WO2020067016A1 - Sealing resin composition, electronic component device, and manufacturing method of electronic component device - Google Patents
Sealing resin composition, electronic component device, and manufacturing method of electronic component device Download PDFInfo
- Publication number
- WO2020067016A1 WO2020067016A1 PCT/JP2019/037281 JP2019037281W WO2020067016A1 WO 2020067016 A1 WO2020067016 A1 WO 2020067016A1 JP 2019037281 W JP2019037281 W JP 2019037281W WO 2020067016 A1 WO2020067016 A1 WO 2020067016A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- sealing resin
- epoxy resin
- mass
- electronic component
- Prior art date
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- 238000007789 sealing Methods 0.000 title claims abstract description 79
- 239000011342 resin composition Substances 0.000 title claims abstract description 76
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- -1 ester compound Chemical class 0.000 claims abstract description 80
- 239000003822 epoxy resin Substances 0.000 claims abstract description 65
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 65
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 61
- 239000011256 inorganic filler Substances 0.000 claims abstract description 38
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 38
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims description 20
- 239000000047 product Substances 0.000 description 43
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 36
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 25
- 239000005011 phenolic resin Substances 0.000 description 23
- 150000002989 phenols Chemical class 0.000 description 21
- 150000001875 compounds Chemical class 0.000 description 19
- 229920005989 resin Polymers 0.000 description 19
- 239000011347 resin Substances 0.000 description 19
- 239000002245 particle Substances 0.000 description 15
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 239000007822 coupling agent Substances 0.000 description 12
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 239000007983 Tris buffer Substances 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 239000003063 flame retardant Substances 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 8
- 239000003086 colorant Substances 0.000 description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 7
- 238000004891 communication Methods 0.000 description 7
- 125000000524 functional group Chemical group 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 6
- 125000004185 ester group Chemical group 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 5
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000004305 biphenyl Substances 0.000 description 5
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- 125000003700 epoxy group Chemical group 0.000 description 5
- 230000017525 heat dissipation Effects 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 4
- NADHCXOXVRHBHC-UHFFFAOYSA-N 2,3-dimethoxycyclohexa-2,5-diene-1,4-dione Chemical compound COC1=C(OC)C(=O)C=CC1=O NADHCXOXVRHBHC-UHFFFAOYSA-N 0.000 description 4
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 4
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000001721 transfer moulding Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 235000013824 polyphenols Nutrition 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- 229960001755 resorcinol Drugs 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000001993 wax Substances 0.000 description 3
- 229940005561 1,4-benzoquinone Drugs 0.000 description 2
- ZEGDFCCYTFPECB-UHFFFAOYSA-N 2,3-dimethoxy-1,4-benzoquinone Natural products C1=CC=C2C(=O)C(OC)=C(OC)C(=O)C2=C1 ZEGDFCCYTFPECB-UHFFFAOYSA-N 0.000 description 2
- AIACLXROWHONEE-UHFFFAOYSA-N 2,3-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=C(C)C(=O)C=CC1=O AIACLXROWHONEE-UHFFFAOYSA-N 0.000 description 2
- SENUUPBBLQWHMF-UHFFFAOYSA-N 2,6-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=C(C)C1=O SENUUPBBLQWHMF-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
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- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
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- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
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- 125000002252 acyl group Chemical group 0.000 description 2
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- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical compound CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 description 2
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- ARUBXNBYMCVENE-UHFFFAOYSA-N 4-(4-bromophenyl)phenol Chemical group C1=CC(O)=CC=C1C1=CC=C(Br)C=C1 ARUBXNBYMCVENE-UHFFFAOYSA-N 0.000 description 1
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- WMUWDPLTTLJNPE-UHFFFAOYSA-N 4-bromo-3,5-dimethylphenol Chemical compound CC1=CC(O)=CC(C)=C1Br WMUWDPLTTLJNPE-UHFFFAOYSA-N 0.000 description 1
- GPOQODYGMUTOQL-UHFFFAOYSA-N 4-bromo-3-methylphenol Chemical compound CC1=CC(O)=CC=C1Br GPOQODYGMUTOQL-UHFFFAOYSA-N 0.000 description 1
- GZFGOTFRPZRKDS-UHFFFAOYSA-N 4-bromophenol Chemical compound OC1=CC=C(Br)C=C1 GZFGOTFRPZRKDS-UHFFFAOYSA-N 0.000 description 1
- LVSPDZAGCBEQAV-UHFFFAOYSA-N 4-chloronaphthalen-1-ol Chemical compound C1=CC=C2C(O)=CC=C(Cl)C2=C1 LVSPDZAGCBEQAV-UHFFFAOYSA-N 0.000 description 1
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- YLDFTMJPQJXGSS-UHFFFAOYSA-N 6-bromo-2-naphthol Chemical compound C1=C(Br)C=CC2=CC(O)=CC=C21 YLDFTMJPQJXGSS-UHFFFAOYSA-N 0.000 description 1
- NHJIDZUQMHKGRE-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl 2-(7-oxabicyclo[4.1.0]heptan-4-yl)acetate Chemical compound C1CC2OC2CC1OC(=O)CC1CC2OC2CC1 NHJIDZUQMHKGRE-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 150000007824 aliphatic compounds Chemical class 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000005036 alkoxyphenyl group Chemical group 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical group [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- ARRNBPCNZJXHRJ-UHFFFAOYSA-M hydron;tetrabutylazanium;phosphate Chemical compound OP(O)([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC ARRNBPCNZJXHRJ-UHFFFAOYSA-M 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N methylimidazole Natural products CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 239000004206 montan acid ester Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- FTDXCHCAMNRNNY-UHFFFAOYSA-N phenol Chemical class OC1=CC=CC=C1.OC1=CC=CC=C1 FTDXCHCAMNRNNY-UHFFFAOYSA-N 0.000 description 1
- CGEXUOTXYSGBLV-UHFFFAOYSA-N phenyl benzenesulfonate Chemical compound C=1C=CC=CC=1S(=O)(=O)OC1=CC=CC=C1 CGEXUOTXYSGBLV-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- JZWFDVDETGFGFC-UHFFFAOYSA-N salacetamide Chemical group CC(=O)NC(=O)C1=CC=CC=C1O JZWFDVDETGFGFC-UHFFFAOYSA-N 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MCZDHTKJGDCTAE-UHFFFAOYSA-M tetrabutylazanium;acetate Chemical compound CC([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC MCZDHTKJGDCTAE-UHFFFAOYSA-M 0.000 description 1
- GTCDARUMAMVCRO-UHFFFAOYSA-M tetraethylazanium;acetate Chemical compound CC([O-])=O.CC[N+](CC)(CC)CC GTCDARUMAMVCRO-UHFFFAOYSA-M 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- DGQOCLATAPFASR-UHFFFAOYSA-N tetrahydroxy-1,4-benzoquinone Chemical compound OC1=C(O)C(=O)C(O)=C(O)C1=O DGQOCLATAPFASR-UHFFFAOYSA-N 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
Definitions
- the present invention relates to a sealing resin composition, an electronic component device, and a method for manufacturing an electronic component device.
- Patent Literature 1 describes a sealing epoxy resin composition in which 60% by volume or more of an inorganic filler is alumina in order to enhance thermal conductivity.
- the amount of transmission loss caused by the radio wave transmitted for communication being thermally converted in the dielectric is expressed as the product of the frequency, the square root of the relative permittivity, and the dielectric loss tangent.
- a transmission signal is likely to change into heat in proportion to the frequency. Therefore, in order to suppress transmission loss, a material of a communication member is required to have a lower dielectric property in a higher frequency band.
- the present disclosure is directed to a sealing resin composition having an excellent balance between heat dissipation properties and dielectric properties of a cured product, an electronic component device sealed using the same, and an electronic component device sealed using the same. It is an object of the present invention to provide a method for manufacturing the same.
- An electronic device comprising: a support member; an element disposed on the support member; and a cured product of the sealing resin composition according to ⁇ 1> or ⁇ 2>, which seals the element. Parts equipment.
- a method for manufacturing an electronic component device comprising: a step of disposing an element on a support member; and a step of sealing the element with the sealing resin composition according to ⁇ 1> or ⁇ 2>.
- a sealing resin composition having an excellent balance between the heat dissipation properties and dielectric properties of a cured product, an electronic component device sealed using the same, and the production of an electronic component device sealed using the same A method is provided.
- the term "step” includes, in addition to a step independent of other steps, even if the purpose of the step is achieved even if it cannot be clearly distinguished from the other steps, the step is also included.
- the numerical ranges indicated by using “to” include the numerical values described before and after “to” as the minimum value and the maximum value, respectively.
- the upper limit or lower limit described in one numerical range may be replaced with the upper limit or lower limit of the numerical range described in other stages.
- the upper limit or the lower limit of the numerical range may be replaced with the value shown in the embodiment.
- each component may include a plurality of corresponding substances.
- the content or content of each component is, unless otherwise specified, the total content or content of the plurality of substances present in the composition. Means quantity.
- a plurality of types of particles corresponding to each component may be included.
- the particle size of each component means a value of a mixture of the plurality of types of particles present in the composition unless otherwise specified.
- the sealing resin composition of the present disclosure is a sealing resin composition containing an epoxy resin, a curing agent containing an active ester compound, and an inorganic filler containing alumina.
- a cured product obtained by curing the sealing resin composition having the above configuration is compared with a cured product of a conventional sealing resin composition using an epoxy resin and a curing agent. It was found that the cured product had an excellent balance between heat dissipation and dielectric properties. The reason is not necessarily clear, but is considered as follows.
- the sealing resin composition of the present disclosure contains alumina as an inorganic filler. Thereby, higher thermal conductivity is achieved as compared with the case where the sealing resin composition contains other inorganic filler such as silica. Furthermore, the resin composition for sealing of the present disclosure contains an active ester compound as a curing agent. A phenol curing agent, an amine curing agent, and the like generally used as a curing agent for an epoxy resin generate a secondary hydroxyl group in a reaction with the epoxy resin. On the other hand, in the reaction between the epoxy resin and the active ester compound, an ester group is generated instead of the secondary hydroxyl group.
- the sealing resin composition of the present disclosure is compared with a sealing resin composition containing only a curing agent that generates a secondary hydroxyl group as a curing agent.
- the dielectric loss tangent of the cured product can be kept low. As a result, even if the relative dielectric constant increases by using alumina as the inorganic filler, an increase in transmission loss can be suppressed.
- Epoxy resin The type of epoxy resin contained in the encapsulating resin composition of the present disclosure is not particularly limited. Specific examples of the epoxy resin include at least one selected from the group consisting of phenol compounds such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A and bisphenol F and naphthol compounds such as ⁇ -naphthol, ⁇ -naphthol and dihydroxynaphthalene.
- Novolak epoxy resin obtained by epoxidizing a novolak resin obtained by condensing or co-condensing a phenolic compound of a type with an aliphatic aldehyde compound such as formaldehyde, acetaldehyde, propionaldehyde, etc. under an acidic catalyst.
- an aromatic aldehyde compound such as benzaldehyde or salicylaldehyde under an acidic catalyst or Is a triphenylmethane-type epoxy resin obtained by epoxidizing a triphenylmethane-type phenol resin obtained by co-condensation
- Copolymer type epoxy resin obtained by epoxidation of resin diphenylmethane type epoxy resin which is diglycidyl ether such as bisphenol A and bisphenol F; biphenyl type epoxy resin which is diglycidyl ether of alkyl-substituted or unsubstituted biphenol; stilbene Stilbene type epoxy resin which is a diglycidyl ether of a phenolic compound; epoxy resin containing a sulfur atom which is a diglycidyl ether such as bisphenol S; butanediol, polyethylene glycol, polypropylene Epoxy resin which is a glycidyl ether of alcohols such as glycol; glycidyl ester type epoxy resin which is a glycidyl ester of a polycarboxylic acid compound such as phthalic acid, isophthalic acid and tetrahydrophthalic acid; nitrogen such as aniline, diaminodiphenylmethane and isocyanuric acid A
- the epoxy equivalent (molecular weight / number of epoxy groups) of the epoxy resin is not particularly limited. From the viewpoint of the balance of various properties such as moldability, reflow resistance and electrical reliability, it is preferably from 100 g / eq to 1000 g / eq, more preferably from 150 g / eq to 500 g / eq.
- the epoxy equivalent of the epoxy resin is a value measured by a method according to JIS K7236: 2009.
- the epoxy resin is a solid, its softening point or melting point is not particularly limited.
- the temperature is preferably from 40 ° C. to 180 ° C. from the viewpoints of moldability and reflow resistance, and more preferably from 50 ° C. to 130 ° C. from the viewpoint of handleability in preparing the sealing resin composition.
- the melting point or softening point of the epoxy resin is a value measured by a differential scanning calorimetry (DSC) or a method (ring and ball method) according to JIS K 7234: 1986.
- the content of the epoxy resin in the encapsulating resin composition is preferably 0.5% by mass to 50% by mass, and more preferably 2% by mass to 30% by mass in view of strength, fluidity, heat resistance, moldability and the like. % Is more preferable.
- the sealing resin composition of the present disclosure contains at least an active ester compound as a curing agent.
- the sealing resin composition of the present disclosure may include a curing agent other than the active ester compound.
- the active ester compound in the present disclosure refers to a compound having one or more ester groups in one molecule that reacts with an epoxy group, and has a curing action of an epoxy resin.
- the sealing resin composition of the present disclosure can reduce the dielectric loss tangent of a cured product by using an active ester compound as a curing agent.
- the polar group in the cured product enhances the water absorption of the cured product.
- the concentration of the polar group in the cured product can be suppressed, and the water absorption of the cured product can be suppressed. it can.
- the dielectric loss tangent of the cured product can be further reduced.
- the water absorption of the cured product is preferably 0% to 0.35%, more preferably 0% to 0.30%, and still more preferably 0% to 0.25%.
- the water absorption of the cured product is a mass increase rate determined by a pressure cooker test (121 ° C., 2.1 atm, 24 hours).
- the type of the active ester compound is not particularly limited as long as it has at least one ester group in the molecule that reacts with the epoxy group.
- the active ester compound examples include a phenol ester compound, a thiophenol ester compound, an N-hydroxyamine ester compound, an esterified product of a heterocyclic hydroxy compound, and the like.
- the active ester compound examples include an ester compound obtained from at least one kind of aliphatic carboxylic acid and aromatic carboxylic acid and at least one kind of aliphatic hydroxy compound and aromatic hydroxy compound.
- An ester compound containing an aliphatic compound as a component of polycondensation tends to have excellent compatibility with an epoxy resin due to having an aliphatic chain.
- An ester compound containing an aromatic compound as a component of polycondensation tends to have excellent heat resistance due to having an aromatic ring.
- the active ester compound examples include an aromatic ester obtained by a condensation reaction between an aromatic carboxylic acid and a phenolic hydroxyl group.
- an aromatic carboxylic acid component in which 2 to 4 hydrogen atoms of an aromatic ring such as benzene, naphthalene, biphenyl, diphenylpropane, diphenylmethane, diphenyl ether, and diphenylsulfonic acid are substituted with a carboxy group
- a mixture of an aromatic carboxylic acid and a phenolic hydroxyl group is obtained by using a mixture of a monohydric phenol in which one of the above is substituted with a hydroxyl group and a polyhydric phenol in which 2 to 4 of the hydrogen atoms of the aromatic ring are substituted with a hydroxyl group as a raw material.
- Aromatic esters obtained by a condensation reaction are preferred. That is, an aromatic ester having a structural unit derived from the aromatic carboxylic acid component, a structural unit derived from the monohydric phenol, and a structural unit derived from the polyhydric phenol is preferable.
- the active ester compound examples include a phenol resin having a molecular structure in which a phenol compound is knotted via an aliphatic cyclic hydrocarbon group, described in JP-A-2012-246467, and an aromatic dicarboxylic acid or An active ester resin having a structure obtained by reacting the halide with an aromatic monohydroxy compound is exemplified.
- the active ester resin a compound represented by the following structural formula (1) is preferable.
- R 1 is an alkyl group having 1 to 4 carbon atoms
- X is a benzene ring, a naphthalene ring, a benzene ring or a naphthalene ring substituted with an alkyl group having 1 to 4 carbon atoms, or a biphenyl group
- Y is a benzene ring, a naphthalene ring, or a benzene ring or a naphthalene ring substituted with an alkyl group having 1 to 4 carbon atoms
- k is 0 or 1
- n is an average of the number of repetitions. 25 to 1.5.
- Specific examples of the compound represented by the structural formula (1) include, for example, the following exemplified compounds (1-1) to (1-10).
- T-Bu in the structural formula is a tert-butyl group.
- active ester compound examples include a compound represented by the following structural formula (2) and a compound represented by the following structural formula (3) described in JP-A-2014-114352. No.
- R 1 and R 2 are each independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
- Z is a benzoyl group, a naphthoyl group
- An ester-forming structural site (z1) selected from the group consisting of a benzoyl group or a naphthoyl group substituted with an alkyl group of Formulas 1 to 4, and an acyl group having 2 to 6 carbon atoms, or a hydrogen atom (z2); At least one is an ester forming structural site (z1).
- R 1 and R 2 are each independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
- Z is a benzoyl group, a naphthoyl group
- An ester-forming structural site (z1) selected from the group consisting of a benzoyl group or a naphthoyl group substituted with an alkyl group of Formulas 1 to 4, and an acyl group having 2 to 6 carbon atoms, or a hydrogen atom (z2); At least one is an ester forming structural site (z1).
- Specific examples of the compound represented by the structural formula (2) include, for example, the following exemplified compounds (2-1) to (2-6).
- Specific examples of the compound represented by the structural formula (3) include, for example, the following exemplified compounds (3-1) to (3-6).
- active ester compound A commercial product may be used as the active ester compound.
- Commercially available active ester compounds include "EXB9451”, “EXB9460”, “EXB9460S”, “HPC-8000-65T” (manufactured by DIC Corporation) as active ester compounds having a dicyclopentadiene-type diphenol structure; "EXB9416-70BK”, “EXB-8", “EXB-9425” (manufactured by DIC Corporation) as an active ester compound having a structure; “DC808” (Mitsubishi Chemical Corporation) as an active ester compound containing an acetylated product of phenol novolak "YLH1026” (manufactured by Mitsubishi Chemical Corporation) as an active ester compound containing benzoylated phenol novolak.
- the active ester compound may be used alone or in combination of two or more.
- the ester equivalent of the active ester compound is not particularly limited. From the viewpoint of the balance of various characteristics such as moldability, reflow resistance, and electrical reliability, 150 g / eq to 400 g / eq is preferable, 170 g / eq to 300 g / eq is more preferable, and 200 g / eq to 250 g / eq is preferable. More preferred.
- the ester equivalent of the active ester compound is a value measured by a method according to JIS K 0070: 1992.
- the equivalent ratio of the epoxy resin to the active ester compound is preferably 0.9 or more, more preferably 0.95 or more, and 0.97 or more, from the viewpoint of keeping the dielectric loss tangent of the cured product low. Is more preferred.
