[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

WO2021168646A1 - 显示基板及显示装置 - Google Patents

显示基板及显示装置 Download PDF

Info

Publication number
WO2021168646A1
WO2021168646A1 PCT/CN2020/076564 CN2020076564W WO2021168646A1 WO 2021168646 A1 WO2021168646 A1 WO 2021168646A1 CN 2020076564 W CN2020076564 W CN 2020076564W WO 2021168646 A1 WO2021168646 A1 WO 2021168646A1
Authority
WO
WIPO (PCT)
Prior art keywords
metal
layer
light
base substrate
grid
Prior art date
Application number
PCT/CN2020/076564
Other languages
English (en)
French (fr)
Inventor
刘琦
樊聪
董向丹
Original Assignee
京东方科技集团股份有限公司
成都京东方光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司, 成都京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to JP2021573139A priority Critical patent/JP7529698B2/ja
Priority to US17/425,113 priority patent/US12075668B2/en
Priority to PCT/CN2020/076564 priority patent/WO2021168646A1/zh
Priority to CN202080000175.6A priority patent/CN113557470B/zh
Priority to EP20921378.4A priority patent/EP4113198A4/en
Publication of WO2021168646A1 publication Critical patent/WO2021168646A1/zh
Priority to US18/768,220 priority patent/US20240365616A1/en
Priority to JP2024115675A priority patent/JP2024150606A/ja

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0448—Details of the electrode shape, e.g. for enhancing the detection of touches, for generating specific electric field shapes, for enhancing display quality
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/22—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
    • G09G3/30—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
    • G09G3/32—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED]
    • G09G3/3208—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED]
    • G09G3/3225—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED] using an active matrix
    • G09G3/3233—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED] using an active matrix with pixel circuitry controlling the current through the light-emitting element
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00—Aspects of the constitution of display devices
    • G09G2300/04—Structural and physical details of display devices
    • G09G2300/0421—Structural details of the set of electrodes
    • G09G2300/0426—Layout of electrodes and connections
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2354/00—Aspects of interface with display user
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens

