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WO2020171617A1 - Composition for insulation film, and insulated electric wire comprising insulation film formed therefrom - Google Patents

Composition for insulation film, and insulated electric wire comprising insulation film formed therefrom Download PDF

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Publication number
WO2020171617A1
WO2020171617A1 PCT/KR2020/002449 KR2020002449W WO2020171617A1 WO 2020171617 A1 WO2020171617 A1 WO 2020171617A1 KR 2020002449 W KR2020002449 W KR 2020002449W WO 2020171617 A1 WO2020171617 A1 WO 2020171617A1
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WO
WIPO (PCT)
Prior art keywords
insulating film
composition
diamine compound
bis
dianhydride
Prior art date
Application number
PCT/KR2020/002449
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French (fr)
Korean (ko)
Inventor
서동진
Original Assignee
엘에스전선 주식회사
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Publication date
Priority claimed from KR1020200020168A external-priority patent/KR20200101867A/en
Application filed by 엘에스전선 주식회사 filed Critical 엘에스전선 주식회사
Publication of WO2020171617A1 publication Critical patent/WO2020171617A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00Insulated conductors or cables characterised by their form
    • H01B7/02Disposition of insulation

Definitions

  • the present invention relates to an insulating electric wire comprising a composition for an insulating film and an insulating film formed therefrom. Specifically, the present invention relates to an insulating wire comprising a composition for an insulating film having low relative dielectric constant and high partial discharge initiation voltage and excellent heat resistance, stable at high temperature, and excellent flexibility, and an insulating film formed therefrom.
  • Insulated wires applied as coils of rotating electric machines such as motors or electric devices such as transformers are made of resins such as polyimide, polyamideimide, and polyesterimide on the surface of a metal conductor with a circular or square cross-sectional shape. It can be produced by covering with an insulating paint dissolved in a solvent to form one or two or more insulating films.
  • inverter surge voltage generated by the inverter control is high, partial discharge occurs due to the inverter surge voltage in the insulated wire constituting the coil of the electric device and insulates it.
  • the insulating film of the electric wire may be deteriorated or damaged.
  • conventional insulated wires contain inorganic particles such as silica in the insulating film to prevent deterioration or damage of the insulating film due to inverter surge voltage, but these inorganic particles increase the relative dielectric constant of the insulating film, and as a result, the insulating wire
  • the partial discharge inception voltage of may be reduced, and flexibility may be greatly reduced.
  • an aromatic diamine component having three or more aromatic rings and an aromatic imide prepolymer containing an acid component have two or less aromatics.
  • a polyimide resin coating obtained by mixing an aromatic diisocyanate component having a ring was applied.
  • such a polyimide resin coating has low heat resistance and thus a stable insulating film at high temperature cannot be formed.
  • high-temperature stability of the insulating film is becoming important.
  • An object of the present invention is to provide a composition for an insulating film having a low relative dielectric constant, high partial discharge initiation voltage, and excellent flexibility, and an insulating wire including an insulating film formed therefrom.
  • Another object of the present invention is to provide an insulating wire comprising a composition for an insulating film stable at high temperature and an insulating film formed therefrom.
  • composition for an insulating film includes a polyimide resin formed through polymerization of a dianhydride compound and a diamine compound, the dianhydride compound includes a tetracarboxylic dianhydride or an isomer thereof, and the diamine compound is a first diamine A compound and a second diamine compound, wherein the first diamine compound is 2,2-bis[4-(4-aminophenoxy)phenyl]propane (BAPP), bis[4-(4-aminophenoxy)phenyl ]Sulfone (BAPS), bis[4-(4-aminophenoxy)phenyl]ether (BAPE), 4,4'-bis(4-aminophenoxy)biphenyl (BAPB), 1,4-bis(4 -Aminophenoxy)benzene, 9,9-bis(4-aminophenyl)fluorene (FDA), 2,2'-dimethyl-4,4'-diaminobiphenyl, 4,
  • BAPP
  • a molar ratio of the first diamine compound and the second diamine compound is greater than 50:50 and less than or equal to 95:5, providing a composition for an insulating film.
  • the tetracarboxylic dianhydride is 1 selected from the group consisting of pyromellitic dianhydride (PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA), and isomers thereof. It provides a composition for an insulating film, characterized in that it contains more than one species.
  • the pyromellitic dianhydride (PMDA) and 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) are 30:70 or more and 70:30 or less. It provides a composition for an insulating film, characterized in that mixed in a molar ratio of.
  • the polyimide resin provides a composition for an insulating film, characterized in that it has a molecular structure of the following formula (1).
  • n 5 to 200.
  • the polyimide resin provides a composition for an insulating film, characterized in that the number average molecular weight (Mn) is 10,000 to 200,000.
  • NMP N-methyl-2-pyrrolidone
  • DMAc N,N-dimethylacetamide
  • DMF N,N-dimethylformamide
  • DI dimethylimidazolidinone
  • cyclohexanone methylcyclohexanone and aromatic alkyl benzenes, characterized in that it comprises at least one solvent selected from the group consisting of, provides a composition for an insulating film.
  • the insulating film is formed on the surface of the conductor and includes a first insulating film comprising at least one resin selected from the group consisting of polyimide resin, polyamideimide resin, and polyesterimide resin; And a second insulating film formed on the first insulating film and formed from the composition for an insulating film of claim 1 or 2.
  • the second insulating film has a thickness of 85% or more of the total thickness of the insulating film.
  • an insulated wire characterized in that it further comprises at least one layer selected from the group consisting of an adhesion-improving layer formed on the surface of the conductor, a lubricating layer formed on the surface of the insulating film or the surface of the second insulating film, and a highly flexible layer Provides.
  • composition for an insulating film according to the present invention contains a polyimide resin having a specific molecular structure, the relative dielectric constant is low, the partial discharge initiation voltage is high, and the heat resistance is excellent, so that it is stable at high temperatures and has excellent flexibility.
  • FIG. 1 shows an embodiment of an insulated wire according to the present invention.
  • Figure 2 shows another embodiment of the insulated wire according to the present invention.
  • the composition for an insulating film according to the present invention may include a polyimide resin formed through polymerization of a dianhydride compound and a diamine compound, wherein the dianhydride compound is, for example, tetracarboxylic dianhydride, preferably fatigue.
  • a polyimide resin formed through polymerization of a dianhydride compound and a diamine compound, wherein the dianhydride compound is, for example, tetracarboxylic dianhydride, preferably fatigue.
  • the pyromellitic dianhydride (PMDA) and 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) are 30:70 or more and 70:30 or less. It can be mixed in a molar ratio of.
  • the insulated wire according to the present invention can be applied in automobiles, and oil resistance must be secured due to the environment exposed to engine oil, etc., and pyromellitic dianhydride (PMDA) and 3,3',4,4'-biphenyltetra
  • the carboxylic acid dianhydride (BPDA) is in the above range, sufficient oil resistance can be secured.
  • the diamine compound may include a first diamine compound and a second diamine compound
  • the first diamine compound is, for example, 2,2-bis[4-(4-aminophenoxy)phenyl]propane (BAPP ), bis[4-(4-aminophenoxy)phenyl]sulfone (BAPS), bis[4-(4-aminophenoxy)phenyl] ether (BAPE), 4,4'-bis(4-aminophenoxy) ) Biphenyl (BAPB), 1,4-bis (4-aminophenoxy) benzene, 9,9-bis (4-aminophenyl) fluorene (FDA), 2,2'-dimethyl-4,4'- Diaminobiphenyl, 4,4'-bis(4-aminophenyl)sulfide, etc. or isomers thereof
  • the second diamine compound is, for example, 1,4-diaminobenzene, 2,4- Diaminotoluene and the like
  • the first diamine compound is a compound having polarity and may lower the relative dielectric constant, but there is a problem in that heat resistance may decrease when excessively added. Therefore, it was confirmed that heat resistance can be secured by mixing the second diamine compound to compensate for this.