- the equivalent ratio (ester group / epoxy group) between the epoxy resin and the active ester compound is preferably 1.1 or less, more preferably 1.05 or less, from the viewpoint of suppressing the unreacted component of the active ester compound. 03 or less is more preferable.
- the curing agent may contain other curing agents other than the active ester compound.
- the type of the other curing agent is not particularly limited, and can be selected according to the desired characteristics of the sealing resin composition.
- Other curing agents include phenol curing agents, amine curing agents, acid anhydride curing agents, polymercaptan curing agents, polyaminoamide curing agents, isocyanate curing agents, and blocked isocyanate curing agents.
- phenol curing agent examples include polyphenol compounds such as resorcin, catechol, bisphenol A, bisphenol F, and substituted or unsubstituted biphenol; phenol, cresol, xylenol, resorcin, catechol, bisphenol A, bisphenol F, and phenylphenol.
- Phenolic compounds such as aminophenols, aminophenols and the like and at least one phenolic compound selected from the group consisting of naphthol compounds such as ⁇ -naphthol, ⁇ -naphthol and dihydroxynaphthalene, and aldehyde compounds such as formaldehyde, acetaldehyde and propionaldehyde
- Novolak-type phenolic resin obtained by condensation or co-condensation under the following conditions: the above-mentioned phenolic compound, dimethoxyparaxylene, bis (methoxymethyl) biffe Phenol aralkyl resins such as phenol aralkyl resins, naphthol aralkyl resins, etc .; para-xylylene-modified phenol resins, meta-xylylene-modified phenol resins; melamine-modified phenol resins; terpene-modified phenol resins; A dicyclopentadiene-type phenol
- the functional group equivalent of other curing agents is not particularly limited. From the viewpoint of the balance of various properties such as moldability, reflow resistance, and electrical reliability, it is preferably from 70 g / eq to 1000 g / eq, more preferably from 80 g / eq to 500 g / eq.
- the temperature is preferably from 40 ° C. to 180 ° C., and from the viewpoint of handleability during the production of the sealing resin composition, it is more preferably from 50 ° C. to 130 ° C. .
- the melting point or softening point of the curing agent is a value measured in the same manner as the melting point or softening point of the epoxy resin.
- the number of functional groups is not particularly limited. From the viewpoint of minimizing the amount of each unreacted component, it is preferably set in the range of 0.5 to 2.0, and more preferably in the range of 0.6 to 1.3. From the viewpoint of moldability and reflow resistance, it is more preferable to set the ratio in the range of 0.8 to 1.2.
- the content of the active ester compound with respect to the total mass of the active ester compound and other curing agents is preferably 80% by mass or more, more preferably 85% by mass or more, from the viewpoint of keeping the dielectric loss tangent of the cured product low. More preferably, it is 90% by mass or more.
- the total content of the epoxy resin and the active ester compound with respect to the total mass of the epoxy resin, the active ester compound and the other curing agent is preferably 80% by mass or more, and more preferably 85% by mass, from the viewpoint of suppressing the dielectric loss tangent of the cured product to be low. %, More preferably 90% by mass or more.
- the sealing resin composition may include a curing accelerator.
- the type of the curing accelerator is not particularly limited, and can be selected according to the type of the epoxy resin or the curing agent, the desired characteristics of the sealing resin composition, and the like.
- curing accelerator examples include diazabicycloalkenes such as 1,5-diazabicyclo [4.3.0] nonene-5 (DBN) and 1,8-diazabicyclo [5.4.0] undecene-7 (DBU); Cyclic amidine compounds such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-heptadecylimidazole; derivatives of the cyclic amidine compounds; phenol novolak salts of the cyclic amidine compounds or derivatives thereof; To maleic anhydride, 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3-dimethoxy-5-methyl-1 , 4-benzoquinone, 2,3-dimethoxy-1,4-benzoquinone, phenyl-1 Quinone compounds such as 4-benzo
- a phosphine compound such as 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, Quinone compounds such as 3-dimethoxy-5-methyl-1,4-benzoquinone, 2,3-dimethoxy-1,4-benzoquinone and phenyl-1,4-benzoquinone; and compounds having a ⁇ bond such as diazophenylmethane.
- a halogenated phenol compound such as di-tert-butylphenol, 4-chloro-1
- the amount is preferably from 0.1 to 30 parts by mass based on 100 parts by mass of the resin component (the total amount of the epoxy resin and the curing agent). And more preferably 1 to 15 parts by weight.
- the amount of the curing accelerator is 0.1 parts by mass or more based on 100 parts by mass of the resin component, the curing tends to be performed well in a short time. If the amount of the curing accelerator is 30 parts by mass or less based on 100 parts by mass of the resin component, the curing rate tends to be too high and a good molded product tends to be obtained.
- the sealing resin composition of the present disclosure contains alumina as an inorganic filler.
- alumina By including alumina, an improvement in the thermal conductivity of the cured product can be expected.
- the inorganic filler other than alumina include inorganic materials such as fused silica, crystalline silica, glass, talc, clay, and mica.
- An inorganic filler having a flame-retardant effect may be used.
- Examples of the inorganic filler having a flame-retardant effect include aluminum hydroxide, magnesium hydroxide, a composite metal hydroxide such as a composite hydroxide of magnesium and zinc, and zinc borate.
- silica such as fused silica is preferable from the viewpoint of reducing the coefficient of linear expansion.
- One inorganic filler may be used alone, or two or more inorganic fillers may be used in combination.
- Examples of the form of the inorganic filler include powder, beads obtained by making the powder spherical, fibers, and the like.
- the average particle size is not particularly limited.
- the average particle size is preferably from 0.2 ⁇ m to 100 ⁇ m, more preferably from 0.5 ⁇ m to 50 ⁇ m.
- the average particle size is 0.2 ⁇ m or more, an increase in the viscosity of the sealing resin composition tends to be further suppressed.
- the average particle size is 100 ⁇ m or less, the filling properties tend to be further improved.
- the average particle size of the inorganic filler is determined as a volume average particle size (D50) by a laser scattering diffraction particle size distribution analyzer.
- the proportion of alumina occupied by the inorganic filler contained in the sealing resin composition is not particularly limited.
- the content is preferably 50% by mass or more, more preferably 60% by mass or more, and even more preferably 70% by mass or more.
- the content is preferably 90% by mass or less.
- the content of the inorganic filler contained in the sealing resin composition is not particularly limited. From the viewpoints of fluidity and strength, the content is preferably 30% by volume to 90% by volume, more preferably 35% by volume to 80% by volume, and more preferably 40% by volume to 70% by volume of the entire sealing resin composition. % Is more preferable.
- the content of the inorganic filler is 30% by volume or more of the entire sealing resin composition, properties such as a thermal expansion coefficient, a thermal conductivity, and an elastic modulus of the cured product tend to be further improved.
- the content of the inorganic filler is 90% by volume or less of the entire sealing resin composition, an increase in the viscosity of the sealing resin composition is suppressed, the flowability is further improved, and the moldability is more improved. Tend to be.
- the sealing resin composition may contain various additives such as a coupling agent, an ion exchanger, a release agent, a flame retardant, and a coloring agent exemplified below, in addition to the above components.
- the sealing resin composition may contain various additives known in the art as needed, in addition to the additives exemplified below.
- the sealing resin composition may include a coupling agent.
- the sealing resin composition preferably contains a coupling agent.
- the coupling agent include known coupling agents such as silane compounds such as epoxy silane, mercapto silane, amino silane, alkyl silane, ureido silane, and vinyl silane, titanium compounds, aluminum chelate compounds, and aluminum / zirconium compounds. .
- the amount of the coupling agent is preferably 0.05 to 5 parts by mass, and more preferably 0.1 part by mass, based on 100 parts by mass of the inorganic filler. More preferably, it is 2.5 parts by mass.
- the amount of the coupling agent is 0.05 parts by mass or more based on 100 parts by mass of the inorganic filler, the adhesiveness to the frame tends to be further improved.
- the amount of the coupling agent is 5 parts by mass or less based on 100 parts by mass of the inorganic filler, the moldability of the package tends to be further improved.
- the sealing resin composition may include an ion exchanger.
- the sealing resin composition preferably contains an ion exchanger from the viewpoint of improving the moisture resistance and high-temperature storage characteristics of the electronic component device including the element to be sealed.
- the ion exchanger is not particularly limited, and a conventionally known ion exchanger can be used. Specific examples include a hydrotalcite compound and a hydrated oxide of at least one element selected from the group consisting of magnesium, aluminum, titanium, zirconium and bismuth.
- One type of ion exchanger may be used alone, or two or more types may be used in combination. Among them, hydrotalcite represented by the following general formula (A) is preferable.
- the sealing resin composition contains an ion exchanger
- its content is not particularly limited as long as it is an amount sufficient to capture ions such as halogen ions.
- the amount is preferably from 0.1 to 30 parts by mass, more preferably from 1 to 10 parts by mass, per 100 parts by mass of the resin component (total amount of the epoxy resin and the curing agent).
- the sealing resin composition may include a release agent from the viewpoint of obtaining good releasability from a mold during molding.
- the release agent is not particularly limited, and a conventionally known release agent can be used. Specific examples include carnauba wax, higher fatty acids such as montanic acid and stearic acid, higher fatty acid metal salts, ester waxes such as montanic acid esters, and polyolefin waxes such as polyethylene oxide and non-oxidized polyethylene.
- One type of release agent may be used alone, or two or more types may be used in combination.
- the amount is preferably from 0.01 to 10 parts by mass, more preferably from 0.1 to 10 parts by mass, per 100 parts by mass of the resin component (total amount of the epoxy resin and the curing agent). More preferred is from 5 parts by mass to 5 parts by mass.
- the amount of the release agent is 0.01 part by mass or more based on 100 parts by mass of the resin component, there is a tendency that sufficient releasability is obtained.
- the amount is 10 parts by mass or less, better adhesiveness tends to be obtained.
- the sealing resin composition may contain a flame retardant.
- the flame retardant is not particularly limited, and a conventionally known one can be used. Specifically, an organic or inorganic compound containing a halogen atom, an antimony atom, a nitrogen atom or a phosphorus atom, a metal hydroxide and the like can be mentioned.
- the flame retardants may be used alone or in combination of two or more.
- the sealing resin composition contains a flame retardant
- its amount is not particularly limited as long as it is an amount sufficient to obtain a desired flame retardant effect.
- it is preferably from 1 to 30 parts by mass, more preferably from 2 to 20 parts by mass, based on 100 parts by mass of the resin component (total amount of the epoxy resin and the curing agent).
- the sealing resin composition may include a coloring agent.
- the coloring agent include known coloring agents such as carbon black, organic dyes, organic pigments, titanium oxide, lead red, and red iron oxide.
- the content of the coloring agent can be appropriately selected according to the purpose and the like.
- the colorant may be used alone or in combination of two or more.
- the method for preparing the sealing resin composition is not particularly limited.
- a general method there can be mentioned a method in which components of a predetermined compounding amount are sufficiently mixed by a mixer or the like, then melt-kneaded by a mixing roll, an extruder, or the like, cooled, and pulverized. More specifically, for example, a method of uniformly stirring and mixing predetermined amounts of the above-described components, kneading with a kneader, roll, extruder or the like which has been heated to 70 ° C. to 140 ° C., cooling, and pulverizing. Can be mentioned.
- the sealing resin composition is preferably solid at normal temperature and normal pressure (for example, 25 ° C. and atmospheric pressure).
- the shape when the sealing resin composition is a solid is not particularly limited, and examples thereof include powder, granules, and tablets.
- the resin composition for sealing is in the form of a tablet, it is preferable from the viewpoint of handleability that the dimensions and the mass be such as to match the molding conditions of the package.
- An electronic component device includes an element, and a cured product of the sealing resin composition of the present disclosure that seals the element.
- Electronic component devices include supporting members such as lead frames, wired tape carriers, wiring boards, glass, silicon wafers, and organic substrates, as well as active elements such as semiconductor chips, transistors, diodes, and thyristors, capacitors, and resistors.
- a passive element such as a coil
- a sealing resin composition More specifically, after fixing an element on a lead frame, connecting a terminal part of the element such as a bonding pad and a lead part by wire bonding, a bump or the like, and then performing transfer molding or the like using a sealing resin composition.
- an element is mounted on the surface of a support member having wiring board connection terminals formed on the back surface, and the element and the support member are bumped or wire-bonded.
- BGA Bit Grid Array
- CSP Chip Size Package
- MCP Multi Chip Package
- the sealing resin composition can also be suitably used for a printed wiring board.
- the method for manufacturing an electronic component device includes a step of disposing an element on a support member, and a step of sealing the element with the sealing resin composition of the present disclosure.
- the method of performing each of the above steps is not particularly limited, and can be performed by a general method. Further, the types of the support members and the elements used for manufacturing the electronic component device are not particularly limited, and the support members and the elements generally used for manufacturing the electronic component device can be used.
- Examples of a method for sealing an element using the sealing resin composition of the present disclosure include a low-pressure transfer molding method, an injection molding method, and a compression molding method. Among these, the low pressure transfer molding method is common.
- Epoxy resin 1 biphenyl aralkyl type epoxy resin, epoxy equivalent 275 g / eq (Nippon Kayaku Co., Ltd., product name "NC-3000")
- Epoxy resin 2 biphenyl type epoxy resin, epoxy equivalent 192 g / eq (Mitsubishi Chemical Corporation, product name "YX-4000”)
- Curing agent 1 Biphenyl aralkyl type phenol resin, hydroxyl equivalent 199 g / eq (Air Water Co., Ltd., product name "HE200C-10")
- Curing agent 2 Active ester compound (DIC Corporation)
- Curing accelerator 1 p-benzoquinone adduct of triphenylphosphine
- Coupling agent 1 3-methacryloxypropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., product name “KBM-503”)
- Coupling agent 2 3-mercaptopropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., product name “KBM-803”)
- Inorganic filler 1 Silica filler (Denka Corporation, product name “FB-9454FC”, average particle size 18 ⁇ m)
- Inorganic filler 2 Silica filler (Denka Corporation, product name “FB-9454”, average particle size 19 ⁇ m)
- a test piece for thermal conductivity evaluation (length 10 mm ⁇ width 10 mm ⁇ ) was prepared by using a vacuum hand press molding machine under the conditions of a mold temperature of 175 ° C. to 180 ° C., a molding pressure of 250 kPa, and a curing time of 600 seconds. 0.8 mm).
- the thermal diffusivity in the thickness direction of the molded test piece was measured.
- the measurement of the thermal diffusivity was performed by a laser flash method (apparatus: LFA467 nanoflash, manufactured by NETZSCH).
- the pulse light irradiation was performed under the conditions of a pulse width of 0.31 (ms) and an applied voltage of 247 V. The measurement was performed at an ambient temperature of 25 ° C.
- ⁇ ⁇ ⁇ Cp ⁇ ⁇ Expression (1) (Where ⁇ is the thermal conductivity (W / (m ⁇ K)), ⁇ is the thermal diffusivity (m 2 / s), Cp is the specific heat (J / (kg ⁇ K)), and ⁇ is the density (D: kg / m 3 ).
- the encapsulating resin composition is charged into a transfer molding machine, molded under the conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds, and post-curing is performed at 175 ° C. for 6 hours to obtain a rod-shaped cured product ( 0.8 mm long, 0.6 mm wide, and 90 mm thick).
- a cavity resonator Kerato Electronics Application Development Co., Ltd., “CP561”
- a network analyzer Keysight Technology, Inc., “PNA E8364B”
- Example 1 As shown in Table 1, the sealing resin compositions of Example 1 and Comparative Example 3 using alumina as the inorganic filler were harder than Comparative Examples 1 and 2 not using alumina as the inorganic filler. The thermal conductivity of the object was high. On the other hand, the relative dielectric constants of Example 1 and Comparative Example 3 were higher than those of Comparative Examples 1 and 2. However, in Example 1 in which the active ester compound was used as the curing agent, the transmission loss was suppressed because the dielectric loss tangent was lower than in Comparative Example 3 in which the phenol resin was used as the curing agent. The balance of characteristics was excellent.
- Example 1 and Comparative Example 2 the use of an active ester having a lower viscosity than that of the phenol resin as the curing agent improved the fluidity as compared with Comparative Examples 1 and 3 using the phenol resin as the curing agent.
- the effect of improving the fluidity of Example 1 using alumina as the inorganic filler was larger than that of Comparative Example 3 not using alumina as the inorganic filler.
- the gel time is shorter than in Comparative Examples 1 to 3.
- Alumina generally causes a delay in the curing reaction, but it is considered that the curability is improved because the reactivity between the active ester compound and the epoxy resin is higher than the reactivity between the phenol resin and the epoxy resin.
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Abstract
Provided is a sealing resin composition containing: an epoxy resin; a curing agent including an active ester compound; and an inorganic filler including alumina.
Description
本発明は、封止用樹脂組成物、電子部品装置及び電子部品装置の製造方法に関する。
The present invention relates to a sealing resin composition, an electronic component device, and a method for manufacturing an electronic component device.
電子通信機器の高密度化、高出力化等に伴って、半導体装置の発熱量が増大する傾向にある。そこで、半導体装置の封止に用いられる材料の放熱性を高めるために熱伝導性の向上が検討されている。例えば、特許文献1には、熱伝導性を高めるために無機充填材の60体積%以上をアルミナとした封止用エポキシ樹脂組成物が記載されている。
(4) With the increase in density and output of electronic communication devices, the amount of heat generated by semiconductor devices tends to increase. Therefore, to improve heat dissipation of a material used for sealing a semiconductor device, improvement in thermal conductivity has been studied. For example, Patent Literature 1 describes a sealing epoxy resin composition in which 60% by volume or more of an inorganic filler is alumina in order to enhance thermal conductivity.
一方、通信のために発信された電波が誘電体において熱変換されることで発生する伝送損失の量は、周波数と比誘電率の平方根と誘電正接との積として表される。つまり伝送信号は周波数に比例して熱に変わりやすいので、伝送損失を抑制するために高周波帯ほど通信部材の材料に低誘電特性が要求される。
On the other hand, the amount of transmission loss caused by the radio wave transmitted for communication being thermally converted in the dielectric is expressed as the product of the frequency, the square root of the relative permittivity, and the dielectric loss tangent. In other words, a transmission signal is likely to change into heat in proportion to the frequency. Therefore, in order to suppress transmission loss, a material of a communication member is required to have a lower dielectric property in a higher frequency band.
情報通信分野においては、チャンネル数の増加と伝送される情報量の増加にともなって電波の高周波化が進行している。現在、第5世代移動通信システムの検討が世界的に進められており、使用する周波帯の候補に約30GHz~70GHzの範囲の幾つかが挙げられている。今後は無線通信の主流がこれほどの高周波帯での通信になるため、通信部材の材料にはさらなる誘電特性の向上が求められている。
(4) In the information and communication field, radio waves are becoming higher in frequency with the increase in the number of channels and the amount of information transmitted. At present, studies on the fifth generation mobile communication system are being promoted worldwide, and some of the candidates for the frequency band to be used are in the range of about 30 GHz to 70 GHz. In the future, since the mainstream of wireless communication will be communication in such a high frequency band, further improvement in dielectric properties is required for the material of communication members.