Definitions

  • the embodiment of the present disclosure relates to a display substrate and a display device.
  • OLED display panels have been widely used in various electronic products due to the advantages of light weight, self-luminescence, wide viewing angle, low driving voltage, high luminous efficiency, low power consumption, and fast response speed. middle.
  • fingerprint detection has become an important verification method for electronic products, especially the under-screen fingerprint detection technology is conducive to the realization of the narrow bezel design of the display panel.
  • the industry has proposed more and more under-screen fingerprint detection solutions for electronic products, mainly including optical, ultrasonic and capacitive under-screen fingerprint detection.
  • the most widely used optical under-screen fingerprint detection technology The fingerprint detection technology under the optical screen relies on light reflection to detect the fingerprint loop, and compares the obtained fingerprint image with the image in the database to achieve the purpose of fingerprint detection.
  • the fingerprint detection technology under the optical screen is particularly widely used in OLED display panels.
  • the embodiments of the present disclosure provide a display substrate and a display device. At least a part of the metal connection signal lines of the display substrate are parallel and overlapped with the grid lines of the metal touch layer, which can reduce the shielding area of the first metal signal line layer and the metal touch layer to the light transmission gap of the display substrate. Therefore, the under-screen fingerprint detection sensitivity of the display device using the display substrate is improved.
  • An embodiment of the present disclosure provides a display substrate, including a base substrate; a first metal signal line layer, located on the base substrate, includes a plurality of first metal signal lines extending in a first direction, and every two phases
  • the adjacent first metal signal lines include a plurality of metal connection signal lines, and the metal connection signal lines connect the adjacent first metal signal lines; the metal touch layer is located on the first metal signal line.
  • the signal line layer is far away from the base substrate and includes a plurality of intersecting grid lines, and the plurality of grid lines form a plurality of grids arranged in an array, wherein the metal is connected to at least a part of the signal line Parallel to the grid lines of the metal touch layer, and in a direction perpendicular to the base substrate, the portion of the metal connection signal line parallel to the grid lines of the metal touch layer touches the metal
  • the grid lines of the control layer at least partially overlap.
  • the metal connection signal line is a broken line, and includes a first metal connection line segment and a second metal connection line segment that are connected to each other.
  • the first metal connection line segment extends in a second direction perpendicular to the first direction, and the second metal connection line segment extends in a direction at an acute or obtuse angle to the first direction.
  • the second metal connection line segment is parallel to the grid lines of the metal touch layer, and in a direction perpendicular to the base substrate, the second metal connection line segment is connected to the metal touch control layer.
  • the grid lines of the layers overlap.
  • the overlapping area of the second metal connection line segment and the grid line is greater than 50% of the area of the metal connection signal line.
  • the first metal connection line segment in a direction perpendicular to the base substrate, at least partially overlaps the grid lines located at the corners of the grid.
  • the overlapping area of the first metal connection line segment and the grid line located at the corner of the grid is smaller than the grid line of the second metal connection line segment and the metal touch layer Overlapping area.
  • the grid line includes a plurality of break points, and in a direction perpendicular to the base substrate, the second metal connection line segment overlaps at least part of the break points.
  • the length of the second metal connection line segment is greater than the length of the first metal connection line segment.
  • the display substrate includes a plurality of light-emitting elements arranged in an array, a light-transmitting gap is included between adjacent light-emitting elements, and the light-emitting elements are located in a direction perpendicular to the base substrate.
  • the grid corresponds to the light-emitting element one-to-one
  • the orthographic projection of each light-emitting element on the base substrate falls into The corresponding grid is in the orthographic projection on the base substrate, and the area of the orthographic projection of the light-emitting element on the base substrate is smaller than that of the corresponding grid on the base substrate The area of the orthographic projection.
  • the light-emitting element includes a red light-emitting element, a green light-emitting element, and a blue light-emitting element.
  • the green light-emitting element corresponds to the first metal connecting line segment.
  • the middle part does not overlap with the grid line, the two ends of the first metal connection line segment corresponding to the green light-emitting element overlap with the grid line; the first metal connection line segment of the red light-emitting element overlaps with the grid line
  • the grid lines completely overlap; the middle part of the first metal connection line segment corresponding to the blue light-emitting element does not overlap the grid line, and the first metal connection corresponding to the blue light-emitting element Both ends of the line segment overlap the grid line.
  • the display substrate further includes a second metal signal line layer located on a side of the first metal signal line layer close to the base substrate, wherein the second metal signal line layer includes There are a plurality of second metal signal lines extending in the first direction, and the plurality of second metal signal lines are electrically connected to the plurality of first metal signal lines.
  • the metal connection signal line and the light-emitting element do not overlap.
  • the display substrate further includes a pixel defining layer, including a plurality of openings arranged in an array, the openings correspond to the light-emitting elements one-to-one, and the openings of the pixel defining layer define the effectiveness of the light-emitting elements.
  • Luminous area including a plurality of openings arranged in an array, the openings correspond to the light-emitting elements one-to-one, and the openings of the pixel defining layer define the effectiveness of the light-emitting elements.
  • the display substrate further includes an encapsulation layer covering the light-emitting element, wherein the metal touch layer is located on a side of the encapsulation layer away from the base substrate.
  • the display substrate further includes a data line, which is in the same layer as the second metal signal line, and is parallel and insulated from the second metal signal line.
  • the metal touch layer includes a touch electrode bridge layer, an insulating layer, and a touch electrode layer that are stacked, and the insulating layer is located between the touch electrode bridge layer and the touch electrode layer And the insulating layer includes a via connecting the touch electrode bridge layer and the touch electrode layer.
  • the first metal signal line is a power line.
  • the display substrate further includes at least one thin film transistor and a connecting electrode located between the base substrate and the light-emitting element;
  • the at least one thin film transistor includes an active layer located on the base substrate. Layer, the gate located on the side of the active layer away from the base substrate, and the source and drain located on the side of the gate away from the base substrate;
  • the connection electrode is located at the at least one The thin film transistor and the light emitting element are electrically connected to the drain of the at least one thin film transistor and the light emitting element;
  • the first metal signal line layer and the connecting electrode are provided in the same layer, and the second metal The signal line layer and the source electrode are arranged in the same layer.
  • the base substrate is a flexible base substrate.
  • An embodiment of the present disclosure further provides a display device, including the display substrate described in any one of the above.
  • the display device further includes a fingerprint sensor located on a side of the base substrate far from the first metal signal line layer, and configured to detect fingerprints on the display substrate.
  • Figure 1 is a schematic diagram of an OLED display panel with an under-screen fingerprint detection function
  • FIG. 2A is a schematic diagram of a planar structure of a display substrate according to an embodiment of the present disclosure
  • FIG. 2B is a schematic cross-sectional structure diagram of the display substrate shown in FIG. 2A along the line A-A;
  • FIG. 2C is a partial enlarged schematic diagram of the display substrate shown in the dashed frame D in FIG. 2A;
  • FIG. 3 is a schematic diagram of a plan structure of a first metal signal line layer according to an embodiment of the present disclosure
  • FIG. 4 is a schematic diagram of a planar structure of a metal touch layer according to an embodiment of the present disclosure
  • Fig. 5 is a schematic plan view of a light emitting element according to an embodiment of the present disclosure.
  • FIG. 6 is a partial schematic diagram of a planar structure of a display substrate according to an embodiment of the present disclosure.
  • FIG. 7 is a schematic cross-sectional structure diagram of a display device according to an embodiment of the present disclosure.
  • the under-screen fingerprint detection solution usually uses the light used for display by the display panel itself as the light source, and the fingerprint sensor is usually arranged on the non-display side of the display panel or integrated in the functional layer of the display panel, thereby realizing the under-screen fingerprint detection function.
  • OLED has self-luminous characteristics, and its light emission can also be controlled or modulated as required, which can provide convenience for fingerprint image collection and help improve the integration of electronic devices.
  • OLED display panels widely use fingerprint detection schemes under the optical screen to achieve unlocking or other functions.
  • Fig. 1 is a schematic diagram of an OLED display panel with an under-screen fingerprint detection function.
  • the OLED display panel includes a top film 21, a thin film encapsulation layer 22, a pixel unit array 23 and a base substrate 24.
  • the base substrate 24 provides protection and support functions for other structures and functional layers located thereon, and is, for example, a plastic substrate or a glass substrate.
  • the pixel unit array 23 is formed on the base substrate 24 and includes a plurality of pixel units arranged in a predetermined array.
  • the light 101 emitted by the pixel unit is used for display and as light for fingerprint detection under the screen.
  • the thin-film encapsulation layer 22 covers the pixel unit array 23 to prevent external water vapor from entering the pixel unit array 23 and cause its aging or deterioration. It can be a multilayer thin-film encapsulation layer, for example, including laminated inorganic encapsulation layers and organic encapsulation layers, etc. .
  • the fingerprint sensor 25 that collects fingerprint images is arranged on (for example, attached to the base substrate 24 by optical clear adhesive (OCA)) on the side of the base substrate 24 away from the pixel unit array 23 (ie, the lower side in the figure), and is used to detect the film 21 from the top layer.
  • OCA optical clear adhesive
  • the surface of the fingerprint 30 reflects the reflected light 102 for fingerprint detection.
  • the fingerprint sensor 25 has a certain area, for example, includes a plurality of detection units arranged in a predetermined array.
  • the OLED display panel may also include other structural or functional layers.
  • the OLED display panel may include a touch structure for realizing a touch function.
  • the touch structure may be built into the pixel unit array 23, or formed on the top film 21, or formed on the packaging structure 22, for example, and may be a capacitive type, a resistive type, or the like.
  • the above-mentioned top film 21, thin film package 22 and base substrate 24 are at least partially transparent or semi-transparent, or a light-transmitting gap 231 is formed between adjacent pixel units in the pixel unit array 23, Therefore, the reflected light of the fingerprint on the surface of the top layer film 21 can be incident on the fingerprint sensor 25 through the transparent/semi-transparent film layer or the light-transmitting gap to obtain the fingerprint image.
  • the inventor of the present application found that there are multiple metal traces (such as power signal lines, gate signal lines, data signal lines, metal touch layers, touch signal lines, etc.) in the OLED display substrate, and the above-mentioned multiple metal traces are stacked Together, the transparent/translucent film layer or the light-transmitting gap 231 will be blocked, thereby affecting the sensitivity of fingerprint detection.
  • multiple metal traces such as power signal lines, gate signal lines, data signal lines, metal touch layers, touch signal lines, etc.
  • the embodiments of the present disclosure provide a display substrate and a display device.
  • the display substrate includes a base substrate, a first metal signal line layer and a metal touch layer.
  • the first metal signal line layer is located on the base substrate and includes a plurality of first metal signal lines extending along the first direction, and each two adjacent first metal signal lines includes a plurality of metal connection signal lines, and the metal connection The signal line connects adjacent first metal signal lines.
  • the metal touch layer is located on a side of the first metal signal line layer away from the base substrate, and includes a plurality of intersecting grid lines, and the plurality of grid lines form a plurality of grids arranged in an array.
  • At least a part of the metal connection signal line is parallel to the grid line of the metal touch layer, and in the direction perpendicular to the base substrate, the part where the metal connection signal line is parallel to the grid line of the metal touch layer and the metal touch layer
  • the grid lines overlap.
  • the metal connection signal lines of the display substrate are parallel and overlapped with the grid lines of the metal touch layer, which can reduce the transparent/translucent film layer or light transmission gap of the first metal signal line layer and the metal touch layer to the display substrate
  • the shielding area can improve the sensitivity of under-screen fingerprint detection of the display device adopting the display substrate, and can realize large-area under-screen fingerprint recognition.
  • FIG. 2A is a schematic plan view of the structure of a display substrate according to an embodiment of the present disclosure
  • FIG. 2B is a schematic view of a cross-sectional structure of the display substrate shown in FIG. 2A along the line A-A.
  • FIG. 2A is a schematic diagram of the planar structure of the display substrate viewed from the non-display side to the display side.
  • the first metal signal line layer is located above the metal touch layer.
  • the display substrate includes a base substrate 100, a first metal signal line layer 200 with a first grid pattern on the base substrate 100, and a first metal signal line layer 200 located far away from the substrate.
  • FIG. 2A schematically shows the planar structure of the first metal signal line layer 200, the metal touch layer 300, and the light-emitting element 520 of the display substrate and the positional relationship between them. As shown in FIG.
  • FIG. 3 is a schematic diagram of the planar structure of the first metal signal line layer 200
  • FIG. 4 is a schematic diagram of the planar structure of the metal touch layer 300
  • FIG. 5 is a schematic diagram of the planar structure of the light emitting element 520.
  • the first metal signal line layer 200 includes a plurality of first metal signal lines 210 extending along the first direction Y, and each two adjacent first metal signal lines 210 include A plurality of metal connection signal lines 220, and a plurality of metal connection signal lines 220 connect adjacent first metal signal lines 210, so that the plurality of first metal signal lines 210 and the plurality of metal connection signal lines 220 form a first metal signal The first grid pattern of the line layer 200.
  • the metal touch layer 300 with the second grid pattern includes a plurality of grid lines 320 connected to each other, and the plurality of grid lines 320 form a plurality of grids 310 arranged in an array.
  • the grid line 320 includes a plurality of first grid lines 321 extending along a direction that forms an acute angle with the first direction Y, and a plurality of second grid lines 321 perpendicular to the first grid line 321.
  • the plurality of first grid lines 321 and the plurality of second grid lines 322 enclose a plurality of rectangular grids 310.
  • the shapes and sizes of the multiple rectangular grids 310 are not completely the same.