  • the molar ratio of the first diamine compound and the second diamine compound may be greater than 50:50 and not greater than 95:5.
  • the molar ratio of the first diamine compound and the second diamine compound is 50:50 or less, the relative dielectric constant of the composition for an insulating film increases, thereby reducing the partial discharge initiation voltage of the insulated wire having the insulating film formed therefrom.
  • the molar ratio is more than 95:5, heat resistance of the composition for insulating coating is lowered, and thus usability insulated wires cannot be manufactured under a high temperature environment.
  • composition for an insulating film according to the present invention may include a polyimide resin having a molecular structure represented by Formula 1 below.
  • n 5 to 200.
  • the polyimide resin may have a number average molecular weight (Mn) of 10,000 to 200,000, and preferably 13,000 to 80,000.
  • n and number average molecular weight are measures of molecular weight, and if the molecular weight is too small, sufficient viscosity may not be secured, making it difficult to form an insulating film, and if the molecular weight is too large, the viscosity increases and the coating operation is difficult. Sex problems can occur.
  • the composition for an insulating film according to the present invention has a low ratio of polar groups in the molecular structure of the polyimide resin, so that the relative dielectric constant of the composition can be lowered and the heat resistance can be improved, and since there is no need to contain inorganic particles, it has flexibility. great.
  • the polyimide resin is N-methyl-2-pyrrolidone (NMP), ⁇ -butyrolactone, N,N-dimethylacetamide (DMAc), N,N-dimethylform It may be dissolved in a solvent such as amide (DMF), dimethylimidazolidinone (DMI), cyclohexanone, methylcyclohexanone, and aromatic alkyl benzenes.
  • NMP N-methyl-2-pyrrolidone
  • DMAc N,N-dimethylacetamide
  • N,N-dimethylform N,N-dimethylform
  • a solvent such as amide (DMF), dimethylimidazolidinone (DMI), cyclohexanone, methylcyclohexanone, and aromatic alkyl benzenes.
  • FIG. 1 shows an embodiment of an insulated wire according to the present invention.
  • the insulated wire according to the present invention may include a conductor 10 and an insulating film 20 formed on the surface of the conductor 10 and formed from the composition for an insulating film as described above, ,
  • the thickness of the insulating film 20 may be, for example, 0.01 to 0.1 mm.
  • the conductor 10 may be made of copper, preferably oxygen-free copper or hypoxic copper, and the cross-sectional shape thereof is circular as shown in FIG. 1A or a cross-sectional shape as shown in FIG. It may be a curved square.
  • Figure 2 shows another embodiment of the insulated wire according to the present invention.
  • the insulated wire according to the present invention is formed on the surface of the conductor 10, the conductor 10, and is made of a conventional general polyimide resin, polyamideimide resin, polyesterimide resin, etc.
  • An insulating film 21 and a second insulating film 22 formed on the first insulating film 21 and formed from the composition for an insulating film as described above may be included.
  • the thickness of the second insulating film 22 may be 85% or more of the total thickness of the insulating film 20, for example, 85% or more and less than 100%.
  • the dielectric constant of the insulating film of the insulating wire according to the present invention increases, so that the partial discharge initiation voltage of the insulated wire decreases or heat resistance It is degraded and cannot be used under high temperature environments.
  • the insulated wire according to the present invention includes the conductor 10 and the insulating film or the first insulating film between the surface of the conductor 10 or between the first insulating film 21 and the second insulating film 22.
  • an adhesion-improving layer may be additionally included, or the surface of the insulating film 20 or the second insulating film 22 may have a lubricating layer, intrinsic It may further include a soft layer and the like.
  • the temperature at which a 10% mass loss occurs was measured as the decomposition temperature for the insulating film formed from the insulating film composition of each of the examples and comparative examples using TGA.
  • Each insulated wire of Examples and Comparative Examples was cut into 500 mm to prepare 10 insulated wire specimens of a twisted pair, and the insulating film was removed from the end of each of the insulated wires to a position of 10 mm to form a terminal treatment part.
  • the voltage was measured at the point where 10 pC discharge occurred 50 times per second on the insulated wire specimen while boosting the voltage of 50 Hz to 10 to 30 V/s under 25°C and 50% humidity, and this was measured by repeating 3 times.
  • the average value of the resulting voltage was described as the partial discharge start voltage.
  • Flexibility was evaluated according to the standard IEC 60851-3. Specifically, in order to make the insulated wire specimens of each of the Examples and Comparative Examples having a length of 400 mm in an elongated S shape, they were bent at 180° along a polishing mandrel having a diameter given in the corresponding standard in two directions and bent in a U shape. The part should be at least 150 mm. In this case, if no cracks occurred on the surface of the insulated wire specimen, it was marked as OK, and if cracks occurred, it was marked as NG.
  • Example 1 Example 2 Example 3 Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Filming ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ permittivity 2.35 2.43 2.43 2.32 2.51 - - 4.7 Decomposition temperature(°C) 565 579 590 510 595 - - 420 Partial discharge start voltage (V) 1150 1130 1130 1140 1100 - - 910 flexibility OK OK OK OK OK OK NG - - OK
  • Comparative Example 1 it was confirmed that the molar ratio of the first diamine compound and the second diamine compound exceeded the standard, and the heat resistance was significantly lowered. It was confirmed that the partial discharge start voltage decreased due to the increase, and the flexibility decreased.

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Abstract

The present invention relates to a composition for an insulation film, and an insulated electric wire comprising an insulation film formed therefrom. Specifically, the present invention relates to: a composition for an insulation film, having a low relative permittivity so as to have a high partial discharge inception voltage and, simultaneously, having excellent heat resistance so as to be stable at a high temperature, and having excellent flexibility; and an insulated electric wire comprising an insulation film formed therefrom.

Description

절연 피막용 조성물 및 이로부터 형성된 절연 피막을 포함하는 절연 전선Insulated wire comprising composition for insulating film and insulating film formed therefrom
본 발명은 절연 피막용 조성물 및 이로부터 형성된 절연 피막을 포함하는 절연 전선에 관한 것이다. 구체적으로, 본 발명은 비유전율이 낮아 부분 방전 개시 전압이 높은 동시에 내열성이 우수하여 고온에서 안정하고, 유연성이 우수한 절연 피막용 조성물 및 이로부터 형성된 절연 피막을 포함하는 절연 전선에 관한 것이다.The present invention relates to an insulating electric wire comprising a composition for an insulating film and an insulating film formed therefrom. Specifically, the present invention relates to an insulating wire comprising a composition for an insulating film having low relative dielectric constant and high partial discharge initiation voltage and excellent heat resistance, stable at high temperature, and excellent flexibility, and an insulating film formed therefrom.
모터 등의 회전 전기기계나 변압기 등의 전기기기의 코일로 적용되는 절연 전선(에나멜선)은 단면 형상이 원형 또는 사각형인 금속 도체 표면을 폴리이미드, 폴리아미드이미드, 폴리에스테르이미드 등의 수지를 유기 용제에 용해시킨 절연 도료로 피복하여 1층 또는 2층 이상의 절연 피막을 형성함으로써 제조할 수 있다.Insulated wires (enamel wires) applied as coils of rotating electric machines such as motors or electric devices such as transformers are made of resins such as polyimide, polyamideimide, and polyesterimide on the surface of a metal conductor with a circular or square cross-sectional shape. It can be produced by covering with an insulating paint dissolved in a solvent to form one or two or more insulating films.