封止用樹脂組成物の無機充填材としてアルミナを用いた場合、熱伝導性が高く放熱性が向上する一方で、比誘電率が上昇して伝送損失が増大するおそれがある。
(4) When alumina is used as the inorganic filler of the sealing resin composition, the heat conductivity is high and the heat dissipation is improved, but the relative dielectric constant is increased and the transmission loss may be increased.
本開示は上記事情に鑑み、硬化物の放熱性と誘電特性のバランスに優れる封止用樹脂組成物、これを用いて封止された電子部品装置、及びこれを用いて封止する電子部品装置の製造方法を提供することを課題とする。
In view of the above circumstances, the present disclosure is directed to a sealing resin composition having an excellent balance between heat dissipation properties and dielectric properties of a cured product, an electronic component device sealed using the same, and an electronic component device sealed using the same. It is an object of the present invention to provide a method for manufacturing the same.
前記課題を解決するための具体的手段には、以下の態様が含まれる。
<1>エポキシ樹脂と、活性エステル化合物を含む硬化剤と、アルミナを含む無機充填材とを含有する封止用樹脂組成物。
<2>前記無機充填材全体に占めるアルミナの割合が50質量%以上である、<1>に記載の封止用樹脂組成物。
<3>支持部材と、前記支持部材上に配置された素子と、前記素子を封止している<1>又は<2>に記載の封止用樹脂組成物の硬化物と、を備える電子部品装置。
<4>素子を支持部材上に配置する工程と、前記素子を<1>又は<2>に記載の封止用樹脂組成物で封止する工程と、を含む電子部品装置の製造方法。 Specific means for solving the above problems include the following aspects.
<1> A sealing resin composition containing an epoxy resin, a curing agent containing an active ester compound, and an inorganic filler containing alumina.
<2> The sealing resin composition according to <1>, wherein the proportion of alumina in the entire inorganic filler is 50% by mass or more.
<3> An electronic device comprising: a support member; an element disposed on the support member; and a cured product of the sealing resin composition according to <1> or <2>, which seals the element. Parts equipment.
<4> A method for manufacturing an electronic component device, comprising: a step of disposing an element on a support member; and a step of sealing the element with the sealing resin composition according to <1> or <2>.
<1>エポキシ樹脂と、活性エステル化合物を含む硬化剤と、アルミナを含む無機充填材とを含有する封止用樹脂組成物。
<2>前記無機充填材全体に占めるアルミナの割合が50質量%以上である、<1>に記載の封止用樹脂組成物。
<3>支持部材と、前記支持部材上に配置された素子と、前記素子を封止している<1>又は<2>に記載の封止用樹脂組成物の硬化物と、を備える電子部品装置。
<4>素子を支持部材上に配置する工程と、前記素子を<1>又は<2>に記載の封止用樹脂組成物で封止する工程と、を含む電子部品装置の製造方法。 Specific means for solving the above problems include the following aspects.
<1> A sealing resin composition containing an epoxy resin, a curing agent containing an active ester compound, and an inorganic filler containing alumina.
<2> The sealing resin composition according to <1>, wherein the proportion of alumina in the entire inorganic filler is 50% by mass or more.
<3> An electronic device comprising: a support member; an element disposed on the support member; and a cured product of the sealing resin composition according to <1> or <2>, which seals the element. Parts equipment.
<4> A method for manufacturing an electronic component device, comprising: a step of disposing an element on a support member; and a step of sealing the element with the sealing resin composition according to <1> or <2>.
本開示によれば、硬化物の放熱性と誘電特性のバランスに優れる封止用樹脂組成物、これを用いて封止された電子部品装置、及びこれを用いて封止する電子部品装置の製造方法が提供される。
According to the present disclosure, a sealing resin composition having an excellent balance between the heat dissipation properties and dielectric properties of a cured product, an electronic component device sealed using the same, and the production of an electronic component device sealed using the same A method is provided.
本開示において「工程」との語には、他の工程から独立した工程に加え、他の工程と明確に区別できない場合であってもその工程の目的が達成されれば、当該工程も含まれる。
本開示において「~」を用いて示された数値範囲には、「~」の前後に記載される数値がそれぞれ最小値及び最大値として含まれる。
本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
本開示において各成分は該当する物質を複数種含んでいてもよい。組成物中に各成分に該当する物質が複数種存在する場合、各成分の含有率又は含有量は、特に断らない限り、組成物中に存在する当該複数種の物質の合計の含有率又は含有量を意味する。
本開示において各成分に該当する粒子は複数種含んでいてもよい。組成物中に各成分に該当する粒子が複数種存在する場合、各成分の粒子径は、特に断らない限り、組成物中に存在する当該複数種の粒子の混合物についての値を意味する。 In the present disclosure, the term "step" includes, in addition to a step independent of other steps, even if the purpose of the step is achieved even if it cannot be clearly distinguished from the other steps, the step is also included. .
In the present disclosure, the numerical ranges indicated by using “to” include the numerical values described before and after “to” as the minimum value and the maximum value, respectively.
In the numerical ranges described in stages in the present disclosure, the upper limit or lower limit described in one numerical range may be replaced with the upper limit or lower limit of the numerical range described in other stages. . Further, in the numerical range described in the present disclosure, the upper limit or the lower limit of the numerical range may be replaced with the value shown in the embodiment.
In the present disclosure, each component may include a plurality of corresponding substances. When there are a plurality of substances corresponding to each component in the composition, the content or content of each component is, unless otherwise specified, the total content or content of the plurality of substances present in the composition. Means quantity.
In the present disclosure, a plurality of types of particles corresponding to each component may be included. When a plurality of types of particles corresponding to each component are present in the composition, the particle size of each component means a value of a mixture of the plurality of types of particles present in the composition unless otherwise specified.
本開示において「~」を用いて示された数値範囲には、「~」の前後に記載される数値がそれぞれ最小値及び最大値として含まれる。
本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
本開示において各成分は該当する物質を複数種含んでいてもよい。組成物中に各成分に該当する物質が複数種存在する場合、各成分の含有率又は含有量は、特に断らない限り、組成物中に存在する当該複数種の物質の合計の含有率又は含有量を意味する。
本開示において各成分に該当する粒子は複数種含んでいてもよい。組成物中に各成分に該当する粒子が複数種存在する場合、各成分の粒子径は、特に断らない限り、組成物中に存在する当該複数種の粒子の混合物についての値を意味する。 In the present disclosure, the term "step" includes, in addition to a step independent of other steps, even if the purpose of the step is achieved even if it cannot be clearly distinguished from the other steps, the step is also included. .
In the present disclosure, the numerical ranges indicated by using “to” include the numerical values described before and after “to” as the minimum value and the maximum value, respectively.
In the numerical ranges described in stages in the present disclosure, the upper limit or lower limit described in one numerical range may be replaced with the upper limit or lower limit of the numerical range described in other stages. . Further, in the numerical range described in the present disclosure, the upper limit or the lower limit of the numerical range may be replaced with the value shown in the embodiment.
In the present disclosure, each component may include a plurality of corresponding substances. When there are a plurality of substances corresponding to each component in the composition, the content or content of each component is, unless otherwise specified, the total content or content of the plurality of substances present in the composition. Means quantity.
In the present disclosure, a plurality of types of particles corresponding to each component may be included. When a plurality of types of particles corresponding to each component are present in the composition, the particle size of each component means a value of a mixture of the plurality of types of particles present in the composition unless otherwise specified.
<封止用樹脂組成物>
本開示の封止用樹脂組成物は、エポキシ樹脂と、活性エステル化合物を含む硬化剤と、アルミナを含む無機充填材とを含有する封止用樹脂組成物である。 <Sealing resin composition>
The sealing resin composition of the present disclosure is a sealing resin composition containing an epoxy resin, a curing agent containing an active ester compound, and an inorganic filler containing alumina.
本開示の封止用樹脂組成物は、エポキシ樹脂と、活性エステル化合物を含む硬化剤と、アルミナを含む無機充填材とを含有する封止用樹脂組成物である。 <Sealing resin composition>
The sealing resin composition of the present disclosure is a sealing resin composition containing an epoxy resin, a curing agent containing an active ester compound, and an inorganic filler containing alumina.
本発明者らの検討の結果、上記構成を有する封止用樹脂組成物を硬化して得られる硬化物は、従来のエポキシ樹脂と硬化剤を用いた封止用樹脂組成物の硬化物に比べて硬化物の放熱性と誘電特性のバランスに優れることがわかった。その理由は必ずしも明らかではないが、以下のように考えられる。
As a result of the study of the present inventors, a cured product obtained by curing the sealing resin composition having the above configuration is compared with a cured product of a conventional sealing resin composition using an epoxy resin and a curing agent. It was found that the cured product had an excellent balance between heat dissipation and dielectric properties. The reason is not necessarily clear, but is considered as follows.
まず、本開示の封止用樹脂組成物は、無機充填材としてアルミナを含んでいる。これにより、封止用樹脂組成物がシリカ等の他の無機充填材を含む場合に比べて高い熱伝導率を達成している。
さらに、本開示の封止用樹脂組成物は、硬化剤として活性エステル化合物を含んでいる。エポキシ樹脂の硬化剤として一般的に用いられるフェノール硬化剤、アミン硬化剤等は、エポキシ樹脂との反応において2級水酸基を生じる。これに対して、エポキシ樹脂と活性エステル化合物との反応においては2級水酸基のかわりにエステル基が生じる。エステル基は2級水酸基に比べて極性が低い故、本開示の封止用樹脂組成物は、硬化剤として2級水酸基を発生させる硬化剤のみを含有する封止用樹脂組成物に比べて、硬化物の誘電正接を低く抑えることができる。その結果、無機充填材としてアルミナを用いることで比誘電率が上昇しても伝送損失の増大を抑えることができる。 First, the sealing resin composition of the present disclosure contains alumina as an inorganic filler. Thereby, higher thermal conductivity is achieved as compared with the case where the sealing resin composition contains other inorganic filler such as silica.
Furthermore, the resin composition for sealing of the present disclosure contains an active ester compound as a curing agent. A phenol curing agent, an amine curing agent, and the like generally used as a curing agent for an epoxy resin generate a secondary hydroxyl group in a reaction with the epoxy resin. On the other hand, in the reaction between the epoxy resin and the active ester compound, an ester group is generated instead of the secondary hydroxyl group. Since the ester group has a lower polarity than the secondary hydroxyl group, the sealing resin composition of the present disclosure is compared with a sealing resin composition containing only a curing agent that generates a secondary hydroxyl group as a curing agent. The dielectric loss tangent of the cured product can be kept low. As a result, even if the relative dielectric constant increases by using alumina as the inorganic filler, an increase in transmission loss can be suppressed.
さらに、本開示の封止用樹脂組成物は、硬化剤として活性エステル化合物を含んでいる。エポキシ樹脂の硬化剤として一般的に用いられるフェノール硬化剤、アミン硬化剤等は、エポキシ樹脂との反応において2級水酸基を生じる。これに対して、エポキシ樹脂と活性エステル化合物との反応においては2級水酸基のかわりにエステル基が生じる。エステル基は2級水酸基に比べて極性が低い故、本開示の封止用樹脂組成物は、硬化剤として2級水酸基を発生させる硬化剤のみを含有する封止用樹脂組成物に比べて、硬化物の誘電正接を低く抑えることができる。その結果、無機充填材としてアルミナを用いることで比誘電率が上昇しても伝送損失の増大を抑えることができる。 First, the sealing resin composition of the present disclosure contains alumina as an inorganic filler. Thereby, higher thermal conductivity is achieved as compared with the case where the sealing resin composition contains other inorganic filler such as silica.
Furthermore, the resin composition for sealing of the present disclosure contains an active ester compound as a curing agent. A phenol curing agent, an amine curing agent, and the like generally used as a curing agent for an epoxy resin generate a secondary hydroxyl group in a reaction with the epoxy resin. On the other hand, in the reaction between the epoxy resin and the active ester compound, an ester group is generated instead of the secondary hydroxyl group. Since the ester group has a lower polarity than the secondary hydroxyl group, the sealing resin composition of the present disclosure is compared with a sealing resin composition containing only a curing agent that generates a secondary hydroxyl group as a curing agent. The dielectric loss tangent of the cured product can be kept low. As a result, even if the relative dielectric constant increases by using alumina as the inorganic filler, an increase in transmission loss can be suppressed.
(エポキシ樹脂)
本開示の封止用樹脂組成物に含まれるエポキシ樹脂の種類は、特に制限されない。
エポキシ樹脂として具体的には、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF等のフェノール化合物及びα-ナフトール、β-ナフトール、ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも1種のフェノール性化合物と、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド等の脂肪族アルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したものであるノボラック型エポキシ樹脂(フェノールノボラック型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂等);上記フェノール性化合物と、ベンズアルデヒド、サリチルアルデヒド等の芳香族アルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるトリフェニルメタン型フェノール樹脂をエポキシ化したものであるトリフェニルメタン型エポキシ樹脂;上記フェノール化合物及びナフトール化合物と、アルデヒド化合物とを酸性触媒下で共縮合させて得られるノボラック樹脂をエポキシ化したものである共重合型エポキシ樹脂;ビスフェノールA、ビスフェノールF等のジグリシジルエーテルであるジフェニルメタン型エポキシ樹脂;アルキル置換又は非置換のビフェノールのジグリシジルエーテルであるビフェニル型エポキシ樹脂;スチルベン系フェノール化合物のジグリシジルエーテルであるスチルベン型エポキシ樹脂;ビスフェノールS等のジグリシジルエーテルである硫黄原子含有エポキシ樹脂;ブタンジオール、ポリエチレングリコール、ポリプロピレングリコール等のアルコール類のグリシジルエーテルであるエポキシ樹脂;フタル酸、イソフタル酸、テトラヒドロフタル酸等の多価カルボン酸化合物のグリシジルエステルであるグリシジルエステル型エポキシ樹脂;アニリン、ジアミノジフェニルメタン、イソシアヌル酸等の窒素原子に結合した活性水素をグリシジル基で置換したものであるグリシジルアミン型エポキシ樹脂;ジシクロペンタジエンとフェノール化合物の共縮合樹脂をエポキシ化したものであるジシクロペンタジエン型エポキシ樹脂;分子内のオレフィン結合をエポキシ化したものであるビニルシクロヘキセンジエポキシド、3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート、2-(3,4-エポキシ)シクロヘキシル-5,5-スピロ(3,4-エポキシ)シクロヘキサン-m-ジオキサン等の脂環型エポキシ樹脂;パラキシリレン変性フェノール樹脂のグリシジルエーテルであるパラキシリレン変性エポキシ樹脂;メタキシリレン変性フェノール樹脂のグリシジルエーテルであるメタキシリレン変性エポキシ樹脂;テルペン変性フェノール樹脂のグリシジルエーテルであるテルペン変性エポキシ樹脂;ジシクロペンタジエン変性フェノール樹脂のグリシジルエーテルであるジシクロペンタジエン変性エポキシ樹脂;シクロペンタジエン変性フェノール樹脂のグリシジルエーテルであるシクロペンタジエン変性エポキシ樹脂;多環芳香環変性フェノール樹脂のグリシジルエーテルである多環芳香環変性エポキシ樹脂;ナフタレン環含有フェノール樹脂のグリシジルエーテルであるナフタレン型エポキシ樹脂;ハロゲン化フェノールノボラック型エポキシ樹脂;ハイドロキノン型エポキシ樹脂;トリメチロールプロパン型エポキシ樹脂;オレフィン結合を過酢酸等の過酸で酸化して得られる線状脂肪族エポキシ樹脂;フェノールアラルキル樹脂、ナフトールアラルキル樹脂等のアラルキル型フェノール樹脂をエポキシ化したものであるアラルキル型エポキシ樹脂;などが挙げられる。さらにはアクリル樹脂のエポキシ化物等もエポキシ樹脂として挙げられる。これらのエポキシ樹脂は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Epoxy resin)
The type of epoxy resin contained in the encapsulating resin composition of the present disclosure is not particularly limited.
Specific examples of the epoxy resin include at least one selected from the group consisting of phenol compounds such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A and bisphenol F and naphthol compounds such as α-naphthol, β-naphthol and dihydroxynaphthalene. Novolak epoxy resin (phenol novolak type) obtained by epoxidizing a novolak resin obtained by condensing or co-condensing a phenolic compound of a type with an aliphatic aldehyde compound such as formaldehyde, acetaldehyde, propionaldehyde, etc. under an acidic catalyst. Epoxy resin, orthocresol novolak type epoxy resin, etc.); condensation of the above phenolic compound with an aromatic aldehyde compound such as benzaldehyde or salicylaldehyde under an acidic catalyst or Is a triphenylmethane-type epoxy resin obtained by epoxidizing a triphenylmethane-type phenol resin obtained by co-condensation; a novolak obtained by co-condensing the phenol compound and the naphthol compound with an aldehyde compound under an acidic catalyst. Copolymer type epoxy resin obtained by epoxidation of resin; diphenylmethane type epoxy resin which is diglycidyl ether such as bisphenol A and bisphenol F; biphenyl type epoxy resin which is diglycidyl ether of alkyl-substituted or unsubstituted biphenol; stilbene Stilbene type epoxy resin which is a diglycidyl ether of a phenolic compound; epoxy resin containing a sulfur atom which is a diglycidyl ether such as bisphenol S; butanediol, polyethylene glycol, polypropylene Epoxy resin which is a glycidyl ether of alcohols such as glycol; glycidyl ester type epoxy resin which is a glycidyl ester of a polycarboxylic acid compound such as phthalic acid, isophthalic acid and tetrahydrophthalic acid; nitrogen such as aniline, diaminodiphenylmethane and isocyanuric acid A glycidylamine-type epoxy resin in which active hydrogen bonded to an atom is replaced by a glycidyl group; a dicyclopentadiene-type epoxy resin in which a cocondensation resin of dicyclopentadiene and a phenol compound is epoxidized; an olefin bond in a molecule Vinylcyclohexene diepoxide obtained by epoxidation of 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 2- (3,4-epoxy) cyclohexyl-5 An alicyclic epoxy resin such as spiro (3,4-epoxy) cyclohexane-m-dioxane; a paraxylylene-modified epoxy resin which is a glycidyl ether of a para-xylylene-modified phenol resin; a meta-xylylene-modified epoxy resin which is a glycidyl ether of a meta-xylylene-modified phenol resin; Terpene-modified epoxy resin which is a glycidyl ether of a terpene-modified phenol resin; dicyclopentadiene-modified epoxy resin which is a glycidyl ether of a dicyclopentadiene-modified phenol resin; cyclopentadiene-modified epoxy resin which is a glycidyl ether of a cyclopentadiene-modified phenol resin; Polycyclic aromatic ring-modified epoxy resin which is a glycidyl ether of an aromatic ring-modified phenolic resin; glycidyl ether of a naphthalene ring-containing phenolic resin Naphthalene-type epoxy resin, which is a polyester; halogenated phenol novolak-type epoxy resin; hydroquinone-type epoxy resin; trimethylolpropane-type epoxy resin; linear aliphatic epoxy resin obtained by oxidizing olefin bond with peracid such as peracetic acid; Aralkyl-type epoxy resins obtained by epoxidizing aralkyl-type phenol resins such as phenol-aralkyl resins and naphthol-aralkyl resins; Further, an epoxidized product of an acrylic resin is also an example of the epoxy resin. These epoxy resins may be used alone or in combination of two or more.
