホ基又はその塩、カルボキシ基の塩が好ましい。架橋性基としては、アクリル基、メタクリル基、アクリルアミド基、メタクリルアミド基、アリル基などが好ましい。
 ポリマーは、ポリマーの極性置換基と、上記極性置換基と対荷電を有する置換基及びエチレン性不飽和結合を有する化合物との塩形成で導入された架橋性基を有してもよいし、上記以外のモノマー、好ましくは親水性モノマーが更に共重合されていてもよい。
When the compound used for the undercoat layer is a polymer, a copolymer of a monomer having an adsorptive group, a monomer having a hydrophilic group, and a monomer having a crosslinkable group is preferable.
The adsorbable adsorptive group to the support surface, a phenolic hydroxyl group, a carboxyl group, -PO 3 H 2, -OPO 3 H 2, -CONHSO 2 -, - SO 2 NHSO 2 -, - is COCH 2 COCH 3 preferable. As the hydrophilic group, a sulfo group or a salt thereof, or a salt of a carboxy group is preferable. As the crosslinkable group, an acrylic group, a methacryl group, an acrylamide group, a methacrylamide group, an allyl group and the like are preferable.
The polymer may have a polar substituent of the polymer and a crosslinkable group introduced by salt formation with a substituent having a pair charge with the polar substituent and a compound having an ethylenically unsaturated bond. A monomer other than the above, preferably a hydrophilic monomer, may be further copolymerized.
 具体的には、特開平10-282679号公報に記載されている付加重合可能なエチレン性二重結合反応基を有しているシランカップリング剤、特開平2-304441号公報記載のエチレン性二重結合反応基を有しているリン化合物が好適に挙げられる。特開2005-238816号、特開2005-125749号、特開2006-239867号、特開2006-215263号の各公報に記載の架橋性基(好ましくは、エチレン性不飽和結合基)、支持体表面と相互作用する官能基及び親水性基を有する低分子又は高分子化合物も好ましく用いられる。
 より好ましいものとして、特開2005-125749号及び特開2006-188038号公報に記載の支持体表面に吸着可能な吸着性基、親水性基及び架橋性基を有する高分子ポリマーが挙げられる。
Specifically, a silane coupling agent having an addition-polymerizable ethylenic double bond reactive group described in JP-A No. 10-228679, and an ethylenic di-ethylene compound described in JP-A-2-304441. A phosphorus compound having a double bond reactive group is preferably used. Crosslinkable groups (preferably ethylenically unsaturated bonding groups) and supports described in JP-A-2005-238816, JP-A-2005-125479, JP-A-2006-239867, and JP-A-2006-215263. Low molecular weight or high molecular weight compounds having functional and hydrophilic groups that interact with the surface are also preferably used.
More preferable are polymer polymers having an adsorptive group, a hydrophilic group and a crosslinkable group that can be adsorbed on the surface of the support described in JP-A-2005-125479 and JP-A-2006-188038.
 下塗り層に用いられるポリマー中のエチレン性不飽和結合基の含有量は、ポリマー1g当たり、好ましくは0.1mmol~10.0mmol、より好ましくは0.2mmol~5.5mmolである。
 下塗り層に用いられるポリマーの重量平均分子量(Mw)は、5,000以上が好ましく、1万~30万がより好ましい。
The content of the ethylenically unsaturated bond group in the polymer used for the undercoat layer is preferably 0.1 mmol to 10.0 mmol, more preferably 0.2 mmol to 5.5 mmol per 1 g of the polymer.
The weight average molecular weight (Mw) of the polymer used for the undercoat layer is preferably 5,000 or more, and more preferably 10,000 to 300,000.
〔親水性化合物〕
 下塗り層は、現像性の観点から、親水性化合物を含むことが好ましい。
 親水性化合物としては、特に制限はなく、下塗り層に用いられる公知の親水性化合物を用いることができる。
 また、下塗り層における親水性化合物は、上記支持体吸着性化合物であることが好ましい。
 親水性化合物としては、カルボキシメチルセルロース、デキストリン等のアミノ基を有するホスホン酸類、有機ホスホン酸、有機リン酸、有機ホスフィン酸、アミノ酸類、並びに、ヒドロキシ基を有するアミンの塩酸塩等が好ましく挙げられる。
 また、親水性化合物としては、アミノ基又は重合禁止能を有する官能基と支持体表面と相互作用する基とを有する化合物(例えば、1,4-ジアザビシクロ[2.2.2]オクタン(DABCO)、2,3,5,6-テトラヒドロキシ-p-キノン、クロラニル、スルホフタル酸、エチレンジアミン四酢酸(EDTA)又はその塩、ヒドロキシエチルエチレンジアミン三酢酸又はその塩、ジヒドロキシエチルエチレンジアミン二酢酸又はその塩、ヒドロキシエチルイミノ二酢酸又はその塩など)が好ましく挙げられる。
[Hydrophilic compound]
The undercoat layer preferably contains a hydrophilic compound from the viewpoint of developability.
The hydrophilic compound is not particularly limited, and a known hydrophilic compound used for the undercoat layer can be used.
Further, the hydrophilic compound in the undercoat layer is preferably the support-adsorbing compound.
Preferred examples of the hydrophilic compound include phosphonic acids having an amino group such as carboxymethyl cellulose and dextrin, organic phosphonic acids, organic phosphoric acids, organic phosphinic acids, amino acids, and hydrochlorides of amines having a hydroxy group.
Further, as the hydrophilic compound, a compound having an amino group or a functional group having a polymerization prohibitive ability and a group interacting with the surface of the support (for example, 1,4-diazabicyclo [2.2.2] octane (DABCO)). , 2,3,5,6-tetrahydroxy-p-quinone, chloranyl, sulfophthalic acid, ethylenediaminetetraacetic acid (EDTA) or its salt, hydroxyethylethylenediaminetriacetic acid or its salt, dihydroxyethylethylenediaminediacetic acid or its salt, hydroxy Ethylenediaminediacetic acid or a salt thereof, etc.) are preferably mentioned.
 親水性化合物としては、傷汚れ抑制性の観点から、ヒドロキシカルボン酸又はその塩を含むことが好ましい。
 また、親水性化合物、好ましくはヒドロキシカルボン酸又はその塩は、傷汚れ抑制性の観点から、上記アルミニウム支持体上の層に含まれることが好ましい。また、上記アルミニウム支持体上の層は、画像記録層が形成されている側の層であることが好ましく、また、上記アルミニウム支持体と接する層であることが好ましい。
 上記アルミニウム支持体上の層としては、上記アルミニウム支持体と接する層として、下塗り層又は画像記録層が好ましく挙げられる。また、上記アルミニウム支持体と接する層以外の層、例えば、保護層又は画像記録層に、親水性化合物、好ましくはヒドロキシカルボン酸又はその塩が含まれていてもよい。
 本開示に係る平版印刷版原版において、画像記録層が、傷汚れ抑制性の観点から、ヒドロキシカルボン酸又はその塩を含むことが好ましい。
 また、本開示に係る平版印刷版原版において、アルミニウム支持体の画像記録層側の表面が、少なくともヒドロキシカルボン酸又はその塩を含む組成物(例えば、水溶液等)により表面処理される態様も好ましく挙げられる。上記態様である場合、処理されたヒドロキシカルボン酸又はその塩は、アルミニウム支持体と接する画像記録層側の層(例えば、画像記録層又は下塗り層)に含まれた状態で少なくとも一部を検出することができる。
 下塗り層等のアルミニウム支持体と接する画像記録層側の層にヒドロキシカルボン酸又はその塩を含むことにより、アルミニウム支持体の画像記録層側の表面を親水化することができ、また、アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角を110°以下と容易にすることができ、傷汚れ抑制性に優れる。
The hydrophilic compound preferably contains a hydroxycarboxylic acid or a salt thereof from the viewpoint of suppressing scratches and stains.
Further, the hydrophilic compound, preferably a hydroxycarboxylic acid or a salt thereof, is preferably contained in the layer on the aluminum support from the viewpoint of suppressing scratches and stains. Further, the layer on the aluminum support is preferably a layer on the side where the image recording layer is formed, and is preferably a layer in contact with the aluminum support.
As the layer on the aluminum support, an undercoat layer or an image recording layer is preferably mentioned as a layer in contact with the aluminum support. Further, a layer other than the layer in contact with the aluminum support, for example, a protective layer or an image recording layer may contain a hydrophilic compound, preferably a hydroxycarboxylic acid or a salt thereof.
In the lithographic printing plate original plate according to the present disclosure, it is preferable that the image recording layer contains a hydroxycarboxylic acid or a salt thereof from the viewpoint of suppressing scratches and stains.
Further, in the lithographic printing plate original plate according to the present disclosure, an embodiment in which the surface of the aluminum support on the image recording layer side is surface-treated with a composition containing at least hydroxycarboxylic acid or a salt thereof (for example, an aqueous solution) is also preferably mentioned. Be done. In the above embodiment, at least a part of the treated hydroxycarboxylic acid or a salt thereof is detected in a state of being contained in a layer on the image recording layer side (for example, an image recording layer or an undercoat layer) in contact with an aluminum support. be able to.
By containing hydroxycarboxylic acid or a salt thereof in the layer on the image recording layer side in contact with the aluminum support such as the undercoat layer, the surface of the aluminum support on the image recording layer side can be made hydrophilic, and the aluminum support can also be made hydrophilic. The contact angle with water on the surface of the image recording layer side by the aerial water droplet method can be easily set to 110 ° or less, and the scratch and stain suppression property is excellent.
 ヒドロキシカルボン酸とは、1分子中に1個以上のカルボキシ基と1個以上のヒドロキシ基とを有する有機化合物の総称のことであり、ヒドロキシ酸、オキシ酸、オキシカルボン酸、アルコール酸とも呼ばれる(岩波理化学辞典第5版、(株)岩波書店発行(1998)参照)。
 上記ヒドロキシカルボン酸又はその塩は、下記式(HC)で表されるものが好ましい。
  RHC(OH)mhc(COOMHCnhc       式(HC)
 式(HC)中、RHCはmhc+nhc価の有機基を表し、MHCはそれぞれ独立に、水素原子、アルカリ金属又はオニウムを表し、mhc及びnhcはそれぞれ独立に、1以上の整数を表し、nが2以上の場合、Mは同じでも異なってもよい。
Hydroxycarboxylic acid is a general term for organic compounds having one or more carboxy groups and one or more hydroxy groups in one molecule, and is also called hydroxy acid, oxyic acid, oxycarboxylic acid, or alcoholic acid (). Iwanami Physics and Chemistry Dictionary 5th Edition, published by Iwanami Shoten Co., Ltd. (1998)).
The hydroxycarboxylic acid or a salt thereof is preferably represented by the following formula (HC).
R HC (OH) mhc ( COMM HC ) nhc type (HC)
In formula (HC), R HC represents an organic group having a mhc + nhc valence, M HC each independently represents a hydrogen atom, an alkali metal or onium, and mhc and nhc each independently represent an integer of 1 or more. When is 2 or more, M may be the same or different.
 式(HC)において、Rで表されるmhc+nhc価の有機基としては、mhc+nhc価の炭化水素基等が挙げられる。炭化水素基は置換基及び/又は連結基を有してもよい。
 炭化水素基としては、脂肪族炭化水素から誘導されるmhc+nhc価の基、例えば、アルキレン基、アルカントリイル基、アルカンテトライル基、アルカンペンタイル基、アルケニレン基、アルケントリイル基、アルケンテトライル基、アルケンペンタイル基、アルキニレン基、アルキントリイル基、アルキンテトライル基、アルキンペンタイル基等、芳香族炭化水素から誘導されるmhc+nhc価の基、例えば、アリーレン基、アレーントリイル基、アレーンテトライル基、アレーンペンタイル基等が挙げられる。ヒドロキシル基及びカルボキシル基以外の置換基としては、アルキル基、アルケニル基、アルキニル基、アラルキル基、アリール基等が挙げられる。置換基の具体例としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、ヘキサデシル基、オクタデシル基、エイコシル基、イソプロピル基、イソブチル基、s-ブチル基、t-ブチル基、イソペンチル基、ネオペンチル基、1-メチルブチル基、イソヘキシル基、2-エチルヘキシル基、2-メチルヘキシル基、シクロヘキシル基、シクロペンチル基、2-ノルボルニル基、メトキシメチル基、メトキシエトキシエチル基、アリルオキシメチル基、フェノキシメチル基、アセチルオキシメチル基、ベンゾイルオキシメチル基、ベンジル基、フェネチル基、α-メチルベンジル基、1-メチル-1-フェニルエチル基、p-メチルベンジル基、シンナミル基、アリル基、1-プロペニルメチル基、2-ブテニル基、2-メチルアリル基、2-メチルプロペニルメチル基、2-プロピニル基、2-ブチニル基、3-ブチニル基、フェニル基、ビフェニル基、ナフチル基、トリル基、キシリル基、メシチル基、クメニル基、メトキシフェニル基、エトキシフェニル基、フェノキシフェニル基、アセトキシフェニル基、ベンゾイロキシフェニル基、メトキシカルボニルフェニル基、エトキシカルボニルフェニル基、フェノキシカルボニルフェニル基等が挙げられる。また、連結基は、水素原子、炭素原子、酸素原子、窒素原子、硫黄原子及びハロゲン原子よりなる群から選ばれる少なくとも1種の原子により構成されるもので、その原子数は好ましくは1~50である。具体的には、アルキレン基、置換アルキレン基、アリーレン基、置換アリーレン基などが挙げられ、これらの2価の基がアミド結合、エーテル結合、ウレタン結合、ウレア結合及びエステル結合のいずれかで複数連結された構造を有していてもよい。
In the formula (HC), examples of the mhc + nhc valent organic group represented by R include a mhc + nhc valent hydrocarbon group. The hydrocarbon group may have a substituent and / or a linking group.
As the hydrocarbon group, a group having a mhc + nhc valence derived from an aliphatic hydrocarbon, for example, an alkylene group, an alcantryyl group, an alkanetetrayl group, an alcantyl group, an alkenylene group, an arcentryyl group, an alkentetrayl group. Mhc + nhc valent groups derived from aromatic hydrocarbons such as groups, alkenylpentyl groups, alkynylene groups, alkyntriyl groups, alkynetetrayl groups, alkynpentyl groups, etc., such as allylene groups, allenetriyl groups, allenes. Examples thereof include a tetrayl group and an arenepentile group. Examples of the substituent other than the hydroxyl group and the carboxyl group include an alkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group and the like. Specific examples of the substituent include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group and a hexadecyl group. Octadecyl group, eicosyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, Cyclopentyl group, 2-norbornyl group, methoxymethyl group, methoxyethoxyethyl group, allyloxymethyl group, phenoxymethyl group, acetyloxymethyl group, benzoyloxymethyl group, benzyl group, phenethyl group, α-methylbenzyl group, 1- Methyl-1-phenylethyl group, p-methylbenzyl group, cinnamyl group, allyl group, 1-propenylmethyl group, 2-butenyl group, 2-methylallyl group, 2-methylpropenylmethyl group, 2-propynyl group, 2- Butynyl group, 3-butynyl group, phenyl group, biphenyl group, naphthyl group, tolyl group, xsilyl group, mesityl group, cumenyl group, methoxyphenyl group, ethoxyphenyl group, phenoxyphenyl group, acetoxyphenyl group, benzoyloxyphenyl group , Methoxycarbonylphenyl group, ethoxycarbonylphenyl group, phenoxycarbonylphenyl group and the like. The linking group is composed of at least one atom selected from the group consisting of hydrogen atom, carbon atom, oxygen atom, nitrogen atom, sulfur atom and halogen atom, and the number of atoms is preferably 1 to 50. Is. Specific examples thereof include an alkylene group, a substituted alkylene group, an arylene group and a substituted arylene group, and a plurality of these divalent groups are linked by any of an amide bond, an ether bond, a urethane bond, a urea bond and an ester bond. It may have an esterified structure.
 MHCで表されるアルカリ金属としては、リチウム、ナトリウム、カリウム等が挙げられ、ナトリウムが特に好ましい。オニウムとしてはアンモニウム、ホスホニウム、スルホニウム等が挙げられ、アンモニウムが特に好ましい。
 また、MHCは、傷汚れ抑制性の観点から、アルカリ金属又はオニウムであることが好ましく、アルカリ金属であることがより好ましい。
 mhcとnhcとの総数は、3以上が好ましく、3~8がより好ましく、4~6が更に好ましい。
Examples of the alkali metal represented by MHC include lithium, sodium, potassium and the like, and sodium is particularly preferable. Examples of onium include ammonium, phosphonium, sulfonium and the like, and ammonium is particularly preferable.
Further, M HC, from the viewpoint of scratch stain inhibitory, preferably an alkali metal or an onium, and more preferably an alkali metal.
The total number of mhc and nhc is preferably 3 or more, more preferably 3 to 8, and even more preferably 4 to 6.
 上記ヒドロキシカルボン酸又はその塩は、分子量が600以下であることが好ましく、500以下であることがより好ましく、300以下であることが特に好ましい。また、上記分子量は、76以上であることが好ましい。
 上記ヒドロキシカルボン酸、又は、上記ヒドロキシカルボン酸の塩を構成するヒドロキシカルボン酸は、具体的には、グルコン酸、グリコール酸、乳酸、タルトロン酸、ヒドロキシ酪酸(2-ヒドロキシ酪酸、3-ヒドロキシ酪酸、γ-ヒドロキシ酪酸等)、リンゴ酸、酒石酸、シトラマル酸、クエン酸、イソクエン酸、ロイシン酸、メバロン酸、パントイン酸、リシノール酸、リシネライジン酸、セレブロン酸、キナ酸、シキミ酸、モノヒドロキシ安息香酸誘導体(サリチル酸、クレオソート酸(ホモサリチル酸、ヒドロキシ(メチル)安息香酸)、バニリン酸、シリング酸等)、ジヒドロキシ安息香酸誘導体(ピロカテク酸、レソルシル酸、プロトカテク酸、ゲンチジン酸、オルセリン酸等)、トリヒドロキシ安息香酸誘導体(没食子酸等)、フェニル酢酸誘導体(マンデル酸、ベンジル酸、アトロラクチン酸等)、ヒドロケイヒ酸誘導体(メリロト酸、フロレト酸、クマル酸、ウンベル酸、コーヒー酸、フェルラ酸、シナピン酸、セレブロン酸、カルミン酸等)等が挙げられる。
The hydroxycarboxylic acid or a salt thereof preferably has a molecular weight of 600 or less, more preferably 500 or less, and particularly preferably 300 or less. The molecular weight is preferably 76 or more.
Specifically, the hydroxycarboxylic acid constituting the hydroxycarboxylic acid or the salt of the hydroxycarboxylic acid is gluconic acid, glycolic acid, lactic acid, tartron acid, hydroxybutyric acid (2-hydroxybutyric acid, 3-hydroxybutyric acid, γ-Hydroxybutyric acid, etc.), malic acid, tartaric acid, citramal acid, citric acid, isocitrate, leucic acid, mevalonic acid, pantoic acid, ricinolic acid, ricineraidic acid, cerebronic acid, quinic acid, shikimic acid, monohydroxybenzoic acid derivative (Salicylic acid, cleosortic acid (homosalicylic acid, hydroxy (methyl) benzoic acid), vanillic acid, syring acid, etc.), dihydroxybenzoic acid derivatives (pyrocatechuic acid, resorcylic acid, protocatechuic acid, gentidic acid, orceric acid, etc.), trihydroxy Benzoic acid derivatives (such as galvanic acid), phenylacetic acid derivatives (mandelic acid, benzylic acid, atrolactic acid, etc.), hydrosilicic acid derivatives (merilotoic acid, floretic acid, kumalic acid, umbellic acid, coffee acid, ferulic acid, cinnapic acid, etc.) Celebronic acid, carmic acid, etc.) and the like.
 これらの中でも、上記ヒドロキシカルボン酸、又は、上記ヒドロキシカルボン酸の塩を構成するヒドロキシカルボン酸としては、傷汚れ抑制性の観点から、ヒドロキシ基を2個以上有している化合物が好ましく、ヒドロキシ基を3個以上有している化合物がより好ましく、ヒドロキシ基を5個以上有している化合物が更に好ましく、ヒドロキシ基を5個~8個有している化合物が特に好ましい。
 また、カルボキシ基を1個、ヒドロキシ基を2個以上有しているものとしては、グルコン酸、又は、シキミ酸が好ましい。
 カルボキシ基を2個以上、ヒドロキシ基を1個有しているものとしては、クエン酸、又は、リンゴ酸が好ましい。
 カルボキシ基及びヒドロキシ基をそれぞれ2個以上有しているものとしては、酒石酸が好ましい。
 中でも、上記ヒドロキシカルボン酸としては、グルコン酸が特に好ましい。
Among these, as the hydroxycarboxylic acid or the hydroxycarboxylic acid constituting the salt of the hydroxycarboxylic acid, a compound having two or more hydroxy groups is preferable from the viewpoint of suppressing scratches and stains, and a hydroxy group is preferable. A compound having 3 or more hydroxy groups is more preferable, a compound having 5 or more hydroxy groups is further preferable, and a compound having 5 to 8 hydroxy groups is particularly preferable.