회전 전기기계나 변압기 등의 전기기기는 인버터 제어에 의해 구동되므로 인버터 제어에 의해 발생하는 인버터 서지 전압이 높은 경우 전기기기의 코일을 구성하는 절연 전선에 이러한 인버터 서지 전압으로 인해 부분 방전이 발생하여 절연 전선의 절연 피막이 열화되거나 손상될 수 있다.Since electric devices such as rotating electric machines and transformers are driven by inverter control, if the inverter surge voltage generated by the inverter control is high, partial discharge occurs due to the inverter surge voltage in the insulated wire constituting the coil of the electric device and insulates it. The insulating film of the electric wire may be deteriorated or damaged.
따라서, 종래 절연 전선은 인버터 서지 전압에 의한 절연 피막의 열화나 손상을 방지하기 위해 절연 피막에 실리카 등의 무기 입자를 포함하나, 이러한 무기 입자는 절연 피막의 비유전율을 상승시키고, 결과적으로 절연 전선의 부분 방전 개시 전압(Partial Discharge Inception Voltage)이 저하될 수 있으며, 유연성이 크게 저하될 수 있다.Therefore, conventional insulated wires contain inorganic particles such as silica in the insulating film to prevent deterioration or damage of the insulating film due to inverter surge voltage, but these inorganic particles increase the relative dielectric constant of the insulating film, and as a result, the insulating wire The partial discharge inception voltage of may be reduced, and flexibility may be greatly reduced.
한편, 종래 절연 전선은 절연 피막에 첨가된 무기 입자에 의해 비유전율이 증가하는 것을 억제하기 위해 3개 이상의 방향족 고리를 가지는 방향족 디아민 성분과 산 성분을 함유하는 방향족 이미드 프리폴리머에 2개 이하의 방향족 고리를 가지는 방향족 디이소시아네이트 성분을 혼합해서 이루어지는 폴리이미드 수지 도료를 적용하였으나, 이러한 폴리이미드 수지 도료는 내열성이 낮아 고온에서 안정한 절연 피막을 형성할 수 없다. 최근 모터 등의 회전 전기기계는 고온 환경하에서의 특성도 고려되고 있기 때문에, 절연 피막의 고온 안정성이 중요해지고 있다.On the other hand, in the conventional insulated wire, in order to suppress an increase in the relative dielectric constant due to inorganic particles added to the insulating film, an aromatic diamine component having three or more aromatic rings and an aromatic imide prepolymer containing an acid component have two or less aromatics. A polyimide resin coating obtained by mixing an aromatic diisocyanate component having a ring was applied. However, such a polyimide resin coating has low heat resistance and thus a stable insulating film at high temperature cannot be formed. In recent years, since the characteristics of rotating electric machines such as motors are also considered under high-temperature environments, high-temperature stability of the insulating film is becoming important.
따라서, 비유전율이 낮아 부분 방전 개시 전압이 높은 동시에 내열성이 우수하여 고온에서 안정하고, 유연성이 우수한 절연 피막용 조성물 및 이로부터 형성된 절연 피막을 포함하는 절연 전선이 절실히 요구되고 있는 실정이다.Accordingly, there is an urgent need for a composition for an insulating film having a low relative dielectric constant, a high partial discharge starting voltage, and excellent heat resistance, stable at high temperatures, and excellent flexibility, and an insulating wire including an insulating film formed therefrom.
본 발명은 비유전율이 낮아 부분 방전 개시 전압이 높고 유연성이 우수한 절연 피막용 조성물 및 이로부터 형성된 절연 피막을 포함하는 절연 전선을 제공하는 것을 목적으로 한다.An object of the present invention is to provide a composition for an insulating film having a low relative dielectric constant, high partial discharge initiation voltage, and excellent flexibility, and an insulating wire including an insulating film formed therefrom.
또한, 본 발명은 고온에서 안정한 절연 피막용 조성물 및 이로부터 형성된 절연 피막을 포함하는 절연 전선을 제공하는 것을 목적으로 한다.Another object of the present invention is to provide an insulating wire comprising a composition for an insulating film stable at high temperature and an insulating film formed therefrom.
상기 과제를 해결하기 위해, 본 발명은,In order to solve the above problems, the present invention,
절연 피막용 조성물로서, 이무수물 화합물과 디아민 화합물의 중합을 통해 형성되는 폴리이미드 수지를 포함하고, 상기 이무수물 화합물은 테트라카르복실산 이무수물 또는 이의 이성질체를 포함하고, 상기 디아민 화합물은 제1 디아민 화합물 및 제2 디아민 화합물을 포함하고, 상기 제1 디아민 화합물은 2,2-비스[4-(4-아미노페녹시)페닐]프로판(BAPP), 비스[4-(4-아미노페족시)페닐]설폰(BAPS), 비스[4-(4-아미노페녹시)페닐]에테르(BAPE), 4,4'-비스(4-아미노페녹시)비페닐(BAPB), 1,4-비스(4-아미노페녹시)벤젠, 9,9-비스(4-아미노페닐)플루오렌(FDA), 2,2'-디메틸-4,4'-디아미노비페닐, 4,4'-비스(4-아미노페닐)설파이드 및 이들의 이성질체로 이루어진 그룹으로부터 선택된 1종 이상을 포함하고, 상기 제2 디아민 화합물은 1,4-디아미노벤젠, 2,4-디아미노톨루엔 및 이들의 이성질체로 이루어진 그룹으로부터 선택된 1종 이상을 포함하는, 절연 피막용 조성물을 제공한다.As a composition for an insulating film, it includes a polyimide resin formed through polymerization of a dianhydride compound and a diamine compound, the dianhydride compound includes a tetracarboxylic dianhydride or an isomer thereof, and the diamine compound is a first diamine A compound and a second diamine compound, wherein the first diamine compound is 2,2-bis[4-(4-aminophenoxy)phenyl]propane (BAPP), bis[4-(4-aminophenoxy)phenyl ]Sulfone (BAPS), bis[4-(4-aminophenoxy)phenyl]ether (BAPE), 4,4'-bis(4-aminophenoxy)biphenyl (BAPB), 1,4-bis(4 -Aminophenoxy)benzene, 9,9-bis(4-aminophenyl)fluorene (FDA), 2,2'-dimethyl-4,4'-diaminobiphenyl, 4,4'-bis(4- Aminophenyl) sulfide and one or more selected from the group consisting of isomers thereof, and the second diamine compound is selected from the group consisting of 1,4-diaminobenzene, 2,4-diaminotoluene, and isomers thereof. It provides a composition for an insulating film containing one or more.
여기서, 상기 제1 디아민 화합물과 상기 제2 디아민 화합물의 몰 비는 50:50 초과 95:5 이하인 것을 특징으로 하는, 절연 피막용 조성물을 제공한다.Here, a molar ratio of the first diamine compound and the second diamine compound is greater than 50:50 and less than or equal to 95:5, providing a composition for an insulating film.
또한, 상기 테트라카르복실산 이무수물은 피로멜리트산 이무수물(PMDA), 3,3',4,4'-비페닐테트라카르복실산 이무수물(BPDA) 및 이들의 이성질체로 이루어진 그룹으로부터 선택된 1종 이상을 포함하는 것을 특징으로 하는, 절연 피막용 조성물을 제공한다.In addition, the tetracarboxylic dianhydride is 1 selected from the group consisting of pyromellitic dianhydride (PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA), and isomers thereof. It provides a composition for an insulating film, characterized in that it contains more than one species.
