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WO2020262688A1 - Lithographic printing plate original plate, method for fabricating lithographic printing plate, and lithographic printing method - Google Patents

Lithographic printing plate original plate, method for fabricating lithographic printing plate, and lithographic printing method Download PDF

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Publication number
WO2020262688A1
WO2020262688A1 PCT/JP2020/025410 JP2020025410W WO2020262688A1 WO 2020262688 A1 WO2020262688 A1 WO 2020262688A1 JP 2020025410 W JP2020025410 W JP 2020025410W WO 2020262688 A1 WO2020262688 A1 WO 2020262688A1
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WO
WIPO (PCT)
Prior art keywords
group
printing plate
compound
original plate
lithographic printing
Prior art date
Application number
PCT/JP2020/025410
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French (fr)
Japanese (ja)
Inventor
洋平 石地
和朗 榎本
俊佑 柳
Original Assignee
富士フイルム株式会社
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Publication date
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Publication of WO2020262688A1 publication Critical patent/WO2020262688A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02Cover layers; Protective layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08Developable by water or the fountain solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers

Definitions

  • This disclosure relates to a lithographic printing plate original plate, a method for producing a lithographic printing plate, and a lithographic printing method.
  • a lithographic printing plate comprises a lipophilic image portion that receives ink in the printing process and a hydrophilic non-image portion that receives dampening water.
  • the oil-based image part of the flat plate printing plate is the ink receiving part
  • the hydrophilic non-image part is the dampening water receiving part (ink non-receptive part).
  • a lithographic printing plate original plate in which a lipophilic photosensitive resin layer (image recording layer) is provided on a hydrophilic support has been widely used.
  • PS plate lithographic printing plate original plate
  • image recording layer image recording layer
  • a flat plate printing plate is obtained by performing plate making by a method of dissolving and removing with a solvent to expose the surface of a hydrophilic support to form a non-image portion.
  • machine development As one of the simple manufacturing methods, a method called "machine development” is performed. That is, after the lithographic printing plate original plate is exposed, the conventional development is not performed, and the printing machine is mounted as it is, and unnecessary portions of the image recording layer are removed at the initial stage of the normal printing process.
  • Patent Document 1 describes (A) a radically polymerizable compound, (B) an infrared absorbing dye, (C) a radical generator, (D) an oil-based resin on the core portion, and the following general formula on the shell portion on the support.
  • a lithographic printing plate precursor having an image recording layer that contains resin fine particles having a core-shell structure having a resin having the structural unit represented by (I) and can be removed by at least one of ink and dampening water.
  • R 1 , R 2 , R 3 and R 4 each independently represent a hydrogen atom or a methyl group, and m and l are 0 or positive integers satisfying 1 ⁇ m + l ⁇ 200. is there.
  • Patent Document 2 describes a color-developing composition containing a compound represented by the following formula 1 used for an image recording layer.
  • A represents a ring structure containing at least one atom selected from the group consisting of a nitrogen atom, an oxygen atom and a sulfur atom
  • a + represents a ring structure containing N + , O + or S + .
  • Each of X independently represents a carbon atom or a nitrogen atom, and at least one of X is a nitrogen atom, and when X is a nitrogen atom, R 1 , R 2 or R 3 bonded to the nitrogen atom is present.
  • R 1 , R 2 and R 3 are independently hydrogen atom, halogen atom, hydrocarbon group, alkoxy group, aryloxy group, alkylthio group, arylthio group, acyl group, hydroxy group, alkoxycarbonyl group and acyloxy. Representing a group, amino group, urethane group, urea group, amide group, nitrile group or imino group, two or more R 1 to R 3 may be bonded to form a ring structure, and one or more R 1 to R may be formed. 3 and A or A + may be combined to form a ring structure, where n represents an integer of 1 to 6 and Z represents a counterion for neutralizing the charge.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2012-711590
  • Patent Document 2 International Publication No. 2018/043150
  • An object to be solved by the embodiment of the present invention is to provide a lithographic printing plate original plate having excellent printing durability of the obtained lithographic printing plate even when UV ink is used.
  • An object to be solved by another embodiment of the present invention is to provide a method for producing a lithographic printing plate or a lithographic printing method using the lithographic printing plate original plate.
  • the means for solving the above problems include the following aspects.
  • ⁇ 3> The planographic printing plate original plate according to ⁇ 1> or ⁇ 2>, wherein the polymethine dye contains a cyanine dye having an electron-attracting group or a heavy atom-containing group in at least one of the aromatic rings at both ends.
  • ⁇ 4> The planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 3>, wherein the HOMO of the polymethine dye is ⁇ 5.3 eV or less.
  • ⁇ 5> The planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 4>, wherein the image recording layer is the outermost layer.
  • ⁇ 6> The planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 4>, which has a protective layer containing a discoloring compound on the image recording layer.
  • ⁇ 7> The planographic printing plate original plate according to ⁇ 6>, wherein the brightness change ⁇ L before and after the exposure is 2.0 or more when exposure is performed with infrared rays having a wavelength of 830 nm at an energy density of 110 mJ / cm 2 .
  • ⁇ 8> The lithographic printing plate original plate according to ⁇ 6> or ⁇ 7>, wherein the discoloring compound contains a compound that develops color due to infrared exposure.
  • ⁇ 9> The planographic printing plate original plate according to any one of ⁇ 6> to ⁇ 8>, wherein the discoloring compound contains a decomposable compound that decomposes due to infrared exposure.
  • the discoloring compound contains a degradable compound that is decomposed by heat, electron transfer, or both due to infrared exposure.
  • the discoloring compound is a cyanine pigment.
  • the discoloring compound is a compound represented by the following formula 1-1.
  • R 1 represents a group represented by any of the following formulas 2 to 4, and R 11 to R 18 are independently hydrogen atom, halogen atom, -R a , -OR b , and so on.
  • -SR c or represents -NR d R e
  • R a ⁇ R e each independently represents a hydrocarbon group
  • a 1 a 2 and a plurality of R 11 ⁇ R 18 are linked monocyclic or Polycycles may be formed, where A 1 and A 2 independently represent an oxygen atom, a sulfur atom, or a nitrogen atom, and n 11 and n 12 each independently represent an integer of 0 to 5.
  • n 11 and n 12 is 2 or more, n 13 and n 14 independently represent 0 or 1, L represents an oxygen atom, a sulfur atom, or -NR 10- , and R 10 Represents a hydrogen atom, an alkyl group, or an aryl group, and Za represents a counterion that neutralizes the charge.
  • R 20 , R 30 , R 41 and R 42 independently represent an alkyl group or an aryl group
  • Zb represents a charge-neutralizing counterion
  • the wavy line represents the above formula 1-.
  • R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independently hydrogen atom, halogen atom, -R a , -OR b , and so on.
  • -CN, -SR c, or represents -NR d R e, R 23 and R 24 each independently represent a hydrogen atom, or represents a -R a, each is R a ⁇ R e independently, hydrocarbon Representing a group, R 19 and R 20 , R 21 and R 22 , or R 23 and R 24 may be linked to form a monocyclic or polycyclic, where L is an oxygen atom, a sulfur atom, or , -NR 10- , R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and R d1 to R d4 , W 1 and W 2 may independently have substituents. It represents an alkyl group and Za represents a counterion that neutralizes the charge.
  • R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independent hydrogen atoms, halogen atoms, and ⁇ R a. , -OR b , -CN, -SR c , or -NR d R e , and R 25 and R 26 independently represent a hydrogen atom, a halogen atom, or -R a , and R a to R e.
  • W 1 and W 2 in the above formulas 1-2 to 1-7 are each independently an alkyl group having a substituent, and as the above substituents,-(OCH 2 CH 2 )-and sulfo.
  • the flat plate printing plate original plate according to ⁇ 13> or ⁇ 14> which is a group, a salt of a sulfo group, a carboxy group, or a group having at least a salt of a carboxy group.
  • ⁇ 16> The planographic printing plate original plate according to any one of ⁇ 13> to ⁇ 15>, wherein L in the above formulas 1-2 to 1-7 is an oxygen atom.
  • the ratio M X / M Y between the content M Y of the infrared absorber content M X and the image recording layer of the discoloring compound of the protective layer is at least 0.2 ⁇ 6>
  • ⁇ 18> The planographic printing plate original plate according to any one of ⁇ 6> to ⁇ 17>, wherein the protective layer contains a water-soluble polymer.
  • the water-soluble polymer contains polyvinyl alcohol having a saponification degree of 50% or more.
  • ⁇ 20> The planographic printing plate original plate according to ⁇ 18> or ⁇ 19>, wherein the water-soluble polymer contains polyvinylpyrrolidone.
  • ⁇ 21> The planographic printing plate original plate according to any one of ⁇ 18> to ⁇ 20>, wherein the protective layer contains a hydrophobic polymer.
  • ⁇ 22> The planographic printing plate original plate according to ⁇ 21>, wherein the hydrophobic polymer is hydrophobic polymer particles.
  • the hydrophobic polymer contains a polyvinylidene chloride resin.
  • the protective layer contains an oil-sensitive agent.
  • the amount of the protective layer is 0.1 g / m 2 to 2.0 g / m 2 .
  • ⁇ 30> The planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 29>, wherein the layer on the aluminum support contains a hydroxycarboxylic acid or a salt thereof.
  • ⁇ 31> The planographic printing plate original plate according to ⁇ 30>, wherein the hydroxycarboxylic acid or a salt thereof contains a compound having two or more hydroxy groups.
  • ⁇ 32> The planographic printing plate original plate according to ⁇ 30> or ⁇ 31>, wherein the hydroxycarboxylic acid or a salt thereof contains a compound having three or more hydroxy groups.
  • ⁇ 33> The planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 32>, wherein the image recording layer contains particles.
  • planographic printing plate original plate according to ⁇ 33> wherein the particles include polymer particles.
  • the polymer particles have a hydrophilic group.
  • the polymer particles have a group represented by the following formula Z as the hydrophilic group.
  • Q represents a divalent linking group
  • W represents a divalent group having a hydrophilic structure or a divalent group having a hydrophobic structure
  • Y represents a monovalent group having a hydrophilic structure or It represents a monovalent group having a hydrophobic structure, either W or Y has a hydrophilic structure
  • * represents a binding site with another structure.
  • planographic printing plate original plate according to ⁇ 37> wherein the polymer particles have a polypropylene oxide structure as the polyoxyalkylene oxide structure.
  • the planographic printing plate original plate according to ⁇ 37> or ⁇ 38> wherein the polymer particles have at least a polyethylene oxide structure and a polypropylene oxide structure as the polyoxyalkylene oxide structure.
  • the polymer particles contain a resin having a structure obtained by at least reacting an isocyanate compound represented by the following formula (Iso) with water. Planographic printing plate original plate.
  • n represents an integer from 0 to 10.
  • the polymer particles have a structure obtained by at least reacting an isocyanate compound represented by the above formula (Iso) with water, and have a polyethylene oxide structure and a polypropylene oxide structure as polyoxyalkylene structures.
  • the planographic printing plate original plate according to ⁇ 40> containing a resin.
  • ⁇ 43> The planographic printing plate original plate according to ⁇ 42>, wherein the HOMO value of the polymethine dye and the HOMO value of the electron-donating polymerization initiator is 0.70 eV or less.
  • ⁇ 44> The planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 43>, wherein the image recording layer further contains a color former.
  • ⁇ 45> The planographic printing plate original plate according to ⁇ 44>, wherein the color former in the image recording layer is an acid color former.
  • ⁇ 46> The lithographic printing plate original plate according to ⁇ 45>, wherein the acid color former in the image recording layer is a leuco dye.
  • ⁇ 47> The planographic printing plate original plate according to ⁇ 46>, wherein the leuco dye in the image recording layer is a leuco dye having a phthalide structure or a fluorine structure.
  • the leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by any of the following formulas (Le-1) to (Le-3), according to ⁇ 47>.
  • each ERG independently represents an electron donating group
  • each X 1 ⁇ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group
  • X 5 to X 10 independently represent a hydrogen atom, a halogen atom or a monovalent organic group
  • Y 1 and Y 2 independently represent C or N, and when Y 1 is N, If X 1 is absent and Y 2 is N, then X 4 is absent, Ra 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 are independent alkyl groups. Or represents an aryl group.
  • the leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by any of the following formulas (Le-4) to (Le-6) ⁇ 47> or ⁇ 48>. > The lithographic printing plate original plate described in.
  • each ERG independently represents an electron donating group
  • each X 1 ⁇ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group
  • Y 1 and Y 2 independently represent C or N, and if Y 1 is N, then X 1 does not exist, and if Y 2 is N, then X 4 does not exist and Ra.
  • 1 represents a hydrogen atom, an alkyl group or an alkoxy group
  • Rb 1 to Rb 4 independently represent an alkyl group or an aryl group, respectively.
  • the leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by any of the following formulas (Le-7) to (Le-9) ⁇ 47> to ⁇ 49.
  • each X 1 ⁇ X 4 is independently a hydrogen atom, a halogen atom or a dialkyl anilino group
  • Y 1 and Y 2 are each independently, C or Representing N, when Y 1 is N, X 1 does not exist, when Y 2 is N, X 4 does not exist
  • Ra 1 to Ra 4 are independent hydrogen atoms and alkyl, respectively.
  • Rb 1 to Rb 4 independently represent an alkyl group or an aryl group
  • Rc 1 and Rc 2 each independently represent an aryl group.
  • ⁇ 51> The lithographic printing plate original plate according to ⁇ 50>, wherein each of Ra 1 to Ra 4 is an alkoxy group independently.
  • ⁇ 52> The planographic printing plate original plate according to ⁇ 50> or ⁇ 51>, wherein the leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by the above formula (Le-8).
  • ⁇ 53> The planographic printing plate original plate according to ⁇ 52>, wherein X 1 to X 4 are hydrogen atoms, and Y 1 and Y 2 are C.
  • Rb 1 and Rb 2 are independently alkyl groups.
  • the polymethine dye has an organic anion in which ⁇ d in the solubility parameter of Hansen is 16 or more, ⁇ p is 16 or more and 32 or less, and ⁇ h is 60% or less of ⁇ p ⁇ 1> to ⁇ 54>.
  • the lithographic printing plate original plate described in any one of. ⁇ 56> The planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 55>, wherein the polymerization initiator contains an electron-accepting polymerization initiator.
  • the electron-accepting polymerization initiator has an organic anion in which ⁇ d in the solubility parameter of Hansen is 16 or more, ⁇ p is 16 or more and 32 or less, and ⁇ h is 60% or less of ⁇ p ⁇ 56>.
  • the original plate of the lithographic printing plate described in. ⁇ 58> The planographic printing plate original plate according to ⁇ 56> or ⁇ 57>, wherein the electron-accepting polymerization initiator contains a compound represented by the following formula (II).
  • X represents a halogen atom and R 3 represents an aryl group.
  • ⁇ 59> The planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 58>, wherein the image recording layer further contains polyvinyl acetal as a binder polymer.
  • the image recording layer further contains a fluoroaliphatic group-containing copolymer.
  • the fluoroaliphatic group-containing copolymer has a structural unit formed of a compound represented by any of the following formulas (F1) and (F2). Original version.
  • R F1 independently represents a hydrogen atom or a methyl group
  • X independently represents an oxygen atom, a sulfur atom, or -N ( RF2 )-.
  • m represents an integer of 1 ⁇ 6
  • n represents an integer of 1 ⁇ 10
  • l represents an integer of 0 ⁇ 10
  • R F2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
  • the fluoroaliphatic group-containing copolymer further has a structural unit formed by at least one compound selected from the group consisting of poly (oxyalkylene) acrylate and poly (oxyalkylene) methacrylate ⁇ 61.
  • the on-board development type lithographic printing plate original plate described in. ⁇ 63> The machine-developed lithographic printing plate original plate according to any one of ⁇ 1> to ⁇ 62>, wherein the polymerizable compound contains a compound having an ethylenically unsaturated bond value of 5.0 mmol / g or more.
  • the compound having an ethylenically unsaturated bond value of 5.0 mmol / g or more has at least one structure selected from the group consisting of an adduct structure, a biuret structure, and an isocyanurate structure ⁇ 63> or ⁇ 64>
  • the on-machine development type lithographic printing plate original plate. ⁇ 66> The machine-developed lithographic printing plate original plate according to any one of ⁇ 1> to ⁇ 65>, wherein the polymerizable compound contains a compound having one or two ethylenically unsaturated groups.
  • the aluminum support has an aluminum plate and an anodic oxide film of aluminum arranged on the aluminum plate, and the anodic oxide film is located closer to the image recording layer than the aluminum plate.
  • the anodic oxide film has micropores extending in the depth direction from the surface on the image recording layer side, and the average diameter of the micropores on the surface of the anodic oxide film is more than 10 nm and 100 nm or less, and the anode.
  • the micropore communicates with a large-diameter hole extending from the surface of the anodic oxide film to a depth of 10 nm to 1,000 nm and the bottom of the large-diameter hole, and has a depth of 20 nm to 2 from the communicating position. It is composed of a small-diameter hole extending to a position of 000 nm, the average diameter of the large-diameter hole on the surface of the anodic oxide film is 15 nm to 100 nm, and the average diameter of the small-diameter hole at the communication position is 13 nm.
  • ⁇ 69> The step of exposing the lithographic printing plate original plate according to any one of ⁇ 1> to ⁇ 68> to an image, and at least one selected from the group consisting of printing ink and dampening water on a printing machine.
  • a method for producing a lithographic printing plate which includes a step of removing an image recording layer in a non-image area by supplying a lithographic printing plate.
  • a step of exposing the planographic printing plate original plate according to any one of ⁇ 1> to ⁇ 68> to an image, and supplying at least one selected from the group consisting of printing ink and dampening water are supplied.
  • a lithographic printing method including a step of removing an image recording layer of a non-image portion on a printing machine to produce a lithographic printing plate, and a step of printing with the obtained lithographic printing plate.
  • a lithographic printing plate original plate having excellent printing durability of the obtained lithographic printing plate even when UV ink is used. Further, according to another embodiment of the present invention, it is possible to provide a method for producing a lithographic printing plate or a lithographic printing method using the lithographic printing plate original plate.
  • FIG. 3 is a schematic cross-sectional view of another embodiment of an aluminum support. It is a graph which shows an example of the alternating waveform current waveform diagram used for the electrochemical roughening process in the manufacturing method of an aluminum support. It is a side view which shows an example of the radial type cell in the electrochemical roughening treatment using alternating current in the manufacturing method of an aluminum support. It is the schematic of the anodizing treatment apparatus used for the anodizing treatment in manufacturing of an aluminum support.
  • the notation that does not describe substitution and non-substitution includes those having no substituent as well as those having a substituent.
  • the "alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • (meth) acrylic is a term used in a concept that includes both acrylic and methacrylic
  • “(meth) acryloyl” is a term that is used as a concept that includes both acryloyl and methacryloyl. Is.
  • process in the present specification is not limited to an independent process, and even if it cannot be clearly distinguished from other processes, the term “process” will be used as long as the intended purpose of the process is achieved. included. Further, in the present disclosure, “% by mass” and “% by weight” are synonymous, and “parts by mass” and “parts by weight” are synonymous. Further, in the present disclosure, a combination of two or more preferred embodiments is a more preferred embodiment.
  • the weight average molecular weight (Mw) and the number average molecular weight (Mn) in the present disclosure use columns of TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (all are trade names manufactured by Toso Co., Ltd.). It is a molecular weight converted by detecting with a solvent THF (tetrahydrofuran) and a differential refractometer by a gel permeation chromatography (GPC) analyzer and using polystyrene as a standard substance.
  • THF tetrahydrofuran
  • GPC gel permeation chromatography
  • the term "lithographic printing plate original plate” includes not only a lithographic printing plate original plate but also a discarded plate original plate.
  • lithographic printing plate includes not only a lithographic printing plate produced by subjecting a lithographic printing plate original plate through operations such as exposure and development as necessary, but also a discarded plate. In the case of a discarded original plate, exposure and development operations are not always necessary.
  • the discard plate is a planographic printing plate original plate for attaching to an unused plate cylinder when printing a part of the paper surface in a single color or two colors in, for example, color newspaper printing.
  • the lithographic printing plate original plate according to the present disclosure has an aluminum support and an image recording layer on the aluminum support, and the image recording layer is an infrared absorbent polymethine dye having a HOMO of ⁇ 5.2 eV or less. It contains a polymerization initiator and a polymerizable compound, and the ethylenically unsaturated bond value of the image recording layer is 1.0 mmol / g or more.
  • the lithographic printing plate original plate according to the present disclosure is a negative type lithographic printing plate original plate, and can be suitably used as a lithographic printing plate original plate for on-machine development.
  • the lithographic printing plate original plate according to the present disclosure has a polymethine dye having a specific oxidation potential in the image recording layer and has a high ethylenically unsaturated bond value, so that the ink penetrates, dissolves with the ink, and The loss of the image portion due to printing wear and the like is suppressed, and even when UV ink is used, the plate skipping property is excellent.
  • plate skipping refers to a phenomenon in which the image recording layer in a lithographic printing plate is thinned and the ink is partially lost. The number of printed sheets until "plate skipping" occurs in a lithographic printing plate is an index indicating that "plate skipping is unlikely to occur”.
  • the lithographic printing plate original plate according to the present disclosure has a polymethine dye having a specific oxidation potential in the image recording layer, and has a high ethylenically unsaturated bond value, so that it has on-machine developability and features. It also has excellent fleshing properties (spot color fleshing properties).
  • the spot color ink is an ink other than the yellow, magenta, or cyan color tone ink, and examples thereof include color tone inks such as red, green, blue, white, and metallic inks, and colorless clear inks.
  • the lithographic printing plate original plate according to the present disclosure has an image recording layer containing an infrared absorbing polymethine dye having a HOMO of -5.2 eV or less, a polymerization initiator, and a polymerizable compound, and has an ethylenic property of the image recording layer.
  • the unsaturated bond value is 1.0 mmol / g or more.
  • the image recording layer in the present disclosure is a negative image recording layer, and is preferably a water-soluble or water-dispersible negative image recording layer. Further, the image recording layer in the present disclosure is preferably an on-board development type image recording layer. Further, the image recording layer in the present disclosure is preferably the outermost layer from the viewpoint of UV printing resistance, UV plate skipping inhibitory property, and special color carving property.
  • the ethylenically unsaturated bond value of the image recording layer in the present disclosure is 1.0 mmol / g or more, and is 1.5 mmol / g from the viewpoint of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property.
  • the above is preferable, 2.0 mmol / g or more is more preferable, 2.5 mmol / g or more is further preferable, and 3.7 mmol / g or more is particularly preferable.
  • the upper limit of the ethylenically unsaturated bond value of the image recording layer is not particularly limited, but is preferably 10 mmol / g or less, and more preferably 8 mmol / g or less.
  • the ethylenically unsaturated bond value in the image recording layer in the present disclosure represents the number of moles of ethylenically unsaturated bond per 1 g of the image recording layer.
  • the ethylenically unsaturated bond in the polymer particles having an ethylenically unsaturated group is not included in the ethylenically unsaturated bond value.
  • the ethylenically unsaturated bond value in the image recording layer in the present disclosure is determined by each of the ethylenically unsaturated compound contained in 1 g of the image recording layer and the polymer having an ethylenically unsaturated group (excluding polymer particles). The content and each structure shall be identified, and the number of moles of ethylenically unsaturated bonds per 1 g of the image recording layer shall be calculated by calculation.
  • the image recording layer in the present disclosure preferably contains polymer particles having an ethylenically unsaturated group, which will be described later.
  • a polymerizable compound having a pentafunctionality or higher may be contained in an amount of 50% by mass or more based on the total mass of the polymerizable compound. It is preferable to contain 70% by mass or more, more preferably 80% by mass or more, and particularly preferably 90% by mass or more.
  • the image recording layer in the present disclosure preferably contains a polymerizable compound having 10 or more functionalities, and has a polymerizable compound of 12 or more functionalities, from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and special color carving property. It is more preferable to contain a compound, and it is particularly preferable to contain a polymerizable compound having 15 or more functionalities. Furthermore, the image recording layer in the present disclosure is a polymerizable compound having five or more functionalities and a polymer having an ethylenically unsaturated group from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and special color carving property. It preferably contains particles.
  • each component contained in the image recording layer will be described.
  • the image recording layer contains an infrared-absorbing polymethine dye (also referred to as "specific polymethin dye”) having a HOMO (maximum occupied orbital) of ⁇ 5.2 eV or less.
  • the HOMO of the specific polymethine dye is ⁇ 5.2 eV or less, and is preferably ⁇ 5.25 eV or less from the viewpoint of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property. It is more preferably 3 eV or less, further preferably -6.0 eV or more and -5.3 eV or less, and particularly preferably -5.6 eV or more and -5.3 eV or less.
  • the highest occupied orbital (HOMO) and the lowest empty orbital (LUMO) are calculated by the following methods.
  • free counterions in the compound to be calculated are excluded from the calculation.
  • the cationic one-electron accepting polymerization initiator and the cationic infrared absorber exclude the counter anion
  • the anionic one-electron donating polymerization initiator excludes the counter cation from the calculation target.
  • free as used herein means that the target compound and its counterion are not covalently linked.
  • Quantum chemistry calculation software Gaussian09 is used, and structural optimization is performed by DFT (B3LYP / 6-31G (d)).
  • the MO energy Ebare (unit: hartree) obtained by the above MO energy calculation is converted into Escaled (unit: eV) used as the values of HOMO and LUMO in the present disclosure by the following formula.
  • Escaled 0.823168 x 27.2114 x Ebare-1.07634 Note that 27.2114 is simply a coefficient for converting heartree to eV, 0.823168 and ⁇ 1.07634 are adjustment coefficients, and HOMO and LUMO of the compound to be calculated are calculated values. Determine to suit.
  • the specific polymethine pigment examples include pigments having a polymethine chain. Among them, cyanine pigments, pyrylium pigments, thiopyrylium pigments, azulenium pigments and the like are preferably mentioned, and cyanine pigments are preferable from the viewpoint of easy availability, solvent solubility at the time of introduction reaction and the like. Further, the specific polymethine dye may be a pigment or a dye.
  • the above-mentioned polymethine dye is a cyanine dye having an electron-attracting group or a heavy atom-containing group on at least one of the aromatic rings at both ends from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property. It is preferable to contain a cyanine dye having a halogen atom, an alkoxycarbonyl group or an aryloxycarbonyl group in at least one of the aromatic rings at both ends, and it is more preferable to contain a cyanine having a halogen atom in at least one of the aromatic rings at both ends.
  • the polymethine dye is a cyanine dye having an electron-attracting group or a heavy atom-containing group in each of the aromatic rings at both ends from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property. It is preferable to include it. Further, the polymethine dye may contain a cyanine dye having an electron-attracting group in at least one of the aromatic rings at both ends from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property. preferable. In the present disclosure, when the group corresponds to both an electron-attracting group and a heavy atom-containing group, the electron-attracting group containing a heavy atom shall be treated as an electron-attracting group.
  • a group having a Hammett substituent constant ⁇ para value of 0.01 or more is preferable, and a ⁇ para value is preferable from the viewpoint of UV printing resistance, UV plate skipping inhibitory property, and characteristic color-forming property.
  • a group having a ⁇ para value of 0.05 or more is more preferable, a group having a ⁇ para value of 0.20 or more is further preferable, and a group having a ⁇ para value of 0.30 or more is particularly preferable.
  • Examples of groups having a ⁇ para value of 0.05 or more include halogen atoms such as fluorine atom (0.06), chlorine atom (0.30), bromine atom (0.27), and iodine atom (0.30); -CHO (0.22), - COCH 3 (0.50), - COC 6 H 5 (0.46), - CONH 2 (0.36), - COO - (0.30), - COOH (0 .41), carbonyl substituents such as -COOCH 3 (0.39), -COOC 2 H 5 (0.45); -SOCH 3 (0.49), -SO 2 CH 3 (0.72),- SO 2 C 6 H 5, -SO 2 CF 3 (0.93), - SO 2 NH 2 (0.57), - SO 2 OC 6 H 5, -SO 3 - (0.09), - SO 3 A sulfonyl or sulfinyl substituent such as H (0.50); -CN (0.01), -N (CH 3
  • an electron-attracting group include, for example, a substituent having an unshared electron pair.
  • substituent having an unshared electron pair include a halogen atom, a group having a carbonyl group, a group having a sulfonyl group, a group having a sulfinyl group, and a group having an ether bond.
  • a halogen atom or a group having a carbonyl group is preferable, a halogen atom, an alkoxycarbonyl group or an aryloxycarbonyl group is more preferable, a halogen atom is further preferable, and a chlorine atom is particularly preferable.
  • the group having a carbonyl group include an acyl group such as an acetyl group and a benzoyl group; an alkoxycarbonyl group such as a methoxycarbonyl group and a toluyloxycarbonyl group, or an aryloxycarbonyl group; an amide such as a diethylaminocarbonyl group.
  • acyl group such as an acetyl group and a benzoyl group
  • an alkoxycarbonyl group such as a methoxycarbonyl group and a toluyloxycarbonyl group, or an aryloxycarbonyl group
  • an amide such as a diethylaminocarbonyl group.
  • carboxy group is mentioned. These may be attached to the aromatic ring or heterocycle of the cyanine dye via a divalent or higher linking group.
  • the "heavy atom-containing group” means a group containing an atom having an atomic weight of 28 or more.
  • atoms having an atomic weight of 28 or more include silicon atom (28.09), phosphorus atom (30.97), sulfur atom (32.07), chlorine atom (35.45), germanium atom (72.61), and the like.
  • Arsenic atom (74.92), selenium atom (78.96), bromine atom (79.90), tin atom (118.71), antimony atom (121.76), tellurium atom (127.60), iodine atom (126.90) is preferably mentioned.
  • the numerical value in parentheses is the atomic weight of each atom.
  • a group containing a silicon atom, a phosphorus atom, or a halogen atom is preferable from the viewpoint of safety and availability of raw materials. It is preferable that these groups containing atoms having an atomic weight of 28 or more (heavy atom-containing groups) become substituents on the aromatic ring of the cyanine dye alone or in combination with other atoms. Further, such a substituent may be bonded to the aromatic ring of the cyanine dye via a divalent or higher valent linking group.
  • Examples of the group containing a silicon atom include an alkyl group such as a trimethylsilyl group, a t-butyldimethylsilyl group, and a dimethylphenylsilyl group, or a group having an aryl group on the silicon atom.
  • Examples of the group containing a phosphorus atom include a group having an alkyl group such as a dimethylphosphino group and a diphenylphosphino group or an aryl group on the phosphorus atom; a phosphono group.
  • the group containing a sulfur atom partially overlaps with the above-mentioned electron-attracting group, but for example, an alkylsulfonyl group such as a methylsulfonyl group or a phenylsulfonyl group or an arylsulfonyl group; an alkyl such as an ethylsulfinyl group or a toluylsulfinyl group.
  • Sulfinyl group or arylsulfinyl group; sulfur acid group such as sulfo group, sulfino group, sulfeno group or salt thereof or ester derivative thereof; alkylthio group or arylthio group such as methylthio group and phenylthio group can be mentioned.
  • the group containing a halogen atom include a halogen atom, a halogen-substituted alkyl group, and a halogen-substituted aryl group, which partially overlap with the above-mentioned electron-attracting group.
  • Specific examples of the specific polymethine dye include those having a HOMO of -5.2 eV or less among those shown below.
  • Specific examples of the cyanine dye include the compounds described in paragraphs 0017 to 0019 of JP-A-2001-133769, paragraphs 0016 to 0021 of JP-A-2002-0233360, and paragraphs 0012 to 0037 of JP-A-2002-040638.
  • Examples thereof include the compounds described in 0043 and the compounds described in paragraphs 0105 to 0113 of JP2012-206495A. Further, the compounds described in paragraphs 0008 to 0009 of JP-A-5-5005 and paragraphs 0022 to 0025 of JP-A-2001-222101 can also be preferably used.
  • the pigment the compounds described in paragraphs 0072 to 0076 of JP-A-2008-195018 are preferable.
  • the specific polymethine dye a polymethine dye that decomposes by infrared exposure (also referred to as “degradable polymethine dye”) can be preferably used.
  • the polymethine dye decomposed by infrared exposure those described in Japanese Patent Publication No. 2008-544322, International Publication No. 2016/027886, International Publication No. 2017/141882, or International Publication No. 2018/0432559 are preferably used. Can be used.
  • the content of the specific polymethine dye in the image recording layer is preferably 0.1% by mass to 10.0% by mass, more preferably 0.5% by mass to 5.0% by mass, based on the total mass of the image recording layer. preferable.
  • the image recording layer in the lithographic printing plate original plate according to the present disclosure contains a polymerization initiator.
  • the polymerization initiator preferably contains an electron-accepting polymerization initiator, and more preferably contains an electron-accepting polymerization initiator and an electron-donating polymerization initiator.
  • the image recording layer preferably contains an electron-accepting polymerization initiator as the polymerization initiator.
  • the electron-accepting polymerization initiator is a compound that generates a polymerization initiator such as a radical by accepting one electron by electron transfer between molecules when the electrons of the infrared absorber are excited by infrared exposure.
  • the electron-accepting polymerization initiator used in the present disclosure is a compound that generates a polymerization initiator such as a radical or a cation by energy of light, heat, or both, and is a known thermal polymerization initiator and has a small bond dissociation energy.
  • a compound having a bond, a photopolymerization initiator and the like can be appropriately selected and used.
  • a radical polymerization initiator is preferable, and an onium salt compound is more preferable.
  • the electron-accepting polymerization initiator is preferably an infrared photosensitive polymerization initiator.
  • the electron-accepting radical polymerization initiator include (a) an organic halide, (b) a carbonyl compound, (c) an azo compound, (d) an organic peroxide, (e) a metallocene compound, and (f) an azide compound. , (G) hexaarylbiimidazole compounds, (i) disulfone compounds, (j) oxime ester compounds, and (k) onium salt compounds.
  • the compounds described in paragraphs 0022 to 0023 of JP-A-2008-195018 are preferable.
  • B) As the carbonyl compound for example, the compound described in paragraph 0024 of JP-A-2008-195018 is preferable.
  • C) As the azo compound for example, the azo compound described in JP-A-8-108621 can be used.
  • D) As the organic peroxide for example, the compound described in paragraph 0025 of JP-A-2008-195018 is preferable.
  • the metallocene compound for example, the compound described in paragraph 0026 of JP-A-2008-195018 is preferable.
  • Examples of the (f) azide compound include compounds such as 2,6-bis (4-azidobenzylidene) -4-methylcyclohexanone.
  • Examples of the hexaarylbiimidazole compound for example, the compound described in paragraph 0027 of JP-A-2008-195018 is preferable.
  • Examples of the disulfon compound include the compounds described in JP-A-61-166544 and JP-A-2002-328465.
  • As the (j) oxime ester compound for example, the compounds described in paragraphs 0028 to 0030 of JP-A-2008-195018 are preferable.
  • oxime ester compounds and onium salt compounds are preferable from the viewpoint of curability.
  • an iodonium salt compound, a sulfonium salt compound or an azinium salt compound is preferable, an iodonium salt compound or a sulfonium salt compound is more preferable, and an iodonium salt compound is particularly preferable. Specific examples of these compounds are shown below, but the present disclosure is not limited thereto.
  • a diaryl iodonium salt compound is preferable, a diphenyl iodonium salt compound substituted with an electron donating group such as an alkyl group or an alkoxyl group is more preferable, and an asymmetric diphenyl iodonium salt compound is preferable.
  • a triarylsulfonium salt compound is preferable, and in particular, an electron-attracting group, for example, a triarylsulfonium salt compound in which at least a part of a group on the aromatic ring is substituted with a halogen atom is preferable, and aromatic.
  • a triarylsulfonium salt compound having a total number of halogen atoms substituted on the ring of 4 or more is more preferable.
  • triphenylsulfonium hexafluorophosphate
  • triphenylsulfonium benzoylformate
  • bis (4-chlorophenyl) phenylsulfonium benzoylformate
  • bis (4-chlorophenyl) -4-methylphenylsulfonium tetrafluoro.
  • Tris (4-chlorophenyl) Sulfonium 3,5-bis (methoxycarbonyl) Benzene Sulfonium
  • Tris (4-chlorophenyl) Sulfonium Hexafluorophosphate
  • a sulfonamide anion or a sulfonimide anion is preferable, and a sulfonimide anion is more preferable.
  • a sulfonamide anion an aryl sulfonamide anion is preferable.
  • a bisaryl sulfonimide anion is preferable. Specific examples of the sulfonamide anion or the sulfonamide anion are shown below, but the present disclosure is not limited thereto. In the specific examples below, Ph represents a phenyl group, Me represents a methyl group, and Et represents an ethyl group.
  • the electron-accepting polymerization initiator may contain a compound represented by the following formula (II) from the viewpoint of developability and UV printing resistance in the obtained lithographic printing plate.
  • X represents a halogen atom and R 3 represents an aryl group.
  • X in the formula (II) include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • a chlorine atom or a bromine atom is preferable because it has excellent sensitivity, and a bromine atom is particularly preferable.
  • R 3 from the viewpoint of excellent balance between sensitivity and storage stability, an aryl group substituted with an amide group.
  • electron-accepting polymerization initiator represented by the above formula (II) include compounds represented by the following formula, but the present disclosure is not limited thereto.
  • the minimum empty orbital (LUMO) of the electron-accepting polymerization initiator is preferably ⁇ 3.00 eV or less, and more preferably ⁇ 3.02 eV or less, from the viewpoint of improving sensitivity and making plate skipping less likely to occur. preferable. Further, as the lower limit, it is preferably -3.80 eV or more, and more preferably -3.60 eV or more.
  • the electron-accepting polymerization initiator may be used alone or in combination of two or more.
  • the content of the electron-accepting polymerization initiator is preferably 0.1% by mass to 50% by mass, more preferably 0.5% by mass to 30% by mass, based on the total mass of the image recording layer. It is preferably 0.8% by mass to 20% by mass, and particularly preferably 0.8% by mass.
  • Electron donation type polymerization initiator (polymerization aid)
  • the image recording layer preferably contains an electron-donating polymerization initiator (also referred to as a "polymerization aid") as a polymerization initiator, and contains an electron-accepting polymerization initiator and an electron-donating polymerization initiator. Is more preferable.
  • the electron donating type polymerization initiator in the present disclosure donates one electron by intermolecular electron transfer to an orbit where one electron is missing from the infrared absorber when the electron of the infrared absorber is excited or moved intramolecularly by infrared exposure. This is a compound that generates a polymerization-initiated species such as a radical.
  • the electron-donating type polymerization initiator is preferably an electron-donating radical polymerization initiator.
  • the image recording layer more preferably contains the electron donating type polymerization initiator described below, and examples thereof include the following five types.
  • Alkyl or arylate complex It is considered that the carbon-heterobond is oxidatively cleaved to generate an active radical. Specifically, a borate compound is preferable.
  • N-arylalkylamine compound It is considered that the CX bond on the carbon adjacent to nitrogen is cleaved by oxidation to generate an active radical.
  • a hydrogen atom, a carboxyl group, a trimethylsilyl group or a benzyl group is preferable.
  • N-phenylglycines which may or may not have a substituent on the phenyl group
  • N-phenyliminodiacetic acid which may or may not have a substituent on the phenyl group.
  • Sulfur-containing compound The above-mentioned amines in which the nitrogen atom is replaced with a sulfur atom can generate an active radical by the same action.
  • phenylthioacetic acid (which may or may not have a substituent on the phenyl group) can be mentioned.
  • Tin-containing compounds The above-mentioned amines in which the nitrogen atom is replaced with a tin atom can generate active radicals by the same action.
  • Sulfinates Oxidation can generate active radicals. Specific examples thereof include arylsulfinic sodium.
  • the image recording layer preferably contains a borate compound from the viewpoint of printing resistance.
  • the borate compound is preferably a tetraaryl borate compound or a monoalkyl triaryl borate compound, and more preferably a tetraaryl borate compound from the viewpoint of print resistance and color development.
  • the counter cation contained in the borate compound is not particularly limited, but is preferably an alkali metal ion or a tetraalkylammonium ion, and more preferably a sodium ion, a potassium ion, or a tetrabutylammonium ion.
  • sodium tetraphenylborate is preferably mentioned as the borate compound.
  • B-1 to B-9 are shown below as preferable specific examples of the electron donating type polymerization initiator, but it goes without saying that the present invention is not limited to these. Further, in the following chemical formula, Ph represents a phenyl group and Bu represents an n-butyl group.
  • the maximum occupied orbital (HOMO) of the electron donating type polymerization initiator used in the present disclosure is preferably ⁇ 6.00 eV or more from the viewpoint of improving sensitivity and making plate skipping less likely to occur, preferably ⁇ 5. It is more preferably .95 eV or more, and even more preferably ⁇ 5.93 eV or more.
  • the upper limit is preferably ⁇ 5.00 eV or less, and more preferably ⁇ 5.40 eV or less.
  • the electron donating type polymerization initiator only one kind may be added, or two or more kinds may be used in combination.
  • the content of the electron donating type polymerization initiator is preferably 0.01% by mass to 30% by mass, preferably 0.05% by mass, based on the total mass of the image recording layer from the viewpoint of sensitivity and printing resistance. It is more preferably to 25% by mass, and further preferably 0.1% by mass to 20% by mass.
  • the image recording layer contains an onium ion and an anion in the above-mentioned electron donating type polymerization initiator
  • the image recording layer is assumed to contain an electron accepting type polymerization initiator and the above-mentioned electron donating type polymerization initiator. ..
  • the image recording layer in the present disclosure contains the electron-donating polymerization initiator and the specific polymethine dye, and is a HOMO of the specific polymethine dye-the electron-donating polymerization initiator.
  • the HOMO value is preferably 0.70 eV or less, and more preferably 0.70 eV to ⁇ 0.10 eV.
  • a negative value means that the HOMO of the electron-donating polymerization initiator is higher than that of the specific polymethine dye.
  • ⁇ d in the solubility parameter of Hansen is 16 or more, ⁇ p is 16 to 32, and ⁇ h is 60 of ⁇ p from the viewpoint of improving sensitivity and making it difficult for plate skipping to occur. It is a preferred embodiment to have an organic anion of% or less.
  • the electron-accepting polymerization initiator in the present disclosure has a solubility parameter of Hansen of 16 or more, ⁇ p of 16 to 32, and ⁇ h from the viewpoint of improving sensitivity and preventing plate skipping. It is a preferable embodiment to have an organic anion which is 60% or less of ⁇ p.
  • ⁇ d, ⁇ p and ⁇ h in the Hansen solubility parameter in the present disclosure have the dispersion term ⁇ d [unit: MPa 0.5 ] and the polarity term ⁇ p [unit: MPa 0.5 ] in the Hansen solubility parameter.
  • the solubility parameter of Hansen is expressed in a three-dimensional space by dividing the solubility parameter introduced by Hildebrand into three components of a dispersion term ⁇ d, a polar term ⁇ p, and a hydrogen bond term ⁇ h. It is a thing. For more information on Hansen's solubility parameters, see Charles M. It is described in the document "Hansen Solubility Parameter; A Users Handbook (CRC Press, 2007)" by Hansen.
  • ⁇ d, ⁇ p and ⁇ h in the Hansen solubility parameter of the organic anion are estimated from the chemical structure by using the computer software “Hansen Solubility Parameters in Practice (HSPiP ver. 4.1.07)”. The value.
  • organic anions having ⁇ d of 16 or more, ⁇ p of 16 to 32, and ⁇ h of 60% or less of ⁇ p in Hansen's solubility parameter are I-1 to I-15 and I described above. -17 to I-21, I-23 to I-25, and the following are preferable, but it goes without saying that the present invention is not limited thereto. Among them, bis (halogen-substituted benzenesulfonyl) imide anion is more preferably mentioned, and I-5 described above is particularly preferable.
  • the image recording layer preferably contains a polymerizable compound.
  • the polymerizable compound used in the present disclosure may be, for example, a radical-polymerizable compound or a cationically polymerizable compound, but is an addition-polymerizable compound having at least one ethylenically unsaturated bond (ethyleney). It is preferably an unsaturated compound).
  • the ethylenically unsaturated compound is preferably a compound having at least one terminal ethylenically unsaturated bond, and more preferably a compound having two or more terminal ethylenically unsaturated bonds.
  • Polymerizable compounds have chemical forms such as, for example, monomers, prepolymers, ie dimers, trimers or oligomers, or mixtures thereof.
  • Examples of the monomer include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, and amides, and unsaturated carboxylic acids are preferable.
  • Esters of an acid and a polyhydric alcohol compound, and amides of an unsaturated carboxylic acid and a polyhydric amine compound are used.
  • an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxy group, an amino group or a mercapto group with a monofunctional or polyfunctional isocyanate or an epoxy, and a monofunctional or polyfunctional group.
  • a dehydration condensation reaction product with a functional carboxylic acid is also preferably used.
  • an addition reaction product of an unsaturated carboxylic acid ester or amide having a polyelectron substituent such as an isocyanate group or an epoxy group with a monofunctional or polyfunctional alcohol, an amine or a thiol, and a halogen atom is also suitable.
  • the monomer of the ester of the polyhydric alcohol compound and the unsaturated carboxylic acid include ethylene glycol diacrylate, 1,3-butanediol diacrylate, tetramethylene glycol diacrylate, and propylene glycol diacrylate as acrylic acid esters.
  • EO ethylene oxide
  • methacrylic acid ester As methacrylic acid ester, tetramethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropantrimethacrylate, ethylene glycol dimethacrylate, pentaerythritol trimethacrylate, bis [p- (3-methacryloxy-2-hydroxypropoxy) phenyl] There are dimethylmethane, bis [p- (methacrylicoxyethoxy) phenyl] dimethylmethane and the like.
  • amide monomer of the polyvalent amine compound and the unsaturated carboxylic acid examples include methylenebisacrylamide, methylenebismethacrylamide, 1,6-hexamethylenebisacrylamide, and 1,6-hexamethylenebismethacrylamide.
  • a urethane-based addition-polymerizable compound produced by using an addition reaction of isocyanate and a hydroxy group is also suitable, and specific examples thereof include, for example, 2 per molecule described in JP-A-48-41708.
  • a vinyl urethane compound containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxy group represented by the following formula (M) to a polyisocyanate compound having two or more isocyanate groups. And so on.
  • CH 2 C (R M4) COOCH 2 CH (R M5) OH (M)
  • RM4 and RM5 each independently represent a hydrogen atom or a methyl group.
  • urethane acrylates described in JP-A-51-37193, JP-A-2-32293, JP-A-2-16765, JP-A-2003-344997, and JP-A-2006-65210 Ethylene described in Japanese Patent Application Laid-Open No. 58-49860, Japanese Patent Publication No. 56-17654, Japanese Patent Publication No. 62-39417, Japanese Patent Application Laid-Open No. 62-39418, Japanese Patent Application Laid-Open No. 2000-250211, and Japanese Patent Application Laid-Open No. 2007-94138.
  • Kind is also suitable.
  • the ethylenically unsaturated bond value of the specific compound B1 is preferably 5.5 mmol / g or more, and more preferably 6.0 mmol / g or more.
  • the upper limit of the ethylenically unsaturated bond value of the specific compound B1 is, for example, 10.0 mmol / g or less, and more preferably 8.5 mmol / g or less.
  • the ethylenically unsaturated bond value of the compound in the present disclosure is determined by the following method. First, for a compound having a predetermined sample amount (for example, 0.2 g), the structure of the compound is specified by using, for example, thermal decomposition GC / MS, FT-IR, NMR, TOF-SIMS, etc., and ethylenically unsaturated. Find the total amount (mmol) of the groups. The ethylenically unsaturated bond value of a compound is calculated by dividing the total amount (mmol) of the determined ethylenically unsaturated groups by the sample amount (g) of the compound.
  • a predetermined sample amount for example, 0.2 g
  • the structure of the compound is specified by using, for example, thermal decomposition GC / MS, FT-IR, NMR, TOF-SIMS, etc.
  • X represents an n-valent organic group having a hydrogen-bonding group
  • Y represents a monovalent group having two or more ethylenically unsaturated groups
  • n represents an integer of two or more.
  • the molecular weight of X / (molecular weight of Y ⁇ n) is 1 or less.
  • the hydrogen-bonding group in X of the formula (I) is not particularly limited as long as it is a hydrogen-bondable group, and whether it is a hydrogen-bond-donating group or a hydrogen-bond-accepting group, both of them. It may be.
  • the hydrogen-bonding group include a hydroxy group, a carboxy group, an amino group, a carbonyl group, a sulfonyl group, a urethane group, a urea group, an imide group, an amide group, a sulfonamide group and the like.
  • the hydrogen-bonding group is at least one group selected from the group consisting of a urethane group, a urea group, an imide group, an amide group, and a sulfonamide group from the viewpoint of on-machine developability and print resistance. It is more preferable to contain at least one group selected from the group consisting of a urethane group, a urea group, an imide group, and an amide group, and more preferably than the group consisting of a urethane group, a urea group, and an imide group. It is more preferably at least one selected group, and particularly preferably containing at least one group selected from the group consisting of urethane groups and urea groups.
  • X in the formula (I) is preferably an organic group having no ethylenically unsaturated bond. Further, X in the formula (I) is a monovalent to n-valent aliphatic hydrocarbon group, a monovalent to n-valent aromatic hydrocarbon group, a urethane bond, or a urea from the viewpoint of on-machine developability and printing resistance. It is preferably a group that combines two or more structures selected from the group consisting of a bond, a biuret bond, and an allophanate bond, and is preferably a monovalent to n-valent aliphatic hydrocarbon group and a monovalent to n-valent aromatic group. It is more preferable that the group is a combination of two or more structures selected from the group consisting of a hydrocarbon group, a urethane bond, a urea bond, and a biuret bond.
  • X in the formula (I) is a quantified product in which a polyfunctional isocyanate compound is increased in a large amount (including an adducted body of a polyfunctional alcohol compound such as a trimethylolpropane adduct) from the viewpoint of on-machine developability and print resistance.
  • the group is a group obtained by removing the terminal isocyanate group from the group, and is a group obtained by removing the terminal isocyanate group from a quantifier (including an adduct of a polyfunctional alcohol compound) in which a bifunctional isocyanate compound is abundant. Is more preferable, and a group in which the terminal isocyanate group is removed from a quantifier (including an adduct of a polyfunctional alcohol compound) in which hexamethylene diisocyanate is increased is particularly preferable.
  • the molecular weight of X in the formula (I) is preferably 100 to 1,000, more preferably 150 to 800, and particularly preferably 150 to 500, from the viewpoint of on-machine developability and print resistance.
  • the ethylenically unsaturated group in Y of the formula (I) is not particularly limited, and from the viewpoint of reactivity, on-machine developability, and print resistance, a vinylphenyl group, a vinyl ester group, a vinyl ether group, an allyl group, ( It is preferably at least one group selected from the group consisting of a meta) acryloxy group and a (meth) acrylamide group. From the same viewpoint as above, the ethylenically unsaturated group in Y of the formula (I) is at least one group selected from the group consisting of a vinylphenyl group, a (meth) acryloxy group, and a (meth) acrylamide group.
  • the ethylenically unsaturated group in Y of the formula (I) preferably contains a (meth) acryloxy group from the viewpoint of on-machine developability and print resistance.
  • Y in the formula (I) is preferably a group having three or more (meth) acryloxy groups, more preferably a group having five or more (meth) acryloxy groups, and five or more twelve. It is more preferable that the group has the following (meth) acryloxy group.
  • Y in the formula (I) may have a structure represented by the following formula (Y-1) or the formula (Y-2) from the viewpoint of on-machine developability and print resistance.
  • R independently represents an acrylic group or a methacrylic group, and the wavy line portion represents the bonding position with another structure.
  • R is preferably an acrylic group.
  • n Ys in the formula (I) are all the same group.
  • the molecular weight of Y in the formula (I) is preferably 200 or more and 1,000 or less, and more preferably 250 or more and 800 or less, from the viewpoint of on-machine developability and print resistance.
  • N in the formula (I) is an integer of 2 or more, and is more preferably 2 to 3 from the viewpoint of on-machine developability and print resistance.
  • the molecular weight of X / (molecular weight of Y ⁇ n) is 1 or less, preferably 0.01 to 0.8, preferably 0.1 to 0.5, from the viewpoint of on-machine developability and print resistance. More preferably.
  • the structure of the specific compound B1 preferably includes a structure in which the terminal isocyanate group of the quantifier (including the adduct) of the polyfunctional isocyanate compound is sealed with a compound having an ethylenically unsaturated group. .. Among them, as the quantifier of the polyfunctional isocyanate compound, the quantifier of the bifunctional isocyanate compound is preferable.
  • the specific compound B1 is a polyfunctional ethylene having a hydroxy group (also referred to as a hydroxyl group) at the end of the terminal isocyanate group of the multimerized product in which the polyfunctional isocyanate compound is increased in quantity. It is preferably a compound obtained by reacting a sex unsaturated compound.
  • the specific compound B1 is a polyfunctional ethylenic compound having a hydroxy group at the terminal isocyanate group of a multimeric compound (including an adduct compound of a polyfunctional alcohol compound) in which a difunctional isocyanate compound is increased in quantity.
  • the compound is obtained by reacting an unsaturated compound.
  • the specific compound B1 is a polyfunctional ethylenically non-polyfunctional compound having a hydroxy group at the terminal isocyanate group of the multimer (including the adduct of the polyfunctional alcohol compound) in which hexamethylene diisocyanate is increased. It is particularly preferable that the compound is obtained by reacting a saturated compound.
  • the polyfunctional isocyanate compound is not particularly limited, and known compounds can be used, and may be an aliphatic polyfunctional isocyanate compound or an aromatic polyfunctional isocyanate compound.
  • Specific examples of the polyfunctional isocyanate compound include 1,3-bis (isocyanatomethyl) cyclohexane, isophorone diisocyanate, trimethylene diisocyanate, tetramethylene diisocyanate, pentamethylene diisocyanate, hexamethylene diisocyanate, and 1,3-.
  • Cyclopentane diisocyanate, 9H-fluorene-2,7-diisocyanate, 9H-fluoren-9-on-2,7-diisocyanate, 4,4'-diphenylmethane diisocyanate, 1,3-phenylenediisocyanate, trilen-2 , 4-Diisocyanate, Trilen-2,6-Diisocyanate, 1,3-bis (isocyanatomethyl) cyclohexane, 2,2-bis (4-isocyanatophenyl) hexafluoropropane, 1,5-di Isocyanatonaphthalene, dimers of these polyisocyanates, trimmers (isocyanurate bonds) and the like are preferably mentioned.
  • a biuret compound obtained by reacting the above polyisocyanate compound with a known amine compound may be used.
  • the polyfunctional ethylenically unsaturated compound having a hydroxy group is preferably a trifunctional or higher functional ethylenically unsaturated compound having a hydroxy group, and is a pentafunctional or higher functional ethylenically unsaturated compound having a hydroxy group. Is more preferable.
  • the polyfunctional ethylenically unsaturated compound having a hydroxy group is preferably a polyfunctional (meth) acrylate compound having a hydroxy group.
  • the specific compound B1 preferably has at least one structure selected from the group consisting of an adduct structure, a biuret structure, and an isocyanurate structure from the viewpoint of on-machine developability and print resistance. From the same viewpoint as above, it is more preferable that the specific compound B1 has at least one structure selected from the group consisting of a trimethylolpropane adduct structure, a biuret structure, and an isocyanurate structure, and the trimethylolpropane adduct structure is formed. It is particularly preferable to have.
  • the specific compound B1 preferably has a structure represented by any of the following formulas (A-1) to (A-3), and the following formula (A-). It is more preferable to have the structure represented by 1).
  • RA1 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and the wavy line portion represents a bond position with another structure.
  • R A1 in the formula (A1) from the viewpoint of on-press development property and printing durability, a hydrogen atom, or preferably an alkyl group having 1 to 4 carbon atoms, an alkyl group having 1 to 3 carbon atoms It is more preferably present, more preferably a methyl group or an ethyl group, and particularly preferably an ethyl group.
  • the specific compound B1 is preferably a (meth) acrylate compound having a urethane group, that is, a urethane (meth) acrylate oligomer from the viewpoint of on-machine developability and print resistance.
  • the specific compound B1 may be an oligomer having a polyester bond (hereinafter, also referred to as a polyester (meth) acrylate oligomer) as long as the ethylenically unsaturated bond value is 5.0 mmol / g or more, or an epoxy residue may be used. It may be an oligomer having an oligomer (hereinafter, also referred to as an epoxy (meth) acrylate oligomer). Here, the epoxy residues in the epoxy (meth) acrylate oligomer are as described above.
  • the number of ethylenically unsaturated groups in the polyester (meth) acrylate oligomer which is the specific compound B1 is preferably 3 or more, and more preferably 6 or more.
  • the epoxy (meth) acrylate oligomer which is the specific compound B1 a compound containing a hydroxy group in the compound is preferable.
  • the number of ethylenically unsaturated groups in the epoxy (meth) acrylate oligomer is preferably 2 to 6, and more preferably 2 to 3.
  • the epoxy (meth) acrylate oligomer can be obtained, for example, by reacting a compound having an epoxy group with acrylic acid.
  • the molecular weight of the specific compound B1 (weight average molecular weight when having a molecular weight distribution) is preferably more than 1,000, more preferably 1,100 to 10,000, and even more preferably 1,100 to 5,000.
  • Specific compound B1 a synthetic product or a commercially available product may be used.
  • Specific examples of the specific compound B1 include, for example, the following commercially available products, but the specific compound B1 used in the present disclosure is not limited thereto.
  • the content of the specific compound B1 in the image recording layer with respect to the total mass of the polymerizable compound is preferably 10% by mass to 100% by mass, preferably 50% by mass to 100% by mass. Is more preferable, and 80% by mass to 100% by mass is further preferable.
  • the polymerizable compound may contain, as a low molecular weight compound, a compound having one or two ethylenically unsaturated bonding groups (hereinafter, also referred to as a specific compound B2).
  • a preferred embodiment of the ethylenically unsaturated group contained in the specific compound B2 is the same as that of the ethylenically unsaturated group in the specific compound B1.
  • the specific compound B2 is preferably a compound having two ethylenically unsaturated bonding groups (that is, a bifunctional polymerizable compound) from the viewpoint of suppressing a decrease in on-machine developability.
  • the specific compound B2 is preferably a methacrylate compound, that is, a compound having a methacryloxy group, from the viewpoint of on-machine developability and print resistance.
  • the specific compound B2 preferably contains an alkyleneoxy structure or a urethane bond from the viewpoint of on-machine developability.
  • the molecular weight (weight average molecular weight when having a molecular weight distribution) of the specific compound B2 is preferably 50 or more and less than 1,000, more preferably 200 to 900, and more preferably 250 to 800. More preferred.
  • specific compound B2 commercially available products shown below may be used, but the specific compound B2 used in the present disclosure is not limited thereto.
  • Specific examples of the specific compound B2 include BPE-80N (compound of (1) above) manufactured by Shin Nakamura Chemical Industry Co., Ltd., BPE-100, BPE-200, BPE-500, and CN104 manufactured by Sartmer Co., Ltd. Examples thereof include ethoxylated bisphenol A dimethacrylate such as the compound of 1).
  • Specific examples of the specific compound B2 include ethoxylated bisphenol A diacrylates such as A-BPE-10 (compound of (2) above) manufactured by Shin Nakamura Chemical Industry Co., Ltd. and A-BPE-4. ..
  • specific examples of the specific compound B2 include bifunctional methacrylate such as FST 510 manufactured by AZ Electronics.
  • FST 510 is a reaction product of 1 mol of 2,2,4-trimethylhexamethylene diisocyanate and 2 mol of hydroxyethyl methacrylate, and is a solution of the compound of the above (3) in an 82% by mass of methyl ethyl ketone. is there.
  • the content of the specific compound B2 is preferably 1% by mass to 60% by mass, and 5% by mass to 55% by mass, based on the total mass of the image recording layer, from the viewpoint of on-machine developability and print resistance. Is more preferable, and 5% by mass to 50% by mass is further preferable.
  • the content of the specific compound B2 with respect to the total mass of the polymerizable compound in the image recording layer is preferably 10% by mass to 100% by mass, preferably 50% by mass to 100% by mass. Is more preferable, and 80% by mass to 100% by mass is further preferable.
  • the details of the method of use such as the structure of the polymerizable compound, whether it is used alone or in combination, and the amount of addition can be arbitrarily set.
  • the content of the polymerizable compound is preferably 5% by mass to 75% by mass, more preferably 10% by mass to 70% by mass, and 15% by mass to 60% by mass with respect to the total mass of the image recording layer. It is particularly preferably by mass%.
  • the image recording layer preferably contains particles from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property.
  • the particles may be organic particles or inorganic particles, but are preferably containing organic particles from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property, and are polymer. It is more preferable to contain particles.
  • the inorganic particles known inorganic particles can be used, and metal oxide particles such as silica particles and titania particles can be preferably used.
  • the polymer particles may be selected from the group consisting of thermoplastic polymer particles, heat-reactive polymer particles, polymer particles having a polymerizable group, microcapsules containing a hydrophobic compound, and microgels (crosslinked polymer particles). preferable. Of these, polymer particles or microgels having a polymerizable group are preferable. In a particularly preferred embodiment, the polymer particles contain at least one ethylenically unsaturated polymerizable group. The presence of such polymer particles has the effect of enhancing the print resistance of the exposed portion and the on-machine developability of the unexposed portion. Further, the polymer particles are preferably thermoplastic polymer particles.
  • thermoplastic polymer particles Research Disclosure No. 1 of January 1992.
  • the thermoplastic polymer particles described in 33303, JP-A-9-123387, JP-A-9-131850, JP-A-9-171249, JP-A-9-171250, and European Patent No. 931647 are preferable.
  • Specific examples of the polymer constituting the thermoplastic polymer particles include ethylene, styrene, vinyl chloride, methyl acrylate, ethyl acrylate, methyl methacrylate, ethyl methacrylate, vinylidene chloride, acrylonitrile, vinylcarbazole, and a polyalkylene structure.
  • thermoplastic polymer particles examples include homopolymers or copolymers of monomers such as acrylates or methacrylates or mixtures thereof.
  • a copolymer containing polystyrene, styrene and acrylonitrile, or polymethylmethacrylate can be mentioned.
  • the average particle size of the thermoplastic polymer particles is preferably 0.01 ⁇ m to 3.0 ⁇ m.
  • heat-reactive polymer particles examples include polymer particles having a heat-reactive group.
  • the heat-reactive polymer particles form a hydrophobic region by cross-linking due to a heat reaction and the change of functional groups at that time.
  • the thermally reactive group in the polymer particles having a thermally reactive group may be a functional group that undergoes any reaction as long as a chemical bond is formed, but a polymerizable group is preferable, and as an example, it is preferable.
  • Eethylene unsaturated groups eg, acryloyl group, methacryloyl group, vinyl group, allyl group, etc.
  • cationically polymerizable groups eg, vinyl group, vinyloxy group, epoxy group, oxetanyl group, etc.
  • Preferred examples thereof include a hydroxy group or an amino group as a partner, an acid anhydride for carrying out a ring-opening addition
  • the microcapsules for example, as described in JP-A-2001-277740 and JP-A-2001-277742, at least a part of the constituent components of the image recording layer is encapsulated in the microcapsules.
  • the constituent components of the image recording layer can also be contained outside the microcapsules.
  • the image recording layer containing the microcapsules is preferably configured such that the hydrophobic constituents are encapsulated in the microcapsules and the hydrophilic constituents are contained outside the microcapsules.
  • the microgel (crosslinked polymer particles) can contain a part of the constituent components of the image recording layer on at least one of the surface or the inside thereof.
  • a reactive microgel having a radically polymerizable group on its surface is preferable from the viewpoint of the sensitivity of the obtained lithographic printing plate original plate and the printing durability of the obtained lithographic printing plate.
  • a known method can be applied to microencapsulate or microgelify the constituents of the image recording layer.
  • an adduct of a polyhydric phenol compound having two or more hydroxy groups in the molecule and isophorone diisocyanate from the viewpoint of printing resistance, stain resistance and storage stability of the obtained flat plate printing plate.
  • the one obtained by the reaction of the polyhydric isocyanate compound and the compound having active hydrogen is preferable.
  • the multivalent phenol compound a compound having a plurality of benzene rings having a phenolic hydroxy group is preferable.
  • a polyol compound or a polyamine compound is preferable, a polyol compound is more preferable, and at least one compound selected from the group consisting of propylene glycol, glycerin and trimethylolpropane is further preferable.
  • the resin particles obtained by the reaction of the polyhydric phenol compound having two or more hydroxy groups in the molecule, the polyhydric isocyanate compound which is an adduct of isophorone diisocyanate, and the compound having active hydrogen include The polymer particles described in paragraphs 0032 to 0905 of JP-206495 are preferably mentioned.
  • the polymer particles have a hydrophobic main chain from the viewpoint of printing resistance and solvent resistance of the obtained lithographic printing plate, and i) a pendant cyano group directly bonded to the hydrophobic main chain. It is preferable to include both a constituent unit having and ii) a constituent unit having a pendant group containing a hydrophilic polyalkylene oxide segment.
  • Acrylic resin chains are preferably mentioned as the hydrophobic main chain.
  • the pendant cyano group -[CH 2 CH (C ⁇ N)-] or-[CH 2 C (CH 3 ) (C ⁇ N)-] is preferably mentioned.
  • the constituent unit having the pendant cyano group can be easily derived from an ethylene-based unsaturated monomer such as acrylonitrile or methacrylonitrile, or from a combination thereof.
  • an ethylene-based unsaturated monomer such as acrylonitrile or methacrylonitrile, or from a combination thereof.
  • the alkylene oxide in the hydrophilic polyalkylene oxide segment ethylene oxide or propylene oxide is preferable, and ethylene oxide is more preferable.
  • the number of repetitions of the alkylene oxide structure in the hydrophilic polyalkylene oxide segment is preferably 10 to 100, more preferably 25 to 75, and even more preferably 40 to 50.
  • Both a constituent unit having a hydrophobic backbone and i) having a pendant cyano group directly attached to the hydrophobic backbone and ii) a constituent unit having a pendant group containing a hydrophilic polyalkylene oxide segment are preferably mentioned.
  • the polymer particles preferably have a hydrophilic group from the viewpoint of UV printing resistance, special color carving property, and on-machine developability.
  • the hydrophilic group is not particularly limited as long as it has a hydrophilic structure, and examples thereof include an acid group such as a carboxy group, a hydroxy group, an amino group, a cyano group, and a polyalkylene oxide structure.
  • a polyalkylene oxide structure is preferable from the viewpoints of on-machine developability, UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property, and a polyethylene oxide structure, a polypropylene oxide structure, or a polyethylene / propylene oxide structure Is more preferable.
  • the polyalkylene oxide structure preferably has a polypropylene oxide structure, and may have a polyethylene oxide structure and a polypropylene oxide structure. More preferred.
  • the hydrophilic group preferably contains a structural unit having a cyano group or a group represented by the following formula Z from the viewpoint of print resistance, fillability and on-machine developability. It is more preferable to include a structural unit represented by the following formula (AN) or a group represented by the following formula Z, and it is particularly preferable to include a group represented by the following formula Z.
  • Q represents a divalent linking group
  • W represents a divalent group having a hydrophilic structure or a divalent group having a hydrophobic structure
  • Y represents a monovalent group having a hydrophilic structure or It represents a monovalent group having a hydrophobic structure, either W or Y has a hydrophilic structure
  • * represents a binding site with another structure.
  • RAN represents a hydrogen atom or a methyl group.
  • the polymer contained in the polymer particles preferably contains a structural unit formed of a compound having a cyano group.
  • the cyano group is usually preferably introduced into the resin A as a structural unit containing a cyano group by using a compound (monomer) having a cyano group.
  • Examples of the compound having a cyano group include acrylonitrile compounds, and (meth) acrylonitrile is preferable.
  • the structural unit having a cyano group is preferably a structural unit formed of an acrylonitrile compound, and more preferably a structural unit formed of (meth) acrylonitrile, that is, a structural unit represented by the above formula (AN). ..
  • the content of the structural unit having a cyano group, preferably the structural unit represented by the above formula (AN), in the polymer having a structural unit having a cyano group. Is preferably 5% by mass to 90% by mass, and more preferably 20% by mass to 80% by mass, based on the total mass of the polymer having a structural unit having a cyano group, from the viewpoint of UV printing resistance. It is preferable, and it is particularly preferable that it is 30% by mass to 60% by mass.
  • the polymer particles preferably contain polymer particles having a group represented by the above formula Z from the viewpoints of printing resistance, meat-forming property, special color-forming property, and on-machine developability.
  • Q in the above formula Z is preferably a divalent linking group having 1 to 20 carbon atoms, and more preferably a divalent linking group having 1 to 10 carbon atoms. Further, Q in the above formula Z is preferably an alkylene group, an arylene group, an ester bond, an amide bond, or a group in which two or more of these are combined, and may be a phenylene group, an ester bond, or an amide bond. More preferred.
  • the divalent group having a hydrophilic structure in W of the above formula Z is preferably a polyalkyleneoxy group or a group in which -CH 2 CH 2 NR W- is bonded to one end of a polyalkyleneoxy group. ..
  • R W represents a hydrogen atom or an alkyl group.
  • the RWAs are independently linear, branched or cyclic alkylene groups having 6 to 120 carbon atoms, haloalkylene groups having 6 to 120 carbon atoms, arylene groups having 6 to 120 carbon atoms, and alcoholylenes having 6 to 120 carbon atoms. It represents a group (a divalent group obtained by removing one hydrogen atom from an alkylaryl group) or an aralkylene group having 6 to 120 carbon atoms.
  • the monovalent group having a hydrophobic structure in Y of the above formula Z is a linear, branched or cyclic alkyl group having 6 to 120 carbon atoms, a haloalkyl group having 6 to 120 carbon atoms, an aryl group having 6 to 120 carbon atoms, and the like.
  • RWB represents an alkyl group having 6 to 20 carbon atoms.
  • the polymer particle having a group represented by the above formula Z is a divalent group in which W has a hydrophilic structure from the viewpoints of printing resistance, fleshing property, characteristic fleshing property, and on-machine developability. More preferably, Q is a phenylene group, an ester bond, or an amide bond, W is a polyalkyleneoxy group, and Y is a polyalkyleneoxy group having a hydrogen atom or an alkyl group at the end. More preferred.
  • the polymer particles preferably contain polymer particles having a polymerizable group from the viewpoints of printing resistance, meat-forming property, special color-forming property, UV plate skipping inhibitory property, and on-machine developability. It is more preferable to contain polymer particles having a polymerizable group on the surface. Further, from the viewpoint of printing resistance, the polymer particles preferably contain polymer particles having a hydrophilic group and a polymerizable group. Even if the polymerizable group is a cationically polymerizable group, it is a radically polymerizable group. However, from the viewpoint of reactivity, a radically polymerizable group is preferable.
  • the polymerizable group is not particularly limited as long as it is a polymerizable group, but from the viewpoint of reactivity, an ethylenically unsaturated group is preferable, and a vinylphenyl group (styryl group), a (meth) acryloxy group, or a (meth) acryloxy group, or A (meth) acrylamide group is more preferred, and a (meth) acryloxy group is particularly preferred.
  • the polymer in the polymer particles having a polymerizable group preferably has a structural unit having a polymerizable group.
  • a polymerizable group may be introduced on the surface of the polymer particles by a polymer reaction.
  • the polymer particles are made of a resin having a urea bond from the viewpoints of printing resistance, fleshing property, characteristic fleshing property, UV plate skipping suppressing property, on-machine development property, and developing residue suppressing property during on-machine development. It is preferable to include a resin having a structure obtained by at least reacting an isocyanate compound represented by the following formula (Iso) with water, and an isocyanate compound represented by the following formula (Iso) and water. It is particularly preferable to contain a resin having a structure obtained by at least reacting with and having a polyethylene oxide structure and a polypropylene oxide structure as the polyoxyalkylene structure. Further, the particles containing the resin having a urea bond are preferably microgels.
  • n represents an integer from 0 to 10.
  • a compound having active hydrogen reactive with an isocyanate group such as an alcohol compound or an amine compound
  • an isocyanate group such as an alcohol compound or an amine compound
  • the structure of the alcohol compound or the amine compound is introduced into the resin having a urea bond. You can also do it.
  • the compound having active hydrogen those described in the above-mentioned microgel are preferably mentioned.
  • the resin having a urea bond preferably has an ethylenically unsaturated group, and more preferably has a group represented by the following formula (PETA).
  • the average particle size of the particles is preferably 0.01 ⁇ m to 3.0 ⁇ m, more preferably 0.03 ⁇ m to 2.0 ⁇ m, and even more preferably 0.10 ⁇ m to 1.0 ⁇ m. Good resolution and stability over time can be obtained in this range.
  • the average primary particle size of the particles in the present disclosure is measured by a light scattering method, or an electron micrograph of the particles is taken, and a total of 5,000 particle sizes are measured on the photograph, and the average value is obtained. Shall be calculated. For non-spherical particles, the particle size value of spherical particles having the same particle area as the particle area on the photograph is used as the particle size. Further, the average particle size in the present disclosure shall be the volume average particle size unless otherwise specified.
  • the image recording layer may contain particles, particularly polymer particles, alone or in combination of two or more.
  • the content of the particles in the image recording layer, particularly the polymer particles is relative to the total mass of the image recording layer from the viewpoints of developability, UV printing resistance, UV plate skipping inhibitory property, and characteristic color carving property. It is preferably 5% by mass to 90% by mass, more preferably 10% by mass to 90% by mass, further preferably 20% by mass to 90% by mass, and 50% by mass to 90% by mass. Especially preferable.
  • the content of the polymer particles in the image recording layer has a molecular weight of 3,000 or more in the image recording layer from the viewpoints of developability, UV printing resistance, UV plate skipping inhibitory property, and special color carving property. 20% by mass to 100% by mass, more preferably 35% by mass to 100% by mass, further preferably 50% by mass to 100% by mass, and 80% by mass to 100% by mass, based on the total mass of the components of. It is particularly preferably 100% by mass.
  • the image recording layer may contain a binder polymer, but it is preferable that the image recording layer does not contain the binder polymer from the viewpoints of on-machine developability, UV printing resistance, UV plate skipping inhibitory property, and special color carving property.
  • the binder polymer is a polymer other than the polymer particles, that is, a binder polymer that is not in the form of particles.
  • a (meth) acrylic resin, a polyvinyl acetal resin, or a polyurethane resin is preferable.
  • a known binder polymer used for the image recording layer of the lithographic printing plate original plate can be preferably used.
  • a binder polymer (hereinafter, also referred to as a binder polymer for on-machine development) used in a machine-developed planographic printing plate original plate will be described in detail.
  • a binder polymer for on-machine development a binder polymer having an alkylene oxide chain is preferable.
  • the binder polymer having an alkylene oxide chain may have a poly (alkylene oxide) moiety in the main chain or the side chain.
  • graft polymer having a poly (alkylene oxide) in a side chain, or a block copolymer of a block composed of a poly (alkylene oxide) -containing repeating unit and a block composed of a (alkylene oxide) -free repeating unit.
  • a polyurethane resin is preferable.
  • the polymer of the main chain is (meth) acrylic resin, polyvinyl acetal resin, polyurethane resin, polyurea resin, polyimide resin, polyamide resin, epoxy resin, polystyrene resin, novolak type. Examples thereof include phenol resin, polyester resin, synthetic rubber and natural rubber, and (meth) acrylic resin is particularly preferable.
  • a high molecular weight polymer chain having a polyfunctional thiol having 6 or more functionalities and 10 or less functional as a nucleus and being bonded to the nucleus by a sulfide bond, and the polymer chain having a polymerizable group examples thereof include molecular compounds (hereinafter, also referred to as star-shaped polymer compounds).
  • the star-shaped polymer compound for example, the compound described in JP2012-148555 can be preferably used.
  • the star-shaped polymer compound contains a polymerizable group such as an ethylenically unsaturated bond for improving the film strength of the image portion as described in JP-A-2008-195018, with a main chain or a side chain, preferably a side chain. Examples include those held in the chain.
  • the polymerizable group forms crosslinks between the polymer molecules to promote curing.
  • an ethylenically unsaturated group such as a (meth) acrylic group, a vinyl group, an allyl group or a styryl group or an epoxy group is preferable, and a (meth) acrylic group, a vinyl group or a styryl group is polymerizable.
  • a (meth) acrylic group is particularly preferable.
  • These groups can be introduced into the polymer by polymer reaction or copolymerization. For example, a reaction between a polymer having a carboxy group in the side chain and glycidyl methacrylate, or a reaction between a polymer having an epoxy group and an ethylenically unsaturated group-containing carboxylic acid such as methacrylic acid can be used. These groups may be used together.
  • the molecular weight of the binder polymer preferably has a weight average molecular weight (Mw) of 2,000 or more, more preferably 5,000 or more, and is 10,000 to 300,000 as a polystyrene-equivalent value by the GPC method. It is more preferable to have.
  • Mw weight average molecular weight
  • hydrophilic polymers such as polyacrylic acid and polyvinyl alcohol described in JP-A-2008-195018 can be used in combination.
  • a lipophilic polymer and a hydrophilic polymer can be used in combination.
  • the binder polymer used in the present disclosure preferably has a glass transition temperature (Tg) of 50 ° C. or higher, preferably 70 ° C. or higher, from the viewpoint of suppressing a decrease in on-machine developability over time. More preferably, it is more preferably 80 ° C. or higher, and particularly preferably 90 ° C. or higher.
  • the upper limit of the glass transition temperature of the binder polymer is preferably 200 ° C., more preferably 120 ° C. or lower, from the viewpoint of easy water penetration into the image recording layer.
  • polyvinyl acetal is preferable from the viewpoint of further suppressing the decrease in on-machine developability with time.
  • Polyvinyl acetal is a resin obtained by acetalizing the hydroxy group of polyvinyl alcohol with an aldehyde.
  • polyvinyl butyral in which the hydroxy group of polyvinyl alcohol is acetalized (that is, butyralized) with butyraldehyde is preferable.
  • the polyvinyl acetal preferably contains a structural unit represented by the following (a) by acetalizing the hydroxy group of polyvinyl alcohol with an aldehyde.
  • R represents a residue of the aldehyde used for acetalization.
  • R include a hydrogen atom, an alkyl group and the like, as well as an ethylenically unsaturated group described later.
  • the content of the structural unit represented by (a) above (also referred to as the amount of ethylene groups in the main chain contained in the structural unit represented by (a) above, and also referred to as the degree of acetalization) is polyvinyl acetal. 50 mol% to 90 mol% is preferable, 55 mol% to 85 mol% is more preferable, and 55 mol% to 80 mol% is further more preferable with respect to the total structural unit (total ethylene group amount of the main chain).
  • the degree of acetalization is the amount of ethylene groups to which acetal groups are bonded (the amount of ethylene groups in the main chain included in the structural unit represented by (a) above) divided by the total amount of ethylene groups in the main chain. It is a value showing the molar fraction obtained by the above as a percentage. The same applies to the content of each structural unit of polyvinyl acetal, which will be described later.
  • the polyvinyl acetal preferably has an ethylenically unsaturated group from the viewpoint of improving printing resistance.
  • the ethylenically unsaturated group contained in the polyvinyl acetal is not particularly limited, and from the viewpoint of reactivity, on-machine developability, and print resistance, a vinylphenyl group (styryl group), a vinyl ester group, a vinyl ether group, It is more preferable that it is at least one group selected from the group consisting of an allyl group, a (meth) acryloxy group, and a (meth) acrylamide group, and a vinyl group, an allyl group, a (meth) acryloxy group and the like are preferable.
  • the polyvinyl acetal preferably contains a structural unit having an ethylenically unsaturated group.
  • the structural unit having an ethylenically unsaturated group may be a structural unit having an acetal ring described above, or a structural unit other than the structural unit having an acetal ring.
  • polyvinyl acetal is preferably a compound in which an ethylenically unsaturated group is introduced into the acetal ring. That is, it is preferable that R has an ethylenically unsaturated group in the structural unit represented by (a) above.
  • the structural unit having an ethylenically unsaturated group is a structural unit other than the structural unit having an acetal ring, for example, the structural unit having an acrylate group, specifically, the structural unit represented by the following (d). There may be.
  • the content of this structural unit is the same as that of all the structural units of polyvinyl acetal. It is preferably 1 mol% to 15 mol%, more preferably 1 mol% to 10 mol%.
  • the polyvinyl acetal preferably further contains a structural unit having a hydroxy group from the viewpoint of on-machine developability and the like. That is, the polyvinyl acetal preferably contains a structural unit derived from vinyl alcohol. Examples of the structural unit having a hydroxy group include the structural unit represented by the following (b).
  • the content (also referred to as the amount of hydroxyl groups) of the structural unit represented by (b) above is preferably 5 mol% to 50 mol%, preferably 10 mol%, based on all the structural units of polyvinyl acetal from the viewpoint of on-machine developability. It is more preferably from 40 mol%, still more preferably from 20 mol% to 40 mol%.
  • the polyvinyl acetal may further contain other structural units.
  • the other structural unit include a structural unit having an acetyl group, specifically, a structural unit represented by the following (c).
  • the content (also referred to as the amount of acetyl group) of the structural unit represented by the above (c) is preferably 0.5 mol% to 10 mol%, preferably 0.5 mol% to 8 mol%, based on all the structural units of polyvinyl acetal. Is more preferable, and 1 mol% to 3 mol% is further preferable.
  • the degree of acetalization, the amount of acrylate groups, the amount of hydroxyl groups, and the amount of acetyl groups can be determined as follows. That is, the mol content is calculated from the proton peak area ratios of the methyl or methylene moiety of acetal, the methyl moiety of the acrylate group, and the methyl moiety of the hydroxyl group and the acetyl group by 1 H NMR measurement.
  • the weight average molecular weight of the polyvinyl acetal is preferably 18,000 to 150,000.
  • Solubility parameter of the polyvinyl acetal (also referred to as SP value) is preferably from 17.5MPa 1/2 ⁇ 20.0MPa 1/2, to be 18.0MPa 1/2 ⁇ 19.5MPa 1/2 More preferable.
  • the “solubility parameter (unit: (MPa) 1/2 )” in the present disclosure uses the Hansen solubility parameter.
  • the Hansen solubility parameter is a three-dimensional space obtained by dividing the solubility parameter introduced by Hildebrand into three components, a dispersion term ⁇ d, a polarity term ⁇ p, and a hydrogen bond term ⁇ h.
  • the solubility parameter (hereinafter, also referred to as SP value) is represented by ⁇ (unit: (MPa) 1/2 ), and a value calculated using the following formula is used.
  • ⁇ (MPa) 1/2 ( ⁇ d 2 + ⁇ p 2 + ⁇ h 2 ) 1/2
  • the dispersion term ⁇ d, the polarity term ⁇ p, and the hydrogen bond term ⁇ h are more sought after by Hansen and his successors, and are described in detail in the Polymer Handbook (fourth edition), VII-698-711. ..
  • the details of the value of the solubility parameter of Hansen are described in the document "Hansen Solubility Parameters; A Users Handbook (CRC Press, 2007)" by Charles M. Hansen.
  • the Hansen solubility parameter in the partial structure of the compound can be a value estimated from the chemical structure by using the computer software "Hansen Solubility Parameters in Practice (HSPiP ver.4.1.07)".
  • Hansen Solubility Parameters in Practice HSPiP ver.4.1.07
  • the SP value for each monomer unit is shown as the total amount multiplied by the molar fraction, and the compound has no monomer unit. If it is a molecular compound, it is the SP value of the entire compound.
  • the SP value of the polymer may be calculated from the molecular structure of the polymer by the Hoy method described in the Polymer Handbook (fourth edition).
  • polyvinyl acetals [P-1 to P-3] are listed below, but the polyvinyl acetals used in the present disclosure are not limited thereto.
  • “l” is 50 mol% to 90 mol%
  • “m” is 0.5 mol% to 10 mass%
  • "n” is 5 mol% to 50 mol%
  • “o” is 1 mol% to 1 mol%. It is 15 mol%.
  • polyvinyl acetal a commercially available product can be used.
  • Eslek series specifically, Eslek BX-L, BX-1, BX-5, BL-7Z, BM-1, BM-5, BH -6, BH-3, etc.
  • the image recording layer in the present disclosure preferably contains a resin having a fluorine atom, and more preferably contains a fluoroaliphatic group-containing copolymer.
  • a resin having a fluorine atom, particularly a fluoroaliphatic group-containing copolymer it is possible to suppress surface quality abnormalities due to foaming during formation of the image recording layer, improve the coating surface shape, and further form the image recording layer.
  • the inking property of the ink in the image recording layer can be improved.
  • the image recording layer containing the fluoroaliphatic group-containing copolymer has high gradation, for example, high sensitivity to laser light, good fog resistance due to scattered light, reflected light, etc., and excellent printing resistance. An excellent lithographic printing plate can be obtained.
  • the fluoroaliphatic group-containing copolymer preferably has a structural unit formed of a compound represented by either the following formula (F1) or the following formula (F2).
  • R F1 independently represents a hydrogen atom or a methyl group
  • X independently represents an oxygen atom, a sulfur atom, or -N ( RF2 )-.
  • m represents an integer of 1 ⁇ 6
  • n represents an integer of 1 ⁇ 10
  • l represents an integer of 0 ⁇ 10
  • R F2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
  • the alkyl group having 1 to 4 carbon atoms represented by RF2 in the formulas (F1) and (F2) is preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, preferably a hydrogen atom or a methyl group. Is more preferable. It is preferable that X in the formulas (F1) and (F2) is an oxygen atom.
  • the m in the formula (F1) is preferably 1 or 2, and more preferably 2.
  • N in the formula (F1) is preferably 2, 4, 6, 8, or 10, and more preferably 4 or 6.
  • the l in the formula (F1) is preferably 0.
  • the fluoroaliphatic group-containing copolymer is composed of poly (oxyalkylene) acrylate and poly (oxyalkylene) in addition to the structural unit formed from the compound represented by any of the above formulas (F1) and (F2). It is preferable to further have a structural unit formed by at least one compound selected from the group consisting of methacrylates.
  • the polyoxyalkylene group in the poly (oxyalkylene) acrylate and the poly (oxyalkylene) methacrylate can be represented by- (OR F3 ) x- , RF3 represents an alkyl group, and x is an integer of 2 or more. Represent.
  • the RF3 is preferably a linear or branched alkylene group having 2 to 4 carbon atoms. Examples of the linear or branched alkylene group having a carbon number of 2 ⁇ 4, -CH 2 CH 2 -, - CH 2 CH 2 CH 2 -, - CH (CH 3) CH 2 -, or -CH (CH 3 ) CH (CH 3 )-preferably.
  • x is preferably an integer of 2 to 100.
  • x "OR F3 " may be the same or different. That is, the polyoxyalkylene group may be one in which two or more kinds of "OR F3 " are regularly or irregularly bonded.
  • the polyoxyalkylene group may be one in which linear or branched oxypropylene units and oxyethylene units are regularly or irregularly bonded. More specifically, the polyoxyalkylene group may be a combination of a linear or branched block of oxypropylene units and a block of oxyethylene units.
  • the polyoxyalkylene group may contain one or more linking groups (for example, -CONH-Ph-NHCO-, -S-, etc., where Ph represents a phenylene group). ..
  • the molecular weight of the polyoxyalkylene group is preferably 250 to 3,000.
  • poly (oxyalkylene) acrylate and the poly (oxyalkylene) methacrylate a commercially available product or a synthetic product may be used.
  • the poly (oxyalkylene) acrylate and the poly (oxyalkylene) methacrylate react, for example, with a hydroxypoly (oxyalkylene) compound with acrylic acid, methacrylic acid, acrylic chloride, methacrylic chloride, anhydrous acrylic acid, or the like by a known method. It can be synthesized by letting it.
  • hydroxypoly (oxyalkylene) compound a commercially available product may be used, for example, ADEKA (registered trademark) Pluronic manufactured by ADEKA Corporation, ADEKA polyether manufactured by ADEKA Corporation, and Union Carbide Corporation. Examples thereof include Carbowax (registered trademark), Triton manufactured by Dow Chemical Corporation, and PEG manufactured by Daiichi Kogyo Seiyaku Co., Ltd.
  • ADEKA registered trademark
  • ADEKA polyether manufactured by ADEKA Corporation ADEKA Corporation
  • Union Carbide Corporation examples thereof include Carbowax (registered trademark), Triton manufactured by Dow Chemical Corporation, and PEG manufactured by Daiichi Kogyo Seiyaku Co., Ltd.
  • poly (oxyalkylene) acrylate and the poly (oxyalkylene) methacrylate poly (oxyalkylene) diacrylate or the like synthesized by a known method may be used.
  • one type of binder polymer may be used alone, or two or more types may be used in combination.
  • the binder polymer can be contained in the image recording layer in an arbitrary amount, but from the viewpoints of on-machine developability, UV printing resistance, UV plate skipping inhibitory property, and special color carving property, the binder polymer can be contained.
  • the content of the binder polymer is preferably more than 0% by mass and 20% by mass or less with respect to the total mass of the image recording layer, and the binder polymer is not contained or the content of the binder polymer is not contained.
  • the content of the binder polymer is more preferably more than 0% by mass and 10% by mass or less with respect to the total mass of the image recording layer, and either does not contain the binder polymer or contains the binder polymer. Is more preferably more than 0% by mass and 5% by mass or less with respect to the total mass of the image recording layer, and either does not contain the binder polymer or the content of the binder polymer is the content of the image recording layer. It is particularly preferably more than 0% by mass and 2% by mass or less with respect to the total mass, and most preferably it does not contain the binder polymer.
  • the image recording layer preferably contains a color former, and more preferably contains an acid color former. Moreover, it is preferable that the color former contains a leuco compound.
  • the "color former” used in the present disclosure means a compound having the property of changing the color of the image recording layer by developing or decoloring the color by a stimulus such as light or acid, and the "acid color former" is used. It means a compound having a property of developing or decoloring and changing the color of an image recording layer by heating in a state of receiving an electron-accepting compound (for example, a proton such as an acid).
  • the acid color former has a partial skeleton such as lactone, lactam, salton, spiropyrane, ester, and amide, and when it comes into contact with an electron-accepting compound, these partial skeletons are rapidly ring-opened or cleaved. Compounds are preferred.
  • Examples of such acid color formers are 3,3-bis (4-dimethylaminophenyl) -6-dimethylaminophthalide (referred to as "crystal violet lactone") and 3,3-bis (4).
  • -Dimethylaminophenyl) phthalide 3- (4-dimethylaminophenyl) -3- (4-diethylamino-2-methylphenyl) -6-dimethylaminophthalide, 3- (4-dimethylaminophenyl) -3- ( 1,2-dimethylindole-3-yl) phthalide, 3- (4-dimethylaminophenyl) -3- (2-methylindole-3-yl) phthalide, 3,3-bis (1,2-dimethylindole-) 3-yl) -5-dimethylaminophthalide, 3,3-bis (1,2-dimethylindole-3-yl) -6-dimethylaminophthalide, 3,3-bis (9-ethy
  • the color former used in the present disclosure is preferably at least one compound selected from the group consisting of a spiropyran compound, a spirooxazine compound, a spirolactone compound, and a spirolactam compound from the viewpoint of color development. .. From the viewpoint of visibility, the hue of the dye after color development is preferably green, blue or black.
  • the acid coloring agent is preferably a leuco dye from the viewpoint of color developing property and visibility of the exposed portion.
  • the leuco dye is not particularly limited as long as it has a leuco structure, but preferably has a spiro structure, and more preferably has a spirolactone ring structure.
  • the leuco dye is preferably a leuco dye having a phthalide structure or a fluorine structure from the viewpoint of color development and visibility of the exposed portion.
  • the leuco dye having the phthalide structure or the fluorine structure is a compound represented by any of the following formulas (Le-1) to (Le-3) from the viewpoint of color development and visibility of the exposed portion. It is more preferable that the compound is represented by the following formula (Le-2).
  • each ERG independently represents an electron donating group
  • each X 1 ⁇ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group
  • X 5 to X 10 independently represent a hydrogen atom, a halogen atom or a monovalent organic group
  • Y 1 and Y 2 independently represent C or N, and when Y 1 is N, If X 1 is absent and Y 2 is N, then X 4 is absent, Ra 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 are independent alkyl groups. Or represents an aryl group.
  • the electron-donating groups in the ERGs of the formulas (Le-1) to (Le-3) include amino groups, alkylamino groups, arylamino groups, and dialkylamino groups from the viewpoint of color development and visibility of the exposed area.
  • a group, a monoalkyl monoarylamino group, a diarylamino group, an alkoxy group, an aryloxy group, or an alkyl group is preferable, and an amino group, an alkylamino group, an arylamino group, a dialkylamino group, or a monoalkyl monoarylamino group.
  • a diarylamino group, an alkoxy group, or an aryloxy group is more preferable, a monoalkyl monoarylamino group or a diarylamino group is further preferable, and a monoalkyl monoarylamino group is particularly preferable. ..
  • Formula (Le-1) ⁇ formula each X 1 ⁇ X 4 is in (Le-3) independently chromogenic, and, from the viewpoint of visibility of the exposure unit, a hydrogen atom, or, be a chlorine atom preferably , A hydrogen atom is more preferable.
  • X 5 to X 10 in the formula (Le-2) or the formula (Le-3) are independently, from the viewpoint of color development and visibility of the exposed part, hydrogen atom, halogen atom, alkyl group, aryl group, respectively.
  • a hydrogen atom is particularly preferable. It is preferable that at least one of Y 1 and Y 2 in the formulas (Le-1) to (Le-3) is C from the viewpoint of color development and visibility of the exposed portion, and Y 1 and Y are Y. It is more preferable that both of 2 are C.
  • Ra 1 in the formulas (Le-1) to (Le-3) is preferably an alkyl group or an alkoxy group, and more preferably an alkoxy group, from the viewpoint of color development and visibility of the exposed portion. It is preferably a methoxy group, and particularly preferably a methoxy group.
  • Rb 1 to Rb 4 in the formulas (Le-1) to (Le-3) are preferably hydrogen atoms or alkyl groups independently from the viewpoint of color development and visibility of the exposed part, and are alkyl. It is more preferably a group, and particularly preferably a methyl group.
  • the leuco dye having the phthalide structure or the fluorene structure has the following formulas (Le-4) to the following formulas (Le-4) from the viewpoint of color development and visibility of the exposed portion.
  • the compound represented by any of Le-6) is more preferable, and the compound represented by the following formula (Le-5) is further preferable.
  • each ERG independently represents an electron donating group
  • each X 1 ⁇ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group
  • Y 1 and Y 2 independently represent C or N, and if Y 1 is N, then X 1 does not exist, and if Y 2 is N, then X 4 does not exist and Ra.
  • 1 represents a hydrogen atom, an alkyl group or an alkoxy group
  • Rb 1 to Rb 4 independently represent an alkyl group or an aryl group, respectively.
  • ERG, X 1 to X 4 , Y 1 , Y 2 , Ra 1 and Rb 1 to Rb 4 in the formulas (Le-4) to (Le-6) are the formulas (Le-1) to the formulas (Le-1) to Rb 4 , respectively.
  • the leuco dye having the phthalide structure or the fluorane structure has the following formulas (Le-7) to the following formulas (Le-7) from the viewpoint of color development and visibility of the exposed portion.
  • a compound represented by any of Le-9) is more preferable, and a compound represented by the following formula (Le-8) is particularly preferable.
  • each X 1 ⁇ X 4 is independently a hydrogen atom, a halogen atom or a dialkyl anilino group
  • Y 1 and Y 2 are each independently, C or Representing N, when Y 1 is N, X 1 does not exist, when Y 2 is N, X 4 does not exist
  • Ra 1 to Ra 4 are independent hydrogen atoms and alkyl, respectively.
  • Rb 1 to Rb 4 independently represent an alkyl group or an aryl group
  • Rc 1 and Rc 2 each independently represent an aryl group.
  • Ra 1 to Ra 4 in the formulas (Le-7) to (Le-9) are preferably alkyl groups or alkoxy groups independently from the viewpoint of color development and visibility of the exposed portion, respectively, and are alkoxy groups. It is more preferably a group, and particularly preferably a methoxy group.
  • Rb 1 to Rb 4 in the formulas (Le-7) to (Le-9) are independently substituted with a hydrogen atom, an alkyl group, or an alkoxy group from the viewpoint of color development and visibility of the exposed portion. It is preferably a group, more preferably an alkyl group, and particularly preferably a methyl group.
  • Rc 1 and Rc 2 in the formula (Le-8) are preferably phenyl groups or alkylphenyl groups, and are preferably phenyl groups, independently from the viewpoint of color development and visibility of the exposed portion. Is more preferable.
  • X 1 to X 4 are hydrogen atoms and Y 1 and Y 2 are C from the viewpoint of color development and visibility of the exposed portion.
  • Rb 1 and Rb 2 are independently alkyl groups or aryl groups substituted with an alkoxy group.
  • the alkyl group in the formulas (Le-1) to (Le-9) may be linear, have a branch, or have a ring structure. Further, the number of carbon atoms of the alkyl group in the formulas (Le-1) to (Le-9) is preferably 1 to 20, more preferably 1 to 8, and further preferably 1 to 4. It is preferably 1 or 2, and particularly preferably 1. The number of carbon atoms of the aryl group in the formulas (Le-1) to (Le-9) is preferably 6 to 20, more preferably 6 to 10, and particularly preferably 6 to 8.
  • each group such as a monovalent organic group, an alkyl group, an aryl group, a dialkylanilino group, an alkylamino group and an alkoxy group in the formulas (Le-1) to (Le-9) has a substituent.
  • substituents include alkyl groups, aryl groups, halogen atoms, amino groups, alkylamino groups, arylamino groups, dialkylamino groups, monoalkyl monoarylamino groups, diarylamino groups, hydroxy groups, alkoxy groups, allyloxy groups and acyl groups. Examples thereof include a group, an alkoxycarbonyl group, an aryloxycarbonyl group and a cyano group. Further, these substituents may be further substituted with these substituents.
  • Examples of the leuco dye having a phthalide structure or a fluorine structure that are preferably used include the following compounds.
  • Me represents a methyl group.
  • ETAC, S-205, BLACK305, BLACK400, BLACK100, BLACK500, H-7001, GREEN300, NIRBLACK78, H-3035, ATP, H-1046, H-2114, GREEN-DCF, Blue-63. , GN-169, and crystal violet lactone are preferable because the film to be formed has a good visible light absorption rate.
  • color formers may be used alone or in combination of two or more kinds of components.
  • the content of the color former is preferably 0.5% by mass to 10% by mass, and more preferably 1% by mass to 5% by mass, based on the total mass of the image recording layer.
  • the image recording layer used in the present disclosure may contain a chain transfer agent.
  • the chain transfer agent contributes to the improvement of printing durability in the lithographic printing plate.
  • a thiol compound is preferable, a thiol having 7 or more carbon atoms is more preferable from the viewpoint of boiling point (difficulty in volatilization), and a compound having a mercapto group on the aromatic ring (aromatic thiol compound) is further preferable.
  • the thiol compound is preferably a monofunctional thiol compound.
  • chain transfer agent examples include the following compounds.
  • the content of the chain transfer agent is preferably 0.01% by mass to 50% by mass, more preferably 0.05% by mass to 40% by mass, and 0.1% by mass to 30% by mass with respect to the total mass of the image recording layer. % Is more preferable.
  • the image recording layer may contain a low molecular weight hydrophilic compound in order to improve on-machine developability while suppressing a decrease in printing resistance.
  • the low molecular weight hydrophilic compound is preferably a compound having a molecular weight of less than 1,000, more preferably a compound having a molecular weight of less than 800, and further preferably a compound having a molecular weight of less than 500.
  • low molecular weight hydrophilic compound examples include, as water-soluble organic compounds, glycols such as ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, and tripropylene glycol, ethers or ester derivatives thereof, and glycerin.
  • glycols such as ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, and tripropylene glycol, ethers or ester derivatives thereof, and glycerin.
  • Polyols such as pentaerythritol and tris (2-hydroxyethyl) isocyanurate
  • organic amines such as triethanolamine, diethanolamine and monoethanolamine and salts thereof
  • organic sulfates such as alkyl sulfonic acid, toluene sulfonic acid and benzene sulfonic acid.