  • FIG. 4 is only an example, and the embodiment of the present disclosure does not limit the first grid line 321 to be perpendicular to the second grid line 322.
  • the second grid line 322 and the first grid line 321 may only intersect without being perpendicular.
  • the plurality of first grid lines 321 and the plurality of second grid lines 322 enclose a plurality of parallelograms. Grid 310.
  • the metal connection signal line 220 is parallel to the grid line 320 of the metal touch layer 300, and in a direction perpendicular to the base substrate 100, the metal connection signal line 220 and the metal touch layer
  • the parallel portion of the grid line 320 of the 300 overlaps the grid line 320 of the metal touch layer 300.
  • the metal connection signal lines 220 and the grid lines 320 of the metal touch layer 300 are parallel to each other and the widths of the corresponding portions may be the same or different.
  • the orthographic projection of the corresponding part of the metal connection signal line 220 on the base substrate may completely fall into the metal touch layer.
  • the corresponding part of the grid line 320 of 300 is in the orthographic projection on the base substrate, or the orthographic projection of the corresponding part of the grid line 320 of the metal touch layer 300 on the base substrate completely falls into the metal connection signal line 220
  • the corresponding part of is in the orthographic projection on the base substrate. In this case, the shielding range of the grid lines of the metal touch layer and the metal connection signal lines can be minimized.
  • the corresponding part of the grid line 320 of the metal touch layer 300 Corresponding parts of the metal connection signal line 220 are staggered with each other, but the two at least partially overlap. In this case, the shielding range of the grid lines of the metal touch layer and the metal connection signal lines can also be reduced.
  • the above-mentioned metal connection signal lines are parallel to the grid lines of the metal touch layer, and it is not limited to be absolutely parallel, and a certain error range is allowed.
  • the above-mentioned metal connection signal line and the grid line of the metal touch layer overlap with the grid line of the metal touch layer, which means that the metal connection signal line and the grid line of the metal touch layer are parallel to the grid line.
  • the orthographic projection on the base substrate and the orthographic projection of the grid lines of the metal touch layer on the base substrate at least partially overlap.
  • the light shielding range of the two can be reduced.
  • the length of the portion where the metal connection signal line 220 and the grid line 320 of the metal touch layer are parallel and overlapped accounts for the length of the metal connection signal. More than 50% of the total length of the line 220.
  • the first metal connection line segment 221 and the grid line 320 located at the corner of the grid 310 at least partially overlap.
  • the first metal connecting line segment overlaps the grid lines at the corners at multiple positions (one of the overlapping positions is shown by the rectangular dashed box C in the figure).
  • the overlap area between the first metal connection line segment 221 and the grid line 320 located at the corner of the grid 310 is smaller than the overlap area between the second metal connection line segment 222 and the grid line 320 of the metal touch layer 300.
  • the grid line 320 of the metal touch layer includes a plurality of break points 321.
  • the second metal connection line segment 222 intersects at least part of the break points 320. Stacked. It should be noted that, from FIG. 2A, the break points 320 that do not overlap with the second metal connection line segment 222 can be seen, but the multiple break points 320 that overlap with the second metal connection line segment 222 are not seen. The reason why it is not visible is that the break point 321 overlapping with the second metal connection line segment 222 is blocked by the second metal connection line segment 222.
  • the base substrate 100 may be an inorganic material, for example, a glass plate, a quartz plate, a metal plate, or the like.
  • the material of the base substrate may also include an organic material.
  • the organic material may be polyimide, polycarbonate, polyacrylate, polyetherimide, polyethersulfone, and polyethylene terephthalate. Resin materials such as esters and polyethylene naphthalate.
  • the base substrate 100 may be a flexible substrate or a non-flexible substrate, which is not limited in the embodiments of the present disclosure.
  • the material of the first metal signal line layer 200 and the metal touch layer 300 may include a metal material or an alloy material, and may be a single layer of metal or a multilayer metal stack.
  • both the first metal signal line layer 200 and the metal touch layer 300 can be made of a three-layer metal stack (Ti/Al/Ti) of titanium, aluminum, and titanium.
  • FIG. 5 is a schematic diagram showing the planar structure of the light-emitting element of the substrate.
  • the display substrate further includes a plurality of light-emitting elements 520 arranged in an array. In a direction perpendicular to the base substrate 100, the light-emitting elements 520 are located between the metal touch layer 300 and the first Between the metal signal line layers 200.
  • a light-transmitting gap 530 is included between adjacent light-emitting elements 520, which can allow the reflected light 102 reflected on the display side (top in FIG. 2B) of the display substrate to pass through.
  • the light transmission gap 530 does not necessarily refer to a light transmission gap, but may also be a light transmission area of the display substrate.
  • the grid 310 of the metal touch layer and the light-emitting element 520 may correspond one-to-one, and the orthographic projection of each light-emitting element 520 on the base substrate 100 falls within the orthographic projection of the corresponding grid 310 on the base substrate 100.
  • the area of the orthographic projection of the light-emitting element 520 on the base substrate 100 is smaller than the area of the orthographic projection of the corresponding grid 310 on the base substrate 100.
  • the orthographic projection of the light-emitting element 520 on the base substrate 100 and the orthographic projection of the corresponding grid 310 on the base substrate 100 jointly divide the light transmission gap 530 into a plurality of annular gaps.
  • FIG. 2C is a partial enlarged schematic diagram of the display substrate shown by the dashed frame D in FIG. 2A.
  • the light-emitting element 520 includes a red light-emitting element R, a green light-emitting element G, and a blue light-emitting element B.
  • One red light-emitting element R, two green light-emitting elements G, and one blue light-emitting element B form a pixel unit (as shown by the dashed box in FIG. 5).
  • the first metal connection line segment 221 corresponding to the green light-emitting element G does not completely overlap the grid line 320.
  • the middle portion 2211 of the first metal connection line segment 221 corresponding to the green light-emitting element G does not overlap the grid line 320, and the two ends 2212 of the first metal connection line segment 221 corresponding to the green light-emitting element G do not overlap with the grid line 320.
  • the grid lines 320 at the corners overlap.
  • the first metal connection line segment 221 corresponding to the red light-emitting element R completely overlaps the grid line 320.
  • the middle portion 2213 of the first metal connection line segment 221 corresponding to the blue light-emitting element B does not overlap the grid line 320, and both ends of the first metal connection line segment 221 corresponding to the blue light-emitting element B 2214 overlaps the grid line 320 at the corner.
  • first metal connection line segment 221 corresponding to the green light-emitting element G refers to the first metal connection line segment 221 of the grid where the green light-emitting element G is located.
  • the first metal connection line segment 221 corresponding to the red light emitting element R and the blue light emitting element B refers to the first metal connection line segment 221 respectively located above the red light emitting element R and the blue light emitting element B in FIG. 2A along the first direction Y.
  • the positions of the green light-emitting element G, the red light-emitting element R, and the blue light-emitting element B can be interchanged, which is not limited in the present disclosure.
  • the display substrate provided by an embodiment of the present disclosure further includes a pixel defining layer 510.
  • the pixel defining layer 510 includes a plurality of openings 511 arranged in an array.
  • the openings 511 correspond to the light-emitting elements 520 one-to-one, and at least a part of the light-emitting elements 520 are located in the corresponding openings 511.
  • the aforementioned light-transmitting gap 530 is located between adjacent openings 511.
  • the embodiment of the present disclosure is not limited to this case.
  • the light-emitting element 520 may include an electroluminescent layer, and anodes and cathodes located on both sides of the electroluminescent layer.
  • the electroluminescent layer may be an organic light emitting layer.
  • the organic light-emitting layer can be produced by evaporation or the like, and it can be a continuous layer, and part of the organic light-emitting layer located in the opening 511 is the effective light-emitting area of the pixel unit.
  • the light-emitting element 520 described in the embodiment of the present disclosure may only include the organic light-emitting layer located in the opening 511, that is, the light-emitting element 520 may only include the effective light-emitting area of the pixel unit.
  • the anode forming the light-emitting element 520 may also be further formed outside the opening of the pixel defining layer 510.
  • the pixel defining layer 510 is a layer with a certain light transmittance, and the pixel defining layer 510 between the light emitting elements 520 can allow the reflected light 102 to pass through.
  • the pixel defining layer 510 between the light-emitting elements 520 may serve as a light-transmitting gap 530.
  • the material of the pixel defining layer 510 may include organic insulating materials such as polyimide, polyphthalimide, polyphthalamide, acrylic resin, benzocyclobutene, or phenolic resin, or inorganic materials such as silicon oxide and silicon nitride.
  • organic insulating materials such as polyimide, polyphthalimide, polyphthalamide, acrylic resin, benzocyclobutene, or phenolic resin, or inorganic materials such as silicon oxide and silicon nitride.
  • the insulating material is not limited in the embodiment of the present disclosure.
  • the metal connection signal lines are parallel and overlapped with the grid lines of the metal touch layer, which can reduce the penetration of the metal connection signal lines and the metal touch layer to the display substrate.
  • the shielding area of the light gap improves the under-screen fingerprint detection sensitivity of the display device using the display substrate, and can realize large-area under-screen fingerprint recognition.
  • at least partially overlapping the grid lines of the metal touch layer and the metal connection signal lines can also reduce the area for arranging opaque lines, thereby increasing the pixel aperture ratio of the display substrate.
  • the light-emitting element 520 is rectangular, and the grid 310 is also rectangular.
  • the shapes of the light-emitting element 520 and the mesh 310 are not limited to rectangles.
  • the shape and size of the light-emitting elements shown in FIGS. 2A and 5 are the same, the embodiments of the present disclosure are not limited thereto. According to actual needs, the shapes and sizes of different light-emitting elements 520 may not be completely the same, and the shapes and sizes of the corresponding grids 310 may not be completely the same.
  • FIG. 6 is a partial schematic diagram showing the planar structure of the substrate, schematically showing the structure of the light-emitting element 520 and the mesh 310 of the metal touch layer.
  • the light-emitting element 520 of the display substrate is a rectangular light-emitting element, and includes a first light-emitting element 5201 and a second light-emitting element 5202 having different sizes.
  • the grid 310 of the touch metal layer 300 is a rectangular grid, and includes a first grid 3101 and a second grid 3102 having different sizes.
  • the first light-emitting element 5201 corresponds to the first mesh 3101
  • the second light-emitting element 5202 corresponds to the second mesh 3102.
  • the area of the first light-emitting element 5201 is larger than the area of the second light-emitting element 5202, and the corresponding area of the first grid 3101 is also larger than the area of the second grid 3102. In this way, it is possible to keep as large a light-transmitting area as possible around each pixel to ensure the sensitivity of fingerprint detection.
  • the display substrate includes a pixel driving circuit for driving the light emitting element 520.
  • the first metal signal line 210 is a power supply line of the pixel driving circuit, and is configured to provide a power supply signal to the pixel driving circuit.
  • the power supply signal is, for example, a high-voltage power supply signal (VDD signal), a low-voltage power supply signal (VSS signal), or a current power supply. Signal.
  • VDD signal high-voltage power supply signal
  • VSS signal low-voltage power supply signal
  • the plurality of first metal signal lines 210 and the plurality of metal connection signal lines 220 form the first grid pattern of the first metal signal line layer 200, which can ensure the voltage of the display substrate in the second direction X perpendicular to the first direction Y Or the uniformity of the current signal, thereby improving the picture display quality.
  • the display substrate provided by an embodiment of the present disclosure further includes a second metal signal line layer 400 located on the side of the first metal signal line layer 200 close to the base substrate 100.
  • a first planarization layer 570 is included between the second metal signal line layer 400 and the first metal signal line layer 200, and a plurality of via holes 610 are opened in the first planarization layer 570.
  • the second metal signal line layer 400 includes a plurality of second metal signal lines 410 extending along the first direction Y.
  • the second metal signal lines 410 and the first metal signal lines 210 correspond to each other in a one-to-one relationship.
  • each second metal signal line 410 is electrically connected to the corresponding first metal signal line 210 through a via 610.
  • the second metal signal line 410 is also a power line of the pixel driving circuit, such as a positive power line (VDD power line), and is configured to provide a power signal to the light-emitting element 520.
  • VDD power line positive power line
  • the material of the second metal signal line layer 400 may include a metal material or an alloy material, and may be a single-layer metal or a multilayer metal stack.
  • both the first metal signal line layer 200 and the metal touch layer 300 can be made of a three-layer metal stack (Ti/Al/Ti) of titanium, aluminum, and titanium.
  • the second metal signal line and the first metal signal line are electrically connected in a one-to-one correspondence.
  • the first metal signal line 210 and the second metal signal line 410 adopt a double-layer parallel metal wiring method (for example, as the positive electrode of the power supply of the pixel driving circuit), which can reduce the resistance and ensure the display substrate in the first direction Y.
  • the uniformity of the signal improves the image display quality.
  • FIG. 2A shows that the width of the second metal signal line 410 in the second direction X is smaller than the width of the first metal signal line 210 in the second direction X, it is not limited to this.
  • the width of the second metal signal line 410 in the second direction X is equal to the width of the first metal signal line 210 in the second direction X.
  • the orthographic projection of the second metal signal line 410 on the base substrate 100 and the first The orthographic projection of a metal signal line 210 on the base substrate 100 basically coincides.
  • the width of the second metal signal line 410 in the second direction X is greater than the width of the first metal signal line 210 in the second direction X.
  • the width of different positions of the second metal signal line 410 or the first metal signal line 210 in the second direction X varies, and the width of the second metal signal line 410 may be greater than that of the first metal signal line 210 in some positions.
  • the width of the second metal signal line 410 is less than or equal to the width of the first metal signal line 210 at other locations.
  • the metal connection signal line 220 is a broken line, and includes a first metal connection line segment 221 and a second metal connection line segment 222 that are connected to each other.
  • the first metal connection line segment 221 extends in a second direction X perpendicular to the first direction Y
  • the second metal connection line segment 222 extends in a direction forming an acute or obtuse angle with the first direction Y.