나아가, 상기 테트라카르복실산 이무수물은 상기 피로멜리트산 이무수물(PMDA)과 3,3',4,4'-비페닐테트라카르복실산 이무수물(BPDA)이 30:70 이상 70:30 이하의 몰 비로 혼합되어 있는 것을 특징으로 하는, 절연 피막용 조성물을 제공한다.Furthermore, in the tetracarboxylic dianhydride, the pyromellitic dianhydride (PMDA) and 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) are 30:70 or more and 70:30 or less. It provides a composition for an insulating film, characterized in that mixed in a molar ratio of.
그리고, 상기 폴리이미드 수지는 아래 화학식 1의 분자 구조를 갖는 것을 특징으로 하는, 절연 피막용 조성물을 제공한다.In addition, the polyimide resin provides a composition for an insulating film, characterized in that it has a molecular structure of the following formula (1).
[화학식 1][Formula 1]
Figure PCTKR2020002449-appb-img-000001
Figure PCTKR2020002449-appb-img-000001
상기 화학식 1에서,In Formula 1,
n은 5 내지 200이다.n is 5 to 200.
여기서, 상기 폴리이미드 수지는 수평균분자량(Mn)이 10,000 내지 200,000인 것을 특징으로 하는, 절연 피막용 조성물을 제공한다.Here, the polyimide resin provides a composition for an insulating film, characterized in that the number average molecular weight (Mn) is 10,000 to 200,000.
나아가, N-메틸-2-피롤리돈(NMP), γ-부티로락톤, N,N-디메틸아세트아미드(DMAc), N,N-디메틸포름아미드(DMF), 디메틸이미다졸리디논(DMI), 사이클로헥사논, 메틸시클로헥사논 및 방향족 알킬 벤젠류로 이루어진 그룹으로부터 선택된 1종 이상의 용제를 포함하는 것을 특징으로 하는, 절연 피막용 조성물을 제공한다.Furthermore, N-methyl-2-pyrrolidone (NMP), γ-butyrolactone, N,N-dimethylacetamide (DMAc), N,N-dimethylformamide (DMF), dimethylimidazolidinone (DMI ), cyclohexanone, methylcyclohexanone and aromatic alkyl benzenes, characterized in that it comprises at least one solvent selected from the group consisting of, provides a composition for an insulating film.
한편, 도체; 및 상기 도체 표면에 형성되고 상기 절연 피막용 조성물로부터 형성된 절연 피막을 포함하는, 절연 전선을 제공한다.Meanwhile, a conductor; And an insulating film formed on the surface of the conductor and formed from the composition for insulating film.
여기서, 상기 절연 피막은 상기 도체 표면에 형성되고 폴리이미드 수지, 폴리아미드이미드 수지 및 폴리에스테르이미드 수지로 이루어진 그룹으로부터 선택된 1종 이상의 수지를 포함하는 제1 절연 피막; 및 상기 제1 절연 피막 위에 형성되고 제1항 또는 제2항의 절연 피막용 조성물로부터 형성된 제2 절연 피막을 포함하는 것을 특징으로 하는, 절연 전선을 제공한다.Here, the insulating film is formed on the surface of the conductor and includes a first insulating film comprising at least one resin selected from the group consisting of polyimide resin, polyamideimide resin, and polyesterimide resin; And a second insulating film formed on the first insulating film and formed from the composition for an insulating film of claim 1 or 2.
여기서, 상기 제2 절연 피막의 두께는 상기 절연 피막의 총 두께의 85% 이상인 것을 특징으로 하는, 절연 전선을 제공한다.Here, the second insulating film has a thickness of 85% or more of the total thickness of the insulating film.
또한, 상기 도체 표면에 형성된 밀착성 향상층, 상기 절연 피막 표면 또는 상기 제2 절연 피막 표면에 형성된 윤활층 및 고유연층으로 이루어진 그룹으로부터 선택된 1종 이상의 층을 추가로 포함하는 것을 특징으로 하는, 절연 전선을 제공한다.In addition, an insulated wire, characterized in that it further comprises at least one layer selected from the group consisting of an adhesion-improving layer formed on the surface of the conductor, a lubricating layer formed on the surface of the insulating film or the surface of the second insulating film, and a highly flexible layer Provides.
본 발명에 따른 절연 피막용 조성물은 특정한 분자구조의 폴리이미드 수지를 포함함으로써 비유전율이 낮아 부분 방전 개시 전압이 높은 동시에 내열성이 우수하여 고온에서 안정하고 유연성이 우수한 효과를 나타낸다.Since the composition for an insulating film according to the present invention contains a polyimide resin having a specific molecular structure, the relative dielectric constant is low, the partial discharge initiation voltage is high, and the heat resistance is excellent, so that it is stable at high temperatures and has excellent flexibility.
도 1은 본 발명에 따른 절연 전선에 관한 실시예를 도시한 것이다.1 shows an embodiment of an insulated wire according to the present invention.
도 2는 본 발명에 따른 절연 전선에 관한 다른 실시예를 도시한 것이다.Figure 2 shows another embodiment of the insulated wire according to the present invention.
이하, 본 발명의 바람직한 실시예들을 상세히 설명하기로 한다. 그러나, 본 발명은 여기서 설명된 실시예들에 한정되지 않고 다른 형태로 구체화될 수도 있다. 오히려, 여기서 소개되는 실시예들은 개시된 내용이 철저하고 완전해질 수 있도록, 그리고 당업자에게 본 발명의 사상이 충분히 전달될 수 있도록 하기 위해 제공되어지는 것이다. 명세서 전체에 걸쳐서 동일한 참조번호들은 동일한 구성요소들을 나타낸다.Hereinafter, preferred embodiments of the present invention will be described in detail. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided so that the disclosed content may be thorough and complete, and the spirit of the present invention may be sufficiently conveyed to those skilled in the art. The same reference numbers throughout the specification denote the same elements.
본 발명에 따른 절연 피막용 조성물은 이무수물 화합물과 디아민 화합물의 중합을 통해 형성되는 폴리이미드 수지를 포함할 수 있고, 여기서 상기 이무수물 화합물은 예를 들어 테트라카르복실산 이무수물, 바람직하게는 피로멜리트산 이무수물(PMDA), 3,3',4,4'-비페닐테트라카르복실산 이무수물(BPDA) 등 또는 이들의 이성질체를 포함할 수 있다.The composition for an insulating film according to the present invention may include a polyimide resin formed through polymerization of a dianhydride compound and a diamine compound, wherein the dianhydride compound is, for example, tetracarboxylic dianhydride, preferably fatigue. Melitic dianhydride (PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA), and the like, or isomers thereof.
한편, 상기 테트라카르복실산 이무수물은 상기 피로멜리트산 이무수물(PMDA)과 3,3',4,4'-비페닐테트라카르복실산 이무수물(BPDA)이 30:70 이상 70:30 이하의 몰 비로 혼합될 수 있다. 본 발명에 따른 절연 전선은 자동차 내에 적용될 수 있으며, 엔진 오일 등에 노출될 수 있는 환경 때문에 내유성을 확보해야 하며, 피로멜리트산 이무수물(PMDA)과 3,3',4,4'-비페닐테트라카르복실산 이무수물(BPDA)이 상기 범위에 있을 때 충분한 내유성을 확보할 수 있다.Meanwhile, in the tetracarboxylic dianhydride, the pyromellitic dianhydride (PMDA) and 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) are 30:70 or more and 70:30 or less. It can be mixed in a molar ratio of. The insulated wire according to the present invention can be applied in automobiles, and oil resistance must be secured due to the environment exposed to engine oil, etc., and pyromellitic dianhydride (PMDA) and 3,3',4,4'-biphenyltetra When the carboxylic acid dianhydride (BPDA) is in the above range, sufficient oil resistance can be secured.