  • organic sulfamic acids such as alkylsulfamic acid and salts thereof, organic sulfates such as alkylsulfuric acid and alkylether sulfuric acid and salts thereof, organic phosphonic acids such as phenylphosphonic acid and salts thereof, tartrate acid, oxalic acid, quench Examples thereof include organic carboxylic acids such as acids, malic acids, lactic acids, gluconic acids and amino acids, salts thereof, and betaines.
  • the low molecular weight hydrophilic compound it is preferable to contain at least one selected from polyols, organic sulfates, organic sulfonates and betaines.
  • organic sulfonates include alkyl sulfonates such as sodium n-butyl sulfonate, sodium n-hexyl sulfonate, sodium 2-ethylhexyl sulfonate, sodium cyclohexyl sulfonate, and sodium n-octyl sulfonate; 5 , 8,11-Trioxapentadecane-1-sulfonate, 5,8,11-trioxaheptadecane-1-sulfonate, 13-ethyl-5,8,11-trioxaheptadecane-1-sulfon Alkyl sulfonates containing ethylene oxide chains such as sodium acid, sodium 5,8,11,14-tetraoxatetracosan-1-sulfonate; sodium benzenesulfonate, sodium p-toluenesulfonate, p-hydroxybenzenesulfonic
  • organic sulfates include sulfates of alkyl, alkenyl, alkynyl, aryl or heterocyclic monoether of polyethylene oxide.
  • the number of ethylene oxide units is preferably 1 to 4, and the salt is preferably a sodium salt, a potassium salt or a lithium salt.
  • Specific examples include the compounds described in paragraphs 0034 to 0038 of JP-A-2007-276454.
  • betaines compounds having 1 to 5 carbon atoms of the hydrocarbon substituent on the nitrogen atom are preferable, and specific examples thereof include trimethylammonium acetate, dimethylpropylammonium acetate, and 3-hydroxy-4-trimethylammonium.
  • Obutyrate, 4- (1-pyridinio) butyrate, 1-hydroxyethyl-1-imidazolioacetate, trimethylammonium methanesulfonate, dimethylpropylammonium methanesulfonate, 3-trimethylammonio-1-propanesulfonate, 3 -(1-Pyridinio) -1-propanesulfonate and the like can be mentioned.
  • the low-molecular-weight hydrophilic compound has a small structure of the hydrophobic part and has almost no surface-active action, dampening water permeates the exposed part (image part) of the image recording layer and reduces the hydrophobicity and film strength of the image part. It is possible to maintain good ink acceptability and printing resistance of the image recording layer.
  • the content of the low molecular weight hydrophilic compound is preferably 0.5% by mass to 20% by mass, more preferably 1% by mass to 15% by mass, and 2% by mass to 10% by mass with respect to the total mass of the image recording layer. Is more preferable. Good on-machine developability and print resistance can be obtained in this range.
  • the low molecular weight hydrophilic compound may be used alone or in combination of two or more.
  • the image recording layer may contain a fat-sensing agent such as a phosphonium compound, a nitrogen-containing low molecular weight compound, and an ammonium group-containing polymer in order to improve the meat-forming property.
  • a fat-sensing agent such as a phosphonium compound, a nitrogen-containing low molecular weight compound, and an ammonium group-containing polymer in order to improve the meat-forming property.
  • these compounds function as a surface coating agent for the inorganic layered compound, and it is possible to suppress a decrease in inking property during printing due to the inorganic layered compound.
  • the fat sensitive agent it is preferable to use a phosphonium compound, a nitrogen-containing low molecular weight compound, and an ammonium group-containing polymer in combination, and the phosphonium compound, a quaternary ammonium salt, and an ammonium group-containing polymer are used in combination. Is more preferable.
  • Examples of the phosphonium compound include the phosphonium compounds described in JP-A-2006-297907 and JP-A-2007-50660. Specific examples include tetrabutylphosphonium iodide, butyltriphenylphosphonium bromide, tetraphenylphosphonium bromide, 1,4-bis (triphenylphosphonio) butane-di (hexafluorophosphine), and 1,7-bis (tri). Phenylphosphonio) heptane-sulfate, 1,9-bis (triphenylphosphonio) nonane-naphthalen-2,7-disulfonate and the like can be mentioned.
  • nitrogen-containing low molecular weight compounds examples include amine salts and quaternary ammonium salts.
  • imidazolinium salts, benzoimidazolinium salts, pyridinium salts, quinolinium salts and the like can also be mentioned. Of these, quaternary ammonium salts and pyridinium salts are preferable.
  • tetramethylammonium hexafluorophosphate
  • tetrabutylammonium hexafluorophosphate
  • dodecyltrimethylammonium p-toluenesulfonate
  • benzyltriethylammonium hexafluorophosphate
  • benzyldimethyloctylammonium hexafluorophos.
  • Examples thereof include fert, benzyldimethyldodecylammonium-hexafluorophosphate, compounds described in paragraphs 0021 to 0037 of JP-A-2008-284858 and paragraphs 0030 to 0057 of JP-A-2009-90645.
  • the ammonium group-containing polymer may have an ammonium group in its structure, and a polymer containing 5 mol% to 80 mol% of a (meth) acrylate having an ammonium group in the side chain as a copolymerization component is preferable.
  • Specific examples include the polymers described in paragraphs 0008-0105 of JP2009-208458A.
  • the ammonium salt-containing polymer preferably has a reduced specific viscosity (unit: ml / g) value in the range of 5 to 120, which is obtained according to the measurement method described in JP-A-2009-208458, and is in the range of 10 to 110. Is more preferable, and those in the range of 15 to 100 are particularly preferable.
  • Mw weight average molecular weight
  • the content of the oil-sensitive agent is preferably 0.01% by mass to 30.0% by mass, more preferably 0.1% by mass to 15.0% by mass, and 1% by mass with respect to the total mass of the image recording layer. % To 10% by mass is more preferable.
  • the image recording layer may contain, as other components, a surfactant, a polymerization inhibitor, a higher fatty acid derivative, a plasticizer, inorganic particles, an inorganic layered compound and the like. Specifically, the description in paragraphs 0114 to 0159 of JP-A-2008-284817 can be referred to.
  • the image recording layer in the lithographic printing plate original plate according to the present disclosure is coated by dispersing or dissolving each of the necessary components in a known solvent, for example, as described in paragraphs 0142 to 0143 of Japanese Patent Application Laid-Open No. 2008-195018. It can be formed by preparing a liquid, applying the coating liquid on the support by a known method such as coating with a bar coater, and drying. As the solvent, a known solvent can be used.
  • the solvent may be used alone or in combination of two or more.
  • the solid content concentration in the coating liquid is preferably about 1 to 50% by mass.
  • the coating amount (solid content) of the image recording layer after coating and drying varies depending on the application, but from the viewpoint of obtaining good sensitivity and good film characteristics of the image recording layer, 0.3 g / m 2 to 3.0 g / m 2 is preferred.
  • the aluminum support in the lithographic printing plate original plate according to the present disclosure can be appropriately selected from known aluminum supports for lithographic printing plate original plates and used.
  • the aluminum support is also simply referred to as a "support”.
  • an aluminum support having a hydrophilic surface (hereinafter, also referred to as “hydrophilic aluminum support”) is preferable.
  • the aluminum support in the lithographic printing plate original plate according to the present disclosure has a contact angle with water on the surface of the aluminum support on the image recording layer side by the aerial water droplet method of 110 ° or less from the viewpoint of suppressing scratches and stains.
  • the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side shall be measured by the following method.
  • the lithographic printing plate original plate is immersed in a solvent capable of removing the image recording layer (for example, the solvent used in the coating liquid for the image recording layer), the image recording layer is scraped off at least one of the sponge and cotton, and the image recording layer is used as a solvent.
  • the surface of the aluminum support is exposed by dissolving in it.
  • the contact angle with water on the surface of the exposed aluminum support on the image recording layer side is measured on the surface at 25 ° C. by a fully automatic contact angle meter (for example, DM-501 manufactured by Kyowa Surface Chemistry Co., Ltd.) as a measuring device. It is measured as the contact angle of water droplets (after 0.2 seconds).
  • the aluminum support in the present disclosure an aluminum plate that has been roughened and anodized by a known method is preferable. That is, the aluminum support in the present disclosure preferably has an aluminum plate and an anodized film of aluminum arranged on the aluminum plate.
  • the support (1) has an aluminum plate and an anodized film of aluminum arranged on the aluminum plate, and the anodized film is located closer to the image recording layer than the aluminum plate.
  • the anodic oxide film has micropores extending in the depth direction from the surface on the image recording layer side, and the average diameter of the micropores on the surface of the anodic oxide film is more than 10 nm and 100 nm or less, and the anodic oxidation.
  • the value of the brightness L * in the L * a * b * color system of the surface of the film on the image recording layer side is 70 to 100.
  • FIG. 1 is a schematic cross-sectional view of an embodiment of the aluminum support 12a.
  • the aluminum support 12a has a laminated structure in which an aluminum plate 18 and an anodized film 20a of aluminum (hereinafter, also simply referred to as “anodized film 20a”) are laminated in this order.
  • the anodized film 20a in the aluminum support 12a is located closer to the image recording layer than the aluminum plate 18. That is, it is preferable that the lithographic printing plate original plate according to the present disclosure has at least an anodized film, an image recording layer, and a water-soluble resin layer on an aluminum plate in this order.
  • the anodized film 20a is a film formed on the surface of the aluminum plate 18 by anodizing treatment, and this film is extremely fine micropores 22a which are substantially perpendicular to the film surface and are uniformly distributed among individuals.
  • the micropores 22a extend from the surface of the anodized film 20a on the image recording layer side (the surface of the anodized film 20a on the side opposite to the aluminum plate 18 side) along the thickness direction (aluminum plate 18 side).
  • the average diameter (average opening diameter) of the micropores 22a in the anodized film 20a on the surface of the anodized film is preferably more than 10 nm and 100 nm or less. Among them, from the viewpoint of the balance between printing resistance, stain resistance, and image visibility, 15 nm to 60 nm is more preferable, 20 nm to 50 nm is further preferable, and 25 nm to 40 nm is particularly preferable.
  • the diameter inside the pores may be wider or narrower than the surface layer. If the average diameter exceeds 10 nm, the printing resistance and image visibility are further excellent. Further, when the average diameter is 100 nm or less, the printing resistance is further excellent.
  • the average diameter of the micropores 22a is 400 nm ⁇ 600 nm in the four images obtained by observing the surface of the anodized film 20a with a field emission scanning electron microscope (FE-SEM) at a magnification of 150,000.
  • the diameter (diameter) of the micropores existing in the range of is measured at 50 points and calculated as an arithmetic average value. If the shape of the micropore 22a is not circular, the diameter equivalent to the circle is used.
  • the "circle equivalent diameter” is the diameter of a circle when the shape of the opening is assumed to be a circle having the same projected area as the projected area of the opening.
  • the depth of the micropore 22a is not particularly limited, but is preferably 10 nm to 3,000 nm, more preferably 50 nm to 2,000 nm, and even more preferably 300 nm to 1,600 nm.
  • the depth is an average value obtained by taking a photograph (150,000 times) of the cross section of the anodized film 20a and measuring the depths of 25 or more micropores 22a.
  • the shape of the micropore 22a is not particularly limited, and in FIG. 1, it is a substantially straight tubular (substantially cylindrical) shape, but it may be a conical shape whose diameter decreases in the depth direction (thickness direction).
  • the shape of the bottom of the micropore 22a is not particularly limited, and may be curved (convex) or flat.
  • the value of L * a * b * brightness L * in the color system of the surface of the aluminum support 12a on the image recording layer side (the surface of the anodized film 20a on the image recording layer side) is preferably 70 to 100. .. Among them, 75 to 100 is preferable, and 75 to 90 is more preferable, in that the balance between printing resistance and image visibility is more excellent.
  • the brightness L * is measured using a color difference meter Specro Eye manufactured by X-Light Co., Ltd.
  • the micropore communicates with the large-diameter hole extending from the surface of the anodic oxide film to a depth of 10 nm to 1,000 nm and the bottom of the large-diameter hole, and is deep from the communication position. It is composed of a small-diameter hole extending from 20 nm to 2,000 nm, and the average diameter of the large-diameter hole on the surface of the anodic oxide film is 15 nm to 150 nm, and the average diameter of the small-diameter hole at the communication position.
  • a mode in which the diameter is 13 nm or less (hereinafter, the support according to the above mode is also referred to as “support (2)”) is also preferably mentioned.
  • support (2) is also preferably mentioned.
  • the aluminum support 12b includes an aluminum plate 18 and an anodic oxide film 20b having a micropore 22b composed of a large-diameter hole portion 24 and a small-diameter hole portion 26.
  • the micropores 22b in the anodized film 20b have a large-diameter hole portion 24 extending from the surface of the anodized film to a depth of 10 nm to 1,000 nm (depth D: see FIG. 2) and a bottom portion of the large-diameter hole portion 24.
  • the large-diameter hole portion 24 and the small-diameter hole portion 26 will be described in detail below.
  • the average diameter of the large-diameter pore portion 24 on the surface of the anodized film 20b is the same as the average diameter of the micropores 22a in the above-mentioned anodized film 20a on the surface of the anodized film, which is more than 10 nm and 100 nm or less, and the preferable range is also the same. Is.
  • the method for measuring the average diameter on the surface of the anodic oxide film 20b of the large-diameter hole portion 24 is the same as the method for measuring the average diameter on the surface of the anodic oxide film of the micropores 22a in the anodic oxide film 20a.
  • the bottom of the large-diameter hole portion 24 is located at a depth of 10 nm to 1,000 nm (hereinafter, also referred to as a depth D) from the surface of the anodized film. That is, the large-diameter hole portion 24 is a hole portion extending from the surface of the anodized film to a position of 10 nm to 1,000 nm in the depth direction (thickness direction).
  • the depth is preferably 10 nm to 200 nm.
  • the depth is an average value obtained by taking a photograph (150,000 times) of the cross section of the anodized film 20b, measuring the depths of 25 or more large-diameter hole portions 24, and averaging them.
  • the shape of the large-diameter hole portion 24 is not particularly limited, and examples thereof include a substantially straight tubular shape (substantially cylindrical) and a conical shape whose diameter decreases in the depth direction (thickness direction). preferable.
  • the small-diameter hole portion 26 is a hole portion that communicates with the bottom portion of the large-diameter hole portion 24 and extends further in the depth direction (thickness direction) from the communication position.
  • the average diameter of the small-diameter hole portion 26 at the communication position is preferably 13 nm or less. Of these, 11 nm or less is preferable, and 10 nm or less is more preferable.
  • the lower limit is not particularly limited, but it is often 5 nm or more.
  • the diameter (diameter) of the (small diameter hole) is measured and obtained as an arithmetic mean value. If the large-diameter hole is deep, the upper part of the anodic oxide film 20b (the region with the large-diameter hole) is cut (for example, cut with argon gas), and then the anodic oxide film 20b is cut.
  • the surface may be observed with the above FE-SEM to obtain the average diameter of the small-diameter holes.
  • the diameter equivalent to a circle is used.
  • the "circle equivalent diameter” is the diameter of a circle when the shape of the opening is assumed to be a circle having the same projected area as the projected area of the opening.
  • the bottom portion of the small-diameter hole portion 26 is located at a position extending 20 nm to 2,000 nm in the depth direction from the communication position with the large-diameter hole portion 24.
  • the small-diameter hole portion 26 is a hole portion that extends further in the depth direction (thickness direction) from the communication position with the large-diameter hole portion 24, and the depth of the small-diameter hole portion 26 is 20 nm to 2,000 nm. ..
  • the depth is preferably 500 nm to 1,500 nm.
  • the depth is an average value obtained by taking a photograph (50,000 times) of the cross section of the anodized film 20b and measuring the depths of 25 or more small-diameter holes.
  • the shape of the small-diameter hole portion 26 is not particularly limited, and examples thereof include a substantially straight tubular (approximately cylindrical) shape and a conical shape whose diameter decreases in the depth direction, and a substantially straight tubular shape is preferable.
  • -Manufacturing method of aluminum support As a method for manufacturing the aluminum support used in the present disclosure, for example, a manufacturing method in which the following steps are sequentially performed is preferable.
  • -Roughening treatment step A step of roughening an aluminum plate-Anodization treatment step: A step of anodizing an aluminum plate that has been roughened-Pore wide treatment step: Anodizer obtained in an anodization treatment step Step of bringing an aluminum plate having an oxide film into contact with an acid aqueous solution or an alkaline aqueous solution to increase the diameter of micropores in the anodic oxide film.
  • the roughening treatment step is a step of applying a roughening treatment including an electrochemical roughening treatment to the surface of the aluminum plate. This step is preferably carried out before the anodizing treatment step described later, but it may not be carried out in particular as long as the surface of the aluminum plate already has a preferable surface shape.
  • the roughening treatment may be carried out only by the electrochemical roughening treatment, but is carried out by combining the electrochemical roughening treatment with the mechanical roughening treatment and / or the chemical roughening treatment. You may.
  • the electrochemical roughening treatment is preferably carried out using direct current or alternating current in an aqueous solution mainly containing nitric acid or hydrochloric acid.
  • the method of mechanical roughening treatment is not particularly limited, and examples thereof include the methods described in Japanese Patent Publication No. 50-40047.
  • the chemical roughening treatment is also not particularly limited, and known methods can be mentioned.
  • the chemical etching treatment performed after the mechanical roughening treatment smoothes the uneven edges on the surface of the aluminum plate, prevents ink from getting caught during printing, and improves the stain resistance of the printing plate. , It is performed to remove unnecessary substances such as abrasive particles remaining on the surface.
  • Examples of the chemical etching treatment include etching with an acid and etching with an alkali, and as a method particularly excellent in terms of etching efficiency, a chemical etching treatment using an alkaline aqueous solution (hereinafter, also referred to as “alkali etching treatment”) can be mentioned. Be done.
  • the alkaline agent used in the alkaline aqueous solution is not particularly limited, and examples thereof include caustic soda, caustic potash, sodium metasilicate, sodium carbonate, sodium aluminate, and sodium gluconate.
  • the alkaline aqueous solution may contain aluminum ions.
  • the concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.01% by mass or more, more preferably 3% by mass or more, and preferably 30% by mass or less.
  • the alkaline etching treatment When the alkaline etching treatment is performed, it is preferable to perform a chemical etching treatment (hereinafter, also referred to as "desmat treatment") using a low-temperature acidic aqueous solution in order to remove the product generated by the alkaline etching treatment.
  • the acid used in the acidic aqueous solution is not particularly limited, and examples thereof include sulfuric acid, nitric acid, and hydrochloric acid.
  • the temperature of the acidic aqueous solution is preferably 20 ° C to 80 ° C.
  • (1) mechanical roughening treatment may be carried out before the treatment of (2) of the A aspect or (10) of the B aspect.
  • the amount of the aluminum plate dissolved in the first alkali etching treatment and the fourth alkali etching treatment is preferably 0.5 g / m 2 to 30 g / m 2, and more preferably 1.0 g / m 2 to 20 g / m 2 .
  • Examples of the nitric acid-based aqueous solution used in the first electrochemical roughening treatment in the A aspect include an aqueous solution used in the electrochemical roughening treatment using direct current or alternating current.
  • an aqueous solution obtained by adding aluminum nitrate, sodium nitrate, ammonium nitrate or the like to an aqueous nitric acid solution of 1 to 100 g / L can be mentioned.
  • the aqueous solution mainly containing hydrochloric acid used in the second electrochemical roughening treatment in the A aspect and the third electrochemical roughening treatment in the B aspect is an electrochemical rough surface using ordinary direct current or alternating current. Examples thereof include an aqueous solution used for the chemical treatment.
  • an aqueous solution obtained by adding 0 g / L to 30 g / L of sulfuric acid to a 1 g / L to 100 g / L hydrochloric acid aqueous solution can be mentioned.
  • nitrate ions such as aluminum nitrate, sodium nitrate and ammonium nitrate
  • hydrochloric acid ions such as aluminum chloride, sodium chloride and ammonium chloride may be further added to this solution.
  • FIG. 3 is a graph showing an example of an alternating waveform current waveform diagram used in the electrochemical roughening process.
  • ta is the anode reaction time
  • ct is the cathode reaction time
  • tp is the time from 0 to the peak of the current
  • Ia is the peak current on the anode cycle side
  • Ic is the peak current on the cathode cycle side.
  • AA is the current of the anode reaction of the aluminum plate
  • CA is the current of the cathode reaction of the aluminum plate.
  • the time tp from 0 to the peak of the current is preferably 1 ms to 10 ms.
  • the conditions for one cycle of AC used for electrochemical roughening are that the ratio ct / ta of the anode reaction time ta and the cathode reaction time ct of the aluminum plate is 1 to 20, and the amount of electricity Qc and the anode when the aluminum plate is the anode.
  • the ratio Qc / Qa of the amount of electricity Qa at the time is in the range of 0.3 to 20 and the anode reaction time ta is in the range of 5 ms to 1,000 ms.
  • the current density is the peak value of the trapezoidal wave, and is preferably 10 A / dm 2 to 200 A / dm 2 for both the anode cycle side Ia and the cathode cycle side Ic of the current.
  • Ic / Ia is preferably 0.3 to 20.
  • the total amount of electricity furnished to anode reaction of the aluminum plate at the time the electrochemical graining is completed, 25C / dm 2 ⁇ 1,000C / dm 2 is preferred.
  • FIG. 4 is a side view showing an example of a radial cell in an electrochemical roughening treatment using alternating current.
  • 50 is a main electrolytic cell
  • 51 is an AC power supply
  • 52 is a radial drum roller
  • 53a and 53b are main poles
  • 54 is an electrolytic solution supply port
  • 55 is an electrolytic solution
  • 56 is a slit
  • 57 is an electrolytic solution passage.
  • 58 is an auxiliary anode
  • 60 is an auxiliary anode tank
  • W is an aluminum plate.
  • the arrow A1 indicates the supply direction of the electrolytic solution
  • the arrow A2 indicates the discharge direction of the electrolytic solution. Is.
  • the electrolysis conditions may be the same or different.
  • the aluminum plate W is wound around a radial drum roller 52 immersed in the main electrolytic cell 50 and is electrolyzed by the main poles 53a and 53b connected to the AC power supply 51 during the transfer process.
  • the electrolytic solution 55 is supplied from the electrolytic solution supply port 54 to the electrolytic solution passage 57 between the radial drum roller 52 and the main poles 53a and 53b through the slit 56.
  • the aluminum plate W treated in the main electrolytic cell 50 is then electrolyzed in the auxiliary anode tank 60.
  • An auxiliary anode 58 is arranged to face the aluminum plate W in the auxiliary anode tank 60, and the electrolytic solution 55 is supplied so as to flow in the space between the auxiliary anode 58 and the aluminum plate W.
  • the amount of the aluminum plate dissolved in the second alkali etching treatment is preferably 1.0 g / m 2 or more, and more preferably 2.0 g / m 2 to 10 g / m 2 in that a predetermined printing plate original plate can be easily produced.
  • the amount of the aluminum plate dissolved in the third alkali etching treatment and the fourth alkali etching treatment is preferably 0.01 g / m 2 to 0.8 g / m 2 and 0.05 g in that a predetermined printing plate original plate can be easily produced.
  • / M 2 to 0.3 g / m 2 is more preferable.
  • an acidic aqueous solution containing phosphoric acid, nitric acid, sulfuric acid, chromium acid, hydrochloric acid, or a mixed acid containing two or more of these acids is preferably used.
  • the acid concentration of the acidic aqueous solution is preferably 0.5% by mass to 60% by mass.
  • the procedure of the anodizing treatment step is not particularly limited as long as the above-mentioned micropores can be obtained, and known methods can be mentioned.
  • aqueous solutions of sulfuric acid, phosphoric acid, oxalic acid and the like can be used as the electrolytic bath.
  • the concentration of sulfuric acid is 100 g / L to 300 g / L.
  • the conditions for the anodic oxidation treatment are appropriately set depending on the electrolytic solution used, and for example, the liquid temperature is 5 ° C. to 70 ° C. (preferably 10 ° C. to 60 ° C.), and the current density is 0.5 A / dm 2 to 60 A / dm 2.
  • the pore-wide treatment is a treatment (pore diameter enlargement treatment) for enlarging the diameter (pore diameter) of micropores existing in the anodizing film formed by the above-mentioned anodizing treatment step.
  • the pore-wide treatment can be carried out by bringing the aluminum plate obtained by the above-mentioned anodizing treatment step into contact with an acid aqueous solution or an alkaline aqueous solution.
  • the method of contact is not particularly limited, and examples thereof include a dipping method and a spraying method.
  • the planographic printing plate original plate according to the present disclosure preferably has an undercoat layer (sometimes referred to as an intermediate layer) between the image recording layer and the support.
  • the undercoat layer strengthens the adhesion between the support and the image recording layer in the exposed portion, and makes it easy for the image recording layer to peel off from the support in the unexposed portion, so that the developability is not impaired. Contributes to improving.
  • the undercoat layer functions as a heat insulating layer, so that the heat generated by the exposure is diffused to the support to prevent the sensitivity from being lowered.
  • Examples of the compound used for the undercoat layer include polymers having an adsorptive group and a hydrophilic group that can be adsorbed on the surface of the support.
  • a polymer having an adsorptive group and a hydrophilic group and further having a crosslinkable group is preferable in order to improve the adhesion to the image recording layer.
  • the compound used for the undercoat layer may be a low molecular weight compound or a polymer.
  • two or more kinds may be mixed and used as needed.
  • the compound used for the undercoat layer is a polymer
  • a copolymer of a monomer having an adsorptive group, a monomer having a hydrophilic group and a monomer having a crosslinkable group is preferable.
  • Adsorbent groups that can be adsorbed on the surface of the support include phenolic hydroxy groups, carboxy groups, -PO 3 H 2 , -OPO 3 H 2 , -CONHSO 2- , -SO 2 NHSO 2- , -COCH 2 COCH 3 Is preferable.
  • As the hydrophilic group a sulfo group or a salt thereof, or a salt of a carboxy group is preferable.
  • the polymer may have a crosslinkable group introduced by salt formation of the polar substituent of the polymer, a substituent having a pair charge with the polar substituent and a compound having an ethylenically unsaturated bond, and the above.
  • a monomer other than the above, preferably a hydrophilic monomer, may be further copolymerized.
  • a phosphorus compound having a double bond reactive group is preferably used.
  • Crosslinkable groups preferably ethylenically unsaturated bonding groups
  • supports described in JP-A-2005-238816, JP-A-2005-125479, JP-A-2006-239867, and JP-A-2006-215263 Low molecular weight or high molecular weight compounds having functional and hydrophilic groups that interact with the surface are also preferably used.
  • More preferable examples thereof include polymer polymers having an adsorptive group, a hydrophilic group and a crosslinkable group that can be adsorbed on the surface of the support described in JP-A-2005-125794 and JP-A-2006-188038.
  • the content of the ethylenically unsaturated bond group in the polymer used for the undercoat layer is preferably 0.1 mmol to 10.0 mmol, more preferably 0.2 mmol to 5.5 mmol per 1 g of the polymer.
  • the weight average molecular weight (Mw) of the polymer used in the undercoat layer is preferably 5,000 or more, and more preferably 10,000 to 300,000.
  • the undercoat layer preferably contains a hydrophilic compound from the viewpoint of developability.
  • the hydrophilic compound is not particularly limited, and a known hydrophilic compound used for the undercoat layer can be used.
  • Preferred examples of the hydrophilic compound include phosphonic acids having an amino group such as carboxymethyl cellulose and dextrin, organic phosphonic acid, organic phosphoric acid, organic phosphinic acid, amino acids, and hydrochloride of amine having a hydroxy group.
  • hydrophilic compound a compound having an amino group or a functional group having a polymerization prohibitive ability and a group interacting with the surface of the support (for example, 1,4-diazabicyclo [2.2.2] octane (DABCO)).
  • DABCO 1,4-diazabicyclo [2.2.2] octane
  • 2,3,5,6-tetrahydroxy-p-quinone, chloranyl, sulfophthalic acid, ethylenediaminetetraacetic acid (EDTA) or its salt, hydroxyethylethylenediaminetriacetic acid or its salt, dihydroxyethylethylenediaminediacetic acid or its salt, hydroxy (Ethyliminodiacetic acid or a salt thereof, etc.) is preferably mentioned.
  • the hydrophilic compound preferably contains hydroxycarboxylic acid or a salt thereof from the viewpoint of suppressing scratches and stains. Further, the hydrophilic compound, preferably hydroxycarboxylic acid or a salt thereof, is preferably contained in the layer on the aluminum support from the viewpoint of suppressing scratches and stains. Further, the layer on the aluminum support is preferably a layer on the side where the image recording layer is formed, and is preferably a layer in contact with the aluminum support. As the layer on the aluminum support, an undercoat layer or an image recording layer is preferably mentioned as a layer in contact with the aluminum support.
  • a layer other than the layer in contact with the aluminum support for example, a protective layer or an image recording layer may contain a hydrophilic compound, preferably hydroxycarboxylic acid or a salt thereof.
  • the image recording layer contains hydroxycarboxylic acid or a salt thereof from the viewpoint of suppressing scratches and stains.
  • an embodiment in which the surface of the aluminum support on the image recording layer side is surface-treated with a composition containing at least hydroxycarboxylic acid or a salt thereof is also preferably mentioned. Be done.
  • the treated hydroxycarboxylic acid or a salt thereof is detected in a layer on the image recording layer side (for example, an image recording layer or an undercoat layer) in contact with the aluminum support.
  • a layer on the image recording layer side for example, an image recording layer or an undercoat layer
  • the surface of the aluminum support on the image recording layer side can be made hydrophilic, and the aluminum support can also be made hydrophilic.
  • the contact angle with water on the surface of the image recording layer side by the aerial water droplet method can be easily set to 110 ° or less, and the scratch stain suppressing property is excellent.
  • Hydroxycarboxylic acid is a general term for organic compounds having one or more carboxy groups and one or more hydroxy groups in one molecule, and is also called hydroxy acid, oxyic acid, oxycarboxylic acid, or alcoholic acid (). Iwanami Physics and Chemistry Dictionary 5th Edition, published by Iwanami Shoten Co., Ltd. (1998)).
  • the hydroxycarboxylic acid or a salt thereof is preferably represented by the following formula (HC).
  • R HC (OH) mhc ( COMM HC ) nhc formula (HC)
  • R HC represents a mhc + nhc valent organic group
  • M HC independently represents a hydrogen atom, an alkali metal or onium
  • mhc and nhc each independently represent an integer of 1 or more, n. If is 2 or more, the MHC may be the same or different.
  • the organic group for mhc + NHC value represented by R HC includes mhc + NHC valent hydrocarbon group.
  • the hydrocarbon group may have a substituent and / or a linking group.
  • a group having a mhc + nhc valence derived from an aliphatic hydrocarbon for example, an alkylene group, an alcantryyl group, an alkanetetrayl group, an alcampentile group, an alkenylene group, an arcentryyl group, an alkentetrayl group.
  • Mhc + nhc valent groups derived from aromatic hydrocarbons such as groups, alkenylpentyl groups, alkynylene groups, alkyntriyl groups, alkynetetrayl groups, alkynpentyl groups, etc., such as allylene groups, allenetriyl groups, allenes. Examples thereof include a tetrayl group and an arenepentile group. Examples of the substituent other than the hydroxy group and the carboxy group include an alkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group and the like.
  • substituents include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, Octadecyl group, eicosyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, Cyclopentyl group, 2-norbornyl group, methoxymethyl group, methoxyethoxyethyl group, allyloxymethyl group, phenoxymethyl group, acetyloxymethyl
  • the linking group is composed of at least one atom selected from the group consisting of hydrogen atom, carbon atom, oxygen atom, nitrogen atom, sulfur atom and halogen atom, and the number of atoms is preferably 1 to 50. Is. Specific examples thereof include an alkylene group, a substituted alkylene group, an arylene group and a substituted arylene group, and a plurality of these divalent groups are linked by any of an amide bond, an ether bond, a urethane bond, a urea bond and an ester bond. It may have an esterified structure.
  • Examples of the alkali metal represented by MHC include lithium, sodium, potassium and the like, and sodium is particularly preferable.
  • Examples of onium include ammonium, phosphonium, sulfonium and the like, and ammonium is particularly preferable.
  • M HC from the viewpoint of scratch stain inhibitory, preferably an alkali metal or an onium, and more preferably an alkali metal.
  • the total number of mhc and nhc is preferably 3 or more, more preferably 3 to 8, and even more preferably 4 to 6.
  • the hydroxycarboxylic acid or a salt thereof preferably has a molecular weight of 600 or less, more preferably 500 or less, and particularly preferably 300 or less.
  • the molecular weight is preferably 76 or more.
  • Specific examples of the hydroxycarboxylic acid constituting the hydroxycarboxylic acid or the salt of the hydroxycarboxylic acid include gluconic acid, glycolic acid, lactic acid, tartron acid, and hydroxybutyric acid (2-hydroxybutyric acid, 3-hydroxybutyric acid, ⁇ -Hydroxybutyric acid, etc.), malic acid, tartaric acid, citramal acid, citric acid, isocitrate, leucic acid, mevalonic acid, pantoic acid, ricinolic acid, ricineraidic acid, cerebronic acid, quinic acid, shikimic acid, monohydroxybenzoic acid derivative (Salicylic acid, cleosortic acid (homosalicylic acid, hydroxy (methyl) benzoic
  • hydroxycarboxylic acid or the hydroxycarboxylic acid constituting the salt of the hydroxycarboxylic acid a compound having two or more hydroxy groups is preferable from the viewpoint of suppressing scratches and stains, and a hydroxy group is preferable.
  • a compound having 3 or more hydroxy groups is more preferable, a compound having 5 or more hydroxy groups is further preferable, and a compound having 5 to 8 hydroxy groups is particularly preferable.
  • gluconic acid or shikimic acid is preferable as a substance having one carboxy group and two or more hydroxy groups.
  • Citric acid or malic acid is preferable as having two or more carboxy groups and one hydroxy group.
  • Tartaric acid is preferable as having two or more carboxy groups and two or more hydroxy groups.
  • gluconic acid is particularly preferable as the hydroxycarboxylic acid.
  • the hydrophilic compound may be used alone or in combination of two or more.
  • the undercoat layer contains a hydrophilic compound, preferably hydroxycarboxylic acid or a salt thereof
  • the content of the hydrophilic compound, preferably hydroxycarboxylic acid and its salt is 0.01% by mass or more based on the total mass of the undercoat layer. It is preferably 50% by mass, more preferably 0.1% by mass to 40% by mass, and particularly preferably 1.0% by mass to 30% by mass.
  • the undercoat layer may contain a chelating agent, a secondary or tertiary amine, a polymerization inhibitor, or the like in order to prevent stains over time.
  • the undercoat layer is applied by a known method.
  • the coating amount (solid content) of the undercoat layer is preferably 0.1 mg / m 2 to 100 mg / m 2, and more preferably 1 mg / m 2 to 30 mg / m 2 .
  • the planographic printing plate original plate according to the present disclosure may have a protective layer (sometimes referred to as an overcoat layer) on the image recording layer.
  • the protective layer may have a function of suppressing an image formation inhibition reaction by blocking oxygen, a function of preventing the occurrence of scratches on the image recording layer, and a function of preventing ablation during high-intensity laser exposure.
  • Protective layers with such properties are described, for example, in US Pat. Nos. 3,458,311 and JP-A-55-49729.
  • the oxygen low-permeability polymer used for the protective layer either a water-soluble polymer or a water-insoluble polymer can be appropriately selected and used, and if necessary, two or more kinds may be mixed and used. it can.
  • Specific examples thereof include polyvinyl alcohol, modified polyvinyl alcohol, polyvinylpyrrolidone, water-soluble cellulose derivatives, poly (meth) acrylonitrile, and the like.
  • the modified polyvinyl alcohol an acid-modified polyvinyl alcohol having a carboxy group or a sulfo group is preferably used.
  • Specific examples thereof include the modified polyvinyl alcohols described in JP-A-2005-250216 and JP-A-2006-259137.
  • the protective layer preferably contains an inorganic layered compound in order to enhance oxygen blocking property.
  • Inorganic laminar compound is a particle having a thin tabular shape, for example, natural mica, micas such as synthetic mica, wherein: talc represented by 3MgO ⁇ 4SiO ⁇ H 2 O, teniolite, montmorillonite, saponite, hectorite Examples include light, zirconium phosphate and the like.
  • the inorganic layered compound preferably used is a mica compound.
  • Examples of the mica compound include formula: A (B, C) 2-5 D 4 O 10 (OH, F, O) 2 [However, A is any of K, Na, Ca, and B and C are It is any of Fe (II), Fe (III), Mn, Al, Mg, and V, and D is Si or Al. ] Can be mentioned as a group of mica such as natural mica and synthetic mica.
  • natural mica includes muscovite, paragonite, phlogopite, biotite and lepidolite.
  • synthetic mica non-swelling mica such as fluorine gold mica KMg 3 (AlSi 3 O 10 ) F 2 , potassium tetrasilicon mica KMg 2.5 Si 4 O 10 ) F 2 , and Na tetrasilic mica Namg 2.
  • the lattice layer causes a positive charge shortage, and in order to compensate for this, cations such as Li + , Na + , Ca 2+ , and Mg 2+ are adsorbed between the layers.
  • the cations intervening between these layers are called exchangeable cations and can be exchanged with various cations.
  • the bond between the layered crystal lattices is weak because the ionic radius is small, and the cations swell greatly with water.
  • Swellable synthetic mica has this tendency and is particularly preferably used.
  • the aspect ratio is preferably 20 or more, more preferably 100 or more, and particularly preferably 200 or more.
  • the aspect ratio is the ratio of the major axis to the thickness of the particles, which can be measured, for example, from a micrograph projection of the particles. The larger the aspect ratio, the greater the effect obtained.
  • the average major axis of the mica compound is preferably 0.3 ⁇ m to 20 ⁇ m, more preferably 0.5 ⁇ m to 10 ⁇ m, and particularly preferably 1 ⁇ m to 5 ⁇ m.
  • the average thickness of the particles is preferably 0.1 ⁇ m or less, more preferably 0.05 ⁇ m or less, and particularly preferably 0.01 ⁇ m or less.
  • the preferred embodiment is such that the thickness is about 1 nm to 50 nm and the surface size (major axis) is about 1 ⁇ m to 20 ⁇ m.
  • the content of the inorganic layered compound is preferably 1% by mass to 60% by mass, more preferably 3% by mass to 50% by mass, based on the total solid content of the protective layer. Even when a plurality of types of inorganic layered compounds are used in combination, the total amount of the inorganic layered compounds is preferably the above content. Oxygen blocking property is improved in the above range, and good sensitivity can be obtained. In addition, it is possible to prevent deterioration of meat-forming property.
  • the protective layer preferably contains a discoloring compound.
  • the protective layer may contain other components such as a water-soluble polymer, a hydrophobic polymer, a fat-sensing agent, an acid generator, and an infrared absorber.
  • the lithographic printing plate original plate has a brightness change ⁇ L before and after exposure when exposed to infrared rays having an energy density of 110 mJ / cm 2 and a wavelength of 830 nm. It is preferably 0 or more.
  • the brightness change ⁇ L is more preferably 3.0 or more, further preferably 5.0 or more, particularly preferably 8.0 or more, and most preferably 10.0 or more.
  • An upper limit of the brightness change ⁇ L is, for example, 20.0.
  • a protective layer containing a discoloring compound it is preferable to satisfy the above-mentioned preferable numerical range of the above-mentioned brightness change ⁇ L.
  • the brightness change ⁇ L is measured by the following method.
  • the original plate of the lithographic printing plate is printed by Luxel PLATESETTER T-9800 manufactured by FUJIFILM Graphic Systems Co., Ltd. equipped with an infrared semiconductor laser with a wavelength of 830 nm.
  • Output 99.5%, outer drum rotation speed 220 rpm, resolution 2,400 dpi (dots per inch, Exposure is performed under the condition of 1 inch 25.4 mm) (energy density 110 mJ / cm 2 ).
  • the exposure is performed in an environment of 25 ° C. and 50% RH.
  • a spectrophotometer eXact manufactured by X-Rite is used for the measurement.
  • the absolute value of the difference between the L * value of the image recording layer after exposure and the L * value of the image recording layer before exposure is changed by the brightness change ⁇ L.
  • the "discolorable compound” refers to a compound whose absorption in the visible light region (wavelength: 400 nm or more and less than 750 nm) changes due to infrared exposure. That is, in the present disclosure, “discoloration” means that the absorption in the visible light region (wavelength: 400 nm or more and less than 750 nm) changes due to infrared exposure.
  • the discoloring compounds in the present disclosure are (1) a compound in which absorption in the visible light region is increased due to infrared exposure compared to before infrared exposure, and (2) absorption in the visible light region due to infrared exposure.
  • the infrared rays in the present disclosure are light rays having a wavelength of 750 nm to 1 mm, and preferably light rays having a wavelength of 750 nm to 1,400 nm.
  • the discoloring compound preferably contains a compound that develops color due to infrared exposure. Further, the discoloring compound preferably contains a decomposable compound that decomposes due to infrared exposure, and in particular, contains a decomposable compound that decomposes due to heat, electron transfer, or both due to infrared exposure. Is preferable. More specifically, the discoloring compounds in the present disclosure are decomposed by infrared exposure (more preferably, by heat, electron transfer, or both due to infrared exposure) and before infrared exposure. It is preferable that the compound has increased absorption in the visible light region, or the absorption has a shorter wavelength and has absorption in the visible light region.
  • decomposition by electron transfer means that an electron excited from HOMO (highest occupied orbital) to LUMO (lowest empty orbital) of a discoloring compound by infrared exposure is an electron accepting group (LUMO and potential) in the molecule. It means that the electron transfers in the molecule to a group close to), and the decomposition occurs accordingly.
  • the degradable compound may be a compound that absorbs and decomposes at least one part of light in the infrared wavelength range (wavelength range of 750 nm to 1 mm, preferably wavelength range of 750 nm to 1,400 nm), but may be 750 nm to 1, It is preferably a compound having maximum absorption in the wavelength range of 400 nm. More specifically, the degradable compound is preferably a compound that decomposes due to infrared exposure to produce a compound having a maximum absorption wavelength in the wavelength range of 500 nm to 600 nm.
  • the degradable compound may be a cyanine dye having a group (specifically, R 1 in the following formulas 1-1 to 1-7) that is decomposed by infrared exposure from the viewpoint of enhancing the visibility of the exposed portion.
  • R 1 in the following formulas 1-1 to 1-7
  • the degradable compound is more preferably a compound represented by the following formula 1-1 from the viewpoint of enhancing the visibility of the exposed portion.
  • R 1 represents a group represented by any of the following formulas 2 to 4, and R 11 to R 18 independently represent a hydrogen atom, a halogen atom, -R a , -OR b , and so on.
  • -SR c or represents -NR d R e, in each of R a ⁇ R e independently represents a hydrocarbon group, a 1, a 2 and a plurality of R 11 ⁇ R 18 are linked monocyclic or Polycycles may be formed, where A 1 and A 2 independently represent an oxygen atom, a sulfur atom, or a nitrogen atom, and n 11 and n 12 each independently represent an integer of 0 to 5.
  • n 11 and n 12 is 2 or more, n 13 and n 14 independently represent 0 or 1, L represents an oxygen atom, a sulfur atom, or -NR 10- , and R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and Za represents a counterion that neutralizes the charge.
  • R 20 , R 30 , R 41 and R 42 independently represent an alkyl group or an aryl group
  • Zb represents a charge-neutralizing counterion
  • the wavy line represents the above formula 1-.
  • R 1 represents a group represented by any of the above formulas 2 to 4.
  • the group represented by the formula 2 the group represented by the formula 3, and the group represented by the formula 4 will be described.
  • R 20 represents an alkyl group or an aryl group, and the wavy line portion represents a binding site with a group represented by L in formula 1-1.
  • the alkyl group represented by R 20 an alkyl group having 1 to 30 carbon atoms is preferable, an alkyl group having 1 to 15 carbon atoms is more preferable, and an alkyl group having 1 to 10 carbon atoms is further preferable.
  • the alkyl group may be linear, have a branch, or have a ring structure.
  • aryl group represented by R 20 an aryl group having 6 to 30 carbon atoms is preferable, an aryl group having 6 to 20 carbon atoms is more preferable, and an aryl group having 6 to 12 carbon atoms is further preferable.
  • the R 20 is preferably an alkyl group from the viewpoint of color development.
  • degradable and, from the viewpoint of coloring properties, be the alkyl group represented by R 20, is preferably a secondary alkyl group or a tertiary alkyl group, tertiary alkyl group preferable.
  • the degradability, and, from the viewpoint of coloring properties, the alkyl group represented by R 20, preferably an alkyl group having 1 to 8 carbon atoms, branched alkyl groups having 3 to 10 carbon atoms It is more preferable to have a branched alkyl group having 3 to 6 carbon atoms, an isopropyl group or a tert-butyl group is particularly preferable, and a tert-butyl group is most preferable.
  • represents the binding site with the group represented by L in the formula 1-1.
  • R 30 represents an alkyl group or an aryl group, and the wavy line portion represents a binding site with a group represented by L in formula 1-1.
  • the alkyl group and aryl group represented by R 30 are the same as those of the alkyl group and aryl group represented by R 20 in Formula 2, and the preferred embodiment is also the same.
  • the alkyl group represented by R 30 is preferably a secondary alkyl group or a tertiary alkyl group, and preferably a tertiary alkyl group.
  • the alkyl group represented by R 30, preferably an alkyl group having 1 to 8 carbon atoms, branched alkyl groups having 3 to 10 carbon atoms It is more preferable to have a branched alkyl group having 3 to 6 carbon atoms, an isopropyl group or a tert-butyl group is particularly preferable, and a tert-butyl group is most preferable.
  • the alkyl group represented by R 30 is preferably a substituted alkyl group, more preferably a fluorosubstituted alkyl group, and a perfluoroalkyl group. Is more preferable, and a trifluoromethyl group is particularly preferable.
  • the aryl group represented by R 30 is preferably a substituted aryl group, and the substituent is an alkyl group (preferably an alkyl group having 1 to 4 carbon atoms) or an alkoxy. Examples thereof include a group (preferably an alkoxy group having 1 to 4 carbon atoms).
  • represents the binding site with the group represented by L in the formula 1-1.
  • R 41 and R 42 independently represent an alkyl group or an aryl group
  • Zb represents a charge-neutralizing counterion
  • the wavy line portion is a group represented by L in Formula 1-1. Represents the binding site with.
  • the alkyl group and aryl group represented by R 41 or R 42 are the same as those of the alkyl group and aryl group represented by R 20 in Formula 2, and the preferred embodiment is also the same.
  • the R 41 is preferably an alkyl group from the viewpoint of decomposability and color development.
  • R 42 is preferably an alkyl group from the viewpoint of decomposability and color development.
  • the alkyl group represented by R 41 is preferably an alkyl group having 1 to 8 carbon atoms, and more preferably an alkyl group having 1 to 4 carbon atoms. , Methyl group is particularly preferred.
  • the alkyl group represented by R 42 is preferably a secondary alkyl group or a tertiary alkyl group, and preferably a tertiary alkyl group.
  • the alkyl group represented by R 42 is preferably an alkyl group having 1 to 8 carbon atoms, and is a branched alkyl group having 3 to 10 carbon atoms.
  • a branched alkyl group having 3 to 6 carbon atoms an isopropyl group or a tert-butyl group is particularly preferable, and a tert-butyl group is most preferable.
  • Zb in the formula 4 may be a counterion for neutralizing the charge, and the compound as a whole may be contained in Za in the formula 1-1.
  • Zb is preferably a sulfonate ion, a carboxylate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, a p-toluenesulfonate ion, or a perchlorate ion, and more preferably a tetrafluoroborate ion.
  • represents the binding site with the group represented by L in the formula 1-1.
  • L is preferably an oxygen atom or ⁇ NR 10 ⁇ , and an oxygen atom is particularly preferable.
  • R 10 in ⁇ NR 10 ⁇ is preferably an alkyl group.
  • the alkyl group represented by R 10 an alkyl group having 1 to 10 carbon atoms is preferable.
  • the alkyl group represented by R 10 may be linear, have a branch, or have a ring structure.
  • a methyl group or a cyclohexyl group is preferable.
  • R 10 in ⁇ NR 10 ⁇ is an aryl group
  • an aryl group having 6 to 30 carbon atoms is preferable, an aryl group having 6 to 20 carbon atoms is more preferable, and an aryl group having 6 to 12 carbon atoms is further preferable.
  • these aryl groups may have a substituent.
  • R 11 ⁇ R 18 are each independently a hydrogen atom, -R a, is preferably -OR b, -SR c, or -NR d R e.
  • Hydrocarbon groups represented by R a ⁇ R e is preferably a hydrocarbon group having 1 to 30 carbon atoms, more preferably a hydrocarbon group having 1 to 15 carbon atoms, further a hydrocarbon group having 1 to 10 carbon atoms preferable.
  • the hydrocarbon group may be linear, have a branch, or have a ring structure.
  • an alkyl group is particularly preferable.
  • an alkyl group having 1 to 30 carbon atoms is preferable, an alkyl group having 1 to 15 carbon atoms is more preferable, and an alkyl group having 1 to 10 carbon atoms is further preferable.
  • the alkyl group may be linear, have a branch, or have a ring structure. Specifically, for example, methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group.
  • the alkyl group may have a substituent.
  • substituents include an alkoxy group, an aryloxy group, an amino group, an alkylthio group, an arylthio group, a halogen atom, a carboxy group, a carboxylate group, a sulfo group, a sulfonate group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and these. Examples include a group in which the above are combined.
  • R 11 to R 14 in the formula 1-1 are each independently preferably a hydrogen atom or —R a (that is, a hydrocarbon group), more preferably a hydrogen atom or an alkyl group, and the following Except for the case of, it is more preferably a hydrogen atom.
  • R 11 and R 13 bonded to the carbon atom to which L is bonded are preferably an alkyl group, and it is more preferable that both are linked to form a ring.
  • the ring formed may be a monocyclic ring or a polycyclic ring.
  • the ring formed include a monocycle such as a cyclopentene ring, a cyclopentadiene ring, a cyclohexene ring and a cyclohexadiene ring, and a polycycle such as an indene ring and an indole ring.
  • R 12 bonded to the carbon atom to which A 1 + is bonded preferably is linked to R 15 or R 16 (preferably R 16 ) to form a ring, and R is bonded to the carbon atom to which A 2 is bonded.
  • 14 is preferably linked to R 17 or R 18 (preferably R 18 ) to form a ring.
  • n 13 is preferably 1 and R 16 is preferably —R a (ie, a hydrocarbon group). Further, it is preferable that R 16 is linked to R 12 bonded to the carbon atom to which A 1 + is bonded to form a ring.
  • R 16 is linked to R 12 bonded to the carbon atom to which A 1 + is bonded to form a ring.
  • an indolium ring, a pyrylium ring, a thiopyrylium ring, a benzoxazoline ring, or a benzoimidazoline ring is preferable, and an indolium ring is more preferable from the viewpoint of enhancing the visibility of the exposed portion. These rings may further have a substituent.
  • n 14 is preferably 1 and R 18 is preferably —R a (ie, a hydrocarbon group). Further, it is preferable that R 18 is linked to R 14 bonded to the carbon atom to which A 2 is bonded to form a ring.
  • R 18 is linked to R 14 bonded to the carbon atom to which A 2 is bonded to form a ring.
  • an indole ring, a pyran ring, a thiopyran ring, a benzoxazole ring, or a benzimidazole ring is preferable, and an indole ring is more preferable from the viewpoint of enhancing the visibility of the exposed portion. These rings may further have a substituent.
  • R 16 and R 18 in the formula 1-1 are preferably the same group, and when they form a ring, it is preferable to form a ring having the same structure except for A 1 + and A 2 .
  • R 15 and R 17 in the formula 1-1 are the same group. Further, R 15 and R 17 are preferably —R a (that is, a hydrocarbon group), more preferably an alkyl group, and further preferably a substituted alkyl group.
  • R 15 and R 17 are preferably substituent alkyl groups from the viewpoint of improving water solubility.
  • Examples of the substituted alkyl group represented by R 15 or R 17 include a group represented by any of the following formulas (a1) to (a4).
  • R W0 represents an alkylene group having 2 to 6 carbon atoms
  • W is a single bond or an oxygen atom
  • n W1 represents an integer of 1 ⁇ 45
  • R W5 represents an alkyl group having 1 to 12 carbon atoms
  • R W2 ⁇ R W4 are each independently a single bond or 1 carbon atoms It represents an alkylene group of ⁇ 12
  • M represents a hydrogen atom, a sodium atom, a potassium atom, or an onium group.
  • alkylene group represented by RW0 in the formula (a1) examples include an ethylene group, an n-propylene group, an isopropylene group, an n-butylene group, an isobutylene group, an n-pentylene group, an isopentylene group, and n-.
  • examples thereof include a hexyl group and an isohexyl group, and an ethylene group, an n-propylene group, an isopropylene group, or an n-butylene group is preferable, and an n-propylene group is particularly preferable.
  • n W1 is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 to 3.
  • alkyl group represented by RW1 examples include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, n-pentyl group, isopentyl group and neopentyl.
  • a group, an n-hexyl group, an n-octyl group, an n-dodecyl group and the like can be mentioned, and a methyl group, an ethyl group, an n-propyl group, an isopropyl group, or an n-butyl group and a tert-butyl group are preferable.
  • Alkyl group represented by R W5 is the same as defined for the alkyl group represented by R W1, preferred embodiments are also the same as the preferred embodiment of the alkyl group represented by R W1.
  • Me represents a methyl group
  • Et represents an ethyl group
  • * represents a binding site
  • alkylene groups represented by RW2 to RW4 in the formulas (a2) to (a4) include a methylene group, an ethylene group, an n-propylene group, an isopropylene group, an n-butylene group, and an isobutylene group.
  • an ethylene group or an n-propylene group is particularly preferable.
  • the two existing Ms may be the same or different.
  • examples of the onium group represented by M include an ammonium group, an iodonium group, a phosphonium group, a sulfonium group and the like.
  • the CO 2 M in the formula (a2), the PO 3 M 2 in the formula (a 2), and the SO 3 M in the formula (a 4) may all have an anion structure in which M is dissociated.
  • Counter cation of the anion structure may be a A 1 +, may be a cation may be included in R 1 -L in Formula 1-1.
  • the group represented by the formula (a1), the formula (a2), or the formula (a4) is preferable.
  • n 11 and n 12 in the formula 1-1 are the same, and an integer of 1 to 5 is preferable, an integer of 1 to 3 is more preferable, 1 or 2 is further preferable, and 2 is particularly preferable.
  • a 1 and A 2 in the formula 1-1 independently represent an oxygen atom, a sulfur atom, or a nitrogen atom, and a nitrogen atom is preferable. It is preferable that A 1 and A 2 in the formula 1-1 are the same atom.
  • Za in Equation 1-1 represents a counterion that neutralizes the charge. If all of R 11 to R 18 and R 1- L are charge-neutral groups, Za is a monovalent counter anion. However, R 11 to R 18 and R 1 to L may have an anion structure or a cation structure. For example, when R 11 to R 18 and R 1 to L have two or more anion structures, Za Can also be a countercation. If the cyanine dye represented by the formula 1-1 has a charge-neutral structure as a whole except for Za, Za is not necessary.
  • Za is a counter anion
  • sulfonate ion carboxylate ion, tetrafluoroborate ion, hexafluorophosphate ion, p-toluenesulfonate ion, perchlorate ion and the like
  • tetrafluoroborate ion is preferable.
  • alkali metal ion, alkaline earth metal ion, ammonium ion, pyridinium ion, sulfonium ion and the like can be mentioned, and sodium ion, potassium ion, ammonium ion, pyridinium ion or sulfonium ion is preferable, and sodium is preferable. Ions, potassium ions, or ammonium ions are more preferred.
  • the degradable compound is more preferably a compound represented by the following formula 1-2 (that is, a cyanine pigment) from the viewpoint of enhancing the visibility of the exposed portion.
  • R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independently hydrogen atom, halogen atom, -R a , -OR b , and so on.
  • -CN represents -SR c, or -NR d R e
  • R 23 and R 24 each independently represent a hydrogen atom, or represents a -R a, each is R a ⁇ R e independently, a hydrocarbon group
  • R 19 and R 20 , R 21 and R 22 , or R 23 and R 24 may be connected to form a monocyclic or polycyclic, and L may be an oxygen atom, a sulfur atom, or a sulfur atom.
  • R 10 represents a hydrogen atom, an alkyl group, or an aryl group
  • R d1 to R d4 , W 1 and W 2 each independently may have a substituent.
  • Za represents a counterion that neutralizes the charge.
  • R 1 in Equation 1-2 is synonymous with R 1 in Equation 1-1, and so is the preferred embodiment.
  • R 19 to R 22 are preferably hydrogen atoms, halogen atoms, -R a , -OR b , or -CN, respectively, independently of each other. More specifically, R 19 and R 21 are preferably hydrogen atom, or a -R a. Further, R 20 and R 22 are preferably hydrogen atoms, -R a , -OR b , or -CN. As —R a represented by R 19 to R 22 , an alkyl group or an alkenyl group is preferable. When all of R 19 to R 22 are ⁇ R a, it is preferable that R 19 and R 20 and R 21 and R 22 are connected to form a monocyclic or polycyclic ring. Examples of the ring formed by connecting R 19 and R 20 or R 21 and R 22 include a benzene ring and a naphthalene ring.
  • R 23 and R 24 are connected to form a monocyclic or polycyclic ring.
  • the ring formed by connecting R 23 and R 24 may be a monocyclic ring or a polycyclic ring.
  • Specific examples of the ring formed include a monocycle such as a cyclopentene ring, a cyclopentadiene ring, a cyclohexene ring and a cyclohexadiene ring, and a polycycle such as an inden ring.
  • R d1 to R d4 are preferably unsubstituted alkyl groups. Further, it is preferable that R d1 to R d4 are all the same group. Examples of the unsubstituted alkyl group include an unsubstituted alkyl group having 1 to 4 carbon atoms, and among them, a methyl group is preferable.
  • W 1 and W 2 are preferably substituted alkyl groups independently from the viewpoint of increasing water solubility in the compound represented by formula 1-2.
  • Examples of the substituted alkyl group represented by W 1 and W 2 include groups represented by any of the formulas (a1) to (a4) in the formula 1-1, and the preferred embodiment is also the same.
  • W 1 and W 2 are independently alkyl groups having a substituent from the viewpoint of on-machine developability, and the above-mentioned substituents include- (OCH 2 CH 2 )-, a sulfo group and a sulfo group.
  • a carboxy group, or a group having at least a salt of a carboxy group is preferable.
  • Za represents a counterion that neutralizes the charge in the molecule. If all of R 19 to R 22 , R 23 to R 24 , R d1 to R d4 , W 1 , W 2 , and R 1 to L are charge-neutral groups, then Za is a monovalent pair. It becomes an anion. However, R 19 to R 22 , R 23 to R 24 , R d1 to R d4 , W 1 , W 2 , and R 1 to L may have an anionic structure or a cation structure, for example, R.
  • Za can also be a counter cation if 19 -R 22 , R 23 -R 24 , R d1 -R d4 , W 1 , W 2 , and R 1- L have more than one anionic structure. If the compound represented by the formula 1-2 has a charge-neutral structure as a whole except for Za, Za is not necessary.
  • the example when Za is a counter anion is the same as that of Za in the formula 1-1, and the preferred embodiment is also the same. Further, the case where Za is a counter cation is the same as that of Za in the formula 1-1, and the preferred embodiment is also the same.
  • the cyanine dye as a degradable compound is more preferably a compound represented by any of the following formulas 1-3 to 1-7 from the viewpoint of degradability and color development.
  • the compound represented by any of the formulas 1-3, 1-5, and 1-6 is preferable.
  • R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independently hydrogen atom, halogen atom, and ⁇ R a. , -OR b, -CN, -SR c, or represents -NR d R e, each R 25 and R 26 independently represent a hydrogen atom, a halogen atom, or represents a -R a, R a ⁇ R e each independently represents a hydrocarbon group, and R 19 and R 20 , R 21 and R 22 , or R 25 and R 26 may be linked to form a monocyclic or polycyclic, and L is , Oxygen atom, sulfur atom, or -NR 10- , R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and R d1 to R d4 , W 1 and W 2 are independent of each other.
  • Za represents a counteri
  • R 1, R 19 ⁇ R 22 in Formula 1-3 to Formula 1-7, R d1 ⁇ R d4, W 1, W 2, and L is, R 1 in Formula 1-2, R 19 ⁇ R 22, R d1 ⁇ R d4, W 1, W 2, and has the same meaning as L, and also the same preferred embodiment.
  • R 25 and R 26 in Formula 1-7 are each independently preferably a hydrogen atom or an alkyl group, more preferably an alkyl group, and particularly preferably a methyl group.
  • the infrared absorbing compound described in International Publication No. 2019/219560 can be preferably used.
  • the said discoloring compound may contain an acid color former.
  • the acid color former those described as the acid color developer in the image recording layer can be used, and the preferred embodiment is also the same.
  • the discoloring compound may be used alone or in combination of two or more kinds of components.
  • the discoloring compound the above-mentioned decomposable compound and the acid generator described later may be used in combination.
  • the content of the discoloring compound in the protective layer is preferably 0.10% by mass to 50% by mass, more preferably 0.50% by mass to 30% by mass, based on the total mass of the protective layer. , 1.0% by mass to 20% by mass is more preferable.
  • the ratio M X / M Y between the content M Y of the infrared absorber content M X and the image recording layer of the discoloring compound of the protective layer is, in terms of color development property, is 0.1 or more It is preferable, 0.2 or more is more preferable, and 0.3 or more and 3.0 or less is particularly preferable.
  • the protective layer preferably contains a water-soluble polymer from the viewpoint of developability (more preferably, on-machine developability).
  • the water-soluble polymer is a solution in which 1 g or more is dissolved in 100 g of pure water at 70 ° C. and 1 g of the polymer is dissolved in 100 g of pure water at 70 ° C., and the solution is cooled to 25 ° C. A polymer that does not precipitate even if.
  • the water-soluble polymer used for the protective layer include polyvinyl alcohol, modified polyvinyl alcohol, polyvinylpyrrolidone, water-soluble cellulose derivative, polyethylene glycol, poly (meth) acrylonitrile and the like.
  • modified polyvinyl alcohol an acid-modified polyvinyl alcohol having a carboxy group or a sulfo group is preferably used. Specific examples thereof include the modified polyvinyl alcohols described in JP-A-2005-250216 and JP-A-2006-259137.
  • polyvinyl alcohol is preferable. Above all, as the water-soluble polymer, it is more preferable to use polyvinyl alcohol having a saponification degree of 50% or more.
  • the saponification degree is preferably 60% or more, more preferably 70% or more, still more preferably 85% or more.
  • the upper limit of the saponification degree is not particularly limited, and may be 100% or less.
  • the degree of saponification is measured according to the method described in JIS K 6726: 1994.
  • polyvinylpyrrolidone is also preferable.
  • hydrophilic polymer it is also preferable to use polyvinyl alcohol and polyvinylpyrrolidone in combination.
  • the water-soluble polymer may be used alone or in combination of two or more.
  • the content of the water-soluble polymer is preferably 1% by mass to 99% by mass and 3% by mass to 97% by mass with respect to the total mass of the protective layer. Is more preferable, and 5% by mass to 95% by mass is further preferable.
  • the protective layer may contain other components such as a hydrophobic polymer, a fat-sensing agent, an acid generator, and an infrared absorber.
  • a hydrophobic polymer such as a polyethylene glycol dimethacrylate copolymer, polyethylene glycol dimethacrylate copolymer, polyethylene glycol dimethacrylate copolymer, polyethylene glycol dimethacrylate copolymer, polyethylene glycol dimethacrylate, poly(ethylene glycol) terpolymer, ethylene glycol dimethacrylate, ethylene glycol dimethacrylate, ethylene glycol dimethacrylate, ethylene glycol dimethacrylate, ethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, polypropylene glycol dimethacrylate, polypropylene glycol dimethacrylate, polypropylene glycol dimethacrylate, polypropylene glycol dimethacrylate, polypropylene glycol dimethacrylate,
  • the protective layer preferably contains a hydrophobic polymer.
  • the hydrophobic polymer means a polymer that dissolves or does not dissolve in less than 1 g in 100 g of pure water at 70 ° C.
  • examples of the hydrophobic polymer include polyethylene, polystyrene, polyvinyl chloride, polyvinylidene chloride, poly (meth) acrylate alkyl ester (for example, methyl poly (meth) acrylate, ethyl poly (meth) acrylate, and poly (meth). ) Butyl acrylate, etc.), copolymers in which raw material monomers of these polymers are combined, and the like.
  • the hydrophobic polymer preferably contains a polyvinylidene chloride resin. Further, the hydrophobic polymer preferably contains a styrene-acrylic copolymer. Furthermore, the hydrophobic polymer is preferably hydrophobic polymer particles from the viewpoint of on-machine developability.
  • the hydrophobic polymer may be used alone or in combination of two or more.
  • the content of the hydrophobic polymer is preferably 1% by mass to 80% by mass and 5% by mass to 50% by mass with respect to the total mass of the protective layer. Is more preferable.
  • the occupied area ratio of the hydrophobic polymer on the surface of the protective layer is preferably 30 area% or more, more preferably 40 area% or more, and further preferably 50 area% or more.
  • the upper limit of the occupied area ratio on the surface of the protective layer of the hydrophobic polymer is, for example, 90 area%.
  • the occupied area ratio of the hydrophobic polymer on the surface of the protective layer can be measured as follows.
  • the surface of the protective layer is irradiated with a Bi ion beam (primary ion) at an acceleration voltage of 30 kV and emitted from the surface.
  • a Bi ion beam primary ion
  • the hydrophobic part is mapped, and the area of the hydrophobic part occupying 1 ⁇ m 2 is measured, and the hydrophobic part is measured.
  • the occupied area ratio of the above is obtained, and this is referred to as the "occupied area ratio on the surface of the protective layer of the hydrophobic polymer".
  • the hydrophobic polymer is an acrylic resin
  • the measurement is carried out by the peak of C 6 H 13 O ⁇ .
  • the hydrophobic polymer is polyvinylidene chloride
  • the measurement is performed by the peak of C 2 H 2 Cl + .
  • the occupied area ratio can be adjusted by the amount of the hydrophobic polymer added or the like.
  • the protective layer preferably contains a fat-sensing agent from the viewpoint of ink penetration.
  • a fat-sensing agent from the viewpoint of ink penetration.
  • the oil-sensitive agent used in the protective layer the oil-sensitive agent described in the image recording layer can be used, and the preferred embodiment is also the same.
  • the oil sensitizer may be used alone or in combination of two or more.
  • the content of the fat-sensitive agent is preferably 0.5% by mass to 30% by mass, and 1% by mass to 20% by mass, based on the total mass of the protective layer. More preferably.
  • the protective layer preferably contains an acid generator.
  • the "acid generator” in the present disclosure is a compound that generates an acid by light or heat, and specifically, a compound that is decomposed by infrared exposure to generate an acid.
  • the acid to be generated is preferably a strong acid having a pKa of 2 or less, such as sulfonic acid and hydrochloric acid.
  • the acid generated from the acid generator can discolor the above-mentioned acid color former.
  • the onium salt compound is preferable as the acid generator from the viewpoint of sensitivity and stability.
  • the onium salt suitable as the acid generator include the compounds described in paragraphs 0121 to 0124 of International Publication No. 2016/047392. Among them, triarylsulfonium, or diaryliodonium, sulfonates, carboxylates, BPh 4 -, BF 4 - , PF 6 -, ClO 4 - and the like are preferable.
  • Ph represents a phenyl group.
  • the acid generator may be used alone or in combination of two or more.
  • the content of the acid generator is preferably 0.5% by mass to 30% by mass, and 1% by mass to 20% by mass, based on the total mass of the protective layer. More preferably.
  • the protective layer may contain known additives such as an inorganic layered compound and a surfactant in addition to the above-mentioned components.
  • the protective layer is formed by applying it by a known method and drying it.
  • the coating amount of the protective layer (solid content) is preferably from 0.01g / m 2 ⁇ 10g / m 2, more preferably 0.02g / m 2 ⁇ 3g / m 2, 0.1g / m 2 ⁇ 2.0g / M 2 is particularly preferred.
  • the film thickness of the protective layer is preferably 0.1 ⁇ m to 5.0 ⁇ m, and more preferably 0.3 ⁇ m to 4.0 ⁇ m.
  • the film thickness of the protective layer is preferably 0.1 to 5.0 times, more preferably 0.2 to 3.0 times, the film thickness of the image recording layer described later.
  • the protective layer may contain known additives such as a plasticizer for imparting flexibility, a surfactant for improving coatability, and inorganic particles for controlling the slipperiness of the surface.
  • a lithographic printing plate can be produced by subjecting the original plate of the lithographic printing plate according to the present disclosure to an image and developing the plate.
  • the method for producing a lithographic printing plate according to the present disclosure comprises a step of exposing the lithographic printing plate original plate according to the present disclosure to an image (hereinafter, also referred to as an “exposure step”), and a group consisting of printing ink and dampening water. It is preferable to include a step of supplying at least one of the selected ones and removing the image recording layer of the non-image portion on the printing machine (hereinafter, also referred to as “on-machine development step”).
  • the lithographic printing method according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image (exposure step) and printing by supplying at least one selected from the group consisting of printing ink and dampening water. It is preferable to include a step of removing the image recording layer of the non-image portion on the machine to produce a lithographic printing plate (on-machine development step) and a step of printing with the obtained lithographic printing plate (printing step).
  • exposure step a step of removing the image recording layer of the non-image portion on the machine to produce a lithographic printing plate (on-machine development step) and a step of printing with the obtained lithographic printing plate (printing step).
  • the lithographic printing plate original plate according to the present disclosure can also be developed with a developing solution.
  • the exposure step and the on-machine development step in the lithographic printing plate manufacturing method will be described, but the exposure step in the lithographic printing plate manufacturing method according to the present disclosure and the exposure step in the lithographic printing method according to the present disclosure are the same. It is a step, and the on-machine development step in the lithographic printing plate manufacturing method according to the present disclosure and the on-machine development step in the lithographic printing method according to the present disclosure are the same steps. Further, it is estimated that a part of the outermost layer is removed at the time of on-machine development, and a part remains on the surface of the image part or permeates into the inside of the image part by printing ink.
  • the method for producing a lithographic printing plate according to the present disclosure preferably includes an exposure step of exposing the lithographic printing plate original plate according to the present disclosure to an image to form an exposed portion and an unexposed portion.
  • the planographic printing plate original plate according to the present disclosure is preferably exposed by laser exposure through a transparent original image having a line image, a halftone dot image, or the like, or by laser light scanning with digital data or the like.
  • the wavelength of the light source is preferably 750 nm to 1,400 nm.
  • a solid-state laser and a semiconductor laser that emit infrared rays are suitable.
  • the output is preferably 100 mW or more, the exposure time per pixel is preferably within 20 microseconds, and the irradiation energy amount is 10 mJ / cm 2 to 300 mJ / cm 2. preferable. Further, it is preferable to use a multi-beam laser device in order to shorten the exposure time.
  • the exposure mechanism may be any of an inner drum method, an outer drum method, a flatbed method and the like. Image exposure can be performed by a conventional method using a platesetter or the like. In the case of on-machine development, the lithographic printing plate original plate may be mounted on the printing machine and then the image may be exposed on the printing machine.
  • the method for producing a lithographic printing plate according to the present disclosure involves an on-machine development step of supplying at least one selected from the group consisting of printing ink and dampening water to remove an image recording layer in a non-image area on a printing machine. It is preferable to include it.
  • the on-machine development method will be described below.
  • the image-exposed lithographic printing plate original plate supplies oil-based ink and water-based components on the printing machine, and the image recording layer in the non-image area is removed to produce a lithographic printing plate.
  • the flat plate printing plate original plate is mounted on the printing machine as it is without any development processing after the image exposure, or the flat plate printing plate original plate is mounted on the printing machine and then the image is exposed on the printing machine, and then When printing is performed by supplying an oil-based ink and a water-based component, in the non-image area, an uncured image recording layer is formed by either or both of the supplied oil-based ink and the water-based component in the initial stage of printing.
  • the image recording layer cured by exposure forms an oil-based ink receiving portion having a lipophilic surface.
  • the first supply to the printing plate may be an oil-based ink or a water-based component, but the oil-based ink is first supplied in terms of preventing contamination by the components of the image recording layer from which the water-based components have been removed. Is preferable.
  • the lithographic printing plate original plate is developed on the printing machine and used as it is for printing a large number of sheets.
  • the oil-based ink and the water-based component ordinary printing ink for lithographic printing and dampening water are preferably used.
  • the wavelength of the light source is preferably 300 nm to 450 nm or 750 nm to 1,400 nm as the laser for image-exposing the lithographic printing plate original plate according to the present disclosure.
  • a light source having a wavelength of 300 nm to 450 nm a lithographic printing plate original plate containing a sensitizing dye having an absorption maximum in this wavelength region in the image recording layer is preferably used, and the light source having a wavelength of 750 nm to 1,400 nm is as described above. It is preferably used.
  • a semiconductor laser is suitable as a light source having a wavelength of 300 nm to 450 nm.
  • the method for producing a lithographic printing plate according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image, and a step of removing the image recording layer of the non-image portion with a developing solution to prepare a lithographic printing plate ( It may also be a method including "developer development step"). Further, the lithographic printing method according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image, and a step of removing the image recording layer of the non-image portion with a developing solution to prepare a lithographic printing plate. A method may include a step of printing with the obtained lithographic printing plate.
  • the developing solution a known developing solution can be used.
  • the pH of the developing solution is not particularly limited and may be a strong alkaline developing solution, but a developing solution having a pH of 2 to 11 is preferable.
  • a developing solution having a pH of 2 to 11 for example, a developing solution containing at least one of a surfactant and a water-soluble polymer compound is preferable.
  • a strong alkaline developer a method in which the protective layer is removed by a pre-washing step, then alkaline development is performed, the alkali is washed and removed in a post-washing step, a gum solution treatment is performed, and the drying step is performed. Can be mentioned.
  • the developer-gum solution treatment can be performed at the same time. Therefore, the post-washing step is not particularly required, and the drying step can be performed after the development and the gum liquid treatment are performed with one liquid. Further, since the protective layer can be removed at the same time as the development and the gum solution treatment, the pre-washing step is not particularly required. After the development treatment, it is preferable to remove excess developer using a squeeze roller or the like and then dry.
  • the lithographic printing method includes a printing step of supplying printing ink to a lithographic printing plate to print a recording medium.
  • the printing ink is not particularly limited, and various known inks can be used as desired. Further, as the printing ink, oil-based ink or ultraviolet curable ink (UV ink) is preferably mentioned. Further, in the printing process, dampening water may be supplied as needed. Further, the printing step may be continuously performed in the on-machine development step or the developer development step without stopping the printing machine.
  • the recording medium is not particularly limited, and a known recording medium can be used as desired.
  • lithographic printing is performed before, during, and between exposure and development as necessary.
  • the entire surface of the plate original may be heated.
  • Heating before development is preferably performed under mild conditions of 150 ° C. or lower.
  • very strong conditions for heating after development preferably in the range of 100 ° C. to 500 ° C. Within the above range, a sufficient image enhancement effect can be obtained, and problems such as deterioration of the support and thermal decomposition of the image portion can be suppressed.
  • the molecular weight is the weight average molecular weight (Mw), and the ratio of the constituent repeating units is a molar percentage, except for those specified specifically.
  • Mw weight average molecular weight
  • the weight average molecular weight (Mw) is a value measured as a polystyrene-equivalent value by a gel permeation chromatography (GPC) method.
  • GPC gel permeation chromatography
  • the average particle size means a volume average particle size unless otherwise specified.
  • Polymer particles R-2 were synthesized according to Examples (Preparation 1) of JP2013-503365A.
  • the polymer particles R-2 are particles having the structure shown below.
  • the total amount of electricity stored in the anodic reaction of the aluminum plate was 450 C / dm 2 , and the electrolysis treatment was carried out in 4 steps with an energization interval of 125 C / dm 2 for 4 seconds.
  • a carbon electrode was used as the counter electrode of the aluminum plate. Then, it was washed with water.
  • Alkaline etching treatment The aluminum plate after the electrochemical roughening treatment is etched by spraying an aqueous solution of caustic soda having a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass with a spray tube at a temperature of 45 ° C. Processing was performed. The dissolved amount of aluminum on the surface subjected to the electrochemical roughening treatment was 0.2 g / m 2 . Then, it was washed with water.
  • the anodized aluminum plate is immersed in a caustic soda aqueous solution having a temperature of 35 ° C., a caustic soda concentration of 5% by mass, and an aluminum ion concentration of 0.5% by mass under the conditions shown in Table 1 for pore wide treatment. Was done. Then, it was washed with water by spraying.
  • Second-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. Anodizing was performed under the conditions shown in Table 1 to form an anodized film having a predetermined film thickness. From the above surface treatment A, the support S1 of the example was obtained.
  • Depth (nm) of large and small holes, pit density (micropore density, unit; piece / ⁇ m 2 ), and thickness of anodic oxide film from the bottom of the small holes to the surface of the aluminum plate. (Nm) are summarized in Table 2.
  • the diameters of the micropores (large-diameter hole portion and small-diameter hole portion) existing in the range of 400 nm ⁇ 600 nm were measured and averaged in the four images obtained.
  • the upper part of the anodic oxide film is cut, and then Various diameters were calculated.
  • depth of the micropores depth of the large-diameter hole and the small-diameter hole
  • FE-SEM observation of the depth of the large-diameter hole: 150,000 times, small diameter
  • the depths of 25 arbitrary micropores were measured and averaged.
  • the amount of film (AD) in the first anodizing treatment column and the amount of film (AD) in the second anodizing treatment column represent the amount of film obtained in each treatment.
  • the electrolytic solution used is an aqueous solution containing the components in Table 1.
  • the total amount of electricity stored in the anodic reaction of the aluminum plate was 450 C / dm 2 , and the electrolysis treatment was carried out in 4 steps with an energization interval of 125 C / dm 2 for 4 seconds.
  • a carbon electrode was used as the counter electrode of the aluminum plate. Then, it was washed with water.
  • (Bd) Alkaline etching treatment The aluminum plate after the electrochemical roughening treatment is etched by spraying an aqueous solution of caustic soda having a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass with a spray tube at a temperature of 45 ° C. Processing was performed. The dissolved amount of aluminum on the surface subjected to the electrochemical roughening treatment was 0.2 g / m 2 . Then, it was washed with water.
  • the first stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. Anodizing was performed under the conditions shown in Table 1 to form an anodized film having a predetermined film thickness.
  • the obtained support S1 was used as the support A, and the support S2 was used as the support B.
  • the support A had micropores having a large-diameter hole and a small-diameter hole, and the average diameter of the micropores was 15 nm, and the L * value was 80.
  • the support B had micropores having only large-diameter holes, the average diameter of the micropores was 60 nm, and the L * value was 85.
  • undercoat layer coating solution having the following composition was prepared.
  • the preparation method of the inorganic layered compound dispersion liquid (1) used in the protective layer coating liquid is shown below.
  • An image recording layer coating liquid was prepared according to the following photosensitive liquid (1) and the description in Tables 3 to 5.
  • the amount of each material added shown in Tables 3 to 5 is the amount of solid content.
  • the photosensitive liquid in which the components shown in Tables 3 to 5 other than the polymer particles are mixed and the polymer particle dispersion liquid are shown in Tables 3 to 5.
  • the composition was adjusted by mixing and stirring immediately before coating.
  • Electron-donated polymerization initiators shown in Tables 3 to 5 Amounts shown in Tables 3 to 5 ⁇ Polymerizable compounds shown in Tables 3 to 5: Amounts shown in Tables 3 to 5 ⁇ Tables 3 to 3 Polymer particles shown in Table 5: Amounts shown in Tables 3 to 5 ⁇ Binder polymers shown in Tables 3 to 5: Amounts shown in Tables 3 to 5 ⁇ Leuco dyes shown in Tables 3 to 5 ( Acid color-developing agent): Amount shown in Tables 3 to 5 ⁇ Surfactant shown in Tables 3 to 5: Amount shown in Tables 3 to 5 ⁇ 2-Butanone: 1.091 parts by mass ⁇ 1-methoxy -2-Propanol: 8.609 parts by mass ⁇ Distilled water: 2.425 parts by mass
  • a protective layer coating solution having the above composition was bar-coated on the image recording layer and dried in an oven at 120 ° C. for 60 seconds to form a protective layer having a dry coating amount of 0.15 g / m 2 .
  • "Yes" was described in the column of the protective layer in Tables 3 to 5.
  • lithographic printing plate original plate The lithographic printing plate original plate produced as described above is mounted on a Magnus 800 Quantum manufactured by Kodak equipped with an infrared semiconductor laser, and has an output of 27 W, an outer drum rotation speed of 450 rpm, and a resolution of 2,400 dpi (dot per inch, 1 inch is 2.54 cm). Exposure was performed under the conditions of (corresponding to irradiation energy of 110 mJ / cm 2 ). The exposed image includes a solid image and a chart of 3% halftone dots on the AM screen (Amplitude Modulation Screen).
  • UV curable ink print resistance UV print resistance
  • the number of printed copies is taken as the number of printed copies when the value measured by the Gretag densitometer (manufactured by Gretag Macbeth) for the halftone dot area ratio of the AM screen 3% halftone dot in the printed matter is 1% lower than the measured value of the 500th printed sheet.
  • the print resistance was evaluated. The evaluation was made based on the relative printing resistance of 100 when the number of printed sheets was 50,000. The larger the value, the better the printing durability. The evaluation results are shown in Tables 3 to 5.
  • Relative printing resistance (number of prints of target lithographic printing plate original plate) / 50,000 x 100
  • the lithographic printing plate original plate produced as described above was subjected to a Magnus 800 Quantum manufactured by Kodak equipped with an infrared semiconductor laser, and had an output of 27 W, an outer drum rotation speed of 450 rpm, and a resolution of 2,400 dpi (dot per). Exposure (corresponding to irradiation energy 110 mJ / cm 2 ) was performed under the condition of inch (1 inch is 2.54 cm). The exposed image includes a solid image and a chart of AM screen (Amplitude Modified Screening) 3% halftone dots.
  • AM screen Amplitude Modified Screening
  • a piano wire (manufactured by Esco Co., Ltd.) with a diameter of 0.4 mm is attached to the halftone dots of the obtained exposed original plate in a direction perpendicular to the rotation direction of the plate cylinder, and is of chrysanthemum size without development processing. It was attached to the cylinder of the Heidelberg printing machine SX-74. A non-woven fabric filter and a dampening water circulation tank having a capacity of 100 L containing a temperature control device were connected to the printing machine.
  • Damping water S-Z1 (manufactured by Fujifilm Co., Ltd.) 2.0% dampening water 80L is charged in the circulation device, and T & K UV OFS K-HS ink GE-M (manufactured by T & K TOKA Co., Ltd.) is used as printing ink.
  • T & K UV OFS K-HS ink GE-M (manufactured by T & K TOKA Co., Ltd.) is used as printing ink. ) Is used to supply dampening water and ink using the standard automatic printing start method, and then printed on Tokuryo Art (manufactured by Mitsubishi Paper Co., Ltd., continuous weight: 76.5 kg) at a printing speed of 10,000 sheets per hour. I printed it. When the number of printed sheets reached 2,000, the piano wire was removed from the plate, set in the printing machine again, and printing was started.
  • B Ink density 1.5 to 1.7: The ink density is slightly reduced, but it is an acceptable level.
  • C Ink density 1.0 to 1.4: The ink density is clearly reduced, which is an unacceptable level.
  • D Ink density 0.9 or less: Ink density decrease is extremely poor.
  • Electron-accepting polymerization initiators I-1 to I-4 and I'-1 The following compounds
  • Infrared absorbing polymethine dyes D-1 to D-4, D'-1 and D'-2 The following compounds
  • Electron-donated polymerization initiator T-1 Sodium tetraphenylborate
  • Polymerizable compound M-1 U-15HA: Urethane acrylate containing the following compounds (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.)
  • Polymerizable Compound M-2 Dipentaerythritol Pentaacrylate, SR-399, manufactured by Sartmer Polymerized Compound M-3: Tris (acryloyloxyethyl) isocyanurate, NK ester A-9300, manufactured by Shin-Nakamura Chemical Industry Co., Ltd.
  • Polymer particles R-1 Polymer particles (microgel (1) below), and the image recording layer coating liquid containing the polymer particles R-1 is prepared by mixing the components shown in Table 3 or Table 4 other than the microgel liquid below. The photosensitive liquid and the following microgel liquid were mixed and stirred immediately before application.
  • the preparation method of the microgel (1) used in the above microgel solution is shown below.
  • microgel (1) The following oil phase components and aqueous phase components were mixed and emulsified at 12,000 rpm for 10 minutes using a homogenizer. After stirring the obtained emulsion at 45 ° C. for 4 hours, 10 mass of 1,8-diazabicyclo [5.4.0] undec-7-ene-octylate (U-CAT SA102, manufactured by San-Apro Co., Ltd.) 5.20 g of% aqueous solution was added, the mixture was stirred at room temperature for 30 minutes, and allowed to stand at 45 ° C. for 24 hours. The solid content concentration was adjusted to 20% by mass with distilled water to obtain an aqueous dispersion of microgel (1). When the average particle size was measured by the light scattering method, it was 0.28 ⁇ m.
  • Oil phase component ⁇ (Component 1) Ethyl acetate: 12.0 g (Component 2) Addition in which trimethylolpropane (6 mol) and xylene diisocyanate (18 mol) are added, and one-terminal methylated polyoxyethylene (1 mol, number of repetitions of oxyethylene unit: 90) is added thereto.
  • Multivalent isocyanate compound (1) (as 50% by mass ethyl acetate solution): 15.0 g (Component 4) 65 mass% ethyl acetate solution of dipentaerythritol pentaacrylate (SR-399, manufactured by Sartmer): 11.54 g (Component 5) 10% ethyl acetate solution of sulfonate-type surfactant (Pionin A-41-C, manufactured by Takemoto Oil & Fat Co., Ltd .): 4.42 g
  • Polymer particles R-2 Polymer particles R-2 produced above Polymer particles
  • R-3 Polymer particles R-3 produced above Polymer particles 18-22: Particles 18-22 prepared by the following method
  • Me represents a methyl group.
  • Neostan U-600 was added to the three-necked flask, and the mixture was heated and stirred for 3 hours. Then, it cooled to room temperature, and wall material C (solid content 50% by mass) was obtained.
  • Pionin A-41-C manufactured by Takemoto Oil & Fat Co., Ltd. 0.45 g, wall material C 14.99 g, SR-399E 7.49 g, wall material B 1.89 g, wall material D 1.89 g, And 16.56 g of ethyl acetate was added, and the mixture was stirred at room temperature. Then, 46.89 g of pure water was added to the aluminum cup, and the mixture was stirred with a homogenizer at 12,000 rpm for 12 minutes. Then, 16.64 g of pure water was further added, the temperature was raised to 45 ° C., and the mixture was heated and stirred for 4 hours.
  • Pionin A-41-C manufactured by Takemoto Oil & Fat Co., Ltd. 0.45 g, wall material A 14.99 g, SR-399E 7.49 g, wall material B 1.89 g, wall material D 1.89 g, And 16.56 g of ethyl acetate was added, and the mixture was stirred at room temperature. Then, 46.89 g of pure water was added to the aluminum cup, and the mixture was stirred with a homogenizer at 12,000 rpm for 12 minutes. Then, 16.64 g of pure water was further added, the temperature was raised to 45 ° C., and the mixture was heated and stirred for 4 hours.
  • Pionin A-41-C manufactured by Takemoto Oil & Fat Co., Ltd.
  • wall material A 14.99 g wall material A 14.99 g
  • SR-399E 7.49 g wall material D 3.78 g
  • ethyl acetate 16.56 g was added and stirred at room temperature.
  • 46.89 g of pure water was added to the aluminum cup, and the mixture was stirred with a homogenizer at 12,000 rpm for 12 minutes.
  • 16.64 g of pure water was further added, the temperature was raised to 45 ° C., and the mixture was heated and stirred for 4 hours.
  • the ethylenically unsaturated bond value of the particle 22 is 2.01 mmol / g, which corresponds to the specific particle A.
  • the median diameter of the particles 22 was 185 nm, and the coefficient of variation was 27.5%.
  • the resin contained in the particles 22 is shown below. In the following resins, the subscripts under each compound (monomer) and the subscripts at the lower right of the parentheses indicate the content ratio (mass ratio).
  • Binder polymer P-1 Polymer shown below, ethylenically unsaturated bond value 0.33 mmol / g
  • the content of each structural unit (subscript at the bottom right of the parentheses) represents the mass ratio, and the subscript at the bottom right of the parentheses of the ethyleneoxy structure represents the number of repetitions.
  • Binder polymer P-2 Klucel M, manufactured by Hercules, hydroxypropyl cellulose, ethylenically unsaturated bond value 0 mmol / g
  • Acid color former SA-1 S-205 (leuco dye with fluorin structure, manufactured by Fukui Yamada Chemical Industry Co., Ltd.)
  • Surfactant W-1 Compound with the following structure
  • the lithographic printing plate originals of Examples 1 to 28, which are the lithographic printing plate originals according to the present disclosure are the lithographic printing plates obtained even when UV ink is used. Has excellent printing resistance.
  • the lithographic printing plate originals of Examples 1 to 28, which are the lithographic printing plate originals according to the present disclosure have UV plate skipping property, on-machine developability, and spot color fleshing property. Also, it is excellent in suppressing development residue during on-machine development.
  • Example 29-40 Preparation of image recording layer coating liquid> A photosensitive liquid (1) and an image recording layer coating liquid were prepared in the same manner as in Example 1 except that the composition was changed to that shown in Table 6. In addition, the obtained image recording layer coating liquid was used to prepare a lithographic printing plate original plate in the same manner as in Example 1.
  • the measurement was performed by the SCE (specular reflection light removal) method using a spectrocolorimeter CM2600d manufactured by Konica Minolta Co., Ltd. and an operation software CM-S100W. Chromogenic uses the L * a * b * color system of L * value (lightness) was evaluated by the difference ⁇ L between the L * values of the L * value and the unexposed portions of the exposed portion. The larger the value of ⁇ L, the better the color development.
  • Undercoat layer coating liquids (2) and (3) having the following compositions were prepared, respectively.
  • Example 41 to 46 Preparation of lithographic printing plate original plate>
  • the undercoat layer coating solution shown in Table 7 was applied onto the support A so that the dry coating amount was 20 mg / m 2 to form an undercoat layer.
  • the image recording layer coating solution shown in Table 7 was bar-coated on the undercoat layer and dried in an oven at 120 ° C. for 40 seconds to form an image recording layer having a dry coating amount of 1.0 g / m 2 .
  • the image recording layer coating liquid was prepared by mixing and stirring the polymer particles immediately before coating.
  • the obtained planographic printing plate original plate was used with a Luxel PLATESETTER T-6000III manufactured by FUJIFILM Corporation equipped with an infrared semiconductor laser, and had an outer drum rotation speed of 1,000 rpm (revolutions per minute), a laser output of 70%, and a resolution of 2, The exposure was performed under the condition of 400 dpi (dot per inch). After the exposure treatment, the lithographic printing plate obtained in an environment of a temperature of 25 ° C. and a humidity of 70% RH was scratched by a scratch tester.
  • HEIDON scratching Intersity TESTER HEIDEN-18 was used, and a sapphire needle having a diameter of 0.1 mm was used, and the scratch load was 50 (g).
  • the scratched plate was attached to the plate cylinder of a diamond IF2 printing machine manufactured by Mitsubishi Heavy Industries, Ltd. without developing.
  • the “surface contact angle” shown in Table 7 represents the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side. The contact angle was measured by the method described above.
  • the UV printing resistance of the planographic printing plate original plates of Examples 41 to 46 was the same as that of Example 1.
  • the details of the hydrophilic compounds shown in Table 7 are shown below.
  • Example 47 The process up to the formation of the image recording layer was carried out in the same manner as in Example 46, except that the composition of each layer was the composition shown in Table 8 or Table 9.
  • Protective layer coating liquid containing the components listed in Table 8 or Table 9 below on the image recording layer (however, the protective layer coating liquid contains each component shown in Table 8 or Table 9 and has a solid content of ion exchange: Was coated with a bar and dried in an oven at 120 ° C. for 60 seconds to form a protective layer having a dry coating amount of 0.50 g / m 2 . Through the above steps, a planographic printing plate original plate was obtained.
  • the obtained flat plate printing plate original plate was used as a light source in an environment of room temperature (25 ° C.) and humidity of 50%, and an OSRAM FLR40SW fluorescent lamp manufactured by Mitsubishi Electric Corporation was used as a light source to make a pocket illuminance meter ANA-F9 type manufactured by Tokyo Photoelectric Co., Ltd.
  • the flat plate printing plate original plate was set at a position of illuminance of 1000 lpx and irradiated with white light for 2 hours.
  • the on-machine developability (2 hours after exposure to white light) was measured in the same manner as in the above-mentioned on-machine developability evaluation. The results are shown in Table 8 or Table 9.
  • the obtained planographic printing plate original plate was used with a Luxel PLATESETTER T-6000III manufactured by FUJIFILM Corporation equipped with an infrared semiconductor laser, and had an outer drum rotation speed of 1,000 rpm (revolutions per minute), a laser output of 70%, and a resolution of 2, The exposure was performed under the condition of 400 dpi (dots per inch). After the exposure treatment, the lithographic printing plate obtained in an environment of a temperature of 25 ° C. and a humidity of 70% was scratched by a scratch tester.
  • HEIDON scratching Intersity TESTER HEIDEN-18 was used, and a sapphire needle having a diameter of 0.1 mm was used, and the scratch load was 50 (g).
  • the scratched plate was attached to the plate cylinder of a Mitsubishi diamond IF2 printing machine without development processing.
  • the evaluation standard is preferably 10 to 6 points.
  • S-1 Compound with the following structure
  • S-2 Compound with the following structure
  • P-1 Compound with the following structure (polyvinylidene chloride resin, weight average molecular weight 40,000)
  • Int-1 A compound having the following structure, Ph represents a phenyl group.
  • Int-2 Compound with the following structure
  • the lithographic printing plate originals of Examples 47 to 62 which are the lithographic printing plate originals according to the present disclosure, are the lithographic printing plates obtained even when UV ink is used. Has excellent printing resistance. Further, from the results shown in Tables 8 and 9, the lithographic printing plate original plates of Examples 47 to 62, which are the lithographic printing plate original plates according to the present disclosure, have visibility (color development) and visibility over time (color development over time). It is also excellent in on-machine developability, on-machine developability over time, and scratch resistance.
  • the protective layer coating solution (2) having the following composition shown in Table 13 is bar-coated on the image recording layer and dried in an oven at 120 ° C. for 60 seconds to obtain the dry coating amount shown in Table 13.
  • a protective layer (overcoat layer) was formed on the surface to prepare an on-machine development type lithographic printing plate original plate.
  • the obtained planographic printing plate original plate was evaluated in the same manner as in Example 1. The evaluation results are shown in Table 13.
  • Desmat treatment in an acidic aqueous solution (first desmat treatment)
  • a desmat treatment was performed in an acidic aqueous solution.
  • an aqueous solution of sulfuric acid of 150 g / L was used as the acidic aqueous solution used for the desmat treatment.
  • the liquid temperature was 30 ° C.
  • the desmat solution was sprayed and treated with desmat for 3 seconds. Then, it was washed with water.
  • the total amount of electricity stored in the anodic reaction of the aluminum plate was 450 C / dm 2 , and the electrolysis treatment was carried out in 4 steps with an energization interval of 125 C / dm 2 for 4 seconds.
  • a carbon electrode was used as the counter electrode of the aluminum plate. Then, it was washed with water.
  • (Dd) Alkaline etching treatment The aluminum plate after the electrochemical roughening treatment is etched by spraying an aqueous solution of caustic soda having a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass with a spray tube at a temperature of 45 ° C. Processing was performed. The dissolved amount of aluminum on the surface subjected to the electrochemical roughening treatment was 0.2 g / m 2 . Then, it was washed with water.
  • (Df) First-stage anodizing treatment The first-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG.
  • the anodizing treatment was performed under the conditions shown in Table 10 to form an anodized film having a predetermined film thickness.
  • Second-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG.
  • the anodizing treatment was performed under the conditions shown in Table 10 to form an anodized film having a predetermined film thickness.
  • Depth (nm) of large and small holes, pit density (micropore density, unit; piece / ⁇ m 2 ), and thickness of anodic oxide film from the bottom of the small holes to the surface of the aluminum plate. (Nm) are summarized in Table 10.
  • the diameters of the micropores (large-diameter hole portion and small-diameter hole portion) existing in the range of 400 nm ⁇ 600 nm were measured and averaged in the four images obtained.
  • the upper part of the anodic oxide film is cut, and then Various diameters were calculated.
  • depth of the micropores depth of the large-diameter hole and the small-diameter hole
  • FE-SEM observation of the depth of the large-diameter hole: 150,000 times, small diameter
  • the depths of 25 arbitrary micropores were measured and averaged.
  • the amount of film (AD) in the first anodizing treatment column and the amount of film (AD) in the second anodizing treatment column represent the amount of film obtained in each treatment.
  • the electrolytic solution used is an aqueous solution containing the components in Table 10.
  • the electric amount was 450C / dm 2 in terms of the total electric quantity aluminum plate participating in the anode reaction, electrolytic treatment was carried out four times to open the energization interval 112.5C / dm 2 by 4 seconds. A carbon electrode was used as the counter electrode of the aluminum plate. Then, it was washed with water.
  • a desmat treatment was performed using an acidic aqueous solution. Specifically, an acidic aqueous solution was sprayed onto an aluminum plate to perform a desmat treatment for 3 seconds.
  • an acidic aqueous solution used for the desmat treatment an aqueous solution having a sulfuric acid concentration of 170 g / L and an aluminum ion concentration of 5 g / L was used.
  • the liquid temperature was 30 ° C.
  • (Af) First-stage anodizing treatment The first-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. The anodizing treatment was carried out under the conditions of the "first anodizing treatment" column shown in Table 12 to form an anodized film having a predetermined amount of film.
  • the anodized aluminum plate is immersed in a caustic soda aqueous solution having a temperature of 40 ° C., a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass under the time conditions shown in Table 12, and then pore wide. Processing was performed. Then, it was washed with water by spraying.
  • Second-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG.
  • the anodizing treatment was carried out under the conditions of the "second anodizing treatment" column shown in Table 12 to form an anodized film having a predetermined amount of film.
  • TsO ⁇ represents a tosylate anion.
  • ⁇ Electron-donated polymerization initiator> B'-1: Sodium tetraphenylborate, HOMO -5.92 eV ⁇ Polymerizable compound> M'-1: Urethane acrylate synthesized according to the following synthesis example, ethylenically unsaturated bond value: 7.22 mmol / g M'-2: Triacrylate ethoxylated isocyanuric acid, A-9300 manufactured by Shin Nakamura Chemical Industry Co., Ltd., ethylenically unsaturated bond value: 7.09 mmol / g M'-3: The following compound, ethylenically unsaturated bond value: 4.25 mmol / g M'-4: The following compounds, ethylenically unsaturated bond value: 4.42 mmol / g
  • Neostan U-600 bismuth-based polycondensation catalyst, manufactured by Nitto Kasei Co., Ltd.
  • the reaction solution was cooled to room temperature (25 ° C.), and methyl ethyl ketone was added to synthesize a urethane acrylate solution having a solid content of 50% by mass.
  • a recycle type GPC (equipment: LC908-C60, column: JAIGEL-1H-40 and 2H-40 (manufactured by Nippon Analytical Industry Co., Ltd.)) was used in a tetrahydrofuran (THF) eluent, and the molecular weight of the urethane acrylate solution was increased. Fractionation was carried out to obtain urethane acrylate M'-1.
  • Oil phase component ⁇ (Component 1) Ethyl acetate: 12.0 parts (Component 2) Trimethylol propane (6 molar equivalents) and xylene diisocyanate (18 molar equivalents) are added, and one-terminal methylated polyoxyethylene (1 molar equivalent, oxy) is added thereto.
  • Additive 50 mass% ethyl acetate solution, manufactured by Mitsui Kagaku Co., Ltd.: 3.76 parts (component 3) polyhydric isocyanate compound (1) (50 mass% acetate) As an ethyl solution): 15.0 parts (component 4) 65% by mass ethyl acetate solution of dipentaerythritol pentaacrylate (SR-399, manufactured by Sartmer) 11.54 parts (component 5) sulfonate type surfactant 10% ethyl acetate solution (Pionin A-41-C, manufactured by Takemoto Oil & Fat Co., Ltd.): 4.42 parts
  • aqueous phase component was added to the oil phase component and mixed, and the obtained mixture was emulsified with a homogenizer at 12,000 rpm for 16 minutes to obtain an emulsion.
  • 16.8 g of distilled water was added to the obtained emulsion, and the obtained liquid was stirred at room temperature for 180 minutes.
  • the stirred liquid was heated to 45 ° C., and the mixture was stirred for 5 hours while maintaining the liquid temperature at 45 ° C. to distill off ethyl acetate from the above liquid.
  • the solid content concentration was adjusted to 20% by mass with distilled water to obtain an aqueous dispersion of polymer particles R'-2.
  • the volume average particle diameter of R'-2 was 165 nm as measured by a laser diffraction / scattering type particle size distribution measuring device LA-920 (manufactured by Horiba Seisakusho Co., Ltd.).
  • WP'-1 Polyvinyl alcohol, Gosenol L-3266 manufactured by Mitsubishi Chemical Corporation, Saponification degree 86-89% or more
  • WP'-2 Mowiol 4-88 (Polyvinyl alcohol (PVA), manufactured by Sigma-Aldrich)
  • WP'-3 Mowiool 8-88 (Polyvinyl alcohol (PVA), manufactured by Sigma-Aldrich)
  • WR'-2 Polyvinylidene chloride aqueous dispersion, Diofan (registered trademark) A50 manufactured by Solvin ⁇ Surfactant>
  • V'-1 Surfactant, Emarex 710, manufactured by Nippon Emulsion Co., Ltd.
  • wIR'-1 The following compounds
  • the lithographic printing plate original plates of Examples 63 to 70 which are the lithographic printing plate original plates according to the present disclosure, have the printing durability of the lithographic printing plate obtained even when UV ink is used. Is excellent. Further, from the results shown in Table 13, the lithographic printing plate original plates of Examples 63 to 70, which are the lithographic printing plate original plates according to the present disclosure, have UV plate skipping inhibitory property, on-machine developability, spot color fleshing property, and It also has excellent ability to suppress development residue during on-machine development.