Further, as a substance having one carboxy group and two or more hydroxy groups, gluconic acid or shikimic acid is preferable.
Citric acid or malic acid is preferable as having two or more carboxy groups and one hydroxy group.
Tartaric acid is preferable as having two or more carboxy groups and two or more hydroxy groups.
Among them, gluconic acid is particularly preferable as the hydroxycarboxylic acid.
 親水性化合物は、1種単独で使用しても、2種以上を併用してもよい。
 下塗り層に親水性化合物、好ましくはヒドロキシカルボン酸又はその塩を含む場合、親水性化合物、好ましくはヒドロキシカルボン酸及びその塩の含有量は、下塗り層の全質量に対し、0.01質量%~50質量%であることが好ましく、0.1質量%~40質量%であることがより好ましく、1.0質量%~30質量%であることが特に好ましい。
The hydrophilic compound may be used alone or in combination of two or more.
When the undercoat layer contains a hydrophilic compound, preferably hydroxycarboxylic acid or a salt thereof, the content of the hydrophilic compound, preferably hydroxycarboxylic acid and its salt is 0.01% by mass or more based on the total mass of the undercoat layer. It is preferably 50% by mass, more preferably 0.1% by mass to 40% by mass, and particularly preferably 1.0% by mass to 30% by mass.
 下塗り層は、上記下塗り層用化合物の他に、経時による汚れ防止のため、キレート剤、第二級又は第三級アミン、重合禁止剤等を含有してもよい。 In addition to the above-mentioned compound for the undercoat layer, the undercoat layer may contain a chelating agent, a secondary or tertiary amine, a polymerization inhibitor, or the like in order to prevent stains over time.
 下塗り層は、公知の方法で塗布される。下塗り層の塗布量(固形分)は、0.1mg/m~100mg/mが好ましく、1mg/m~30mg/mがより好ましい。 The undercoat layer is applied by a known method. The coating amount (solid content) of the undercoat layer is preferably 0.1 mg / m 2 to 100 mg / m 2, and more preferably 1 mg / m 2 to 30 mg / m 2 .
<エッジ親水化層>
 本開示に係る平版印刷版原版は、エッジ汚れ抑制性の観点から、上記平版印刷版原版の画像記録層側の面の端部から1cm以内の領域に親水化層(「エッジ親水化層」ともいう。)を有することが好ましい。
 上記エッジ親水化層は、上記平版印刷版原版の画像記録層側の面の少なくとも1つの辺の端部に有していても、四辺形状の上記平版印刷版原版の画像記録層側の面の4辺の端部に有していてもよいが、上記平版印刷版原版の画像記録層側の面の対向する2辺の端部から各1cm以内の領域に有していることが好ましい。
 上記エッジ親水化層の幅は、特に制限はないが、1mm~50mmであることが好ましい。
 また、本開示に係る平版印刷版原版は、上記エッジ親水化層が形成された領域で裁断してなる平版印刷版原版であることが好ましい。
 上記エッジ親水化層は、画像記録層側の最外層として有していても、各層の間に有していてもよいが、エッジ汚れ抑制性の観点から、画像記録層側の最外層として有していることが好ましい。
<Edge hydrophilic layer>
From the viewpoint of suppressing edge stains, the lithographic printing plate original plate according to the present disclosure has a hydrophilic layer (also referred to as "edge hydrophilic layer") in a region within 1 cm from the edge of the surface of the lithographic printing plate original plate on the image recording layer side. It is preferable to have.
Even if the edge hydrophilic layer is provided at the end of at least one side of the surface of the lithographic printing plate original plate on the image recording layer side, the surface of the lithographic printing plate original plate on the image recording layer side has a quadrilateral shape. It may be provided at the ends of the four sides, but it is preferably provided within 1 cm from the ends of the two opposite sides of the surface of the planographic printing plate original plate on the image recording layer side.
The width of the edge hydrophilic layer is not particularly limited, but is preferably 1 mm to 50 mm.
Further, the lithographic printing plate original plate according to the present disclosure is preferably a lithographic printing plate original plate formed by cutting in the region where the edge hydrophilic layer is formed.
The edge hydrophilic layer may be provided as the outermost layer on the image recording layer side or between the layers, but is provided as the outermost layer on the image recording layer side from the viewpoint of suppressing edge stains. It is preferable to do so.
 上記エッジ親水化層は、親水化剤を含むことが好ましい。
 親水化剤としては、リン酸化合物及び/又はホスホン酸化合物を含むことが好ましく、親水化剤としてリン酸化合物及び/又はホスホン酸化合物並びに界面活性剤を含むことがより好ましい。
 更に、上記2つの態様において、少なくともリン酸化合物を含むことが好ましい。
The edge hydrophilization layer preferably contains a hydrophilizing agent.
The hydrophilizing agent preferably contains a phosphoric acid compound and / or a phosphonic acid compound, and more preferably contains a phosphoric acid compound and / or a phosphonic acid compound and a surfactant as a hydrophilizing agent.
Further, in the above two embodiments, it is preferable to contain at least a phosphoric acid compound.
-界面活性剤-
 親水化剤としては、界面活性剤を使用することが好ましい。
 界面活性剤としては、アニオン性界面活性剤、非イオン性界面活性剤、カチオン性界面活性剤、及び、両性界面活性剤が挙げられるが、アニオン性界面活性剤、非イオン性界面活性剤、及び、両性界面活性剤よりなる群から選ばれた少なくとも一種の界面活性剤が好ましく、アニオン性界面活性剤及び/又は非イオン性界面活性剤がより好ましい。上記態様によれば、塗布性に優れた親水化塗布液を得ることができる。
 なお、フッ素系、シリコーン系等のアニオン性、非イオン性界面活性剤(典型的には、フッ素系又はシリコーン系のアニオン性又は非イオン性界面活性剤)は、アニオン性又は非イオン性界面活性剤としては好ましくない。これらの界面活性剤を使用すると親水化塗布液の塗布性が劣り好ましくない。
-Surfactant-
As the hydrophilic agent, it is preferable to use a surfactant.
Examples of the surfactant include anionic surfactants, nonionic surfactants, cationic surfactants, and amphoteric surfactants, but anionic surfactants, nonionic surfactants, and , At least one surfactant selected from the group consisting of amphoteric surfactants is preferred, anionic surfactants and / or nonionic surfactants are more preferred. According to the above aspect, a hydrophilic coating liquid having excellent coatability can be obtained.
Anionic and nonionic surfactants such as fluorine-based and silicone-based surfactants (typically, fluorine-based or silicone-based anionic or nonionic surfactants) are anionic or nonionic surfactants. Not preferable as an agent. When these surfactants are used, the coatability of the hydrophilic coating liquid is poor, which is not preferable.
 アニオン性界面活性剤としては、脂肪酸塩類、アビエチン酸塩類、ヒドロキシアルカンスルホン酸塩類、アルカンスルホン酸塩類、ジアルキルスルホコハク酸塩類、直鎖アルキルベンゼンスルホン酸塩類、分岐鎖アルキルベンゼンスルホン酸塩類、アルキルナフタレンスルホン酸塩類、アルキルフェノキシポリオキシエチレンプロピルスルホン酸塩類、ポリオキシエチレンアリールエーテル硫酸エステル塩類、ポリオキシエチレンアルキルスルホフェニルエーテル塩類、N-メチル-N-オレイルタウリンナトリウム類、N-アルキルスルホコハク酸モノアミド二ナトリウム塩類、石油スルホン酸塩類、硫酸化ヒマシ油、硫酸化牛脂油、脂肪酸アルキルエステルの硫酸エステル塩類、アルキル硫酸エステル塩類、ポリオキシエチレンアルキルエーテル硫酸エステル塩類、脂肪酸モノグリセリド硫酸エステル塩類、ポリオキシエチレンアルキルフェニルエーテル硫酸エステル塩類、ポリオキシエチレンスチリルフェニルエーテル硫酸エステル塩類、アルキル燐酸エステル塩類、ポリオキシエチレンアルキルエーテル燐酸エステル塩類、ポリオキシエチレンアルキルフェニルエーテル燐酸エステル塩類、スチレン-無水マレイン酸共重合物の部分ケン化物類、オレフィン-無水マレイン酸共重合物の部分ケン化物類、ナフタレンスルホン酸塩ホルマリン縮合物類等が挙げられる。これらの中でもジアルキルスルホコハク酸塩類、アルキル硫酸エステル塩類、ポリオキシエチレンアリールエーテル硫酸エステル塩類、及びアルキルナフタレンスルホン酸塩類が特に好ましく用いられる。
 具体的には、式(I-A)又は式(I-B)で表されるアニオン界面活性剤からなる群から選ばれる少なくとも一種のアニオン性界面活性剤を挙げることができる。
Anionic surfactants include fatty acid salts, avietates, hydroxyalcan sulfonates, alkane sulfonates, dialkyl sulfosuccinates, linear alkylbenzene sulfonates, branched alkylbenzene sulfonates, alkylnaphthalene sulfonates. , Alkylphenoxypolyoxyethylenepropyl sulfonates, polyoxyethylenearyl ether sulfate esters, polyoxyethylene alkyl sulfophenyl ether salts, N-methyl-N-oleyl taurine sodiums, N-alkyl sulfosuccinic acid monoamide disodium salts, Petroleum sulfonates, sulfated castor oil, sulfated cow fat oil, fatty acid alkyl ester sulfates, alkyl sulfates, polyoxyethylene alkyl ether sulfates, fatty acid monoglyceride sulfates, polyoxyethylene alkyl phenyl ether sulfate Ester salts, polyoxyethylene styrylphenyl ether sulfate esters, alkyl phosphoric acid ester salts, polyoxyethylene alkyl ether phosphoric acid ester salts, polyoxyethylene alkyl phenyl ether phosphoric acid ester salts, partially saponified products of styrene-maleic anhydride copolymer , Partially saponified products of olefin-maleic anhydride copolymer, naphthalene sulfonate formalin condensates and the like. Among these, dialkyl sulfosuccinates, alkyl sulfate esters, polyoxyethylene aryl ether sulfate esters, and alkylnaphthalene sulfonates are particularly preferably used.
Specifically, at least one anionic surfactant selected from the group consisting of anionic surfactants represented by the formula (IA) or the formula (IB) can be mentioned.
Figure JPOXMLDOC01-appb-C000085
Figure JPOXMLDOC01-appb-C000085
 上記式(I-A)中、Rは、直鎖又は分岐鎖の炭素原子数1~20のアルキル基を表し;pは0、1又は2を表し;Arは炭素原子数6~10のアリール基を表し;qは、1、2又は3を表し;M は、Na、K、Li又はNH を表す。pが2の場合、複数存在するRは互いに同じでも異なっていてもよい。
 上記式(I-B)中、Rは、直鎖又は分岐鎖の炭素原子数1~20のアルキル基を表し;mは0、1又は2を表し;Arは炭素原子数6~10のアリール基を表し;Yは単結合又は炭素原子数1~10のアルキレン基を表し;Rは、直鎖又は分岐鎖の炭素原子数1~5のアルキレン基を表し;nは1~100の整数を表し;M は、Na、K、Li又はNH を表す。mが2の場合、複数存在するRは互いに同じでも異なっていてもよく;nが2以上の場合には、複数存在するRは互いに同じでも異なっていてもよい。
In the above formula (IA), R 1 represents an alkyl group having 1 to 20 carbon atoms in a linear or branched chain; p represents 0, 1 or 2; Ar 1 represents 6 to 10 carbon atoms. It represents an aryl group; q represents 1, 2 or 3; M 1 + is, Na +, K +, representative of the Li + or NH 4 +. When p is 2, a plurality of R 1s may be the same or different from each other.
In the above formula (IB), R 2 represents an alkyl group having 1 to 20 carbon atoms in a linear or branched chain; m represents 0, 1 or 2; Ar 2 represents 6 to 10 carbon atoms. Represents an aryl group of; Y represents a single bond or an alkylene group having 1 to 10 carbon atoms; R 3 represents a linear or branched alkylene group having 1 to 5 carbon atoms; n represents 1 to 100. It represents an integer; M 2 + is, Na +, K +, representative of the Li + or NH 4 +. When m is 2, the plurality of R 2s may be the same or different from each other; when n is 2 or more, the plurality of R 3s may be the same or different from each other.
 上記式(I-A)及び式(I-B)中、R及びRの好ましい例としては、CH、C、C、又はCが挙げられる。また、Rの好ましい例としては、それぞれ-CH-、-CHCH-、又は-CHCHCH-、-CHCH(CH)-が挙げられ、より好ましい例としては-CHCH-が挙げられる。また、p及びmは0又は1であることが好ましく、pは、0であることが特に好ましい。Yは単結合であることが好ましい。また、nは1~20の整数であることが好ましい。 In the above formulas (IA) and (IB), preferable examples of R 1 and R 2 include CH 3 , C 2 H 5 , C 3 H 7 , or C 4 H 9 . Preferred examples of R 3 are each -CH 2 -, - CH 2 CH 2 -, or -CH 2 CH 2 CH 2 -, - CH 2 CH (CH 3) - and the like, more preferable examples Is -CH 2 CH 2- . Further, p and m are preferably 0 or 1, and p is particularly preferably 0. Y is preferably a single bond. Further, n is preferably an integer of 1 to 20.
 式(I-A)、又は式(I-B)で表される化合物の具体例としては以下の化合物が挙げられる。 Specific examples of the compound represented by the formula (IA) or the formula (IB) include the following compounds.
Figure JPOXMLDOC01-appb-C000086
Figure JPOXMLDOC01-appb-C000086
 上記アニオン性界面活性剤は、高分子化合物(アニオン高分子界面活性剤)であることが好ましい。上記態様によれば、面状に優れる。上記高分子化合物は、親水性基としてアニオン性基の少なくとも1種を含むものであれば特に制限はない。
 アニオン性基としては、スルホン酸基、硫酸基、カルボキシ基が挙げられる。中でも、スルホン酸基が好ましい。
 これらのアニオン性基は塩を構成していてもよい。上記塩は、無機カチオンとの塩であっても、有機カチオンとの塩であってもよい。
 無機カチオンとしては、リチウムカチオン、ナトリウムカチオン、カリウムカチオン、カルシウムカチオン、マグネシウムカチオンなどが挙げられる。リチウムカチオン、ナトリウムカチオン、カリウムカチオンが好ましく、ナトリウムカチオン、カリウムカチオンがより好ましい。
 有機カチオンとしては、アンモニウム(NH )、第四級アンモニウム、第四級ピリジニウム、第四級ホスホニウムなどが挙げられる。アンモニウム、第四級アンモニウム、第四級ピリジニウムが好ましく、第四級アンモニウムがより好ましい。
 上記高分子化合物としては、分子内にアニオン性基を有する単量体の重合体、分子内にアニオン性基を有する単量体の重合体と他の1種以上の単量体との共重合体、又は、アニオン性基を有さない高分子に後から親水性基を導入した高分子等が挙げられる。
 分子内にアニオン性基を有する単量体としては、例えば、アクリル酸、メタクリル酸、マレイン酸、イタコン酸、スチレンスルホン酸、スチレンスルホン酸ナトリウム、α-メチルスチレンスルホン酸などのスルホン酸基を有するスチレン誘導体、無水マレイン酸、ビニルスルホン酸、アリルスルホン酸ナトリウム、メタリルスルホン酸ナトリウム、イソプレンスルホン酸ナトリウム、3-ビニルオキシプロパンスルホン酸などのオレフィンスルホン酸、2-アクリルアミド-2-メチルプロパンスルホン酸、2-アクリルアミド-2-メチルプロパンスルホン酸ナトリウムなどのスルホン酸基を有するアクリルアミド誘導体、2-スルホエチルメタクリレートナトリウムなどの(メタ)アクリレート誘導体、ブタジエンスルホン酸などのジエンスルホン酸、ナフタレンスルホン酸などが挙げられる。上記単量体の中でも、エッジ汚れ防止性能の観点から、スルホン酸基を有するスチレン誘導体、又は、スルホン酸基を有するアクリルアミド誘導体が好ましく、4-スチレンスルホン酸ナトリウム又は2-アクリルアミド-2-メチルプロパンスルホン酸ナトリウムがより好ましい。
 なお、上記アニオン性基を有する単量体と、後述する分子内にリン酸エステル基を有する単量体との共重合体はアニオン性界面活性剤ではなくリン酸化合物に、後述する分子内にホスホン酸エステル基を有する単量体との共重合体はアニオン性界面活性剤ではなくホスホン酸化合物に、それぞれ該当するものとする。
 上記高分子化合物としては、スチレン-無水マレイン酸共重合体の部分ケン化物類、多核芳香族化合物を含むスルホン化芳香族化合物のホルマリン縮合物(特に、ナフタレンスルホン酸ナトリウム塩ホルマリン縮合物類)、エチレン-無水マレイン酸共重合体の部分ケン化物類、ポリアクリル酸のナトリウム塩、ポリスチレンスルホン酸のナトリウム塩、ポリ2-アクリルアミド-2-メチルプロパンスルホン酸のナトリウム塩、等を挙げることができる。
 上記高分子化合物の重量平均分子量は、2,000~1,000,000が好ましく、3,000~700,000がより好ましく、5,000~500,000が特に好ましい。
The anionic surfactant is preferably a polymer compound (anionic polymer surfactant). According to the above aspect, the surface shape is excellent. The polymer compound is not particularly limited as long as it contains at least one anionic group as a hydrophilic group.
Examples of the anionic group include a sulfonic acid group, a sulfuric acid group and a carboxy group. Of these, a sulfonic acid group is preferable.
These anionic groups may constitute salts. The salt may be a salt with an inorganic cation or a salt with an organic cation.
Examples of the inorganic cation include lithium cation, sodium cation, potassium cation, calcium cation, magnesium cation and the like. Lithium cations, sodium cations and potassium cations are preferable, and sodium cations and potassium cations are more preferable.
The organic cation, ammonium (NH 4 +), quaternary ammonium, quaternary pyridinium, as a quaternary phosphonium and the like. Ammonium, quaternary ammonium, and quaternary pyridinium are preferable, and quaternary ammonium is more preferable.
The polymer compound includes a polymer of a monomer having an anionic group in the molecule, a polymer of a monomer having an anionic group in the molecule, and a common weight of one or more other monomers. Examples thereof include a polymer obtained by introducing a hydrophilic group into a polymer having no anionic group or a coalescence.
Examples of the monomer having an anionic group in the molecule include sulfonic acid groups such as acrylic acid, methacrylic acid, maleic acid, itaconic acid, styrene sulfonic acid, sodium styrene sulfonate, and α-methyl styrene sulfonic acid. Olefin sulfonic acid such as styrene derivative, maleic anhydride, vinyl sulfonic acid, sodium allyl sulfonic acid, sodium metalyl sulfonic acid, sodium isoprene sulfonic acid, 3-vinyloxypropane sulfonic acid, 2-acrylamide-2-methyl propane sulfonic acid , A acrylamide derivatives having a sulfonic acid group such as 2-acrylamide-2-methylpropanesulfonic acid, (meth) acrylate derivatives such as 2-sulfoethylmethacrylate, dienesulfonic acid such as butadienesulfonic acid, naphthalenesulfonic acid and the like. Can be mentioned. Among the above monomers, a styrene derivative having a sulfonic acid group or an acrylamide derivative having a sulfonic acid group is preferable from the viewpoint of edge stain prevention performance, and sodium 4-styrene sulfonate or 2-acrylamide-2-methylpropane. Sodium sulfonate is more preferred.
The copolymer of the above-mentioned monomer having an anionic group and the monomer having a phosphoric acid ester group in the molecule described later is not an anionic surfactant but a phosphoric acid compound, and the copolymer described later is contained in the molecule described later. It is assumed that the copolymer with the monomer having a phosphonate ester group corresponds to a phosphonic acid compound instead of an anionic surfactant.