또한, 상기 디아민 화합물은 제1 디아민 화합물과 제2 디아민 화합물을 포함할 수 있고, 상기 제1 디아민 화합물은 예를 들어 2,2-비스[4-(4-아미노페녹시)페닐]프로판(BAPP), 비스[4-(4-아미노페족시)페닐]설폰(BAPS), 비스[4-(4-아미노페녹시)페닐]에테르(BAPE), 4,4'-비스(4-아미노페녹시)비페닐(BAPB), 1,4-비스(4-아미노페녹시)벤젠, 9,9-비스(4-아미노페닐)플루오렌(FDA), 2,2'-디메틸-4,4'-디아미노비페닐, 4,4'-비스(4-아미노페닐)설파이드 등 또는 이들의 이성질체를 포함할 수 있고, 상기 제2 디아민 화합물은 예를 들어 1,4-디아미노벤젠, 2,4-디아미노톨루엔 등 또는 이들의 이성질체를 포함할 수 있다.In addition, the diamine compound may include a first diamine compound and a second diamine compound, and the first diamine compound is, for example, 2,2-bis[4-(4-aminophenoxy)phenyl]propane (BAPP ), bis[4-(4-aminophenoxy)phenyl]sulfone (BAPS), bis[4-(4-aminophenoxy)phenyl] ether (BAPE), 4,4'-bis(4-aminophenoxy) ) Biphenyl (BAPB), 1,4-bis (4-aminophenoxy) benzene, 9,9-bis (4-aminophenyl) fluorene (FDA), 2,2'-dimethyl-4,4'- Diaminobiphenyl, 4,4'-bis(4-aminophenyl)sulfide, etc. or isomers thereof, and the second diamine compound is, for example, 1,4-diaminobenzene, 2,4- Diaminotoluene and the like or isomers thereof.
상기 제1 디아민 화합물은 극성을 띄는 화합물로서 비유전율을 낮출 수 있으나, 과도하게 첨가되는 경우 내열성이 저하될 수 있는 문제가 있다. 따라서, 이를 보완하기 위해 제2 디아민 화합물을 혼합하여 내열성까지 확보할 수 있음을 확인하였다.The first diamine compound is a compound having polarity and may lower the relative dielectric constant, but there is a problem in that heat resistance may decrease when excessively added. Therefore, it was confirmed that heat resistance can be secured by mixing the second diamine compound to compensate for this.
여기서, 상기 제1 디아민 화합물과 상기 제2 디아민 화합물의 몰비는 50:50 초과 95:5 이하일 수 있다. 상기 제1 디아민 화합물과 상기 제2 디아민 화합물의 몰비가 50:50 이하인 경우 상기 절연 피막용 조성물의 비유전율이 증가하여 이로부터 형성되는 절연 피막을 갖는 절연 전선의 부분 방전 개시 전압이 저하되는 문제가 발생하고 절연 피막 형성을 위한 필름화가 어려운 문제가 있는 반면, 상기 몰비가 95:5 초과인 경우 상기 절연 피막용 조성물의 내열성이 저하되어 고온 환경하에서 사용가능성 절연 전선을 제조할 수 없다.Here, the molar ratio of the first diamine compound and the second diamine compound may be greater than 50:50 and not greater than 95:5. When the molar ratio of the first diamine compound and the second diamine compound is 50:50 or less, the relative dielectric constant of the composition for an insulating film increases, thereby reducing the partial discharge initiation voltage of the insulated wire having the insulating film formed therefrom. On the other hand, when the molar ratio is more than 95:5, heat resistance of the composition for insulating coating is lowered, and thus usability insulated wires cannot be manufactured under a high temperature environment.
이로써, 본 발명에 따른 절연 피막용 조성물은 아래 화학식 1의 분자 구조를 보유하는 폴리이미드 수지를 포함할 수 있다.Accordingly, the composition for an insulating film according to the present invention may include a polyimide resin having a molecular structure represented by Formula 1 below.
[화학식 1][Formula 1]
Figure PCTKR2020002449-appb-img-000002
Figure PCTKR2020002449-appb-img-000002
상기 화학식 1에서,In Formula 1,
n은 5 내지 200이다.n is 5 to 200.
한편, 상기 폴리이미드 수지는 수평균분자량(Mn)이 10,000 내지 200,000일 수 있으며, 바람직하게는 13,000 내지 80,000일 수 있다.Meanwhile, the polyimide resin may have a number average molecular weight (Mn) of 10,000 to 200,000, and preferably 13,000 to 80,000.
상기 n 및 수평균분자량(Mn)은 분자량을 나타내는 척도이며, 분자량이 너무 작으면 충분한 점도를 확보하지 못하여 절연 피막 형성을 위한 필름화가 어려울 수 있으며, 분자량이 너무 크면 점도가 높아져서 코팅 작업이 어려워 양산성에 문제가 발생할 수 있다. The n and number average molecular weight (Mn) are measures of molecular weight, and if the molecular weight is too small, sufficient viscosity may not be secured, making it difficult to form an insulating film, and if the molecular weight is too large, the viscosity increases and the coating operation is difficult. Sex problems can occur.
본 발명에 따른 절연 피막용 조성물은 폴리이미드 수지의 분자 구조에 있어서 극성기의 비율이 낮기 때문에 상기 조성물의 비유전율을 낮출 수 있고 내열성을 향상시킬 수 있으며, 무기 입자를 포함할 필요가 없기 때문에 유연성이 우수하다.The composition for an insulating film according to the present invention has a low ratio of polar groups in the molecular structure of the polyimide resin, so that the relative dielectric constant of the composition can be lowered and the heat resistance can be improved, and since there is no need to contain inorganic particles, it has flexibility. great.
본 발명에 따른 절연 피막용 조성물은 상기 폴리이미드 수지가 N-메틸-2-피롤리돈(NMP), γ-부티로락톤, N,N-디메틸아세트아미드(DMAc), N,N-디메틸포름아미드(DMF), 디메틸이미다졸리디논(DMI), 사이클로헥사논, 메틸시클로헥사논, 방향족 알킬 벤젠류 등의 용제에 용해되어 있을 수 있다.In the composition for an insulating film according to the present invention, the polyimide resin is N-methyl-2-pyrrolidone (NMP), γ-butyrolactone, N,N-dimethylacetamide (DMAc), N,N-dimethylform It may be dissolved in a solvent such as amide (DMF), dimethylimidazolidinone (DMI), cyclohexanone, methylcyclohexanone, and aromatic alkyl benzenes.
도 1은 본 발명에 따른 절연 전선에 관한 실시예를 도시한 것이다.1 shows an embodiment of an insulated wire according to the present invention.
도 1에 도시된 바와 같이, 본 발명에 따른 절연 전선은 도체(10) 및 상기 도체(10) 표면에 형성되고 앞서 기술한 바와 같은 절연 피막용 조성물로부터 형성된 절연 피막(20)을 포함할 수 있고, 상기 절연 피막(20)의 두께는 예를 들어 0.01 내지 0.1 mm일 수 있다.As shown in Figure 1, the insulated wire according to the present invention may include a conductor 10 and an insulating film 20 formed on the surface of the conductor 10 and formed from the composition for an insulating film as described above, , The thickness of the insulating film 20 may be, for example, 0.01 to 0.1 mm.
상기 도체(10)는 구리, 바람직하게는 무산소동이나 저산소 동 등으로 이루어질 수 있고, 이의 단면 형상은 도 1a에 도시된 바와 같이 원형이거나 도 1b에 도시된 바와 같이 단면 형상이 사각형, 특히 모서리가 굴곡 처리된 사각형일 수 있다.The conductor 10 may be made of copper, preferably oxygen-free copper or hypoxic copper, and the cross-sectional shape thereof is circular as shown in FIG. 1A or a cross-sectional shape as shown in FIG. It may be a curved square.