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Abstract

The present invention provides: a lithographic printing plate original plate having an aluminum support and an image recording layer on the aluminum support, the image recording layer including an infrared-absorbent polymethine dye having a HOMO of -5.2 eV or less, a polymerization initiator, and a polymerizable compound, and the ethylenically unsaturated valence of the image recording layer being 1.0 mmol/g or greater; a method for fabricating a lithographic printing plate; and a lithographic printing method.

Description

平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法Planographic printing plate Original plate, lithographic printing plate manufacturing method, and lithographic printing method
 本開示は、平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法に関する。 This disclosure relates to a lithographic printing plate original plate, a method for producing a lithographic printing plate, and a lithographic printing method.
 一般に、平版印刷版は、印刷過程でインキを受容する親油性の画像部と、湿し水を受容する親水性の非画像部とからなる。平版印刷は、水と油性インキが互いに反発する性質を利用して、平版印刷版の親油性の画像部をインキ受容部、親水性の非画像部を湿し水受容部(インキ非受容部)として、平版印刷版の表面にインキの付着性の差異を生じさせ、画像部のみにインキを着肉させた後、紙などの被印刷体にインキを転写して印刷する方法である。
 この平版印刷版を作製するため、従来、親水性の支持体上に親油性の感光性樹脂層(画像記録層)を設けてなる平版印刷版原版(PS版)が広く用いられている。通常は、平版印刷版原版を、リスフィルムなどの原画を通した露光を行った後、画像記録層の画像部となる部分を残存させ、それ以外の不要な画像記録層をアルカリ性現像液又は有機溶剤によって溶解除去し、親水性の支持体表面を露出させて非画像部を形成する方法により製版を行って、平版印刷版を得ている。
In general, a lithographic printing plate comprises a lipophilic image portion that receives ink in the printing process and a hydrophilic non-image portion that receives dampening water. In flat plate printing, utilizing the property that water and oil-based ink repel each other, the oil-based image part of the flat plate printing plate is the ink receiving part, and the hydrophilic non-image part is the dampening water receiving part (ink non-receptive part). This is a method in which a difference in the adhesiveness of ink is generated on the surface of a flat plate printing plate, the ink is inlaid only on the image portion, and then the ink is transferred to an object to be printed such as paper for printing.
In order to produce this lithographic printing plate, a lithographic printing plate original plate (PS plate) in which a lipophilic photosensitive resin layer (image recording layer) is provided on a hydrophilic support has been widely used. Normally, after exposing the original plate of a flat plate printing plate through an original image such as a squirrel film, the part that becomes the image part of the image recording layer remains, and the other unnecessary image recording layer is an alkaline developer or organic. A flat plate printing plate is obtained by performing plate making by a method of dissolving and removing with a solvent to expose the surface of a hydrophilic support to form a non-image portion.
 また、地球環境への関心の高まりから、現像処理などの湿式処理に伴う廃液に関する環境課題がクローズアップされている。
 上記の環境課題に対して、現像あるいは製版の簡易化や無処理化が指向されている。簡易な作製方法の一つとしては、「機上現像」と呼ばれる方法が行われている。すなわち、平版印刷版原版を露光後、従来の現像は行わず、そのまま印刷機に装着して、画像記録層の不要部分の除去を通常の印刷工程の初期段階で行う方法である。
In addition, due to growing interest in the global environment, environmental issues related to waste liquids associated with wet treatments such as development treatments have been highlighted.
In response to the above environmental issues, simplification and non-processing of development or plate making are aimed at. As one of the simple manufacturing methods, a method called "machine development" is performed. That is, after the lithographic printing plate original plate is exposed, the conventional development is not performed, and the printing machine is mounted as it is, and unnecessary portions of the image recording layer are removed at the initial stage of the normal printing process.
 従来の平版印刷版原版としては、例えば、特許文献1又は2に記載されたものが挙げられる。
 特許文献1には、支持体上に、(A)ラジカル重合性化合物、(B)赤外線吸収染料、(C)ラジカル発生剤、及び(D)コア部に親油性樹脂、シェル部に下記一般式(I)で表わされる構造単位を有する樹脂を有するコアシェル構造の樹脂微粒子を含有する、インキ及び湿し水の少なくともいずれかにより除去可能な画像記録層を有する平版印刷版原版が記載されている。
Examples of the conventional planographic printing plate original plate include those described in Patent Document 1 or 2.
Patent Document 1 describes (A) a radically polymerizable compound, (B) an infrared absorbing dye, (C) a radical generator, (D) an oil-based resin on the core portion, and the following general formula on the shell portion on the support. Described is a lithographic printing plate precursor having an image recording layer that contains resin fine particles having a core-shell structure having a resin having the structural unit represented by (I) and can be removed by at least one of ink and dampening water.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 一般式(I)中、R、R、R及びRは、それぞれ独立に水素原子又はメチル基を表し、m及びlは、1≦m+l≦200を満足する0又は正の整数である。 In the general formula (I), R 1 , R 2 , R 3 and R 4 each independently represent a hydrogen atom or a methyl group, and m and l are 0 or positive integers satisfying 1 ≦ m + l ≦ 200. is there.
 また、特許文献2には、画像記録層に使用する、下記式1で表される化合物を含む発色組成物が記載されている。 Further, Patent Document 2 describes a color-developing composition containing a compound represented by the following formula 1 used for an image recording layer.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 式1中、Aは窒素原子、酸素原子及び硫黄原子よりなる群から選ばれた原子を少なくとも1つ含む環構造を表し、AはN、O又はSを含む環構造を表し、Xはそれぞれ独立に、炭素原子又は窒素原子を表し、Xのうち少なくとも1つは窒素原子であり、Xが窒素原子である場合、上記窒素原子に結合するR、R又はRは存在しないものとし、R、R及びRはそれぞれ独立に、水素原子、ハロゲン原子、炭化水素基、アルコキシ基、アリーロキシ基、アルキルチオ基、アリールチオ基、アシル基、ヒドロキシ基、アルコキシカルボニル基、アシルオキシ基、アミノ基、ウレタン基、ウレア基、アミド基、ニトリル基又はイミノ基を表し、2以上のR~Rは結合して環構造を形成してもよく、1以上のR~RとA又はAとは結合して環構造を形成してもよく、nは1~6の整数を表し、Zは電荷を中和するための対イオンを表す。 In Equation 1, A represents a ring structure containing at least one atom selected from the group consisting of a nitrogen atom, an oxygen atom and a sulfur atom, and A + represents a ring structure containing N + , O + or S + . Each of X independently represents a carbon atom or a nitrogen atom, and at least one of X is a nitrogen atom, and when X is a nitrogen atom, R 1 , R 2 or R 3 bonded to the nitrogen atom is present. R 1 , R 2 and R 3 are independently hydrogen atom, halogen atom, hydrocarbon group, alkoxy group, aryloxy group, alkylthio group, arylthio group, acyl group, hydroxy group, alkoxycarbonyl group and acyloxy. Representing a group, amino group, urethane group, urea group, amide group, nitrile group or imino group, two or more R 1 to R 3 may be bonded to form a ring structure, and one or more R 1 to R may be formed. 3 and A or A + may be combined to form a ring structure, where n represents an integer of 1 to 6 and Z represents a counterion for neutralizing the charge.
  特許文献1:特開2012-71590号公報
  特許文献2:国際公開第2018/043150号
Patent Document 1: Japanese Patent Application Laid-Open No. 2012-711590 Patent Document 2: International Publication No. 2018/043150
 本発明の実施形態が解決しようとする課題は、UVインキを使用した場合であっても、得られる平版印刷版の耐刷性に優れる平版印刷版原版を提供することである。
 本発明の他の実施形態が解決しようとする課題は、上記平版印刷版原版を用いた平版印刷版の作製方法又は平版印刷方法を提供することである。
An object to be solved by the embodiment of the present invention is to provide a lithographic printing plate original plate having excellent printing durability of the obtained lithographic printing plate even when UV ink is used.
An object to be solved by another embodiment of the present invention is to provide a method for producing a lithographic printing plate or a lithographic printing method using the lithographic printing plate original plate.
 上記課題を解決するための手段には、以下の態様が含まれる。
<1> アルミニウム支持体、及び、上記アルミニウム支持体上に画像記録層を有し、上記画像記録層が、HOMOが-5.2eV以下である赤外線吸収性ポリメチン色素、重合開始剤、及び、重合性化合物を含み、上記画像記録層のエチレン性不飽和結合価が、1.0mmol/g以上である平版印刷版原版。
<2> 上記画像記録層のエチレン性不飽和結合価が、2.5mmol/g以上である<1>に記載の平版印刷版原版。
<3> 上記ポリメチン色素が、両末端の芳香環の少なくとも一方に電子求引性基又は重原子含有基を有するシアニン色素を含む<1>又は<2>に記載の平版印刷版原版。
<4> 上記ポリメチン色素のHOMOが、-5.3eV以下である<1>~<3>のいずれか1つに記載の平版印刷版原版。
<5> 上記画像記録層が、最外層である<1>~<4>のいずれか1つに記載の平版印刷版原版。
<6> 上記画像記録層の上に変色性化合物を含有する保護層を有する<1>~<4>のいずれか1つに記載の平版印刷版原版。
<7> エネルギー密度110mJ/cmにて波長830nmの赤外線による露光を行った場合の、上記露光前後の明度変化ΔLが、2.0以上である<6>に記載の平版印刷版原版。
<8> 上記変色性化合物が、赤外線露光に起因して発色する化合物を含む<6>又は<7>に記載の平版印刷版原版。
<9> 上記変色性化合物が、赤外線露光に起因して分解する分解性化合物を含む<6>~<8>のいずれか1つに記載の平版印刷版原版。
<10> 上記変色性化合物が、赤外線露光に起因する、熱、電子移動、又はその両方により分解する分解性化合物を含む<9>に記載の平版印刷版原版。
<11> 上記変色性化合物が、シアニン色素である<6>~<10>のいずれか1つに記載の平版印刷版原版。
<12> 上記変色性化合物が、下記式1-1で表される化合物である<6>~<11>に記載の平版印刷版原版。
The means for solving the above problems include the following aspects.
<1> An aluminum support and an infrared absorbing polymethine dye having an image recording layer on the aluminum support and having a HOMO of −5.2 eV or less, a polymerization initiator, and polymerization. A lithographic printing plate original plate containing a sex compound and having an ethylenically unsaturated bond value of the image recording layer of 1.0 mmol / g or more.
<2> The lithographic printing plate original plate according to <1>, wherein the ethylenically unsaturated bond value of the image recording layer is 2.5 mmol / g or more.
<3> The planographic printing plate original plate according to <1> or <2>, wherein the polymethine dye contains a cyanine dye having an electron-attracting group or a heavy atom-containing group in at least one of the aromatic rings at both ends.
<4> The planographic printing plate original plate according to any one of <1> to <3>, wherein the HOMO of the polymethine dye is −5.3 eV or less.
<5> The planographic printing plate original plate according to any one of <1> to <4>, wherein the image recording layer is the outermost layer.
<6> The planographic printing plate original plate according to any one of <1> to <4>, which has a protective layer containing a discoloring compound on the image recording layer.
<7> The planographic printing plate original plate according to <6>, wherein the brightness change ΔL before and after the exposure is 2.0 or more when exposure is performed with infrared rays having a wavelength of 830 nm at an energy density of 110 mJ / cm 2 .
<8> The lithographic printing plate original plate according to <6> or <7>, wherein the discoloring compound contains a compound that develops color due to infrared exposure.
<9> The planographic printing plate original plate according to any one of <6> to <8>, wherein the discoloring compound contains a decomposable compound that decomposes due to infrared exposure.
<10> The lithographic printing plate original plate according to <9>, wherein the discoloring compound contains a degradable compound that is decomposed by heat, electron transfer, or both due to infrared exposure.
<11> The planographic printing plate original plate according to any one of <6> to <10>, wherein the discoloring compound is a cyanine pigment.
<12> The lithographic printing plate original plate according to <6> to <11>, wherein the discoloring compound is a compound represented by the following formula 1-1.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 式1-1中、Rは下記式2~式4のいずれかで表される基を表し、R11~R18はそれぞれ独立に、水素原子、ハロゲン原子、-R、-OR、-SR、又は-NRを表し、R~Rは、それぞれ独立に、炭化水素基を表し、A、A及び複数のR11~R18が連結して単環又は多環を形成してもよく、A及びAはそれぞれ独立に、酸素原子、硫黄原子、又は、窒素原子を表し、n11及びn12はそれぞれ独立に、0~5の整数を表し、但し、n11及びn12の合計は2以上であり、n13及びn14はそれぞれ独立に、0又は1を表し、Lは酸素原子、硫黄原子、又は、-NR10-を表し、R10は、水素原子、アルキル基、又はアリール基を表し、Zaは電荷を中和する対イオンを表す。 In formula 1-1, R 1 represents a group represented by any of the following formulas 2 to 4, and R 11 to R 18 are independently hydrogen atom, halogen atom, -R a , -OR b , and so on. -SR c, or represents -NR d R e, R a ~ R e each independently represents a hydrocarbon group, a 1, a 2 and a plurality of R 11 ~ R 18 are linked monocyclic or Polycycles may be formed, where A 1 and A 2 independently represent an oxygen atom, a sulfur atom, or a nitrogen atom, and n 11 and n 12 each independently represent an integer of 0 to 5. However, the total of n 11 and n 12 is 2 or more, n 13 and n 14 independently represent 0 or 1, L represents an oxygen atom, a sulfur atom, or -NR 10- , and R 10 Represents a hydrogen atom, an alkyl group, or an aryl group, and Za represents a counterion that neutralizes the charge.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 式2~式4中、R20、R30、R41及びR42はそれぞれ独立に、アルキル基又はアリール基を表し、Zbは電荷を中和する対イオンを表し、波線は、上記式1-1中のLで表される基との結合部位を表す。 In formulas 2 to 4, R 20 , R 30 , R 41 and R 42 independently represent an alkyl group or an aryl group, Zb represents a charge-neutralizing counterion, and the wavy line represents the above formula 1-. Represents a binding site with a group represented by L in 1.
<13> 上記変色性化合物が、下記式1-2で表される化合物である<12>に記載の平版印刷版原版。 <13> The lithographic printing plate original plate according to <12>, wherein the discoloring compound is a compound represented by the following formula 1-2.
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 式1-2中、Rは上記式2~式4のいずれかで表される基を表し、R19~R22はそれぞれ独立に、水素原子、ハロゲン原子、-R、-OR、-CN、-SR、又は、-NRを表し、R23及びR24はそれぞれ独立に、水素原子、又は、-Rを表し、R~Rはそれぞれ独立に、炭化水素基を表し、R19とR20、R21とR22、又は、R23とR24は、連結して単環又は多環を形成してもよく、Lは、酸素原子、硫黄原子、又は、-NR10-を表し、R10は、水素原子、アルキル基、又は、アリール基を表し、Rd1~Rd4、W及びWは、それぞれ独立に、置換基を有してもよいアルキル基を表し、Zaは電荷を中和する対イオンを表す。 In formula 1-2, R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independently hydrogen atom, halogen atom, -R a , -OR b , and so on. -CN, -SR c, or represents -NR d R e, R 23 and R 24 each independently represent a hydrogen atom, or represents a -R a, each is R a ~ R e independently, hydrocarbon Representing a group, R 19 and R 20 , R 21 and R 22 , or R 23 and R 24 may be linked to form a monocyclic or polycyclic, where L is an oxygen atom, a sulfur atom, or , -NR 10- , R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and R d1 to R d4 , W 1 and W 2 may independently have substituents. It represents an alkyl group and Za represents a counterion that neutralizes the charge.
<14> 上記変色性化合物が、下記式1-3~式1-7のいずれかで表される化合物である<12>又は<13>に記載の平版印刷版原版。 <14> The planographic printing plate original plate according to <12> or <13>, wherein the discoloring compound is a compound represented by any of the following formulas 1-3 to 1-7.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 式1-3~式1-7中、Rは上記式2~式4のいずれかで表される基を表し、R19~R22はそれぞれ独立に、水素原子、ハロゲン原子、-R、-OR、-CN、-SR、又は、-NRを表し、R25及びR26はそれぞれ独立に、水素原子、ハロゲン原子、又は-Rを表し、R~Rはそれぞれ独立に、炭化水素基を表し、R19とR20、R21とR22、又は、R25とR26は、連結して単環又は多環を形成してもよく、Lは、酸素原子、硫黄原子、又は、-NR10-を表し、R10は、水素原子、アルキル基、又は、アリール基を表し、Rd1~Rd4、W及びWはそれぞれ独立に、置換基を有してもよいアルキル基を表し、Zaは電荷を中和する対イオンを表す。 In formulas 1-3 to 1-7, R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independent hydrogen atoms, halogen atoms, and −R a. , -OR b , -CN, -SR c , or -NR d R e , and R 25 and R 26 independently represent a hydrogen atom, a halogen atom, or -R a , and R a to R e. Represent each independently as a hydrocarbon group, and R 19 and R 20 , R 21 and R 22 , or R 25 and R 26 may be linked to form a monocyclic or polycyclic, and L is It represents an oxygen atom, a sulfur atom, or -NR 10- , R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and R d1 to R d4 , W 1 and W 2 are independent substituents. Represents an alkyl group which may have, and Za represents a counterion that neutralizes the charge.
<15> 上記式1-2~式1-7におけるW及びWはそれぞれ独立に、置換基を有するアルキル基であり、かつ、上記置換基として、-(OCHCH)-、スルホ基、スルホ基の塩、カルボキシ基、又は、カルボキシ基の塩を少なくとも有する基である<13>又は<14>に記載の平版印刷版原版。
<16> 上記式1-2~式1-7におけるLが、酸素原子である<13>~<15>のいずれか1つに記載の平版印刷版原版。
<17> 上記保護層の上記変色性化合物の含有量Mと上記画像記録層の上記赤外線吸収剤の含有量Mとの比M/Mが、0.2以上である<6>~<16>のいずれか1つに記載の平版印刷版原版。
<18> 上記保護層が、水溶性ポリマーを含む<6>~<17>のいずれか1つに記載の平版印刷版原版。
<19> 上記水溶性ポリマーが、けん化度が50%以上であるポリビニルアルコールを含む<18>に記載の平版印刷版原版。
<20> 上記水溶性ポリマーが、ポリビニルピロリドンを含む<18>又は<19>に記載の平版印刷版原版。
<21> 上記保護層が、疎水性ポリマーを含む<18>~<20>のいずれか1つに記載の平版印刷版原版。
<22> 上記疎水性ポリマーが、疎水性ポリマー粒子である<21>に記載の平版印刷版原版。
<23> 上記疎水性ポリマーが、ポリビニリデンクロライド樹脂を含む<21>又は<22>に記載の平版印刷版原版。
<24> 上記疎水性ポリマーが、スチレン-アクリル共重合体を含む<21>~<23>のいずれか1つに記載の平版印刷版原版。
<25> 上記保護層が、感脂化剤を含む<6>~<24>のいずれか1つに記載の平版印刷版原版。
<26> 上記保護層の量が、0.1g/m~2.0g/mである<6>~<25>のいずれか1つに記載の平版印刷版原版。
<27> 上記アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角が、110°以下である<1>~<26>のいずれか1つに記載の平版印刷版原版。
<28> 上記アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角が、80°以下である<27>に記載の平版印刷版原版。
<29> 上記アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角が、50°以下である<28>に記載の平版印刷版原版。
<30> 上記アルミニウム支持体上の層が、ヒドロキシカルボン酸又はその塩を含む<1>~<29>のいずれか1つに記載の平版印刷版原版。
<31> 上記ヒドロキシカルボン酸又はその塩が、ヒドロキシ基を2個以上有する化合物を含む<30>に記載の平版印刷版原版。
<32> 上記ヒドロキシカルボン酸又はその塩が、ヒドロキシ基を3個以上有する化合物を含む<30>又は<31>に記載の平版印刷版原版。
<33> 上記画像記録層が、粒子を含む<1>~<32>のいずれか1つに記載の平版印刷版原版。
<34> 上記粒子が、ポリマー粒子を含む<33>に記載の平版印刷版原版。
<35> 上記ポリマー粒子が、親水性基を有する<34>に記載の平版印刷版原版。
<36> 上記ポリマー粒子が、上記親水性基として、下記式Zで表される基を有する<35>に記載の平版印刷版原版。
  *-Q-W-Y 式Z
 式Z中、Qは二価の連結基を表し、Wは親水性構造を有する二価の基又は疎水性構造を有する二価の基を表し、Yは親水性構造を有する一価の基又は疎水性構造を有する一価の基を表し、W及びYのいずれかは親水性構造を有し、*は他の構造との結合部位を表す。
<37> 上記ポリマー粒子が、上記親水性基として、ポリアルキレンオキシド構造を有する<35>又は<36>に記載の平版印刷版原版。
<38> 上記ポリマー粒子が、上記ポリオキシアルキレンオキシド構造として、ポリプロピレンオキシド構造を有する<37>に記載の平版印刷版原版。
<39> 上記ポリマー粒子が、上記ポリオキシアルキレンオキシド構造として、ポリエチレンオキシド構造及びポリプロピレンオキシド構造を少なくとも有する<37>又は<38>に記載の平版印刷版原版。
<40> 上記ポリマー粒子が、下記式(Iso)で表されるイソシアネート化合物と水とを少なくとも反応させて得られる構造を有する樹脂を含む<34>~<39>のいずれか1つに記載の平版印刷版原版。
<15> W 1 and W 2 in the above formulas 1-2 to 1-7 are each independently an alkyl group having a substituent, and as the above substituents,-(OCH 2 CH 2 )-and sulfo. The flat plate printing plate original plate according to <13> or <14>, which is a group, a salt of a sulfo group, a carboxy group, or a group having at least a salt of a carboxy group.
<16> The planographic printing plate original plate according to any one of <13> to <15>, wherein L in the above formulas 1-2 to 1-7 is an oxygen atom.
<17> The ratio M X / M Y between the content M Y of the infrared absorber content M X and the image recording layer of the discoloring compound of the protective layer is at least 0.2 <6> The planographic printing plate original plate according to any one of <16>.
<18> The planographic printing plate original plate according to any one of <6> to <17>, wherein the protective layer contains a water-soluble polymer.
<19> The planographic printing plate original plate according to <18>, wherein the water-soluble polymer contains polyvinyl alcohol having a saponification degree of 50% or more.
<20> The planographic printing plate original plate according to <18> or <19>, wherein the water-soluble polymer contains polyvinylpyrrolidone.
<21> The planographic printing plate original plate according to any one of <18> to <20>, wherein the protective layer contains a hydrophobic polymer.
<22> The planographic printing plate original plate according to <21>, wherein the hydrophobic polymer is hydrophobic polymer particles.
<23> The planographic printing plate original plate according to <21> or <22>, wherein the hydrophobic polymer contains a polyvinylidene chloride resin.
<24> The planographic printing plate original plate according to any one of <21> to <23>, wherein the hydrophobic polymer contains a styrene-acrylic copolymer.
<25> The planographic printing plate original plate according to any one of <6> to <24>, wherein the protective layer contains an oil-sensitive agent.
<26> The planographic printing plate original plate according to any one of <6> to <25>, wherein the amount of the protective layer is 0.1 g / m 2 to 2.0 g / m 2 .
<27> The planographic printing plate original plate according to any one of <1> to <26>, wherein the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side is 110 ° or less. ..
<28> The planographic printing plate original plate according to <27>, wherein the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side is 80 ° or less.
<29> The planographic printing plate original plate according to <28>, wherein the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side is 50 ° or less.
<30> The planographic printing plate original plate according to any one of <1> to <29>, wherein the layer on the aluminum support contains a hydroxycarboxylic acid or a salt thereof.
<31> The planographic printing plate original plate according to <30>, wherein the hydroxycarboxylic acid or a salt thereof contains a compound having two or more hydroxy groups.
<32> The planographic printing plate original plate according to <30> or <31>, wherein the hydroxycarboxylic acid or a salt thereof contains a compound having three or more hydroxy groups.
<33> The planographic printing plate original plate according to any one of <1> to <32>, wherein the image recording layer contains particles.
<34> The planographic printing plate original plate according to <33>, wherein the particles include polymer particles.
<35> The planographic printing plate original plate according to <34>, wherein the polymer particles have a hydrophilic group.
<36> The planographic printing plate original plate according to <35>, wherein the polymer particles have a group represented by the following formula Z as the hydrophilic group.
* -Q-W-Y formula Z
In formula Z, Q represents a divalent linking group, W represents a divalent group having a hydrophilic structure or a divalent group having a hydrophobic structure, and Y represents a monovalent group having a hydrophilic structure or It represents a monovalent group having a hydrophobic structure, either W or Y has a hydrophilic structure, and * represents a binding site with another structure.
<37> The planographic printing plate original plate according to <35> or <36>, wherein the polymer particles have a polyalkylene oxide structure as the hydrophilic group.
<38> The planographic printing plate original plate according to <37>, wherein the polymer particles have a polypropylene oxide structure as the polyoxyalkylene oxide structure.
<39> The planographic printing plate original plate according to <37> or <38>, wherein the polymer particles have at least a polyethylene oxide structure and a polypropylene oxide structure as the polyoxyalkylene oxide structure.
<40> The above-mentioned one of <34> to <39>, wherein the polymer particles contain a resin having a structure obtained by at least reacting an isocyanate compound represented by the following formula (Iso) with water. Planographic printing plate original plate.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 式(Iso)中、nは0~10の整数を表す。 In the formula (Iso), n represents an integer from 0 to 10.
<41> 上記ポリマー粒子が、上記式(Iso)で表されるイソシアネート化合物と水とを少なくとも反応させて得られる構造を有し、かつポリオキシアルキレン構造として、ポリエチレンオキシド構造及びポリプロピレンオキシド構造を有する樹脂を含む<40>に記載の平版印刷版原版。
<42> 上記画像記録層が、上記重合開始剤として、電子供与型重合開始剤を含む<1>~<41>のいずれか1つに記載の平版印刷版原版。
<43> 上記ポリメチン色素のHOMO-上記電子供与型重合開始剤のHOMOの値が、0.70eV以下である<42>に記載の平版印刷版原版。
<44> 上記画像記録層が、発色剤を更に含む<1>~<43>のいずれか1つに記載の平版印刷版原版。
<45> 上記画像記録層における上記発色剤が、酸発色剤である<44>に記載の平版印刷版原版。
<46> 上記画像記録層における上記酸発色剤が、ロイコ色素である<45>に記載の平版印刷版原版。
<47> 上記画像記録層における上記ロイコ色素が、フタリド構造又はフルオラン構造を有するロイコ色素である<46>に記載の平版印刷版原版。
<48> 上記画像記録層における上記フタリド構造又はフルオラン構造を有するロイコ色素が、下記式(Le-1)~式(Le-3)のいずれかで表される化合物である<47>に記載の平版印刷版原版。
<41> The polymer particles have a structure obtained by at least reacting an isocyanate compound represented by the above formula (Iso) with water, and have a polyethylene oxide structure and a polypropylene oxide structure as polyoxyalkylene structures. The planographic printing plate original plate according to <40> containing a resin.
<42> The planographic printing plate original plate according to any one of <1> to <41>, wherein the image recording layer contains an electron donating type polymerization initiator as the polymerization initiator.
<43> The planographic printing plate original plate according to <42>, wherein the HOMO value of the polymethine dye and the HOMO value of the electron-donating polymerization initiator is 0.70 eV or less.
<44> The planographic printing plate original plate according to any one of <1> to <43>, wherein the image recording layer further contains a color former.
<45> The planographic printing plate original plate according to <44>, wherein the color former in the image recording layer is an acid color former.
<46> The lithographic printing plate original plate according to <45>, wherein the acid color former in the image recording layer is a leuco dye.
<47> The planographic printing plate original plate according to <46>, wherein the leuco dye in the image recording layer is a leuco dye having a phthalide structure or a fluorine structure.
<48> The leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by any of the following formulas (Le-1) to (Le-3), according to <47>. Planographic printing plate original plate.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 式(Le-1)~式(Le-3)中、ERGはそれぞれ独立に、電子供与性基を表し、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、X~X10はそれぞれ独立に、水素原子、ハロゲン原子又は一価の有機基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Raは、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、アルキル基又はアリール基を表す。 Wherein (Le-1) ~ formula (Le-3), in each ERG independently represents an electron donating group, each X 1 ~ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group , X 5 to X 10 independently represent a hydrogen atom, a halogen atom or a monovalent organic group, Y 1 and Y 2 independently represent C or N, and when Y 1 is N, If X 1 is absent and Y 2 is N, then X 4 is absent, Ra 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 are independent alkyl groups. Or represents an aryl group.
<49> 上記画像記録層における上記フタリド構造又はフルオラン構造を有するロイコ色素が、下記式(Le-4)~式(Le-6)のいずれかで表される化合物である<47>又は<48>に記載の平版印刷版原版。 <49> The leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by any of the following formulas (Le-4) to (Le-6) <47> or <48>. > The lithographic printing plate original plate described in.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 式(Le-4)~式(Le-6)中、ERGはそれぞれ独立に、電子供与性基を表し、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Raは、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、アルキル基又はアリール基を表す。 Wherein (Le-4) ~ formula (Le-6), in each ERG independently represents an electron donating group, each X 1 ~ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group , Y 1 and Y 2 independently represent C or N, and if Y 1 is N, then X 1 does not exist, and if Y 2 is N, then X 4 does not exist and Ra. 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 independently represent an alkyl group or an aryl group, respectively.
<50> 上記画像記録層における上記フタリド構造又はフルオラン構造を有するロイコ色素が、下記式(Le-7)~式(Le-9)のいずれかで表される化合物である<47>~<49>のいずれか1つに記載の平版印刷版原版。 <50> The leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by any of the following formulas (Le-7) to (Le-9) <47> to <49. The lithographic printing plate original plate described in any one of>.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
 式(Le-7)~式(Le-9)中、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Ra~Raはそれぞれ独立に、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、アルキル基又はアリール基を表し、Rc及びRcはそれぞれ独立に、アリール基を表す。 Wherein (Le-7) ~ formula (Le-9), each X 1 ~ X 4 is independently a hydrogen atom, a halogen atom or a dialkyl anilino group, Y 1 and Y 2 are each independently, C or Representing N, when Y 1 is N, X 1 does not exist, when Y 2 is N, X 4 does not exist, and Ra 1 to Ra 4 are independent hydrogen atoms and alkyl, respectively. Represents a group or an alkoxy group, Rb 1 to Rb 4 independently represent an alkyl group or an aryl group, and Rc 1 and Rc 2 each independently represent an aryl group.
<51> Ra~Raがそれぞれ独立に、アルコキシ基である<50>に記載の平版印刷版原版。
<52> 上記画像記録層における上記フタリド構造又はフルオラン構造を有するロイコ色素が、上記式(Le-8)で表される化合物である<50>又は<51>に記載の平版印刷版原版。
<53> X~Xが水素原子であり、Y及びYがCである<52>に記載の平版印刷版原版。
<54> Rb及びRbがそれぞれ独立に、アルキル基である<52>又は<53>に記載の平版印刷版原版。
<55> 上記ポリメチン色素が、ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16以上32以下であり、かつδhがδpの60%以下である有機アニオンを有する<1>~<54>のいずれか1つに記載の平版印刷版原版。
<56> 上記重合開始剤が、電子受容型重合開始剤を含む<1>~<55>のいずれか1つに記載の平版印刷版原版。
<57> 上記電子受容型重合開始剤が、ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16以上32以下であり、かつδhがδpの60%以下である有機アニオンを有する<56>に記載の平版印刷版原版。
<58> 上記電子受容型重合開始剤が、下記式(II)で表される化合物を含む<56>又は<57>に記載の平版印刷版原版。
<51> The lithographic printing plate original plate according to <50>, wherein each of Ra 1 to Ra 4 is an alkoxy group independently.
<52> The planographic printing plate original plate according to <50> or <51>, wherein the leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by the above formula (Le-8).
<53> The planographic printing plate original plate according to <52>, wherein X 1 to X 4 are hydrogen atoms, and Y 1 and Y 2 are C.
<54> The lithographic printing plate original plate according to <52> or <53>, wherein Rb 1 and Rb 2 are independently alkyl groups.
<55> The polymethine dye has an organic anion in which δd in the solubility parameter of Hansen is 16 or more, δp is 16 or more and 32 or less, and δh is 60% or less of δp <1> to <54>. The lithographic printing plate original plate described in any one of.
<56> The planographic printing plate original plate according to any one of <1> to <55>, wherein the polymerization initiator contains an electron-accepting polymerization initiator.
<57> The electron-accepting polymerization initiator has an organic anion in which δd in the solubility parameter of Hansen is 16 or more, δp is 16 or more and 32 or less, and δh is 60% or less of δp <56>. The original plate of the lithographic printing plate described in.
<58> The planographic printing plate original plate according to <56> or <57>, wherein the electron-accepting polymerization initiator contains a compound represented by the following formula (II).
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
 式(II)中、Xはハロゲン原子を表し、Rはアリール基を表す。 In formula (II), X represents a halogen atom and R 3 represents an aryl group.
<59> 上記画像記録層が、バインダーポリマーとしてポリビニルアセタールを更に含有する<1>~<58>のいずれか1つに記載の平版印刷版原版。
<60> 上記画像記録層が、フルオロ脂肪族基含有共重合体を更に含有する<1>~<59>のいずれか1つに記載の平版印刷版原版。
<61> 上記フルオロ脂肪族基含有共重合体が、下記式(F1)及び下記式(F2)のいずれかで表される化合物により形成される構成単位を有する<60>に記載の平版印刷版原版。
<59> The planographic printing plate original plate according to any one of <1> to <58>, wherein the image recording layer further contains polyvinyl acetal as a binder polymer.
<60> The lithographic printing plate original plate according to any one of <1> to <59>, wherein the image recording layer further contains a fluoroaliphatic group-containing copolymer.
<61> The lithographic printing plate according to <60>, wherein the fluoroaliphatic group-containing copolymer has a structural unit formed of a compound represented by any of the following formulas (F1) and (F2). Original version.
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
 式(F1)及び(F2)中、RF1は、それぞれ独立に、水素原子又はメチル基を表し、Xは、それぞれ独立に、酸素原子、硫黄原子、又は-N(RF2)-を表し、mは1~6の整数を表し、nは1~10の整数を表し、lは0~10の整数を表し、RF2は水素原子又は炭素数1~4のアルキル基を表す。 In formulas (F1) and (F2), R F1 independently represents a hydrogen atom or a methyl group, and X independently represents an oxygen atom, a sulfur atom, or -N ( RF2 )-. m represents an integer of 1 ~ 6, n represents an integer of 1 ~ 10, l represents an integer of 0 ~ 10, R F2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
<62> 上記フルオロ脂肪族基含有共重合体が、ポリ(オキシアルキレン)アクリレート及びポリ(オキシアルキレン)メタクリレートよりなる群から選択される少なくとも1種の化合物により形成される構成単位を更に有する<61>に記載の機上現像型平版印刷版原版。
<63> 上記重合性化合物が、エチレン性不飽和結合価が5.0mmol/g以上の化合物を含む<1>~<62>のいずれか1つに記載の機上現像型平版印刷版原版。
<64> 上記エチレン性不飽和結合価が5.0mmol/g以上の化合物が、下記式(I)で表される化合物である<63>に記載の機上現像型平版印刷版原版。
 式(I) : X-(Y)  
 式(I)中、Xは水素結合性基を有するn価の有機基を表し、Yは2以上のエチレン性不飽和基を有する1価の基を表し、nは2以上の整数を表し、Xの分子量/(Yの分子量×n)が1以下である。
<65> 上記エチレン性不飽和結合価が5.0mmol/g以上の化合物が、アダクト構造、ビウレット構造、及びイソシアヌレート構造からなる群より選ばれた少なくとも1種の構造を有する<63>又は<64>に記載の機上現像型平版印刷版原版。
<66> 上記重合性化合物が、エチレン性不飽和基を1つ又は2つ有する化合物を含む<1>~<65>のいずれか1つに記載の機上現像型平版印刷版原版。
<67> 上記アルミニウム支持体が、アルミニウム板と、上記アルミニウム板上に配置されたアルミニウムの陽極酸化皮膜とを有し、上記陽極酸化皮膜が、上記アルミニウム板よりも上記画像記録層側に位置し、上記陽極酸化皮膜が、上記画像記録層側の表面から深さ方向にのびるマイクロポアを有し、上記マイクロポアの上記陽極酸化皮膜表面における平均径が、10nmを超え100nm以下であり、上記陽極酸化皮膜の上記画像記録層側の表面のL表色系における明度Lの値が、70~100である<1>~<66>のいずれか1つに記載の平版印刷版原版。
<68> 上記マイクロポアが、上記陽極酸化皮膜表面から深さ10nm~1,000nmの位置までのびる大径孔部と、上記大径孔部の底部と連通し、連通位置から深さ20nm~2,000nmの位置までのびる小径孔部とから構成され、上記大径孔部の上記陽極酸化皮膜表面における平均径が、15nm~100nmであり、上記小径孔部の上記連通位置における平均径が、13nm以下である<67>に記載の平版印刷版原版。
<69> <1>~<68>のいずれか1つに記載の平版印刷版原版を画像様に露光する工程と、印刷機上で印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して非画像部の画像記録層を除去する工程と、を含む平版印刷版の作製方法。
<70> <1>~<68>のいずれか1つに記載の平版印刷版原版を画像様に露光する工程と、印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去し平版印刷版を作製する工程と、得られた平版印刷版により印刷する工程と、を含む平版印刷方法。
<62> The fluoroaliphatic group-containing copolymer further has a structural unit formed by at least one compound selected from the group consisting of poly (oxyalkylene) acrylate and poly (oxyalkylene) methacrylate <61. > The on-board development type lithographic printing plate original plate described in.
<63> The machine-developed lithographic printing plate original plate according to any one of <1> to <62>, wherein the polymerizable compound contains a compound having an ethylenically unsaturated bond value of 5.0 mmol / g or more.
<64> The machine-developed planographic printing plate original plate according to <63>, wherein the compound having an ethylenically unsaturated bond value of 5.0 mmol / g or more is a compound represented by the following formula (I).
Formula (I): X- (Y) n
In formula (I), X represents an n-valent organic group having a hydrogen-bonding group, Y represents a monovalent group having two or more ethylenically unsaturated groups, and n represents an integer of two or more. The molecular weight of X / (molecular weight of Y × n) is 1 or less.
<65> The compound having an ethylenically unsaturated bond value of 5.0 mmol / g or more has at least one structure selected from the group consisting of an adduct structure, a biuret structure, and an isocyanurate structure <63> or <64> The on-machine development type lithographic printing plate original plate.
<66> The machine-developed lithographic printing plate original plate according to any one of <1> to <65>, wherein the polymerizable compound contains a compound having one or two ethylenically unsaturated groups.
<67> The aluminum support has an aluminum plate and an anodic oxide film of aluminum arranged on the aluminum plate, and the anodic oxide film is located closer to the image recording layer than the aluminum plate. The anodic oxide film has micropores extending in the depth direction from the surface on the image recording layer side, and the average diameter of the micropores on the surface of the anodic oxide film is more than 10 nm and 100 nm or less, and the anode. the lithographic printing according to the value of the lightness L * in the L * a * b * color system of the image recording layer-side surface of the oxide film, any one of which is 70 to 100 <1> to <66> Original version.
<68> The micropore communicates with a large-diameter hole extending from the surface of the anodic oxide film to a depth of 10 nm to 1,000 nm and the bottom of the large-diameter hole, and has a depth of 20 nm to 2 from the communicating position. It is composed of a small-diameter hole extending to a position of 000 nm, the average diameter of the large-diameter hole on the surface of the anodic oxide film is 15 nm to 100 nm, and the average diameter of the small-diameter hole at the communication position is 13 nm. The planographic printing plate original plate according to <67> below.
<69> The step of exposing the lithographic printing plate original plate according to any one of <1> to <68> to an image, and at least one selected from the group consisting of printing ink and dampening water on a printing machine. A method for producing a lithographic printing plate, which includes a step of removing an image recording layer in a non-image area by supplying a lithographic printing plate.
<70> A step of exposing the planographic printing plate original plate according to any one of <1> to <68> to an image, and supplying at least one selected from the group consisting of printing ink and dampening water are supplied. A lithographic printing method including a step of removing an image recording layer of a non-image portion on a printing machine to produce a lithographic printing plate, and a step of printing with the obtained lithographic printing plate.
 本発明の実施形態によれば、UVインキを使用した場合であっても、得られる平版印刷版の耐刷性に優れる平版印刷版原版を提供することができる。
 また、本発明の他の実施形態によれば、上記平版印刷版原版を用いた平版印刷版の作製方法又は平版印刷方法を提供することができる。
According to the embodiment of the present invention, it is possible to provide a lithographic printing plate original plate having excellent printing durability of the obtained lithographic printing plate even when UV ink is used.
Further, according to another embodiment of the present invention, it is possible to provide a method for producing a lithographic printing plate or a lithographic printing method using the lithographic printing plate original plate.
アルミニウム支持体の一実施形態の模式的断面図である。It is a schematic cross-sectional view of one Embodiment of an aluminum support. アルミニウム支持体の別の一実施形態の模式的断面図である。FIG. 3 is a schematic cross-sectional view of another embodiment of an aluminum support. アルミニウム支持体の製造方法における電気化学的粗面化処理に用いられる交番波形電流波形図の一例を示すグラフである。It is a graph which shows an example of the alternating waveform current waveform diagram used for the electrochemical roughening process in the manufacturing method of an aluminum support. アルミニウム支持体の製造方法における交流を用いた電気化学的粗面化処理におけるラジアル型セルの一例を示す側面図である。It is a side view which shows an example of the radial type cell in the electrochemical roughening treatment using alternating current in the manufacturing method of an aluminum support. アルミニウム支持体の作製における陽極酸化処理に用いられる陽極酸化処理装置の概略図である。It is the schematic of the anodizing treatment apparatus used for the anodizing treatment in manufacturing of an aluminum support.
 以下において、本開示の内容について詳細に説明する。以下に記載する構成要件の説明は、本開示の代表的な実施態様に基づいてなされることがあるが、本開示はそのような実施態様に限定されるものではない。
 なお、本明細書において、数値範囲を示す「~」とはその前後に記載される数値を下限値及び上限値として含む意味で使用される。
 本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
 また、本明細書における基(原子団)の表記において、置換及び無置換を記していない表記は、置換基を有さないものと共に置換基を有するものをも包含するものである。例えば「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
 本明細書において、「(メタ)アクリル」は、アクリル及びメタクリルの両方を包含する概念で用いられる語であり、「(メタ)アクリロイル」は、アクリロイル及びメタクリロイルの両方を包含する概念として用いられる語である。
 また、本明細書中の「工程」の用語は、独立した工程だけではなく、他の工程と明確に区別できない場合であっても、その工程の所期の目的が達成されれば本用語に含まれる。 また、本開示において、「質量%」と「重量%」とは同義であり、「質量部」と「重量部」とは同義である。
 更に、本開示において、2以上の好ましい態様の組み合わせは、より好ましい態様である。
 また、本開示における重量平均分子量(Mw)及び数平均分子量(Mn)は、特に断りのない限り、TSKgel GMHxL、TSKgel G4000HxL、TSKgel G2000HxL(何れも東ソー(株)製の商品名)のカラムを使用したゲルパーミエーションクロマトグラフィ(GPC)分析装置により、溶剤THF(テトラヒドロフラン)、示差屈折計により検出し、標準物質としてポリスチレンを用いて換算した分子量である。
 本明細書において、「平版印刷版原版」の用語は、平版印刷版原版だけでなく、捨て版原版を包含する。また、「平版印刷版」の用語は、平版印刷版原版を、必要により、露光、現像などの操作を経て作製された平版印刷版だけでなく、捨て版を包含する。捨て版原版の場合には、必ずしも、露光、現像の操作は必要ない。なお、捨て版とは、例えばカラーの新聞印刷において一部の紙面を単色又は2色で印刷を行う場合に、使用しない版胴に取り付けるための平版印刷版原版である。
 以下、本開示を詳細に説明する。
The contents of the present disclosure will be described in detail below. The description of the constituent elements described below may be based on the representative embodiments of the present disclosure, but the present disclosure is not limited to such embodiments.
In addition, in this specification, "-" indicating a numerical range is used in the meaning of including the numerical values described before and after it as a lower limit value and an upper limit value.
In the numerical range described stepwise in the present disclosure, the upper limit value or the lower limit value described in one numerical range may be replaced with the upper limit value or the lower limit value of another numerical range described stepwise. .. Further, in the numerical range described in the present disclosure, the upper limit value or the lower limit value of the numerical range may be replaced with the value shown in the examples.
Further, in the notation of a group (atomic group) in the present specification, the notation that does not describe substitution and non-substitution includes those having no substituent as well as those having a substituent. For example, the "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In the present specification, "(meth) acrylic" is a term used in a concept that includes both acrylic and methacrylic, and "(meth) acryloyl" is a term that is used as a concept that includes both acryloyl and methacryloyl. Is.
Further, the term "process" in the present specification is not limited to an independent process, and even if it cannot be clearly distinguished from other processes, the term "process" will be used as long as the intended purpose of the process is achieved. included. Further, in the present disclosure, "% by mass" and "% by weight" are synonymous, and "parts by mass" and "parts by weight" are synonymous.
Further, in the present disclosure, a combination of two or more preferred embodiments is a more preferred embodiment.
Unless otherwise specified, the weight average molecular weight (Mw) and the number average molecular weight (Mn) in the present disclosure use columns of TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (all are trade names manufactured by Toso Co., Ltd.). It is a molecular weight converted by detecting with a solvent THF (tetrahydrofuran) and a differential refractometer by a gel permeation chromatography (GPC) analyzer and using polystyrene as a standard substance.
In the present specification, the term "lithographic printing plate original plate" includes not only a lithographic printing plate original plate but also a discarded plate original plate. Further, the term "lithographic printing plate" includes not only a lithographic printing plate produced by subjecting a lithographic printing plate original plate through operations such as exposure and development as necessary, but also a discarded plate. In the case of a discarded original plate, exposure and development operations are not always necessary. The discard plate is a planographic printing plate original plate for attaching to an unused plate cylinder when printing a part of the paper surface in a single color or two colors in, for example, color newspaper printing.
Hereinafter, the present disclosure will be described in detail.
(平版印刷版原版)
 本開示に係る平版印刷版原版は、アルミニウム支持体、及び、上記アルミニウム支持体上に画像記録層を有し、上記画像記録層が、HOMOが-5.2eV以下である赤外線吸収性ポリメチン色素、重合開始剤、及び、重合性化合物を含み、上記画像記録層のエチレン性不飽和結合価が、1.0mmol/g以上である。
 また、本開示に係る平版印刷版原版は、ネガ型平版印刷版原版であり、また、機上現像用平版印刷版原版として好適に用いることができる。
(Planographic printing plate original)
The lithographic printing plate original plate according to the present disclosure has an aluminum support and an image recording layer on the aluminum support, and the image recording layer is an infrared absorbent polymethine dye having a HOMO of −5.2 eV or less. It contains a polymerization initiator and a polymerizable compound, and the ethylenically unsaturated bond value of the image recording layer is 1.0 mmol / g or more.
Further, the lithographic printing plate original plate according to the present disclosure is a negative type lithographic printing plate original plate, and can be suitably used as a lithographic printing plate original plate for on-machine development.
 本発明者らが鋭意検討した結果、上記構成をとることにより、UVインキを使用した場合であっても、得られる平版印刷版の耐刷性に優れる平版印刷版原版を提供できることを見出した。
 上記効果が得られる詳細なメカニズムは不明であるが、以下のように推測される。
 上記に示す特定の酸化電位を有するポリメチン色素を有することで、ラジカル発生効率が高くなり、かつ、画像記録層におけるエチレン性不飽和結合価が高いことにより、重合効率が向上し、耐刷性、特に紫外線硬化性インキ(UVインキ)を用いた場合であっても耐刷性(「UV耐刷性」ともいう。)に優れると推定している。
As a result of diligent studies by the present inventors, it has been found that by adopting the above configuration, it is possible to provide a lithographic printing plate original plate having excellent printing durability of the obtained lithographic printing plate even when UV ink is used.
The detailed mechanism by which the above effect is obtained is unknown, but it is presumed as follows.
By having the polymethine dye having a specific oxidation potential shown above, the radical generation efficiency is high, and the ethylenically unsaturated bond value in the image recording layer is high, so that the polymerization efficiency is improved and the printing resistance is improved. In particular, it is estimated that the printing resistance (also referred to as "UV printing resistance") is excellent even when an ultraviolet curable ink (UV ink) is used.
 また、本開示に係る平版印刷版原版は、画像記録層において、特定の酸化電位を有するポリメチン色素を有し、かつ、エチレン性不飽和結合価が高いことにより、インキの浸透、インキによる溶解及び印刷摩耗等による画像部の目減りが抑制され、UVインキを用いた場合であっても、版飛び抑制性に優れる。
 なお、「版飛び」とは、平版印刷版における画像記録層が膜減りを起こし部分的にインキがつかなくなる現象を指す。平版印刷版における「版飛び」を起こすまでの印刷枚数が、「版飛びが発生しにくい」ことを示す指標となる。
 更に、本開示に係る平版印刷版原版は、画像記録層において、特定の酸化電位を有するポリメチン色素を有し、かつ、エチレン性不飽和結合価が高いことにより、機上現像性、及び、特色着肉性(特色インキの着肉性)にも優れる。
 特色インキは、イエロー、マゼンタ又はシアン色調インキ以外のインキであり、例えば、レッド、グリーン、ブルー、ホワイト又はメタリックインキ等の色調インキ又は無色のクリアインキ等が挙げられる。
Further, the lithographic printing plate original plate according to the present disclosure has a polymethine dye having a specific oxidation potential in the image recording layer and has a high ethylenically unsaturated bond value, so that the ink penetrates, dissolves with the ink, and The loss of the image portion due to printing wear and the like is suppressed, and even when UV ink is used, the plate skipping property is excellent.
In addition, "plate skipping" refers to a phenomenon in which the image recording layer in a lithographic printing plate is thinned and the ink is partially lost. The number of printed sheets until "plate skipping" occurs in a lithographic printing plate is an index indicating that "plate skipping is unlikely to occur".
Further, the lithographic printing plate original plate according to the present disclosure has a polymethine dye having a specific oxidation potential in the image recording layer, and has a high ethylenically unsaturated bond value, so that it has on-machine developability and features. It also has excellent fleshing properties (spot color fleshing properties).
The spot color ink is an ink other than the yellow, magenta, or cyan color tone ink, and examples thereof include color tone inks such as red, green, blue, white, and metallic inks, and colorless clear inks.
<画像記録層>
 本開示に係る平版印刷版原版は、HOMOが-5.2eV以下である赤外線吸収性ポリメチン色素、重合開始剤、及び、重合性化合物を含む画像記録層を有し、上記画像記録層のエチレン性不飽和結合価が、1.0mmol/g以上である。
 本開示における画像記録層は、ネガ型画像記録層であり、水溶性又は水分散性のネガ型画像記録層であることが好ましい。
 また、本開示における画像記録層は、機上現像型画像記録層であることが好ましい。
 更に、本開示における画像記録層は、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、最外層であることが好ましい。
<Image recording layer>
The lithographic printing plate original plate according to the present disclosure has an image recording layer containing an infrared absorbing polymethine dye having a HOMO of -5.2 eV or less, a polymerization initiator, and a polymerizable compound, and has an ethylenic property of the image recording layer. The unsaturated bond value is 1.0 mmol / g or more.
The image recording layer in the present disclosure is a negative image recording layer, and is preferably a water-soluble or water-dispersible negative image recording layer.
Further, the image recording layer in the present disclosure is preferably an on-board development type image recording layer.
Further, the image recording layer in the present disclosure is preferably the outermost layer from the viewpoint of UV printing resistance, UV plate skipping inhibitory property, and special color carving property.
 本開示における画像記録層のエチレン性不飽和結合価は、1.0mmol/g以上であり、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、1.5mmol/g以上であることが好ましく、2.0mmol/g以上であることがより好ましく、2.5mmol/g以上であることが更に好ましく、3.7mmol/g以上であることが特に好ましい。
 上記画像記録層のエチレン性不飽和結合価の上限は、特に限定されないが、10mmol/g以下であることが好ましく、8mmol/g以下であることがより好ましい。
The ethylenically unsaturated bond value of the image recording layer in the present disclosure is 1.0 mmol / g or more, and is 1.5 mmol / g from the viewpoint of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property. The above is preferable, 2.0 mmol / g or more is more preferable, 2.5 mmol / g or more is further preferable, and 3.7 mmol / g or more is particularly preferable.
The upper limit of the ethylenically unsaturated bond value of the image recording layer is not particularly limited, but is preferably 10 mmol / g or less, and more preferably 8 mmol / g or less.
 本開示における画像記録層におけるエチレン性不飽和結合価は、画像記録層1g当たりのエチレン性不飽和結合のモル数を表すものである。ただし、本開示においては、エチレン性不飽和基を有するポリマー粒子におけるエチレン性不飽和結合は、上記エチレン性不飽和結合価に含めないものとする。
 また、本開示における画像記録層におけるエチレン性不飽和結合価は、画像記録層1g当たりに含まれるエチレン性不飽和化合物、及び、エチレン性不飽和基を有するポリマー(ポリマー粒子は除く。)の各含有量、及び、各構造を同定し、計算により、画像記録層1g当たりのエチレン性不飽和結合のモル数を算出するものとする。
The ethylenically unsaturated bond value in the image recording layer in the present disclosure represents the number of moles of ethylenically unsaturated bond per 1 g of the image recording layer. However, in the present disclosure, the ethylenically unsaturated bond in the polymer particles having an ethylenically unsaturated group is not included in the ethylenically unsaturated bond value.
Further, the ethylenically unsaturated bond value in the image recording layer in the present disclosure is determined by each of the ethylenically unsaturated compound contained in 1 g of the image recording layer and the polymer having an ethylenically unsaturated group (excluding polymer particles). The content and each structure shall be identified, and the number of moles of ethylenically unsaturated bonds per 1 g of the image recording layer shall be calculated by calculation.
 本開示における画像記録層は、後述する、エチレン性不飽和基を有するポリマー粒子を含むことが好ましい。
 また、上記画像記録層における重合性化合物として、上記範囲のエチレン性不飽和結合価とするため、5官能以上の重合性化合物を、重合性化合物の全質量に対し、50質量%以上含むことが好ましく、70質量%以上含むことがより好ましく、80質量%以上含むことが更に好ましく、90質量%以上含むことが特に好ましい。
 更に、本開示における画像記録層は、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、10官能以上の重合性化合物を含むことが好ましく、12官能以上の重合性化合物を含むことがより好ましく、15官能以上の重合性化合物を含むことが特に好ましい。
 更にまた、本開示における画像記録層は、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、5官能以上の重合性化合物、及び、エチレン性不飽和基を有するポリマー粒子を含むことが好ましい。
 以下、画像記録層に含まれる各成分の詳細について説明する。
The image recording layer in the present disclosure preferably contains polymer particles having an ethylenically unsaturated group, which will be described later.
Further, as the polymerizable compound in the image recording layer, in order to have an ethylenically unsaturated bond value in the above range, a polymerizable compound having a pentafunctionality or higher may be contained in an amount of 50% by mass or more based on the total mass of the polymerizable compound. It is preferable to contain 70% by mass or more, more preferably 80% by mass or more, and particularly preferably 90% by mass or more.
Further, the image recording layer in the present disclosure preferably contains a polymerizable compound having 10 or more functionalities, and has a polymerizable compound of 12 or more functionalities, from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and special color carving property. It is more preferable to contain a compound, and it is particularly preferable to contain a polymerizable compound having 15 or more functionalities.
Furthermore, the image recording layer in the present disclosure is a polymerizable compound having five or more functionalities and a polymer having an ethylenically unsaturated group from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and special color carving property. It preferably contains particles.
Hereinafter, details of each component contained in the image recording layer will be described.
-赤外線吸収性ポリメチン色素-
 上記画像記録層は、HOMO(最高被占軌道)が-5.2eV以下である赤外線吸収性ポリメチン色素(「特定ポリメチン色素」ともいう。)を含む。
 特定ポリメチン色素のHOMOは、-5.2eV以下であり、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、-5.25eV以下であることが好ましく、-5.3eV以下であることがより好ましく、-6.0eV以上-5.3eV以下であることが更に好ましく、-5.6eV以上-5.3eV以下であることが特に好ましい。
-Infrared absorbing polymethine dye-
The image recording layer contains an infrared-absorbing polymethine dye (also referred to as "specific polymethin dye") having a HOMO (maximum occupied orbital) of −5.2 eV or less.
The HOMO of the specific polymethine dye is −5.2 eV or less, and is preferably −5.25 eV or less from the viewpoint of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property. It is more preferably 3 eV or less, further preferably -6.0 eV or more and -5.3 eV or less, and particularly preferably -5.6 eV or more and -5.3 eV or less.
 本開示において、最高被占軌道(HOMO)及び最低空軌道(LUMO)の計算は、以下の方法により行う。
 まず、計算対象となる化合物における遊離の対イオンは計算対象から除外する。例えば、カチオン性の一電子受容型重合開始剤、カチオン性の赤外線吸収剤では対アニオンを、アニオン性の一電子供与型重合開始剤では対カチオンをそれぞれ計算対象から除外する。ここでいう遊離とは、対象とする化合物とその対イオンが共有結合で連結されていないことを意味する。
 量子化学計算ソフトウェアGaussian09を用い、構造最適化はDFT(B3LYP/6-31G(d))で行う。
 MO(分子軌道)エネルギー計算は、上記構造最適化で得た構造でDFT(B3LYP/6-31+G(d,p)/CPCM(solvent=methanol))で行う。
 上記MOエネルギー計算で得られたMOエネルギーEbare(単位:hartree)を以下の公式により、本開示においてHOMO及びLUMOの値として用いるEscaled(単位:eV)へ変換する。
  Escaled=0.823168×27.2114×Ebare-1.07634
 なお、27.2114は単にhartreeをeVに変換するための係数であり、0.823168と-1.07634とは調節係数であり、計算対象となる化合物のHOMOとLUMOとを計算が実測の値に合うように定める。
In the present disclosure, the highest occupied orbital (HOMO) and the lowest empty orbital (LUMO) are calculated by the following methods.
First, free counterions in the compound to be calculated are excluded from the calculation. For example, the cationic one-electron accepting polymerization initiator and the cationic infrared absorber exclude the counter anion, and the anionic one-electron donating polymerization initiator excludes the counter cation from the calculation target. The term "free" as used herein means that the target compound and its counterion are not covalently linked.
Quantum chemistry calculation software Gaussian09 is used, and structural optimization is performed by DFT (B3LYP / 6-31G (d)).
The MO (molecular orbital) energy calculation is performed by DFT (B3LYP / 6-31 + G (d, p) / CPCM (solvent = methanol)) with the structure obtained by the above structure optimization.
The MO energy Ebare (unit: hartree) obtained by the above MO energy calculation is converted into Escaled (unit: eV) used as the values of HOMO and LUMO in the present disclosure by the following formula.
Escaled = 0.823168 x 27.2114 x Ebare-1.07634
Note that 27.2114 is simply a coefficient for converting hartree to eV, 0.823168 and −1.07634 are adjustment coefficients, and HOMO and LUMO of the compound to be calculated are calculated values. Determine to suit.
 特定ポリメチン色素としては、ポリメチン鎖を有する色素が挙げられる。中でも、シアニン色素、ピリリウム色素、チオピリリウム色素、アズレニウム色素等が好ましく挙げられ、入手の容易性、導入反応時の溶剤溶解性等の観点から、シアニン色素であることが好ましい。
 また、特定ポリメチン色素は、顔料であっても、染料であってもよい。
Examples of the specific polymethine pigment include pigments having a polymethine chain. Among them, cyanine pigments, pyrylium pigments, thiopyrylium pigments, azulenium pigments and the like are preferably mentioned, and cyanine pigments are preferable from the viewpoint of easy availability, solvent solubility at the time of introduction reaction and the like.
Further, the specific polymethine dye may be a pigment or a dye.
 上記ポリメチン色素は、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、両末端の芳香環の少なくとも一方に電子求引性基又は重原子含有基を有するシアニン色素を含むことが好ましく、両末端の芳香環の少なくとも一方にハロゲン原子、アルコキシカルボニル基又はアリーロキシカルボニル基を有するシアニン色素を含むことがより好ましく、両末端の芳香環の少なくとも一方にハロゲン原子を有するシアニン色素を含むことが更に好ましく、両末端の芳香環の少なくとも一方に塩素原子を有するシアニン色素を含むことが特に好ましい。
 また、上記ポリメチン色素は、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、両末端の芳香環それぞれに電子求引性基又は重原子含有基を有するシアニン色素を含むことが好ましい。
 更に、上記ポリメチン色素は、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、両末端の芳香環の少なくとも一方に電子求引性基を有するシアニン色素を含むことが好ましい。なお、本開示において、電子求引性基及び重原子含有基の両方に該当する基である場合、重原子を含有する電子求引性基は、電子求引性基として扱うものとする。
The above-mentioned polymethine dye is a cyanine dye having an electron-attracting group or a heavy atom-containing group on at least one of the aromatic rings at both ends from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property. It is preferable to contain a cyanine dye having a halogen atom, an alkoxycarbonyl group or an aryloxycarbonyl group in at least one of the aromatic rings at both ends, and it is more preferable to contain a cyanine having a halogen atom in at least one of the aromatic rings at both ends. It is more preferable to contain a dye, and it is particularly preferable to contain a cyanine dye having a chlorine atom in at least one of the aromatic rings at both ends.
Further, the polymethine dye is a cyanine dye having an electron-attracting group or a heavy atom-containing group in each of the aromatic rings at both ends from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property. It is preferable to include it.
Further, the polymethine dye may contain a cyanine dye having an electron-attracting group in at least one of the aromatic rings at both ends from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property. preferable. In the present disclosure, when the group corresponds to both an electron-attracting group and a heavy atom-containing group, the electron-attracting group containing a heavy atom shall be treated as an electron-attracting group.
 上記電子求引性基としては、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、Hammettの置換基定数σpara値が0.01以上である基が好ましく、σpara値が0.05以上である基がより好ましく、σpara値が0.20以上である基が更に好ましく、σpara値が0.30以上である基が特に好ましい。
 σpara値が0.05以上の基としては、例えば、フッ素原子(0.06)、塩素原子(0.30)、臭素原子(0.27)、ヨウ素原子(0.30)等のハロゲン原子;-CHO(0.22)、-COCH(0.50)、-COC(0.46)、-CONH(0.36)、-COO(0.30)、-COOH(0.41)、-COOCH(0.39)、-COOC(0.45)等のカルボニル置換基;-SOCH(0.49)、-SOCH(0.72)、-SO、-SOCF(0.93)、-SONH(0.57)、-SOOC、-SO (0.09)、-SOH(0.50)等のスルホニル置換基又はスルフィニル置換基;-CN(0.01)、-N(CH (0.82)、-N(CF(0.53)等の含窒素置換基;-CCl、-CHCl(0.18)、-CHCl、-CF(0.54)等のハロゲン原子含有置換基が挙げられる。なお、上記括弧内の数値は各化合物のσpara値である。
As the electron-attracting group, a group having a Hammett substituent constant σpara value of 0.01 or more is preferable, and a σpara value is preferable from the viewpoint of UV printing resistance, UV plate skipping inhibitory property, and characteristic color-forming property. A group having a σpara value of 0.05 or more is more preferable, a group having a σpara value of 0.20 or more is further preferable, and a group having a σpara value of 0.30 or more is particularly preferable.
Examples of groups having a σpara value of 0.05 or more include halogen atoms such as fluorine atom (0.06), chlorine atom (0.30), bromine atom (0.27), and iodine atom (0.30); -CHO (0.22), - COCH 3 (0.50), - COC 6 H 5 (0.46), - CONH 2 (0.36), - COO - (0.30), - COOH (0 .41), carbonyl substituents such as -COOCH 3 (0.39), -COOC 2 H 5 (0.45); -SOCH 3 (0.49), -SO 2 CH 3 (0.72),- SO 2 C 6 H 5, -SO 2 CF 3 (0.93), - SO 2 NH 2 (0.57), - SO 2 OC 6 H 5, -SO 3 - (0.09), - SO 3 A sulfonyl or sulfinyl substituent such as H (0.50); -CN (0.01), -N (CH 3 ) 3 + (0.82), -N (CF 3 ) 2 (0.53) Nitrogen-containing substituents such as-CCl 3 , -CH 2 Cl (0.18), -CHCl 2 , -CF 3 (0.54) and the like. The numerical value in parentheses is the σpara value of each compound.
 このような電子求引性基の好適な具体例としては、例えば、非共有電子対を有する置換基が挙げられる。非共有電子対を有する置換基としては、例えば、ハロゲン原子、カルボニル基を有する基、スルホニル基を有する基、スルフィニル基を有する基、エーテル結合を有する基が挙げられる。中でも、ハロゲン原子、又は、カルボニル基を有する基が好ましく、ハロゲン原子、アルコキシカルボニル基、又は、アリーロキシカルボニル基がより好ましく、ハロゲン原子が更に好ましく、塩素原子が特に好ましい。
 カルボニル基を有する基としては、具体的には、例えば、アセチル基、ベンゾイル基等のアシル基;メトキシカルボニル基、トルイルオキシカルボニル基等のアルコキシカルボニル基又はアリールオキシカルボニル基;ジエチルアミノカルボニル基等のアミド基;カルボキシ基が挙げられる。これらは二価以上の連結基を介して、シアニン色素の芳香環またはヘテロ環に結合していてもよい。
Preferable specific examples of such an electron-attracting group include, for example, a substituent having an unshared electron pair. Examples of the substituent having an unshared electron pair include a halogen atom, a group having a carbonyl group, a group having a sulfonyl group, a group having a sulfinyl group, and a group having an ether bond. Among them, a halogen atom or a group having a carbonyl group is preferable, a halogen atom, an alkoxycarbonyl group or an aryloxycarbonyl group is more preferable, a halogen atom is further preferable, and a chlorine atom is particularly preferable.
Specific examples of the group having a carbonyl group include an acyl group such as an acetyl group and a benzoyl group; an alkoxycarbonyl group such as a methoxycarbonyl group and a toluyloxycarbonyl group, or an aryloxycarbonyl group; an amide such as a diethylaminocarbonyl group. Group; carboxy group is mentioned. These may be attached to the aromatic ring or heterocycle of the cyanine dye via a divalent or higher linking group.
 本開示において、「重原子含有基」とは、原子量28以上の原子を含む基を意味する。原子量28以上の原子としては、例えば、ケイ素原子(28.09)、リン原子(30.97)、硫黄原子(32.07)、塩素原子(35.45)、ゲルマニウム原子(72.61)、ヒ素原子(74.92)、セレン原子(78.96)、臭素原子(79.90)、スズ原子(118.71)、アンチモン原子(121.76)、テルル原子(127.60)、ヨウ素原子(126.90)が好適に挙げられる。なお、上記括弧内の数値は、各原子の原子量である。
 中でも、安全性及び原料入手性の観点から、ケイ素原子、リン原子、又は、ハロゲン原子を含む基が好ましい。
 これらの原子量28以上の原子を含む基(重原子含有基)は、単独で、又は、他の原子と組み合わされて、シアニン色素の芳香環上の置換基となることが好ましい。また、そのような置換基は二価以上の連結基を介して、シアニン色素の芳香環に結合していてもよい。
In the present disclosure, the "heavy atom-containing group" means a group containing an atom having an atomic weight of 28 or more. Examples of atoms having an atomic weight of 28 or more include silicon atom (28.09), phosphorus atom (30.97), sulfur atom (32.07), chlorine atom (35.45), germanium atom (72.61), and the like. Arsenic atom (74.92), selenium atom (78.96), bromine atom (79.90), tin atom (118.71), antimony atom (121.76), tellurium atom (127.60), iodine atom (126.90) is preferably mentioned. The numerical value in parentheses is the atomic weight of each atom.
Of these, a group containing a silicon atom, a phosphorus atom, or a halogen atom is preferable from the viewpoint of safety and availability of raw materials.
It is preferable that these groups containing atoms having an atomic weight of 28 or more (heavy atom-containing groups) become substituents on the aromatic ring of the cyanine dye alone or in combination with other atoms. Further, such a substituent may be bonded to the aromatic ring of the cyanine dye via a divalent or higher valent linking group.
 ケイ素原子を含む基としては、例えば、トリメチルシリル基、t-ブチルジメチルシリル基、ジメチルフェニルシリル基等のアルキル基又はアリール基をケイ素原子上に有する基が挙げられる。
 リン原子を含む基としては、例えば、ジメチルホスフィノ基、ジフェニルホスフィノ基等のアルキル基又はアリール基をリン原子上に有する基;フォスフォノ基が挙げられる。
 硫黄原子を含む基としては、上記電子求引性基と一部重複するが、例えば、メチルスルホニル基、フェニルスルホニル基等のアルキルスルホニル基又はアリールスルホニル基;エチルスルフィニル基、トルイルスルフィニル基等のアルキルスルフィニル基又はアリールスルフィニル基;スルホ基、スルフィノ基、スルフェノ基等の硫黄酸基又はその塩若しくはそのエステル誘導体;メチルチオ基、フェニルチオ基等のアルキルチオ基又はアリールチオ基が挙げられる。
 ハロゲン原子を含む基としては、上記電子求引性基と一部重複するが、例えば、ハロゲン原子、ハロゲン置換アルキル基、ハロゲン置換アリール基が挙げられる。
Examples of the group containing a silicon atom include an alkyl group such as a trimethylsilyl group, a t-butyldimethylsilyl group, and a dimethylphenylsilyl group, or a group having an aryl group on the silicon atom.
Examples of the group containing a phosphorus atom include a group having an alkyl group such as a dimethylphosphino group and a diphenylphosphino group or an aryl group on the phosphorus atom; a phosphono group.
The group containing a sulfur atom partially overlaps with the above-mentioned electron-attracting group, but for example, an alkylsulfonyl group such as a methylsulfonyl group or a phenylsulfonyl group or an arylsulfonyl group; an alkyl such as an ethylsulfinyl group or a toluylsulfinyl group. Sulfinyl group or arylsulfinyl group; sulfur acid group such as sulfo group, sulfino group, sulfeno group or salt thereof or ester derivative thereof; alkylthio group or arylthio group such as methylthio group and phenylthio group can be mentioned.
Examples of the group containing a halogen atom include a halogen atom, a halogen-substituted alkyl group, and a halogen-substituted aryl group, which partially overlap with the above-mentioned electron-attracting group.
 特定ポリメチン色素の具体例としては、下記の示すもののうち、HOMOが-5.2eV以下であるものが挙げられる。
 シアニン色素の具体例としては、特開2001-133969号公報の段落0017~0019に記載の化合物、特開2002-023360号公報の段落0016~0021、特開2002-040638号公報の段落0012~0037に記載の化合物、好ましくは特開2002-278057号公報の段落0034~0041、特開2008-195018号公報の段落0080~0086に記載の化合物、特に好ましくは特開2007-90850号公報の段落0035~0043に記載の化合物、特開2012-206495号公報の段落0105~0113に記載の化合物が挙げられる。
 また、特開平5-5005号公報の段落0008~0009、特開2001-222101号公報の段落0022~0025に記載の化合物も好ましく使用することができる。
 顔料としては、特開2008-195018号公報の段落0072~0076に記載の化合物が好ましい。
 また、特定ポリメチン色素として、赤外線露光により分解するポリメチン色素(「分解性ポリメチン色素」ともいう。)も好適に用いることができる。
 赤外線露光により分解するポリメチン色素としては、特表2008-544322号公報、国際公開第2016/027886号、国際公開第2017/141882号、又は、国際公開第2018/043259号に記載のものを好適に用いることができる。
Specific examples of the specific polymethine dye include those having a HOMO of -5.2 eV or less among those shown below.
Specific examples of the cyanine dye include the compounds described in paragraphs 0017 to 0019 of JP-A-2001-133769, paragraphs 0016 to 0021 of JP-A-2002-0233360, and paragraphs 0012 to 0037 of JP-A-2002-040638. , Preferably the compounds described in paragraphs 0034 to 0041 of JP-A-2002-278057, paragraphs 0080-0086 of JP-A-2008-195018, and particularly preferably paragraphs 0035 of JP-A-2007-90850. Examples thereof include the compounds described in 0043 and the compounds described in paragraphs 0105 to 0113 of JP2012-206495A.
Further, the compounds described in paragraphs 0008 to 0009 of JP-A-5-5005 and paragraphs 0022 to 0025 of JP-A-2001-222101 can also be preferably used.
As the pigment, the compounds described in paragraphs 0072 to 0076 of JP-A-2008-195018 are preferable.
Further, as the specific polymethine dye, a polymethine dye that decomposes by infrared exposure (also referred to as “degradable polymethine dye”) can be preferably used.
As the polymethine dye decomposed by infrared exposure, those described in Japanese Patent Publication No. 2008-544322, International Publication No. 2016/027886, International Publication No. 2017/141882, or International Publication No. 2018/0432559 are preferably used. Can be used.
 特定ポリメチン色素は、1種のみ用いてもよいし、2種以上を併用してもよい。また、特定ポリメチン色素として顔料と染料とを併用してもよい。
 上記画像記録層中の特定ポリメチン色素の含有量は、画像記録層の全質量に対し、0.1質量%~10.0質量%が好ましく、0.5質量%~5.0質量%がより好ましい。
Only one type of specific polymethine dye may be used, or two or more types may be used in combination. Further, the pigment and the dye may be used in combination as the specific polymethine dye.
The content of the specific polymethine dye in the image recording layer is preferably 0.1% by mass to 10.0% by mass, more preferably 0.5% by mass to 5.0% by mass, based on the total mass of the image recording layer. preferable.
-重合開始剤-
 本開示に係る平版印刷版原版における画像記録層は、重合開始剤を含む。
 また、重合開始剤としては、電子受容型重合開始剤を含むことが好ましく、電子受容型重合開始剤、及び、電子供与型重合開始剤を含むことがより好ましい。
-Polymer initiator-
The image recording layer in the lithographic printing plate original plate according to the present disclosure contains a polymerization initiator.
The polymerization initiator preferably contains an electron-accepting polymerization initiator, and more preferably contains an electron-accepting polymerization initiator and an electron-donating polymerization initiator.
<<電子受容型重合開始剤>>
 上記画像記録層は、重合開始剤として、電子受容型重合開始剤を含むことが好ましい。
 電子受容型重合開始剤は、赤外線露光により赤外線吸収剤の電子が励起した際に、分子間電子移動で一電子を受容することにより、ラジカル等の重合開始種を発生する化合物である。
 本開示に用いられる電子受容型重合開始剤は、光、熱あるいはその両方のエネルギーによりラジカルやカチオン等の重合開始種を発生する化合物であって、公知の熱重合開始剤、結合解離エネルギーの小さな結合を有する化合物、光重合開始剤などを適宜選択して用いることができる。
 電子受容型重合開始剤としては、ラジカル重合開始剤が好ましく、オニウム塩化合物がより好ましい。
 また、電子受容型重合開始剤としては、赤外線感光性重合開始剤であることが好ましい。
 電子受容型ラジカル重合開始剤としては、例えば、(a)有機ハロゲン化物、(b)カルボニル化合物、(c)アゾ化合物、(d)有機過酸化物、(e)メタロセン化合物、(f)アジド化合物、(g)ヘキサアリールビイミダゾール化合物、(i)ジスルホン化合物、(j)オキシムエステル化合物、(k)オニウム塩化合物が挙げられる。
<< Electron-accepting polymerization initiator >>
The image recording layer preferably contains an electron-accepting polymerization initiator as the polymerization initiator.
The electron-accepting polymerization initiator is a compound that generates a polymerization initiator such as a radical by accepting one electron by electron transfer between molecules when the electrons of the infrared absorber are excited by infrared exposure.
The electron-accepting polymerization initiator used in the present disclosure is a compound that generates a polymerization initiator such as a radical or a cation by energy of light, heat, or both, and is a known thermal polymerization initiator and has a small bond dissociation energy. A compound having a bond, a photopolymerization initiator and the like can be appropriately selected and used.
As the electron-accepting polymerization initiator, a radical polymerization initiator is preferable, and an onium salt compound is more preferable.
The electron-accepting polymerization initiator is preferably an infrared photosensitive polymerization initiator.
Examples of the electron-accepting radical polymerization initiator include (a) an organic halide, (b) a carbonyl compound, (c) an azo compound, (d) an organic peroxide, (e) a metallocene compound, and (f) an azide compound. , (G) hexaarylbiimidazole compounds, (i) disulfone compounds, (j) oxime ester compounds, and (k) onium salt compounds.
 (a)有機ハロゲン化物としては、例えば、特開2008-195018号公報の段落0022~0023に記載の化合物が好ましい。
 (b)カルボニル化合物としては、例えば、特開2008-195018号公報の段落0024に記載の化合物が好ましい。
 (c)アゾ化合物としては、例えば、特開平8-108621号公報に記載のアゾ化合物等を使用することができる。
 (d)有機過酸化物としては、例えば、特開2008-195018号公報の段落0025に記載の化合物が好ましい。
 (e)メタロセン化合物としては、例えば、特開2008-195018号公報の段落0026に記載の化合物が好ましい。
 (f)アジド化合物としては、例えば、2,6-ビス(4-アジドベンジリデン)-4-メチルシクロヘキサノン等の化合物を挙げることができる。
 (g)ヘキサアリールビイミダゾール化合物としては、例えば、特開2008-195018号公報の段落0027に記載の化合物が好ましい。
 (i)ジスルホン化合物としては、例えば、特開昭61-166544号、特開2002-328465号の各公報に記載の化合物が挙げられる。
 (j)オキシムエステル化合物としては、例えば、特開2008-195018号公報の段落0028~0030に記載の化合物が好ましい。
As the (a) organic halide, for example, the compounds described in paragraphs 0022 to 0023 of JP-A-2008-195018 are preferable.
(B) As the carbonyl compound, for example, the compound described in paragraph 0024 of JP-A-2008-195018 is preferable.
(C) As the azo compound, for example, the azo compound described in JP-A-8-108621 can be used.
(D) As the organic peroxide, for example, the compound described in paragraph 0025 of JP-A-2008-195018 is preferable.
(E) As the metallocene compound, for example, the compound described in paragraph 0026 of JP-A-2008-195018 is preferable.
Examples of the (f) azide compound include compounds such as 2,6-bis (4-azidobenzylidene) -4-methylcyclohexanone.
(G) As the hexaarylbiimidazole compound, for example, the compound described in paragraph 0027 of JP-A-2008-195018 is preferable.
(I) Examples of the disulfon compound include the compounds described in JP-A-61-166544 and JP-A-2002-328465.
As the (j) oxime ester compound, for example, the compounds described in paragraphs 0028 to 0030 of JP-A-2008-195018 are preferable.
 上記電子受容型重合開始剤の中でも好ましいものとして、硬化性の観点から、オキシムエステル化合物及びオニウム塩化合物が挙げられる。中でも、耐刷性の観点から、ヨードニウム塩化合物、スルホニウム塩化合物又はアジニウム塩化合物が好ましく、ヨードニウム塩化合物又はスルホニウム塩化合物がより好ましく、ヨードニウム塩化合物が特に好ましい。
 これら化合物の具体例を以下に示すが、本開示はこれに限定されるものではない。
Among the above-mentioned electron-accepting polymerization initiators, oxime ester compounds and onium salt compounds are preferable from the viewpoint of curability. Among them, from the viewpoint of printing resistance, an iodonium salt compound, a sulfonium salt compound or an azinium salt compound is preferable, an iodonium salt compound or a sulfonium salt compound is more preferable, and an iodonium salt compound is particularly preferable.
Specific examples of these compounds are shown below, but the present disclosure is not limited thereto.
 ヨードニウム塩化合物の例としては、ジアリールヨードニウム塩化合物が好ましく、特に電子供与性基、例えば、アルキル基又はアルコキシル基で置換されたジフェニルヨードニウム塩化合物がより好ましく、また、非対称のジフェニルヨードニウム塩化合物が好ましい。具体例としては、ジフェニルヨードニウム=ヘキサフルオロホスファート、4-メトキシフェニル-4-(2-メチルプロピル)フェニルヨードニウム=ヘキサフルオロホスファート、4-(2-メチルプロピル)フェニル-p-トリルヨードニウム=ヘキサフルオロホスファート、4-ヘキシルオキシフェニル-2,4,6-トリメトキシフェニルヨードニウム=ヘキサフルオロホスファート、4-ヘキシルオキシフェニル-2,4-ジエトキシフェニルヨードニウム=テトラフルオロボラート、4-オクチルオキシフェニル-2,4,6-トリメトキシフェニルヨードニウム=1-ペルフルオロブタンスルホナート、4-オクチルオキシフェニル-2,4,6-トリメトキシフェニルヨードニウム=ヘキサフルオロホスファート、ビス(4-t-ブチルフェニル)ヨードニウム=ヘキサフルオロホスファートが挙げられる。 As an example of the iodonium salt compound, a diaryl iodonium salt compound is preferable, a diphenyl iodonium salt compound substituted with an electron donating group such as an alkyl group or an alkoxyl group is more preferable, and an asymmetric diphenyl iodonium salt compound is preferable. .. Specific examples include diphenyliodonium = hexafluorophosphate, 4-methoxyphenyl-4- (2-methylpropyl) phenyliodonium = hexafluorophosphate, 4- (2-methylpropyl) phenyl-p-tolyliodonium = hexa. Fluorophosphate, 4-hexyloxyphenyl-2,4,6-trimethoxyphenyliodonium = hexafluorophosphate, 4-hexyloxyphenyl-2,4-diethoxyphenyliodonium = tetrafluoroborate, 4-octyloxy Phenyl-2,4,6-trimethoxyphenyliodonium = 1-perfluorobutane sulfonate, 4-octyloxyphenyl-2,4,6-trimethoxyphenyliodonium = hexafluorophosphate, bis (4-t-butylphenyl) ) Iodonium = hexafluorophosphate can be mentioned.
 スルホニウム塩化合物の例としては、トリアリールスルホニウム塩化合物が好ましく、特に電子求引性基、例えば、芳香環上の基の少なくとも一部がハロゲン原子で置換されたトリアリールスルホニウム塩化合物が好ましく、芳香環上のハロゲン原子の総置換数が4以上であるトリアリールスルホニウム塩化合物が更に好ましい。具体例としては、トリフェニルスルホニウム=ヘキサフルオロホスファート、トリフェニルスルホニウム=ベンゾイルホルマート、ビス(4-クロロフェニル)フェニルスルホニウム=ベンゾイルホルマート、ビス(4-クロロフェニル)-4-メチルフェニルスルホニウム=テトラフルオロボラート、トリス(4-クロロフェニル)スルホニウム=3,5-ビス(メトキシカルボニル)ベンゼンスルホナート、トリス(4-クロロフェニル)スルホニウム=ヘキサフルオロホスファート、トリス(2,4-ジクロロフェニル)スルホニウム=ヘキサフルオロホスファートが挙げられる。 As an example of the sulfonium salt compound, a triarylsulfonium salt compound is preferable, and in particular, an electron-attracting group, for example, a triarylsulfonium salt compound in which at least a part of a group on the aromatic ring is substituted with a halogen atom is preferable, and aromatic. A triarylsulfonium salt compound having a total number of halogen atoms substituted on the ring of 4 or more is more preferable. Specific examples include triphenylsulfonium = hexafluorophosphate, triphenylsulfonium = benzoylformate, bis (4-chlorophenyl) phenylsulfonium = benzoylformate, and bis (4-chlorophenyl) -4-methylphenylsulfonium = tetrafluoro. Borate, Tris (4-chlorophenyl) Sulfonium = 3,5-bis (methoxycarbonyl) Benzene Sulfonium, Tris (4-chlorophenyl) Sulfonium = Hexafluorophosphate, Tris (2,4-dichlorophenyl) Sulfonium = Hexafluorophos Fert can be mentioned.
 また、ヨードニウム塩化合物及びスルホニウム塩化合物の対アニオンとしては、スルホンアミドアニオン又はスルホンイミドアニオンが好ましく、スルホンイミドアニオンがより好ましい。
 スルホンアミドアニオンとしては、アリールスルホンアミドアニオンが好ましい。
 また、スルホンイミドアニオンとしては、ビスアリールスルホンイミドアニオンが好ましい。
 スルホンアミドアニオン又はスルホンイミドアニオンの具体例を以下に示すが、本開示はこれらに限定されるものではない。下記具体例中、Phはフェニル基を、Meはメチル基を、Etはエチル基を、それぞれ表す。
Further, as the counter anion of the iodonium salt compound and the sulfonium salt compound, a sulfonamide anion or a sulfonimide anion is preferable, and a sulfonimide anion is more preferable.
As the sulfonamide anion, an aryl sulfonamide anion is preferable.
Further, as the sulfonimide anion, a bisaryl sulfonimide anion is preferable.
Specific examples of the sulfonamide anion or the sulfonamide anion are shown below, but the present disclosure is not limited thereto. In the specific examples below, Ph represents a phenyl group, Me represents a methyl group, and Et represents an ethyl group.
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 また、上記電子受容型重合開始剤は、現像性、及び、得られる平版印刷版におけるUV耐刷性の観点から、下記式(II)で表される化合物を含んでいてもよい。 Further, the electron-accepting polymerization initiator may contain a compound represented by the following formula (II) from the viewpoint of developability and UV printing resistance in the obtained lithographic printing plate.
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
 式(II)中、Xはハロゲン原子を表し、Rはアリール基を表す。 In formula (II), X represents a halogen atom and R 3 represents an aryl group.
 式(II)におけるXとしては、具体的には、フッ素原子、塩素原子、臭素原子及びヨウ素原子が挙げられる。これらのうち、塩素原子又は臭素原子は、感度に優れるため好ましく、臭素原子が特に好ましい。
 また、式(II)において、Rとしては、感度と保存安定性とのバランスに優れる観点から、アミド基で置換されているアリール基が好ましい。
Specific examples of X in the formula (II) include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Of these, a chlorine atom or a bromine atom is preferable because it has excellent sensitivity, and a bromine atom is particularly preferable.
Further, in formula (II), R 3, from the viewpoint of excellent balance between sensitivity and storage stability, an aryl group substituted with an amide group.
 上記式(II)で表される電子受容型重合開始剤の具体例としては、下記式に示す化合物などが挙げられるが、本開示はこれらに限定されるものではない。 Specific examples of the electron-accepting polymerization initiator represented by the above formula (II) include compounds represented by the following formula, but the present disclosure is not limited thereto.
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
 電子受容型重合開始剤の最低空軌道(LUMO)は、感度の向上及び版飛びを発生しにくくする観点から、-3.00eV以下であることが好ましく、-3.02eV以下であることがより好ましい。
 また、下限としては、-3.80eV以上であることが好ましく、-3.60eV以上であることがより好ましい。
The minimum empty orbital (LUMO) of the electron-accepting polymerization initiator is preferably −3.00 eV or less, and more preferably −3.02 eV or less, from the viewpoint of improving sensitivity and making plate skipping less likely to occur. preferable.
Further, as the lower limit, it is preferably -3.80 eV or more, and more preferably -3.60 eV or more.
 電子受容型重合開始剤は、1種単独で用いてもよく、2種以上を併用してもよい。
 電子受容型重合開始剤の含有量は、画像記録層の全質量に対して、0.1質量%~50質量%であることが好ましく、0.5質量%~30質量%であることがより好ましく、0.8質量%~20質量%であることが特に好ましい。
The electron-accepting polymerization initiator may be used alone or in combination of two or more.
The content of the electron-accepting polymerization initiator is preferably 0.1% by mass to 50% by mass, more preferably 0.5% by mass to 30% by mass, based on the total mass of the image recording layer. It is preferably 0.8% by mass to 20% by mass, and particularly preferably 0.8% by mass.
<<電子供与型重合開始剤(重合助剤)>>
 上記画像記録層は、重合開始剤として、電子供与型重合開始剤(「重合助剤」ともいう。)を含むことが好ましく、電子受容型重合開始剤、及び、電子供与型重合開始剤を含むことがより好ましい。
 本開示における電子供与型重合開始剤は、赤外線露光により赤外線吸収剤の電子が励起又は分子内移動した際に、赤外線吸収剤の一電子抜けた軌道に分子間電子移動で一電子を供与することにより、ラジカル等の重合開始種を発生する化合物である。
 電子供与型重合開始剤としては、電子供与型ラジカル重合開始剤であることが好ましい。
 上記画像記録層は、平版印刷版における耐刷性向上の観点から、以下に説明する電子供与型重合開始剤を含有することがより好ましく、その例として以下の5種が挙げられる。
(i)アルキル又はアリールアート錯体:酸化的に炭素-ヘテロ結合が解裂し、活性ラジカルを生成すると考えられる。具体的には、ボレート化合物が好ましい。
(ii)N-アリールアルキルアミン化合物:酸化により窒素に隣接した炭素上のC-X結合が解裂し、活性ラジカルを生成するものと考えられる。Xとしては、水素原子、カルボキシル基、トリメチルシリル基又はベンジル基が好ましい。具体的には、例えば、N-フェニルグリシン類(フェニル基に置換基を有していてもいなくてもよい。)、N-フェニルイミノジ酢酸(フェニル基に置換基を有していてもいなくてもよい。)が挙げられる。
(iii)含硫黄化合物:上述のアミン類の窒素原子を硫黄原子に置き換えたものが、同様の作用により活性ラジカルを生成し得る。例えばフェニルチオ酢酸(フェニル基に置換基を有していてもいなくてもよい。)が挙げられる。
(iv)含錫化合物:上述のアミン類の窒素原子を錫原子に置き換えたものが、同様の作用により活性ラジカルを生成し得る。
(v)スルフィン酸塩類:酸化により活性ラジカルを生成し得る。具体的は、アリールスルフィン駿ナトリウム等を挙げることができる。
<< Electron donation type polymerization initiator (polymerization aid) >>
The image recording layer preferably contains an electron-donating polymerization initiator (also referred to as a "polymerization aid") as a polymerization initiator, and contains an electron-accepting polymerization initiator and an electron-donating polymerization initiator. Is more preferable.
The electron donating type polymerization initiator in the present disclosure donates one electron by intermolecular electron transfer to an orbit where one electron is missing from the infrared absorber when the electron of the infrared absorber is excited or moved intramolecularly by infrared exposure. This is a compound that generates a polymerization-initiated species such as a radical.
The electron-donating type polymerization initiator is preferably an electron-donating radical polymerization initiator.
From the viewpoint of improving the printing durability of the lithographic printing plate, the image recording layer more preferably contains the electron donating type polymerization initiator described below, and examples thereof include the following five types.
(I) Alkyl or arylate complex: It is considered that the carbon-heterobond is oxidatively cleaved to generate an active radical. Specifically, a borate compound is preferable.
(Ii) N-arylalkylamine compound: It is considered that the CX bond on the carbon adjacent to nitrogen is cleaved by oxidation to generate an active radical. As X, a hydrogen atom, a carboxyl group, a trimethylsilyl group or a benzyl group is preferable. Specifically, for example, N-phenylglycines (which may or may not have a substituent on the phenyl group) and N-phenyliminodiacetic acid (which may or may not have a substituent on the phenyl group). May be mentioned.)
(Iii) Sulfur-containing compound: The above-mentioned amines in which the nitrogen atom is replaced with a sulfur atom can generate an active radical by the same action. For example, phenylthioacetic acid (which may or may not have a substituent on the phenyl group) can be mentioned.
(Iv) Tin-containing compounds: The above-mentioned amines in which the nitrogen atom is replaced with a tin atom can generate active radicals by the same action.
(V) Sulfinates: Oxidation can generate active radicals. Specific examples thereof include arylsulfinic sodium.
 これらの中でも、上記画像記録層は、耐刷性の観点から、ボレート化合物を含有することが好ましい。
 ボレート化合物としては、耐刷性及び発色性の観点から、テトラアリールボレート化合物、又は、モノアルキルトリアリールボレート化合物であることが好ましく、テトラアリールボレート化合物であることがより好ましい。
 ボレート化合物が有する対カチオンとしては、特に制限はないが、アルカリ金属イオン、又は、テトラアルキルアンモニウムイオンであることが好ましく、ナトリウムイオン、カリウムイオン、又は、テトラブチルアンモニウムイオンであることがより好ましい。
Among these, the image recording layer preferably contains a borate compound from the viewpoint of printing resistance.
The borate compound is preferably a tetraaryl borate compound or a monoalkyl triaryl borate compound, and more preferably a tetraaryl borate compound from the viewpoint of print resistance and color development.
The counter cation contained in the borate compound is not particularly limited, but is preferably an alkali metal ion or a tetraalkylammonium ion, and more preferably a sodium ion, a potassium ion, or a tetrabutylammonium ion.
 ボレート化合物として具体的には、ナトリウムテトラフェニルボレートが好ましく挙げられる。 Specifically, sodium tetraphenylborate is preferably mentioned as the borate compound.
 以下に電子供与型重合開始剤の好ましい具体例として、B-1~B-9を示すが、これらに限定されないことは、言うまでもない。また、下記化学式において、Phはフェニル基を表し、Buはn-ブチル基を表す。 B-1 to B-9 are shown below as preferable specific examples of the electron donating type polymerization initiator, but it goes without saying that the present invention is not limited to these. Further, in the following chemical formula, Ph represents a phenyl group and Bu represents an n-butyl group.
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
 また、本開示に用いられる電子供与型重合開始剤の最高被占軌道(HOMO)は、感度の向上及び版飛びを発生しにくくする観点から、-6.00eV以上であることが好ましく、-5.95eV以上であることがより好ましく、-5.93eV以上であることが更に好ましい。