Examples of the polymer compound include partially saponified products of a styrene-maleic anhydride copolymer, formalin condensates of sulfonated aromatic compounds containing polynuclear aromatic compounds (particularly, sodium sodium phthalene sulfonic acid salt formalin condensates), and the like. Examples thereof include partially saponified products of ethylene-maleic anhydride copolymer, sodium salt of polyacrylic acid, sodium salt of polystyrene sulfonic acid, sodium salt of poly2-acrylamide-2-methylpropanesulfonic acid, and the like.
The weight average molecular weight of the polymer compound is preferably 2,000 to 1,000,000, more preferably 3,000 to 700,000, and particularly preferably 5,000 to 500,000.
 また、非イオン性界面活性剤としては、ポリオキシエチレンアルキルエーテル類、ポリオキシエチレンアリールエーテル類、グリセリン脂肪酸部分エステル類、ソルビタン脂肪酸部分エステル類、ペンタエリスリトール脂肪酸部分エステル類、プロピレングリコールモノ脂肪酸エステル、ショ糖脂肪酸部分エステル、ポリオキシエチレンソルビタン脂肪酸部分エステル類、ポリオキシエチレンソルビトール脂肪酸部分エステル類、ポリエチレングリコール脂肪酸エステル類、ポリグリセリン脂肪酸部分エステル類、ポリオキシエチレングリセリン脂肪酸部分エステル類、脂肪酸ジエタノールアミド類、N,N-ビス-2-ヒドロキシアルキルアミン類、ポリオキシエチレンアルキルアミン、トリエタノールアミン脂肪酸エステル、トリアルキルアミンオキシドなどが挙げられる。その中でもポリオキシエチレンアリールエーテル類、ポリオキシエチレン-ポリオキシプロピレンブロック共重合体類等が好ましく用いられる。 Examples of nonionic surfactants include polyoxyethylene alkyl ethers, polyoxyethylene aryl ethers, glycerin fatty acid partial esters, sorbitan fatty acid partial esters, pentaerythritol fatty acid partial esters, and propylene glycol monofatty acid esters. Sucrose fatty acid partial esters, polyoxyethylene sorbitan fatty acid partial esters, polyoxyethylene sorbitol fatty acid partial esters, polyethylene glycol fatty acid esters, polyglycerin fatty acid partial esters, polyoxyethylene glycerin fatty acid partial esters, fatty acid diethanolamides , N, N-bis-2-hydroxyalkylamines, polyoxyethylene alkylamines, triethanolamine fatty acid esters, trialkylamine oxides and the like. Among them, polyoxyethylene aryl ethers, polyoxyethylene-polyoxypropylene block copolymers and the like are preferably used.
 その他の界面活性剤としては、例えば、ポリオキシエチレンナフチルエーテル、ポリオキシエチレンアルキルフェニルエーテル、ポリオキシエチレンラウリルエーテル、ポリオキシエチレンセチルエーテル、ポリオキシエチレンステアリルエーテル等のポリオキシエチレンアルキルエーテル類、ポリオキシエチレンステアレート等のポリオキシエチレンアルキルエステル類、ソルビタンモノラウレート、ソルビタンモノステアレート、ソルビタンジステアレート、ソルビタンモノオレエート、ソルビタンセスキオレエート、ソルビタントリオレエート等のソルビタンアルキルエステル類、グリセロールモノステアレート、グリセロールモノオレート等のモノグリセリドアルキルエステル類等の非イオン性界面活性剤が好ましく挙げられる。
 また、非イオン性界面活性剤は、高分子化合物であることが好ましい。上記高分子化合物の重量平均分子量は、2,000~1,000,000が好ましく、3,000~700,000がより好ましく、5,000~500,000が特に好ましい。
Examples of other surfactants include polyoxyethylene alkyl ethers such as polyoxyethylene naphthyl ether, polyoxyethylene alkylphenyl ether, polyoxyethylene lauryl ether, polyoxyethylene cetyl ether, and polyoxyethylene stearyl ether, and poly. Polyoxyethylene alkyl esters such as oxyethylene stearate, sorbitan alkyl esters such as sorbitan monolaurate, sorbitan monostearate, sorbitan distearate, sorbitan monooleate, sorbitan sesquioleate, sorbitan trioleate, glycerol mono Nonionic surfactants such as monoglyceride alkyl esters such as stearate and glycerol monoolate are preferred.
Further, the nonionic surfactant is preferably a polymer compound. The weight average molecular weight of the polymer compound is preferably 2,000 to 1,000,000, more preferably 3,000 to 700,000, and particularly preferably 5,000 to 500,000.
 非イオン性界面活性剤としては好ましくは、下記式(II-A)で表される界面活性剤、及び式(II-B)で表される界面活性剤が挙げられる。 Preferred examples of the nonionic surfactant include a surfactant represented by the following formula (II-A) and a surfactant represented by the formula (II-B).
Figure JPOXMLDOC01-appb-C000087
Figure JPOXMLDOC01-appb-C000087
 (上記式(II-A)中、R1は、水素原子又は炭素原子数1~100のアルキル基を表し、n及びmはそれぞれ0~100の整数を表し、n及びmの双方が0であることはない。
 上記式(II-B)中、R2は、水素原子又は炭素原子数1~100のアルキル基を表し、n及びmはそれぞれ0~100の整数を表し、n及びmの双方が0であることはない。)
(In the above formula (II-A), R 1 represents a hydrogen atom or an alkyl group having 1 to 100 carbon atoms, n and m represent integers of 0 to 100, respectively, and both n and m are 0. There is no such thing.
In the above formula (II-B), R 2 represents a hydrogen atom or an alkyl group having 1 to 100 carbon atoms, n and m represent integers of 0 to 100, respectively, and both n and m are 0. There is no such thing. )
 式(II-A)で表される化合物としては、ポリオキシエチレンフェニルエーテル、ポリオキシエチレンメチルフェニルエーテル、ポリオキシエチレンオクチルフェニルエーテル、ポリオキシエチレンノニルフェニルエーテル等が挙げられる。式(II-B)で表される化合物としては、ポリオキシエチレンナフチルエーテル、ポリオキシエチレンメチルナフチルエーテル、ポリオキシエチレンオクチルナフチルエーテル、ホリオキシエチレンノニルナフチルエーテル等が挙げられる。 Examples of the compound represented by the formula (II-A) include polyoxyethylene phenyl ether, polyoxyethylene methyl phenyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether and the like. Examples of the compound represented by the formula (II-B) include polyoxyethylene naphthyl ether, polyoxyethylene methyl naphthyl ether, polyoxyethylene octyl naphthyl ether, holioxyethylene nonyl naphthyl ether and the like.
 上記式(II-A)及び式(II-B)で表される化合物において、ポリオキシエチレン鎖の繰り返し単位数(n)は、好ましくは3~50、より好ましくは5~30である。ポリオキシプロピレン鎖の繰り返し単位数(m)は、好ましくは0~10、より好ましくは0~5である。ポリオキシエチレン部とポリオキシプロピレン部はランダムでもブロックの共重合体でもよい。
 上記式(II-A)及び式(II-B)で表される非イオン芳香族エーテル系界面活性剤は、単独又は2種類以上を組み合わせて使用される。
 下記に式(II-A)及び式(II-B)で表される化合物の具体例を示す。なお、下記例示化合物「Y-5」におけるオキシエチレン繰り返し単位及びオキシプロピレン繰り返し単位は、ランダム結合、及び、ブロック連結のいずれの態様をもとりうる。
In the compounds represented by the above formulas (II-A) and (II-B), the number of repeating units (n) of the polyoxyethylene chain is preferably 3 to 50, more preferably 5 to 30. The number of repeating units (m) of the polyoxypropylene chain is preferably 0 to 10, more preferably 0 to 5. The polyoxyethylene moiety and the polyoxypropylene moiety may be a random or block copolymer.
The nonionic aromatic ether-based surfactants represented by the above formulas (II-A) and (II-B) are used alone or in combination of two or more.
Specific examples of the compounds represented by the formulas (II-A) and (II-B) are shown below. The oxyethylene repeating unit and the oxypropylene repeating unit in the following exemplified compound "Y-5" may take any of a random bond and a block connection.
Figure JPOXMLDOC01-appb-C000088
Figure JPOXMLDOC01-appb-C000088
Figure JPOXMLDOC01-appb-C000089
Figure JPOXMLDOC01-appb-C000089
 上記エッジ親水化層は、両性界面活性剤を含むことが好ましい。
 両性界面活性剤としては、例えば、カルボキシベタイン類、アミノカルボン酸類、スルホベタイン類、アミノ硫酸エステル類、イミダゾリン類などが挙げられる。
 また、上記両性界面活性剤は高分子化合物(両性界面活性剤高分子)であることが好ましい。両性界面活性剤高分子としては、スルホベタイン系高分子、カルボキシベタイン系高分子、ホスホベタイン系高分子化合物が好ましく、例えば、特開2013-57747号公報、特開2012-194535号公報記載の化合物が挙げられる。
The edge hydrophilized layer preferably contains an amphoteric surfactant.
Examples of amphoteric surfactants include carboxybetaines, aminocarboxylic acids, sulfobetaines, aminosulfates, imidazolines and the like.
Further, the amphoteric surfactant is preferably a polymer compound (amphoteric surfactant polymer). As the amphoteric surfactant polymer, a sulfobetaine polymer, a carboxybetaine polymer, and a phosphobetaine polymer compound are preferable, and for example, the compounds described in JP2013-57747A and JP2012-194535A. Can be mentioned.
 上記界面活性剤のうち、機上現像の促進効果が高いアニオン性界面活性剤が特に好ましく使用されるが、これら界面活性剤は2種以上併用することもできる。例えば、互いに異なる2種以上のアニオン界面活性剤の併用やアニオン界面活性剤と非イオン界面活性剤の併用が好ましい。 Of the above-mentioned surfactants, anionic surfactants having a high effect of promoting on-machine development are particularly preferably used, but two or more of these surfactants can be used in combination. For example, the combined use of two or more kinds of anionic surfactants different from each other or the combined use of an anionic surfactant and a nonionic surfactant is preferable.
 ナフタレンスルホン酸ナトリウム、アルキルナフタレンスルホン酸ナトリウム、又は、ポリオキシエチレンアリールエーテルを用いることが好ましく、ナフタレンスルホン酸ナトリウム、又は、t-ブチルナフタレンスルホン酸ナトリウムを使用することが更に好ましい。 It is preferable to use sodium naphthalene sulfonate, sodium alkylnaphthalene sulfonate, or polyoxyethylene aryl ether, and it is more preferable to use sodium naphthalene sulfonate or sodium t-butyl naphthalene sulfonate.
 上記の界面活性剤の含有量は特に限定する必要はないが、エッジ親水化層の全質量に対し、1質量%~95質量%であることが好ましく、10質量%~90質量%であることがより好ましく、50質量%~90質量%であることが更に好ましい。界面活性剤の含有量が上記範囲内である場合、機上現像性が促進される。 The content of the above-mentioned surfactant is not particularly limited, but is preferably 1% by mass to 95% by mass and 10% by mass to 90% by mass with respect to the total mass of the edge hydrophilized layer. Is more preferable, and 50% by mass to 90% by mass is further preferable. When the content of the surfactant is within the above range, the on-machine developability is promoted.
 その他、カチオン性界面活性剤の従来公知のものを併用することができる。カチオン性界面活性剤としては、例えば、アルキルアミン塩類、第四級アンモニウム塩類、ポリオキシアルキルアミン塩類、ポリエチレンポリアミン誘導体などが挙げられる。 In addition, conventionally known cationic surfactants can be used in combination. Examples of the cationic surfactant include alkylamine salts, quaternary ammonium salts, polyoxyalkylamine salts, polyethylene polyamine derivatives and the like.
-リン酸化合物-
 親水化剤としては、リン酸化合物を使用することが好ましい。リン酸化合物としては、リン酸、メタリン酸、第一リン酸アンモニウム、第二リン酸アンモニウム、リン酸二水素ナトリウム、リン酸一水素ナトリウム、第一リン酸カリウム、第二リン酸カリウム、トリポリリン酸ナトリウム、ピロリン酸カリウム、ヘキサメタリン酸ナトリウムなどが挙げられる。中でも、リン酸二水素ナトリウム、リン酸一水素ナトリウム、ヘキサメタリン酸ナトリウムが好適に使用できる。
 リン酸化合物の含有量は、エッジ親水化層の全質量に対し、1質量%~80質量%が好ましく、10質量%~50質量%がより好ましい。
-Phosphoric acid compound-
As the hydrophilic agent, it is preferable to use a phosphoric acid compound. Examples of phosphoric acid compounds include phosphoric acid, metaphosphoric acid, ammonium monophosphate, ammonium dibasic phosphate, sodium dihydrogen phosphate, sodium monohydrogen phosphate, potassium monophosphate, potassium dibasic phosphate, and tripolyphosphoric acid. Examples thereof include sodium, potassium pyrophosphate, and sodium hexametaphosphate. Of these, sodium dihydrogen phosphate, sodium monohydrogen phosphate, and sodium hexametaphosphate can be preferably used.
The content of the phosphoric acid compound is preferably 1% by mass to 80% by mass, more preferably 10% by mass to 50% by mass, based on the total mass of the edge hydrophilic layer.
 リン酸化合物としてリン酸モノエステル化合物、リン酸ジエステル化合物が使用できる。
 リン酸化合物としては、高分子化合物を用いることが好ましく、リン酸モノエステル基を有する高分子化合物がより好ましい。上記態様によれば、支持体への塗布性に優れた親水化塗布液が得られる。
 上記高分子化合物としては、分子内にリン酸エステル基を有する単量体の1種以上からなる重合体又は、リン酸エステル基を含む1種以上の単量体及びリン酸エステル基を含まない1種以上の単量体との共重合体、リン酸エステル基を有さない高分子に後からリン酸エステル基を導入した高分子等が挙げられる。
 リン酸エステル基を有する単量体としては、モノ(2-メタクリロイルオキシエチル)アシッドホスフェート、モノ(2-メタクリロイルオキシポリオキシエチレングリコール)アシッドホスフェート、モノ(2-アクリロイルオキシエチル)アシッドホスフェート、3-クロロ-2-アシッドホスホオキシプロピルメタクリレート、アシッドホスホオキシポリオキシエチレングリコールモノメタクリレート、アシッドホスホオキシポリオキシプロピレングリコールメタクリレート、(メタ)アクリロイルオキシエチルアシッドホスフェート、(メタ)アクリロイルオキシプロピルアシッドホスフェート、(メタ)アクリロイルオキシ-2-ヒドロキシプロピルアシッドホスフェート、(メタ)アクリロイルオキシ-3-ヒドロキシプロピルアシッドホスフェート、(メタ)アクリロイルオキシ-3-クロロ-2-ヒドロキシプロピルアシッドホスフェート、アリルアルコールアシッドホスフェート、などが挙げられる。上記単量体の中でも、エッジ汚れ防止性能の観点から、モノ(2-アクリロイルオキシエチル)アシッドホスフェートが好ましく用いられる。代表的な製品としては、ライトエステルP-1M(共栄化学(株)製)、ホスマーPE(ユニケミカル(株)製)が挙げられる。
As the phosphoric acid compound, a phosphoric acid monoester compound and a phosphoric acid diester compound can be used.
As the phosphoric acid compound, it is preferable to use a polymer compound, and a polymer compound having a phosphoric acid monoester group is more preferable. According to the above aspect, a hydrophilic coating liquid having excellent coatability on a support can be obtained.
The polymer compound does not include a polymer composed of one or more of the monomers having a phosphate ester group in the molecule, or one or more monomers containing a phosphate ester group and a phosphate ester group. Examples thereof include a copolymer with one or more kinds of monomers, a polymer in which a phosphoric acid ester group is later introduced into a polymer having no phosphoric acid ester group, and the like.
Examples of the monomer having a phosphate ester group include mono (2-methacryloyloxyethyl) acid phosphate, mono (2-methacryloyloxypolyoxyethylene glycol) acid phosphate, mono (2-acryloyloxyethyl) acid phosphate, and 3-. Chloro-2-acid phosphooxypropyl methacrylate, acid phosphooxypolyoxyethylene glycol monomethacrylate, acid phosphooxypolyoxypropylene glycol methacrylate, (meth) acryloyloxyethyl acid phosphate, (meth) acryloyloxypropyl acid phosphate, (meth) Examples thereof include acryloyloxy-2-hydroxypropyl acid phosphate, (meth) acryloyloxy-3-hydroxypropyl acid phosphate, (meth) acryloyloxy-3-chloro-2-hydroxypropyl acid phosphate, and allyl alcohol acid phosphate. Among the above-mentioned monomers, mono (2-acryloyloxyethyl) acid phosphate is preferably used from the viewpoint of edge stain prevention performance. Typical products include Light Ester P-1M (manufactured by Kyoei Chemical Co., Ltd.) and Hosmer PE (manufactured by Unichemical Co., Ltd.).
 上記高分子化合物としては、リン酸エステル基を有する単量体の単独重合体、共重合体のどちらも用いられる。共重合体としては、例えば、リン酸エステル基を有する単量体と上記アニオン性基を有する単量体との共重合体や、リン酸エステル基を有する単量体とリン酸エステル基とアニオン性基のどちらも含まない単量体との共重合体が使用できる。
 上記高分子化合物の好ましい態様は、分子内にリン酸エステル基を有するモノマー単位の割合が、1モル%~100モル%、より好ましくは5モル%~100モル%、更に好ましくは10モル%~100モル%の、共重合体又は単独重合体である。
 リン酸エステル基とアニオン性基のどちらも含まない単量体としては、親水性基を有する単量体が好ましい。親水性基としては、例えば、ヒドロキシ基、アルキレンオキシド構造、アミノ基、アンモニウム基、アミド基、が挙げられ、中でも、ヒドロキシ基、アルキレンオキシド構造、アミド基が好ましく、炭素数2又は3のアルキレンオキシド単位を1~20個有するアルキレンオキシド構造がより好ましく、エチレンオキシド単位を2~10個有するポリエチレンオキシド構造が更に好ましい。例えば、2-ヒドロキシエチルアクリレート、エトキシジエチレングリコールアクリレート、メトキシトリエチレングリコールアクリレート、ポリ(オキシエチレン)メタクリレート、N-イソプロピルアクリルアミド、アクリルアミド、等が挙げられる。
 また、リン酸化合物として、上記分子内にリン酸エステル基を有する単量体と上記アニオン性基を有する単量体との共重合体を用いることが好ましい。上記態様によれば、塗布性が高く、エッジ汚れ防止性能が高い親水化塗布液が得られる。
 上記分子内にリン酸エステル基を有する単量体と上記アニオン性基を有する単量体との共重合体中、分子内にリン酸エステル基を有するモノマー単位の割合は、全モノマー単位に対し、2モル%~99モル%であることが好ましく、2モル%~80モル%であることがより好ましく、5モル%~70モル%であることが更に好ましく、5モル%~50モル%であることが特に好ましい。
 上記高分子化合物の重量平均分子量は、5,000~1,000,000が好ましく、7,000~700,000がより好ましく、10,000~500,000が特に好ましい。
As the polymer compound, both a homopolymer and a copolymer of a monomer having a phosphoric acid ester group are used. Examples of the copolymer include a copolymer of a monomer having a phosphoric acid ester group and the above-mentioned monomer having an anionic group, a monomer having a phosphoric acid ester group, a phosphoric acid ester group and an anion. A copolymer with a monomer containing neither of the sex groups can be used.
In a preferred embodiment of the above polymer compound, the proportion of the monomer unit having a phosphate ester group in the molecule is 1 mol% to 100 mol%, more preferably 5 mol% to 100 mol%, still more preferably 10 mol% to. It is a 100 mol% copolymer or homopolymer.
As the monomer containing neither a phosphoric acid ester group nor an anionic group, a monomer having a hydrophilic group is preferable. Examples of the hydrophilic group include a hydroxy group, an alkylene oxide structure, an amino group, an ammonium group and an amide group. Among them, a hydroxy group, an alkylene oxide structure and an amide group are preferable, and an alkylene oxide having 2 or 3 carbon atoms is preferable. An alkylene oxide structure having 1 to 20 units is more preferable, and a polyethylene oxide structure having 2 to 10 ethylene oxide units is further preferable. For example, 2-hydroxyethyl acrylate, ethoxydiethylene glycol acrylate, methoxytriethylene glycol acrylate, poly (oxyethylene) methacrylate, N-isopropylacrylamide, acrylamide, and the like can be mentioned.
Further, as the phosphoric acid compound, it is preferable to use a copolymer of the monomer having a phosphoric acid ester group in the molecule and the monomer having the anionic group. According to the above aspect, a hydrophilic coating liquid having high coatability and high edge stain prevention performance can be obtained.