本開示の封止用樹脂組成物に含まれるエポキシ樹脂の種類は、特に制限されない。
エポキシ樹脂として具体的には、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF等のフェノール化合物及びα-ナフトール、β-ナフトール、ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも1種のフェノール性化合物と、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド等の脂肪族アルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したものであるノボラック型エポキシ樹脂(フェノールノボラック型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂等);上記フェノール性化合物と、ベンズアルデヒド、サリチルアルデヒド等の芳香族アルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるトリフェニルメタン型フェノール樹脂をエポキシ化したものであるトリフェニルメタン型エポキシ樹脂;上記フェノール化合物及びナフトール化合物と、アルデヒド化合物とを酸性触媒下で共縮合させて得られるノボラック樹脂をエポキシ化したものである共重合型エポキシ樹脂;ビスフェノールA、ビスフェノールF等のジグリシジルエーテルであるジフェニルメタン型エポキシ樹脂;アルキル置換又は非置換のビフェノールのジグリシジルエーテルであるビフェニル型エポキシ樹脂;スチルベン系フェノール化合物のジグリシジルエーテルであるスチルベン型エポキシ樹脂;ビスフェノールS等のジグリシジルエーテルである硫黄原子含有エポキシ樹脂;ブタンジオール、ポリエチレングリコール、ポリプロピレングリコール等のアルコール類のグリシジルエーテルであるエポキシ樹脂;フタル酸、イソフタル酸、テトラヒドロフタル酸等の多価カルボン酸化合物のグリシジルエステルであるグリシジルエステル型エポキシ樹脂;アニリン、ジアミノジフェニルメタン、イソシアヌル酸等の窒素原子に結合した活性水素をグリシジル基で置換したものであるグリシジルアミン型エポキシ樹脂;ジシクロペンタジエンとフェノール化合物の共縮合樹脂をエポキシ化したものであるジシクロペンタジエン型エポキシ樹脂;分子内のオレフィン結合をエポキシ化したものであるビニルシクロヘキセンジエポキシド、3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート、2-(3,4-エポキシ)シクロヘキシル-5,5-スピロ(3,4-エポキシ)シクロヘキサン-m-ジオキサン等の脂環型エポキシ樹脂;パラキシリレン変性フェノール樹脂のグリシジルエーテルであるパラキシリレン変性エポキシ樹脂;メタキシリレン変性フェノール樹脂のグリシジルエーテルであるメタキシリレン変性エポキシ樹脂;テルペン変性フェノール樹脂のグリシジルエーテルであるテルペン変性エポキシ樹脂;ジシクロペンタジエン変性フェノール樹脂のグリシジルエーテルであるジシクロペンタジエン変性エポキシ樹脂;シクロペンタジエン変性フェノール樹脂のグリシジルエーテルであるシクロペンタジエン変性エポキシ樹脂;多環芳香環変性フェノール樹脂のグリシジルエーテルである多環芳香環変性エポキシ樹脂;ナフタレン環含有フェノール樹脂のグリシジルエーテルであるナフタレン型エポキシ樹脂;ハロゲン化フェノールノボラック型エポキシ樹脂;ハイドロキノン型エポキシ樹脂;トリメチロールプロパン型エポキシ樹脂;オレフィン結合を過酢酸等の過酸で酸化して得られる線状脂肪族エポキシ樹脂;フェノールアラルキル樹脂、ナフトールアラルキル樹脂等のアラルキル型フェノール樹脂をエポキシ化したものであるアラルキル型エポキシ樹脂;などが挙げられる。さらにはアクリル樹脂のエポキシ化物等もエポキシ樹脂として挙げられる。これらのエポキシ樹脂は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Epoxy resin)
The type of epoxy resin contained in the encapsulating resin composition of the present disclosure is not particularly limited.
Specific examples of the epoxy resin include at least one selected from the group consisting of phenol compounds such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A and bisphenol F and naphthol compounds such as α-naphthol, β-naphthol and dihydroxynaphthalene. Novolak epoxy resin (phenol novolak type) obtained by epoxidizing a novolak resin obtained by condensing or co-condensing a phenolic compound of a type with an aliphatic aldehyde compound such as formaldehyde, acetaldehyde, propionaldehyde, etc. under an acidic catalyst. Epoxy resin, orthocresol novolak type epoxy resin, etc.); condensation of the above phenolic compound with an aromatic aldehyde compound such as benzaldehyde or salicylaldehyde under an acidic catalyst or Is a triphenylmethane-type epoxy resin obtained by epoxidizing a triphenylmethane-type phenol resin obtained by co-condensation; a novolak obtained by co-condensing the phenol compound and the naphthol compound with an aldehyde compound under an acidic catalyst. Copolymer type epoxy resin obtained by epoxidation of resin; diphenylmethane type epoxy resin which is diglycidyl ether such as bisphenol A and bisphenol F; biphenyl type epoxy resin which is diglycidyl ether of alkyl-substituted or unsubstituted biphenol; stilbene Stilbene type epoxy resin which is a diglycidyl ether of a phenolic compound; epoxy resin containing a sulfur atom which is a diglycidyl ether such as bisphenol S; butanediol, polyethylene glycol, polypropylene Epoxy resin which is a glycidyl ether of alcohols such as glycol; glycidyl ester type epoxy resin which is a glycidyl ester of a polycarboxylic acid compound such as phthalic acid, isophthalic acid and tetrahydrophthalic acid; nitrogen such as aniline, diaminodiphenylmethane and isocyanuric acid A glycidylamine-type epoxy resin in which active hydrogen bonded to an atom is replaced by a glycidyl group; a dicyclopentadiene-type epoxy resin in which a cocondensation resin of dicyclopentadiene and a phenol compound is epoxidized; an olefin bond in a molecule Vinylcyclohexene diepoxide obtained by epoxidation of 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 2- (3,4-epoxy) cyclohexyl-5 An alicyclic epoxy resin such as spiro (3,4-epoxy) cyclohexane-m-dioxane; a paraxylylene-modified epoxy resin which is a glycidyl ether of a para-xylylene-modified phenol resin; a meta-xylylene-modified epoxy resin which is a glycidyl ether of a meta-xylylene-modified phenol resin; Terpene-modified epoxy resin which is a glycidyl ether of a terpene-modified phenol resin; dicyclopentadiene-modified epoxy resin which is a glycidyl ether of a dicyclopentadiene-modified phenol resin; cyclopentadiene-modified epoxy resin which is a glycidyl ether of a cyclopentadiene-modified phenol resin; Polycyclic aromatic ring-modified epoxy resin which is a glycidyl ether of an aromatic ring-modified phenolic resin; glycidyl ether of a naphthalene ring-containing phenolic resin Naphthalene-type epoxy resin, which is a polyester; halogenated phenol novolak-type epoxy resin; hydroquinone-type epoxy resin; trimethylolpropane-type epoxy resin; linear aliphatic epoxy resin obtained by oxidizing olefin bond with peracid such as peracetic acid; Aralkyl-type epoxy resins obtained by epoxidizing aralkyl-type phenol resins such as phenol-aralkyl resins and naphthol-aralkyl resins; Further, an epoxidized product of an acrylic resin is also an example of the epoxy resin. These epoxy resins may be used alone or in combination of two or more.
エポキシ樹脂のエポキシ当量(分子量/エポキシ基数)は、特に制限されない。成形性、耐リフロー性及び電気的信頼等の各種特性バランスの観点からは、100g/eq~1000g/eqであることが好ましく、150g/eq~500g/eqであることがより好ましい。
(4) The epoxy equivalent (molecular weight / number of epoxy groups) of the epoxy resin is not particularly limited. From the viewpoint of the balance of various properties such as moldability, reflow resistance and electrical reliability, it is preferably from 100 g / eq to 1000 g / eq, more preferably from 150 g / eq to 500 g / eq.
エポキシ樹脂のエポキシ当量は、JIS K 7236:2009に準じた方法で測定される値とする。
(4) The epoxy equivalent of the epoxy resin is a value measured by a method according to JIS K7236: 2009.
エポキシ樹脂が固体である場合、その軟化点又は融点は特に制限されない。成形性と耐リフロー性の観点からは40℃~180℃であることが好ましく、封止用樹脂組成物の調製の際の取扱い性の観点からは50℃~130℃であることがより好ましい。
場合 When the epoxy resin is a solid, its softening point or melting point is not particularly limited. The temperature is preferably from 40 ° C. to 180 ° C. from the viewpoints of moldability and reflow resistance, and more preferably from 50 ° C. to 130 ° C. from the viewpoint of handleability in preparing the sealing resin composition.
エポキシ樹脂の融点又は軟化点は、示差走査熱量測定(DSC)又はJIS K 7234:1986に準じた方法(環球法)で測定される値とする。
(4) The melting point or softening point of the epoxy resin is a value measured by a differential scanning calorimetry (DSC) or a method (ring and ball method) according to JIS K 7234: 1986.
封止用樹脂組成物中のエポキシ樹脂の含有率は、強度、流動性、耐熱性、成形性等の観点から0.5質量%~50質量%であることが好ましく、2質量%~30質量%であることがより好ましい。
The content of the epoxy resin in the encapsulating resin composition is preferably 0.5% by mass to 50% by mass, and more preferably 2% by mass to 30% by mass in view of strength, fluidity, heat resistance, moldability and the like. % Is more preferable.
(硬化剤)
本開示の封止用樹脂組成物は、硬化剤として少なくとも活性エステル化合物を含む。本開示の封止用樹脂組成物は、活性エステル化合物以外の硬化剤を含んでもよい。 (Curing agent)
The sealing resin composition of the present disclosure contains at least an active ester compound as a curing agent. The sealing resin composition of the present disclosure may include a curing agent other than the active ester compound.
本開示の封止用樹脂組成物は、硬化剤として少なくとも活性エステル化合物を含む。本開示の封止用樹脂組成物は、活性エステル化合物以外の硬化剤を含んでもよい。 (Curing agent)
The sealing resin composition of the present disclosure contains at least an active ester compound as a curing agent. The sealing resin composition of the present disclosure may include a curing agent other than the active ester compound.
本開示における活性エステル化合物とは、エポキシ基と反応するエステル基を1分子中に1個以上有し、エポキシ樹脂の硬化作用を有する化合物をいう。
活性 The active ester compound in the present disclosure refers to a compound having one or more ester groups in one molecule that reacts with an epoxy group, and has a curing action of an epoxy resin.
本開示の封止用樹脂組成物は、先述のとおり、硬化剤として活性エステル化合物を用いることによって、硬化物の誘電正接を低く抑えることができる。
また、硬化物中の極性基は硬化物の吸水性を高めるところ、硬化剤として活性エステル化合物を用いることによって硬化物の極性基濃度を抑えることができ、硬化物の吸水性を抑制することができる。そして、硬化物の吸水性を抑制すること、つまりは極性分子であるH2Oの含有量を抑制することにより、硬化物の誘電正接をさらに低く抑えることができる。硬化物の吸水率は、0%~0.35%が好ましく、0%~0.30%がより好ましく、0%~0.25%がさらに好ましい。ここで硬化物の吸水率は、プレッシャークッカー試験(121℃、2.1気圧、24時間)によって求める質量増加率である。 As described above, the sealing resin composition of the present disclosure can reduce the dielectric loss tangent of a cured product by using an active ester compound as a curing agent.
In addition, the polar group in the cured product enhances the water absorption of the cured product.However, by using an active ester compound as a curing agent, the concentration of the polar group in the cured product can be suppressed, and the water absorption of the cured product can be suppressed. it can. By suppressing the water absorption of the cured product, that is, by suppressing the content of H 2 O, which is a polar molecule, the dielectric loss tangent of the cured product can be further reduced. The water absorption of the cured product is preferably 0% to 0.35%, more preferably 0% to 0.30%, and still more preferably 0% to 0.25%. Here, the water absorption of the cured product is a mass increase rate determined by a pressure cooker test (121 ° C., 2.1 atm, 24 hours).
また、硬化物中の極性基は硬化物の吸水性を高めるところ、硬化剤として活性エステル化合物を用いることによって硬化物の極性基濃度を抑えることができ、硬化物の吸水性を抑制することができる。そして、硬化物の吸水性を抑制すること、つまりは極性分子であるH2Oの含有量を抑制することにより、硬化物の誘電正接をさらに低く抑えることができる。硬化物の吸水率は、0%~0.35%が好ましく、0%~0.30%がより好ましく、0%~0.25%がさらに好ましい。ここで硬化物の吸水率は、プレッシャークッカー試験(121℃、2.1気圧、24時間)によって求める質量増加率である。 As described above, the sealing resin composition of the present disclosure can reduce the dielectric loss tangent of a cured product by using an active ester compound as a curing agent.
In addition, the polar group in the cured product enhances the water absorption of the cured product.However, by using an active ester compound as a curing agent, the concentration of the polar group in the cured product can be suppressed, and the water absorption of the cured product can be suppressed. it can. By suppressing the water absorption of the cured product, that is, by suppressing the content of H 2 O, which is a polar molecule, the dielectric loss tangent of the cured product can be further reduced. The water absorption of the cured product is preferably 0% to 0.35%, more preferably 0% to 0.30%, and still more preferably 0% to 0.25%. Here, the water absorption of the cured product is a mass increase rate determined by a pressure cooker test (121 ° C., 2.1 atm, 24 hours).
活性エステル化合物は、エポキシ基と反応するエステル基を分子中に1個以上有する化合物であればその種類は特に制限されない。
(4) The type of the active ester compound is not particularly limited as long as it has at least one ester group in the molecule that reacts with the epoxy group.
活性エステル化合物としては、フェノールエステル化合物、チオフェノールエステル化合物、N-ヒドロキシアミンエステル化合物、複素環ヒドロキシ化合物のエステル化物等が挙げられる。
Examples of the active ester compound include a phenol ester compound, a thiophenol ester compound, an N-hydroxyamine ester compound, an esterified product of a heterocyclic hydroxy compound, and the like.
活性エステル化合物としては、例えば、脂肪族カルボン酸及び芳香族カルボン酸の少なくとも1種と脂肪族ヒドロキシ化合物及び芳香族ヒドロキシ化合物の少なくとも1種とから得られるエステル化合物が挙げられる。脂肪族化合物を重縮合の成分とするエステル化合物は、脂肪族鎖を有することによりエポキシ樹脂との相溶性に優れる傾向にある。芳香族化合物を重縮合の成分とするエステル化合物は、芳香環を有することにより耐熱性に優れる傾向にある。
Examples of the active ester compound include an ester compound obtained from at least one kind of aliphatic carboxylic acid and aromatic carboxylic acid and at least one kind of aliphatic hydroxy compound and aromatic hydroxy compound. An ester compound containing an aliphatic compound as a component of polycondensation tends to have excellent compatibility with an epoxy resin due to having an aliphatic chain. An ester compound containing an aromatic compound as a component of polycondensation tends to have excellent heat resistance due to having an aromatic ring.
活性エステル化合物の具体例としては、芳香族カルボン酸とフェノール性水酸基との縮合反応にて得られる芳香族エステルが挙げられる。中でも、ベンゼン、ナフタレン、ビフェニル、ジフェニルプロパン、ジフェニルメタン、ジフェニルエーテル、ジフェニルスルホン酸等の芳香環の水素原子の2~4個をカルボキシ基で置換した芳香族カルボン酸成分と、前記した芳香環の水素原子の1個を水酸基で置換した1価フェノールと、前記した芳香環の水素原子の2~4個を水酸基で置換した多価フェノールとの混合物を原材料として、芳香族カルボン酸とフェノール性水酸基との縮合反応にて得られる芳香族エステルが好ましい。すなわち、上記芳香族カルボン酸成分由来の構造単位と上記1価フェノール由来の構造単位と上記多価フェノール由来の構造単位とを有する芳香族エステルが好ましい。
Specific examples of the active ester compound include an aromatic ester obtained by a condensation reaction between an aromatic carboxylic acid and a phenolic hydroxyl group. Among them, an aromatic carboxylic acid component in which 2 to 4 hydrogen atoms of an aromatic ring such as benzene, naphthalene, biphenyl, diphenylpropane, diphenylmethane, diphenyl ether, and diphenylsulfonic acid are substituted with a carboxy group; A mixture of an aromatic carboxylic acid and a phenolic hydroxyl group is obtained by using a mixture of a monohydric phenol in which one of the above is substituted with a hydroxyl group and a polyhydric phenol in which 2 to 4 of the hydrogen atoms of the aromatic ring are substituted with a hydroxyl group as a raw material. Aromatic esters obtained by a condensation reaction are preferred. That is, an aromatic ester having a structural unit derived from the aromatic carboxylic acid component, a structural unit derived from the monohydric phenol, and a structural unit derived from the polyhydric phenol is preferable.
活性エステル化合物の具体例としては、特開2012-246367号公報に記載されている、脂肪族環状炭化水素基を介してフェノール化合物が結節された分子構造を有するフェノール樹脂と、芳香族ジカルボン酸又はそのハライドと、芳香族モノヒドロキシ化合物とを反応させて得られる構造を有する活性エステル樹脂が挙げられる。当該活性エステル樹脂としては、下記の構造式(1)で表される化合物が好ましい。
Specific examples of the active ester compound include a phenol resin having a molecular structure in which a phenol compound is knotted via an aliphatic cyclic hydrocarbon group, described in JP-A-2012-246467, and an aromatic dicarboxylic acid or An active ester resin having a structure obtained by reacting the halide with an aromatic monohydroxy compound is exemplified. As the active ester resin, a compound represented by the following structural formula (1) is preferable.
構造式(1)中、R1は炭素数1~4のアルキル基であり、Xはベンゼン環、ナフタレン環、炭素数1~4のアルキル基で置換されたベンゼン環若しくはナフタレン環、又はビフェニル基であり、Yはベンゼン環、ナフタレン環、又は炭素数1~4のアルキル基で置換されたベンゼン環若しくはナフタレン環であり、kは0又は1であり、nは繰り返し数の平均を表し0.25~1.5である。
In the structural formula (1), R 1 is an alkyl group having 1 to 4 carbon atoms, and X is a benzene ring, a naphthalene ring, a benzene ring or a naphthalene ring substituted with an alkyl group having 1 to 4 carbon atoms, or a biphenyl group. Y is a benzene ring, a naphthalene ring, or a benzene ring or a naphthalene ring substituted with an alkyl group having 1 to 4 carbon atoms, k is 0 or 1, and n is an average of the number of repetitions. 25 to 1.5.