  • the second metal connection line segment 222 is parallel to the grid line 320 of the metal touch layer 300, and in a direction perpendicular to the base substrate 100, the second metal connection line segment 222 is connected to the metal touch layer 300 overlap.
  • FIG. 2A shows that although FIG. 2A shows that the width of the second metal connection line segment 222 is equal to the width of the grid line 320 of the metal touch layer 300, it is not limited thereto.
  • the width of the second metal connection line segment 222 may also be smaller or larger than the width of the grid line 320 of the metal touch layer 300.
  • the width of the second metal connection line segment 222 is less than or equal to the width of the grid line 320 of the metal touch layer 300, and the orthographic projection of the second metal connection line segment 222 on the base substrate 100 falls into the metal touch layer 300 on the liner. In the orthographic projection on the base substrate 100.
  • the second metal connection line segment is parallel and overlapped with the grid lines of the metal touch layer, which can reduce the shielding area of the second metal connection line segment to the light transmission gap of the display substrate. Therefore, the under-screen fingerprint detection sensitivity of the display device adopting the display substrate is improved, and large-area under-screen fingerprint recognition is realized.
  • the length of the second metal connection line segment 222 is greater than or equal to the length of the first metal connection line segment 221. That is, the portion of the second metal connection line 220 that overlaps the metal touch layer is larger than the portion that does not overlap the metal touch layer, or in other words, in the direction perpendicular to the base substrate 100, the second metal connection line segment 222 is connected to the metal touch control layer.
  • the overlapping area of the grid lines 320 of the layer is greater than 50% of the area of the metal connection signal line 220. In this way, it is beneficial to reduce the shielding area of the light transmission gap of the display substrate by the second metal connecting line, thereby improving the under-screen fingerprint detection sensitivity of the display device using the display substrate, and realizing large-area under-screen fingerprint recognition.
  • the metal connection signal line 220 and the light-emitting element 520 do not overlap, which is beneficial to increase the pixel aperture ratio of the display substrate.
  • FIG. 2B also schematically shows the structure of the light-emitting element 520 and the switching element 540.
  • the display substrate provided by an embodiment of the present disclosure further includes at least one switch element 540, and each light-emitting element 520 has a corresponding switch element 540 to control the light-emitting element 520 to turn on or off.
  • the pixel circuit that controls each light-emitting element 520 may include multiple switching elements. For simplicity, only one of the switching elements is schematically shown in FIG. 2B.
  • the switching element 540 is a thin film transistor 540.
  • the thin film transistor 540 includes an active layer 543 on the base substrate 100, a gate 544 on the side of the active layer 543 away from the base substrate 100, and source and drain electrodes on the side of the gate 544 away from the base substrate. 541.
  • the display substrate provided by the embodiment of the present disclosure further includes a connection electrode 580.
  • the connection electrode is located between the thin film transistor and the light emitting element, and is electrically connected to the drain of the thin film transistor and the light emitting element, respectively.
  • the first metal signal line layer 200 and the connection electrode 580 are provided in the same layer, and the second metal signal line layer 400 is provided in the same layer as the source electrode or the drain electrode.
  • the light emitting element 520 is located on the side of the thin film transistor 540 away from the base substrate 100.
  • Each light-emitting element 520 also includes an anode 522, an electroluminescent layer 521, and a cathode 523 stacked in a direction perpendicular to the base substrate.
  • the electroluminescent layer 521 is located between the anode 522 and the cathode 523. Glow under the action.
  • the anode 522 of each light-emitting element is insulated from each other.
  • the cathode 523 of each light-emitting element is connected to each other to form a continuous cathode layer.
  • the anode 522 can be used as a pixel electrode, so that the brightness of each light-emitting element can be independently controlled for display.
  • the active layer of the thin film transistor 540 includes a source region and a drain region, and a channel region located between the source region and the drain region.
  • the thin film transistor 540 includes a source electrode and a drain electrode 541, and the source electrode and the drain electrode are electrically connected to the source electrode region and the drain region through via holes, respectively.
  • the gate overlaps the channel region between the source region and the drain region in the active layer in a direction perpendicular to the base substrate 100.
  • the display substrate further includes a plurality of data lines 542 extending along the first direction Y.
  • the data line 542 is configured to provide a data signal to the pixel driving circuit.
  • the data line 542 adopts a single-layer metal wiring structure.
  • the data line 542 and the second metal signal line 410 are arranged in the same layer, and the data line 542 and the second metal signal line 410 are parallel and insulated.
  • the width of the data line 542 is smaller than the width of the second metal signal line 410.
  • the material of the data line 542 and the source and drain electrodes 541 may include a metal material or an alloy material, and may be a single-layer metal or a multi-layer metal laminate, for example, a three-layer metal laminate of titanium, aluminum, and titanium (Ti/Al /Ti) Preparation.
  • the data line 542 and the source and drain electrodes 541 are arranged in the same layer as the second metal signal line 410, and can be manufactured by the same patterning process, thereby simplifying the manufacturing process of the display substrate and saving manufacturing costs.
  • the display substrate further includes a first planarization layer 570, which is located above the source and drain electrodes 541, and is used to planarize the surface of the thin film transistor on the side away from the base substrate.
  • a connection electrode 580 is formed on the first planarization layer 570, and the connection electrode 580 overlaps the anode 522 in a direction perpendicular to the base substrate.
  • the display substrate further includes a second planarization layer 590, which is located between the anode 522 and the connection electrode 580, and is used to planarize the surface of the connection electrode 580 away from the base substrate.
  • connection electrode 580 is electrically connected to the source and drain 541 through the via hole, and the anode 522 is electrically connected to the connection electrode 580 through the via hole, thereby achieving electrical connection between the anode 522 and the source and drain 541.
  • the connection electrode can avoid directly forming a straight through hole with a relatively large diameter in the first planarization layer and the second planarization layer, thereby improving the quality of the electrical connection of the via.
  • connection electrode 580 is located in the first metal signal line layer 200, that is, the connection electrode 580 is disposed in the same layer as the first metal signal line 210 and the metal connection signal line 220.
  • the connection electrode, the first metal signal line, and the metal connection signal line can be manufactured using the same patterning process, thereby simplifying the manufacturing process of the display substrate and saving manufacturing costs.
  • the display substrate further includes a first buffer layer 110 located between the base substrate 100 and the active layer 543.
  • the display substrate further includes a passivation layer 620 located between the first planarization layer 570 and the source and drain electrodes 541.
  • the display substrate further includes a second buffer layer 740 on top of 730.
  • the anode 522 may include a reflective layer, and the cathode 523 may include a transparent layer or a semi-transparent layer.
  • the area of the anode 522 is larger than the area of the electroluminescent layer 521 located in the opening 511, and the light-transmitting gap 530 between adjacent light-emitting elements 520 may further refer to the gap between adjacent anodes 522.
  • the anode 522 can reflect the light emitted by the electroluminescent layer 521 in the light-emitting element 520, and this part of the light is emitted into the external environment through the cathode 523, so that the light emission rate can be improved.
  • the anode 522 includes a reflective layer, which can also prevent the light-emitting element from emitting light downward and incident on the fingerprint sensor together with the reflected light from the fingerprint, which interferes with fingerprint detection and affects the sensitivity and accuracy of fingerprint detection.
  • the size of the above-mentioned light-emitting element can refer to the size of the anode of each light-emitting element.
  • the size of the anode is larger than the effective light-emitting area of the light-emitting element, and the area around the anode of the light-emitting element can be set as a light-transmitting gap. For the light used for fingerprint detection to pass through.
  • the material of the anode 522 may include at least one transparent conductive oxide material, including indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), and the like.
  • the anode 522 may include a metal having high reflectivity as a reflective layer, such as silver (Ag).
  • the material of the electroluminescent layer 521 may include small molecular organic materials or polymer molecular organic materials, which may be fluorescent light-emitting materials or phosphorescent light-emitting materials, which can emit red, green, blue, or white light;
  • the electroluminescent layer may further include functional layers such as an electron injection layer, an electron transport layer, a hole injection layer, and a hole transport layer as required.
  • the cathode 523 may include various conductive materials.
  • the cathode 523 may include metal materials such as lithium (Li), aluminum (Al), magnesium (Mg), and silver (Ag).
  • the display substrate further includes an encapsulation layer 700 covering the light-emitting element 520.
  • the metal touch layer 300 is located on the side of the packaging layer 700 away from the base substrate 100.
  • the encapsulation layer 700 seals the light emitting element 520, so that the deterioration of the light emitting element 520 caused by moisture or oxygen included in the environment can be reduced or prevented.
  • the encapsulation layer 700 may have a single-layer structure or a composite layer structure, and the composite layer structure includes a stacked structure of an inorganic layer and an organic layer.
  • the encapsulation layer 700 includes a first inorganic encapsulation layer 710, an organic encapsulation layer 720, and a second inorganic encapsulation layer 730 that are sequentially arranged.
  • the material of the encapsulation layer may include insulating materials such as silicon nitride, silicon oxide, silicon oxynitride, and polymer resin.
  • insulating materials such as silicon nitride, silicon oxide, silicon oxynitride, and polymer resin.
  • Inorganic materials such as silicon nitride, silicon oxide, and silicon oxynitride have high density and can prevent the intrusion of water and oxygen;
  • the material of the organic encapsulation layer can be a polymer material containing a desiccant or a polymer material that can block water vapor, etc.
  • polymer resins can be used to planarize the surface of the display substrate, and can relieve the stress of the first inorganic encapsulation layer and the second inorganic encapsulation layer, and can also include water-absorbing materials such as desiccant to absorb water intruding into the interior, Oxygen and other substances.
  • the display substrate further includes a second buffer layer 740 located on the side of the second inorganic encapsulation layer 730 away from the base substrate 100.
  • the display substrate further includes an insulating layer 750 located on the side of the second buffer layer 740 away from the base substrate 100.
  • the insulating layer 750 may be a silicon nitride layer.
  • the display substrate provided by the embodiment of the present disclosure has a touch function, which is implemented by the metal touch layer 300.
  • the touch structure used to implement the touch function may be a self-capacitance type or a mutual-capacitance type.
  • the self-capacitance touch structure includes a plurality of self-capacitance electrodes arranged in an array (on the same layer), and each self-capacitance electrode is electrically connected to a touch processing circuit (touch chip) through a touch lead.
  • the position detection is realized by detecting the change in capacitance of the self-capacitance electrode due to, for example, the approach of a finger during touch.
  • the mutual capacitance type touch structure includes a plurality of first touch signal lines extending in a first direction and a plurality of second touch signal lines extending in a second direction, the first touch signal line and the second touch signal line All are electrically connected to the touch processing circuit (touch chip) through the touch leads.
  • the first direction and the second direction cross each other and form an opening, thereby forming a touch capacitance at the crossing position of the first touch signal line and the second touch signal line.
  • the change of touch capacitance realizes position detection.
  • the embodiments of the present disclosure take a mutual capacitance type touch structure as an example for description.
  • the metal touch layer 300 includes a touch electrode bridge layer, a touch electrode insulating layer, and a touch electrode layer that are stacked.
  • the touch electrode layer includes a plurality of driving electrodes and a plurality of sensing electrodes insulated from each other.
  • the second grid pattern of the metal touch layer is located on the touch electrode layer, a plurality of metal grids in the second grid pattern form a driving electrode or a sensing electrode, the plurality of driving electrodes are connected to form a driving electrode line, and a plurality of sensing electrodes Connect to form a sensing electrode line.
  • the touch electrode insulating layer is located between the touch electrode bridge layer and the touch electrode layer, and the touch electrode insulating layer includes a plurality of via holes. The multiple vias electrically connect the touch electrode bridging layer and the touch electrode layer, thereby functioning as a bridge to contact the driving electrode or the sensing electrode of the control electrode layer.
  • the metal touch layer 300 is located on the encapsulation layer 700.
  • directly forming the touch structure on the packaging layer for example, directly fabricating a metal touch grid on the second inorganic packaging layer 730, it is beneficial to improve the integration of the display substrate, thereby reducing the thickness of the display substrate and improving the folding of the display substrate. performance.
  • the display substrate further includes a cover plate 800.
  • the cover 800 is, for example, a substrate or film made of glass or plastic, which is used to provide support and protection for the display substrate, and can also be used for a user to perform touch operations.
  • An embodiment of the present disclosure provides a display device, including the display substrate 10 provided in any of the foregoing embodiments.
  • FIG. 7 is a schematic cross-sectional structure diagram of a display device provided by an embodiment of the disclosure.
  • the display device further includes a fingerprint sensor 20 located on the side of the base substrate 100 away from the first metal signal line layer 200 and configured to detect the fingerprint 30 on the display substrate 10.
  • the fingerprint sensor 20 is attached to the side of the base substrate 100 away from the first metal signal line layer 200 (ie, the lower side in the figure) through optical transparent adhesive (OCA), and is used to detect the reflection from the surface of the cover 800 Reflected light 102 for fingerprint detection.
  • OCA optical transparent adhesive
  • the fingerprint sensor 20 has a certain area and includes areas corresponding to multiple light-emitting elements.
  • the fingerprint sensor 20 is coupled to a fingerprint detection processor (for example, an integrated circuit chip) through a wire, for example, so that the collected fingerprint image can be transmitted to the fingerprint detection processor in the form of a data signal.
  • the fingerprint sensor 20 may be various appropriate types of fingerprint sensors such as a charge coupled device (CCD) type or a complementary metal oxide semiconductor (CMOS) type image sensor.
  • CCD charge coupled device
  • CMOS complementary metal oxide semiconductor
  • the display device provided by the embodiment of the present disclosure may be any product or component with a display function, such as a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigator, and the like.
  • a display function such as a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigator, and the like.