The ratio of the monomer unit having a phosphoric acid ester group in the molecule to the total monomer unit in the copolymer of the monomer having a phosphoric acid ester group in the molecule and the monomer having an anionic group is , 2 mol% to 99 mol%, more preferably 2 mol% to 80 mol%, further preferably 5 mol% to 70 mol%, and 5 mol% to 50 mol%. It is particularly preferable to have.
The weight average molecular weight of the polymer compound is preferably 5,000 to 1,000,000, more preferably 7,000 to 700,000, and particularly preferably 10,000 to 500,000.
-ホスホン酸化合物-
 親水化剤としては、ホスホン酸化合物を使用することが好ましい。ホスホン酸化合物としては、エチルホスホン酸、プロピルホスホン酸、i-プロピルホスホン酸、ブチルホスホン酸、ヘキシルホスホン酸、オクチルホスホン酸、ドデシルホスホン酸、オクタデシルホスホン酸、2-ヒドロキシエチルホスホン酸及びこれらのナトリウム塩又はカリウム塩、メチルホスホン酸メチル、エチルホスホン酸メチル、2-ヒドロキシエチルホスホン酸メチルなどのアルキルホスホン酸モノアルキルエステル及びこれらのナトリウム塩又はカリウム塩、メチレンジホスホン酸、エチレンジホスホン酸等のアルキレンジホスホン酸及びこれらのナトリウム塩又はカリウム塩、ポリビニルホスホン酸が挙げられる。
 中でも、ポリビニルホスホン酸を用いることが好ましい。
 ホスホン酸化合物の含有量は、エッジ親水化層の全質量に対し、1質量%~80質量%が好ましく、10質量%~50質量%がより好ましい。
-Phosphonate compound-
As the hydrophilic agent, it is preferable to use a phosphonic acid compound. Phosphonate compounds include ethylphosphonic acid, propylphosphonic acid, i-propylphosphonic acid, butylphosphonic acid, hexylphosphonic acid, octylphosphonic acid, dodecylphosphonic acid, octadecylphosphonic acid, 2-hydroxyethylphosphonic acid and sodiums thereof. Alkylphosphonic acid monoalkyl esters such as salts or potassium salts, methyl methylphosphonates, methyl ethylphosphonates, and methyl 2-hydroxyethylphosphonates and arches such as sodium salts or potassium salts thereof, methylene diphosphonic acid, ethylene diphosphonic acid, etc. Examples thereof include range phosphonic acid and sodium or potassium salts thereof, polyvinyl phosphonic acid.
Above all, it is preferable to use polyvinylphosphonic acid.
The content of the phosphonic acid compound is preferably 1% by mass to 80% by mass, more preferably 10% by mass to 50% by mass, based on the total mass of the edge hydrophilized layer.
 ホスホン酸化合物としては、高分子化合物が好ましい。上記態様により、支持体への塗布性に優れた親水化塗布液が得られる。
 ホスホン酸化合物として好ましい高分子化合物は、ポリビニルホスホン酸の他、分子内にホスホン酸基又はホスホン酸モノエステル基を有する1種以上の単量体からなる重合体又は、ホスホン酸基又はホスホン酸モノエステル基を有する1種以上の単量体及びホスホン酸基又はホスホン酸モノエステル基を含まない1種以上の単量体との共重合体、等が挙げられる。
 ホスホン酸基を有する単量体としては、ビニルホスホン酸、エチルホスホン酸モノビニルエステル、アクリロイルアミノメチルホスホン酸、3-メタクリロイルオキシプロピルホスホン酸などが挙げられる。
 上記高分子化合物としては、ホスホン酸エステル基を有する単量体の単独重合体、共重合体のどちらも用いられる。共重合体としては、例えば、ホスホン酸エステル基を有する単量体と上記アニオン性基を有する単量体との共重合体や、リン酸エステル基を有する単量体とリン酸エステル基とアニオン性基のどちらも含まない単量体との共重合体が使用できる。
 ホスホン酸エステル基とアニオン性基のどちらも含まない単量体としては、親水性基を有する単量体が好ましい。親水性基としては、例えば、ヒドロキシ基、アルキレンオキシド構造、アミノ基、アンモニウム基、アミド基、が挙げられ、中でも、ヒドロキシ基、アルキレンオキシド構造、アミド基が好ましく、炭素数2又は3のアルキレンオキシド単位を1~20個有するアルキレンオキシド構造がより好ましく、エチレンオキシド単位を2~10個有するポリエチレンオキシド構造が更に好ましい。例えば、2-ヒドロキシエチルアクリレート、エトキシジエチレングリコールアクリレート、メトキシトリエチレングリコールアクリレート、ポリ(オキシエチレン)メタクリレート、N-イソプロピルアクリルアミド、アクリルアミド、などが挙げられる。
 上記高分子化合物の好ましい態様は、分子内にリン酸エステル基を有するモノマー単位の割合が、1モル%~100モル%、より好ましくは3モル%~100モル%、更に好ましくは5モル%~100モル%の、共重合体あるいは単独重合体である。
 また、ホスホン酸化合物として、上記分子内にホスホン酸エステル基を有する単量体と上記アニオン性基を有する単量体との共重合体を用いることもできる。上記態様によれば、塗布性が高く、エッジ汚れ防止性能が高い親水化塗布液が得られるため好ましい。
 上記分子内にホスホン酸エステル基を有する単量体と上記アニオン性基を有する単量体との共重合体中、分子内にホスホン酸エステル基を有するモノマー単位の割合は、全モノマー単位に対し、2モル%~99モル%であることが好ましく、2モル%~80モル%であることがより好ましく、5モル%~70モル%であることが更に好ましく、10モル%~50モル%であることが特に好ましい。
 上記高分子化合物の重量平均分子量は、5,000~1,000,000が好ましく、7,000~700,000がより好ましく、10,000~500,000が特に好ましい。
As the phosphonic acid compound, a polymer compound is preferable. According to the above aspect, a hydrophilic coating liquid having excellent coatability on a support can be obtained.
A preferable polymer compound as a phosphonic acid compound is a polymer composed of one or more monomers having a phosphonic acid group or a phosphonic acid monoester group in the molecule, or a phosphonic acid group or a phosphonic acid monoester, in addition to polyvinylphosphonic acid. Examples thereof include a copolymer with one or more monomers having an ester group and one or more monomers not containing a phosphonic acid group or a phosphonic acid monoester group.
Examples of the monomer having a phosphonic acid group include vinylphosphonic acid, ethylphosphonic acid monovinyl ester, acryloylaminomethylphosphonic acid, and 3-methacryloyloxypropylphosphonic acid.
As the polymer compound, both a homopolymer and a copolymer of a monomer having a phosphonic acid ester group are used. Examples of the copolymer include a copolymer of a monomer having a phosphonic acid ester group and the above-mentioned monomer having an anionic group, a monomer having a phosphoric acid ester group, a phosphoric acid ester group, and an anion. A copolymer with a monomer containing neither of the sex groups can be used.
As the monomer containing neither a phosphonic acid ester group nor an anionic group, a monomer having a hydrophilic group is preferable. Examples of the hydrophilic group include a hydroxy group, an alkylene oxide structure, an amino group, an ammonium group and an amide group. Among them, a hydroxy group, an alkylene oxide structure and an amide group are preferable, and an alkylene oxide having 2 or 3 carbon atoms is preferable. An alkylene oxide structure having 1 to 20 units is more preferable, and a polyethylene oxide structure having 2 to 10 ethylene oxide units is further preferable. For example, 2-hydroxyethyl acrylate, ethoxydiethylene glycol acrylate, methoxytriethylene glycol acrylate, poly (oxyethylene) methacrylate, N-isopropylacrylamide, acrylamide, and the like can be mentioned.
In a preferred embodiment of the above polymer compound, the proportion of the monomer unit having a phosphate ester group in the molecule is 1 mol% to 100 mol%, more preferably 3 mol% to 100 mol%, still more preferably 5 mol% to. It is a 100 mol% copolymer or homopolymer.
Further, as the phosphonic acid compound, a copolymer of the monomer having a phosphonic acid ester group in the molecule and the monomer having the anionic group can also be used. According to the above aspect, a hydrophilic coating liquid having high coatability and high edge stain prevention performance can be obtained, which is preferable.
The ratio of the monomer unit having a phosphonic acid ester group in the molecule to the total monomer unit in the copolymer of the monomer having a phosphonic acid ester group in the molecule and the monomer having an anionic group is , 2 mol% to 99 mol%, more preferably 2 mol% to 80 mol%, further preferably 5 mol% to 70 mol%, and 10 mol% to 50 mol%. It is particularly preferable to have.
The weight average molecular weight of the polymer compound is preferably 5,000 to 1,000,000, more preferably 7,000 to 700,000, and particularly preferably 10,000 to 500,000.
-水溶性樹脂-
 親水化剤としては、水溶性樹脂を含有することが好ましい。
 水溶性樹脂としては、多糖類として分類される水溶性樹脂、ポリビニルアルコール、ポリビニルピロリドン、ポリアクリルアミド及びその共重合体、ビニルメチルエーテル/無水マレイン酸共重合体、酢酸ビニル/無水マレイン酸共重合体、スチレン/無水マレイン酸共重合体等を挙げることができる。
 多糖類としては、澱粉誘導体(例えばデキストリン、酵素分解デキストリン、ヒドロキシプロピル化澱粉、カルボキシメチル化澱粉、リン酸エステル化澱粉、ポリオキシアルキレングラフト化澱粉、サイクロデキストリン)、セルロース類(例えばカルボキシメチルセルロース、カルボキシエチルセルロース、メチルセルロース、ヒドロキシプロピルセルロース、メチルプロピルセルロース等)、カラギーナン、アルギン酸、グァーガム、ローカストビーンガム、キサンタンガム、アラビアガム、大豆多糖類などを挙げることができる。
 中でもデキストリン、ポリオキシアルキレングラフト化澱粉といった澱粉誘導体、アラビアガム、カルボキシメチルセルロース、大豆多糖類などが好ましく用いられる。
-Water-soluble resin-
The hydrophilic agent preferably contains a water-soluble resin.
Water-soluble resins include water-soluble resins classified as polysaccharides, polyvinyl alcohol, polyvinylpyrrolidone, polyacrylamide and copolymers thereof, vinyl methyl ether / maleic anhydride copolymer, vinyl acetate / maleic anhydride copolymer. , Styrene / maleic anhydride copolymer and the like.
Examples of polysaccharides include starch derivatives (eg, dextrin, enzymatically decomposed dextrin, hydroxypropylated starch, carboxymethylated starch, phosphate esterified starch, polyoxyalkylene grafted starch, cyclodextrin), celluloses (eg, carboxymethyl cellulose, carboxy). Ethyl cellulose, methyl cellulose, hydroxypropyl cellulose, methyl propyl cellulose, etc.), carrageenan, alginic acid, guar gum, locust bean gum, xanthan gum, arabic gum, soybean polysaccharide and the like can be mentioned.
Among them, starch derivatives such as dextrin and polyoxyalkylene grafted starch, gum arabic, carboxymethyl cellulose, soybean polysaccharide and the like are preferably used.
 これらの水溶性樹脂は2種以上組み合わせても使用できる。
 水溶性樹脂の含有量は、エッジ親水化層の全質量に対し、好ましくは5質量%~40質量%、より好ましくは10質量%~30質量%の範囲で含有させることができる。この範囲内で、塗布性に優れ、良好な親水化保護膜が得られる。
These water-soluble resins can be used in combination of two or more.
The content of the water-soluble resin can be preferably in the range of 5% by mass to 40% by mass, more preferably 10% by mass to 30% by mass, based on the total mass of the edge hydrophilized layer. Within this range, a hydrophilic protective film having excellent coatability can be obtained.
 上記親水化剤は、1種単独で使用してもよいが、2種以上の親水化剤を組み合わせて使用することが好ましく、1種~4種の親水化剤を組み合わせて使用することがより好ましく、1種~3種の親水化剤を組み合わせて使用することが更に好ましく、2種の親水化剤を組み合わせて使用することが特に好ましい
 複数の親水化剤を組み合わせて使用する場合、界面活性剤とリン酸化合物又はホスホン酸化合物とを組み合わせて使用することが好ましく、アニオン性界面活性剤とリン酸化合物又はホスホン酸化合物とを組み合わせて使用することがより好ましい。
 また、親水化剤を1種単独で使用する場合は、分子内にリン酸エステル基又はホスホン酸エステル基を有する単量体と分子内にアニオン性基を有する単量体との共重合体を使用することが好ましく、分子内にリン酸エステル基を有する単量体と分子内にアニオン性基を有する単量体との共重合体を使用することがより好ましく、分子内にリン酸エステル基を有する単量体と分子内にスルホン酸基を有する単量体との共重合体を使用することが更に好ましい。
The above-mentioned hydrophilizing agent may be used alone, but it is preferable to use two or more kinds of hydrophilizing agents in combination, and it is more preferable to use one to four kinds of hydrophilizing agents in combination. Preferably, it is more preferable to use one to three kinds of hydrophilic agents in combination, and it is particularly preferable to use two kinds of hydrophilic agents in combination. When a plurality of hydrophilic agents are used in combination, surfactant is used. It is preferable to use the agent in combination with a phosphoric acid compound or a phosphonic acid compound, and more preferably to use an anionic surfactant in combination with a phosphoric acid compound or a phosphonic acid compound.
When one kind of hydrophilic agent is used alone, a copolymer of a monomer having a phosphoric acid ester group or a phosphonic acid ester group in the molecule and a monomer having an anionic group in the molecule is used. It is preferable to use a copolymer of a monomer having a phosphate ester group in the molecule and a monomer having an anionic group in the molecule, and it is more preferable to use a phosphoric acid ester group in the molecule. It is more preferable to use a copolymer of a monomer having a sulfonic acid group and a monomer having a sulfonic acid group in the molecule.
-可塑剤-
 上記エッジ親水化層には、可塑剤を含有させることができる。
 可塑剤としては、例えばジブチルフタレート、ジヘプチルフタレート、ジ-n-オクチルフタレート、ジ(2-エチルヘキシル)フタレート、ジノニルフタレート、ジデシルフタレート、ジラウリルフタレート、ブチルベンジルフタレートなどのフタル酸ジエステル類、例えばジオクチルアジペート、ブチルグリコールアジペート、ジオクチルアゼレート、ジブチルセバケート、ジ(2-エチルヘキシル)セバケート、ジオクチルセバケートなどの脂肪族二塩基酸エステル類、例えばエポキシ化大豆油などのエポキシ化トリグリセリド類、例えばトリクレジルフォスフェート、トリオクチルフォスフェート、トリスクロルエチルフォスフェートなどの燐酸エステル類、例えば安息香酸ベンジルなどの安息香酸エステル類などの凝固点が15℃以下の可塑剤が含まれる。
-Plasticizer-
The edge hydrophilic layer can contain a plasticizer.
Examples of the plasticizer include phthalates such as dibutylphthalate, diheptylphthalate, di-n-octylphthalate, di (2-ethylhexyl) phthalate, dinonylphthalate, didecylphthalate, dilaurylphthalate, and butylbenzylphthalate. Aliphatic dibasic acid esters such as dioctyl adipate, butyl glycol adipate, dioctyl azelate, dibutyl sebacate, di (2-ethylhexyl) sebacate, dioctyl sebacate, eg epoxidized triglycerides such as epoxidized soybean oil, eg Includes plasticizers having a freezing point of 15 ° C. or lower, such as phosphoric acid esters such as tricresyl phosphate, trioctyl phosphate, trischloroethyl phthalate, and benzoic acid esters such as benzyl benzoate.
 可塑剤は1種のみ用いてもよいし、2種以上を併用することもできる。
 可塑剤の含有量は、エッジ親水化層の全質量に対し、0質量%を超え10質量%以下が好ましく、0質量%を超え5質量%以下がより好ましい。
Only one type of plasticizer may be used, or two or more types may be used in combination.
The content of the plasticizer is preferably more than 0% by mass and 10% by mass or less, and more preferably more than 0% by mass and 5% by mass or less with respect to the total mass of the edge hydrophilized layer.
-その他の任意成分-
 上記エッジ親水化層は、上記成分の他に、硝酸塩、硫酸塩などの無機塩、防腐剤、消泡剤等を含有できる。
 また、上記エッジ親水化層は、上述したミクロゲル等の粒子を含むことも好ましい。
 無機塩としては、例えば硝酸マグネシウム、硝酸ナトリウム、硝酸カリウム、硝酸アンモニウム、硫酸ナトリウム、硫酸カリウム、硫酸アンモニウム、硫酸水素ナトリウム、硫酸ニッケル等が挙げられる。
 防腐剤としては、フェノール又はその誘導体、ホルマリン、イミダゾール誘導体、デヒドロ酢酸ナトリウム、4-イソチアゾリン-3-オン誘導体、ベンゾイソチアゾリン-3-オン、ベンズトリアゾール誘導体、アミジングアニジン誘導体、四級アンモニウム塩類、ピリジン、キノリン、グアニジン等の誘導体、ダイアジン、トリアゾール誘導体、オキサゾール、オキサジン誘導体、ニトロブロモアルコール系の2-ブロモ-2-ニトロプロパン-1,3-ジオール、1,1-ジブロモ-1-ニトロ-2-エタノール、1,1-ジブロモ-1-ニトロ-2-プロパノール等が挙げられる。
 消泡剤としては一般的なシリコーン系の自己乳化タイプ、乳化タイプ、界面活性剤非イオン系のHLB値が5以下等の化合物を使用することができる。
-Other optional ingredients-
In addition to the above components, the edge hydrophilic layer can contain inorganic salts such as nitrates and sulfates, preservatives, antifoaming agents and the like.
Further, it is also preferable that the edge hydrophilic layer contains particles such as the above-mentioned microgel.
Examples of the inorganic salt include magnesium nitrate, sodium nitrate, potassium nitrate, ammonium nitrate, sodium sulfate, potassium sulfate, ammonium sulfate, sodium hydrogen sulfate, nickel sulfate and the like.
Preservatives include phenol or derivatives thereof, formalin, imidazole derivatives, sodium dehydroacetate, 4-isothiazolin-3-one derivatives, benzoisothiazolin-3-one, benztriazole derivatives, amizing anidine derivatives, quaternary ammonium salts, pyridine, etc. Derivatives such as quinoline and guanidine, diazine, triazole derivative, oxazole, oxazine derivative, nitrobromo alcohol-based 2-bromo-2-nitropropane-1,3-diol, 1,1-dibromo-1-nitro-2-ethanol , 1,1-Dibromo-1-nitro-2-propanol and the like.
As the defoaming agent, a general silicone-based self-emulsifying type, emulsifying type, or surfactant nonionic compound having an HLB value of 5 or less can be used.
(平版印刷版の作製方法、及び、平版印刷方法)
 本開示に係る平版印刷版原版を画像露光して現像処理を行うことで平版印刷版を作製することができる。
 本開示に係る平版印刷版の作製方法は、本開示に係る平版印刷版原版を画像様に露光する工程(以下、「露光工程」ともいう。)と、印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去する工程(以下、「機上現像工程」ともいう。)と、を含むことが好ましい。
 本開示に係る平版印刷方法は、本開示に係る平版印刷版原版を画像様に露光する工程(露光工程)と、印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去し平版印刷版を作製する工程(機上現像工程)と、得られた平版印刷版により印刷する工程(印刷工程)と、を含むことが好ましい。
 以下、本開示に係る平版印刷版の作製方法、及び、本開示に係る平版印刷方法について、各工程の好ましい態様を順に説明する。なお、本開示に係る平版印刷版原版は、現像液によっても現像可能である。
 以下、平版印刷版の作製方法における露光工程及び機上現像工程について説明するが、本開示に係る平版印刷版の作製方法における露光工程と、本開示に係る平版印刷方法における露光工程とは同様の工程であり、本開示に係る平版印刷版の作製方法における機上現像工程と、本開示に係る平版印刷方法における機上現像工程とは同様の工程である。
 また、上記最外層は、機上現像時において、一部は除去され、一部は画像部の表面に残留又は画像部の内部に印刷インキにより浸透しているものと推定している。
(Planographic printing plate manufacturing method and lithographic printing method)
A lithographic printing plate can be produced by image-exposing the lithographic printing plate original plate according to the present disclosure and performing development processing.