構造式(1)で表される化合物の具体例としては、例えば、下記の例示化合物(1-1)~(1-10)が挙げられる。構造式中のt-Buは、tert-ブチル基である。
具体 Specific examples of the compound represented by the structural formula (1) include, for example, the following exemplified compounds (1-1) to (1-10). T-Bu in the structural formula is a tert-butyl group.
活性エステル化合物の別の具体例としては、特開2014-114352号公報に記載されている、下記の構造式(2)で表される化合物及び下記の構造式(3)で表される化合物が挙げられる。
Other specific examples of the active ester compound include a compound represented by the following structural formula (2) and a compound represented by the following structural formula (3) described in JP-A-2014-114352. No.
構造式(2)中、R1及びR2はそれぞれ独立に、水素原子、炭素数1~4のアルキル基、又は炭素数1~4のアルコキシ基であり、Zはベンゾイル基、ナフトイル基、炭素数1~4のアルキル基で置換されたベンゾイル基又はナフトイル基、及び炭素数2~6のアシル基からなる群から選ばれるエステル形成構造部位(z1)、又は水素原子(z2)であり、Zのうち少なくとも1個はエステル形成構造部位(z1)である。
In the structural formula (2), R 1 and R 2 are each independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and Z is a benzoyl group, a naphthoyl group, An ester-forming structural site (z1) selected from the group consisting of a benzoyl group or a naphthoyl group substituted with an alkyl group of Formulas 1 to 4, and an acyl group having 2 to 6 carbon atoms, or a hydrogen atom (z2); At least one is an ester forming structural site (z1).
構造式(3)中、R1及びR2はそれぞれ独立に、水素原子、炭素数1~4のアルキル基、又は炭素数1~4のアルコキシ基であり、Zはベンゾイル基、ナフトイル基、炭素数1~4のアルキル基で置換されたベンゾイル基又はナフトイル基、及び炭素数2~6のアシル基からなる群から選ばれるエステル形成構造部位(z1)、又は水素原子(z2)であり、Zのうち少なくとも1個はエステル形成構造部位(z1)である。
In the structural formula (3), R 1 and R 2 are each independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and Z is a benzoyl group, a naphthoyl group, An ester-forming structural site (z1) selected from the group consisting of a benzoyl group or a naphthoyl group substituted with an alkyl group of Formulas 1 to 4, and an acyl group having 2 to 6 carbon atoms, or a hydrogen atom (z2); At least one is an ester forming structural site (z1).
構造式(2)で表される化合物の具体例としては、例えば、下記の例示化合物(2-1)~(2-6)が挙げられる。
具体 Specific examples of the compound represented by the structural formula (2) include, for example, the following exemplified compounds (2-1) to (2-6).
構造式(3)で表される化合物の具体例としては、例えば、下記の例示化合物(3-1)~(3-6)が挙げられる。
具体 Specific examples of the compound represented by the structural formula (3) include, for example, the following exemplified compounds (3-1) to (3-6).
活性エステル化合物としては、市販品を用いてもよい。活性エステル化合物の市販品としては、ジシクロペンタジエン型ジフェノール構造を含む活性エステル化合物として「EXB9451」、「EXB9460」、「EXB9460S」、「HPC-8000-65T」(DIC株式会社製);芳香族構造を含む活性エステル化合物として「EXB9416-70BK」、「EXB-8」、「EXB-9425」(DIC株式会社製);フェノールノボラックのアセチル化物を含む活性エステル化合物として「DC808」(三菱ケミカル株式会社製);フェノールノボラックのベンゾイル化物を含む活性エステル化合物として「YLH1026」(三菱ケミカル株式会社製)等が挙げられる。
市 販 A commercial product may be used as the active ester compound. Commercially available active ester compounds include "EXB9451", "EXB9460", "EXB9460S", "HPC-8000-65T" (manufactured by DIC Corporation) as active ester compounds having a dicyclopentadiene-type diphenol structure; "EXB9416-70BK", "EXB-8", "EXB-9425" (manufactured by DIC Corporation) as an active ester compound having a structure; "DC808" (Mitsubishi Chemical Corporation) as an active ester compound containing an acetylated product of phenol novolak "YLH1026" (manufactured by Mitsubishi Chemical Corporation) as an active ester compound containing benzoylated phenol novolak.
活性エステル化合物は、1種を単独で用いても2種以上を組み合わせて用いてもよい。
The active ester compound may be used alone or in combination of two or more.
活性エステル化合物のエステル当量は、特に制限されない。成形性、耐リフロー性、電気的信頼性等の各種特性バランスの観点からは、150g/eq~400g/eqが好ましく、170g/eq~300g/eqがより好ましく、200g/eq~250g/eqがさらに好ましい。
エ ス テ ル The ester equivalent of the active ester compound is not particularly limited. From the viewpoint of the balance of various characteristics such as moldability, reflow resistance, and electrical reliability, 150 g / eq to 400 g / eq is preferable, 170 g / eq to 300 g / eq is more preferable, and 200 g / eq to 250 g / eq is preferable. More preferred.
活性エステル化合物のエステル当量は、JIS K 0070:1992に準じた方法により測定される値とする。
エ ス テ ル The ester equivalent of the active ester compound is a value measured by a method according to JIS K 0070: 1992.
エポキシ樹脂と活性エステル化合物との当量比(エステル基/エポキシ基)は、硬化物の誘電正接を低く抑える観点からは、0.9以上が好ましく、0.95以上がより好ましく、0.97以上がさらに好ましい。
エポキシ樹脂と活性エステル化合物との当量比(エステル基/エポキシ基)は、活性エステル化合物の未反応分を少なく抑える観点からは、1.1以下が好ましく、1.05以下がより好ましく、1.03以下がさらに好ましい。 The equivalent ratio of the epoxy resin to the active ester compound (ester group / epoxy group) is preferably 0.9 or more, more preferably 0.95 or more, and 0.97 or more, from the viewpoint of keeping the dielectric loss tangent of the cured product low. Is more preferred.
The equivalent ratio (ester group / epoxy group) between the epoxy resin and the active ester compound is preferably 1.1 or less, more preferably 1.05 or less, from the viewpoint of suppressing the unreacted component of the active ester compound. 03 or less is more preferable.
エポキシ樹脂と活性エステル化合物との当量比(エステル基/エポキシ基)は、活性エステル化合物の未反応分を少なく抑える観点からは、1.1以下が好ましく、1.05以下がより好ましく、1.03以下がさらに好ましい。 The equivalent ratio of the epoxy resin to the active ester compound (ester group / epoxy group) is preferably 0.9 or more, more preferably 0.95 or more, and 0.97 or more, from the viewpoint of keeping the dielectric loss tangent of the cured product low. Is more preferred.
The equivalent ratio (ester group / epoxy group) between the epoxy resin and the active ester compound is preferably 1.1 or less, more preferably 1.05 or less, from the viewpoint of suppressing the unreacted component of the active ester compound. 03 or less is more preferable.
硬化剤は、活性エステル化合物以外のその他の硬化剤を含んでもよい。この場合、その他の硬化剤の種類は特に制限されず、封止用樹脂組成物の所望の特性等に応じて選択できる。その他の硬化剤としては、フェノール硬化剤、アミン硬化剤、酸無水物硬化剤、ポリメルカプタン硬化剤、ポリアミノアミド硬化剤、イソシアネート硬化剤、ブロックイソシアネート硬化剤等が挙げられる。
The curing agent may contain other curing agents other than the active ester compound. In this case, the type of the other curing agent is not particularly limited, and can be selected according to the desired characteristics of the sealing resin composition. Other curing agents include phenol curing agents, amine curing agents, acid anhydride curing agents, polymercaptan curing agents, polyaminoamide curing agents, isocyanate curing agents, and blocked isocyanate curing agents.
フェノール硬化剤として具体的には、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF、置換又は非置換のビフェノール等の多価フェノール化合物;フェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF、フェニルフェノール、アミノフェノール等のフェノール化合物及びα-ナフトール、β-ナフトール、ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも一種のフェノール性化合物と、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド等のアルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック型フェノール樹脂;上記フェノール性化合物と、ジメトキシパラキシレン、ビス(メトキシメチル)ビフェニル等とから合成されるフェノールアラルキル樹脂、ナフトールアラルキル樹脂等のアラルキル型フェノール樹脂;パラキシリレン変性フェノール樹脂、メタキシリレン変性フェノール樹脂;メラミン変性フェノール樹脂;テルペン変性フェノール樹脂;上記フェノール性化合物と、ジシクロペンタジエンとから共重合により合成されるジシクロペンタジエン型フェノール樹脂及びジシクロペンタジエン型ナフトール樹脂;シクロペンタジエン変性フェノール樹脂;多環芳香環変性フェノール樹脂;ビフェニル型フェノール樹脂;上記フェノール性化合物と、ベンズアルデヒド、サリチルアルデヒド等の芳香族アルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるトリフェニルメタン型フェノール樹脂;これら2種以上を共重合して得たフェノール樹脂などが挙げられる。これらのフェノール硬化剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。
Specific examples of the phenol curing agent include polyphenol compounds such as resorcin, catechol, bisphenol A, bisphenol F, and substituted or unsubstituted biphenol; phenol, cresol, xylenol, resorcin, catechol, bisphenol A, bisphenol F, and phenylphenol. Phenolic compounds such as aminophenols, aminophenols and the like and at least one phenolic compound selected from the group consisting of naphthol compounds such as α-naphthol, β-naphthol and dihydroxynaphthalene, and aldehyde compounds such as formaldehyde, acetaldehyde and propionaldehyde Novolak-type phenolic resin obtained by condensation or co-condensation under the following conditions: the above-mentioned phenolic compound, dimethoxyparaxylene, bis (methoxymethyl) biffe Phenol aralkyl resins such as phenol aralkyl resins, naphthol aralkyl resins, etc .; para-xylylene-modified phenol resins, meta-xylylene-modified phenol resins; melamine-modified phenol resins; terpene-modified phenol resins; A dicyclopentadiene-type phenol resin and a dicyclopentadiene-type naphthol resin synthesized by copolymerization with: a cyclopentadiene-modified phenolic resin; a polycyclic aromatic ring-modified phenolic resin; a biphenyl-type phenolic resin; the phenolic compound, benzaldehyde, and salicyl Triphenylmethane-type phenolic resin obtained by condensing or co-condensing an aromatic aldehyde compound such as an aldehyde in the presence of an acidic catalyst; Phenol resins obtained by. These phenol curing agents may be used alone or in combination of two or more.
その他の硬化剤の官能基当量(フェノール硬化剤の場合は水酸基当量)は、特に制限されない。成形性、耐リフロー性、電気的信頼性等の各種特性バランスの観点からは、70g/eq~1000g/eqであることが好ましく、80g/eq~500g/eqであることがより好ましい。
官能 The functional group equivalent of other curing agents (hydroxyl equivalent in the case of a phenol curing agent) is not particularly limited. From the viewpoint of the balance of various properties such as moldability, reflow resistance, and electrical reliability, it is preferably from 70 g / eq to 1000 g / eq, more preferably from 80 g / eq to 500 g / eq.
その他の硬化剤の官能基当量(フェノール硬化剤の場合は水酸基当量)は、JIS K 0070:1992に準じた方法により測定される値とする。
(4) The functional group equivalent of other curing agents (hydroxyl equivalent in the case of a phenol curing agent) is a value measured by a method according to JIS K 0070: 1992.
硬化剤が固体である場合、その軟化点又は融点は、特に制限されない。成形性と耐リフロー性の観点からは、40℃~180℃であることが好ましく、封止用樹脂組成物の製造時における取扱い性の観点からは、50℃~130℃であることがより好ましい。
場合 When the curing agent is a solid, its softening point or melting point is not particularly limited. From the viewpoint of moldability and reflow resistance, the temperature is preferably from 40 ° C. to 180 ° C., and from the viewpoint of handleability during the production of the sealing resin composition, it is more preferably from 50 ° C. to 130 ° C. .
硬化剤の融点又は軟化点は、エポキシ樹脂の融点又は軟化点と同様にして測定される値とする。
融 点 The melting point or softening point of the curing agent is a value measured in the same manner as the melting point or softening point of the epoxy resin.
エポキシ樹脂とすべての硬化剤(活性エステル化合物及びその他の硬化剤)との当量比、すなわちエポキシ樹脂中の官能基数に対する硬化剤中の官能基数の比(硬化剤中の官能基数/エポキシ樹脂中の官能基数)は、特に制限されない。それぞれの未反応分を少なく抑える観点からは、0.5~2.0の範囲に設定されることが好ましく、0.6~1.3の範囲に設定されることがより好ましい。成形性と耐リフロー性の観点からは、0.8~1.2の範囲に設定されることがさらに好ましい。
The equivalent ratio of the epoxy resin to all the curing agents (active ester compound and other curing agents), that is, the ratio of the number of functional groups in the curing agent to the number of functional groups in the epoxy resin (the number of functional groups in the curing agent / the number of functional groups in the epoxy resin) The number of functional groups) is not particularly limited. From the viewpoint of minimizing the amount of each unreacted component, it is preferably set in the range of 0.5 to 2.0, and more preferably in the range of 0.6 to 1.3. From the viewpoint of moldability and reflow resistance, it is more preferable to set the ratio in the range of 0.8 to 1.2.
活性エステル化合物及びその他の硬化剤の全質量に対する活性エステル化合物の含有率は、硬化物の誘電正接を低く抑える観点から、80質量%以上であることが好ましく、85質量%以上であることがより好ましく、90質量%以上であることがさらに好ましい。
The content of the active ester compound with respect to the total mass of the active ester compound and other curing agents is preferably 80% by mass or more, more preferably 85% by mass or more, from the viewpoint of keeping the dielectric loss tangent of the cured product low. More preferably, it is 90% by mass or more.
エポキシ樹脂、活性エステル化合物及びその他の硬化剤の全質量に対するエポキシ樹脂及び活性エステル化合物の合計含有率は、硬化物の誘電正接を低く抑える観点から、80質量%以上であることが好ましく、85質量%以上であることがより好ましく、90質量%以上であることがさらに好ましい。
The total content of the epoxy resin and the active ester compound with respect to the total mass of the epoxy resin, the active ester compound and the other curing agent is preferably 80% by mass or more, and more preferably 85% by mass, from the viewpoint of suppressing the dielectric loss tangent of the cured product to be low. %, More preferably 90% by mass or more.
(硬化促進剤)
封止用樹脂組成物は、硬化促進剤を含んでもよい。硬化促進剤の種類は特に制限されず、エポキシ樹脂又は硬化剤の種類、封止用樹脂組成物の所望の特性等に応じて選択できる。 (Curing accelerator)
The sealing resin composition may include a curing accelerator. The type of the curing accelerator is not particularly limited, and can be selected according to the type of the epoxy resin or the curing agent, the desired characteristics of the sealing resin composition, and the like.
封止用樹脂組成物は、硬化促進剤を含んでもよい。硬化促進剤の種類は特に制限されず、エポキシ樹脂又は硬化剤の種類、封止用樹脂組成物の所望の特性等に応じて選択できる。 (Curing accelerator)
The sealing resin composition may include a curing accelerator. The type of the curing accelerator is not particularly limited, and can be selected according to the type of the epoxy resin or the curing agent, the desired characteristics of the sealing resin composition, and the like.