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Nonlinear Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Quality & Reliability (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

一种显示基板及显示装置。该显示基板包括衬底基板、第一金属信号线层以及金属触控层。第一金属信号线层位于衬底基板上，包括沿第一方向延伸的多条第一金属信号线，每两条相邻的第一金属信号线之间包括多条金属连接信号线，金属连接信号线把两条相邻的第一金属信号线连接起来。金属触控层位于第一金属信号线层远离衬底基板的一侧，包括交叉的多条网格线。金属连接信号线的至少一部分与金属触控层的网格线平行，且在垂直于衬底基板的方向，金属连接信号线与金属触控层的网格线平行的部分与金属触控层的网格线交叠。该显示基板的金属连接信号线与金属触控层的网格线平行且交叠，可减小第一金属信号线层和金属触控层对显示基板遮挡面积。

Description

显示基板及显示装置 技术领域
本公开的实施例涉及一种显示基板及显示装置。
背景技术
有机发光二极管(Organic Light Emitting Diode,OLED)显示面板由于重量轻、自发光、广视角、驱动电压低、发光效率高、功耗低、响应速度快等优点，已经被广泛应用于各种电子产品中。目前，指纹检测已经成为电子产品的一种重要验证手段，尤其是屏下指纹检测技术有利于实现显示面板的窄边框设计。现今业界提出了越来越多的用于电子产品的屏下指纹检测解决方案，主要包括光学式、超声波式以及电容式屏下指纹检测，而目前应用最广泛的是光学屏下指纹检测技术。光学屏下指纹检测技术依靠光线反射来探测指纹回路，并将获得指纹图像与数据库中的图像进行对比，以达到检测指纹的目的。光学屏下指纹检测技术在OLED显示面板中应用尤其广泛。
发明内容
本公开的实施例提供一种显示基板及显示装置。该显示基板的金属连接信号线的至少一部分与金属触控层的网格线平行且交叠，可减小第一金属信号线层和金属触控层对显示基板的透光间隙的遮挡面积，从而提高采用了该显示基板的显示装置的屏下指纹检测灵敏度。
本公开一实施例提供一种显示基板，包括衬底基板；第一金属信号线层，位于所述衬底基板上，包括沿第一方向延伸的多条第一金属信号线，每两条相邻的所述第一金属信号线之间包括多条金属连接信号线，所述金属连接信号线把相邻的所述第一金属信号线连接起来；金属触控层，位于所述第一金属信号线层远离所述衬底基板的一侧，包括交叉的多条网格线，所述多条网格线形成阵列排布的多个网格，其中，所述金属连接信号线的至少一部分与所述金属触控层的网格线平行，且在垂直于所述衬底基板的方向，所述金属连接信号线与所述金属触控层的网格线平行的部分与所述金属触控层的网格 线至少部分交叠。
在一些示例中，所述金属连接信号线为折线，包括相互连接的第一金属连接线段和第二金属连接线段。
在一些示例中，所述第一金属连接线段沿与所述第一方向垂直的第二方向延伸，所述第二金属连接线段沿与所述第一方向呈锐角或钝角的方向延伸。
在一些示例中，所述第二金属连接线段与所述金属触控层的网格线平行，且在垂直于所述衬底基板的方向，所述第二金属连接线段与所述金属触控层的网格线交叠。
在一些示例中，在垂直于所述衬底基板的方向，所述第二金属连接线段与所述网格线交叠的面积大于所述金属连接信号线的面积的50％。
在一些示例中，在垂直于所述衬底基板的方向，所述第一金属连接线段与位于所述网格的拐角处的所述网格线至少部分交叠。
在一些示例中，所述第一金属连接线段与位于所述网格的拐角处的所述网格线的交叠面积小于所述第二金属连接线段与所述金属触控层的网格线交叠面积。
在一些示例中，所述网格线包括多个断点，在垂直于所述衬底基板的方向上，所述第二金属连接线段与至少部分所述断点交叠。
在一些示例中，所述第二金属连接线段的长度大于所述第一金属连接线段的长度。
在一些示例中，所述显示基板包括阵列排布的多个发光元件，相邻的所述发光元件之间包括透光间隙，在垂直于所述衬底基板的方向，所述发光元件位于所述金属触控层与所述第一金属信号线层之间，其中，所述网格与所述发光元件一一对应，每个所述发光元件在所述衬底基板上的正投影落入对应的所述网格在所述衬底基板上的正投影内，且所述发光元件在所述衬底基板上的正投影的面积小于对应的所述网格在所述衬底基板上的正投影的面积。
在一些示例中，所述发光元件包括红色发光元件、绿色发光元件和蓝色发光元件，在垂直于所述衬底基板的方向上，所述绿色发光元件对应的所述第一金属连接线段的中间部分与所述网格线不交叠，所述绿色发光元件对应的所述第一金属连接线段的两端与所述网格线交叠；所述红色发光元件第一金属连接线段与所述网格线完全交叠；所述蓝色发光元件对应的所述第一金 属连接线段的中间部分与所述网格线不交叠，所述蓝色发光元件对应的所述第一金属连接线段的两端与所述网格线交叠。
在一些示例中，所述显示基板还包括第二金属信号线层，位于所述第一金属信号线层靠近所述衬底基板的一侧，其中，所述第二金属信号线层包括沿所述第一方向延伸的多条第二金属信号线，所述多条第二金属信号线与所述多条第一金属信号线电连接。
在一些示例中，在垂直于所述衬底基板的方向上，所述金属连接信号线与所述发光元件不交叠。
在一些示例中，所述显示基板还包括像素限定层，包括阵列排布的多个开口，所述开口与所述发光元件一一对应，所述像素限定层的开口限定所述发光元件的有效发光区域。
在一些示例中，所述显示基板还包括封装层，覆盖所述发光元件，其中，所述金属触控层位于所述封装层远离所述衬底基板的一侧。
在一些示例中，所述显示基板还包括数据线，与所述第二金属信号线层同层，与所述第二金属信号线平行且绝缘。
在一些示例中，所述金属触控层包括层叠设置的触控电极桥接层、绝缘层以及触控电极层，所述绝缘层位于所述触控电极桥接层和所述触控电极层之间，并且所述绝缘层包括连接所述触控电极桥接层和所述触控电极层的过孔。
在一些示例中，所述第一金属信号线为电源线。
在一些示例中，所述显示基板还包括位于所述衬底基板和所述发光元件之间的至少一个薄膜晶体管和连接电极；所述至少一个薄膜晶体管包括位于所述衬底基板上的有源层，位于所述有源层远离所述衬底基板一侧的栅极，以及位于所述栅极远离所述衬底基板一侧的源极和漏极；所述连接电极位于所述至少一个薄膜晶体管和所述发光元件之间，与所述至少一个薄膜晶体管的漏极和所述发光元件电连接；所述第一金属信号线层与所述连接电极同层设置，所述第二金属信号线层与所述源极同层设置。
在一些示例中，所述衬底基板为柔性衬底基板。
本公开一实施例还提供一种显示装置，包括上述任一项所述的显示基板。
在一些示例中，所述显示装置还包括指纹传感器，位于所述衬底基板远 离所述第一金属信号线层的一侧，被配置为检测所述显示基板上的指纹。
附图说明
为了更清楚地说明本公开实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本公开的一些实施例，而非对本公开的限制。
图1为一种具有屏下指纹检测功能的OLED显示面板的示意图；
图2A为根据本公开一实施例的显示基板的平面结构示意图；
图2B为图2A所示的显示基板沿A-A线的剖面结构示意图；
图2C为图2A中虚线框D所示的显示基板的局部放大示意图；
图3为根据本公开一实施例的第一金属信号线层的平面结构示意图；
图4为根据本公开一实施例的金属触控层的平面结构示意图；
图5为根据本公开一实施例的发光元件的平面结构示意图；
图6为根据本公开一实施例的显示基板的平面结构的局部示意图；以及
图7为根据本公开一实施例的显示装置的截面结构示意图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例的附图，对本公开实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本公开保护的范围。
除非另外定义，本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相 对位置关系也可能相应地改变。
屏下指纹检测方案通常采用显示面板本身用于显示的光作为光源，指纹传感器通常设置在显示面板的非显示侧或集成在显示面板的功能层之中，由此实现屏下指纹检测功能。OLED具有自发光特性，并且其发光还可以根据需要进行控制或调制，可以为指纹图像采集提供便利，而且有助于提高电子装置的集成度。目前，OLED显示面板广泛采用光学屏下指纹检测方案以实现解锁或其他功能。
图1为一种具有屏下指纹检测功能的OLED显示面板的示意图。如图1所示，该OLED显示面板包括顶层膜21、薄膜封装层22、像素单元阵列23以及衬底基板24。
衬底基板24为位于其上的其他结构和功能层提供保护与支撑功能，其例如为塑料基板或玻璃基板。
像素单元阵列23形成在衬底基板24上，包括多个排列为预定阵列的像素单元。像素单元发出的光101用于显示以及作为屏下指纹检测的光。
薄膜封装层22覆盖像素单元阵列23以防止外界的水汽进入到像素单元阵列23之中导致其老化或劣化，其可以为多层薄膜封装层，例如包括层叠设置的无机封装层和有机封装层等。
采集指纹图像的指纹传感器25设置于(例如通过光学透明胶(OCA)贴附于)衬底基板24远离像素单元阵列23的一侧(即图中的下侧)，用于检测从顶层膜21的表面的指纹30反射的用于指纹检测的反射光102。指纹传感器25具有一定面积，例如包括多个排列为预定阵列的检测单元。
根据需要，该OLED显示面板还可以包括其他结构或功能层。例如，该OLED显示面板可以包括触控结构以用于实现触控功能。该触控结构例如可以内置于像素单元阵列23之中，或者形成在顶层膜21上，或者形成在封装结构22上等，例如可以为电容式、电阻式等。
为了实现屏下指纹检测功能，上述顶层膜21、薄膜封装22以及衬底基板24为至少部分透明或半透明的，或者像素单元阵列23中相邻的像素单元之间形成有透光间隙231，以便顶层膜21表面的指纹的反射光可以通过透明/半透明膜层或者透光间隙入射到指纹传感器25上，以获取指纹图像。
本申请的发明人发现，OLED显示基板中存在多种金属走线(例如电源 信号线、栅信号线、数据信号线、金属触控层、触控信号线等)，上述多种金属走线堆叠在一起会对上述透明/半透明膜层或透光间隙231形成遮挡，从而影响指纹检测的灵敏度。
针对上述问题，本公开的实施例提供一种显示基板及显示装置。该显示基板包括衬底基板、第一金属信号线层以及金属触控层。第一金属信号线层位于衬底基板上，包括沿第一方向延伸的多条第一金属信号线，每两条相邻的第一金属信号线之间包括多条金属连接信号线，金属连接信号线把相邻的第一金属信号线连接起来。金属触控层位于第一金属信号线层远离衬底基板的一侧，包括交叉的多条网格线，多条网格线形成阵列排布的多个网格。金属连接信号线的至少一部分与金属触控层的网格线平行，且在垂直于衬底基板的方向，金属连接信号线与金属触控层的网格线平行的部分与金属触控层的网格线交叠。该显示基板的金属连接信号线与金属触控层的网格线平行且交叠，可减小第一金属信号线层和金属触控层对显示基板的透明/半透明膜层或透光间隙的遮挡面积，从而提高采用了该显示基板的显示装置的屏下指纹检测灵敏度，并且能实现大面积的屏下指纹识别。
下面结合附图对本公开实施例提供的显示基板及显示装置进行描述。
本公开一实施例提供一种显示基板。图2A为根据本公开一实施例的显示基板的平面结构示意图，图2B为图2A所示的显示基板沿A-A线的剖面结构示意图。需要说明的是，为了更清楚地示出第一金属信号线层与金属触控层的交叠关系，图2A为显示基板的从非显示侧向显示侧观察的平面结构示意图，因此在图2A中第一金属信号线层位于金属触控层的上面。
如图2A和图2B所示，显示基板包括衬底基板100、位于衬底基板100上的具有第一网格图案的第一金属信号线层200、位于第一金属信号线层200远离衬底基板100一侧的具有第二网格图案的金属触控层300以及位于第一金属信号线层200与金属触控层300之间的发光元件520。图2A示意性地示出了该显示基板的第一金属信号线层200、金属触控层300以及发光元件520的平面结构及它们之间的位置关系。如图2A所示，在垂直于衬底基板100的方向(即，垂直于图中X-Y平面的方向)，第一金属信号线层200与金属触控层300相互交叠。图3-图5分别示出了第一金属信号线层200、发光元件520和金属触控层300的平面结构。图3为第一金属信号线层200的平面 结构示意图，图4为金属触控层300的平面结构示意图，图5为发光元件520的平面结构示意图。