The method for producing a lithographic printing plate according to the present disclosure comprises a step of exposing the lithographic printing plate original plate according to the present disclosure to an image (hereinafter, also referred to as an “exposure step”), and a group consisting of printing ink and dampening water. It is preferable to include a step of supplying at least one of the selected ones and removing the image recording layer of the non-image portion on the printing machine (hereinafter, also referred to as “on-machine development step”).
The lithographic printing method according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image (exposure step) and printing by supplying at least one selected from the group consisting of printing ink and dampening water. It is preferable to include a step of removing the image recording layer of the non-image portion on the machine to prepare a lithographic printing plate (on-machine development step) and a step of printing with the obtained lithographic printing plate (printing step).
Hereinafter, preferred embodiments of each step will be described in order with respect to the method for producing a lithographic printing plate according to the present disclosure and the lithographic printing method according to the present disclosure. The lithographic printing plate original plate according to the present disclosure can also be developed with a developing solution.
Hereinafter, the exposure step and the on-machine development step in the lithographic printing plate manufacturing method will be described, but the exposure step in the lithographic printing plate manufacturing method according to the present disclosure and the exposure step in the lithographic printing method according to the present disclosure are the same. It is a step, and the on-machine development step in the method for producing a lithographic printing plate according to the present disclosure and the on-machine development step in the lithographic printing method according to the present disclosure are the same steps.
Further, it is estimated that a part of the outermost layer is removed during on-machine development, and a part of the outermost layer remains on the surface of the image portion or permeates into the inside of the image portion by printing ink.
<露光工程>
 本開示に係る平版印刷版の作製方法は、本開示に係る平版印刷版原版を画像様に露光し、露光部と未露光部とを形成する露光工程を含むことが好ましい。本開示に係る平版印刷版原版は、線画像、網点画像等を有する透明原画を通してレーザー露光するかデジタルデータによるレーザー光走査等で画像様に露光されることが好ましい。
 光源の波長は750nm~1,400nmが好ましく用いられる。波長750nm~1,400nmの光源としては、赤外線を放射する固体レーザー及び半導体レーザーが好適である。赤外線レーザーに関しては、出力は100mW以上であることが好ましく、1画素当たりの露光時間は20マイクロ秒以内であるのが好ましく、また照射エネルギー量は10mJ/cm~300mJ/cmであるのが好ましい。また、露光時間を短縮するためマルチビームレーザーデバイスを用いることが好ましい。露光機構は、内面ドラム方式、外面ドラム方式、及びフラットベッド方式等のいずれでもよい。
 画像露光は、プレートセッターなどを用いて常法により行うことができる。機上現像の場合には、平版印刷版原版を印刷機に装着した後、印刷機上で画像露光を行ってもよい。
<Exposure process>
The method for producing a lithographic printing plate according to the present disclosure preferably includes an exposure step of exposing the lithographic printing plate original plate according to the present disclosure to an image to form an exposed portion and an unexposed portion. The planographic printing plate original plate according to the present disclosure is preferably exposed by laser exposure through a transparent original image having a line image, halftone dot image, or the like, or by laser light scanning with digital data or the like.
The wavelength of the light source is preferably 750 nm to 1,400 nm. As a light source having a wavelength of 750 nm to 1,400 nm, a solid-state laser and a semiconductor laser that emit infrared rays are suitable. Regarding the infrared laser, the output is preferably 100 mW or more, the exposure time per pixel is preferably 20 microseconds or less, and the irradiation energy amount is 10 mJ / cm 2 to 300 mJ / cm 2. preferable. Further, it is preferable to use a multi-beam laser device in order to shorten the exposure time. The exposure mechanism may be any of an inner drum method, an outer drum method, a flatbed method and the like.
Image exposure can be performed by a conventional method using a platesetter or the like. In the case of on-machine development, the lithographic printing plate original plate may be mounted on the printing machine and then the image may be exposed on the printing machine.
<機上現像工程>
 本開示に係る平版印刷版の作製方法は、印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去する機上現像工程を含むことが好ましい。
 以下に、機上現像方式について説明する。
<In-machine development process>
The method for producing a lithographic printing plate according to the present disclosure involves an on-machine development step of supplying at least one selected from the group consisting of printing ink and dampening water to remove an image recording layer in a non-image area on a printing machine. It is preferable to include it.
The on-machine development method will be described below.
〔機上現像方式〕
 機上現像方式においては、画像露光された平版印刷版原版は、印刷機上で油性インキと水性成分とを供給し、非画像部の画像記録層が除去されて平版印刷版が作製されることが好ましい。
 すなわち、平版印刷版原版を画像露光後、何らの現像処理を施すことなくそのまま印刷機に装着するか、あるいは、平版印刷版原版を印刷機に装着した後、印刷機上で画像露光し、ついで、油性インキと水性成分とを供給して印刷すると、印刷途上の初期の段階で、非画像部においては、供給された油性インキ及び水性成分のいずれか又は両方によって、未硬化の画像記録層が溶解又は分散して除去され、その部分に親水性の表面が露出する。一方、露光部においては、露光により硬化した画像記録層が、親油性表面を有する油性インキ受容部を形成する。最初に版面に供給されるのは、油性インキでもよく、水性成分でもよいが、水性成分が除去された画像記録層の成分によって汚染されることを防止する点で、最初に油性インキを供給することが好ましい。このようにして、平版印刷版原版は印刷機上で機上現像され、そのまま多数枚の印刷に用いられる。油性インキ及び水性成分としては、通常の平版印刷用の印刷インキ及び湿し水が好適に用いられる。
[In-machine development method]
In the on-machine development method, the image-exposed lithographic printing plate original plate supplies oil-based ink and water-based components on the printing machine, and the image recording layer in the non-image area is removed to produce a lithographic printing plate. Is preferable.
That is, either the flat plate printing plate original plate is mounted on the printing machine as it is without any development processing after the image exposure, or the flat plate printing plate original plate is mounted on the printing machine and then the image is exposed on the printing machine, and then When printing is performed by supplying an oil-based ink and a water-based component, in the non-image area, an uncured image recording layer is formed by either or both of the supplied oil-based ink and the water-based component in the initial stage of printing. It dissolves or disperses and is removed, exposing a hydrophilic surface in that area. On the other hand, in the exposed portion, the image recording layer cured by exposure forms an oil-based ink receiving portion having a lipophilic surface. The first supply to the printing plate may be an oil-based ink or a water-based component, but the oil-based ink is first supplied in terms of preventing contamination by the components of the image recording layer from which the water-based components have been removed. Is preferable. In this way, the lithographic printing plate original plate is developed on the printing machine and used as it is for printing a large number of sheets. As the oil-based ink and the water-based component, ordinary printing ink for lithographic printing and dampening water are preferably used.
 上記本開示に係る平版印刷版原版を画像露光するレーザーとしては、光源の波長は300nm~450nm又は750nm~1,400nmが好ましく用いられる。波長300nm~450nmの光源の場合は、この波長領域に吸収極大を有する増感色素を画像記録層に含有する平版印刷版原版が好ましく用いられ、波長750nm~1,400nmの光源は上述したものが好ましく用いられる。波長300nm~450nmの光源としては、半導体レーザーが好適である。 The wavelength of the light source is preferably 300 nm to 450 nm or 750 nm to 1,400 nm as the laser for image-exposing the lithographic printing plate original plate according to the present disclosure. In the case of a light source having a wavelength of 300 nm to 450 nm, a lithographic printing plate original plate containing a sensitizing dye having an absorption maximum in this wavelength region in the image recording layer is preferably used, and the light source having a wavelength of 750 nm to 1,400 nm is the above-mentioned one. It is preferably used. A semiconductor laser is suitable as a light source having a wavelength of 300 nm to 450 nm.
<現像液現像工程>
 本開示に係る平版印刷版の作製方法は、本開示に係る平版印刷版原版を画像様に露光する工程と、現像液により非画像部の画像記録層を除去し平版印刷版を作製する工程(「現像液現像工程」ともいう。)と、を含む方法であってもよい。
 また、本開示に係る平版印刷方法は、本開示に係る平版印刷版原版を画像様に露光する工程と、現像液により非画像部の画像記録層を除去し平版印刷版を作製する工程と、得られた平版印刷版により印刷する工程と、を含む方法であってもよい。
 現像液としては、公知の現像液を用いることができる。
 現像液のpHは、特に制限はなく、強アルカリ現像液であってもよいが、pH2~11の現像液が好ましく挙げられる。pH2~11の現像液としては、例えば、界面活性剤及び水溶性高分子化合物のうち少なくとも1種を含有する現像液が好ましく挙げられる。
 強アルカリ現像液を用いた現像処理においては、前水洗工程により保護層を除去し、次いでアルカリ現像を行い、後水洗工程でアルカリを水洗除去し、ガム液処理を行い、乾燥工程で乾燥する方法が挙げられる。
 また、界面活性剤又は水溶性高分子化合物を含有する上記現像液を用いる場合は、現像-ガム液処理を同時に行うことができる。よって、後水洗工程は特に必要とせず、1液で現像とガム液処理を行った後、乾燥工程を行うことができる。更に、保護層の除去も現像、ガム液処理と同時に行うことができるので、前水洗工程も特に必要としない。現像処理後、スクイズローラー等を用いて余剰の現像液を除去した後、乾燥を行うことが好ましい。
<Developer development process>
The method for producing a lithographic printing plate according to the present disclosure is a step of exposing the lithographic printing plate original plate according to the present disclosure to an image, and a step of removing the image recording layer of the non-image portion with a developing solution to prepare a lithographic printing plate ( It may also be a method including "developer development step").
Further, the lithographic printing method according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image, and a step of removing the image recording layer of the non-image portion with a developing solution to prepare a lithographic printing plate. The method may include a step of printing with the obtained lithographic printing plate.
As the developing solution, a known developing solution can be used.
The pH of the developing solution is not particularly limited and may be a strong alkaline developing solution, but a developing solution having a pH of 2 to 11 is preferable. As the developing solution having a pH of 2 to 11, for example, a developing solution containing at least one of a surfactant and a water-soluble polymer compound is preferable.
In the development process using a strong alkaline developer, a method of removing the protective layer by a pre-washing step, then performing alkaline development, removing the alkali by washing with water in a post-washing step, performing a gum solution treatment, and drying in a drying step. Can be mentioned.
When the developer containing a surfactant or a water-soluble polymer compound is used, the developer-gum solution treatment can be performed at the same time. Therefore, the post-washing step is not particularly required, and the drying step can be performed after the development and the gum liquid treatment are performed with one liquid. Further, since the protective layer can be removed at the same time as the development and the gum liquid treatment, the pre-washing step is not particularly required. After the development treatment, it is preferable to remove excess developer using a squeeze roller or the like and then dry.
<印刷工程>
 本開示に係る平版印刷方法は、平版印刷版に印刷インキを供給して記録媒体を印刷する印刷工程を含む。
 印刷インキとしては、特に制限はなく、所望に応じ、種々の公知のインキを用いることができる。また、印刷インキとしては、油性インキ又は紫外線硬化型インキ(UVインキ)が好ましく挙げられる。
 また、上記印刷工程においては、必要に応じ、湿し水を供給してもよい。
 また、上記印刷工程は、印刷機を停止することなく、上記機上現像工程又は上記現像液現像工程に連続して行われてもよい。
 記録媒体としては、特に制限はなく、所望に応じ、公知の記録媒体を用いることができる。
<Printing process>
The lithographic printing method according to the present disclosure includes a printing step of supplying printing ink to a lithographic printing plate to print a recording medium.
The printing ink is not particularly limited, and various known inks can be used as desired. Further, as the printing ink, oil-based ink or ultraviolet curable ink (UV ink) is preferably mentioned.
Further, in the printing process, dampening water may be supplied as needed.
Further, the printing step may be continuously performed in the on-machine development step or the developer development step without stopping the printing machine.
The recording medium is not particularly limited, and a known recording medium can be used as desired.
 本開示に係る平版印刷版原版からの平版印刷版の作製方法、及び、本開示に係る平版印刷方法においては、必要に応じて、露光前、露光中、露光から現像までの間に、平版印刷版原版の全面を加熱してもよい。このような加熱により、画像記録層中の画像形成反応が促進され、感度や耐刷性の向上や感度の安定化等の利点が生じ得る。現像前の加熱は150℃以下の穏和な条件で行うことが好ましい。上記態様であると、非画像部が硬化してしまう等の問題を防ぐことができる。現像後の加熱には、上記よりも強い条件を利用することが好ましく、100℃~500℃の範囲であることが好ましい。上記範囲であると、十分な画像強化作用が得られまた、支持体の劣化、画像部の熱分解といった問題を抑制することができる。 In the method for producing a lithographic printing plate from the lithographic printing plate original plate according to the present disclosure and the lithographic printing method according to the present disclosure, lithographic printing is performed before, during, and between exposure and development as necessary. The entire surface of the plate original may be heated. By such heating, the image formation reaction in the image recording layer is promoted, and advantages such as improvement of sensitivity and printing durability and stabilization of sensitivity may occur. Heating before development is preferably performed under mild conditions of 150 ° C. or lower. In the above aspect, it is possible to prevent problems such as hardening of the non-image area. For heating after development, it is preferable to use conditions stronger than the above, and it is preferably in the range of 100 ° C. to 500 ° C. Within the above range, a sufficient image enhancement effect can be obtained, and problems such as deterioration of the support and thermal decomposition of the image portion can be suppressed.
 以下、実施例により本開示を詳細に説明するが、本開示はこれらに限定されるものではない。なお、本実施例において、「%」、「部」とは、特に断りのない限り、それぞれ「質量%」、「質量部」を意味する。
 なお、実施例で使用したA-1、A-4、A-7、A-9、A-13、A-16、A-21、A-46、A-55、AN-1及びAN-2は、上述したA-1、A-4、A-7、A-9、A-13、A-16、A-21、A-46、A-55、AN-1及びAN-2とそれぞれ同じ化合物である。
Hereinafter, the present disclosure will be described in detail by way of examples, but the present disclosure is not limited thereto. In this embodiment, "%" and "parts" mean "mass%" and "parts by mass", respectively, unless otherwise specified.
In addition, A-1, A-4, A-7, A-9, A-13, A-16, A-21, A-46, A-55, AN-1 and AN-2 used in an Example Is the same as A-1, A-4, A-7, A-9, A-13, A-16, A-21, A-46, A-55, AN-1 and AN-2 described above, respectively. It is a compound.
(実施例1~34、及び、比較例1~5)
<支持体1の作製>
 厚さ0.3mmの材質1Sのアルミニウム板(アルミニウム合金板)に対し、下記(J-a)~(J-m)の処理を施し、支持体1を製造した。なお、全ての処理工程の間には水洗処理を施し、水洗処理の後にはニップローラで液切りを行った。
(Examples 1 to 34 and comparative examples 1 to 5)
<Preparation of support 1>
The following treatments (Ja) to (Jm) were applied to an aluminum plate (aluminum alloy plate) of a material 1S having a thickness of 0.3 mm to manufacture a support 1. A water washing treatment was performed during all the treatment steps, and after the water washing treatment, the liquid was drained with a nip roller.
(J-a)機械的粗面化処理(ブラシグレイン法)
 図7に示したような装置を使って、パミスの懸濁液(比重1.1g/cm)を研磨スラリー液としてアルミニウム板の表面に供給しながら、回転する束植ブラシにより機械的粗面化処理を行った。図7において、1はアルミニウム板、2及び4はローラ状ブラシ(本実施例においては、束植ブラシ)、3は研磨スラリー液、5、6、7及び8は支持ローラである。
 機械的粗面化処理では、研磨材のメジアン径(μm)を30μm、ブラシ本数を4本、ブラシの回転数(rpm)を250rpmとした。束植ブラシの材質は6・10ナイロンで、ブラシ毛の直径0.3mm、毛長50mmであった。ブラシは、φ300mmのステンレス製の筒に穴をあけて密になるように植毛した。束植ブラシ下部の2本の支持ローラ(φ200mm)の距離は、300mmであった。束植ブラシはブラシを回転させる駆動モータの負荷が、束植ブラシをアルミニウム板に押さえつける前の負荷に対して10kWプラスになるまで押さえつけた。ブラシの回転方向はアルミニウム板の移動方向と同じであった。
(Ja) Mechanical roughening treatment (brush grain method)
Using a device as shown in FIG. 7, while supplying a suspension of pumice (specific gravity 1.1 g / cm 3 ) to the surface of an aluminum plate as a polishing slurry liquid, a mechanical rough surface is mechanically roughened by a rotating bundled planting brush. The conversion process was performed. In FIG. 7, 1 is an aluminum plate, 2 and 4 are roller-shaped brushes (in this embodiment, a bundled brush), 3 is a polishing slurry liquid, and 5, 6, 7 and 8 are support rollers.
In the mechanical roughening treatment, the median diameter (μm) of the abrasive was 30 μm, the number of brushes was 4, and the rotation speed (rpm) of the brushes was 250 rpm. The material of the bundled brush was 6.10 nylon, and the diameter of the brush bristles was 0.3 mm and the bristles length was 50 mm. The brush was made by making a hole in a stainless steel cylinder having a diameter of 300 mm and flocking the brush so as to be dense. The distance between the two support rollers (φ200 mm) at the bottom of the bundled brush was 300 mm. The bundled brush was pressed until the load of the drive motor for rotating the brush became 10 kW plus the load before pressing the bundled brush against the aluminum plate. The direction of rotation of the brush was the same as the direction of movement of the aluminum plate.
(J-b)アルカリエッチング処理
 アルミニウム板に、カセイソーダ濃度26質量%及びアルミニウムイオン濃度6.5質量%のカセイソーダ水溶液を、温度70℃でスプレーにより吹き付けてエッチング処理を行った。後に電気化学的粗面化処理を施す面のアルミニウム溶解量は、10g/mであった。
(Jb) Alkaline Etching Treatment An aqueous solution of caustic soda having a caustic soda concentration of 26% by mass and an aluminum ion concentration of 6.5% by mass was sprayed onto an aluminum plate at a temperature of 70 ° C. to perform an etching treatment. The amount of aluminum dissolved on the surface to be subjected to the electrochemical roughening treatment later was 10 g / m 2 .
(J-c)酸性水溶液を用いたデスマット処理
 酸性水溶液として、液温35℃の次工程の電気化学的粗面化処理に用いた硝酸の廃液をアルミニウム板にスプレーにて3秒間吹き付けて、デスマット処理を行った。
(Jc) Desmat treatment using an acidic aqueous solution As an acidic aqueous solution, the waste liquid of nitric acid used for the electrochemical roughening treatment in the next step at a liquid temperature of 35 ° C. is sprayed onto an aluminum plate for 3 seconds to desmatte. Processing was performed.
(J-d)硝酸水溶液を用いた電気化学的粗面化処理
 60Hzの交流電圧を用いて、連続的に電気化学的粗面化処理を行った。電解液は、硝酸10.4g/Lの水溶液に硝酸アルミニウムを添加してアルミニウムイオン濃度を4.5g/Lに調整した、液温35℃の電解液を用いた。交流電源波形は図5に示した波形であり、電流値がゼロからピークに達するまでの時間tpが0.8msec、duty比1:1、台形の矩形波交流を用いて、カーボン電極を対極として電気化学的な粗面化処理を行った。補助アノードにはフェライトを用いた。電解槽は図6に示すものを使用した。電流密度は電流のピーク値で30A/dm、補助陽極には電源から流れる電流の5%を分流させた。電気量(C/dm)はアルミニウム板が陽極時の電気量の総和で185C/dmであった。
(Jd) Electrochemical roughening treatment using an aqueous nitric acid solution An electrochemical roughening treatment was continuously performed using an AC voltage of 60 Hz. As the electrolytic solution, an electrolytic solution having a liquid temperature of 35 ° C. was used, in which aluminum nitrate was added to an aqueous solution of 10.4 g / L of nitric acid to adjust the aluminum ion concentration to 4.5 g / L. The AC power supply waveform is the waveform shown in FIG. 5, in which the time tp from zero to the peak of the current value is 0.8 msec, the duty ratio is 1: 1, and the trapezoidal square wave AC is used, with the carbon electrode as the counter electrode. An electrochemical roughening treatment was performed. Ferrite was used as the auxiliary anode. The electrolytic cell shown in FIG. 6 was used. The current density was 30 A / dm 2 at the peak value of the current, and 5% of the current flowing from the power supply was diverted to the auxiliary anode. Amount of electricity (C / dm 2) the aluminum plate was 185C / dm 2 as the total quantity of electricity when the anode.