 また、上限としては、-5.00eV以下であることが好ましく、-5.40eV以下であることがより好ましい。
Further, the maximum occupied orbital (HOMO) of the electron donating type polymerization initiator used in the present disclosure is preferably −6.00 eV or more from the viewpoint of improving sensitivity and making plate skipping less likely to occur, preferably −5. It is more preferably .95 eV or more, and even more preferably −5.93 eV or more.
The upper limit is preferably −5.00 eV or less, and more preferably −5.40 eV or less.
 電子供与型重合開始剤は、1種のみを添加しても、2種以上を併用してもよい。
 電子供与型重合開始剤の含有量としては、感度及び耐刷性の観点から、画像記録層の全質量に対し、0.01質量%~30質量%であることが好ましく、0.05質量%~25質量%であることがより好ましく、0.1質量%~20質量%であることが更に好ましい。
As the electron donating type polymerization initiator, only one kind may be added, or two or more kinds may be used in combination.
The content of the electron donating type polymerization initiator is preferably 0.01% by mass to 30% by mass, preferably 0.05% by mass, based on the total mass of the image recording layer from the viewpoint of sensitivity and printing resistance. It is more preferably to 25% by mass, and further preferably 0.1% by mass to 20% by mass.
 本開示において、画像記録層が、オニウムイオンと、上述の電子供与型重合開始剤におけるアニオンと、を含む場合、画像記録層は電子受容型重合開始剤及び上記電子供与型重合開始剤を含むものとする。 In the present disclosure, when the image recording layer contains an onium ion and an anion in the above-mentioned electron donating type polymerization initiator, the image recording layer is assumed to contain an electron accepting type polymerization initiator and the above-mentioned electron donating type polymerization initiator. ..
-電子供与型重合開始剤と特定ポリメチン色素との関係-
 本開示における画像記録層は、感度の向上及びUV版飛び抑制性の観点から、上記電子供与型重合開始剤及び特定ポリメチン色素を含有し、特定ポリメチン色素のHOMO-上記電子供与型重合開始剤のHOMOの値が0.70eV以下であることが好ましく、0.70eV~-0.10eVであることがより好ましい。
 なお、マイナスの値は、上記電子供与型重合開始剤のHOMOが、特定ポリメチン色素のHOMOよりも高くなることを意味する。
-Relationship between electron-donating polymerization initiator and specific polymethine dye-
From the viewpoint of improving sensitivity and suppressing UV plate skipping, the image recording layer in the present disclosure contains the electron-donating polymerization initiator and the specific polymethine dye, and is a HOMO of the specific polymethine dye-the electron-donating polymerization initiator. The HOMO value is preferably 0.70 eV or less, and more preferably 0.70 eV to −0.10 eV.
A negative value means that the HOMO of the electron-donating polymerization initiator is higher than that of the specific polymethine dye.
-特定ポリメチン色素及び電子受容型重合開始剤の好ましい態様-
 本開示における特定ポリメチン色素としては、感度の向上及び版飛びを発生しにくくする観点から、ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16~32であり、且つ、δhがδpの60%以下である有機アニオンを有することが好ましい態様である。
 本開示における電子受容型重合開始剤としては、感度の向上及び版飛びを発生しにくくする観点から、ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16~32であり、且つ、δhがδpの60%以下である有機アニオンを有することが好ましい態様である。
-Preferable embodiments of the specific polymethine dye and the electron-accepting polymerization initiator-
As the specific polymethine dye in the present disclosure, δd in the solubility parameter of Hansen is 16 or more, δp is 16 to 32, and δh is 60 of δp from the viewpoint of improving sensitivity and making it difficult for plate skipping to occur. It is a preferred embodiment to have an organic anion of% or less.
The electron-accepting polymerization initiator in the present disclosure has a solubility parameter of Hansen of 16 or more, δp of 16 to 32, and δh from the viewpoint of improving sensitivity and preventing plate skipping. It is a preferable embodiment to have an organic anion which is 60% or less of δp.
 ここで、本開示におけるハンセンの溶解度パラメータにおけるδd、δp及びδhは、ハンセン(Hansen)の溶解度パラメータにおける分散項δd[単位:MPa0.5]及び極性項δp[単位:MPa0.5]を用いる。ここで、ハンセン(Hansen)の溶解度パラメータは、ヒルデブランド(Hildebrand)によって導入された溶解度パラメータを、分散項δd、極性項δp、水素結合項δhの3成分に分割し、3次元空間に表したものである。
 ハンセン(Hansen)の溶解度パラメータの詳細については、Charles M.Hansen著の文献「Hansen Solubility Parameters;A Users Handbook(CRC Press,2007)」に記載されている。
Here, δd, δp and δh in the Hansen solubility parameter in the present disclosure have the dispersion term δd [unit: MPa 0.5 ] and the polarity term δp [unit: MPa 0.5 ] in the Hansen solubility parameter. Use. Here, the solubility parameter of Hansen is expressed in a three-dimensional space by dividing the solubility parameter introduced by Hildebrand into three components of a dispersion term δd, a polar term δp, and a hydrogen bond term δh. It is a thing.
For more information on Hansen's solubility parameters, see Charles M. It is described in the document "Hansen Solubility Parameter; A Users Handbook (CRC Press, 2007)" by Hansen.
 本開示において、上記有機アニオンのハンセンの溶解度パラメータにおけるδd、δp及びδhは、コンピュータソフトウェア「Hansen Solubility Parameters in Practice(HSPiP ver.4.1.07)」を用いることにより、その化学構造から推算した値である。 In the present disclosure, δd, δp and δh in the Hansen solubility parameter of the organic anion are estimated from the chemical structure by using the computer software “Hansen Solubility Parameters in Practice (HSPiP ver. 4.1.07)”. The value.
 ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16~32であり、且つ、δhがδpの60%以下である有機アニオンの具体例としては、上述したI-1~I-15、I-17~I-21、及び、I-23~I-25、並びに、以下に示すものが好適に挙げられるが、これらに限定されないことは言うまでもない。中でも、ビス(ハロゲン置換ベンゼンスルホニル)イミドアニオンがより好適に挙げられ、上述したI-5が特に好適に挙げられる。 Specific examples of the organic anions having δd of 16 or more, δp of 16 to 32, and δh of 60% or less of δp in Hansen's solubility parameter are I-1 to I-15 and I described above. -17 to I-21, I-23 to I-25, and the following are preferable, but it goes without saying that the present invention is not limited thereto. Among them, bis (halogen-substituted benzenesulfonyl) imide anion is more preferably mentioned, and I-5 described above is particularly preferable.
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
-重合性化合物-
 上記画像記録層は、重合性化合物を含むことが好ましい。
 本開示に用いられる重合性化合物は、例えば、ラジカル重合性化合物であっても、カチオン重合性化合物であってもよいが、少なくとも1個のエチレン性不飽和結合を有する付加重合性化合物(エチレン性不飽和化合物)であることが好ましい。エチレン性不飽和化合物としては、末端エチレン性不飽和結合を少なくとも1個有する化合物であることが好ましく、末端エチレン性不飽和結合を2個以上有する化合物であることがより好ましい。重合性化合物は、例えばモノマー、プレポリマー、すなわち2量体、3量体若しくはオリゴマー、又は、それらの混合物などの化学的形態をもつ。
-Polymerizable compound-
The image recording layer preferably contains a polymerizable compound.
The polymerizable compound used in the present disclosure may be, for example, a radical-polymerizable compound or a cationically polymerizable compound, but is an addition-polymerizable compound having at least one ethylenically unsaturated bond (ethyleney). It is preferably an unsaturated compound). The ethylenically unsaturated compound is preferably a compound having at least one terminal ethylenically unsaturated bond, and more preferably a compound having two or more terminal ethylenically unsaturated bonds. Polymerizable compounds have chemical forms such as, for example, monomers, prepolymers, ie dimers, trimers or oligomers, or mixtures thereof.
 モノマーの例としては、不飽和カルボン酸(例えば、アクリル酸、メタクリル酸、イタコン酸、クロトン酸、イソクロトン酸、マレイン酸など)や、そのエステル類、アミド類が挙げられ、好ましくは、不飽和カルボン酸と多価アルコール化合物とのエステル類、不飽和カルボン酸と多価アミン化合物とのアミド類が用いられる。また、ヒドロキシ基、アミノ基、メルカプト基等の求核性置換基を有する不飽和カルボン酸エステル類あるいはアミド類と単官能もしくは多官能イソシアネート類あるいはエポキシ類との付加反応物、及び単官能もしくは多官能のカルボン酸との脱水縮合反応物等も好適に使用される。また、イソシアネート基、エポキシ基等の親電子性置換基を有する不飽和カルボン酸エステル類あるいはアミド類と単官能又は多官能のアルコール類、アミン類、チオール類との付加反応物、更にハロゲン原子、トシルオキシ基等の脱離性置換基を有する不飽和カルボン酸エステル類あるいはアミド類と単官能又は多官能のアルコール類、アミン類、チオール類との置換反応物も好適である。また、別の例として、上記の不飽和カルボン酸を、不飽和ホスホン酸、スチレン、ビニルエーテル等に置き換えた化合物群を使用することも可能である。これらは、特表2006-508380号公報、特開2002-287344号公報、特開2008-256850号公報、特開2001-342222号公報、特開平9-179296号公報、特開平9-179297号公報、特開平9-179298号公報、特開2004-294935号公報、特開2006-243493号公報、特開2002-275129号公報、特開2003-64130号公報、特開2003-280187号公報、特開平10-333321号公報等に記載されている。 Examples of the monomer include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, and amides, and unsaturated carboxylic acids are preferable. Esters of an acid and a polyhydric alcohol compound, and amides of an unsaturated carboxylic acid and a polyhydric amine compound are used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxy group, an amino group or a mercapto group with a monofunctional or polyfunctional isocyanate or an epoxy, and a monofunctional or polyfunctional group. A dehydration condensation reaction product with a functional carboxylic acid is also preferably used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having a polyelectron substituent such as an isocyanate group or an epoxy group with a monofunctional or polyfunctional alcohol, an amine or a thiol, and a halogen atom, Substituents of unsaturated carboxylic acid esters or amides having a releasable substituent such as a tosyloxy group with monofunctional or polyfunctional alcohols, amines and thiols are also suitable. Further, as another example, it is also possible to use a compound group in which the above unsaturated carboxylic acid is replaced with unsaturated phosphonic acid, styrene, vinyl ether or the like. These are JP-A-2006-508380, JP-A-2002-287344, JP-A-2008-256850, JP-A-2001-342222, JP-A-9-179296, JP-A-9-179297. , JP-A-9-179298, JP-A-2004-294935, JP-A-2006-243493, JP-A-2002-275129, JP-A-2003-64130, JP-A-2003-280187, It is described in Kaihei 10-333321.
 多価アルコール化合物と不飽和カルボン酸とのエステルのモノマーの具体例としては、アクリル酸エステルとして、エチレングリコールジアクリレート、1,3-ブタンジオールジアクリレート、テトラメチレングリコールジアクリレート、プロピレングリコールジアクリレート、トリメチロールプロパントリアクリレート、ヘキサンジオールジアクリレート、テトラエチレングリコールジアクリレート、ペンタエリスリトールテトラアクリレート、ソルビトールトリアクリレート、イソシアヌル酸エチレンオキシド(EO)変性トリアクリレート、ポリエステルアクリレートオリゴマー等がある。メタクリル酸エステルとして、テトラメチレングリコールジメタクリレート、ネオペンチルグリコールジメタクリレート、トリメチロールプロパントリメタクリレート、エチレングリコールジメタクリレート、ペンタエリスリトールトリメタクリレート、ビス〔p-(3-メタクリルオキシ-2-ヒドロキシプロポキシ)フェニル〕ジメチルメタン、ビス〔p-(メタクリルオキシエトキシ)フェニル〕ジメチルメタン等がある。また、多価アミン化合物と不飽和カルボン酸とのアミドのモノマーの具体例としては、メチレンビスアクリルアミド、メチレンビスメタクリルアミド、1,6-ヘキサメチレンビスアクリルアミド、1,6-ヘキサメチレンビスメタクリルアミド、ジエチレントリアミントリスアクリルアミド、キシリレンビスアクリルアミド、キシリレンビスメタクリルアミド等がある。 Specific examples of the monomer of the ester of the polyhydric alcohol compound and the unsaturated carboxylic acid include ethylene glycol diacrylate, 1,3-butanediol diacrylate, tetramethylene glycol diacrylate, and propylene glycol diacrylate as acrylic acid esters. Trimethylol propan triacrylate, hexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol tetraacrylate, sorbitol triacrylate, isocyanurate ethylene oxide (EO) modified triacrylate, polyester acrylate oligomer and the like. As methacrylic acid ester, tetramethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropantrimethacrylate, ethylene glycol dimethacrylate, pentaerythritol trimethacrylate, bis [p- (3-methacryloxy-2-hydroxypropoxy) phenyl] There are dimethylmethane, bis [p- (methacrylicoxyethoxy) phenyl] dimethylmethane and the like. Specific examples of the amide monomer of the polyvalent amine compound and the unsaturated carboxylic acid include methylenebisacrylamide, methylenebismethacrylamide, 1,6-hexamethylenebisacrylamide, and 1,6-hexamethylenebismethacrylamide. Diethylenetriaminetrisacrylamide, xylylenebisacrylamide, xylylenebismethacrylamide and the like.
 また、イソシアネートとヒドロキシ基の付加反応を用いて製造されるウレタン系付加重合性化合物も好適であり、その具体例としては、例えば、特公昭48-41708号公報に記載されている1分子に2個以上のイソシアネート基を有するポリイソシアネート化合物に、下記式(M)で表されるヒドロキシ基を含有するビニルモノマーを付加させた1分子中に2個以上の重合性ビニル基を含有するビニルウレタン化合物等が挙げられる。
 CH=C(RM4)COOCHCH(RM5)OH    (M)
 式(M)中、RM4及びRM5はそれぞれ独立に、水素原子又はメチル基を表す。
Further, a urethane-based addition-polymerizable compound produced by using an addition reaction of isocyanate and a hydroxy group is also suitable, and specific examples thereof include, for example, 2 per molecule described in JP-A-48-41708. A vinyl urethane compound containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxy group represented by the following formula (M) to a polyisocyanate compound having two or more isocyanate groups. And so on.
CH 2 = C (R M4) COOCH 2 CH (R M5) OH (M)
In formula (M), RM4 and RM5 each independently represent a hydrogen atom or a methyl group.
 また、特開昭51-37193号公報、特公平2-32293号公報、特公平2-16765号公報、特開2003-344997号公報、特開2006-65210号公報に記載のウレタンアクリレート類、特公昭58-49860号公報、特公昭56-17654号公報、特公昭62-39417号公報、特公昭62-39418号公報、特開2000-250211号公報、特開2007-94138号公報に記載のエチレンオキサイド系骨格を有するウレタン化合物類、米国特許第7153632号明細書、特表平8-505958号公報、特開2007-293221号公報、特開2007-293223号公報に記載の親水基を有するウレタン化合物類も好適である。 Further, the urethane acrylates described in JP-A-51-37193, JP-A-2-32293, JP-A-2-16765, JP-A-2003-344997, and JP-A-2006-65210, Ethylene described in Japanese Patent Application Laid-Open No. 58-49860, Japanese Patent Publication No. 56-17654, Japanese Patent Publication No. 62-39417, Japanese Patent Application Laid-Open No. 62-39418, Japanese Patent Application Laid-Open No. 2000-250211, and Japanese Patent Application Laid-Open No. 2007-94138. Urethane compounds having an oxide-based skeleton, urethane compounds having a hydrophilic group described in US Pat. No. 7,153,632, JP-A-8-505598, JP-A-2007-293221, JP-A-2007-293223. Kind is also suitable.
-特定化合物B1-
 重合性化合物は、耐刷性を高める観点から、エチレン性不飽和結合価(「C=C価」ともいう。)が5.0mmol/g以上の化合物(以下、特定化合物B1ともいう。)を含むことが好ましい。
 特定化合物B1のエチレン性不飽和結合価は、5.5mmol/g以上であることが好ましく、6.0mmol/g以上であることがより好ましい。特定化合物B1のエチレン性不飽和結合価の上限は、例えば、10.0mmol/g以下が挙げられ、8.5mmol/g以下であることがより好ましい。
-Specific compound B1-
From the viewpoint of enhancing printing resistance, the polymerizable compound is a compound having an ethylenically unsaturated bond value (also referred to as “C = C value”) of 5.0 mmol / g or more (hereinafter, also referred to as specific compound B1). It is preferable to include it.
The ethylenically unsaturated bond value of the specific compound B1 is preferably 5.5 mmol / g or more, and more preferably 6.0 mmol / g or more. The upper limit of the ethylenically unsaturated bond value of the specific compound B1 is, for example, 10.0 mmol / g or less, and more preferably 8.5 mmol / g or less.
 ここで、本開示における化合物のエチレン性不飽和結合価は、以下の方法にて求める。まず、所定のサンプル量(例えば、0.2g)の化合物について、例えば、熱分解GC/MS、FT-IR、NMR、TOF-SIMS等を用いて、化合物の構造を特定し、エチレン性不飽和基の総量(mmol)を求める。求められたエチレン性不飽和基の総量(mmol)を、化合物のサンプル量(g)にて除することで、化合物におけるエチレン性不飽和結合価が算出される。 Here, the ethylenically unsaturated bond value of the compound in the present disclosure is determined by the following method. First, for a compound having a predetermined sample amount (for example, 0.2 g), the structure of the compound is specified by using, for example, thermal decomposition GC / MS, FT-IR, NMR, TOF-SIMS, etc., and ethylenically unsaturated. Find the total amount (mmol) of the groups. The ethylenically unsaturated bond value of a compound is calculated by dividing the total amount (mmol) of the determined ethylenically unsaturated groups by the sample amount (g) of the compound.
 特定化合物B1は、上記C=C価を満たす観点から、下記式(I)で表される化合物であることが好ましい。
 式(I) : X-(Y)n  
 式(I)中、Xは水素結合性基を有するn価の有機基を表し、Yは2以上のエチレン性不飽和基を有する1価の基を表し、nは2以上の整数を表し、Xの分子量/(Yの分子量×n)が1以下である。
The specific compound B1 is preferably a compound represented by the following formula (I) from the viewpoint of satisfying the above C = C valence.
Formula (I): X- (Y) n
In formula (I), X represents an n-valent organic group having a hydrogen-bonding group, Y represents a monovalent group having two or more ethylenically unsaturated groups, and n represents an integer of two or more. The molecular weight of X / (molecular weight of Y × n) is 1 or less.
 式(I)のXにおける水素結合性基としては特に制限はなく、水素結合可能な基であればよく、水素結合供与性基であっても、水素結合受容型基であっても、その両方であってもよい。上記水素結合性基としては、ヒドロキシ基、カルボキシ基、アミノ基、カルボニル基、スルホニル基、ウレタン基、ウレア基、イミド基、アミド基、スルホンアミド基等が挙げられる。中でも、上記水素結合性基としては、機上現像性及び耐刷性の観点から、ウレタン基、ウレア基、イミド基、アミド基、及びスルホンアミド基からなる群より選ばれた少なくとも1種の基を含むことが好ましく、ウレタン基、ウレア基、イミド基、及びアミド基からなる群より選ばれた少なくとも1種の基を含むことがより好ましく、ウレタン基、ウレア基、及びイミド基からなる群より選ばれた少なくとも1種の基であることが更に好ましく、ウレタン基及びウレア基からなる群より選ばれた少なくとも1種の基を含むことが特に好ましい。 The hydrogen-bonding group in X of the formula (I) is not particularly limited as long as it is a hydrogen-bondable group, and whether it is a hydrogen-bond-donating group or a hydrogen-bond-accepting group, both of them. It may be. Examples of the hydrogen-bonding group include a hydroxy group, a carboxy group, an amino group, a carbonyl group, a sulfonyl group, a urethane group, a urea group, an imide group, an amide group, a sulfonamide group and the like. Among them, the hydrogen-bonding group is at least one group selected from the group consisting of a urethane group, a urea group, an imide group, an amide group, and a sulfonamide group from the viewpoint of on-machine developability and print resistance. It is more preferable to contain at least one group selected from the group consisting of a urethane group, a urea group, an imide group, and an amide group, and more preferably than the group consisting of a urethane group, a urea group, and an imide group. It is more preferably at least one selected group, and particularly preferably containing at least one group selected from the group consisting of urethane groups and urea groups.
 式(I)におけるXは、エチレン性不飽和結合を有しない有機基であることが好ましい。
 また、式(I)におけるXは、機上現像性及び耐刷性の観点から、1価~n価の脂肪族炭化水素基、1価~n価の芳香族炭化水素基、ウレタン結合、ウレア結合、ビウレット結合、及びアロファネート結合からなる群より選ばれた2種以上の構造を組み合わせた基であることが好ましく、1価~n価の脂肪族炭化水素基、1価~n価の芳香族炭化水素基、ウレタン結合、ウレア結合、及びビウレット結合からなる群より選ばれた2種以上の構造を組み合わせた基であることがより好ましい。
X in the formula (I) is preferably an organic group having no ethylenically unsaturated bond.
Further, X in the formula (I) is a monovalent to n-valent aliphatic hydrocarbon group, a monovalent to n-valent aromatic hydrocarbon group, a urethane bond, or a urea from the viewpoint of on-machine developability and printing resistance. It is preferably a group that combines two or more structures selected from the group consisting of a bond, a biuret bond, and an allophanate bond, and is preferably a monovalent to n-valent aliphatic hydrocarbon group and a monovalent to n-valent aromatic group. It is more preferable that the group is a combination of two or more structures selected from the group consisting of a hydrocarbon group, a urethane bond, a urea bond, and a biuret bond.
 式(I)におけるXは、機上現像性及び耐刷性の観点から、多官能イソシアネート化合物が多量化した多量化体(トリメチロールプロパンアダクト体等の多官能アルコール化合物のアダクト体を含む。)から末端のイソシアネート基を除いた基であることが好ましく、二官能イソシアネート化合物が多量化した多量化体(多官能アルコール化合物のアダクト体を含む。)から末端のイソシアネート基を除いた基であることがより好ましく、ヘキサメチレンジイソシアネートが多量化した多量化体(多官能アルコール化合物のアダクト体を含む。)から末端のイソシアネート基を除いた基であることが特に好ましい。 X in the formula (I) is a quantified product in which a polyfunctional isocyanate compound is increased in a large amount (including an adducted body of a polyfunctional alcohol compound such as a trimethylolpropane adduct) from the viewpoint of on-machine developability and print resistance. It is preferable that the group is a group obtained by removing the terminal isocyanate group from the group, and is a group obtained by removing the terminal isocyanate group from a quantifier (including an adduct of a polyfunctional alcohol compound) in which a bifunctional isocyanate compound is abundant. Is more preferable, and a group in which the terminal isocyanate group is removed from a quantifier (including an adduct of a polyfunctional alcohol compound) in which hexamethylene diisocyanate is increased is particularly preferable.
 式(I)におけるXの分子量は、機上現像性及び耐刷性の観点から、100~1,000が好ましく、150~800であることがより好ましく、150~500であることが特に好ましい。 The molecular weight of X in the formula (I) is preferably 100 to 1,000, more preferably 150 to 800, and particularly preferably 150 to 500, from the viewpoint of on-machine developability and print resistance.
 式(I)のYにおけるエチレン性不飽和基としては特に制限はなく、反応性、機上現像性、及び耐刷性の観点から、ビニルフェニル基、ビニルエステル基、ビニルエーテル基、アリル基、(メタ)アクリロキシ基、及び(メタ)アクリルアミド基からなる群より選ばれた少なくとも1種の基であることが好ましい。上記と同様の観点から、式(I)のYにおけるエチレン性不飽和基としては、ビニルフェニル基、(メタ)アクリロキシ基、及び(メタ)アクリルアミド基からなる群より選ばれた少なくとも1種の基であることがより好ましく、(メタ)アクリロキシ基であることが更に好ましい。即ち、式(I)のYにおけるエチレン性不飽和基は、機上現像性及び耐刷性の観点から、(メタ)アクリロキシ基を含むことが好ましい。 The ethylenically unsaturated group in Y of the formula (I) is not particularly limited, and from the viewpoint of reactivity, on-machine developability, and print resistance, a vinylphenyl group, a vinyl ester group, a vinyl ether group, an allyl group, ( It is preferably at least one group selected from the group consisting of a meta) acryloxy group and a (meth) acrylamide group. From the same viewpoint as above, the ethylenically unsaturated group in Y of the formula (I) is at least one group selected from the group consisting of a vinylphenyl group, a (meth) acryloxy group, and a (meth) acrylamide group. Is more preferable, and it is more preferable that it is a (meth) acrylate group. That is, the ethylenically unsaturated group in Y of the formula (I) preferably contains a (meth) acryloxy group from the viewpoint of on-machine developability and print resistance.
 式(I)におけるYは、3つ以上の(メタ)アクリロキシ基を有する基であることが好ましく、5つ以上の(メタ)アクリロキシ基を有する基であることがより好ましく、5つ以上12つ以下の(メタ)アクリロキシ基を有する基であることが更に好ましい。 Y in the formula (I) is preferably a group having three or more (meth) acryloxy groups, more preferably a group having five or more (meth) acryloxy groups, and five or more twelve. It is more preferable that the group has the following (meth) acryloxy group.
 式(I)におけるYは、機上現像性及び耐刷性の観点から、下記式(Y-1)又は式(Y-2)で表される構造を有していてもよい。 Y in the formula (I) may have a structure represented by the following formula (Y-1) or the formula (Y-2) from the viewpoint of on-machine developability and print resistance.
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
 式(Y-1)及び式(Y-2)中、Rは、それぞれ独立に、アクリル基又はメタクリル基を表し、波線部分は他の構造との結合位置を表す。 In the formula (Y-1) and the formula (Y-2), R independently represents an acrylic group or a methacrylic group, and the wavy line portion represents the bonding position with another structure.
 式(Y-1)又は式(Y-2)においては、Rは全て同じ基であることが好ましい。また、式(Y-1)又は式(Y-2)においては、Rは、アクリル基であることが好ましい。 In the formula (Y-1) or the formula (Y-2), it is preferable that all Rs have the same group. Further, in the formula (Y-1) or the formula (Y-2), R is preferably an acrylic group.
 更に、式(I)におけるn個のYは、全て同じ基であることが好ましい。 Further, it is preferable that the n Ys in the formula (I) are all the same group.
 式(I)におけるYの分子量は、機上現像性及び耐刷性の観点から、200以上1,000以下であることが好ましく、250以上800以下であることがより好ましい。 The molecular weight of Y in the formula (I) is preferably 200 or more and 1,000 or less, and more preferably 250 or more and 800 or less, from the viewpoint of on-machine developability and print resistance.
 式(I)におけるnは2以上の整数であり、機上現像性及び耐刷性の観点から、2~3であることがより好ましい。 N in the formula (I) is an integer of 2 or more, and is more preferably 2 to 3 from the viewpoint of on-machine developability and print resistance.
 Xの分子量/(Yの分子量×n)は1以下であり、機上現像性及び耐刷性の観点から、0.01~0.8であることが好ましく、0.1~0.5であることがより好ましい。 The molecular weight of X / (molecular weight of Y × n) is 1 or less, preferably 0.01 to 0.8, preferably 0.1 to 0.5, from the viewpoint of on-machine developability and print resistance. More preferably.
 特定化合物B1の構造は、上述のように、多官能イソシアネート化合物の多量化体(アダクト体を含む。)の末端イソシアネート基を、エチレン性不飽和基を有する化合物により封止した構造が好ましく挙げられる。中でも、多官能イソシアネート化合物の多量化体としては、2官能イソシアネート化合物の多量化体が好ましい。 As described above, the structure of the specific compound B1 preferably includes a structure in which the terminal isocyanate group of the quantifier (including the adduct) of the polyfunctional isocyanate compound is sealed with a compound having an ethylenically unsaturated group. .. Among them, as the quantifier of the polyfunctional isocyanate compound, the quantifier of the bifunctional isocyanate compound is preferable.
 また、特定化合物B1は、機上現像性及び耐刷性の観点から、多官能イソシアネート化合物が多量化した多量化体の末端イソシアネート基に、ヒドロキシ基(水酸基ともいう)を末端に有する多官能エチレン性不飽和化合物を反応させてなる化合物であることが好ましい。また、上記と同様の観点から、特定化合物B1は、2官能イソシアネート化合物が多量化した多量化体(多官能アルコール化合物のアダクト体を含む)の末端イソシアネート基に、ヒドロキシ基を有する多官能エチレン性不飽和化合物を反応させてなる化合物であることがより好ましい。更に、上記と同様の観点から、特定化合物B1は、ヘキサメチレンジイソシアネートが多量化した多量化体(多官能アルコール化合物のアダクト体を含む)の末端イソシアネート基に、ヒドロキシ基を有する多官能エチレン性不飽和化合物を反応させてなる化合物であることが特に好ましい。 Further, from the viewpoint of on-machine developability and print resistance, the specific compound B1 is a polyfunctional ethylene having a hydroxy group (also referred to as a hydroxyl group) at the end of the terminal isocyanate group of the multimerized product in which the polyfunctional isocyanate compound is increased in quantity. It is preferably a compound obtained by reacting a sex unsaturated compound. Further, from the same viewpoint as above, the specific compound B1 is a polyfunctional ethylenic compound having a hydroxy group at the terminal isocyanate group of a multimeric compound (including an adduct compound of a polyfunctional alcohol compound) in which a difunctional isocyanate compound is increased in quantity. It is more preferable that the compound is obtained by reacting an unsaturated compound. Further, from the same viewpoint as above, the specific compound B1 is a polyfunctional ethylenically non-polyfunctional compound having a hydroxy group at the terminal isocyanate group of the multimer (including the adduct of the polyfunctional alcohol compound) in which hexamethylene diisocyanate is increased. It is particularly preferable that the compound is obtained by reacting a saturated compound.
 上記多官能イソシアネート化合物としては、特に制限はなく、公知のものを用いることができ、脂肪族多官能イソシアネート化合物であってもよいし、芳香族多官能イソシアネート化合物であってもよい。上記多官能イソシアネート化合物としては、具体的には、例えば、1,3-ビス(イソシアナトメチル)シクロヘキサン、イソホロンジイソシアネート、トリメチレンジイソシアネート、テトラメチレンジイソシアネート、ペンタメチレンジイソシアネート、ヘキサメチレンジイソシアネート、1,3-シクロペンタンジイソシアネート、9H-フルオレン-2,7-ジイソシアネート、9H-フルオレン-9-オン-2,7-ジイソシアネート、4,4’-ジフェニルメタンジイソシアナート、1,3-フェニレンジイソシアナート、トリレン-2,4-ジイソシアナート、トリレン-2,6-ジイソシアナート、1,3-ビス(イソシアナトメチル)シクロヘキサン、2,2-ビス(4-イソシアナトフェニル)ヘキサフルオロプロパン、1,5-ジイソシアナトナフタレン、これらのポリイソシアネートのダイマー、トリマー(イソシアヌレート結合)等が好ましく挙げられる。また、上記のポリイソシアネート化合物と公知のアミン化合物とを反応させたビウレット体を用いてもよい。
 また、上記ヒドロキシ基を有する多官能エチレン性不飽和化合物は、ヒドロキシ基を有する3官能以上のエチレン性不飽和化合物であることが好ましく、ヒドロキシ基を有する5官能以上のエチレン性不飽和化合物であることがより好ましい。上記ヒドロキシ基を有する多官能エチレン性不飽和化合物は、ヒドロキシ基を有する多官能(メタ)アクリレート化合物であることが好ましい。
The polyfunctional isocyanate compound is not particularly limited, and known compounds can be used, and may be an aliphatic polyfunctional isocyanate compound or an aromatic polyfunctional isocyanate compound. Specific examples of the polyfunctional isocyanate compound include 1,3-bis (isocyanatomethyl) cyclohexane, isophorone diisocyanate, trimethylene diisocyanate, tetramethylene diisocyanate, pentamethylene diisocyanate, hexamethylene diisocyanate, and 1,3-. Cyclopentane diisocyanate, 9H-fluorene-2,7-diisocyanate, 9H-fluoren-9-on-2,7-diisocyanate, 4,4'-diphenylmethane diisocyanate, 1,3-phenylenediisocyanate, trilen-2 , 4-Diisocyanate, Trilen-2,6-Diisocyanate, 1,3-bis (isocyanatomethyl) cyclohexane, 2,2-bis (4-isocyanatophenyl) hexafluoropropane, 1,5-di Isocyanatonaphthalene, dimers of these polyisocyanates, trimmers (isocyanurate bonds) and the like are preferably mentioned. Further, a biuret compound obtained by reacting the above polyisocyanate compound with a known amine compound may be used.
The polyfunctional ethylenically unsaturated compound having a hydroxy group is preferably a trifunctional or higher functional ethylenically unsaturated compound having a hydroxy group, and is a pentafunctional or higher functional ethylenically unsaturated compound having a hydroxy group. Is more preferable. The polyfunctional ethylenically unsaturated compound having a hydroxy group is preferably a polyfunctional (meth) acrylate compound having a hydroxy group.
 特定化合物B1は、機上現像性及び耐刷性の観点から、アダクト構造、ビウレット構造、及びイソシアヌレート構造よりなる群から選ばれた少なくとも1種の構造を有することが好ましい。上記と同様の観点から、特定化合物B1は、トリメチロールプロパンアダクト構造、ビウレット構造、及びイソシアヌレート構造よりなる群から選ばれた少なくとも1種の構造を有することがより好ましく、トリメチロールプロパンアダクト構造を有することが特に好ましい。 The specific compound B1 preferably has at least one structure selected from the group consisting of an adduct structure, a biuret structure, and an isocyanurate structure from the viewpoint of on-machine developability and print resistance. From the same viewpoint as above, it is more preferable that the specific compound B1 has at least one structure selected from the group consisting of a trimethylolpropane adduct structure, a biuret structure, and an isocyanurate structure, and the trimethylolpropane adduct structure is formed. It is particularly preferable to have.
 特定化合物B1は、機上現像性及び耐刷性の観点から、下記式(A-1)~式(A-3)のいずれかで表される構造を有することが好ましく、下記式(A-1)で表される構造を有することがより好ましい。 From the viewpoint of on-machine developability and print resistance, the specific compound B1 preferably has a structure represented by any of the following formulas (A-1) to (A-3), and the following formula (A-). It is more preferable to have the structure represented by 1).
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
 式(A-1)中、RA1は、水素原子、又は、炭素数1~8のアルキル基を表し、波線部分は他の構造との結合位置を表す。 In the formula (A-1), RA1 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and the wavy line portion represents a bond position with another structure.
 式(A-1)におけるRA1は、機上現像性及び耐刷性の観点から、水素原子、又は炭素数1~4のアルキル基であることが好ましく、炭素数1~3のアルキル基であることがより好ましく、メチル基又はエチル基であることが更に好ましく、エチル基であることが特に好ましい。 R A1 in the formula (A1), from the viewpoint of on-press development property and printing durability, a hydrogen atom, or preferably an alkyl group having 1 to 4 carbon atoms, an alkyl group having 1 to 3 carbon atoms It is more preferably present, more preferably a methyl group or an ethyl group, and particularly preferably an ethyl group.
 特定化合物B1は、機上現像性及び耐刷性の観点から、ウレタン基を有する(メタ)アクリレート化合物、即ち、ウレタン(メタ)アクリレートオリゴマーであることが好ましい。 The specific compound B1 is preferably a (meth) acrylate compound having a urethane group, that is, a urethane (meth) acrylate oligomer from the viewpoint of on-machine developability and print resistance.
 特定化合物B1は、エチレン性不飽和結合価が5.0mmol/g以上であれば、ポリエステル結合を有するオリゴマー(以降、ポリエステル(メタ)アクリレートオリゴマーともいう)であってもよいし、エポキシ残基を有するオリゴマー(以降、エポキシ(メタ)アクリレートオリゴマーともいう)であってもよい。
 ここで、エポキシ(メタ)アクリレートオリゴマー中のエポキシ残基は、既述の通りである。
The specific compound B1 may be an oligomer having a polyester bond (hereinafter, also referred to as a polyester (meth) acrylate oligomer) as long as the ethylenically unsaturated bond value is 5.0 mmol / g or more, or an epoxy residue may be used. It may be an oligomer having an oligomer (hereinafter, also referred to as an epoxy (meth) acrylate oligomer).
Here, the epoxy residues in the epoxy (meth) acrylate oligomer are as described above.
 特定化合物B1であるポリエステル(メタ)アクリレートオリゴマーにおけるエチレン性不飽和基の数は、3以上であることが好ましく、6以上であることが更に好ましい。 The number of ethylenically unsaturated groups in the polyester (meth) acrylate oligomer which is the specific compound B1 is preferably 3 or more, and more preferably 6 or more.
 特定化合物B1であるエポキシ(メタ)アクリレートオリゴマーとしては、化合物内にヒドロキシ基を含む化合物が好ましい。また、エポキシ(メタ)アクリレートオリゴマーにおけるエチレン性不飽和基の数は、2~6であることが好ましく、2~3であることがより好ましい。上記エポキシ(メタ)アクリレートオリゴマーとしては、例えば、エポキシ基を有する化合物にアクリル酸を反応することにより得ることができる。 As the epoxy (meth) acrylate oligomer which is the specific compound B1, a compound containing a hydroxy group in the compound is preferable. The number of ethylenically unsaturated groups in the epoxy (meth) acrylate oligomer is preferably 2 to 6, and more preferably 2 to 3. The epoxy (meth) acrylate oligomer can be obtained, for example, by reacting a compound having an epoxy group with acrylic acid.
 特定化合物B1の分子量(分子量分布を有する場合には、重量平均分子量)としては、1,000超が好ましく、1,100~10,000がより好ましく、1,100~5,000が更に好ましい。 The molecular weight of the specific compound B1 (weight average molecular weight when having a molecular weight distribution) is preferably more than 1,000, more preferably 1,100 to 10,000, and even more preferably 1,100 to 5,000.
 特定化合物B1は、合成品を用いてもよいし、市販品を用いてもよい。
 特定化合物B1の具体例としては、例えば、以下に挙げる市販品が挙げられるが、本開示にて用いられる特定化合物B1はこれらに限定されるものではない。なお、カッコ内には、エチレン性不飽和基の官能基数(又は平均官能基数)及びC=C価を示した。
 特定化合物B1の具体例としては、新中村化学工業(株)製のU-10HA(官能基数:10、C=C価:8mmol/g)、U-15HA(官能基数:15、C=C価:6mmol/g)、共栄社化学(株)製のUA-510H(官能基数:10、C=C価:8mmol/g)、ダイセル・オルネクス(株)製のKRM8452(官能基数:10、C=C価:7mmol/g)、サートマー社製のCN8885NS(官能基数:9、C=C価:6mmol/g)、CN9013NS(官能基数:9、C=C価:6mmol/g)等のウレタン(メタ)アクリレートオリゴマーが挙げられる。
 また、特定化合物B1の具体例としては、新中村化学工業(株)製のNKオリゴ EA-7420/PGMAc(官能基数:10~15、C=C価:5mmol/g)、サートマー社製のCN153(C=C価:5mmol/g)等のエポキシ(メタ)アクリレートオリゴマーが挙げられる。
 更に、特定化合物B1の具体例としては、サートマー社製のCN2267(C=C価:5mmol/g)等のポリエステル(メタ)アクリレートオリゴマーが挙げられる。
As the specific compound B1, a synthetic product or a commercially available product may be used.
Specific examples of the specific compound B1 include, for example, the following commercially available products, but the specific compound B1 used in the present disclosure is not limited thereto. The number of functional groups (or average number of functional groups) and C = C valence of the ethylenically unsaturated group are shown in parentheses.
Specific examples of the specific compound B1 include U-10HA (number of functional groups: 10, C = C value: 8 mmol / g) and U-15HA (number of functional groups: 15, C = C value) manufactured by Shin Nakamura Chemical Industry Co., Ltd. : 6 mmol / g), UA-510H manufactured by Kyoeisha Chemical Co., Ltd. (number of functional groups: 10, C = C value: 8 mmol / g), KRM8452 manufactured by Daicel Ornex Co., Ltd. (number of functional groups: 10, C = C) Urethane (meth) such as CN8885NS (number of functional groups: 9, C = C value: 6 mmol / g) and CN9013NS (number of functional groups: 9, C = C value: 6 mmol / g) manufactured by Sartmer Co., Ltd. Examples include acrylate oligomers.
Specific examples of the specific compound B1 include NK oligo EA-7420 / PGMAC (number of functional groups: 10 to 15, C = C value: 5 mmol / g) manufactured by Shin-Nakamura Chemical Industry Co., Ltd., and CN153 manufactured by Sartmer Co., Ltd. Epoxy (meth) acrylate oligomers such as (C = C value: 5 mmol / g) can be mentioned.
Further, specific examples of the specific compound B1 include polyester (meth) acrylate oligomers such as CN2267 (C = C value: 5 mmol / g) manufactured by Sartmer.
 特定化合物B1を用いる場合、画像記録層における重合性化合物の全質量に対する上記特定化合物B1の含有量は、10質量%~100質量%であることが好ましく、50質量%~100質量%であることがより好ましく、80質量%~100質量%であることが更に好ましい。 When the specific compound B1 is used, the content of the specific compound B1 in the image recording layer with respect to the total mass of the polymerizable compound is preferably 10% by mass to 100% by mass, preferably 50% by mass to 100% by mass. Is more preferable, and 80% by mass to 100% by mass is further preferable.
-特定化合物B2-
 重合性化合物としては、低分子化合物として、エチレン性不飽和結合基を1つ又は2つ有する化合物(以下、特定化合物B2ともいう。)を含んでいてもよい。
 特定化合物B2が有するエチレン性不飽和基の好ましい態様は、特定化合物B1におけるエチレン性不飽和基と同様である。
 また、特定化合物B2は、機上現像性の低下を抑制する観点から、エチレン性不飽和結合基を2つ有する化合物(即ち、2官能の重合性化合物)であることが好ましい。
-Specific compound B2-
The polymerizable compound may contain, as a low molecular weight compound, a compound having one or two ethylenically unsaturated bonding groups (hereinafter, also referred to as a specific compound B2).
A preferred embodiment of the ethylenically unsaturated group contained in the specific compound B2 is the same as that of the ethylenically unsaturated group in the specific compound B1.
Further, the specific compound B2 is preferably a compound having two ethylenically unsaturated bonding groups (that is, a bifunctional polymerizable compound) from the viewpoint of suppressing a decrease in on-machine developability.
 特定化合物B2としては、機上現像性及び耐刷性の観点から、メタクリレート化合物、即ち、メタクリロキシ基を有する化合物であることが好ましい。 The specific compound B2 is preferably a methacrylate compound, that is, a compound having a methacryloxy group, from the viewpoint of on-machine developability and print resistance.
 特定化合物B2としては、機上現像性の観点から、アルキレンオキシ構造又はウレタン結合を含むことが好ましい。 The specific compound B2 preferably contains an alkyleneoxy structure or a urethane bond from the viewpoint of on-machine developability.
 特定化合物B2の分子量(分子量分布を有する場合には、重量平均分子量)としては、50以上1,000未満であることが好ましく、200~900であることがより好ましく、250~800であることが更に好ましい。 The molecular weight (weight average molecular weight when having a molecular weight distribution) of the specific compound B2 is preferably 50 or more and less than 1,000, more preferably 200 to 900, and more preferably 250 to 800. More preferred.
 特定化合物B2の具体例を以下に挙げるが、本開示にて用いられる特定化合物B2はこれらに限定されるものではない。なお、下記(2)の化合物中、例えば、n+m=10である Specific examples of the specific compound B2 are given below, but the specific compound B2 used in the present disclosure is not limited thereto. In the compound of the following (2), for example, n + m = 10.
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036
 特定化合物B2としては、以下に示す市販品を用いてもよいが、本開示にて用いられる特定化合物B2はこれらに限定されるものではない。
 特定化合物B2の具体例としては、新中村化学工業(株)製のBPE-80N(上記(1)の化合物)、BPE-100、BPE-200、BPE-500、サートマー社製のCN104(上記(1)の化合物)等のエトキシ化ビスフェノールAジメタクリレートが挙げられる。
 また、特定化合物B2の具体例としては、新中村化学工業(株)製のA-BPE-10(上記(2)の化合物)、A-BPE-4等のエトキシ化ビスフェノールAジアクリレートが挙げられる。
 更に、特定化合物B2の具体例としては、AZ Electronics社製のFST 510等の2官能メタクリレートが挙げられる。
As the specific compound B2, commercially available products shown below may be used, but the specific compound B2 used in the present disclosure is not limited thereto.
Specific examples of the specific compound B2 include BPE-80N (compound of (1) above) manufactured by Shin Nakamura Chemical Industry Co., Ltd., BPE-100, BPE-200, BPE-500, and CN104 manufactured by Sartmer Co., Ltd. Examples thereof include ethoxylated bisphenol A dimethacrylate such as the compound of 1).
Specific examples of the specific compound B2 include ethoxylated bisphenol A diacrylates such as A-BPE-10 (compound of (2) above) manufactured by Shin Nakamura Chemical Industry Co., Ltd. and A-BPE-4. ..
Further, specific examples of the specific compound B2 include bifunctional methacrylate such as FST 510 manufactured by AZ Electronics.
 ここで、上記「FST 510」は、1モルの2,2,4-トリメチルヘキサメチレンジイソシアネートと2モルのヒドロキシエチルメタクリレートの反応生成物あって、上記(3)の化合物のメチルエチルケトン82質量%溶液である。 Here, the above "FST 510" is a reaction product of 1 mol of 2,2,4-trimethylhexamethylene diisocyanate and 2 mol of hydroxyethyl methacrylate, and is a solution of the compound of the above (3) in an 82% by mass of methyl ethyl ketone. is there.
 特定化合物B2の含有量は、機上現像性及び耐刷性の観点から、画像記録層の全質量に対して、1質量%~60質量%であることが好ましく、5質量%~55質量%であることがより好ましく、5質量%~50質量%であることが更に好ましい。
 特定化合物B2を用いる場合、画像記録層における重合性化合物の全質量に対する上記特定化合物B2の含有量は、10質量%~100質量%であることが好ましく、50質量%~100質量%であることがより好ましく、80質量%~100質量%であることが更に好ましい。
The content of the specific compound B2 is preferably 1% by mass to 60% by mass, and 5% by mass to 55% by mass, based on the total mass of the image recording layer, from the viewpoint of on-machine developability and print resistance. Is more preferable, and 5% by mass to 50% by mass is further preferable.
When the specific compound B2 is used, the content of the specific compound B2 with respect to the total mass of the polymerizable compound in the image recording layer is preferably 10% by mass to 100% by mass, preferably 50% by mass to 100% by mass. Is more preferable, and 80% by mass to 100% by mass is further preferable.
 重合性化合物の構造、単独使用か併用か、添加量等の使用方法の詳細は、任意に設定できる。
 重合性化合物の含有量は、画像記録層の全質量に対して、5質量%~75質量%であることが好ましく、10質量%~70質量%であることがより好ましく、15質量%~60質量%であることが特に好ましい。
The details of the method of use such as the structure of the polymerizable compound, whether it is used alone or in combination, and the amount of addition can be arbitrarily set.
The content of the polymerizable compound is preferably 5% by mass to 75% by mass, more preferably 10% by mass to 70% by mass, and 15% by mass to 60% by mass with respect to the total mass of the image recording layer. It is particularly preferably by mass%.
-粒子-
 上記画像記録層は、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、粒子を含むことが好ましい。
 粒子としては、有機粒子であっても、無機粒子であってもよいが、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、有機粒子を含むことが好ましく、ポリマー粒子を含むことがより好ましい。
 無機粒子としては、公知の無機粒子を用いることができ、シリカ粒子、チタニア粒子等の金属酸化物粒子を好適に用いることができる。
-particle-
The image recording layer preferably contains particles from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property.
The particles may be organic particles or inorganic particles, but are preferably containing organic particles from the viewpoints of UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property, and are polymer. It is more preferable to contain particles.
As the inorganic particles, known inorganic particles can be used, and metal oxide particles such as silica particles and titania particles can be preferably used.
 ポリマー粒子は、熱可塑性ポリマー粒子、熱反応性ポリマー粒子、重合性基を有するポリマー粒子、疎水性化合物を内包しているマイクロカプセル、及び、ミクロゲル(架橋ポリマー粒子)よりなる群から選ばれることが好ましい。中でも、重合性基を有するポリマー粒子又はミクロゲルが好ましい。特に好ましい実施形態では、ポリマー粒子は少なくとも1つのエチレン性不飽和重合性基を含む。このようなポリマー粒子の存在により、露光部の耐刷性及び未露光部の機上現像性を高める効果が得られる。
 また、ポリマー粒子は、熱可塑性ポリマー粒子であることが好ましい。
The polymer particles may be selected from the group consisting of thermoplastic polymer particles, heat-reactive polymer particles, polymer particles having a polymerizable group, microcapsules containing a hydrophobic compound, and microgels (crosslinked polymer particles). preferable. Of these, polymer particles or microgels having a polymerizable group are preferable. In a particularly preferred embodiment, the polymer particles contain at least one ethylenically unsaturated polymerizable group. The presence of such polymer particles has the effect of enhancing the print resistance of the exposed portion and the on-machine developability of the unexposed portion.
Further, the polymer particles are preferably thermoplastic polymer particles.
 熱可塑性ポリマー粒子としては、1992年1月のResearch Disclosure No.33303、特開平9-123387号公報、同9-131850号公報、同9-171249号公報、同9-171250号公報及び欧州特許第931647号明細書などに記載の熱可塑性ポリマー粒子が好ましい。
 熱可塑性ポリマー粒子を構成するポリマーの具体例としては、エチレン、スチレン、塩化ビニル、アクリル酸メチル、アクリル酸エチル、メタクリル酸メチル、メタクリル酸エチル、塩化ビニリデン、アクリロニトリル、ビニルカルバゾール、ポリアルキレン構造を有するアクリレート又はメタクリレートなどのモノマーのホモポリマー若しくはコポリマー又はそれらの混合物を挙げることができる。好ましくは、ポリスチレン、スチレン及びアクリロニトリルを含む共重合体、又は、ポリメタクリル酸メチルを挙げることができる。熱可塑性ポリマー粒子の平均粒径は0.01μm~3.0μmが好ましい。
As the thermoplastic polymer particles, Research Disclosure No. 1 of January 1992. The thermoplastic polymer particles described in 33303, JP-A-9-123387, JP-A-9-131850, JP-A-9-171249, JP-A-9-171250, and European Patent No. 931647 are preferable.
Specific examples of the polymer constituting the thermoplastic polymer particles include ethylene, styrene, vinyl chloride, methyl acrylate, ethyl acrylate, methyl methacrylate, ethyl methacrylate, vinylidene chloride, acrylonitrile, vinylcarbazole, and a polyalkylene structure. Examples include homopolymers or copolymers of monomers such as acrylates or methacrylates or mixtures thereof. Preferably, a copolymer containing polystyrene, styrene and acrylonitrile, or polymethylmethacrylate can be mentioned. The average particle size of the thermoplastic polymer particles is preferably 0.01 μm to 3.0 μm.
 熱反応性ポリマー粒子としては、熱反応性基を有するポリマー粒子が挙げられる。熱反応性ポリマー粒子は熱反応による架橋及びその際の官能基変化により疎水化領域を形成する。 Examples of the heat-reactive polymer particles include polymer particles having a heat-reactive group. The heat-reactive polymer particles form a hydrophobic region by cross-linking due to a heat reaction and the change of functional groups at that time.
 熱反応性基を有するポリマー粒子における熱反応性基としては、化学結合が形成されるならば、どのような反応を行う官能基でもよいが、重合性基であることが好ましく、その例として、ラジカル重合反応を行うエチレン性不飽和基(例えば、アクリロイル基、メタクリロイル基、ビニル基、アリル基など)、カチオン重合性基(例えば、ビニル基、ビニルオキシ基、エポキシ基、オキセタニル基など)、付加反応を行うイソシアナト基又はそのブロック体、エポキシ基、ビニルオキシ基及びこれらの反応相手である活性水素原子を有する官能基(例えば、アミノ基、ヒドロキシ基、カルボキシ基など)、縮合反応を行うカルボキシ基及び反応相手であるヒドロキシ基又はアミノ基、開環付加反応を行う酸無水物及び反応相手であるアミノ基又はヒドロキシ基などが好ましく挙げられる。 The thermally reactive group in the polymer particles having a thermally reactive group may be a functional group that undergoes any reaction as long as a chemical bond is formed, but a polymerizable group is preferable, and as an example, it is preferable. Eethylene unsaturated groups (eg, acryloyl group, methacryloyl group, vinyl group, allyl group, etc.), cationically polymerizable groups (eg, vinyl group, vinyloxy group, epoxy group, oxetanyl group, etc.), addition reaction Isocyanato group or a block thereof, an epoxy group, a vinyloxy group, a functional group having an active hydrogen atom which is a reaction partner thereof (for example, an amino group, a hydroxy group, a carboxy group, etc.), a carboxy group for performing a condensation reaction, and a reaction. Preferred examples thereof include a hydroxy group or an amino group as a partner, an acid anhydride for carrying out a ring-opening addition reaction, and an amino group or a hydroxy group as a reaction partner.
 マイクロカプセルとしては、例えば、特開2001-277740号公報、特開2001-277742号公報に記載のごとく、画像記録層の構成成分の少なくとも一部をマイクロカプセルに内包させたものである。画像記録層の構成成分は、マイクロカプセル外にも含有させることもできる。マイクロカプセルを含有する画像記録層は、疎水性の構成成分をマイクロカプセルに内包し、親水性の構成成分をマイクロカプセル外に含有する構成が好ましい態様である。 As the microcapsules, for example, as described in JP-A-2001-277740 and JP-A-2001-277742, at least a part of the constituent components of the image recording layer is encapsulated in the microcapsules. The constituent components of the image recording layer can also be contained outside the microcapsules. The image recording layer containing the microcapsules is preferably configured such that the hydrophobic constituents are encapsulated in the microcapsules and the hydrophilic constituents are contained outside the microcapsules.
 ミクロゲル(架橋ポリマー粒子)は、その表面又は内部の少なくとも一方に、画像記録層の構成成分の一部を含有することができる。特に、ラジカル重合性基をその表面に有する反応性ミクロゲルは、得られる平版印刷版原版の感度、及び、得られる平版印刷版の耐刷性の観点から好ましい。 The microgel (crosslinked polymer particles) can contain a part of the constituent components of the image recording layer on at least one of the surface or the inside thereof. In particular, a reactive microgel having a radically polymerizable group on its surface is preferable from the viewpoint of the sensitivity of the obtained lithographic printing plate original plate and the printing durability of the obtained lithographic printing plate.
 画像記録層の構成成分をマイクロカプセル化又はミクロゲル化するには、公知の方法が適用できる。 A known method can be applied to microencapsulate or microgelify the constituents of the image recording layer.
 また、ポリマー粒子としては、得られる平版印刷版の耐刷性、耐汚れ性及び保存安定性の観点から、分子中に2個以上のヒドロキシ基を有する多価フェノール化合物とイソホロンジイソシアネートとの付加物である多価イソシアネート化合物、及び、活性水素を有する化合物の反応により得られるものが好ましい。
 上記多価フェノール化合物としては、フェノール性ヒドロキシ基を有するベンゼン環を複数有している化合物が好ましい。
 上記活性水素を有する化合物としては、ポリオール化合物、又は、ポリアミン化合物が好ましく、ポリオール化合物がより好ましく、プロピレングリコール、グリセリン及びトリメチロールプロパンよりなる群から選ばれた少なくとも1種の化合物が更に好ましい。
 分子中に2個以上のヒドロキシ基を有する多価フェノール化合物とイソホロンジイソシアネートとの付加物である多価イソシアネート化合物、及び、活性水素を有する化合物の反応により得られる樹脂の粒子としては、特開2012-206495号公報の段落0032~0095に記載のポリマー粒子が好ましく挙げられる。
Further, as the polymer particles, an adduct of a polyhydric phenol compound having two or more hydroxy groups in the molecule and isophorone diisocyanate from the viewpoint of printing resistance, stain resistance and storage stability of the obtained flat plate printing plate. The one obtained by the reaction of the polyhydric isocyanate compound and the compound having active hydrogen is preferable.
As the multivalent phenol compound, a compound having a plurality of benzene rings having a phenolic hydroxy group is preferable.
As the compound having active hydrogen, a polyol compound or a polyamine compound is preferable, a polyol compound is more preferable, and at least one compound selected from the group consisting of propylene glycol, glycerin and trimethylolpropane is further preferable.
Examples of the resin particles obtained by the reaction of the polyhydric phenol compound having two or more hydroxy groups in the molecule, the polyhydric isocyanate compound which is an adduct of isophorone diisocyanate, and the compound having active hydrogen include The polymer particles described in paragraphs 0032 to 0905 of JP-206495 are preferably mentioned.
 更に、ポリマー粒子としては、得られる平版印刷版の耐刷性及び耐溶剤性の観点から、疎水性主鎖を有し、i)上記疎水性主鎖に直接的に結合されたペンダントシアノ基を有する構成ユニット、及び、ii)親水性ポリアルキレンオキシドセグメントを含むペンダント基を有する構成ユニットの両方を含むことが好ましい。
 上記疎水性主鎖としては、アクリル樹脂鎖が好ましく挙げられる。
 上記ペンダントシアノ基の例としては、-[CHCH(C≡N)-]又は-[CHC(CH)(C≡N)-]が好ましく挙げられる。
 また、上記ペンダントシアノ基を有する構成ユニットは、エチレン系不飽和型モノマー、例えば、アクリロニトリル又はメタクリロニトリルから、又は、これらの組み合わせから容易に誘導することができる。
 また、上記親水性ポリアルキレンオキシドセグメントにおけるアルキレンオキシドとしては、エチレンオキシド又はプロピレンオキシドが好ましく、エチレンオキシドがより好ましい。
 上記親水性ポリアルキレンオキシドセグメントにおけるアルキレンオキシド構造の繰り返し数は、10~100であることが好ましく、25~75であることがより好ましく、40~50であることが更に好ましい。
 疎水性主鎖を有し、i)上記疎水性主鎖に直接的に結合されたペンダントシアノ基を有する構成ユニット、及び、ii)親水性ポリアルキレンオキシドセグメントを含むペンダント基を有する構成ユニットの両方を含む樹脂の粒子としては、特表2008-503365号公報の段落0039~0068に記載のものが好ましく挙げられる。
Further, the polymer particles have a hydrophobic main chain from the viewpoint of printing resistance and solvent resistance of the obtained lithographic printing plate, and i) a pendant cyano group directly bonded to the hydrophobic main chain. It is preferable to include both a constituent unit having and ii) a constituent unit having a pendant group containing a hydrophilic polyalkylene oxide segment.
Acrylic resin chains are preferably mentioned as the hydrophobic main chain.
As an example of the pendant cyano group,-[CH 2 CH (C≡N)-] or-[CH 2 C (CH 3 ) (C≡N)-] is preferably mentioned.
In addition, the constituent unit having the pendant cyano group can be easily derived from an ethylene-based unsaturated monomer such as acrylonitrile or methacrylonitrile, or from a combination thereof.
Further, as the alkylene oxide in the hydrophilic polyalkylene oxide segment, ethylene oxide or propylene oxide is preferable, and ethylene oxide is more preferable.
The number of repetitions of the alkylene oxide structure in the hydrophilic polyalkylene oxide segment is preferably 10 to 100, more preferably 25 to 75, and even more preferably 40 to 50.
Both a constituent unit having a hydrophobic backbone and i) having a pendant cyano group directly attached to the hydrophobic backbone and ii) a constituent unit having a pendant group containing a hydrophilic polyalkylene oxide segment. As the resin particles containing the above, those described in paragraphs 0039 to 0068 of JP-A-2008-503365 are preferably mentioned.
 また、上記ポリマー粒子は、UV耐刷性、特色着肉性、及び、機上現像性の観点から、親水性基を有することが好ましい。
 上記親水性基としては、親水性を有する構造であれば、特に制限はないが、カルボキシ基等の酸基、ヒドロキシ基、アミノ基、シアノ基、ポリアルキレンオキシド構造等が挙げられる。
 中でも、機上現像性、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、ポリアルキレンオキシド構造が好ましく、ポリエチレンオキシド構造、ポリプロピレンオキシド構造、又は、ポリエチレン/プロピレンオキシド構造がより好ましい。
 また、機上現像性、及び、機上現像時の現像カス抑制性の観点からは、上記ポリアルキレンオキシド構造として、ポリプロピレンオキシド構造を有することが好ましく、ポリエチレンオキシド構造及びポリプロピレンオキシド構造を有することがより好ましい。
 また、上記親水性基としては、耐刷性、着肉性、及び、機上現像性の観点から、シアノ基を有する構成単位、又は、下記式Zで表される基を含むことが好ましく、下記式(AN)で表される構成単位、又は、下記式Zで表される基を含むことがより好ましく、下記式Zで表される基を含むことが特に好ましい。
 *-Q-W-Y 式Z
 式Z中、Qは二価の連結基を表し、Wは親水性構造を有する二価の基又は疎水性構造を有する二価の基を表し、Yは親水性構造を有する一価の基又は疎水性構造を有する一価の基を表し、W及びYのいずれかは親水性構造を有し、*は他の構造との結合部位を表す。
Further, the polymer particles preferably have a hydrophilic group from the viewpoint of UV printing resistance, special color carving property, and on-machine developability.
The hydrophilic group is not particularly limited as long as it has a hydrophilic structure, and examples thereof include an acid group such as a carboxy group, a hydroxy group, an amino group, a cyano group, and a polyalkylene oxide structure.
Among them, a polyalkylene oxide structure is preferable from the viewpoints of on-machine developability, UV printing resistance, UV plate skipping inhibitory property, and characteristic carving property, and a polyethylene oxide structure, a polypropylene oxide structure, or a polyethylene / propylene oxide structure Is more preferable.
Further, from the viewpoint of on-machine developability and ability to suppress development residue during on-machine development, the polyalkylene oxide structure preferably has a polypropylene oxide structure, and may have a polyethylene oxide structure and a polypropylene oxide structure. More preferred.
Further, the hydrophilic group preferably contains a structural unit having a cyano group or a group represented by the following formula Z from the viewpoint of print resistance, fillability and on-machine developability. It is more preferable to include a structural unit represented by the following formula (AN) or a group represented by the following formula Z, and it is particularly preferable to include a group represented by the following formula Z.
* -Q-W-Y formula Z
In formula Z, Q represents a divalent linking group, W represents a divalent group having a hydrophilic structure or a divalent group having a hydrophobic structure, and Y represents a monovalent group having a hydrophilic structure or It represents a monovalent group having a hydrophobic structure, either W or Y has a hydrophilic structure, and * represents a binding site with another structure.
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037
 式(AN)中、RANは、水素原子又はメチル基を表す。 In formula (AN), RAN represents a hydrogen atom or a methyl group.
 上記ポリマー粒子に含まれるポリマーは、UV耐刷性の観点から、シアノ基を有する化合物により形成される構成単位を含むことが好ましい。
 シアノ基は、通常、シアノ基を有する化合物(モノマー)を用いて、シアノ基を含む構成単位として樹脂Aに導入されることが好ましい。シアノ基を有する化合物としては、アクリロニトリル化合物が挙げられ、(メタ)アクリロニトリルが好適に挙げられる。
 シアノ基を有する構成単位としては、アクリロニトリル化合物により形成される構成単位であることが好ましく、(メタ)アクリロニトリルにより形成される構成単位、すなわち、上記式(AN)で表される構成単位がより好ましい。
 上記ポリマーが、シアノ基を有する構成単位を有するポリマーを含む場合、シアノ基を有する構成単位を有するポリマーにおけるシアノ基を有する構成単位、好ましくは上記式(AN)で表される構成単位の含有量は、UV耐刷性の観点から、シアノ基を有する構成単位を有するポリマーの全質量に対し、5質量%~90質量%であることが好ましく、20質量%~80質量%であることがより好ましく、30質量%~60質量%であることが特に好ましい。
From the viewpoint of UV print resistance, the polymer contained in the polymer particles preferably contains a structural unit formed of a compound having a cyano group.
The cyano group is usually preferably introduced into the resin A as a structural unit containing a cyano group by using a compound (monomer) having a cyano group. Examples of the compound having a cyano group include acrylonitrile compounds, and (meth) acrylonitrile is preferable.
The structural unit having a cyano group is preferably a structural unit formed of an acrylonitrile compound, and more preferably a structural unit formed of (meth) acrylonitrile, that is, a structural unit represented by the above formula (AN). ..
When the polymer contains a polymer having a structural unit having a cyano group, the content of the structural unit having a cyano group, preferably the structural unit represented by the above formula (AN), in the polymer having a structural unit having a cyano group. Is preferably 5% by mass to 90% by mass, and more preferably 20% by mass to 80% by mass, based on the total mass of the polymer having a structural unit having a cyano group, from the viewpoint of UV printing resistance. It is preferable, and it is particularly preferable that it is 30% by mass to 60% by mass.
 また、上記ポリマー粒子は、耐刷性、着肉性、特色着肉性、及び、機上現像性の観点から、上記式Zで表される基を有するポリマー粒子を含むことが好ましい。 Further, the polymer particles preferably contain polymer particles having a group represented by the above formula Z from the viewpoints of printing resistance, meat-forming property, special color-forming property, and on-machine developability.
 上記式ZにおけるQは、炭素数1~20の二価の連結基であることが好ましく、炭素数1~10の二価の連結基であることがより好ましい。
 また、上記式ZにおけるQは、アルキレン基、アリーレン基、エステル結合、アミド結合、又は、これらを2以上組み合わせた基であることが好ましく、フェニレン基、エステル結合、又は、アミド結合であることがより好ましい。
Q in the above formula Z is preferably a divalent linking group having 1 to 20 carbon atoms, and more preferably a divalent linking group having 1 to 10 carbon atoms.
Further, Q in the above formula Z is preferably an alkylene group, an arylene group, an ester bond, an amide bond, or a group in which two or more of these are combined, and may be a phenylene group, an ester bond, or an amide bond. More preferred.
 上記式ZのWにおける親水性構造を有する二価の基は、ポリアルキレンオキシ基、又は、ポリアルキレンオキシ基の一方の末端に-CHCHNR-が結合した基であることが好ましい。なお、Rは、水素原子又はアルキル基を表す。
 上記式ZのWにおける疎水性構造を有する二価の基は、-RWA-、-O-RWA-O-、-RN-RWA-NR-、-OC(=O)-RWA-O-、又は、-OC(=O)-RWA-O-であることが好ましい。なお、RWAはそれぞれ独立に、炭素数6~120の直鎖、分岐若しくは環状アルキレン基、炭素数6~120のハロアルキレン基、炭素数6~120のアリーレン基、炭素数6~120のアルカーリレン基(アルキルアリール基から水素原子を1つ除いた二価の基)、又は、炭素数6~120のアラルキレン基を表す。
The divalent group having a hydrophilic structure in W of the above formula Z is preferably a polyalkyleneoxy group or a group in which -CH 2 CH 2 NR W- is bonded to one end of a polyalkyleneoxy group. .. Incidentally, R W represents a hydrogen atom or an alkyl group.
The divalent group having a hydrophobic structure in the W of formula Z, -R WA -, - O -R WA -O -, - R W N-R WA -NR W -, - OC (= O) - It is preferably R WA- O- or -OC (= O) -R WA- O-. The RWAs are independently linear, branched or cyclic alkylene groups having 6 to 120 carbon atoms, haloalkylene groups having 6 to 120 carbon atoms, arylene groups having 6 to 120 carbon atoms, and alcoholylenes having 6 to 120 carbon atoms. It represents a group (a divalent group obtained by removing one hydrogen atom from an alkylaryl group) or an aralkylene group having 6 to 120 carbon atoms.
 上記式ZのYにおける親水性構造を有する一価の基は、-OH、-C(=O)OH、末端が水素原子又はアルキル基であるポリアルキレンオキシ基、又は、末端が水素原子又はアルキル基であるポリアルキレンオキシ基の他方の末端に-CHCHN(R)-が結合した基であることが好ましい。
 上記式ZのYにおける疎水性構造を有する一価の基は、炭素数6~120の直鎖、分岐若しくは環状アルキル基、炭素数6~120のハロアルキル基、炭素数6~120のアリール基、炭素数6~120のアルカーリル基(アルキルアリール基)、炭素数6~120のアラルキル基、-ORWB、-C(=O)ORWB、又は、-OC(=O)RWBであることが好ましい。RWBは、炭素数6~20を有するアルキル基を表す。
The monovalent group having a hydrophilic structure in Y of the above formula Z is -OH, -C (= O) OH, a polyalkyleneoxy group having a hydrogen atom or an alkyl group at the end, or a hydrogen atom or alkyl at the end. it is preferably bound group - at the other end of the polyalkyleneoxy group is a group -CH 2 CH 2 N (R W ).
The monovalent group having a hydrophobic structure in Y of the above formula Z is a linear, branched or cyclic alkyl group having 6 to 120 carbon atoms, a haloalkyl group having 6 to 120 carbon atoms, an aryl group having 6 to 120 carbon atoms, and the like. It may be an alcoholyl group (alkylaryl group) having 6 to 120 carbon atoms, an aralkyl group having 6 to 120 carbon atoms, -OR WB , -C (= O) OR WB , or -OC (= O) R WB. preferable. RWB represents an alkyl group having 6 to 20 carbon atoms.
 上記式Zで表される基を有するポリマー粒子は、耐刷性、着肉性、特色着肉性、及び、機上現像性の観点から、Wが親水性構造を有する二価の基であることがより好ましく、Qがフェニレン基、エステル結合、又は、アミド結合であり、Wは、ポリアルキレンオキシ基であり、Yが、末端が水素原子又はアルキル基であるポリアルキレンオキシ基であることがより好ましい。 The polymer particle having a group represented by the above formula Z is a divalent group in which W has a hydrophilic structure from the viewpoints of printing resistance, fleshing property, characteristic fleshing property, and on-machine developability. More preferably, Q is a phenylene group, an ester bond, or an amide bond, W is a polyalkyleneoxy group, and Y is a polyalkyleneoxy group having a hydrogen atom or an alkyl group at the end. More preferred.
 また、上記ポリマー粒子は、耐刷性、着肉性、特色着肉性、UV版飛び抑制性、及び、機上現像性の観点から、重合性基を有するポリマー粒子を含むことが好ましく、粒子表面に重合性基を有するポリマー粒子を含むことがより好ましい。
 更に、上記ポリマー粒子は、耐刷性の観点から、親水性基及び重合性基を有するポリマー粒子を含むことが好まし
 上記重合性基は、カチオン重合性基であっても、ラジカル重合性基であってもよいが、反応性の観点からは、ラジカル重合性基であることが好ましい。
 上記重合性基としては、重合可能な基であれば特に制限はないが、反応性の観点から、エチレン性不飽和基が好ましく、ビニルフェニル基(スチリル基)、(メタ)アクリロキシ基、又は、(メタ)アクリルアミド基がより好ましく、(メタ)アクリロキシ基が特に好ましい。
 また、重合性基を有するポリマー粒子におけるポリマーは、重合性基を有する構成単位を有することが好ましい。
 更に、高分子反応によりポリマー粒子表面に重合性基を導入してもよい。
Further, the polymer particles preferably contain polymer particles having a polymerizable group from the viewpoints of printing resistance, meat-forming property, special color-forming property, UV plate skipping inhibitory property, and on-machine developability. It is more preferable to contain polymer particles having a polymerizable group on the surface.
Further, from the viewpoint of printing resistance, the polymer particles preferably contain polymer particles having a hydrophilic group and a polymerizable group. Even if the polymerizable group is a cationically polymerizable group, it is a radically polymerizable group. However, from the viewpoint of reactivity, a radically polymerizable group is preferable.
The polymerizable group is not particularly limited as long as it is a polymerizable group, but from the viewpoint of reactivity, an ethylenically unsaturated group is preferable, and a vinylphenyl group (styryl group), a (meth) acryloxy group, or a (meth) acryloxy group, or A (meth) acrylamide group is more preferred, and a (meth) acryloxy group is particularly preferred.
Further, the polymer in the polymer particles having a polymerizable group preferably has a structural unit having a polymerizable group.
Further, a polymerizable group may be introduced on the surface of the polymer particles by a polymer reaction.
 また、上記ポリマー粒子は、耐刷性、着肉性、特色着肉性、UV版飛び抑制性、機上現像性、機上現像時の現像カス抑制性の観点から、ウレア結合を有する樹脂を含むことが好ましく、下記式(Iso)で表されるイソシアネート化合物と水とを少なくとも反応させて得られる構造を有する樹脂を含むことがより好ましく、下記式(Iso)で表されるイソシアネート化合物と水とを少なくとも反応させて得られる構造を有し、かつポリオキシアルキレン構造として、ポリエチレンオキシド構造及びポリプロピレンオキシド構造を有する樹脂を含むことが特に好ましい。また、上記ウレア結合を有する樹脂を含む粒子は、ミクロゲルであることが好ましい。 In addition, the polymer particles are made of a resin having a urea bond from the viewpoints of printing resistance, fleshing property, characteristic fleshing property, UV plate skipping suppressing property, on-machine development property, and developing residue suppressing property during on-machine development. It is preferable to include a resin having a structure obtained by at least reacting an isocyanate compound represented by the following formula (Iso) with water, and an isocyanate compound represented by the following formula (Iso) and water. It is particularly preferable to contain a resin having a structure obtained by at least reacting with and having a polyethylene oxide structure and a polypropylene oxide structure as the polyoxyalkylene structure. Further, the particles containing the resin having a urea bond are preferably microgels.
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
 式(Iso)中、nは0~10の整数を表す。 In the formula (Iso), n represents an integer from 0 to 10.
 上記式(Iso)で表されるイソシアネート化合物と水との反応の一例としては、下記に示す反応が挙げられる。なお、下記の例は、n=0、4,4-異性体を使用した例である。
 下記に示すように、上記式(Iso)で表されるイソシアネート化合物と水とを反応させると、水によりイソシアネート基の一部が加水分解し、アミノ基が生じ、生じたアミノ基とイソシアネート基とが反応し、ウレア結合が生成し、二量体が形成される。また、下記反応が繰り返され、ウレア結合を有する樹脂が形成される。
 また、下記反応において、アルコール化合物、アミン化合物等のイソシアネート基と反応性を有する化合物(活性水素を有する化合物)を添加することにより、アルコール化合物、アミン化合物等の構造をウレア結合を有する樹脂に導入することもできる。
 上記活性水素を有する化合物としては、上述したミクロゲルにおいて記載したものが好ましく挙げられる。
An example of the reaction between the isocyanate compound represented by the above formula (Iso) and water is the reaction shown below. The following example is an example using n = 0, 4,4-isomer.
As shown below, when the isocyanate compound represented by the above formula (Iso) is reacted with water, a part of the isocyanate group is hydrolyzed by water to generate an amino group, and the generated amino group and isocyanate group Reacts to form urea bonds and dimers are formed. Further, the following reaction is repeated to form a resin having a urea bond.
Further, in the following reaction, by adding a compound (compound having active hydrogen) reactive with an isocyanate group such as an alcohol compound or an amine compound, the structure of the alcohol compound or the amine compound is introduced into the resin having a urea bond. You can also do it.
As the compound having active hydrogen, those described in the above-mentioned microgel are preferably mentioned.
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039
 また、上記ウレア結合を有する樹脂は、エチレン性不飽和基を有することが好ましく、下記式(PETA)で表される基を有することがより好ましい。 Further, the resin having a urea bond preferably has an ethylenically unsaturated group, and more preferably has a group represented by the following formula (PETA).
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040
 式(PETA)中、波線部分は、他の構造との結合位置を表す。 In the formula (PETA), the wavy line part represents the connection position with other structures.
 上記粒子の平均粒径は、0.01μm~3.0μmが好ましく、0.03μm~2.0μmがより好ましく、0.10μm~1.0μmが更に好ましい。この範囲で良好な解像度と経時安定性が得られる。
 本開示における上記粒子の平均一次粒径は、光散乱法により測定するか、又は、粒子の電子顕微鏡写真を撮影し、写真上で粒子の粒径を総計で5,000個測定し、平均値を算出するものとする。なお、非球形粒子については写真上の粒子面積と同一の粒子面積を有する球形粒子の粒径値を粒径とする。
 また、本開示における平均粒径は、特に断りのない限り、体積平均粒径であるものとする。
The average particle size of the particles is preferably 0.01 μm to 3.0 μm, more preferably 0.03 μm to 2.0 μm, and even more preferably 0.10 μm to 1.0 μm. Good resolution and stability over time can be obtained in this range.
The average primary particle size of the particles in the present disclosure is measured by a light scattering method, or an electron micrograph of the particles is taken, and a total of 5,000 particle sizes are measured on the photograph, and the average value is obtained. Shall be calculated. For non-spherical particles, the particle size value of spherical particles having the same particle area as the particle area on the photograph is used as the particle size.
Further, the average particle size in the present disclosure shall be the volume average particle size unless otherwise specified.
 上記画像記録層は、粒子、特にポリマー粒子を1種単独で含有していても、2種以上を含有していてもよい。
 また、上記画像記録層における粒子、特にポリマー粒子の含有量は、現像性、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、上記画像記録層の全質量に対し、5質量%~90質量%が好ましく、10質量%~90質量%であることがより好ましく、20質量%~90質量%であることが更に好ましく、50質量%~90質量%であることが特に好ましい。
 また、上記画像記録層におけるポリマー粒子の含有量は、現像性、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、上記画像記録層層中の分子量3,000以上の成分の全質量に対し、20質量%~100質量%が好ましく、35質量%~100質量%であることがより好ましく、50質量%~100質量%であることが更に好ましく、80質量%~100質量%であることが特に好ましい。
The image recording layer may contain particles, particularly polymer particles, alone or in combination of two or more.
Further, the content of the particles in the image recording layer, particularly the polymer particles, is relative to the total mass of the image recording layer from the viewpoints of developability, UV printing resistance, UV plate skipping inhibitory property, and characteristic color carving property. It is preferably 5% by mass to 90% by mass, more preferably 10% by mass to 90% by mass, further preferably 20% by mass to 90% by mass, and 50% by mass to 90% by mass. Especially preferable.
Further, the content of the polymer particles in the image recording layer has a molecular weight of 3,000 or more in the image recording layer from the viewpoints of developability, UV printing resistance, UV plate skipping inhibitory property, and special color carving property. 20% by mass to 100% by mass, more preferably 35% by mass to 100% by mass, further preferably 50% by mass to 100% by mass, and 80% by mass to 100% by mass, based on the total mass of the components of. It is particularly preferably 100% by mass.
-バインダーポリマー-
 上記画像記録層は、バインダーポリマーを含んでいてもよいが、機上現像性、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、含まないことが好ましい。
 上記バインダーポリマーは、上記ポリマー粒子以外のポリマー、すなわち、粒子形状でないバインダーポリマーである。
 上記バインダーポリマーとしては、(メタ)アクリル樹脂、ポリビニルアセタール樹脂、又は、ポリウレタン樹脂が好ましい。
-Binder polymer-
The image recording layer may contain a binder polymer, but it is preferable that the image recording layer does not contain the binder polymer from the viewpoints of on-machine developability, UV printing resistance, UV plate skipping inhibitory property, and special color carving property.
The binder polymer is a polymer other than the polymer particles, that is, a binder polymer that is not in the form of particles.
As the binder polymer, a (meth) acrylic resin, a polyvinyl acetal resin, or a polyurethane resin is preferable.
 中でも、上記バインダーポリマーは、平版印刷版原版の画像記録層に用いられる公知のバインダーポリマーを好適に使用することができる。一例として、機上現像型の平版印刷版原版に用いられるバインダーポリマー(以下、機上現像用バインダーポリマーともいう。)について、詳細に記載する。
 機上現像用バインダーポリマーとしては、アルキレンオキシド鎖を有するバインダーポリマーが好ましい。アルキレンオキシド鎖を有するバインダーポリマーは、ポリ(アルキレンオキシド)部位を主鎖に有していても側鎖に有していてもよい。また、ポリ(アルキレンオキシド)を側鎖に有するグラフトポリマーでも、ポリ(アルキレンオキシド)含有繰返し単位で構成されるブロックと(アルキレンオキシド)非含有繰返し単位で構成されるブロックとのブロックコポリマーでもよい。
 ポリ(アルキレンオキシド)部位を主鎖に有する場合は、ポリウレタン樹脂が好ましい。ポリ(アルキレンオキシド)部位を側鎖に有する場合の主鎖のポリマーとしては、(メタ)アクリル樹脂、ポリビニルアセタール樹脂、ポリウレタン樹脂、ポリウレア樹脂、ポリイミド樹脂、ポリアミド樹脂、エポキシ樹脂、ポリスチレン樹脂、ノボラック型フェノール樹脂、ポリエステル樹脂、合成ゴム、天然ゴムが挙げられ、特に(メタ)アクリル樹脂が好ましい。
Above all, as the binder polymer, a known binder polymer used for the image recording layer of the lithographic printing plate original plate can be preferably used. As an example, a binder polymer (hereinafter, also referred to as a binder polymer for on-machine development) used in a machine-developed planographic printing plate original plate will be described in detail.
As the binder polymer for on-machine development, a binder polymer having an alkylene oxide chain is preferable. The binder polymer having an alkylene oxide chain may have a poly (alkylene oxide) moiety in the main chain or the side chain. Further, it may be a graft polymer having a poly (alkylene oxide) in a side chain, or a block copolymer of a block composed of a poly (alkylene oxide) -containing repeating unit and a block composed of a (alkylene oxide) -free repeating unit.
When the main chain has a poly (alkylene oxide) moiety, a polyurethane resin is preferable. When the main chain polymer has a poly (alkylene oxide) moiety in the side chain, the polymer of the main chain is (meth) acrylic resin, polyvinyl acetal resin, polyurethane resin, polyurea resin, polyimide resin, polyamide resin, epoxy resin, polystyrene resin, novolak type. Examples thereof include phenol resin, polyester resin, synthetic rubber and natural rubber, and (meth) acrylic resin is particularly preferable.
 また、バインダーポリマーの他の好ましい例として、6官能以上10官能以下の多官能チオールを核として、この核に対しスルフィド結合により結合したポリマー鎖を有し、当該ポリマー鎖が重合性基を有する高分子化合物(以下、星型高分子化合物ともいう。)が挙げられる。星型高分子化合物としては、例えば、特開2012-148555号公報に記載の化合物を好ましく用いることができる。 Further, as another preferable example of the binder polymer, a high molecular weight polymer chain having a polyfunctional thiol having 6 or more functionalities and 10 or less functional as a nucleus and being bonded to the nucleus by a sulfide bond, and the polymer chain having a polymerizable group Examples thereof include molecular compounds (hereinafter, also referred to as star-shaped polymer compounds). As the star-shaped polymer compound, for example, the compound described in JP2012-148555 can be preferably used.
 星型高分子化合物は、特開2008-195018号公報に記載のような画像部の皮膜強度を向上するためのエチレン性不飽和結合等の重合性基を、主鎖又は側鎖、好ましくは側鎖に有しているものが挙げられる。重合性基によってポリマー分子間に架橋が形成され、硬化が促進する。
 重合性基としては、(メタ)アクリル基、ビニル基、アリル基、スチリル基などのエチレン性不飽和基やエポキシ基等が好ましく、(メタ)アクリル基、ビニル基、スチリル基が重合反応性の観点でより好ましく、(メタ)アクリル基が特に好ましい。これらの基は高分子反応や共重合によってポリマーに導入することができる。例えば、カルボキシ基を側鎖に有するポリマーとグリシジルメタクリレートとの反応、あるいはエポキシ基を有するポリマーとメタクリル酸などのエチレン性不飽和基含有カルボン酸との反応を利用できる。これらの基は併用してもよい。
The star-shaped polymer compound contains a polymerizable group such as an ethylenically unsaturated bond for improving the film strength of the image portion as described in JP-A-2008-195018, with a main chain or a side chain, preferably a side chain. Examples include those held in the chain. The polymerizable group forms crosslinks between the polymer molecules to promote curing.
As the polymerizable group, an ethylenically unsaturated group such as a (meth) acrylic group, a vinyl group, an allyl group or a styryl group or an epoxy group is preferable, and a (meth) acrylic group, a vinyl group or a styryl group is polymerizable. From the viewpoint, it is more preferable, and a (meth) acrylic group is particularly preferable. These groups can be introduced into the polymer by polymer reaction or copolymerization. For example, a reaction between a polymer having a carboxy group in the side chain and glycidyl methacrylate, or a reaction between a polymer having an epoxy group and an ethylenically unsaturated group-containing carboxylic acid such as methacrylic acid can be used. These groups may be used together.
 バインダーポリマーの分子量は、GPC法によるポリスチレン換算値として重量平均分子量(Mw)が、2,000以上であることが好ましく、5,000以上であることがより好ましく、10,000~300,000であることが更に好ましい。 The molecular weight of the binder polymer preferably has a weight average molecular weight (Mw) of 2,000 or more, more preferably 5,000 or more, and is 10,000 to 300,000 as a polystyrene-equivalent value by the GPC method. It is more preferable to have.
 必要に応じて、特開2008-195018号公報に記載のポリアクリル酸、ポリビニルアルコールなどの親水性ポリマーを併用することができる。また、親油的なポリマーと親水的なポリマーとを併用することもできる。 If necessary, hydrophilic polymers such as polyacrylic acid and polyvinyl alcohol described in JP-A-2008-195018 can be used in combination. In addition, a lipophilic polymer and a hydrophilic polymer can be used in combination.
 また、本開示に用いられるバインダーポリマーは、例えば、経時による機上現像性の低下を抑制する観点から、ガラス転移温度(Tg)が50℃以上であることが好ましく、70℃以上であることがより好ましく、80℃以上であることが更に好ましく、90℃以上であることが特に好ましい。
 また、バインダーポリマーのガラス転移温度の上限としては、画像記録層への水の浸み込みやすさの観点から、200℃が好ましく、120℃以下がより好ましい。
Further, the binder polymer used in the present disclosure preferably has a glass transition temperature (Tg) of 50 ° C. or higher, preferably 70 ° C. or higher, from the viewpoint of suppressing a decrease in on-machine developability over time. More preferably, it is more preferably 80 ° C. or higher, and particularly preferably 90 ° C. or higher.
The upper limit of the glass transition temperature of the binder polymer is preferably 200 ° C., more preferably 120 ° C. or lower, from the viewpoint of easy water penetration into the image recording layer.
 上記のガラス転移温度を有するバインダーポリマーとしては、経時による機上現像性の低下をより抑制する観点から、ポリビニルアセタールが好ましい。 As the binder polymer having the above glass transition temperature, polyvinyl acetal is preferable from the viewpoint of further suppressing the decrease in on-machine developability with time.
 ポリビニルアセタールは、ポリビニルアルコールのヒドロキシ基をアルデヒドにてアセタール化させて得られた樹脂である。
 特に、ポリビニルアルコールのヒドロキシ基を、ブチルアルデヒドでアセタール化(即ち、ブチラール化)したポリビニルブチラールが好ましい。
 ポリビニルアセタールは、ポリビニルアルコールのヒドロキシ基をアルデヒドにてアセタール化することで、下記(a)で表される構成単位を含むことが好ましい。
Polyvinyl acetal is a resin obtained by acetalizing the hydroxy group of polyvinyl alcohol with an aldehyde.
In particular, polyvinyl butyral in which the hydroxy group of polyvinyl alcohol is acetalized (that is, butyralized) with butyraldehyde is preferable.
The polyvinyl acetal preferably contains a structural unit represented by the following (a) by acetalizing the hydroxy group of polyvinyl alcohol with an aldehyde.
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041
 ここで、Rとしては、アセタール化に用いられたアルデヒドの残基を表す。
 Rとしては、水素原子、アルキル基等の他、後述するエチレン性不飽和基が挙げられる。
Here, R represents a residue of the aldehyde used for acetalization.
Examples of R include a hydrogen atom, an alkyl group and the like, as well as an ethylenically unsaturated group described later.
 上記(a)で表される構成単位の含有量(上記(a)で表される構成単位に含まれる主鎖のエチレン基量ともいう。また、アセタール化度ともいう。)としては、ポリビニルアセタールの全構成単位(主鎖の全エチレン基量)に対して、50mol%~90mol%が好ましく、55mol%~85mol%がより好ましく、55mol%~80mol%が更に好ましい。
 なお、アセタール化度とは、アセタール基が結合しているエチレン基量(上記(a)で表される構成単位に含まれる主鎖のエチレン基量)を、主鎖の全エチレン基量で除して求めたモル分率を百分率で示した値である。
 また、後述のポリビニルアセタールの各構成単位の含有量においても、同様である。
The content of the structural unit represented by (a) above (also referred to as the amount of ethylene groups in the main chain contained in the structural unit represented by (a) above, and also referred to as the degree of acetalization) is polyvinyl acetal. 50 mol% to 90 mol% is preferable, 55 mol% to 85 mol% is more preferable, and 55 mol% to 80 mol% is further more preferable with respect to the total structural unit (total ethylene group amount of the main chain).
The degree of acetalization is the amount of ethylene groups to which acetal groups are bonded (the amount of ethylene groups in the main chain included in the structural unit represented by (a) above) divided by the total amount of ethylene groups in the main chain. It is a value showing the molar fraction obtained by the above as a percentage.
The same applies to the content of each structural unit of polyvinyl acetal, which will be described later.
 ポリビニルアセタールは、耐刷性向上の観点から、エチレン性不飽和基を有することが好ましい。
 ここで、ポリビニルアセタールが有するエチレン性不飽和基としては特に制限はなく、反応性、機上現像性、及び耐刷性の観点から、ビニルフェニル基(スチリル基)、ビニルエステル基、ビニルエーテル基、アリル基、(メタ)アクリロキシ基、及び(メタ)アクリルアミド基からなる群より選ばれた少なくとも1種の基であることがより好ましく、ビニル基、アリル基、(メタ)アクリロキシ基等が好ましい。
The polyvinyl acetal preferably has an ethylenically unsaturated group from the viewpoint of improving printing resistance.
Here, the ethylenically unsaturated group contained in the polyvinyl acetal is not particularly limited, and from the viewpoint of reactivity, on-machine developability, and print resistance, a vinylphenyl group (styryl group), a vinyl ester group, a vinyl ether group, It is more preferable that it is at least one group selected from the group consisting of an allyl group, a (meth) acryloxy group, and a (meth) acrylamide group, and a vinyl group, an allyl group, a (meth) acryloxy group and the like are preferable.
 ポリビニルアセタールが、耐刷性向上の観点から、エチレン性不飽和基を有する構成単位を含むことが好ましい。
 エチレン性不飽和基を有する構成単位としては、上述のアセタール環を有する構成単位であってもよいし、アセタール環を有する構成単位以外の構成単位であってもよい。
 中でも、露光時の架橋密度増加の観点から、ポリビニルアセタールは、アセタール環にエチレン性不飽和基が導入された化合物であることが好ましい。即ち、上述の(a)で表される構成単位において、Rにエチレン性不飽和基を有することが好ましい。
From the viewpoint of improving printing resistance, the polyvinyl acetal preferably contains a structural unit having an ethylenically unsaturated group.
The structural unit having an ethylenically unsaturated group may be a structural unit having an acetal ring described above, or a structural unit other than the structural unit having an acetal ring.
Above all, from the viewpoint of increasing the crosslink density during exposure, polyvinyl acetal is preferably a compound in which an ethylenically unsaturated group is introduced into the acetal ring. That is, it is preferable that R has an ethylenically unsaturated group in the structural unit represented by (a) above.
 エチレン性不飽和基を有する構成単位が、アセタール環を有する構成単位以外の構成単位である場合、例えば、アクリレート基を有する構成単位、具体的には、下記(d)で表される構成単位であってもよい。 When the structural unit having an ethylenically unsaturated group is a structural unit other than the structural unit having an acetal ring, for example, the structural unit having an acrylate group, specifically, the structural unit represented by the following (d). There may be.
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042
 エチレン性不飽和基を有する構成単位がアセタール環を有する構成単位以外の構成単位である場合、この構成単位の含有量(アクリレート基量ともいう)としては、ポリビニルアセタールの全構成単位に対して、1mol%~15mol%が好ましく、1mol%~10mol%がより好ましい。 When the structural unit having an ethylenically unsaturated group is a structural unit other than the structural unit having an acetal ring, the content of this structural unit (also referred to as the amount of acrylate groups) is the same as that of all the structural units of polyvinyl acetal. It is preferably 1 mol% to 15 mol%, more preferably 1 mol% to 10 mol%.
 ポリビニルアセタールとしては、更に、機上現像性等の観点から、ヒドロキシ基を有する構成単位を含むことが好ましい。つまり、上記ポリビニルアセタールは、ビニルアルコールに由来する構成単位を含むことが好ましい。
 ヒドロキシ基を有する構成単位としては、下記(b)で表される構成単位が挙げられる。
The polyvinyl acetal preferably further contains a structural unit having a hydroxy group from the viewpoint of on-machine developability and the like. That is, the polyvinyl acetal preferably contains a structural unit derived from vinyl alcohol.
Examples of the structural unit having a hydroxy group include the structural unit represented by the following (b).
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
 上記(b)で表される構成単位の含有量(水酸基量ともいう)としては、機上現像性の観点から、ポリビニルアセタールの全構成単位に対して、5mol%~50mol%が好ましく、10mol%~40mol%がより好ましく、20mol%~40mol%が更に好ましい。 The content (also referred to as the amount of hydroxyl groups) of the structural unit represented by (b) above is preferably 5 mol% to 50 mol%, preferably 10 mol%, based on all the structural units of polyvinyl acetal from the viewpoint of on-machine developability. It is more preferably from 40 mol%, still more preferably from 20 mol% to 40 mol%.
 上記ポリビニルアセタールとしては、更に、その他の構成単位を含んでいてもよい。
 その他の構成単位としては、例えば、アセチル基を有する構成単位、具体的には、以下(c)で表される構成単位が挙げられる。
The polyvinyl acetal may further contain other structural units.
Examples of the other structural unit include a structural unit having an acetyl group, specifically, a structural unit represented by the following (c).
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000044
 上記(c)で表される構成単位の含有量(アセチル基量ともいう)としては、ポリビニルアセタールの全構成単位に対して、0.5mol%~10mol%が好ましく、0.5mol%~8mol%がより好ましく、1mol%~3mol%が更に好ましい。 The content (also referred to as the amount of acetyl group) of the structural unit represented by the above (c) is preferably 0.5 mol% to 10 mol%, preferably 0.5 mol% to 8 mol%, based on all the structural units of polyvinyl acetal. Is more preferable, and 1 mol% to 3 mol% is further preferable.
 ここで、上記アセタール化度、アクリレート基量、水酸基量、及びアセチル基量、は、以下のようにして求めることができる。
 即ち、H NMR測定によって、アセタールのメチル又はメチレン部位、アクリレート基のメチル部位、水酸基及びアセチル基のメチル部位のプロトンピーク面積比からmol含有率を算出する。
Here, the degree of acetalization, the amount of acrylate groups, the amount of hydroxyl groups, and the amount of acetyl groups can be determined as follows.
That is, the mol content is calculated from the proton peak area ratios of the methyl or methylene moiety of acetal, the methyl moiety of the acrylate group, and the methyl moiety of the hydroxyl group and the acetyl group by 1 H NMR measurement.
 上記ポリビニルアセタールの重量平均分子量としては、18,000~150,000が好ましい。 The weight average molecular weight of the polyvinyl acetal is preferably 18,000 to 150,000.
 上記ポリビニルアセタールの溶解度パラメータ(SP値ともいう)は、17.5MPa1/2~20.0MPa1/2であることが好ましく、18.0MPa1/2~19.5MPa1/2であることがより好ましい。
 ここで、本開示における「溶解度パラメータ(単位:(MPa)1/2)」は、ハンセン(Hansen)溶解度パラメータを用いるものとする。
 ハンセン(Hansen)溶解度パラメータは、ヒルデブランド(Hildebrand)によって導入された溶解度パラメータを、分散項δd、極性項δp、水素結合項δhの3成分に分割し、3次元空間に表したものであるが、本開示においては溶解度パラメータ(以降、SP値ともいう)をδ(単位:(MPa)1/2)で表し、下記式を用いて算出される値を用いる。
  δ(MPa)1/2=(δd+δp+δh1/2
 なお、この分散項δd、極性項δp、及び水素結合項δhは、ハンセンやその研究後継者らにより多く求められており、Polymer Handbook (fourth edition)、VII-698~711に詳しく掲載されている。また、ハンセンの溶解度パラメータの値の詳細については、Charles M.Hansen著の文献「Hansen Solubility Parameters; A Users Handbook (CRC Press,2007)」に記載されている。
 本開示において、化合物の部分構造におけるハンセン溶解度パラメータは、コンピュータソフトウェア「Hansen Solubility Parameters in Practice(HSPiP ver.4.1.07)」を用いることにより、その化学構造から推算した値を用いることもできる。
 また、本開示においては、化合物が付加重合型、重縮合型等のポリマーである場合は、モノマー単位ごとのSP値をモル分率で掛け合わせた総量で示し、化合物がモノマー単位を有しない低分子化合物である場合は、化合物全体のSP値とする。
 なお、本開示において、ポリマーのSP値は、ポリマーの分子構造からPolymer Handbook (fourth edition)に記載のHoy法により計算してもよい。
Solubility parameter of the polyvinyl acetal (also referred to as SP value) is preferably from 17.5MPa 1/2 ~ 20.0MPa 1/2, to be 18.0MPa 1/2 ~ 19.5MPa 1/2 More preferable.
Here, the “solubility parameter (unit: (MPa) 1/2 )” in the present disclosure uses the Hansen solubility parameter.
The Hansen solubility parameter is a three-dimensional space obtained by dividing the solubility parameter introduced by Hildebrand into three components, a dispersion term δd, a polarity term δp, and a hydrogen bond term δh. In the present disclosure, the solubility parameter (hereinafter, also referred to as SP value) is represented by δ (unit: (MPa) 1/2 ), and a value calculated using the following formula is used.
δ (MPa) 1/2 = (δd 2 + δp 2 + δh 2 ) 1/2