例如，如图2A和图3所示，第一金属信号线层200包括沿第一方向Y延伸的多条第一金属信号线210，每两条相邻的第一金属信号线210之间包括多条金属连接信号线220，多条金属连接信号线220把相邻的第一金属信号线210连接起来，使得多条第一金属信号线210和多条金属连接信号线220组成第一金属信号线层200的第一网格图案。
例如，如图4所示，具有第二网格图案的金属触控层300包括多条相互连接的网格线320，多条网格线320形成多个阵列排布的网格310。例如，如图4所示，网格线320包括沿与第一方向Y成一锐角夹角的方向延伸的多条第一网格线321，以及与第一网格线321垂直的多条第二网格线322。多条第一网格线321与多条第二网格线322围成多个矩形的网格310。例如，如图4所示，多个矩形网格310的形状和尺寸不完全相同。当然，图4仅为一个示例，本公开的实施例不限定第一网格线321与第二网格线322垂直。例如，第二网格线322与第一网格线321也可以仅相交而不垂直，此时，多条第一网格线321与多条第二网格线322围成多个平行四边形的网格310。
例如，如图2A所示，金属连接信号线220的至少一部分与金属触控层300的网格线320平行，且在垂直于衬底基板100的方向，金属连接信号线220与金属触控层300的网格线320平行的部分与金属触控层300的网格线320交叠。例如，对于金属连接信号线220和金属触控线300的彼此平行且对应的部分可以完全重叠或部分重叠。例如，金属连接信号线220和金属触控层300的网格线320彼此平行且对应的部分的宽度可以相同或不同。例如，金属连接信号线220和金属触控层300的网格线320彼此平行且对应的部分中，金属连接信号线220的相应部分在衬底基板上的正投影可以完全落入金属触控层300的网格线320的相应部分在衬底基板上的正投影内，或者，金属触控层300的网格线320的相应部分在衬底基板上的正投影完全落入金属连接信号线220的相应部分在衬底基板上的正投影内。在这种情况下，可以最大程度地减小金属触控层的网格线和金属连接信号线的遮光范围。在一些示例中，在沿金属连接信号线220和金属触控层300的网格线320彼此平行且对应的部分的延伸方向垂直的方向上，金属触控层300的网格线320的相 应部分和金属连接信号线220的相应部分彼此错开，但二者至少部分重叠。在这种情况下，也可以减小金属触控层的网格线和金属连接信号线的遮光范围。
需要说明的是，上述的金属连接信号线的至少一部分与金属触控层的网格线平行，并不限定绝对平行，允许一定的误差范围。上述的金属连接信号线与金属触控层的网格线平行的部分与金属触控层的网格线交叠，是指金属连接信号线与金属触控层的网格线平行的部分在衬底基板上的正投影与金属触控层的网格线在衬底基板上的正投影至少部分重叠。
如上所述，通过以上方式将金属触控层的网格线与金属连接信号线至少部分重叠，可以减少二者的遮光范围。
在一些示例中，在设置有金属触控层的区域(即，触控区域)内，金属连接信号线220与金属触控层的网格线320平行且交叠的部分的长度占金属连接信号线220的总长度的50％以上。
例如，如图2A所示，在垂直于衬底基板100的方向，第一金属连接线段221与位于网格310的拐角处的网格线320至少部分交叠。例如，第一金属连接线段与拐角处的网格线在多个位置交叠(其中一个交叠位置如图中矩形虚线框C所示)。例如，第一金属连接线段221与位于网格310的拐角处的网格线320的交叠面积小于第二金属连接线段222与金属触控层300的网格线320的交叠面积。
例如，如图2A和图4所示，金属触控层的网格线320包括多个断点321，在垂直于衬底基板的方向上，第二金属连接线段222与至少部分断点320交叠。需要说明的是，从图2A中可以看到不与第二金属连接线段222交叠的断点320，但是看不到与第二金属连接线段222交叠的多个断点320。看不到的原因是与第二金属连接线段222交叠的断点321被第二金属连接线段222所遮挡。
例如，衬底基板100可以为无机材料，例如，玻璃板、石英板、金属板等。例如，衬底基板的材料也可以包括有机材料，例如该有机材料可以为聚酰亚胺、聚碳酸酯、聚丙烯酸酯、聚醚酰亚胺、聚醚砜、聚对苯二甲酸乙二醇酯和聚萘二甲酸乙二醇酯等树脂类材料。衬底基板100可以为柔性基板或非柔性基板，本公开的实施例对此不作限制。
例如，第一金属信号线层200和金属触控层300的材料可以包括金属材料或者合金材料，可以为单层金属或多层金属叠层。例如第一金属信号线层200和金属触控层300均可以采用钛、铝及钛三层金属叠层(Ti/Al/Ti)制备。
图5为显示基板的发光元件的平面结构示意图。例如，如图2A、图2B和图5所示，显示基板还包括阵列排布的多个发光元件520，在垂直于衬底基板100的方向，发光元件520位于金属触控层300与第一金属信号线层200之间。相邻的发光元件520之间包括透光间隙530，可允许显示基板显示侧(图2B中的顶部)反射的反射光102穿过。需要说明的是，透光间隙530并不一定是指透光的缝隙，也可以是显示基板的能透光的区域。例如，金属触控层的网格310与发光元件520可以一一对应，每个发光元件520在衬底基板100上的正投影落入对应的网格310在衬底基板100上的正投影内，且发光元件520在衬底基板100上的正投影的面积小于对应的网格310在衬底基板100上的正投影的面积。例如，如图2A所示，发光元件520在衬底基板100上的正投影和对应的网格310在衬底基板100上的正投影共同把透光间隙530分割为多个环形的间隙。
图2C为图2A中虚线框D所示的显示基板的局部放大示意图。例如，如图2A、图2C和图5所示，发光元件520包括红色发光元件R、绿色发光元件G和蓝色发光元件B。一个红色发光元件R、两个绿色发光元件G和一个蓝色发光元件B组成一个像素单元(如图5虚线框所示)。如图2A所示，在垂直于衬底基板的方向上，绿色发光元件G对应的第一金属连接线段221与网格线320不完全交叠。例如，如图2C所示，绿色发光元件G对应的第一金属连接线段221的中间部分2211与网格线320不交叠，绿色发光元件G对应的第一金属连接线段221的两端2212与拐角处的网格线320交叠。例如，如图2C所示，红色发光元件R对应的第一金属连接线段221与网格线320完全交叠。例如，如图2C所示，蓝色发光元件B对应的第一金属连接线段221的中间部分2213与网格线320不交叠，蓝色发光元件B对应的第一金属连接线段221的两端2214与拐角处的网格线320交叠。
需要说明的是，绿色发光元件G对应的第一金属连接线段221是指位于该绿色发光元件G所在的网格的第一金属连接线段221。红色发光元件R和蓝色发光元件B对应的第一金属连接线段221是指沿第一方向Y分别位于图 2A中该红色发光元件R和蓝色发光元件B上方的第一金属连接线段221。另外，绿色发光元件G、红色发光元件R和蓝色发光元件B的位置可以互换，本公开对此不做限定。
例如，本公开一实施例提供的显示基板还包括像素限定层510。如图2A、图2B和图5所示，像素限定层510包括多个阵列排布的开口511，开口511与发光元件520一一对应，发光元件520的至少一部分位于对应的开口511中。上述的透光间隙530位于相邻的开口511之间。
需要说明的是，虽然附图2B示意性地示出发光元件520设置在像素限定层510的开口内，但本公开的实施例不限于这种情况。例如，发光元件520可包括电致发光层以及位于电致发光层两侧的阳极和阴极。例如，电致发光层可为有机发光层。例如，有机发光层可以通过蒸镀等方式制作，其可以为连续的层，而位于开口511中的部分有机发光层为像素单元的有效发光区域。本公开实施例描述的发光元件520可以仅包括位于开口511中的有机发光层，即发光元件520可以仅包括像素单元的有效发光区域。又例如，形成发光元件520的阳极也可以进一步形成在像素限定层510的开口之外。关于发光元件520的具体结构，下文将结合图7做进一步描述。
例如，如图2B所示，像素限定层510为具有一定透光率的层，发光元件520之间的像素限定层510可允许反射光102穿过。也就是说，发光元件520之间的像素限定层510可以作为透光间隙530。
例如，像素限定层510的材料可以包括聚酰亚胺、聚酞亚胺、聚酞胺、丙烯酸树脂、苯并环丁烯或酚醛树脂等有机绝缘材料，或者包括氧化硅、氮化硅等无机绝缘材料，本公开的实施例对此不做限定。
在本公开一实施例提供的显示基板中，金属连接信号线的至少一部分与金属触控层的网格线平行且交叠，可减小金属连接信号线和金属触控层对显示基板的透光间隙的遮挡面积，从而提高采用了该显示基板的显示装置的屏下指纹检测灵敏度，并且能实现大面积屏下指纹识别。另外，将金属触控层的网格线与金属连接信号线至少部分重叠，还可以减少用于设置不透光线路的面积，从而增大显示基板的像素开口率。
例如，如图2A所示，发光元件520为矩形，网格310也为矩形。当然，发光元件520和网格310的形状不局限于矩形。例如，虽然图2A和图5示 出的发光元件的形状和尺寸均相同，但本公开的实施例不限于此。根据实际需要，不同的发光元件520的形状和尺寸可以不完全相同，相应的网格310的形状和尺寸也可以不完全相同。
图6为显示基板的平面结构的局部示意图，示意性地示出了发光元件520和金属触控层的网格310的结构。例如，如图6所示，显示基板的发光元件520为矩形发光元件，包括具有不同尺寸的第一发光元件5201和第二发光元件5202。触控金属层300的网格310为矩形网格，包括具有不同尺寸的第一网格3101和第二网格3102。第一发光元件5201对应第一网格3101，第二发光元件5202对应第二网格3102。例如，第一发光元件5201的面积大于第二发光元件5202的面积，相应的第一网格3101的面积也大于第二网格3102的面积。这样，可以尽量保持每个像素周围有尽量大的透光区域，保证指纹检测的灵敏度。
例如，显示基板包括用于驱动发光元件520的像素驱动电路。第一金属信号线210为像素驱动电路的电源线，被配置为给像素驱动电路提供电源信号，该电源信号例如为高电压电源信号(VDD信号)、低电压电源信号(VSS信号)或电流电源信号。多条第一金属信号线210和多条金属连接信号线220组成第一金属信号线层200的第一网格图案，可以保证显示基板在与第一方向Y垂直的第二方向X上的电压或电流信号的均一性，从而提升画面显示质量。
在一些示例中，如图2A和图2B所示，本公开一实施例提供的显示基板还包括第二金属信号线层400，位于第一金属信号线层200靠近衬底基板100的一侧。第二金属信号线层400与第一金属信号线层200之间包括第一平坦化层570，第一平坦化层570中开设有多个过孔610。第二金属信号线层400包括沿第一方向Y延伸的多条第二金属信号线410，第二金属信号线410与第一金属信号线210一一对应且在垂直于衬底基板的方向相互交叠，且每条第二金属信号线410通过过孔610与相应的第一金属信号线210电连接。第二金属信号线410也为像素驱动电路的电源线，例如正极电源线(VDD电源线)，被配置为给发光元件520提供电源信号。
例如，第二金属信号线层400的材料可以包括金属材料或者合金材料，可以为单层金属或多层金属叠层。例如第一金属信号线层200和金属触控层 300均可以采用钛、铝及钛三层金属叠层(Ti/Al/Ti)制备。
在本公开一实施例提供的显示基板中，第二金属信号线与第一金属信号线一一对应电连接。如此，第一金属信号线210和第二金属信号线410采用双层并联金属走线的方式(例如，作为像素驱动电路的电源正极)，可以降低电阻，保证显示基板在第一方向Y上的信号均一性，从而提升画面显示质量。