(J-e)アルカリエッチング処理
 アルミニウム板に、カセイソーダ濃度27質量%及びアルミニウムイオン濃度2.5質量%のカセイソーダ水溶液を、温度50℃でスプレーにより吹き付けてエッチング処理を行った。アルミニウム溶解量は、3.5g/mであった。
(Je) Alkaline Etching Treatment An aqueous caustic soda solution having a caustic soda concentration of 27% by mass and an aluminum ion concentration of 2.5% by mass was sprayed onto an aluminum plate at a temperature of 50 ° C. to perform an etching treatment. The amount of aluminum dissolved was 3.5 g / m 2 .
(J-f)酸性水溶液を用いたデスマット処理
 酸性水溶液として、液温30℃の硫酸濃度170g/L及びアルミニウムイオン濃度5g/Lの水溶液をアルミニウム板にスプレーにて3秒間吹き付けて、デスマット処理を行った。
(Jf) Desmat treatment using an acidic aqueous solution As an acidic aqueous solution, an aqueous solution having a sulfuric acid concentration of 170 g / L and an aluminum ion concentration of 5 g / L at a liquid temperature of 30 ° C. is sprayed onto an aluminum plate for 3 seconds to perform a desmat treatment. went.
(J-g)塩酸水溶液を用いた電気化学的粗面化処理
 60Hzの交流電圧を用いて、連続的に電気化学的粗面化処理を行った。電解液は、塩酸6.2g/Lの水溶液に塩化アルミニウムを添加してアルミニウムイオン濃度を4.5g/Lに調整した、液温35℃の電解液を用いた。交流電源波形は図5に示した波形であり、電流値がゼロからピークに達するまでの時間tpが0.8msec、duty比1:1、台形の矩形波交流を用いて、カーボン電極を対極として電気化学的な粗面化処理を行った。補助アノードにはフェライトを用いた。電解槽は図6に示すものを使用した。電流密度は電流のピーク値で25A/dmであり、塩酸電解における電気量(C/dm)はアルミニウム板が陽極時の電気量の総和で63C/dmであった。
(Jg) Electrochemical roughening treatment using an aqueous hydrochloric acid solution An electrochemical roughening treatment was continuously performed using an AC voltage of 60 Hz. As the electrolytic solution, an electrolytic solution having a liquid temperature of 35 ° C. was used, in which aluminum chloride was added to an aqueous solution of 6.2 g / L of hydrochloric acid to adjust the aluminum ion concentration to 4.5 g / L. The AC power supply waveform is the waveform shown in FIG. 5, in which the time tp from zero to the peak of the current value is 0.8 msec, the duty ratio is 1: 1, and the trapezoidal square wave AC is used, with the carbon electrode as the counter electrode. An electrochemical roughening treatment was performed. Ferrite was used as the auxiliary anode. The electrolytic cell shown in FIG. 6 was used. The current density was 25A / dm 2 at the peak of electric current amount of hydrochloric acid electrolysis (C / dm 2) the aluminum plate was 63C / dm 2 as the total quantity of electricity when the anode.
(J-h)アルカリエッチング処理
 アルミニウム板に、カセイソーダ濃度5質量%及びアルミニウムイオン濃度0.5質量%のカセイソーダ水溶液を、温度60℃でスプレーにより吹き付けてエッチング処理を行った。アルミニウム溶解量は、0.2g/mであった。
(Jh) Alkaline Etching Treatment An aqueous solution of caustic soda having a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass was sprayed onto an aluminum plate at a temperature of 60 ° C. to perform an etching treatment. The amount of aluminum dissolved was 0.2 g / m 2 .
(J-i)酸性水溶液を用いたデスマット処理
 酸性水溶液として、液温35℃の陽極酸化処理工程で発生した廃液(硫酸濃度170g/L及びアルミニウムイオン濃度5g/L)の水溶液をアルミニウム板にスプレーにて4秒間吹き付けて、デスマット処理を行った。
(Ji) Desmat treatment using an acidic aqueous solution As an acidic aqueous solution, an aqueous solution of waste liquid (sulfuric acid concentration 170 g / L and aluminum ion concentration 5 g / L) generated in the anodic oxidation treatment step at a liquid temperature of 35 ° C. is sprayed on an aluminum plate. Was sprayed for 4 seconds to perform desmat treatment.
(J-j)第1段階の陽極酸化処理
 図8に示す構造の直流電解による陽極酸化装置を用いて第1段階の陽極酸化処理を行った。電解液として170g/L硫酸水溶液を用い、液温50℃、電流密度30A/dmの条件にて陽極酸化処理を行い、皮膜量0.3g/mの陽極酸化皮膜を形成した。
 なお、陽極酸化処理装置610において、アルミニウム板616は、図8中矢印で示すように搬送される。電解液618が貯溜された給電槽612にてアルミニウム板616は給電電極620によって(+)に荷電される。そして、アルミニウム板616は、給電槽612においてローラ622によって上方に搬送され、ニップローラ624によって下方に方向転換された後、電解液626が貯溜された電解処理槽614に向けて搬送され、ローラ628によって水平方向に方向転換される。ついで、アルミニウム板616は、電解電極630によって(-)に荷電されることにより、その表面に陽極酸化皮膜が形成され、電解処理槽614を出たアルミニウム板616は後工程に搬送される。陽極酸化処理装置610において、ローラ622、ニップローラ624及びローラ628によって方向転換手段が構成され、アルミニウム板616は、給電槽612と電解処理槽614との槽間部において、ローラ622、ニップローラ624及びローラ628により、山型及び逆U字型に搬送される。給電電極620と電解電極630とは、直流電源634に接続されている。
(Jj) First-stage anodizing treatment The first-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. Anodizing treatment was carried out using a 170 g / L sulfuric acid aqueous solution as an electrolytic solution under the conditions of a liquid temperature of 50 ° C. and a current density of 30 A / dm 2 to form an anodized film having a film amount of 0.3 g / m 2.
In the anodizing treatment apparatus 610, the aluminum plate 616 is conveyed as shown by an arrow in FIG. The aluminum plate 616 is charged to (+) by the feeding electrode 620 in the feeding tank 612 in which the electrolytic solution 618 is stored. Then, the aluminum plate 616 is conveyed upward by the roller 622 in the power supply tank 612, turned downward by the nip roller 624, and then conveyed toward the electrolytic treatment tank 614 in which the electrolytic solution 626 is stored, and is conveyed by the roller 628. Turns horizontally. Then, the aluminum plate 616 is charged to (-) by the electrolytic electrode 630 to form an anodic oxide film on the surface thereof, and the aluminum plate 616 leaving the electrolytic treatment tank 614 is conveyed to a subsequent process. In the anodizing treatment apparatus 610, the direction changing means is composed of the roller 622, the nip roller 624 and the roller 628, and the aluminum plate 616 is formed in the inter-tank portion between the power supply tank 612 and the electrolytic treatment tank 614, and the roller 622, the nip roller 624 and the roller By 628, it is conveyed in a chevron shape and an inverted U shape. The feeding electrode 620 and the electrolytic electrode 630 are connected to the DC power supply 634.
(J-k)ポアワイド処理
 陽極酸化処理したアルミニウム板を、カセイソーダ濃度5質量%及びアルミニウムイオン濃度0.5質量%のカセイソーダ水溶液に、40℃で3秒間浸漬し、ポアワイド処理を行った。
(Jk) Pore Wide Treatment The anodized aluminum plate was immersed in a caustic soda aqueous solution having a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass at 40 ° C. for 3 seconds to perform a pore wide treatment.
(J-l)第2段階の陽極酸化処理
 図8に示す構造の直流電解による陽極酸化装置を用いて第2段階の陽極酸化処理を行った。電解液として170g/L硫酸水溶液を用い、液温50℃、電流密度13A/dmの条件にて陽極酸化処理を行い、皮膜量2.1g/mの陽極酸化皮膜を形成した。
(Jl) Second-stage anodizing treatment The second-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. Anodizing treatment was carried out using a 170 g / L sulfuric acid aqueous solution as an electrolytic solution under the conditions of a liquid temperature of 50 ° C. and a current density of 13 A / dm 2 to form an anodized film having a film amount of 2.1 g / m 2.
(J-m)親水化処理
 非画像部の親水性を確保するため、アルミニウム板を、2.5質量%3号ケイ酸ソーダ水溶液に50℃で7秒間浸漬してシリケート処理を施した。Siの付着量は8.5mg/mであった。マイクロポアの平均径は30nmであった。
 支持体1の陽極酸化皮膜表面のL表色系における明度Lの値は72.3であった。
(Jm) Hydrophilization Treatment In order to ensure the hydrophilicity of the non-imaged portion, an aluminum plate was immersed in a 2.5 mass% No. 3 sodium silicate aqueous solution at 50 ° C. for 7 seconds to perform a silicate treatment. The amount of Si adhered was 8.5 mg / m 2 . The average diameter of the micropores was 30 nm.
The value of the lightness L * in the L * a * b * color system on the surface of the anodic oxide film of the support 1 was 72.3.
<下塗り層の形成>
 次に、上記支持体1上に、下記組成の下塗り層用塗布液(1)を乾燥塗布量が20mg/mになるよう塗布して、下塗り層を形成した。
 なお、実施例16又は17では、下塗り層用塗布液(1)にリン酸又はグルコン酸を乾燥塗布量が表1に記載の量となるように添加し、乾燥塗布量が70mg/mになるよう塗布して、下塗り層を形成した。
 また、実施例25~30では、下塗り層を形成しなかった。
<Formation of undercoat layer>
Next, the undercoat layer coating liquid (1) having the following composition was applied onto the support 1 so that the dry coating amount was 20 mg / m 2 to form an undercoat layer.
In Example 16 or 17, phosphoric acid or gluconic acid was added to the undercoat layer coating liquid (1) so that the dry coating amount was the amount shown in Table 1, and the dry coating amount was 70 mg / m 2 . It was applied so as to form an undercoat layer.
Moreover, in Examples 25 to 30, the undercoat layer was not formed.
〔下塗り層用塗布液(1)〕
 ・下記構造の下塗り層用化合物(1):0.18部
 ・ヒドロキシエチルイミノ二酢酸:0.10部
 ・メタノール:55.24部
 ・水:6.15部
[Coating liquid for undercoat layer (1)]
-Compound for undercoat layer with the following structure (1): 0.18 parts-Hydroxyethyliminodiacetic acid: 0.10 parts-Methanol: 55.24 parts-Water: 6.15 parts
Figure JPOXMLDOC01-appb-C000090
Figure JPOXMLDOC01-appb-C000090
<画像記録層の形成>
 表1に記載の下記画像記録層(1)~(4)の形成のいずれかにより、画像記録層を形成した。
<Formation of image recording layer>
The image recording layer was formed by any of the following image recording layers (1) to (4) shown in Table 1.
<<画像記録層(1)の形成>>
 下塗り層又は支持体1上に、下記組成の画像記録層塗布液(1)をバー塗布し、100℃で60秒間オーブン乾燥して、乾燥塗布量が1.0g/mの画像記録層(1)を形成した。
 画像記録層塗布液(1)は下記感光液(1)及びミクロゲル液を塗布直前に混合し撹拌することにより調製した。
<< Formation of image recording layer (1) >>
An image recording layer coating liquid (1) having the following composition is bar-coated on the undercoat layer or the support 1, and dried in an oven at 100 ° C. for 60 seconds to obtain an image recording layer having a dry coating amount of 1.0 g / m 2. 1) was formed.
The image recording layer coating liquid (1) was prepared by mixing and stirring the following photosensitive liquid (1) and microgel liquid immediately before coating.
-感光液(1)-
・表1に記載の発色性化合物:表1に記載の乾燥塗布量となる量
・表1に記載の支持体吸着性化合物:表1に記載の乾燥塗布量となる量
・バインダーポリマー(1)〔下記構造〕:0.240部
・重合開始剤(1)〔下記構造〕:0.245部
・ボレート化合物(テトラフェニルホウ酸ナトリウム):0.010部
・重合性化合物(トリス(アクリロイルオキシエチル)イソシアヌレート、NKエステル A-9300、新中村化学工業(株)製):0.192部
・低分子親水性化合物(トリス(2-ヒドロキシエチル)イソシアヌレート):0.062部
・低分子親水性化合物(1)〔下記構造〕:0.050部
・フッ素系界面活性剤(1)〔下記構造〕:0.008部
・2-ブタノン:1.091部
・1-メトキシ-2-プロパノール:8.609部
-Photosensitive liquid (1)-
-Color-developing compound shown in Table 1: Amount of dry coating amount shown in Table 1-Support-adsorbing compound shown in Table 1: Amount of dry coating amount shown in Table 1-Binder polymer (1) [Structure below]: 0.240 parts, polymerization initiator (1) [Structure below]: 0.245 parts, borate compound (sodium tetraphenylborate): 0.010 parts, polymerizable compound (Tris (acryloyloxyethyl) ) Isocyanurate, NK ester A-9300, manufactured by Shin-Nakamura Chemical Industry Co., Ltd.): 0.192 parts, low molecular weight hydrophilic compound (Tris (2-hydroxyethyl) isocyanurate): 0.062 parts, low molecular weight hydrophilic Sex compounds (1) [the following structure]: 0.050 parts, fluorine-based surfactant (1) [the following structure]: 0.008 parts, 2-butanone: 1.091 parts, 1-methoxy-2-propanol: 8.609 copies
-ミクロゲル液-
・ミクロゲル(1):2.640部
・蒸留水:2.425部
-Microgel liquid-
・ Microgel (1): 2.640 parts ・ Distilled water: 2.425 parts
Figure JPOXMLDOC01-appb-C000091
Figure JPOXMLDOC01-appb-C000091
Figure JPOXMLDOC01-appb-C000092
Figure JPOXMLDOC01-appb-C000092
Figure JPOXMLDOC01-appb-C000093
Figure JPOXMLDOC01-appb-C000093
Figure JPOXMLDOC01-appb-C000094
Figure JPOXMLDOC01-appb-C000094
 上記ミクロゲル液に用いたミクロゲル(1)の調製法を以下に示す。
-多価イソシアネート化合物(1)の調製-
 イソホロンジイソシアネート17.78g(80mmol)と下記多価フェノール化合物(1)7.35g(20mmol)との酢酸エチル(25.31g)懸濁溶液に、ビスマストリス(2-エチルヘキサノエート)(ネオスタン U-600、日東化成(株)製)43mgを加えて撹拌した。発熱が収まった時点で反応温度を50℃に設定し、3時間撹拌して多価イソシアネート化合物(1)の酢酸エチル溶液(50質量%)を得た。
The preparation method of the microgel (1) used in the above microgel solution is shown below.
-Preparation of multivalent isocyanate compound (1)-
Bismuth tris (2-ethylhexanoate) (neostan U) in a suspension solution of ethyl acetate (25.31 g) containing 17.78 g (80 mmol) of isophorone diisocyanate and 7.35 g (20 mmol) of the following polyhydric phenol compound (1). -600, 43 mg (manufactured by Nitto Kasei Co., Ltd.) was added and stirred. When the exotherm subsided, the reaction temperature was set to 50 ° C., and the mixture was stirred for 3 hours to obtain an ethyl acetate solution (50% by mass) of the polyvalent isocyanate compound (1).
Figure JPOXMLDOC01-appb-C000095
Figure JPOXMLDOC01-appb-C000095
-ミクロゲル(1)の調製-
 下記油相成分及び水相成分を混合し、ホモジナイザーを用いて12000rpmで10分間乳化した。得られた乳化物を45℃で4時間撹拌後、1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン-オクチル酸塩(U-CAT SA102、サンアプロ(株)製)の10質量%水溶液5.20gを加え、室温で30分撹拌し、45℃で24時間静置した。蒸留水で、固形分濃度を20質量%になるように調整し、ミクロゲル(1)の水分散液が得られた。レーザ回折/散乱式粒度分布測定装置(LA-920、(株)堀場製作所製)を用いて、光散乱法により数平均粒径を測定したところ、0.28μmであった。
-Preparation of microgel (1)-
The following oil phase components and aqueous phase components were mixed and emulsified at 12000 rpm for 10 minutes using a homogenizer. After stirring the obtained emulsion at 45 ° C. for 4 hours, 10 mass of 1,8-diazabicyclo [5.4.0] undec-7-ene-octylate (U-CAT SA102, manufactured by San-Apro Co., Ltd.) 5.20 g of% aqueous solution was added, the mixture was stirred at room temperature for 30 minutes, and allowed to stand at 45 ° C. for 24 hours. The solid content concentration was adjusted to 20% by mass with distilled water to obtain an aqueous dispersion of microgel (1). When the number average particle size was measured by the light scattering method using a laser diffraction / scattering type particle size distribution measuring device (LA-920, manufactured by HORIBA, Ltd.), it was 0.28 μm.
〔油相成分〕
 (成分1)酢酸エチル:12.0g
 (成分2)トリメチロールプロパン(6モル)とキシレンジイソシアネート(18モル)を付加させ、これにメチル辺末端ポリオキシエチレン(1モル、オキシエチレン単位の繰返し数:90)を付加させた付加体(50質量%酢酸エチル溶液、三井化学(株)製):3.76g
 (成分3)多価イソシアネート化合物(1)(50質量%酢酸エチル溶液として):15.0g
 (成分4)ジペンタエリスリトールペンタアクリレート(SR-399、サートマー社製)の65質量%酢酸エチル溶液:11.54g
 (成分5)スルホン酸塩型界面活性剤(パイオニンA-41-C、竹本油脂(株)製)の10%酢酸エチル溶液:4.42g
[Oil phase component]
(Component 1) Ethyl acetate: 12.0 g
(Component 2) An addition (1 mol, number of repetitions of oxyethylene unit: 90) added to trimethylolpropane (6 mol) and xylene diisocyanate (18 mol). 50 mass% ethyl acetate solution, manufactured by Mitsui Kagaku Co., Ltd .: 3.76 g
(Component 3) Multivalent isocyanate compound (1) (as a 50% by mass ethyl acetate solution): 15.0 g
(Component 4) 65% by mass ethyl acetate solution of dipentaerythritol pentaacrylate (SR-399, manufactured by Sartmer): 11.54 g
(Component 5) 10% ethyl acetate solution of sulfonate type surfactant (Pionin A-41-C, manufactured by Takemoto Oil & Fat Co., Ltd .): 4.42 g
〔水相成分〕
 蒸留水:46.87g
[Aqueous phase component]
Distilled water: 46.87 g
<<画像記録層(2)の形成>>
 上記のようにして形成された下塗り層上に、下記組成の画像記録層塗布液(2)をバー塗布した後、100℃60秒でオーブン乾燥し、乾燥塗布量1.0g/mの画像記録層(2)を形成した。
 画像記録層塗布液(2)は下記感光液(2)及びミクロゲル液(2)を塗布直前に混合し撹拌することにより得た。
<< Formation of image recording layer (2) >>
An image recording layer coating liquid (2) having the following composition is bar-coated on the undercoat layer formed as described above, dried in an oven at 100 ° C. for 60 seconds, and an image having a dry coating amount of 1.0 g / m 2. The recording layer (2) was formed.
The image recording layer coating liquid (2) was obtained by mixing and stirring the following photosensitive liquid (2) and microgel liquid (2) immediately before coating.