도 2는 본 발명에 따른 절연 전선에 관한 다른 실시예를 도시한 것이다.Figure 2 shows another embodiment of the insulated wire according to the present invention.
도 2에 도시된 바와 같이, 본 발명에 따른 절연 전선은 도체(10), 상기 도체(10)의 표면에 형성되고 종래 일반적인 폴리이미드 수지, 폴리아미드이미드 수지, 폴리에스테르이미드 수지 등으로 이루어진 제1 절연 피막(21) 및 상기 제1 절연 피막(21) 위에 형성되고 앞서 기술한 바와 같은 절연 피막용 조성물로부터 형성된 제2 절연 피막(22)을 포함할 수 있다.As shown in Figure 2, the insulated wire according to the present invention is formed on the surface of the conductor 10, the conductor 10, and is made of a conventional general polyimide resin, polyamideimide resin, polyesterimide resin, etc. An insulating film 21 and a second insulating film 22 formed on the first insulating film 21 and formed from the composition for an insulating film as described above may be included.
여기서, 상기 제2 절연 피막(22)의 두께는 상기 절연 피막(20) 전체 두께의 85% 이상, 예를 들어, 85% 이상 100% 미만일 수 있다. 상기 제2 절연 피막(22)의 두께가 상기 절연 피막(20) 전체 두께의 85% 미만인 경우 본 발명에 따른 절연 전선의 절연 피막은 비유전율이 상승하여 절연 전선의 부분 방전 개시 전압이 저하되거나 내열성이 저하되어 고온 환경 하에서 사용될 수 없다.Here, the thickness of the second insulating film 22 may be 85% or more of the total thickness of the insulating film 20, for example, 85% or more and less than 100%. When the thickness of the second insulating film 22 is less than 85% of the total thickness of the insulating film 20, the dielectric constant of the insulating film of the insulating wire according to the present invention increases, so that the partial discharge initiation voltage of the insulated wire decreases or heat resistance It is degraded and cannot be used under high temperature environments.
또한, 본 발명에 따른 절연 전선은 상기 도체(10)의 표면이나 상기 제1 절연 피막(21)과 상기 제2 절연 피막(22) 사이에 상기 도체(10)와 상기 절연 피막 또는 상기 제1 절연 피막(21)과 상기 제2 절연 피막(22) 사이의 밀착성 향상을 위해 밀착성 향상층을 추가로 포함하거나, 상기 절연 피막(20) 표면 또는 상기 제2 절연 피막(22) 표면에는 윤활층, 고유연층 등을 추가로 포함할 수 있다.In addition, the insulated wire according to the present invention includes the conductor 10 and the insulating film or the first insulating film between the surface of the conductor 10 or between the first insulating film 21 and the second insulating film 22. In order to improve the adhesion between the film 21 and the second insulating film 22, an adhesion-improving layer may be additionally included, or the surface of the insulating film 20 or the second insulating film 22 may have a lubricating layer, intrinsic It may further include a soft layer and the like.
[실시예][Example]
1. 제조예1. Manufacturing example
교반기, 환류 냉각관, 질소 유입관 및 온도계를 구비한 플라스크를 이용하여 용제 N-메틸-2-피롤리돈(NMP) 내에서 아래 표 1에 기재된 화합물을 기재된 함량으로 12시간 동안 혼합함으로써 고형분 농도가 15 중량%인 절연 피막용 조성물을 제조하고 이로부터 절연 필름을 제조했고, 구리 도체 표면을 상기 절연 필름으로 코팅하여 두께 0.04 mm의 절연 피막을 형성함으로써 절연 전선을 제조했다. 아래 표 1에 기재된 함량의 단위는 몰%이다.Solid content concentration by mixing the compounds shown in Table 1 below in the solvent N-methyl-2-pyrrolidone (NMP) for 12 hours at the stated content using a stirrer, reflux condenser, nitrogen inlet tube and a flask equipped with a thermometer. An insulating film having a thickness of 15% by weight was prepared, an insulating film was prepared therefrom, and an insulating film having a thickness of 0.04 mm was formed by coating the surface of a copper conductor with the insulating film. The units of the content listed in Table 1 below are mol%.
실시예1Example 1 실시예2Example 2 실시예3Example 3 비교예1Comparative Example 1 비교예2Comparative Example 2 비교예3Comparative Example 3 비교예4Comparative Example 4 비교예5Comparative Example 5
PMDAPMDA 5050 5050 5050 5050 5050 5050 5050 PAIPAI
BPDABPDA 5050 5050 5050 5050 5050 5050 5050
BAPPBAPP 9595 8080 7070 9898 5050 2020 00
PDAPDA 55 2020 3030 22 5050 8080 100100
- PMDA : 피로멜리트산 무수물(분자량 : 218)- BPDA : 3,3',4,4'-비페닐테트라카르복실산 이무수물(분자량 : 294)-PMDA: pyromellitic anhydride (molecular weight: 218)-BPDA: 3,3',4,4'-biphenyltetracarboxylic dianhydride (molecular weight: 294)
- BAPP : 2,2-비스[4-(4-아미노페녹시)페닐]프로판(분자량 : 410)-BAPP: 2,2-bis[4-(4-aminophenoxy)phenyl]propane (molecular weight: 410)
- P-페닐렌디아민(분자량 : 108)-P-phenylenediamine (molecular weight: 108)
- PAI : 폴리아미드이미드 수지(제조사 : 코멕사; 제품명 : GM38K)-PAI: Polyamideimide resin (manufacturer: COMEX; product name: GM38K)
2. 물성 평가2. Property evaluation
1) 필름화 평가1) Filming evaluation
실시예 및 비교예 각각의 절연 피막용 조성물을 80℃에서 10분, 150℃에서 10분, 200℃에서 10분, 250℃에서 10분 간 열처리 후 200℃ 진공오븐에서 24시간 동안 건조한 후 육안으로 관찰했고, 형성된 필름의 상태에 따라 ○(양호), △(약간 불량), ×(불량)으로 표시했다.After heat treatment at 80°C for 10 minutes, 150°C for 10 minutes, 200°C for 10 minutes, and 250°C for 10 minutes, each of Examples and Comparative Examples was dried in a vacuum oven at 200°C for 24 hours, and then visually Observation was carried out, and according to the state of the formed film, it was marked as ○ (good), △ (slightly poor), and x (defective).
2) 유전율 측정2) dielectric constant measurement
실시예 및 비교예 각각의 절연 피막용 조성물로부터 가로 100 mm, 세로 100 mm, 두께 50㎛의 절연 필름을 제조한 후 이에 대해 전극간 정전용량을 LCR 미터로 측정하고 측정한 정전용량 값과 필름의 두께로부터 유전율을 산출했다. 정전용량 측정은 온도 23℃ 및 습도 50%의 조건에서 수행했다.Examples and Comparative Examples After preparing an insulating film having a width of 100 mm, a length of 100 mm, and a thickness of 50 μm from the composition for each insulating coating, the capacitance between electrodes was measured with an LCR meter, and the measured capacitance value and the film The dielectric constant was calculated from the thickness. The capacitance measurement was performed under conditions of a temperature of 23° C. and a humidity of 50%.
3) 분해온도(내열성) 측정3) Decomposition temperature (heat resistance) measurement
실시예 및 비교예 각각의 절연 피막용 조성물로부터 형성된 절연 필름에 대해 TGA를 이용하여 10% 질량 손실이 발생하는 온도를 분해온도로 하여 측정했다.The temperature at which a 10% mass loss occurs was measured as the decomposition temperature for the insulating film formed from the insulating film composition of each of the examples and comparative examples using TGA.