硬化促進剤としては、1,5-ジアザビシクロ[4.3.0]ノネン-5(DBN)、1,8-ジアザビシクロ[5.4.0]ウンデセン-7(DBU)等のジアザビシクロアルケン、2-メチルイミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾール、2-ヘプタデシルイミダゾール等の環状アミジン化合物;前記環状アミジン化合物の誘導体;前記環状アミジン化合物又はその誘導体のフェノールノボラック塩;これらの化合物に無水マレイン酸、1,4-ベンゾキノン、2,5-トルキノン、1,4-ナフトキノン、2,3-ジメチルベンゾキノン、2,6-ジメチルベンゾキノン、2,3-ジメトキシ-5-メチル-1,4-ベンゾキノン、2,3-ジメトキシ-1,4-ベンゾキノン、フェニル-1,4-ベンゾキノン等のキノン化合物、ジアゾフェニルメタンなどの、π結合をもつ化合物を付加してなる分子内分極を有する化合物;DBUのテトラフェニルボレート塩、DBNのテトラフェニルボレート塩、2-エチル-4-メチルイミダゾールのテトラフェニルボレート塩、N-メチルモルホリンのテトラフェニルボレート塩等の環状アミジニウム化合物;ピリジン、トリエチルアミン、トリエチレンジアミン、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノール等の三級アミン化合物;前記三級アミン化合物の誘導体;酢酸テトラ-n-ブチルアンモニウム、リン酸テトラ-n-ブチルアンモニウム、酢酸テトラエチルアンモニウム、安息香酸テトラ-n-ヘキシルアンモニウム、水酸化テトラプロピルアンモニウム等のアンモニウム塩化合物;トリフェニルホスフィン、ジフェニル(p-トリル)ホスフィン、トリス(アルキルフェニル)ホスフィン、トリス(アルコキシフェニル)ホスフィン、トリス(アルキル・アルコキシフェニル)ホスフィン、トリス(ジアルキルフェニル)ホスフィン、トリス(トリアルキルフェニル)ホスフィン、トリス(テトラアルキルフェニル)ホスフィン、トリス(ジアルコキシフェニル)ホスフィン、トリス(トリアルコキシフェニル)ホスフィン、トリス(テトラアルコキシフェニル)ホスフィン、トリアルキルホスフィン、ジアルキルアリールホスフィン、アルキルジアリールホスフィン等の三級ホスフィン;前記三級ホスフィンと有機ボロン類との錯体等のホスフィン化合物;前記三級ホスフィン又は前記ホスフィン化合物と無水マレイン酸、1,4-ベンゾキノン、2,5-トルキノン、1,4-ナフトキノン、2,3-ジメチルベンゾキノン、2,6-ジメチルベンゾキノン、2,3-ジメトキシ-5-メチル-1,4-ベンゾキノン、2,3-ジメトキシ-1,4-ベンゾキノン、フェニル-1,4-ベンゾキノン等のキノン化合物、ジアゾフェニルメタンなどの、π結合をもつ化合物を付加してなる分子内分極を有する化合物;前記三級ホスフィン又は前記ホスフィン化合物と4-ブロモフェノール、3-ブロモフェノール、2-ブロモフェノール、4-クロロフェノール、3-クロロフェノール、2-クロロフェノール、4-ヨウ化フェノール、3-ヨウ化フェノール、2-ヨウ化フェノール、4-ブロモ-2-メチルフェノール、4-ブロモ-3-メチルフェノール、4-ブロモ-2,6-ジメチルフェノール、4-ブロモ-3,5-ジメチルフェノール、4-ブロモ-2,6-ジ-tert-ブチルフェノール、4-クロロ-1-ナフトール、1-ブロモ-2-ナフトール、6-ブロモ-2-ナフトール、4-ブロモ-4’-ヒドロキシビフェニル等のハロゲン化フェノール化合物を反応させた後に、脱ハロゲン化水素の工程を経て得られる、分子内分極を有する化合物;テトラフェニルホスホニウム等のテトラ置換ホスホニウム、テトラ-p-トリルボレート等のホウ素原子に結合したフェニル基がないテトラ置換ホスホニウム及びテトラ置換ボレート;テトラフェニルホスホニウムとフェノール化合物、テトラアルキルホスホニウムと芳香族カルボン酸無水物の部分加水分解物との塩などが挙げられる。
Examples of the curing accelerator include diazabicycloalkenes such as 1,5-diazabicyclo [4.3.0] nonene-5 (DBN) and 1,8-diazabicyclo [5.4.0] undecene-7 (DBU); Cyclic amidine compounds such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-heptadecylimidazole; derivatives of the cyclic amidine compounds; phenol novolak salts of the cyclic amidine compounds or derivatives thereof; To maleic anhydride, 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3-dimethoxy-5-methyl-1 , 4-benzoquinone, 2,3-dimethoxy-1,4-benzoquinone, phenyl-1 Quinone compounds such as 4-benzoquinone, and compounds having an intramolecular polarization obtained by adding a compound having a π bond such as diazophenylmethane; tetraphenylborate salt of DBU, tetraphenylborate salt of DBN, 2-ethyl-4 Cyclic amidinium compounds such as tetraphenylborate salt of methyl-imidazole and tetraphenylborate salt of N-methylmorpholine; pyridine, triethylamine, triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol Tertiary amine compounds such as tertiary amine compounds; tetra-n-butylammonium acetate, tetra-n-butylammonium phosphate, tetraethylammonium acetate, tetra-n-hexyl benzoate Ammonium salt compounds such as silammonium and tetrapropylammonium hydroxide; triphenylphosphine, diphenyl (p-tolyl) phosphine, tris (alkylphenyl) phosphine, tris (alkoxyphenyl) phosphine, tris (alkylalkoxyphenyl) phosphine, tris (Dialkylphenyl) phosphine, tris (trialkylphenyl) phosphine, tris (tetraalkylphenyl) phosphine, tris (dialkoxyphenyl) phosphine, tris (trialkoxyphenyl) phosphine, tris (tetraalkoxyphenyl) phosphine, trialkylphosphine, Tertiary phosphines such as dialkylarylphosphines and alkyldiarylphosphines; complexes of the above tertiary phosphines with organic borons, etc. A phosphine compound; the tertiary phosphine or the phosphine compound and maleic anhydride, 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, Quinone compounds such as 3-dimethoxy-5-methyl-1,4-benzoquinone, 2,3-dimethoxy-1,4-benzoquinone and phenyl-1,4-benzoquinone; and compounds having a π bond such as diazophenylmethane. A compound having an intramolecular polarization obtained by addition; the tertiary phosphine or the phosphine compound and 4-bromophenol, 3-bromophenol, 2-bromophenol, 4-chlorophenol, 3-chlorophenol, 2-chlorophenol; 4-iodinated phenol, 3-iodinated phenol, 2-iodinated phenol Phenol, 4-bromo-2-methylphenol, 4-bromo-3-methylphenol, 4-bromo-2,6-dimethylphenol, 4-bromo-3,5-dimethylphenol, 4-bromo-2,6- After reacting a halogenated phenol compound such as di-tert-butylphenol, 4-chloro-1-naphthol, 1-bromo-2-naphthol, 6-bromo-2-naphthol, 4-bromo-4′-hydroxybiphenyl A compound having an intramolecular polarization obtained through the step of dehydrohalogenation; tetra-substituted phosphonium such as tetraphenylphosphonium, tetra-substituted phosphonium and tetra-substituted without a phenyl group bonded to a boron atom such as tetra-p-tolyl borate Substituted borate; tetraphenylphosphonium and phenolic compound, tetraalkyl And salts with partial hydrolyzate of phosphonium and aromatic carboxylic acid anhydrides.
封止用樹脂組成物が硬化促進剤を含む場合、その量は、樹脂成分100質量部(エポキシ樹脂と硬化剤の合計量)に対して0.1質量部~30質量部であることが好ましく、1質量部~15重量部であることがより好ましい。硬化促進剤の量が樹脂成分100質量部に対して0.1質量部以上であると、短時間で良好に硬化する傾向にある。硬化促進剤の量が樹脂成分100質量部に対して30質量部以下であると、硬化速度が速すぎず良好な成形品が得られる傾向にある。
When the sealing resin composition contains a curing accelerator, the amount is preferably from 0.1 to 30 parts by mass based on 100 parts by mass of the resin component (the total amount of the epoxy resin and the curing agent). And more preferably 1 to 15 parts by weight. When the amount of the curing accelerator is 0.1 parts by mass or more based on 100 parts by mass of the resin component, the curing tends to be performed well in a short time. If the amount of the curing accelerator is 30 parts by mass or less based on 100 parts by mass of the resin component, the curing rate tends to be too high and a good molded product tends to be obtained.
(無機充填材)
本開示の封止用樹脂組成物は、無機充填材としてアルミナを含む。アルミナを含むことで、硬化物の熱伝導率の向上が期待できる。一方、硬化物の線膨張係数、誘電特性等の他の特性とのバランスの観点からは、アルミナと、アルミナ以外の無機充填材を併用することが好ましい。 (Inorganic filler)
The sealing resin composition of the present disclosure contains alumina as an inorganic filler. By including alumina, an improvement in the thermal conductivity of the cured product can be expected. On the other hand, from the viewpoint of balance with other properties such as a coefficient of linear expansion and dielectric properties of the cured product, it is preferable to use alumina and an inorganic filler other than alumina in combination.
本開示の封止用樹脂組成物は、無機充填材としてアルミナを含む。アルミナを含むことで、硬化物の熱伝導率の向上が期待できる。一方、硬化物の線膨張係数、誘電特性等の他の特性とのバランスの観点からは、アルミナと、アルミナ以外の無機充填材を併用することが好ましい。 (Inorganic filler)
The sealing resin composition of the present disclosure contains alumina as an inorganic filler. By including alumina, an improvement in the thermal conductivity of the cured product can be expected. On the other hand, from the viewpoint of balance with other properties such as a coefficient of linear expansion and dielectric properties of the cured product, it is preferable to use alumina and an inorganic filler other than alumina in combination.
アルミナ以外の無機充填材として具体的には、溶融シリカ、結晶シリカ、ガラス、タルク、クレー、マイカ等の無機材料が挙げられる。難燃効果を有する無機充填材を用いてもよい。難燃効果を有する無機充填材としては、水酸化アルミニウム、水酸化マグネシウム、マグネシウムと亜鉛の複合水酸化物等の複合金属水酸化物、硼酸亜鉛などが挙げられる。
無機 Specific examples of the inorganic filler other than alumina include inorganic materials such as fused silica, crystalline silica, glass, talc, clay, and mica. An inorganic filler having a flame-retardant effect may be used. Examples of the inorganic filler having a flame-retardant effect include aluminum hydroxide, magnesium hydroxide, a composite metal hydroxide such as a composite hydroxide of magnesium and zinc, and zinc borate.
無機充填材の中でも、線膨張係数低減の観点からは溶融シリカ等のシリカが好ましい。無機充填材は1種を単独で用いても2種以上を組み合わせて用いてもよい。無機充填材の形態としては粉末、粉末を球形化したビーズ、繊維等が挙げられる。
シ リ カ Among the inorganic fillers, silica such as fused silica is preferable from the viewpoint of reducing the coefficient of linear expansion. One inorganic filler may be used alone, or two or more inorganic fillers may be used in combination. Examples of the form of the inorganic filler include powder, beads obtained by making the powder spherical, fibers, and the like.
無機充填材が粒子状である場合、その平均粒径は、特に制限されない。例えば、平均粒径が0.2μm~100μmであることが好ましく、0.5μm~50μmであることがより好ましい。平均粒径が0.2μm以上であると、封止用樹脂組成物の粘度の上昇がより抑制される傾向がある。平均粒径が100μm以下であると、充填性がより向上する傾向にある。無機充填材の平均粒径は、レーザー散乱回折法粒度分布測定装置により、体積平均粒径(D50)として求める。
場合 When the inorganic filler is in the form of particles, the average particle size is not particularly limited. For example, the average particle size is preferably from 0.2 μm to 100 μm, more preferably from 0.5 μm to 50 μm. When the average particle size is 0.2 μm or more, an increase in the viscosity of the sealing resin composition tends to be further suppressed. When the average particle size is 100 μm or less, the filling properties tend to be further improved. The average particle size of the inorganic filler is determined as a volume average particle size (D50) by a laser scattering diffraction particle size distribution analyzer.
封止用樹脂組成物に含まれる無機充填材のうちアルミナが占める割合は特に制限されない。硬化物の熱伝導率向上の観点からは、例えば、50質量%以上であることが好ましく、60質量%以上であることがより好ましく、70質量%以上であることがさらに好ましい。硬化物の他の特性とのバランスの観点からは、例えば、90質量%以下であることが好ましい。
割 合 The proportion of alumina occupied by the inorganic filler contained in the sealing resin composition is not particularly limited. From the viewpoint of improving the thermal conductivity of the cured product, for example, the content is preferably 50% by mass or more, more preferably 60% by mass or more, and even more preferably 70% by mass or more. From the viewpoint of balance with other properties of the cured product, for example, the content is preferably 90% by mass or less.
封止用樹脂組成物に含まれる無機充填材の含有率は特に制限されない。流動性及び強度の観点からは、封止用樹脂組成物全体の30体積%~90体積%であることが好ましく、35体積%~80体積%であることがより好ましく、40体積%~70体積%であることがさらに好ましい。無機充填材の含有率が封止用樹脂組成物全体の30体積%以上であると、硬化物の熱膨張係数、熱伝導率、弾性率等の特性がより向上する傾向にある。無機充填材の含有率が封止用樹脂組成物全体の90体積%以下であると、封止用樹脂組成物の粘度の上昇が抑制され、流動性がより向上して成形性がより良好になる傾向にある。
含有 The content of the inorganic filler contained in the sealing resin composition is not particularly limited. From the viewpoints of fluidity and strength, the content is preferably 30% by volume to 90% by volume, more preferably 35% by volume to 80% by volume, and more preferably 40% by volume to 70% by volume of the entire sealing resin composition. % Is more preferable. When the content of the inorganic filler is 30% by volume or more of the entire sealing resin composition, properties such as a thermal expansion coefficient, a thermal conductivity, and an elastic modulus of the cured product tend to be further improved. When the content of the inorganic filler is 90% by volume or less of the entire sealing resin composition, an increase in the viscosity of the sealing resin composition is suppressed, the flowability is further improved, and the moldability is more improved. Tend to be.
[各種添加剤]
封止用樹脂組成物は、上述の成分に加えて、以下に例示するカップリング剤、イオン交換体、離型剤、難燃剤、着色剤等の各種添加剤を含んでもよい。封止用樹脂組成物は、以下に例示する添加剤以外にも必要に応じて当技術分野で周知の各種添加剤を含んでもよい。 [Various additives]
The sealing resin composition may contain various additives such as a coupling agent, an ion exchanger, a release agent, a flame retardant, and a coloring agent exemplified below, in addition to the above components. The sealing resin composition may contain various additives known in the art as needed, in addition to the additives exemplified below.
封止用樹脂組成物は、上述の成分に加えて、以下に例示するカップリング剤、イオン交換体、離型剤、難燃剤、着色剤等の各種添加剤を含んでもよい。封止用樹脂組成物は、以下に例示する添加剤以外にも必要に応じて当技術分野で周知の各種添加剤を含んでもよい。 [Various additives]
The sealing resin composition may contain various additives such as a coupling agent, an ion exchanger, a release agent, a flame retardant, and a coloring agent exemplified below, in addition to the above components. The sealing resin composition may contain various additives known in the art as needed, in addition to the additives exemplified below.
(カップリング剤)
封止用樹脂組成物は、カップリング剤を含んでもよい。樹脂成分と無機充填材との接着性を高める観点からは、封止用樹脂組成物はカップリング剤を含むことが好ましい。カップリング剤としては、エポキシシラン、メルカプトシラン、アミノシラン、アルキルシラン、ウレイドシラン、ビニルシラン等のシラン系化合物、チタン系化合物、アルミニウムキレート化合物、アルミニウム/ジルコニウム系化合物などの公知のカップリング剤が挙げられる。 (Coupling agent)
The sealing resin composition may include a coupling agent. From the viewpoint of increasing the adhesiveness between the resin component and the inorganic filler, the sealing resin composition preferably contains a coupling agent. Examples of the coupling agent include known coupling agents such as silane compounds such as epoxy silane, mercapto silane, amino silane, alkyl silane, ureido silane, and vinyl silane, titanium compounds, aluminum chelate compounds, and aluminum / zirconium compounds. .
封止用樹脂組成物は、カップリング剤を含んでもよい。樹脂成分と無機充填材との接着性を高める観点からは、封止用樹脂組成物はカップリング剤を含むことが好ましい。カップリング剤としては、エポキシシラン、メルカプトシラン、アミノシラン、アルキルシラン、ウレイドシラン、ビニルシラン等のシラン系化合物、チタン系化合物、アルミニウムキレート化合物、アルミニウム/ジルコニウム系化合物などの公知のカップリング剤が挙げられる。 (Coupling agent)
The sealing resin composition may include a coupling agent. From the viewpoint of increasing the adhesiveness between the resin component and the inorganic filler, the sealing resin composition preferably contains a coupling agent. Examples of the coupling agent include known coupling agents such as silane compounds such as epoxy silane, mercapto silane, amino silane, alkyl silane, ureido silane, and vinyl silane, titanium compounds, aluminum chelate compounds, and aluminum / zirconium compounds. .
封止用樹脂組成物がカップリング剤を含む場合、カップリング剤の量は、無機充填材100質量部に対して0.05質量部~5質量部であることが好ましく、0.1質量部~2.5質量部であることがより好ましい。カップリング剤の量が無機充填材100質量部に対して0.05質量部以上であると、フレームとの接着性がより向上する傾向にある。カップリング剤の量が無機充填材100質量部に対して5質量部以下であると、パッケージの成形性がより向上する傾向にある。
When the sealing resin composition contains a coupling agent, the amount of the coupling agent is preferably 0.05 to 5 parts by mass, and more preferably 0.1 part by mass, based on 100 parts by mass of the inorganic filler. More preferably, it is 2.5 parts by mass. When the amount of the coupling agent is 0.05 parts by mass or more based on 100 parts by mass of the inorganic filler, the adhesiveness to the frame tends to be further improved. When the amount of the coupling agent is 5 parts by mass or less based on 100 parts by mass of the inorganic filler, the moldability of the package tends to be further improved.
(イオン交換体)
封止用樹脂組成物は、イオン交換体を含んでもよい。封止用樹脂組成物は、封止される素子を備える電子部品装置の耐湿性及び高温放置特性を向上させる観点から、イオン交換体を含むことが好ましい。イオン交換体は特に制限されず、従来公知のものを用いることができる。具体的には、ハイドロタルサイト化合物、並びにマグネシウム、アルミニウム、チタン、ジルコニウム及びビスマスからなる群より選ばれる少なくとも1種の元素の含水酸化物等が挙げられる。イオン交換体は、1種を単独で用いても2種以上を組み合わせて用いてもよい。中でも、下記一般式(A)で表されるハイドロタルサイトが好ましい。 (Ion exchanger)
The sealing resin composition may include an ion exchanger. The sealing resin composition preferably contains an ion exchanger from the viewpoint of improving the moisture resistance and high-temperature storage characteristics of the electronic component device including the element to be sealed. The ion exchanger is not particularly limited, and a conventionally known ion exchanger can be used. Specific examples include a hydrotalcite compound and a hydrated oxide of at least one element selected from the group consisting of magnesium, aluminum, titanium, zirconium and bismuth. One type of ion exchanger may be used alone, or two or more types may be used in combination. Among them, hydrotalcite represented by the following general formula (A) is preferable.
封止用樹脂組成物は、イオン交換体を含んでもよい。封止用樹脂組成物は、封止される素子を備える電子部品装置の耐湿性及び高温放置特性を向上させる観点から、イオン交換体を含むことが好ましい。イオン交換体は特に制限されず、従来公知のものを用いることができる。具体的には、ハイドロタルサイト化合物、並びにマグネシウム、アルミニウム、チタン、ジルコニウム及びビスマスからなる群より選ばれる少なくとも1種の元素の含水酸化物等が挙げられる。イオン交換体は、1種を単独で用いても2種以上を組み合わせて用いてもよい。中でも、下記一般式(A)で表されるハイドロタルサイトが好ましい。 (Ion exchanger)
The sealing resin composition may include an ion exchanger. The sealing resin composition preferably contains an ion exchanger from the viewpoint of improving the moisture resistance and high-temperature storage characteristics of the electronic component device including the element to be sealed. The ion exchanger is not particularly limited, and a conventionally known ion exchanger can be used. Specific examples include a hydrotalcite compound and a hydrated oxide of at least one element selected from the group consisting of magnesium, aluminum, titanium, zirconium and bismuth. One type of ion exchanger may be used alone, or two or more types may be used in combination. Among them, hydrotalcite represented by the following general formula (A) is preferable.
Mg(1-X)AlX(OH)2(CO3)X/2・mH2O ……(A)
(0<X≦0.5、mは正の数) Mg (1-X) Al X (OH) 2 (CO 3 ) X / 2 · mH 2 O (A)
(0 <X ≦ 0.5, m is a positive number)
(0<X≦0.5、mは正の数) Mg (1-X) Al X (OH) 2 (CO 3 ) X / 2 · mH 2 O (A)
(0 <X ≦ 0.5, m is a positive number)
封止用樹脂組成物がイオン交換体を含む場合、その含有量は、ハロゲンイオン等のイオンを捕捉するのに充分な量であれば特に制限はない。例えば、樹脂成分100質量部(エポキシ樹脂と硬化剤の合計量)に対して0.1質量部~30質量部であることが好ましく、1質量部~10質量部であることがより好ましい。
場合 When the sealing resin composition contains an ion exchanger, its content is not particularly limited as long as it is an amount sufficient to capture ions such as halogen ions. For example, the amount is preferably from 0.1 to 30 parts by mass, more preferably from 1 to 10 parts by mass, per 100 parts by mass of the resin component (total amount of the epoxy resin and the curing agent).
(離型剤)
封止用樹脂組成物は、成形時における金型との良好な離型性を得る観点から、離型剤を含んでもよい。離型剤は特に制限されず、従来公知のものを用いることができる。具体的には、カルナバワックス、モンタン酸、ステアリン酸等の高級脂肪酸、高級脂肪酸金属塩、モンタン酸エステル等のエステル系ワックス、酸化ポリエチレン、非酸化ポリエチレン等のポリオレフィン系ワックスなどが挙げられる。離型剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Release agent)
The sealing resin composition may include a release agent from the viewpoint of obtaining good releasability from a mold during molding. The release agent is not particularly limited, and a conventionally known release agent can be used. Specific examples include carnauba wax, higher fatty acids such as montanic acid and stearic acid, higher fatty acid metal salts, ester waxes such as montanic acid esters, and polyolefin waxes such as polyethylene oxide and non-oxidized polyethylene. One type of release agent may be used alone, or two or more types may be used in combination.