〔感光液(2)〕
・表1に記載の発色性化合物:表1に記載の乾燥塗布量となる量
・表1に記載の支持体吸着性化合物:表1に記載の乾燥塗布量となる量
・バインダーポリマー(2)〔下記構造、Mw:55,000、n:2(エチレンオキサイド(EO)単位数)〕:0.240部
・ボレート化合物(テトラフェニルホウ酸ナトリウム):0.010部
・重合開始剤(1)〔上記構造〕:0.162部
・重合性化合物(トリス(アクリロイルオキシエチル)イソシアヌレート、NKエステルA-9300、新中村化学工業(株)製):0.192部
・低分子親水性化合物(1)〔上記構造〕:0.050部
・感脂化剤(ホスホニウム化合物(1)〔下記構造〕):0.055部
・感脂化剤(ベンジル-ジメチル-オクチルアンモニウム・PF塩):0.018部
・アンモニウム基含有ポリマー(1)〔下記構造、Mw:50,000、還元比粘度:45ml/g〕:0.040部
・フッ素系界面活性剤(1)〔下記構造〕:0.008部
・2-ブタノン:1.091部
・1-メトキシ-2-プロパノール:8.609部
[Photosensitive liquid (2)]
-Color-developing compounds shown in Table 1: Amount of dry coating shown in Table 1-Support-adsorbing compounds shown in Table 1: Amount of dry coating shown in Table 1-Binder polymer (2) [The following structure, Mw: 55,000, n: 2 (number of ethylene oxide (EO) units)]: 0.240 parts, borate compound (sodium tetraphenylborate): 0.010 parts, polymerization initiator (1) [Structure]: 0.162 parts, polymerizable compound (Tris (acryloyloxyethyl) isocyanurate, NK ester A-9300, manufactured by Shin-Nakamura Chemical Industry Co., Ltd.): 0.192 parts, low molecular weight hydrophilic compound ( 1) [Structure]: 0.050 parts-Fat sensitive agent (phosphonium compound (1) [structure below]): 0.055 parts-Fat sensitive agent (benzyl-dimethyl-octylammonium / PF 6 salt): 0.018 parts-Ammonium group-containing polymer (1) [Structure below, Mw: 50,000, Reduction specific viscosity: 45 ml / g]: 0.040 parts-Fluorine-based surfactant (1) [Structure below]: 0 .008 parts ・ 2-butanone: 1.091 parts ・ 1-methoxy-2-propanol: 8.609 parts
〔ミクロゲル液(2)〕
・ミクロゲル(2):2.640部
・蒸留水:2.425部
[Microgel liquid (2)]
・ Microgel (2): 2.640 parts ・ Distilled water: 2.425 parts
Figure JPOXMLDOC01-appb-C000096
Figure JPOXMLDOC01-appb-C000096
Figure JPOXMLDOC01-appb-C000097
Figure JPOXMLDOC01-appb-C000097
 上記のミクロゲル(2)の合成法は、以下に示す通りである。
-ミクロゲル(2)の合成-
 油相成分として、トリメチロールプロパンとキシレンジイソシアナート付加体(三井化学ポリウレタン(株)製、タケネートD-110N)10g、ペンタエリスリトールトリアクリレート(日本化薬(株)製、SR444)3.15g、及びアルキルベンゼンスルホン酸塩(竹本油脂(株)製、パイオニンA-41C)0.1gを酢酸エチル17gに溶解した。水相成分としてポリビニルアルコール((株)クラレ製、PVA-205)の4質量%水溶液40gを調製した。油相成分及び水相成分を混合し、ホモジナイザーを用いて12,000rpmで10分間乳化した。得られた乳化物を、蒸留水25gに添加し、室温で30分撹拌後、50℃で3時間撹拌した。このようにして得られたミクロゲル液の固形分濃度を、15質量%になるように蒸留水を用いて希釈し、これを上記ミクロゲル(2)とした。ミクロゲルの体積平均粒子径を光散乱法により測定したところ、0.2μmであった。
The method for synthesizing the above microgel (2) is as shown below.
-Synthesis of microgel (2)-
As oil phase components, trimethylolpropane and xylene diisocyanate adduct (manufactured by Mitsui Chemicals Polyurethane Co., Ltd., Takenate D-110N) 10 g, pentaerythritol triacrylate (manufactured by Nippon Kayaku Co., Ltd., SR444) 3.15 g, And 0.1 g of alkylbenzene sulfonate (manufactured by Takemoto Oil & Fat Co., Ltd., Pionin A-41C) was dissolved in 17 g of ethyl acetate. As an aqueous phase component, 40 g of a 4% by mass aqueous solution of polyvinyl alcohol (PVA-205, manufactured by Kuraray Co., Ltd.) was prepared. The oil phase component and the aqueous phase component were mixed and emulsified at 12,000 rpm for 10 minutes using a homogenizer. The obtained emulsion was added to 25 g of distilled water, stirred at room temperature for 30 minutes, and then stirred at 50 ° C. for 3 hours. The solid content concentration of the microgel solution thus obtained was diluted with distilled water so as to be 15% by mass, and this was used as the above-mentioned microgel (2). The volume average particle size of the microgel was measured by the light scattering method and found to be 0.2 μm.
<<画像記録層(3)の形成>>
 上記のようにして形成された下塗り層又は支持体1上に、下記組成の画像記録層塗布液(3)を厚さ30μmにてバー塗布した後、120℃1分でオーブン乾燥し、画像記録層(3)を形成した。
<< Formation of image recording layer (3) >>
An image recording layer coating liquid (3) having the following composition is bar-coated on the undercoat layer or support 1 formed as described above to a thickness of 30 μm, dried in an oven at 120 ° C. for 1 minute, and image-recorded. The layer (3) was formed.
〔画像記録層塗布液(3)〕
・表1に記載の発色性化合物:表1に記載の乾燥塗布量となる量
・表1に記載の支持体吸着性化合物:表1に記載の乾燥塗布量となる量
・2,2,4-トリメチルヘキサメチレンジイソシアネートの2モル当量ヒドロキシエチルメタアクリレート付加物(82質量%メチルエチルケトン溶液、AZ Electronics社製):0.250部
・エポキシアクリレートオリゴマー(Arkema社製):0.250部
・ビス(4-t-ブチルフェニル)ヨードニウムテトラフェニルボレート:0.045部
・ポリビニルブチラール(積水化学工業(株)製S-LEC BX35-Z):0.150部
・Tego Glide 410(ポリエーテル変性ポリシロキサンコポリマー、Evonik Tego Chemie社製):0.0015部
・メタクリロキシ基を有するリン酸エステル化合物(Sipomer PAM 100、Rhodia社製):0.130部
・ビニルホスホン酸とアクリル酸との共重合体(20質量%水性分散液、Albritect CP 30、Rhodia社製):0.024部
・メチルエチルケトン:1-メトキシ-2-プロパノール=35:65(体積比)の混合溶剤:固形分が35体積%となる量
[Image recording layer coating liquid (3)]
-Color-developing compounds shown in Table 1: Amount of dry coating shown in Table 1-Support-adsorbing compounds shown in Table 1: Amount of dry coating shown in Table 1.-2, 2, 4 -2 mol equivalent hydroxyethyl methacrylate adduct of trimethylhexamethylene diisocyanate (82 mass% methyl ethyl ketone solution, manufactured by AZ Electronics): 0.250 parts, epoxy acrylate oligomer (manufactured by Archema): 0.250 parts, bis (4) -T-Butylphenyl) Iodonium tetraphenylborate: 0.045 parts-Polyvinyl butyral (S-LEC BX35-Z manufactured by Sekisui Chemical Industry Co., Ltd.): 0.150 parts-Tego Glide 410 (polyether-modified polysiloxane copolymer, Evonik Tego Chemie): 0.0015 parts ・ Phosphonate ester compound having a methacryloxy group (Sipomer PAM 100, manufactured by Rhodia): 0.130 parts ・ Copolymer of vinylphosphonic acid and acrylic acid (20% by mass) Aqueous dispersion, Acrytect CP 30, manufactured by Rhodia): 0.024 part ・ Methyl ethyl ketone: 1-methoxy-2-propanol = 35:65 (volume ratio) mixed solvent: Amount of solid content of 35% by volume
<<画像記録層(4)の形成>>
 熱可塑性ポリマー粒子、赤外線吸収剤及びポリアクリル酸を含有する画像記録層水系塗布液を調製し、pHを3.6に調整した後、下塗り層又は支持体1上に塗布し、50℃で1分間乾燥して画像記録層(4)を形成した。各成分の乾燥後の塗布量を以下に示す。
<< Formation of image recording layer (4) >>
An image recording layer water-based coating liquid containing thermoplastic polymer particles, an infrared absorber and polyacrylic acid was prepared, the pH was adjusted to 3.6, and then the coating was applied on the undercoat layer or the support 1 and 1 at 50 ° C. It was dried for a minute to form an image recording layer (4). The amount of each component applied after drying is shown below.
・表1に記載の発色性化合物:表1に記載の乾燥塗布量となる量
・表1に記載の支持体吸着性化合物:表1に記載の乾燥塗布量となる量
・熱可塑性ポリマー粒子:0.7g/m
・ポリアクリル酸:0.09g/m
-Color-developing compounds shown in Table 1: Amount of dry coating amount shown in Table 1-Support-adsorptive compounds shown in Table 1: Amount of dry coating amount shown in Table 1-Thermoplastic polymer particles: 0.7g / m 2
-Polyacrylic acid: 0.09 g / m 2
 画像記録層塗布液に用いた熱可塑性ポリマー粒子、赤外線吸収剤IR-01、ポリアクリル酸は以下に示す通りである。 The thermoplastic polymer particles, infrared absorber IR-01, and polyacrylic acid used in the image recording layer coating liquid are as shown below.
 熱可塑性ポリマー粒子:スチレン/アクリロニトリル共重合体(モル比50/50)、Tg:99℃、体積平均粒子径:60nm
 ポリアクリル酸:Mw:250,000
Thermoplastic polymer particles: styrene / acrylonitrile copolymer (molar ratio 50/50), Tg: 99 ° C., volume average particle size: 60 nm
Polyacrylic acid: Mw: 250,000
<保護層の形成>
 表1に記載の下記保護層(1)又は(2)の形成により、保護層を形成した。
<Formation of protective layer>
A protective layer was formed by forming the following protective layer (1) or (2) shown in Table 1.
<<保護層(1)の形成>>
 画像記録層上に、下記組成の保護層塗布液(1)をバー塗布し、120℃で60秒間オーブン乾燥して、乾燥塗布量が0.15g/mの保護層(1)を形成した。
<< Formation of protective layer (1) >>
A protective layer coating liquid (1) having the following composition was bar-coated on the image recording layer and dried in an oven at 120 ° C. for 60 seconds to form a protective layer (1) having a dry coating amount of 0.15 g / m 2. ..
-保護層塗布液(1)-
・表1に記載の発色性化合物:表1に記載の乾燥塗布量となる量
・表1に記載の支持体吸着性化合物:表1に記載の乾燥塗布量となる量
・無機層状化合物分散液(1)〔下記〕:1.5部
・ポリビニルアルコール(CKS50、日本合成化学工業(株)製、スルホン酸変性、けん化度99モル%以上、重合度300)6質量%水溶液:0.55部
・ポリビニルアルコール(PVA-405、(株)クラレ製、けん化度81.5モル%、重合度500)6質量%水溶液:0.03部
・界面活性剤(ポリオキシエチレンラウリルエーテル、エマレックス710、日本エマルジョン(株)製)1質量%水溶液:0.86部
・イオン交換水:6.0部
-Protective layer coating liquid (1)-
-Color-developing compound shown in Table 1: Amount of dry coating amount shown in Table 1-Support-adsorptive compound shown in Table 1: Amount of dry coating amount shown in Table 1-Inorganic layered compound dispersion. (1) [below]: 1.5 parts-Polyvinyl alcohol (CKS50, manufactured by Nippon Synthetic Chemical Industry Co., Ltd., sulfonic acid modification, saponification degree 99 mol% or more, degree of polymerization 300) 6% by mass aqueous solution: 0.55 parts -Polyvinyl alcohol (PVA-405, manufactured by Kuraray Co., Ltd., saponification degree 81.5 mol%, degree of polymerization 500) 6% by mass aqueous solution: 0.03 parts-Surfactant (polyoxyethylene lauryl ether, Emarex 710, Nippon Emulsion Co., Ltd.) 1% by mass aqueous solution: 0.86 parts, ion-exchanged water: 6.0 parts
 上記保護層塗布液(1)に用いた無機層状化合物分散液(1)の調製法を以下に示す。 The preparation method of the inorganic layered compound dispersion liquid (1) used for the protective layer coating liquid (1) is shown below.
-無機層状化合物分散液(1)の調製-
 イオン交換水193.6gに合成雲母(ソマシフME-100、コープケミカル(株)製)6.4gを添加し、ホモジナイザーを用いて平均粒径(レーザー散乱法)が3μmになるまで分散した。得られた分散粒子のアスペクト比は100以上であった。
-Preparation of inorganic layered compound dispersion (1)-
6.4 g of synthetic mica (Somasif ME-100, manufactured by Corp Chemical Co., Ltd.) was added to 193.6 g of ion-exchanged water, and the mixture was dispersed using a homogenizer until the average particle size (laser scattering method) became 3 μm. The aspect ratio of the obtained dispersed particles was 100 or more.
<<保護層(2)の形成>>
 上記画像記録層上に、更に下記組成の保護層用塗布液(2)をバー塗布した後、120℃、60秒でオーブン乾燥し、乾燥塗布量0.15g/mの保護層(2)を形成した。
<< Formation of protective layer (2) >>
A protective layer coating liquid (2) having the following composition is further bar-coated on the image recording layer, then dried in an oven at 120 ° C. for 60 seconds, and the protective layer (2) having a dry coating amount of 0.15 g / m 2 is dried. Was formed.
-保護層用塗布液(2)-
・無機質層状化合物分散液(1)(上記で得たもの):1.5部
・親水性ポリマー(1)(固形分)〔下記構造、Mw:3万〕:0.55部
・ポリビニルアルコール(日本合成化学工業(株)製CKS50、スルホン酸変性、けん化度99モル%以上、重合度300)6質量%水溶液:0.10部
・ポリビニルアルコール((株)クラレ製PVA-405、けん化度81.5モル%、重合度500)6質量%水溶液:0.03部
・界面活性剤(エマレックス710、商品名:日本エマルジョン(株)製)1質量%水溶液:0.86部
・イオン交換水:6.0部
-Coating liquid for protective layer (2)-
-Inorganic layered compound dispersion (1) (obtained above): 1.5 parts-Hydrophilic polymer (1) (solid content) [Structure below, Mw: 30,000]: 0.55 parts-Polyvinyl alcohol ( CKS50 manufactured by Nippon Synthetic Chemical Industry Co., Ltd., sulfonic acid modification, saponification degree 99 mol% or more, polymerization degree 300) 6% by mass aqueous solution: 0.10 part ・ Polyvinyl alcohol (PVA-405 manufactured by Kuraray Co., Ltd., saponification degree 81) .5 mol%, degree of polymerization 500) 6 mass% aqueous solution: 0.03 part ・ Surfactant (Emarex 710, trade name: Nippon Emulsion Co., Ltd.) 1 mass% aqueous solution: 0.86 part ・ ion exchange water : 6.0 copies
Figure JPOXMLDOC01-appb-C000098
Figure JPOXMLDOC01-appb-C000098
<エッジ親水化層の形成>
 実施例22及び25においては、エッジ親水化層を更に形成した。
 塗布装置として、兵神装備(株)製2NL04を使用した。
 エッジ親水化層を形成する塗布液は、下記に記載した純水以外の成分を純水に加えて撹拌し、親水化成分含有塗布液を調製した。
・下記式P-2で表される化合物(Mw:100,000):5.0質量部
・上記ミクロゲル(2):1.0質量部
・純水:194質量部
<Formation of edge hydrophilized layer>
In Examples 22 and 25, an edge hydrophilized layer was further formed.
As a coating device, 2NL04 manufactured by Hyojin Equipment Co., Ltd. was used.
As the coating liquid for forming the edge hydrophilic layer, components other than the pure water described below were added to pure water and stirred to prepare a coating liquid containing a hydrophilic component.
-Compound represented by the following formula P-2 (Mw: 100,000): 5.0 parts by mass-Microgel (2): 1.0 part by mass-Pure water: 194 parts by mass
Figure JPOXMLDOC01-appb-C000099
Figure JPOXMLDOC01-appb-C000099
 クリアランス0.3mmで送液量5cc/分で搬送速度を調整し、上記塗布液を固形分塗布量1.7g/mになるように塗布した。
 塗布は、支持体の対向する2辺の端部からそれぞれ3cmの位置を中心とする幅5mmの領域(2箇所)に行った。
 塗布後、120℃1分間で乾燥し、エッジ親水化層を画像記録層側の最外層として形成した。
The transport speed was adjusted with a clearance of 0.3 mm and a liquid feed rate of 5 cc / min, and the coating liquid was applied so that the solid content coating amount was 1.7 g / m 2 .
The coating was applied to a region (two places) having a width of 5 mm centered at a position of 3 cm from each of the two opposite end portions of the support.
After coating, it was dried at 120 ° C. for 1 minute to form an edge hydrophilized layer as the outermost layer on the image recording layer side.
<平版印刷版原版の裁断>
 上記により得られた平版印刷版原版を、図2に示すようなスリッター装置を用いて、上側裁断刃と下側裁断刃の隙間、噛み込み量及び刃先角度を調整して裁断し、表1に記載の端部にダレ形状を形成した。
 裁断位置は、エッジ親水化層の形成領域の中央の位置(上記支持体の対向する2辺の端部からそれぞれ3cmの位置)を裁断位置とし、支持体の2箇所を裁断した。
 ダレ形状におけるダレ量X及びダレ幅Yを表1に記載する。
<Cutting of lithographic printing plate original plate>
The planographic printing plate original plate obtained as described above is cut by adjusting the gap between the upper cutting blade and the lower cutting blade, the biting amount, and the cutting edge angle using a slitter device as shown in FIG. 2, and the results are shown in Table 1. A sagging shape was formed at the described end.
The cutting position was set at the center of the formation region of the edge hydrophilic layer (position 3 cm from each of the two opposite sides of the support), and two points of the support were cut.
Table 1 shows the sagging amount X and the sagging width Y in the sagging shape.
<発色性、及び、経時発色性評価>
 平版印刷版原版を、水冷式40W赤外線半導体レーザー搭載のCreo社製Trendsetter3244VXにより、出力11.7W、外面ドラム回転数250rpm、解像度2,400dpi(dots per inch、1inch=25.4mm)の条件で露光した。露光は25℃、50%RHの環境下で行った。
 露光直後(発色性)、及び、露光後暗所(25℃)で2時間保存後(経時発色性)、平版印刷版原版の発色を測定した。測定は、コニカミノルタ(株)製分光測色計CM2600dとオペレーションソフトCM-S100Wとを用い、SCE(正反射光除去)方式で行った。発色性は、L表色系のL値(明度)を用い、露光部のL値と未露光部のL値との差ΔLにより評価した。ΔLの値が大きい程、発色性が優れる。
<Evaluation of color development and color development over time>
The lithographic printing plate original is exposed by Creo's Trendsetter 3244VX equipped with a water-cooled 40W infrared semiconductor laser under the conditions of output 11.7W, outer drum rotation speed 250rpm, and resolution 2,400 dpi (dots per inch, 1 inch = 25.4 mm). bottom. The exposure was performed in an environment of 25 ° C. and 50% RH.
Immediately after exposure (color development) and after storage in a dark place (25 ° C.) for 2 hours after exposure (color development over time), the color development of the lithographic printing plate original plate was measured. The measurement was performed by the SCE (specular reflection light removal) method using a spectrocolorimeter CM2600d manufactured by Konica Minolta Co., Ltd. and an operation software CM-S100W. Chromogenic uses the L * a * b * color system of L * value (lightness) was evaluated by the difference ΔL between the L * values of the L * value and the unexposed portions of the exposed portion. The larger the value of ΔL, the better the color development.
<エッジ汚れ抑制性評価>
 平版印刷版原版を、赤外線半導体レーザー搭載の富士フイルム(株)製Luxcel PLATESETTER T-6000IIIにて、外面ドラム回転数1,000rpm、レーザー出力70%、解像度2,400dpiの条件で露光した。露光画像にはベタ画像、50%網点、非画像部を含むチャートを用いた。
 画像露光した平版印刷版原版を、(株)東京機械製作所製オフセット輪転印刷機に装着し、新聞用印刷インキとして、インクテック(株)製ソイビーKKST-S(紅)、湿し水として、東洋インキ(株)製東洋ALKYを用いて、新聞用紙に100,000枚/時のスピードで印刷し、地汚れ解消の水目盛から1.1倍の水目盛で、1,000枚目の印刷物をサンプリングし、印刷用原版の端部に起因する線状汚れの程度を下記の基準で評価した。
  5:全く汚れていない
  4:5と3との中間レベル
  3:うっすらと汚れているが許容レベル
  2:3と1との中間レベル(許容レベル)
  1:はっきりと汚れており非許容レベル
<Evaluation of edge stain suppression>
The lithographic printing plate original plate was exposed on a Luxcel PLATESETTER T-6000III manufactured by FUJIFILM Corporation equipped with an infrared semiconductor laser under the conditions of an outer drum rotation speed of 1,000 rpm, a laser output of 70%, and a resolution of 2,400 dpi. As the exposed image, a chart including a solid image, 50% halftone dots, and a non-image portion was used.
The image-exposed flat plate printing plate original plate is attached to an offset rotary printing machine manufactured by Tokyo Kikai Seisakusho Co., Ltd., and used as printing ink for newspapers, Soybee KKST-S (red) manufactured by Inktech Co., Ltd. Using Toyo ALKY manufactured by Ink Co., Ltd., print on newspaper at a speed of 100,000 sheets / hour, and print the 1,000th sheet with a water scale 1.1 times the water scale for removing ground stains. Sampling was performed, and the degree of linear stain caused by the edge of the printing original plate was evaluated according to the following criteria.