The dispersion term δd, the polarity term δp, and the hydrogen bond term δh are more sought after by Hansen and his successors, and are described in detail in the Polymer Handbook (fourth edition), VII-698-711. .. The details of the value of the solubility parameter of Hansen are described in the document "Hansen Solubility Parameters; A Users Handbook (CRC Press, 2007)" by Charles M. Hansen.
In the present disclosure, the Hansen solubility parameter in the partial structure of the compound can be a value estimated from the chemical structure by using the computer software "Hansen Solubility Parameters in Practice (HSPiP ver.4.1.07)".
Further, in the present disclosure, when the compound is an addition polymerization type, polycondensation type or the like polymer, the SP value for each monomer unit is shown as the total amount multiplied by the molar fraction, and the compound has no monomer unit. If it is a molecular compound, it is the SP value of the entire compound.
In the present disclosure, the SP value of the polymer may be calculated from the molecular structure of the polymer by the Hoy method described in the Polymer Handbook (fourth edition).
 上記ポリビニルアセタールの具体例[P-1~P-3]を以下に挙げるが、本開示に用いられるポリビニルアセタールはこれらに限定されるものではない。
 下記構造中、「l」は50mol%~90mol%であり、「m」は0.5mol%~10質量%であり、「n」は5mol%~50mol%であり、「o」は1mol%~15mol%である。
Specific examples of the above-mentioned polyvinyl acetals [P-1 to P-3] are listed below, but the polyvinyl acetals used in the present disclosure are not limited thereto.
In the structure below, "l" is 50 mol% to 90 mol%, "m" is 0.5 mol% to 10 mass%, "n" is 5 mol% to 50 mol%, and "o" is 1 mol% to 1 mol%. It is 15 mol%.
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
 上記ポリビニルアセタールとしては、市販品を用いることができる。
 ポリビニルアセタールの市販品としては、積水化学工業(株)のエスレックシリーズ(具体的には、エスレック BX-L,BX-1,BX-5,BL-7Z,BM-1,BM-5,BH-6,BH-3等)が挙げられる。
As the polyvinyl acetal, a commercially available product can be used.
As a commercial product of polyvinyl acetal, Sekisui Chemical Co., Ltd.'s Eslek series (specifically, Eslek BX-L, BX-1, BX-5, BL-7Z, BM-1, BM-5, BH -6, BH-3, etc.).
 本開示における画像記録層には、フッ素原子を有する樹脂を含有することが好ましく、フルオロ脂肪族基含有共重合体を含有することがより好ましい。
 フッ素原子を有する樹脂、特にフルオロ脂肪族基含有共重合体を用いることで、画像記録層の形成時の発泡による面質異常を抑制し、塗布面状を高めることができ、更に、形成された画像記録層のインキの着肉性を高められる。
 また、フルオロ脂肪族基含有共重合体を含む画像記録層は、階調が高くなり、例えば、レーザー光に対して高感度となり、散乱光、反射光等によるかぶり性が良好で耐刷性に優れる平版印刷版が得られる。
The image recording layer in the present disclosure preferably contains a resin having a fluorine atom, and more preferably contains a fluoroaliphatic group-containing copolymer.
By using a resin having a fluorine atom, particularly a fluoroaliphatic group-containing copolymer, it is possible to suppress surface quality abnormalities due to foaming during formation of the image recording layer, improve the coating surface shape, and further form the image recording layer. The inking property of the ink in the image recording layer can be improved.
In addition, the image recording layer containing the fluoroaliphatic group-containing copolymer has high gradation, for example, high sensitivity to laser light, good fog resistance due to scattered light, reflected light, etc., and excellent printing resistance. An excellent lithographic printing plate can be obtained.
 上記フルオロ脂肪族基含有共重合体は、下記式(F1)及び下記式(F2)のいずれかで表される化合物により形成される構成単位を有することが好ましい。 The fluoroaliphatic group-containing copolymer preferably has a structural unit formed of a compound represented by either the following formula (F1) or the following formula (F2).
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
 式(F1)及び(F2)中、RF1は、それぞれ独立に、水素原子又はメチル基を表し、Xは、それぞれ独立に、酸素原子、硫黄原子、又は-N(RF2)-を表し、mは1~6の整数を表し、nは1~10の整数を表し、lは0~10の整数を表し、RF2は水素原子又は炭素数1~4のアルキル基を表す。 In formulas (F1) and (F2), R F1 independently represents a hydrogen atom or a methyl group, and X independently represents an oxygen atom, a sulfur atom, or -N ( RF2 )-. m represents an integer of 1 ~ 6, n represents an integer of 1 ~ 10, l represents an integer of 0 ~ 10, R F2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
 式(F1)及び(F2)におけるRF2で表される炭素数1~4のアルキル基としては、メチル基、エチル基、n-プロピル基、又はn-ブチル基が好ましく、水素原子又はメチル基がより好ましい。
 式(F1)及び(F2)におけるXは、酸素原子であることが好ましい。
 式(F1)におけるmは1又は2が好ましく、2がより好ましい。
 式(F1)におけるnは、2、4、6、8、又は10が好ましく、4又は6がより好ましい。
 式(F1)におけるlは、0が好ましい。
The alkyl group having 1 to 4 carbon atoms represented by RF2 in the formulas (F1) and (F2) is preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, preferably a hydrogen atom or a methyl group. Is more preferable.
It is preferable that X in the formulas (F1) and (F2) is an oxygen atom.
The m in the formula (F1) is preferably 1 or 2, and more preferably 2.
N in the formula (F1) is preferably 2, 4, 6, 8, or 10, and more preferably 4 or 6.
The l in the formula (F1) is preferably 0.
 フッ素原子を有する樹脂に用いられるフッ素原子を有するモノマーの具体例を以下に示すが、これらに限定されるものではない。 Specific examples of the monomer having a fluorine atom used in the resin having a fluorine atom are shown below, but the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000058
Figure JPOXMLDOC01-appb-C000058
 上記フルオロ脂肪族基含有共重合体は、上記式(F1)及び式(F2)のいずれかで表される化合物から形成される構成単位に加え、ポリ(オキシアルキレン)アクリレート及びポリ(オキシアルキレン)メタクリレートよりなる群から選択される少なくとも1種の化合物により形成される構成単位を更に有することが好ましい。 The fluoroaliphatic group-containing copolymer is composed of poly (oxyalkylene) acrylate and poly (oxyalkylene) in addition to the structural unit formed from the compound represented by any of the above formulas (F1) and (F2). It is preferable to further have a structural unit formed by at least one compound selected from the group consisting of methacrylates.
 上記ポリ(オキシアルキレン)アクリレート及びポリ(オキシアルキレン)メタクリレート中のポリオキシアルキレン基は、-(ORF3-で表すことができ、RF3はアルキル基を表し、xは2以上の整数を表す。RF3としては、直鎖状又は分岐状の炭素数2~4のアルキレン基であることが好ましい。直鎖状又は分岐状の炭素数2~4のアルキレン基としては、-CHCH-、-CHCHCH-、-CH(CH)CH-、又は-CH(CH)CH(CH)-であることが好ましい。xは、2~100の整数が好ましい。
 上記ポリオキシアルキレン基中、x個の「ORF3」は、それぞれ同一であってもよく、異なっていてもよい。つまり、上記ポリオキシアルキレン基は、2種以上の「ORF3」が規則的に又は不規則に結合したものであってもよい。例えば、上記ポリオキシアルキレン基は、直鎖状又は分岐状のオキシプロピレン単位とオキシエチレン単位とが規則的に又は不規則に結合したものであってもよい。より具体的には、上記ポリオキシアルキレン基は、直鎖又は分岐状のオキシプロピレン単位のブロックとオキシエチレン単位のブロックとが結合したものであってもよい。
 なお、ポリオキシアルキレン基中には、1つ又は複数の連結基(例えば、-CONH-Ph-NHCO-、-S-等、ここで、Phはフェニレン基を表す。)を含んでいてもよい。
 上記ポリオキシアルキレン基の分子量は、250~3,000が好ましい。
The polyoxyalkylene group in the poly (oxyalkylene) acrylate and the poly (oxyalkylene) methacrylate can be represented by- (OR F3 ) x- , RF3 represents an alkyl group, and x is an integer of 2 or more. Represent. The RF3 is preferably a linear or branched alkylene group having 2 to 4 carbon atoms. Examples of the linear or branched alkylene group having a carbon number of 2 ~ 4, -CH 2 CH 2 -, - CH 2 CH 2 CH 2 -, - CH (CH 3) CH 2 -, or -CH (CH 3 ) CH (CH 3 )-preferably. x is preferably an integer of 2 to 100.
Among the polyoxyalkylene groups, x "OR F3 " may be the same or different. That is, the polyoxyalkylene group may be one in which two or more kinds of "OR F3 " are regularly or irregularly bonded. For example, the polyoxyalkylene group may be one in which linear or branched oxypropylene units and oxyethylene units are regularly or irregularly bonded. More specifically, the polyoxyalkylene group may be a combination of a linear or branched block of oxypropylene units and a block of oxyethylene units.
The polyoxyalkylene group may contain one or more linking groups (for example, -CONH-Ph-NHCO-, -S-, etc., where Ph represents a phenylene group). ..
The molecular weight of the polyoxyalkylene group is preferably 250 to 3,000.
 上記ポリ(オキシアルキレン)アクリレート及びポリ(オキシアルキレン)メタクリレートとしては、市販品を用いてもよいし、合成品を用いてもよい。
 上記ポリ(オキシアルキレン)アクリレート及びポリ(オキシアルキレン)メタクリレートは、例えば、ヒドロキシポリ(オキシアルキレン)化合物と、アクリル酸、メタクリル酸、アクリルクロリド、メタクリルクロリド、無水アクリル酸等とを公知の方法で反応させることによって合成することができる。
 上記ヒドロキシポリ(オキシアルキレン)化合物としては、市販品を用いてもよく、例えば、(株)ADEKA製のアデカ(登録商標) プルロニック、(株)ADEKA製のアデカポリエーテル、ユニオン・カーバイド社製のCarbowax(登録商標)、ダウ・ケミカル社製のTriton)、第一工業製薬(株)製のPEG等が挙げられる。
 なお、ポリ(オキシアルキレン)アクリレート及びポリ(オキシアルキレン)メタクリレートとしては、公知の方法で合成した、ポリ(オキシアルキレン)ジアクリレート等を用いてもよい。
As the poly (oxyalkylene) acrylate and the poly (oxyalkylene) methacrylate, a commercially available product or a synthetic product may be used.
The poly (oxyalkylene) acrylate and the poly (oxyalkylene) methacrylate react, for example, with a hydroxypoly (oxyalkylene) compound with acrylic acid, methacrylic acid, acrylic chloride, methacrylic chloride, anhydrous acrylic acid, or the like by a known method. It can be synthesized by letting it.
As the hydroxypoly (oxyalkylene) compound, a commercially available product may be used, for example, ADEKA (registered trademark) Pluronic manufactured by ADEKA Corporation, ADEKA polyether manufactured by ADEKA Corporation, and Union Carbide Corporation. Examples thereof include Carbowax (registered trademark), Triton manufactured by Dow Chemical Corporation, and PEG manufactured by Daiichi Kogyo Seiyaku Co., Ltd.
As the poly (oxyalkylene) acrylate and the poly (oxyalkylene) methacrylate, poly (oxyalkylene) diacrylate or the like synthesized by a known method may be used.
 本開示において用いられる画像記録層においては、バインダーポリマーを1種単独で使用しても、2種以上を併用してもよい。
 上記バインダーポリマーは、画像記録層中に任意な量で含有させることができるが、機上現像性、UV耐刷性、UV版飛び抑制性、及び、特色着肉性の観点から、上記バインダーポリマーを含まないか、又は、上記バインダーポリマーの含有量は、画像記録層の全質量に対して、0質量%を超え20質量%以下であることが好ましく、上記バインダーポリマーを含まないか、又は、上記バインダーポリマーの含有量は、画像記録層の全質量に対して、0質量%を超え10質量%以下であることがより好ましく、上記バインダーポリマーを含まないか、又は、上記バインダーポリマーの含有量は、画像記録層の全質量に対して、0質量%を超え5質量%以下であることが更に好ましく、上記バインダーポリマーを含まないか、又は、上記バインダーポリマーの含有量は、画像記録層の全質量に対して、0質量%を超え2質量%以下であることが特に好ましく、上記バインダーポリマーを含まないことが最も好ましい。
In the image recording layer used in the present disclosure, one type of binder polymer may be used alone, or two or more types may be used in combination.
The binder polymer can be contained in the image recording layer in an arbitrary amount, but from the viewpoints of on-machine developability, UV printing resistance, UV plate skipping inhibitory property, and special color carving property, the binder polymer can be contained. The content of the binder polymer is preferably more than 0% by mass and 20% by mass or less with respect to the total mass of the image recording layer, and the binder polymer is not contained or the content of the binder polymer is not contained. The content of the binder polymer is more preferably more than 0% by mass and 10% by mass or less with respect to the total mass of the image recording layer, and either does not contain the binder polymer or contains the binder polymer. Is more preferably more than 0% by mass and 5% by mass or less with respect to the total mass of the image recording layer, and either does not contain the binder polymer or the content of the binder polymer is the content of the image recording layer. It is particularly preferably more than 0% by mass and 2% by mass or less with respect to the total mass, and most preferably it does not contain the binder polymer.
-発色剤-
 上記画像記録層は、発色剤を含むことが好ましく、酸発色剤を含むことがより好ましい。また、発色剤としては、ロイコ化合物を含むことが好ましい。
 本開示で用いられる「発色剤」とは、光や酸等の刺激により発色又は消色し画像記録層の色を変化させる性質を有する化合物を意味し、また、「酸発色剤」とは、電子受容性化合物(例えば酸等のプロトン)を受容した状態で加熱することにより、発色又は消色し画像記録層の色を変化させる性質を有する化合物を意味する。酸発色剤としては、特に、ラクトン、ラクタム、サルトン、スピロピラン、エステル、アミド等の部分骨格を有し、電子受容性化合物と接触した時に、速やかにこれらの部分骨格が開環若しくは開裂する無色の化合物が好ましい。
-Color former-
The image recording layer preferably contains a color former, and more preferably contains an acid color former. Moreover, it is preferable that the color former contains a leuco compound.
The "color former" used in the present disclosure means a compound having the property of changing the color of the image recording layer by developing or decoloring the color by a stimulus such as light or acid, and the "acid color former" is used. It means a compound having a property of developing or decoloring and changing the color of an image recording layer by heating in a state of receiving an electron-accepting compound (for example, a proton such as an acid). The acid color former has a partial skeleton such as lactone, lactam, salton, spiropyrane, ester, and amide, and when it comes into contact with an electron-accepting compound, these partial skeletons are rapidly ring-opened or cleaved. Compounds are preferred.
 このような酸発色剤の例としては、3,3-ビス(4-ジメチルアミノフェニル)-6-ジメチルアミノフタリド(“クリスタルバイオレットラクトン”と称される。)、3,3-ビス(4-ジメチルアミノフェニル)フタリド、3-(4-ジメチルアミノフェニル)-3-(4-ジエチルアミノ-2-メチルフェニル)-6-ジメチルアミノフタリド、3-(4-ジメチルアミノフェニル)-3-(1,2-ジメチルインドール-3-イル)フタリド、3-(4-ジメチルアミノフェニル)-3-(2-メチルインドール-3-イル)フタリド、3,3-ビス(1,2-ジメチルインドール-3-イル)-5-ジメチルアミノフタリド、3,3-ビス(1,2-ジメチルインドール-3-イル)-6-ジメチルアミノフタリド、3,3-ビス(9-エチルカルバゾール-3-イル)-6-ジメチルアミノフタリド、3,3-ビス(2-フェニルインドール-3-イル)-6-ジメチルアミノフタリド、3-(4-ジメチルアミノフェニル)-3-(1-メチルピロール-3-イル)-6-ジメチルアミノフタリド、 Examples of such acid color formers are 3,3-bis (4-dimethylaminophenyl) -6-dimethylaminophthalide (referred to as "crystal violet lactone") and 3,3-bis (4). -Dimethylaminophenyl) phthalide, 3- (4-dimethylaminophenyl) -3- (4-diethylamino-2-methylphenyl) -6-dimethylaminophthalide, 3- (4-dimethylaminophenyl) -3- ( 1,2-dimethylindole-3-yl) phthalide, 3- (4-dimethylaminophenyl) -3- (2-methylindole-3-yl) phthalide, 3,3-bis (1,2-dimethylindole-) 3-yl) -5-dimethylaminophthalide, 3,3-bis (1,2-dimethylindole-3-yl) -6-dimethylaminophthalide, 3,3-bis (9-ethylcarbazole-3-3) Il) -6-dimethylaminophthalide, 3,3-bis (2-phenylindole-3-yl) -6-dimethylaminophthalide, 3- (4-dimethylaminophenyl) -3- (1-methylpyrrole) -3-yl) -6-dimethylaminophthalide,
 3,3-ビス〔1,1-ビス(4-ジメチルアミノフェニル)エチレン-2-イル〕-4,5,6,7-テトラクロロフタリド、3,3-ビス〔1,1-ビス(4-ピロリジノフェニル)エチレン-2-イル〕-4,5,6,7-テトラブロモフタリド、3,3-ビス〔1-(4-ジメチルアミノフェニル)-1-(4-メトキシフェニル)エチレン-2-イル〕-4,5,6,7-テトラクロロフタリド、3,3-ビス〔1-(4-ピロリジノフェニル)-1-(4-メトキシフェニル)エチレン-2-イル〕-4,5,6,7-テトラクロロフタリド、3-〔1,1-ジ(1-エチル-2-メチルインドール-3-イル)エチレン-2-イル〕-3-(4-ジエチルアミノフェニル)フタリド、3-〔1,1-ジ(1-エチル-2-メチルインドール-3-イル)エチレン-2-イル〕-3-(4-N-エチル-N-フェニルアミノフェニル)フタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-n-オクチル-2-メチルインドール-3-イル)フタリド、3,3-ビス(1-n-オクチル-2-メチルインドール-3-イル)フタリド、3-(2-メチル-4-ジエチルアミノフェニル)-3-(1-n-オクチル-2-メチルインドール-3-イル)フタリド等のフタリド類、 3,3-bis [1,1-bis (4-dimethylaminophenyl) ethylene-2-yl] -4,5,6,7-tetrachlorophthalide, 3,3-bis [1,1-bis (1,1-bis) 4-Pyrrolidinophenyl) ethylene-2-yl] -4,5,6,7-tetrabromophthalide, 3,3-bis [1- (4-dimethylaminophenyl) -1- (4-methoxyphenyl) Ethylene-2-yl] -4,5,6,7-tetrachlorophthalide, 3,3-bis [1- (4-pyrrolidinophenyl) -1- (4-methoxyphenyl) ethylene-2-yl] -4,5,6,7-tetrachlorophthalide, 3- [1,1-di (1-ethyl-2-methylindole-3-yl) ethylene-2-yl] -3- (4-diethylaminophenyl) ) Phenylide, 3- [1,1-di (1-ethyl-2-methylindol-3-yl) ethylene-2-yl] -3- (4-N-ethyl-N-phenylaminophenyl) phthalide, 3 -(2-ethoxy-4-diethylaminophenyl) -3- (1-n-octyl-2-methylindole-3-yl) phthalide, 3,3-bis (1-n-octyl-2-methylindole-3) -Ftalides such as phthalide, 3- (2-methyl-4-diethylaminophenyl) -3- (1-n-octyl-2-methylindole-3-yl) phthalide,
 4,4-ビス-ジメチルアミノベンズヒドリンベンジルエーテル、N-ハロフェニル-ロイコオーラミン、N-2,4,5-トリクロロフェニルロイコオーラミン、ローダミン-B-アニリノラクタム、ローダミン-(4-ニトロアニリノ)ラクタム、ローダミン-B-(4-クロロアニリノ)ラクタム、3,7-ビス(ジエチルアミノ)-10-ベンゾイルフェノオキサジン、ベンゾイルロイコメチレンブルー、4ーニトロベンゾイルメチレンブルー、 4,4-Bis-dimethylaminobenzhydrinbenzyl ether, N-halophenyl-leucooramine, N-2,4,5-trichlorophenylleucooramine, rhodamine-B-anilinolactam, rhodamine- (4-nitroanilino) ) Lactam, Rhodamine-B- (4-chloroanilino) lactam, 3,7-bis (diethylamino) -10-benzoylphenoxazine, benzoyl leucomethylene blue, 4-nitrobenzoyl methylene blue,
 3,6-ジメトキシフルオラン、3-ジメチルアミノ-7-メトキシフルオラン、3-ジエチルアミノ-6-メトキシフルオラン、3-ジエチルアミノ-7-メトキシフルオラン、3-ジエチルアミノ-7-クロロフルオラン、3-ジエチルアミノ-6-メチル-7-クロロフルオラン、3-ジエチルアミノ-6,7-ジメチルフルオラン、3-N-シクロヘキシル-N-n-ブチルアミノ-7-メチルフルオラン、3-ジエチルアミノ-7-ジベンジルアミノフルオラン、3-ジエチルアミノ-7-オクチルアミノフルオラン、3-ジエチルアミノ-7-ジ-n-ヘキシルアミノフルオラン、3-ジエチルアミノ-7-アニリノフルオラン、3-ジエチルアミノ-7-(2’-フルオロフェニルアミノ)フルオラン、3-ジエチルアミノ-7-(2’-クロロフェニルアミノ)フルオラン、3-ジエチルアミノ-7-(3’-クロロフェニルアミノ)フルオラン、3-ジエチルアミノ-7-(2’,3’-ジクロロフェニルアミノ)フルオラン、3-ジエチルアミノ-7-(3’-トリフルオロメチルフェニルアミノ)フルオラン、3-ジ-n-ブチルアミノ-7-(2’-フルオロフェニルアミノ)フルオラン、3-ジ-n-ブチルアミノ-7-(2’-クロロフェニルアミノ)フルオラン、3-N-イソペンチル-N-エチルアミノ-7-(2’-クロロフェニルアミノ)フルオラン、 3,6-dimethoxyfluorane, 3-dimethylamino-7-methoxyfluorane, 3-diethylamino-6-methoxyfluorane, 3-diethylamino-7-methoxyfluorane, 3-diethylamino-7-chlorofluorine, 3 -Diethylamino-6-methyl-7-chlorofluorine, 3-diethylamino-6,7-dimethylfluorane, 3-N-cyclohexyl-Nn-butylamino-7-methylfluorane, 3-diethylamino-7- Dibenzylaminofluorane, 3-diethylamino-7-octylaminofluorane, 3-diethylamino-7-di-n-hexylaminofluorane, 3-diethylamino-7-anilinofluorane, 3-diethylamino-7- ( 2'-fluorophenylamino) fluorane, 3-diethylamino-7- (2'-chlorophenylamino) fluorane, 3-diethylamino-7- (3'-chlorophenylamino) fluorane, 3-diethylamino-7- (2', 3) '-Dichlorophenylamino) fluorane, 3-diethylamino-7- (3'-trifluoromethylphenylamino) fluorane, 3-di-n-butylamino-7- (2'-fluorophenylamino) fluorane, 3-di- n-Butylamino-7- (2'-chlorophenylamino) fluorane, 3-N-isopentyl-N-ethylamino-7- (2'-chlorophenylamino) fluorane,
 3-N-n-ヘキシル-N-エチルアミノ-7-(2’-クロロフェニルアミノ)フルオラン、3-ジエチルアミノ-6-クロロ-7-アニリノフルオラン、3-ジ-n-ブチルアミノ-6-クロロ-7-アニリノフルオラン、3-ジエチルアミノ-6-メトキシ-7-アニリノフルオラン、3-ジ-n-ブチルアミノ-6-エトキシ-7-アニリノフルオラン、3-ピロリジノ-6-メチル-7-アニリノフルオラン、3-ピペリジノ-6-メチル-7-アニリノフルオラン、3-モルホリノ-6-メチル-7-アニリノフルオラン、3-ジメチルアミノ-6-メチル-7-アニリノフルオラン、3-ジエチルアミノ-6-メチル-7-アニリノフルオラン、3-ジ-n-ブチルアミノ-6-メチル-7-アニリノフルオラン、3-ジ-n-ペンチルアミノ-6-メチル-7-アニリノフルオラン、3-N-エチル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-プロピル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-プロピル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-ブチル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-ブチル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-イソブチル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-イソブチル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-イソペンチル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-n-ヘキシル-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-n-プロピルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-n-ブチルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-n-ヘキシルアミノ-6-メチル-7-アニリノフルオラン、3-N-シクロヘキシル-N-n-オクチルアミノ-6-メチル-7-アニリノフルオラン、 3-Nn-hexyl-N-ethylamino-7- (2'-chlorophenylamino) fluorane, 3-diethylamino-6-chloro-7-anilinofluorane, 3-di-n-butylamino-6- Chloro-7-anilinofluorane, 3-diethylamino-6-methoxy-7-anilinofluorane, 3-di-n-butylamino-6-ethoxy-7-anilinofluorane, 3-pyrrolidino-6- Methyl-7-anilinofluoran, 3-piperidino-6-methyl-7-anilinofluoran, 3-morpholino-6-methyl-7-anilinofluoran, 3-dimethylamino-6-methyl-7- Anilinofluorane, 3-diethylamino-6-methyl-7-anilinofluorane, 3-di-n-butylamino-6-methyl-7-anilinofluorane, 3-di-n-pentylamino-6 -Methyl-7-anilinofluorane, 3-N-ethyl-N-methylamino-6-methyl-7-anilinofluorane, 3-Nn-propyl-N-methylamino-6-methyl-7 -Anilinofluorane, 3-Nn-propyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-Nn-butyl-N-methylamino-6-methyl-7-ani Renofluorane, 3-Nn-butyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-N-isobutyl-N-methylamino-6-methyl-7-anilinofluorane, 3-N-isobutyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-N-isopentyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-Nn- Hexyl-N-methylamino-6-methyl-7-anilinofluorane, 3-N-cyclohexyl-N-ethylamino-6-methyl-7-anilinofluorane, 3-N-cyclohexyl-Nn- Propylamino-6-methyl-7-anilinofluorane, 3-N-cyclohexyl-Nn-butylamino-6-methyl-7-anilinofluorane, 3-N-cyclohexyl-Nn-hexylamino -6-Methyl-7-anilinofluorane, 3-N-cyclohexyl-Nn-octylamino-6-methyl-7-anilinofluorane,
 3-N-(2’-メトキシエチル)-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-メトキシエチル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-メトキシエチル)-N-イソブチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-エトキシエチル)-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-エトキシエチル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(3’-メトキシプロピル)-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(3’-メトキシプロピル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(3’-エトキシプロピル)-N-メチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(3’-エトキシプロピル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(2’-テトラヒドロフルフリル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-N-(4’-メチルフェニル)-N-エチルアミノ-6-メチル-7-アニリノフルオラン、3-ジエチルアミノ-6-エチル-7-アニリノフルオラン、3-ジエチルアミノ-6-メチル-7-(3’-メチルフェニルアミノ)フルオラン、3-ジエチルアミノ-6-メチル-7-(2’,6’-ジメチルフェニルアミノ)フルオラン、3-ジ-n-ブチルアミノ-6-メチル-7-(2’,6’-ジメチルフェニルアミノ)フルオラン、3-ジ-n-ブチルアミノ-7-(2’,6’-ジメチルフェニルアミノ)フルオラン、2,2-ビス〔4’-(3-N-シクロヘキシル-N-メチルアミノ-6-メチルフルオラン)-7-イルアミノフェニル〕プロパン、3-〔4’-(4-フェニルアミノフェニル)アミノフェニル〕アミノ-6-メチル-7-クロロフルオラン、3-〔4’-(ジメチルアミノフェニル)〕アミノ-5,7-ジメチルフルオラン等のフルオラン類、 3-N- (2'-methoxyethyl) -N-methylamino-6-methyl-7-anilinofluorane, 3-N- (2'-methoxyethyl) -N-ethylamino-6-methyl-7 -Anilinofluorane, 3-N- (2'-methoxyethyl) -N-isobutylamino-6-methyl-7-anilinofluorane, 3-N- (2'-ethoxyethyl) -N-methylamino -6-Methyl-7-anilinofluorane, 3-N- (2'-ethoxyethyl) -N-ethylamino-6-methyl-7-anilinofluorane, 3-N- (3'-methoxypropyl) ) -N-Methylamino-6-methyl-7-anilinofluorane, 3-N- (3'-methoxypropyl) -N-ethylamino-6-methyl-7-anilinofluorane, 3-N- (3'-ethoxypropyl) -N-methylamino-6-methyl-7-anilinofluorane, 3-N- (3'-ethoxypropyl) -N-ethylamino-6-methyl-7-anilinoflu Oran, 3-N- (2'-tetrahydrofurfuryl) -N-ethylamino-6-methyl-7-anilinofluoran, 3-N- (4'-methylphenyl) -N-ethylamino-6- Methyl-7-anilinofluorane, 3-diethylamino-6-ethyl-7-anilinofluorane, 3-diethylamino-6-methyl-7- (3'-methylphenylamino) fluorane, 3-diethylamino-6- Methyl-7- (2', 6'-dimethylphenylamino) fluorane, 3-di-n-butylamino-6-methyl-7- (2', 6'-dimethylphenylamino) fluorane, 3-di-n -Butylamino-7- (2', 6'-dimethylphenylamino) fluorane, 2,2-bis [4'-(3-N-cyclohexyl-N-methylamino-6-methylfluorane) -7-yl Aminophenyl] Propane, 3- [4'-(4-phenylaminophenyl) Aminophenyl] Amino-6-Methyl-7-Chlorofluorane, 3- [4'-(Dimethylaminophenyl)] Amino-5,7 -Fluorans such as dimethylfluorane,
 3-(2-メチル-4-ジエチルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-n-プロポキシカルボニルアミノ-4-ジ-n-プロピルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-メチルアミノ-4-ジ-n-プロピルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-メチル-4-ジn-ヘキシルアミノフェニル)-3-(1-n-オクチル-2-メチルインドール-3-イル)-4,7-ジアザフタリド、3,3-ビス(2-エトキシ-4-ジエチルアミノフェニル)-4-アザフタリド、3,3-ビス(1-n-オクチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4-アザフタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-オクチル-2-メチルインドール-3-イル)-4又は7-アザフタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4又は7-アザフタリド、3-(2-ヘキシルオキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-メチルインドール-3-イル)-4又は7-アザフタリド、3-(2-エトキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-フェニルインドール-3-イル)-4又は7-アザフタリド、3-(2-ブトキシ-4-ジエチルアミノフェニル)-3-(1-エチル-2-フェニルインドール-3-イル)-4又は7-アザフタリド、3-メチル-スピロ-ジナフトピラン、3-エチル-スピロ-ジナフトピラン、3-フェニル-スピロ-ジナフトピラン、3-ベンジル-スピロ-ジナフトピラン、3-メチル-ナフト-(3-メトキシベンゾ)スピロピラン、3-プロピル-スピロ-ジベンゾピラン-3,6-ビス(ジメチルアミノ)フルオレン-9-スピロ-3’-(6’-ジメチルアミノ)フタリド、3,6-ビス(ジエチルアミノ)フルオレン-9-スピロ-3’-(6’-ジメチルアミノ)フタリド等のフタリド類、 3- (2-Methyl-4-diethylaminophenyl) -3- (1-ethyl-2-methylindol-3-yl) -4-azaphthalide, 3- (2-n-propoxycarbonylamino-4-di-n) -Propylaminophenyl) -3- (1-ethyl-2-methylindol-3-yl) -4-azaphthalide, 3- (2-methylamino-4-di-n-propylaminophenyl) -3- (1) -Ethyl-2-methylindole-3-yl) -4-azaphthalide, 3- (2-methyl-4-din-hexylaminophenyl) -3- (1-n-octyl-2-methylindole-3-) Il) -4,7-diazaphthalide, 3,3-bis (2-ethoxy-4-diethylaminophenyl) -4-azaphthalide, 3,3-bis (1-n-octyl-2-methylindole-3-yl) -4-azaphthalide, 3- (2-ethoxy-4-diethylaminophenyl) -3- (1-ethyl-2-methylindole-3-yl) -4-azaphthalide, 3- (2-ethoxy-4-diethylaminophenyl) ) -3- (1-octyl-2-methylindole-3-yl) -4 or 7-azaphthalide, 3- (2-ethoxy-4-diethylaminophenyl) -3- (1-ethyl-2-methylindole-) 3-Il) -4 or 7-azaphthalide, 3- (2-hexyloxy-4-diethylaminophenyl) -3- (1-ethyl-2-methylindole-3-yl) -4 or 7-azaphthalide, 3- (2-Ethyl-4-diethylaminophenyl) -3- (1-ethyl-2-phenylindole-3-yl) -4 or 7-azaphthalide, 3- (2-butoxy-4-diethylaminophenyl) -3-( 1-Ethyl-2-phenylindole-3-yl) -4 or 7-azaphthalide, 3-methyl-spiro-dinaphthopylane, 3-ethyl-spiro-dinaftopylan, 3-phenyl-spiro-dinaftopyrane, 3-benzyl-spiro- Dinaftpyran, 3-methyl-naphtho- (3-methoxybenzo) spiropyrane, 3-propyl-spiro-dibenzopyran-3,6-bis (dimethylamino) fluorene-9-spiryl-3'-(6'-dimethylamino) Phtalides, phthalides such as 3,6-bis (diethylamino) fluorene-9-spiro-3'-(6'-dimethylamino) phthalide,
 その他、2’-アニリノ-6’-(N-エチル-N-イソペンチル)アミノ-3’-メチルスピロ[イソベンゾフラン-1(3H),9’-(9H)キサンテン-3-オン、2’-アニリノ-6’-(N-エチル-N-(4-メチルフェニル))アミノ-3’-メチルスピロ[イソベンゾフラン-1(3H),9’-(9H)キサンテン]-3-オン、3’-N,N-ジベンジルアミノ-6’-N,N-ジエチルアミノスピロ[イソベンゾフラン-1(3H),9’-(9H)キサンテン]-3-オン、2’-(N-メチル-N-フェニル)アミノ-6’-(N-エチル-N-(4-メチルフェニル))アミノスピロ[イソベンゾフラン-1(3H),9’-(9H)キサンテン]-3-オンなどが挙げられる。 In addition, 2'-anilino-6'-(N-ethyl-N-isopentyl) amino-3'-methylspiro [isobenzofuran-1 (3H), 9'-(9H) xanthen-3-one, 2'-anilino -6'-(N-ethyl-N- (4-methylphenyl)) amino-3'-methylspiro [isobenzofuran-1 (3H), 9'-(9H) xanthene] -3-one, 3'-N , N-dibenzylamino-6'-N, N-diethylaminospiro [isobenzofuran-1 (3H), 9'-(9H) xanthene] -3-one, 2'-(N-methyl-N-phenyl) Amino-6'-(N-ethyl-N- (4-methylphenyl)) aminospiro [isobenzofuran-1 (3H), 9'-(9H) xanthene] -3-one and the like can be mentioned.
 中でも、本開示に用いられる発色剤は、発色性の観点から、スピロピラン化合物、スピロオキサジン化合物、スピロラクトン化合物、及び、スピロラクタム化合物よりなる群から選ばれた少なくとも1種の化合物であることが好ましい。
 発色後の色素の色相としては、可視性の観点から、緑、青又は黒であることが好ましい。
Among them, the color former used in the present disclosure is preferably at least one compound selected from the group consisting of a spiropyran compound, a spirooxazine compound, a spirolactone compound, and a spirolactam compound from the viewpoint of color development. ..
From the viewpoint of visibility, the hue of the dye after color development is preferably green, blue or black.
 また、上記酸発色剤は、発色性、及び、露光部の視認性の観点から、ロイコ色素であることが好ましい。
 上記ロイコ色素としては、ロイコ構造を有する色素であれば、特に制限はないが、スピロ構造を有することが好ましく、スピロラクトン環構造を有することがより好ましい。
 また、上記ロイコ色素としては、発色性、及び、露光部の視認性の観点から、フタリド構造又はフルオラン構造を有するロイコ色素であることが好ましい。
 更に、上記フタリド構造又はフルオラン構造を有するロイコ色素は、発色性、及び、露光部の視認性の観点から、下記式(Le-1)~式(Le-3)のいずれかで表される化合物であることが好ましく、下記式(Le-2)で表される化合物であることがより好ましい。
Further, the acid coloring agent is preferably a leuco dye from the viewpoint of color developing property and visibility of the exposed portion.
The leuco dye is not particularly limited as long as it has a leuco structure, but preferably has a spiro structure, and more preferably has a spirolactone ring structure.
The leuco dye is preferably a leuco dye having a phthalide structure or a fluorine structure from the viewpoint of color development and visibility of the exposed portion.
Further, the leuco dye having the phthalide structure or the fluorine structure is a compound represented by any of the following formulas (Le-1) to (Le-3) from the viewpoint of color development and visibility of the exposed portion. It is more preferable that the compound is represented by the following formula (Le-2).
Figure JPOXMLDOC01-appb-C000059
Figure JPOXMLDOC01-appb-C000059
 式(Le-1)~式(Le-3)中、ERGはそれぞれ独立に、電子供与性基を表し、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、X~X10はそれぞれ独立に、水素原子、ハロゲン原子又は一価の有機基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Raは、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、アルキル基又はアリール基を表す。 Wherein (Le-1) ~ formula (Le-3), in each ERG independently represents an electron donating group, each X 1 ~ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group , X 5 to X 10 independently represent a hydrogen atom, a halogen atom or a monovalent organic group, Y 1 and Y 2 independently represent C or N, and when Y 1 is N, If X 1 is absent and Y 2 is N, then X 4 is absent, Ra 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 are independent alkyl groups. Or represents an aryl group.
 式(Le-1)~式(Le-3)のERGにおける電子供与性基としては、発色性、及び、露光部の視認性の観点から、アミノ基、アルキルアミノ基、アリールアミノ基、ジアルキルアミノ基、モノアルキルモノアリールアミノ基、ジアリールアミノ基、アルコキシ基、アリーロキシ基、又は、アルキル基であることが好ましく、アミノ基、アルキルアミノ基、アリールアミノ基、ジアルキルアミノ基、モノアルキルモノアリールアミノ基、ジアリールアミノ基、アルコキシ基、又は、アリーロキシ基であることがより好ましく、モノアルキルモノアリールアミノ基、又は、ジアリールアミノ基であることが更に好ましく、モノアルキルモノアリールアミノ基であることが特に好ましい。
 式(Le-1)~式(Le-3)におけるX~Xはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、水素原子、又は、塩素原子であることが好ましく、水素原子であることがより好ましい。
 式(Le-2)又は式(Le-3)におけるX~X10はそれぞれ独立に、発色性、及び、露光部の視認性の観点から、水素原子、ハロゲン原子、アルキル基、アリール基、アミノ基、アルキルアミノ基、アリールアミノ基、ジアルキルアミノ基、モノアルキルモノアリールアミノ基、ジアリールアミノ基、ヒドロキシ基、アルコキシ基、アリーロキシ基、アシル基、アルコキシカルボニル基、アリーロキシカルボニル基又はシアノ基であることが好ましく、水素原子、ハロゲン原子、アルキル基、アリール基、アルコキシ基、又は、アリーロキシ基であることがより好ましく、水素原子、ハロゲン原子、アルキル基、又は、アリール基であることが更に好ましく、水素原子であることが特に好ましい。
 式(Le-1)~式(Le-3)におけるY及びYは、発色性、及び、露光部の視認性の観点から、少なくとも1方がCであることが好ましく、Y及びYの両方がCであることがより好ましい。
 式(Le-1)~式(Le-3)におけるRaは、発色性、及び、露光部の視認性の観点から、アルキル基又はアルコキシ基であることが好ましく、アルコキシ基であることがより好ましく、メトキシ基であることが特に好ましい。
 式(Le-1)~式(Le-3)におけるRb~Rbはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、水素原子又はアルキル基であることが好ましく、アルキル基であることがより好ましく、メチル基であることが特に好ましい。
The electron-donating groups in the ERGs of the formulas (Le-1) to (Le-3) include amino groups, alkylamino groups, arylamino groups, and dialkylamino groups from the viewpoint of color development and visibility of the exposed area. A group, a monoalkyl monoarylamino group, a diarylamino group, an alkoxy group, an aryloxy group, or an alkyl group is preferable, and an amino group, an alkylamino group, an arylamino group, a dialkylamino group, or a monoalkyl monoarylamino group. , A diarylamino group, an alkoxy group, or an aryloxy group is more preferable, a monoalkyl monoarylamino group or a diarylamino group is further preferable, and a monoalkyl monoarylamino group is particularly preferable. ..
Formula (Le-1) ~ formula each X 1 ~ X 4 is in (Le-3) independently chromogenic, and, from the viewpoint of visibility of the exposure unit, a hydrogen atom, or, be a chlorine atom preferably , A hydrogen atom is more preferable.
X 5 to X 10 in the formula (Le-2) or the formula (Le-3) are independently, from the viewpoint of color development and visibility of the exposed part, hydrogen atom, halogen atom, alkyl group, aryl group, respectively. Amino group, alkylamino group, arylamino group, dialkylamino group, monoalkyl monoarylamino group, diarylamino group, hydroxy group, alkoxy group, aryloxy group, acyl group, alkoxycarbonyl group, aryloxycarbonyl group or cyano group. It is preferably a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, or an aryloxy group, and more preferably a hydrogen atom, a halogen atom, an alkyl group, or an aryl group. , A hydrogen atom is particularly preferable.
It is preferable that at least one of Y 1 and Y 2 in the formulas (Le-1) to (Le-3) is C from the viewpoint of color development and visibility of the exposed portion, and Y 1 and Y are Y. It is more preferable that both of 2 are C.
Ra 1 in the formulas (Le-1) to (Le-3) is preferably an alkyl group or an alkoxy group, and more preferably an alkoxy group, from the viewpoint of color development and visibility of the exposed portion. It is preferably a methoxy group, and particularly preferably a methoxy group.
Rb 1 to Rb 4 in the formulas (Le-1) to (Le-3) are preferably hydrogen atoms or alkyl groups independently from the viewpoint of color development and visibility of the exposed part, and are alkyl. It is more preferably a group, and particularly preferably a methyl group.
 また、上記フタリド構造又はフルオラン構造を有するロイコ色素は、発色性、及び、露光部の視認性の観点から、上記フタリド構造又はフルオラン構造を有するロイコ色素は、下記式(Le-4)~式(Le-6)のいずれかで表される化合物であることがより好ましく、下記式(Le-5)で表される化合物であることが更に好ましい。 Further, the leuco dye having the phthalide structure or the fluorene structure has the following formulas (Le-4) to the following formulas (Le-4) from the viewpoint of color development and visibility of the exposed portion. The compound represented by any of Le-6) is more preferable, and the compound represented by the following formula (Le-5) is further preferable.
Figure JPOXMLDOC01-appb-C000060
Figure JPOXMLDOC01-appb-C000060
 式(Le-4)~式(Le-6)中、ERGはそれぞれ独立に、電子供与性基を表し、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Raは、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、アルキル基又はアリール基を表す。 Wherein (Le-4) ~ formula (Le-6), in each ERG independently represents an electron donating group, each X 1 ~ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group , Y 1 and Y 2 independently represent C or N, and if Y 1 is N, then X 1 does not exist, and if Y 2 is N, then X 4 does not exist and Ra. 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 independently represent an alkyl group or an aryl group, respectively.
 式(Le-4)~式(Le-6)におけるERG、X~X、Y、Y、Ra、及び、Rb~Rbはそれぞれ、式(Le-1)~式(Le-3)におけるERG、X~X、Y、Y、Ra、及び、Rb~Rbと同義であり、好ましい態様も同様である。 ERG, X 1 to X 4 , Y 1 , Y 2 , Ra 1 and Rb 1 to Rb 4 in the formulas (Le-4) to (Le-6) are the formulas (Le-1) to the formulas (Le-1) to Rb 4 , respectively. le-3) ERG in, X 1 ~ X 4, Y 1, Y 2, Ra 1 and have the same meanings as Rb 1 ~ Rb 4, preferable embodiments thereof are also the same.
 更に、上記フタリド構造又はフルオラン構造を有するロイコ色素は、発色性、及び、露光部の視認性の観点から、上記フタリド構造又はフルオラン構造を有するロイコ色素は、下記式(Le-7)~式(Le-9)のいずれかで表される化合物であることが更に好ましく、下記式(Le-8)で表される化合物であることが特に好ましい。 Further, the leuco dye having the phthalide structure or the fluorane structure has the following formulas (Le-7) to the following formulas (Le-7) from the viewpoint of color development and visibility of the exposed portion. A compound represented by any of Le-9) is more preferable, and a compound represented by the following formula (Le-8) is particularly preferable.
Figure JPOXMLDOC01-appb-C000061
Figure JPOXMLDOC01-appb-C000061
 式(Le-7)~式(Le-9)中、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Ra~Raはそれぞれ独立に、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、アルキル基又はアリール基を表し、Rc及びRcはそれぞれ独立に、アリール基を表す。 Wherein (Le-7) ~ formula (Le-9), each X 1 ~ X 4 is independently a hydrogen atom, a halogen atom or a dialkyl anilino group, Y 1 and Y 2 are each independently, C or Representing N, when Y 1 is N, X 1 does not exist, when Y 2 is N, X 4 does not exist, and Ra 1 to Ra 4 are independent hydrogen atoms and alkyl, respectively. Represents a group or an alkoxy group, Rb 1 to Rb 4 independently represent an alkyl group or an aryl group, and Rc 1 and Rc 2 each independently represent an aryl group.
 式(Le-7)~式(Le-9)におけるX~X、Y及びYは、式(Le-1)~式(Le-3)におけるX~X、Y及びYと同義であり、好ましい態様も同様である。
 式(Le-7)~式(Le-9)におけるRa~Raはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、アルキル基又はアルコキシ基であることが好ましく、アルコキシ基であることがより好ましく、メトキシ基であることが特に好ましい。
 式(Le-7)~式(Le-9)におけるRb~Rbはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、水素原子、アルキル基又はアルコキシ基が置換したアリール基であることが好ましく、アルキル基であることがより好ましく、メチル基であることが特に好ましい。
 式(Le-8)におけるRc及びRcはそれぞれ独立に、発色性、及び、露光部の視認性の観点から、フェニル基、又は、アルキルフェニル基であることが好ましく、フェニル基であることがより好ましい。
 また、式(Le-8)において、発色性、及び、露光部の視認性の観点から、X~Xが水素原子であり、Y及びYがCであることが好ましい。
 更に、式(Le-8)において、発色性、及び、露光部の視認性の観点から、Rb及びRbがそれぞれ独立に、アルキル基又はアルコキシ基が置換したアリール基であることが好ましい。
X 1 - X 4 in formula (Le-7) to Formula (Le-9), Y 1 and Y 2 has the formula (Le-1) X 1 ~ X 4 in ~ formula (Le-3), Y 1 and It has the same meaning as Y 2 , and the preferred embodiment is also the same.
Ra 1 to Ra 4 in the formulas (Le-7) to (Le-9) are preferably alkyl groups or alkoxy groups independently from the viewpoint of color development and visibility of the exposed portion, respectively, and are alkoxy groups. It is more preferably a group, and particularly preferably a methoxy group.
Rb 1 to Rb 4 in the formulas (Le-7) to (Le-9) are independently substituted with a hydrogen atom, an alkyl group, or an alkoxy group from the viewpoint of color development and visibility of the exposed portion. It is preferably a group, more preferably an alkyl group, and particularly preferably a methyl group.
Rc 1 and Rc 2 in the formula (Le-8) are preferably phenyl groups or alkylphenyl groups, and are preferably phenyl groups, independently from the viewpoint of color development and visibility of the exposed portion. Is more preferable.
Further, in the formula (Le-8), it is preferable that X 1 to X 4 are hydrogen atoms and Y 1 and Y 2 are C from the viewpoint of color development and visibility of the exposed portion.
Further, in the formula (Le-8), from the viewpoint of color development and visibility of the exposed portion, it is preferable that Rb 1 and Rb 2 are independently alkyl groups or aryl groups substituted with an alkoxy group.
 式(Le-1)~式(Le-9)におけるアルキル基は、直鎖であっても、分岐を有していても、環構造を有していてもよい。
 また、式(Le-1)~式(Le-9)におけるアルキル基の炭素数は、1~20であることが好ましく、1~8であることがより好ましく、1~4であることが更に好ましく、1又は2であることが特に好ましい。
 式(Le-1)~式(Le-9)におけるアリール基の炭素数は、6~20であることが好ましく、6~10であることがより好ましく、6~8であることが特に好ましい。
The alkyl group in the formulas (Le-1) to (Le-9) may be linear, have a branch, or have a ring structure.
Further, the number of carbon atoms of the alkyl group in the formulas (Le-1) to (Le-9) is preferably 1 to 20, more preferably 1 to 8, and further preferably 1 to 4. It is preferably 1 or 2, and particularly preferably 1.
The number of carbon atoms of the aryl group in the formulas (Le-1) to (Le-9) is preferably 6 to 20, more preferably 6 to 10, and particularly preferably 6 to 8.
 また、式(Le-1)~式(Le-9)における一価の有機基、アルキル基、アリール基、ジアルキルアニリノ基、アルキルアミノ基、アルコキシ基等の各基は、置換基を有していてもよい。置換基としては、アルキル基、アリール基、ハロゲン原子、アミノ基、アルキルアミノ基、アリールアミノ基、ジアルキルアミノ基、モノアルキルモノアリールアミノ基、ジアリールアミノ基、ヒドロキシ基、アルコキシ基、アリーロキシ基、アシル基、アルコキシカルボニル基、アリーロキシカルボニル基、シアノ基等が挙げられる。また、これら置換基は、更にこれら置換基により置換されていてもよい。 Further, each group such as a monovalent organic group, an alkyl group, an aryl group, a dialkylanilino group, an alkylamino group and an alkoxy group in the formulas (Le-1) to (Le-9) has a substituent. May be. Substituents include alkyl groups, aryl groups, halogen atoms, amino groups, alkylamino groups, arylamino groups, dialkylamino groups, monoalkyl monoarylamino groups, diarylamino groups, hydroxy groups, alkoxy groups, allyloxy groups and acyl groups. Examples thereof include a group, an alkoxycarbonyl group, an aryloxycarbonyl group and a cyano group. Further, these substituents may be further substituted with these substituents.
 好適に用いられる上記フタリド構造又はフルオラン構造を有するロイコ色素としては、以下の化合物が挙げられる。なお、Meはメチル基を表す。 Examples of the leuco dye having a phthalide structure or a fluorine structure that are preferably used include the following compounds. In addition, Me represents a methyl group.
Figure JPOXMLDOC01-appb-C000062
Figure JPOXMLDOC01-appb-C000062
Figure JPOXMLDOC01-appb-C000063
Figure JPOXMLDOC01-appb-C000063
Figure JPOXMLDOC01-appb-C000064
Figure JPOXMLDOC01-appb-C000064
Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000065
 酸発色剤としては上市されている製品を使用することも可能であり、ETAC、RED500、RED520、CVL、S-205、BLACK305、BLACK400、BLACK100、BLACK500、H-7001、GREEN300、NIRBLACK78、BLUE220、H-3035、BLUE203、ATP、H-1046、H-2114(以上、福井山田化学工業(株)製)、ORANGE-DCF、Vermilion-DCF、PINK-DCF、RED-DCF、BLMB、CVL、GREEN-DCF、TH-107(以上、保土ヶ谷化学(株)製)、ODB、ODB-2、ODB-4、ODB-250、ODB-BlackXV、Blue-63、Blue-502、GN-169、GN-2、Green-118、Red-40、Red-8(以上、山本化成(株)製)、クリスタルバイオレットラクトン(東京化成工業(株)製)等が挙げられる。これらの市販品の中でも、ETAC、S-205、BLACK305、BLACK400、BLACK100、BLACK500、H-7001、GREEN300、NIRBLACK78、H-3035、ATP、H-1046、H-2114、GREEN-DCF、Blue-63、GN-169、クリスタルバイオレットラクトンが、形成される膜の可視光吸収率が良好のため好ましい。 It is also possible to use commercially available products as the acid color former, ETAC, RED500, RED520, CVL, S-205, BLACK305, BLACK400, BLACK100, BLACK500, H-7001, GREEN300, NIRBLACK78, BLUE220, H. -3035, BLUE203, ATP, H-1046, H-2114 (all manufactured by Fukui Yamada Chemical Industry Co., Ltd.), ORANGE-DCF, Vermilion-DCF, PINK-DCF, RED-DCF, BLMB, CVL, GREEN-DCF , TH-107 (all manufactured by Hodogaya Chemical Co., Ltd.), ODB, ODB-2, ODB-4, ODB-250, ODB-BlackXV, Blue-63, Blue-502, GN-169, GN-2, Green -118, Red-40, Red-8 (all manufactured by Yamamoto Kasei Co., Ltd.), crystal violet lactone (manufactured by Tokyo Chemical Industry Co., Ltd.) and the like can be mentioned. Among these commercially available products, ETAC, S-205, BLACK305, BLACK400, BLACK100, BLACK500, H-7001, GREEN300, NIRBLACK78, H-3035, ATP, H-1046, H-2114, GREEN-DCF, Blue-63. , GN-169, and crystal violet lactone are preferable because the film to be formed has a good visible light absorption rate.
 これらの発色剤は、1種単独で用いてもよいし、2種類以上の成分を組み合わせて使用することもできる。
 発色剤の含有量は、画像記録層の全質量に対し、0.5質量%~10質量%であることが好ましく、1質量%~5質量%であることがより好ましい。
These color formers may be used alone or in combination of two or more kinds of components.
The content of the color former is preferably 0.5% by mass to 10% by mass, and more preferably 1% by mass to 5% by mass, based on the total mass of the image recording layer.
-連鎖移動剤-
 本開示において用いられる画像記録層は、連鎖移動剤を含有してもよい。連鎖移動剤は、平版印刷版における耐刷性の向上に寄与する。
 連鎖移動剤としては、チオール化合物が好ましく、沸点(揮発し難さ)の観点で炭素数7以上のチオールがより好ましく、芳香環上にメルカプト基を有する化合物(芳香族チオール化合物)が更に好ましい。上記チオール化合物は単官能チオール化合物であることが好ましい。
-Chain transfer agent-
The image recording layer used in the present disclosure may contain a chain transfer agent. The chain transfer agent contributes to the improvement of printing durability in the lithographic printing plate.
As the chain transfer agent, a thiol compound is preferable, a thiol having 7 or more carbon atoms is more preferable from the viewpoint of boiling point (difficulty in volatilization), and a compound having a mercapto group on the aromatic ring (aromatic thiol compound) is further preferable. The thiol compound is preferably a monofunctional thiol compound.
 連鎖移動剤として具体的には、下記の化合物が挙げられる。 Specific examples of the chain transfer agent include the following compounds.
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000067
Figure JPOXMLDOC01-appb-C000067
Figure JPOXMLDOC01-appb-C000068
Figure JPOXMLDOC01-appb-C000068
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-C000069
 連鎖移動剤は、1種のみを添加しても、2種以上を併用してもよい。
 連鎖移動剤の含有量は、画像記録層の全質量に対し、0.01質量%~50質量%が好ましく、0.05質量%~40質量%がより好ましく、0.1質量%~30質量%が更に好ましい。
Only one type of chain transfer agent may be added, or two or more types may be used in combination.
The content of the chain transfer agent is preferably 0.01% by mass to 50% by mass, more preferably 0.05% by mass to 40% by mass, and 0.1% by mass to 30% by mass with respect to the total mass of the image recording layer. % Is more preferable.
-低分子親水性化合物-
 画像記録層は、耐刷性の低下を抑制させつつ機上現像性を向上させるために、低分子親水性化合物を含有してもよい。低分子親水性化合物は、分子量1,000未満の化合物が好ましく、分子量800未満の化合物がより好ましく、分子量500未満の化合物が更に好ましい。
 低分子親水性化合物としては、例えば、水溶性有機化合物としては、エチレングリコール、ジエチレングリコール、トリエチレングリコール、プロピレングリコール、ジプロピレングリコール、トリプロピレングリコール等のグリコール類及びそのエーテル又はエステル誘導体類、グリセリン、ペンタエリスリトール、トリス(2-ヒドロキシエチル)イソシアヌレート等のポリオール類、トリエタノールアミン、ジエタノールアミン、モノエタノールアミン等の有機アミン類及びその塩、アルキルスルホン酸、トルエンスルホン酸、ベンゼンスルホン酸等の有機スルホン酸類及びその塩、アルキルスルファミン酸等の有機スルファミン酸類及びその塩、アルキル硫酸、アルキルエーテル硫酸等の有機硫酸類及びその塩、フェニルホスホン酸等の有機ホスホン酸類及びその塩、酒石酸、シュウ酸、クエン酸、リンゴ酸、乳酸、グルコン酸、アミノ酸類等の有機カルボン酸類及びその塩、ベタイン類等が挙げられる。
-Low molecular weight hydrophilic compound-
The image recording layer may contain a low molecular weight hydrophilic compound in order to improve on-machine developability while suppressing a decrease in printing resistance. The low molecular weight hydrophilic compound is preferably a compound having a molecular weight of less than 1,000, more preferably a compound having a molecular weight of less than 800, and further preferably a compound having a molecular weight of less than 500.
Examples of the low molecular weight hydrophilic compound include, as water-soluble organic compounds, glycols such as ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, and tripropylene glycol, ethers or ester derivatives thereof, and glycerin. Polyols such as pentaerythritol and tris (2-hydroxyethyl) isocyanurate, organic amines such as triethanolamine, diethanolamine and monoethanolamine and salts thereof, organic sulfates such as alkyl sulfonic acid, toluene sulfonic acid and benzene sulfonic acid. Acids and salts thereof, organic sulfamic acids such as alkylsulfamic acid and salts thereof, organic sulfates such as alkylsulfuric acid and alkylether sulfuric acid and salts thereof, organic phosphonic acids such as phenylphosphonic acid and salts thereof, tartrate acid, oxalic acid, quench Examples thereof include organic carboxylic acids such as acids, malic acids, lactic acids, gluconic acids and amino acids, salts thereof, and betaines.
 低分子親水性化合物としては、ポリオール類、有機硫酸塩類、有機スルホン酸塩類及びベタイン類から選ばれる少なくとも1つを含有させることが好ましい。 As the low molecular weight hydrophilic compound, it is preferable to contain at least one selected from polyols, organic sulfates, organic sulfonates and betaines.
 有機スルホン酸塩類の具体例としては、n-ブチルスルホン酸ナトリウム、n-ヘキシルスルホン酸ナトリウム、2-エチルヘキシルスルホン酸ナトリウム、シクロヘキシルスルホン酸ナトリウム、n-オクチルスルホン酸ナトリウムなどのアルキルスルホン酸塩;5,8,11-トリオキサペンタデカン-1-スルホン酸ナトリウム、5,8,11-トリオキサヘプタデカン-1-スルホン酸ナトリウム、13-エチル-5,8,11-トリオキサヘプタデカン-1-スルホン酸ナトリウム、5,8,11,14-テトラオキサテトラコサン-1-スルホン酸ナトリウムなどのエチレンオキシド鎖を含むアルキルスルホン酸塩;ベンゼンスルホン酸ナトリウム、p-トルエンスルホン酸ナトリウム、p-ヒドロキシベンゼンスルホン酸ナトリウム、p-スチレンスルホン酸ナトリウム、イソフタル酸ジメチル-5-スルホン酸ナトリウム、1-ナフチルスルホン酸ナトリウム、4-ヒドロキシナフチルスルホン酸ナトリウム、1,5-ナフタレンジスルホン酸ジナトリウム、1,3,6-ナフタレントリスルホン酸トリナトリウムなどのアリールスルホン酸塩、特開2007-276454号公報の段落0026~0031及び特開2009-154525号公報の段落0020~0047に記載の化合物等が挙げられる。塩は、カリウム塩、リチウム塩でもよい。 Specific examples of organic sulfonates include alkyl sulfonates such as sodium n-butyl sulfonate, sodium n-hexyl sulfonate, sodium 2-ethylhexyl sulfonate, sodium cyclohexyl sulfonate, and sodium n-octyl sulfonate; 5 , 8,11-Trioxapentadecane-1-sulfonate, 5,8,11-trioxaheptadecane-1-sulfonate, 13-ethyl-5,8,11-trioxaheptadecane-1-sulfon Alkyl sulfonates containing ethylene oxide chains such as sodium acid, sodium 5,8,11,14-tetraoxatetracosan-1-sulfonate; sodium benzenesulfonate, sodium p-toluenesulfonate, p-hydroxybenzenesulfonic acid Sodium, sodium p-styrene sulfonate, sodium dimethyl-5-sulfonate isophthalate, sodium 1-naphthyl sulfonate, sodium 4-hydroxynaphthyl sulfonate, disodium 1,5-naphthalenedi sulfonate, 1,3,6- Examples thereof include aryl sulfonates such as trisodium naphthalene trisulfonate, and compounds described in paragraphs 0026 to 0031 of JP-A-2007-276454 and paragraphs 0020-0047 of JP-A-2009-154525. The salt may be a potassium salt or a lithium salt.
 有機硫酸塩類としては、ポリエチレンオキシドのアルキル、アルケニル、アルキニル、アリール又は複素環モノエーテルの硫酸塩が挙げられる。エチレンオキシド単位の数は1~4が好ましく、塩はナトリウム塩、カリウム塩又はリチウム塩が好ましい。具体例としては、特開2007-276454号公報の段落0034~0038に記載の化合物が挙げられる。 Examples of organic sulfates include sulfates of alkyl, alkenyl, alkynyl, aryl or heterocyclic monoether of polyethylene oxide. The number of ethylene oxide units is preferably 1 to 4, and the salt is preferably a sodium salt, a potassium salt or a lithium salt. Specific examples include the compounds described in paragraphs 0034 to 0038 of JP-A-2007-276454.
 ベタイン類としては、窒素原子への炭化水素置換基の炭素数が1~5である化合物が好ましく、具体例としては、トリメチルアンモニウムアセタート、ジメチルプロピルアンモニウムアセタート、3-ヒドロキシ-4-トリメチルアンモニオブチラート、4-(1-ピリジニオ)ブチラート、1-ヒドロキシエチル-1-イミダゾリオアセタート、トリメチルアンモニウムメタンスルホナート、ジメチルプロピルアンモニウムメタンスルホナート、3-トリメチルアンモニオ-1-プロパンスルホナート、3-(1-ピリジニオ)-1-プロパンスルホナート等が挙げられる。 As betaines, compounds having 1 to 5 carbon atoms of the hydrocarbon substituent on the nitrogen atom are preferable, and specific examples thereof include trimethylammonium acetate, dimethylpropylammonium acetate, and 3-hydroxy-4-trimethylammonium. Obutyrate, 4- (1-pyridinio) butyrate, 1-hydroxyethyl-1-imidazolioacetate, trimethylammonium methanesulfonate, dimethylpropylammonium methanesulfonate, 3-trimethylammonio-1-propanesulfonate, 3 -(1-Pyridinio) -1-propanesulfonate and the like can be mentioned.
 低分子親水性化合物は疎水性部分の構造が小さくて界面活性作用がほとんどないため、湿し水が画像記録層露光部(画像部)へ浸透して画像部の疎水性や皮膜強度を低下させることがなく、画像記録層のインキ受容性や耐刷性を良好に維持することができる。 Since the low-molecular-weight hydrophilic compound has a small structure of the hydrophobic part and has almost no surface-active action, dampening water permeates the exposed part (image part) of the image recording layer and reduces the hydrophobicity and film strength of the image part. It is possible to maintain good ink acceptability and printing resistance of the image recording layer.
 低分子親水性化合物の含有量は、画像記録層の全質量に対して、0.5質量%~20質量%が好ましく、1質量%~15質量%がより好ましく、2質量%~10質量%が更に好ましい。この範囲で良好な機上現像性と耐刷性が得られる。
 低分子親水性化合物は、1種単独で用いてもよく、2種以上を混合して用いてもよい。
The content of the low molecular weight hydrophilic compound is preferably 0.5% by mass to 20% by mass, more preferably 1% by mass to 15% by mass, and 2% by mass to 10% by mass with respect to the total mass of the image recording layer. Is more preferable. Good on-machine developability and print resistance can be obtained in this range.
The low molecular weight hydrophilic compound may be used alone or in combination of two or more.
-感脂化剤-
 画像記録層は、着肉性を向上させるために、ホスホニウム化合物、含窒素低分子化合物、アンモニウム基含有ポリマー等の感脂化剤を含有してもよい。特に、保護層に無機層状化合物を含有させる場合、これらの化合物は、無機層状化合物の表面被覆剤として機能し、無機層状化合物による印刷途中の着肉性低下を抑制することができる。
 感脂化剤としては、ホスホニウム化合物と、含窒素低分子化合物と、アンモニウム基含有ポリマーとを併用することが好ましく、ホスホニウム化合物と、第四級アンモニウム塩類と、アンモニウム基含有ポリマーとを併用することがより好ましい。
-Fat sensitive agent-
The image recording layer may contain a fat-sensing agent such as a phosphonium compound, a nitrogen-containing low molecular weight compound, and an ammonium group-containing polymer in order to improve the meat-forming property. In particular, when the protective layer contains an inorganic layered compound, these compounds function as a surface coating agent for the inorganic layered compound, and it is possible to suppress a decrease in inking property during printing due to the inorganic layered compound.
As the fat sensitive agent, it is preferable to use a phosphonium compound, a nitrogen-containing low molecular weight compound, and an ammonium group-containing polymer in combination, and the phosphonium compound, a quaternary ammonium salt, and an ammonium group-containing polymer are used in combination. Is more preferable.
 ホスホニウム化合物としては、特開2006-297907号公報及び特開2007-50660号公報に記載のホスホニウム化合物が挙げられる。具体例としては、テトラブチルホスホニウムヨージド、ブチルトリフェニルホスホニウムブロミド、テトラフェニルホスホニウムブロミド、1,4-ビス(トリフェニルホスホニオ)ブタン=ジ(ヘキサフルオロホスファート)、1,7-ビス(トリフェニルホスホニオ)ヘプタン=スルファート、1,9-ビス(トリフェニルホスホニオ)ノナン=ナフタレン-2,7-ジスルホナート等が挙げられる。 Examples of the phosphonium compound include the phosphonium compounds described in JP-A-2006-297907 and JP-A-2007-50660. Specific examples include tetrabutylphosphonium iodide, butyltriphenylphosphonium bromide, tetraphenylphosphonium bromide, 1,4-bis (triphenylphosphonio) butane-di (hexafluorophosphine), and 1,7-bis (tri). Phenylphosphonio) heptane-sulfate, 1,9-bis (triphenylphosphonio) nonane-naphthalen-2,7-disulfonate and the like can be mentioned.
 含窒素低分子化合物としては、アミン塩類、第四級アンモニウム塩類が挙げられる。また、イミダゾリニウム塩類、ベンゾイミダゾリニウム塩類、ピリジニウム塩類、キノリニウム塩類も挙げられる。中でも、第四級アンモニウム塩類及びピリジニウム塩類が好ましい。具体例としては、テトラメチルアンモニウム=ヘキサフルオロホスファート、テトラブチルアンモニウム=ヘキサフルオロホスファート、ドデシルトリメチルアンモニウム=p-トルエンスルホナート、ベンジルトリエチルアンモニウム=ヘキサフルオロホスファート、ベンジルジメチルオクチルアンモニウム=ヘキサフルオロホスファート、ベンジルジメチルドデシルアンモニウム=ヘキサフルオロホスファート、特開2008-284858号公報の段落0021~0037、特開2009-90645号公報の段落0030~0057に記載の化合物等が挙げられる。 Examples of nitrogen-containing low molecular weight compounds include amine salts and quaternary ammonium salts. In addition, imidazolinium salts, benzoimidazolinium salts, pyridinium salts, quinolinium salts and the like can also be mentioned. Of these, quaternary ammonium salts and pyridinium salts are preferable. Specific examples include tetramethylammonium = hexafluorophosphate, tetrabutylammonium = hexafluorophosphate, dodecyltrimethylammonium = p-toluenesulfonate, benzyltriethylammonium = hexafluorophosphate, and benzyldimethyloctylammonium = hexafluorophos. Examples thereof include fert, benzyldimethyldodecylammonium-hexafluorophosphate, compounds described in paragraphs 0021 to 0037 of JP-A-2008-284858 and paragraphs 0030 to 0057 of JP-A-2009-90645.
 アンモニウム基含有ポリマーとしては、その構造中にアンモニウム基を有すればよく、側鎖にアンモニウム基を有する(メタ)アクリレートを共重合成分として5モル%~80モル%含有するポリマーが好ましい。具体例としては、特開2009-208458号公報の段落0089~0105に記載のポリマーが挙げられる。 The ammonium group-containing polymer may have an ammonium group in its structure, and a polymer containing 5 mol% to 80 mol% of a (meth) acrylate having an ammonium group in the side chain as a copolymerization component is preferable. Specific examples include the polymers described in paragraphs 0008-0105 of JP2009-208458A.
 アンモニウム塩含有ポリマーは、特開2009-208458号公報に記載の測定方法に従って求められる還元比粘度(単位:ml/g)の値が、5~120の範囲のものが好ましく、10~110の範囲のものがより好ましく、15~100の範囲のものが特に好ましい。上記還元比粘度を重量平均分子量(Mw)に換算した場合、10,000~150,0000が好ましく、17,000~140,000がより好ましく、20,000~130,000が特に好ましい。 The ammonium salt-containing polymer preferably has a reduced specific viscosity (unit: ml / g) value in the range of 5 to 120, which is obtained according to the measurement method described in JP-A-2009-208458, and is in the range of 10 to 110. Is more preferable, and those in the range of 15 to 100 are particularly preferable. When the reduced specific viscosity is converted into a weight average molecular weight (Mw), it is preferably 10,000 to 150,000, more preferably 17,000 to 140,000, and particularly preferably 20,000 to 130,000.
 以下に、アンモニウム基含有ポリマーの具体例を示す。
(1)2-(トリメチルアンモニオ)エチルメタクリレート=p-トルエンスルホナート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比10/90、Mw4.5万)
(2)2-(トリメチルアンモニオ)エチルメタクリレート=ヘキサフルオロホスファート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比20/80、Mw6.0万)
(3)2-(エチルジメチルアンモニオ)エチルメタクリレート=p-トルエンスルホナート/ヘキシルメタクリレート共重合体(モル比30/70、Mw4.5万)
(4)2-(トリメチルアンモニオ)エチルメタクリレート=ヘキサフルオロホスファート/2-エチルヘキシルメタクリレート共重合体(モル比20/80、Mw6.0万)
(5)2-(トリメチルアンモニオ)エチルメタクリレート=メチルスルファート/ヘキシルメタクリレート共重合体(モル比40/60、Mw7.0万)
(6)2-(ブチルジメチルアンモニオ)エチルメタクリレート=ヘキサフルオロホスファート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比25/75、Mw6.5万)
(7)2-(ブチルジメチルアンモニオ)エチルアクリレート=ヘキサフルオロホスファート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比20/80、Mw6.5万)
(8)2-(ブチルジメチルアンモニオ)エチルメタクリレート=13-エチル-5,8,11-トリオキサ-1-ヘプタデカンスルホナート/3,6-ジオキサヘプチルメタクリレート共重合体(モル比20/80、Mw7.5万)
(9)2-(ブチルジメチルアンモニオ)エチルメタクリレート=ヘキサフルオロホスファート/3,6-ジオキサヘプチルメタクリレート/2-ヒドロキシ-3-メタクロイルオキシプロピルメタクリレート共重合体(モル比15/80/5、Mw6.5万)
Specific examples of the ammonium group-containing polymer are shown below.
(1) 2- (trimethylammonio) ethyl methacrylate = p-toluenesulfonate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 10/90, Mw 45,000)
(2) 2- (trimethylammonio) ethyl methacrylate = hexafluorophosphate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 20/80, Mw 60,000)
(3) 2- (Ethyldimethylammonio) ethyl methacrylate = p-toluenesulfonate / hexyl methacrylate copolymer (molar ratio 30/70, Mw 45,000)
(4) 2- (trimethylammonio) ethyl methacrylate = hexafluorophosphate / 2-ethylhexyl methacrylate copolymer (molar ratio 20/80, Mw 60,000)
(5) 2- (trimethylammonio) ethyl methacrylate = methyl sulfate / hexyl methacrylate copolymer (molar ratio 40/60, Mw 7,000,000)
(6) 2- (Butyldimethylammonio) ethyl methacrylate = hexafluorophosphate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 25/75, Mw 65,000)
(7) 2- (Butyldimethylammonio) ethyl acrylate = hexafluorophosphate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 20/80, Mw 65,000)
(8) 2- (Butyldimethylammonio) ethyl methacrylate = 13-ethyl-5,8,11-trioxa-1-heptadecanesulfonate / 3,6-dioxaheptyl methacrylate copolymer (molar ratio 20/80) , Mw 75,000)
(9) 2- (Butyldimethylammonio) ethyl methacrylate = hexafluorophosphate / 3,6-dioxaheptyl methacrylate / 2-hydroxy-3-methacloyloxypropyl methacrylate copolymer (molar ratio 15/80/5) , Mw 65,000)
 感脂化剤の含有量は、画像記録層の全質量に対して、0.01質量%~30.0質量%が好ましく、0.1質量%~15.0質量%がより好ましく、1質量%~10質量%が更に好ましい。 The content of the oil-sensitive agent is preferably 0.01% by mass to 30.0% by mass, more preferably 0.1% by mass to 15.0% by mass, and 1% by mass with respect to the total mass of the image recording layer. % To 10% by mass is more preferable.
-その他の成分-
 画像記録層には、その他の成分として、界面活性剤、重合禁止剤、高級脂肪酸誘導体、可塑剤、無機粒子、無機層状化合物等を含有することができる。具体的には、特開2008-284817号公報の段落0114~0159の記載を参照することができる。
-Other ingredients-
The image recording layer may contain, as other components, a surfactant, a polymerization inhibitor, a higher fatty acid derivative, a plasticizer, inorganic particles, an inorganic layered compound and the like. Specifically, the description in paragraphs 0114 to 0159 of JP-A-2008-284817 can be referred to.
-画像記録層の形成-
 本開示に係る平版印刷版原版における画像記録層は、例えば、特開2008-195018号公報の段落0142~0143に記載のように、必要な上記各成分を公知の溶剤に分散又は溶解して塗布液を調製し、塗布液を支持体上にバーコーター塗布など公知の方法で塗布し、乾燥することにより形成することができる。
 溶剤としては、公知の溶剤を用いることができる。具体的には、例えば、水、アセトン、メチルエチルケトン(2-ブタノン)、シクロヘキサン、酢酸エチル、エチレンジクロライド、テトラヒドロフラン、トルエン、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、アセチルアセトン、シクロヘキサノン、ジアセトンアルコール、エチレングリコールモノメーチルエーテルアセテート、エチレングリコールエチルエーテルアセテート、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテルアセテート、1-メトキシ-2-プロパノール、3-メトキシ-1-プロパノール、メトキシメトキシエタノール、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、3-メトキシプロピルアセテート、N,N-ジメチルホルムアミド、ジメチルスルホキシド、γ-ブチロラクトン、乳酸メチル、乳酸エチル等が挙げられる。溶剤は、1種単独で使用してもよいし、2種以上を併用してもよい。塗布液中の固形分濃度は1~50質量%程度であることが好ましい。
 塗布、乾燥後における画像記録層の塗布量(固形分)は、用途によって異なるが、良好な感度と画像記録層の良好な皮膜特性を得る観点から、0.3g/m~3.0g/mが好ましい。
-Formation of image recording layer-
The image recording layer in the lithographic printing plate original plate according to the present disclosure is coated by dispersing or dissolving each of the necessary components in a known solvent, for example, as described in paragraphs 0142 to 0143 of Japanese Patent Application Laid-Open No. 2008-195018. It can be formed by preparing a liquid, applying the coating liquid on the support by a known method such as coating with a bar coater, and drying.
As the solvent, a known solvent can be used. Specifically, for example, water, acetone, methyl ethyl ketone (2-butanone), cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, Propylene glycol monoethyl ether, acetylacetone, cyclohexanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether acetate, 1-methoxy-2-propanol, 3- Methoxy-1-propanol, methoxymethoxyethanol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-methoxypropyl acetate, N, N-dimethyl Examples thereof include formamide, dimethylsulfoxide, γ-butyrolactone, methyl lactate and ethyl lactate. The solvent may be used alone or in combination of two or more. The solid content concentration in the coating liquid is preferably about 1 to 50% by mass.
The coating amount (solid content) of the image recording layer after coating and drying varies depending on the application, but from the viewpoint of obtaining good sensitivity and good film characteristics of the image recording layer, 0.3 g / m 2 to 3.0 g / m 2 is preferred.
<アルミニウム支持体>
 本開示に係る平版印刷版原版におけるアルミニウム支持体は、公知の平版印刷版原版用アルミニウム支持体から適宜選択して用いることができる。以下、アルミニウム支持体を単に「支持体」ともいう。
 アルミニウム支持体としては、親水性表面を有するアルミニウム支持体(以下、「親水性アルミニウム支持体」ともいう。)が好ましい。
 本開示に係る平版印刷版原版におけるアルミニウム支持体は、アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角が、傷汚れ抑制性の観点から、110°以下であることが好ましく、90°以下であることがより好ましく、80°以下であることが更に好ましく、50°以下であることがより更に好ましく、30°以下であることが特に好ましく、20°以下であることがより特に好ましく、10以下であることが最も好ましい。
<Aluminum support>
The aluminum support in the lithographic printing plate original plate according to the present disclosure can be appropriately selected from known aluminum supports for lithographic printing plate original plates and used. Hereinafter, the aluminum support is also simply referred to as a "support".
As the aluminum support, an aluminum support having a hydrophilic surface (hereinafter, also referred to as “hydrophilic aluminum support”) is preferable.
The aluminum support in the lithographic printing plate original plate according to the present disclosure has a contact angle with water on the surface of the aluminum support on the image recording layer side by the aerial water droplet method of 110 ° or less from the viewpoint of suppressing scratches and stains. Is more preferable, 90 ° or less is more preferable, 80 ° or less is further preferable, 50 ° or less is further preferable, 30 ° or less is particularly preferable, and 20 ° or less is preferable. Is more particularly preferable, and 10 or less is most preferable.
 本開示において、アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角は、以下の方法により測定するものとする。
 平版印刷版原版を画像記録層を除去可能な溶媒(例えば、画像記録層用塗布液で用いた溶媒)に浸漬させ、スポンジ及びコットンの少なくとも一方で画像記録層を掻き取り、画像記録層を溶媒中に溶解させることでアルミニウム支持体の表面を露出させる。
 露出させたアルミニウム支持体の画像記録層側の表面における水との接触角は、測定装置として全自動接触角計(例えば、協和界面化学(株)製DM-501)によって、25℃における表面上の水滴の接触角(0.2秒後)として測定される。
In the present disclosure, the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side shall be measured by the following method.
The lithographic printing plate original plate is immersed in a solvent capable of removing the image recording layer (for example, the solvent used in the coating liquid for the image recording layer), the image recording layer is scraped off at least one of the sponge and cotton, and the image recording layer is used as a solvent. The surface of the aluminum support is exposed by dissolving in it.
The contact angle with water on the surface of the exposed aluminum support on the image recording layer side is measured on the surface at 25 ° C. by a fully automatic contact angle meter (for example, DM-501 manufactured by Kyowa Surface Chemistry Co., Ltd.) as a measuring device. It is measured as the contact angle of water droplets (after 0.2 seconds).
 本開示におけるアルミニウム支持体としては、公知の方法で粗面化処理され、陽極酸化処理されたアルミニウム板が好ましい。即ち、本開示におけるアルミニウム支持体は、アルミニウム板とアルミニウム板上に配置されたアルミニウムの陽極酸化被膜とを有することが好ましい。 As the aluminum support in the present disclosure, an aluminum plate that has been roughened and anodized by a known method is preferable. That is, the aluminum support in the present disclosure preferably has an aluminum plate and an anodized film of aluminum arranged on the aluminum plate.
 本開示において用いられるアルミニウム支持体の好ましい態様の一例(本一例に係るアルミニウム支持体を、「支持体(1)」ともいう。)を以下に示す。
 即ち、支持体(1)は、アルミニウム板と、上記アルミニウム板上に配置されたアルミニウムの陽極酸化皮膜とを有し、上記陽極酸化皮膜が、上記アルミニウム板よりも上記画像記録層側に位置し、上記陽極酸化皮膜が、上記画像記録層側の表面から深さ方向にのびるマイクロポアを有し、上記マイクロポアの上記陽極酸化皮膜表面における平均径が10nmを超え100nm以下であり、上記陽極酸化皮膜の上記画像記録層側の表面のL表色系における明度Lの値が、70~100である。
An example of a preferred embodiment of the aluminum support used in the present disclosure (the aluminum support according to this example is also referred to as “support (1)”) is shown below.
That is, the support (1) has an aluminum plate and an anodized film of aluminum arranged on the aluminum plate, and the anodized film is located closer to the image recording layer than the aluminum plate. The anodic oxide film has micropores extending in the depth direction from the surface on the image recording layer side, and the average diameter of the micropores on the surface of the anodic oxide film is more than 10 nm and 100 nm or less, and the anodic oxidation. The value of the brightness L * in the L * a * b * color system of the surface of the film on the image recording layer side is 70 to 100.
 図1は、アルミニウム支持体12aの一実施形態の模式的断面図である。
 アルミニウム支持体12aは、アルミニウム板18とアルミニウムの陽極酸化皮膜20a(以後、単に「陽極酸化皮膜20a」とも称する)とをこの順で積層した積層構造を有する。なお、アルミニウム支持体12a中の陽極酸化皮膜20aが、アルミニウム板18よりも画像記録層側に位置する。つまり、本開示に係る平版印刷版原版は、アルミニウム板上に、陽極酸化皮膜、画像記録層、及び水溶性樹脂層をこの順で少なくとも有することが好ましい。
FIG. 1 is a schematic cross-sectional view of an embodiment of the aluminum support 12a.
The aluminum support 12a has a laminated structure in which an aluminum plate 18 and an anodized film 20a of aluminum (hereinafter, also simply referred to as “anodized film 20a”) are laminated in this order. The anodized film 20a in the aluminum support 12a is located closer to the image recording layer than the aluminum plate 18. That is, it is preferable that the lithographic printing plate original plate according to the present disclosure has at least an anodized film, an image recording layer, and a water-soluble resin layer on an aluminum plate in this order.
-陽極酸化皮膜-
 以下、陽極酸化被膜20aの好ましい態様について説明する。
 陽極酸化皮膜20aは、陽極酸化処理によってアルミニウム板18の表面に作製される皮膜であって、この皮膜は、皮膜表面に略垂直であり、かつ、個々が均一に分布した極微細なマイクロポア22aを有する。マイクロポア22aは、画像記録層側の陽極酸化皮膜20a表面(アルミニウム板18側とは反対側の陽極酸化皮膜20a表面)から厚み方向(アルミニウム板18側)に沿ってのびる。
-Anodized film-
Hereinafter, preferred embodiments of the anodized coating 20a will be described.
The anodized film 20a is a film formed on the surface of the aluminum plate 18 by anodizing treatment, and this film is extremely fine micropores 22a which are substantially perpendicular to the film surface and are uniformly distributed among individuals. Has. The micropores 22a extend from the surface of the anodized film 20a on the image recording layer side (the surface of the anodized film 20a on the side opposite to the aluminum plate 18 side) along the thickness direction (aluminum plate 18 side).
 陽極酸化皮膜20a中のマイクロポア22aの陽極酸化皮膜表面における平均径(平均開口径)は、10nm超え100nm以下であることが好ましい。中でも、耐刷性、耐汚れ性、及び画像視認性のバランスの点から、15nm~60nmがより好ましく、20nm~50nmが更に好ましく、25nm~40nmが特に好ましい。ポア内部の径は、表層よりも広がっても狭まってもよい。
 平均径が10nmを超えれば、耐刷性及び画像視認性が更に優れる。また、平均径が100nm以下であれば場合、耐刷性が更に優れる。
 マイクロポア22aの平均径は、陽極酸化皮膜20a表面を倍率15万倍の電界放出型走査電子顕微鏡(FE-SEM)でN=4枚観察し、得られた4枚の画像において、400nm×600nmの範囲に存在するマイクロポアの径(直径)を50箇所測定し、算術平均値として算出される。
 なお、マイクロポア22aの形状が円状でない場合は、円相当径を用いる。「円相当径」とは、開口部の形状を、開口部の投影面積と同じ投影面積をもつ円と想定したときの円の直径である。
The average diameter (average opening diameter) of the micropores 22a in the anodized film 20a on the surface of the anodized film is preferably more than 10 nm and 100 nm or less. Among them, from the viewpoint of the balance between printing resistance, stain resistance, and image visibility, 15 nm to 60 nm is more preferable, 20 nm to 50 nm is further preferable, and 25 nm to 40 nm is particularly preferable. The diameter inside the pores may be wider or narrower than the surface layer.
If the average diameter exceeds 10 nm, the printing resistance and image visibility are further excellent. Further, when the average diameter is 100 nm or less, the printing resistance is further excellent.
The average diameter of the micropores 22a is 400 nm × 600 nm in the four images obtained by observing the surface of the anodized film 20a with a field emission scanning electron microscope (FE-SEM) at a magnification of 150,000. The diameter (diameter) of the micropores existing in the range of is measured at 50 points and calculated as an arithmetic average value.
If the shape of the micropore 22a is not circular, the diameter equivalent to the circle is used. The "circle equivalent diameter" is the diameter of a circle when the shape of the opening is assumed to be a circle having the same projected area as the projected area of the opening.
 マイクロポア22aの深さは特に制限されないが、10nm~3,000nmが好ましく、50nm~2,000nmがより好ましく、300nm~1,600nmが更に好ましい。
 なお、上記深さは、陽極酸化皮膜20aの断面の写真(15万倍)をとり、25個以上のマイクロポア22aの深さを測定し、平均した値である。
The depth of the micropore 22a is not particularly limited, but is preferably 10 nm to 3,000 nm, more preferably 50 nm to 2,000 nm, and even more preferably 300 nm to 1,600 nm.
The depth is an average value obtained by taking a photograph (150,000 times) of the cross section of the anodized film 20a and measuring the depths of 25 or more micropores 22a.
 マイクロポア22aの形状は特に制限されず、図1では、略直管状(略円柱状)であるが、深さ方向(厚み方向)に向かって径が小さくなる円錐状であってもよい。また、マイクロポア22aの底部の形状は特に制限されず、曲面状(凸状)であっても、平面状であってもよい。 The shape of the micropore 22a is not particularly limited, and in FIG. 1, it is a substantially straight tubular (substantially cylindrical) shape, but it may be a conical shape whose diameter decreases in the depth direction (thickness direction). The shape of the bottom of the micropore 22a is not particularly limited, and may be curved (convex) or flat.
 アルミニウム支持体12aの画像記録層側の表面(陽極酸化皮膜20aの画像記録層側の表面)のL表色系における明度Lの値は、70~100であることが好ましい。中でも、耐刷性及び画像視認性のバランスがより優れる点で、75~100が好ましく、75~90がより好ましい。
 上記明度Lの測定は、エックスライト(株)製、色彩色差計Spectro Eyeを用いて測定する。
The value of L * a * b * brightness L * in the color system of the surface of the aluminum support 12a on the image recording layer side (the surface of the anodized film 20a on the image recording layer side) is preferably 70 to 100. .. Among them, 75 to 100 is preferable, and 75 to 90 is more preferable, in that the balance between printing resistance and image visibility is more excellent.
The brightness L * is measured using a color difference meter Specro Eye manufactured by X-Light Co., Ltd.
 支持体(1)において、上記マイクロポアが、上記陽極酸化皮膜表面から深さ10nm~1,000nmの位置までのびる大径孔部と、上記大径孔部の底部と連通し、連通位置から深さ20nm~2,000nmの位置までのびる小径孔部とから構成され、上記大径孔部の上記陽極酸化皮膜表面における平均径が15nm~150nmであり、上記小径孔部の上記連通位置における平均径が13nm以下である態様(以下、上記態様に係る支持体を、「支持体(2)」ともいう。)も好ましく挙げられる。
 図2は、アルミニウム支持体12aの、図1に示したものとは別の一実施形態の模式的断面図である。
 図2において、アルミニウム支持体12bは、アルミニウム板18と、大径孔部24と小径孔部26とから構成されるマイクロポア22bを有する陽極酸化皮膜20bとを含む。
 陽極酸化皮膜20b中のマイクロポア22bは、陽極酸化皮膜表面から深さ10nm~1,000nm(深さD:図2参照)の位置までのびる大径孔部24と、大径孔部24の底部と連通し、連通位置から更に深さ20nm~2,000nmの位置までのびる小径孔部26とから構成される。
 以下に、大径孔部24と小径孔部26について詳述する。
In the support (1), the micropore communicates with the large-diameter hole extending from the surface of the anodic oxide film to a depth of 10 nm to 1,000 nm and the bottom of the large-diameter hole, and is deep from the communication position. It is composed of a small-diameter hole extending from 20 nm to 2,000 nm, and the average diameter of the large-diameter hole on the surface of the anodic oxide film is 15 nm to 150 nm, and the average diameter of the small-diameter hole at the communication position. A mode in which the diameter is 13 nm or less (hereinafter, the support according to the above mode is also referred to as “support (2)”) is also preferably mentioned.
FIG. 2 is a schematic cross-sectional view of the aluminum support 12a according to an embodiment different from that shown in FIG.
In FIG. 2, the aluminum support 12b includes an aluminum plate 18 and an anodic oxide film 20b having a micropore 22b composed of a large-diameter hole portion 24 and a small-diameter hole portion 26.
The micropores 22b in the anodized film 20b have a large-diameter hole portion 24 extending from the surface of the anodized film to a depth of 10 nm to 1,000 nm (depth D: see FIG. 2) and a bottom portion of the large-diameter hole portion 24. It is composed of a small-diameter hole portion 26 extending from the communication position to a depth of 20 nm to 2,000 nm.
The large-diameter hole portion 24 and the small-diameter hole portion 26 will be described in detail below.
 大径孔部24の陽極酸化皮膜20b表面における平均径は、上述した陽極酸化皮膜20a中のマイクロポア22aの陽極酸化皮膜表面における平均径と同じで、10nm超100nm以下であり、好適範囲も同じである。
 大径孔部24の陽極酸化皮膜20b表面における平均径の測定方法は、陽極酸化皮膜20a中のマイクロポア22aの陽極酸化皮膜表面における平均径の測定方法と同じである。
The average diameter of the large-diameter pore portion 24 on the surface of the anodized film 20b is the same as the average diameter of the micropores 22a in the above-mentioned anodized film 20a on the surface of the anodized film, which is more than 10 nm and 100 nm or less, and the preferable range is also the same. Is.
The method for measuring the average diameter on the surface of the anodic oxide film 20b of the large-diameter hole portion 24 is the same as the method for measuring the average diameter on the surface of the anodic oxide film of the micropores 22a in the anodic oxide film 20a.
 大径孔部24の底部は、陽極酸化皮膜表面から深さ10nm~1,000nm(以後、深さDとも称する)に位置する。つまり、大径孔部24は、陽極酸化皮膜表面から深さ方向(厚み方向)に10nm~1,000nmの位置までのびる孔部である。上記深さは、10nm~200nmが好ましい。
 なお、上記深さは、陽極酸化皮膜20bの断面の写真(15万倍)をとり、25個以上の大径孔部24の深さを測定し、平均した値である。
The bottom of the large-diameter hole portion 24 is located at a depth of 10 nm to 1,000 nm (hereinafter, also referred to as a depth D) from the surface of the anodized film. That is, the large-diameter hole portion 24 is a hole portion extending from the surface of the anodized film to a position of 10 nm to 1,000 nm in the depth direction (thickness direction). The depth is preferably 10 nm to 200 nm.
The depth is an average value obtained by taking a photograph (150,000 times) of the cross section of the anodized film 20b, measuring the depths of 25 or more large-diameter hole portions 24, and averaging them.
 大径孔部24の形状は特に制限されず、例えば、略直管状(略円柱状)、及び、深さ方向(厚み方向)に向かって径が小さくなる円錐状が挙げられ、略直管状が好ましい。 The shape of the large-diameter hole portion 24 is not particularly limited, and examples thereof include a substantially straight tubular shape (substantially cylindrical) and a conical shape whose diameter decreases in the depth direction (thickness direction). preferable.
 小径孔部26は、図2に示すように、大径孔部24の底部と連通して、連通位置より更に深さ方向(厚み方向)に延びる孔部である。
 小径孔部26の連通位置における平均径は、13nm以下が好ましい。中でも、11nm以下が好ましく、10nm以下がより好ましい。下限は特に制限されないが、5nm以上の場合が多い。
As shown in FIG. 2, the small-diameter hole portion 26 is a hole portion that communicates with the bottom portion of the large-diameter hole portion 24 and extends further in the depth direction (thickness direction) from the communication position.
The average diameter of the small-diameter hole portion 26 at the communication position is preferably 13 nm or less. Of these, 11 nm or less is preferable, and 10 nm or less is more preferable. The lower limit is not particularly limited, but it is often 5 nm or more.
 小径孔部26の平均径は、陽極酸化皮膜20a表面を倍率15万倍のFE-SEMでN=4枚観察し、得られた4枚の画像において、400nm×600nmの範囲に存在するマイクロポア(小径孔部)の径(直径)を測定し、算術平均値として得られる。なお、大径孔部の深さが深い場合は、必要に応じて、陽極酸化皮膜20b上部(大径孔部のある領域)を切削し(例えば、アルゴンガスによって切削)、その後陽極酸化皮膜20b表面を上記FE-SEMで観察して、小径孔部の平均径を求めてもよい。
 なお、小径孔部26の形状が円状でない場合は、円相当径を用いる。「円相当径」とは、開口部の形状を、開口部の投影面積と同じ投影面積をもつ円と想定したときの円の直径である。
The average diameter of the small-diameter hole portion 26 is such that the surface of the anodized film 20a is observed with N = 4 images by FE-SEM at a magnification of 150,000 times, and in the obtained 4 images, micropores existing in the range of 400 nm × 600 nm. The diameter (diameter) of the (small diameter hole) is measured and obtained as an arithmetic mean value. If the large-diameter hole is deep, the upper part of the anodic oxide film 20b (the region with the large-diameter hole) is cut (for example, cut with argon gas), and then the anodic oxide film 20b is cut. The surface may be observed with the above FE-SEM to obtain the average diameter of the small-diameter holes.
When the shape of the small diameter hole portion 26 is not circular, the diameter equivalent to a circle is used. The "circle equivalent diameter" is the diameter of a circle when the shape of the opening is assumed to be a circle having the same projected area as the projected area of the opening.
 小径孔部26の底部は、上記の大径孔部24との連通位置から更に深さ方向に20nm~2,000nmのびた場所に位置する。言い換えると、小径孔部26は、上記大径孔部24との連通位置から更に深さ方向(厚み方向)にのびる孔部であり、小径孔部26の深さは20nm~2,000nmである。なお、上記深さは、500nm~1,500nmが好ましい。
 なお、上記深さは、陽極酸化皮膜20bの断面の写真(5万倍)をとり、25個以上の小径孔部の深さを測定し、平均した値である。
The bottom portion of the small-diameter hole portion 26 is located at a position extending 20 nm to 2,000 nm in the depth direction from the communication position with the large-diameter hole portion 24. In other words, the small-diameter hole portion 26 is a hole portion that extends further in the depth direction (thickness direction) from the communication position with the large-diameter hole portion 24, and the depth of the small-diameter hole portion 26 is 20 nm to 2,000 nm. .. The depth is preferably 500 nm to 1,500 nm.
The depth is an average value obtained by taking a photograph (50,000 times) of the cross section of the anodized film 20b and measuring the depths of 25 or more small-diameter holes.
 小径孔部26の形状は特に制限されず、例えば、略直管状(略円柱状)、及び、深さ方向に向かって径が小さくなる円錐状が挙げられ、略直管状が好ましい。 The shape of the small-diameter hole portion 26 is not particularly limited, and examples thereof include a substantially straight tubular (approximately cylindrical) shape and a conical shape whose diameter decreases in the depth direction, and a substantially straight tubular shape is preferable.
-アルミニウム支持体の製造方法-
 本開示に用いられるアルミニウム支持体の製造方法としては、例えば、以下の工程を順番に実施する製造方法が好ましい。
・粗面化処理工程:アルミニウム板に粗面化処理を施す工程
・陽極酸化処理工程:粗面化処理されたアルミニウム板を陽極酸化する工程
・ポアワイド処理工程:陽極酸化処理工程で得られた陽極酸化皮膜を有するアルミニウム板を、酸水溶液又はアルカリ水溶液に接触させ、陽極酸化皮膜中のマイクロポアの径を拡大させる工程
 以下、各工程の手順について詳述する。
-Manufacturing method of aluminum support-
As a method for manufacturing the aluminum support used in the present disclosure, for example, a manufacturing method in which the following steps are sequentially performed is preferable.
-Roughening treatment step: A step of roughening an aluminum plate-Anodization treatment step: A step of anodizing an aluminum plate that has been roughened-Pore wide treatment step: Anodizer obtained in an anodization treatment step Step of bringing an aluminum plate having an oxide film into contact with an acid aqueous solution or an alkaline aqueous solution to increase the diameter of micropores in the anodic oxide film The procedure of each step will be described in detail below.
〔粗面化処理工程〕
 粗面化処理工程は、アルミニウム板の表面に、電気化学的粗面化処理を含む粗面化処理を施す工程である。本工程は、後述する陽極酸化処理工程の前に実施されることが好ましいが、アルミニウム板の表面がすでに好ましい表面形状を有していれば、特に実施しなくてもよい。
[Roughening process]
The roughening treatment step is a step of applying a roughening treatment including an electrochemical roughening treatment to the surface of the aluminum plate. This step is preferably carried out before the anodizing treatment step described later, but it may not be carried out in particular as long as the surface of the aluminum plate already has a preferable surface shape.
 粗面化処理は、電気化学的粗面化処理のみを実施してもよいが、電気化学的粗面化処理と機械的粗面化処理及び/又は化学的粗面化処理とを組み合わせて実施してもよい。
 機械的粗面化処理と電気化学的粗面化処理とを組み合わせる場合には、機械的粗面化処理の後に、電気化学的粗面化処理を実施するのが好ましい。
 電気化学的粗面化処理は、硝酸又は塩酸を主体とする水溶液中で、直流又は交流を用いて行われることが好ましい。
 機械的粗面化処理の方法は特に制限されないが、例えば、特公昭50-40047号公報に記載されている方法が挙げられる。
 化学的粗面化処理も特に制限されず、公知の方法が挙げられる。
The roughening treatment may be carried out only by the electrochemical roughening treatment, but is carried out by combining the electrochemical roughening treatment with the mechanical roughening treatment and / or the chemical roughening treatment. You may.
When the mechanical roughening treatment and the electrochemical roughening treatment are combined, it is preferable to carry out the electrochemical roughening treatment after the mechanical roughening treatment.
The electrochemical roughening treatment is preferably carried out using direct current or alternating current in an aqueous solution mainly containing nitric acid or hydrochloric acid.
The method of mechanical roughening treatment is not particularly limited, and examples thereof include the methods described in Japanese Patent Publication No. 50-40047.
The chemical roughening treatment is also not particularly limited, and known methods can be mentioned.
 機械的粗面化処理の後には、以下の化学エッチング処理を実施するのが好ましい。
 機械的粗面化処理の後に施される化学エッチング処理は、アルミニウム板の表面の凹凸形状のエッジ部分をなだらかにし、印刷時のインキの引っかかりを防止し、印刷版の耐汚れ性を向上させるとともに、表面に残った研磨材粒子等の不要物を除去するために行われる。
 化学エッチング処理としては、酸によるエッチング及びアルカリによるエッチングが挙げられ、エッチング効率の点で特に優れている方法として、アルカリ水溶液を用いる化学エッチング処理(以下、「アルカリエッチング処理」ともいう。)が挙げられる。
After the mechanical roughening treatment, it is preferable to carry out the following chemical etching treatment.
The chemical etching treatment performed after the mechanical roughening treatment smoothes the uneven edges on the surface of the aluminum plate, prevents ink from getting caught during printing, and improves the stain resistance of the printing plate. , It is performed to remove unnecessary substances such as abrasive particles remaining on the surface.
Examples of the chemical etching treatment include etching with an acid and etching with an alkali, and as a method particularly excellent in terms of etching efficiency, a chemical etching treatment using an alkaline aqueous solution (hereinafter, also referred to as “alkali etching treatment”) can be mentioned. Be done.
 アルカリ水溶液に用いられるアルカリ剤は特に制限されないが、例えば、カセイソーダ、カセイカリ、メタケイ酸ソーダ、炭酸ソーダ、アルミン酸ソーダ、及び、グルコン酸ソーダが挙げられる。
 アルカリ水溶液は、アルミニウムイオンを含んでいてもよい。
 アルカリ水溶液のアルカリ剤の濃度は、0.01質量%以上が好ましく、3質量%以上がより好ましく、また、30質量%以下が好ましい。
The alkaline agent used in the alkaline aqueous solution is not particularly limited, and examples thereof include caustic soda, caustic potash, sodium metasilicate, sodium carbonate, sodium aluminate, and sodium gluconate.
The alkaline aqueous solution may contain aluminum ions.
The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.01% by mass or more, more preferably 3% by mass or more, and preferably 30% by mass or less.
 アルカリエッチング処理を施した場合、アルカリエッチング処理により生じる生成物を除去するために、低温の酸性水溶液を用いて化学エッチング処理(以下、「デスマット処理」ともいう。)を施すのが好ましい。
 酸性水溶液に用いられる酸は特に制限されないが、例えば、硫酸、硝酸、及び、塩酸が挙げられる。また、酸性水溶液の温度は、20℃~80℃が好ましい。
When the alkaline etching treatment is performed, it is preferable to perform a chemical etching treatment (hereinafter, also referred to as "desmat treatment") using a low-temperature acidic aqueous solution in order to remove the product generated by the alkaline etching treatment.
The acid used in the acidic aqueous solution is not particularly limited, and examples thereof include sulfuric acid, nitric acid, and hydrochloric acid. The temperature of the acidic aqueous solution is preferably 20 ° C to 80 ° C.
 粗面化処理工程としては、A態様又はB態様に示す処理を以下に示す順に実施する方法が好ましい。 As the roughening treatment step, it is preferable to carry out the treatments shown in the A mode or the B mode in the order shown below.
~A態様~
(2)アルカリ水溶液を用いた化学エッチング処理(第1アルカリエッチング処理)
(3)酸性水溶液を用いた化学エッチング処理(第1デスマット処理)
(4)硝酸を主体とする水溶液を用いた電気化学的粗面化処理(第1電気化学的粗面化処理)
(5)アルカリ水溶液を用いた化学エッチング処理(第2アルカリエッチング処理)
(6)酸性水溶液を用いた化学エッチング処理(第2デスマット処理)
(7)塩酸を主体とする水溶液中で電気化学的粗面化処理(第2電気化学的粗面化処理)
(8)アルカリ水溶液を用いた化学エッチング処理(第3アルカリエッチング処理)
(9)酸性水溶液を用いた化学エッチング処理(第3デスマット処理)
~ A aspect ~
(2) Chemical etching treatment using an alkaline aqueous solution (first alkaline etching treatment)
(3) Chemical etching treatment using an acidic aqueous solution (first desmat treatment)
(4) Electrochemical roughening treatment using an aqueous solution mainly composed of nitric acid (first electrochemical roughening treatment)
(5) Chemical etching treatment using an alkaline aqueous solution (second alkaline etching treatment)
(6) Chemical etching treatment using an acidic aqueous solution (second desmat treatment)
(7) Electrochemical roughening treatment in an aqueous solution mainly composed of hydrochloric acid (second electrochemical roughening treatment)
(8) Chemical etching treatment using an alkaline aqueous solution (third alkaline etching treatment)
(9) Chemical etching treatment using an acidic aqueous solution (third desmat treatment)
~B態様~
(10)アルカリ水溶液を用いた化学エッチング処理(第4アルカリエッチング処理)
(11)酸性水溶液を用いた化学エッチング処理(第4デスマット処理)
(12)塩酸を主体とする水溶液を用いた電気化学的粗面化処理(第3電気化学的粗面化処理)
(13)アルカリ水溶液を用いた化学エッチング処理(第5アルカリエッチング処理)
(14)酸性水溶液を用いた化学エッチング処理(第5デスマット処理)
~ B mode ~
(10) Chemical etching treatment using an alkaline aqueous solution (fourth alkaline etching treatment)
(11) Chemical etching treatment using an acidic aqueous solution (fourth desmat treatment)
(12) Electrochemical roughening treatment using an aqueous solution mainly composed of hydrochloric acid (third electrochemical roughening treatment)