封止用樹脂組成物は、成形時における金型との良好な離型性を得る観点から、離型剤を含んでもよい。離型剤は特に制限されず、従来公知のものを用いることができる。具体的には、カルナバワックス、モンタン酸、ステアリン酸等の高級脂肪酸、高級脂肪酸金属塩、モンタン酸エステル等のエステル系ワックス、酸化ポリエチレン、非酸化ポリエチレン等のポリオレフィン系ワックスなどが挙げられる。離型剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Release agent)
The sealing resin composition may include a release agent from the viewpoint of obtaining good releasability from a mold during molding. The release agent is not particularly limited, and a conventionally known release agent can be used. Specific examples include carnauba wax, higher fatty acids such as montanic acid and stearic acid, higher fatty acid metal salts, ester waxes such as montanic acid esters, and polyolefin waxes such as polyethylene oxide and non-oxidized polyethylene. One type of release agent may be used alone, or two or more types may be used in combination.
封止用樹脂組成物が離型剤を含む場合、その量は樹脂成分100質量部(エポキシ樹脂と硬化剤の合計量)に対して0.01質量部~10質量部が好ましく、0.1質量部~5質量部がより好ましい。離型剤の量が樹脂成分100質量部に対して0.01質量部以上であると、離型性が充分に得られる傾向にある。10質量部以下であると、より良好な接着性が得られる傾向にある。
When the encapsulating resin composition contains a release agent, the amount is preferably from 0.01 to 10 parts by mass, more preferably from 0.1 to 10 parts by mass, per 100 parts by mass of the resin component (total amount of the epoxy resin and the curing agent). More preferred is from 5 parts by mass to 5 parts by mass. When the amount of the release agent is 0.01 part by mass or more based on 100 parts by mass of the resin component, there is a tendency that sufficient releasability is obtained. When the amount is 10 parts by mass or less, better adhesiveness tends to be obtained.
(難燃剤)
封止用樹脂組成物は、難燃剤を含んでもよい。難燃剤は特に制限されず、従来公知のものを用いることができる。具体的には、ハロゲン原子、アンチモン原子、窒素原子又はリン原子を含む有機又は無機の化合物、金属水酸化物等が挙げられる。難燃剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Flame retardants)
The sealing resin composition may contain a flame retardant. The flame retardant is not particularly limited, and a conventionally known one can be used. Specifically, an organic or inorganic compound containing a halogen atom, an antimony atom, a nitrogen atom or a phosphorus atom, a metal hydroxide and the like can be mentioned. The flame retardants may be used alone or in combination of two or more.
封止用樹脂組成物は、難燃剤を含んでもよい。難燃剤は特に制限されず、従来公知のものを用いることができる。具体的には、ハロゲン原子、アンチモン原子、窒素原子又はリン原子を含む有機又は無機の化合物、金属水酸化物等が挙げられる。難燃剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Flame retardants)
The sealing resin composition may contain a flame retardant. The flame retardant is not particularly limited, and a conventionally known one can be used. Specifically, an organic or inorganic compound containing a halogen atom, an antimony atom, a nitrogen atom or a phosphorus atom, a metal hydroxide and the like can be mentioned. The flame retardants may be used alone or in combination of two or more.
封止用樹脂組成物が難燃剤を含む場合、その量は、所望の難燃効果を得るのに充分な量であれば特に制限されない。例えば、樹脂成分100質量部(エポキシ樹脂と硬化剤の合計量)に対して1質量部~30質量部であることが好ましく、2質量部~20質量部であることがより好ましい。
場合 When the sealing resin composition contains a flame retardant, its amount is not particularly limited as long as it is an amount sufficient to obtain a desired flame retardant effect. For example, it is preferably from 1 to 30 parts by mass, more preferably from 2 to 20 parts by mass, based on 100 parts by mass of the resin component (total amount of the epoxy resin and the curing agent).
(着色剤)
封止用樹脂組成物は、着色剤を含んでもよい。着色剤としてはカーボンブラック、有機染料、有機顔料、酸化チタン、鉛丹、ベンガラ等の公知の着色剤を挙げることができる。着色剤の含有量は目的等に応じて適宜選択できる。着色剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Colorant)
The sealing resin composition may include a coloring agent. Examples of the coloring agent include known coloring agents such as carbon black, organic dyes, organic pigments, titanium oxide, lead red, and red iron oxide. The content of the coloring agent can be appropriately selected according to the purpose and the like. The colorant may be used alone or in combination of two or more.
封止用樹脂組成物は、着色剤を含んでもよい。着色剤としてはカーボンブラック、有機染料、有機顔料、酸化チタン、鉛丹、ベンガラ等の公知の着色剤を挙げることができる。着色剤の含有量は目的等に応じて適宜選択できる。着色剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Colorant)
The sealing resin composition may include a coloring agent. Examples of the coloring agent include known coloring agents such as carbon black, organic dyes, organic pigments, titanium oxide, lead red, and red iron oxide. The content of the coloring agent can be appropriately selected according to the purpose and the like. The colorant may be used alone or in combination of two or more.
(封止用樹脂組成物の調製方法)
封止用樹脂組成物の調製方法は、特に制限されない。一般的な手法としては、所定の配合量の成分をミキサー等によって十分混合した後、ミキシングロール、押出機等によって溶融混練し、冷却し、粉砕する方法を挙げることができる。より具体的には、例えば、上述した成分の所定量を均一に攪拌及び混合し、予め70℃~140℃に加熱してあるニーダー、ロール、エクストルーダー等で混練し、冷却し、粉砕する方法を挙げることができる。 (Preparation method of sealing resin composition)
The method for preparing the sealing resin composition is not particularly limited. As a general method, there can be mentioned a method in which components of a predetermined compounding amount are sufficiently mixed by a mixer or the like, then melt-kneaded by a mixing roll, an extruder, or the like, cooled, and pulverized. More specifically, for example, a method of uniformly stirring and mixing predetermined amounts of the above-described components, kneading with a kneader, roll, extruder or the like which has been heated to 70 ° C. to 140 ° C., cooling, and pulverizing. Can be mentioned.
封止用樹脂組成物の調製方法は、特に制限されない。一般的な手法としては、所定の配合量の成分をミキサー等によって十分混合した後、ミキシングロール、押出機等によって溶融混練し、冷却し、粉砕する方法を挙げることができる。より具体的には、例えば、上述した成分の所定量を均一に攪拌及び混合し、予め70℃~140℃に加熱してあるニーダー、ロール、エクストルーダー等で混練し、冷却し、粉砕する方法を挙げることができる。 (Preparation method of sealing resin composition)
The method for preparing the sealing resin composition is not particularly limited. As a general method, there can be mentioned a method in which components of a predetermined compounding amount are sufficiently mixed by a mixer or the like, then melt-kneaded by a mixing roll, an extruder, or the like, cooled, and pulverized. More specifically, for example, a method of uniformly stirring and mixing predetermined amounts of the above-described components, kneading with a kneader, roll, extruder or the like which has been heated to 70 ° C. to 140 ° C., cooling, and pulverizing. Can be mentioned.
封止用樹脂組成物は、常温常圧下(例えば、25℃、大気圧下)において固体であることが好ましい。封止用樹脂組成物が固体である場合の形状は特に制限されず、粉状、粒状、タブレット状等が挙げられる。封止用樹脂組成物がタブレット状である場合の寸法及び質量は、パッケージの成形条件に合うような寸法及び質量となるようにすることが取り扱い性の観点から好ましい。
(4) The sealing resin composition is preferably solid at normal temperature and normal pressure (for example, 25 ° C. and atmospheric pressure). The shape when the sealing resin composition is a solid is not particularly limited, and examples thereof include powder, granules, and tablets. When the resin composition for sealing is in the form of a tablet, it is preferable from the viewpoint of handleability that the dimensions and the mass be such as to match the molding conditions of the package.
<電子部品装置>
本開示の一実施形態である電子部品装置は、素子と、前記素子を封止している本開示の封止用樹脂組成物の硬化物と、を備える。 <Electronic component device>
An electronic component device according to an embodiment of the present disclosure includes an element, and a cured product of the sealing resin composition of the present disclosure that seals the element.
本開示の一実施形態である電子部品装置は、素子と、前記素子を封止している本開示の封止用樹脂組成物の硬化物と、を備える。 <Electronic component device>
An electronic component device according to an embodiment of the present disclosure includes an element, and a cured product of the sealing resin composition of the present disclosure that seals the element.
電子部品装置としては、リードフレーム、配線済みのテープキャリア、配線板、ガラス、シリコンウエハ、有機基板等の支持部材に、素子(半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子、コンデンサ、抵抗体、コイル等の受動素子など)を搭載して得られた素子部を封止用樹脂組成物で封止したものが挙げられる。
より具体的には、リードフレーム上に素子を固定し、ボンディングパッド等の素子の端子部とリード部とをワイヤボンディング、バンプ等で接続した後、封止用樹脂組成物を用いてトランスファ成形等によって封止した構造を有するDIP(Dual Inline Package)、PLCC(Plastic Leaded Chip Carrier)、QFP(Quad Flat Package)、SOP(Small Outline Package)、SOJ(Small Outline J-lead package)、TSOP(Thin Small Outline Package)、TQFP(Thin Quad Flat Package)等の一般的な樹脂封止型IC;テープキャリアにバンプで接続した素子を封止用樹脂組成物で封止した構造を有するTCP(Tape Carrier Package);支持部材上に形成した配線に、ワイヤボンディング、フリップチップボンディング、はんだ等で接続した素子を、封止用樹脂組成物で封止した構造を有するCOB(Chip On Board)モジュール、ハイブリッドIC、マルチチップモジュール等;裏面に配線板接続用の端子を形成した支持部材の表面に素子を搭載し、バンプ又はワイヤボンディングにより素子と支持部材に形成された配線とを接続した後、封止用樹脂組成物で素子を封止した構造を有するBGA(Ball Grid Array)、CSP(Chip Size Package)、MCP(Multi Chip Package)などが挙げられる。また、プリント配線板においても封止用樹脂組成物を好適に使用することができる。 Electronic component devices include supporting members such as lead frames, wired tape carriers, wiring boards, glass, silicon wafers, and organic substrates, as well as active elements such as semiconductor chips, transistors, diodes, and thyristors, capacitors, and resistors. , A passive element such as a coil) is sealed with a sealing resin composition.
More specifically, after fixing an element on a lead frame, connecting a terminal part of the element such as a bonding pad and a lead part by wire bonding, a bump or the like, and then performing transfer molding or the like using a sealing resin composition. (Dual Inline Package), PLCC (Plastic Leaded Chip Carrier), QFP (Quad Flat Package), SOP (Small Outline Package, SOJ (Small Outlet Package), and SOJ (Small Outline Package). General resin-sealed ICs such as Outline Package and TQFP (Thin Quad Flat Package); an element connected to a tape carrier by a bump for sealing. TCP (Tape Carrier Package) having a structure sealed with a composition; an element connected to a wiring formed on a support member by wire bonding, flip chip bonding, solder, or the like is sealed with a sealing resin composition. COB (Chip On Board) module, hybrid IC, multi-chip module, etc. having a structure; an element is mounted on the surface of a support member having wiring board connection terminals formed on the back surface, and the element and the support member are bumped or wire-bonded. After connection with the formed wiring, BGA (Ball Grid Array), CSP (Chip Size Package), MCP (Multi Chip Package), and the like having a structure in which the element is sealed with a sealing resin composition are exemplified. The sealing resin composition can also be suitably used for a printed wiring board.
より具体的には、リードフレーム上に素子を固定し、ボンディングパッド等の素子の端子部とリード部とをワイヤボンディング、バンプ等で接続した後、封止用樹脂組成物を用いてトランスファ成形等によって封止した構造を有するDIP(Dual Inline Package)、PLCC(Plastic Leaded Chip Carrier)、QFP(Quad Flat Package)、SOP(Small Outline Package)、SOJ(Small Outline J-lead package)、TSOP(Thin Small Outline Package)、TQFP(Thin Quad Flat Package)等の一般的な樹脂封止型IC;テープキャリアにバンプで接続した素子を封止用樹脂組成物で封止した構造を有するTCP(Tape Carrier Package);支持部材上に形成した配線に、ワイヤボンディング、フリップチップボンディング、はんだ等で接続した素子を、封止用樹脂組成物で封止した構造を有するCOB(Chip On Board)モジュール、ハイブリッドIC、マルチチップモジュール等;裏面に配線板接続用の端子を形成した支持部材の表面に素子を搭載し、バンプ又はワイヤボンディングにより素子と支持部材に形成された配線とを接続した後、封止用樹脂組成物で素子を封止した構造を有するBGA(Ball Grid Array)、CSP(Chip Size Package)、MCP(Multi Chip Package)などが挙げられる。また、プリント配線板においても封止用樹脂組成物を好適に使用することができる。 Electronic component devices include supporting members such as lead frames, wired tape carriers, wiring boards, glass, silicon wafers, and organic substrates, as well as active elements such as semiconductor chips, transistors, diodes, and thyristors, capacitors, and resistors. , A passive element such as a coil) is sealed with a sealing resin composition.
More specifically, after fixing an element on a lead frame, connecting a terminal part of the element such as a bonding pad and a lead part by wire bonding, a bump or the like, and then performing transfer molding or the like using a sealing resin composition. (Dual Inline Package), PLCC (Plastic Leaded Chip Carrier), QFP (Quad Flat Package), SOP (Small Outline Package, SOJ (Small Outlet Package), and SOJ (Small Outline Package). General resin-sealed ICs such as Outline Package and TQFP (Thin Quad Flat Package); an element connected to a tape carrier by a bump for sealing. TCP (Tape Carrier Package) having a structure sealed with a composition; an element connected to a wiring formed on a support member by wire bonding, flip chip bonding, solder, or the like is sealed with a sealing resin composition. COB (Chip On Board) module, hybrid IC, multi-chip module, etc. having a structure; an element is mounted on the surface of a support member having wiring board connection terminals formed on the back surface, and the element and the support member are bumped or wire-bonded. After connection with the formed wiring, BGA (Ball Grid Array), CSP (Chip Size Package), MCP (Multi Chip Package), and the like having a structure in which the element is sealed with a sealing resin composition are exemplified. The sealing resin composition can also be suitably used for a printed wiring board.
<電子部品装置の製造方法>
本開示の電子部品装置の製造方法は、素子を支持部材上に配置する工程と、前記素子を本開示の封止用樹脂組成物で封止する工程と、を含む。 <Manufacturing method of electronic component device>
The method for manufacturing an electronic component device according to the present disclosure includes a step of disposing an element on a support member, and a step of sealing the element with the sealing resin composition of the present disclosure.
本開示の電子部品装置の製造方法は、素子を支持部材上に配置する工程と、前記素子を本開示の封止用樹脂組成物で封止する工程と、を含む。 <Manufacturing method of electronic component device>
The method for manufacturing an electronic component device according to the present disclosure includes a step of disposing an element on a support member, and a step of sealing the element with the sealing resin composition of the present disclosure.
上記各工程を実施する方法は特に制限されず、一般的な手法により行うことができる。また、電子部品装置の製造に使用する支持部材及び素子の種類は特に制限されず、電子部品装置の製造に一般的に用いられる支持部材及び素子を使用できる。
方法 The method of performing each of the above steps is not particularly limited, and can be performed by a general method. Further, the types of the support members and the elements used for manufacturing the electronic component device are not particularly limited, and the support members and the elements generally used for manufacturing the electronic component device can be used.
本開示の封止用樹脂組成物を用いて素子を封止する方法としては、低圧トランスファ成形法、インジェクション成形法、圧縮成形法等が挙げられる。これらの中では、低圧トランスファ成形法が一般的である。
方法 Examples of a method for sealing an element using the sealing resin composition of the present disclosure include a low-pressure transfer molding method, an injection molding method, and a compression molding method. Among these, the low pressure transfer molding method is common.
以下、上記実施形態を実施例により具体的に説明するが、上記実施形態の範囲はこれらの実施例に限定されるものではない。
Hereinafter, the above embodiments will be specifically described with reference to examples, but the scope of the embodiments is not limited to these examples.
<封止用樹脂組成物の調製>
下記に示す成分を表1に示す配合(質量部)で混合し、実施例と比較例の封止用樹脂組成物を調製した。 <Preparation of sealing resin composition>
The components shown below were mixed in the proportions (parts by mass) shown in Table 1 to prepare sealing resin compositions of Examples and Comparative Examples.
下記に示す成分を表1に示す配合(質量部)で混合し、実施例と比較例の封止用樹脂組成物を調製した。 <Preparation of sealing resin composition>
The components shown below were mixed in the proportions (parts by mass) shown in Table 1 to prepare sealing resin compositions of Examples and Comparative Examples.