5: Not dirty at all 4: Intermediate level between 5 and 3 3: Slightly dirty but acceptable level 2: Intermediate level between 3 and 1 (acceptable level)
1: Clearly dirty and unacceptable level
<機上現像性評価>
 平版印刷版原版を赤外線半導体レーザー搭載の富士フイルム(株)製Luxel PLATESETTER T-6000IIIにより、外面ドラム回転数1,000rpm、レーザー出力70%、解像度2,400dpiの条件で露光した。露光画像にはベタ画像及び20μmドットFMスクリーンの50%網点チャートを含むようにした。
 露光された平版印刷版原版を現像処理することなく、(株)小森コーポレーション製印刷機LITHRONE26の版胴に取り付けた。Ecolity-2(富士フイルム(株)製)/水道水=2/98(容量比)の湿し水とValues-G(N)墨インキ(DICグラフィックス(株)製)とを用い、LITHRONE26の標準自動印刷スタート方法で湿し水とインキとを供給し、毎時10,000枚の印刷速度で、特菱アート紙(連量:76.5kg、三菱製紙(株)製)に100枚印刷を行った。
 印刷機上で画像記録層の未露光部の機上現像が完了し、非画像部にインキが転写しない状態になるまでに要した印刷用紙の枚数を計測し、機上現像性として評価した。枚数が少ない程、機上現像性が良好である。
<Evaluation of on-machine developability>
The lithographic printing plate original plate was exposed by a Luxel PLATESETTER T-6000III manufactured by FUJIFILM Corporation equipped with an infrared semiconductor laser under the conditions of an outer drum rotation speed of 1,000 rpm, a laser output of 70%, and a resolution of 2,400 dpi. The exposed image included a solid image and a 50% halftone dot chart of a 20 μm dot FM screen.
The exposed planographic printing plate original plate was attached to the plate cylinder of the printing machine LITHRONE26 manufactured by Komori Corporation without developing. Efficiency-2 (manufactured by Fujifilm Co., Ltd.) / tap water = 2/98 (volume ratio) of dampening water and Values-G (N) ink ink (manufactured by DIC Graphics Co., Ltd.) of LITHRONE26 We supply dampening water and ink using the standard automatic printing start method, and print 100 sheets on Tokubishi Art Paper (ream weight: 76.5 kg, manufactured by Mitsubishi Paper Mills Limited) at a printing speed of 10,000 sheets per hour. went.
The number of printing papers required to complete the on-machine development of the unexposed portion of the image recording layer on the printing machine and to prevent the ink from being transferred to the non-image portion was measured and evaluated as the on-machine developability. The smaller the number, the better the on-machine developability.
<耐薬品性(クリーナー耐刷性)評価>
 上記機上現像性の評価を行った後、更に印刷を続けた。印刷枚数の増加に伴い徐々に画像記録層が摩耗するため印刷物上のインキ濃度が低下した。また、印刷の途中に10,000枚印刷する毎に、クリーナー(富士フイルム(株)製、HN-C)で版面を拭いた。印刷物におけるFMスクリーン50%網点の網点面積率をグレタグ濃度計で測定した値が印刷100枚目の測定値よりも5%低下するまでの印刷枚数を計測した。印刷枚数が10万枚の場合を100とする相対耐刷性により評価した。数値が大きい程、耐刷性が良好である。
  相対耐刷性=(対象平版印刷版原版の印刷枚数)/100,000×100
<Chemical resistance (cleaner printing resistance) evaluation>
After evaluating the on-machine developability, printing was continued. As the number of printed sheets increased, the image recording layer was gradually worn, so that the ink density on the printed matter decreased. In addition, every time 10,000 sheets were printed during printing, the plate surface was wiped with a cleaner (manufactured by FUJIFILM Corporation, HN-C). The number of printed sheets was measured until the value measured by the Gretag densitometer of the halftone dot area ratio of the FM screen 50% halftone dot in the printed matter was 5% lower than the measured value of the 100th printed sheet. The evaluation was made based on the relative printing resistance of 100 when the number of printed sheets was 100,000. The larger the value, the better the printing durability.
Relative printing resistance = (number of prints of target lithographic printing plate original plate) / 100,000 x 100
 評価結果を表1にまとめて示す。 The evaluation results are summarized in Table 1.
Figure JPOXMLDOC01-appb-T000100
Figure JPOXMLDOC01-appb-T000100
 なお、表1に記載のB-1及びB-2は、以下の化合物である。 Note that B-1 and B-2 shown in Table 1 are the following compounds.
Figure JPOXMLDOC01-appb-C000101
Figure JPOXMLDOC01-appb-C000101
 表1に記載の結果から、本開示に係る平版印刷版原版である実施例1~34の平版印刷版原版は、比較例の平版印刷版原版と比べ、エッジ汚れ抑制性に優れている。
 また、表1に記載の結果から、本開示に係る平版印刷版原版である実施例1~34の平版印刷版原版は、発色性、経時発色性、機上現像性、及び、耐薬品性にも優れる。
From the results shown in Table 1, the lithographic printing plate original plates of Examples 1 to 34, which are the lithographic printing plate original plates according to the present disclosure, are superior in edge stain suppression property as compared with the lithographic printing plate original plates of the comparative examples.
Further, from the results shown in Table 1, the lithographic printing plate original plates of Examples 1 to 34, which are the lithographic printing plate original plates according to the present disclosure, have improved color development property, color development property over time, on-machine developability, and chemical resistance. Is also excellent.
 X:ダレ量、Y:ダレ幅、1:アルミニウム板、2,4:ローラ状ブラシ、3:研磨スラリー液、5,6,7,8:支持ローラ、18:アルミニウム板、ta:アノード反応時間、tc:カソード反応時間、tp:電流が0からピークに達するまでの時間、Ia:アノードサイクル側のピーク時の電流、Ic:カソードサイクル側のピーク時の電流、AA:アルミニウム板のアノード反応の電流、CA:アルミニウム板のカソード反応の電流、10:平版印刷版原版、12a,12b:アルミニウム支持体、14:下塗り層、16:画像記録層、20a,20b:陽極酸化皮膜、22a,22b:マイクロポア、24:大径孔部、26:小径孔部、D:大径孔部の深さ、50:主電解槽、51:交流電源、52:ラジアルドラムローラ、53a,53b:主極、54:電解液供給口、55:電解液、56:補助陽極、60:補助陽極槽、W:アルミニウム板、A1:給液方向、A2:電解液排出方向、210:裁断刃、210a:上側裁断刃、210b:上側裁断刃、211:回転軸、220:裁断刃、220a:下側裁断刃、220b:下側裁断刃、221:回転軸、230:支持体、610:陽極酸化処理装置、612:給電槽、614:電解処理槽、616:アルミニウム板、618,26:電解液、620:給電電極、622,628:ローラ、624:ニップローラ、630:電解電極、632:槽壁、634:直流電源 X: Amount of sagging, Y: Sagging width, 1: Aluminum plate, 2, 4: Roller brush, 3: Polishing slurry liquid, 5, 6, 7, 8: Support roller, 18: Aluminum plate, ta: Anode reaction time , Tc: Cathode reaction time, tp: Time from 0 to peak of current, Ia: Peak current on the anode cycle side, Ic: Peak current on the cathode cycle side, AA: Anode reaction of aluminum plate Current, CA: Current of cathode reaction of aluminum plate, 10: Plate printing plate original plate, 12a, 12b: Aluminum support, 14: Undercoat layer, 16: Image recording layer, 20a, 20b: Anode oxide film, 22a, 22b: Micropore, 24: Large-diameter hole, 26: Small-diameter hole, D: Depth of large-diameter hole, 50: Main anode, 51: AC power supply, 52: Radial drum roller, 53a, 53b: Main pole, 54: Electrolyte supply port, 55: Electrolyte, 56: Auxiliary anode, 60: Auxiliary anode tank, W: Aluminum plate, A1: Liquid supply direction, A2: Electrolyte discharge direction, 210: Cutting blade, 210a: Upper cutting Blade, 210b: Upper cutting blade, 211: Rotating shaft, 220: Cutting blade, 220a: Lower cutting blade, 220b: Lower cutting blade, 221: Rotating shaft, 230: Support, 610: Anode oxidation treatment device, 612 : Feeding tank, 614: Electrolytic treatment tank, 616: Aluminum plate, 618, 26: Electrolyte, 620: Feeding electrode, 622,628: Roller, 624: Nip roller, 630: Electrolytic electrode, 632: Tank wall, 634: DC Power supply
 2020年2月28日に出願された日本国特許出願第2020-034241号の開示は、その全体が参照により本明細書に取り込まれる。
 本明細書に記載された全ての文献、特許出願、及び、技術規格は、個々の文献、特許出願、及び、技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。
The disclosure of Japanese Patent Application No. 2020-034241 filed on February 28, 2020 is incorporated herein by reference in its entirety.
All documents, patent applications, and technical standards described herein are to the same extent as if the individual documents, patent applications, and technical standards were specifically and individually stated to be incorporated by reference. Is incorporated herein by reference.

Claims (16)

  1.  支持体上に、熱又は赤外線露光により開裂する基を有する発色性化合物を含む層を有し、
     前記支持体の少なくとも対向する2辺の端部に、ダレ量Xが25μm~150μm、かつダレ幅Yが70μm~300μmであるダレ形状を有する
     平版印刷版原版。
    A layer containing a chromogenic compound having a group that is cleaved by thermal or infrared exposure is provided on the support.
    A lithographic printing plate original plate having a sagging shape having a sagging amount X of 25 μm to 150 μm and a sagging width Y of 70 μm to 300 μm at at least two opposite ends of the support.
  2.  前記発色性化合物を含む層が、画像記録層である請求項1に記載の平版印刷版原版。 The planographic printing plate original plate according to claim 1, wherein the layer containing the color-developing compound is an image recording layer.
  3.  支持体上に、画像記録層を有し、
     前記発色性化合物を含む層を、前記画像記録層上に有する請求項1に記載の平版印刷版原版。
    It has an image recording layer on the support and
    The lithographic printing plate original plate according to claim 1, which has a layer containing the color-developing compound on the image recording layer.
  4.  前記熱又は赤外線露光により開裂する基を有する発色性化合物が、下記式(1)で表される化合物である請求項1~請求項3のいずれか1項に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000001

     式(1)中、Mは熱又は赤外線露光により開裂する基であり、R及びRはそれぞれ独立に、水素原子又はアルキル基を表し、R及びRは互いに連結して環を形成してもよく、Ar及びArはそれぞれ独立に、ベンゼン環又はナフタレン環を形成する基を表し、Y及びYはそれぞれ独立に、酸素原子、硫黄原子、-NR-又はジアルキルメチレン基を表し、R及びRはそれぞれ独立に、脂肪族炭化水素基を表し、R~Rはそれぞれ独立に、水素原子又はアルキル基を表し、Rは水素原子、アルキル基又はアリール基を表し、Zaは電荷を中和する対イオンを表す。
    The planographic printing plate original plate according to any one of claims 1 to 3, wherein the color-developing compound having a group that cleaves by heat or infrared exposure is a compound represented by the following formula (1).
    Figure JPOXMLDOC01-appb-C000001

    In formula (1), M 1 is a group that is cleaved by thermal or infrared exposure, R 2 and R 3 independently represent a hydrogen atom or an alkyl group, and R 2 and R 3 are connected to each other to form a ring. They may be formed, where Ar 1 and Ar 2 each independently represent a group forming a benzene ring or a naphthalene ring, and Y 1 and Y 2 independently represent an oxygen atom, a sulfur atom, -NR 0- or a dialkyl. R 4 and R 5 each independently represent an aliphatic hydrocarbon group, R 6 to R 9 each independently represent a hydrogen atom or an alkyl group, and R 0 represents a hydrogen atom, an alkyl group or an alkyl group. Represents an aryl group and Za represents a counterion that neutralizes the charge.
  5.  前記式(1)で表される化合物におけるR、R、M、Ar及びArよりなる群から選ばれた少なくとも1つの基が、親水性基を有する、請求項4に記載の平版印刷版原版。 The fourth aspect of the present invention, wherein at least one group selected from the group consisting of R 4, R 5 , M 1 , Ar 1 and Ar 2 in the compound represented by the formula (1) has a hydrophilic group. Planographic printing plate original plate.
  6.  前記親水性基が、下記式(2)~式(5)のいずれかで表される基である請求項5に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000002

     式(2)~式(5)中、R10は炭素数2~6のアルキレン基を表し、Wは単結合又は酸素原子を表し、n1は1~45の整数を表し、R11は炭素数1~12のアルキル基又は炭素数2~12のアシル基を表し、R12及びR13はそれぞれ独立に、単結合、又は、炭素数1~12のアルキレン基若しくはアルキレンオキシ基を表し、Mは水素原子、Na原子、K原子又はオニウム基を表し、また、式(1)で表される化合物全体で電荷が中和可能な場合は、Mを有していなくともよく、m1は1、2、3又は4を表し、Xは-O-、-S-又は-CH-を表し、波線部分は他の構造との結合位置を表す。
    The planographic printing plate original plate according to claim 5, wherein the hydrophilic group is a group represented by any of the following formulas (2) to (5).
    Figure JPOXMLDOC01-appb-C000002

    In formulas (2) to (5), R 10 represents an alkylene group having 2 to 6 carbon atoms, W 1 represents a single bond or an oxygen atom, n1 represents an integer of 1 to 45, and R 11 represents carbon. Represents an alkyl group of number 1 to 12 or an acyl group of 2 to 12 carbon atoms, and R 12 and R 13 independently represent a single bond or an alkylene group or alkylene oxy group having 1 to 12 carbon atoms, respectively. Represents a hydrogen atom, a Na atom, a K atom or an onium group, and if the charge can be neutralized in the whole compound represented by the formula (1), it does not have to have M, and m1 is 1. It represents 2, 3 or 4, X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
  7.  前記式(1)におけるMが、-NR、-NR(SO)又は-NR(CO)である請求項4~請求項6のいずれか1項に記載の平版印刷版原版。
     ただし、R及びRはそれぞれ独立に、アリール基を表し、R、R及びRはそれぞれ独立に、アルキル基又はアリール基を表し、Rは、アルキル基、アリール基、又は、-NRd1d2を表し、Rd1及びRd2はそれぞれ独立に、水素原子、アルキル基又はアリール基を表す。
    In any one of claims 4 to 6, where M 1 in the formula (1) is -NR a R b , -NR c (SO 2 R d ) or -NR e (CO 2 R f). The original planographic printing plate described.
    However, R a and R b each independently represent an aryl group, R c , Re and R f independently represent an alkyl group or an aryl group, and R d is an alkyl group, an aryl group, or an aryl group. -NR d1 represents R d2 , and R d1 and R d2 independently represent a hydrogen atom, an alkyl group or an aryl group.
  8.  前記式(1)におけるMが、-O-Rである請求項4~請求項6のいずれか1項に記載の平版印刷版原版。
     ただし、Rは、熱又は赤外線露光によりR-O結合が開裂する基を表す。
    Formula M 1 is in (1), lithographic printing plate precursor as claimed in any one of Claims 4 to 6 is -O-R 1.
    However, R 1 is, R 1 -O bond by heat or infrared exposure represents a group which cleaves.
  9.  前記Rが、下記式(6)で表される基である請求項8に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000003

     式(6)中、R15及びR16はそれぞれ独立に、水素原子、アルキル基又はアリール基を表し、Eはオニウム基を表し、波線部分は酸素原子との結合位置を表す。
    The flat plate printing plate original plate according to claim 8, wherein R 1 is a group represented by the following formula (6).
    Figure JPOXMLDOC01-appb-C000003

    In formula (6), R 15 and R 16 independently represent a hydrogen atom, an alkyl group or an aryl group, E represents an onium group, and the wavy line portion represents a bond position with an oxygen atom.
  10.  前記式(6)におけるEが、下記式(7)で表されるピリジニウム基である請求項9に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000004

     式(7)中、R17はハロゲン原子、アルキル基、アリール基、ヒドロキシ基又はアルコキシ基を表し、R17が複数存在する場合、複数のR17は同じでも異なってもよく、あるいは複数のR17が連結して環を形成してもよく、n2は0~4の整数を表し、R18はアルキル基、アリール基又は下記式(2)~式(5)のいずれかで表される基を表し、Zbは電荷を中和するための対イオンを表す。
    Figure JPOXMLDOC01-appb-C000005

     式(2)~式(5)中、R10は炭素数2~6のアルキレン基を表し、Wは単結合又は酸素原子を表し、n1は1~45の整数を表し、R11は炭素数1~12のアルキル基又は炭素数2~12のアシル基を表し、R12及びR13はそれぞれ独立に、単結合、又は、炭素数1~12のアルキレン基若しくはアルキレンオキシ基を表し、Mは水素原子、Na原子、K原子又はオニウム基を表し、また、式(1)で表される化合物全体で電荷が中和可能な場合は、Mを有していなくともよく、m1は1、2、3又は4を表し、Xは-O-、-S-又は-CH-を表し、波線部分は他の構造との結合位置を表す。
    The planographic printing plate original plate according to claim 9, wherein E in the formula (6) is a pyridinium group represented by the following formula (7).
    Figure JPOXMLDOC01-appb-C000004

    Wherein (7), R 17 represents a halogen atom, an alkyl group, an aryl group, hydroxy group or alkoxy group, if R 17 there are a plurality, the plurality of R 17 may be the same or different, or a plurality of R 17 may be linked to form a ring, n2 represents an integer of 0 to 4, and R 18 is an alkyl group, an aryl group, or a group represented by any of the following formulas (2) to (5). Represents, and Zb represents a counterion for neutralizing the charge.
    Figure JPOXMLDOC01-appb-C000005

    In formulas (2) to (5), R 10 represents an alkylene group having 2 to 6 carbon atoms, W 1 represents a single bond or an oxygen atom, n1 represents an integer of 1 to 45, and R 11 represents carbon. Represents an alkyl group of number 1 to 12 or an acyl group of 2 to 12 carbon atoms, and R 12 and R 13 independently represent a single bond or an alkylene group or alkylene oxy group having 1 to 12 carbon atoms, respectively. Represents a hydrogen atom, a Na atom, a K atom or an onium group, and if the charge can be neutralized in the whole compound represented by the formula (1), it does not have to have M, and m1 is 1. It represents 2, 3 or 4, X 1 represents -O-, -S- or -CH 2- , and the wavy line portion represents the bonding position with other structures.
  11.  前記画像記録層が、重合開始剤及び重合性化合物を有する請求項2又は請求項3に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 2 or 3, wherein the image recording layer has a polymerization initiator and a polymerizable compound.
  12.  前記画像記録層が、ポリマー粒子を有する請求項2、請求項3又は請求項11に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 2, claim 3 or claim 11, wherein the image recording layer has polymer particles.
  13.  分子量1,000以下の支持体吸着性化合物をいずれかの層に含む請求項1~請求項12のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 1 to 12, which contains a support-adsorbing compound having a molecular weight of 1,000 or less in any layer.
  14.  前記平版印刷版原版の画像記録層側の面の端部から1cm以内の領域に親水化層を有する請求項1~請求項13のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate original plate according to any one of claims 1 to 13, which has a hydrophilic layer in a region within 1 cm from the end of the surface of the lithographic printing plate original plate on the image recording layer side.
  15.  請求項1~請求項14のいずれか1項に記載の平版印刷版原版を画像様に露光する工程と、
     印刷機上で印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して非画像部の画像記録層を除去する工程と、を含む
     平版印刷版の作製方法。
    A step of exposing the lithographic printing plate original plate according to any one of claims 1 to 14 to an image.
    A method for producing a lithographic printing plate, comprising a step of supplying at least one selected from the group consisting of printing ink and dampening water on a printing machine to remove an image recording layer in a non-image area.
  16.  請求項1~請求項14のいずれか1項に記載の平版印刷版原版を画像様に露光する工程と、
     印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去し平版印刷版を作製する工程と、
     得られた平版印刷版により印刷する工程と、を含む
     平版印刷方法。
    A step of exposing the lithographic printing plate original plate according to any one of claims 1 to 14 to an image.
    A process of supplying at least one selected from the group consisting of printing ink and dampening water to remove the image recording layer of the non-image area on the printing machine to prepare a lithographic printing plate.
    A lithographic printing method including a step of printing with the obtained lithographic printing plate.
PCT/JP2021/002475 2020-02-28 2021-01-25 Lithographic printing plate original plate, lithographic printing plate manufacturing method, and lithographic printing method WO2021171862A1 (en)

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