(13) Chemical etching treatment using an alkaline aqueous solution (fifth alkaline etching treatment)
(14) Chemical etching treatment using an acidic aqueous solution (fifth desmat treatment)
 上記A態様の(2)の処理前、又は、B態様の(10)の処理前に、必要に応じて、(1)機械的粗面化処理を実施してもよい。 If necessary, (1) mechanical roughening treatment may be carried out before the treatment of (2) of the A aspect or (10) of the B aspect.
 第1アルカリエッチング処理及び第4アルカリエッチング処理におけるアルミニウム板の溶解量は、0.5g/m~30g/mが好ましく、1.0g/m~20g/mがより好ましい。 The amount of the aluminum plate dissolved in the first alkali etching treatment and the fourth alkali etching treatment is preferably 0.5 g / m 2 to 30 g / m 2, and more preferably 1.0 g / m 2 to 20 g / m 2 .
 A態様における第1電気化学的粗面化処理で用いる硝酸を主体とする水溶液としては、直流又は交流を用いた電気化学的な粗面化処理に用いる水溶液が挙げられる。例えば、1~100g/Lの硝酸水溶液に、硝酸アルミニウム、硝酸ナトリウム、又は、硝酸アンモニウム等を添加して得られる水溶液が挙げられる。
 A態様における第2電気化学的粗面化処理及びB態様における第3電気化学的粗面化処理で用いる塩酸を主体とする水溶液としては、通常の直流又は交流を用いた電気化学的な粗面化処理に用いる水溶液が挙げられる。例えば、1g/L~100g/Lの塩酸水溶液に、硫酸を0g/L~30g/L添加して得られる水溶液が挙げられる。なお、この溶液に、硝酸アルミニウム、硝酸ナトリウム、及び、硝酸アンモニウム等の硝酸イオン;塩化アルミニウム、塩化ナトリウム、及び、塩化アンモニウム等の塩酸イオンを更に添加してもよい。
Examples of the nitric acid-based aqueous solution used in the first electrochemical roughening treatment in the A aspect include an aqueous solution used in the electrochemical roughening treatment using direct current or alternating current. For example, an aqueous solution obtained by adding aluminum nitrate, sodium nitrate, ammonium nitrate or the like to an aqueous nitric acid solution of 1 to 100 g / L can be mentioned.
The aqueous solution mainly containing hydrochloric acid used in the second electrochemical roughening treatment in the A aspect and the third electrochemical roughening treatment in the B aspect is an electrochemical rough surface using ordinary direct current or alternating current. Examples thereof include an aqueous solution used for the chemical treatment. For example, an aqueous solution obtained by adding 0 g / L to 30 g / L of sulfuric acid to a 1 g / L to 100 g / L hydrochloric acid aqueous solution can be mentioned. In addition, nitrate ions such as aluminum nitrate, sodium nitrate and ammonium nitrate; hydrochloric acid ions such as aluminum chloride, sodium chloride and ammonium chloride may be further added to this solution.
 電気化学的粗面化処理の交流電源波形は、サイン波、矩形波、台形波、及び、三角波等を用いることができる。周波数は0.1Hz~250Hzが好ましい。
 図3は、電気化学的粗面化処理に用いられる交番波形電流波形図の一例を示すグラフである。
 図3において、taはアノード反応時間、tcはカソード反応時間、tpは電流が0からピークに達するまでの時間、Iaはアノードサイクル側のピーク時の電流、Icはカソードサイクル側のピーク時の電流、AAはアルミニウム板のアノード反応の電流、CAはアルミニウム板のカソード反応の電流である。台形波において、電流が0からピークに達するまでの時間tpは1ms~10msが好ましい。電気化学的な粗面化に用いる交流の1サイクルの条件が、アルミニウム板のアノード反応時間taとカソード反応時間tcの比tc/taが1~20、アルミニウム板がアノード時の電気量Qcとアノード時の電気量Qaの比Qc/Qaが0.3~20、アノード反応時間taが5ms~1,000ms、の範囲にあるのが好ましい。電流密度は台形波のピーク値で電流のアノードサイクル側Ia、カソードサイクル側Icともに10A/dm~200A/dmが好ましい。Ic/Iaは、0.3~20が好ましい。電気化学的な粗面化が終了した時点でのアルミニウム板のアノード反応にあずかる電気量の総和は、25C/dm~1,000C/dmが好ましい。
As the AC power supply waveform of the electrochemical roughening treatment, a sine wave, a square wave, a trapezoidal wave, a triangular wave, or the like can be used. The frequency is preferably 0.1 Hz to 250 Hz.
FIG. 3 is a graph showing an example of an alternating waveform current waveform diagram used in the electrochemical roughening process.
In FIG. 3, ta is the anode reaction time, ct is the cathode reaction time, tp is the time from 0 to the peak of the current, Ia is the peak current on the anode cycle side, and Ic is the peak current on the cathode cycle side. , AA is the current of the anode reaction of the aluminum plate, and CA is the current of the cathode reaction of the aluminum plate. In a trapezoidal wave, the time tp from 0 to the peak of the current is preferably 1 ms to 10 ms. The conditions for one cycle of AC used for electrochemical roughening are that the ratio ct / ta of the anode reaction time ta and the cathode reaction time ct of the aluminum plate is 1 to 20, and the amount of electricity Qc and the anode when the aluminum plate is the anode. It is preferable that the ratio Qc / Qa of the amount of electricity Qa at the time is in the range of 0.3 to 20 and the anode reaction time ta is in the range of 5 ms to 1,000 ms. The current density is the peak value of the trapezoidal wave, and is preferably 10 A / dm 2 to 200 A / dm 2 for both the anode cycle side Ia and the cathode cycle side Ic of the current. Ic / Ia is preferably 0.3 to 20. The total amount of electricity furnished to anode reaction of the aluminum plate at the time the electrochemical graining is completed, 25C / dm 2 ~ 1,000C / dm 2 is preferred.
 交流を用いた電気化学的な粗面化には図4に示した装置を用いることができる。
 図4は、交流を用いた電気化学的粗面化処理におけるラジアル型セルの一例を示す側面図である。
 図4において、50は主電解槽、51は交流電源、52はラジアルドラムローラ、53a及び53bは主極、54は電解液供給口、55は電解液、56はスリット、57は電解液通路、58は補助陽極、60は補助陽極槽、Wはアルミニウム板である。図4中、矢印A1は電解液の給液方向を、矢印A2は電解液の排出方向をそれぞれ示している。である。電解槽を2つ以上用いるときには、電解条件は同じでもよいし、異なっていてもよい。
 アルミニウム板Wは主電解槽50中に浸漬して配置されたラジアルドラムローラ52に巻装され、搬送過程で交流電源51に接続する主極53a及び53bにより電解処理される。電解液55は、電解液供給口54からスリット56を通じてラジアルドラムローラ52と主極53a及び53bとの間の電解液通路57に供給される。主電解槽50で処理されたアルミニウム板Wは、次いで、補助陽極槽60で電解処理される。この補助陽極槽60には補助陽極58がアルミニウム板Wと対向配置されており、電解液55が補助陽極58とアルミニウム板Wとの間の空間を流れるように供給される。
The apparatus shown in FIG. 4 can be used for electrochemical roughening using alternating current.
FIG. 4 is a side view showing an example of a radial cell in an electrochemical roughening treatment using alternating current.
In FIG. 4, 50 is a main electrolytic cell, 51 is an AC power supply, 52 is a radial drum roller, 53a and 53b are main poles, 54 is an electrolytic solution supply port, 55 is an electrolytic solution, 56 is a slit, and 57 is an electrolytic solution passage. 58 is an auxiliary anode, 60 is an auxiliary anode tank, and W is an aluminum plate. In FIG. 4, the arrow A1 indicates the supply direction of the electrolytic solution, and the arrow A2 indicates the discharge direction of the electrolytic solution. Is. When two or more electrolytic cells are used, the electrolysis conditions may be the same or different.
The aluminum plate W is wound around a radial drum roller 52 immersed in the main electrolytic cell 50 and is electrolyzed by the main poles 53a and 53b connected to the AC power supply 51 during the transfer process. The electrolytic solution 55 is supplied from the electrolytic solution supply port 54 to the electrolytic solution passage 57 between the radial drum roller 52 and the main poles 53a and 53b through the slit 56. The aluminum plate W treated in the main electrolytic cell 50 is then electrolyzed in the auxiliary anode tank 60. An auxiliary anode 58 is arranged to face the aluminum plate W in the auxiliary anode tank 60, and the electrolytic solution 55 is supplied so as to flow in the space between the auxiliary anode 58 and the aluminum plate W.
 第2アルカリエッチング処理におけるアルミニウム板の溶解量は、所定の印刷版原版が製造しやすい点で、1.0g/m以上が好ましく、2.0g/m~10g/mがより好ましい。 The amount of the aluminum plate dissolved in the second alkali etching treatment is preferably 1.0 g / m 2 or more, and more preferably 2.0 g / m 2 to 10 g / m 2 in that a predetermined printing plate original plate can be easily produced.
 第3アルカリエッチング処理及び第4アルカリエッチング処理におけるアルミニウム板の溶解量は、所定の印刷版原版が製造しやすい点で、0.01g/m~0.8g/mが好ましく、0.05g/m~0.3g/mがより好ましい。 The amount of the aluminum plate dissolved in the third alkali etching treatment and the fourth alkali etching treatment is preferably 0.01 g / m 2 to 0.8 g / m 2 and 0.05 g in that a predetermined printing plate original plate can be easily produced. / M 2 to 0.3 g / m 2 is more preferable.
 酸性水溶液を用いた化学エッチング処理(第1~第5デスマット処理)では、燐酸、硝酸、硫酸、クロム酸、塩酸、又はこれらの2以上の酸を含む混酸を含む酸性水溶液が好適に用いられる。
 酸性水溶液の酸の濃度は、0.5質量%~60質量%が好ましい。
In the chemical etching treatment (first to fifth desmat treatments) using an acidic aqueous solution, an acidic aqueous solution containing phosphoric acid, nitric acid, sulfuric acid, chromium acid, hydrochloric acid, or a mixed acid containing two or more of these acids is preferably used.
The acid concentration of the acidic aqueous solution is preferably 0.5% by mass to 60% by mass.
〔陽極酸化処理工程〕
 陽極酸化処理工程の手順は、上述したマイクロポアが得られれば特に制限されず、公知の方法が挙げられる。
 陽極酸化処理工程においては、硫酸、リン酸、及び、シュウ酸等の水溶液を電解浴として用いることができる。例えば、硫酸の濃度は、100g/L~300g/Lが挙げられる。
 陽極酸化処理の条件は使用される電解液によって適宜設定されるが、例えば、液温5℃~70℃(好ましくは10℃~60℃)、電流密度0.5A/dm~60A/dm(好ましくは5A/dm~60A/dm)、電圧1V~100V(好ましくは5V~50V)、電解時間1秒~100秒(好ましくは5秒~60秒)、及び、皮膜量0.1g/m~5g/m(好ましくは0.2g/m~3g/m)が挙げられる。
[Anodizing process]
The procedure of the anodizing treatment step is not particularly limited as long as the above-mentioned micropores can be obtained, and known methods can be mentioned.
In the anodizing treatment step, aqueous solutions of sulfuric acid, phosphoric acid, oxalic acid and the like can be used as the electrolytic bath. For example, the concentration of sulfuric acid is 100 g / L to 300 g / L.
The conditions for the anodic oxidation treatment are appropriately set depending on the electrolytic solution used, and for example, the liquid temperature is 5 ° C. to 70 ° C. (preferably 10 ° C. to 60 ° C.), and the current density is 0.5 A / dm 2 to 60 A / dm 2. (Preferably 5A / dm 2 to 60A / dm 2 ), voltage 1V to 100V (preferably 5V to 50V), electrolysis time 1 to 100 seconds (preferably 5 to 60 seconds), and film amount 0.1 g. / M 2 to 5 g / m 2 (preferably 0.2 g / m 2 to 3 g / m 2 ).
〔ポアワイド処理〕
 ポアワイド処理は、上述した陽極酸化処理工程により形成された陽極酸化皮膜に存在するマイクロポアの径(ポア径)を拡大させる処理(孔径拡大処理)である。
 ポアワイド処理は、上述した陽極酸化処理工程により得られたアルミニウム板を、酸水溶液又はアルカリ水溶液に接触させることにより行うことができる。接触させる方法は特に制限されず、例えば、浸せき法及びスプレー法が挙げられる。
[Pore wide processing]
The pore-wide treatment is a treatment (pore diameter enlargement treatment) for enlarging the diameter (pore diameter) of micropores existing in the anodizing film formed by the above-mentioned anodizing treatment step.
The pore-wide treatment can be carried out by bringing the aluminum plate obtained by the above-mentioned anodizing treatment step into contact with an acid aqueous solution or an alkaline aqueous solution. The method of contact is not particularly limited, and examples thereof include a dipping method and a spraying method.
<下塗り層>
 本開示に係る平版印刷版原版は、画像記録層と支持体との間に下塗り層(中間層と呼ばれることもある。)を有することが好ましい。下塗り層は、露光部においては支持体と画像記録層との密着を強化し、未露光部においては画像記録層の支持体からのはく離を生じやすくさせるため、耐刷性を損なわずに現像性を向上させることに寄与する。また、赤外線レーザー露光の場合に、下塗り層が断熱層として機能することにより、露光により発生した熱が支持体に拡散して感度が低下するのを防ぐ効果も有する。
<Undercoat layer>
The planographic printing plate original plate according to the present disclosure preferably has an undercoat layer (sometimes referred to as an intermediate layer) between the image recording layer and the support. The undercoat layer strengthens the adhesion between the support and the image recording layer in the exposed portion, and makes it easy for the image recording layer to peel off from the support in the unexposed portion, so that the developability is not impaired. Contributes to improving. Further, in the case of infrared laser exposure, the undercoat layer functions as a heat insulating layer, so that the heat generated by the exposure is diffused to the support to prevent the sensitivity from being lowered.
 下塗り層に用いられる化合物としては、支持体表面に吸着可能な吸着性基及び親水性基を有するポリマーが挙げられる。画像記録層との密着性を向上させるために吸着性基及び親水性基を有し、更に架橋性基を有するポリマーが好ましい。下塗り層に用いられる化合物は、低分子化合物でもポリマーであってもよい。下塗り層に用いられる化合物は、必要に応じて、2種以上を混合して使用してもよい。 Examples of the compound used for the undercoat layer include polymers having an adsorptive group and a hydrophilic group that can be adsorbed on the surface of the support. A polymer having an adsorptive group and a hydrophilic group and further having a crosslinkable group is preferable in order to improve the adhesion to the image recording layer. The compound used for the undercoat layer may be a low molecular weight compound or a polymer. As the compound used for the undercoat layer, two or more kinds may be mixed and used as needed.
 下塗り層に用いられる化合物がポリマーである場合、吸着性基を有するモノマー、親水性基を有するモノマー及び架橋性基を有するモノマーの共重合体が好ましい。
 支持体表面に吸着可能な吸着性基としては、フェノール性ヒドロキシ基、カルボキシ基、-PO、-OPO、-CONHSO-、-SONHSO-、-COCHCOCHが好ましい。親水性基としては、スルホ基又はその塩、カルボキシ基の塩が好ましい。架橋性基としては、アクリル基、メタクリル基、アクリルアミド基、メタクリルアミド基、アリル基などが好ましい。
 ポリマーは、ポリマーの極性置換基と、上記極性置換基と対荷電を有する置換基及びエチレン性不飽和結合を有する化合物との塩形成で導入された架橋性基を有してもよいし、上記以外のモノマー、好ましくは親水性モノマーが更に共重合されていてもよい。
When the compound used for the undercoat layer is a polymer, a copolymer of a monomer having an adsorptive group, a monomer having a hydrophilic group and a monomer having a crosslinkable group is preferable.
Adsorbent groups that can be adsorbed on the surface of the support include phenolic hydroxy groups, carboxy groups, -PO 3 H 2 , -OPO 3 H 2 , -CONHSO 2- , -SO 2 NHSO 2- , -COCH 2 COCH 3 Is preferable. As the hydrophilic group, a sulfo group or a salt thereof, or a salt of a carboxy group is preferable. As the crosslinkable group, an acrylic group, a methacrylic group, an acrylamide group, a methacrylamide group, an allyl group and the like are preferable.
The polymer may have a crosslinkable group introduced by salt formation of the polar substituent of the polymer, a substituent having a pair charge with the polar substituent and a compound having an ethylenically unsaturated bond, and the above. A monomer other than the above, preferably a hydrophilic monomer, may be further copolymerized.
 具体的には、特開平10-282679号公報に記載されている付加重合可能なエチレン性二重結合反応基を有しているシランカップリング剤、特開平2-304441号公報記載のエチレン性二重結合反応基を有しているリン化合物が好適に挙げられる。特開2005-238816号、特開2005-125749号、特開2006-239867号、特開2006-215263号の各公報に記載の架橋性基(好ましくは、エチレン性不飽和結合基)、支持体表面と相互作用する官能基及び親水性基を有する低分子又は高分子化合物も好ましく用いられる。
 より好ましいものとして、特開2005-125749号公報及び特開2006-188038号公報に記載の支持体表面に吸着可能な吸着性基、親水性基及び架橋性基を有する高分子ポリマーが挙げられる。
Specifically, a silane coupling agent having an addition-polymerizable ethylenic double bond reactive group described in JP-A No. 10-282679, and an ethylenic di-ethylene compound described in JP-A-2-304441. A phosphorus compound having a double bond reactive group is preferably used. Crosslinkable groups (preferably ethylenically unsaturated bonding groups) and supports described in JP-A-2005-238816, JP-A-2005-125479, JP-A-2006-239867, and JP-A-2006-215263. Low molecular weight or high molecular weight compounds having functional and hydrophilic groups that interact with the surface are also preferably used.
More preferable examples thereof include polymer polymers having an adsorptive group, a hydrophilic group and a crosslinkable group that can be adsorbed on the surface of the support described in JP-A-2005-125794 and JP-A-2006-188038.
 下塗り層に用いられるポリマー中のエチレン性不飽和結合基の含有量は、ポリマー1g当たり、好ましくは0.1mmol~10.0mmol、より好ましくは0.2mmol~5.5mmolである。
 下塗り層に用いられるポリマーの重量平均分子量(Mw)は、5,000以上が好ましく、1万~30万がより好ましい。
The content of the ethylenically unsaturated bond group in the polymer used for the undercoat layer is preferably 0.1 mmol to 10.0 mmol, more preferably 0.2 mmol to 5.5 mmol per 1 g of the polymer.
The weight average molecular weight (Mw) of the polymer used in the undercoat layer is preferably 5,000 or more, and more preferably 10,000 to 300,000.
〔親水性化合物〕
 下塗り層は、現像性の観点から、親水性化合物を含むことが好ましい。
 親水性化合物としては、特に制限はなく、下塗り層に用いられる公知の親水性化合物を用いることができる。
 親水性化合物としては、カルボキシメチルセルロース、デキストリン等のアミノ基を有するホスホン酸類、有機ホスホン酸、有機リン酸、有機ホスフィン酸、アミノ酸類、並びに、ヒドロキシ基を有するアミンの塩酸塩等が好ましく挙げられる。
 また、親水性化合物としては、アミノ基又は重合禁止能を有する官能基と支持体表面と相互作用する基とを有する化合物(例えば、1,4-ジアザビシクロ[2.2.2]オクタン(DABCO)、2,3,5,6-テトラヒドロキシ-p-キノン、クロラニル、スルホフタル酸、エチレンジアミン四酢酸(EDTA)又はその塩、ヒドロキシエチルエチレンジアミン三酢酸又はその塩、ジヒドロキシエチルエチレンジアミン二酢酸又はその塩、ヒドロキシエチルイミノ二酢酸又はその塩など)が好ましく挙げられる。
[Hydrophilic compound]
The undercoat layer preferably contains a hydrophilic compound from the viewpoint of developability.
The hydrophilic compound is not particularly limited, and a known hydrophilic compound used for the undercoat layer can be used.
Preferred examples of the hydrophilic compound include phosphonic acids having an amino group such as carboxymethyl cellulose and dextrin, organic phosphonic acid, organic phosphoric acid, organic phosphinic acid, amino acids, and hydrochloride of amine having a hydroxy group.
Further, as the hydrophilic compound, a compound having an amino group or a functional group having a polymerization prohibitive ability and a group interacting with the surface of the support (for example, 1,4-diazabicyclo [2.2.2] octane (DABCO)). , 2,3,5,6-tetrahydroxy-p-quinone, chloranyl, sulfophthalic acid, ethylenediaminetetraacetic acid (EDTA) or its salt, hydroxyethylethylenediaminetriacetic acid or its salt, dihydroxyethylethylenediaminediacetic acid or its salt, hydroxy (Ethyliminodiacetic acid or a salt thereof, etc.) is preferably mentioned.
 親水性化合物としては、傷汚れ抑制性の観点から、ヒドロキシカルボン酸又はその塩を含むことが好ましい。
 また、親水性化合物、好ましくはヒドロキシカルボン酸又はその塩は、傷汚れ抑制性の観点から、上記アルミニウム支持体上の層に含まれることが好ましい。また、上記アルミニウム支持体上の層は、画像記録層が形成されている側の層であることが好ましく、また、上記アルミニウム支持体と接する層であることが好ましい。
 上記アルミニウム支持体上の層としては、上記アルミニウム支持体と接する層として、下塗り層又は画像記録層が好ましく挙げられる。また、上記アルミニウム支持体と接する層以外の層、例えば、保護層又は画像記録層に、親水性化合物、好ましくはヒドロキシカルボン酸又はその塩が含まれていてもよい。
 本開示に係る平版印刷版原版において、画像記録層が、傷汚れ抑制性の観点から、ヒドロキシカルボン酸又はその塩を含むことが好ましい。
 また、本開示に係る平版印刷版原版において、アルミニウム支持体の画像記録層側の表面が、少なくともヒドロキシカルボン酸又はその塩を含む組成物(例えば、水溶液等)により表面処理される態様も好ましく挙げられる。上記態様である場合、処理されたヒドロキシカルボン酸又はその塩は、アルミニウム支持体と接する画像記録層側の層(例えば、画像記録層又は下塗り層)に含まれた状態で少なくとも一部を検出することができる。
 下塗り層等のアルミニウム支持体と接する画像記録層側の層にヒドロキシカルボン酸又はその塩を含むことにより、アルミニウム支持体の画像記録層側の表面を親水化することができ、また、アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角を110°以下と容易にすることができ、傷汚れ抑制性に優れる。
The hydrophilic compound preferably contains hydroxycarboxylic acid or a salt thereof from the viewpoint of suppressing scratches and stains.
Further, the hydrophilic compound, preferably hydroxycarboxylic acid or a salt thereof, is preferably contained in the layer on the aluminum support from the viewpoint of suppressing scratches and stains. Further, the layer on the aluminum support is preferably a layer on the side where the image recording layer is formed, and is preferably a layer in contact with the aluminum support.
As the layer on the aluminum support, an undercoat layer or an image recording layer is preferably mentioned as a layer in contact with the aluminum support. Further, a layer other than the layer in contact with the aluminum support, for example, a protective layer or an image recording layer may contain a hydrophilic compound, preferably hydroxycarboxylic acid or a salt thereof.
In the lithographic printing plate original plate according to the present disclosure, it is preferable that the image recording layer contains hydroxycarboxylic acid or a salt thereof from the viewpoint of suppressing scratches and stains.
Further, in the lithographic printing plate original plate according to the present disclosure, an embodiment in which the surface of the aluminum support on the image recording layer side is surface-treated with a composition containing at least hydroxycarboxylic acid or a salt thereof (for example, an aqueous solution) is also preferably mentioned. Be done. In the above embodiment, at least a part of the treated hydroxycarboxylic acid or a salt thereof is detected in a layer on the image recording layer side (for example, an image recording layer or an undercoat layer) in contact with the aluminum support. be able to.
By containing hydroxycarboxylic acid or a salt thereof in the layer on the image recording layer side in contact with the aluminum support such as the undercoat layer, the surface of the aluminum support on the image recording layer side can be made hydrophilic, and the aluminum support can also be made hydrophilic. The contact angle with water on the surface of the image recording layer side by the aerial water droplet method can be easily set to 110 ° or less, and the scratch stain suppressing property is excellent.
 ヒドロキシカルボン酸とは、1分子中に1個以上のカルボキシ基と1個以上のヒドロキシ基とを有する有機化合物の総称のことであり、ヒドロキシ酸、オキシ酸、オキシカルボン酸、アルコール酸とも呼ばれる(岩波理化学辞典第5版、(株)岩波書店発行(1998)参照)。
 上記ヒドロキシカルボン酸又はその塩は、下記式(HC)で表されるものが好ましい。
  RHC(OH)mhc(COOMHCnhc       式(HC)
 式(HC)中、RHCはmhc+nhc価の有機基を表し、MHCはそれぞれ独立に、水素原子、アルカリ金属又はオニウムを表し、mhc及びnhcはそれぞれ独立に、1以上の整数を表し、nが2以上の場合、MHCは同じでも異なってもよい。
Hydroxycarboxylic acid is a general term for organic compounds having one or more carboxy groups and one or more hydroxy groups in one molecule, and is also called hydroxy acid, oxyic acid, oxycarboxylic acid, or alcoholic acid (). Iwanami Physics and Chemistry Dictionary 5th Edition, published by Iwanami Shoten Co., Ltd. (1998)).
The hydroxycarboxylic acid or a salt thereof is preferably represented by the following formula (HC).
R HC (OH) mhc ( COMM HC ) nhc formula (HC)
In formula (HC), R HC represents a mhc + nhc valent organic group, M HC independently represents a hydrogen atom, an alkali metal or onium, and mhc and nhc each independently represent an integer of 1 or more, n. If is 2 or more, the MHC may be the same or different.
 式(HC)において、RHCで表されるmhc+nhc価の有機基としては、mhc+nhc価の炭化水素基等が挙げられる。炭化水素基は置換基及び/又は連結基を有してもよい。
 炭化水素基としては、脂肪族炭化水素から誘導されるmhc+nhc価の基、例えば、アルキレン基、アルカントリイル基、アルカンテトライル基、アルカンペンタイル基、アルケニレン基、アルケントリイル基、アルケンテトライル基、アルケンペンタイル基、アルキニレン基、アルキントリイル基、アルキンテトライル基、アルキンペンタイル基等、芳香族炭化水素から誘導されるmhc+nhc価の基、例えば、アリーレン基、アレーントリイル基、アレーンテトライル基、アレーンペンタイル基等が挙げられる。ヒドロキシ基及びカルボキシ基以外の置換基としては、アルキル基、アルケニル基、アルキニル基、アラルキル基、アリール基等が挙げられる。置換基の具体例としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、ヘキサデシル基、オクタデシル基、エイコシル基、イソプロピル基、イソブチル基、s-ブチル基、t-ブチル基、イソペンチル基、ネオペンチル基、1-メチルブチル基、イソヘキシル基、2-エチルヘキシル基、2-メチルヘキシル基、シクロヘキシル基、シクロペンチル基、2-ノルボルニル基、メトキシメチル基、メトキシエトキシエチル基、アリルオキシメチル基、フェノキシメチル基、アセチルオキシメチル基、ベンゾイルオキシメチル基、ベンジル基、フェネチル基、α-メチルベンジル基、1-メチル-1-フェニルエチル基、p-メチルベンジル基、シンナミル基、アリル基、1-プロペニルメチル基、2-ブテニル基、2-メチルアリル基、2-メチルプロペニルメチル基、2-プロピニル基、2-ブチニル基、3-ブチニル基、フェニル基、ビフェニル基、ナフチル基、トリル基、キシリル基、メシチル基、クメニル基、メトキシフェニル基、エトキシフェニル基、フェノキシフェニル基、アセトキシフェニル基、ベンゾイロキシフェニル基、メトキシカルボニルフェニル基、エトキシカルボニルフェニル基、フェノキシカルボニルフェニル基等が挙げられる。また、連結基は、水素原子、炭素原子、酸素原子、窒素原子、硫黄原子及びハロゲン原子よりなる群から選ばれる少なくとも1種の原子により構成されるもので、その原子数は好ましくは1~50である。具体的には、アルキレン基、置換アルキレン基、アリーレン基、置換アリーレン基などが挙げられ、これらの2価の基がアミド結合、エーテル結合、ウレタン結合、ウレア結合及びエステル結合のいずれかで複数連結された構造を有していてもよい。
In the formula (HC), as the organic group for mhc + NHC value represented by R HC, it includes mhc + NHC valent hydrocarbon group. The hydrocarbon group may have a substituent and / or a linking group.
As the hydrocarbon group, a group having a mhc + nhc valence derived from an aliphatic hydrocarbon, for example, an alkylene group, an alcantryyl group, an alkanetetrayl group, an alcampentile group, an alkenylene group, an arcentryyl group, an alkentetrayl group. Mhc + nhc valent groups derived from aromatic hydrocarbons such as groups, alkenylpentyl groups, alkynylene groups, alkyntriyl groups, alkynetetrayl groups, alkynpentyl groups, etc., such as allylene groups, allenetriyl groups, allenes. Examples thereof include a tetrayl group and an arenepentile group. Examples of the substituent other than the hydroxy group and the carboxy group include an alkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group and the like. Specific examples of the substituent include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, Octadecyl group, eicosyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, Cyclopentyl group, 2-norbornyl group, methoxymethyl group, methoxyethoxyethyl group, allyloxymethyl group, phenoxymethyl group, acetyloxymethyl group, benzoyloxymethyl group, benzyl group, phenethyl group, α-methylbenzyl group, 1- Methyl-1-phenylethyl group, p-methylbenzyl group, cinnamyl group, allyl group, 1-propenylmethyl group, 2-butenyl group, 2-methylallyl group, 2-methylpropenylmethyl group, 2-propynyl group, 2- Butynyl group, 3-butynyl group, phenyl group, biphenyl group, naphthyl group, trill group, xylyl group, mesityl group, cumenyl group, methoxyphenyl group, ethoxyphenyl group, phenoxyphenyl group, acetoxyphenyl group, benzoyloxyphenyl group , Methoxycarbonylphenyl group, ethoxycarbonylphenyl group, phenoxycarbonylphenyl group and the like. The linking group is composed of at least one atom selected from the group consisting of hydrogen atom, carbon atom, oxygen atom, nitrogen atom, sulfur atom and halogen atom, and the number of atoms is preferably 1 to 50. Is. Specific examples thereof include an alkylene group, a substituted alkylene group, an arylene group and a substituted arylene group, and a plurality of these divalent groups are linked by any of an amide bond, an ether bond, a urethane bond, a urea bond and an ester bond. It may have an esterified structure.
 MHCで表されるアルカリ金属としては、リチウム、ナトリウム、カリウム等が挙げられ、ナトリウムが特に好ましい。オニウムとしてはアンモニウム、ホスホニウム、スルホニウム等が挙げられ、アンモニウムが特に好ましい。
 また、MHCは、傷汚れ抑制性の観点から、アルカリ金属又はオニウムであることが好ましく、アルカリ金属であることがより好ましい。
 mhcとnhcとの総数は、3以上が好ましく、3~8がより好ましく、4~6が更に好ましい。
Examples of the alkali metal represented by MHC include lithium, sodium, potassium and the like, and sodium is particularly preferable. Examples of onium include ammonium, phosphonium, sulfonium and the like, and ammonium is particularly preferable.
Further, M HC, from the viewpoint of scratch stain inhibitory, preferably an alkali metal or an onium, and more preferably an alkali metal.
The total number of mhc and nhc is preferably 3 or more, more preferably 3 to 8, and even more preferably 4 to 6.
 上記ヒドロキシカルボン酸又はその塩は、分子量が600以下であることが好ましく、500以下であることがより好ましく、300以下であることが特に好ましい。また、上記分子量は、76以上であることが好ましい。
 上記ヒドロキシカルボン酸、又は、上記ヒドロキシカルボン酸の塩を構成するヒドロキシカルボン酸は、具体的には、グルコン酸、グリコール酸、乳酸、タルトロン酸、ヒドロキシ酪酸(2-ヒドロキシ酪酸、3-ヒドロキシ酪酸、γ-ヒドロキシ酪酸等)、リンゴ酸、酒石酸、シトラマル酸、クエン酸、イソクエン酸、ロイシン酸、メバロン酸、パントイン酸、リシノール酸、リシネライジン酸、セレブロン酸、キナ酸、シキミ酸、モノヒドロキシ安息香酸誘導体(サリチル酸、クレオソート酸(ホモサリチル酸、ヒドロキシ(メチル)安息香酸)、バニリン酸、シリング酸等)、ジヒドロキシ安息香酸誘導体(ピロカテク酸、レソルシル酸、プロトカテク酸、ゲンチジン酸、オルセリン酸等)、トリヒドロキシ安息香酸誘導体(没食子酸等)、フェニル酢酸誘導体(マンデル酸、ベンジル酸、アトロラクチン酸等)、ヒドロケイヒ酸誘導体(メリロト酸、フロレト酸、クマル酸、ウンベル酸、コーヒー酸、フェルラ酸、シナピン酸、セレブロン酸、カルミン酸等)等が挙げられる。
The hydroxycarboxylic acid or a salt thereof preferably has a molecular weight of 600 or less, more preferably 500 or less, and particularly preferably 300 or less. The molecular weight is preferably 76 or more.
Specific examples of the hydroxycarboxylic acid constituting the hydroxycarboxylic acid or the salt of the hydroxycarboxylic acid include gluconic acid, glycolic acid, lactic acid, tartron acid, and hydroxybutyric acid (2-hydroxybutyric acid, 3-hydroxybutyric acid, γ-Hydroxybutyric acid, etc.), malic acid, tartaric acid, citramal acid, citric acid, isocitrate, leucic acid, mevalonic acid, pantoic acid, ricinolic acid, ricineraidic acid, cerebronic acid, quinic acid, shikimic acid, monohydroxybenzoic acid derivative (Salicylic acid, cleosortic acid (homosalicylic acid, hydroxy (methyl) benzoic acid), vanillic acid, syring acid, etc.), dihydroxybenzoic acid derivatives (pyrocatechuic acid, resorcylic acid, protocatechuic acid, gentidic acid, orceric acid, etc.), trihydroxy Benzoic acid derivatives (such as galvanic acid), phenylacetic acid derivatives (mandelic acid, benzylic acid, atrolactic acid, etc.), hydrosilicic acid derivatives (merilotoic acid, floret acid, kumalic acid, umbelic acid, coffee acid, ferulic acid, cinnapic acid, etc.) Celebronic acid, carmic acid, etc.) and the like.
 これらの中でも、上記ヒドロキシカルボン酸、又は、上記ヒドロキシカルボン酸の塩を構成するヒドロキシカルボン酸としては、傷汚れ抑制性の観点から、ヒドロキシ基を2個以上有している化合物が好ましく、ヒドロキシ基を3個以上有している化合物がより好ましく、ヒドロキシ基を5個以上有している化合物が更に好ましく、ヒドロキシ基を5個~8個有している化合物が特に好ましい。
 また、カルボキシ基を1個、ヒドロキシ基を2個以上有しているものとしては、グルコン酸、又は、シキミ酸が好ましい。
 カルボキシ基を2個以上、ヒドロキシ基を1個有しているものとしては、クエン酸、又は、リンゴ酸が好ましい。
 カルボキシ基及びヒドロキシ基をそれぞれ2個以上有しているものとしては、酒石酸が好ましい。
 中でも、上記ヒドロキシカルボン酸としては、グルコン酸が特に好ましい。
Among these, as the hydroxycarboxylic acid or the hydroxycarboxylic acid constituting the salt of the hydroxycarboxylic acid, a compound having two or more hydroxy groups is preferable from the viewpoint of suppressing scratches and stains, and a hydroxy group is preferable. A compound having 3 or more hydroxy groups is more preferable, a compound having 5 or more hydroxy groups is further preferable, and a compound having 5 to 8 hydroxy groups is particularly preferable.
Further, as a substance having one carboxy group and two or more hydroxy groups, gluconic acid or shikimic acid is preferable.
Citric acid or malic acid is preferable as having two or more carboxy groups and one hydroxy group.
Tartaric acid is preferable as having two or more carboxy groups and two or more hydroxy groups.
Among them, gluconic acid is particularly preferable as the hydroxycarboxylic acid.
 親水性化合物は、1種単独で使用しても、2種以上を併用してもよい。
 下塗り層に親水性化合物、好ましくはヒドロキシカルボン酸又はその塩を含む場合、親水性化合物、好ましくはヒドロキシカルボン酸及びその塩の含有量は、下塗り層の全質量に対し、0.01質量%~50質量%であることが好ましく、0.1質量%~40質量%であることがより好ましく、1.0質量%~30質量%であることが特に好ましい。
The hydrophilic compound may be used alone or in combination of two or more.
When the undercoat layer contains a hydrophilic compound, preferably hydroxycarboxylic acid or a salt thereof, the content of the hydrophilic compound, preferably hydroxycarboxylic acid and its salt is 0.01% by mass or more based on the total mass of the undercoat layer. It is preferably 50% by mass, more preferably 0.1% by mass to 40% by mass, and particularly preferably 1.0% by mass to 30% by mass.
 下塗り層は、上記下塗り層用化合物の他に、経時による汚れ防止のため、キレート剤、第二級又は第三級アミン、重合禁止剤等を含有してもよい。 In addition to the above-mentioned compound for the undercoat layer, the undercoat layer may contain a chelating agent, a secondary or tertiary amine, a polymerization inhibitor, or the like in order to prevent stains over time.
 下塗り層は、公知の方法で塗布される。下塗り層の塗布量(固形分)は、0.1mg/m~100mg/mが好ましく、1mg/m~30mg/mがより好ましい。 The undercoat layer is applied by a known method. The coating amount (solid content) of the undercoat layer is preferably 0.1 mg / m 2 to 100 mg / m 2, and more preferably 1 mg / m 2 to 30 mg / m 2 .
<保護層>
 本開示に係る平版印刷版原版は、画像記録層上に、保護層(オーバーコート層と呼ばれることもある。)を有していてもよい。保護層は酸素遮断により画像形成阻害反応を抑制する機能の他、画像記録層における傷の発生防止及び高照度レーザー露光時のアブレーション防止の機能を有していてもよい。
<Protective layer>
The planographic printing plate original plate according to the present disclosure may have a protective layer (sometimes referred to as an overcoat layer) on the image recording layer. The protective layer may have a function of suppressing an image formation inhibition reaction by blocking oxygen, a function of preventing the occurrence of scratches on the image recording layer, and a function of preventing ablation during high-intensity laser exposure.
 このような特性の保護層については、例えば、米国特許第3,458,311号明細書及び特公昭55-49729号公報に記載されている。保護層に用いられる酸素低透過性のポリマーとしては、水溶性ポリマー、水不溶性ポリマーのいずれをも適宜選択して使用することができ、必要に応じて2種類以上を混合して使用することもできる。具体的には、例えば、ポリビニルアルコール、変性ポリビニルアルコール、ポリビニルピロリドン、水溶性セルロース誘導体、ポリ(メタ)アクリロニトリル等が挙げられる。
 変性ポリビニルアルコールとしてはカルボキシ基又はスルホ基を有する酸変性ポリビニルアルコールが好ましく用いられる。具体的には、特開2005-250216号公報及び特開2006-259137号公報に記載の変性ポリビニルアルコールが挙げられる。
Protective layers with such properties are described, for example, in US Pat. Nos. 3,458,311 and JP-A-55-49729. As the oxygen low-permeability polymer used for the protective layer, either a water-soluble polymer or a water-insoluble polymer can be appropriately selected and used, and if necessary, two or more kinds may be mixed and used. it can. Specific examples thereof include polyvinyl alcohol, modified polyvinyl alcohol, polyvinylpyrrolidone, water-soluble cellulose derivatives, poly (meth) acrylonitrile, and the like.
As the modified polyvinyl alcohol, an acid-modified polyvinyl alcohol having a carboxy group or a sulfo group is preferably used. Specific examples thereof include the modified polyvinyl alcohols described in JP-A-2005-250216 and JP-A-2006-259137.
 保護層は、酸素遮断性を高めるために無機層状化合物を含有することが好ましい。無機層状化合物は、薄い平板状の形状を有する粒子であり、例えば、天然雲母、合成雲母等の雲母群、式:3MgO・4SiO・HOで表されるタルク、テニオライト、モンモリロナイト、サポナイト、ヘクトライト、リン酸ジルコニウム等が挙げられる。
 好ましく用いられる無機層状化合物は雲母化合物である。雲母化合物としては、例えば、式:A(B,C)2-510(OH,F,O)〔ただし、Aは、K、Na、Caのいずれか、B及びCは、Fe(II)、Fe(III)、Mn、Al、Mg、Vのいずれかであり、Dは、Si又はAlである。〕で表される天然雲母、合成雲母等の雲母群が挙げられる。
The protective layer preferably contains an inorganic layered compound in order to enhance oxygen blocking property. Inorganic laminar compound is a particle having a thin tabular shape, for example, natural mica, micas such as synthetic mica, wherein: talc represented by 3MgO · 4SiO · H 2 O, teniolite, montmorillonite, saponite, hectorite Examples include light, zirconium phosphate and the like.
The inorganic layered compound preferably used is a mica compound. Examples of the mica compound include formula: A (B, C) 2-5 D 4 O 10 (OH, F, O) 2 [However, A is any of K, Na, Ca, and B and C are It is any of Fe (II), Fe (III), Mn, Al, Mg, and V, and D is Si or Al. ] Can be mentioned as a group of mica such as natural mica and synthetic mica.
 雲母群においては、天然雲母としては白雲母、ソーダ雲母、金雲母、黒雲母及び鱗雲母が挙げられる。合成雲母としてはフッ素金雲母KMg(AlSi10)F、カリ四ケイ素雲母KMg2.5Si10)F等の非膨潤性雲母、及び、NaテトラシリリックマイカNaMg2.5(Si10)F、Na又はLiテニオライト(Na,Li)MgLi(Si10)F、モンモリロナイト系のNa又はLiヘクトライト(Na,Li)1/8Mg2/5Li1/8(Si10)F等の膨潤性雲母等が挙げられる。更に合成スメクタイトも有用である。 In the mica group, natural mica includes muscovite, paragonite, phlogopite, biotite and lepidolite. As synthetic mica, non-swelling mica such as fluorine gold mica KMg 3 (AlSi 3 O 10 ) F 2 , potassium tetrasilicon mica KMg 2.5 Si 4 O 10 ) F 2 , and Na tetrasilic mica Namg 2. 5 (Si 4 O 10 ) F 2 , Na or Li teniolite (Na, Li) Mg 2 Li (Si 4 O 10 ) F 2 , montmorillonite-based Na or Li hectrite (Na, Li) 1/8 Mg 2 / Examples thereof include swelling mica such as 5 Li 1/8 (Si 4 O 10 ) F 2 . In addition, synthetic smectites are also useful.
 上記の雲母化合物の中でも、フッ素系の膨潤性雲母が特に有用である。すなわち、膨潤性合成雲母は、10Å~15Å(1Å=0.1nm)程度の厚さの単位結晶格子層からなる積層構造を有し、格子内金属原子置換が他の粘土鉱物より著しく大きい。その結果、格子層は正電荷不足を生じ、それを補償するために層間にLi、Na、Ca2+、Mg2+等の陽イオンを吸着している。これらの層間に介在している陽イオンは交換性陽イオンと呼ばれ、いろいろな陽イオンと交換し得る。特に、層間の陽イオンがLi、Naの場合、イオン半径が小さいため層状結晶格子間の結合が弱く、水により大きく膨潤する。その状態でシェアーをかけると容易に劈開し、水中で安定したゾルを形成する。膨潤性合成雲母はこの傾向が強く、特に好ましく用いられる。 Among the above mica compounds, fluorine-based swelling mica is particularly useful. That is, the swellable synthetic mica has a laminated structure composed of a unit crystal lattice layer having a thickness of about 10 Å to 15 Å (1 Å = 0.1 nm), and the metal atom substitution in the lattice is significantly larger than that of other clay minerals. As a result, the lattice layer causes a positive charge shortage, and in order to compensate for this, cations such as Li + , Na + , Ca 2+ , and Mg 2+ are adsorbed between the layers. The cations intervening between these layers are called exchangeable cations and can be exchanged with various cations. In particular, when the cations between layers are Li + and Na + , the bond between the layered crystal lattices is weak because the ionic radius is small, and the cations swell greatly with water. When a share is applied in that state, it easily cleaves and forms a stable sol in water. Swellable synthetic mica has this tendency and is particularly preferably used.
 雲母化合物の形状としては、拡散制御の観点からは、厚さは薄ければ薄いほどよく、平面サイズは塗布面の平滑性や活性光線の透過性を阻害しない限りにおいて大きい程よい。従って、アスペクト比は、好ましくは20以上であり、より好ましくは100以上、特に好ましくは200以上である。アスペクト比は粒子の厚さに対する長径の比であり、例えば、粒子の顕微鏡写真による投影図から測定することができる。アスペクト比が大きい程、得られる効果が大きい。 As for the shape of the mica compound, from the viewpoint of diffusion control, the thinner the thickness, the better, and the plane size is better as long as it does not hinder the smoothness of the coated surface and the transmission of active rays. Therefore, the aspect ratio is preferably 20 or more, more preferably 100 or more, and particularly preferably 200 or more. The aspect ratio is the ratio of the major axis to the thickness of the particles, which can be measured, for example, from a micrograph projection of the particles. The larger the aspect ratio, the greater the effect obtained.
 雲母化合物の粒子径は、その平均長径が、好ましくは0.3μm~20μm、より好ましくは0.5μm~10μm、特に好ましくは1μm~5μmである。粒子の平均の厚さは、好ましくは0.1μm以下、より好ましくは0.05μm以下、特に好ましくは0.01μm以下である。具体的には、例えば、代表的化合物である膨潤性合成雲母の場合、好ましい態様としては、厚さが1nm~50nm程度、面サイズ(長径)が1μm~20μm程度である。 The average major axis of the mica compound is preferably 0.3 μm to 20 μm, more preferably 0.5 μm to 10 μm, and particularly preferably 1 μm to 5 μm. The average thickness of the particles is preferably 0.1 μm or less, more preferably 0.05 μm or less, and particularly preferably 0.01 μm or less. Specifically, for example, in the case of swellable synthetic mica, which is a typical compound, the preferred embodiment is such that the thickness is about 1 nm to 50 nm and the surface size (major axis) is about 1 μm to 20 μm.
 無機層状化合物の含有量は、保護層の全固形分に対して、1質量%~60質量%が好ましく、3質量%~50質量%がより好ましい。複数種の無機層状化合物を併用する場合でも、無機層状化合物の合計量が上記の含有量であることが好ましい。上記範囲で酸素遮断性が向上し、良好な感度が得られる。また、着肉性の低下を防止できる。 The content of the inorganic layered compound is preferably 1% by mass to 60% by mass, more preferably 3% by mass to 50% by mass, based on the total solid content of the protective layer. Even when a plurality of types of inorganic layered compounds are used in combination, the total amount of the inorganic layered compounds is preferably the above content. Oxygen blocking property is improved in the above range, and good sensitivity can be obtained. In addition, it is possible to prevent deterioration of meat-forming property.
-変色性化合物-
 また、上記保護層は、変色性化合物を含むことが好ましい。
 上記保護層は、変色性化合物以外に、水溶性ポリマー、疎水性ポリマー、感脂化剤、酸発生剤、赤外線吸収剤等の他の成分を含んでいてもよい。
-Discoloring compound-
Further, the protective layer preferably contains a discoloring compound.
In addition to the discoloring compound, the protective layer may contain other components such as a water-soluble polymer, a hydrophobic polymer, a fat-sensing agent, an acid generator, and an infrared absorber.
 本開示に係る平版印刷版原版は、露光部の視認性を高める観点から、エネルギー密度110mJ/cmにて波長830nmの赤外線による露光を行った場合の、露光前後の明度変化ΔLが、2.0以上であることが好ましい。
 上記明度変化ΔLは、3.0以上であることがより好ましく、5.0以上であることが更に好ましく、8.0以上であることが特に好ましく、10.0以上であることが最も好ましい。
 明度変化ΔLの上限としては、例えば、20.0が挙げられる。
 また、特に、変色性化合物を含む保護層を有する場合、上記明度変化ΔLの上記好ましい数値範囲を満たすことが好ましい。
From the viewpoint of enhancing the visibility of the exposed portion, the lithographic printing plate original plate according to the present disclosure has a brightness change ΔL before and after exposure when exposed to infrared rays having an energy density of 110 mJ / cm 2 and a wavelength of 830 nm. It is preferably 0 or more.
The brightness change ΔL is more preferably 3.0 or more, further preferably 5.0 or more, particularly preferably 8.0 or more, and most preferably 10.0 or more.
An upper limit of the brightness change ΔL is, for example, 20.0.
Further, in particular, when a protective layer containing a discoloring compound is provided, it is preferable to satisfy the above-mentioned preferable numerical range of the above-mentioned brightness change ΔL.
 明度変化ΔLの測定は、以下の方法により行う。
 平版印刷版原版を、波長830nmの赤外線半導体レーザー搭載の富士フイルム グラフィックシステムズ(株)製Luxel PLATESETTER T-9800により、出力99.5%、外面ドラム回転数220rpm、解像度2,400dpi(dots per inch、1inch=25.4mm)の条件(エネルギー密度110mJ/cm)で露光する。露光は25℃、50%RHの環境下で行う。
 露光前後の平版印刷版原版の明度変化を測定する。
 測定には、X-Rite社製分光測色計eXactを用いる。L表色系のL値(明度)を用い、露光後の画像記録層のL値と露光前の画像記録層のL値との差の絶対値を明度変化ΔLとする。
The brightness change ΔL is measured by the following method.
The original plate of the lithographic printing plate is printed by Luxel PLATESETTER T-9800 manufactured by FUJIFILM Graphic Systems Co., Ltd. equipped with an infrared semiconductor laser with a wavelength of 830 nm. Output 99.5%, outer drum rotation speed 220 rpm, resolution 2,400 dpi (dots per inch, Exposure is performed under the condition of 1 inch = 25.4 mm) (energy density 110 mJ / cm 2 ). The exposure is performed in an environment of 25 ° C. and 50% RH.
Measure the change in brightness of the lithographic printing plate original before and after exposure.
A spectrophotometer eXact manufactured by X-Rite is used for the measurement. Using the L * a * b * color system L * value (brightness), the absolute value of the difference between the L * value of the image recording layer after exposure and the L * value of the image recording layer before exposure is changed by the brightness change ΔL. And.
 本開示において「変色性化合物」とは、赤外線露光に起因して、可視光領域(波長:400nm以上750nm未満)の吸収が変化する化合物をいう。つまり、本開示において「変色」とは、赤外線露光に起因して、可視光領域(波長:400nm以上750nm未満)の吸収が変化することをいう。
 具体的には、本開示における変色性化合物は、(1)赤外線露光に起因して赤外線露光前より可視光領域の吸収が増加する化合物、(2)赤外線露光に起因して可視光領域の吸収を有するようになる化合物、(3)赤外線露光に起因して可視光領域に吸収を有しないようになる化合物が挙げられる。
 なお、本開示における赤外線は、750nm~1mmの波長の光線であり、750nm~1,400nmの波長の光線であることが好ましい。
In the present disclosure, the "discolorable compound" refers to a compound whose absorption in the visible light region (wavelength: 400 nm or more and less than 750 nm) changes due to infrared exposure. That is, in the present disclosure, "discoloration" means that the absorption in the visible light region (wavelength: 400 nm or more and less than 750 nm) changes due to infrared exposure.
Specifically, the discoloring compounds in the present disclosure are (1) a compound in which absorption in the visible light region is increased due to infrared exposure compared to before infrared exposure, and (2) absorption in the visible light region due to infrared exposure. (3) Compounds that do not have absorption in the visible light region due to infrared exposure can be mentioned.
The infrared rays in the present disclosure are light rays having a wavelength of 750 nm to 1 mm, and preferably light rays having a wavelength of 750 nm to 1,400 nm.
 変色性化合物としては、赤外線露光に起因して発色する化合物を含むことが好ましい。
 また、変色性化合物としては、赤外線露光に起因して分解する分解性化合物を含むことが好ましく、中でも、赤外線露光に起因する、熱、電子移動、又はその両方により分解する分解性化合物を含むことが好ましい。
 より具体的に言えば、本開示における変色性化合物は、赤外線露光に起因して分解し(より好ましくは、赤外線露光に起因する、熱、電子移動、又はその両方により分解し)、赤外線露光前に比べて、可視光領域における吸収が増加するか、又は、吸収が短波長化し可視光領域に吸収を有するようになる化合物であることが好ましい。
 ここで、「電子移動により分解する」とは、赤外線露光によって変色性化合物のHOMO(最高被占軌道)からLUMO(最低空軌道)に励起した電子が、分子内の電子受容基(LUMOと電位が近い基)に分子内電子移動し、それに伴って分解が生じることを意味する。
The discoloring compound preferably contains a compound that develops color due to infrared exposure.
Further, the discoloring compound preferably contains a decomposable compound that decomposes due to infrared exposure, and in particular, contains a decomposable compound that decomposes due to heat, electron transfer, or both due to infrared exposure. Is preferable.
More specifically, the discoloring compounds in the present disclosure are decomposed by infrared exposure (more preferably, by heat, electron transfer, or both due to infrared exposure) and before infrared exposure. It is preferable that the compound has increased absorption in the visible light region, or the absorption has a shorter wavelength and has absorption in the visible light region.
Here, "decomposition by electron transfer" means that an electron excited from HOMO (highest occupied orbital) to LUMO (lowest empty orbital) of a discoloring compound by infrared exposure is an electron accepting group (LUMO and potential) in the molecule. It means that the electron transfers in the molecule to a group close to), and the decomposition occurs accordingly.
 以下、変色性化合物の一例である分解性化合物について説明する。
 分解性化合物は、赤外線波長域(750nm~1mmの波長域、好ましくは750nm~1,400nmの波長域)の少なくとも1部の光を吸収し、分解するものであればよいが、750nm~1,400nmの波長域に極大吸収を有する化合物であることが好ましい。
 より具体的には、分解性化合物は、赤外線露光に起因して分解し、500nm~600nmの波長域に極大吸収波長を有する化合物を生成する化合物であることが好ましい。
Hereinafter, a degradable compound, which is an example of a discolorable compound, will be described.
The degradable compound may be a compound that absorbs and decomposes at least one part of light in the infrared wavelength range (wavelength range of 750 nm to 1 mm, preferably wavelength range of 750 nm to 1,400 nm), but may be 750 nm to 1, It is preferably a compound having maximum absorption in the wavelength range of 400 nm.
More specifically, the degradable compound is preferably a compound that decomposes due to infrared exposure to produce a compound having a maximum absorption wavelength in the wavelength range of 500 nm to 600 nm.
 分解性化合物は、露光部の視認性を高める観点から、赤外線露光により分解する基(具体的には、下式1-1~式1-7におけるR)を有する、シアニン色素であることが好ましい。
 分解性化合物としては、露光部の視認性を高める観点から、下記式1-1で表される化合物であることがより好ましい。
The degradable compound may be a cyanine dye having a group (specifically, R 1 in the following formulas 1-1 to 1-7) that is decomposed by infrared exposure from the viewpoint of enhancing the visibility of the exposed portion. preferable.
The degradable compound is more preferably a compound represented by the following formula 1-1 from the viewpoint of enhancing the visibility of the exposed portion.
Figure JPOXMLDOC01-appb-C000070
Figure JPOXMLDOC01-appb-C000070
 式1-1中、Rは下記式2~式4のいずれかで表される基を表し、R11~R18はそれぞれ独立に、水素原子、ハロゲン原子、-R、-OR、-SR、又は、-NRを表し、R~Rはそれぞれ独立に、炭化水素基を表し、A、A及び複数のR11~R18が連結して単環又は多環を形成してもよく、A及びAはそれぞれ独立に、酸素原子、硫黄原子、又は、窒素原子を表し、n11及びn12はそれぞれ独立に、0~5の整数を表し、但し、n11及びn12の合計は2以上であり、n13及びn14はそれぞれ独立に、0又は1を表し、Lは、酸素原子、硫黄原子、又は、-NR10-を表し、R10は、水素原子、アルキル基、又は、アリール基を表し、Zaは電荷を中和する対イオンを表す。 In formula 1-1, R 1 represents a group represented by any of the following formulas 2 to 4, and R 11 to R 18 independently represent a hydrogen atom, a halogen atom, -R a , -OR b , and so on. -SR c, or represents -NR d R e, in each of R a ~ R e independently represents a hydrocarbon group, a 1, a 2 and a plurality of R 11 ~ R 18 are linked monocyclic or Polycycles may be formed, where A 1 and A 2 independently represent an oxygen atom, a sulfur atom, or a nitrogen atom, and n 11 and n 12 each independently represent an integer of 0 to 5. However, the total of n 11 and n 12 is 2 or more, n 13 and n 14 independently represent 0 or 1, L represents an oxygen atom, a sulfur atom, or -NR 10- , and R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and Za represents a counterion that neutralizes the charge.
Figure JPOXMLDOC01-appb-C000071
Figure JPOXMLDOC01-appb-C000071
 式2~式4中、R20、R30、R41及びR42はそれぞれ独立に、アルキル基又はアリール基を表し、Zbは電荷を中和する対イオンを表し、波線は、前記式1-1中のLで表される基との結合部位を表す。 In formulas 2 to 4, R 20 , R 30 , R 41 and R 42 independently represent an alkyl group or an aryl group, Zb represents a charge-neutralizing counterion, and the wavy line represents the above formula 1-. Represents a binding site with a group represented by L in 1.
 式1-1で表される化合物は、赤外線で露光されると、R-L結合が開裂し、Lは、=O、=S、又は=NR10となって、変色する。 Compounds of the formula 1-1, when exposed with infrared, R 1 -L bond is cleaved, L is, = O, = S, or = become NR 10, changes color.
 式1-1において、Rは上記式2~式4のいずれかで表される基を表す。
 以下、式2で表される基、式3で表される基、及び式4で表される基についてそれぞれ説明する。
In formula 1-1, R 1 represents a group represented by any of the above formulas 2 to 4.
Hereinafter, the group represented by the formula 2, the group represented by the formula 3, and the group represented by the formula 4 will be described.
 式2中、R20は、アルキル基又はアリール基を表し、波線部分は、式1-1中のLで表される基との結合部位を表す。
 R20で表されるアルキル基としては、炭素数1~30のアルキル基が好ましく、炭素数1~15のアルキル基がより好ましく、炭素数1~10のアルキル基が更に好ましい。
 上記アルキル基は、直鎖状であっても、分岐を有していても、環構造を有していてもよい。
 R20で表されるアリール基としては、炭素数6~30のアリール基が好ましく、炭素数6~20のアリール基がより好ましく、炭素数6~12のアリール基が更に好ましい。
 R20としては、発色性の観点から、アルキル基であることが好ましい。
In formula 2, R 20 represents an alkyl group or an aryl group, and the wavy line portion represents a binding site with a group represented by L in formula 1-1.
As the alkyl group represented by R 20 , an alkyl group having 1 to 30 carbon atoms is preferable, an alkyl group having 1 to 15 carbon atoms is more preferable, and an alkyl group having 1 to 10 carbon atoms is further preferable.
The alkyl group may be linear, have a branch, or have a ring structure.
As the aryl group represented by R 20 , an aryl group having 6 to 30 carbon atoms is preferable, an aryl group having 6 to 20 carbon atoms is more preferable, and an aryl group having 6 to 12 carbon atoms is further preferable.
The R 20 is preferably an alkyl group from the viewpoint of color development.
 また、分解性、及び、発色性の観点から、R20で表されるアルキル基としては、第二級アルキル基又は第三級アルキル基であることが好ましく、第三級アルキル基であることが好ましい。
 更に、分解性、及び、発色性の観点から、R20で表されるアルキル基としては、炭素数1~8のアルキル基であることが好ましく、炭素数3~10の分岐状のアルキル基であることがより好ましく、炭素数3~6の分岐状のアルキル基であることが更に好ましく、イソプロピル基、又はtert-ブチル基が特に好ましく、tert-ブチル基が最も好ましい。
Moreover, degradable, and, from the viewpoint of coloring properties, be the alkyl group represented by R 20, is preferably a secondary alkyl group or a tertiary alkyl group, tertiary alkyl group preferable.
Moreover, the degradability, and, from the viewpoint of coloring properties, the alkyl group represented by R 20, preferably an alkyl group having 1 to 8 carbon atoms, branched alkyl groups having 3 to 10 carbon atoms It is more preferable to have a branched alkyl group having 3 to 6 carbon atoms, an isopropyl group or a tert-butyl group is particularly preferable, and a tert-butyl group is most preferable.
 以下に、上記式2で表される基の具体例を挙げるが、本開示はこれらに限定されるものではない。下記構造式中、●は式1-1中のLで表される基との結合部位を表す。 Specific examples of the groups represented by the above formula 2 are given below, but the present disclosure is not limited thereto. In the following structural formula, ● represents the binding site with the group represented by L in the formula 1-1.
Figure JPOXMLDOC01-appb-C000072
Figure JPOXMLDOC01-appb-C000072
 式3中、R30は、アルキル基又はアリール基を表し、波線部分は、式1-1中のLで表される基との結合部位を表す。
 R30で表されるアルキル基及びアリール基としては、式2中のR20で表されるアルキル基及びアリール基と同様であり、好ましい態様も同様である。
In formula 3, R 30 represents an alkyl group or an aryl group, and the wavy line portion represents a binding site with a group represented by L in formula 1-1.
The alkyl group and aryl group represented by R 30 are the same as those of the alkyl group and aryl group represented by R 20 in Formula 2, and the preferred embodiment is also the same.
 分解性、及び、発色性の観点から、R30で表されるアルキル基としては、第二級アルキル基又は第三級アルキル基であることが好ましく、第三級アルキル基であることが好ましい。
 また、分解性、及び、発色性の観点から、R30で表されるアルキル基としては、炭素数1~8のアルキル基であることが好ましく、炭素数3~10の分岐状のアルキル基であることがより好ましく、炭素数3~6の分岐状のアルキル基であることが更に好ましく、イソプロピル基、又はtert-ブチル基が特に好ましく、tert-ブチル基が最も好ましい。
 更に、分解性、及び、発色性の観点から、R30で表されるアルキル基は、置換アルキル基であることが好ましく、フルオロ置換アルキル基であることがより好ましく、パーフルオロアルキル基であることが更に好ましく、トリフルオロメチル基であることが特に好ましい。
From the viewpoint of degradability and color development, the alkyl group represented by R 30 is preferably a secondary alkyl group or a tertiary alkyl group, and preferably a tertiary alkyl group.
Moreover, degradable, and, from the viewpoint of coloring properties, the alkyl group represented by R 30, preferably an alkyl group having 1 to 8 carbon atoms, branched alkyl groups having 3 to 10 carbon atoms It is more preferable to have a branched alkyl group having 3 to 6 carbon atoms, an isopropyl group or a tert-butyl group is particularly preferable, and a tert-butyl group is most preferable.
Further, from the viewpoint of degradability and color development, the alkyl group represented by R 30 is preferably a substituted alkyl group, more preferably a fluorosubstituted alkyl group, and a perfluoroalkyl group. Is more preferable, and a trifluoromethyl group is particularly preferable.
 分解性、及び、発色性の観点から、R30で表されるアリール基は置換アリール基であることが好ましく、置換基としては、アルキル基(好ましくは炭素数1~4のアルキル基)、アルコキシ基(好ましくは炭素数1~4のアルコキシ基)等が挙げられる。 From the viewpoint of degradability and color development, the aryl group represented by R 30 is preferably a substituted aryl group, and the substituent is an alkyl group (preferably an alkyl group having 1 to 4 carbon atoms) or an alkoxy. Examples thereof include a group (preferably an alkoxy group having 1 to 4 carbon atoms).
 以下に、上記式3で表される基の具体例を挙げるが、本開示はこれらに限定されるものではない。下記構造式中、●は式1-1中のLで表される基との結合部位を表す。 Specific examples of the groups represented by the above formula 3 are given below, but the present disclosure is not limited thereto. In the following structural formula, ● represents the binding site with the group represented by L in the formula 1-1.
Figure JPOXMLDOC01-appb-C000073
Figure JPOXMLDOC01-appb-C000073
 式4中、R41及びR42はそれぞれ独立に、アルキル基又はアリール基を表し、Zbは電荷を中和する対イオンを表し、波線部分は、式1-1中のLで表される基との結合部位を表す。
 R41又はR42で表されるアルキル基及びアリール基としては、式2中のR20で表されるアルキル基及びアリール基と同様であり、好ましい態様も同様である。
 R41としては、分解性、及び、発色性の観点から、アルキル基であることが好ましい。
 R42としては、分解性、及び、発色性の観点から、アルキル基であることが好ましい。
In Formula 4, R 41 and R 42 independently represent an alkyl group or an aryl group, Zb represents a charge-neutralizing counterion, and the wavy line portion is a group represented by L in Formula 1-1. Represents the binding site with.
The alkyl group and aryl group represented by R 41 or R 42 are the same as those of the alkyl group and aryl group represented by R 20 in Formula 2, and the preferred embodiment is also the same.
The R 41 is preferably an alkyl group from the viewpoint of decomposability and color development.
R 42 is preferably an alkyl group from the viewpoint of decomposability and color development.
 分解性、及び、発色性の観点から、R41で表されるアルキル基としては、炭素数1~8のアルキル基であることが好ましく、炭素数1~4のアルキル基であることがより好ましく、メチル基が特に好ましい。
 分解性、及び、発色性の観点から、R42で表されるアルキル基としては、第二級アルキル基又は第三級アルキル基であることが好ましく、第三級アルキル基であることが好ましい。
 また、分解性、及び、発色性の観点から、R42で表されるアルキル基としては、炭素数1~8のアルキル基であることが好ましく、炭素数3~10の分岐状のアルキル基であることがより好ましく、炭素数3~6の分岐状のアルキル基であることが更に好ましく、イソプロピル基、又は、tert-ブチル基が特に好ましく、tert-ブチル基が最も好ましい。
From the viewpoint of decomposability and color development, the alkyl group represented by R 41 is preferably an alkyl group having 1 to 8 carbon atoms, and more preferably an alkyl group having 1 to 4 carbon atoms. , Methyl group is particularly preferred.
From the viewpoint of degradability and color development, the alkyl group represented by R 42 is preferably a secondary alkyl group or a tertiary alkyl group, and preferably a tertiary alkyl group.
Further, from the viewpoint of decomposability and color development, the alkyl group represented by R 42 is preferably an alkyl group having 1 to 8 carbon atoms, and is a branched alkyl group having 3 to 10 carbon atoms. It is more preferable to have a branched alkyl group having 3 to 6 carbon atoms, an isopropyl group or a tert-butyl group is particularly preferable, and a tert-butyl group is most preferable.
 式4におけるZbは、電荷を中和するための対イオンであればよく、化合物全体として、式1-1におけるZaに含まれてもよい。
 Zbは、スルホネートイオン、カルボキシレートイオン、テトラフルオロボレートイオン、ヘキサフルオロホスフェートイオン、p-トルエンスルホネートイオン、又は過塩素酸塩イオンが好ましく、テトラフルオロボレートイオンがより好ましい。
Zb in the formula 4 may be a counterion for neutralizing the charge, and the compound as a whole may be contained in Za in the formula 1-1.
Zb is preferably a sulfonate ion, a carboxylate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, a p-toluenesulfonate ion, or a perchlorate ion, and more preferably a tetrafluoroborate ion.
 以下に、上記式4で表される基の具体例を挙げるが、本開示はこれらに限定されるものではない。下記構造式中、●は式1-1中のLで表される基との結合部位を表す。 Specific examples of the groups represented by the above formula 4 are given below, but the present disclosure is not limited thereto. In the following structural formula, ● represents the binding site with the group represented by L in the formula 1-1.
Figure JPOXMLDOC01-appb-C000074
Figure JPOXMLDOC01-appb-C000074
 式1-1において、Lは、酸素原子、又は-NR10-が好ましく、酸素原子が特に好ましい。
 また、-NR10-におけるR10は、アルキル基が好ましい。R10で表されるアルキル基としては、炭素数1~10のアルキル基が好ましい。また、R10で表されるアルキル基は、直鎖状であっても、分岐を有していても、環構造を有していてもよい。
 アルキル基の中では、メチル基又はシクロヘキシル基が好ましい。
 -NR10-におけるR10がアリール基の場合、炭素数6~30のアリール基が好ましく、炭素数6~20のアリール基がより好ましく、炭素数6~12のアリール基が更に好ましい。また、これらアリール基は、置換基を有していてもよい。
In the formula 1-1, L is preferably an oxygen atom or −NR 10 −, and an oxygen atom is particularly preferable.
Further, R 10 in −NR 10− is preferably an alkyl group. As the alkyl group represented by R 10 , an alkyl group having 1 to 10 carbon atoms is preferable. Further, the alkyl group represented by R 10 may be linear, have a branch, or have a ring structure.
Among the alkyl groups, a methyl group or a cyclohexyl group is preferable.
When R 10 in −NR 10 − is an aryl group, an aryl group having 6 to 30 carbon atoms is preferable, an aryl group having 6 to 20 carbon atoms is more preferable, and an aryl group having 6 to 12 carbon atoms is further preferable. Moreover, these aryl groups may have a substituent.
 式1-1において、R11~R18は、それぞれ独立に、水素原子、-R、-OR、-SR、又は-NRであることが好ましい。
 R~Rで表される炭化水素基は、炭素数1~30の炭化水素基が好ましく、炭素数1~15の炭化水素基がより好ましく、炭素数1~10の炭化水素基が更に好ましい。
 上記炭化水素基は、直鎖状であっても、分岐を有していても、環構造を有していてもよい。
 上記炭化水素基としては、アルキル基が特に好ましい。
In Formula 1-1, R 11 ~ R 18 are each independently a hydrogen atom, -R a, is preferably -OR b, -SR c, or -NR d R e.
Hydrocarbon groups represented by R a ~ R e is preferably a hydrocarbon group having 1 to 30 carbon atoms, more preferably a hydrocarbon group having 1 to 15 carbon atoms, further a hydrocarbon group having 1 to 10 carbon atoms preferable.
The hydrocarbon group may be linear, have a branch, or have a ring structure.
As the hydrocarbon group, an alkyl group is particularly preferable.
 上記アルキル基としては、炭素数1~30のアルキル基が好ましく、炭素数1~15のアルキル基がより好ましく、炭素数1~10のアルキル基が更に好ましい。
 上記アルキル基は、直鎖状であっても、分岐を有していても、環構造を有していてもよい。
 具体的には、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、ヘキサデシル基、オクタデシル基、エイコシル基、イソプロピル基、イソブチル基、s-ブチル基、tert-ブチル基、イソペンチル基、ネオペンチル基、1-メチルブチル基、イソヘキシル基、2-エチルヘキシル基、2-メチルヘキシル基、シクロヘキシル基、シクロペンチル基、及び、2-ノルボルニル基が挙げられる。
 アルキル基の中で、メチル基、エチル基、プロピル基又はブチル基が好ましい。
As the alkyl group, an alkyl group having 1 to 30 carbon atoms is preferable, an alkyl group having 1 to 15 carbon atoms is more preferable, and an alkyl group having 1 to 10 carbon atoms is further preferable.
The alkyl group may be linear, have a branch, or have a ring structure.
Specifically, for example, methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group. Group, eicosyl group, isopropyl group, isobutyl group, s-butyl group, tert-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group. Examples thereof include a group and a 2-norbornyl group.
Among the alkyl groups, a methyl group, an ethyl group, a propyl group or a butyl group is preferable.
 上記アルキル基は、置換基を有していてもよい。
 置換基の例としては、アルコキシ基、アリーロキシ基、アミノ基、アルキルチオ基、アリールチオ基、ハロゲン原子、カルボキシ基、カルボキシレート基、スルホ基、スルホネート基、アルキルオキシカルボニル基、アリールオキシカルボニル基、及びこれらを組み合わせた基等が挙げられる。
The alkyl group may have a substituent.
Examples of substituents include an alkoxy group, an aryloxy group, an amino group, an alkylthio group, an arylthio group, a halogen atom, a carboxy group, a carboxylate group, a sulfo group, a sulfonate group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and these. Examples include a group in which the above are combined.
 式1-1におけるR11~R14はそれぞれ独立に、水素原子、又は、-R(即ち炭化水素基)であることが好ましく、水素原子、又は、アルキル基であることがより好ましく、以下の場合を除き、水素原子であることが更に好ましい。
 中でも、Lが結合する炭素原子と結合する炭素原子に結合するR11及びR13は、アルキル基が好ましく、両者が連結して環を形成することがより好ましい。上記形成される環としては、単環であってもよく、多環であってもよい。形成される環として、具体的には、シクロペンテン環、シクロペンタジエン環、シクロヘキセン環、シクロヘキサジエン環等の単環、及び、インデン環、インドール環等の多環が挙げられる。
 また、A が結合する炭素原子に結合するR12はR15又はR16(好ましくはR16)と連結して環を形成することが好ましく、Aが結合する炭素原子に結合するR14はR17又はR18(好ましくはR18)と連結して環を形成することが好ましい。
R 11 to R 14 in the formula 1-1 are each independently preferably a hydrogen atom or —R a (that is, a hydrocarbon group), more preferably a hydrogen atom or an alkyl group, and the following Except for the case of, it is more preferably a hydrogen atom.
Among them, R 11 and R 13 bonded to the carbon atom to which L is bonded are preferably an alkyl group, and it is more preferable that both are linked to form a ring. The ring formed may be a monocyclic ring or a polycyclic ring. Specific examples of the ring formed include a monocycle such as a cyclopentene ring, a cyclopentadiene ring, a cyclohexene ring and a cyclohexadiene ring, and a polycycle such as an indene ring and an indole ring.
Further, R 12 bonded to the carbon atom to which A 1 + is bonded preferably is linked to R 15 or R 16 (preferably R 16 ) to form a ring, and R is bonded to the carbon atom to which A 2 is bonded. 14 is preferably linked to R 17 or R 18 (preferably R 18 ) to form a ring.
 式1-1において、n13は1であり、R16は、-R(即ち炭化水素基)であることが好ましい。
 また、R16は、A が結合する炭素原子に結合するR12と連結して環を形成することが好ましい。形成される環としては、インドリウム環、ピリリウム環、チオピリリウム環、ベンゾオキサゾリン環、又はベンゾイミダゾリン環が好ましく、露光部の視認性を高める観点から、インドリウム環がより好ましい。これらの環は更に置換基を有していてもよい。
 式1-1において、n14は1であり、R18は、-R(即ち炭化水素基)であることが好ましい。
 また、R18は、Aが結合する炭素原子に結合するR14と連結して環を形成することが好ましい。形成される環としては、インドール環、ピラン環、チオピラン環、ベンゾオキサゾール環、又はベンゾイミダゾール環が好ましく、露光部の視認性を高める観点から、インドール環がより好ましい。これらの環は更に置換基を有していてもよい。
 式1-1におけるR16及びR18は同一の基であることが好ましく、それぞれが環を形成する場合、A 及びAを除き、同一の構造の環を形成することが好ましい。
In formula 1-1, n 13 is preferably 1 and R 16 is preferably —R a (ie, a hydrocarbon group).
Further, it is preferable that R 16 is linked to R 12 bonded to the carbon atom to which A 1 + is bonded to form a ring. As the ring to be formed, an indolium ring, a pyrylium ring, a thiopyrylium ring, a benzoxazoline ring, or a benzoimidazoline ring is preferable, and an indolium ring is more preferable from the viewpoint of enhancing the visibility of the exposed portion. These rings may further have a substituent.
In formula 1-1, n 14 is preferably 1 and R 18 is preferably —R a (ie, a hydrocarbon group).
Further, it is preferable that R 18 is linked to R 14 bonded to the carbon atom to which A 2 is bonded to form a ring. As the ring to be formed, an indole ring, a pyran ring, a thiopyran ring, a benzoxazole ring, or a benzimidazole ring is preferable, and an indole ring is more preferable from the viewpoint of enhancing the visibility of the exposed portion. These rings may further have a substituent.
R 16 and R 18 in the formula 1-1 are preferably the same group, and when they form a ring, it is preferable to form a ring having the same structure except for A 1 + and A 2 .
 式1-1におけるR15及びR17は同一の基であることが好ましい。また、R15及びR17は、-R(即ち炭化水素基)であることが好ましく、アルキル基であることがより好ましく、置換アルキル基であることが更に好ましい。 It is preferable that R 15 and R 17 in the formula 1-1 are the same group. Further, R 15 and R 17 are preferably —R a (that is, a hydrocarbon group), more preferably an alkyl group, and further preferably a substituted alkyl group.
 式1-1により表される化合物において、水溶性を向上させる観点からは、R15及びR17は置換基アルキル基であることが好ましい。
 R15又はR17で表される置換アルキル基としては、下記式(a1)~式(a4)のいずれかで表される基が挙げられる。
In the compound represented by the formula 1-1, R 15 and R 17 are preferably substituent alkyl groups from the viewpoint of improving water solubility.
Examples of the substituted alkyl group represented by R 15 or R 17 include a group represented by any of the following formulas (a1) to (a4).
Figure JPOXMLDOC01-appb-C000075
Figure JPOXMLDOC01-appb-C000075
 式(a1)~式(a4)中、RW0は炭素数2~6のアルキレン基を表し、Wは単結合又は酸素原子を表し、nW1は1~45の整数を表し、RW1は炭素数1~12のアルキル基又は-C(=O)-RW5を表し、RW5は炭素数1~12のアルキル基を表し、RW2~RW4はそれぞれ独立に、単結合又は炭素数1~12のアルキレン基を表し、Mは水素原子、ナトリウム原子、カリウム原子、又は、オニウム基を表す。 Wherein (a1) ~ formula (a4), R W0 represents an alkylene group having 2 to 6 carbon atoms, W is a single bond or an oxygen atom, n W1 represents an integer of 1 ~ 45, R W1 carbon represents an alkyl group or -C (= O) -R W5 having 1 to 12, R W5 represents an alkyl group having 1 to 12 carbon atoms, R W2 ~ R W4 are each independently a single bond or 1 carbon atoms It represents an alkylene group of ~ 12, and M represents a hydrogen atom, a sodium atom, a potassium atom, or an onium group.
 式(a1)において、RW0で表されるアルキレン基の具体例としては、エチレン基、n-プロピレン基、イソプロピレン基、n-ブチレン基、イソブチレン基、n-ペンチレン基、イソペンチレン基、n-ヘキシル基、イソヘキシル基等が挙げられ、エチレン基、n-プロピレン基、イソプロピレン基、又はn-ブチレン基が好ましく、n-プロピレン基が特に好ましい。
 nW1は1~10が好ましく、1~5がより好ましく、1~3が特に好ましい。
 RW1で表されるアルキル基の具体例としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、tert-ブチル基、n-ペンチル基、イソペンチル基、ネオペンチル基、n-ヘキシル基、n-オクチル基、n-ドデシル基等が挙げられ、メチル基、エチル基、n-プロピル基、イソプロピル基、又はn-ブチル基、tert-ブチル基が好ましく、メチル基、又はエチル基が更に好ましく、メチル基が特に好ましい。
 RW5で表されるアルキル基は、RW1で表されるアルキル基と同様であり、好ましい態様もRW1で表されるアルキル基の好ましい態様と同様である。
Specific examples of the alkylene group represented by RW0 in the formula (a1) include an ethylene group, an n-propylene group, an isopropylene group, an n-butylene group, an isobutylene group, an n-pentylene group, an isopentylene group, and n-. Examples thereof include a hexyl group and an isohexyl group, and an ethylene group, an n-propylene group, an isopropylene group, or an n-butylene group is preferable, and an n-propylene group is particularly preferable.
n W1 is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 to 3.
Specific examples of the alkyl group represented by RW1 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, n-pentyl group, isopentyl group and neopentyl. A group, an n-hexyl group, an n-octyl group, an n-dodecyl group and the like can be mentioned, and a methyl group, an ethyl group, an n-propyl group, an isopropyl group, or an n-butyl group and a tert-butyl group are preferable. , Or an ethyl group is more preferable, and a methyl group is particularly preferable.
Alkyl group represented by R W5 is the same as defined for the alkyl group represented by R W1, preferred embodiments are also the same as the preferred embodiment of the alkyl group represented by R W1.
 式(a1)で表される基の具体例を以下に示すが、本開示はこれらに限定されるものではない。下記構造式中、Meはメチル基、Etはエチル基を表し、*は結合部位を表す。 Specific examples of the groups represented by the formula (a1) are shown below, but the present disclosure is not limited thereto. In the following structural formula, Me represents a methyl group, Et represents an ethyl group, and * represents a binding site.
Figure JPOXMLDOC01-appb-C000076
Figure JPOXMLDOC01-appb-C000076
 式(a2)~式(a4)において、RW2~RW4で表されるアルキレン基の具体例としては、メチレン基、エチレン基、n-プロピレン基、イソプロピレン基、n-ブチレン基、イソブチレン基、n-ペンチレン基、イソペンチレン基、n-ヘキシル基、イソヘキシル基、n-オクチレン基、n-ドデシレン基等が挙げられ、エチレン基、n-プロピレン基、イソプロピレン基、又は、n-ブチレン基が好ましく、エチレン基、又は、n-プロピレン基が特に好ましい。
 式(a3)において、2つ存在するMは同じでも異なってもよい。
Specific examples of the alkylene groups represented by RW2 to RW4 in the formulas (a2) to (a4) include a methylene group, an ethylene group, an n-propylene group, an isopropylene group, an n-butylene group, and an isobutylene group. , N-pentylene group, isopentylene group, n-hexyl group, isohexyl group, n-octylene group, n-dodecylene group and the like, and ethylene group, n-propylene group, isopropylene group or n-butylene group Preferably, an ethylene group or an n-propylene group is particularly preferable.
In the formula (a3), the two existing Ms may be the same or different.
 式(a2)~式(a4)において、Mで表されるオニウム基としては、アンモニウム基、ヨードニウム基、ホスホニウム基、スルホニウム基等が挙げられる。
 式(a2)におけるCOM、式(a2)におけるPO、及び式(a4)におけるSOMは、いずれもMが解離したアニオン構造を有していてもよい。アニオン構造の対カチオンは、A であってもよいし、式1-1中のR-Lに含まれうるカチオンであってもよい。
In the formulas (a2) to (a4), examples of the onium group represented by M include an ammonium group, an iodonium group, a phosphonium group, a sulfonium group and the like.
The CO 2 M in the formula (a2), the PO 3 M 2 in the formula (a 2), and the SO 3 M in the formula (a 4) may all have an anion structure in which M is dissociated. Counter cation of the anion structure may be a A 1 +, may be a cation may be included in R 1 -L in Formula 1-1.
 式(a1)~式(a4)で表される基の中で、式(a1)、式(a2)、又は式(a4)で表される基が好ましい。 Among the groups represented by the formulas (a1) to (a4), the group represented by the formula (a1), the formula (a2), or the formula (a4) is preferable.
 式1-1におけるn11及びn12は同一であることが好ましく、いずれも、1~5の整数が好ましく、1~3の整数がより好ましく、1又は2が更に好ましく、2が特に好ましい。 It is preferable that n 11 and n 12 in the formula 1-1 are the same, and an integer of 1 to 5 is preferable, an integer of 1 to 3 is more preferable, 1 or 2 is further preferable, and 2 is particularly preferable.
 式1-1におけるA及びAは、それぞれ独立に、酸素原子、硫黄原子、又は窒素原子を表し、窒素原子が好ましい。
 式1-1におけるA及びAは同一の原子であることが好ましい。
A 1 and A 2 in the formula 1-1 independently represent an oxygen atom, a sulfur atom, or a nitrogen atom, and a nitrogen atom is preferable.
It is preferable that A 1 and A 2 in the formula 1-1 are the same atom.
 式1-1におけるZaは、電荷を中和する対イオンを表す。
 R11~R18及びR-Lの全てが電荷的に中性の基であれば、Zaは一価の対アニオンとなる。但し、R11~R18及びR-Lは、アニオン構造又はカチオン構造を有していてもよく、例えば、R11~R18及びR-Lに2以上のアニオン構造を有する場合、Zaは対カチオンにもなり得る。
 なお、式1-1で表されるシアニン色素が、Zaを除き、化合物の全体において電荷的に中性な構造であれば、Zaは必要ない。
 Zaが対アニオンである場合、スルホネートイオン、カルボキシレートイオン、テトラフルオロボレートイオン、ヘキサフルオロホスフェートイオン、p-トルエンスルホネートイオン、過塩素酸塩イオン等が挙げられ、テトラフルオロボレートイオンが好ましい。
 Zaが対カチオンである場合、アルカリ金属イオン、アルカリ土類金属イオン、アンモニウムイオン、ピリジニウムイオン、スルホニウムイオン等が挙げられ、ナトリウムイオン、カリウムイオン、アンモニウムイオン、ピリジニウムイオン、又はスルホニウムイオンが好ましく、ナトリウムイオン、カリウムイオン、又はアンモニウムイオンがより好ましい。
Za in Equation 1-1 represents a counterion that neutralizes the charge.
If all of R 11 to R 18 and R 1- L are charge-neutral groups, Za is a monovalent counter anion. However, R 11 to R 18 and R 1 to L may have an anion structure or a cation structure. For example, when R 11 to R 18 and R 1 to L have two or more anion structures, Za Can also be a countercation.
If the cyanine dye represented by the formula 1-1 has a charge-neutral structure as a whole except for Za, Za is not necessary.
When Za is a counter anion, sulfonate ion, carboxylate ion, tetrafluoroborate ion, hexafluorophosphate ion, p-toluenesulfonate ion, perchlorate ion and the like can be mentioned, and tetrafluoroborate ion is preferable.
When Za is a counter cation, alkali metal ion, alkaline earth metal ion, ammonium ion, pyridinium ion, sulfonium ion and the like can be mentioned, and sodium ion, potassium ion, ammonium ion, pyridinium ion or sulfonium ion is preferable, and sodium is preferable. Ions, potassium ions, or ammonium ions are more preferred.
 分解性化合物としては、露光部の視認性を高める観点から、下記式1-2で表される化合物(即ち、シアニン色素)であることがより好ましい。 The degradable compound is more preferably a compound represented by the following formula 1-2 (that is, a cyanine pigment) from the viewpoint of enhancing the visibility of the exposed portion.
Figure JPOXMLDOC01-appb-C000077
Figure JPOXMLDOC01-appb-C000077
 式1-2中、Rは上記式2~式4のいずれかで表される基を表し、R19~R22はそれぞれ独立に、水素原子、ハロゲン原子、-R、-OR、-CN、-SR、又は-NRを表し、R23及びR24はそれぞれ独立に、水素原子、又は、-Rを表し、R~Rはそれぞれ独立に、炭化水素基を表し、R19とR20、R21とR22、又は、R23とR24は、連結して単環又は多環を形成してもよく、Lは、酸素原子、硫黄原子、又は、-NR10-を表し、R10は、水素原子、アルキル基、又は、アリール基を表し、Rd1~Rd4、W及びWはそれぞれ独立に、置換基を有してもよいアルキル基を表し、Zaは電荷を中和する対イオンを表す。 In formula 1-2, R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independently hydrogen atom, halogen atom, -R a , -OR b , and so on. -CN, represents -SR c, or -NR d R e, R 23 and R 24 each independently represent a hydrogen atom, or represents a -R a, each is R a ~ R e independently, a hydrocarbon group R 19 and R 20 , R 21 and R 22 , or R 23 and R 24 may be connected to form a monocyclic or polycyclic, and L may be an oxygen atom, a sulfur atom, or a sulfur atom. -NR 10- represents, R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and R d1 to R d4 , W 1 and W 2 each independently may have a substituent. Represents, and Za represents a counterion that neutralizes the charge.
 式1-2におけるRは、式1-1におけるRと同義であり、好ましい態様も同様である。 R 1 in Equation 1-2 is synonymous with R 1 in Equation 1-1, and so is the preferred embodiment.
 式1-2において、R19~R22は、それぞれ独立に、それぞれ独立に、水素原子、ハロゲン原子、-R、-OR、又は-CNであることが好ましい。
 より具体的には、R19及びR21は、水素原子、又は-Rであることが好ましい。
 また、R20及びR22は、水素原子、-R、-OR、又は-CNであることが好ましい。
 R19~R22で表される-Rとしては、アルキル基、又はアルケニル基が好ましい。
 R19~R22のすべてが-Rである場合、R19とR20及びR21とR22が連結して単環又は多環を形成することが好ましい。
 R19とR20又はR21とR22が連結して形成される環としては、ベンゼン環、ナフタレン環等が挙げられる。
In Formula 1-2, R 19 to R 22 are preferably hydrogen atoms, halogen atoms, -R a , -OR b , or -CN, respectively, independently of each other.
More specifically, R 19 and R 21 are preferably hydrogen atom, or a -R a.
Further, R 20 and R 22 are preferably hydrogen atoms, -R a , -OR b , or -CN.
As —R a represented by R 19 to R 22 , an alkyl group or an alkenyl group is preferable.
When all of R 19 to R 22 are −R a, it is preferable that R 19 and R 20 and R 21 and R 22 are connected to form a monocyclic or polycyclic ring.
Examples of the ring formed by connecting R 19 and R 20 or R 21 and R 22 include a benzene ring and a naphthalene ring.
 式1-2において、R23とR24は、連結して単環又は多環を形成していることが好ましい。
 R23とR24が連結して形成される環としては、単環であってもよく、多環であってもよい。形成される環として、具体的には、シクロペンテン環、シクロペンタジエン環、シクロヘキセン環、シクロヘキサジエン環等の単環、及び、インデン環等の多環が挙げられる。
In formula 1-2, it is preferable that R 23 and R 24 are connected to form a monocyclic or polycyclic ring.
The ring formed by connecting R 23 and R 24 may be a monocyclic ring or a polycyclic ring. Specific examples of the ring formed include a monocycle such as a cyclopentene ring, a cyclopentadiene ring, a cyclohexene ring and a cyclohexadiene ring, and a polycycle such as an inden ring.
 式1-2において、Rd1~Rd4は、無置換アルキル基であることが好ましい。また、Rd1~Rd4は、いずれも同一の基であることが好ましい。
 無置換アルキル基としては、炭素数1~4の無置換アルキル基が挙げられ、中でも、メチル基が好ましい。
In formula 1-2, R d1 to R d4 are preferably unsubstituted alkyl groups. Further, it is preferable that R d1 to R d4 are all the same group.
Examples of the unsubstituted alkyl group include an unsubstituted alkyl group having 1 to 4 carbon atoms, and among them, a methyl group is preferable.
 式1-2において、W及びWはそれぞれ独立に、式1-2で表される化合物に水溶性を高める観点から、置換アルキル基であることが好ましい。
 W及びWで表される置換アルキル基としては、式1-1における式(a1)~式(a4)のいずれかで表される基が挙げられ、好ましい態様も同様である。
 また、W及びWはそれぞれ独立に、機上現像性の観点から、置換基を有するアルキル基であり、かつ、上記置換基として、-(OCHCH)-、スルホ基、スルホ基の塩、カルボキシ基、又は、カルボキシ基の塩を少なくとも有する基であることが好ましい。
In formula 1-2, W 1 and W 2 are preferably substituted alkyl groups independently from the viewpoint of increasing water solubility in the compound represented by formula 1-2.
Examples of the substituted alkyl group represented by W 1 and W 2 include groups represented by any of the formulas (a1) to (a4) in the formula 1-1, and the preferred embodiment is also the same.
Further, W 1 and W 2 are independently alkyl groups having a substituent from the viewpoint of on-machine developability, and the above-mentioned substituents include- (OCH 2 CH 2 )-, a sulfo group and a sulfo group. , A carboxy group, or a group having at least a salt of a carboxy group is preferable.
 Zaは、分子内の電荷を中和する対イオンを表す。
 R19~R22、R23~R24、Rd1~Rd4、W、W、及び、R-Lの全てが電荷的に中性の基であれば、Zaは一価の対アニオンとなる。但し、R19~R22、R23~R24、Rd1~Rd4、W、W、及び、R-Lは、アニオン構造又はカチオン構造を有していてもよく、例えば、R19~R22、R23~R24、Rd1~Rd4、W、W、及び、R-Lに2以上のアニオン構造を有する場合、Zaは対カチオンにもなり得る。
 なお、式1-2で表される化合物が、Zaを除き、化合物の全体において電荷的に中性な構造であれば、Zaは必要ない。
 Zaが対アニオンである場合の例は、式1-1におけるZaと同様であり、好ましい態様も同様である。また、Zaが対カチオンである場合の例も、式1-1におけるZaと同様であり、好ましい態様も同様である。
Za represents a counterion that neutralizes the charge in the molecule.
If all of R 19 to R 22 , R 23 to R 24 , R d1 to R d4 , W 1 , W 2 , and R 1 to L are charge-neutral groups, then Za is a monovalent pair. It becomes an anion. However, R 19 to R 22 , R 23 to R 24 , R d1 to R d4 , W 1 , W 2 , and R 1 to L may have an anionic structure or a cation structure, for example, R. Za can also be a counter cation if 19 -R 22 , R 23 -R 24 , R d1 -R d4 , W 1 , W 2 , and R 1- L have more than one anionic structure.
If the compound represented by the formula 1-2 has a charge-neutral structure as a whole except for Za, Za is not necessary.
The example when Za is a counter anion is the same as that of Za in the formula 1-1, and the preferred embodiment is also the same. Further, the case where Za is a counter cation is the same as that of Za in the formula 1-1, and the preferred embodiment is also the same.
 分解性化合物としてのシアニン色素は、分解性、及び、発色性の観点から、下記式1-3~式1-7のいずれかで表される化合物であることが更に好ましい。
 特に、分解性、及び、発色性の観点から、式1-3、式1-5、及び式1-6のいずれかで表される化合物であることが好ましい。
The cyanine dye as a degradable compound is more preferably a compound represented by any of the following formulas 1-3 to 1-7 from the viewpoint of degradability and color development.
In particular, from the viewpoint of degradability and color development, the compound represented by any of the formulas 1-3, 1-5, and 1-6 is preferable.
Figure JPOXMLDOC01-appb-C000078
Figure JPOXMLDOC01-appb-C000078
 式1-3~式1-7中、Rは上記式2~式4のいずれかで表される基を表し、R19~R22はそれぞれ独立に、水素原子、ハロゲン原子、-R、-OR、-CN、-SR、又は、-NRを表し、R25及びR26はそれぞれ独立に、水素原子、ハロゲン原子、又は、-Rを表し、R~Rはそれぞれ独立に、炭化水素基を表し、R19とR20、R21とR22、又は、R25とR26は、連結して単環又は多環を形成してもよく、Lは、酸素原子、硫黄原子、又は、-NR10-を表し、R10は、水素原子、アルキル基、又は、アリール基を表し、Rd1~Rd4、W及びWは、それぞれ独立に、置換基を有してもよいアルキル基を表し、Zaは電荷を中和する対イオンを表す。 In formulas 1-3 to 1-7, R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independently hydrogen atom, halogen atom, and −R a. , -OR b, -CN, -SR c, or represents -NR d R e, each R 25 and R 26 independently represent a hydrogen atom, a halogen atom, or represents a -R a, R a ~ R e each independently represents a hydrocarbon group, and R 19 and R 20 , R 21 and R 22 , or R 25 and R 26 may be linked to form a monocyclic or polycyclic, and L is , Oxygen atom, sulfur atom, or -NR 10- , R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and R d1 to R d4 , W 1 and W 2 are independent of each other. Represents an alkyl group that may have a substituent, and Za represents a counterion that neutralizes the charge.
 式1-3~式1-7におけるR、R19~R22、Rd1~Rd4、W、W、及びLは、式1-2におけるR、R19~R22、Rd1~Rd4、W、W、及びLと同義であり、好ましい態様も同様である。
 式1-7におけるR25及びR26はそれぞれ独立に、水素原子又はアルキル基であることが好ましく、アルキル基であることがより好ましく、メチル基であることが特に好ましい。
R 1, R 19 ~ R 22 in Formula 1-3 to Formula 1-7, R d1 ~ R d4, W 1, W 2, and L is, R 1 in Formula 1-2, R 19 ~ R 22, R d1 ~ R d4, W 1, W 2, and has the same meaning as L, and also the same preferred embodiment.
R 25 and R 26 in Formula 1-7 are each independently preferably a hydrogen atom or an alkyl group, more preferably an alkyl group, and particularly preferably a methyl group.
 以下に、分解性化合物のシアニン色素の具体例を挙げるが、本開示はこれらに限定されるものではない。 Specific examples of the degradable compound cyanine pigment are given below, but the present disclosure is not limited thereto.
Figure JPOXMLDOC01-appb-C000079
Figure JPOXMLDOC01-appb-C000079
 また、分解性化合物であるシアニン色素は、国際公開第2019/219560号に記載の赤外線吸収性化合物を好適に用いることができる。 Further, as the cyanine dye which is a degradable compound, the infrared absorbing compound described in International Publication No. 2019/219560 can be preferably used.
 また、上記変色性化合物は、酸発色剤を含んでいてもよい。
 酸発色剤としては、画像記録層において酸発色剤として記載したものを用いることができ、好ましい態様も同様である。
Moreover, the said discoloring compound may contain an acid color former.
As the acid color former, those described as the acid color developer in the image recording layer can be used, and the preferred embodiment is also the same.
 変色性化合物は、1種単独で用いてもよいし、2種類以上の成分を組み合わせて使用してもよい。
 変色性化合物としては、既述の分解性化合物と後述の酸発生剤とを組み合わせて使用してもよい。
The discoloring compound may be used alone or in combination of two or more kinds of components.
As the discoloring compound, the above-mentioned decomposable compound and the acid generator described later may be used in combination.
 保護層中の変色性化合物の含有量は、発色性の観点から、保護層の全質量に対し、0.10質量%~50質量%が好ましく、0.50質量%~30質量%がより好ましく、1.0質量%~20質量%が更に好ましい。 From the viewpoint of color development, the content of the discoloring compound in the protective layer is preferably 0.10% by mass to 50% by mass, more preferably 0.50% by mass to 30% by mass, based on the total mass of the protective layer. , 1.0% by mass to 20% by mass is more preferable.
 上記保護層の上記変色性化合物の含有量Mと上記画像記録層の上記赤外線吸収剤の含有量Mとの比M/Mが、発色性の観点から、0.1以上であることが好ましく、0.2以上がより好ましく、0.3以上3.0以下が特に好ましい。 The ratio M X / M Y between the content M Y of the infrared absorber content M X and the image recording layer of the discoloring compound of the protective layer is, in terms of color development property, is 0.1 or more It is preferable, 0.2 or more is more preferable, and 0.3 or more and 3.0 or less is particularly preferable.
-水溶性ポリマー-
 上記保護層は、現像除去性(より好ましくは、機上現像性)の観点から、水溶性ポリマーを含むことが好ましい。
 本開示において、水溶性ポリマーとは、70℃、100gの純水に対して1g以上溶解し、かつ、70℃、100gの純水に対して1gのポリマーが溶解した溶液を25℃に冷却しても析出しないポリマーをいう。
 保護層に用いられる水溶性ポリマーとしては、例えば、ポリビニルアルコール、変性ポリビニルアルコール、ポリビニルピロリドン、水溶性セルロース誘導体、ポリエチレングリコール、ポリ(メタ)アクリロニトリル等が挙げられる。
 変性ポリビニルアルコールとしてはカルボキシ基又はスルホ基を有する酸変性ポリビニルアルコールが好ましく用いられる。具体的には、特開2005-250216号公報及び特開2006-259137号公報に記載の変性ポリビニルアルコールが挙げられる。
-Water-soluble polymer-
The protective layer preferably contains a water-soluble polymer from the viewpoint of developability (more preferably, on-machine developability).
In the present disclosure, the water-soluble polymer is a solution in which 1 g or more is dissolved in 100 g of pure water at 70 ° C. and 1 g of the polymer is dissolved in 100 g of pure water at 70 ° C., and the solution is cooled to 25 ° C. A polymer that does not precipitate even if.
Examples of the water-soluble polymer used for the protective layer include polyvinyl alcohol, modified polyvinyl alcohol, polyvinylpyrrolidone, water-soluble cellulose derivative, polyethylene glycol, poly (meth) acrylonitrile and the like.
As the modified polyvinyl alcohol, an acid-modified polyvinyl alcohol having a carboxy group or a sulfo group is preferably used. Specific examples thereof include the modified polyvinyl alcohols described in JP-A-2005-250216 and JP-A-2006-259137.
 上記水溶性ポリマーとしては、ポリビニルアルコールが好ましいものとして挙げられる。中でも、水溶性ポリマーとしては、けん化度が50%以上であるポリビニルアルコールを用いることが更に好ましい。
 上記けん化度は、60%以上が好ましく、70%以上がより好ましく、85%以上が更に好ましい。けん化度の上限は特に限定されず、100%以下であればよい。
 上記けん化度は、JIS K 6726:1994に記載の方法に従い測定される。
As the water-soluble polymer, polyvinyl alcohol is preferable. Above all, as the water-soluble polymer, it is more preferable to use polyvinyl alcohol having a saponification degree of 50% or more.
The saponification degree is preferably 60% or more, more preferably 70% or more, still more preferably 85% or more. The upper limit of the saponification degree is not particularly limited, and may be 100% or less.
The degree of saponification is measured according to the method described in JIS K 6726: 1994.
 上記水溶性ポリマーとしては、ポリビニルピロリドンも好ましいものとして挙げられる。
 親水性ポリマーとしては、ポリビニルアルコールとポリビニルピロリドンとを組み合わせて使用することも好ましい。
As the water-soluble polymer, polyvinylpyrrolidone is also preferable.
As the hydrophilic polymer, it is also preferable to use polyvinyl alcohol and polyvinylpyrrolidone in combination.
 水溶性ポリマーは、1種単独で用いてもよいし、2種類以上を組み合わせて使用してもよい。 The water-soluble polymer may be used alone or in combination of two or more.
 保護層が水溶性ポリマーを含む場合、水溶性ポリマーの含有量は、保護層の全質量に対して、1質量%~99質量%であることが好ましく、3質量%~97質量%であることがより好ましく、5質量%~95質量%であることが更に好ましい。 When the protective layer contains a water-soluble polymer, the content of the water-soluble polymer is preferably 1% by mass to 99% by mass and 3% by mass to 97% by mass with respect to the total mass of the protective layer. Is more preferable, and 5% by mass to 95% by mass is further preferable.
-その他の成分-
 上記保護層は、既述の変色性化合物及び水溶性ポリマー以外に、疎水性ポリマー、感脂化剤、酸発生剤、赤外線吸収剤等の他の成分を含んでいてもよい。
 以下、その他の成分について説明する。
-Other ingredients-
In addition to the discoloring compound and the water-soluble polymer described above, the protective layer may contain other components such as a hydrophobic polymer, a fat-sensing agent, an acid generator, and an infrared absorber.
Hereinafter, other components will be described.
〔疎水性ポリマー〕
 上記保護層は、疎水性ポリマーを含むことが好ましい。
 疎水性ポリマーとは、70℃、100gの純水に対する1g未満で溶解するか、又は、溶解しないポリマーをいう。
 疎水性ポリマーとしては、例えば、ポリエチレン、ポリスチレン、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリ(メタ)アクリル酸アルキルエステル(例えば、ポリ(メタ)アクリル酸メチル、ポリ(メタ)アクリル酸エチル、ポリ(メタ)アクリル酸ブチル等)、これらのポリマーの原料モノマーを組み合わせた共重合体等が挙げられる。
 また、疎水性ポリマーとしては、ポリビニリデンクロライド樹脂を含むことが好ましい。
 更に、疎水性ポリマーとしては、スチレン-アクリル共重合体を含むことが好ましい。
 