需要说明的是，虽然图2A示出第二金属信号线410在第二方向X的宽度小于第一金属信号线210在第二方向X的宽度，但不限于此。例如，第二金属信号线410在第二方向X的宽度等于第一金属信号线210在第二方向X的宽度，此时，第二金属信号线410在衬底基板100上的正投影与第一金属信号线210在衬底基板100上的正投影基本重合。又例如，第二金属信号线410在第二方向X的宽度大于第一金属信号线210在第二方向X的宽度。又例如，第二金属信号线410或第一金属信号线210的不同位置在第二方向X的宽度是变化的，可以在一些位置第二金属信号线410的宽度大于第一金属信号线210的宽度，而在另一些位置第二金属信号线410的宽度小于或等于第一金属信号线210的宽度。
例如，如图2A和图3所示，金属连接信号线220为折线，包括相互连接的第一金属连接线段221和第二金属连接线段222。第一金属连接线段221沿与第一方向Y垂直的第二方向X延伸，第二金属连接线段222沿与第一方向Y成一锐角或钝角的方向延伸。
例如，如图2A所示，第二金属连接线段222与金属触控层300的网格线320平行，且在垂直于衬底基板100的方向，第二金属连接线段222与金属触控层300交叠。需要说明的是，虽然图2A示出第二金属连接线段222的宽度等于金属触控层300的网格线320的宽度，但不限于此。例如，第二金属连接线段222的宽度还可以小于或大于金属触控层300的网格线320的宽度。例如，第二金属连接线段222的宽度小于或等于金属触控层300的网格线320的宽度，第二金属连接线段222在衬底基板100上的正投影落入金属触控层300在衬底基板100上的正投影内。
在本公开一实施例提供的显示基板中，第二金属连接线段与金属触控层的网格线平行且交叠，可减小第二金属连接线段对显示基板的透光间隙的遮 挡面积，从而提高采用了该显示基板的显示装置的屏下指纹检测灵敏度，并且实现大面积屏下指纹识别。
例如，如图2A和图3所示，第二金属连接线段222的长度大于或等于第一金属连接线段221的长度。即，第二金属连接线220与金属触控层重叠的部分大于不与金属触控层重叠的部分，或者说，在垂直于衬底基板100的方向，第二金属连接线段222与金属触控层的网格线320交叠的面积大于金属连接信号线220的面积的50％。如此，有利于减小第二金属连接线对显示基板的透光间隙的遮挡面积，从而提高采用了该显示基板的显示装置的屏下指纹检测灵敏度，并且实现大面积屏下指纹识别。
例如，如图2A和图3所示，金属连接信号线220与发光元件520不交叠，有利于提高显示基板的像素开口率。
例如，图2B还示意性地示出了发光元件520及开关元件540的结构。例如，如图2B所示，本公开一实施例提供的显示基板还包括至少一个开关元件540，每个发光元件520都有对应的开关元件540，以控制发光元件520打开或关闭。此外，需要说明的是，在控制每个发光元件520的像素电路中，可以包括多个开关元件，为了简便，图2B中仅仅示意性地示出了其中一个开关元件。
例如，如图2B所示，开关元件540为薄膜晶体管540。薄膜晶体管540包括位于衬底基板100上的有源层543，位于有源层543远离衬底基板100一侧的栅极544，以及位于栅极544远离衬底基板一侧的源极和漏极541。
例如，如图2B所示，本公开实施例提供的显示基板还包括连接电极580。连接电极位于薄膜晶体管和发光元件之间，分别与薄膜晶体管的漏极以及发光元件电连接。
例如，第一金属信号线层200与连接电极580同层设置，第二金属信号线层400与源极或漏极同层设置。
发光元件520位于薄膜晶体管540远离衬底基板100的一侧。每个发光元件520还包括沿垂直于衬底基板方向层叠设置的阳极522、电致发光层521和阴极523，电致发光层521位于阳极522和阴极523之间，可以在阳极和阴极的共同作用下发光。例如，每个发光元件的阳极522相互绝缘。每个发光元件的阴极523相互连接，组成连续的阴极层。例如，阳极522可以作为 像素电极，从而每个发光元件的亮度可以被独立控制，以进行显示。
例如，如图2B所示，薄膜晶体管540的有源层包括源极区和漏极区，以及位于源极区和漏极区之间的沟道区。薄膜晶体管540包括源极和漏极541，源极和漏极分别通过过孔与源极区和漏极区电连接。栅极在垂直于衬底基板100的方向上与有源层中位于源极区和漏极区之间的沟道区重叠。
例如，如图2A所示，显示基板还包括多条数据线542，沿第一方向Y延伸。数据线542配置为给像素驱动电路提供数据信号。例如，不同于第一金属信号线210与第二金属信号线410的双层并联走线结构，数据线542采用单层金属走线结构。
例如，数据线542与第二金属信号线410同层设置，且数据线542与第二金属信号线410平行且绝缘。例如，数据线542的宽度小于第二金属信号线410的宽度。
例如，数据线542及源极和漏极541的材料可以包括金属材料或者合金材料，可以为单层金属或多层金属叠层，例如采用钛、铝及钛三层金属叠层(Ti/Al/Ti)制备。数据线542及源极和漏极541与第二金属信号线410同层设置，可采用同一构图工艺制作，从而简化显示基板的制备工艺，节省制造成本。
例如，如图2B所示，显示基板还包括第一平坦化层570，第一平坦化层570位于源极和漏极541的上方，用于平坦化薄膜晶体管远离衬底基板一侧的表面。第一平坦化层570上形成有连接电极580，在垂直于衬底基板的方向，连接电极580与阳极522交叠。显示基板还包括第二平坦化层590，第二平坦化层590位于阳极522和连接电极580之间，用于平坦化连接电极580远离衬底基板一侧的表面。连接电极580通过过孔与源极和漏极541电连接，阳极522通过过孔与连接电极580电连接，从而实现阳极522与源极和漏极541的电连接。该连接电极可以避免直接在第一平坦化层和第二平坦化层中形成孔径比较大的直通过孔，从而改善过孔电连接的质量。
例如，连接电极580位于第一金属信号线层200内，即连接电极580与第一金属信号线210以及金属连接信号线220同层设置。如此，连接电极、第一金属信号线以及金属连接信号线可采用同一构图工艺制作，从而简化显示基板的制备工艺，节省制造成本。
例如，如图2B所示，显示基板还包括第一缓冲层110，位于衬底基板100和有源层543之间。显示基板还包括钝化层620，位于第一平坦化层570和源极和漏极541之间。显示基板还包括第二缓冲层740，位于730之上。
例如，阳极522可以包括反射层，阴极523可以包括透明层或半透明层。例如，阳极522的面积大于位于开口511中的电致发光层521的面积，相邻的发光元件520之间的透光间隙530进一步可以是指相邻的阳极522之间的间隙。由此，阳极522可以反射发光元件520中的电致发光层521发射的光，该部分光通过阴极523发射到外界环境中，从而可以提高光出射率。同时，阳极522包括反射层，还可以防止发光元件向下发射光线，与指纹反射光一起入射到指纹传感器，干扰指纹检测，影响指纹检测的灵敏度和准确性。
需要说明的是，上述发光元件的尺寸可以指每个发光元件的阳极的尺寸，一般阳极的尺寸会大于发光元件的有效发光区域，而发光元件的阳极周围的区域则可以设置为透光间隙，以供用于指纹检测的光线穿过。
例如，阳极522的材料可以包括至少一种透明导电氧化物材料，包括氧化铟锡(ITO)、氧化铟锌(IZO)、氧化锌(ZnO)等。此外，阳极522可以包括具有高反射率的金属作为反射层，诸如银(Ag)。
例如，对于OLED，电致发光层521的材料可以包括小分子有机材料或聚合物分子有机材料，可以为荧光发光材料或磷光发光材料，可以发红光、绿光、蓝光，或可以发白光；并且，根据需要电致发光层还可以进一步包括电子注入层、电子传输层、空穴注入层、空穴传输层等功能层。
例如，阴极523可以包括各种导电材料。例如，阴极523可以包括锂(Li)、铝(Al)、镁(Mg)、银(Ag)等金属材料。
例如，如图2B所示，显示基板还包括封装层700，覆盖发光元件520。金属触控层300位于封装层700远离衬底基板100的一侧。封装层700将发光元件520密封，从而可以减少或防止由环境中包括的湿气或氧引起的发光元件520的劣化。封装层700可以为单层结构，也可以为复合层结构，该复合层结构包括无机层和有机层堆叠的结构。例如，如图2B所示，封装层700包括依次设置的第一无机封装层710、有机封装层720和第二无机封装层730。
例如，该封装层的材料可以包括氮化硅、氧化硅、氮氧化硅、高分子树脂等绝缘材料。氮化硅、氧化硅、氮氧化硅等无机材料的致密性高，可以防 止水、氧等的侵入；有机封装层的材料可以为含有干燥剂的高分子材料或可阻挡水汽的高分子材料等，例如高分子树脂等以对显示基板的表面进行平坦化处理，并且可以缓解第一无机封装层和第二无机封装层的应力，还可以包括干燥剂等吸水性材料以吸收侵入内部的水、氧等物质。
例如，如图2B所示，显示基板还包括第二缓冲层740，位于第二无机封装层730远离衬底基板100的一侧。例如，显示基板还包括绝缘层750，位于第二缓冲层740远离衬底基板100的一侧。例如，绝缘层750可以为氮化硅层。
例如，本公开的实施例提供的显示基板具有触控功能，通过金属触控层300实现。用于实现触控功能的触控结构可以为自电容型或互电容型。自电容型触控结构包括多个阵列排布(在同一层)的自电容电极，每个自电容电极通过触控引线与触控处理电路(触控芯片)电连接。通过检测在触控时由于例如手指靠近而导致自电容电极的电容变化而实现位置检测。互电容型触控结构包括多条沿第一方向延伸的第一触控信号线和多条沿第二方向延伸的第二触控信号线，第一触控信号线和第二触控信号线均通过触控引线与触控处理电路(触控芯片)电连接。第一方向和第二方向彼此交叉并且形成开口，由此在第一触控信号线和第二触控信号线交叉位置处形成触控电容，通过检测在触控时由于例如手指靠近而导致该触控电容的变化而实现位置检测。本公开的实施例以互电容型触控结构为例进行说明。
金属触控层300包括层叠设置的触控电极桥接层、触控电极绝缘层以及触控电极层。触控电极层包括相互绝缘的多个驱动电极和多个感应电极。金属触控层的第二网格图案位于触控电极层，第二网格图案中的多个金属网格组成一个驱动电极或感应电极，多个驱动电极连接形成驱动电极线，多个感应电极连接形成感应电极线。触控电极绝缘层位于触控电极桥接层和触控电极层之间，并且触控电极绝缘层包括多个过孔。多个过孔使触控电极桥接层和触控电极层电连接从而起到桥接触控电极层的驱动电极或感应电极的作用。
例如，如图2B所示，金属触控层300位于封装层700上。通过将触控结构直接形成在封装层上，例如在第二无机封装层730上直接制作金属触控网格，有利于提高显示基板的集成度，从而降低显示基板的厚度，提高显示基板的折叠性能。
例如，如图2B所示，显示基板还包括盖板800。盖板800例如为玻璃或塑料制备的基板或膜层，用于为显示基板提供支撑与保护，也可以用于供用户进行触控操作。
本公开一实施例提供一种显示装置，包括上述任一实施例提供的显示基板10。
图7为本公开一实施例提供的显示装置的截面结构示意图。在一些示例中，如图7所示，显示装置还包括指纹传感器20，位于衬底基板100远离第一金属信号线层200的一侧，被配置为检测显示基板10上的指纹30。例如，指纹传感器20通过光学透明胶(OCA)贴附于衬底基板100远离第一金属信号线层200的一侧(即图中的下侧)，用于检测从盖板800的表面反射的用于指纹检测的反射光102。指纹传感器20具有一定面积，包括多个发光元件对应的区域。该指纹传感器20例如通过引线与指纹检测处理器(例如集成电路芯片)耦接，从而可以将采集的指纹图像以数据信号的方式传送给该指纹检测处理器。指纹传感器20可以为电荷耦合装置(CCD)型或互补金属氧化物半导体(CMOS)型图像传感器等各种适当类型的指纹传感器。
例如，本公开的实施例提供的显示装置可以为手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
有以下几点需要说明：
(1)本公开实施例附图只涉及到与本公开实施例涉及到的结构，其他结构可参考通常设计。
(2)在不冲突的情况下，本公开的实施例及实施例中的特征可以相互组合以得到新的实施例。
以上，仅为本公开的具体实施方式，但本公开的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本公开揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本公开的保护范围之内。因此，本公开的保护范围应以权利要求的保护范围为准。