・エポキシ樹脂1:ビフェニルアラルキル型エポキシ樹脂、エポキシ当量275g/eq(日本化薬株式会社、品名「NC-3000」)
・エポキシ樹脂2:ビフェニル型エポキシ樹脂、エポキシ当量192g/eq(三菱ケミカル株式会社、品名「YX-4000」) -Epoxy resin 1: biphenyl aralkyl type epoxy resin, epoxy equivalent 275 g / eq (Nippon Kayaku Co., Ltd., product name "NC-3000")
Epoxy resin 2: biphenyl type epoxy resin, epoxy equivalent 192 g / eq (Mitsubishi Chemical Corporation, product name "YX-4000")
・エポキシ樹脂2:ビフェニル型エポキシ樹脂、エポキシ当量192g/eq(三菱ケミカル株式会社、品名「YX-4000」) -Epoxy resin 1: biphenyl aralkyl type epoxy resin, epoxy equivalent 275 g / eq (Nippon Kayaku Co., Ltd., product name "NC-3000")
Epoxy resin 2: biphenyl type epoxy resin, epoxy equivalent 192 g / eq (Mitsubishi Chemical Corporation, product name "YX-4000")
・硬化剤1:ビフェニルアラルキル型フェノール樹脂、水酸基当量199g/eq(エア・ウォーター株式会社、品名「HE200C-10」)
・硬化剤2:活性エステル化合物(DIC株式会社) Curing agent 1: Biphenyl aralkyl type phenol resin, hydroxyl equivalent 199 g / eq (Air Water Co., Ltd., product name "HE200C-10")
・ Curing agent 2: Active ester compound (DIC Corporation)
・硬化剤2:活性エステル化合物(DIC株式会社) Curing agent 1: Biphenyl aralkyl type phenol resin, hydroxyl equivalent 199 g / eq (Air Water Co., Ltd., product name "HE200C-10")
・ Curing agent 2: Active ester compound (DIC Corporation)
・硬化促進剤1:トリフェニルホスフィンのp-ベンゾキノン付加物
Curing accelerator 1: p-benzoquinone adduct of triphenylphosphine
・カップリング剤1:3-メタクリロキシプロピルトリメトキシシラン(信越化学工業株式会社、品名「KBM-503」)
・カップリング剤2:3-メルカプトプロピルトリメトキシシラン(信越化学工業株式会社、品名「KBM-803」) ・ Coupling agent 1: 3-methacryloxypropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., product name “KBM-503”)
・ Coupling agent 2: 3-mercaptopropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., product name “KBM-803”)
・カップリング剤2:3-メルカプトプロピルトリメトキシシラン(信越化学工業株式会社、品名「KBM-803」) ・ Coupling agent 1: 3-methacryloxypropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., product name “KBM-503”)
・ Coupling agent 2: 3-mercaptopropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., product name “KBM-803”)
・離型剤:モンタン酸エステルワックス(クラリアントジャパン株式会社、品名「HW-E」)
・着色剤:カーボンブラック(三菱ケミカル株式会社、品名「MA600」)
・添加剤:トリフェニルホスフィンオキシド(北興化学工業株式会社、品名「TP-50」) ・ Release agent: montanic acid ester wax (Clariant Japan K.K., product name “HW-E”)
-Colorant: carbon black (Mitsubishi Chemical Corporation, product name "MA600")
・ Additive: Triphenylphosphine oxide (Hokuko Chemical Co., Ltd., product name “TP-50”)
・着色剤:カーボンブラック(三菱ケミカル株式会社、品名「MA600」)
・添加剤:トリフェニルホスフィンオキシド(北興化学工業株式会社、品名「TP-50」) ・ Release agent: montanic acid ester wax (Clariant Japan K.K., product name “HW-E”)
-Colorant: carbon black (Mitsubishi Chemical Corporation, product name "MA600")
・ Additive: Triphenylphosphine oxide (Hokuko Chemical Co., Ltd., product name “TP-50”)
・無機充填材1:シリカフィラ(デンカ株式会社、品名「FB-9454FC」、平均粒径18μm)
・無機充填材2:シリカフィラ(デンカ株式会社、品名「FB-9454」、平均粒径19μm)
・無機充填材3:アルミナ/シリカ=9/1の混合物(デンカ株式会社、品名「DAB-10FC」、平均粒径10μm) ・ Inorganic filler 1: Silica filler (Denka Corporation, product name “FB-9454FC”, average particle size 18 μm)
・ Inorganic filler 2: Silica filler (Denka Corporation, product name “FB-9454”, average particle size 19 μm)
-Inorganic filler 3: A mixture of alumina / silica = 9/1 (Denka Corporation, product name "DAB-10FC", average particle size 10 µm)
・無機充填材2:シリカフィラ(デンカ株式会社、品名「FB-9454」、平均粒径19μm)
・無機充填材3:アルミナ/シリカ=9/1の混合物(デンカ株式会社、品名「DAB-10FC」、平均粒径10μm) ・ Inorganic filler 1: Silica filler (Denka Corporation, product name “FB-9454FC”, average particle size 18 μm)
・ Inorganic filler 2: Silica filler (Denka Corporation, product name “FB-9454”, average particle size 19 μm)
-Inorganic filler 3: A mixture of alumina / silica = 9/1 (Denka Corporation, product name "DAB-10FC", average particle size 10 µm)
<封止用樹脂組成物の性能評価>
(スパイラルフロー)
EMMI-1-66に準じたスパイラルフロー測定用金型を用いて、封止用樹脂組成物を金型温度180℃、成形圧力6.9MPa、硬化時間90秒の条件で成形し、流動距離(cm)を求めた。 <Performance evaluation of sealing resin composition>
(Spiral flow)
Using a mold for spiral flow measurement according to EMMI-1-66, the sealing resin composition was molded under the conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds, and a flow distance ( cm).
(スパイラルフロー)
EMMI-1-66に準じたスパイラルフロー測定用金型を用いて、封止用樹脂組成物を金型温度180℃、成形圧力6.9MPa、硬化時間90秒の条件で成形し、流動距離(cm)を求めた。 <Performance evaluation of sealing resin composition>
(Spiral flow)
Using a mold for spiral flow measurement according to EMMI-1-66, the sealing resin composition was molded under the conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds, and a flow distance ( cm).
(ゲルタイム)
封止用樹脂組成物0.5gを175℃に熱した熱板上に乗せ、治具を用いて20回転/分~25回転/分の回転速度で、試料を2.0cm~2.5cmの円状に均一に広げた。試料を熱板に乗せてから、試料の粘性がなくなり、ゲル状態となって熱板から剥がれるようになるまでの時間を計測し、これをゲルタイム(sec)として測定した。 (Gel time)
0.5 g of the resin composition for sealing is placed on a hot plate heated to 175 ° C., and the sample is placed at 2.0 to 2.5 cm at a rotation speed of 20 to 25 rotations / minute using a jig. Spread uniformly in a circle. After the sample was placed on the hot plate, the time required for the sample to lose its viscosity and to be in a gel state and come off from the hot plate was measured, and this was measured as a gel time (sec).
封止用樹脂組成物0.5gを175℃に熱した熱板上に乗せ、治具を用いて20回転/分~25回転/分の回転速度で、試料を2.0cm~2.5cmの円状に均一に広げた。試料を熱板に乗せてから、試料の粘性がなくなり、ゲル状態となって熱板から剥がれるようになるまでの時間を計測し、これをゲルタイム(sec)として測定した。 (Gel time)
0.5 g of the resin composition for sealing is placed on a hot plate heated to 175 ° C., and the sample is placed at 2.0 to 2.5 cm at a rotation speed of 20 to 25 rotations / minute using a jig. Spread uniformly in a circle. After the sample was placed on the hot plate, the time required for the sample to lose its viscosity and to be in a gel state and come off from the hot plate was measured, and this was measured as a gel time (sec).
(熱伝導率)
封止組成物を用いて、真空ハンドプレス成形機により、金型温度175℃~180℃、成形圧力250kPa、硬化時間600秒の条件で熱伝導率評価用の試験片(縦10mm×横10mm×厚み0.8mm)を作製した。次いで、成形した試験片について、厚さ方向の熱拡散率を測定した。熱拡散率の測定はレーザーフラッシュ法(装置:LFA467 nanoflash、NETZSCH社製)にて行った。パルス光照射は、パルス幅0.31(ms)、印加電圧247Vの条件で行った。測定は雰囲気温度25℃±1℃で行った。また上記試験片の密度は電子比重計(AUX220、株式会社島津製作所)を用いて測定した。比熱は各材料の比熱の文献値と配合比率より封止組成物の理論比熱を算出した。
次いで、式(1)を用いて比熱及び密度を熱拡散率に乗算することによって,熱伝導率の値を得た。
λ=α×Cp×ρ・・・式(1)
(式(1)中、λは熱伝導率(W/(m・K))、αは熱拡散率(m2/s)、Cpは比熱(J/(kg・K))、ρは密度(d:kg/m3)をそれぞれ示す。) (Thermal conductivity)
A test piece for thermal conductivity evaluation (length 10 mm × width 10 mm ×) was prepared by using a vacuum hand press molding machine under the conditions of a mold temperature of 175 ° C. to 180 ° C., a molding pressure of 250 kPa, and a curing time of 600 seconds. 0.8 mm). Next, the thermal diffusivity in the thickness direction of the molded test piece was measured. The measurement of the thermal diffusivity was performed by a laser flash method (apparatus: LFA467 nanoflash, manufactured by NETZSCH). The pulse light irradiation was performed under the conditions of a pulse width of 0.31 (ms) and an applied voltage of 247 V. The measurement was performed at an ambient temperature of 25 ° C. ± 1 ° C. The density of the test piece was measured using an electronic hydrometer (AUX220, Shimadzu Corporation). As the specific heat, the theoretical specific heat of the sealing composition was calculated from the reference value of the specific heat of each material and the mixing ratio.
Next, the value of the thermal conductivity was obtained by multiplying the specific heat and density by the thermal diffusivity using Equation (1).
λ = α × Cp × ρ Expression (1)
(Where λ is the thermal conductivity (W / (m · K)), α is the thermal diffusivity (m 2 / s), Cp is the specific heat (J / (kg · K)), and ρ is the density (D: kg / m 3 ).
封止組成物を用いて、真空ハンドプレス成形機により、金型温度175℃~180℃、成形圧力250kPa、硬化時間600秒の条件で熱伝導率評価用の試験片(縦10mm×横10mm×厚み0.8mm)を作製した。次いで、成形した試験片について、厚さ方向の熱拡散率を測定した。熱拡散率の測定はレーザーフラッシュ法(装置:LFA467 nanoflash、NETZSCH社製)にて行った。パルス光照射は、パルス幅0.31(ms)、印加電圧247Vの条件で行った。測定は雰囲気温度25℃±1℃で行った。また上記試験片の密度は電子比重計(AUX220、株式会社島津製作所)を用いて測定した。比熱は各材料の比熱の文献値と配合比率より封止組成物の理論比熱を算出した。
次いで、式(1)を用いて比熱及び密度を熱拡散率に乗算することによって,熱伝導率の値を得た。
λ=α×Cp×ρ・・・式(1)
(式(1)中、λは熱伝導率(W/(m・K))、αは熱拡散率(m2/s)、Cpは比熱(J/(kg・K))、ρは密度(d:kg/m3)をそれぞれ示す。) (Thermal conductivity)
A test piece for thermal conductivity evaluation (length 10 mm × width 10 mm ×) was prepared by using a vacuum hand press molding machine under the conditions of a mold temperature of 175 ° C. to 180 ° C., a molding pressure of 250 kPa, and a curing time of 600 seconds. 0.8 mm). Next, the thermal diffusivity in the thickness direction of the molded test piece was measured. The measurement of the thermal diffusivity was performed by a laser flash method (apparatus: LFA467 nanoflash, manufactured by NETZSCH). The pulse light irradiation was performed under the conditions of a pulse width of 0.31 (ms) and an applied voltage of 247 V. The measurement was performed at an ambient temperature of 25 ° C. ± 1 ° C. The density of the test piece was measured using an electronic hydrometer (AUX220, Shimadzu Corporation). As the specific heat, the theoretical specific heat of the sealing composition was calculated from the reference value of the specific heat of each material and the mixing ratio.
Next, the value of the thermal conductivity was obtained by multiplying the specific heat and density by the thermal diffusivity using Equation (1).
λ = α × Cp × ρ Expression (1)
(Where λ is the thermal conductivity (W / (m · K)), α is the thermal diffusivity (m 2 / s), Cp is the specific heat (J / (kg · K)), and ρ is the density (D: kg / m 3 ).
(比誘電率及び誘電正接)
封止用樹脂組成物をトランスファ成形機に仕込み、金型温度180℃、成形圧力6.9MPa、硬化時間90秒の条件で成形し、後硬化を175℃で6時間行い、棒状の硬化物(縦0.8mm、横0.6mm、厚さ90mm)を得た。この硬化物を試験片として、空洞共振器(株式会社関東電子応用開発、「CP561」)およびネットワーク・アナライザー(キーサイトテクノロジー社、「PNA E8364B」)を用いて、温度25±1℃下、20GHzでの比誘電率と誘電正接を測定した。 (Relative permittivity and dielectric loss tangent)
The encapsulating resin composition is charged into a transfer molding machine, molded under the conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds, and post-curing is performed at 175 ° C. for 6 hours to obtain a rod-shaped cured product ( 0.8 mm long, 0.6 mm wide, and 90 mm thick). Using this cured product as a test piece, using a cavity resonator (Kanto Electronics Application Development Co., Ltd., “CP561”) and a network analyzer (Keysight Technology, Inc., “PNA E8364B”), at a temperature of 25 ± 1 ° C. and 20 GHz Was measured for dielectric constant and dielectric loss tangent.
封止用樹脂組成物をトランスファ成形機に仕込み、金型温度180℃、成形圧力6.9MPa、硬化時間90秒の条件で成形し、後硬化を175℃で6時間行い、棒状の硬化物(縦0.8mm、横0.6mm、厚さ90mm)を得た。この硬化物を試験片として、空洞共振器(株式会社関東電子応用開発、「CP561」)およびネットワーク・アナライザー(キーサイトテクノロジー社、「PNA E8364B」)を用いて、温度25±1℃下、20GHzでの比誘電率と誘電正接を測定した。 (Relative permittivity and dielectric loss tangent)
The encapsulating resin composition is charged into a transfer molding machine, molded under the conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds, and post-curing is performed at 175 ° C. for 6 hours to obtain a rod-shaped cured product ( 0.8 mm long, 0.6 mm wide, and 90 mm thick). Using this cured product as a test piece, using a cavity resonator (Kanto Electronics Application Development Co., Ltd., “CP561”) and a network analyzer (Keysight Technology, Inc., “PNA E8364B”), at a temperature of 25 ± 1 ° C. and 20 GHz Was measured for dielectric constant and dielectric loss tangent.
表1に示すように、無機充填材としてアルミナを使用した実施例1、比較例3の封止用樹脂組成物は、無機充填材としてアルミナを使用していない比較例1、2に比べて硬化物の熱伝導率が高かった。一方、実施例1、比較例3の比誘電率は比較例1、2に比べて上昇した。しかしながら、硬化剤として活性エステル化合物を使用した実施例1は、硬化剤としてフェノール樹脂を使用した比較例3に比べて誘電正接が低いために伝送損失の増大が抑えられ、結果として放熱性と誘電特性のバランスに優れていた。
また、実施例1、比較例2では硬化剤としてフェノール樹脂よりも低粘度の活性エステルを使用することで、硬化剤としてフェノール樹脂を使用した比較例1、3に比べて流動性が向上しているが、無機充填材としてアルミナを併用した実施例1の方が、無機充填材としてアルミナを併用しない比較例3より流動性向上効果が大きくなっている。
さらに、実施例1では比較例1~3に比べてゲルタイムが短い。アルミナは一般に硬化反応の遅延を引き起こすが、活性エステル化合物とエポキシ樹脂の反応性がフェノール樹脂とエポキシ樹脂の反応性に比べて高いために、硬化性が向上すると考えられる。 As shown in Table 1, the sealing resin compositions of Example 1 and Comparative Example 3 using alumina as the inorganic filler were harder than Comparative Examples 1 and 2 not using alumina as the inorganic filler. The thermal conductivity of the object was high. On the other hand, the relative dielectric constants of Example 1 and Comparative Example 3 were higher than those of Comparative Examples 1 and 2. However, in Example 1 in which the active ester compound was used as the curing agent, the transmission loss was suppressed because the dielectric loss tangent was lower than in Comparative Example 3 in which the phenol resin was used as the curing agent. The balance of characteristics was excellent.
In Example 1 and Comparative Example 2, the use of an active ester having a lower viscosity than that of the phenol resin as the curing agent improved the fluidity as compared with Comparative Examples 1 and 3 using the phenol resin as the curing agent. However, the effect of improving the fluidity of Example 1 using alumina as the inorganic filler was larger than that of Comparative Example 3 not using alumina as the inorganic filler.
Further, in Example 1, the gel time is shorter than in Comparative Examples 1 to 3. Alumina generally causes a delay in the curing reaction, but it is considered that the curability is improved because the reactivity between the active ester compound and the epoxy resin is higher than the reactivity between the phenol resin and the epoxy resin.
また、実施例1、比較例2では硬化剤としてフェノール樹脂よりも低粘度の活性エステルを使用することで、硬化剤としてフェノール樹脂を使用した比較例1、3に比べて流動性が向上しているが、無機充填材としてアルミナを併用した実施例1の方が、無機充填材としてアルミナを併用しない比較例3より流動性向上効果が大きくなっている。
さらに、実施例1では比較例1~3に比べてゲルタイムが短い。アルミナは一般に硬化反応の遅延を引き起こすが、活性エステル化合物とエポキシ樹脂の反応性がフェノール樹脂とエポキシ樹脂の反応性に比べて高いために、硬化性が向上すると考えられる。 As shown in Table 1, the sealing resin compositions of Example 1 and Comparative Example 3 using alumina as the inorganic filler were harder than Comparative Examples 1 and 2 not using alumina as the inorganic filler. The thermal conductivity of the object was high. On the other hand, the relative dielectric constants of Example 1 and Comparative Example 3 were higher than those of Comparative Examples 1 and 2. However, in Example 1 in which the active ester compound was used as the curing agent, the transmission loss was suppressed because the dielectric loss tangent was lower than in Comparative Example 3 in which the phenol resin was used as the curing agent. The balance of characteristics was excellent.
In Example 1 and Comparative Example 2, the use of an active ester having a lower viscosity than that of the phenol resin as the curing agent improved the fluidity as compared with Comparative Examples 1 and 3 using the phenol resin as the curing agent. However, the effect of improving the fluidity of Example 1 using alumina as the inorganic filler was larger than that of Comparative Example 3 not using alumina as the inorganic filler.
Further, in Example 1, the gel time is shorter than in Comparative Examples 1 to 3. Alumina generally causes a delay in the curing reaction, but it is considered that the curability is improved because the reactivity between the active ester compound and the epoxy resin is higher than the reactivity between the phenol resin and the epoxy resin.
Claims (4)
- エポキシ樹脂と、活性エステル化合物を含む硬化剤と、アルミナを含む無機充填材とを含有する封止用樹脂組成物。 (4) A sealing resin composition containing an epoxy resin, a curing agent containing an active ester compound, and an inorganic filler containing alumina.
- 前記無機充填材全体に占めるアルミナの割合が50質量%以上である、請求項1に記載の封止用樹脂組成物。 The sealing resin composition according to claim 1, wherein the proportion of alumina in the entire inorganic filler is 50% by mass or more.
- 支持部材と、
前記支持部材上に配置された素子と、
前記素子を封止している請求項1又は請求項2に記載の封止用樹脂組成物の硬化物と、
を備える電子部品装置。 A support member;
An element disposed on the support member,
A cured product of the encapsulating resin composition according to claim 1 or 2, which encapsulates the element;
Electronic component device comprising: - 素子を支持部材上に配置する工程と、
前記素子を請求項1又は請求項2に記載の封止用樹脂組成物で封止する工程と、
を含む電子部品装置の製造方法。 Arranging the element on a support member;
A step of sealing the element with the sealing resin composition according to claim 1 or 2,
A method for manufacturing an electronic component device including:
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JP2010184993A (en) * | 2009-02-12 | 2010-08-26 | Nippon Steel Chem Co Ltd | Epoxy resin composition and cured article |
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WO2018008416A1 (en) * | 2016-07-06 | 2018-01-11 | Dic株式会社 | Active ester composition and cured product thereof |
JP2018058959A (en) * | 2016-10-03 | 2018-04-12 | 味の素株式会社 | Resin composition |
JP2018159028A (en) * | 2017-03-23 | 2018-10-11 | 味の素株式会社 | Resin composition |
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WO2018008416A1 (en) * | 2016-07-06 | 2018-01-11 | Dic株式会社 | Active ester composition and cured product thereof |
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