 更にまた、疎水性ポリマーは、機上現像性の観点から、疎水性ポリマー粒子であることが好ましい。
[Hydrophobic polymer]
The protective layer preferably contains a hydrophobic polymer.
The hydrophobic polymer means a polymer that dissolves or does not dissolve in less than 1 g in 100 g of pure water at 70 ° C.
Examples of the hydrophobic polymer include polyethylene, polystyrene, polyvinyl chloride, polyvinylidene chloride, poly (meth) acrylate alkyl ester (for example, methyl poly (meth) acrylate, ethyl poly (meth) acrylate, and poly (meth). ) Butyl acrylate, etc.), copolymers in which raw material monomers of these polymers are combined, and the like.
The hydrophobic polymer preferably contains a polyvinylidene chloride resin.
Further, the hydrophobic polymer preferably contains a styrene-acrylic copolymer.

Furthermore, the hydrophobic polymer is preferably hydrophobic polymer particles from the viewpoint of on-machine developability.
 疎水性ポリマーは、1種単独で用いてもよいし、2種類以上を組み合わせて使用してもよい。 The hydrophobic polymer may be used alone or in combination of two or more.
 保護層が疎水性ポリマーを含む場合、疎水性ポリマーの含有量は、保護層の全質量に対して、1質量%~80質量%であることが好ましく、5質量%~50質量%であることがより好ましい。 When the protective layer contains a hydrophobic polymer, the content of the hydrophobic polymer is preferably 1% by mass to 80% by mass and 5% by mass to 50% by mass with respect to the total mass of the protective layer. Is more preferable.
 本開示において、疎水性ポリマーの保護層表面における占有面積率が30面積%以上であることが好ましく、40面積%以上であることがより好ましく、50面積%以上であることが更に好ましい。
 疎水性ポリマーの保護層表面における占有面積率の上限としては、例えば、90面積%が挙げられる。
 疎水性ポリマーの保護層表面における占有面積率は、以下のようにして測定することができる。
 アルバック・ファイ社製PHI nano TOFII型飛行時間型二次イオン質量分析装置(TOF-SIMS)を用い、保護層表面に加速電圧30kVでBiイオンビーム(一次イオン)を照射し、表面から放出される疎水部(即ち、疎水性ポリマーによる領域)に相当するイオン(二次イオン)のピークを測定することで、疎水部のマッピングを行い、1μmあたりに占める疎水部の面積を測定し、疎水部の占有面積率を求め、これを「疎水性ポリマーの保護層表面における占有面積率」とする。
 例えば、疎水性ポリマーがアクリル樹脂である場合は、C13のピークにより測定を行う。また、疎水性ポリマーがポリ塩化ビニリデンである場合は、CClのピークにより測定を行う。
 上記占有面積率は、疎水性ポリマーの添加量等によって、調整しうる。
In the present disclosure, the occupied area ratio of the hydrophobic polymer on the surface of the protective layer is preferably 30 area% or more, more preferably 40 area% or more, and further preferably 50 area% or more.
The upper limit of the occupied area ratio on the surface of the protective layer of the hydrophobic polymer is, for example, 90 area%.
The occupied area ratio of the hydrophobic polymer on the surface of the protective layer can be measured as follows.
Using ULVAC-PHI's PHI nano TOFII type time-of-flight secondary ion mass spectrometer (TOF-SIMS), the surface of the protective layer is irradiated with a Bi ion beam (primary ion) at an acceleration voltage of 30 kV and emitted from the surface. By measuring the peak of the ion (secondary ion) corresponding to the hydrophobic part (that is, the region due to the hydrophobic polymer), the hydrophobic part is mapped, and the area of the hydrophobic part occupying 1 μm 2 is measured, and the hydrophobic part is measured. The occupied area ratio of the above is obtained, and this is referred to as the "occupied area ratio on the surface of the protective layer of the hydrophobic polymer".
For example, when the hydrophobic polymer is an acrylic resin, the measurement is carried out by the peak of C 6 H 13 O . When the hydrophobic polymer is polyvinylidene chloride, the measurement is performed by the peak of C 2 H 2 Cl + .
The occupied area ratio can be adjusted by the amount of the hydrophobic polymer added or the like.
〔感脂化剤〕
 上記保護層は、インキ着肉性の観点から、感脂化剤を含むことが好ましい。
 上記保護層に用いられる感脂化剤としては、上記画像記録層において記載した感脂化剤を用いることができ、好ましい態様も同様である。
[Fat sensitive agent]
The protective layer preferably contains a fat-sensing agent from the viewpoint of ink penetration.
As the oil-sensitive agent used in the protective layer, the oil-sensitive agent described in the image recording layer can be used, and the preferred embodiment is also the same.
 感脂化剤は、1種単独で使用してもよいし、2種以上を組み合わせて使用してもよい。
 保護層が感脂化剤を含む場合、感脂化剤の含有量は、保護層の全質量に対して、0.5質量%~30質量%であることが好ましく、1質量%~20質量%であることがより好ましい。
The oil sensitizer may be used alone or in combination of two or more.
When the protective layer contains a fat-sensitive agent, the content of the fat-sensitive agent is preferably 0.5% by mass to 30% by mass, and 1% by mass to 20% by mass, based on the total mass of the protective layer. More preferably.
〔酸発生剤〕
 上記保護層は、変色性化合物として酸発色剤を用いる場合に、酸発生剤を含むことが好ましい。
 本開示における「酸発生剤」とは、光又は熱により酸を発生する化合物であり、具体的には、赤外線露光によって分解し酸を発生する化合物をいう。
 発生する酸としては、スルホン酸、塩酸等のpKaが2以下の強酸であることが好ましい。酸発生剤から発生した酸によって、既述の酸発色剤が変色することができる。
[Acid generator]
When an acid color former is used as the discoloring compound, the protective layer preferably contains an acid generator.
The "acid generator" in the present disclosure is a compound that generates an acid by light or heat, and specifically, a compound that is decomposed by infrared exposure to generate an acid.
The acid to be generated is preferably a strong acid having a pKa of 2 or less, such as sulfonic acid and hydrochloric acid. The acid generated from the acid generator can discolor the above-mentioned acid color former.
 酸発生剤として具体的には、感度と安定性の観点から、オニウム塩化合物が好ましい。
 酸発生剤として好適なオニウム塩の具体例は、国際公開第2016/047392号の段落0121~段落0124に記載された化合物が挙げられる。
 中でも、トリアリールスルホニウム、又は、ジアリールヨードニウムの、スルホン酸塩、カルボン酸塩、BPh 、BF 、PF 、ClO などが好ましい。ここで、Phはフェニル基を表す。
Specifically, the onium salt compound is preferable as the acid generator from the viewpoint of sensitivity and stability.
Specific examples of the onium salt suitable as the acid generator include the compounds described in paragraphs 0121 to 0124 of International Publication No. 2016/047392.
Among them, triarylsulfonium, or diaryliodonium, sulfonates, carboxylates, BPh 4 -, BF 4 - , PF 6 -, ClO 4 - and the like are preferable. Here, Ph represents a phenyl group.
 酸発生剤は、1種単独で使用してもよいし、2種以上を組み合わせて使用してもよい。
 保護層が酸発生剤を含む場合、酸発生剤の含有量は、保護層の全質量に対して、0.5質量%~30質量%であることが好ましく、1質量%~20質量%であることがより好ましい。
The acid generator may be used alone or in combination of two or more.
When the protective layer contains an acid generator, the content of the acid generator is preferably 0.5% by mass to 30% by mass, and 1% by mass to 20% by mass, based on the total mass of the protective layer. More preferably.
 上記保護層は、既述の成分以外にも、無機層状化合物、界面活性剤等の公知の添加物を含有してもよい。 The protective layer may contain known additives such as an inorganic layered compound and a surfactant in addition to the above-mentioned components.
 保護層は、公知の方法で塗布され、乾燥することで形成される。
 保護層の塗布量(固形分)は、0.01g/m~10g/mが好ましく、0.02g/m~3g/mがより好ましく、0.1g/m~2.0g/mが特に好ましい。
 保護層の膜厚は、0.1μm~5.0μmであることが好ましく、0.3μm~4.0μmであることがより好ましい。
The protective layer is formed by applying it by a known method and drying it.
The coating amount of the protective layer (solid content) is preferably from 0.01g / m 2 ~ 10g / m 2, more preferably 0.02g / m 2 ~ 3g / m 2, 0.1g / m 2 ~ 2.0g / M 2 is particularly preferred.
The film thickness of the protective layer is preferably 0.1 μm to 5.0 μm, and more preferably 0.3 μm to 4.0 μm.
 上記保護層の膜厚は、後述する画像記録層の膜厚に対し、0.1倍~5.0倍であることが好ましく、0.2倍~3.0倍であることがより好ましい。 The film thickness of the protective layer is preferably 0.1 to 5.0 times, more preferably 0.2 to 3.0 times, the film thickness of the image recording layer described later.
 保護層は可撓性付与のための可塑剤、塗布性を向上させための界面活性剤、表面の滑り性を制御するための無機粒子など公知の添加物を含有してもよい。 The protective layer may contain known additives such as a plasticizer for imparting flexibility, a surfactant for improving coatability, and inorganic particles for controlling the slipperiness of the surface.
(平版印刷版の作製方法、及び、平版印刷方法)
 本開示に係る平版印刷版原版を画像露光して現像処理を行うことで平版印刷版を作製することができる。
 本開示に係る平版印刷版の作製方法は、本開示に係る平版印刷版原版を画像様に露光する工程(以下、「露光工程」ともいう。)と、印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去する工程(以下、「機上現像工程」ともいう。)と、を含むことが好ましい。
 本開示に係る平版印刷方法は、本開示に係る平版印刷版原版を画像様に露光する工程(露光工程)と、印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去し平版印刷版を作製する工程(機上現像工程)と、得られた平版印刷版により印刷する工程(印刷工程)と、を含むことが好ましい。
 以下、本開示に係る平版印刷版の作製方法、及び、本開示に係る平版印刷方法について、各工程の好ましい態様を順に説明する。なお、本開示に係る平版印刷版原版は、現像液によっても現像可能である。
 以下、平版印刷版の作製方法における露光工程及び機上現像工程について説明するが、本開示に係る平版印刷版の作製方法における露光工程と、本開示に係る平版印刷方法における露光工程とは同様の工程であり、本開示に係る平版印刷版の作製方法における機上現像工程と、本開示に係る平版印刷方法における機上現像工程とは同様の工程である。
 また、上記最外層は、機上現像時において、一部は除去され、一部は画像部の表面に残留又は画像部の内部に印刷インキにより浸透しているものと推定している。
(Planographic printing plate manufacturing method and lithographic printing method)
A lithographic printing plate can be produced by subjecting the original plate of the lithographic printing plate according to the present disclosure to an image and developing the plate.
The method for producing a lithographic printing plate according to the present disclosure comprises a step of exposing the lithographic printing plate original plate according to the present disclosure to an image (hereinafter, also referred to as an “exposure step”), and a group consisting of printing ink and dampening water. It is preferable to include a step of supplying at least one of the selected ones and removing the image recording layer of the non-image portion on the printing machine (hereinafter, also referred to as “on-machine development step”).
The lithographic printing method according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image (exposure step) and printing by supplying at least one selected from the group consisting of printing ink and dampening water. It is preferable to include a step of removing the image recording layer of the non-image portion on the machine to produce a lithographic printing plate (on-machine development step) and a step of printing with the obtained lithographic printing plate (printing step).
Hereinafter, preferred embodiments of each step will be described in order with respect to the method for producing a lithographic printing plate according to the present disclosure and the lithographic printing method according to the present disclosure. The lithographic printing plate original plate according to the present disclosure can also be developed with a developing solution.
Hereinafter, the exposure step and the on-machine development step in the lithographic printing plate manufacturing method will be described, but the exposure step in the lithographic printing plate manufacturing method according to the present disclosure and the exposure step in the lithographic printing method according to the present disclosure are the same. It is a step, and the on-machine development step in the lithographic printing plate manufacturing method according to the present disclosure and the on-machine development step in the lithographic printing method according to the present disclosure are the same steps.
Further, it is estimated that a part of the outermost layer is removed at the time of on-machine development, and a part remains on the surface of the image part or permeates into the inside of the image part by printing ink.
<露光工程>
 本開示に係る平版印刷版の作製方法は、本開示に係る平版印刷版原版を画像様に露光し、露光部と未露光部とを形成する露光工程を含むことが好ましい。本開示に係る平版印刷版原版は、線画像、網点画像等を有する透明原画を通してレーザー露光するかデジタルデータによるレーザー光走査等で画像様に露光されることが好ましい。
 光源の波長は750nm~1,400nmが好ましく用いられる。波長750nm~1,400nmの光源としては、赤外線を放射する固体レーザー及び半導体レーザーが好適である。赤外線レーザーに関しては、出力は100mW以上であることが好ましく、1画素当たりの露光時間は20マイクロ秒以内であるのが好ましく、また照射エネルギー量は10mJ/cm~300mJ/cmであるのが好ましい。また、露光時間を短縮するためマルチビームレーザーデバイスを用いることが好ましい。露光機構は、内面ドラム方式、外面ドラム方式、及びフラットベッド方式等のいずれでもよい。
 画像露光は、プレートセッターなどを用いて常法により行うことができる。機上現像の場合には、平版印刷版原版を印刷機に装着した後、印刷機上で画像露光を行ってもよい。
<Exposure process>
The method for producing a lithographic printing plate according to the present disclosure preferably includes an exposure step of exposing the lithographic printing plate original plate according to the present disclosure to an image to form an exposed portion and an unexposed portion. The planographic printing plate original plate according to the present disclosure is preferably exposed by laser exposure through a transparent original image having a line image, a halftone dot image, or the like, or by laser light scanning with digital data or the like.
The wavelength of the light source is preferably 750 nm to 1,400 nm. As a light source having a wavelength of 750 nm to 1,400 nm, a solid-state laser and a semiconductor laser that emit infrared rays are suitable. Regarding the infrared laser, the output is preferably 100 mW or more, the exposure time per pixel is preferably within 20 microseconds, and the irradiation energy amount is 10 mJ / cm 2 to 300 mJ / cm 2. preferable. Further, it is preferable to use a multi-beam laser device in order to shorten the exposure time. The exposure mechanism may be any of an inner drum method, an outer drum method, a flatbed method and the like.
Image exposure can be performed by a conventional method using a platesetter or the like. In the case of on-machine development, the lithographic printing plate original plate may be mounted on the printing machine and then the image may be exposed on the printing machine.
<機上現像工程>
 本開示に係る平版印刷版の作製方法は、印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去する機上現像工程を含むことが好ましい。
 以下に、機上現像方式について説明する。
<In-machine development process>
The method for producing a lithographic printing plate according to the present disclosure involves an on-machine development step of supplying at least one selected from the group consisting of printing ink and dampening water to remove an image recording layer in a non-image area on a printing machine. It is preferable to include it.
The on-machine development method will be described below.
〔機上現像方式〕
 機上現像方式においては、画像露光された平版印刷版原版は、印刷機上で油性インキと水性成分とを供給し、非画像部の画像記録層が除去されて平版印刷版が作製されることが好ましい。
 すなわち、平版印刷版原版を画像露光後、何らの現像処理を施すことなくそのまま印刷機に装着するか、あるいは、平版印刷版原版を印刷機に装着した後、印刷機上で画像露光し、ついで、油性インキと水性成分とを供給して印刷すると、印刷途上の初期の段階で、非画像部においては、供給された油性インキ及び水性成分のいずれか又は両方によって、未硬化の画像記録層が溶解又は分散して除去され、その部分に親水性の表面が露出する。一方、露光部においては、露光により硬化した画像記録層が、親油性表面を有する油性インキ受容部を形成する。最初に版面に供給されるのは、油性インキでもよく、水性成分でもよいが、水性成分が除去された画像記録層の成分によって汚染されることを防止する点で、最初に油性インキを供給することが好ましい。このようにして、平版印刷版原版は印刷機上で機上現像され、そのまま多数枚の印刷に用いられる。油性インキ及び水性成分としては、通常の平版印刷用の印刷インキ及び湿し水が好適に用いられる。
[In-machine development method]
In the on-machine development method, the image-exposed lithographic printing plate original plate supplies oil-based ink and water-based components on the printing machine, and the image recording layer in the non-image area is removed to produce a lithographic printing plate. Is preferable.
That is, either the flat plate printing plate original plate is mounted on the printing machine as it is without any development processing after the image exposure, or the flat plate printing plate original plate is mounted on the printing machine and then the image is exposed on the printing machine, and then When printing is performed by supplying an oil-based ink and a water-based component, in the non-image area, an uncured image recording layer is formed by either or both of the supplied oil-based ink and the water-based component in the initial stage of printing. It dissolves or disperses and is removed, exposing a hydrophilic surface in that area. On the other hand, in the exposed portion, the image recording layer cured by exposure forms an oil-based ink receiving portion having a lipophilic surface. The first supply to the printing plate may be an oil-based ink or a water-based component, but the oil-based ink is first supplied in terms of preventing contamination by the components of the image recording layer from which the water-based components have been removed. Is preferable. In this way, the lithographic printing plate original plate is developed on the printing machine and used as it is for printing a large number of sheets. As the oil-based ink and the water-based component, ordinary printing ink for lithographic printing and dampening water are preferably used.
 上記本開示に係る平版印刷版原版を画像露光するレーザーとしては、光源の波長は300nm~450nm又は750nm~1,400nmが好ましく用いられる。波長300nm~450nmの光源の場合は、この波長領域に吸収極大を有する増感色素を画像記録層に含有する平版印刷版原版が好ましく用いられ、波長750nm~1,400nmの光源は上述したものが好ましく用いられる。波長300nm~450nmの光源としては、半導体レーザーが好適である。 The wavelength of the light source is preferably 300 nm to 450 nm or 750 nm to 1,400 nm as the laser for image-exposing the lithographic printing plate original plate according to the present disclosure. In the case of a light source having a wavelength of 300 nm to 450 nm, a lithographic printing plate original plate containing a sensitizing dye having an absorption maximum in this wavelength region in the image recording layer is preferably used, and the light source having a wavelength of 750 nm to 1,400 nm is as described above. It is preferably used. A semiconductor laser is suitable as a light source having a wavelength of 300 nm to 450 nm.
<現像液現像工程>
 本開示に係る平版印刷版の作製方法は、本開示に係る平版印刷版原版を画像様に露光する工程と、現像液により非画像部の画像記録層を除去し平版印刷版を作製する工程(「現像液現像工程」ともいう。)と、を含む方法であってもよい。
 また、本開示に係る平版印刷方法は、本開示に係る平版印刷版原版を画像様に露光する工程と、現像液により非画像部の画像記録層を除去し平版印刷版を作製する工程と、得られた平版印刷版により印刷する工程と、を含む方法であってもよい。
 現像液としては、公知の現像液を用いることができる。
 現像液のpHは、特に制限はなく、強アルカリ現像液であってもよいが、pH2~11の現像液が好ましく挙げられる。pH2~11の現像液としては、例えば、界面活性剤及び水溶性高分子化合物のうち少なくとも1種を含有する現像液が好ましく挙げられる。
 強アルカリ現像液を用いた現像処理においては、前水洗工程により保護層を除去し、次いでアルカリ現像を行い、後水洗工程でアルカリを水洗除去し、ガム液処理を行い、乾燥工程で乾燥する方法が挙げられる。
 また、界面活性剤又は水溶性高分子化合物を含有する上記現像液を用いる場合は、現像-ガム液処理を同時に行うことができる。よって、後水洗工程は特に必要とせず、1液で現像とガム液処理を行った後、乾燥工程を行うことができる。更に、保護層の除去も現像、ガム液処理と同時に行うことができるので、前水洗工程も特に必要としない。現像処理後、スクイズローラー等を用いて余剰の現像液を除去した後、乾燥を行うことが好ましい。
<Developer development process>
The method for producing a lithographic printing plate according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image, and a step of removing the image recording layer of the non-image portion with a developing solution to prepare a lithographic printing plate ( It may also be a method including "developer development step").
Further, the lithographic printing method according to the present disclosure includes a step of exposing the lithographic printing plate original plate according to the present disclosure to an image, and a step of removing the image recording layer of the non-image portion with a developing solution to prepare a lithographic printing plate. A method may include a step of printing with the obtained lithographic printing plate.
As the developing solution, a known developing solution can be used.
The pH of the developing solution is not particularly limited and may be a strong alkaline developing solution, but a developing solution having a pH of 2 to 11 is preferable. As the developing solution having a pH of 2 to 11, for example, a developing solution containing at least one of a surfactant and a water-soluble polymer compound is preferable.
In the development process using a strong alkaline developer, a method in which the protective layer is removed by a pre-washing step, then alkaline development is performed, the alkali is washed and removed in a post-washing step, a gum solution treatment is performed, and the drying step is performed. Can be mentioned.
When the developer containing a surfactant or a water-soluble polymer compound is used, the developer-gum solution treatment can be performed at the same time. Therefore, the post-washing step is not particularly required, and the drying step can be performed after the development and the gum liquid treatment are performed with one liquid. Further, since the protective layer can be removed at the same time as the development and the gum solution treatment, the pre-washing step is not particularly required. After the development treatment, it is preferable to remove excess developer using a squeeze roller or the like and then dry.
<印刷工程>
 本開示に係る平版印刷方法は、平版印刷版に印刷インキを供給して記録媒体を印刷する印刷工程を含む。
 印刷インキとしては、特に制限はなく、所望に応じ、種々の公知のインキを用いることができる。また、印刷インキとしては、油性インキ又は紫外線硬化型インキ(UVインキ)が好ましく挙げられる。
 また、上記印刷工程においては、必要に応じ、湿し水を供給してもよい。
 また、上記印刷工程は、印刷機を停止することなく、上記機上現像工程又は上記現像液現像工程に連続して行われてもよい。
 記録媒体としては、特に制限はなく、所望に応じ、公知の記録媒体を用いることができる。
<Printing process>
The lithographic printing method according to the present disclosure includes a printing step of supplying printing ink to a lithographic printing plate to print a recording medium.
The printing ink is not particularly limited, and various known inks can be used as desired. Further, as the printing ink, oil-based ink or ultraviolet curable ink (UV ink) is preferably mentioned.
Further, in the printing process, dampening water may be supplied as needed.
Further, the printing step may be continuously performed in the on-machine development step or the developer development step without stopping the printing machine.
The recording medium is not particularly limited, and a known recording medium can be used as desired.
 本開示に係る平版印刷版原版からの平版印刷版の作製方法、及び、本開示に係る平版印刷方法においては、必要に応じて、露光前、露光中、露光から現像までの間に、平版印刷版原版の全面を加熱してもよい。このような加熱により、画像記録層中の画像形成反応が促進され、感度や耐刷性の向上や感度の安定化等の利点が生じ得る。現像前の加熱は150℃以下の穏和な条件で行うことが好ましい。上記態様であると、非画像部が硬化してしまう等の問題を防ぐことができる。現像後の加熱には非常に強い条件を利用することが好ましく、100℃~500℃の範囲であることが好ましい。上記範囲であると、十分な画像強化作用が得られまた、支持体の劣化、画像部の熱分解といった問題を抑制することができる。 In the method for producing a lithographic printing plate from the lithographic printing plate original plate according to the present disclosure and the lithographic printing method according to the present disclosure, lithographic printing is performed before, during, and between exposure and development as necessary. The entire surface of the plate original may be heated. By such heating, the image formation reaction in the image recording layer is promoted, and advantages such as improvement of sensitivity and printing durability and stabilization of sensitivity can occur. Heating before development is preferably performed under mild conditions of 150 ° C. or lower. In the above aspect, it is possible to prevent problems such as hardening of the non-image portion. It is preferable to use very strong conditions for heating after development, preferably in the range of 100 ° C. to 500 ° C. Within the above range, a sufficient image enhancement effect can be obtained, and problems such as deterioration of the support and thermal decomposition of the image portion can be suppressed.
 以下、実施例により本開示を詳細に説明するが、本開示はこれらに限定されるものではない。なお、本実施例において、「%」、「部」とは、特に断りのない限り、それぞれ「質量%」、「質量部」を意味する。なお、高分子化合物において、特別に規定したもの以外は、分子量は重量平均分子量(Mw)であり、構成繰り返し単位の比率はモル百分率である。また、重量平均分子量(Mw)は、ゲル浸透クロマトグラフィー(GPC)法によるポリスチレン換算値として測定した値である。また、平均粒径は、特に断りのない限り、体積平均粒径を意味する。 Hereinafter, the present disclosure will be described in detail by way of examples, but the present disclosure is not limited thereto. In addition, in this Example, "%" and "part" mean "mass%" and "part by mass", respectively, unless otherwise specified. In the polymer compound, the molecular weight is the weight average molecular weight (Mw), and the ratio of the constituent repeating units is a molar percentage, except for those specified specifically. The weight average molecular weight (Mw) is a value measured as a polystyrene-equivalent value by a gel permeation chromatography (GPC) method. Further, the average particle size means a volume average particle size unless otherwise specified.
<ポリマー粒子R-2の合成>
 特表2013-503365号公報の実施例(調製1)に従い、ポリマー粒子R-2を合成した。ポリマー粒子R-2は、下記に示す構造の粒子である。
<Synthesis of polymer particles R-2>
Polymer particles R-2 were synthesized according to Examples (Preparation 1) of JP2013-503365A. The polymer particles R-2 are particles having the structure shown below.
Figure JPOXMLDOC01-appb-C000080
Figure JPOXMLDOC01-appb-C000080
<ポリマー粒子R-3の合成> <Synthesis of polymer particles R-3>
Figure JPOXMLDOC01-appb-C000081
Figure JPOXMLDOC01-appb-C000081
 3つ口フラスコに化合物(1)0.25部、化合物(2)2.25部、化合物(3)1.0部、化合物(4)1.5部、ラウリル硫酸ナトリウム0.38部、蒸留水90部を加え、窒素雰囲気下で撹拌し、70℃に昇温した。次に、VA-057(2,2’-アゾビス[N-(2-カルボキシエチル)-2-メチルプロピオンアミジン]四水和物、富士フイルム和光純薬(株)製)を0.245部、蒸留水5.0部を加え、4時間撹拌した。その後、90℃に昇温し、2時間撹拌した。反応液を室温(25℃、以下同様)に放冷後、重曹をpH=8.5になるまで添加し、ポリマー粒子R’-3の分散液(固形分5%)を得た。ポリマー粒子R’-3の平均粒径は90nmであった。
 得られたポリマー粒子R’-3の分散液(固形分5%)100部にAOI(2-イソシアナトエチルアクリレート、昭和電工(株)製)を2.00部、4OH-TEMPO(4-ヒドロキシ-2,2,6,6-テトラメチルピペリジン-1-オキシル)を0.004部加え、3時間室温にて撹拌し、ポリマー粒子R-3の分散液(固形分5%)を得た。また、ポリマー粒子R-3の平均粒径は90nmであった。
Compound (1) 0.25 parts, compound (2) 2.25 parts, compound (3) 1.0 parts, compound (4) 1.5 parts, sodium lauryl sulfate 0.38 parts, distilled in a three-necked flask 90 parts of water was added, and the mixture was stirred under a nitrogen atmosphere and heated to 70 ° C. Next, 0.245 parts of VA-057 (2,2'-azobis [N- (2-carboxyethyl) -2-methylpropion amidine] tetrahydrate, manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), 5.0 parts of distilled water was added, and the mixture was stirred for 4 hours. Then, the temperature was raised to 90 ° C., and the mixture was stirred for 2 hours. After allowing the reaction solution to cool to room temperature (25 ° C., the same applies hereinafter), baking soda was added until pH = 8.5 to obtain a dispersion of polymer particles R'-3 (solid content 5%). The average particle size of the polymer particles R'-3 was 90 nm.
2.00 parts of AOI (2-isocyanatoethyl acrylate, manufactured by Showa Denko KK) in 100 parts of the obtained dispersion liquid (solid content 5%) of polymer particles R'-3, 4OH-TEMPO (4-hydroxy) -2,2,6,6-tetramethylpiperidin-1-oxyl) was added in an amount of 0.004 parts, and the mixture was stirred for 3 hours at room temperature to obtain a dispersion liquid (solid content 5%) of the polymer particles R-3. The average particle size of the polymer particles R-3 was 90 nm.
<支持体の作製>
<<表面処理A>>
〔大径孔部及び小径孔部を有する支持体〕
(A-a)アルカリエッチング処理
 アルミニウム板に、カセイソーダ(水酸化ナトリウム)濃度26質量%、アルミニウムイオン濃度6.5質量%のカセイソーダ水溶液を、温度70℃でスプレー管により吹き付けてエッチング処理を行った。その後、スプレーによる水洗を行った。後に電気化学的粗面化処理を施す面のアルミニウム溶解量は、1.0g/mであった。
<Preparation of support>
<< Surface Treatment A >>
[Support with large-diameter holes and small-diameter holes]
(Aa) Alkaline Etching Treatment An aqueous solution of caustic soda having a caustic soda (sodium hydroxide) concentration of 26% by mass and an aluminum ion concentration of 6.5% by mass was sprayed onto an aluminum plate at a temperature of 70 ° C. by a spray tube to perform an etching treatment. .. Then, it was washed with water by spraying. The amount of aluminum dissolved on the surface to be subjected to the electrochemical roughening treatment later was 1.0 g / m 2 .
(A-b)酸性水溶液中でのデスマット処理(第1デスマット処理)
 次に、酸性水溶液中でデスマット処理を行った。デスマット処理に用いる酸性水溶液は、硫酸150g/Lの水溶液を用いた。その液温は30℃であった。デスマット液はスプレーにより吹き付けて、3秒間デスマット処理した。その後、水洗処理を行った。
(Ab) Desmat treatment in an acidic aqueous solution (first desmat treatment)
Next, a desmat treatment was performed in an acidic aqueous solution. As the acidic aqueous solution used for the desmat treatment, an aqueous solution of sulfuric acid of 150 g / L was used. The liquid temperature was 30 ° C. The desmat solution was sprayed and treated with desmat for 3 seconds. Then, it was washed with water.
(A-c)塩酸水溶液中での電気化学的粗面化処理
 次に、塩酸濃度14g/L、アルミニウムイオン濃度13g/L、硫酸濃度3g/Lの電解液を用い、交流電流を用いて電解粗面化処理を行った。電解液の液温は30℃であった。アルミニウムイオン濃度は塩化アルミニウムを添加して調整した。交流電流の波形は正と負の波形が対称な正弦波であり、周波数は50Hz、交流電流1周期におけるアノード反応時間とカソード反応時間は1:1、電流密度は交流電流波形のピーク電流値で75A/dmであった。また、電気量はアルミニウム板がアノード反応に預かる電気量の総和で450C/dmであり、電解処理は125C/dmずつ4秒間の通電間隔を開けて4回に分けて行った。アルミニウム板の対極にはカーボン電極を用いた。その後、水洗処理を行った。
(Ac) Electrochemical roughening treatment in hydrochloric acid aqueous solution Next, electrolysis using an electrolytic solution having a hydrochloric acid concentration of 14 g / L, an aluminum ion concentration of 13 g / L, and a sulfuric acid concentration of 3 g / L was used. Roughening treatment was performed. The temperature of the electrolytic solution was 30 ° C. The aluminum ion concentration was adjusted by adding aluminum chloride. The AC current waveform is a sinusoidal wave with symmetrical positive and negative waveforms, the frequency is 50 Hz, the anode reaction time and cathode reaction time in one AC current cycle are 1: 1, and the current density is the peak current value of the AC current waveform. It was 75 A / dm 2 . The total amount of electricity stored in the anodic reaction of the aluminum plate was 450 C / dm 2 , and the electrolysis treatment was carried out in 4 steps with an energization interval of 125 C / dm 2 for 4 seconds. A carbon electrode was used as the counter electrode of the aluminum plate. Then, it was washed with water.
(A-d)アルカリエッチング処理
 電気化学的粗面化処理後のアルミニウム板を、カセイソーダ濃度5質量%、アルミニウムイオン濃度0.5質量%のカセイソーダ水溶液を、温度45℃でスプレー管により吹き付けてエッチング処理を行った。電気化学的粗面化処理が施された面のアルミニウムの溶解量は0.2g/mであった。その後、水洗処理を行った。
(Ad) Alkaline etching treatment The aluminum plate after the electrochemical roughening treatment is etched by spraying an aqueous solution of caustic soda having a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass with a spray tube at a temperature of 45 ° C. Processing was performed. The dissolved amount of aluminum on the surface subjected to the electrochemical roughening treatment was 0.2 g / m 2 . Then, it was washed with water.
(A-e)酸性水溶液中でのデスマット処理
 次に、酸性水溶液中でのデスマット処理を行った。デスマット処理に用いる酸性水溶液は、陽極酸化処理工程で発生した廃液(硫酸170g/L水溶液中にアルミニウムイオン5.0g/L溶解)を用いた。液温は30℃であった。デスマット液はスプレーに吹き付けて3秒間デスマット処理を行った。
(Ae) Desmat treatment in an acidic aqueous solution Next, a desmat treatment in an acidic aqueous solution was performed. As the acidic aqueous solution used for the desmat treatment, a waste liquid (aluminum ion 5.0 g / L dissolved in a sulfuric acid 170 g / L aqueous solution) generated in the anodizing treatment step was used. The liquid temperature was 30 ° C. The desmat solution was sprayed on a spray to perform a desmat treatment for 3 seconds.
(A-f)第1段階の陽極酸化処理
 図5に示す構造の直流電解による陽極酸化装置を用いて第1段階の陽極酸化処理を行った。表1に示す条件にて陽極酸化処理を行い、所定の皮膜厚の陽極酸化皮膜を形成した。
(Af) First-stage anodizing treatment The first-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. Anodizing was performed under the conditions shown in Table 1 to form an anodized film having a predetermined film thickness.
(A-g)ポアワイド処理
 上記陽極酸化処理したアルミニウム板を、温度35℃、カセイソーダ濃度5質量%、アルミニウムイオン濃度0.5質量%のカセイソーダ水溶液に表1に示す条件にて浸漬し、ポアワイド処理を行った。その後、スプレーによる水洗を行った。
(Ag) Pore Wide Treatment The anodized aluminum plate is immersed in a caustic soda aqueous solution having a temperature of 35 ° C., a caustic soda concentration of 5% by mass, and an aluminum ion concentration of 0.5% by mass under the conditions shown in Table 1 for pore wide treatment. Was done. Then, it was washed with water by spraying.
(A-h)第2段階の陽極酸化処理
 図5に示す構造の直流電解による陽極酸化装置を用いて第2段階の陽極酸化処理を行った。表1に示す条件にて陽極酸化処理を行い、所定の皮膜厚の陽極酸化皮膜を形成した。
 以上の表面処理Aから、実施例の支持体S1を得た。
(Ah) Second-stage anodizing treatment The second-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. Anodizing was performed under the conditions shown in Table 1 to form an anodized film having a predetermined film thickness.
From the above surface treatment A, the support S1 of the example was obtained.
 上記で得られた第2陽極酸化処理工程後のマイクロポアを有する陽極酸化皮膜中の大径孔部の陽極酸化皮膜表面における平均径(nm)、小径孔部の連通位置における平均径(nm)、大径孔部及び小径孔部の深さ(nm)、ピット密度(マイクロポアの密度、単位;個/μm)、並びに、小径孔部の底部からアルミニウム板表面までの陽極酸化皮膜の厚み(nm)を、表2にまとめて示す。
 なお、マイクロポアの平均径(大径孔部及び小径孔部の平均径)は、大径孔部表面及び小径孔部表面を倍率15万倍のFE-SEMでN=4枚観察し、得られた4枚の画像において、400nm×600nmの範囲に存在するマイクロポア(大径孔部及び小径孔部)の径を測定し、平均した値である。なお、大径孔部の深さが深く、小径孔部の径が測定しづらい場合、及び、小径孔部中の拡径孔部の測定を行う場合は、陽極酸化皮膜上部を切削し、その後各種径を求めた。
 マイクロポアの深さ(大径孔部及び小径孔部の深さ)は、支持体(陽極酸化皮膜)の断面をFE-SEMで観察し(大径孔部深さ観察:15万倍、小径孔部深さ観察:5万倍)、得られた画像において、任意のマイクロポア25個の深さを測定し、平均した値である。
 なお、表1中、第1陽極酸化処理欄の皮膜量(AD)量と第2陽極酸化処理欄の皮膜量(AD)とは、各処理で得られた皮膜量を表す。なお、使用される電解液は、表1中の成分を含む水溶液である。
The average diameter (nm) on the surface of the anodic oxide film of the large-diameter pores in the anodic oxide film having micropores after the second anodic oxidation treatment step obtained above, and the average diameter (nm) at the communication position of the small-diameter pores. , Depth (nm) of large and small holes, pit density (micropore density, unit; piece / μm 2 ), and thickness of anodic oxide film from the bottom of the small holes to the surface of the aluminum plate. (Nm) are summarized in Table 2.
The average diameter of the micropores (average diameter of the large-diameter hole and the small-diameter hole) was obtained by observing the surface of the large-diameter hole and the surface of the small-diameter hole with N = 4 sheets at a magnification of 150,000 times. The diameters of the micropores (large-diameter hole portion and small-diameter hole portion) existing in the range of 400 nm × 600 nm were measured and averaged in the four images obtained. When the depth of the large-diameter hole is deep and it is difficult to measure the diameter of the small-diameter hole, or when measuring the enlarged hole in the small-diameter hole, the upper part of the anodic oxide film is cut, and then Various diameters were calculated.
For the depth of the micropores (depth of the large-diameter hole and the small-diameter hole), observe the cross section of the support (anodic oxide film) with FE-SEM (observation of the depth of the large-diameter hole: 150,000 times, small diameter). (Observation of hole depth: 50,000 times), in the obtained image, the depths of 25 arbitrary micropores were measured and averaged.
In Table 1, the amount of film (AD) in the first anodizing treatment column and the amount of film (AD) in the second anodizing treatment column represent the amount of film obtained in each treatment. The electrolytic solution used is an aqueous solution containing the components in Table 1.
<<表面処理B>>
〔大径孔部を有する支持体〕
(B-a)アルカリエッチング処理
 アルミニウム板に、カセイソーダ濃度26質量%、アルミニウムイオン濃度6.5質量%のカセイソーダ水溶液を、温度70℃でスプレー管により吹き付けてエッチング処理を行った。その後、スプレーによる水洗を行った。後に電気化学的粗面化処理を施す面のアルミニウム溶解量は、1.0g/mであった。
<< Surface Treatment B >>
[Support with large diameter hole]
(BA) Alkaline Etching Treatment An aqueous caustic soda solution having a caustic soda concentration of 26% by mass and an aluminum ion concentration of 6.5% by mass was sprayed onto an aluminum plate at a temperature of 70 ° C. by a spray tube to perform an etching treatment. Then, it was washed with water by spraying. The amount of aluminum dissolved on the surface to be subjected to the electrochemical roughening treatment later was 1.0 g / m 2 .
(B-b)酸性水溶液中でのデスマット処理(第1デスマット処理)
 次に、酸性水溶液中でデスマット処理を行った。デスマット処理に用いる酸性水溶液は、硫酸150g/Lの水溶液を用いた。その液温は30℃であった。デスマット液はスプレーにより吹き付けて、3秒間デスマット処理した。その後、水洗処理を行った。
(Bb) Desmat treatment in an acidic aqueous solution (first desmat treatment)
Next, a desmat treatment was performed in an acidic aqueous solution. As the acidic aqueous solution used for the desmat treatment, an aqueous solution of sulfuric acid of 150 g / L was used. The liquid temperature was 30 ° C. The desmat solution was sprayed and treated with desmat for 3 seconds. Then, it was washed with water.
(B-c)塩酸水溶液中での電気化学的粗面化処理
 次に、塩酸濃度14g/L、アルミニウムイオン濃度13g/L、硫酸濃度3g/Lの電解液を用い、交流電流を用いて電解粗面化処理を行った。電解液の液温は30℃であった。アルミニウムイオン濃度は塩化アルミニウムを添加して調整した。
 交流電流の波形は正と負の波形が対称な正弦波であり、周波数は50Hz、交流電流1周期におけるアノード反応時間とカソード反応時間は1:1、電流密度は交流電流波形のピーク電流値で75A/dmであった。また、電気量はアルミニウム板がアノード反応に預かる電気量の総和で450C/dmであり、電解処理は125C/dmずつ4秒間の通電間隔を開けて4回に分けて行った。アルミニウム板の対極にはカーボン電極を用いた。その後、水洗処理を行った。
(BC) Electrochemical roughening treatment in an aqueous hydrochloric acid solution Next, electrolysis using an electrolytic solution having a hydrochloric acid concentration of 14 g / L, an aluminum ion concentration of 13 g / L, and a sulfuric acid concentration of 3 g / L was used. Roughening treatment was performed. The temperature of the electrolytic solution was 30 ° C. The aluminum ion concentration was adjusted by adding aluminum chloride.
The AC current waveform is a sinusoidal wave with symmetrical positive and negative waveforms, the frequency is 50 Hz, the anode reaction time and cathode reaction time in one AC current cycle are 1: 1, and the current density is the peak current value of the AC current waveform. It was 75 A / dm 2 . The total amount of electricity stored in the anodic reaction of the aluminum plate was 450 C / dm 2 , and the electrolysis treatment was carried out in 4 steps with an energization interval of 125 C / dm 2 for 4 seconds. A carbon electrode was used as the counter electrode of the aluminum plate. Then, it was washed with water.
(B-d)アルカリエッチング処理
 電気化学的粗面化処理後のアルミニウム板を、カセイソーダ濃度5質量%、アルミニウムイオン濃度0.5質量%のカセイソーダ水溶液を、温度45℃でスプレー管により吹き付けてエッチング処理を行った。電気化学的粗面化処理が施された面のアルミニウムの溶解量は0.2g/mであった。その後、水洗処理を行った。
(Bd) Alkaline etching treatment The aluminum plate after the electrochemical roughening treatment is etched by spraying an aqueous solution of caustic soda having a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass with a spray tube at a temperature of 45 ° C. Processing was performed. The dissolved amount of aluminum on the surface subjected to the electrochemical roughening treatment was 0.2 g / m 2 . Then, it was washed with water.
(B-e)酸性水溶液中でのデスマット処理
 次に、酸性水溶液中でのデスマット処理を行った。デスマット処理に用いる酸性水溶液は、陽極酸化処理工程で発生した廃液(硫酸170g/L水溶液中にアルミニウムイオン5.0g/L溶解)を用いた。液温は30℃であった。デスマット液はスプレーに吹き付けて3秒間デスマット処理を行った。
(B) Desmat treatment in an acidic aqueous solution Next, a desmat treatment in an acidic aqueous solution was performed. As the acidic aqueous solution used for the desmat treatment, a waste liquid (aluminum ion 5.0 g / L dissolved in a sulfuric acid 170 g / L aqueous solution) generated in the anodizing treatment step was used. The liquid temperature was 30 ° C. The desmat solution was sprayed on a spray to perform a desmat treatment for 3 seconds.
(B-f)第1陽極酸化処理
 図5に示す構造の直流電解による陽極酸化装置を用いて第1段階の陽極酸化処理を行った。表1に示す条件にて陽極酸化処理を行い、所定の皮膜厚の陽極酸化皮膜を形成した。
(BF) First Anodizing Treatment The first stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. Anodizing was performed under the conditions shown in Table 1 to form an anodized film having a predetermined film thickness.
(B-g)ポアワイド処理
 上記陽極酸化処理したアルミニウム板を、温度35℃、カセイソーダ濃度5質量%、アルミニウムイオン濃度0.5質量%のカセイソーダ水溶液に表1に示す条件にて浸漬し、ポアワイド処理を行った。その後、スプレーによる水洗を行った。
 以上の表面処理Bから、実施例の支持体S2を得た。得られた支持体S2の詳細を表2にまとめて示す。
(Bg) Pore Wide Treatment The anodized aluminum plate is immersed in a caustic soda aqueous solution having a temperature of 35 ° C., a caustic soda concentration of 5% by mass, and an aluminum ion concentration of 0.5% by mass under the conditions shown in Table 1 for pore wide treatment. Was done. Then, it was washed with water by spraying.
From the above surface treatment B, the support S2 of the example was obtained. The details of the obtained support S2 are summarized in Table 2.
Figure JPOXMLDOC01-appb-T000082
Figure JPOXMLDOC01-appb-T000082
Figure JPOXMLDOC01-appb-T000083
Figure JPOXMLDOC01-appb-T000083
 得られた支持体S1を支持体Aとして、支持体S2を支持体Bとして使用した。
 支持体Aは、大径孔部及び小径孔部を有するマイクロポアを有し、マイクロポアの平均径は15nmであり、L値は80であった。
 支持体Bは、大径孔部のみを有するマイクロポアを有し、マイクロポアの平均径は60nmであり、L値は85であった。
The obtained support S1 was used as the support A, and the support S2 was used as the support B.
The support A had micropores having a large-diameter hole and a small-diameter hole, and the average diameter of the micropores was 15 nm, and the L * value was 80.
The support B had micropores having only large-diameter holes, the average diameter of the micropores was 60 nm, and the L * value was 85.
<下塗り層塗布液の調製>
 下記組成の下塗り層塗布液を調製した。
(下塗り層塗布液)
・ポリマー(UC-1)(下記):0.18質量部
・ヒドロキシエチルイミノ二酢酸:0.10質量部
・水:61.4質量部
<Preparation of undercoat layer coating solution>
An undercoat layer coating solution having the following composition was prepared.
(Undercoat layer coating liquid)
-Polymer (UC-1) (below): 0.18 parts by mass-Hydroxyethyliminodiacetic acid: 0.10 parts by mass-Water: 61.4 parts by mass
Figure JPOXMLDOC01-appb-C000084
Figure JPOXMLDOC01-appb-C000084
<保護層塗布液の調製>
・無機層状化合物分散液(1)〔下記〕:1.5部
・ポリビニルアルコール(CKS50、日本合成化学工業(株)製、スルホン酸変性、けん化度99モル%以上、重合度300)6質量%水溶液:0.55部
・ポリビニルアルコール(PVA-405、(株)クラレ製、けん化度81.5モル%、重合度500)6質量%水溶液:0.03部
・界面活性剤(ポリオキシエチレンラウリルエーテル、エマレックス710、日本エマルジョン(株)製)1質量%水溶液:0.86部
・イオン交換水:6.0部 
<Preparation of protective layer coating solution>
-Inorganic layered compound dispersion (1) [below]: 1.5 parts-Polyvinyl alcohol (CKS50, manufactured by Nippon Synthetic Chemical Industry Co., Ltd., sulfonic acid modification, saponification degree 99 mol% or more, degree of polymerization 300) 6% by mass Aqueous solution: 0.55 parts ・ Polyvinyl alcohol (PVA-405, manufactured by Kuraray Co., Ltd., saponification degree 81.5 mol%, degree of polymerization 500) 6% by mass Aqueous solution: 0.03 parts ・ Surfactant (polyoxyethylene lauryl) Ether, Emarex 710, manufactured by Nippon Emulsion Co., Ltd.) 1% by mass aqueous solution: 0.86 parts, ion-exchanged water: 6.0 parts
 上記保護層塗布液に用いた無機層状化合物分散液(1)の調製法を以下に示す。 The preparation method of the inorganic layered compound dispersion liquid (1) used in the protective layer coating liquid is shown below.
-無機層状化合物分散液(1)の調製-
 イオン交換水193.6部に合成雲母(ソマシフME-100、コープケミカル(株)製)6.4部を添加し、ホモジナイザーを用いて平均粒径(レーザー散乱法)が3μmになるまで分散した。得られた分散粒子のアスペクト比は100以上であった。
-Preparation of inorganic layered compound dispersion (1)-
6.4 parts of synthetic mica (Somasif ME-100, manufactured by CO-OP CHEMICAL CO., LTD.) Was added to 193.6 parts of ion-exchanged water, and dispersed using a homogenizer until the average particle size (laser scattering method) became 3 μm. .. The aspect ratio of the obtained dispersed particles was 100 or more.
<画像記録層塗布液の調製>
 下記感光液(1)、及び、表3~表5の記載に従い、画像記録層塗布液を作製した。表3~表5で示す各素材の添加量は、固形分量である。なお、ポリマー粒子を含む画像記録層塗布液の調製は、ポリマー粒子以外の表3~表5に記載の成分を混合した感光液と、ポリマー粒子分散液とを、表3~表5に記載の組成となるように塗布直前に混合し撹拌することにより調整した。
<Preparation of image recording layer coating liquid>
An image recording layer coating liquid was prepared according to the following photosensitive liquid (1) and the description in Tables 3 to 5. The amount of each material added shown in Tables 3 to 5 is the amount of solid content. For the preparation of the image recording layer coating liquid containing the polymer particles, the photosensitive liquid in which the components shown in Tables 3 to 5 other than the polymer particles are mixed and the polymer particle dispersion liquid are shown in Tables 3 to 5. The composition was adjusted by mixing and stirring immediately before coating.
-感光液(1)-
・表3~表5に記載の電子受容型重合開始剤:表3~表5に記載の量
・表3~表5に記載の赤外線吸収性ポリメチン色素:表3~表5に記載の量
・表3~表5に記載の電子供与型重合開始剤:表3~表5に記載の量
・表3~表5に記載の重合性化合物:表3~表5に記載の量
・表3~表5に記載のポリマー粒子:表3~表5に記載の量
・表3~表5に記載のバインダーポリマー:表3~表5に記載の量
・表3~表5に記載のロイコ色素(酸発色剤):表3~表5に記載の量
・表3~表5に記載の界面活性剤:表3~表5に記載の量
・2-ブタノン:1.091質量部
・1-メトキシ-2-プロパノール:8.609質量部
・蒸留水:2.425質量部
-Photosensitive liquid (1)-
-Electronic-accepting polymerization initiators shown in Tables 3 to 5: Amounts shown in Tables 3 to 5-Infrared absorbing polymer dyes shown in Tables 3 to 5: Amounts shown in Tables 3 to 5. Electron-donated polymerization initiators shown in Tables 3 to 5: Amounts shown in Tables 3 to 5 ・ Polymerizable compounds shown in Tables 3 to 5: Amounts shown in Tables 3 to 5 ・ Tables 3 to 3 Polymer particles shown in Table 5: Amounts shown in Tables 3 to 5 ・ Binder polymers shown in Tables 3 to 5: Amounts shown in Tables 3 to 5 ・ Leuco dyes shown in Tables 3 to 5 ( Acid color-developing agent): Amount shown in Tables 3 to 5 ・ Surfactant shown in Tables 3 to 5: Amount shown in Tables 3 to 5 ・ 2-Butanone: 1.091 parts by mass ・ 1-methoxy -2-Propanol: 8.609 parts by mass ・ Distilled water: 2.425 parts by mass
(実施例1~28、及び、比較例1~4)
<平版印刷版原版の作製>
 表3~表5に記載の上記支持体A又はB上に、上記組成の下塗り層塗布液を乾燥塗布量が10mg/mになるように塗布して下塗り層を形成した。下塗り層上に、表3~表5に記載の各画像記録層塗布液をバー塗布し、120℃で40秒間オーブン乾燥して、乾燥塗布量1.0g/mの画像記録層を形成した。
 画像記録層塗布液は、ポリマー粒子を塗布直前に混合し撹拌することにより調製した。
 必要に応じ、画像記録層上に、上記組成の保護層塗布液をバー塗布し、120℃で60秒間オーブン乾燥して、乾燥塗布量0.15g/mの保護層を形成した。
 保護層を形成した例については、表3~表5中の保護層の欄に「あり」と記載した。
(Examples 1 to 28 and Comparative Examples 1 to 4)
<Preparation of lithographic printing plate original plate>
An undercoat layer coating solution having the above composition was applied onto the supports A or B shown in Tables 3 to 5 so that the dry coating amount was 10 mg / m 2 to form an undercoat layer. Each of the image recording layer coating solutions shown in Tables 3 to 5 was bar-coated on the undercoat layer and dried in an oven at 120 ° C. for 40 seconds to form an image recording layer having a dry coating amount of 1.0 g / m 2 . ..
The image recording layer coating liquid was prepared by mixing and stirring the polymer particles immediately before coating.
If necessary, a protective layer coating solution having the above composition was bar-coated on the image recording layer and dried in an oven at 120 ° C. for 60 seconds to form a protective layer having a dry coating amount of 0.15 g / m 2 .
For the example in which the protective layer was formed, "Yes" was described in the column of the protective layer in Tables 3 to 5.
<平版印刷版原版の評価>
 上記のようにして作製した平版印刷版原版を、赤外線半導体レーザー搭載のKodak社製Magnus800 Quantumにて、出力27W、外面ドラム回転数450rpm、解像度2,400dpi(dot per inch、1inchは2.54cm)の条件で露光(照射エネルギー110mJ/cm相当)した。露光画像にはベタ画像、及び、AMスクリーン(Amplitude Modulation Screen)3%網点のチャートを含むようにした。
<Evaluation of lithographic printing plate original plate>
The lithographic printing plate original plate produced as described above is mounted on a Magnus 800 Quantum manufactured by Kodak equipped with an infrared semiconductor laser, and has an output of 27 W, an outer drum rotation speed of 450 rpm, and a resolution of 2,400 dpi (dot per inch, 1 inch is 2.54 cm). Exposure was performed under the conditions of (corresponding to irradiation energy of 110 mJ / cm 2 ). The exposed image includes a solid image and a chart of 3% halftone dots on the AM screen (Amplitude Modulation Screen).
(1)機上現像性
  得られた露光済み原版を現像処理することなく、菊判サイズのハイデルベルグ社製印刷機SX-74のシリンダーに取り付けた。本印刷機には、不織布フィルターと温度制御装置を内蔵する容量100Lの湿し水循環タンクを接続した。湿し水S-Z1(富士フイルム(株)製)2.0%の湿し水80Lを循環装置内に仕込み、印刷インキとしてT&K UV OFS K-HS墨GE-M((株)T&K TOKA製)を用い、標準の自動印刷スタート方法で湿し水とインキを供給した後、毎時10,000枚の印刷速度で特菱アート(連量:76.5kg、三菱製紙(株)製)紙に500枚印刷を行った。
 上記機上現像において、非画像部にインキが転写しない状態になるまでに要した印刷用紙の枚数を機上現像性として計測した。計測結果は表3~表5に記載した。上記枚数が少ないほど、機上現像性が良好であるといえる。
(1) Machine-Developability The obtained exposed original plate was attached to the cylinder of a chrysanthemum-sized Heidelberg printing machine SX-74 without developing. A non-woven fabric filter and a dampening water circulation tank having a capacity of 100 L containing a temperature control device were connected to the printing machine. Damping water S-Z1 (manufactured by Fujifilm Co., Ltd.) 2.0% dampening water 80L is charged in the circulation device, and T & K UV OFS K-HS ink GE-M (manufactured by T & K TOKA Co., Ltd.) is used as printing ink. ) Is used to supply dampening water and ink using the standard automatic printing start method, and then printed on Tokuryo Art (ream amount: 76.5 kg, manufactured by Mitsubishi Paper Co., Ltd.) at a printing speed of 10,000 sheets per hour. 500 sheets were printed.
In the above-mentioned on-machine development, the number of printing papers required until the ink was not transferred to the non-image area was measured as the on-machine developability. The measurement results are shown in Tables 3 to 5. It can be said that the smaller the number of sheets, the better the on-machine developability.
(2)紫外線硬化型インキ耐刷性(UV耐刷性)
 上述した機上現像性の評価を行った後、更に印刷を続けた。印刷枚数を増やしていくと徐々に画像部が磨耗するため印刷物上のインキ濃度が低下した。印刷物におけるAMスクリーン3%網点の網点面積率をグレタグ濃度計(GretagMacbeth社製)で計測した値が、印刷500枚目の計測値よりも1%低下したときの印刷部数を刷了枚数として耐刷性を評価した。印刷枚数が5万枚の場合を100とする相対耐刷性により評価した。数値が大きいほど、耐刷性が良好である。評価結果は表3~表5に記載した。
  相対耐刷性=(対象平版印刷版原版の印刷枚数)/50,000×100
(2) UV curable ink print resistance (UV print resistance)
After evaluating the on-machine developability described above, printing was continued. As the number of printed sheets was increased, the image portion was gradually worn, and the ink density on the printed matter decreased. The number of printed copies is taken as the number of printed copies when the value measured by the Gretag densitometer (manufactured by Gretag Macbeth) for the halftone dot area ratio of the AM screen 3% halftone dot in the printed matter is 1% lower than the measured value of the 500th printed sheet. The print resistance was evaluated. The evaluation was made based on the relative printing resistance of 100 when the number of printed sheets was 50,000. The larger the value, the better the printing durability. The evaluation results are shown in Tables 3 to 5.
Relative printing resistance = (number of prints of target lithographic printing plate original plate) / 50,000 x 100
(3)UV版飛び抑制性
 上記のようにして作製した平版印刷版原版を、赤外線半導体レーザー搭載のKodak社製Magnus800 Quantumにて、出力27W、外面ドラム回転数450rpm、解像度2,400dpi(dot per inch、1inchは2.54cm)の条件で露光(照射エネルギー110mJ/cm相当)した。露光画像にはベタ画像、及び、AMスクリーン(Amplitude Modulated Screening)3%網点のチャートを含むようにした。
 得られた露光済み原版の網点部に、直径0.4mmのピアノ線((株)エスコ製)を版胴の回転方向に対して垂直方向に貼り付け、現像処理することなく、菊判サイズのハイデルベルグ社製印刷機SX-74のシリンダーに取り付けた。本印刷機には、不織布フィルターと温度制御装置を内蔵する容量100Lの湿し水循環タンクを接続した。湿し水S-Z1(富士フイルム(株)製)2.0%の湿し水80Lを循環装置内に仕込み、印刷インキとしてT&K UV OFS K-HS墨GE-M((株)T&K TOKA製)を用い、標準の自動印刷スタート方法で湿し水とインキを供給した後、毎時10,000枚の印刷速度で特菱アート(三菱製紙(株)製、連量:76.5kg)紙に印刷を行った。
 印刷枚数が2,000枚に達したところで、版からピアノ線を取り外し、再度印刷機にセットし、印刷を開始した。再開後100枚目の印刷物を確認し、ピアノ線の位置に対応する画像部を確認し、着肉不良が生じているか50倍拡大鏡を用いて目視で確認した。同様に2,000枚ごとに確認を行い、着肉不良が生じた段階で評価を終了した。評価結果は表3~表5に記載した。
-評価基準-
  A:平版印刷版における「版飛び」を起こすまでの印刷枚数が20,000枚以上である。
  B:平版印刷版における「版飛び」を起こすまでの印刷枚数が4,000枚以上20,000枚未満である。
  C:平版印刷版における「版飛び」を起こすまでの印刷枚数が4,000枚未満である。
(3) UV plate skipping suppression The lithographic printing plate original plate produced as described above was subjected to a Magnus 800 Quantum manufactured by Kodak equipped with an infrared semiconductor laser, and had an output of 27 W, an outer drum rotation speed of 450 rpm, and a resolution of 2,400 dpi (dot per). Exposure (corresponding to irradiation energy 110 mJ / cm 2 ) was performed under the condition of inch (1 inch is 2.54 cm). The exposed image includes a solid image and a chart of AM screen (Amplitude Modified Screening) 3% halftone dots.
A piano wire (manufactured by Esco Co., Ltd.) with a diameter of 0.4 mm is attached to the halftone dots of the obtained exposed original plate in a direction perpendicular to the rotation direction of the plate cylinder, and is of chrysanthemum size without development processing. It was attached to the cylinder of the Heidelberg printing machine SX-74. A non-woven fabric filter and a dampening water circulation tank having a capacity of 100 L containing a temperature control device were connected to the printing machine. Damping water S-Z1 (manufactured by Fujifilm Co., Ltd.) 2.0% dampening water 80L is charged in the circulation device, and T & K UV OFS K-HS ink GE-M (manufactured by T & K TOKA Co., Ltd.) is used as printing ink. ) Is used to supply dampening water and ink using the standard automatic printing start method, and then printed on Tokuryo Art (manufactured by Mitsubishi Paper Co., Ltd., continuous weight: 76.5 kg) at a printing speed of 10,000 sheets per hour. I printed it.
When the number of printed sheets reached 2,000, the piano wire was removed from the plate, set in the printing machine again, and printing was started. After resuming, the 100th printed matter was confirmed, the image part corresponding to the position of the piano wire was confirmed, and it was visually confirmed using a 50x magnifying glass whether or not the inking defect had occurred. Similarly, confirmation was performed every 2,000 sheets, and the evaluation was completed when poor meat formation occurred. The evaluation results are shown in Tables 3 to 5.
-Evaluation criteria-
A: The number of printed sheets until "plate skipping" occurs in the lithographic printing plate is 20,000 or more.
B: The number of printed sheets until "plate skipping" occurs in the lithographic printing plate is 4,000 or more and less than 20,000.
C: The number of printed sheets until "plate skipping" occurs in the lithographic printing plate is less than 4,000.
(4)特色着肉性(特色インキ着肉性)
 インキとして特色インキEpple Pantone Blau 072C(Epple社製インキ)を用いた以外は、上記耐刷性と同様に印刷を行った。1万枚目の印刷用紙をサンプリングし、20%FM網点部のインキ濃度をグレタグ濃度計で調べた。その測定値(小数点2桁目は四捨五入した。)を基に特色インキ着肉性の評価を次の指標で表3~表5に示す。
-評価基準-
  A:インキ濃度1.8~1.9:全くインキ濃度低下なく、インキ着肉性良好。
  B:インキ濃度1.5~1.7:ややインキ濃度低下しているが許容レベル。
  C:インキ濃度1.0~1.4:はっきりとインキ濃度低下しており、許容できないレベル。
  D:インキ濃度0.9以下:インキ濃度低下著しく劣悪。
(4) Spot color onset (spot color ink onset)
Printing was performed in the same manner as in the above-mentioned printing durability except that the special color ink Apple Pantone Blau 072C (an ink manufactured by Apple Inc.) was used as the ink. The 10,000th printing paper was sampled, and the ink density at the 20% FM halftone dots was examined with a Gretag densitometer. Based on the measured value (the second decimal place is rounded off), the evaluation of the special color ink inking property is shown in Tables 3 to 5 as the following indexes.
-Evaluation criteria-
A: Ink density 1.8 to 1.9: No decrease in ink density and good ink inking property.
B: Ink density 1.5 to 1.7: The ink density is slightly reduced, but it is an acceptable level.
C: Ink density 1.0 to 1.4: The ink density is clearly reduced, which is an unacceptable level.
D: Ink density 0.9 or less: Ink density decrease is extremely poor.
(5)機上現像時における現像カス抑制性(機上現像カス抑制性)
 上記UV耐刷性の評価において印刷を行った後、同時に水着けローラ上の除去カスの付着状況を評価した。指標は以下の通りである。評価結果を表3~表5に記載した。
  5:水着けローラ上にカスは見られない。
  4:かすかに水着けローラ上にカスが見られる。
  3:水着けローラ上にカスが見られる。
  2:水着けローラ上にカスが多く見られる。
  1:水着けローラ上にカスが非常に多く見られる。
(5) Development residue suppression property during on-machine development (on-machine development residue suppression property)
After printing in the above evaluation of UV printing resistance, the state of adhesion of the removal residue on the watering roller was evaluated at the same time. The indicators are as follows. The evaluation results are shown in Tables 3 to 5.
5: No residue can be seen on the watering roller.
4: Slightly dregs can be seen on the watering roller.
3: Scraps can be seen on the watering roller.
2: Many debris can be seen on the watering roller.
1: Very many debris can be seen on the watering roller.
Figure JPOXMLDOC01-appb-T000085
Figure JPOXMLDOC01-appb-T000085
Figure JPOXMLDOC01-appb-T000086
Figure JPOXMLDOC01-appb-T000086
Figure JPOXMLDOC01-appb-T000087
Figure JPOXMLDOC01-appb-T000087
 表3~表5における各成分欄の数値の単位は、質量部であり、固形分量を表す。
 また、表3~表5におけるΔHOMOは、ポリメチン色素のHOMO-電子供与型重合開始剤のHOMOの値である。
 表3~表5に記載の略称の詳細を、以下に示す。
 電子受容型重合開始剤I-1~I-4及びI’-1:下記化合物
The unit of the numerical value in each component column in Tables 3 to 5 is a part by mass and represents the amount of solid content.
Further, ΔHOMO in Tables 3 to 5 is a value of HOMO of the HOMO-electron donating type polymerization initiator of the polymethine dye.
Details of the abbreviations shown in Tables 3 to 5 are shown below.
Electron-accepting polymerization initiators I-1 to I-4 and I'-1: The following compounds
Figure JPOXMLDOC01-appb-C000088
Figure JPOXMLDOC01-appb-C000088
 赤外線吸収性ポリメチン色素D-1~D-4、D’-1及びD’-2:下記化合物 Infrared absorbing polymethine dyes D-1 to D-4, D'-1 and D'-2: The following compounds
Figure JPOXMLDOC01-appb-C000089
Figure JPOXMLDOC01-appb-C000089
Figure JPOXMLDOC01-appb-C000090
Figure JPOXMLDOC01-appb-C000090
 電子供与型重合開始剤T-1:ナトリウムテトラフェニルボレート
 重合性化合物M-1:U-15HA:下記化合物を含むウレタンアクリレート(新中村化学工業(株)製)
Electron-donated polymerization initiator T-1: Sodium tetraphenylborate Polymerizable compound M-1: U-15HA: Urethane acrylate containing the following compounds (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.)
Figure JPOXMLDOC01-appb-C000091
Figure JPOXMLDOC01-appb-C000091
 重合性化合物M-2:ジペンタエリスリトールペンタアクリレート、SR-399、サートマー社製
 重合性化合物M-3:トリス(アクリロイルオキシエチル)イソシアヌレート、NKエステル A-9300、新中村化学工業(株)製
Polymerizable Compound M-2: Dipentaerythritol Pentaacrylate, SR-399, manufactured by Sartmer Polymerized Compound M-3: Tris (acryloyloxyethyl) isocyanurate, NK ester A-9300, manufactured by Shin-Nakamura Chemical Industry Co., Ltd.
 ポリマー粒子R-1:ポリマー粒子(下記ミクロゲル(1))、なお、ポリマー粒子R-1を含む画像記録層塗布液の調製は、下記ミクロゲル液以外の表3又は表4に記載の成分を混合した感光液と、下記ミクロゲル液とを塗布直前に混合し撹拌することにより調製した。 Polymer particles R-1: Polymer particles (microgel (1) below), and the image recording layer coating liquid containing the polymer particles R-1 is prepared by mixing the components shown in Table 3 or Table 4 other than the microgel liquid below. The photosensitive liquid and the following microgel liquid were mixed and stirred immediately before application.
-ミクロゲル液の調製-
・ミクロゲル(1)(ポリマー粒子R-1):2.640部
・蒸留水:2.425部
-Preparation of microgel solution-
-Microgel (1) (polymer particle R-1): 2.640 parts-Distilled water: 2.425 parts
 上記ミクロゲル液に用いたミクロゲル(1)の調製法を以下に示す。 The preparation method of the microgel (1) used in the above microgel solution is shown below.
-多価イソシアネート化合物(1)の調製-
 イソホロンジイソシアネート17.78g(80mmol)と下記多価フェノール化合物(1)7.35g(20mmol)との酢酸エチル(25.31g)懸濁溶液に、ビスマストリス(2-エチルヘキサノエート)(ネオスタン U-600、日東化成(株)製)43mgを加えて撹拌した。発熱が収まった時点で反応温度を50℃に設定し、3時間撹拌して多価イソシアネート化合物(1)の酢酸エチル溶液(50質量%)を得た。
-Preparation of multivalent isocyanate compound (1)-
Bismuth tris (2-ethylhexanoate) (neostan U) in a suspension solution of ethyl acetate (25.31 g) containing 17.78 g (80 mmol) of isophorone diisocyanate and 7.35 g (20 mmol) of the following polyhydric phenol compound (1). -600, 43 mg manufactured by Nitto Kasei Co., Ltd. was added and stirred. When the exotherm subsided, the reaction temperature was set to 50 ° C., and the mixture was stirred for 3 hours to obtain an ethyl acetate solution (50% by mass) of the polyvalent isocyanate compound (1).
Figure JPOXMLDOC01-appb-C000092
Figure JPOXMLDOC01-appb-C000092
-ミクロゲル(1)の調製-
 下記油相成分及び水相成分を混合し、ホモジナイザーを用いて12,000rpmで10分間乳化した。得られた乳化物を45℃で4時間撹拌後、1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン-オクチル酸塩(U-CAT SA102、サンアプロ(株)製)の10質量%水溶液5.20gを加え、室温で30分撹拌し、45℃で24時間静置した。蒸留水で、固形分濃度を20質量%になるように調整し、ミクロゲル(1)の水分散液が得られた。光散乱法により平均粒径を測定したところ、0.28μmであった。
-Preparation of microgel (1)-
The following oil phase components and aqueous phase components were mixed and emulsified at 12,000 rpm for 10 minutes using a homogenizer. After stirring the obtained emulsion at 45 ° C. for 4 hours, 10 mass of 1,8-diazabicyclo [5.4.0] undec-7-ene-octylate (U-CAT SA102, manufactured by San-Apro Co., Ltd.) 5.20 g of% aqueous solution was added, the mixture was stirred at room temperature for 30 minutes, and allowed to stand at 45 ° C. for 24 hours. The solid content concentration was adjusted to 20% by mass with distilled water to obtain an aqueous dispersion of microgel (1). When the average particle size was measured by the light scattering method, it was 0.28 μm.
~油相成分~
 (成分1)酢酸エチル:12.0g
 (成分2)トリメチロールプロパン(6モル)とキシレンジイソシアネート(18モル)を付加させ、これに片末端メチル化ポリオキシエチレン(1モル、オキシエチレン単位の繰返し数:90)を付加させた付加体(50質量%酢酸エチル溶液、三井化学(株)製):3.76g
 (成分3)多価イソシアネート化合物(1)(50質量%酢酸エチル溶液として):15.0g
 (成分4)ジペンタエリスリトールペンタアクリレート(SR-399、サートマー社製)の65質量%酢酸エチル溶液:11.54g
 (成分5)スルホン酸塩型界面活性剤(パイオニンA-41-C、竹本油脂(株)製)の10%酢酸エチル溶液:4.42g
~ Oil phase component ~
(Component 1) Ethyl acetate: 12.0 g
(Component 2) Addition in which trimethylolpropane (6 mol) and xylene diisocyanate (18 mol) are added, and one-terminal methylated polyoxyethylene (1 mol, number of repetitions of oxyethylene unit: 90) is added thereto. (50 mass% ethyl acetate solution, manufactured by Mitsui Kagaku Co., Ltd.): 3.76 g
(Component 3) Multivalent isocyanate compound (1) (as 50% by mass ethyl acetate solution): 15.0 g
(Component 4) 65 mass% ethyl acetate solution of dipentaerythritol pentaacrylate (SR-399, manufactured by Sartmer): 11.54 g
(Component 5) 10% ethyl acetate solution of sulfonate-type surfactant (Pionin A-41-C, manufactured by Takemoto Oil & Fat Co., Ltd .): 4.42 g
~水相成分~
 蒸留水:46.87g
~ Aqueous phase component ~
Distilled water: 46.87 g
 ポリマー粒子R-2:上述にて作製したポリマー粒子R-2
 ポリマー粒子R-3:上述にて作製したポリマー粒子R-3
 ポリマー粒子18~22:下記方法に作製した粒子18~22
Polymer particles R-2: Polymer particles R-2 produced above
Polymer particles R-3: Polymer particles R-3 produced above
Polymer particles 18-22: Particles 18-22 prepared by the following method
<ポリマー粒子18(粒子18)の作製>
-壁材Aの合成-
<Preparation of polymer particles 18 (particles 18)>
-Synthesis of wall material A-
Figure JPOXMLDOC01-appb-C000093
Figure JPOXMLDOC01-appb-C000093
 3つ口フラスコに、MR-200(式(Iso)で表される化合物、n=0~10、東ソー(株)製)7.5g、PETA(ペンタエリスリトールトリアクリレート、日本化薬(株)製、SR444)2.5g、及び酢酸エチル10gを加え、室温で撹拌した後、60℃に昇温した。
 次に、3つ口フラスコに、ネオスタンU-600を0.05g加え、3時間加熱撹拌した。その後、室温になるまで冷却し、壁材A(固形分50質量%)を得た。
In a three-necked flask, MR-200 (compound represented by formula (Iso), n = 0 to 10, manufactured by Toso Co., Ltd.) 7.5 g, PETA (pentaerythritol triacrylate, manufactured by Nippon Kayaku Co., Ltd.) , SR444), and 10 g of ethyl acetate were added, and the mixture was stirred at room temperature and then heated to 60 ° C.
Next, 0.05 g of Neostan U-600 was added to the three-necked flask, and the mixture was heated and stirred for 3 hours. Then, it cooled to room temperature, and wall material A (solid content 50% by mass) was obtained.
-壁材Bの合成-
 なお、下記式中、Meはメチル基を表す。
-Synthesis of wall material B-
In the following formula, Me represents a methyl group.
Figure JPOXMLDOC01-appb-C000094
Figure JPOXMLDOC01-appb-C000094
 3つ口フラスコに、D-110N(三井化学(株)製)5.0g、ユニオックスM-4000(日本油脂(株))5.0g、及び酢酸エチル10gを加え、室温で撹拌した後、60℃に昇温した。
 次に、3つ口フラスコに、ネオスタンU-600を0.05g加え、3時間加熱撹拌した。その後、室温になるまで冷却し、壁材B(固形分50質量%)を得た。
To a three-necked flask, 5.0 g of D-110N (manufactured by Mitsui Chemicals, Inc.), 5.0 g of Uniox M-4000 (NOF CORPORATION), and 10 g of ethyl acetate were added, and the mixture was stirred at room temperature. The temperature was raised to 60 ° C.
Next, 0.05 g of Neostan U-600 was added to the three-necked flask, and the mixture was heated and stirred for 3 hours. Then, it cooled to room temperature, and wall material B (solid content 50% by mass) was obtained.
-粒子18の合成-
 アルミカップに、パイオニンA-41-C(竹本油脂(株)製)0.45g、壁材A 14.99g、SR-399E(ジペンタエリスリトールペンタアクリレート、サートマー社製)7.49g、壁材B 3.78g、及び、酢酸エチル16.56gを添加し、室温で撹拌した。
 その後、アルミカップに、純水46.89gを添加し、ホモジナイザーにより12分間12,000rpmで撹拌した。その後、純水16.64gを更に添加し、45℃に昇温し、4時間加熱撹拌した。
 その後、U-CAT SA 102の10%水溶液5.17gを添加した。次に、恒温槽に容器を入れ、48時間熟成し、粒子18の分散液(固形分20%)を得た。
 粒子18のエチレン性不飽和結合価は2.01mmol/gである。
 また、粒子18のメジアン径は180nmであって、変動係数は29.1%であった。
 粒子18に含まれる樹脂を以下に示す。
 下記樹脂中、各化合物(モノマー)の下の添え字、また、括弧右下の添え字は含有比(質量比)を表す。
-Synthesis of particle 18-
In an aluminum cup, Pionin A-41-C (manufactured by Takemoto Oil & Fat Co., Ltd.) 0.45 g, wall material A 14.99 g, SR-399E (dipentaerythritol pentaacrylate, manufactured by Sartmer) 7.49 g, wall material B 3.78 g and 16.56 g of ethyl acetate were added, and the mixture was stirred at room temperature.
Then, 46.89 g of pure water was added to the aluminum cup, and the mixture was stirred with a homogenizer at 12,000 rpm for 12 minutes. Then, 16.64 g of pure water was further added, the temperature was raised to 45 ° C., and the mixture was heated and stirred for 4 hours.
Then, 5.17 g of a 10% aqueous solution of U-CAT SA 102 was added. Next, the container was placed in a constant temperature bath and aged for 48 hours to obtain a dispersion liquid (solid content 20%) of the particles 18.
The ethylenically unsaturated valency of the particles 18 is 2.01 mmol / g.
The median diameter of the particles 18 was 180 nm, and the coefficient of variation was 29.1%.
The resin contained in the particles 18 is shown below.
In the following resins, the subscripts under each compound (monomer) and the subscripts at the lower right of the parentheses indicate the content ratio (mass ratio).
Figure JPOXMLDOC01-appb-C000095
Figure JPOXMLDOC01-appb-C000095
<ポリマー粒子19(粒子19)の作製>
-壁材Bの合成-
 粒子18における壁材Bと同様な方法により合成した。
<Preparation of polymer particles 19 (particles 19)>
-Synthesis of wall material B-
It was synthesized by the same method as the wall material B in the particles 18.
-壁材Cの合成- -Synthesis of wall material C-
Figure JPOXMLDOC01-appb-C000096
Figure JPOXMLDOC01-appb-C000096
 3つ口フラスコに、上記化合物a1.5g、上記化合物b6.0g、上記化合物c2.5g、及び酢酸エチル10gを加え、室温で撹拌した後、60℃に昇温した。
 次に、3つ口フラスコに、ネオスタンU-600を0.05g加え、3時間加熱撹拌した。その後、室温になるまで冷却し、壁材C(固形分50質量%)を得た。
To a three-necked flask, 1.5 g of the above compound a, 6.0 g of the above compound b, 2.5 g of the above compound c, and 10 g of ethyl acetate were added, stirred at room temperature, and then heated to 60 ° C.
Next, 0.05 g of Neostan U-600 was added to the three-necked flask, and the mixture was heated and stirred for 3 hours. Then, it cooled to room temperature, and wall material C (solid content 50% by mass) was obtained.
-壁材Dの合成- -Synthesis of wall material D-
Figure JPOXMLDOC01-appb-C000097
Figure JPOXMLDOC01-appb-C000097
 3つ口フラスコに、D-110N(三井化学(株)製)5.0g、ユニセーフPKA5014-TF(日本油脂(株)製)5.0g、及び酢酸エチル10gを加え、室温で撹拌した後、60℃に昇温した。
 次に、3つ口フラスコに、ネオスタンU-600を0.05g加え、3時間加熱撹拌した。その後、室温になるまで冷却し、壁材D(固形分50質量%)を得た。
To a three-necked flask, 5.0 g of D-110N (manufactured by Mitsui Chemicals, Inc.), 5.0 g of Unisafe PKA5014-TF (manufactured by NOF CORPORATION), and 10 g of ethyl acetate were added, and the mixture was stirred at room temperature. The temperature was raised to 60 ° C.
Next, 0.05 g of Neostan U-600 was added to the three-necked flask, and the mixture was heated and stirred for 3 hours. Then, it cooled to room temperature, and wall material D (solid content 50% by mass) was obtained.
-粒子19の合成-
アルミカップに、パイオニンA-41-C(竹本油脂(株)製)0.45g、壁材C 14.99g、SR-399E 7.49g、壁材B 1.89g、壁材D 1.89g、及び、酢酸エチル16.56gを添加し、室温で撹拌した。
 その後、アルミカップに、純水46.89gを添加し、ホモジナイザーにより12分間12,000rpmで撹拌した。その後、純水16.64gを更に添加し、45℃に昇温し、4時間加熱撹拌した。
 その後、U-CAT SA 102の10%水溶液5.17gを添加した。次に、恒温槽に容器を入れ、48時間熟成し、粒子19の分散液(固形分20%)を得た。
 粒子19のエチレン性不飽和結合価は2.01mmol/gである。
 また、粒子19のメジアン径は200nmであって、変動係数は28.1%であった。
 粒子19に含まれる樹脂を以下に示す。
 下記樹脂中、各化合物(モノマー)の下の添え字、また、括弧右下の添え字は含有比(質量比)を表す。
-Synthesis of particles 19-
In an aluminum cup, Pionin A-41-C (manufactured by Takemoto Oil & Fat Co., Ltd.) 0.45 g, wall material C 14.99 g, SR-399E 7.49 g, wall material B 1.89 g, wall material D 1.89 g, And 16.56 g of ethyl acetate was added, and the mixture was stirred at room temperature.
Then, 46.89 g of pure water was added to the aluminum cup, and the mixture was stirred with a homogenizer at 12,000 rpm for 12 minutes. Then, 16.64 g of pure water was further added, the temperature was raised to 45 ° C., and the mixture was heated and stirred for 4 hours.
Then, 5.17 g of a 10% aqueous solution of U-CAT SA 102 was added. Next, the container was placed in a constant temperature bath and aged for 48 hours to obtain a dispersion liquid (solid content 20%) of the particles 19.
The ethylenically unsaturated valency of particle 19 is 2.01 mmol / g.
The median diameter of the particles 19 was 200 nm, and the coefficient of variation was 28.1%.
The resin contained in the particles 19 is shown below.
In the following resins, the subscripts under each compound (monomer) and the subscripts at the lower right of the parentheses indicate the content ratio (mass ratio).
Figure JPOXMLDOC01-appb-C000098
Figure JPOXMLDOC01-appb-C000098
<ポリマー粒子20(粒子20)の作製>
-壁材Cの合成-
 粒子19における壁材Cと同様な方法により合成した。
<Preparation of polymer particles 20 (particles 20)>
-Synthesis of wall material C-
It was synthesized by the same method as the wall material C in the particles 19.
-壁材Dの合成-
 粒子19における壁材Dと同様な方法により合成した。
-Synthesis of wall material D-
It was synthesized by the same method as the wall material D in the particles 19.
-粒子20の合成-
 アルミカップに、パイオニンA-41-C(竹本油脂(株)製)0.45g、壁材C 14.99g、SR-399E 7.49g、壁材D3.78g、及び、酢酸エチル16.56gを添加し、室温で撹拌した。
 その後、アルミカップに、純水46.89gを添加し、ホモジナイザーにより12分間12,000rpmで撹拌した。その後、純水16.64gを更に添加し、45℃に昇温し、4時間加熱撹拌した。
 その後、U-CAT SA 102の10%水溶液5.17gを添加した。次に、恒温槽に容器を入れ、48時間熟成し、粒子20の分散液(固形分20%)を得た。
 粒子20のエチレン性不飽和結合価は2.01mmol/gである。
 また、粒子20のメジアン径は195nmであって、変動係数は28.5%であった。
 粒子20に含まれる樹脂を以下に示す。
 下記樹脂中、各化合物(モノマー)の下の添え字、また、括弧右下の添え字は含有比(質量比)を表す。
-Synthesis of particles 20-
In an aluminum cup, 0.45 g of Pionin A-41-C (manufactured by Takemoto Oil & Fat Co., Ltd.), 14.99 g of wall material C, 7.49 g of SR-399E, 3.78 g of wall material D, and 16.56 g of ethyl acetate. It was added and stirred at room temperature.
Then, 46.89 g of pure water was added to the aluminum cup, and the mixture was stirred with a homogenizer at 12,000 rpm for 12 minutes. Then, 16.64 g of pure water was further added, the temperature was raised to 45 ° C., and the mixture was heated and stirred for 4 hours.
Then, 5.17 g of a 10% aqueous solution of U-CAT SA 102 was added. Next, the container was placed in a constant temperature bath and aged for 48 hours to obtain a dispersion liquid (solid content 20%) of the particles 20.
The ethylenically unsaturated valency of the particles 20 is 2.01 mmol / g.
The median diameter of the particles 20 was 195 nm, and the coefficient of variation was 28.5%.
The resin contained in the particles 20 is shown below.
In the following resins, the subscripts under each compound (monomer) and the subscripts at the lower right of the parentheses indicate the content ratio (mass ratio).
Figure JPOXMLDOC01-appb-C000099
Figure JPOXMLDOC01-appb-C000099
<ポリマー粒子21(粒子21)の作製>
-壁材Aの合成-
 粒子18における壁材Aと同様な方法により合成した。
<Preparation of polymer particles 21 (particles 21)>
-Synthesis of wall material A-
It was synthesized by the same method as the wall material A in the particles 18.
-壁材Bの合成-
 粒子18における壁材Bと同様な方法により合成した。
-Synthesis of wall material B-
It was synthesized by the same method as the wall material B in the particles 18.
-壁材Dの合成-
 粒子19における壁材Dと同様な方法により合成した。
-Synthesis of wall material D-
It was synthesized by the same method as the wall material D in the particles 19.
-粒子21の合成-
 アルミカップに、パイオニンA-41-C(竹本油脂(株)製)0.45g、壁材A 14.99g、SR-399E 7.49g、壁材B 1.89g、壁材D 1.89g、及び、酢酸エチル16.56gを添加し、室温で撹拌した。
 その後、アルミカップに、純水46.89gを添加し、ホモジナイザーにより12分間12,000rpmで撹拌した。その後、純水16.64gを更に添加し、45℃に昇温し、4時間加熱撹拌した。
 その後、U-CAT SA 102の10%水溶液5.17gを添加した。次に、恒温槽に容器を入れ、48時間熟成し、粒子21の分散液(固形分20%)を得た。
 粒子21のエチレン性不飽和結合価は2.01mmol/gである。
 また、粒子21のメジアン径は195nmであって、変動係数は28.5%であった。
 粒子21に含まれる樹脂を以下に示す。
 下記樹脂中、各化合物(モノマー)の下の添え字、また、括弧右下の添え字は含有比(質量比)を表す。また、Meはメチル基を表す。
-Synthesis of particles 21-
In an aluminum cup, Pionin A-41-C (manufactured by Takemoto Oil & Fat Co., Ltd.) 0.45 g, wall material A 14.99 g, SR-399E 7.49 g, wall material B 1.89 g, wall material D 1.89 g, And 16.56 g of ethyl acetate was added, and the mixture was stirred at room temperature.
Then, 46.89 g of pure water was added to the aluminum cup, and the mixture was stirred with a homogenizer at 12,000 rpm for 12 minutes. Then, 16.64 g of pure water was further added, the temperature was raised to 45 ° C., and the mixture was heated and stirred for 4 hours.
Then, 5.17 g of a 10% aqueous solution of U-CAT SA 102 was added. Next, the container was placed in a constant temperature bath and aged for 48 hours to obtain a dispersion liquid (solid content 20%) of the particles 21.
The ethylenically unsaturated valency of the particles 21 is 2.01 mmol / g.
The median diameter of the particles 21 was 195 nm, and the coefficient of variation was 28.5%.
The resin contained in the particles 21 is shown below.
In the following resins, the subscripts under each compound (monomer) and the subscripts at the lower right of the parentheses indicate the content ratio (mass ratio). In addition, Me represents a methyl group.
Figure JPOXMLDOC01-appb-C000100
Figure JPOXMLDOC01-appb-C000100
<ポリマー粒子22(粒子22)の作製>
-壁材Aの合成-
 粒子18における壁材Aと同様な方法により合成した。
<Preparation of polymer particles 22 (particles 22)>
-Synthesis of wall material A-
It was synthesized by the same method as the wall material A in the particles 18.
-壁材Dの合成-
 粒子19における壁材Dと同様な方法により合成した。
-Synthesis of wall material D-
It was synthesized by the same method as the wall material D in the particles 19.
-粒子22の合成-
 アルミカップに、パイオニンA-41-C(竹本油脂(株)製)0.45g、壁材A 14.99g、SR-399E 7.49g、壁材D 3.78g、及び、酢酸エチル16.56gを添加し、室温で撹拌した。
 その後、アルミカップに、純水46.89gを添加し、ホモジナイザーにより12分間12,000rpmで撹拌した。その後、純水16.64gを更に添加し、45℃に昇温し、4時間加熱撹拌した。
 その後、U-CAT SA 102の10%水溶液5.17gを添加した。次に、恒温槽に容器を入れ、48時間熟成し、粒子22の分散液(固形分20%)を得た。
 粒子22のエチレン性不飽和結合価は2.01mmol/gであり、特定粒子Aに該当する。
 また、粒子22のメジアン径は185nmであって、変動係数は27.5%であった。
 粒子22に含まれる樹脂を以下に示す。
 下記樹脂中、各化合物(モノマー)の下の添え字、また、括弧右下の添え字は含有比(質量比)を表す。
-Synthesis of particles 22-
In an aluminum cup, Pionin A-41-C (manufactured by Takemoto Oil & Fat Co., Ltd.) 0.45 g, wall material A 14.99 g, SR-399E 7.49 g, wall material D 3.78 g, and ethyl acetate 16.56 g. Was added and stirred at room temperature.
Then, 46.89 g of pure water was added to the aluminum cup, and the mixture was stirred with a homogenizer at 12,000 rpm for 12 minutes. Then, 16.64 g of pure water was further added, the temperature was raised to 45 ° C., and the mixture was heated and stirred for 4 hours.
Then, 5.17 g of a 10% aqueous solution of U-CAT SA 102 was added. Next, the container was placed in a constant temperature bath and aged for 48 hours to obtain a dispersion liquid (solid content 20%) of the particles 22.
The ethylenically unsaturated bond value of the particle 22 is 2.01 mmol / g, which corresponds to the specific particle A.
The median diameter of the particles 22 was 185 nm, and the coefficient of variation was 27.5%.
The resin contained in the particles 22 is shown below.
In the following resins, the subscripts under each compound (monomer) and the subscripts at the lower right of the parentheses indicate the content ratio (mass ratio).
Figure JPOXMLDOC01-appb-C000101
Figure JPOXMLDOC01-appb-C000101
 バインダーポリマーP-1:下記に示すポリマー、エチレン性不飽和結合価0.33mmol/g Binder polymer P-1: Polymer shown below, ethylenically unsaturated bond value 0.33 mmol / g
Figure JPOXMLDOC01-appb-C000102
Figure JPOXMLDOC01-appb-C000102
 上記式中、各構成単位の含有量(括弧右下の添え字)は質量比を表し、エチレンオキシ構造の括弧右下の添え字は繰り返し数を表す。 In the above formula, the content of each structural unit (subscript at the bottom right of the parentheses) represents the mass ratio, and the subscript at the bottom right of the parentheses of the ethyleneoxy structure represents the number of repetitions.
 バインダーポリマーP-2:Klucel M、Hercules社製、ヒドロキシプロピルセルロース、エチレン性不飽和結合価0mmol/g
 酸発色剤SA-1:S-205(フルオラン構造を有するロイコ色素、福井山田化学工業(株)製)
 界面活性剤W-1:下記構造の化合物
Binder polymer P-2: Klucel M, manufactured by Hercules, hydroxypropyl cellulose, ethylenically unsaturated bond value 0 mmol / g
Acid color former SA-1: S-205 (leuco dye with fluorin structure, manufactured by Fukui Yamada Chemical Industry Co., Ltd.)
Surfactant W-1: Compound with the following structure
Figure JPOXMLDOC01-appb-C000103
Figure JPOXMLDOC01-appb-C000103
 上記構造中、各構成単位の括弧右下の添え字は含有比(質量比)を表す。 In the above structure, the subscript at the bottom right of the parentheses of each structural unit indicates the content ratio (mass ratio).
 表3~表5に記載の結果から、本開示に係る平版印刷版原版である実施例1~28の平版印刷版原版は、UVインキを使用した場合であっても、得られる平版印刷版の耐刷性に優れている。
 また、表3~表5に記載の結果から、本開示に係る平版印刷版原版である実施例1~28の平版印刷版原版は、UV版飛び抑制性、機上現像性、特色着肉性、及び、機上現像時における現像カス抑制性にも優れる。
From the results shown in Tables 3 to 5, the lithographic printing plate originals of Examples 1 to 28, which are the lithographic printing plate originals according to the present disclosure, are the lithographic printing plates obtained even when UV ink is used. Has excellent printing resistance.
In addition, from the results shown in Tables 3 to 5, the lithographic printing plate originals of Examples 1 to 28, which are the lithographic printing plate originals according to the present disclosure, have UV plate skipping property, on-machine developability, and spot color fleshing property. Also, it is excellent in suppressing development residue during on-machine development.
(実施例29~40)
<画像記録層塗布液の調製>
 表6の記載の組成に変更した以外は、実施例1と同様にして、感光液(1)、及び、画像記録層塗布液を作製した。
 また、得られた画像記録層塗布液を使用し、実施例1と同様にして、平版印刷版原版を作製した。
(Examples 29-40)
<Preparation of image recording layer coating liquid>
A photosensitive liquid (1) and an image recording layer coating liquid were prepared in the same manner as in Example 1 except that the composition was changed to that shown in Table 6.
In addition, the obtained image recording layer coating liquid was used to prepare a lithographic printing plate original plate in the same manner as in Example 1.
-視認性(発色性)-
 得られた平版印刷版原版を、水冷式40W赤外線半導体レーザー搭載のCreo社製Trendsetter3244VXにより、出力11.5W、外面ドラム回転数220rpm、解像度2,400dpi(dot per inch、1inch=25.4mm)の条件で露光した。露光は25℃、50%RHの環境下で行った。
 露光直後、及び、露光後暗所(25℃)で2時間保存後、平版印刷版原版の発色を測定した。測定は、コニカミノルタ(株)製分光測色計CM2600dとオペレーションソフトCM-S100Wとを用い、SCE(正反射光除去)方式で行った。発色性は、L表色系のL値(明度)を用い、露光部のL値と未露光部のL値との差ΔLにより評価した。ΔLの値が大きい程、発色性が優れる。
-Visibility (color development)-
The obtained planographic printing plate original plate was subjected to a water-cooled 40 W infrared semiconductor laser-equipped Creo Trendsetter 3244VX with an output of 11.5 W, an outer drum rotation speed of 220 rpm, and a resolution of 2,400 dpi (dot per inch, 1 inch = 25.4 mm). It was exposed under the conditions. The exposure was performed in an environment of 25 ° C. and 50% RH.
Immediately after the exposure and after storage in a dark place (25 ° C.) for 2 hours after the exposure, the color development of the lithographic printing plate original plate was measured. The measurement was performed by the SCE (specular reflection light removal) method using a spectrocolorimeter CM2600d manufactured by Konica Minolta Co., Ltd. and an operation software CM-S100W. Chromogenic uses the L * a * b * color system of L * value (lightness) was evaluated by the difference ΔL between the L * values of the L * value and the unexposed portions of the exposed portion. The larger the value of ΔL, the better the color development.
Figure JPOXMLDOC01-appb-T000104
Figure JPOXMLDOC01-appb-T000104
 なお、表3~表5において上述した以外の、表6において使用したS-1、S-4、S-6及びS-11~S-14はそれぞれ、上述したS-1、S-4、S-6及びS-11~S-14と同じ化合物である。
 なお、実施例29~40の平版印刷版原版におけるUV耐刷性は、実施例1と同様であった。
In addition to the above-mentioned S-1, S-4, S-6 and S-11 to S-14 used in Table 6, the above-mentioned S-1, S-4, respectively, other than those described above in Tables 3 to 5, respectively. It is the same compound as S-6 and S-11 to S-14.
The UV printing resistance of the planographic printing plate original plates of Examples 29 to 40 was the same as that of Example 1.
<下塗り層塗布液(2)及び(3)の調製>
 下記組成の下塗り層塗布液(2)及び(3)をそれぞれ調製した。
<Preparation of undercoat layer coating liquids (2) and (3)>
Undercoat layer coating liquids (2) and (3) having the following compositions were prepared, respectively.
-下塗り層塗布液(2)の組成-
・ポリマー(UC-1):0.18部
・界面活性剤(エマレックス710、日本エマルジョン(株)製):0.03部
・水:28.0部
-Composition of undercoat layer coating liquid (2)-
-Polymer (UC-1): 0.18 parts-Surfactant (Emarex 710, manufactured by Nippon Emulsion Co., Ltd.): 0.03 parts-Water: 28.0 parts
-下塗り層塗布液(3)の組成-
・ポリマー(UC-1):0.18部
・界面活性剤(エマレックス710、日本エマルジョン(株)製):0.03部
・親水性化合物:表7に記載の量
・水:28.0部
-Composition of undercoat layer coating liquid (3)-
-Polymer (UC-1): 0.18 parts-Surfactant (Emarex 710, manufactured by Nippon Emulsion Co., Ltd.): 0.03 parts-Hydrophilic compound: Amount shown in Table 7-Water: 28.0 Department
(実施例41~46)
<平版印刷版原版の作製>
 上記支持体A上に、表7に記載の下塗り層塗布液を乾燥塗布量が20mg/mになるように塗布して下塗り層を形成した。下塗り層上に、表7に記載の画像記録層塗布液をバー塗布し、120℃で40秒間オーブン乾燥して、乾燥塗布量1.0g/mの画像記録層を形成した。
 画像記録層塗布液は、ポリマー粒子を塗布直前に混合し撹拌することにより調製した。
(Examples 41 to 46)
<Preparation of lithographic printing plate original plate>
The undercoat layer coating solution shown in Table 7 was applied onto the support A so that the dry coating amount was 20 mg / m 2 to form an undercoat layer. The image recording layer coating solution shown in Table 7 was bar-coated on the undercoat layer and dried in an oven at 120 ° C. for 40 seconds to form an image recording layer having a dry coating amount of 1.0 g / m 2 .
The image recording layer coating liquid was prepared by mixing and stirring the polymer particles immediately before coating.
<傷汚れ抑制性評価>
 得られた平版印刷版原版を赤外線半導体レーザー搭載の富士フイルム(株)製Luxel PLATESETTER T-6000IIIにて、外面ドラム回転数1,000rpm(revolutions per minute)、レーザー出力70%、及び、解像度2,400dpi(dot per inch)の条件で露光した。露光処理後に、温度25℃、湿度70%RHの環境下にて得られた平版印刷版に引っかき試験機によってキズを付けた。
 この引っかき試験機としては、HEIDON scratching Intersity TESTER HEIDEN-18を使用し、直径0.1mmのサファイア針を用いて、引っ掻き荷重は50(g)とした。キズ付け後の版を現像処理することなく、三菱重工業(株)製ダイヤIF2印刷機の版胴に取り付けた。IF102(富士フイルム(株)製)/水道水=3/97(容量比)の湿し水とValues-G(N)墨インキ(大日本インキ化学工業(株)製)とを用い、ダイヤIF2の標準自動印刷スタート方法で湿し水とインキとを供給して機上現像した後、毎時10,000枚の印刷速度で、特菱アート(連量76.5kg)紙を用いて印刷を行い、キズ付け部が印刷汚れにならないか評価した。また、9点、7点等の中間点については、上限の評価基準の中間である場合に中間点の評価とした。評価基準10点~6点であることが好ましい。結果を表7に示す。
-評価基準-
  10点:キズ付け部が印刷汚れにならない。
  8点:目視では判別できないわずかな印刷汚れがキズ付け部に認められる。
  6点:目視によりわずかな印刷汚れがキズ付け部に認められる。
  4点:目視により印刷汚れがキズ付け部に認められる。
  2点:キズ付け部に明らかな印刷汚れが認められる
<Scratch stain suppression evaluation>
The obtained planographic printing plate original plate was used with a Luxel PLATESETTER T-6000III manufactured by FUJIFILM Corporation equipped with an infrared semiconductor laser, and had an outer drum rotation speed of 1,000 rpm (revolutions per minute), a laser output of 70%, and a resolution of 2, The exposure was performed under the condition of 400 dpi (dot per inch). After the exposure treatment, the lithographic printing plate obtained in an environment of a temperature of 25 ° C. and a humidity of 70% RH was scratched by a scratch tester.
As this scratch tester, HEIDON scratching Intersity TESTER HEIDEN-18 was used, and a sapphire needle having a diameter of 0.1 mm was used, and the scratch load was 50 (g). The scratched plate was attached to the plate cylinder of a diamond IF2 printing machine manufactured by Mitsubishi Heavy Industries, Ltd. without developing. Dia IF2 using IF102 (manufactured by FUJIFILM Corporation) / tap water = 3/97 (capacity ratio) dampening water and Values-G (N) ink ink (manufactured by Dainippon Ink and Chemicals Co., Ltd.) After supplying dampening water and ink and developing on the machine using the standard automatic printing start method of, printing is performed using Tokuryo Art (76.5 kg) paper at a printing speed of 10,000 sheets per hour. , It was evaluated whether the scratched part became a printing stain. In addition, the intermediate points such as 9 points and 7 points were evaluated as intermediate points when they were in the middle of the upper limit evaluation criteria. The evaluation standard is preferably 10 to 6 points. The results are shown in Table 7.
-Evaluation criteria-
10 points: The scratched part does not become a print stain.
8 points: Slight print stains that cannot be visually identified are observed on the scratched part.
6 points: Slight print stains are visually observed on the scratched part.
4 points: Printing stains are visually observed on the scratched part.
2 points: Clear printing stains are found on the scratched part
Figure JPOXMLDOC01-appb-T000105
Figure JPOXMLDOC01-appb-T000105
 なお、表7に記載の「表面接触角」は、アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角を表す。上記接触角は、上述した方法により測定した。
 なお、実施例41~46の平版印刷版原版におけるUV耐刷性は、実施例1と同様であった。
 また、表7に記載の親水性化合物の詳細を以下に示す。
The "surface contact angle" shown in Table 7 represents the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side. The contact angle was measured by the method described above.
The UV printing resistance of the planographic printing plate original plates of Examples 41 to 46 was the same as that of Example 1.
The details of the hydrophilic compounds shown in Table 7 are shown below.
Figure JPOXMLDOC01-appb-C000106
Figure JPOXMLDOC01-appb-C000106
(実施例47~62)
 画像記録層の形成までは、各層の組成等を表8又は表9に記載の組成とした以外は、実施例46と同様に行った。
(Examples 47 to 62)
The process up to the formation of the image recording layer was carried out in the same manner as in Example 46, except that the composition of each layer was the composition shown in Table 8 or Table 9.
<保護層の形成>
 画像記録層上に、下記表8又は表9に記載の成分を含む保護層塗布液(ただし、保護層塗布液は、表8又は表9に記載の各成分を含み、イオン交換:で固形分が20質量%になるように調製した。)をバー塗布し、120℃で60秒間オーブン乾燥して、乾燥塗布量が0.50g/mの保護層を形成した。
 以上の工程を経て、平版印刷版原版を得た。
<Formation of protective layer>
Protective layer coating liquid containing the components listed in Table 8 or Table 9 below on the image recording layer (however, the protective layer coating liquid contains each component shown in Table 8 or Table 9 and has a solid content of ion exchange: Was coated with a bar and dried in an oven at 120 ° C. for 60 seconds to form a protective layer having a dry coating amount of 0.50 g / m 2 .
Through the above steps, a planographic printing plate original plate was obtained.
<平版印刷版原版の評価>
 UV耐刷性、機上現像性(直後)、及び、視認性(発色性)については、上記と同様に評価を行った。
<Evaluation of lithographic printing plate original plate>
The UV printing resistance, on-machine developability (immediately after), and visibility (color development) were evaluated in the same manner as described above.
〔経時機上現像性〕
 得られた平版印刷版原版を室温(25℃)、湿度50%の環境下、三菱電機(株)製OSRAM  FLR40SW蛍光灯を光源に用い、東京光電(株)製ポケット照度計ANA-F9型にて1000lxの照度の位置に平版印刷版原版をセットし、2時間白色光を照射した。照射後の平版印刷版を使用し、上記機上現像性評価と同様にして機上現像性(白灯曝光2時間後)を測定した。結果を表8又は表9に示す。
[Developability over time]
The obtained flat plate printing plate original plate was used as a light source in an environment of room temperature (25 ° C.) and humidity of 50%, and an OSRAM FLR40SW fluorescent lamp manufactured by Mitsubishi Electric Corporation was used as a light source to make a pocket illuminance meter ANA-F9 type manufactured by Tokyo Photoelectric Co., Ltd. The flat plate printing plate original plate was set at a position of illuminance of 1000 lpx and irradiated with white light for 2 hours. Using a lithographic printing plate after irradiation, the on-machine developability (2 hours after exposure to white light) was measured in the same manner as in the above-mentioned on-machine developability evaluation. The results are shown in Table 8 or Table 9.
〔経時視認性(経時発色性):露光前後の明度変化ΔLの測定〕
 露光後暗所(25℃)で24時間保存後の平版印刷版原版を使用し、上記視認性評価と同様にして、露光前から24時間後の平版印刷版原版の明度変化を測定した。
 24時間保存後の平版印刷版原版を用い、求められたΔLの値は、表8又は表9の「ΔL(24時間後)」の欄に記載した。また、上記視認性(発色性)評価において、求められたΔLの値は、表8又は表9の「ΔL(直後)」の欄に記載した。
[Visibility over time (color development over time): Measurement of brightness change ΔL before and after exposure]
Using the lithographic printing plate original plate stored in a dark place (25 ° C.) for 24 hours after exposure, the change in brightness of the lithographic printing plate original plate 24 hours after exposure was measured in the same manner as in the above visibility evaluation.
Using the lithographic printing plate original plate after storage for 24 hours, the obtained values of ΔL are described in the column of “ΔL (after 24 hours)” in Table 8 or Table 9. Further, the values of ΔL obtained in the above visibility (color development) evaluation are described in the column of “ΔL (immediately after)” in Table 8 or Table 9.
〔耐傷性(傷汚れ抑制性)〕
 得られた平版印刷版原版を赤外線半導体レーザー搭載の富士フイルム(株)製Luxel PLATESETTER T-6000IIIにて、外面ドラム回転数1,000rpm(revolutions per minute)、レーザー出力70%、及び、解像度2,400dpi(dots per inch)の条件で露光した。露光処理後に、温度25℃、湿度70%の環境下にて得られた平版印刷版に引っかき試験機によってキズを付けた。
 この引っかき試験機としては、HEIDON scratching Intersity TESTER HEIDEN-18を使用し、直径0.1mmのサファイア針を用いて、引っ掻き荷重は50(g)とした。キズ付け後の版を現像処理することなく、三菱製ダイヤIF2印刷機の版胴に取り付けた。IF102(富士フイルム(株)製)/水道水=3/97(容量比)の湿し水とValues-G(N)墨インキ(DIC(株)製)とを用い、ダイヤIF2の標準自動印刷スタート方法で湿し水とインキとを供給して機上現像した後、毎時10,000枚の印刷速度で、特菱アート紙(連量:76.5kg、三菱製紙(株)製)を用いて印刷を行い、キズ付け部が印刷汚れにならないか評価した。結果を表3に示す。また、9点、7点等の中間点については、上限の評価基準の中間である場合に中間点の評価とした。評価基準10点~6点であることが好ましい。
-評価基準-
  10点:キズ付け部が印刷汚れにならない。
  8点:目視では判別できないわずかな印刷汚れがキズ付け部に認められる。
  6点:目視によりわずかな印刷汚れがキズ付け部に認められる。
  4点:目視により印刷汚れがキズ付け部に認められる。
  2点:キズ付け部に明らかな印刷汚れが認められる。
[Scratch resistance (scratch stain suppression)]
The obtained planographic printing plate original plate was used with a Luxel PLATESETTER T-6000III manufactured by FUJIFILM Corporation equipped with an infrared semiconductor laser, and had an outer drum rotation speed of 1,000 rpm (revolutions per minute), a laser output of 70%, and a resolution of 2, The exposure was performed under the condition of 400 dpi (dots per inch). After the exposure treatment, the lithographic printing plate obtained in an environment of a temperature of 25 ° C. and a humidity of 70% was scratched by a scratch tester.
As this scratch tester, HEIDON scratching Intersity TESTER HEIDEN-18 was used, and a sapphire needle having a diameter of 0.1 mm was used, and the scratch load was 50 (g). The scratched plate was attached to the plate cylinder of a Mitsubishi diamond IF2 printing machine without development processing. Standard automatic printing of diamond IF2 using IF102 (manufactured by Fujifilm Co., Ltd.) / tap water = 3/97 (capacity ratio) of dampening water and Values-G (N) ink ink (manufactured by DIC Co., Ltd.) After supplying dampening water and ink in the starting method and developing on the machine, Tokuryo Art Paper (ream weight: 76.5 kg, manufactured by Mitsubishi Paper Mills Limited) is used at a printing speed of 10,000 sheets per hour. Printing was performed, and it was evaluated whether or not the scratched part became a printing stain. The results are shown in Table 3. In addition, the intermediate points such as 9 points and 7 points were evaluated as intermediate points when they were in the middle of the upper limit evaluation criteria. The evaluation standard is preferably 10 to 6 points.
-Evaluation criteria-
10 points: The scratched part does not become a print stain.
8 points: Slight print stains that cannot be visually identified are observed on the scratched part.
6 points: Slight print stains are visually observed on the scratched part.
4 points: Printing stains are visually observed on the scratched part.
2 points: Clear printing stains are observed on the scratched part.
Figure JPOXMLDOC01-appb-T000107
Figure JPOXMLDOC01-appb-T000107
Figure JPOXMLDOC01-appb-T000108
Figure JPOXMLDOC01-appb-T000108
 なお、実施例47~62の平版印刷版原版におけるUV耐刷性は、実施例1と同様であった。
 以下に、上述した以外の表8又は表9に記載の化合物の詳細を示す。
The UV printing resistance of the planographic printing plate original plates of Examples 47 to 62 was the same as that of Example 1.
The details of the compounds listed in Table 8 or Table 9 other than those described above are shown below.
〔変色性化合物〕
 IR-1~IR-7:下記構造の化合物
[Discoloring compound]
IR-1 to IR-7: Compounds with the following structures
Figure JPOXMLDOC01-appb-C000109
Figure JPOXMLDOC01-appb-C000109
Figure JPOXMLDOC01-appb-C000110
Figure JPOXMLDOC01-appb-C000110
〔酸発色剤〕
 S-1:下記構造の化合物
 S-2:下記構造の化合物
[Acid color former]
S-1: Compound with the following structure S-2: Compound with the following structure
Figure JPOXMLDOC01-appb-C000111
Figure JPOXMLDOC01-appb-C000111
〔〔水溶性ポリマー〕
 PVA-1:Mowiol 4-88、Sigma Aldrich社製Mowiol(登録商標) 4-88
 PVA-2:Mowiol 8-88、Sigma Aldrich社製Mowiol(登録商標) 8-88
 WP-1:下記構造の化合物(ポリビニルピロリドン、重量平均分子量45,000)
[[Water-soluble polymer]
PVA-1: Mowoil 4-88, Sigma-Aldrich Mowoil® 4-88
PVA-2: Mowiol 8-88, Sigma-Aldrich Mowiol® 8-88
WP-1: Compound with the following structure (polyvinylpyrrolidone, weight average molecular weight 45,000)
Figure JPOXMLDOC01-appb-C000112
Figure JPOXMLDOC01-appb-C000112
〔疎水性ポリマー〕
 P-1:下記構造の化合物(ポリ塩化ビニリデン樹脂、重量平均分子量40,000)
 P-2:下記構造の化合物(スチレン-アクリル酸メチル共重合体、n=0.3、m=0.7、重量平均分子量40,000)
[Hydrophobic polymer]
P-1: Compound with the following structure (polyvinylidene chloride resin, weight average molecular weight 40,000)
P-2: Compound having the following structure (styrene-methyl acrylate copolymer, n = 0.3, m = 0.7, weight average molecular weight 40,000)
Figure JPOXMLDOC01-appb-C000113
Figure JPOXMLDOC01-appb-C000113
〔酸発生剤〕
 Int-1:下記構造の化合物、Phはフェニル基を表す。
 Int-2:下記構造の化合物
[Acid generator]
Int-1: A compound having the following structure, Ph represents a phenyl group.
Int-2: Compound with the following structure
Figure JPOXMLDOC01-appb-C000114
Figure JPOXMLDOC01-appb-C000114
〔感脂化剤〕
 A-1:下記構造の化合物
[Fat sensitive agent]
A-1: Compound with the following structure
Figure JPOXMLDOC01-appb-C000115
Figure JPOXMLDOC01-appb-C000115
 表8及び表9に記載の結果から、本開示に係る平版印刷版原版である実施例47~62の平版印刷版原版は、UVインキを使用した場合であっても、得られる平版印刷版の耐刷性に優れている。
 また、表8及び表9に記載の結果から、本開示に係る平版印刷版原版である実施例47~62の平版印刷版原版は、視認性(発色性)、経時視認性(経時発色性)、機上現像性、経時機上現像性、及び、耐傷性にも優れる。
From the results shown in Tables 8 and 9, the lithographic printing plate originals of Examples 47 to 62, which are the lithographic printing plate originals according to the present disclosure, are the lithographic printing plates obtained even when UV ink is used. Has excellent printing resistance.
Further, from the results shown in Tables 8 and 9, the lithographic printing plate original plates of Examples 47 to 62, which are the lithographic printing plate original plates according to the present disclosure, have visibility (color development) and visibility over time (color development over time). It is also excellent in on-machine developability, on-machine developability over time, and scratch resistance.
(実施例63~70)
<平版印刷版原版の形成>
 表13に記載の支持体上に、表13に記載の下記組成の下塗り液B又はCを乾燥塗布量が20mg/mになるよう塗布し、100℃30秒間オーブンで乾燥し、下塗り層を有する支持体を作製した。
 下塗り層上に、下記画像記録層塗布液(2)をバー塗布し、100℃で60秒間オーブン乾燥して表13に記載の乾燥塗布量となるように画像記録層を形成し、平版印刷版原版を得た。
 更にその後、画像記録層上に、表13に記載の下記組成の保護層塗布液(2)をバー塗布し、120℃で60秒間オーブン乾燥して、表13に記載の乾燥塗布量となるように保護層(オーバーコート層)を形成し、機上現像型平版印刷版原版を作製した。
 得られた平版印刷版原版を、実施例1と同様にして、評価を行った。評価結果を表13に示す。
(Examples 63 to 70)
<Formation of lithographic printing plate original plate>
On the support shown in Table 13, the undercoat liquid B or C having the following composition shown in Table 13 is applied so that the dry coating amount is 20 mg / m 2 , and dried in an oven at 100 ° C. for 30 seconds to form an undercoat layer. A support having was prepared.
The following image recording layer coating liquid (2) is bar-coated on the undercoat layer and dried in an oven at 100 ° C. for 60 seconds to form an image recording layer so as to have the dry coating amount shown in Table 13, and a lithographic printing plate is formed. I got the original version.
After that, the protective layer coating solution (2) having the following composition shown in Table 13 is bar-coated on the image recording layer and dried in an oven at 120 ° C. for 60 seconds to obtain the dry coating amount shown in Table 13. A protective layer (overcoat layer) was formed on the surface to prepare an on-machine development type lithographic printing plate original plate.
The obtained planographic printing plate original plate was evaluated in the same manner as in Example 1. The evaluation results are shown in Table 13.
<支持体Xの作製>
<<表面処理D>>:
〔大径孔部及び小径孔部を有する支持体〕
(D-a)アルカリエッチング処理
 アルミニウム板に、カセイソーダ(水酸化ナトリウム)濃度26質量%、アルミニウムイオン濃度6.5質量%のカセイソーダ水溶液を、温度70℃でスプレー管により吹き付けてエッチング処理を行った。その後、スプレーによる水洗を行った。後に電気化学的粗面化処理を施す面のアルミニウム溶解量は、1.0g/mであった。
<Preparation of support X>
<< Surface Treatment D >>:
[Support with large-diameter holes and small-diameter holes]
(Da) Alkaline Etching Treatment An aqueous solution of caustic soda having a caustic soda (sodium hydroxide) concentration of 26% by mass and an aluminum ion concentration of 6.5% by mass was sprayed onto an aluminum plate at a temperature of 70 ° C. by a spray tube to perform an etching treatment. .. Then, it was washed with water by spraying. The amount of aluminum dissolved on the surface to be subjected to the electrochemical roughening treatment later was 1.0 g / m 2 .
(D-b)酸性水溶液中でのデスマット処理(第1デスマット処理)
 次に、酸性水溶液中でデスマット処理を行った。デスマット処理に用いる酸性水溶液は、硫酸150g/Lの水溶液を用いた。その液温は30℃であった。デスマット液はスプレーにより吹き付けて、3秒間デスマット処理した。その後、水洗処理を行った。
(Db) Desmat treatment in an acidic aqueous solution (first desmat treatment)
Next, a desmat treatment was performed in an acidic aqueous solution. As the acidic aqueous solution used for the desmat treatment, an aqueous solution of sulfuric acid of 150 g / L was used. The liquid temperature was 30 ° C. The desmat solution was sprayed and treated with desmat for 3 seconds. Then, it was washed with water.
(D-c)塩酸水溶液中での電気化学的粗面化処理
 次に、塩酸濃度14g/L、アルミニウムイオン濃度13g/L、硫酸濃度3g/Lの電解液を用い、交流電流を用いて電解粗面化処理を行った。電解液の液温は30℃であった。アルミニウムイオン濃度は塩化アルミニウムを添加して調整した。交流電流の波形は正と負の波形が対称な正弦波であり、周波数は50Hz、交流電流1周期におけるアノード反応時間とカソード反応時間は1:1、電流密度は交流電流波形のピーク電流値で75A/dmであった。また、電気量はアルミニウム板がアノード反応に預かる電気量の総和で450C/dmであり、電解処理は125C/dmずつ4秒間の通電間隔を開けて4回に分けて行った。アルミニウム板の対極にはカーボン電極を用いた。その後、水洗処理を行った。
(Dc) Electrochemical roughening treatment in hydrochloric acid aqueous solution Next, electrolysis using an electrolytic solution having a hydrochloric acid concentration of 14 g / L, an aluminum ion concentration of 13 g / L, and a sulfuric acid concentration of 3 g / L was used. Roughening treatment was performed. The temperature of the electrolytic solution was 30 ° C. The aluminum ion concentration was adjusted by adding aluminum chloride. The AC current waveform is a sinusoidal wave with symmetrical positive and negative waveforms, the frequency is 50 Hz, the anode reaction time and cathode reaction time in one AC current cycle are 1: 1, and the current density is the peak current value of the AC current waveform. It was 75 A / dm 2 . The total amount of electricity stored in the anodic reaction of the aluminum plate was 450 C / dm 2 , and the electrolysis treatment was carried out in 4 steps with an energization interval of 125 C / dm 2 for 4 seconds. A carbon electrode was used as the counter electrode of the aluminum plate. Then, it was washed with water.
(D-d)アルカリエッチング処理
 電気化学的粗面化処理後のアルミニウム板を、カセイソーダ濃度5質量%、アルミニウムイオン濃度0.5質量%のカセイソーダ水溶液を、温度45℃でスプレー管により吹き付けてエッチング処理を行った。電気化学的粗面化処理が施された面のアルミニウムの溶解量は0.2g/mであった。その後、水洗処理を行った。
(Dd) Alkaline etching treatment The aluminum plate after the electrochemical roughening treatment is etched by spraying an aqueous solution of caustic soda having a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass with a spray tube at a temperature of 45 ° C. Processing was performed. The dissolved amount of aluminum on the surface subjected to the electrochemical roughening treatment was 0.2 g / m 2 . Then, it was washed with water.
(D-e)酸性水溶液中でのデスマット処理
 次に、酸性水溶液中でのデスマット処理を行った。デスマット処理に用いる酸性水溶液は、陽極酸化処理工程で発生した廃液(硫酸170g/L水溶液中にアルミニウムイオン5.0g/L溶解)を用いた。液温は30℃であった。デスマット液はスプレーに吹き付けて3秒間デスマット処理を行った。
(D) Desmat treatment in an acidic aqueous solution Next, a desmat treatment in an acidic aqueous solution was performed. As the acidic aqueous solution used for the desmat treatment, a waste liquid (aluminum ion 5.0 g / L dissolved in a sulfuric acid 170 g / L aqueous solution) generated in the anodizing treatment step was used. The liquid temperature was 30 ° C. The desmat solution was sprayed on a spray to perform a desmat treatment for 3 seconds.
(D-f)第1段階の陽極酸化処理
 図5に示す構造の直流電解による陽極酸化装置を用いて第1段階の陽極酸化処理を行った。表10に示す条件にて陽極酸化処理を行い、所定の皮膜厚の陽極酸化皮膜を形成した。
(Df) First-stage anodizing treatment The first-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. The anodizing treatment was performed under the conditions shown in Table 10 to form an anodized film having a predetermined film thickness.
(D-g)ポアワイド処理
 上記陽極酸化処理したアルミニウム板を、温度35℃、カセイソーダ濃度5質量%、アルミニウムイオン濃度0.5質量%のカセイソーダ水溶液に表10に示す条件にて浸漬し、ポアワイド処理を行った。その後、スプレーによる水洗を行った。
(Dg) Pore Wide Treatment The anodized aluminum plate is immersed in a caustic soda aqueous solution having a temperature of 35 ° C., a caustic soda concentration of 5% by mass, and an aluminum ion concentration of 0.5% by mass under the conditions shown in Table 10 for pore wide treatment. Was done. Then, it was washed with water by spraying.
(D-h)第2段階の陽極酸化処理
 図5に示す構造の直流電解による陽極酸化装置を用いて第2段階の陽極酸化処理を行った。表10に示す条件にて陽極酸化処理を行い、所定の皮膜厚の陽極酸化皮膜を形成した。
(Dh) Second-stage anodizing treatment The second-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. The anodizing treatment was performed under the conditions shown in Table 10 to form an anodized film having a predetermined film thickness.
 以上の表面処理Dから、表10及び表11に記載の支持体Xを得た。 From the above surface treatment D, the supports X shown in Tables 10 and 11 were obtained.
 上記で得られた第2陽極酸化処理工程後のマイクロポアを有する陽極酸化皮膜中の大径孔部の陽極酸化皮膜表面における平均径(nm)、小径孔部の連通位置における平均径(nm)、大径孔部及び小径孔部の深さ(nm)、ピット密度(マイクロポアの密度、単位;個/μm)、並びに、小径孔部の底部からアルミニウム板表面までの陽極酸化皮膜の厚み(nm)を、表10にまとめて示す。
 なお、マイクロポアの平均径(大径孔部及び小径孔部の平均径)は、大径孔部表面及び小径孔部表面を倍率15万倍のFE-SEMでN=4枚観察し、得られた4枚の画像において、400nm×600nmの範囲に存在するマイクロポア(大径孔部及び小径孔部)の径を測定し、平均した値である。なお、大径孔部の深さが深く、小径孔部の径が測定しづらい場合、及び、小径孔部中の拡径孔部の測定を行う場合は、陽極酸化皮膜上部を切削し、その後各種径を求めた。
 マイクロポアの深さ(大径孔部及び小径孔部の深さ)は、支持体(陽極酸化皮膜)の断面をFE-SEMで観察し(大径孔部深さ観察:15万倍、小径孔部深さ観察:5万倍)、得られた画像において、任意のマイクロポア25個の深さを測定し、平均した値である。
 なお、表10中、第1陽極酸化処理欄の皮膜量(AD)量と第2陽極酸化処理欄の皮膜量(AD)とは、各処理で得られた皮膜量を表す。なお、使用される電解液は、表10中の成分を含む水溶液である。
The average diameter (nm) on the surface of the anodic oxide film of the large-diameter pores in the anodic oxide film having micropores after the second anodic oxidation treatment step obtained above, and the average diameter (nm) at the communication position of the small-diameter pores. , Depth (nm) of large and small holes, pit density (micropore density, unit; piece / μm 2 ), and thickness of anodic oxide film from the bottom of the small holes to the surface of the aluminum plate. (Nm) are summarized in Table 10.
The average diameter of the micropores (average diameter of the large-diameter hole and the small-diameter hole) was obtained by observing the surface of the large-diameter hole and the surface of the small-diameter hole with N = 4 sheets at a magnification of 150,000 times. The diameters of the micropores (large-diameter hole portion and small-diameter hole portion) existing in the range of 400 nm × 600 nm were measured and averaged in the four images obtained. When the depth of the large-diameter hole is deep and it is difficult to measure the diameter of the small-diameter hole, or when measuring the enlarged hole in the small-diameter hole, the upper part of the anodic oxide film is cut, and then Various diameters were calculated.
For the depth of the micropores (depth of the large-diameter hole and the small-diameter hole), observe the cross section of the support (anodic oxide film) with FE-SEM (observation of the depth of the large-diameter hole: 150,000 times, small diameter). (Observation of hole depth: 50,000 times), in the obtained image, the depths of 25 arbitrary micropores were measured and averaged.
In Table 10, the amount of film (AD) in the first anodizing treatment column and the amount of film (AD) in the second anodizing treatment column represent the amount of film obtained in each treatment. The electrolytic solution used is an aqueous solution containing the components in Table 10.
Figure JPOXMLDOC01-appb-T000116
Figure JPOXMLDOC01-appb-T000116
Figure JPOXMLDOC01-appb-T000117
Figure JPOXMLDOC01-appb-T000117
<支持体Yの作製>
<<処理A>>
(A-a)アルカリエッチング処理
 アルミニウム板に、カセイソーダ濃度26質量%及びアルミニウムイオン濃度6.5質量%のカセイソーダ水溶液を、温度70℃でスプレーにより吹き付けてエッチング処理を行った。その後、スプレーによる水洗を行った。後に電気化学的粗面化処理を施す面の アルミニウム溶解量は、5g/mであった。
<Preparation of support Y>
<< Processing A >>
(Aa) Alkaline Etching Treatment An aqueous caustic soda solution having a caustic soda concentration of 26% by mass and an aluminum ion concentration of 6.5% by mass was sprayed onto an aluminum plate at a temperature of 70 ° C. to perform an etching treatment. Then, it was washed with water by spraying. The amount of aluminum dissolved on the surface to be subjected to the electrochemical roughening treatment later was 5 g / m 2 .
(A-b)酸性水溶液を用いたデスマット処理(第1デスマット処理)
 次に、酸性水溶液を用いてデスマット処理を行った。デスマット処理に用いる酸性水溶液は、硫酸150g/Lの水溶液を用いた。その液温は30℃であった。酸性水溶液をアルミニウム板にスプレーにて吹き付けて、3秒間デスマット処理を行った。その後、水洗処理を行った。
(Ab) Desmat treatment using an acidic aqueous solution (first desmat treatment)
Next, a desmat treatment was performed using an acidic aqueous solution. As the acidic aqueous solution used for the desmat treatment, an aqueous solution of sulfuric acid of 150 g / L was used. The liquid temperature was 30 ° C. An acidic aqueous solution was sprayed onto an aluminum plate to perform a desmat treatment for 3 seconds. Then, it was washed with water.
(A-c)電気化学的粗面化処理
 次に、塩酸濃度14g/L、アルミニウムイオン濃度13g/L、及び、硫酸濃度3 g/Lの電解液を用い、交流電流を用いて電気化学的粗面化処理を行った。電解液の液温は30℃であった。アルミニウムイオン濃度は塩化アルミニウムを添加して調整した。
 交流電流の波形は正と負の波形が対称な正弦波であり、周波数は50Hz、交流電流1周期におけるアノード反応時間とカソード反応時間は1:1、電流密度は交流電流波形のピーク電流値で75A/dmであった。また、電気量はアルミニウム板がアノード反応に預かる電気量の総和で450C/dmであり、電解処理は112.5C/dmずつ4秒間の通電間隔を開けて4回に分けて行った。アルミニウム板の対極にはカーボン電極を用いた。その後、水洗処理を行った。
(Ac) Electrochemical roughening treatment Next, an electrolytic solution having a hydrochloric acid concentration of 14 g / L, an aluminum ion concentration of 13 g / L, and a sulfuric acid concentration of 3 g / L was used, and electrochemically using an AC current. Roughening treatment was performed. The temperature of the electrolytic solution was 30 ° C. The aluminum ion concentration was adjusted by adding aluminum chloride.
The AC current waveform is a sinusoidal wave with symmetrical positive and negative waveforms, the frequency is 50 Hz, the anode reaction time and cathode reaction time in one AC current cycle are 1: 1, and the current density is the peak current value of the AC current waveform. It was 75 A / dm 2 . The electric amount was 450C / dm 2 in terms of the total electric quantity aluminum plate participating in the anode reaction, electrolytic treatment was carried out four times to open the energization interval 112.5C / dm 2 by 4 seconds. A carbon electrode was used as the counter electrode of the aluminum plate. Then, it was washed with water.
(A-d)アルカリエッチング処理
 電気化学的粗面化処理後のアルミニウム板に、カセイソーダ濃度5質量%及びアルミニウムイオン濃度0.5質量%のカセイソーダ水溶液を、温度45℃でスプレーにより吹き付けてエッチング処理を行った。電気化学的粗面化処理が施された面のアルミニウムの 溶解量は0.2g/mであった。その後、水洗処理を行った。
(Ad) Alkaline etching treatment An aqueous solution of caustic soda having a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass is sprayed on an aluminum plate after an electrochemical roughening treatment at a temperature of 45 ° C. for etching treatment. Was done. The dissolved amount of aluminum on the surface subjected to the electrochemical roughening treatment was 0.2 g / m 2 . Then, it was washed with water.
(A-e)酸性水溶液を用いたデスマット処理
 次に、酸性水溶液を用いてデスマット処理を行った。具体的には、酸性水溶液をアルミニウム板にスプレーにて吹き付けて、3秒間デスマット処理を行った。デスマット処理に用いる酸性水溶液は、硫酸濃度170g/L及びアルミニウムイオン濃度5g/Lの水溶液を用いた。その液温は30℃であった。 
(A) Desmat treatment using an acidic aqueous solution Next, a desmat treatment was performed using an acidic aqueous solution. Specifically, an acidic aqueous solution was sprayed onto an aluminum plate to perform a desmat treatment for 3 seconds. As the acidic aqueous solution used for the desmat treatment, an aqueous solution having a sulfuric acid concentration of 170 g / L and an aluminum ion concentration of 5 g / L was used. The liquid temperature was 30 ° C.
(A-f)第1段階の陽極酸化処理
 図5に示す構造の直流電解による陽極酸化装置を用いて第1段階の陽極酸化処理を行った。表12に示す「第1陽極酸化処理」欄の条件にて陽極酸化処理を行い、所定の皮膜量の 陽極酸化皮膜を形成した。
(Af) First-stage anodizing treatment The first-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. The anodizing treatment was carried out under the conditions of the "first anodizing treatment" column shown in Table 12 to form an anodized film having a predetermined amount of film.
(A-g)ポアワイド処理
 上記陽極酸化処理したアルミニウム板を、温度40℃、カセイソーダ濃度5質量%及びアルミニウムイオン濃度0.5質量%のカセイソーダ水溶液に表12に示す時間条件にて浸漬し、ポアワイド処理を行った。その後、スプレーによる水洗を行った。
(Ag) Pore Wide Treatment The anodized aluminum plate is immersed in a caustic soda aqueous solution having a temperature of 40 ° C., a caustic soda concentration of 5% by mass and an aluminum ion concentration of 0.5% by mass under the time conditions shown in Table 12, and then pore wide. Processing was performed. Then, it was washed with water by spraying.
(A-h)第2段階の陽極酸化処理
 図5に示す構造の直流電解による陽極酸化装置を用いて第2段階の陽極酸化処理を行った。表12に示す「第2陽極酸化処理」欄の条件にて陽極酸化処理を行い、所定の皮膜量の陽極酸化皮膜を形成した。
(Ah) Second-stage anodizing treatment The second-stage anodizing treatment was performed using an anodizing apparatus by direct current electrolysis having the structure shown in FIG. The anodizing treatment was carried out under the conditions of the "second anodizing treatment" column shown in Table 12 to form an anodized film having a predetermined amount of film.
Figure JPOXMLDOC01-appb-T000118
Figure JPOXMLDOC01-appb-T000118
-下塗り層塗布液Bの組成-
・ポリマー(U-1):0.18部
・ヒドロキシエチルイミノ二酢酸:0.10部
・水:61.4部
-Composition of undercoat layer coating liquid B-
-Polymer (U-1): 0.18 parts-Hydroxyethyliminodiacetic acid: 0.10 parts-Water: 61.4 parts
-下塗り層塗布液Cの組成-
・ポリマー(U-1):0.14部
・キレスト400:0.035部
・キレスト3EAF:0.035部
・界面活性剤(エマレックス710、日本エマルジョン(株)製):0.0016部
・防腐剤(バイオホープL、ケイ・アイ化成(株)製):0.0015部
・水:3.29部
-Composition of undercoat layer coating liquid C-
-Polymer (U-1): 0.14 parts-Kirest 400: 0.035 parts-Kirest 3EAF: 0.035 parts-Surfactant (Emarex 710, manufactured by Nippon Emulsion Co., Ltd.): 0.0016 parts- Preservative (Biohope L, manufactured by Keiai Kasei Co., Ltd.): 0.0015 parts, water: 3.29 parts
Figure JPOXMLDOC01-appb-C000119
Figure JPOXMLDOC01-appb-C000119
-ポリマー(U-1)の合成-
<<モノマーM-1の精製>>
 ライトエステル P-1M(2-メタクリロイルオキシエチルアシッドホスフェート、共栄社化学(株)製)420部、ジエチレングリコールジブチルエーテル1,050部及び蒸留水1,050部を分液ロートに加え、激しく撹拌した後静置した。上層を廃棄した後、ジエチレングリコールジブチルエーテル1,050部を加え、激しく撹拌した後静置した。上層を廃棄してモノマーM-1の水溶液(固形分換算10.5質量%)を1,300部得た。
-Synthesis of polymer (U-1)-
<< Purification of Monomer M-1 >>
Add 420 parts of light ester P-1M (2-methacryloyloxyethyl acid phosphate, manufactured by Kyoeisha Chemical Co., Ltd.), 1,050 parts of diethylene glycol dibutyl ether and 1,050 parts of distilled water to the separatory funnel, stir vigorously and then statically. Placed. After discarding the upper layer, 1,050 parts of diethylene glycol dibutyl ether was added, and the mixture was vigorously stirred and then allowed to stand. The upper layer was discarded to obtain 1,300 parts of an aqueous solution of monomer M-1 (10.5% by mass in terms of solid content).
<<ポリマー(U-1)の合成>>
 三口フラスコに、蒸留水を53.73部、以下に示すモノマーM-2を3.66部加え、窒素雰囲気下で55℃に昇温した。次に、以下に示す滴下液1を2時間掛けて滴下し、30分撹拌した後、VA-046B(富士フイルム和光純薬(株)製)0.386部を加え、80℃に昇温し、1.5時間撹拌した。反応液を室温(25℃)に戻した後、30質量%水酸化ナトリウム水溶液を加え、pHを8.0に調整したのち、4-ヒドロキシ-2,2,6,6-テトラメチルピペリジン-1-オキシル(4-OH-TEMPO)を0.005部加えた。以上の操作により、ポリマー(U-1)の水溶液を180部得た。ゲル浸透クロマトグラフィー(GPC)法によるポリエチレングリコール換算値とした重量平均分子量(Mw)は20万であった。
<< Synthesis of polymer (U-1) >>
53.73 parts of distilled water and 3.66 parts of the monomer M-2 shown below were added to the three-necked flask, and the temperature was raised to 55 ° C. under a nitrogen atmosphere. Next, the dropping solution 1 shown below was added dropwise over 2 hours, stirred for 30 minutes, and then 0.386 parts of VA-046B (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) was added and the temperature was raised to 80 ° C. , Stirred for 1.5 hours. After returning the reaction solution to room temperature (25 ° C.), a 30 mass% sodium hydroxide aqueous solution was added to adjust the pH to 8.0, and then 4-hydroxy-2,2,6,6-tetramethylpiperidine-1. -Oxyl (4-OH-TEMPO) was added in an amount of 0.005 parts. By the above operation, 180 parts of an aqueous solution of the polymer (U-1) was obtained. The weight average molecular weight (Mw) in terms of polyethylene glycol by gel permeation chromatography (GPC) was 200,000.
Figure JPOXMLDOC01-appb-C000120
Figure JPOXMLDOC01-appb-C000120
<<滴下液1の組成>>
・上記モノマーM-1水溶液:87.59部
・上記モノマーM-2:14.63部
・VA-046B(2,2’-アゾビス[2-(2-イミダゾリン-2-イル)プロパン]ジスルフェートジハイドレート、富士フイルム和光純薬(株)製):0.386部
・蒸留水:20.95部
<< Composition of Dropping Liquid 1 >>
・ Monomer M-1 aqueous solution: 87.59 parts ・ Monomer M-2: 14.63 parts ・ VA-046B (2,2'-azobis [2- (2-imidazolin-2-yl) propane] distilled water] Fate the hydrate, manufactured by Fujifilm Wako Pure Chemical Industries, Ltd .: 0.386 parts, distilled water: 20.95 parts
<画像記録層塗布液(2)の組成>
・表13に記載の赤外線吸収剤:表13に記載の量
・表13に記載の発色体前駆体:表13に記載の量
・表13に記載の電子受容型重合開始剤:表13に記載の量
・表13に記載のボレート化合物(電子供与性重合開始剤):表13に記載の量
・表13に記載のバインダーポリマー:表13に記載の量
・表13に記載の重合性化合物:表10に記載の量
・表13に記載の感脂化剤:表10に記載の量
・アニオン界面活性剤(A-1、下記化合物):表13に記載の量
・フッ素系界面活性剤(W-1、下記化合物):4.16部
・2-ブタノン:4,920部
・1-メトキシ-2-プロパノール:3,100部
・メタノール:2,790部
・表13に記載のポリマー粒子:表13に記載の量
<Composition of image recording layer coating liquid (2)>
-Infrared absorbers shown in Table 13: Amounts shown in Table 13-Color-developing precursors shown in Table 13: Amounts shown in Table 13-Electronic accepting polymerization initiators shown in Table 13: Listed in Table 13. -Borate compound shown in Table 13 (electron donating polymerization initiator): Amount shown in Table 13-Binder polymer shown in Table 13: Amount shown in Table 13-Polymer compound shown in Table 13: Amounts shown in Table 10-Fat sensitive agents shown in Table 13: Amounts shown in Table 10-Anionic surfactants (A-1, the following compounds): Amounts shown in Table 13-Fluorine-based surfactants (A-1) W-1, the following compound): 4.16 parts, 2-butanone: 4,920 parts, 1-methoxy-2-propanol: 3,100 parts, methanol: 2,790 parts, polymer particles shown in Table 13: Amounts listed in Table 13
<保護層塗布液(2)の組成>
・表13に記載の水溶性ポリマー:表13に記載の量
・表13に記載の疎水性ポリマー粒子:表13に記載の量
・表13に記載の界面活性剤:表13に記載の量
・表13に記載の発色体前駆体:表13に記載の量
・水:6.0部
<Composition of protective layer coating liquid (2)>
-Water-soluble polymer shown in Table 13: Amount shown in Table 13-Hydrophobic polymer particles shown in Table 13: Amount shown in Table 13-Surfactant shown in Table 13: Amount shown in Table 13. Color-developing precursors shown in Table 13: Amount and water shown in Table 13: 6.0 parts
Figure JPOXMLDOC01-appb-T000121
Figure JPOXMLDOC01-appb-T000121
 上述した以外の表13に記載の各略称の詳細を、以下に示す。
 なお、下記において、TsOは、トシレートアニオンを表す。
<赤外線吸収剤>
 D’-1:下記化合物、HOMO=-5.35eV
 D’-2:下記化合物、HOMO=-5.31eV
 D’-3:下記化合物、HOMO=-5.32eV
Details of each abbreviation shown in Table 13 other than those described above are shown below.
In the following, TsO represents a tosylate anion.
<Infrared absorber>
D'-1: The following compound, HOMO = -5.35eV
D'-2: The following compound, HOMO = -5.31 eV
D'-3: The following compound, HOMO = -5.32 eV
Figure JPOXMLDOC01-appb-C000122
Figure JPOXMLDOC01-appb-C000122
<電子受容型重合開始剤>
 I’-1及びI’-2:下記化合物
<Electron-accepting polymerization initiator>
I'-1 and I'-2: The following compounds
Figure JPOXMLDOC01-appb-C000123
Figure JPOXMLDOC01-appb-C000123
<電子供与型重合開始剤>
 B’-1:ナトリウムテトラフェニルボレート、HOMO=-5.92eV
<重合性化合物>
 M’-1:下記合成例により合成したウレタンアクリレート、エチレン性不飽和結合価:7.22mmol/g
 M’-2:エトキシ化イソシアヌル酸トリアクリレート、新中村化学工業(株)製A-9300、エチレン性不飽和結合価:7.09mmol/g
 M’-3:下記化合物、エチレン性不飽和結合価:4.25mmol/g
 M’-4:下記化合物、エチレン性不飽和結合価:4.42mmol/g
<Electron-donated polymerization initiator>
B'-1: Sodium tetraphenylborate, HOMO = -5.92 eV
<Polymerizable compound>
M'-1: Urethane acrylate synthesized according to the following synthesis example, ethylenically unsaturated bond value: 7.22 mmol / g
M'-2: Triacrylate ethoxylated isocyanuric acid, A-9300 manufactured by Shin Nakamura Chemical Industry Co., Ltd., ethylenically unsaturated bond value: 7.09 mmol / g
M'-3: The following compound, ethylenically unsaturated bond value: 4.25 mmol / g
M'-4: The following compounds, ethylenically unsaturated bond value: 4.42 mmol / g
Figure JPOXMLDOC01-appb-C000124
Figure JPOXMLDOC01-appb-C000124
<M’-1の合成>
 タケネートD-160N(ポリイソシアネート、三井化学(株)製)4.7質量部、アロニックスM-403(水酸基含多官能アクリレート、東亞合成(株)製)タケネートD-160NのNCO価とアロニックスM-403の水酸基価が1:1となる量、t-ブチルベンゾキノン0.02質量部、メチルエチルケトン11.5質量部の混合溶液を65℃に加熱した。反応溶液に、ネオスタンU-600(ビスマス系重縮合触媒、日東化成(株)製)0.11質量部を加え、同温度で4時間加熱した。反応溶液を室温(25℃)まで冷却し、メチルエチルケトンを加えることで、固形分が50質量%のウレタンアクリレート溶液を合成した。
 続いて、リサイクル型GPC(機器:LC908-C60、カラム:JAIGEL-1H-40及び2H-40(日本分析工業(株)製))で、テトラヒドロフラン(THF)溶離液にて、ウレタンアクリレート溶液の分子量分画を実施し、ウレタンアクリレートM’-1を得た。
<Synthesis of M'-1>
Takenate D-160N (polyisocyanate, manufactured by Mitsui Chemicals, Inc.) 4.7 parts by mass, Aronix M-403 (hydroxyl-containing polyfunctional acrylate, manufactured by Toa Synthetic Co., Ltd.) NCO value and Aronix M- of Takenate D-160N A mixed solution of 0.02 parts by mass of t-butylbenzoquinone and 11.5 parts by mass of methyl ethyl ketone was heated to 65 ° C. in an amount such that the hydroxyl value of 403 was 1: 1. To the reaction solution, 0.11 part by mass of Neostan U-600 (bismuth-based polycondensation catalyst, manufactured by Nitto Kasei Co., Ltd.) was added, and the mixture was heated at the same temperature for 4 hours. The reaction solution was cooled to room temperature (25 ° C.), and methyl ethyl ketone was added to synthesize a urethane acrylate solution having a solid content of 50% by mass.
Subsequently, a recycle type GPC (equipment: LC908-C60, column: JAIGEL-1H-40 and 2H-40 (manufactured by Nippon Analytical Industry Co., Ltd.)) was used in a tetrahydrofuran (THF) eluent, and the molecular weight of the urethane acrylate solution was increased. Fractionation was carried out to obtain urethane acrylate M'-1.
<ポリマー粒子>
 R’-1:下記により作製したポリマー粒子、エチレン性不飽和結合価:2.01mmol/g
 R’-2:下記により作製したポリマー粒子、エチレン性不飽和結合価:2.01mmol/g
<Polymer particles>
R'-1: Polymer particles prepared as described below, ethylenically unsaturated bond value: 2.01 mmol / g
R'-2: Polymer particles prepared as described below, ethylenically unsaturated bond value: 2.01 mmol / g
<ポリマー粒子R’-1の調製>
・ミクロゲル(ポリマー粒子R’-1):2.640部
・蒸留水:2.425部
 上記ミクロゲルの調製法を以下に示す。
<Preparation of polymer particles R'-1>
-Microgel (polymer particle R'-1): 2.640 parts-Distilled water: 2.425 parts The method for preparing the above microgel is shown below.
-多価イソシアネート化合物の調製-
イソホロンジイソシアネート17.78部(80モル当量)と下記多価フェノール化合物(1)7.35部(20モル当量)との酢酸エチル(25.31部)懸濁溶液に、ビスマストリス(2-エチルヘキサノエート)(ネオスタン U-600、日東化成(株)製)0.043部を加えて撹拌した。発熱が収まった時点で反応温度を50℃に設定し、3時間撹拌して多価イソシアネート化合物(1)の酢酸エチル溶液(50質量%)を得た。
-Preparation of multivalent isocyanate compound-
Bismastris (2-ethyl) in a suspension solution of ethyl acetate (25.31 parts) containing 17.78 parts (80 mol equivalents) of isophorone diisocyanate and 7.35 parts (20 mol equivalents) of the following polyhydric phenol compound (1). Hexanoate) (Neostan U-600, manufactured by Nitto Kasei Co., Ltd.) 0.043 part was added and stirred. When the exotherm subsided, the reaction temperature was set to 50 ° C., and the mixture was stirred for 3 hours to obtain an ethyl acetate solution (50% by mass) of the polyvalent isocyanate compound (1).
Figure JPOXMLDOC01-appb-C000125
Figure JPOXMLDOC01-appb-C000125
-ミクロゲルの調製-
 下記油相成分及び水相成分を混合し、ホモジナイザーを用いて12,000rpmで10分間乳化した。得られた乳化物を45℃で4時間撹拌後、1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン-オクチル酸塩(U-CAT SA102、サンアプロ(株)製)の10質量%水溶液5.20gを加え、室温で30分撹拌し、45℃で24時間静置した。蒸留水で、固形分濃度を20質量%になるように調整し、ミクロゲルの水分散液が得られた。光散乱法により平均粒径を測定したところ、0.20μmであった。
-Preparation of microgel-
The following oil phase components and aqueous phase components were mixed and emulsified at 12,000 rpm for 10 minutes using a homogenizer. After stirring the obtained emulsion at 45 ° C. for 4 hours, 10 mass of 1,8-diazabicyclo [5.4.0] undec-7-ene-octylate (U-CAT SA102, manufactured by San-Apro Co., Ltd.) 5.20 g of% aqueous solution was added, the mixture was stirred at room temperature for 30 minutes, and allowed to stand at 45 ° C. for 24 hours. The solid content concentration was adjusted to 20% by mass with distilled water, and an aqueous dispersion of microgel was obtained. When the average particle size was measured by the light scattering method, it was 0.20 μm.
~油相成分~
 (成分1)酢酸エチル:12.0部
 (成分2)トリメチロールプロパン(6モル当量)とキシレンジイソシアネート(18モル当量)を付加させ、これに片末端メチル化ポリオキシエチレン(1モル当量、オキシエチレン単位の繰返し数:90)を付加させた付加体(50質量%酢酸エチル溶液、三井化学(株)製):3.76部
 (成分3)多価イソシアネート化合物(1)(50質量%酢酸エチル溶液として):15.0部
 (成分4)ジペンタエリスリトールペンタアクリレート(SR-399、サートマー社製)の65質量%酢酸エチル溶液:11.54部
 (成分5)スルホン酸塩型界面活性剤(パイオニンA-41-C、竹本油脂(株)製)の10%酢酸エチル溶液:4.42部
~ Oil phase component ~
(Component 1) Ethyl acetate: 12.0 parts (Component 2) Trimethylol propane (6 molar equivalents) and xylene diisocyanate (18 molar equivalents) are added, and one-terminal methylated polyoxyethylene (1 molar equivalent, oxy) is added thereto. Additive (50 mass% ethyl acetate solution, manufactured by Mitsui Kagaku Co., Ltd.): 3.76 parts (component 3) polyhydric isocyanate compound (1) (50 mass% acetate) As an ethyl solution): 15.0 parts (component 4) 65% by mass ethyl acetate solution of dipentaerythritol pentaacrylate (SR-399, manufactured by Sartmer) 11.54 parts (component 5) sulfonate type surfactant 10% ethyl acetate solution (Pionin A-41-C, manufactured by Takemoto Oil & Fat Co., Ltd.): 4.42 parts
~水相成分~
 蒸留水:46.87部
~ Aqueous phase component ~
Distilled water: 46.87 parts
<ポリマー粒子R’-2の作製>
-油相成分の調製-
 WANNATE(登録商標)PM-200(多官能イソシアネート化合物:万華化学社製):6.66gと、タケネート(登録商標)D-116N(トリメチロールプロパン(TMP)とm-キシリレンジイソシアネート(XDI)とポリエチレングリコールモノメチルエーテル(EO90)との付加物(下記構造)の50質量%酢酸エチル溶液:三井化学(株)製):5.46gと、SR399(ジペンタエリスリトールペンタアクリレート:サートマー社製)の65質量%酢酸エチル溶液:11.24gと、酢酸エチル:14.47gと、パイオニン(登録商標)A-41-C(竹本油脂(株)製):0.45gを混合し、室温(25℃)で15分攪拌して油相成分を得た。
<Preparation of polymer particles R'-2>
-Preparation of oil phase components-
WANNAME (registered trademark) PM-200 (polyfunctional isocyanate compound: manufactured by Manka Chemical Co., Ltd.): 6.66 g and Takenate (registered trademark) D-116N (trimethylolpropane (TMP) and m-xylylene diisocyanate (XDI)) 50% by mass ethyl acetate solution of an adduct (structure below) of polyethylene glycol monomethyl ether (EO90): 5.46 g and SR399 (dipentaerythritol pentaacrylate: manufactured by Sartomer). A 65 mass% ethyl acetate solution: 11.24 g, ethyl acetate: 14.47 g, and Pionin (registered trademark) A-41-C (manufactured by Takemoto Oil & Fat Co., Ltd.): 0.45 g were mixed and mixed at room temperature (25 ° C.). ) Was stirred for 15 minutes to obtain an oil phase component.
Figure JPOXMLDOC01-appb-C000126
Figure JPOXMLDOC01-appb-C000126
-水相成分の準備-
 水相成分として、蒸留水47.2gを準備した。
-Preparation of aqueous phase components-
As an aqueous phase component, 47.2 g of distilled water was prepared.
-マイクロカプセル形成工程-
 油相成分に水相成分を添加して混合し、得られた混合物を、ホモジナイザーを用いて12,000rpmで16分間乳化させて乳化物を得た。
 得られた乳化物に蒸留水16.8gを添加し、得られた液体を室温で180分撹拌した。
 次いで、撹拌後の液体を45℃に加熱し、液温を45℃に保持した状態で5時間撹拌することにより、上記液体から酢酸エチルを留去した。蒸留水で、固形分濃度を20質量%になるように調整し、ポリマー粒子R’-2の水分散液が得られた。R’-2の体積平均粒径はレーザー回折/散乱式粒子径分布測定装置LA-920((株)堀場製作所製)により測定したところ、165nmであった。
-Microcapsule forming process-
The aqueous phase component was added to the oil phase component and mixed, and the obtained mixture was emulsified with a homogenizer at 12,000 rpm for 16 minutes to obtain an emulsion.
16.8 g of distilled water was added to the obtained emulsion, and the obtained liquid was stirred at room temperature for 180 minutes.
Next, the stirred liquid was heated to 45 ° C., and the mixture was stirred for 5 hours while maintaining the liquid temperature at 45 ° C. to distill off ethyl acetate from the above liquid. The solid content concentration was adjusted to 20% by mass with distilled water to obtain an aqueous dispersion of polymer particles R'-2. The volume average particle diameter of R'-2 was 165 nm as measured by a laser diffraction / scattering type particle size distribution measuring device LA-920 (manufactured by Horiba Seisakusho Co., Ltd.).
<バインダーポリマー>
 P’-1:一部アセチル化されたポリビニルブチラール、積水化学工業(株)製エスレックBL10
<親水性化合物>
 T’-1:下記化合物
<添加剤>
 O’-1:下記化合物
<Binder polymer>
P'-1: Partially acetylated polyvinyl butyral, Sekisui Chemical Co., Ltd. Eslek BL10
<Hydrophilic compound>
T'-1: The following compounds <additives>
O'-1: The following compounds
Figure JPOXMLDOC01-appb-C000127
Figure JPOXMLDOC01-appb-C000127
<界面活性剤>
 U’-1及びU’-2:下記化合物
<Surfactant>
U'-1 and U'-2: The following compounds
Figure JPOXMLDOC01-appb-C000128
Figure JPOXMLDOC01-appb-C000128
<水溶性ポリマー>
 WP’-1:ポリビニルアルコール、三菱ケミカル(株)製ゴーセノールL-3266、けん化度86~89%以上
 WP’-2:Mowiol 4-88(ポリビニルアルコール(PVA)、シグマアルドリッチ社製)
 WP’-3:Mowiol 8-88(ポリビニルアルコール(PVA)、シグマアルドリッチ社製)
<疎水性ポリマー粒子>
 WR’-1:FS-102、スチレン-アクリル樹脂、日本ペイント・インダストリアルコーティングス(株)製、Tg=103℃
 WR’-2:ポリ塩化ビニリデン水性ディスパージョン、Solvin社製Diofan(登録商標) A50
<界面活性剤>
 V’-1:界面活性剤、エマレックス710、日本エマルジョン(株)製
<発色体前駆体>
 wIR’-1:下記化合物
<Water-soluble polymer>
WP'-1: Polyvinyl alcohol, Gosenol L-3266 manufactured by Mitsubishi Chemical Corporation, Saponification degree 86-89% or more WP'-2: Mowiol 4-88 (Polyvinyl alcohol (PVA), manufactured by Sigma-Aldrich)
WP'-3: Mowiool 8-88 (Polyvinyl alcohol (PVA), manufactured by Sigma-Aldrich)
<Hydrophobic polymer particles>
WR'-1: FS-102, styrene-acrylic resin, manufactured by Nippon Paint Industrial Coatings Co., Ltd., Tg = 103 ° C.
WR'-2: Polyvinylidene chloride aqueous dispersion, Diofan (registered trademark) A50 manufactured by Solvin
<Surfactant>
V'-1: Surfactant, Emarex 710, manufactured by Nippon Emulsion Co., Ltd. <Color former precursor>
wIR'-1: The following compounds
Figure JPOXMLDOC01-appb-C000129
Figure JPOXMLDOC01-appb-C000129
 表13に記載の結果から、本開示に係る平版印刷版原版である実施例63~70の平版印刷版原版は、UVインキを使用した場合であっても、得られる平版印刷版の耐刷性に優れている。
 また、表13に記載の結果から、本開示に係る平版印刷版原版である実施例63~70の平版印刷版原版は、UV版飛び抑制性、機上現像性、特色着肉性、及び、機上現像時における現像カス抑制性にも優れる。
From the results shown in Table 13, the lithographic printing plate original plates of Examples 63 to 70, which are the lithographic printing plate original plates according to the present disclosure, have the printing durability of the lithographic printing plate obtained even when UV ink is used. Is excellent.
Further, from the results shown in Table 13, the lithographic printing plate original plates of Examples 63 to 70, which are the lithographic printing plate original plates according to the present disclosure, have UV plate skipping inhibitory property, on-machine developability, spot color fleshing property, and It also has excellent ability to suppress development residue during on-machine development.
 2019年6月28日に出願された日本国特許出願第2019-122479号の開示、2019年8月30日に出願された日本国特許出願第2019-158812号の開示、2019年9月18日に出願された日本国特許出願第2019-169808号の開示、及び、2020年2月28日に出願された日本国特許出願第2020-034236号の開示は、その全体が参照により本明細書に取り込まれる。
 本明細書に記載された全ての文献、特許出願、及び、技術規格は、個々の文献、特許出願、及び、技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。
Disclosure of Japanese Patent Application No. 2019-12479 filed on June 28, 2019, Disclosure of Japanese Patent Application No. 2019-158812 filed on August 30, 2019, September 18, 2019 The disclosure of Japanese Patent Application No. 2019-169808 filed in, and the disclosure of Japanese Patent Application No. 2020-034236 filed on February 28, 2020, are hereby incorporated by reference in their entirety. It is captured.
All documents, patent applications, and technical standards described herein are to the same extent as if the individual documents, patent applications, and technical standards were specifically and individually stated to be incorporated by reference. Is incorporated herein by reference.
 18:アルミニウム板、ta:アノード反応時間、tc:カソード反応時間、tp:電流が0からピークに達するまでの時間、Ia:アノードサイクル側のピーク時の電流、Ic:カソードサイクル側のピーク時の電流、AA:アルミニウム板のアノード反応の電流、CA:アルミニウム板のカソード反応の電流、10:平版印刷版原版、12a,12b:アルミニウム支持体、14:下塗り層、16:画像記録層、20a,20b:陽極酸化皮膜、22a,22b:マイクロポア、24:大径孔部、26:小径孔部、D:大径孔部の深さ、50:主電解槽、51:交流電源、52:ラジアルドラムローラ、53a,53b:主極、54:電解液供給口、55:電解液、56:補助陽極、60:補助陽極槽、W:アルミニウム板、A1:給液方向、A2:電解液排出方向、610:陽極酸化処理装置、612:給電槽、614:電解処理槽、616:アルミニウム板、618,26:電解液、620:給電電極、622,628:ローラ、624:ニップローラ、630:電解電極,632:槽壁、634:直流電源 18: Aluminum plate, ta: Anode reaction time, ct: Cathode reaction time, tp: Time from 0 to peak of current, Ia: Peak current on anode cycle side, Ic: Peak time on cathode cycle side Current, AA: Anode reaction current of aluminum plate, CA: Electrode reaction current of aluminum plate, 10: Flat plate printing plate original plate, 12a, 12b: Aluminum support, 14: Undercoat layer, 16: Image recording layer, 20a, 20b: Anodized film, 22a, 22b: Micropore, 24: Large-diameter hole, 26: Small-diameter hole, D: Depth of large-diameter hole, 50: Main electrolytic tank, 51: AC power supply, 52: Radial Drum roller, 53a, 53b: main electrode, 54: electrolyte supply port, 55: electrolyte, 56: auxiliary anode, 60: auxiliary anode tank, W: aluminum plate, A1: liquid supply direction, A2: electrolyte discharge direction , 610: Anodizing device, 612: Feeding tank, 614: Electrolytic treatment tank, 616: Aluminum plate, 618, 26: Electrolyte, 620: Feeding electrode, 622,628: Roller, 624: Nip roller, 630: Electrolytic electrode , 632: Tank wall, 634: DC power supply