Claims (22)

  1. 一种显示基板，包括：
    衬底基板；
    第一金属信号线层，位于所述衬底基板上，包括沿第一方向延伸的多条第一金属信号线，每两条相邻的所述第一金属信号线之间包括多条金属连接信号线，所述金属连接信号线把相邻的所述第一金属信号线连接起来；
    金属触控层，位于所述第一金属信号线层远离所述衬底基板的一侧，包括交叉的多条网格线，所述多条网格线形成阵列排布的多个网格，
    其中，所述金属连接信号线的至少一部分与所述金属触控层的网格线平行，且在垂直于所述衬底基板的方向，所述金属连接信号线与所述金属触控层的网格线平行的部分与所述金属触控层的网格线至少部分交叠。
  2. 根据权利要求1所述的显示基板，其中，所述金属连接信号线为折线，包括相互连接的第一金属连接线段和第二金属连接线段。
  3. 根据权利要求2所述的显示基板，其中，所述第一金属连接线段沿与所述第一方向垂直的第二方向延伸，所述第二金属连接线段沿与所述第一方向呈锐角或钝角的方向延伸。
  4. 根据权利要求2或3所述的显示基板，其中，所述第二金属连接线段与所述金属触控层的网格线平行，且在垂直于所述衬底基板的方向，所述第二金属连接线段与所述金属触控层的网格线交叠。
  5. 根据权利要求4所述的显示基板，其中，在垂直于所述衬底基板的方向，所述第二金属连接线段与所述网格线交叠的面积大于所述金属连接信号线的面积的50％。
  6. 根据权利要求2-5任一项所述的显示基板，其中，在垂直于所述衬底基板的方向，所述第一金属连接线段与位于所述网格的拐角处的所述网格线至少部分交叠。
  7. 根据权利要求6所述的显示基板，其中，所述第一金属连接线段与位于所述网格的拐角处的所述网格线的交叠面积小于所述第二金属连接线段与所述金属触控层的网格线的交叠面积。
  8. 根据权利要求4-7任一项所述的显示基板，其中，所述网格线包括多 个断点，在垂直于所述衬底基板的方向上，所述第二金属连接线段与至少部分所述断点交叠。
  9. 根据权利要求2-8任一项所述的显示基板，其中，所述第二金属连接线段的长度大于所述第一金属连接线段的长度。
  10. 根据权利要求1-9任一项所述的显示基板，包括阵列排布的多个发光元件，相邻的所述发光元件之间包括透光间隙，在垂直于所述衬底基板的方向，所述发光元件位于所述金属触控层与所述第一金属信号线层之间，其中，所述网格与所述发光元件一一对应，每个所述发光元件在所述衬底基板上的正投影落入对应的所述网格在所述衬底基板上的正投影内，且所述发光元件在所述衬底基板上的正投影的面积小于对应的所述网格在所述衬底基板上的正投影的面积。
  11. 据权利要求10所述的显示基板，其中，所述发光元件包括红色发光元件、绿色发光元件和蓝色发光元件，在垂直于所述衬底基板的方向上，所述绿色发光元件对应的所述第一金属连接线段的中间部分与所述网格线不交叠，所述绿色发光元件对应的所述第一金属连接线段的两端与所述网格线交叠；
    所述红色发光元件对应的所述第一金属连接线段与所述网格线完全交叠；
    所述蓝色发光元件对应的所述第一金属连接线段的中间部分与所述网格线不交叠，所述蓝色发光元件对应的所述第一金属连接线段的两端与所述网格线交叠。
  12. 根据权利要求1-11任一项所述的显示基板，还包括第二金属信号线层，位于所述第一金属信号线层靠近所述衬底基板的一侧，其中，所述第二金属信号线层包括沿所述第一方向延伸的多条第二金属信号线，所述多条第二金属信号线与所述多条第一金属信号线电连接。
  13. 根据权利要求10所述的显示基板，其中，在垂直于所述衬底基板的方向上，所述金属连接信号线与所述发光元件不交叠。
  14. 根据权利要求10或11所述的显示基板，还包括：
    像素限定层，包括阵列排布的多个开口，所述开口与所述发光元件一一对应，所述像素限定层的开口限定所述发光元件的有效发光区域。
  15. 根据权利要求10或11所述的显示基板，还包括封装层，覆盖所述 发光元件，其中，所述金属触控层位于所述封装层远离所述衬底基板的一侧。
  16. 根据权利要求2-15任一项所述的显示基板，还包括数据线，与所述第二金属信号线层同层，与所述第二金属信号线平行且绝缘。
  17. 根据权利要求1-16任一项所述的显示基板，其中，所述金属触控层包括层叠设置的触控电极桥接层、绝缘层以及触控电极层，所述绝缘层位于所述触控电极桥接层和所述触控电极层之间，并且所述绝缘层包括连接所述触控电极桥接层和所述触控电极层的过孔。
  18. 根据权利要求1-17任一项所述的显示基板，其中，所述第一金属信号线为正极电源线。
  19. 根据权利要求12所述的显示基板，还包括位于所述衬底基板和所述发光元件之间的至少一个薄膜晶体管和连接电极，
    所述至少一个薄膜晶体管包括位于所述衬底基板上的有源层，位于所述有源层远离所述衬底基板一侧的栅极，以及位于所述栅极远离所述衬底基板一侧的源极和漏极；
    所述连接电极位于所述至少一个薄膜晶体管和所述发光元件之间，与所述至少一个薄膜晶体管的漏极和所述发光元件电连接；
    所述第一金属信号线层与所述连接电极同层设置，所述第二金属信号线层与所述源极同层设置。
  20. 根据权利要求1-19任一项所述的显示基板，其中，所述衬底基板为柔性衬底基板。
  21. 一种显示装置，包括根据权利要求1-20任一项所述的显示基板。
  22. 根据权利要求21所述的显示装置，还包括指纹传感器，位于所述衬底基板远离所述第一金属信号线层的一侧，被配置为检测所述显示基板上的指纹。
PCT/CN2020/076564 2020-02-25 2020-02-25 显示基板及显示装置 WO2021168646A1 (zh)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2021573139A JP7529698B2 (ja) 2020-02-25 2020-02-25 表示基板及び表示装置
US17/425,113 US12075668B2 (en) 2020-02-25 2020-02-25 Display substrate and display device
PCT/CN2020/076564 WO2021168646A1 (zh) 2020-02-25 2020-02-25 显示基板及显示装置
CN202080000175.6A CN113557470B (zh) 2020-02-25 2020-02-25 显示基板及显示装置
EP20921378.4A EP4113198A4 (en) 2020-02-25 2020-02-25 DISPLAY SUBSTRATE AND DISPLAY DEVICE
US18/768,220 US20240365616A1 (en) 2020-02-25 2024-07-10 Display substrate and display device
JP2024115675A JP2024150606A (ja) 2020-02-25 2024-07-19 表示基板及び表示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2020/076564 WO2021168646A1 (zh) 2020-02-25 2020-02-25 显示基板及显示装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US17/425,113 A-371-Of-International US12075668B2 (en) 2020-02-25 2020-02-25 Display substrate and display device
US18/768,220 Continuation US20240365616A1 (en) 2020-02-25 2024-07-10 Display substrate and display device

Publications (1)

Publication Number Publication Date
WO2021168646A1 true WO2021168646A1 (zh) 2021-09-02

Family

ID=77492053

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2020/076564 WO2021168646A1 (zh) 2020-02-25 2020-02-25 显示基板及显示装置

Country Status (5)

Country Link
US (2) US12075668B2 (zh)
EP (1) EP4113198A4 (zh)
JP (2) JP7529698B2 (zh)
CN (1) CN113557470B (zh)
WO (1) WO2021168646A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111755489A (zh) * 2020-06-22 2020-10-09 武汉华星光电半导体显示技术有限公司 显示面板

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113557470B (zh) * 2020-02-25 2023-10-13 京东方科技集团股份有限公司 显示基板及显示装置
KR20220073296A (ko) * 2020-11-26 2022-06-03 엘지디스플레이 주식회사 터치 디스플레이 장치
CN114019736B (zh) * 2021-11-05 2023-10-20 京东方科技集团股份有限公司 显示基板和显示装置
CN114510160B (zh) * 2022-01-28 2024-06-25 云谷（固安）科技有限公司 触控面板及显示装置
CN114783008A (zh) * 2022-03-31 2022-07-22 上海天马微电子有限公司 显示面板及显示装置
CN115113766B (zh) * 2022-06-24 2024-10-18 京东方科技集团股份有限公司 触控显示基板和触控显示装置
WO2024197556A1 (en) * 2023-03-28 2024-10-03 Boe Technology Group Co., Ltd. Array substrate and display apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160299612A1 (en) * 2015-04-09 2016-10-13 Shanghai Tianma Micro-Electronics Co.,Ltd Array substrate, touch display panel and display apparatus
CN106168865A (zh) * 2016-06-28 2016-11-30 京东方科技集团股份有限公司 内嵌式触摸屏及其制作方法、显示装置
CN106775063A (zh) * 2016-11-25 2017-05-31 京东方科技集团股份有限公司 触控面板及其制作方法、显示装置
CN206479736U (zh) * 2017-02-28 2017-09-08 厦门天马微电子有限公司 触控显示面板和触控显示装置
CN108319398A (zh) * 2018-02-28 2018-07-24 京东方科技集团股份有限公司 一种触控面板及其制备方法、触控装置

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120257135A1 (en) * 2011-04-08 2012-10-11 Shenzhen China Star Optoelectronics Technology Co. Ltd. Fan-out design, method of forming fan-out design, and lcd adopting the fan-out design
KR101903568B1 (ko) 2012-07-19 2018-10-04 삼성디스플레이 주식회사 표시 장치
KR102096051B1 (ko) * 2013-03-27 2020-04-02 삼성디스플레이 주식회사 박막 트랜지스터 어레이 기판 및 이를 포함하는 유기 발광 표시 장치
TWI726843B (zh) * 2014-05-30 2021-05-11 日商半導體能源研究所股份有限公司 觸控面板
CN106210250A (zh) * 2015-05-28 2016-12-07 中兴通讯股份有限公司 车载终端及其控制方法、以及手持终端及其控制方法
CN105158955B (zh) * 2015-10-26 2019-02-12 天马微电子股份有限公司 一种显示面板及其制作方法
CN117500327A (zh) * 2016-01-21 2024-02-02 苹果公司 有机发光二极管显示器的电源和数据路由结构
JP6684167B2 (ja) * 2016-06-27 2020-04-22 株式会社ジャパンディスプレイ 表示装置
KR101913395B1 (ko) * 2016-07-29 2018-10-31 삼성디스플레이 주식회사 표시장치
KR101979444B1 (ko) * 2016-07-29 2019-05-17 삼성디스플레이 주식회사 표시장치
US10224386B2 (en) * 2016-09-23 2019-03-05 Apple Inc. Display with power supply mesh
US10474295B2 (en) 2016-11-10 2019-11-12 Samsung Display Co., Ltd. Display device including sensor and auxiliary sensor parts
JP6842362B2 (ja) * 2017-05-12 2021-03-17 株式会社ジャパンディスプレイ 表示装置
KR102419557B1 (ko) * 2017-08-28 2022-07-08 엘지디스플레이 주식회사 터치 스크린 패널 및 이를 포함하는 표시 장치
CN107491211B (zh) * 2017-08-28 2021-03-16 上海中航光电子有限公司 一种触控显示面板和触控显示装置
KR102382639B1 (ko) * 2017-10-31 2022-04-05 엘지디스플레이 주식회사 터치센서를 포함하는 표시장치 및 그의 제조방법
CN109976566B (zh) * 2018-03-23 2021-05-18 京东方科技集团股份有限公司 触控结构、触控基板及其制作方法、显示装置
US10452201B1 (en) 2018-03-30 2019-10-22 Sharp Kabushiki Kaisha Touch sensor for display with shield
CN208903230U (zh) 2018-10-18 2019-05-24 信利光电股份有限公司 一种金属网格触摸屏
CN110188702B (zh) 2019-05-31 2021-03-30 上海天马微电子有限公司 一种显示面板和显示装置
CN113557470B (zh) * 2020-02-25 2023-10-13 京东方科技集团股份有限公司 显示基板及显示装置
KR20220008997A (ko) * 2020-07-14 2022-01-24 삼성디스플레이 주식회사 전자장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160299612A1 (en) * 2015-04-09 2016-10-13 Shanghai Tianma Micro-Electronics Co.,Ltd Array substrate, touch display panel and display apparatus
CN106168865A (zh) * 2016-06-28 2016-11-30 京东方科技集团股份有限公司 内嵌式触摸屏及其制作方法、显示装置
CN106775063A (zh) * 2016-11-25 2017-05-31 京东方科技集团股份有限公司 触控面板及其制作方法、显示装置
CN206479736U (zh) * 2017-02-28 2017-09-08 厦门天马微电子有限公司 触控显示面板和触控显示装置
CN108319398A (zh) * 2018-02-28 2018-07-24 京东方科技集团股份有限公司 一种触控面板及其制备方法、触控装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111755489A (zh) * 2020-06-22 2020-10-09 武汉华星光电半导体显示技术有限公司 显示面板

Also Published As

Publication number Publication date
CN113557470A (zh) 2021-10-26
EP4113198A1 (en) 2023-01-04
US20240365616A1 (en) 2024-10-31
EP4113198A4 (en) 2023-04-05
JP2024150606A (ja) 2024-10-23
US12075668B2 (en) 2024-08-27
JP7529698B2 (ja) 2024-08-06
JP2023524325A (ja) 2023-06-12
CN113557470B (zh) 2023-10-13
US20220320237A1 (en) 2022-10-06

Similar Documents

Publication Publication Date Title
WO2021168646A1 (zh) 显示基板及显示装置
KR102482495B1 (ko) 터치 센서를 가지는 표시 장치
KR101926527B1 (ko) 터치 센서를 가지는 유기 발광 표시 장치 및 그 제조 방법
KR101939479B1 (ko) 표시 장치
US9991465B2 (en) Display device having crack prevention portion
KR102269919B1 (ko) 터치 센서를 포함하는 표시 장치
JP5443442B2 (ja) ディスプレイパネル及びその製造方法
JP7119180B2 (ja) 表示装置
KR20200102025A (ko) 표시 장치
WO2022017020A1 (zh) 一种显示装置及其制作方法
US20220384555A1 (en) Display substrate and manufacturing method thereof, and display device
JP2017224508A (ja) 表示装置
US11921963B2 (en) Touch structure, touch display structure, and touch display device
WO2022241679A1 (zh) 触控结构以及显示面板
CN110023891B (zh) 压力触控结构、压力触控面板、显示装置
KR20160000980A (ko) 디스플레이 장치
CN114005861A (zh) 显示基板以及显示装置
KR102603603B1 (ko) 터치 디스플레이 장치
KR20210086143A (ko) 터치 디스플레이 장치
US11954278B2 (en) Display panel and electronic device
WO2024022126A1 (zh) 触控面板及显示装置
KR102009331B1 (ko) 표시 장치
US20240188372A1 (en) Display panel, manufacturing method and display device
US20230209925A1 (en) Display substrate and display device
US12130985B2 (en) Display panel

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20921378

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2021573139

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 2020921378

Country of ref document: EP

Effective date: 20220926