4) 부분 방전 개시 전압 측정4) Measurement of partial discharge start voltage
실시예 및 비교예 각각의 절연 전선을 500 mm로 잘라 twisted pair의 절연 전선 시편을 10개 제작하고 이들의 단부에서 10 mm의 위치까지 절연 피막을 제거해 단말 처리부를 형성했고, 상기 단말 처리부에 전극을 접속해 25℃ 및 습도 50% 하에서 50 Hz의 전압을 10~30 V/s로 승압시키면서 절연 전선 시편에 10 pC의 방전이 매초 50회 발생하는 시점의 전압을 측정했고, 이를 3회 반복하여 측정된 전압의 평균값을 부분 방전 개시 전압으로 기재했다.Each insulated wire of Examples and Comparative Examples was cut into 500 mm to prepare 10 insulated wire specimens of a twisted pair, and the insulating film was removed from the end of each of the insulated wires to a position of 10 mm to form a terminal treatment part. The voltage was measured at the point where 10 pC discharge occurred 50 times per second on the insulated wire specimen while boosting the voltage of 50 Hz to 10 to 30 V/s under 25°C and 50% humidity, and this was measured by repeating 3 times. The average value of the resulting voltage was described as the partial discharge start voltage.
5) 유연성 평가5) Flexibility evaluation
규격 IEC 60851-3에 준하여 유연성을 평가했다. 구체적으로, 길이가 400 mm인 실시예 및 비교예 각각의 절연 전선 시편을 신장된 S 형태로 만들기 위해 두 방향에서 해당 규격에 주어진 지름을 갖는 연마 맨드릴을 따라 180°로 구부리고 U자 형태로 굴곡된 부분은 최소 150 mm가 되도록 한다. 이러한 경우 절연 전선 시편 표면에 균열이 발생하지 않는 경우 OK로 표시했고, 균열이 발생한 경우 NG로 표시했다.Flexibility was evaluated according to the standard IEC 60851-3. Specifically, in order to make the insulated wire specimens of each of the Examples and Comparative Examples having a length of 400 mm in an elongated S shape, they were bent at 180° along a polishing mandrel having a diameter given in the corresponding standard in two directions and bent in a U shape. The part should be at least 150 mm. In this case, if no cracks occurred on the surface of the insulated wire specimen, it was marked as OK, and if cracks occurred, it was marked as NG.
실시예1Example 1 실시예2Example 2 실시예3Example 3 비교예1Comparative Example 1 비교예2Comparative Example 2 비교예3Comparative Example 3 비교예4Comparative Example 4 비교예5Comparative Example 5
필름화Filming ×× ××
유전율permittivity 2.352.35 2.432.43 2.432.43 2.322.32 2.512.51 -- -- 4.74.7
분해온도(℃)Decomposition temperature(℃) 565565 579579 590590 510510 595595 -- -- 420420
부분방전개시전압(V)Partial discharge start voltage (V) 11501150 11301130 11301130 11401140 11001100 -- -- 910910
유연성flexibility OKOK OKOK OKOK OKOK NGNG -- -- OKOK
상기 표 2에 기재된 바와 같이, 본 발명에 따른 절연 피막용 조성물에 해당하는 실시예 1 내지 3의 경우 필름화 형성이 가능하고, 절연 피막의 유연율이 낮게 조절되어 절연 전선의 부분방전개시전압이 향상되었고, 유연성도 우수한 것으로 확인되었다.As shown in Table 2, in the case of Examples 1 to 3 corresponding to the composition for an insulating film according to the present invention, film formation is possible, and the flexibility of the insulating film is controlled to be low, so that the partial discharge start voltage of the insulating wire is reduced. It was improved and it was confirmed that flexibility was also excellent.
한편, 비교예 1은 제1 디아민 화합물과 제2 디아민 화합물의 몰 비가 기준 초과로 내열성이 크게 저하된 것으로 확인되었고, 비교예 2는 제1 디아민 화합물과 제2 디아민 화합물의 몰 비가 기준 미달로 유전율 증가에 의한 부분방전개시전압 저하가 발생하였고, 유연성이 저하된 것으로 확인되었다.On the other hand, in Comparative Example 1, it was confirmed that the molar ratio of the first diamine compound and the second diamine compound exceeded the standard, and the heat resistance was significantly lowered. It was confirmed that the partial discharge start voltage decreased due to the increase, and the flexibility decreased.
또한, 비교예 3 및 4는 제1 디아민 화합물의 함량이 과도하게 낮아 필름화가 불가능했고, 비교예 5는 종래 폴리아미디이미드 수지가 적용되어 유전율이 크게 증가하여 부분방전개시전압이 크게 저하되었고, 내열성 역시 크게 저하된 것으로 확인되었다.In addition, in Comparative Examples 3 and 4, film formation was not possible because the content of the first diamine compound was excessively low, and in Comparative Example 5, the conventional polyamidiimide resin was applied to greatly increase the dielectric constant, so that the partial discharge initiation voltage was greatly reduced, and It was also confirmed that it was greatly degraded.
본 명세서는 본 발명의 바람직한 실시예를 참조하여 설명하였지만, 해당 기술분야의 당업자는 이하에서 서술하는 특허청구범위에 기재된 본 발명의 사상 및 영역으로부터 벗어나지 않는 범위 내에서 본 발명을 다양하게 수정 및 변경 실시할 수 있을 것이다. 그러므로 변형된 실시가 기본적으로 본 발명의 특허청구범위의 구성요소를 포함한다면 모두 본 발명의 기술적 범주에 포함된다고 보아야 한다.Although the present specification has been described with reference to preferred embodiments of the present invention, those skilled in the art will variously modify and change the present invention within the scope not departing from the spirit and scope of the present invention described in the claims described below. You will be able to do it. Therefore, if the modified implementation basically includes the elements of the claims of the present invention, all should be considered to be included in the technical scope of the present invention.

Claims (11)

  1. 절연 피막용 조성물로서,As a composition for an insulating film,
    이무수물 화합물과 디아민 화합물의 중합을 통해 형성되는 폴리이미드 수지를 포함하고,Including a polyimide resin formed through polymerization of a dianhydride compound and a diamine compound,
    상기 이무수물 화합물은 테트라카르복실산 이무수물 또는 이의 이성질체를 포함하고,The dianhydride compound includes a tetracarboxylic dianhydride or an isomer thereof,
    상기 디아민 화합물은 제1 디아민 화합물 및 제2 디아민 화합물을 포함하고,The diamine compound includes a first diamine compound and a second diamine compound,
    상기 제1 디아민 화합물은 2,2-비스[4-(4-아미노페녹시)페닐]프로판(BAPP), 비스[4-(4-아미노페족시)페닐]설폰(BAPS), 비스[4-(4-아미노페녹시)페닐]에테르(BAPE), 4,4'-비스(4-아미노페녹시)비페닐(BAPB), 1,4-비스(4-아미노페녹시)벤젠, 9,9-비스(4-아미노페닐)플루오렌(FDA), 2,2'-디메틸-4,4'-디아미노비페닐, 4,4'-비스(4-아미노페닐)설파이드 및 이들의 이성질체로 이루어진 그룹으로부터 선택된 1종 이상을 포함하고,The first diamine compound is 2,2-bis[4-(4-aminophenoxy)phenyl]propane (BAPP), bis[4-(4-aminophenoxy)phenyl]sulfone (BAPS), bis[4- (4-aminophenoxy)phenyl]ether (BAPE), 4,4'-bis(4-aminophenoxy)biphenyl (BAPB), 1,4-bis(4-aminophenoxy)benzene, 9,9 -Consisting of bis(4-aminophenyl)fluorene (FDA), 2,2'-dimethyl-4,4'-diaminobiphenyl, 4,4'-bis(4-aminophenyl)sulfide and isomers thereof It contains at least one selected from the group,
    상기 제2 디아민 화합물은 1,4-디아미노벤젠, 2,4-디아미노톨루엔 및 이들의 이성질체로 이루어진 그룹으로부터 선택된 1종 이상을 포함하는,The second diamine compound comprises at least one selected from the group consisting of 1,4-diaminobenzene, 2,4-diaminotoluene, and isomers thereof,
    절연 피막용 조성물.Composition for insulating film.