Claims (70)

  1.  アルミニウム支持体、及び、前記アルミニウム支持体上に画像記録層を有し、
     前記画像記録層が、HOMOが-5.2eV以下である赤外線吸収性ポリメチン色素、重合開始剤、及び、重合性化合物を含み、
     前記画像記録層のエチレン性不飽和結合価が、1.0mmol/g以上である
     平版印刷版原版。
    It has an aluminum support and an image recording layer on the aluminum support.
    The image recording layer contains an infrared-absorbing polymethine dye having a HOMO of −5.2 eV or less, a polymerization initiator, and a polymerizable compound.
    A lithographic printing plate original plate in which the ethylenically unsaturated bond value of the image recording layer is 1.0 mmol / g or more.
  2.  前記画像記録層のエチレン性不飽和結合価が、2.5mmol/g以上である請求項1に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 1, wherein the ethylenically unsaturated bond value of the image recording layer is 2.5 mmol / g or more.
  3.  前記ポリメチン色素が、両末端の芳香環の少なくとも一方に電子求引性基又は重原子含有基を有するシアニン色素を含む請求項1又は請求項2に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 1 or 2, wherein the polymethine dye contains a cyanine dye having an electron-attracting group or a heavy atom-containing group in at least one of the aromatic rings at both ends.
  4.  前記ポリメチン色素のHOMOが、-5.3eV以下である請求項1~請求項3のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 1 to 3, wherein the HOMO of the polymethine dye is −5.3 eV or less.
  5.  前記画像記録層が、最外層である請求項1~請求項4のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 1 to 4, wherein the image recording layer is the outermost layer.
  6.  前記画像記録層の上に変色性化合物を含有する保護層を有する請求項1~請求項4のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate original plate according to any one of claims 1 to 4, which has a protective layer containing a discoloring compound on the image recording layer.
  7.  エネルギー密度110mJ/cmにて波長830nmの赤外線による露光を行った場合の、前記露光前後の明度変化ΔLが、2.0以上である請求項6に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 6, wherein the change in brightness ΔL before and after the exposure when exposed to infrared rays having a wavelength of 830 nm at an energy density of 110 mJ / cm 2 is 2.0 or more.
  8.  前記変色性化合物が、赤外線露光に起因して発色する化合物を含む請求項6又は請求項7に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 6 or 7, wherein the discoloring compound contains a compound that develops color due to infrared exposure.
  9.  前記変色性化合物が、赤外線露光に起因して分解する分解性化合物を含む請求項6~請求項8のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate original plate according to any one of claims 6 to 8, wherein the discoloring compound contains a decomposable compound that decomposes due to infrared exposure.
  10.  前記変色性化合物が、赤外線露光に起因する、熱、電子移動、又はその両方により分解する分解性化合物を含む請求項9に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 9, wherein the discoloring compound contains a degradable compound that is decomposed by heat, electron transfer, or both due to infrared exposure.
  11.  前記変色性化合物が、シアニン色素である請求項6~請求項10のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate original plate according to any one of claims 6 to 10, wherein the discoloring compound is a cyanine dye.
  12.  前記変色性化合物が、下記式1-1で表される化合物である請求項6~請求項11に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000001

     式1-1中、Rは下記式2~式4のいずれかで表される基を表し、R11~R18はそれぞれ独立に、水素原子、ハロゲン原子、-R、-OR、-SR、又は-NRを表し、R~Rは、それぞれ独立に、炭化水素基を表し、A、A及び複数のR11~R18が連結して単環又は多環を形成してもよく、A及びAはそれぞれ独立に、酸素原子、硫黄原子、又は、窒素原子を表し、n11及びn12はそれぞれ独立に、0~5の整数を表し、但し、n11及びn12の合計は2以上であり、n13及びn14はそれぞれ独立に、0又は1を表し、Lは酸素原子、硫黄原子、又は、-NR10-を表し、R10は、水素原子、アルキル基、又はアリール基を表し、Zaは電荷を中和する対イオンを表す。
    Figure JPOXMLDOC01-appb-C000002

     式2~式4中、R20、R30、R41及びR42はそれぞれ独立に、アルキル基又はアリール基を表し、Zbは電荷を中和する対イオンを表し、波線は、前記式1-1中のLで表される基との結合部位を表す。
    The planographic printing plate original plate according to claim 6 to 11, wherein the discoloring compound is a compound represented by the following formula 1-1.
    Figure JPOXMLDOC01-appb-C000001

    In formula 1-1, R 1 represents a group represented by any of the following formulas 2 to 4, and R 11 to R 18 are independently hydrogen atom, halogen atom, -R a , -OR b , and so on. -SR c, or represents -NR d R e, R a ~ R e each independently represents a hydrocarbon group, a 1, a 2 and a plurality of R 11 ~ R 18 are linked monocyclic or Polycycles may be formed, where A 1 and A 2 independently represent an oxygen atom, a sulfur atom, or a nitrogen atom, and n 11 and n 12 each independently represent an integer of 0 to 5. However, the total of n 11 and n 12 is 2 or more, n 13 and n 14 independently represent 0 or 1, L represents an oxygen atom, a sulfur atom, or -NR 10- , and R 10 Represents a hydrogen atom, an alkyl group, or an aryl group, and Za represents a counterion that neutralizes the charge.
    Figure JPOXMLDOC01-appb-C000002

    In formulas 2 to 4, R 20 , R 30 , R 41 and R 42 independently represent an alkyl group or an aryl group, Zb represents a charge-neutralizing counterion, and the wavy line represents the above formula 1-. Represents a binding site with a group represented by L in 1.
  13.  前記変色性化合物が、下記式1-2で表される化合物である請求項12に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000003

     式1-2中、Rは上記式2~式4のいずれかで表される基を表し、R19~R22はそれぞれ独立に、水素原子、ハロゲン原子、-R、-OR、-CN、-SR、又は、-NRを表し、R23及びR24はそれぞれ独立に、水素原子、又は、-Rを表し、R~Rはそれぞれ独立に、炭化水素基を表し、R19とR20、R21とR22、又は、R23とR24は、連結して単環又は多環を形成してもよく、Lは、酸素原子、硫黄原子、又は、-NR10-を表し、R10は、水素原子、アルキル基、又は、アリール基を表し、Rd1~Rd4、W及びWは、それぞれ独立に、置換基を有してもよいアルキル基を表し、Zaは電荷を中和する対イオンを表す。
    The planographic printing plate original plate according to claim 12, wherein the discoloring compound is a compound represented by the following formula 1-2.
    Figure JPOXMLDOC01-appb-C000003

    In formula 1-2, R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independently hydrogen atom, halogen atom, -R a , -OR b , and so on. -CN, -SR c, or represents -NR d R e, R 23 and R 24 each independently represent a hydrogen atom, or represents a -R a, each is R a ~ R e independently, hydrocarbon Representing a group, R 19 and R 20 , R 21 and R 22 , or R 23 and R 24 may be linked to form a monocyclic or polycyclic, where L is an oxygen atom, a sulfur atom, or , -NR 10- , R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and R d1 to R d4 , W 1 and W 2 may independently have substituents. It represents an alkyl group and Za represents a counterion that neutralizes the charge.
  14.  前記変色性化合物が、下記式1-3~式1-7のいずれかで表される化合物である請求項12又は請求項13に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000004

     式1-3~式1-7中、Rは上記式2~式4のいずれかで表される基を表し、R19~R22はそれぞれ独立に、水素原子、ハロゲン原子、-R、-OR、-CN、-SR、又は、-NRを表し、R25及びR26はそれぞれ独立に、水素原子、ハロゲン原子、又は-Rを表し、R~Rはそれぞれ独立に、炭化水素基を表し、R19とR20、R21とR22、又は、R25とR26は、連結して単環又は多環を形成してもよく、Lは、酸素原子、硫黄原子、又は、-NR10-を表し、R10は、水素原子、アルキル基、又は、アリール基を表し、Rd1~Rd4、W及びWはそれぞれ独立に、置換基を有してもよいアルキル基を表し、Zaは電荷を中和する対イオンを表す。
    The planographic printing plate original plate according to claim 12 or 13, wherein the discoloring compound is a compound represented by any of the following formulas 1-3 to 1-7.
    Figure JPOXMLDOC01-appb-C000004

    In formulas 1-3 to 1-7, R 1 represents a group represented by any of the above formulas 2 to 4, and R 19 to R 22 are independent hydrogen atoms, halogen atoms, and −R a. , -OR b , -CN, -SR c , or -NR d R e , and R 25 and R 26 independently represent a hydrogen atom, a halogen atom, or -R a , and R a to R e. Represent each independently as a hydrocarbon group, and R 19 and R 20 , R 21 and R 22 , or R 25 and R 26 may be linked to form a monocyclic or polycyclic, and L is It represents an oxygen atom, a sulfur atom, or -NR 10- , R 10 represents a hydrogen atom, an alkyl group, or an aryl group, and R d1 to R d4 , W 1 and W 2 are independent substituents. Represents an alkyl group which may have, and Za represents a counterion that neutralizes the charge.
  15.  前記式1-2~式1-7におけるW及びWはそれぞれ独立に、置換基を有するアルキル基であり、かつ、前記置換基として、-(OCHCH)-、スルホ基、スルホ基の塩、カルボキシ基、又は、カルボキシ基の塩を少なくとも有する基である請求項13又は請求項14に記載の平版印刷版原版。 W 1 and W 2 in the formulas 1-2 to 1-7 are each independently an alkyl group having a substituent, and the substituents are-(OCH 2 CH 2 )-, a sulfo group, and a sulfo. The flat plate printing plate original plate according to claim 13 or 14, which is a group having at least a salt of a group, a carboxy group, or a salt of a carboxy group.
  16.  前記式1-2~式1-7におけるLが、酸素原子である請求項13~請求項15のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 13 to 15, wherein L in the formulas 1-2 to 1-7 is an oxygen atom.
  17.  前記保護層の前記変色性化合物の含有量Mと前記画像記録層の前記赤外線吸収剤の含有量Mとの比M/Mが、0.2以上である請求項6~請求項16のいずれか1項に記載の平版印刷版原版。 The ratio M X / M Y between the content M X and the content M Y of the infrared absorbent in the image recording layer of the color-changing compound of the protective layer is, claims 6 to claim at least 0.2 The planographic printing plate original plate according to any one of 16.
  18.  前記保護層が、水溶性ポリマーを含む請求項6~請求項17のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate original plate according to any one of claims 6 to 17, wherein the protective layer contains a water-soluble polymer.
  19.  前記水溶性ポリマーが、けん化度が50%以上であるポリビニルアルコールを含む請求項18に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 18, wherein the water-soluble polymer contains polyvinyl alcohol having a saponification degree of 50% or more.
  20.  前記水溶性ポリマーが、ポリビニルピロリドンを含む請求項18又は請求項19に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 18 or 19, wherein the water-soluble polymer contains polyvinylpyrrolidone.
  21.  前記保護層が、疎水性ポリマーを含む請求項18~請求項20のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate original plate according to any one of claims 18 to 20, wherein the protective layer contains a hydrophobic polymer.
  22.  前記疎水性ポリマーが、疎水性ポリマー粒子である請求項21に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 21, wherein the hydrophobic polymer is hydrophobic polymer particles.
  23.  前記疎水性ポリマーが、ポリビニリデンクロライド樹脂を含む請求項21又は請求項22に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 21 or 22, wherein the hydrophobic polymer contains a polyvinylidene chloride resin.
  24.  前記疎水性ポリマーが、スチレン-アクリル共重合体を含む請求項21~請求項23のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate original plate according to any one of claims 21 to 23, wherein the hydrophobic polymer contains a styrene-acrylic copolymer.
  25.  前記保護層が、感脂化剤を含む請求項6~請求項24のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 6 to 24, wherein the protective layer contains an oil-sensitive agent.
  26.  前記保護層の量が、0.1g/m~2.0g/mである請求項6~請求項25のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 6 to 25, wherein the amount of the protective layer is 0.1 g / m 2 to 2.0 g / m 2 .
  27.  前記アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角が、110°以下である請求項1~請求項26のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 1 to 26, wherein the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side is 110 ° or less.
  28.  前記アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角が、80°以下である請求項27に記載の平版印刷版原版。 The planographic printing plate original plate according to claim 27, wherein the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side is 80 ° or less.
  29.  前記アルミニウム支持体の画像記録層側の表面における空中水滴法による水との接触角が、50°以下である請求項28に記載の平版印刷版原版。 The planographic printing plate original plate according to claim 28, wherein the contact angle with water by the aerial water droplet method on the surface of the aluminum support on the image recording layer side is 50 ° or less.
  30.  前記アルミニウム支持体上の層が、ヒドロキシカルボン酸又はその塩を含む請求項1~請求項29のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate original plate according to any one of claims 1 to 29, wherein the layer on the aluminum support contains hydroxycarboxylic acid or a salt thereof.
  31.  前記ヒドロキシカルボン酸又はその塩が、ヒドロキシ基を2個以上有する化合物を含む請求項30に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 30, wherein the hydroxycarboxylic acid or a salt thereof contains a compound having two or more hydroxy groups.
  32.  前記ヒドロキシカルボン酸又はその塩が、ヒドロキシ基を3個以上有する化合物を含む請求項30又は請求項31に記載の平版印刷版原版。 The planographic printing plate original plate according to claim 30 or 31, wherein the hydroxycarboxylic acid or a salt thereof contains a compound having three or more hydroxy groups.
  33.  前記画像記録層が、粒子を含む請求項1~請求項32のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 1 to 32, wherein the image recording layer contains particles.
  34.  前記粒子が、ポリマー粒子を含む請求項33に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 33, wherein the particles include polymer particles.
  35.  前記ポリマー粒子が、親水性基を有する請求項34に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 34, wherein the polymer particles have a hydrophilic group.
  36.  前記ポリマー粒子が、前記親水性基として、下記式Zで表される基を有する請求項35に記載の平版印刷版原版。
      *-Q-W-Y 式Z
     式Z中、Qは二価の連結基を表し、Wは親水性構造を有する二価の基又は疎水性構造を有する二価の基を表し、Yは親水性構造を有する一価の基又は疎水性構造を有する一価の基を表し、W及びYのいずれかは親水性構造を有し、*は他の構造との結合部位を表す。
    The planographic printing plate original plate according to claim 35, wherein the polymer particles have a group represented by the following formula Z as the hydrophilic group.
    * -Q-W-Y formula Z
    In formula Z, Q represents a divalent linking group, W represents a divalent group having a hydrophilic structure or a divalent group having a hydrophobic structure, and Y represents a monovalent group having a hydrophilic structure or It represents a monovalent group having a hydrophobic structure, either W or Y has a hydrophilic structure, and * represents a binding site with another structure.
  37.  前記ポリマー粒子が、前記親水性基として、ポリアルキレンオキシド構造を有する請求項35又は請求項36に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 35 or 36, wherein the polymer particles have a polyalkylene oxide structure as the hydrophilic group.
  38.  前記ポリマー粒子が、前記ポリオキシアルキレンオキシド構造として、ポリプロピレンオキシド構造を有する請求項37に記載の平版印刷版原版。 The planographic printing plate original plate according to claim 37, wherein the polymer particles have a polypropylene oxide structure as the polyoxyalkylene oxide structure.
  39.  前記ポリマー粒子が、前記ポリオキシアルキレンオキシド構造として、ポリエチレンオキシド構造及びポリプロピレンオキシド構造を少なくとも有する請求項37又は請求項38に記載の平版印刷版原版。 The planographic printing plate original plate according to claim 37 or 38, wherein the polymer particles have at least a polyethylene oxide structure and a polypropylene oxide structure as the polyoxyalkylene oxide structure.
  40.  前記ポリマー粒子が、下記式(Iso)で表されるイソシアネート化合物と水とを少なくとも反応させて得られる構造を有する樹脂を含む請求項34~請求項39のいずれか1項に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000005

     式(Iso)中、nは0~10の整数を表す。
    The lithographic printing plate according to any one of claims 34 to 39, wherein the polymer particles contain a resin having a structure obtained by at least reacting an isocyanate compound represented by the following formula (Iso) with water. Original version.
    Figure JPOXMLDOC01-appb-C000005

    In the formula (Iso), n represents an integer from 0 to 10.
  41.  前記ポリマー粒子が、前記式(Iso)で表されるイソシアネート化合物と水とを少なくとも反応させて得られる構造を有し、かつポリオキシアルキレン構造として、ポリエチレンオキシド構造及びポリプロピレンオキシド構造を有する樹脂を含む請求項40に記載の平版印刷版原版。 The polymer particles have a structure obtained by at least reacting an isocyanate compound represented by the formula (Iso) with water, and include a resin having a polyethylene oxide structure and a polypropylene oxide structure as a polyoxyalkylene structure. The lithographic printing plate original plate according to claim 40.
  42.  前記画像記録層が、前記重合開始剤として、電子供与型重合開始剤を含む請求項1~請求項41のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 1 to 41, wherein the image recording layer contains an electron donating type polymerization initiator as the polymerization initiator.
  43.  前記ポリメチン色素のHOMO-前記電子供与型重合開始剤のHOMOの値が、0.70eV以下である請求項42に記載の平版印刷版原版。 The planographic printing plate original plate according to claim 42, wherein the HOMO value of the polymethine dye-the HOMO value of the electron donating type polymerization initiator is 0.70 eV or less.
  44.  前記画像記録層が、発色剤を更に含む請求項1~請求項43のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 1 to 43, wherein the image recording layer further contains a color former.
  45.  前記画像記録層における前記発色剤が、酸発色剤である請求項44に記載の平版印刷版原版。 The planographic printing plate original plate according to claim 44, wherein the color former in the image recording layer is an acid color former.
  46.  前記画像記録層における前記酸発色剤が、ロイコ色素である請求項45に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 45, wherein the acid color former in the image recording layer is a leuco dye.
  47.  前記画像記録層における前記ロイコ色素が、フタリド構造又はフルオラン構造を有するロイコ色素である請求項46に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 46, wherein the leuco dye in the image recording layer is a leuco dye having a phthalide structure or a fluorine structure.
  48.  前記画像記録層における前記フタリド構造又はフルオラン構造を有するロイコ色素が、下記式(Le-1)~式(Le-3)のいずれかで表される化合物である請求項47に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000006

     式(Le-1)~式(Le-3)中、ERGはそれぞれ独立に、電子供与性基を表し、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、X~X10はそれぞれ独立に、水素原子、ハロゲン原子又は一価の有機基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Raは、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、アルキル基又はアリール基を表す。
    The lithographic printing plate according to claim 47, wherein the leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by any of the following formulas (Le-1) to (Le-3). Original version.
    Figure JPOXMLDOC01-appb-C000006

    Wherein (Le-1) ~ formula (Le-3), in each ERG independently represents an electron donating group, each X 1 ~ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group , X 5 to X 10 independently represent a hydrogen atom, a halogen atom or a monovalent organic group, Y 1 and Y 2 independently represent C or N, and when Y 1 is N, If X 1 is absent and Y 2 is N, then X 4 is absent, Ra 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 are independent alkyl groups. Or represents an aryl group.
  49.  前記画像記録層における前記フタリド構造又はフルオラン構造を有するロイコ色素が、下記式(Le-4)~式(Le-6)のいずれかで表される化合物である請求項47又は請求項48に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000007

     式(Le-4)~式(Le-6)中、ERGはそれぞれ独立に、電子供与性基を表し、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Raは、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、アルキル基又はアリール基を表す。
    The 47th or 48th claim, wherein the leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by any of the following formulas (Le-4) to (Le-6). The original plate of the lithographic printing plate.
    Figure JPOXMLDOC01-appb-C000007

    Wherein (Le-4) ~ formula (Le-6), in each ERG independently represents an electron donating group, each X 1 ~ X 4 independently represent a hydrogen atom, a halogen atom or a dialkyl anilino group , Y 1 and Y 2 independently represent C or N, and if Y 1 is N, then X 1 does not exist, and if Y 2 is N, then X 4 does not exist and Ra. 1 represents a hydrogen atom, an alkyl group or an alkoxy group, and Rb 1 to Rb 4 independently represent an alkyl group or an aryl group, respectively.
  50.  前記画像記録層における前記フタリド構造又はフルオラン構造を有するロイコ色素が、下記式(Le-7)~式(Le-9)のいずれかで表される化合物である請求項47~請求項49のいずれか1項に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000008

     式(Le-7)~式(Le-9)中、X~Xはそれぞれ独立に、水素原子、ハロゲン原子又はジアルキルアニリノ基を表し、Y及びYはそれぞれ独立に、C又はNを表し、YがNである場合は、Xは存在せず、YがNである場合は、Xは存在せず、Ra~Raはそれぞれ独立に、水素原子、アルキル基又はアルコキシ基を表し、Rb~Rbはそれぞれ独立に、アルキル基又はアリール基を表し、Rc及びRcはそれぞれ独立に、アリール基を表す。
    Any of claims 47 to 49, wherein the leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by any of the following formulas (Le-7) to (Le-9). Or the original plate of the lithographic printing plate described in item 1.
    Figure JPOXMLDOC01-appb-C000008

    Wherein (Le-7) ~ formula (Le-9), each X 1 ~ X 4 is independently a hydrogen atom, a halogen atom or a dialkyl anilino group, Y 1 and Y 2 are each independently, C or Representing N, when Y 1 is N, X 1 does not exist, when Y 2 is N, X 4 does not exist, and Ra 1 to Ra 4 are independent hydrogen atoms and alkyl, respectively. Represents a group or an alkoxy group, Rb 1 to Rb 4 independently represent an alkyl group or an aryl group, and Rc 1 and Rc 2 each independently represent an aryl group.
  51.  Ra~Raがそれぞれ独立に、アルコキシ基である請求項50に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 50, wherein each of Ra 1 to Ra 4 is an alkoxy group independently.
  52.  前記画像記録層における前記フタリド構造又はフルオラン構造を有するロイコ色素が、前記式(Le-8)で表される化合物である請求項50又は請求項51に記載の平版印刷版原版。 The planographic printing plate original plate according to claim 50 or 51, wherein the leuco dye having the phthalide structure or the fluorine structure in the image recording layer is a compound represented by the formula (Le-8).
  53.  X~Xが水素原子であり、Y及びYがCである請求項52に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 52, wherein X 1 to X 4 are hydrogen atoms and Y 1 and Y 2 are C.
  54.  Rb及びRbがそれぞれ独立に、アルキル基である請求項52又は請求項53に記載の平版印刷版原版。 The lithographic printing plate original plate according to claim 52 or 53, wherein Rb 1 and Rb 2 are independently alkyl groups.
  55.  前記ポリメチン色素が、ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16以上32以下であり、かつδhがδpの60%以下である有機アニオンを有する請求項1~請求項54のいずれか1項に記載の平版印刷版原版。 Any of claims 1 to 54, wherein the polymethine dye has an organic anion having δd of 16 or more, δp of 16 or more and 32 or less, and δh of 60% or less of δp in the Hansen solubility parameter. The original plate of the lithographic printing plate described in item 1.
  56.  前記重合開始剤が、電子受容型重合開始剤を含む請求項1~請求項55のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 1 to 55, wherein the polymerization initiator contains an electron-accepting polymerization initiator.
  57.  前記電子受容型重合開始剤が、ハンセンの溶解度パラメータにおけるδdが16以上であり、δpが16以上32以下であり、かつδhがδpの60%以下である有機アニオンを有する請求項56に記載の平版印刷版原版。 The 56th claim, wherein the electron-accepting polymerization initiator has an organic anion in which δd in the solubility parameter of Hansen is 16 or more, δp is 16 or more and 32 or less, and δh is 60% or less of δp. Planographic printing plate original plate.
  58.  前記電子受容型重合開始剤が、下記式(II)で表される化合物を含む請求項56又は請求項57に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000009

     式(II)中、Xはハロゲン原子を表し、Rはアリール基を表す。
    The planographic printing plate original plate according to claim 56 or 57, wherein the electron-accepting polymerization initiator contains a compound represented by the following formula (II).
    Figure JPOXMLDOC01-appb-C000009

    In formula (II), X represents a halogen atom and R 3 represents an aryl group.
  59.  前記画像記録層が、バインダーポリマーとしてポリビニルアセタールを更に含有する請求項1~請求項58のいずれか1項に記載の平版印刷版原版。 The planographic printing plate original plate according to any one of claims 1 to 58, wherein the image recording layer further contains polyvinyl acetal as a binder polymer.
  60.  前記画像記録層が、フルオロ脂肪族基含有共重合体を更に含有する請求項1~請求項59のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate original plate according to any one of claims 1 to 59, wherein the image recording layer further contains a fluoroaliphatic group-containing copolymer.
  61.  前記フルオロ脂肪族基含有共重合体が、下記式(F1)及び下記式(F2)のいずれかで表される化合物により形成される構成単位を有する請求項60に記載の平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000010

     式(F1)及び(F2)中、RF1は、それぞれ独立に、水素原子又はメチル基を表し、Xは、それぞれ独立に、酸素原子、硫黄原子、又は-N(RF2)-を表し、mは1~6の整数を表し、nは1~10の整数を表し、lは0~10の整数を表し、RF2は水素原子又は炭素数1~4のアルキル基を表す。
    The planographic printing plate original plate according to claim 60, wherein the fluoroaliphatic group-containing copolymer has a structural unit formed of a compound represented by any of the following formulas (F1) and (F2).
    Figure JPOXMLDOC01-appb-C000010

    In formulas (F1) and (F2), R F1 independently represents a hydrogen atom or a methyl group, and X independently represents an oxygen atom, a sulfur atom, or -N ( RF2 )-. m represents an integer of 1 ~ 6, n represents an integer of 1 ~ 10, l represents an integer of 0 ~ 10, R F2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
  62.  前記フルオロ脂肪族基含有共重合体が、ポリ(オキシアルキレン)アクリレート及びポリ(オキシアルキレン)メタクリレートよりなる群から選択される少なくとも1種の化合物により形成される構成単位を更に有する請求項61に記載の機上現像型平版印刷版原版。 16. The 61st aspect of the present invention, wherein the fluoroaliphatic group-containing copolymer further has a structural unit formed of at least one compound selected from the group consisting of poly (oxyalkylene) acrylate and poly (oxyalkylene) methacrylate. On-board development type lithographic printing plate original plate.
  63.  前記重合性化合物が、エチレン性不飽和結合価が5.0mmol/g以上の化合物を含む請求項1~請求項62のいずれか1項に記載の機上現像型平版印刷版原版。 The machine-developed lithographic printing plate original plate according to any one of claims 1 to 62, wherein the polymerizable compound contains a compound having an ethylenically unsaturated bond value of 5.0 mmol / g or more.
  64.  前記エチレン性不飽和結合価が5.0mmol/g以上の化合物が、下記式(I)で表される化合物である請求項63に記載の機上現像型平版印刷版原版。
     式(I) : X-(Y)  
     式(I)中、Xは水素結合性基を有するn価の有機基を表し、Yは2以上のエチレン性不飽和基を有する1価の基を表し、nは2以上の整数を表し、Xの分子量/(Yの分子量×n)が1以下である。
    The machine-developed lithographic printing plate original plate according to claim 63, wherein the compound having an ethylenically unsaturated bond value of 5.0 mmol / g or more is a compound represented by the following formula (I).
    Formula (I): X- (Y) n
    In formula (I), X represents an n-valent organic group having a hydrogen-bonding group, Y represents a monovalent group having two or more ethylenically unsaturated groups, and n represents an integer of two or more. The molecular weight of X / (molecular weight of Y × n) is 1 or less.
  65.  前記エチレン性不飽和結合価が5.0mmol/g以上の化合物が、アダクト構造、ビウレット構造、及びイソシアヌレート構造からなる群より選ばれた少なくとも1種の構造を有する請求項63又は請求項64に記載の機上現像型平版印刷版原版。 Claim 63 or 64, wherein the compound having an ethylenically unsaturated bond value of 5.0 mmol / g or more has at least one structure selected from the group consisting of an adduct structure, a biuret structure, and an isocyanurate structure. The above-mentioned on-board development type lithographic printing plate original plate.
  66.  前記重合性化合物が、エチレン性不飽和基を1つ又は2つ有する化合物を含む請求項1~請求項65のいずれか1項に記載の機上現像型平版印刷版原版。 The machine-developed lithographic printing plate original plate according to any one of claims 1 to 65, wherein the polymerizable compound contains a compound having one or two ethylenically unsaturated groups.
  67.  前記アルミニウム支持体が、アルミニウム板と、前記アルミニウム板上に配置されたアルミニウムの陽極酸化皮膜とを有し、
     前記陽極酸化皮膜が、前記アルミニウム板よりも前記画像記録層側に位置し、
     前記陽極酸化皮膜が、前記画像記録層側の表面から深さ方向にのびるマイクロポアを有し、
     前記マイクロポアの前記陽極酸化皮膜表面における平均径が、10nmを超え100nm以下であり、
     前記陽極酸化皮膜の前記画像記録層側の表面のL表色系における明度Lの値が、70~100である請求項1~請求項66のいずれか1項に記載の平版印刷版原版。
    The aluminum support has an aluminum plate and an anodized film of aluminum arranged on the aluminum plate.
    The anodized film is located closer to the image recording layer than the aluminum plate.
    The anodized film has micropores extending in the depth direction from the surface on the image recording layer side.
    The average diameter of the micropores on the surface of the anodized film is more than 10 nm and 100 nm or less.
    The method according to any one of claims 1 to 66, wherein the value of the lightness L * in the surface of the anodized film on the image recording layer side is 70 to 100 in the L * a * b * color system. Planographic printing plate original plate.
  68.  前記マイクロポアが、前記陽極酸化皮膜表面から深さ10nm~1,000nmの位置までのびる大径孔部と、前記大径孔部の底部と連通し、連通位置から深さ20nm~2,000nmの位置までのびる小径孔部とから構成され、
     前記大径孔部の前記陽極酸化皮膜表面における平均径が、15nm~100nmであり、
     前記小径孔部の前記連通位置における平均径が、13nm以下である請求項67に記載の平版印刷版原版。
    The micropore communicates with a large-diameter hole extending from the surface of the anodized film to a depth of 10 nm to 1,000 nm and the bottom of the large-diameter hole, and has a depth of 20 nm to 2,000 nm from the communicating position. It is composed of a small diameter hole that extends to the position,
    The average diameter of the large-diameter pore portion on the surface of the anodized film is 15 nm to 100 nm.
    The planographic printing plate original plate according to claim 67, wherein the average diameter of the small-diameter hole portion at the communication position is 13 nm or less.
  69.  請求項1~請求項68のいずれか1項に記載の平版印刷版原版を画像様に露光する工程と、
     印刷機上で印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して非画像部の画像記録層を除去する工程と、を含む平版印刷版の作製方法。
    The step of exposing the lithographic printing plate original plate according to any one of claims 1 to 68 like an image, and
    A method for producing a lithographic printing plate, comprising a step of supplying at least one selected from the group consisting of printing ink and dampening water on a printing machine to remove an image recording layer in a non-image area.
  70.  請求項1~請求項68のいずれか1項に記載の平版印刷版原版を画像様に露光する工程と、
     印刷インキ及び湿し水よりなる群から選ばれた少なくとも一方を供給して印刷機上で非画像部の画像記録層を除去し平版印刷版を作製する工程と、
     得られた平版印刷版により印刷する工程と、を含む平版印刷方法。
    The step of exposing the lithographic printing plate original plate according to any one of claims 1 to 68 like an image, and
    A step of supplying at least one selected from the group consisting of printing ink and dampening water to remove the image recording layer of the non-image area on the printing machine to prepare a lithographic printing plate.
    A lithographic printing method including a step of printing with the obtained lithographic printing plate.
PCT/JP2020/025410 2019-06-28 2020-06-26 Lithographic printing plate original plate, method for fabricating lithographic printing plate, and lithographic printing method WO2020262688A1 (en)

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