  2. 제1항에 있어서,The method of claim 1,
    상기 제1 디아민 화합물과 상기 제2 디아민 화합물의 몰 비는 50:50 초과 95:5 이하인 것을 특징으로 하는, 절연 피막용 조성물.The molar ratio of the first diamine compound and the second diamine compound is greater than 50:50 and 95:5 or less.
  3. 제1항 또는 제2항에 있어서,The method according to claim 1 or 2,
    상기 테트라카르복실산 이무수물은 피로멜리트산 이무수물(PMDA), 3,3',4,4'-비페닐테트라카르복실산 이무수물(BPDA) 및 이들의 이성질체로 이루어진 그룹으로부터 선택된 1종 이상을 포함하는 것을 특징으로 하는, 절연 피막용 조성물.The tetracarboxylic dianhydride is at least one selected from the group consisting of pyromellitic dianhydride (PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA), and isomers thereof. It characterized in that it comprises a, the composition for an insulating film.
  4. 제3항에 있어서,The method of claim 3,
    상기 테트라카르복실산 이무수물은 상기 피로멜리트산 이무수물(PMDA)과 3,3',4,4'-비페닐테트라카르복실산 이무수물(BPDA)이 30:70 이상 70:30 이하의 몰 비로 혼합되어 있는 것을 특징으로 하는, 절연 피막용 조성물.The tetracarboxylic dianhydride has a mole of 30:70 or more and 70:30 or less of the pyromellitic dianhydride (PMDA) and 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) The composition for an insulating film, characterized in that mixed in a ratio.
  5. 제1항 또는 제2항에 있어서,The method according to claim 1 or 2,
    상기 폴리이미드 수지는 아래 화학식 1의 분자 구조를 갖는 것을 특징으로 하는, 절연 피막용 조성물.The polyimide resin is characterized in that it has a molecular structure of the following formula (1), an insulating film composition.
    [화학식 1][Formula 1]
    Figure PCTKR2020002449-appb-img-000003
    Figure PCTKR2020002449-appb-img-000003
    상기 화학식 1에서,In Formula 1,
    n은 5 내지 200이다.n is 5 to 200.
  6. 제1항 또는 제2항에 있어서,The method according to claim 1 or 2,
    상기 폴리이미드 수지는 수평균분자량(Mn)이 10,000 내지 200,000인 것을 특징으로 하는, 절연 피막용 조성물.The polyimide resin is characterized in that the number average molecular weight (Mn) of 10,000 to 200,000, an insulating film composition.
  7. 제1항 또는 제2항에 있어서,The method according to claim 1 or 2,
    N-메틸-2-피롤리돈(NMP), γ-부티로락톤, N,N-디메틸아세트아미드(DMAc), N,N-디메틸포름아미드(DMF), 디메틸이미다졸리디논(DMI), 사이클로헥사논, 메틸시클로헥사논 및 방향족 알킬 벤젠류로 이루어진 그룹으로부터 선택된 1종 이상의 용제를 포함하는 것을 특징으로 하는, 절연 피막용 조성물.N-methyl-2-pyrrolidone (NMP), γ-butyrolactone, N,N-dimethylacetamide (DMAc), N,N-dimethylformamide (DMF), dimethylimidazolidinone (DMI), A composition for an insulating coating comprising at least one solvent selected from the group consisting of cyclohexanone, methylcyclohexanone and aromatic alkyl benzenes.
  8. 도체; 및Conductor; And
    상기 도체 표면에 형성되고 제1항 또는 제2항의 절연 피막용 조성물로부터 형성된 절연 피막을 포함하는, 절연 전선.An insulated wire formed on the surface of the conductor and comprising an insulating film formed from the composition for an insulating film according to claim 1 or 2.
  9. 제8항에 있어서,The method of claim 8,
    상기 절연 피막은 상기 도체 표면에 형성되고 폴리이미드 수지, 폴리아미드이미드 수지 및 폴리에스테르이미드 수지로 이루어진 그룹으로부터 선택된 1종 이상의 수지를 포함하는 제1 절연 피막; 및The insulating film is formed on the surface of the conductor and includes a first insulating film containing at least one resin selected from the group consisting of polyimide resin, polyamideimide resin, and polyesterimide resin; And
    상기 제1 절연 피막 위에 형성되고 제1항 또는 제2항의 절연 피막용 조성물로부터 형성된 제2 절연 피막을 포함하는 것을 특징으로 하는, 절연 전선.An insulated wire comprising a second insulating film formed on the first insulating film and formed from the composition for an insulating film of claim 1 or 2.
  10. 제9항에 있어서,The method of claim 9,
    상기 제2 절연 피막의 두께는 상기 절연 피막의 총 두께의 85% 이상인 것을 특징으로 하는, 절연 전선.Insulated wire, characterized in that the thickness of the second insulating film is 85% or more of the total thickness of the insulating film.
  11. 제10항에 있어서,The method of claim 10,
    상기 도체 표면에 형성된 밀착성 향상층, 상기 절연 피막 표면 또는 상기 제2 절연 피막 표면에 형성된 윤활층 및 고유연층으로 이루어진 그룹으로부터 선택된 1종 이상의 층을 추가로 포함하는 것을 특징으로 하는, 절연 전선.An insulated wire, characterized in that it further comprises at least one layer selected from the group consisting of an adhesion-improving layer formed on the surface of the conductor, a lubricating layer formed on the surface of the insulating film or the surface of the second insulating film, and a highly flexible layer.
PCT/KR2020/002449 2019-02-20 2020-02-20 Composition for insulation film, and insulated electric wire comprising insulation film formed therefrom WO2020171617A1 (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110133001A (en) * 2010-06-03 2011-12-09 엘에스전선 주식회사 Insulated wire
JP2012048922A (en) * 2010-08-26 2012-03-08 Sumitomo Electric Wintec Inc Insulation wire, and electric machine coil and motor using the same
KR20120102712A (en) * 2009-11-20 2012-09-18 이 아이 듀폰 디 네모아 앤드 캄파니 Dimensionally stable polyimides, and methods relating thereto
KR20150054707A (en) * 2012-11-30 2015-05-20 후루카와 덴키 고교 가부시키가이샤 Insulated wire and electrical/electronic device
KR20160014651A (en) * 2013-05-31 2016-02-11 가부시키가이샤 가네카 Insulated coating material and use of same

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Publication number Priority date Publication date Assignee Title
KR20120102712A (en) * 2009-11-20 2012-09-18 이 아이 듀폰 디 네모아 앤드 캄파니 Dimensionally stable polyimides, and methods relating thereto
KR20110133001A (en) * 2010-06-03 2011-12-09 엘에스전선 주식회사 Insulated wire
JP2012048922A (en) * 2010-08-26 2012-03-08 Sumitomo Electric Wintec Inc Insulation wire, and electric machine coil and motor using the same
KR20150054707A (en) * 2012-11-30 2015-05-20 후루카와 덴키 고교 가부시키가이샤 Insulated wire and electrical/electronic device
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